WO2021169483A1 - Dispositif et procédé d'élimination d'ions métalliques lourds dans un liquide résiduaire photovoltaïque - Google Patents

Dispositif et procédé d'élimination d'ions métalliques lourds dans un liquide résiduaire photovoltaïque Download PDF

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WO2021169483A1
WO2021169483A1 PCT/CN2020/135218 CN2020135218W WO2021169483A1 WO 2021169483 A1 WO2021169483 A1 WO 2021169483A1 CN 2020135218 W CN2020135218 W CN 2020135218W WO 2021169483 A1 WO2021169483 A1 WO 2021169483A1
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resin
metal
adsorption column
adsorption
resin adsorption
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蒋新
赵会
施利君
屠金玲
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苏州晶洲装备科技有限公司
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C02F1/285—Treatment of water, waste water, or sewage by sorption using synthetic organic sorbents
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • C02F1/5281—Installations for water purification using chemical agents
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/66—Treatment of water, waste water, or sewage by neutralisation; pH adjustment
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C02F2101/20—Heavy metals or heavy metal compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2301/00—General aspects of water treatment
    • C02F2301/08—Multistage treatments, e.g. repetition of the same process step under different conditions
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/16—Regeneration of sorbents, filters
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling

Definitions

  • This application relates to the technical field of waste liquid recovery and treatment, and in particular to a device and method for removing heavy metal ions in photovoltaic waste liquid.
  • the wet-process black silicon technology uses gold, silver and other precious metal particles randomly attached to the surface of the silicon wafer as the cathode, and silicon as the anode. At the same time, a microelectrochemical reaction channel is formed on the silicon surface, and the silicon substrate is quickly etched under the metal particles to form a nanostructure.
  • Chemical solvents such as KOH, HNO 3 , H 2 O 2 , ammonia, hydrofluoric acid, etc. are also used in polishing, digging, desilvering, and reaming in the production process. Therefore, the wet black silicon technology will generate a large amount of silver ions. And other heavy metal ions such as zinc, iron, manganese, copper, nickel, chromium, cadmium and other waste acid solutions.
  • the content of silver ions is the largest, about 98800ppb, the content of nitric acid is about 30% to 35%, hydrofluoric acid is 3% to 4%, and fluorosilicic acid is 4% to 5%. If it is directly disposed of as hazardous waste, this It will undoubtedly cause a great waste of resources. Therefore, in consideration of maximizing resource utilization, it is necessary to recycle the nitric acid, hydrofluoric acid, and metal ion silver.
  • the best technology for recovering nitric acid and hydrofluoric acid in waste mixed acid is diffusion dialysis. Its advantage is that the recovery rate of nitric acid and hydrofluoric acid is high, which can reach 80% to 90%, and the recovery device occupies a small area and is easy to operate. , And almost no energy consumption, but the disadvantage is that it will produce about the same volume of dialysate, and the dialysate contains about 90% of the original solution of metal ions and about 10% to 20% acid. Due to the large metal ion content and low pH of this dialysate, it cannot be directly discharged. It must be treated before it can be discharged to the factory. Otherwise, it will cause environmental pollution and the loss of precious metals contained in the dialysate will also cause Economic losses.
  • the purpose of this application is to provide a device for removing heavy metal ions in photovoltaic waste liquid, which has a simple overall structure, can realize the collection of different metal ions step by step, improves resource recovery and utilization, and improves environmental protection while reducing production and processing. cost.
  • this application also provides a method for removing heavy metal ions in photovoltaic waste liquid, combining the characteristics of the dialysate, while gradually adjusting and increasing the pH value, it is The adsorption and separation of different metal ions improves the resource recovery rate.
  • This application provides a device for removing heavy metal ions in photovoltaic waste liquid, which is used to process the dialysis liquid after diffusion dialysis treatment of the waste liquid produced by wet-process black silicon, including a multi-stage series-connected first metal adsorption mechanism, The second metal adsorption mechanism and the third metal adsorption mechanism perform adsorption and removal of different metal ions through the first metal adsorption mechanism, the second metal adsorption mechanism and the third metal adsorption mechanism respectively.
  • the first metal adsorption mechanism and the second metal adsorption mechanism The second metal adsorption mechanism and the third metal adsorption mechanism are respectively provided with resin adsorption columns for selectively adsorbing corresponding metal ions;
  • the first metal adsorption mechanism, the second metal adsorption mechanism and the third metal adsorption mechanism are respectively provided with a first elution mechanism, a second elution mechanism and a third elution mechanism.
