WO2021238349A1

WO2021238349A1 - Housing assembly and preparation method therefor, and electronic device

Info

Publication number: WO2021238349A1
Application number: PCT/CN2021/081218
Authority: WO
Inventors: 李聪
Original assignee: Oppo广东移动通信有限公司
Priority date: 2020-05-25
Filing date: 2021-03-17
Publication date: 2021-12-02
Also published as: TW202147817A; CN111586221A

Abstract

Provided are a housing assembly and a preparation method therefor, and an electronic device. The housing assembly comprises: a housing body; the housing body has a first surface and a second surface; multiple texture regions connected to each other are provided on at least a part of the first surface; each texture region comprises a first sub-texture region and a second sub-texture region; the first sub-texture region has multiple micron-level first dimples; the second sub-texture region has multiple micron-level second dimples; the average maximum radial dimension of the first dimples is greater than that of the second dimples.

Description

Shell assembly and preparation method thereof and electronic equipment

Technical field

This application relates to the technical field of electronic equipment, and in particular to a housing assembly, a preparation method thereof, and electronic equipment.

Background technique

Existing electronic devices (such as smart phones) increasingly use transparent casing films as interfaces (housings) for interacting with users. With the development of technology and the improvement of user aesthetics, more and more consumers want to show the corresponding appearance design and tactile design with different hand feelings on the shell. At present, the appearance improvement of the shell is mainly concentrated on the diaphragm, and the development is more beautiful. , The appearance effect of better user experience is one of the research hotspots in the field of electronic equipment housing.

Therefore, the related technology of the current electronic device housing still needs to be studied in depth.

Application content

This application aims to solve one of the technical problems in the related technology at least to a certain extent. For this reason, one purpose of the present application is to provide a housing assembly with beautiful snowflake appearance, simple preparation process, or short preparation process.

In one aspect of the present application, the present application provides a housing assembly. According to an embodiment of the present application, the housing assembly includes a housing body, the housing body has a first surface and a second surface, and at least part of the first surface has a plurality of texture areas that are connected to each other. Each of the texture areas includes a first sub-texture area and a second sub-texture area, the first sub-texture area has a plurality of micron-level first pits, and the second sub-texture area has a plurality of micron-level second pits. The average maximum radial dimension of the first pit is greater than the average maximum radial dimension of the second pit. The surface of the shell assembly can form a beautiful snowflake appearance effect, and can provide users with a better experience.

In another aspect of the present application, the present application provides a method of preparing the aforementioned housing assembly. According to an embodiment of the present application, the method includes: forming a plurality of contiguous texture areas on the first surface of the housing body, wherein each of the texture areas includes a first sub-texture area and a second sub-texture area, The first sub-texture area has a plurality of micron-level first pits, the second sub-texture area has a plurality of micron-level second pits, and the average maximum radial size of the first pits is larger than that of the first pits. The average maximum radial dimension of the two pits. In the method, the steps are simple, convenient, and easy to operate, and the obtained shell assembly has a uniform, comprehensive and beautiful snowflake appearance effect.

In another aspect of this application, this application provides an electronic device. According to an embodiment of the present application, the electronic device includes: the aforementioned housing assembly, the housing assembly defines an accommodating space; and a display screen, the display screen being arranged in the accommodating space. This electronic device has all the features and advantages of the aforementioned housing assembly, and will not be repeated here.

Description of the drawings

FIG. 1 is a schematic structural diagram of a first surface of a housing body according to an embodiment of the present application.

Fig. 2 is a schematic flowchart of a method for preparing a housing assembly according to an embodiment of the present application.

Fig. 3 is a photograph of the housing assembly of Example 1 of the present application.

Fig. 4 is an enlarged photograph of the position indicated by the circle in Fig. 3.

Fig. 5 is an enlarged photograph of the position indicated by the circle in Fig. 4.

Fig. 6 is an enlarged photograph of the position indicated by the circle in Fig. 5.

Fig. 7 is a photograph of the housing assembly of Example 3 of the present application.

Fig. 8 is an enlarged photograph of the position indicated by the circle in Fig. 7.

Fig. 9 is an enlarged photograph of the position indicated by the circle in Fig. 8.

Fig. 10 is an enlarged photograph of the position indicated by the circle in Fig. 9.

Fig. 11 is a photograph of the housing assembly of Example 4 of the present application.

Fig. 12 is a 100 times enlarged photograph of the position indicated by the circle in Fig. 11.

Fig. 13 is a 1000 times magnified photograph of the position indicated by the circle in Fig. 11.

FIG. 14 is a schematic cross-sectional structure diagram of a housing assembly according to an embodiment of the present application.

Detailed ways

The embodiments of the present application are described in detail below. The embodiments described below are exemplary, and are only used to explain the present application, and cannot be understood as a limitation to the present application. Where specific techniques or conditions are not indicated in the examples, the procedures shall be carried out in accordance with the techniques or conditions described in the literature in the field or in accordance with the product specification. The reagents or instruments used without the manufacturer's indication are all conventional products that can be purchased commercially.

In one aspect of the present application, the present application provides a housing assembly. According to an embodiment of the present application, referring to FIG. 1, the housing assembly includes a housing body 10 having a first surface 11 and a second surface 12, and at least part of the first surface has a plurality of mutually opposite surfaces. Each of the texture areas 20 includes a first sub-texture area 21 and a second sub-texture area 22. The first sub-texture area 21 has a plurality of micron-level first pits 211. The second sub-texture area 22 has a plurality of micron-scale second pits 221, and the average maximum radial size of the first pits 211 is greater than the average maximum radial size of the second pits 221. The surface of the shell assembly can form a good snowflake appearance, which is beautiful and beautiful, and can provide users with a better use experience.

