WO2021235037A8 - 蛍光x線分析装置 - Google Patents

蛍光x線分析装置 Download PDF

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WO2021235037A8
WO2021235037A8 PCT/JP2021/006935 JP2021006935W WO2021235037A8 WO 2021235037 A8 WO2021235037 A8 WO 2021235037A8 JP 2021006935 W JP2021006935 W JP 2021006935W WO 2021235037 A8 WO2021235037 A8 WO 2021235037A8
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PCT/JP2021/006935
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WO2021235037A1 (ja
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由行 片岡
泰彦 名越
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株式会社リガク
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Priority to CN202180006207.8A priority Critical patent/CN114641687B/zh
Priority to EP21807987.9A priority patent/EP4036563B1/en
Publication of WO2021235037A1 publication Critical patent/WO2021235037A1/ja
Publication of WO2021235037A8 publication Critical patent/WO2021235037A8/ja
Priority to US17/733,626 priority patent/US11513086B2/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2209Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using wavelength dispersive spectroscopy [WDS]
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/07Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076X-ray fluorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/10Different kinds of radiation or particles
    • G01N2223/101Different kinds of radiation or particles electromagnetic radiation
    • G01N2223/1016X-ray
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/30Accessories, mechanical or electrical features
    • G01N2223/303Accessories, mechanical or electrical features calibrating, standardising
    • G01N2223/3037Accessories, mechanical or electrical features calibrating, standardising standards (constitution)
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/30Accessories, mechanical or electrical features
    • G01N2223/304Accessories, mechanical or electrical features electric circuits, signal processing
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/30Accessories, mechanical or electrical features
    • G01N2223/306Accessories, mechanical or electrical features computer control
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/30Accessories, mechanical or electrical features
    • G01N2223/32Accessories, mechanical or electrical features adjustments of elements during operation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/30Accessories, mechanical or electrical features
    • G01N2223/321Accessories, mechanical or electrical features manipulator for positioning a part
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/30Accessories, mechanical or electrical features
    • G01N2223/33Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/60Specific applications or type of materials
    • G01N2223/611Specific applications or type of materials patterned objects; electronic devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/60Specific applications or type of materials
    • G01N2223/633Specific applications or type of materials thickness, density, surface weight (unit area)
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/60Specific applications or type of materials
    • G01N2223/64Specific applications or type of materials multiple-sample chamber, multiplicity of materials

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Dispersion Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

本発明の走査型蛍光X線分析装置が備えるトータル分析時間表示手段は、分析対象の試料の品種ごとに、成分の含有率が標準値として既知である標準試料を測定して成分に対応する測定線ごとに測定強度を求める。トータル分析時間表示手段は、さらに、成分ごとに、標準値および測定強度を用いて、指定された分析精度が得られる計数時間を計算するとともに、各成分の計数時間の合計として合計計数時間を計算する。トータル分析時間表示手段は、その合計計数時間と合計非計数時間との和としてトータル分析時間を計算し、計算したトータル分析時間および計算した各成分の計数時間を出力する。
PCT/JP2021/006935 2020-05-18 2021-02-24 蛍光x線分析装置 WO2021235037A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN202180006207.8A CN114641687B (zh) 2020-05-18 2021-02-24 荧光x射线分析装置
EP21807987.9A EP4036563B1 (en) 2020-05-18 2021-02-24 X-ray fluorescence spectrometer
US17/733,626 US11513086B2 (en) 2020-05-18 2022-04-29 X-ray fluorescence spectrometer

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020086629A JP7190749B2 (ja) 2020-05-18 2020-05-18 蛍光x線分析装置
JP2020-086629 2020-05-18

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US17/733,626 Continuation US11513086B2 (en) 2020-05-18 2022-04-29 X-ray fluorescence spectrometer

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WO2021235037A1 WO2021235037A1 (ja) 2021-11-25
WO2021235037A8 true WO2021235037A8 (ja) 2022-03-24

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US (1) US11513086B2 (ja)
EP (1) EP4036563B1 (ja)
JP (1) JP7190749B2 (ja)
CN (1) CN114641687B (ja)
WO (1) WO2021235037A1 (ja)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7190749B2 (ja) * 2020-05-18 2022-12-16 株式会社リガク 蛍光x線分析装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2592134Y2 (ja) * 1993-09-22 1999-03-17 理学電機工業株式会社 蛍光x線分析装置における試料の装填装置
JP3291251B2 (ja) 1998-08-19 2002-06-10 理学電機工業株式会社 蛍光x線分析装置
JP3291253B2 (ja) 1998-08-27 2002-06-10 理学電機工業株式会社 蛍光x線分析装置
JP2002310953A (ja) * 2001-04-17 2002-10-23 Kawasaki Steel Corp 表面処理被膜の付着量測定方法及び装置
JP3823155B2 (ja) 2003-09-26 2006-09-20 理学電機工業株式会社 雰囲気置換機能を備えたx線分析方法
JP4253610B2 (ja) * 2004-04-09 2009-04-15 株式会社日立ハイテクノロジーズ 電子線検査装置
JP5506288B2 (ja) 2008-08-28 2014-05-28 株式会社日立ハイテクサイエンス 蛍光x線分析装置
JP5540235B2 (ja) 2010-06-23 2014-07-02 株式会社リガク X線分析装置および発光分析装置
EP3239702B1 (en) * 2015-08-28 2019-03-27 Rigaku Corporation X-ray fluorescence spectrometer
CN206274315U (zh) * 2016-10-31 2017-06-23 宝山钢铁股份有限公司 提高x荧光光谱仪真空系统抽气速度的装置
JP6614740B2 (ja) 2017-03-15 2019-12-04 株式会社リガク 蛍光x線分析方法、蛍光x線分析プログラムおよび蛍光x線分析装置
JP6601854B1 (ja) 2018-06-21 2019-11-06 株式会社リガク 蛍光x線分析システム
JP6732347B1 (ja) * 2019-03-29 2020-07-29 株式会社リガク 蛍光x線分析装置
JP7190749B2 (ja) * 2020-05-18 2022-12-16 株式会社リガク 蛍光x線分析装置

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Publication number Publication date
WO2021235037A1 (ja) 2021-11-25
US11513086B2 (en) 2022-11-29
JP7190749B2 (ja) 2022-12-16
EP4036563A1 (en) 2022-08-03
JP2021181897A (ja) 2021-11-25
EP4036563A4 (en) 2023-02-22
CN114641687B (zh) 2022-10-14
EP4036563B1 (en) 2024-03-20
US20220260506A1 (en) 2022-08-18
CN114641687A (zh) 2022-06-17

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