WO2021238349A1 - Ensemble boîtier et procédé de préparation associé, et dispositif électronique - Google Patents

Ensemble boîtier et procédé de préparation associé, et dispositif électronique Download PDF

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Publication number
WO2021238349A1
WO2021238349A1 PCT/CN2021/081218 CN2021081218W WO2021238349A1 WO 2021238349 A1 WO2021238349 A1 WO 2021238349A1 CN 2021081218 W CN2021081218 W CN 2021081218W WO 2021238349 A1 WO2021238349 A1 WO 2021238349A1
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Prior art keywords
sub
maximum radial
texture area
housing assembly
texture
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PCT/CN2021/081218
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English (en)
Chinese (zh)
Inventor
李聪
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Oppo广东移动通信有限公司
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Publication of WO2021238349A1 publication Critical patent/WO2021238349A1/fr

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    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04M—TELEPHONIC COMMUNICATION
    • H04M1/00—Substation equipment, e.g. for use by subscribers
    • H04M1/02—Constructional features of telephone sets
    • H04M1/0202—Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
    • H04M1/0279—Improving the user comfort or ergonomics
    • H04M1/0283—Improving the user comfort or ergonomics for providing a decorative aspect, e.g. customization of casings, exchangeable faceplate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K5/00—Casings, cabinets or drawers for electric apparatus
    • H05K5/02—Details
    • H05K5/0217—Mechanical details of casings
    • H05K5/0243—Mechanical details of casings for decorative purposes

Definitions

  • This application relates to the technical field of electronic equipment, and in particular to a housing assembly, a preparation method thereof, and electronic equipment.
  • This application aims to solve one of the technical problems in the related technology at least to a certain extent. For this reason, one purpose of the present application is to provide a housing assembly with beautiful snowflake appearance, simple preparation process, or short preparation process.
  • the present application provides a housing assembly.
  • the housing assembly includes a housing body, the housing body has a first surface and a second surface, and at least part of the first surface has a plurality of texture areas that are connected to each other.
  • Each of the texture areas includes a first sub-texture area and a second sub-texture area, the first sub-texture area has a plurality of micron-level first pits, and the second sub-texture area has a plurality of micron-level second pits.
  • the average maximum radial dimension of the first pit is greater than the average maximum radial dimension of the second pit.
  • the surface of the shell assembly can form a beautiful snowflake appearance effect, and can provide users with a better experience.
  • the present application provides a method of preparing the aforementioned housing assembly.
  • the method includes: forming a plurality of contiguous texture areas on the first surface of the housing body, wherein each of the texture areas includes a first sub-texture area and a second sub-texture area, The first sub-texture area has a plurality of micron-level first pits, the second sub-texture area has a plurality of micron-level second pits, and the average maximum radial size of the first pits is larger than that of the first pits. The average maximum radial dimension of the two pits.
  • the steps are simple, convenient, and easy to operate, and the obtained shell assembly has a uniform, comprehensive and beautiful snowflake appearance effect.
  • this application provides an electronic device.
  • the electronic device includes: the aforementioned housing assembly, the housing assembly defines an accommodating space; and a display screen, the display screen being arranged in the accommodating space.
  • This electronic device has all the features and advantages of the aforementioned housing assembly, and will not be repeated here.
  • FIG. 1 is a schematic structural diagram of a first surface of a housing body according to an embodiment of the present application.
  • Fig. 2 is a schematic flowchart of a method for preparing a housing assembly according to an embodiment of the present application.
  • Fig. 3 is a photograph of the housing assembly of Example 1 of the present application.
  • Fig. 4 is an enlarged photograph of the position indicated by the circle in Fig. 3.
  • Fig. 5 is an enlarged photograph of the position indicated by the circle in Fig. 4.
  • Fig. 6 is an enlarged photograph of the position indicated by the circle in Fig. 5.
  • Fig. 7 is a photograph of the housing assembly of Example 3 of the present application.
  • Fig. 8 is an enlarged photograph of the position indicated by the circle in Fig. 7.
  • Fig. 9 is an enlarged photograph of the position indicated by the circle in Fig. 8.
  • Fig. 10 is an enlarged photograph of the position indicated by the circle in Fig. 9.
  • Fig. 11 is a photograph of the housing assembly of Example 4 of the present application.
  • Fig. 12 is a 100 times enlarged photograph of the position indicated by the circle in Fig. 11.
  • Fig. 13 is a 1000 times magnified photograph of the position indicated by the circle in Fig. 11.
  • FIG. 14 is a schematic cross-sectional structure diagram of a housing assembly according to an embodiment of the present application.
