WO2021169482A1 - Dispositif et procédé d'élimination sélective en plusieurs étapes d'ions de métaux lourds dans un liquide résiduaire photovoltaïque - Google Patents

Dispositif et procédé d'élimination sélective en plusieurs étapes d'ions de métaux lourds dans un liquide résiduaire photovoltaïque Download PDF

Info

Publication number
WO2021169482A1
WO2021169482A1 PCT/CN2020/135178 CN2020135178W WO2021169482A1 WO 2021169482 A1 WO2021169482 A1 WO 2021169482A1 CN 2020135178 W CN2020135178 W CN 2020135178W WO 2021169482 A1 WO2021169482 A1 WO 2021169482A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin
adsorption
metal
adsorption column
buffer tank
Prior art date
Application number
PCT/CN2020/135178
Other languages
English (en)
Chinese (zh)
Inventor
蒋新
赵会
施利君
屠金玲
Original Assignee
苏州晶洲装备科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 苏州晶洲装备科技有限公司 filed Critical 苏州晶洲装备科技有限公司
Publication of WO2021169482A1 publication Critical patent/WO2021169482A1/fr

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00Multistage treatment of water, waste water or sewage
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/28Treatment of water, waste water, or sewage by sorption
    • C02F1/285Treatment of water, waste water, or sewage by sorption using synthetic organic sorbents
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/52Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/52Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • C02F1/5281Installations for water purification using chemical agents
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/66Treatment of water, waste water, or sewage by neutralisation; pH adjustment
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00Nature of the contaminant
    • C02F2101/10Inorganic compounds
    • C02F2101/20Heavy metals or heavy metal compounds
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2301/00General aspects of water treatment
    • C02F2301/08Multistage treatments, e.g. repetition of the same process step under different conditions
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00Specific treatment goals
    • C02F2303/16Regeneration of sorbents, filters
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

