WO2023234177A1 - Méthode de production de film - Google Patents

Méthode de production de film Download PDF

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Publication number
WO2023234177A1
WO2023234177A1 PCT/JP2023/019553 JP2023019553W WO2023234177A1 WO 2023234177 A1 WO2023234177 A1 WO 2023234177A1 JP 2023019553 W JP2023019553 W JP 2023019553W WO 2023234177 A1 WO2023234177 A1 WO 2023234177A1
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WO
WIPO (PCT)
Prior art keywords
block
less
coating liquid
base material
shim
Prior art date
Application number
PCT/JP2023/019553
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English (en)
Japanese (ja)
Inventor
有 森本
憲顕 高橋
篤志 大本
尚樹 橋本
Original Assignee
日東電工株式会社
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Filing date
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Publication of WO2023234177A1 publication Critical patent/WO2023234177A1/fr

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/26Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00Coating compositions based on unspecified macromolecular compounds

Definitions

  • the present invention relates to a method for manufacturing a film.
  • the present invention provides a method for producing a film that can uniformly form a wide and thin coating on a substrate using a slot die.
  • the present invention [1] is a method for producing a film in which a film having a width of 1,600 mm or more and a thickness of 30 ⁇ m or less is formed on a base material using a slot die, and the method comprises using a coating liquid as a base material.
  • a film comprising a coating step of coating the material and a drying step of drying the coating liquid applied to the base material, and the thickness of the shim of the slot die is 20 ⁇ m or more and 100 ⁇ m or less. Including manufacturing method.
  • the present invention [2] is characterized in that the slot die is arranged downstream of the first block in the conveyance direction of the base material and forms a slot between the first block and the second block.
  • a block, and the shim disposed between the first block and the second block, and the second block includes a main body and a downstream side of the main body in the discharging direction of the coating liquid.
  • the method includes a method for manufacturing a film according to [1] above, wherein the film has a protrusion that protrudes from the end face toward the downstream side in the discharge direction, and the protrusion amount of the protrusion is 10 ⁇ m or less.
  • the present invention [3] is characterized in that the slot die is arranged downstream of the first block in the transport direction of the base material and forms a slot between the first block and the second block. a block, and the shim disposed between the first block and the second block, wherein the second block is arranged in the discharging direction from the downstream end of the second block in the discharging direction of the coating liquid. has a slope that slopes away from the first block toward the upstream end of the second block, and an obtuse angle between the coating liquid discharge direction and the slope is 110° or more, It includes the method for producing a film according to [1] above, in which the angle is 170° or less.
  • the present invention [4] includes the method for producing a film according to the above [1], wherein the transport speed of the base material is 15 m/min or more and 30 m/min or less.
  • the present invention [5] includes the method for producing a film according to the above [1], wherein the solid content concentration of the coating liquid is 10% by mass or more and 50% by mass or less.
  • the coating liquid contains a polyfunctional oligomer and a trifunctional monomer, and the proportion of the polyfunctional oligomer in the coating liquid is 20% by mass or more and 70% by mass or less.
  • the present invention includes the method for producing a film according to [1] above, wherein the proportion of the trifunctional monomer in the coating liquid is 20% by mass or more and 70% by mass or less.
  • the present invention [7] includes the method for producing a film according to the above [1], wherein the shim has an elastic modulus of 1500 MPa or more and 6000 MPa or less.
  • the present invention [8] includes the method for producing a film according to the above [1], wherein the shim is made of polyethylene terephthalate.
  • the thickness of the shim of the slot die is adjusted to 30 ⁇ m or more and 100 ⁇ m or less.
  • a wide (width of 1600 mm or more) and thin (thickness of 30 ⁇ m or less) coating can be uniformly formed on the base material.
  • FIG. 1 is a cross-sectional view of the film.
  • FIG. 2 is a schematic diagram of a film manufacturing system.
  • FIG. 3 is a perspective view of the slot die.
  • FIG. 4 is a cross-sectional view of the slot die shown in FIG. 3.