  • the present application provides a housing assembly.
  • the housing assembly includes a housing body 10 having a first surface 11 and a second surface 12, and at least part of the first surface has a plurality of mutually opposite surfaces.
  • Each of the texture areas 20 includes a first sub-texture area 21 and a second sub-texture area 22.
  • the first sub-texture area 21 has a plurality of micron-level first pits 211.
  • the second sub-texture area 22 has a plurality of micron-scale second pits 221, and the average maximum radial size of the first pits 211 is greater than the average maximum radial size of the second pits 221.
  • the surface of the shell assembly can form a good snowflake appearance, which is beautiful and beautiful, and can provide users with a better use experience.
  • the brightness of the first sub-texture area and the second sub-texture area are different.
  • a difference of brightness and darkness occurs between the first sub-texture area and the second sub-texture area, and the sub-texture area with greater brightness looks like a piece of snowflakes, thereby effectively forming a snowflake appearance effect.
  • multiple texture areas can be connected to each other, that is, there is no gap between multiple texture areas, and the first sub-texture area and the second sub-texture area in each texture area can also be arranged next to each other, or each texture area
  • the area is composed of a first sub-texture area and a second sub-texture area, so that the first surface of the shell body forming multiple texture areas is completely covered by the texture area without gaps, and the brightness and darkness between different sub-texture areas
  • the difference in combination with its distribution method can better form a beautiful snowflake appearance.
  • micron-scale pit means that the maximum radial dimension of the pit is on the micron level (for example, in the range of 1-999 microns), and the maximum radial dimension of the pit refers to the pit.
  • the maximum value of the distance between any two points on the contour line, and other similar descriptions have the same meaning.
  • the "average maximum radial size of the first pits” described herein refers to the average value of the maximum radial size of all the first pits in each first sub-texture area
  • average maximum radial size of the second pits “Maximum radial size” refers to the average of the maximum radial size of all second pits in each second sub-texture area.
  • first and second are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with “first” and “second” may explicitly or implicitly include one or more of these features.
  • the sizes of the multiple first pits in each first sub-texture area are not necessarily the same, and may be distributed within a certain range, and the multiple first pits in each second sub-texture area The size of the two pits may not be exactly the same, but may be distributed within a certain range.
  • the specific shape of the above-mentioned multiple texture regions can be regular geometric shapes or irregular shapes.
  • the regular shapes can be rectangles, triangles, pentagons, hexagons, circles, ellipses, etc.
  • the contour line of the irregular shape can be a polyline, a curve, a straight line, and a combination thereof, etc. In FIG. 1, only a hexagon is taken as an example for illustration, and it cannot be understood as a limitation of the present application.
  • the maximum radial size of the first pit and the maximum radial size of the second pit in the housing assembly of the present application are not greater than 200 microns, such as 10 microns, 20 microns, 30 microns, 40 microns, 50 microns, 60 microns, 70 microns, 80 microns, 90 microns, 100 microns, 110 microns, 120 microns, 130 microns, 140 microns, 150 microns, 160 microns, 170 microns, 180 microns, 190 microns, 200 microns Wait.
  • the housing assembly can present a more beautiful and uniform snowflake appearance. It should be noted that the uniformity of the appearance of snowflakes includes uniform size and uniform distribution.
  • size uniformity refers to the small difference between the maximum radial sizes of multiple first sub-texture regions and multiple second sub-texture regions.
  • the difference between the maximum radial dimensions of the texture area is small, and the uniform distribution means that a plurality of first sub-texture areas are substantially evenly distributed on the surface of the shell body, and the second sub-texture area is on the surface of the shell body. Basically evenly distributed.
  • the maximum radial dimension of the first pit may be 100-120 microns (specifically, 100, 105, 110, 115, 120, etc.); the size of the second pit The maximum radial dimension is 45-70 microns (specifically, 45 microns, 50 microns, 55 microns, 60 microns, 65 microns, 70 microns, etc.).
  • the maximum radial dimension of the first pit may be 40 to 45 microns (specifically, 40 microns, 41 microns, 42 microns, 43 microns, 44 microns, 45 microns, etc.);
  • the maximum radial dimension of the pit can be 20-30 microns (specifically, 20 microns, 22 microns, 25 microns, 28 microns, 30 microns, etc.). Therefore, the size between the first pit and the second pit is easier for human eyes to recognize, and the range of the difference is appropriate, which can better match the appearance of snowflakes of different sizes.