Definitions

  • the application relates to the technical field of environmental protection treatment, in particular to the technical field of waste liquid recovery treatment, and in particular to a device for multi-stage selective removal of heavy metal ions in silicon texturing wastewater.
  • wet black silicon technology uses gold, silver and other precious metal particles randomly attached to the surface of the silicon wafer as the cathode, and silicon as the anode. At the same time, a micro-electrochemical reaction channel is formed on the silicon surface, and the silicon substrate is quickly etched under the metal particles to form a nanostructure.
  • Chemical solvents such as KOH, HNO3, H2O2, ammonia, hydrofluoric acid, etc. are also used in polishing, digging, desilvering and reaming in the production process. Therefore, wet black silicon technology will generate a large amount of silver ions and other heavy metal ions. Such as waste acid solution of zinc, iron, manganese, copper, nickel, chromium, cadmium, etc.
  • the content of silver ions is the largest, about 98800ppb, the content of nitric acid is about 30% to 35%, hydrofluoric acid is 3% to 4%, and fluorosilicic acid is 4% to 5%. If it is directly disposed of as hazardous waste, this It will undoubtedly cause a great waste of resources. Therefore, in consideration of maximizing resource utilization, it is necessary to recycle the nitric acid, hydrofluoric acid, and metal ion silver.
  • the best technology for recovering nitric acid and hydrofluoric acid in waste mixed acid is diffusion dialysis. Its advantage is that the recovery rate of nitric acid and hydrofluoric acid is high, which can reach 80% to 90%, and the recovery device occupies a small area and is easy to operate. , And almost no energy consumption, but the disadvantage is that it will produce about the same volume of dialysate, and the dialysate contains about 90% of the original solution of metal ions and about 10% to 20% acid. Due to the large metal ion content and low pH of this dialysate, it cannot be directly discharged. It must be treated before it can be discharged to the factory. Otherwise, it will cause environmental pollution and the loss of precious metals contained in the dialysate will also cause Economic losses.
  • the purpose of this application is to provide a multi-stage selective removal of heavy metal ions in photovoltaic waste liquid. Its overall structure is simple, and it can collect different metal ions step by step, improve resource recovery and utilization, and improve environmental protection at the same time. Can reduce production and processing costs.
  • the present application also provides a multi-stage method for selectively removing heavy metal ions in photovoltaic waste liquid. Combining with the characteristics of the dialysate, it can adjust and increase the pH value step by step, and realize the improvement of gold, silver, iron, zinc, copper, manganese, and lead. The adsorption and separation of the three different metal ions of chromium, nickel and cadmium improves the resource recovery rate.
  • This application provides a multi-stage selective removal of heavy metal ions in photovoltaic waste liquid, which is used to treat the dialysis liquid after the diffusion dialysis treatment of the waste liquid produced by wet-process black silicon, including a multi-stage series-connected first
  • the metal adsorption mechanism, the second metal adsorption mechanism, and the third metal adsorption mechanism perform adsorption and removal of different metal ions through the first metal adsorption mechanism, the second metal adsorption mechanism, and the third metal adsorption mechanism.
  • the adsorption mechanism, the second metal adsorption mechanism and the third metal adsorption mechanism are respectively provided with resin adsorption columns for selectively adsorbing corresponding metal ions.
  • each metal adsorption mechanism includes a buffer tank, a transfer pump and a resin adsorption column, and the buffer tank is used for storage
  • the pH value of the wastewater is adjusted, the inlet end of the delivery pump is connected to the buffer tank, and the outlet end is connected to the lower part of the resin adsorption column, and the upper part of the resin adsorption column is passed into the next-stage mechanism.
  • the resin adsorption column in the first metal adsorption mechanism adopts a mercapto-type chelating resin adsorption column or a carboxymethyl chitosan thiourea resin adsorption column
  • the resin adsorption column in the second metal adsorption mechanism adopts It is an imino oxalic acid chelating resin adsorption column
  • the resin adsorption column in the third metal adsorption mechanism uses an amine chelating resin.