  • a slot die D is used to form a "wide" and "thin” coating C on a base material S.
  • Wide means that the width is 1600 mm or more.
  • Thin means that the thickness is 30 ⁇ m or less.
  • the film F includes a base material S and a coating C.
  • the base material S has a sheet shape.
  • the base material S has a first surface S1 and a second surface S2 in the thickness direction of the base material S.
  • the base material S is made of thermoplastic resin.
  • thermoplastic resins include acrylic resins, polyolefin resins, cyclic polyolefin resins, polyester resins, polycarbonate resins, polystyrene resins, polyamide resins, polyimide resins, and acetate resins.
  • acetate resins include diacetylcellulose and triacetylcellulose.
  • the base material S may contain additives.
  • additives include antioxidants, stabilizers, reinforcing materials, ultraviolet absorbers, flame retardants, antistatic agents, colorants, fillers, plasticizers, lubricants, and fillers.
  • the coating C is placed on the first surface S1 of the base material S.
  • the coating C covers the first surface S1 of the base material S.
  • Functions of the coating C include, for example, anti-glare properties, anti-reflection properties and scratch resistance.
  • Coating C contains resin.
  • the resin include thermosetting resins and thermoplastic resins.
  • thermosetting resins include urethane resins and epoxy resins.
  • thermoplastic resins include acrylic resins, urethane acrylic resins, and polyester resins.
  • the coating C may contain particles.
  • the particles include oxides, carbonates, silicates, silicate minerals, and phosphates.
  • oxides include silicon oxide (silica), titanium oxide (titania), aluminum oxide (alumina), and zirconium oxide (zirconia).
  • carbonates include calcium carbonate.
  • silicates include calcium silicate, aluminum silicate, and magnesium silicate.
  • silicate minerals include talc and kaolin.
  • phosphates include calcium phosphate.
  • the film F manufacturing system 1 includes a coating device 2 including a slot die D and a drying device 3.
  • the coating device 2 coats the coating liquid on the first surface S1 of the base material S (coating process). That is, the method for manufacturing film F includes a coating step. Note that the first surface S1 of the base material S may be subjected to surface treatment such as corona treatment or plasma treatment before the coating step.
  • the conveyance speed of the substrate S is, for example, 10 m/min or more, preferably 15 m/min or more, more preferably 20 m/min or more, and, for example, 40 m/min or less, preferably 35 m/min. /min, more preferably 30m/min or less.
  • the coating liquid can be uniformly applied to the substrate S.
  • the transport speed of the base material S is equal to or higher than the above lower limit value, the production efficiency of the film F can be improved.
  • the drying device 3 dries the coating liquid applied to the substrate S (drying step). That is, the method for manufacturing film F includes a drying step. By drying the coating liquid, a coating C is formed on the base material S, and the above-described film F is obtained. Note that the coating C may be subjected to an ultraviolet curing treatment or a thermosetting treatment, if necessary.
  • the viscosity of the coating liquid is, for example, 100 mPa ⁇ s or less, preferably 50 mPa ⁇ s or less, more preferably 10 mPa ⁇ s or less, for example, 1 mPa ⁇ s or more. When the viscosity of the coating liquid is below the above upper limit, the coating liquid can be uniformly applied to the substrate S.
  • the surface tension of the coating liquid is, for example, 30 mN/m or more, preferably 35 mN/m or more, and, for example, 60 mN/m or less, preferably 55 mN/m or less.
  • the solid content concentration of the coating liquid is adjusted so that the viscosity of the coating liquid is below the above upper limit.
  • the solid content concentration of the coating liquid is, for example, 10% by mass or more, preferably 20% by mass or more, more preferably 30% by mass or more, more preferably 40% by mass or more, and, for example, 50% by mass or less. , preferably 45% by mass or less.
  • the coating liquid contains a resin component and a solvent.
  • the coating liquid contains the above-mentioned particles and additives, if necessary.
  • the resin component may be the resin described above or a precursor of the resin described above.
  • the coating liquid contains a polyfunctional oligomer, a polyfunctional monomer, a hydroxyl monomer, a photopolymerization initiator, the above particles, a surface tension modifier, and a thickener.
  • the polyfunctional oligomer, polyfunctional monomer, and hydroxyl monomer are resin components (resin precursors), and the photopolymerization initiator, surface tension adjuster, and thickener are additives.
  • a polyfunctional oligomer has multiple ethylenically unsaturated groups.