Specifically, under the same angle, the brightness of the first sub-texture area and the second sub-texture area are different. As a result, when viewed by the human eye, a difference of brightness and darkness occurs between the first sub-texture area and the second sub-texture area, and the sub-texture area with greater brightness looks like a piece of snowflakes, thereby effectively forming a snowflake appearance effect.

Specifically, multiple texture areas can be connected to each other, that is, there is no gap between multiple texture areas, and the first sub-texture area and the second sub-texture area in each texture area can also be arranged next to each other, or each texture area The area is composed of a first sub-texture area and a second sub-texture area, so that the first surface of the shell body forming multiple texture areas is completely covered by the texture area without gaps, and the brightness and darkness between different sub-texture areas The difference in combination with its distribution method can better form a beautiful snowflake appearance.

It should be noted that the "micron-scale pit" described in this article means that the maximum radial dimension of the pit is on the micron level (for example, in the range of 1-999 microns), and the maximum radial dimension of the pit refers to the pit. The maximum value of the distance between any two points on the contour line, and other similar descriptions have the same meaning. In addition, the "average maximum radial size of the first pits" described herein refers to the average value of the maximum radial size of all the first pits in each first sub-texture area, and the "average maximum radial size of the second pits" "Maximum radial size" refers to the average of the maximum radial size of all second pits in each second sub-texture area.

In addition, in the description of this application, the terms "first" and "second" are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with "first" and "second" may explicitly or implicitly include one or more of these features. In addition, it should be noted that the sizes of the multiple first pits in each first sub-texture area are not necessarily the same, and may be distributed within a certain range, and the multiple first pits in each second sub-texture area The size of the two pits may not be exactly the same, but may be distributed within a certain range.

It can be understood that the specific shape of the above-mentioned multiple texture regions can be regular geometric shapes or irregular shapes. The regular shapes can be rectangles, triangles, pentagons, hexagons, circles, ellipses, etc. The contour line of the irregular shape can be a polyline, a curve, a straight line, and a combination thereof, etc. In FIG. 1, only a hexagon is taken as an example for illustration, and it cannot be understood as a limitation of the present application.

Specifically, the maximum radial size of the first pit and the maximum radial size of the second pit in the housing assembly of the present application are not greater than 200 microns, such as 10 microns, 20 microns, 30 microns, 40 microns, 50 microns, 60 microns, 70 microns, 80 microns, 90 microns, 100 microns, 110 microns, 120 microns, 130 microns, 140 microns, 150 microns, 160 microns, 170 microns, 180 microns, 190 microns, 200 microns Wait. Within this size range, the housing assembly can present a more beautiful and uniform snowflake appearance. It should be noted that the uniformity of the appearance of snowflakes includes uniform size and uniform distribution. Specifically, size uniformity refers to the small difference between the maximum radial sizes of multiple first sub-texture regions and multiple second sub-texture regions. The difference between the maximum radial dimensions of the texture area is small, and the uniform distribution means that a plurality of first sub-texture areas are substantially evenly distributed on the surface of the shell body, and the second sub-texture area is on the surface of the shell body. Basically evenly distributed.

In some specific embodiments, the maximum radial dimension of the first pit may be 100-120 microns (specifically, 100, 105, 110, 115, 120, etc.); the size of the second pit The maximum radial dimension is 45-70 microns (specifically, 45 microns, 50 microns, 55 microns, 60 microns, 65 microns, 70 microns, etc.). In other specific implementations, the maximum radial dimension of the first pit may be 40 to 45 microns (specifically, 40 microns, 41 microns, 42 microns, 43 microns, 44 microns, 45 microns, etc.); The maximum radial dimension of the pit can be 20-30 microns (specifically, 20 microns, 22 microns, 25 microns, 28 microns, 30 microns, etc.). Therefore, the size between the first pit and the second pit is easier for human eyes to recognize, and the range of the difference is appropriate, which can better match the appearance of snowflakes of different sizes.

In some embodiments, the ratio of the maximum radial dimension of the first pit to the maximum radial dimension of the second pit is (1.3 to 2.7):1, specifically such as 1.3:1, 1.4:1, 1.5 :1, 1.6:1, 1.7:1, 1.8:1, 1.9:1, 2.0:1, 2.1:1, 2.2:1, 2.3:1, 2.4:1, 2.5:1, 2.6:1, 2.7:1 Wait. In some specific embodiments, the ratio of the average maximum radial dimension of the first pits to the average maximum radial dimension of the second pits may be (1.4-2.7):1. In other specific embodiments, the ratio of the average maximum radial dimension of the first pits to the average maximum radial dimension of the second pits may be (1.3-2.3):1. Within this ratio range, human eyes can better distinguish the difference between the first sub-texture area and the second sub-texture area, and it will not cause unsightly appearance because the difference is too large, and it will not be impossible because the difference is too small. Reflect the appearance of snowflakes.

It can be understood that the maximum radial dimension of the first sub-texture area and the second sub-texture area are each independently 0.1-2.5mm, specifically such as 0.1mm, 0.2mm, 0.3mm, 0.4mm, 0.5mm, 0.6 mm, 0.7mm, 0.8mm, 0.9mm, 1.0mm, 1.1mm, 1.2mm, 1.3mm, 1.4mm, 1.5mm, 1.6mm, 1.7mm, 1.8mm, 1.9mm, 2mm, 2.1mm, 2.2mm, 2.3 mm, 2.4mm, 2.5mm, etc. In some embodiments, the maximum radial dimension of the first sub-texture area and the second sub-texture area are independently 0.8-1mm (specifically, 0.8mm, 0.81mm, 0.82mm, 0.83mm, 0.84mm, 0.85mm, 0.86mm, 0.87mm, 0.88mm, 0.9mm, 0.91mm, 0.92mm, 0.93mm, 0.94mm, 0.95mm, 0.96mm, 0.97mm, 0.98mm, 0.99mm, 1mm, etc.). In other embodiments, the maximum radial dimension of the first sub-texture area and the second sub-texture area are independently 0.2 to 0.5 mm (specifically, 0.2 mm, 0.25 mm, 0.3 mm, 0.35 mm, 0.4 mm). mm, 0.45mm, 0.5mm, etc.). In some specific embodiments, the maximum radial size of the plurality of first sub-texture regions and the maximum radial size of the plurality of second sub-texture regions may be 0.5 ± 0.2 mm, 1 ± 0.3 mm, 1.5 ± independently. 0.4mm, 2±0.5mm, etc. Therefore, the housing assembly has a snowflake appearance effect of a suitable size, and will not easily cause leakage during the processing due to the oversize, and will not affect the aesthetics due to the undersize.

