WO2022007474A1 - 阵列基板、显示面板及电子设备 - Google Patents

阵列基板、显示面板及电子设备 Download PDF

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Publication number
WO2022007474A1
WO2022007474A1 PCT/CN2021/089702 CN2021089702W WO2022007474A1 WO 2022007474 A1 WO2022007474 A1 WO 2022007474A1 CN 2021089702 W CN2021089702 W CN 2021089702W WO 2022007474 A1 WO2022007474 A1 WO 2022007474A1
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WIPO (PCT)
Prior art keywords
conductive traces
array substrate
substrate according
display area
transparent display
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PCT/CN2021/089702
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English (en)
French (fr)
Inventor
陈昊
康梦华
丁立薇
刘如胜
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云谷（固安）科技有限公司
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Publication of WO2022007474A1 publication Critical patent/WO2022007474A1/zh
Priority to US17/948,615 priority Critical patent/US20230019842A1/en

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/33—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being semiconductor devices, e.g. diodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/131—Interconnections, e.g. wiring lines or terminals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/179—Interconnections, e.g. wiring lines or terminals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/60—OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
    • H10K59/65—OLEDs integrated with inorganic image sensors

Definitions

  • the present invention relates to the field of display technology, and in particular, to an array substrate, a display panel and an electronic device.
  • a photosensitive element such as a camera is usually arranged below the display panel to form an under-screen camera.
  • the display panel usually includes a transparent display area and a non-transparent display area surrounding the transparent display area.
  • the photosensitive elements such as the under-screen camera correspond to the positions of the transparent display area.
  • a plurality of film layers, and conductive traces located between any adjacent film layers, external light passes through the gaps between the adjacent conductive traces and enters the photosensitive element located under the display panel to acquire images.
  • embodiments of the present invention provide an array substrate, a display panel, and an electronic device, which are used to improve the diffraction phenomenon when light passes through the transparent display area, and improve the image quality obtained by the photosensitive element.
  • a first aspect of the embodiments of the present invention provides an array substrate, which includes: a transparent display area and a non-transparent display area adjacent to the transparent display area; the transparent display area includes a plurality of film layers stacked in sequence and a conductive trace located between any two adjacent film layers; the shape of the conductive trace is arranged in a preset function curve.
  • a second aspect of the embodiments of the present invention provides a display panel, which includes: the array substrate provided in the first aspect, a light-emitting layer disposed on the array substrate, and an encapsulation layer covering the light-emitting layer.
  • a third aspect of the embodiments of the present invention provides an electronic device, which includes: the display panel provided in the second aspect and at least one photosensitive element; the photosensitive element is provided on a side of the display panel away from the light-emitting surface, and the photosensitive element is The photosensitive element corresponds to the transparent display area.
  • the shape of the conductive traces between any two adjacent film layers in the transparent display area is arranged in a preset function curve, in this way, the conductive traces between adjacent conductive traces can be
  • the shapes of the gaps are irregularly distributed or irregularly distributed, which destroys the structural periodicity of the gaps between adjacent conductive traces, thereby improving the diffraction phenomenon of the display panel, thereby improving the image quality obtained by the photosensitive element.
  • FIG. 1 is a schematic structural diagram of an array substrate provided by an embodiment of the present invention.
  • FIG. 2 is a schematic top view of a first shape of conductive traces in an array substrate provided by an embodiment of the present invention
  • FIG. 3 is a schematic top view of a second shape of conductive traces in an array substrate according to an embodiment of the present invention.
  • FIG. 4 is a schematic top view of a third shape of conductive traces in an array substrate according to an embodiment of the present invention.
  • FIG. 5 is a schematic top view of a fourth shape of conductive traces in an array substrate provided by an embodiment of the present invention.
  • FIG. 6 is a schematic top view of a fifth shape of conductive traces in an array substrate provided by an embodiment of the present invention.
  • FIG. 8 is a schematic top view of a seventh shape of conductive traces in an array substrate according to an embodiment of the present invention.
  • FIG. 9 is a schematic top view of an eighth shape of conductive traces in an array substrate according to an embodiment of the present invention.
  • FIG. 10 is a schematic top view of a ninth shape of conductive traces in an array substrate according to an embodiment of the present invention.
  • FIG. 11 is a schematic top view of a tenth shape of conductive traces in an array substrate according to an embodiment of the present invention.
  • FIG. 12 is a schematic top view of an eleventh shape of conductive traces in an array substrate according to an embodiment of the present invention.
  • FIG. 13 is a schematic top view of a twelfth shape of a conductive trace in an array substrate according to an embodiment of the present invention.
  • FIG. 14 is a schematic top view of a thirteenth shape of a conductive trace in an array substrate according to an embodiment of the present invention.
  • 15 is a schematic diagram of a simulation of zero-order transmission diffraction efficiency of conductive traces in an array substrate according to an embodiment of the present invention.
  • the conductive traces between any adjacent film layers in the transparent display area are usually straight and parallel and spaced apart, and the conductive traces between adjacent conductive traces
  • the shape of the formed gap is a regular shape such as a rectangle, and is regularly arranged.
  • the shape of the conductive traces between any two adjacent film layers in the transparent display area is arranged in a preset function curve, so that the adjacent conductive traces are arranged in a shape of a preset function curve.
  • the shape of the gaps between them is irregularly distributed or irregularly distributed, which destroys the structural periodicity of the gaps between adjacent conductive traces, thereby improving the diffraction phenomenon caused by light passing through the transparent display area, thereby improving the photosensitive element. Acquired image quality without defects such as image distortion.
  • the electronic device provided by the embodiment of the present invention may be an electronic device such as a mobile phone, a tablet computer, a wearable device, etc., and a mobile phone is used as an example for description below.