  • the ratio of the maximum radial dimension of the first pit to the maximum radial dimension of the second pit is (1.3 to 2.7):1, specifically such as 1.3:1, 1.4:1, 1.5 :1, 1.6:1, 1.7:1, 1.8:1, 1.9:1, 2.0:1, 2.1:1, 2.2:1, 2.3:1, 2.4:1, 2.5:1, 2.6:1, 2.7:1 Wait.
  • the ratio of the average maximum radial dimension of the first pits to the average maximum radial dimension of the second pits may be (1.4-2.7):1.
  • the ratio of the average maximum radial dimension of the first pits to the average maximum radial dimension of the second pits may be (1.3-2.3):1.
  • the maximum radial dimension of the first sub-texture area and the second sub-texture area are each independently 0.1-2.5mm, specifically such as 0.1mm, 0.2mm, 0.3mm, 0.4mm, 0.5mm, 0.6 mm, 0.7mm, 0.8mm, 0.9mm, 1.0mm, 1.1mm, 1.2mm, 1.3mm, 1.4mm, 1.5mm, 1.6mm, 1.7mm, 1.8mm, 1.9mm, 2mm, 2.1mm, 2.2mm, 2.3 mm, 2.4mm, 2.5mm, etc.
  • the maximum radial dimension of the first sub-texture area and the second sub-texture area are independently 0.8-1mm (specifically, 0.8mm, 0.81mm, 0.82mm, 0.83mm, 0.84mm, 0.85mm, 0.86mm, 0.87mm, 0.88mm, 0.9mm, 0.91mm, 0.92mm, 0.93mm, 0.94mm, 0.95mm, 0.96mm, 0.97mm, 0.98mm, 0.99mm, 1mm, etc.). In other embodiments, the maximum radial dimension of the first sub-texture area and the second sub-texture area are independently 0.2 to 0.5 mm (specifically, 0.2 mm, 0.25 mm, 0.3 mm, 0.35 mm, 0.4 mm).
  • the maximum radial size of the plurality of first sub-texture regions and the maximum radial size of the plurality of second sub-texture regions may be 0.5 ⁇ 0.2 mm, 1 ⁇ 0.3 mm, 1.5 ⁇ independently. 0.4mm, 2 ⁇ 0.5mm, etc. Therefore, the housing assembly has a snowflake appearance effect of a suitable size, and will not easily cause leakage during the processing due to the oversize, and will not affect the aesthetics due to the undersize.
  • the maximum radial dimensions of the first sub-texture area and the second sub-texture area are independently 0.8-1mm (specifically, 0.8mm, 0.81mm, 0.82mm, 0.83mm, 0.84mm). , 0.85mm, 0.86mm, 0.87mm, 0.88mm, 0.9mm, 0.91mm, 0.92mm, 0.93mm, 0.94mm, 0.95mm, 0.96mm, 0.97mm, 0.98mm, 0.99mm, 1mm, etc.);
  • the ratio of the maximum radial size of a pit to the maximum radial size of the second pit is (1.4 ⁇ 2.7):1 (specifically, 1.4:1, 1.5:1, 1.6:1, 1.7:1, 1.8 :1, .9:1, 2.0:1, 2.1:1, 2.2:1, 2.3:1, 2.4:1, 2.5:1, 2.6:1, 2.7:1, etc.); the largest of the first pit
  • the radial dimension is 100-120 microns (specifically, 100 microns, 101 microns, 102 microns,
  • snowflake used in this article refers to the sub-texture area with larger brightness in the first sub-texture area and the second sub-texture area.
  • the maximum radial dimension of the first sub-texture area and the second sub-texture area are independently 0.2-0.5mm (specifically, such as 0.2mm, 0.25mm, 0.3mm, 0.35mm, 0.4mm, 0.45mm, 0.5mm, etc.); the ratio of the maximum radial dimension of the first pit to the maximum radial dimension of the second pit is (1.3 ⁇ 2.3):1 (specifically, 1.3:1 , 1.4:1, 1.5:1, 1.6:1, 1.7:1, 1.8:1, 1.9:1, 2.0:1, 2.1:1, 2.2:1, 2.3:1, etc.); The maximum radial dimension is 40 to 45 microns (specifically, 40 microns, 41 microns, 42 microns, 43 microns, 44 microns, 45 microns, etc.); and the maximum radial size of the second pit is 20 to 30 microns ( Specifically, such as 20 micrometers, 21 micrometers, 22 micrometers, 23 micrometers, 24 micrometers,
  • the ratio between the maximum radial size of the first sub-texture area and the maximum radial size of the second sub-texture area may be 1:0.6 to 1.4, such as 1:0.6, 1:0.7, 1:0.8, 1:0.9, 1:1, 1:1.1, 1:1.2, 1:1.3, 1:1.4, etc.
