WO2021106440A1 - 被覆切削工具 - Google Patents

被覆切削工具 Download PDF

Info

Publication number
WO2021106440A1
WO2021106440A1 PCT/JP2020/039604 JP2020039604W WO2021106440A1 WO 2021106440 A1 WO2021106440 A1 WO 2021106440A1 JP 2020039604 W JP2020039604 W JP 2020039604W WO 2021106440 A1 WO2021106440 A1 WO 2021106440A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
atomic
cutting tool
film
less
Prior art date
Application number
PCT/JP2020/039604
Other languages
English (en)
French (fr)
Inventor
正和 伊坂
Original Assignee
株式会社Moldino
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2019214083A external-priority patent/JP7406079B2/ja
Priority claimed from JP2019213826A external-priority patent/JP7406078B2/ja
Application filed by 株式会社Moldino filed Critical 株式会社Moldino
Priority to CN202080067356.0A priority Critical patent/CN114531856A/zh
Priority to KR1020227009568A priority patent/KR20220050204A/ko
Priority to EP20892552.9A priority patent/EP4066970B1/en
Priority to US17/762,809 priority patent/US20220331882A1/en
Publication of WO2021106440A1 publication Critical patent/WO2021106440A1/ja

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23C—MILLING
    • B23C5/00—Milling-cutters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
    • B23B27/148—Composition of the cutting inserts
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23C—MILLING
    • B23C5/00—Milling-cutters
    • B23C5/16—Milling-cutters characterised by physical features other than shape
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0652—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0664—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5873—Removal of material
    • C23C14/588—Removal of material by mechanical treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
    • B23B2228/10—Coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23C—MILLING
    • B23C2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
    • B23C2228/10—Coating