  • the electronic device generally includes a display panel and a photosensitive element disposed below the display panel, wherein the photosensitive element may be a camera, an image sensor, or a photodiode, etc.
  • the area corresponding to the photosensitive element is Transparent display area, other display areas are non-transparent display areas.
  • the non-transparent display area can be arranged around the transparent display area, or the transparent display area can be arranged close to the border. Only a part of the non-transparent display area surrounds the transparent display area.
  • the photosensitive element located under the display panel can be accessed through the transparent display area, so as to achieve the purpose of acquiring an image by the photosensitive element.
  • the display panel may be an organic light-emitting diode (Organic Light-Emitting Diode, OLED for short) display panel, a liquid crystal panel, or a micro flat display panel (Micro-OLED or Micro-LED), or the like.
  • OLED Organic Light-Emitting Diode
  • LCD liquid crystal panel
  • Micro-OLED Micro-LED
  • the display panel generally includes an array substrate, a light-emitting layer disposed on the array substrate, and an encapsulation layer covering the light-emitting layer; the area of the light-emitting layer corresponding to the transparent display area is a transparent area.
  • the conductive traces 20 are arranged in a preset function curve between any two adjacent film layers 10 , that is to say, the conductive traces 20 are extended according to the preset function curve.
  • shape, and the size of the spacing between adjacent conductive traces 20, etc., the shape of the gap formed between adjacent conductive traces 20 is an irregular shape, which destroys the structural periodicity between adjacent conductive traces. Thereby, the diffraction phenomenon generated when the external light passes through the transparent display area is improved, thereby improving the image quality obtained by the photosensitive element, and avoiding defects such as image distortion.
  • the material of the conductive traces 20 may be made of conductive materials such as molybdenum, titanium, aluminum, copper, silver, indium tin oxide or transparent conductive polymer, and the scope is not limited.
  • the array substrate includes a base substrate, a thin film transistor (Thin Film Transistor, TFT for short) array layer disposed on the base substrate, a flat layer disposed on the TFT array layer, and the like.
  • TFT Thin Film Transistor
  • the base substrate can be a rigid substrate, such as a glass substrate; it can also be a flexible substrate, and its material can be polyimide, polystyrene, polyethylene terephthalate, parylene, polyethylene Ethersulfone or polyethylene naphthalate.
  • the base substrate is mainly used to support the devices arranged thereon.
  • the TFT array layer generally includes a gate insulating layer, a gate electrode arranged on the gate insulating layer, an interlayer insulating layer arranged on the gate insulating layer and the gate electrode, and a source/drain electrode arranged on the interlayer insulating layer; A planarization layer disposed on the interlayer insulating layer and the source/drain electrodes.
  • the grid lines of the gate can be arranged in a preset function curve, so that the shapes of the gaps between adjacent grid lines are irregularly distributed or irregularly distributed, which destroys the structural period of the gaps between adjacent grid lines. Therefore, when the external light passes through the gap between the adjacent grid lines, diffraction is not easy to occur, which can improve the diffraction phenomenon when the light passes through the transparent display area, thereby improving the image quality obtained by the photosensitive element, and avoiding the occurrence of such as Defects such as image distortion.
  • the source/drain traces arranged between the interlayer insulating layer and the planarization layer can also be arranged in a preset function curve, so that the shape of the gap between adjacent source or drain traces is irregular.
  • the distribution or irregular distribution destroys the structural periodicity of the gap between adjacent source or drain traces. Therefore, it is not easy for external light to pass through the gap between adjacent source or drain traces. Diffraction occurs, thereby improving the diffraction phenomenon when light passes through the transparent display area, thereby improving the image quality obtained by the photosensitive element and avoiding defects such as image distortion.
  • the gate lines of the gate and the source/drain lines disposed between the interlayer insulating layer and the planarization layer are all arranged in a preset function curve, so as to improve the diffraction phenomenon when light passes through the transparent display area , thereby improving the image quality obtained by the photosensitive element and avoiding defects such as image distortion.
  • the conductive traces in other film layers in the array substrate can also be arranged in a preset function curve to improve the diffraction phenomenon when light passes through the transparent display area, thereby improving the image quality obtained by the photosensitive element. Avoid defects such as image distortion. In this embodiment, they are not listed one by one.
  • the conductive traces 20 between any two adjacent film layers 10 may include a plurality of repeating units.
  • the repeating unit includes a plurality of segments of sinusoidal function curves connected in sequence, and the sinusoidal function curves are periodically arranged in the repeating unit. That is to say, the conductive traces 20 are periodically connected by a plurality of sinusoidal function curves, so that diffraction is not easy to occur when the external light passes through the irregular gaps between the adjacent conductive traces 20 arranged in the sinusoidal function curve. Therefore, the diffraction phenomenon generated when the light passes through the transparent display area can be improved, thereby improving the image quality obtained by the photosensitive element and avoiding defects such as image distortion.
  • the repeating unit may include a plurality of sinusoidal function curves and a plurality of straight lines connected in sequence, and each sinusoidal function curve and each straight line are arranged alternately at intervals, so that it is not easy for light to pass through the irregular gaps between adjacent conductive traces 20. Diffraction, thereby improving the image quality acquired by the photosensitive element.
  • the repeating unit may also include multiple cosine function curves that are connected in sequence, and the cosine function curves are periodically arranged in the repeating unit, so that it is not easy for light to pass through the irregular gaps between adjacent conductive traces 20. Diffraction, thereby improving the image quality acquired by the photosensitive element.