In some specific embodiments, the maximum radial dimensions of the first sub-texture area and the second sub-texture area are independently 0.8-1mm (specifically, 0.8mm, 0.81mm, 0.82mm, 0.83mm, 0.84mm). , 0.85mm, 0.86mm, 0.87mm, 0.88mm, 0.9mm, 0.91mm, 0.92mm, 0.93mm, 0.94mm, 0.95mm, 0.96mm, 0.97mm, 0.98mm, 0.99mm, 1mm, etc.); The ratio of the maximum radial size of a pit to the maximum radial size of the second pit is (1.4～2.7):1 (specifically, 1.4:1, 1.5:1, 1.6:1, 1.7:1, 1.8 :1, .9:1, 2.0:1, 2.1:1, 2.2:1, 2.3:1, 2.4:1, 2.5:1, 2.6:1, 2.7:1, etc.); the largest of the first pit The radial dimension is 100-120 microns (specifically, 100 microns, 101 microns, 102 microns, 103 microns, 104 microns, 105 microns, 106 microns, 107 microns, 108 microns, 109 microns, 110 microns, 111 microns, 112 microns, 113 microns, 114 microns, 115 microns, 116 microns, 117 microns, 118 microns, 119 microns, 20 microns, etc.); and the maximum radial dimension of the second pit is 45-70 microns (specifically, 45 microns, 50 microns Micrometers, 55 micrometers, 60 micrometers, 65 micrometers, 70 micrometers, etc.). In a specific embodiment, within this size range, there are about 15 snowflakes in an area of 4 mm×4 mm (see FIG. 4). It should be noted that the description method “snowflake” used in this article refers to the sub-texture area with larger brightness in the first sub-texture area and the second sub-texture area.

In some other specific embodiments, the maximum radial dimension of the first sub-texture area and the second sub-texture area are independently 0.2-0.5mm (specifically, such as 0.2mm, 0.25mm, 0.3mm, 0.35mm, 0.4mm, 0.45mm, 0.5mm, etc.); the ratio of the maximum radial dimension of the first pit to the maximum radial dimension of the second pit is (1.3～2.3):1 (specifically, 1.3:1 , 1.4:1, 1.5:1, 1.6:1, 1.7:1, 1.8:1, 1.9:1, 2.0:1, 2.1:1, 2.2:1, 2.3:1, etc.); The maximum radial dimension is 40 to 45 microns (specifically, 40 microns, 41 microns, 42 microns, 43 microns, 44 microns, 45 microns, etc.); and the maximum radial size of the second pit is 20 to 30 microns ( Specifically, such as 20 micrometers, 21 micrometers, 22 micrometers, 23 micrometers, 24 micrometers, 25 micrometers, 26 micrometers, 27 micrometers, 28 micrometers, 29 micrometers, 30 micrometers, etc.). In one embodiment, within this size range, there are approximately 55 snowflakes in a 4mm×4mm area (see FIG. 8).

Specifically, the ratio between the maximum radial size of the first sub-texture area and the maximum radial size of the second sub-texture area may be 1:0.6 to 1.4, such as 1:0.6, 1:0.7, 1:0.8, 1:0.9, 1:1, 1:1.1, 1:1.2, 1:1.3, 1:1.4, etc. In some embodiments, the difference between the maximum radial dimension of the first sub-texture area and the maximum radial dimension of the second sub-texture area is not greater than 0.5 mm (specifically, 0.5 mm, 0.4 mm, 0.3 mm). , 0.2mm, 0.1mm, etc.). As a result, the appearance of snowflakes is more stable, comprehensive and uniform.

In some embodiments, in a straight line direction, the maximum radial size of the first sub-texture area and the maximum radial size of the second sub-texture area gradually change, and the gradual change includes gradually increasing and gradually smaller At least one of (specifically, gradually increasing, gradually decreasing, first gradually increasing and then gradually decreasing, first gradually decreasing and then gradually increasing, etc.). As a result, the housing assembly can exhibit a gradual snowflake appearance. Further, in the linear direction, the maximum radial size of the first pit and the maximum radial size of the second pit gradually change, and the gradual change includes at least one of gradually increasing and gradually smaller A sort of. Specifically, the change trend of the maximum radial size of the first pit and the maximum radial size of the second pit may be the same as the change of the maximum radial size of the first sub-texture area and the maximum radial size of the second sub-texture area. The trends are the same, so I won’t repeat them here.

It can be understood that the housing body includes at least one of glass, sapphire, and glass-ceramic, where the glass may be high-alumina silica glass. As a result, it has better wear resistance, higher strength, better scratch resistance and impact resistance. When used as a glass component, a thin thickness can meet the requirements of use, and the weight is lighter and can be better. To meet the needs of electronic equipment.