  • the device is respectively provided with a first elution mechanism, a second elution mechanism and a third elution mechanism corresponding to each metal adsorption mechanism, and the first elution mechanism, the second elution mechanism and the third elution mechanism
  • the structure of the mechanism is basically the same.
  • Each elution mechanism includes a high-pressure purge gas path, an eluent storage tank, and a recovery tank.
  • the inlet of the high-pressure purge gas path is located at the top of the resin adsorption column.
  • the outlet of the storage tank is connected with the eluent inlet on the resin adsorption column, the bottom end of the resin adsorption column is provided with an eluent outlet, and the eluent outlet is connected with the recovery tank through a pipeline.
  • the buffer tanks in the first metal adsorption mechanism, the second metal adsorption mechanism and the third metal adsorption mechanism are all jacketed and electrically stirred reactors.
  • a coagulation sedimentation tank is provided at the rear end of the third metal adsorption mechanism, the wastewater treated by the third metal adsorption mechanism is discharged into the coagulation sedimentation tank, and the coagulation sedimentation tank is After adding coagulation and precipitation agent, it is used to remove aluminum ions in wastewater.
  • this application also provides a multi-stage method for selectively removing heavy metal ions in photovoltaic waste liquid, which is used to treat the dialysis liquid after the diffusion dialysis treatment of the waste liquid produced by wet-process black silicon.
  • the processing steps include :
  • the dialysate is transported to the first buffer tank for pH adjustment, the pH value is controlled to 2 to 4, and then the dialysate in the first buffer tank is fed from below the first resin adsorption column through the first transfer pump for adsorption treatment The latter dialysate is sent from above the first resin adsorption column and flows into the second buffer tank of the next stage;
  • the liquid flowing out from the first resin adsorption column is sent to the second buffer tank for pH adjustment, the pH value is controlled to 5-6, and then the dialysis liquid in the second buffer tank is transferred from the second resin through the second transfer pump
  • the dialysis solution after the adsorption treatment is sent from the top of the second resin adsorption column to flow into the third buffer tank of the next stage;
  • the liquid flowing out from the second resin adsorption column is sent to the third buffer tank for pH adjustment, and the pH value is controlled to 6-7, and then the dialysate in the third buffer tank is transferred from the third resin through the third transfer pump.
  • the dialysis solution after the adsorption treatment is sent out from the top of the third resin adsorption column.
  • the liquid flowing out from above the third resin adsorption column enters the coagulation sedimentation tank, the pH value of the liquid in the coagulation sedimentation tank is adjusted to 7-8, and then the coagulation sedimentation agent is added and then stirred , Settling, filtering, and processing after the supernatant in the coagulation sedimentation tank reaches the standard.
  • first buffer tank, the second buffer tank, and the third buffer tank are all jacketed and heatable stirrable reactors, and the liquid temperature of the reactor is controlled at 15-20°C.
  • any one of the first resin adsorption column, the second resin adsorption column, and the third resin adsorption column reaches adsorption saturation
  • dilute nitric acid or dilute hydrochloric acid is used as the eluent for the saturated resin adsorption column ,
  • the metal ions adsorbed on the resin surface are eluted and recovered.
  • the multi-stage selective removal of heavy metal ions in photovoltaic waste liquid of this application uses a multi-stage metal adsorption mechanism to selectively adsorb and remove heavy metal ions in the dialysate and cleaning liquid, and pass through each level of metal respectively.
  • Different types of resin adsorption columns set in the adsorption mechanism perform directional adsorption and removal of different metal ions. After the adsorption is saturated, the surface of the resin used for adsorption is eluted by the eluent, and the metal ions are recovered to achieve metal Reuse, especially for the recovery of precious metals such as gold and silver.
  • a coagulation precipitation tank is used in the device to add a coagulation precipitation agent to the dialysate to remove aluminum ions, so as to maximize the removal of metal ions in the dialysate. It can meet the emission standards, or it can be discharged to the field for recycling.