  • each metal adsorption mechanism includes a buffer tank, a transfer pump and a resin adsorption column, and the buffer tank is used for storage
  • the pH value of the wastewater is adjusted, the inlet end of the delivery pump is connected to the buffer tank, and the outlet end is connected to the lower part of the resin adsorption column, and the upper part of the resin adsorption column is passed into the next-stage mechanism.
  • the buffer tanks in the first metal adsorption mechanism, the second metal adsorption mechanism and the third metal adsorption mechanism are all jacketed and electrically stirred reactors.
  • the resin adsorption column in the first metal adsorption mechanism adopts a mercapto-type chelating resin adsorption column or a carboxymethyl chitosan thiourea resin adsorption column
  • the resin adsorption column in the second metal adsorption mechanism adopts It is an imino oxalic acid chelating resin adsorption column
  • the resin adsorption column in the third metal adsorption mechanism uses an amine chelating resin.
  • each elution mechanism includes a high-pressure purge gas path, an eluent storage tank, and a recovery tank
  • the inlet of the high-pressure purge gas path is located at the top of the resin adsorption column
  • the outlet of the eluent storage tank is connected with the eluent inlet on the resin adsorption column
  • the bottom end of the resin adsorption column is provided with an eluent
  • An outlet, the eluent outlet is connected to the recovery tank through a pipeline.
  • a coagulation sedimentation tank is provided at the rear end of the third metal adsorption mechanism, the wastewater treated by the third metal adsorption mechanism is discharged into the coagulation sedimentation tank, and the coagulation sedimentation tank is After adding coagulation and precipitation agent, it is used to remove aluminum ions in wastewater.
  • this application also provides a method for removing heavy metal ions in photovoltaic waste liquid, which is used to treat the dialysis liquid after the diffusion dialysis treatment of the waste liquid produced by wet-process black silicon.
  • the processing steps include:
  • the dialysate is transported to the first buffer tank for pH adjustment, the pH value is controlled to 2 to 4, and then the dialysate in the first buffer tank is fed from below the first resin adsorption column through the first transfer pump for adsorption treatment The latter dialysate is sent from above the first resin adsorption column and flows into the second buffer tank of the next stage;
  • the liquid flowing out from the first resin adsorption column is sent to the second buffer tank for pH adjustment, the pH value is controlled to 5-6, and then the dialysis liquid in the second buffer tank is transferred from the second resin through the second transfer pump
  • the dialysis solution after the adsorption treatment is sent from the top of the second resin adsorption column to flow into the third buffer tank of the next stage;
  • the liquid flowing out of the second resin adsorption column is sent to the third buffer tank for pH adjustment, and the pH value is controlled to 6-7, and then the dialysate in the third buffer tank is transferred from the third resin through the third transfer pump.
  • the dialysis liquid after the adsorption treatment is sent out from the top of the third resin adsorption column;
  • the metal ions adsorbed on the resin surface are eluted and recovered.
  • the liquid flowing out from above the third resin adsorption column enters the coagulation sedimentation tank, the pH value of the liquid in the coagulation sedimentation tank is adjusted to 7-8, and then the coagulation sedimentation agent is added and then stirred , Settling, filtering, and processing after the supernatant in the coagulation sedimentation tank reaches the standard.
  • first buffer tank, the second buffer tank, and the third buffer tank are all jacketed and heatable stirrable reactors, and the liquid temperature of the reactor is controlled at 15-20°C.
  • dilute nitric acid or dilute hydrochloric acid is used as the eluent for the saturated resin adsorption column .
  • the heavy metal ion removal device in the photovoltaic waste liquid of this application adopts a multi-stage metal adsorption mechanism, which selectively adsorbs and removes heavy metal ions in the dialysate and cleaning liquid, and passes through the metal adsorption mechanism in each level.
  • Different types of resin adsorption columns are set up to perform directional adsorption and removal of different metal ions. After the adsorption is saturated, the surface of the resin used for adsorption is eluted by the eluent, and the metal ions are recovered, thereby realizing metal reuse, especially It is the recovery of precious metals such as gold and silver.
  • a coagulation precipitation tank is used in the device to add a coagulation precipitation agent to the dialysate to remove aluminum ions, so as to maximize the removal of metal ions in the dialysate. It can meet the emission standards, or it can be discharged to the field for recycling.