Specifically, the formation position of the aforementioned texture area on the first surface of the housing body can be flexibly selected according to actual needs. In some embodiments, the texture area may be formed on part or all of the first surface; in other embodiments, the texture area may also be formed on multiple surfaces. In a specific embodiment, the housing body includes a first surface and a second surface, and both the first surface and the second surface have a plurality of the texture regions that are connected to each other. Further, the first surface and the second surface are arranged opposite to each other, and in a direction perpendicular to the first surface, the orthographic projection of the multiple texture regions on the first surface and the multiple textures on the second surface The orthographic projections of the regions overlap at least partially. As a result, the appearance of snowflakes overlapping on both sides can be realized.

Specifically, the position where the texture area is formed on the shell body satisfies at least one of the following conditions: the haze may be 75%-85% (specifically, 75%, 76%, 77%, 78%, 79%, 80%, 81%, 82%, 83%, 84%, 85%, etc.); surface roughness can be 0.8-1 micron (specifically 0.8 micron, 0.9 micron, 1 micron, etc.); light transmittance 50% to 65% (specifically, 50%, 51%, 52%, 53%, 54%, 55%, 56%, 57%, 58%, 59%, 60%, 61%, 62%, 63%, 64%, 65%, etc.).

Specifically, referring to FIG. 14, the housing assembly may further include: an ink layer 30, the ink layer 30 is provided on the second surface of the housing body 10, and the ink layer 30 is on the first surface The above orthographic projection covers a plurality of said texture areas 20. Therefore, since the shell body has a beautiful snowflake appearance effect, the shell assembly can be formed by simply spraying ink, and there is no need for complicated decoration film preparation and attaching processes, which greatly simplifies the process and saves costs.

In another aspect of the present application, the present application provides a method of preparing the aforementioned housing assembly. According to an embodiment of the present application, the method includes: forming a plurality of contiguous texture areas on the first surface of the housing body, wherein each of the texture areas includes a first sub-texture area and a second sub-texture area, The first sub-texture area has a plurality of micron-level first pits, the second sub-texture area has a plurality of micron-level second pits, and the average maximum radial size of the first pits is larger than that of the first pits. The average maximum radial dimension of the two pits. As a result, a snowflake appearance effect can be conveniently formed on the casing body.

Specifically, according to the material of the shell body, different methods can be selected to form the texture area. For example, if the shell body is made of plastic material, it can be directly injected with a mold with a textured area. If it is made of ceramic material, it can be formed by CNC machining, laser engraving, etc., and if it is made of glass, it can be The texture area is formed by an etching method.

In some specific embodiments, referring to FIG. 2, the method may include:

S100: forming a plurality of depressions on the first surface of the housing body.

Specifically, in this step, a depression is formed on the first surface of the housing body, which can provide nucleation points for the insoluble salt crystals generated in the subsequent etching step, thereby reducing the energy of crystal growth, reducing the time of crystal growth, and increasing etching The life cycle of the liquid is more conducive to controlling the uniformity and comprehensiveness of the appearance of the snowflake, and it is not easy to cause leakage (that is, no texture is formed on the surface of the shell body). In addition, the formation of recesses to increase the physical lattice defects can effectively compensate for the uneven state of the lattice defects generated by a single chemical etching, so that the appearance of the formed snowflakes is more uniform.

Specifically, the plurality of depressions are formed by at least one method of sandblasting, mold embossing, CNC cold engraving, and laser laser. Specifically, the size of the depression formed on the first surface of the casing body by the above method is relatively small, and can be regarded as a point approximately. The depression point can be used as a nucleation point of the fluorosilicate crystal in the subsequent etching process. In some specific embodiments, a sandblasting method may be selected to form the depressions. As a result, the equipment requirements are lower, the cost is lower, and the economy is better.

Specifically, the sand used in the sandblasting includes at least one of zirconium sand and brown corundum. Therefore, the performance is suitable, the depression formed by sandblasting is more conducive to crystal growth, and the material source is wide and easy to obtain.

Specifically, the particle size of the sand is 40#～2000# (e.g. 40#, 60#, 80#, 100#, 200#, 400#, 500#, 600#, 800#, 1000#, 1200# , 1400#, 1500#, 1800#, 2000#, etc.). Within this particle size range, the size and distribution of the pits formed are appropriate, which is more conducive to crystal growth, and the appearance of the subsequent snowflakes is high and the user experience is good. If the particle size is too small, the size of the snowflakes will be too small, which will affect the aesthetics. , And if the particle size is too large, it will easily cause leakage and affect the overall appearance of the snowflake.

Specifically, the sandblasting distance can be 20-60 cm (specifically, 20 cm, 25 cm, 30 cm, 35 cm, 40 cm, 45 cm, 50 cm, 55 cm, 60 cm, etc.). Within this distance, dents of suitable size and density can be formed, thereby forming a beautiful snowflake appearance. If the distance is too small, the size of the dents formed will be smaller, which is not conducive to the growth of crystals in the subsequent steps, and the size of the obtained snowflakes is too small , And if the distance is too large, it will easily lead to leakage.

Specifically, the sandblasting time may be 1 to 30 seconds (specifically, 1 second, 5 seconds, 10 seconds, 15 seconds, 20 seconds, 25 seconds, 30 seconds, etc.). Within this time range, depressions of suitable size and distribution can be formed, and a highly beautiful snowflake appearance can be obtained. If the time is too short, it is easy to be missed, and if the time is too long, the size of the snowflake is likely to be too small.

In some embodiments, the recesses are formed by sandblasting, and the distance between two adjacent recesses is less than 5mm (specifically, 0.2mm, 0.5mm, 0.8mm, 1mm, 2mm, 3mm, 4mm, 5mm, etc.) . The depressions formed by sandblasting have irregular morphology, which facilitates the growth of crystals during the etching process. Therefore, a good snowflake appearance can be achieved within the above-mentioned pitch range. In some specific embodiments, the surface of the housing body on which the recesses are formed is within the field of view of a 5x optical magnifier, and the number of recesses is 3 to 4, wherein the diameter of the field of view is 1 to 2 mm ( Specifically, such as 1mm, 1.1mm, 1.2mm, 1.3mm, 1.4mm, 1.5mm, 1.6mm, 1.7mm, 1.8mm, 1.9mm, 2mm, etc.). Therefore, the distribution density of the depressions is more suitable, the human eyes are comfortable to see, and the aesthetics is high.