  • the multi-stage selective removal of heavy metal ions in photovoltaic waste liquid of the present application utilizes the different forces between different metals and resin functional groups, so that different resin adsorption columns can selectively adsorb heavy metal ions, thereby achieving separation Heavy metals play a vital role in the subsequent recovery of metals, especially precious metals such as gold and silver.
  • the removal rate of heavy metals is as high as 90%.
  • the pH value of the wastewater is adjusted step by step, so that the treated wastewater can meet the discharge standard, which greatly reduces the wastewater treatment cost of the enterprise. Therefore, the promotion of this method can ensure high economic and environmental benefits.
  • Fig. 1 is a schematic diagram of the overall structure of a multi-stage selective removal of heavy metal ions in photovoltaic waste liquid according to an embodiment of the present application.
  • first”, “second”, and “third” are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance, such as the first heating tube, the second heating tube, and the third heating tube, It is to be able to describe the product structure more clearly, not to limit its importance.
  • Adsorption resin refers to a type of high molecular polymer, which can be used to remove organic matter in wastewater, decolorize sugar liquid, separate and refine natural products and biochemical products, etc. There are many kinds of adsorption resins, and the changes of monomers and functional groups on the monomers can give the resin various special properties. Commonly used are high molecular polymers such as polystyrene resin and polyacrylate resin.
  • Adsorbent resin is a resin adsorbent with a porous three-dimensional structure characterized by adsorption. It is a porous resin newly developed in the polymer field in recent years.
  • the resin adsorption column in this application is constructed by carrying a specific adsorption resin in a columnar container.
  • This embodiment describes a multi-stage selective removal of heavy metal ions in photovoltaic waste liquid, which is used to treat the dialysis liquid after the diffusion dialysis treatment of the waste liquid produced by wet-process black silicon, including multi-stage series connection
  • a metal adsorption mechanism, a second metal adsorption mechanism, and a third metal adsorption mechanism are used to adsorb and remove different metal ions through the first metal adsorption mechanism, the second metal adsorption mechanism, and the third metal adsorption mechanism, respectively.
  • the metal adsorption mechanism, the second metal adsorption mechanism and the third metal adsorption mechanism are respectively provided with resin adsorption columns for selectively adsorbing corresponding metal ions.
  • the first metal adsorption mechanism, the second metal adsorption mechanism and the third metal adsorption mechanism are basically the same in structure, wherein the first metal adsorption mechanism includes a first buffer tank 1, a first delivery pump 2, and The first resin adsorption column 3, the first buffer tank 1 is used to store waste water and adjust the pH value therein, the liquid inlet end of the first delivery pump 2 is connected to the first buffer tank 1, the first delivery pump 2 The outlet end of the first resin adsorption column 3 is connected to the lower part of the first resin adsorption column 3, and the upper part of the first resin adsorption column 3 passes into the next level mechanism, that is, the second buffer tank 4 of the second metal adsorption mechanism. .
  • the second metal adsorption mechanism includes a second buffer tank 4, a second transfer pump 5, and a second resin adsorption column 6.
  • the second buffer tank 4 receives the wastewater from the first resin adsorption column 3 and adjusts the pH value
  • the inlet end of the second delivery pump 5 is connected to the second buffer tank 4
  • the outlet end of the second delivery pump 5 is connected to the lower part of the second resin adsorption column 6.
  • the upper part of the second resin adsorption column 6 passes into the next level mechanism, that is, the third buffer tank 7 of the third metal adsorption mechanism.
  • the third metal adsorption mechanism includes a third buffer tank 7, a third transfer pump 8 and a third resin adsorption column 9.
  • the third buffer tank 7 receives wastewater from the second resin adsorption column 6 and adjusts the pH value therein.
  • the inlet end of the third delivery pump 8 is connected to the third buffer tank 7, and the outlet end of the third delivery pump 8 is connected to the lower part of the third resin adsorption column 9, and the third resin adsorption column
  • the upper part of 9 leads to the next level of organization area for processing, such as discharge or other processing.
  • the buffer tanks in the first metal adsorption mechanism, the second metal adsorption mechanism and the third metal adsorption mechanism are all jacketed and electrically stirred reactors.