  • the method for removing heavy metal ions in photovoltaic waste liquid of the present application utilizes the different forces between different metals and resin functional groups, so that different resin adsorption columns can selectively adsorb heavy metal ions, so as to achieve the separation of heavy metals. Recycling metals, especially precious metals such as gold and silver, play a vital role. At the same time, due to the selective adsorption of heavy metals, the removal rate of heavy metals is as high as 90%. At the same time, the pH value of the wastewater is adjusted step by step, so that the treated wastewater can meet the discharge standard, which greatly reduces the wastewater treatment cost of the enterprise. Therefore, the promotion of this method can ensure high economic and environmental benefits.
  • FIG. 1 is a schematic diagram of the overall structure of a device for removing heavy metal ions in photovoltaic waste liquid according to an embodiment of the present application.
  • first”, “second”, and “third” are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance, such as the first heating tube, the second heating tube, and the third heating tube, It is to be able to describe the product structure more clearly, not to limit its importance.
  • Adsorption resin refers to a type of high molecular polymer, which can be used to remove organic matter in wastewater, decolorize sugar liquid, separate and refine natural products and biochemical products, etc. There are many kinds of adsorption resins, and the changes of monomers and functional groups on the monomers can give the resin various special properties. Commonly used are high molecular polymers such as polystyrene resin and polyacrylate resin.
  • Adsorbent resin is a resin adsorbent with a porous three-dimensional structure characterized by adsorption. It is a porous resin newly developed in the polymer field in recent years.
  • the resin adsorption column in this application is constructed by carrying a specific adsorption resin in a columnar container.
  • This embodiment describes a device for removing heavy metal ions in photovoltaic waste liquid, which is used to process the dialysis liquid after the diffusion dialysis treatment of the waste liquid produced by wet-process black silicon, including a multi-stage series-connected first metal adsorption mechanism , The second metal adsorption mechanism and the third metal adsorption mechanism are respectively used to adsorb and remove different metal ions through the first metal adsorption mechanism, the second metal adsorption mechanism and the third metal adsorption mechanism.
  • the first metal adsorption mechanism, The second metal adsorption mechanism and the third metal adsorption mechanism are respectively provided with resin adsorption columns for selectively adsorbing corresponding metal ions.
  • the first metal adsorption mechanism, the second metal adsorption mechanism and the third metal adsorption mechanism are basically the same in structure, wherein the first metal adsorption mechanism includes a first buffer tank 1, a first delivery pump 2, and The first resin adsorption column 3, the first buffer tank 1 is used to store waste water and adjust the pH value therein, the liquid inlet end of the first delivery pump 2 is connected to the first buffer tank 1, the first delivery pump 2 The outlet end of the first resin adsorption column 3 is connected to the lower part of the first resin adsorption column 3, and the upper part of the first resin adsorption column 3 passes into the next level mechanism, that is, the second buffer tank 4 of the second metal adsorption mechanism. .
  • the second metal adsorption mechanism includes a second buffer tank 4, a second transfer pump 5, and a second resin adsorption column 6.
  • the second buffer tank 4 receives the wastewater from the first resin adsorption column 3 and adjusts the pH value
  • the inlet end of the second delivery pump 5 is connected to the second buffer tank 4
  • the outlet end of the second delivery pump 5 is connected to the lower part of the second resin adsorption column 6.
  • the upper part of the second resin adsorption column 6 passes into the next level mechanism, that is, the third buffer tank 7 of the third metal adsorption mechanism.
  • the third metal adsorption mechanism includes a third buffer tank 7, a third transfer pump 8 and a third resin adsorption column 9.
  • the third buffer tank 7 receives wastewater from the second resin adsorption column 6 and adjusts the pH value therein.
  • the inlet end of the third delivery pump 8 is connected to the third buffer tank 7, and the outlet end of the third delivery pump 8 is connected to the lower part of the third resin adsorption column 9, and the third resin adsorption column
  • the upper part of 9 leads to the next level of organization area for processing, such as discharge or other processing.
  • the device corresponds to the first metal adsorption mechanism, the second metal adsorption mechanism and the third metal adsorption mechanism respectively provided with a first elution mechanism, a second elution mechanism and The third elution mechanism.
  • the buffer tanks in the first metal adsorption mechanism, the second metal adsorption mechanism and the third metal adsorption mechanism are all jacketed and electrically stirred reactors.