It can be understood that the above-mentioned recesses may be formed on the entire first surface of the housing body, or may be formed on part of the first surface of the housing body. When only formed on a part of the first surface of the housing body, the recesses Previously, a protective film can be formed in advance on a surface that does not need to be recessed.

In some embodiments, the depression can also be formed by mold embossing. Specifically, it can be formed into a recessed housing body in one step during the molding process of the housing body, or the molded housing body can be reheated and then passed through the mold. The embossing forms a depression. In other embodiments, a CNC cold engraving method may be used to form the depressions. At this time, the CNC machine tool's cutting program is preset according to the shape and distribution of the depressions formed, and the processing can be performed according to the predetermined program. In still other embodiments, a laser laser method may be used to form the depressions, specifically, laser laser may be performed according to the distribution and size of the depressions.

Specifically, when the depressions are formed by mold imprinting, CNC cold engraving, and laser laser, the distance between two adjacent depressions may be less than 1mm (specifically, 0.9mm, 0.8mm, 0.7mm, 0.6mm, 0.5mm). mm, 0.4mm, 0.3mm, 0.2mm, 0.1mm, etc.). The depressions formed by the above-mentioned methods are relatively regular, and the ability to promote crystal growth is relatively weak compared with the irregular morphology. Therefore, the distribution density of the depressions can be relatively large to ensure a better appearance of snowflakes.

S200: etching the first surface of the housing body on which the recesses are formed to form a plurality of connected texture regions.

In this step, the etching solution used in the etching can react with the silicon dioxide in the glass to form crystals that are difficult to dissolve in acid. With the continuation of the reaction time, the reactants accumulate into granular crystals and firmly adhere to the surface of the shell body. The surface of the attached housing body hinders the further reaction of the etching, while the surface of the housing body where the crystal is not adhered will continue to be etched, and the crystal will be removed during the cleaning process after etching, and a recess will be formed at the position where the crystal is formed. Pit, and then form the texture area.

Specifically, in terms of mass percentage, the etching solution used in the etching may include: 1-8% (specifically, 1%, 2%, 3%, 4%, 5%, 6%, 7%, 8%, etc.) The main acid is used to etch the shell body; 10-50% (specifically, 10%, 15%, 20%, 25%, 30%, 35%, 40%, 45%, 50% Etc.), the secondary acid is used to replace the alkali metal and alkaline earth metal in the shell body, and to balance the pH; 10-60% (specifically, 10%, 15%, 20%, 25%, 30%). %, 35%, 40%, 45%, 50%, 55%, 60%, etc.), the crystal growth agent is used to react with the shell body to form acid-insoluble fluorosilicon salt crystals ; And the remainder of the solvent. Among them, the role of the main acid is to etch the silicon dioxide network structure in the glass, open the silicon-oxygen covalent bond to etch the shell body; the hydrogen ion in the auxiliary acid can quickly replace the alkali metal and alkaline earth metal elements in the glass (For example, lithium, sodium, potassium, magnesium, calcium, etc.), it can balance the pH and control the appropriate etching rate; and the crystal growth agent can be combined with other components to chemically react with the glass to form acid-insoluble fluorine-silicon salts Crystal. The above reaction processes can generate acid-insoluble fluorine-silicon salt crystals on the glass surface, thereby effectively forming a snowflake texture. The etching solution has a suitable etching rate and is easy to control, and can effectively promote the growth of crystals, and can flexibly control the ratio and distribution of the adhered crystal area and the non-adhered crystal area, thereby obtaining a beautiful snowflake texture.

Specifically, the main acid includes hydrofluoric acid; the side acid includes at least one of sulfuric acid, hydrochloric acid and nitric acid; the crystal growth agent includes hydrofluoride, sulfate, chloride, nitrate, and preferably includes fluorine. Ammonium hydride, potassium fluoride, sodium chloride, potassium chloride, ammonium chloride, sodium nitrate, potassium nitrate, ammonium nitrate, sodium sulfate, potassium sulfate, ammonium sulfate, sodium fluoride, potassium fluoride and ammonium fluoride, etc. The solvent includes water. As a result, each component can better play its corresponding role, and at the same time can be matched with each other to obtain a uniform, comprehensive, stable, and highly beautiful snowflake appearance. In addition, the etching solution of this component is very suitable for high-alumina silica glass, and can effectively form a uniform, stable and comprehensive snowflake appearance on the surface of the high-alumina silica glass.

Specifically, during the etching process, the silicon dioxide structure in the glass is corroded by hydrofluoric acid, breaking the silicon-oxygen bond, causing lattice defects (snowflake nucleation points), and simultaneously generating fluorosilicic acid and water: SiO ₂ (s) +6HF→H ₂ SiF ₆ +2H ₂ O, meanwhile, the alkali metal ion or alkaline earth metal ion M ⁺ in the glass is replaced by the hydrogen ion in the acid: H ⁺ +MO-Si _(glass) →M ⁺ +HO- Si _(glass) , due to the ^{low solubility of fluorosilicic acid and M +} ions, taking potassium ions as an example, potassium fluorosilicate will crystallize on the glass surface: 2K ⁺ +H ₂ SiF ₆ →K ₂ SiF ₆ (s)+ 2H ⁺ . Since the potassium fluorosilicate obtained by the above reaction has high stability, it will hinder the reaction between glass and acid. As the etching progresses, the crystals gradually grow up. After the crystals are removed in the cleaning step after etching, The pits are formed, which in turn creates the appearance of snowflakes.