  • the repeating unit includes multiple cosine function curves connected in sequence, and any adjacent two cosine function curves have the same direction; or, as shown in FIG. 3 , any adjacent two cosine function curves are in the same direction.
  • the directions of the curves are opposite, so that the light is less likely to be diffracted when passing through the irregular gaps between the adjacent conductive traces 20, thereby improving the image quality obtained by the photosensitive element.
  • the directions of two adjacent cosine function curves are the same or opposite, and any combination is made to make the light pass through the adjacent conductive traces 20 . Diffraction is not easy to occur when there are irregular gaps between them, thereby improving the image quality obtained by the photosensitive element.
  • the repeating unit includes a plurality of cosine function curves and a plurality of straight lines, and each cosine function curve and each straight line are alternately arranged at intervals, so that diffraction is not easy to occur when the light passes through the irregular gaps between adjacent conductive traces 20, thereby improving the performance. Image quality acquired by the sensor.
  • the repeating unit includes multi-segment cosine function curves and multi-segment straight lines, wherein the multi-segment cosine function curves are in the same direction, and each cosine function curve and each straight line are alternately arranged at intervals, so that light passes through adjacent conductive lines.
  • the irregular gap between the lines 20 is less likely to cause diffraction, thereby improving the image quality obtained by the photosensitive element.
  • the repeating unit includes a multi-segment cosine function curve and a multi-segment straight line, wherein any two adjacent cosine function curves are in opposite directions, and a straight line is sandwiched between any two adjacent cosine function curves in opposite directions. , so that when the light passes through the irregular gaps between the adjacent conductive traces 20 , diffraction is less likely to occur, thereby improving the image quality obtained by the photosensitive element.
  • the repeating unit includes a multi-segment cosine function curve and a multi-segment straight line, wherein a single cosine function curve is used as a unit, which is alternately arranged with each straight line, and two straight lines are arranged alternately.
  • the cosine function curves of the two units at the ends are in the same or opposite directions, so that the light is less likely to be diffracted when passing through the irregular gaps between the adjacent conductive traces 20, thereby improving the image quality obtained by the photosensitive element.
  • the repeating unit includes multiple sine function curves and multiple cosine function curves, and each sine function curve and each cosine function curve are arranged alternately at intervals.
  • the repeating unit includes multiple sine function curves, multiple cosine function curves, and multiple straight lines, and the sine function curves, the cosine function curves, and the straight lines are alternately arranged at intervals.
  • the conductive traces 20 in the transparent display area include a plurality of first conductive traces 21 and a plurality of second conductive traces 22 arranged horizontally and vertically.
  • the plurality of first conductive traces 21 may extend in the longitudinal direction, and the plurality of second conductive traces may extend in the lateral direction, or the plurality of first conductive traces 21 may extend in the lateral direction, and the plurality of second conductive traces may extend in the longitudinal direction.
  • the first conductive traces 21 and the second conductive traces 22 may be approximately vertical, that is, the first conductive traces and the second conductive traces that cross horizontally and vertically may be vertical, or may be skewed Yes, this embodiment does not limit it.
  • the first conductive traces 21 are arranged in a first preset function curve, and the second conductive traces 22 are arranged in a second predetermined function curve.
  • the first conductive traces 21 are arranged in a sinusoidal function curve, and the second conductive traces
  • the conductive traces 22 are arranged in a cosine function curve; alternatively, the first conductive traces 21 are arranged in a sine function curve, and the second conductive traces 22 are arranged in a straight line; alternatively, the first conductive traces 21 are in a cosine function curve
  • the second conductive traces 22 are arranged in a straight line; alternatively, the first conductive traces 21 and the second conductive traces 22 are both arranged in a cosine function curve, or in a sine function curve, etc., so that the light passes through
  • the gaps between the adjacent conductive traces 20 are irregularly shaped or distributed irregularly, so as to improve the diffraction phenomenon when light passes through the gaps between the adjacent conductive traces 20,
  • the light is less likely to be diffracted when passing through the gaps between the adjacent conductive traces 20, and the acquisition of the photosensitive element can be improved. image quality.
  • the period, amplitude, and direction of the function curve in the conductive traces and the size of the gap between adjacent conductive traces can be changed.
  • the structure of the gap between the traces is periodic, thereby improving the diffraction phenomenon of the display panel and improving the image quality obtained by the photosensitive element.
  • the conductive trace includes a function curve and a straight line, and by changing the period and amplitude of the function curve, the magnitude and direction, and setting the function curve and the straight line at intervals, as shown in Figure 12, Figure 13 and Figure 14, the function curve is: Cosine function curve, the period and amplitude of adjacent cosine function curves are different, the direction can be the same or opposite, and they are set at intervals from the straight line, so that the shape of the gap between adjacent conductive traces is irregularly distributed or irregularly distributed.
  • the structural periodicity of the gap between adjacent conductive traces is improved, thereby improving the diffraction phenomenon of the display panel and improving the image quality obtained by the photosensitive element.
  • the function curve in the conductive traces can also be other function curves such as sinusoidal function curves.
  • sinusoidal function curves By changing the amplitude, period, direction of the function curve and the size of the gap between adjacent conductive traces, as long as the The shapes of the gaps between adjacent conductive traces are irregularly distributed or irregularly distributed, and it is sufficient to destroy the structural periodicity of the gaps between adjacent conductive traces, which is not specifically limited in this embodiment.
  • the conductive traces in the non-transparent display area can also be arranged in a preset function curve, which facilitates the consistency of the processing technology of the conductive traces in the non-transparent display area and the transparent display area, thereby improving the performance of the conductive traces. processing efficiency.