  • the liquid can be heated and stirred.
  • the resin adsorption column in the first metal adsorption mechanism adopts a mercapto-type chelating resin adsorption column or a carboxymethyl chitosan thiourea resin adsorption column, and the selected mercapto-type chelating resin adsorption column or a carboxymethyl chelating resin adsorption column is used.
  • Methyl chitosan thiourea resin because of its high selective adsorption performance for gold ions and silver ions, and high elution rate (>90%), good reusability, currently observed in repeated use 5 times Afterwards, its adsorption capacity is not significantly reduced, and the above two types of resins can effectively separate and recover precious metals from mixed metal wastewater to achieve relatively high purity and recovery rate.
  • the resin adsorption column in the second metal adsorption mechanism adopts imino oxalic acid chelating resin adsorption column.
  • the selected imino oxalic acid chelating resin is mostly Amberlite IRC-718 type, Lewatit TP-207 type, the above two types of chelating resins show a high adsorption effect on iron ions, zinc ions, and manganese ions.
  • the resin adsorption column in the third metal adsorption mechanism uses amine chelating resins, such as Dowex M-4195, Purolite S-985, Diaion CR-20 and other types of amine chelating resins can be used. Copper ion, nickel ion, chromium ion, cadmium ion, lead ion and other ions are selectively adsorbed.
  • amine chelating resins such as Dowex M-4195, Purolite S-985, Diaion CR-20 and other types of amine chelating resins can be used. Copper ion, nickel ion, chromium ion, cadmium ion, lead ion and other ions are selectively adsorbed.
  • the waste liquid can be transported to the coagulation sedimentation tank 10 after most of the metal ions are processed through the above steps, and the mixing is provided at the rear end of the third metal adsorption mechanism.
  • the upper end of the third resin adsorption column 9 is connected to the coagulation sedimentation tank 10, and the wastewater treated by the third metal adsorption mechanism is discharged into the coagulation sedimentation tank 10.
  • the coagulation sedimentation tank 10 is used to remove aluminum ions in wastewater after adding a coagulation sedimentation agent. Adding coagulation precipitation agent to directional removal of aluminum ions.
  • the device corresponds to the first metal adsorption mechanism, the second metal adsorption mechanism and the third metal adsorption mechanism, respectively, provided with a first elution mechanism, a second elution mechanism and
  • the third elution mechanism, the structure of the first elution mechanism, the second elution mechanism and the third elution mechanism are basically the same, wherein each elution mechanism includes a high-pressure purge gas path and an eluent storage tank 16 , 18 and recovery tanks 13, 14, the inlet of the high-pressure purge gas path is located at the top of the resin adsorption column, and the outlets of the eluent storage tanks 16, 18 are respectively connected to the eluent inlet on the corresponding resin adsorption column An eluent outlet is provided at the bottom end of the resin adsorption column, and the eluent outlet is connected to the corresponding recovery tanks 13, 14
  • This application also provides a method for multi-stage selective removal of heavy metal ions in photovoltaic waste liquid.
  • the method is based on the device described in Example 1, and is used to treat the waste liquid produced by wet-process black silicon after diffusion dialysis.
  • the dialysate is processed, and the processing steps include:
  • the dialysate is transported to the first buffer tank 1 for pH adjustment.
  • the first buffer tank 1 is a jacketed and heatable stirrable reactor.
  • the temperature of the solution in the reactor is adjusted to 15-20°C.
  • the adsorption rate of the first resin adsorption column 3 is relatively high under the pH value.
  • the first resin adsorption column 3 is a resin type that selectively adsorbs gold and silver ions, such as a mercapto-type chelating resin adsorption column, carboxymethyl chitosan thiourea resin;
  • the liquid flowing out from the first resin adsorption column 3 is sent to the second buffer tank 4 for pH adjustment.
  • the second buffer tank 4 is a jacketed, heatable and stirrable reactor.
  • the temperature of the solution is 15-20°C, take a sample at the sampling port under the second buffer tank 4, measure the H+ concentration, calculate the amount of lye such as NaOH or KOH that needs to be added, and adjust the pH to about 2 to 4, if the pH is greater than this range , Can be adjusted by adding dilute nitric acid, at this pH value, the adsorption rate of the first resin adsorption column 3 is higher.