  • the difference between the maximum radial dimension of the first sub-texture area and the maximum radial dimension of the second sub-texture area is not greater than 0.5 mm (specifically, 0.5 mm, 0.4 mm, 0.3 mm). , 0.2mm, 0.1mm, etc.). As a result, the appearance of snowflakes is more stable, comprehensive and uniform.
  • the maximum radial size of the first sub-texture area and the maximum radial size of the second sub-texture area gradually change, and the gradual change includes gradually increasing and gradually smaller At least one of (specifically, gradually increasing, gradually decreasing, first gradually increasing and then gradually decreasing, first gradually decreasing and then gradually increasing, etc.).
  • the housing assembly can exhibit a gradual snowflake appearance.
  • the maximum radial size of the first pit and the maximum radial size of the second pit gradually change, and the gradual change includes at least one of gradually increasing and gradually smaller A sort of.
  • the change trend of the maximum radial size of the first pit and the maximum radial size of the second pit may be the same as the change of the maximum radial size of the first sub-texture area and the maximum radial size of the second sub-texture area.
  • the trends are the same, so I won’t repeat them here.
  • the housing body includes at least one of glass, sapphire, and glass-ceramic, where the glass may be high-alumina silica glass.
  • the glass may be high-alumina silica glass.
  • a thin thickness can meet the requirements of use, and the weight is lighter and can be better. To meet the needs of electronic equipment.
  • the formation position of the aforementioned texture area on the first surface of the housing body can be flexibly selected according to actual needs.
  • the texture area may be formed on part or all of the first surface; in other embodiments, the texture area may also be formed on multiple surfaces.
  • the housing body includes a first surface and a second surface, and both the first surface and the second surface have a plurality of the texture regions that are connected to each other. Further, the first surface and the second surface are arranged opposite to each other, and in a direction perpendicular to the first surface, the orthographic projection of the multiple texture regions on the first surface and the multiple textures on the second surface The orthographic projections of the regions overlap at least partially. As a result, the appearance of snowflakes overlapping on both sides can be realized.
  • the position where the texture area is formed on the shell body satisfies at least one of the following conditions: the haze may be 75%-85% (specifically, 75%, 76%, 77%, 78%, 79%, 80%, 81%, 82%, 83%, 84%, 85%, etc.); surface roughness can be 0.8-1 micron (specifically 0.8 micron, 0.9 micron, 1 micron, etc.); light transmittance 50% to 65% (specifically, 50%, 51%, 52%, 53%, 54%, 55%, 56%, 57%, 58%, 59%, 60%, 61%, 62%, 63%, 64%, 65%, etc.).
  • the housing assembly may further include: an ink layer 30, the ink layer 30 is provided on the second surface of the housing body 10, and the ink layer 30 is on the first surface
  • the above orthographic projection covers a plurality of said texture areas 20. Therefore, since the shell body has a beautiful snowflake appearance effect, the shell assembly can be formed by simply spraying ink, and there is no need for complicated decoration film preparation and attaching processes, which greatly simplifies the process and saves costs.
  • the present application provides a method of preparing the aforementioned housing assembly.
  • the method includes: forming a plurality of contiguous texture areas on the first surface of the housing body, wherein each of the texture areas includes a first sub-texture area and a second sub-texture area, The first sub-texture area has a plurality of micron-level first pits, the second sub-texture area has a plurality of micron-level second pits, and the average maximum radial size of the first pits is larger than that of the first pits. The average maximum radial dimension of the two pits. As a result, a snowflake appearance effect can be conveniently formed on the casing body.
  • the texture area is formed by different methods. For example, if the shell body is made of plastic material, it can be directly injected with a mold with a textured area. If it is made of ceramic material, it can be formed by CNC machining, laser engraving, etc., and if it is made of glass, it can be The texture area is formed by an etching method.
  • the method may include:
  • a depression is formed on the first surface of the housing body, which can provide nucleation points for the insoluble salt crystals generated in the subsequent etching step, thereby reducing the energy of crystal growth, reducing the time of crystal growth, and increasing etching
  • the life cycle of the liquid is more conducive to controlling the uniformity and comprehensiveness of the appearance of the snowflake, and it is not easy to cause leakage (that is, no texture is formed on the surface of the shell body).
  • the formation of recesses to increase the physical lattice defects can effectively compensate for the uneven state of the lattice defects generated by a single chemical etching, so that the appearance of the formed snowflakes is more uniform.
  • the plurality of depressions are formed by at least one method of sandblasting, mold embossing, CNC cold engraving, and laser laser.