  • the liquid can be heated and stirred.
  • the resin adsorption column in the first metal adsorption mechanism adopts a mercapto-type chelating resin adsorption column or a carboxymethyl chitosan thiourea resin adsorption column, and the selected mercapto-type chelating resin adsorption column or a carboxymethyl chelating resin adsorption column is used.
  • Methyl chitosan thiourea resin because of its high selective adsorption performance for gold ions and silver ions, and high elution rate (>90%), good reusability, currently observed in repeated use 5 times Afterwards, its adsorption capacity is not significantly reduced, and the above two types of resins can effectively separate and recover precious metals from mixed metal wastewater to achieve relatively high purity and recovery rate.
  • the resin adsorption column in the second metal adsorption mechanism adopts imino oxalic acid chelating resin adsorption column.
  • the selected imino oxalic acid chelating resin is mostly Amberlite IRC-718 type, Lewatit TP-207 type, the above two types of chelating resins show a high adsorption effect on iron ions, zinc ions, and manganese ions.
  • the resin adsorption column in the third metal adsorption mechanism uses amine chelating resins, such as Dowex M-4195, Purolite S-985, Diaion CR-20 and other types of amine chelating resins can be used. Copper ion, nickel ion, chromium ion, cadmium ion, lead ion and other ions are selectively adsorbed.
  • amine chelating resins such as Dowex M-4195, Purolite S-985, Diaion CR-20 and other types of amine chelating resins can be used. Copper ion, nickel ion, chromium ion, cadmium ion, lead ion and other ions are selectively adsorbed.
  • the waste liquid can be transported to the coagulation sedimentation tank 10 after most of the metal ions are processed through the above steps, and the mixing is provided at the rear end of the third metal adsorption mechanism.
  • the upper end of the third resin adsorption column 9 is connected to the coagulation sedimentation tank 10, and the wastewater treated by the third metal adsorption mechanism is discharged into the coagulation sedimentation tank 10.
  • the coagulation sedimentation tank 10 is used to remove aluminum ions in wastewater after adding a coagulation sedimentation agent. Adding coagulation precipitation agent to directional removal of aluminum ions.
  • each elution mechanism includes a high-pressure purge gas path, eluent storage tanks 16, 18, and a recovery tank 13. 14.
  • the inlet of the high-pressure purge gas path is located at the top of the resin adsorption column, and the outlets of the eluent storage tanks 16, 18 are respectively connected to the eluent inlet on the corresponding resin adsorption column, and the resin adsorption column
  • An eluent outlet is provided at the bottom end of the eluate, and the eluent outlet is connected to the corresponding recovery tanks 13, 14 through pipelines.
  • This application also provides a method for removing heavy metal ions in photovoltaic waste liquid.
  • the method is based on the device described in Example 1, and is used to perform diffusion dialysis treatment on the waste liquid produced by wet-process black silicon. Processing, the processing steps include:
  • the dialysate is transported to the first buffer tank 1 for pH adjustment.
  • the first buffer tank 1 is a jacketed and heatable stirrable reactor.
  • the temperature of the solution in the reactor is adjusted to 15-20°C.
  • the adsorption rate of the first resin adsorption column 3 is relatively high under the pH value.
  • the first resin adsorption column 3 is a resin type that selectively adsorbs gold and silver ions, such as a mercapto-type chelating resin adsorption column, carboxymethyl chitosan thiourea resin;
  • the liquid flowing out from the first resin adsorption column 3 is sent to the second buffer tank 4 for pH adjustment.
  • the second buffer tank 4 is a jacketed, heatable and stirrable reactor.
  • the temperature of the solution is 15-20°C, take a sample at the sampling port under the second buffer tank 4, measure the H+ concentration, calculate the amount of lye such as NaOH or KOH that needs to be added, and adjust the pH to about 2 to 4, if the pH is greater than this range , Can be adjusted by adding dilute nitric acid, at this pH value, the adsorption rate of the first resin adsorption column 3 is higher.
  • the second resin adsorption column 6 is a resin type that selectively adsorbs metal ions such as iron, zinc, copper, manganese, etc., and imino oxalic acid chelating resins can be used, such as Amberlite IRC-718 type, Lewatit TP- Type 207;
  • the liquid flowing out from the second resin adsorption column 6 is sent to the third buffer tank 7 for pH adjustment.