  • the second resin adsorption column 6 is a resin type that selectively adsorbs metal ions such as iron, zinc, copper, manganese, etc., and imino oxalic acid chelating resins can be used, such as Amberlite IRC-718 type, Lewatit TP- Type 207;
  • the liquid flowing out from the second resin adsorption column 6 is sent to the third buffer tank 7 for pH adjustment.
  • the temperature of the solution is 15-20°C, take a sample at the sampling port below the third buffer tank 7, measure the H+ concentration, calculate the amount of lye such as NaOH or KOH that needs to be added, and adjust the pH to about 2 to 4, if the pH is greater than this range , Can be adjusted by adding dilute nitric acid, at this pH value, the adsorption rate of the first resin adsorption column 3 is higher.
  • the third resin adsorption column 9 is a resin type that selectively adsorbs copper ions, nickel ions, chromium ions, cadmium ions, and lead ions.
  • Amine chelating resins can be used, such as Dowex M-4195, Purolite S-985, Diaion CR -20 and other types of amine chelating resins.
  • the liquid flowing out from the top of the third resin adsorption column 9 enters the coagulation sedimentation tank 10, adjust the temperature of the solution in the coagulation sedimentation tank 10 to 15-20 °C, and take a sample at the upper sampling port to measure the content of each component Content, adjust the pH to 7-8, add a coagulation precipitation agent, such as polyaluminum chloride, polyaluminum sulfate, polyaluminum phosphate, polyferric sulfate, polyferric chloride, Polymeric ferric phosphate, polyferrous iron and anionic, such as polymeric silicic acid, etc., are stirred, filtered, precipitated, the supernatant is taken to measure the content of each component, and after reaching the standard, it is discharged through the output water pump 12 or sent to the factory.
  • a coagulation precipitation agent such as polyaluminum chloride, polyaluminum sulfate, polyaluminum phosphate, polyferric sulfate, poly
  • samples are taken regularly at the outlets above the first, second, and third resin adsorption columns 9 to measure the content of each component. If the content of each component in the effluent is found to increase, it indicates that the adsorption has reached saturation and needs to be eluted.
  • dilute nitric acid or dilute hydrochloric acid is used as the eluent for the saturated resin adsorption column , The metal ions adsorbed on the resin surface are eluted and recovered.
  • first resin adsorption column 3 Take the first resin adsorption column 3 that needs to be eluted as an example.
  • the eluent of the first resin adsorption column 3 uses dilute nitric acid instead of hydrochloric acid, because if dilute hydrochloric acid is used, it will react with silver ions to form a silver chloride precipitate, which is easy to adhere to the resin particles, which is good for the second resin adsorption
  • the column 6 or the third resin adsorption column 9 is used for elution, not only dilute nitric acid but also dilute hydrochloric acid can be used for elution.
  • the second resin adsorption column 6 or the third resin adsorption column 9 can use the same An eluent storage tank.
  • the eluate of the first resin adsorption column 3 is supplied from the first eluate storage tank 16 through the first elution pump 17, while the second resin adsorption column 6 and the third resin adsorption column
  • the eluent of 9 is supplied from the second eluent storage tank 18 through the second eluent pump 19.
  • the eluent enters from the top of the first resin adsorption column 3 and flows out of the first resin adsorption column 3 from below. In this process, the flow rate is adjusted within a proper range, and the eluent flows out. Collected in the first recovery tank 13, relatively, the eluate that flows out when the second resin adsorption column 6 is eluted will enter the second recovery tank 14, and the third resin adsorption column 9 will be eluted. The eluent flowing out at this time will enter the third recovery tank 15.
  • the first recovery tank 13 contains relatively high concentrations of silver ions and gold ions, which can be oriented for subsequent processing to recover gold and silver elements, and so on, and the second recovery tank 14 also contains relatively high concentrations of iron, zinc, copper, and manganese.
  • the second recovery tank 14 also contains relatively high concentrations of copper ions, nickel ions, chromium ions, cadmium ions, and lead ions.
  • the adsorption-purge-elution-purge-adsorption process is carried out cyclically as described above to achieve the recovery of different types of metal ions, especially gold and silver ions, and the removal of other ions.
  • the treated water metal The ion meets the national first-level sewage discharge standard and is easy to operate.