  • the size of the depression formed on the first surface of the casing body by the above method is relatively small, and can be regarded as a point approximately.
  • the depression point can be used as a nucleation point of the fluorosilicate crystal in the subsequent etching process.
  • a sandblasting method may be selected to form the depressions. As a result, the equipment requirements are lower, the cost is lower, and the economy is better.
  • the sand used in the sandblasting includes at least one of zirconium sand and brown corundum. Therefore, the performance is suitable, the depression formed by sandblasting is more conducive to crystal growth, and the material source is wide and easy to obtain.
  • the particle size of the sand is 40# ⁇ 2000# (e.g. 40#, 60#, 80#, 100#, 200#, 400#, 500#, 600#, 800#, 1000#, 1200# , 1400#, 1500#, 1800#, 2000#, etc.).
  • the size and distribution of the pits formed are appropriate, which is more conducive to crystal growth, and the appearance of the subsequent snowflakes is high and the user experience is good. If the particle size is too small, the size of the snowflakes will be too small, which will affect the aesthetics. , And if the particle size is too large, it will easily cause leakage and affect the overall appearance of the snowflake.
  • the sandblasting distance can be 20-60 cm (specifically, 20 cm, 25 cm, 30 cm, 35 cm, 40 cm, 45 cm, 50 cm, 55 cm, 60 cm, etc.).
  • dents of suitable size and density can be formed, thereby forming a beautiful snowflake appearance. If the distance is too small, the size of the dents formed will be smaller, which is not conducive to the growth of crystals in the subsequent steps, and the size of the obtained snowflakes is too small , And if the distance is too large, it will easily lead to leakage.
  • the sandblasting time may be 1 to 30 seconds (specifically, 1 second, 5 seconds, 10 seconds, 15 seconds, 20 seconds, 25 seconds, 30 seconds, etc.). Within this time range, depressions of suitable size and distribution can be formed, and a highly beautiful snowflake appearance can be obtained. If the time is too short, it is easy to be missed, and if the time is too long, the size of the snowflake is likely to be too small.
  • the recesses are formed by sandblasting, and the distance between two adjacent recesses is less than 5mm (specifically, 0.2mm, 0.5mm, 0.8mm, 1mm, 2mm, 3mm, 4mm, 5mm, etc.) .
  • the depressions formed by sandblasting have irregular morphology, which facilitates the growth of crystals during the etching process. Therefore, a good snowflake appearance can be achieved within the above-mentioned pitch range.
  • the surface of the housing body on which the recesses are formed is within the field of view of a 5x optical magnifier, and the number of recesses is 3 to 4, wherein the diameter of the field of view is 1 to 2 mm ( Specifically, such as 1mm, 1.1mm, 1.2mm, 1.3mm, 1.4mm, 1.5mm, 1.6mm, 1.7mm, 1.8mm, 1.9mm, 2mm, etc.). Therefore, the distribution density of the depressions is more suitable, the human eyes are comfortable to see, and the aesthetics is high.
  • the above-mentioned recesses may be formed on the entire first surface of the housing body, or may be formed on part of the first surface of the housing body. When only formed on a part of the first surface of the housing body, the recesses Previously, a protective film can be formed in advance on a surface that does not need to be recessed.
  • the depression can also be formed by mold embossing. Specifically, it can be formed into a recessed housing body in one step during the molding process of the housing body, or the molded housing body can be reheated and then passed through the mold.
  • the embossing forms a depression.
  • a CNC cold engraving method may be used to form the depressions. At this time, the CNC machine tool's cutting program is preset according to the shape and distribution of the depressions formed, and the processing can be performed according to the predetermined program.
  • a laser laser method may be used to form the depressions, specifically, laser laser may be performed according to the distribution and size of the depressions.
  • the distance between two adjacent depressions may be less than 1mm (specifically, 0.9mm, 0.8mm, 0.7mm, 0.6mm, 0.5mm). mm, 0.4mm, 0.3mm, 0.2mm, 0.1mm, etc.).
  • the depressions formed by the above-mentioned methods are relatively regular, and the ability to promote crystal growth is relatively weak compared with the irregular morphology. Therefore, the distribution density of the depressions can be relatively large to ensure a better appearance of snowflakes.
  • S200 etching the first surface of the housing body on which the recesses are formed to form a plurality of connected texture regions.
  • the etching solution used in the etching can react with the silicon dioxide in the glass to form crystals that are difficult to dissolve in acid.
  • the reactants accumulate into granular crystals and firmly adhere to the surface of the shell body.