  • FIG. 15 is a schematic diagram of a simulation result of the zero-order transmission diffraction efficiency of the conductive trace model in the array substrate provided by the embodiment of the present invention, wherein the conductive traces 20 are arranged in a cosine function curve as an example, and the The zero-order transmission diffraction efficiency of the conductive trace model arranged in a cosine function curve, the traditional conductive trace model arranged in a straight line, and the non-conductive trace model were simulated, and the simulation results were compared, as shown in the figure 15, the graph line 1 in the figure represents the zero-order transmission diffraction efficiency of the traditional conductive trace model arranged in a straight line, and the graph line 2 represents the zero-order transmission diffraction efficiency of the non-conductive trace model, The graph in the middle of graph line 1 to graph line 2 represents the zero-order transmission diffraction efficiency of the conductive trace model provided in this embodiment arranged in a cosine function curve, and the single conductive trace function curve from bottom to top The period increases in turn
  • the function curve period of a single conductive trace model is greater than or equal to 18, and when the amplitude is greater than or equal to 3, it is arranged in a cosine function curve.
  • the simulation results of the zero-order transmission diffraction efficiency of the conductive trace model no longer change significantly, and are close to the results of the non-conductive trace model. Therefore, in this embodiment, the diffraction phenomenon of the screen body can be improved by changing the arrangement shape of the conductive traces, no additional process conditions need to be added, and the implementation is convenient.
  • the light-emitting layer includes a plurality of light-emitting units arranged in an array, and a pixel definition layer for isolating each light-emitting unit. The light of the photosensitive element under the substrate passes through.
  • the encapsulation layer capped on the light-emitting layer generally includes a plurality of repeatedly stacked encapsulation units, and each encapsulation unit includes a stacked inorganic thin film and an organic thin film.
  • inorganic thin films are generally selected from transparent oxide, fluoride and silicon nitride series.
  • an anode layer is also formed on the array substrate, and the material of the anode layer is generally a material with a high work function in order to improve the hole injection efficiency, which can be gold (Au), platinum (Pt), titanium (Ti), silver (Ag) ), indium tin oxide (ITO), zinc tin oxide (IZO), or transparent conductive polymers (such as polyaniline), etc., which are not limited in this embodiment.