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Water Treatment By Sorption (AREA)

Abstract

L'invention concerne un dispositif et un procédé pour l'élimination sélective en plusieurs étapes d'ions de métaux lourds dans un liquide résiduaire photovoltaïque. Selon le dispositif, un mécanisme d'adsorption de métal à plusieurs étapes est utilisé pour adsorber et éliminer sélectivement les ions de métaux lourds dans un dialysat et un liquide de nettoyage ; selon le procédé, différents ions métalliques sont adsorbés et éliminés de manière directionnelle au moyen de différents types de colonnes d'adsorption à résine disposées dans chaque étape du mécanisme d'adsorption de métal ; après que l'adsorption ait atteint la saturation, la surface de la résine servant à l'adsorption est éluée au moyen d'un éluant, et les ions métalliques sont recyclés.
PCT/CN2020/135178 2020-02-26 2020-12-10 Dispositif et procédé d'élimination sélective en plusieurs étapes d'ions de métaux lourds dans un liquide résiduaire photovoltaïque WO2021169482A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202010119857.0A CN111233202A (zh) 2020-02-26 2020-02-26 多级选择性去除光伏废液中重金属离子的装置和方法
CN202010119857.0 2020-02-26

Publications (1)

Publication Number Publication Date
WO2021169482A1 true WO2021169482A1 (fr) 2021-09-02

Family

ID=70875064

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/CN2020/135218 WO2021169483A1 (fr) 2020-02-26 2020-12-10 Dispositif et procédé d'élimination d'ions métalliques lourds dans un liquide résiduaire photovoltaïque
PCT/CN2020/135178 WO2021169482A1 (fr) 2020-02-26 2020-12-10 Dispositif et procédé d'élimination sélective en plusieurs étapes d'ions de métaux lourds dans un liquide résiduaire photovoltaïque

Family Applications Before (1)

Application Number Title Priority Date Filing Date
PCT/CN2020/135218 WO2021169483A1 (fr) 2020-02-26 2020-12-10 Dispositif et procédé d'élimination d'ions métalliques lourds dans un liquide résiduaire photovoltaïque

Country Status (2)

Country Link
CN (1) CN111233202A (fr)
WO (2) WO2021169483A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111233202A (zh) * 2020-02-26 2020-06-05 苏州晶洲装备科技有限公司 多级选择性去除光伏废液中重金属离子的装置和方法
CN115246689A (zh) * 2022-05-25 2022-10-28 上海三及新材料科技有限公司 一种化抛水洗液废酸回收工艺

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5078583A (fr) * 1973-11-14 1975-06-26
US4197391A (en) * 1977-03-01 1980-04-08 Unitika Ltd Phenolic chelate resin and method of adsorption treatment
CN102351343A (zh) * 2011-07-08 2012-02-15 南开大学 一种采用絮凝工艺有效去除水中残留铝的方法
CN105174556A (zh) * 2015-10-16 2015-12-23 南京大学 一种高酸高铁重金属废水分质资源回收的方法
CN107217142A (zh) * 2017-07-04 2017-09-29 南京大学 一种分质回收复杂重金属的耐酸螯合树脂组合调控方法
CN206901813U (zh) * 2017-05-19 2018-01-19 深圳市绿恩环保技术有限公司 一种重金属废水的处理装置
CN208561989U (zh) * 2018-07-13 2019-03-01 佛山市高明左右铝业有限公司 一种生产铝制品的无重金属废水处理装置
CN111233202A (zh) * 2020-02-26 2020-06-05 苏州晶洲装备科技有限公司 多级选择性去除光伏废液中重金属离子的装置和方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6346195B1 (en) * 1998-07-10 2002-02-12 U.S. Filter Corporation Ion exchange removal of metal ions from wastewater
WO2010071599A1 (fr) * 2008-12-17 2010-06-24 Hydrochem (S) Pte Ltd Procédé de traitement d’eaux usées produites dans un procédé de production d’acide aromatique
CN102268537B (zh) * 2011-08-15 2013-05-29 广西银亿科技矿冶有限公司 一种从红土镍矿中提取钴镍的方法
CN102583822A (zh) * 2012-02-09 2012-07-18 湖南大学 一种去除提钒废水中重金属离子的方法
GB2533497B (en) * 2013-08-23 2017-12-20 Hitachi Ge Nuclear Energy Ltd Method of treating radioactive liquid waste and radioactive liquid waste treatment apparatus
CN106219661B (zh) * 2016-08-30 2019-12-10 上海交通大学 一种用于废水中多种重金属同步去除与分离的方法
CN207827913U (zh) * 2018-01-15 2018-09-07 湖南永清环保研究院有限责任公司 一种重金属吸附处理装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5078583A (fr) * 1973-11-14 1975-06-26
US4197391A (en) * 1977-03-01 1980-04-08 Unitika Ltd Phenolic chelate resin and method of adsorption treatment
CN102351343A (zh) * 2011-07-08 2012-02-15 南开大学 一种采用絮凝工艺有效去除水中残留铝的方法
CN105174556A (zh) * 2015-10-16 2015-12-23 南京大学 一种高酸高铁重金属废水分质资源回收的方法
CN206901813U (zh) * 2017-05-19 2018-01-19 深圳市绿恩环保技术有限公司 一种重金属废水的处理装置
CN107217142A (zh) * 2017-07-04 2017-09-29 南京大学 一种分质回收复杂重金属的耐酸螯合树脂组合调控方法
CN208561989U (zh) * 2018-07-13 2019-03-01 佛山市高明左右铝业有限公司 一种生产铝制品的无重金属废水处理装置
CN111233202A (zh) * 2020-02-26 2020-06-05 苏州晶洲装备科技有限公司 多级选择性去除光伏废液中重金属离子的装置和方法