  • the surface of the attached housing body hinders the further reaction of the etching, while the surface of the housing body where the crystal is not adhered will continue to be etched, and the crystal will be removed during the cleaning process after etching, and a recess will be formed at the position where the crystal is formed. Pit, and then form the texture area.
  • the etching solution used in the etching may include: 1-8% (specifically, 1%, 2%, 3%, 4%, 5%, 6%, 7%, 8%, etc.)
  • the main acid is used to etch the shell body; 10-50% (specifically, 10%, 15%, 20%, 25%, 30%, 35%, 40%, 45%, 50% Etc.), the secondary acid is used to replace the alkali metal and alkaline earth metal in the shell body, and to balance the pH; 10-60% (specifically, 10%, 15%, 20%, 25%, 30%).
  • the crystal growth agent is used to react with the shell body to form acid-insoluble fluorosilicon salt crystals ; And the remainder of the solvent.
  • the role of the main acid is to etch the silicon dioxide network structure in the glass, open the silicon-oxygen covalent bond to etch the shell body; the hydrogen ion in the auxiliary acid can quickly replace the alkali metal and alkaline earth metal elements in the glass (For example, lithium, sodium, potassium, magnesium, calcium, etc.), it can balance the pH and control the appropriate etching rate; and the crystal growth agent can be combined with other components to chemically react with the glass to form acid-insoluble fluorine-silicon salts Crystal.
  • the above reaction processes can generate acid-insoluble fluorine-silicon salt crystals on the glass surface, thereby effectively forming a snowflake texture.
  • the etching solution has a suitable etching rate and is easy to control, and can effectively promote the growth of crystals, and can flexibly control the ratio and distribution of the adhered crystal area and the non-adhered crystal area, thereby obtaining a beautiful snowflake texture.
  • the main acid includes hydrofluoric acid
  • the side acid includes at least one of sulfuric acid, hydrochloric acid and nitric acid
  • the crystal growth agent includes hydrofluoride, sulfate, chloride, nitrate, and preferably includes fluorine.
  • the solvent includes water.
  • each component can better play its corresponding role, and at the same time can be matched with each other to obtain a uniform, comprehensive, stable, and highly beautiful snowflake appearance.
  • the etching solution of this component is very suitable for high-alumina silica glass, and can effectively form a uniform, stable and comprehensive snowflake appearance on the surface of the high-alumina silica glass.
  • the silicon dioxide structure in the glass is corroded by hydrofluoric acid, breaking the silicon-oxygen bond, causing lattice defects (snowflake nucleation points), and simultaneously generating fluorosilicic acid and water: SiO 2 (s) +6HF ⁇ H 2 SiF 6 +2H 2 O, meanwhile, the alkali metal ion or alkaline earth metal ion M + in the glass is replaced by the hydrogen ion in the acid: H + +MO-Si (glass) ⁇ M + +HO- Si (glass) , due to the low solubility of fluorosilicic acid and M + ions, taking potassium ions as an example, potassium fluorosilicate will crystallize on the glass surface: 2K + +H 2 SiF 6 ⁇ K 2 SiF 6 (s)+ 2H + .
  • the potassium fluorosilicate obtained by the above reaction has high stability, it will hinder the reaction between glass and acid. As the etching progresses, the crystals gradually grow up. After the crystals are removed in the cleaning step after etching, The pits are formed, which in turn creates the appearance of snowflakes.
  • alkali metals and alkaline earth metals mainly exist in the form of bridging oxygen structure (MO-Si), therefore, the above reaction formula H + +MO-Si (glass) ⁇ M + +HO -Si (glass) can proceed smoothly.
  • MO-Si bridging oxygen structure
  • the above reaction formula H + +MO-Si (glass) ⁇ M + +HO -Si (glass) can proceed smoothly.
  • the basic structure of high-alumina silica glass in addition to the silicon-oxygen structure, there is also an aluminum-oxygen structure.
  • Most of the alkali metals and alkaline earth metals M exist in the form of non-bridging oxygen structures.
  • the alkali metal ions and alkaline earth metal ions mainly exist in the aluminum oxide.
  • the fluorosilicate is used
  • the cations in the crystal growth agent can react with the main acid and glass to generate H 2 SiF 6 to form high-solubility fluorosilicates (such as sodium and ammonium salts), and the high-solubility fluorosilicates can directly interact with glass reaction insoluble crystalline silicon fluoride-based salt: Na + (Acid) + SiF 6 2- (Acid
  • this application adds a strong acid (such as nitric acid, hydrochloric acid, sulfuric acid, etc.) to the etching solution to balance the pH, which can appropriately speed up the etching rate and improve production efficiency.