Furthermore, in glasses with less aluminum content, alkali metals and alkaline earth metals mainly exist in the form of bridging oxygen structure (MO-Si), therefore, the above reaction formula H ⁺ +MO-Si _(glass) → M ⁺ +HO -Si _(glass) can proceed smoothly. However, in the basic structure of high-alumina silica glass, in addition to the silicon-oxygen structure, there is also an aluminum-oxygen structure. Most of the alkali metals and alkaline earth metals M exist in the form of non-bridging oxygen structures. The alkali metal ions and alkaline earth metal ions mainly exist in the aluminum oxide. Around the tetrahedron AlO ₄ , since all oxygen in the aluminox tetrahedron forms a strong covalent bond with aluminum or silicon, hydrogen ions cannot be easily broken, so hydrogen ions cannot be easily tetrahedral with aluminum oxygen. Alkali metals and alkaline earth metals around the body are replaced, and in this application, by adding a crystal growth agent component that can replace the alkali metals and alkaline earth metals in the glass and dissolve in the etching solution into the etching solution, the fluorosilicate is used The high solubility of sodium and ammonium salts, the introduction of fluorine hydride, sulfate, chloride, nitrate to improve the replacement efficiency, such as ammonium fluoride, sodium fluoride, sodium chloride, ammonium chloride, ammonium sulfate, nitric acid Sodium, etc., the cations in the crystal growth agent can react with the main acid and glass to generate H ₂ SiF _{6 to} form high-solubility fluorosilicates (such as sodium and ammonium salts), and the high-solubility fluorosilicates can directly interact with glass reaction insoluble crystalline silicon fluoride-based ^{_{salt: Na + (Acid) + SiF}} 6 2- (Acid) + K + -AlO4 - (glass) → K 2 SiF 6 + Na + -AlO4 - (glass). At the same time, because the high-alumina silica glass has relatively strong corrosion resistance, this application adds a strong acid (such as nitric acid, hydrochloric acid, sulfuric acid, etc.) to the etching solution to balance the pH, which can appropriately speed up the etching rate and improve production efficiency.

Among them, it should be noted that the subscripts of each component in the reaction formula refer to the source of the component, the subscript Acid indicates that the component comes from the acid component in the etching solution, and the subscript glass indicates that the component comes from glass.

Specifically, the etching time may be 2-10 minutes, such as 1 minute, 3 minutes, 4 minutes, 5 minutes, 6 minutes, 7 minutes, 8 minutes, 9 minutes, 10 minutes, etc. Within this time range, the size of the first pit and the second pit formed are appropriate, and the appearance of the obtained snowflake is high in aesthetics.

In some embodiments, in the etching step, the etching solution may be left for a predetermined time so that the etching solution forms a concentration gradient from top to bottom, and then the housing body is immersed in the etching solution, and the housing body is The liquid level of the etching solution is not parallel. Therefore, different positions of the housing body have different depths of immersion in the etching solution, that is, positions with different depths react with different concentrations of the etching solution, and the etching rate is different, so that texture areas of different sizes can be formed, and a gradual snowflake appearance can be realized.

In other embodiments, in the etching step, the etching solution may be heated or cooled above or below the etching solution, so that the etching solution forms a temperature gradient from top to bottom, and then the housing body is immersed in In the etching solution, the housing body and the liquid level of the etching solution are not parallel. Therefore, different positions of the housing body have different depths of immersion in the etching solution, that is, positions with different depths react with the etching solution with different temperatures, and the etching rate is different, so that texture areas of different sizes can be formed, and a gradual snowflake appearance can be realized.

In this method, pre-forming recesses on the first surface of the housing body can provide crystal nuclei for the insoluble crystals generated in the subsequent etching process, thereby reducing the energy of crystal growth, reducing the time of crystal growth, and increasing the etching solution. It has a long life cycle and is more conducive to controlling the uniformity and comprehensiveness of the appearance of snowflakes.

It can be understood that the housing body in the housing assembly can be a flat panel structure, a 2.5D structure, a 3D structure, etc. The specific shape and size can also be flexibly selected according to the needs of the actual electronic device, and will not be repeated here. In some specific embodiments, the housing assembly may only be composed of the aforementioned housing body, or may include other structures and components, such as plastic parts, metal parts, and decorative film layers. In some specific embodiments, the ink layer can be sprayed directly on the surface of the housing body, thereby reducing the cost of the housing assembly. In other embodiments, a decorative film can also be attached to the housing body. The structure can be selected as ink layer, texture layer, color layer, coating layer, etc. according to needs, and will not be repeated here.

In some specific embodiments, the shell assembly can be prepared according to the following steps: white glass (after chipping, opening position, finishing, side polishing, 3D hot bending, polishing) → ink protection surface that does not require etching effect → spraying Sand (make the glass surface uniformly dented by sandblasting) → cleaning (clean the glass surface with water, acid and other chemical reagents) → etching (etch the glass surface with an etching solution to form the required snowflake texture) → remove the ink → chemical polishing (pass Acid or alkali solution is slightly etched to achieve the effect of passivating defects and increasing strength) → chemical strengthening (form a compressive stress layer on the surface of the glass through ion exchange to achieve the effect of increasing the strength of the glass) → decoration (decorate the glass by filming, spraying ink, etc.) ).

In another aspect of this application, this application provides an electronic device. According to an embodiment of the present application, the electronic device includes: the aforementioned housing assembly, the housing assembly defines an accommodating space; and a display screen, the display screen being arranged in the accommodating space. The electronic device housing has all the features and advantages of the aforementioned housing assembly, and will not be repeated here.