  • the material of the anode layer is generally a material with a high work function in order to improve the hole injection efficiency, which can be gold (Au), platinum (Pt), titanium (Ti), silver (Ag) ), indium tin oxide (ITO), zinc tin oxide (IZO), or transparent conductive polymers (such as polyaniline), etc., which are not limited in this embodiment.
  • a light-emitting layer is arranged on the anode layer, and a cathode layer is arranged on the light-emitting layer.
  • the cathode material generally adopts a material with a lower work function, so as to facilitate electron injection, in addition, it can reduce the heat generated during operation and prolong the service life of the OLED device.
  • the material of the cathode can be one of metal materials such as silver (Ag), aluminum (Al), lithium (Li), magnesium (Mg), ytterbium (Yb), calcium (Ca) or indium (In), etc. Alloys of metal materials, such as magnesium-silver alloy (Mg/Ag) and lithium-aluminum alloy (Li/Al), are not limited in this embodiment.
  • the shape of the conductive traces between any two adjacent film layers in the transparent display area is arranged in a preset function curve, in this way, the conductive traces between adjacent conductive traces can be
  • the shape of the gaps is irregularly distributed or irregularly distributed, which destroys the structural periodicity of the gaps between adjacent conductive traces, thereby improving the diffraction phenomenon caused by light passing through the transparent display area, thereby improving the light obtained by the photosensitive element.
  • Image quality avoiding defects such as image distortion.

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Abstract

本发明提供一种阵列基板、显示面板及电子设备，该阵列基板包括透明显示区和与透明显示区相邻的非透明显示区，透明显示区内包括依次层叠设置的多个膜层以及位于任意相邻两个膜层之间的导电走线，导电走线的形状呈预设函数曲线排布。

Description

阵列基板、显示面板及电子设备
本申请要求于2020年07月08日提交中国专利局、申请号为202010652527.8、申请名称为“阵列基板、显示面板及电子设备”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本发明涉及显示技术领域，尤其涉及一种阵列基板、显示面板及电子设备。
背景技术
随着电子设备的快速发展，全面屏显示已经成为手机等电子设备的发展趋势。为了实现全面屏显示，通常是将摄像头等感光元件设置在显示面板的下方，形成屏下摄像头。
采用屏下摄像头的电子设备中，显示面板通常包括透明显示区和环绕透明显示区的非透明显示区，屏下摄像头等感光元件与透明显示区的位置相对应，透明显示区内包括依次层叠设置的多个膜层，以及位于任意相邻膜层之间的导电走线，外界的光线穿过相邻导电走线之间的缝隙，进入位于显示面板下方的感光元件，从而获取图像。
然而，光线穿过相邻导电走线之间的缝隙时会发生衍射现象，导致感光元件所获取的图像质量差。
发明内容
鉴于上述问题，本发明实施例提供一种阵列基板、显示面板及电子设备，用于改善光线透过透明显示区时所产生的衍射现象，提升感光元件获取的图像质量。
为了实现上述目的，本发明实施例提供如下技术方案：
本发明实施例的第一方面提供一种阵列基板，其包括：透明显示区和与所述透明显示区相邻的非透明显示区；所述透明显示区内包括依次层叠设 置的多个膜层以及位于任意相邻两个膜层之间的导电走线；所述导电走线的形状呈预设函数曲线排布。
本发明实施例的第二方面提供一种显示面板，其包括：第一方面提供的阵列基板，设置在所述阵列基板上的发光层，以及封盖在所述发光层上的封装层。
本发明实施例的第三方面提供一种电子设备，其包括：第二方面提供的显示面板和至少一个感光元件；所述感光元件设在所述显示面板背离出光面的一侧上，且所述感光元件与所述透明显示区对应。
本发明实施例提供的阵列基板、显示面板及电子设备具有如下优点：
本发明实施例提供的阵列基板中，透明显示区内的任意相邻两个膜层之间的导电走线的形状呈预设函数曲线排布，这样，可以使相邻导电走线之间的缝隙的形状呈不规则分布或无规律分布，破坏了相邻导电走线之间的缝隙的结构周期性，从而改善显示面板的衍射现象，进而提升感光元件获取的图像质量。