  • the temperature of the solution is 15-20°C, take a sample at the sampling port below the third buffer tank 7, measure the H+ concentration, calculate the amount of lye such as NaOH or KOH that needs to be added, and adjust the pH to about 2 to 4, if the pH is greater than this range , Can be adjusted by adding dilute nitric acid, at this pH value, the adsorption rate of the first resin adsorption column 3 is higher.
  • the third resin adsorption column 9 is a resin type that selectively adsorbs copper ions, nickel ions, chromium ions, cadmium ions, and lead ions.
  • Amine chelating resins can be used, such as Dowex M-4195, Purolite S-985, Diaion CR -20 and other types of amine chelating resins.
  • the liquid flowing out from the top of the third resin adsorption column 9 enters the coagulation sedimentation tank 10, adjust the temperature of the solution in the coagulation sedimentation tank 10 to 15-20 °C, and take a sample at the upper sampling port to measure the content of each component Content, adjust the pH to 7-8, add a coagulation precipitation agent, such as polyaluminum chloride, polyaluminum sulfate, polyaluminum phosphate, polyferric sulfate, polyferric chloride, Polymeric ferric phosphate, polyferrous iron and anionic, such as polymeric silicic acid, etc., are stirred, filtered, precipitated, the supernatant is taken to measure the content of each component, and after reaching the standard, it is discharged through the output water pump 12 or sent to the factory.
  • a coagulation precipitation agent such as polyaluminum chloride, polyaluminum sulfate, polyaluminum phosphate, polyferric sulfate, poly
  • samples are taken regularly at the outlets above the first, second, and third resin adsorption columns 9 to measure the content of each component. If the content of each component in the effluent is found to increase, it indicates that the adsorption has reached saturation and needs to be eluted.
  • dilute nitric acid or dilute hydrochloric acid is used as the eluent for the saturated resin adsorption column , The metal ions adsorbed on the resin surface are eluted and recovered.
  • first resin adsorption column 3 Take the first resin adsorption column 3 that needs to be eluted as an example.
  • the eluent of the first resin adsorption column 3 uses dilute nitric acid instead of hydrochloric acid, because if dilute hydrochloric acid is used, it will react with silver ions to form a silver chloride precipitate, which is easy to adhere to the resin particles, which is good for the second resin adsorption
  • the column 6 or the third resin adsorption column 9 is used for elution, not only dilute nitric acid but also dilute hydrochloric acid can be used for elution.
  • the second resin adsorption column 6 or the third resin adsorption column 9 can use the same An eluent storage tank.
  • the eluate of the first resin adsorption column 3 is supplied from the first eluate storage tank 16 through the first elution pump 17, while the second resin adsorption column 6 and the third resin adsorption column
  • the eluent of 9 is supplied from the second eluent storage tank 18 through the second eluent pump 19.
  • the eluent enters from the top of the first resin adsorption column 3 and flows out of the first resin adsorption column 3 from below. In this process, the flow rate is adjusted within a proper range, and the eluent flows out. Collected in the first recovery tank 13, relatively, the eluate that flows out when the second resin adsorption column 6 is eluted will enter the second recovery tank 14, and the third resin adsorption column 9 will be eluted. The eluent flowing out at this time will enter the third recovery tank 15.
  • the first recovery tank 13 contains relatively high concentrations of silver ions and gold ions, which can be oriented for subsequent processing to recover gold and silver elements, and so on, and the second recovery tank 14 also contains relatively high concentrations of iron, zinc, copper, and manganese.
  • the second recovery tank 14 also contains relatively high concentrations of copper ions, nickel ions, chromium ions, cadmium ions, and lead ions.
  • the adsorption-purge-elution-purge-adsorption process is carried out cyclically as described above to achieve the recovery of different types of metal ions, especially gold and silver ions, and the removal of other ions.
  • the treated water metal The ion meets the national first-level sewage discharge standard and is easy to operate.

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Abstract

L'invention concerne un dispositif et un procédé d'élimination d'ions métalliques lourds dans un liquide résiduaire photovoltaïque, appartenant au domaine technique de la récupération et du traitement de déchets liquides. Le dispositif adopte différents mécanismes d'absorption de métal, chaque mécanisme d'absorption de métal absorbe sélectivement des ions de métal lourd dans une solution de dialyse et une solution de nettoyage, et enfin, les ions de métal lourd sont éliminés et récupérés.