Specifically, the specific type of the electronic device can be a mobile phone, a tablet computer, a TV, a game console, a wearable device, etc., and it is understandable that in addition to the electronic device housing and display screen described above, the electronic device also Including the necessary structures and components of conventional electronic equipment. Taking a mobile phone as an example, it may also include a touch module, a fingerprint recognition module, a motherboard, a memory, a camera module, etc., which will not be detailed here.

The embodiments of the present invention are described in detail below.

Example 1

After the white glass opening, hole position, finishing, side polishing, 3D hot bending and polishing steps, the high alumina silicon shell body is obtained, and the ink protection film is formed on the surface of the high aluminum silicon glass shell body that does not need to form a snowflake appearance. , And then use 240# brown steel grit to blast the exposed surface of the high-alumina silica glass shell body with a blasting distance of 50cm for 3 seconds, and then clean the blasted surface to remove the remaining sand and impurities, and then use 5% The etching solution of hydrofluoric acid, 25% hydrochloric acid, 55% hydrogen fluoride and 15% water etches the sandblasted surface for 4 minutes. After removing the ink protection layer, the shell assembly is obtained through chemical polishing and chemical strengthening. See the photo Figure 3, the partially enlarged optical microscope photos are shown in Figure 4, Figure 5 and Figure 6. It can be clearly seen from the figure that sub-texture areas with different pit sizes are formed on the surface of the shell body. The maximum radial size of each sub-texture area is about 1 mm. The maximum radial size of the pit is about 48-68 microns, and the maximum radial size of the pit in the sub-texture area with a larger pit size is about 100-110 microns.

Example 2

Same as Example 1, the difference is: sandblasting uses 200# zirconium sand, the sandblasting distance is 40cm, the sandblasting time is 1s, and the etching solution used contains 3% hydrofluoric acid, 15% sulfuric acid, 25% potassium cyanide fluoride and 57% water, the etching time is 8 minutes. The surface morphology of the obtained shell body is similar to that of Example 1, and the size of the sub-texture area and the size of the pits are slightly different.

Example 3

Same as Example 1, the difference lies in that the etching solution used contains 2% hydrofluoric acid, 10% hydrochloric acid, 20% nitric acid, 50% hydrogen fluoride, and 18% water. The etching time is 6 minutes. The resulting photo of the housing assembly See Figure 7, and the partially enlarged optical microscope photos are shown in Figure 8, Figure 9, and Figure 10. It can be clearly seen from the figure that sub-texture areas with different pit sizes are formed on the surface of the shell body. The maximum radial size of each sub-texture area is about 0.2～0.45mm, while the sub-texture area with a smaller pit size The maximum radial size of the pits in is about 20-28 microns, and the maximum radial size of the pits in the sub-texture area with a larger pit size is about 40-45 microns.

Example 4

After the white glass opening, hole position, finishing, side polishing, 3D hot bending and polishing steps, the high aluminum silicon shell body is obtained. The ink protection film is formed on the surface of the high aluminum silicon shell body that does not need to form a snowflake appearance. Then an etching solution containing 10% hydrofluoric acid, 25% hydrochloric acid, 25% hydrogen fluoride and 40% water is used to etch the surface of the glass for 4 minutes. After removing the ink protection layer, the shell is obtained by chemical polishing and chemical strengthening. The components, the photos are shown in Figure 11, and the partially enlarged optical microscope photos are shown in Figure 12 and Figure 13. It can be seen from the figure that the appearance of snowflakes is not evenly and comprehensively covered on the surface of the shell body, and there is a leaky area. From the enlarged view, it can be seen directly that the leaky area on the surface of the shell body is not obvious. The pit morphology.

Example 5

Laser engraving is used to form a textured area on the surface of the mold, and the mold with the textured area is used to form a plastic shell body, and then the shell body is subjected to the steps of filming, silk screen ink, CNC processing, etc. as needed to obtain the shell assembly, the shell assembly Its structure is similar to that of Examples 1-4, showing a better appearance of snowflakes.

In the description of this specification, descriptions with reference to the terms "one embodiment", "some embodiments", "examples", "specific examples", or "some examples" etc. mean specific features described in conjunction with the embodiment or example , The structure, materials, or characteristics are included in at least one embodiment or example of the present application. In this specification, the schematic representations of the above-mentioned terms do not necessarily refer to the same embodiment or example. Moreover, the described specific features, structures, materials or characteristics can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine and combine the different embodiments or examples and the features of the different embodiments or examples described in this specification without contradicting each other.

Although the embodiments of the present application have been shown and described above, it can be understood that the above-mentioned embodiments are exemplary and should not be construed as limiting the present application. A person of ordinary skill in the art can comment on the foregoing within the scope of the present application. The embodiment undergoes changes, modifications, substitutions, and modifications.

Claims

A housing assembly, characterized by comprising: a housing body, the housing body has a first surface and a second surface, at least part of the first surface has a plurality of texture areas that are connected to each other, each The texture area includes a first sub-texture area and a second sub-texture area, the first sub-texture area has a plurality of micron-level first pits, and the second sub-texture area has a plurality of micron-level second pits , The average maximum radial dimension of the first pits is greater than the average maximum radial dimension of the second pits.
The housing assembly of claim 1, wherein under the same angle, the brightness of the first sub-texture area and the second sub-texture area are different.
The housing assembly according to claim 1 or 2, wherein the maximum radial dimension of the first pit and the maximum radial dimension of the second pit are both not greater than 200 microns.
The housing assembly according to any one of claims 1 to 3, wherein the maximum radial dimension of the first recess is 100 to 120 microns;

The maximum radial dimension of the second pit is 45-70 microns.
The housing assembly according to any one of claims 1 to 4, wherein the maximum radial dimension of the first recess is 40 to 45 microns; and