除了上面所描述的本发明实施例解决的技术问题、构成技术方案的技术特征以及由这些技术方案的技术特征所带来的有益效果外，本发明实施例提供的阵列基板、显示面板及电子设备所能解决的其他技术问题、技术方案中包含的其他技术特征以及这些技术特征带来的有益效果，将在具体实施方式中作出进一步详细的说明。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作一简单地介绍，显而易见地，下面描述中的附图是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本发明实施例提供的阵列基板的结构示意图；
图2为本发明实施例提供的阵列基板中的导电走线的第一种形状的俯视示意图；
图3为本发明实施例提供的阵列基板中的导电走线的第二种形状的俯视示意图；
图4为本发明实施例提供的阵列基板中的导电走线的第三种形状的俯视示意图；
图5为本发明实施例提供的阵列基板中的导电走线的第四种形状的俯视示意图；
图6为本发明实施例提供的阵列基板中的导电走线的第五种形状的俯视示意图；
图7为本发明实施例提供的阵列基板中的导电走线的第六种形状的俯视示意图；
图8为本发明实施例提供的阵列基板中的导电走线的第七种形状的俯视示意图；
图9为本发明实施例提供的阵列基板中的导电走线的第八种形状的俯视示意图；
图10为本发明实施例提供的阵列基板中的导电走线的第九种形状的俯视示意图；
图11为本发明实施例提供的阵列基板中的导电走线的第十种形状的俯视示意图；
图12为本发明实施例提供的阵列基板中的导电走线的第十一种形状的俯视示意图；
图13为本发明实施例提供的阵列基板中的导电走线的第十二种形状的俯视示意图；
图14为本发明实施例提供的阵列基板中的导电走线的第十三种形状的俯视示意图；
图15为本发明实施例提供的阵列基板中导电走线的零级透过衍射效率的仿真示意图。
具体实施方式
光线透过透明显示区时会发生衍射现象的主要原因之一为：透明显示区内任意相邻膜层之间的导电走线通常都是呈直线且平行间隔设置，相邻导电走线之间形成缝隙的形状为矩形等规则形状，且呈规律排布，当光线透过相邻导电走线之间的缝隙时，会产生衍射现象，形成衍射条纹或者光晕，导致 感光元件所获取的图像质量差，甚至出现诸如图像失真的缺陷。
为了解决上述问题，本发明实施例提供的阵列基板中，透明显示区内的任意相邻两个膜层之间的导电走线的形状呈预设函数曲线排布，使相邻导电走线之间的缝隙的形状呈不规则分布或无规律分布，破坏了相邻导电走线之间的缝隙的结构周期性，从而改善光线在透过透明显示区时所产生的衍射现象，进而提升感光元件获取的图像质量，避免出现诸如图像失真等缺陷。
为了使本发明实施例的上述目的、特征和优点能够更加明显易懂，下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述。显然，所描述的实施例仅仅是本发明的一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有付出创造性劳动的前提下所获得的所有其它实施例，均属于本发明保护的范围。
本发明实施例提供的电子设备可以为手机、平板电脑、穿戴设备等电子设备，下面将以手机为例进行描述。
本发明实施例提供的电子设备通常包括显示面板和设置在显示面板下方的感光元件，其中，感光元件可以是摄像头、图像传感器或光电二极管等，在显示面板中，与感光元件相对应的区域为透明显示区，其他显示区域则为非透明显示区，非透明显示区可以环绕透明显示区设置，也可以是透明显示区靠近边框设置，非透明显示区只有一部分环绕透明显示区等，外界的光线可透过透明显示区进入位于显示面板下方的感光元件，以实现感光元件获取图像的目的。
其中，显示面板可以为有机发光二极管(Organic Light-Emitting Diode，简称为OLED)显示面板、液晶面板或微型平面显示面板(Micro-OLED或Micro-LED)等。下面将以显示面板为OLED显示面板为例进行描述。
显示面板通常包括阵列基板，设置在阵列基板上的发光层，以及封盖在发光层上的封装层；发光层与透明显示区相对应的区域为透明区域。
在上述显示面板中，阵列基板用于承载显示面板的其他器件，以及用于控制流入发光层的电流。如图1所示，在阵列基板与透明显示区对应的区域，阵列基板包括依次层叠设置的多个膜层10以及位于任意相邻两个膜层10之间的导电走线20，且导电走线20的形状呈预设函数曲线排布。其中，导电 走线20设置有多个，多个导电走线20可以位于同一膜层中，也可以位于不同的膜层中。需要说明的是，透明显示区中的多个膜层10的材质可为通常的阵列膜层所使用的材料，或者也可以是高透明的材料，对此，本实施例不做限制。
导电走线20在任意相邻的两个膜层10之间呈预设函数曲线排布，也就是说，导电走线20是按照预设函数曲线进行延伸的，通过调整各导电走线20的形状，以及相邻导电走线20之间的间距大小等，使相邻的导电走线20之间形成的缝隙的形状为非规则形状，破坏了相邻导电走线之间的结构周期性，从而改善外界光线透过透明显示区时所产生的衍射现象，进而提升感光元件获取的图像质量，避免出现诸如图像失真等缺陷。
其中，导电走线20的材质可以是钼、钛、铝、铜、银、氧化铟锡或者透明导电聚合物等导电材质制成，范围不作限定。
在一些实施例中，阵列基板包括衬底基板、设置在衬底基板上的薄膜晶体管(Thin Film Transistor，简称为TFT)阵列层以及设置在TFT阵列层上的平坦层等。
其中，衬底基板可以为硬质基板，如玻璃基板；也可以为柔性基板，其材质可以为聚酰亚胺、聚苯乙烯、聚对苯二甲酸乙二醇酯、聚对二甲苯、聚醚砜或聚萘二甲酸乙二醇酯。衬底基板主要用于支撑设置在其上的器件。
TFT阵列层通常包括栅极绝缘层、设置在栅极绝缘层上的栅极、设置在栅极绝缘层和栅极上的层间绝缘层、设置在层间绝缘层上的源/漏极；设置在层间绝缘层和源/漏极上的平坦化层。
其中，栅极的栅线可以呈预设函数曲线排布，这样，相邻栅线之间的缝隙的形状呈不规则分布或无规律分布，破坏了相邻栅线之间的缝隙的结构周期性，因此，当外界光线穿过相邻栅线之间的缝隙时不易发生衍射，从而能够改善光线透过透明显示区时所产生的衍射现象，进而提升感光元件获取的图像质量，避免出现诸如图像失真等缺陷。
设置在层间绝缘层和平坦化层之间源/漏极的走线也可以呈预设函数曲线排布，这样，相邻的源极或者漏极走线之间的缝隙的形状呈不规则分布或无规律分布，破坏了相邻的源极或者漏极走线之间的缝隙的结构周期性，因此，当外界光线穿过相邻的源极或者漏极走线之间的缝隙时不易发生衍射， 从而能够改善光线透过透明显示区时所产生的衍射现象，进而提升感光元件获取的图像质量，避免出现诸如图像失真等缺陷。