  • a strong acid such as nitric acid, hydrochloric acid, sulfuric acid, etc.
  • subscripts of each component in the reaction formula refer to the source of the component
  • the subscript Acid indicates that the component comes from the acid component in the etching solution
  • the subscript glass indicates that the component comes from glass.
  • the etching time may be 2-10 minutes, such as 1 minute, 3 minutes, 4 minutes, 5 minutes, 6 minutes, 7 minutes, 8 minutes, 9 minutes, 10 minutes, etc.
  • the size of the first pit and the second pit formed are appropriate, and the appearance of the obtained snowflake is high in aesthetics.
  • the etching solution in the etching step, may be left for a predetermined time so that the etching solution forms a concentration gradient from top to bottom, and then the housing body is immersed in the etching solution, and the housing body is The liquid level of the etching solution is not parallel. Therefore, different positions of the housing body have different depths of immersion in the etching solution, that is, positions with different depths react with different concentrations of the etching solution, and the etching rate is different, so that texture areas of different sizes can be formed, and a gradual snowflake appearance can be realized.
  • the etching solution in the etching step, may be heated or cooled above or below the etching solution, so that the etching solution forms a temperature gradient from top to bottom, and then the housing body is immersed in In the etching solution, the housing body and the liquid level of the etching solution are not parallel. Therefore, different positions of the housing body have different depths of immersion in the etching solution, that is, positions with different depths react with the etching solution with different temperatures, and the etching rate is different, so that texture areas of different sizes can be formed, and a gradual snowflake appearance can be realized.
  • pre-forming recesses on the first surface of the housing body can provide crystal nuclei for the insoluble crystals generated in the subsequent etching process, thereby reducing the energy of crystal growth, reducing the time of crystal growth, and increasing the etching solution. It has a long life cycle and is more conducive to controlling the uniformity and comprehensiveness of the appearance of snowflakes.
  • the housing body in the housing assembly can be a flat panel structure, a 2.5D structure, a 3D structure, etc.
  • the specific shape and size can also be flexibly selected according to the needs of the actual electronic device, and will not be repeated here.
  • the housing assembly may only be composed of the aforementioned housing body, or may include other structures and components, such as plastic parts, metal parts, and decorative film layers.
  • the ink layer can be sprayed directly on the surface of the housing body, thereby reducing the cost of the housing assembly.
  • a decorative film can also be attached to the housing body.
  • the structure can be selected as ink layer, texture layer, color layer, coating layer, etc. according to needs, and will not be repeated here.
  • the shell assembly can be prepared according to the following steps: white glass (after chipping, opening position, finishing, side polishing, 3D hot bending, polishing) ⁇ ink protection surface that does not require etching effect ⁇ spraying Sand (make the glass surface uniformly dented by sandblasting) ⁇ cleaning (clean the glass surface with water, acid and other chemical reagents) ⁇ etching (etch the glass surface with an etching solution to form the required snowflake texture) ⁇ remove the ink ⁇ chemical polishing (pass Acid or alkali solution is slightly etched to achieve the effect of passivating defects and increasing strength) ⁇ chemical strengthening (form a compressive stress layer on the surface of the glass through ion exchange to achieve the effect of increasing the strength of the glass) ⁇ decoration (decorate the glass by filming, spraying ink, etc.) ).
  • this application provides an electronic device.
  • the electronic device includes: the aforementioned housing assembly, the housing assembly defines an accommodating space; and a display screen, the display screen being arranged in the accommodating space.
  • the electronic device housing has all the features and advantages of the aforementioned housing assembly, and will not be repeated here.
  • the specific type of the electronic device can be a mobile phone, a tablet computer, a TV, a game console, a wearable device, etc., and it is understandable that in addition to the electronic device housing and display screen described above, the electronic device also Including the necessary structures and components of conventional electronic equipment.
  • a mobile phone as an example, it may also include a touch module, a fingerprint recognition module, a motherboard, a memory, a camera module, etc., which will not be detailed here.
  • the high alumina silicon shell body is obtained, and the ink protection film is formed on the surface of the high aluminum silicon glass shell body that does not need to form a snowflake appearance.
  • the high-alumina silica glass shell body is obtained, and the ink protection film is formed on the surface of the high aluminum silicon glass shell body that does not need to form a snowflake appearance.
  • 240# brown steel grit to blast the exposed surface of the high-alumina silica glass shell body with a blasting distance of 50cm for 3 seconds, and then clean the blasted surface to remove the remaining sand and impurities, and then use 5%
  • the etching solution of hydrofluoric acid, 25% hydrochloric acid, 55% hydrogen fluoride and 15% water etches the sandblasted surface for 4 minutes.
