WO2021235037A8 - 蛍光x線分析装置 - Google Patents
蛍光x線分析装置 Download PDFInfo
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- WO2021235037A8 WO2021235037A8 PCT/JP2021/006935 JP2021006935W WO2021235037A8 WO 2021235037 A8 WO2021235037 A8 WO 2021235037A8 JP 2021006935 W JP2021006935 W JP 2021006935W WO 2021235037 A8 WO2021235037 A8 WO 2021235037A8
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- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
- G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
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- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2209—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using wavelength dispersive spectroscopy [WDS]
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- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
- G01N2223/1016—X-ray
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
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- G01N2223/3037—Accessories, mechanical or electrical features calibrating, standardising standards (constitution)
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- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/306—Accessories, mechanical or electrical features computer control
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- G—PHYSICS
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- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/32—Accessories, mechanical or electrical features adjustments of elements during operation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/321—Accessories, mechanical or electrical features manipulator for positioning a part
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/33—Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/611—Specific applications or type of materials patterned objects; electronic devices
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/633—Specific applications or type of materials thickness, density, surface weight (unit area)
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/64—Specific applications or type of materials multiple-sample chamber, multiplicity of materials
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Dispersion Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
本発明の走査型蛍光X線分析装置が備えるトータル分析時間表示手段は、分析対象の試料の品種ごとに、成分の含有率が標準値として既知である標準試料を測定して成分に対応する測定線ごとに測定強度を求める。トータル分析時間表示手段は、さらに、成分ごとに、標準値および測定強度を用いて、指定された分析精度が得られる計数時間を計算するとともに、各成分の計数時間の合計として合計計数時間を計算する。トータル分析時間表示手段は、その合計計数時間と合計非計数時間との和としてトータル分析時間を計算し、計算したトータル分析時間および計算した各成分の計数時間を出力する。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202180006207.8A CN114641687B (zh) | 2020-05-18 | 2021-02-24 | 荧光x射线分析装置 |
EP21807987.9A EP4036563B1 (en) | 2020-05-18 | 2021-02-24 | X-ray fluorescence spectrometer |
US17/733,626 US11513086B2 (en) | 2020-05-18 | 2022-04-29 | X-ray fluorescence spectrometer |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020086629A JP7190749B2 (ja) | 2020-05-18 | 2020-05-18 | 蛍光x線分析装置 |
JP2020-086629 | 2020-05-18 |
Related Child Applications (1)
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US17/733,626 Continuation US11513086B2 (en) | 2020-05-18 | 2022-04-29 | X-ray fluorescence spectrometer |
Publications (2)
Publication Number | Publication Date |
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WO2021235037A1 WO2021235037A1 (ja) | 2021-11-25 |
WO2021235037A8 true WO2021235037A8 (ja) | 2022-03-24 |
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PCT/JP2021/006935 WO2021235037A1 (ja) | 2020-05-18 | 2021-02-24 | 蛍光x線分析装置 |
Country Status (5)
Country | Link |
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US (1) | US11513086B2 (ja) |
EP (1) | EP4036563B1 (ja) |
JP (1) | JP7190749B2 (ja) |
CN (1) | CN114641687B (ja) |
WO (1) | WO2021235037A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP7190749B2 (ja) * | 2020-05-18 | 2022-12-16 | 株式会社リガク | 蛍光x線分析装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2592134Y2 (ja) * | 1993-09-22 | 1999-03-17 | 理学電機工業株式会社 | 蛍光x線分析装置における試料の装填装置 |
JP3291251B2 (ja) | 1998-08-19 | 2002-06-10 | 理学電機工業株式会社 | 蛍光x線分析装置 |
JP3291253B2 (ja) | 1998-08-27 | 2002-06-10 | 理学電機工業株式会社 | 蛍光x線分析装置 |
JP2002310953A (ja) * | 2001-04-17 | 2002-10-23 | Kawasaki Steel Corp | 表面処理被膜の付着量測定方法及び装置 |
JP3823155B2 (ja) | 2003-09-26 | 2006-09-20 | 理学電機工業株式会社 | 雰囲気置換機能を備えたx線分析方法 |
JP4253610B2 (ja) * | 2004-04-09 | 2009-04-15 | 株式会社日立ハイテクノロジーズ | 電子線検査装置 |
JP5506288B2 (ja) | 2008-08-28 | 2014-05-28 | 株式会社日立ハイテクサイエンス | 蛍光x線分析装置 |
JP5540235B2 (ja) | 2010-06-23 | 2014-07-02 | 株式会社リガク | X線分析装置および発光分析装置 |
EP3239702B1 (en) * | 2015-08-28 | 2019-03-27 | Rigaku Corporation | X-ray fluorescence spectrometer |
CN206274315U (zh) * | 2016-10-31 | 2017-06-23 | 宝山钢铁股份有限公司 | 提高x荧光光谱仪真空系统抽气速度的装置 |
JP6614740B2 (ja) | 2017-03-15 | 2019-12-04 | 株式会社リガク | 蛍光x線分析方法、蛍光x線分析プログラムおよび蛍光x線分析装置 |
JP6601854B1 (ja) | 2018-06-21 | 2019-11-06 | 株式会社リガク | 蛍光x線分析システム |
JP6732347B1 (ja) * | 2019-03-29 | 2020-07-29 | 株式会社リガク | 蛍光x線分析装置 |
JP7190749B2 (ja) * | 2020-05-18 | 2022-12-16 | 株式会社リガク | 蛍光x線分析装置 |
-
2020
- 2020-05-18 JP JP2020086629A patent/JP7190749B2/ja active Active
-
2021
- 2021-02-24 CN CN202180006207.8A patent/CN114641687B/zh active Active
- 2021-02-24 WO PCT/JP2021/006935 patent/WO2021235037A1/ja active Application Filing
- 2021-02-24 EP EP21807987.9A patent/EP4036563B1/en active Active
-
2022
- 2022-04-29 US US17/733,626 patent/US11513086B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
WO2021235037A1 (ja) | 2021-11-25 |
US11513086B2 (en) | 2022-11-29 |
JP7190749B2 (ja) | 2022-12-16 |
EP4036563A1 (en) | 2022-08-03 |
JP2021181897A (ja) | 2021-11-25 |
EP4036563A4 (en) | 2023-02-22 |
CN114641687B (zh) | 2022-10-14 |
EP4036563B1 (en) | 2024-03-20 |
US20220260506A1 (en) | 2022-08-18 |
CN114641687A (zh) | 2022-06-17 |
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