  • the ethylenically unsaturated group include an acrylic group, a methacryl group, and a vinyl group.
  • the weight average molecular weight of the polyfunctional oligomer is, for example, 300 or more, preferably 400 or more, and, for example, 5000 or less, preferably 3000 or less.
  • the functional group equivalent of the polyfunctional oligomer is, for example, 1 or more, preferably 2 or more, and is, for example, 6 or less, preferably 5 or less.
  • polyfunctional oligomers examples include urethane acrylate and erythritol acrylate.
  • the proportion of the polyfunctional oligomer in the coating liquid is, for example, 20% by mass or more, preferably 30% by mass or more, and, for example, 70% by mass or less, preferably 50% by mass or less.
  • the polyfunctional monomer has multiple ethylenically unsaturated groups.
  • the ethylenically unsaturated group include an acrylic group, a methacryl group, and a vinyl group.
  • polyfunctional monomer examples include a condensate of pentaerythritol and acrylic acid.
  • the proportion of the polyfunctional monomer in the coating liquid is, for example, 20% by mass or more, preferably 30% by mass or more, and, for example, 70% by mass or less, preferably 50% by mass or less.
  • the hydroxyl monomer has one ethylenically unsaturated group and one hydroxyl group.
  • examples of the hydroxyl monomer include 4-hydroxybutyl acrylate and 2-hydroxyethyl acrylate.
  • the photopolymerization initiator radically polymerizes polyfunctional oligomers, polyfunctional monomers, and hydroxyl monomers by UV irradiation.
  • Examples of the photopolymerization initiator include benzophenone photopolymerization initiators, phosphine oxide photopolymerization initiators, oxime ester photopolymerization initiators, and cationic photopolymerization initiators.
  • the surface tension adjuster adjusts the surface tension of the coating liquid.
  • the surface tension adjusting agent include cationic surfactants, anionic surfactants, nonionic surfactants, silicone leveling agents, and fluorine leveling agents.
  • a thickener adjusts the viscosity of the coating liquid.
  • thickeners include synthetic inorganic polymers, synthetic organic polymers, and natural organic polymers.
  • the slot die D includes a first block 11, a second block 12, and a shim 13.
  • the slot die D has a slot 10 between a first block 11 and a second block 12. The coating liquid is discharged from the slot 10.
  • the first block 11 is arranged upstream of the second block 12 in the transport direction of the base material S.
  • the first block 11 is arranged below the second block 12.
  • the first block 11 extends in the width direction of the base material S.
  • the first block 11 has an upstream end E1 and a downstream end E2 in the coating liquid discharge direction.
  • the first block 11 has a manifold 111, a flow path 112, a slot surface 113, and an inclined surface 114.
  • the manifold 111 is arranged between the upstream end E1 and the downstream end E2 in the coating liquid discharge direction. Manifold 111 extends in the width direction. The manifold 111 is open toward the second block 12.
  • the flow path 112 is arranged at the center of the first block 11 in the width direction. Flow path 112 communicates with manifold 111 . The coating liquid passes through the flow path 112 and enters the manifold 111 .
  • the slot surface 113 is the inner surface on the upstream side of the slot 10 in the conveying direction of the base material S.
  • the slot surface 113 faces the second block 12.
  • the slot surface 113 extends from the manifold 111 to the downstream end E2 in the coating liquid discharge direction.
  • the slot surface 113 also extends in the width direction.
  • Slot surface 113 is a flat surface.
  • the inclined surface 114 is the outer surface of the first block 11 on the upstream side in the conveying direction of the base material S.
  • the inclined surface 114 is inclined with respect to the coating liquid discharge direction. Specifically, the slope 114 slopes away from the second block 12 from the downstream end E2 of the first block 11 toward the upstream end E1.
  • the obtuse angle ⁇ 1 between the coating liquid discharge direction and the inclined surface 114 is, for example, 110° or more, preferably 140° or more, and is, for example, 170° or less, preferably 160° or less.
  • the obtuse angle ⁇ 1 is equal to or greater than the above lower limit value, it is possible to suppress excessive accumulation of the coating liquid on the upstream side of the protruding portion 122 in the conveyance direction of the substrate S.
  • the protrusion 122 will be explained later.
  • the obtuse angle ⁇ 1 is less than or equal to the above upper limit value, it is possible to suppress the amount of the coating liquid that accumulates on the upstream side of the protruding portion 122 in the transport direction of the substrate S from becoming excessively small.