Also Published As

Publication number Publication date
CN111233202A (zh) 2020-06-05
WO2021169483A1 (fr) 2021-09-02

Similar Documents

Publication Publication Date Title
WO2021169482A1 (fr) Dispositif et procédé d'élimination sélective en plusieurs étapes d'ions de métaux lourds dans un liquide résiduaire photovoltaïque
CN102531233B (zh) 一种含重金属的电镀废水处理及重金属回收利用方法
CN105384195B (zh) 一种从钼冶炼废酸中回收铼的方法
CN109678196B (zh) 一种微蚀刻废液阴阳离子全回收利用方法
CN109182791B (zh) 一种有机酸络合-固相吸附从稀土料液中除铝的方法
CN109652647B (zh) 一种基于硫代硫酸盐浸出法的二硫化钼回收贵金属工艺
CN106811598A (zh) 一种低含量镍钴生物浸出液高效净化分离提纯工艺
CN107058757A (zh) 一种从含银废液中分离银的生产方法
CN106542670A (zh) 一种湿法脱硫废水零排放处理工艺
Kwon et al. Selective adsorption for indium (III) from industrial wastewater using chemically modified sawdust
CN105714121A (zh) 一种从酸性废液中回收铼和铋的方法
He et al. Separation and recovery of indium from solution in a sulfite-sulfuric acid system
CN108269637A (zh) 一种球形核燃料元件生产线含有机物废液处理装置
WO2024045654A1 (fr) Système et procédé de purification pour nanofils métalliques
CN106861598B (zh) CuS纳米晶吸附剂及其制备方法与电镀铜废水处理中的应用
CN105461140B (zh) 一种钨冶炼离子交换法废水综合处理回收系统及方法
CN103555949B (zh) 高盐度高氯体系下从低浓度含金废水中回收金的方法
CN111747592A (zh) 化学镀镍废液资源化利用系统及化学镀镍废液处理方法
CN106698790A (zh) 一种石墨生产废水综合回用方法
WO2023097923A1 (fr) Agent réducteur de faible coût pour la précipitation sélective d'ions de métal noble
Ni et al. An extraction and precipitation process for the removal of Ca and Mg from ammonium sulfate rare earth wastewaters
CN107233884A (zh) 一种用于催化三价铁水解沉淀的铁磁性催化剂及其制备方法和应用
CN105126789B (zh) 硫基聚偏氟乙烯膜吸附剂及制备方法和用于回收废水中金的方法
CN102836696A (zh) 一种用于Pb2+分离的磁纳米固相萃取剂的制备方法
CN105565544A (zh) 一种镍的回收方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 20922248

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 20922248

Country of ref document: EP

Kind code of ref document: A1