或者，栅极的栅线以及设置在层间绝缘层和平坦化层之间的源/漏极走线均呈预设函数曲线排布，以改善光线透过透明显示区时所产生的衍射现象，进而提升感光元件获取的图像质量，避免出现诸如图像失真等缺陷。
需要说明的是，阵列基板内其他膜层中的导电走线也可以呈预设函数曲线排布，以改善光线透过透明显示区时所产生的衍射现象，进而提升感光元件获取的图像质量，避免出现诸如图像失真等缺陷。在本实施例中，不再一一进行列举。
在上述阵列基板中，任意相邻两层膜层10之间的导电走线20可以包括多个重复单元。
其中，重复单元可以包括三角函数曲线、直线、或者其他函数曲线等。其中，三角函数曲线包括余弦函数曲线、正弦函数曲线等等。
在一个实施例中，重复单元包括依次连接的多段正弦函数曲线，且正弦函数曲线在重复单元中呈周期性排布。也就是说，导电走线20是由多段正弦函数曲线呈周期性依次连接的，使外界光线穿过呈正弦函数曲线排布的相邻导电走线20之间的不规则缝隙时不易发生衍射，从而能够改善光线透过透明显示区时所产生的衍射现象，进而提升感光元件获取的图像质量，避免出现诸如图像失真等缺陷。
可选的，重复单元可以包括依次连接的多段正弦函数曲线和多段直线，且各正弦函数曲线和各直线交替间隔设置，使光线穿过相邻导电走线20之间的不规则间隙时不易发生衍射，进而提升感光元件获取的图像质量。
可选的，重复单元还可以包括依次连接的多段余弦函数曲线，且余弦函数曲线在重复单元中呈周期性排布，使光线穿过相邻导电走线20之间的不规则间隙时不易发生衍射，进而提升感光元件获取的图像质量。
示例性的，如图2所示，重复单元包括依次连接的多段余弦函数曲线，且任意相邻的两段余弦函数曲线方向相同；或者，如图3所示，任意相邻的两段余弦函数曲线方向相反，使光线穿过相邻导电走线20之间的不规则缝隙时不易发生衍射，进而提升感光元件获取的图像质量。
需要说明的是，图2中，一段余弦函数曲线中，曲线中的一个最低点与 相邻的一个最高点属于一个余弦函数；而图3中，一段余弦函数曲线中，曲线中的一个最低点与相邻的一个最高点属于两个余弦函数。
在又一实施例中，如图4所示，以单一的余弦函数曲线为单位，相邻两段余弦函数曲线的方向相同或者相反，进行任意组合，使光线穿过相邻导电走线20之间的不规则缝隙时不易发生衍射，进而提升感光元件获取的图像质量。
可选的，重复单元包括多段余弦函数曲线和多段直线，且各余弦函数曲线和各直线交替间隔设置，使光线穿过相邻导电走线20之间的不规则缝隙时不易发生衍射，进而提升感光元件获取的图像质量。
示例性的，如图5所示，重复单元包括多段余弦函数曲线和多段直线，其中，多段余弦函数曲线方向相同，且各余弦函数曲线和各直线交替间隔设置，使光线穿过相邻导电走线20之间的不规则缝隙时不易发生衍射，进而提升感光元件获取的图像质量。
如图6所示，重复单元包括多段余弦函数曲线和多段直线，其中，任意相邻的两段余弦函数曲线方向相反，且任意相邻两段方向相反的余弦函数曲线之间夹设有一段直线，使光线穿过相邻导电走线20之间的不规则缝隙时不易发生衍射，进而提升感光元件获取的图像质量。
在另一种可选的实现方式中，如图7所示，重复单元包括多段余弦函数曲线和多段直线，其中，以单一的余弦函数曲线为一个单元，与各直线进行交替设置，且直线两端的两个单元的余弦函数曲线方向相同或相反，以使光线穿过相邻导电走线20之间的不规则缝隙时不易发生衍射，进而提升感光元件获取的图像质量。
可选的，重复单元包括多段正弦函数曲线和多段余弦函数曲线，且各正弦函数曲线和各余弦函数曲线交替间隔设置。
可选的，重复单元包括多段正弦函数曲线、多段余弦函数曲线以及多段直线，且各正弦函数曲线、各余弦函数曲线以及各直线间隔交替设置。
可选的，重复单元也可以包括余弦函数曲线、正弦函数曲线、直线以及其它函数曲线，且各函数曲线以及直线之间可进行任意组合。只要能够使相邻导电走线20之间的间隙呈不规则形状或无规律分布，改善光线穿过相邻导电走线20之间的缝隙时所产生的衍射现象，提升感光元件获取的图像质量 即可。对此，本实施例不做限制。
在上述实施例的基础上，还可以通过改变导电走线20的函数周期、振幅以及相邻导电走线之间的间隙大小等，使光线穿过相邻导电走线20之间的间隙时不易发生衍射，以达到改善衍射现象的目的，提升感光元件获取的图像质量。
在一种可选的实施方式中，如图8所示，透明显示区内的导电走线20包括横纵交叉设置的多条第一导电走线21和多条第二导电走线22。其中，多条第一导电走线21可以沿纵向延伸，多条第二导电走线可以沿横向延伸，或者多条第一导线走线21沿横向延伸，多条第二导电走线沿纵向延伸，第一导电走线21和第二导电走线22可以近似垂直，也就是说，横纵交叉的第一导电走线和第二导电走线之间可以是垂直的，也可以是发生偏斜的，对此，本实施例不做限制。
其中，第一导电走线21呈第一预设函数曲线排布，第二导电走线22呈第二预设函数排布，例如，第一导电走线21呈正弦函数曲线排布，第二导电走线22呈余弦函数曲线排布；或者，第一导电走线21呈正弦函数曲线排布，第二导电走线22呈直线排布；又或者，第一导电走线21呈余弦函数曲线排布，第二导电走线22呈直线排布；再或者，第一导电走线21和第二导电走线22均呈余弦函数曲线排布，或者呈正弦函数曲线排布等，使光线穿过相邻导电走线20之间的间隙呈不规则形状或无规律分布，从而改善光线穿过相邻导电走线20之间的缝隙时所产生的衍射现象，从而提升感光元件获取的图像质量。
进一步的，还可以通过改变第一导电走线21和第二导电走线22的排布周期及振幅，使光线穿过相邻导电走线20之间的间隙时不易发生衍射，提升感光元件获取的图像质量。
可选的，导电走线中函数曲线的周期、振幅、方向以及相邻导电走线之间的缝隙大小均可以改变，如图9、图10以及图11所示，相邻余弦函数曲线的周期和振幅大小不同，方向相同或相反，以及改变相邻导电走线之间的缝隙大小等，使相邻导电走线之间的缝隙的形状呈不规则分布或无规律分布，破坏了相邻导电走线之间的缝隙的结构周期性，进而改善显示面板的衍射现象，提升感光元件获取的图像质量。
可选的，导电走线包括函数曲线以及直线，并通过改变函数曲线的周期和振幅大小，方向，并使函数曲线与直线间隔设置，如图12、图13以及图14所示，函数曲线为余弦函数曲线，相邻余弦函数曲线的周期和振幅大小不同、方向可以相同或相反，并与直线间隔设置，使相邻导电走线之间的缝隙的形状呈不规则分布或无规律分布，破坏了相邻导电走线之间的缝隙的结构周期性，进而改善显示面板的衍射现象，提升感光元件获取的图像质量。
需要说明的是，导电走线中的函数曲线还可以是正弦函数曲线等其他函数曲线，通过改变函数曲线的振幅、周期、方向以及相邻导电走线之间的缝隙大小等，只要能够使相邻导电走线之间的缝隙的形状呈不规则分布或无规律分布，破坏相邻导电走线之间的缝隙的结构周期性即可，对此，本实施例不做具体限制。