  • the second block 12 is arranged downstream of the first block 11 in the conveyance direction of the base material S.
  • the second block 12 is arranged above the first block 11.
  • the second block 12 extends in the width direction of the base material S.
  • the second block 12 has an upstream end E11 and a downstream end E12 in the coating liquid discharge direction.
  • the second block 12 has a main body portion 121 and a protrusion portion 122.
  • the main body portion 121 is the entire second block 12 excluding the protruding portion 122.
  • the main body portion 121 has a slot surface 1211, an inclined surface 1212, and an end surface 1213.
  • the slot surface 1211 is the downstream inner surface of the slot 10 in the conveyance direction of the base material S.
  • the slot surface 1211 faces the first block 11 .
  • slot surface 113 faces manifold 111 and slot surface 113.
  • the slot surface 1211 extends in the coating liquid discharge direction.
  • Slot surface 1211 extends parallel to slot surface 113. Note that the slot surface 1211 also extends in the width direction.
  • Slot surface 1211 is a flat surface.
  • the inclined surface 1212 is the outer surface of the second block 12 on the downstream side in the conveyance direction of the base material S.
  • the inclined surface 1212 is inclined with respect to the coating liquid discharge direction. Specifically, the slope 1212 slopes away from the first block 11 from the downstream end E12 of the second block 12 toward the upstream end E11.
  • the obtuse angle ⁇ 2 between the coating liquid discharge direction and the inclined surface 1212 is, for example, 110° or more, preferably 140° or more, and is, for example, 170° or less, preferably 160° or less.
  • the obtuse angle ⁇ 2 is greater than or equal to the above lower limit value, it is possible to prevent the coating liquid from accumulating excessively on the upstream side of the protruding portion 122 in the conveyance direction of the substrate S.
  • the obtuse angle ⁇ 2 is less than or equal to the above upper limit value, it is possible to suppress the amount of the coating liquid that accumulates on the upstream side of the protruding portion 122 in the conveyance direction of the substrate S from becoming excessively small.
  • the end surface 1213 is the downstream end surface of the main body portion 121 in the coating liquid discharge direction.
  • the end surface 1213 is arranged at the downstream end E12 of the second block.
  • End surface 1213 is perpendicular to slot surface 1211.
  • the end surface 1213 extends in the conveyance direction of the base material S.
  • the protruding portion 122 protrudes from the end surface 1213 toward the downstream side in the discharge direction. In other words, the protrusion 122 protrudes toward the base material S.
  • the amount of protrusion of the protruding portion 122 is, for example, 15 ⁇ m or less, preferably 10 ⁇ m or less, preferably 5 ⁇ m or less, and, for example, 1 ⁇ m or more.
  • the coating liquid can be stored upstream of the protruding portion 122 in the conveyance direction of the substrate S, and even if the conveyance speed of the substrate S increases, the coating solution can be maintained. The solution can be uniformly applied to the base material S.
  • the amount of protrusion of the protruding portion 122 is, for example, 20% or less, preferably 10% or less, and, for example, 1% or more with respect to the distance between the end surface 1213 and the base material S in the discharge direction.
  • the ratio of the amount of protrusion of the protrusion 122 to the distance between the end face 1213 and the base material S in the discharge direction is equal to or less than the above upper limit value, it is possible to suppress the protrusion 122 from touching the base material S.
  • the ratio of the protrusion amount of the protrusion 122 to the distance between the end face 1213 and the base material S in the discharge direction is equal to or greater than the lower limit value, the coating liquid is stored upstream of the protrusion 122 in the conveyance direction of the base material S. Therefore, even if the conveyance speed of the substrate S increases, the coating liquid can be uniformly applied to the substrate S.
  • the shim 13 is arranged between the first block 11 and the second block 12.
  • the shim 13 adjusts the distance between the slot surface 113 of the first block 11 and the slot surface 1211 of the second block 12. In other words, the shim 13 adjusts the inner dimension of the slot 10 in the conveyance direction of the base material S.
  • the thickness of the shim 13 is 20 ⁇ m or more, preferably 30 ⁇ m or more, more preferably 60 ⁇ m or more, and, for example, 100 ⁇ m or less, preferably 80 ⁇ m or less.