PCT/CN2020/135218 2020-02-26 2020-12-10 Dispositif et procédé d'élimination d'ions métalliques lourds dans un liquide résiduaire photovoltaïque WO2021169483A1 (fr)

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CN202010119857.0A CN111233202A (zh) 2020-02-26 2020-02-26 多级选择性去除光伏废液中重金属离子的装置和方法
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PCT/CN2020/135218 WO2021169483A1 (fr) 2020-02-26 2020-12-10 Dispositif et procédé d'élimination d'ions métalliques lourds dans un liquide résiduaire photovoltaïque

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CN115246689A (zh) * 2022-05-25 2022-10-28 上海三及新材料科技有限公司 一种化抛水洗液废酸回收工艺

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CN111233202A (zh) * 2020-02-26 2020-06-05 苏州晶洲装备科技有限公司 多级选择性去除光伏废液中重金属离子的装置和方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1303354A (zh) * 1998-07-10 2001-07-11 美国过滤公司 从废水中离子交换除去金属离子
WO2010071599A1 (fr) * 2008-12-17 2010-06-24 Hydrochem (S) Pte Ltd Procédé de traitement d’eaux usées produites dans un procédé de production d’acide aromatique
CN102268537A (zh) * 2011-08-15 2011-12-07 广西银亿科技矿冶有限公司 一种从红土镍矿中提取钴镍的方法
CN102583822A (zh) * 2012-02-09 2012-07-18 湖南大学 一种去除提钒废水中重金属离子的方法
US20160211040A1 (en) * 2013-08-23 2016-07-21 Hitachi-Ge Nuclear Energy, Ltd. Method of Treating Radioactive Liquid Waste and Radioactive Liquid Waste Treatment Apparatus
CN107217142A (zh) * 2017-07-04 2017-09-29 南京大学 一种分质回收复杂重金属的耐酸螯合树脂组合调控方法
CN111233202A (zh) * 2020-02-26 2020-06-05 苏州晶洲装备科技有限公司 多级选择性去除光伏废液中重金属离子的装置和方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5613501B2 (fr) * 1973-11-14 1981-03-28
JPS6059011B2 (ja) * 1977-03-01 1985-12-23 ユニチカ株式会社 吸着処理方法
CN102351343A (zh) * 2011-07-08 2012-02-15 南开大学 一种采用絮凝工艺有效去除水中残留铝的方法
CN105174556B (zh) * 2015-10-16 2017-10-24 南京大学 一种高酸高铁重金属废水分质资源回收的方法
CN106219661B (zh) * 2016-08-30 2019-12-10 上海交通大学 一种用于废水中多种重金属同步去除与分离的方法
CN206901813U (zh) * 2017-05-19 2018-01-19 深圳市绿恩环保技术有限公司 一种重金属废水的处理装置
CN207827913U (zh) * 2018-01-15 2018-09-07 湖南永清环保研究院有限责任公司 一种重金属吸附处理装置
CN208561989U (zh) * 2018-07-13 2019-03-01 佛山市高明左右铝业有限公司 一种生产铝制品的无重金属废水处理装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1303354A (zh) * 1998-07-10 2001-07-11 美国过滤公司 从废水中离子交换除去金属离子
WO2010071599A1 (fr) * 2008-12-17 2010-06-24 Hydrochem (S) Pte Ltd Procédé de traitement d’eaux usées produites dans un procédé de production d’acide aromatique
CN102268537A (zh) * 2011-08-15 2011-12-07 广西银亿科技矿冶有限公司 一种从红土镍矿中提取钴镍的方法
CN102583822A (zh) * 2012-02-09 2012-07-18 湖南大学 一种去除提钒废水中重金属离子的方法
US20160211040A1 (en) * 2013-08-23 2016-07-21 Hitachi-Ge Nuclear Energy, Ltd. Method of Treating Radioactive Liquid Waste and Radioactive Liquid Waste Treatment Apparatus
CN107217142A (zh) * 2017-07-04 2017-09-29 南京大学 一种分质回收复杂重金属的耐酸螯合树脂组合调控方法
CN111233202A (zh) * 2020-02-26 2020-06-05 苏州晶洲装备科技有限公司 多级选择性去除光伏废液中重金属离子的装置和方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115246689A (zh) * 2022-05-25 2022-10-28 上海三及新材料科技有限公司 一种化抛水洗液废酸回收工艺

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