WO2021160712A3 - Optische baugruppe, projektionsbelichtungsanlage und verfahren - Google Patents

Optische baugruppe, projektionsbelichtungsanlage und verfahren Download PDF

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Publication number
WO2021160712A3
WO2021160712A3 PCT/EP2021/053278 EP2021053278W WO2021160712A3 WO 2021160712 A3 WO2021160712 A3 WO 2021160712A3 EP 2021053278 W EP2021053278 W EP 2021053278W WO 2021160712 A3 WO2021160712 A3 WO 2021160712A3
Authority
WO
WIPO (PCT)
Prior art keywords
exposure apparatus
projection exposure
optical assembly
actuator
optical element
Prior art date
Application number
PCT/EP2021/053278
Other languages
English (en)
French (fr)
Other versions
WO2021160712A2 (de
Inventor
Andreas Raba
Johannes Lippert
Markus Raab
Original Assignee
Carl Zeiss Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Smt Gmbh filed Critical Carl Zeiss Smt Gmbh
Priority to CN202180020492.9A priority Critical patent/CN115698859A/zh
Priority to EP21705156.4A priority patent/EP4104021A2/de
Publication of WO2021160712A2 publication Critical patent/WO2021160712A2/de
Publication of WO2021160712A3 publication Critical patent/WO2021160712A3/de
Priority to US17/818,904 priority patent/US20220382165A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/185—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the shape of the mirror surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • H10N30/206—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using only longitudinal or thickness displacement, e.g. d33 or d31 type devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/50—Piezoelectric or electrostrictive devices having a stacked or multilayer structure
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/85—Piezoelectric or electrostrictive active materials
    • H10N30/852—Composite materials, e.g. having 1-3 or 2-2 type connectivity
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/88—Mounts; Supports; Enclosures; Casings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Chemical & Material Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

Die Erfindung betrifft eine optische Baugruppe (30) einer Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem optischen Element (31) und einem Aktuator (33) zur Deformation des optischen Elementes (31), wobei der Aktuator (33) von einer vorhandenen Steuerung mit einer Vorspannung beaufschlagt wird. Weiterhin betrifft die Erfindung eine Projektionsbelichtungsanlage (1) für die Halbleiterlithographie, umfassend eine optische Baugruppe (30) nach einem der vorangehenden Ansprüche und ein Verfahren zum Betrieb eines Aktuators (33) zur Deformation eines optischen Elementes (31) für die Halbleiterlithographie, wobei der Aktuator (33) von einer vorhandenen Steuerung mit einer Vorspannung beaufschlagt wird.
PCT/EP2021/053278 2020-02-13 2021-02-11 Optische baugruppe, projektionsbelichtungsanlage und verfahren WO2021160712A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN202180020492.9A CN115698859A (zh) 2020-02-13 2021-02-11 光学装配件、投射曝光设备及方法
EP21705156.4A EP4104021A2 (de) 2020-02-13 2021-02-11 Optische baugruppe, projektionsbelichtungsanlage und verfahren
US17/818,904 US20220382165A1 (en) 2020-02-13 2022-08-10 Optical assembly, projection exposure apparatus and method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102020201774.3 2020-02-13
DE102020201774.3A DE102020201774A1 (de) 2020-02-13 2020-02-13 Optische Baugruppe mit Kompensationselement und Projektionsbelichtungsanlage

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US17/818,904 Continuation US20220382165A1 (en) 2020-02-13 2022-08-10 Optical assembly, projection exposure apparatus and method

Publications (2)

Publication Number Publication Date
WO2021160712A2 WO2021160712A2 (de) 2021-08-19
WO2021160712A3 true WO2021160712A3 (de) 2021-10-14

Family

ID=74595295

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2021/053278 WO2021160712A2 (de) 2020-02-13 2021-02-11 Optische baugruppe, projektionsbelichtungsanlage und verfahren

Country Status (5)

Country Link
US (1) US20220382165A1 (de)
EP (1) EP4104021A2 (de)
CN (1) CN115698859A (de)
DE (1) DE102020201774A1 (de)
WO (1) WO2021160712A2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102022204014B3 (de) 2022-04-26 2022-12-08 Carl Zeiss Smt Gmbh Temperaturinsensitiver Aktuator und Deformationsspiegel

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10344178A1 (de) * 2003-09-24 2005-04-28 Zeiss Carl Smt Ag Halte- und Positioniervorrichtung für ein optisches Element
US20100033704A1 (en) * 2008-08-11 2010-02-11 Masayuki Shiraishi Deformable mirror, mirror apparatus, and exposure apparatus
DE102009055303A1 (de) * 2008-12-25 2010-07-01 Ngk Insulators, Ltd., Nagoya Verbundsubstrat und Verfahren zur Ausbildung eines Metallmusters
DE102012212953A1 (de) * 2012-07-24 2013-06-06 Carl Zeiss Smt Gmbh Spiegelanordnung für eine Lithographieanlage
DE102015221921A1 (de) * 2015-11-09 2016-10-20 Carl Zeiss Smt Gmbh Facetteneinrichtung mit einem Formgedächtnislegierungs-Aktor, Verfahren zum Herstellen und Lithographieanlage
DE102018212508A1 (de) * 2018-07-26 2020-01-30 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zum Betreiben eines deformierbaren Spiegels

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014219755A1 (de) 2013-10-30 2015-04-30 Carl Zeiss Smt Gmbh Reflektives optisches Element
DE102016201445A1 (de) 2016-02-01 2017-02-09 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102017205405A1 (de) 2017-03-30 2018-10-04 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10344178A1 (de) * 2003-09-24 2005-04-28 Zeiss Carl Smt Ag Halte- und Positioniervorrichtung für ein optisches Element
US20100033704A1 (en) * 2008-08-11 2010-02-11 Masayuki Shiraishi Deformable mirror, mirror apparatus, and exposure apparatus
DE102009055303A1 (de) * 2008-12-25 2010-07-01 Ngk Insulators, Ltd., Nagoya Verbundsubstrat und Verfahren zur Ausbildung eines Metallmusters
DE102012212953A1 (de) * 2012-07-24 2013-06-06 Carl Zeiss Smt Gmbh Spiegelanordnung für eine Lithographieanlage
DE102015221921A1 (de) * 2015-11-09 2016-10-20 Carl Zeiss Smt Gmbh Facetteneinrichtung mit einem Formgedächtnislegierungs-Aktor, Verfahren zum Herstellen und Lithographieanlage
DE102018212508A1 (de) * 2018-07-26 2020-01-30 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zum Betreiben eines deformierbaren Spiegels

Also Published As

Publication number Publication date
WO2021160712A2 (de) 2021-08-19
DE102020201774A1 (de) 2021-08-19
US20220382165A1 (en) 2022-12-01
EP4104021A2 (de) 2022-12-21
CN115698859A (zh) 2023-02-03

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