  • the shell assembly After removing the ink protection layer, the shell assembly is obtained through chemical polishing and chemical strengthening. See the photo Figure 3, the partially enlarged optical microscope photos are shown in Figure 4, Figure 5 and Figure 6. It can be clearly seen from the figure that sub-texture areas with different pit sizes are formed on the surface of the shell body.
  • the maximum radial size of each sub-texture area is about 1 mm.
  • the maximum radial size of the pit is about 48-68 microns, and the maximum radial size of the pit in the sub-texture area with a larger pit size is about 100-110 microns.
  • Example 2 Same as Example 1, the difference is: sandblasting uses 200# zirconium sand, the sandblasting distance is 40cm, the sandblasting time is 1s, and the etching solution used contains 3% hydrofluoric acid, 15% sulfuric acid, 25% potassium cyanide fluoride and 57% water, the etching time is 8 minutes.
  • the surface morphology of the obtained shell body is similar to that of Example 1, and the size of the sub-texture area and the size of the pits are slightly different.
  • the difference lies in that the etching solution used contains 2% hydrofluoric acid, 10% hydrochloric acid, 20% nitric acid, 50% hydrogen fluoride, and 18% water.
  • the etching time is 6 minutes.
  • the resulting photo of the housing assembly See Figure 7, and the partially enlarged optical microscope photos are shown in Figure 8, Figure 9, and Figure 10. It can be clearly seen from the figure that sub-texture areas with different pit sizes are formed on the surface of the shell body.
  • the maximum radial size of each sub-texture area is about 0.2 ⁇ 0.45mm, while the sub-texture area with a smaller pit size
  • the maximum radial size of the pits in is about 20-28 microns, and the maximum radial size of the pits in the sub-texture area with a larger pit size is about 40-45 microns.
  • the high aluminum silicon shell body is obtained.
  • the ink protection film is formed on the surface of the high aluminum silicon shell body that does not need to form a snowflake appearance.
  • an etching solution containing 10% hydrofluoric acid, 25% hydrochloric acid, 25% hydrogen fluoride and 40% water is used to etch the surface of the glass for 4 minutes.
  • the shell is obtained by chemical polishing and chemical strengthening.
  • the components, the photos are shown in Figure 11, and the partially enlarged optical microscope photos are shown in Figure 12 and Figure 13.
  • Laser engraving is used to form a textured area on the surface of the mold, and the mold with the textured area is used to form a plastic shell body, and then the shell body is subjected to the steps of filming, silk screen ink, CNC processing, etc. as needed to obtain the shell assembly, the shell assembly Its structure is similar to that of Examples 1-4, showing a better appearance of snowflakes.

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  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Casings For Electric Apparatus (AREA)

Abstract

La présente invention concerne un ensemble boîtier et un procédé de préparation associé, ainsi qu'un dispositif électronique. L'ensemble boîtier comprend : un corps de boîtier ; le corps de boîtier a une première surface et une seconde surface ; de multiples régions de texture reliées l'une à l'autre sont disposées sur au moins une partie de la première surface ; chaque région de texture comprend une première région de sous-texture et une seconde région de sous-texture ; la première région de sous-texture a de multiples premières alvéoles au niveau du micron ; la seconde région de sous-texture a de multiples secondes alvéoles au niveau du micron ; la dimension radiale maximale moyenne des premières alvéoles est supérieure à celle des secondes alvéoles.
PCT/CN2021/081218 2020-05-25 2021-03-17 Ensemble boîtier et procédé de préparation associé, et dispositif électronique WO2021238349A1 (fr)

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WO2023134355A1 (fr) * 2022-01-17 2023-07-20 比亚迪股份有限公司 Verre flash et son procédé de préparation, et boîtier de dispositif électronique
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CN112165798B (zh) * 2020-09-17 2022-01-28 Oppo（重庆）智能科技有限公司 玻璃壳体及其制备方法、壳体组件和电子设备
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CN114697427A (zh) * 2020-12-31 2022-07-01 Oppo广东移动通信有限公司 壳体及其制作方法、电子设备
CN113043779A (zh) * 2021-03-18 2021-06-29 惠州Tcl移动通信有限公司 一种制作具有炫彩效果的壳体的方法及壳体
CN113411430A (zh) * 2021-07-08 2021-09-17 Oppo广东移动通信有限公司 防眩光盖板的制作方法、防眩光盖板和电子装置
CN114349360A (zh) * 2022-02-23 2022-04-15 Oppo广东移动通信有限公司 制备玻璃基材的方法、玻璃基材、壳体组件以及电子设备

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