The maximum radial dimension of the second pit is 20-30 microns.
The housing assembly according to any one of claims 1 to 5, wherein the ratio of the average maximum radial dimension of the first dimple to the average maximum radial dimension of the second dimple is ( 1.3～2.7):1.
The housing assembly according to any one of claims 1 to 6, wherein the position where the texture area is formed on the housing body satisfies at least one of the following conditions:

The haze is 75%-85%;

The surface roughness is 0.8～1 micron;

The light transmittance is 50% to 65%.
The housing assembly according to any one of claims 1 to 7, wherein the maximum radial dimension of the first sub-texture area and the second sub-texture area are each independently 0.1-2.5 mm.
The housing assembly according to any one of claims 1 to 8, characterized in that it satisfies any one of the following conditions:

The maximum radial dimensions of the first sub-texture area and the second sub-texture area are 0.8-1 mm independently of each other;

The maximum radial dimensions of the first sub-texture area and the second sub-texture area are independently 0.2-0.5 mm.
The housing assembly according to any one of claims 1-9, wherein the ratio between the maximum radial dimension of the first sub-texture area and the maximum radial dimension of the second sub-texture area It is 1:0.6～1.4.
The housing assembly according to any one of claims 1 to 10, wherein the difference between the maximum radial dimension of the first sub-texture area and the maximum radial dimension of the second sub-texture area The value is not more than 0.5mm.
The housing assembly according to any one of claims 1 to 11, wherein, in a linear direction, the maximum radial dimension of the first sub-texture area and the maximum diameter of the second sub-texture area are It gradually changes to the size, and the gradual change includes at least one of gradually increasing and gradually decreasing.
The housing assembly according to claim 12, wherein in the linear direction, the maximum radial size of the first pit and the maximum radial size of the second pit gradually change, and the The gradual change includes at least one of gradually increasing and gradually decreasing.
The housing assembly according to any one of claims 1 to 13, wherein the housing body comprises at least one of glass, sapphire, and glass-ceramic, and the glass comprises high-alumina silica glass.
The housing assembly according to any one of claims 1 to 14, wherein each of the first surface and the second surface has a plurality of the texture regions that are connected to each other.
The housing assembly according to claim 15, wherein the first surface and the second surface are arranged opposite to each other, and in a direction perpendicular to the first surface, a plurality of The orthographic projection of the texture region and the orthographic projection of the plurality of texture regions on the second surface at least partially overlap.
The housing assembly according to claim 15 or 16, further comprising:

The ink layer is arranged on the second surface of the casing body, and the orthographic projection of the ink layer on the first surface covers a plurality of the texture regions.
A method for preparing a housing assembly, which is characterized in that it comprises:

A plurality of contiguous texture areas are formed on the first surface of the casing body, wherein each of the texture areas includes a first sub-texture area and a second sub-texture area, and the first sub-texture area has a plurality of micrometers. The second sub-texture area has a plurality of micron-sized second pits, and the average maximum radial size of the first pits is greater than the average maximum radial size of the second pits.
The method of claim 18, comprising:

Forming a plurality of depressions on the first surface of the housing body;

The first surface of the casing body on which the recesses are formed is etched to form a plurality of connected texture regions.
The method according to claim 19, wherein the plurality of depressions are formed by at least one of sandblasting, mold embossing, CNC cold engraving, and laser laser.
The method according to claim 20, wherein the sandblasting satisfies at least one of the following conditions:

The sand used for the sandblasting includes at least one of zirconium sand and brown corundum;

The particle size of the sand is 40#～2000#;

The blasting distance is 20～60cm;

The blasting time is 1 to 30 seconds.
22. The method according to any one of claims 19-21, wherein the depression satisfies at least one of the following conditions:

The recesses are formed by sandblasting, and the distance between two adjacent recesses is less than 5 mm;

The recesses are formed by at least one method of die stamping, CNC cold engraving and laser laser, and the distance between two adjacent recesses is less than 1 mm.
The method according to any one of claims 19-22, wherein the number of the recesses is 3 to 4 within the field of view of a 5x optical magnifier, wherein the diameter of the field of view is 1 ~ 2mm.
22. The method according to any one of claims 19 to 23, characterized in that, in terms of mass percentage, the etching liquid used in the etching comprises:

1-8% of the main acid, the main acid is used to etch the housing body;

10-50% of the secondary acid, the secondary acid is used to replace the alkali metal and alkaline earth metal in the shell body and balance the pH;

10-60% crystal growth agent, which is used to generate acid-insoluble fluorosilicon salt crystals; and

The remainder of the solvent.
The method of claim 24, wherein the main acid comprises hydrofluoric acid;

The side acid includes at least one of sulfuric acid, hydrochloric acid and nitric acid;

The crystal growth agent includes fluorine hydride, sulfate, chloride, nitrate, preferably includes fluorine hydride, potassium fluoride, sodium chloride, potassium chloride, ammonium chloride, sodium nitrate, potassium nitrate, ammonium nitrate, At least one of sodium sulfate, potassium sulfate, ammonium sulfate, sodium fluoride, potassium fluoride, ammonium fluoride, etc.;

The solvent includes water.
The method according to any one of claims 19-25, wherein the etching time is 2-10 minutes.
The method according to any one of claims 19 to 26, wherein the etching comprises at least one of the following:

Standing the etching solution for a predetermined time so that the etching solution forms a concentration gradient from top to bottom, and then immersing the housing body in the etching solution, and the housing body is not parallel to the liquid level of the etching solution;

The etching solution is heated or cooled above or below the etching solution, so that the etching solution forms a temperature gradient from top to bottom, and then the housing body is immersed in the etching solution. It is not parallel to the liquid level of the etching solution.
An electronic device, characterized in that it includes:

The housing assembly according to any one of claims 1 to 17, the housing assembly defining an accommodation space;

A display screen, the display screen is arranged in the accommodating space.