  • the thickness of the shim 13 is greater than or equal to the above lower limit, the thickness of the central portion of the coating C in the width direction of the base material S will increase excessively relative to the thickness of the end portion of the coating C in the width direction of the base material S. can be suppressed. If the thickness of the shim 13 is below the above upper limit value, the thickness of the end portion of the coating C in the width direction of the base material S will increase excessively relative to the thickness of the center portion of the coating C in the width direction of the base material S. can be suppressed.
  • Examples of the material for the shim 13 include stainless steel and polyethylene terephthalate.
  • the elastic modulus of the shim 13 is 1500 MPa or more and 6000 MPa or less.
  • the shim 13 can be slightly deformed when the shim 13 is sandwiched between the first block 11 and the second block 12.
  • the shim 13 is brought into contact with the first block 11 so that there is no gap between the first block 11 and the shim 13, and the shim 13 is brought into contact with the first block 11 so that no gap is created between the second block 12 and the shim 13. It can be brought into contact with the second block 12.
  • the coating liquid from leaking between the first block 11 and the shim 13 or between the second block 12 and the shim 13.
  • the elastic modulus of the shim 13 is below the upper limit value, even if the shim 13 is slightly bent during storage, or if the shim 13 has minute scratches, the first block 11 and the first block 11 A shim 13 can be sandwiched between the first block 11 and the second block 12 so as to follow the second block 12.
  • the modulus of elasticity of the shim 13 is equal to or greater than the above lower limit value, when the shim 13 is sandwiched between the first block 11 and the second block 12, excessive deformation of the shim 13 can be suppressed.
  • the shim 13 is preferably made of polyethylene terephthalate.
  • the elastic modulus of the shim 13 can be set within the above range.
  • the shim 13 can be easily processed.
  • the difference between the thickness of the center part of the coating C and the thickness of the edge part of the coating C is, for example, 2.5 ⁇ m or less, preferably 2.0 ⁇ m or less. , more preferably 1.5 ⁇ m or less, more preferably 1.0 ⁇ m or less, and even more preferably 0.5 ⁇ m or less.
  • the lower limit of the difference between the thickness of the central portion of the coating C and the thickness of the end portions of the coating C is not limited.
  • the difference between the thickness of the central portion of the coating C and the thickness of the end portions of the coating C may be 0 ⁇ m.
  • the thickness of the shim 13 of the slot die D is adjusted to be 30 ⁇ m or more and 100 ⁇ m or less.
  • a wide (width of 1600 mm or more) and thin (thickness of 30 ⁇ m or less) coating C can be uniformly formed on the base material S.
  • the viscosity of the coating liquid is 100 mPa or less
  • the difference between the thickness of the center portion of the coating C and the thickness of the edge portion of the coating C in the width direction of the substrate S is 2.5 ⁇ m or less. Can be done.
  • coating liquid The following materials were blended with toluene to obtain a coating liquid.
  • the solid content of the coating liquid was 42% by mass, and the viscosity of the coating liquid was 6 mPa ⁇ s.
  • Multifunctional oligomer NK oligomer UA-53H-80BK (manufactured by Shin Nakamura Chemical Co., Ltd.) 50 parts by mass Polyfunctional monomer: Viscoat #300 (manufactured by Osaka Organic Chemical Industry Co., Ltd.) 50 parts by mass Hydroxyl group monomer: 4-Hydroxybutyl acrylate (manufactured by Osaka Organic Chemical Industry Co., Ltd.) 20 parts by mass Photopolymerization initiator: Omnirad907 (manufactured by IGM Resin) 5 parts by mass Surface tension regulator GRANDIC PC4100 (manufactured by DIC) 1 part by mass Silica particles Techpolymer SSX-103DXE (manufactured by Sekisui Plastics Co., Ltd.) 0.5 parts by mass Thickener Smectone-SAN Solution (manufactured by Nitto Denko Corporation) 1.5 parts by mass 2.
  • Polyfunctional monomer Viscoat #300 (manufactured
  • the coating liquid was applied to the base material (material: acrylic film) using the slot die (block height: 76 mm) shown in Figure 3 under the conditions shown in Tables 1 to 3, and the coating solution was heated at 95°C. , and dried for 1 minute to obtain films of each Example and each Comparative Example having an acrylic urethane resin coating on the base material.
  • the thickness of the resulting film was measured at five locations in the width direction of the substrate (center, one end, the other end, between one end and the center, between the other end and the center), and the maximum The difference between the thickness and the minimum thickness was calculated. The results are shown in Table 1.
  • the method for producing a film of the present invention is used for producing a film.