其中，非透明显示区中的各导电走线也可以呈预设函数曲线排布，这样，方便非透明显示区和透明显示区中导电走线的加工工艺的一致性，从而提高导电走线的加工效率。
进一步的，图15为本发明实施例提供的阵列基板中导电走线模型的零级透过衍射效率的仿真结果示意图，其中，以导电走线20呈余弦函数曲线进行排布为例，并对呈余弦函数曲线排布的导电走线模型、传统的呈直线排布的导电走线模型以及无导电走线模型的零级透过衍射效率进行了仿真模拟，并对仿真结果进行比较，如图15所示，图中图线1代表的是传统的呈直线排布的导电走线模型的零级透过衍射效率，图线2代表的是无导电走线模型的零级透过衍射效率，图线1至图线2中间的图线代表的是本实施例中提供的呈余弦函数曲线排布的导电走线模型的零级透过衍射效率，且从下至上单一的导电走线函数曲线周期依次增大，从图15可知，在呈余弦函数曲线排布的导电走线模型中，单一的导电走线模型的函数曲线周期大于等于18，振幅大于等于3时，呈余弦函数曲线排布的导电走线模型的零级透过衍射效率的仿真结果不再明显变化，且接近无导电走线模型结果。因此，在本实施例中，通过改变导电走线的排布形状，即可改善屏体的衍射现象，不需要增加额外的工艺条件，实施方便。
在上述显示面板中，发光层包括呈阵列排布的多个发光单元，以及用于隔离各个发光单元的像素定义层，在透明显示区内，像素定义层可为透明层， 增加射向位于阵列基板下方的感光元件的光线透过。
封盖在发光层上的封装层通常包括多个重复堆叠的封装单元，每个封装单元包括层叠设置的无机薄膜和有机薄膜。其中，无机薄膜一般选取透明的氧化物、氟化物和氮化硅系列。
通常，在阵列基板上还形成阳极层，阳极层的材料一般为功函数高的材料，以便提高空穴注入效率，可为金(Au)、铂(Pt)、钛(Ti)、银(Ag)、氧化铟锡(ITO)、氧化锌锡(IZO)或透明导电聚合物(如聚苯胺)等，对此，本实施例不做限制。
在阳极层上设置发光层，在发光层上设置阴极层，阴极材料一般采用功函数较低的材料，以便电子注入，另外还可以减少工作中产生的热量，延长OLED器件的使用寿命。阴极的材料可以为银(Ag)、铝(Al)、锂(Li)、镁(Mg)、镱(Yb)、钙(Ca)或铟(In)等金属材料的一种，还可以为前述金属材料的合金，如镁银合金(Mg/Ag)、锂铝合金(Li/Al)，对此，本实施例不做限制。
本发明实施例提供的阵列基板中，透明显示区内的任意相邻两个膜层之间的导电走线的形状呈预设函数曲线排布，这样，可以使相邻导电走线之间的缝隙的形状呈不规则分布或无规律分布，破坏了相邻导电走线之间的缝隙的结构周期性，从而能够改善光线透过透明显示区时所产生的衍射现象，进而提升感光元件获取的图像质量，避免出现诸如图像失真等缺陷。
本说明书中各实施例或实施方式采用递进的方式描述，每个实施例重点说明的都是与其他实施例的不同之处，各个实施例之间相同相似部分相互参见即可。
最后应说明的是：以上各实施例仅用以说明本发明的技术方案，而非对其限制；尽管参照前述各实施例对本发明进行了详细的说明，本领域的普通技术人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分或者全部技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本发明各实施例技术方案的范围。

Claims (20)

  1. 一种阵列基板，其中，包括
    透明显示区；和
    非透明显示区，与所述透明显示区相邻；
    所述透明显示区内包括依次层叠设置的多个膜层以及位于任意相邻两个膜层之间的导电走线；所述导电走线的形状呈预设函数曲线排布。
  2. 根据权利要求1所述的阵列基板，其中，所述导电走线包括多个重复单元。
  3. 根据权利要求2所述的阵列基板，其中，所述重复单元包括依次连接的多段正弦函数曲线，且所述正弦函数曲线在所述重复单元中呈周期性排布。
  4. 根据权利要求2所述的阵列基板，其中，所述重复单元包括依次连接的多段余弦函数曲线，且所述余弦函数曲线在所述重复单元中呈周期性排布。
  5. 根据权利要求2所述的阵列基板，其中，所述重复单元包括依次连接的多段余弦函数曲线，且任意相邻的两段所述余弦函数曲线方向相反。
  6. 根据权利要求4或5所述的阵列基板，其中，任意相邻两段所述余弦函数曲线的振幅大小不同。
  7. 根据权利要求2所述的阵列基板，其中，所述重复单元包括依次连接的多段正弦函数曲线和多段直线，且各所述正弦函数曲线和各所述直线交替间隔设置。
  8. 根据权利要求2所述的阵列基板，其中，所述重复单元包括多段余弦函数曲线和多段直线，且各所述余弦函数曲线和各所述直线交替间隔设置。
  9. 根据权利要求1-8中任一项所述的阵列基板，其中，所述透明显示区内的所述导电走线包括多条。
  10. 根据权利要求9所述的阵列基板，其中，多条所述导电走线异层设置。
  11. 根据权利要求9所述的阵列基板，其中，多条所述导电走线同层设置。
  12. 根据权利要求9所述的阵列基板，其中，所述透明显示区内的所述导电走线包括横纵交叉设置的多条第一导电走线和多条第二导电走线。
  13. 根据权利要求12所述的阵列基板，其中，所述第一导电走线呈第一 预设函数排布，所述第二导电走线呈第二预设函数排布。
  14. 根据权利要求13所述的阵列基板，其中，所述第一导电走线呈正弦函数排布；所述第二导电走线呈余弦函数、正弦函数或者直线中的任意一者排布。
  15. 根据权利要求13所述的阵列基板，其中，所述第一导电走线为余弦函数排布，所述第二导电走线呈余弦函数、正弦函数或者直线中的任意一者排布。
  16. 根据权利要求13所述的阵列基板，其中，所述第一导电走线呈直线排布，所述第二导电走线呈余弦函数或正弦函数中的任意一者排布。
  17. 根据权利要求1-8中任一项所述的阵列基板，其中，所述导电走线为栅线、源极线、漏极线中的一者。
  18. 根据权利要求1所述的阵列基板，其中，多个所述膜层包括衬底基板、设置在衬底基板上的TFT阵列层和设置在TFT阵列层上的平坦层。
  19. 一种显示面板，其中，包括：如权利要求1-18中任一项所述的阵列基板，设置在所述阵列基板上的发光层，以及封盖在所述发光层上的封装层。
  20. 一种电子设备，其中，包括如权利要求19所述的显示面板和至少一个感光元件；
    所述感光元件设在所述透明显示区的下方。
PCT/CN2021/089702 2020-07-08 2021-04-25 阵列基板、显示面板及电子设备 WO2022007474A1 (zh)

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