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  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
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Abstract

Un procédé de production d'un film, dans lequel une filière à fente est utilisée pour former, sur un substrat, un film de revêtement ayant une largeur de 1 600 mm ou plus et une épaisseur de 30 µm ou moins. Le procédé comprend une étape d'application dans laquelle un fluide de revêtement est appliqué sur le substrat et une étape de séchage dans laquelle le fluide de revêtement appliqué sur le substrat est séché, la cale de la filière à fente ayant une épaisseur de 20 à 100 µm.
PCT/JP2023/019553 2022-06-01 2023-05-25 Méthode de production de film WO2023234177A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022-089956 2022-06-01
JP2022089956A JP2023177169A (ja) 2022-06-01 2022-06-01 フィルムの製造方法

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WO2023234177A1 true WO2023234177A1 (fr) 2023-12-07

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JP2011194291A (ja) * 2010-03-18 2011-10-06 Johoku Seikosho:Kk コーティングダイ
JP2012115788A (ja) * 2010-12-02 2012-06-21 Nitto Denko Corp 塗布液の塗布方法及び塗布装置、並びに、塗布物の製造方法
JP2013212492A (ja) * 2012-03-07 2013-10-17 Nitto Denko Corp シム部材、ダイコーター及び塗布膜の製造方法
JP2015073928A (ja) * 2013-10-08 2015-04-20 株式会社カネカ 局所ベントを有するスロットダイを用いた塗布膜の製造方法および局所ベントを有するスロットダイ
JP2016073952A (ja) * 2014-10-08 2016-05-12 株式会社ヒラノテクシード ダイ
JP2018013569A (ja) * 2016-07-20 2018-01-25 日東電工株式会社 光学フィルムの製造方法および光学フィルムの製造装置
WO2021157664A1 (fr) * 2020-02-05 2021-08-12 日東電工株式会社 Film de revêtement dur antireflet, procédé de fabrication de film de revêtement dur antireflet, élément optique et dispositif d'affichage d'image

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JP2003275652A (ja) * 2002-03-22 2003-09-30 Fuji Photo Film Co Ltd 塗布方法及び装置
JP2009018227A (ja) * 2007-07-10 2009-01-29 Nitto Denko Corp ダイコーター及びダイコーター調整方法、並びに光学フィルムの製造方法
JP2011194291A (ja) * 2010-03-18 2011-10-06 Johoku Seikosho:Kk コーティングダイ
JP2012115788A (ja) * 2010-12-02 2012-06-21 Nitto Denko Corp 塗布液の塗布方法及び塗布装置、並びに、塗布物の製造方法
JP2013212492A (ja) * 2012-03-07 2013-10-17 Nitto Denko Corp シム部材、ダイコーター及び塗布膜の製造方法
JP2015073928A (ja) * 2013-10-08 2015-04-20 株式会社カネカ 局所ベントを有するスロットダイを用いた塗布膜の製造方法および局所ベントを有するスロットダイ
JP2016073952A (ja) * 2014-10-08 2016-05-12 株式会社ヒラノテクシード ダイ
JP2018013569A (ja) * 2016-07-20 2018-01-25 日東電工株式会社 光学フィルムの製造方法および光学フィルムの製造装置
WO2021157664A1 (fr) * 2020-02-05 2021-08-12 日東電工株式会社 Film de revêtement dur antireflet, procédé de fabrication de film de revêtement dur antireflet, élément optique et dispositif d'affichage d'image

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