Definitions

  • the present invention relates to a coated cutting tool such as an end mill.
  • the present application claims priority based on Japanese Patent Application No. 2019-214083 and Japanese Patent Application No. 2019-213826 filed in Japan on November 27, 2019, the contents of which are incorporated herein by reference.
  • AlCrSi nitride or carbonitride is a film type having excellent heat resistance and wear resistance, and is applied to coated cutting tools.
  • the applicant of the present application proposes AlCrSi nitride or carbonitride in Patent Documents 1 to 3 in which the Si content ratio is increased and the film structure is refined.
  • the coated cutting tool disclosed in Patent Documents 1 to 3 the coated cutting tool provided with TiSi nitride or carbonitride in the upper layer has extremely excellent wear resistance and is used for cutting high-hardness steel. Has excellent durability in.
  • the present inventor has provided a coating cutting tool in which a TiSi nitride or a carbonitride is provided on an AlCrSi nitride or a carbonitride having a high Si content ratio and a fine film structure in cutting high hardness steel. It was confirmed that the wear resistance tends to be equal to or higher than that of the cBN tool. However, the present inventor has confirmed that there is room for improvement in durability when applied to a small-diameter tool having a tool diameter of less than 1 mm and a tool diameter of less than 0.5 mm.
  • the total amount of metal (including semi-metal) elements on the surface of the base material is 50 atomic% or more for aluminum (Al) and 20 atomic% or more for chromium (Cr).
  • a face-centered cubic lattice that is a nitride or carbonitride with a total content of aluminum (Al) and chromium (Cr) of 85 atomic% or more and silicon (Si) of 4 atomic% or more and 15 atomic% or less.
  • a coated cutting tool having an A layer having a structure and a B layer provided on the A layer.
  • the total amount of metal (including semi-metal) elements is 70 atomic% or more and 90 atomic% or less for Ti (titanium), and 5 atomic% or more and 20 atomic% or less for silicon (Si). It is a nitride or carbonitride having a niobium (Nb) or chromium (Cr) content of 1 atomic% or more and 10 atomic% or less, and has a face-centered cubic lattice structure.
  • the film thickness of the A layer is larger than 1.0 ⁇ m and the film thickness of the B layer is larger than 0.5 ⁇ m.
  • a coated cutting tool having excellent durability is provided.
  • the present inventor has made a coating cutting tool based on AlCrSi nitride or carbonitride having a finely divided film structure by adding a small amount of Nb or Cr to the TiSi nitride or carbonitride provided in the upper layer. We found that the properties were further improved and arrived at the invention. Hereinafter, the details of the present invention will be described.
  • the coated cutting tool according to the embodiment of the present invention has a base material, an A layer arranged on the surface of the base material, and a B layer provided on the A layer.
  • an intermediate film arranged between the base material and the hard film, an intermediate film arranged between the A layer and the B layer, and an upper layer of the B layer are arranged.
  • Other films such as a protective film to be applied may be attached.
  • the layer A is a nitride or carbonitride mainly composed of Al and Cr.
  • Nitride or carbonitride mainly composed of Al and Cr is a film type having excellent wear resistance and heat resistance, and its durability can be enhanced by applying it to a coated cutting tool.
  • the constituent material of the A layer is more preferably a nitride having better heat resistance than the carbonitride.
  • Al is an element that imparts heat resistance to a hard film.
  • the layer A contains 50% or more of Al in the content ratio (atomic%, the same applies hereinafter) of metal (including metalloids, the same applies hereinafter) elements. To. Furthermore, it is preferable that the Al content ratio of the A layer is 55% or more.
  • the Al content ratio of the A layer is 70% or less.
  • Cr is an element that has a face-centered cubic lattice structure (fcc structure, the same applies hereinafter) as the crystal structure of the A layer, and improves wear resistance and heat resistance as a coated cutting tool. If the Cr content ratio of the A layer is too small, the wear resistance and heat resistance are lowered, and the hcp structure is the main component, so that the durability of the coated cutting tool tends to be lowered. Therefore, the Cr content ratio of the A layer is set to 20% or more. Furthermore, the Cr content ratio of the A layer is preferably 30% or more. On the other hand, if the Cr content ratio of the A layer becomes too large, the heat resistance tends to decrease. Therefore, it is preferable that the Cr content ratio of the A layer is 45% or less.
  • fcc structure face-centered cubic lattice structure
  • the total content ratio of Al and Cr is set to 85% or more. Furthermore, it is preferable that the total content ratio of Al and Cr in the A layer is 90% or more.
  • the total content ratio of Al and Cr in the A layer is preferably 96% or less, and more preferably 95% or less.
  • Si is an important element for refining the structure of nitrides or carbonitrides mainly composed of Al and Cr.
  • the columnar particles of AlCrN that does not contain Si and AlCrSiN that has a small Si content ratio become coarse. Since the hard film having such a structure has many grain boundaries that are the starting points of film fracture, the flank wear of the coated cutting tool tends to increase. On the other hand, the structure of AlCrSiN containing a certain amount of Si becomes finer, and it becomes difficult to observe clear columnar particles by cross-sectional observation (20,000 times) with an electron microscope, for example.
  • the hard film having such a structure has fewer columnar grain boundaries that are the starting points of fracture, and can suppress wear on the flank of the coated cutting tool.
  • the Si content ratio of the A layer is 4% or more and 15% or less.
  • the Si content ratio of the A layer is preferably 5% or more.
  • the Si content ratio of the A layer is preferably 10% or less.
  • the A layer may contain other metal elements other than Al, Cr, and Si.
  • the layer A can contain elements of groups 4a, 5a, and 6a of the periodic table and one or more elements selected from B, Cu, Y, and Yb. These elements are elements added to the AlTiN-based and AlCrN-based hard coatings in order to improve the characteristics of the hard coatings, and unless the content ratio is excessive, the durability of the coated cutting tool is significantly reduced. There is no such thing.
  • the A layer contains a large amount of metal elements other than Al, Cr and Si, the basic characteristics of the nitride or carbonitride mainly composed of Al and Cr may be impaired and the durability of the coated cutting tool may be lowered. .. Therefore, even when the A layer contains metal elements other than Al, Cr, and Si, the total content ratio thereof is preferably 10% or less. Further, even when the A layer contains metal elements other than Al, Cr and Si, the total content ratio thereof is preferably 5% or less.
  • an intermediate film of metal, nitride, carbonitride, carbide or the like may be provided between the base material and the A layer.
  • the adhesion between the base material and the hard film may be further improved.
  • the surface of the base material may be metal bombarded to form a nano-level modified phase.
  • the interlayer film may be a single layer or a multilayer. An interlayer film may be provided after the metal bombard treatment.
  • the A layer in this embodiment has an fcc structure.
  • the fcc structure means that the peak intensity due to the fcc structure indicates the maximum intensity in the intensity profile obtained from the X-ray diffraction pattern or the selected area diffraction pattern of the transmission electron microscope. Since the hard film having the maximum diffraction intensity due to the hcp structure is fragile, the durability as a coating cutting tool becomes poor. In particular, in wet processing, the durability tends to decrease.
  • the layer A preferably does not have the diffraction intensity due to the hcp structure in the X-ray diffraction pattern.
  • the A layer is preferable because it has a film structure in which the peak strength of the (200) plane or the (111) plane is maximized in the fcc structure, so that it tends to exhibit excellent durability.
  • AlN having an hcp structure may be present in the microstructure.
  • the intensity profile obtained from the selected area diffraction pattern of the transmission electron microscope when observing the processed cross section of the hard film can be used. Specifically, the relationship of Ih ⁇ 100 / Is is evaluated in the intensity profile of the selected area diffraction pattern of the transmission electron microscope.
  • the layer A satisfies the relationship of Ih ⁇ 100 / Is ⁇ 25 by reducing the AlN of the hcp structure present in the microstructure. By satisfying the relationship of Ih ⁇ 100 / Is ⁇ 25, the durability of the coated cutting tool becomes more excellent. Further, it is preferable that the layer A satisfies the relationship of Ih ⁇ 100 / Is ⁇ 20.
  • the B layer is a hard film arranged on the A layer.
  • the B layer is based on a nitride or carbonitride of TiSi, which is a film type having excellent wear resistance and heat resistance.
  • a trace amount of Nb or Cr is further added to the B layer.
  • the present inventor examined the addition of a third element in order to further enhance the wear resistance of TiSiN. Then, it was confirmed that the hardness was increased by adding a small amount of Nb or Cr to TiSiN in which the Si content ratio was suppressed, and the wear resistance of the coated cutting tool was improved.
  • the B layer has a total amount of metal (including metalloid) elements and a Ti (titanium) content ratio of 60% or more and 90% or less. If the Si content ratio of the B layer is too small, the film structure is insufficiently miniaturized and the wear resistance of the hard film is lowered. Further, if the Si content ratio of the B layer is too large, the film structure becomes too fine and becomes almost amorphous, so that the wear resistance of the hard film is lowered. Therefore, the B layer has a total amount of metal (including metalloid) elements and a Si (silicon) content ratio of 5% or more and 20% or less.
  • the total amount of metal (including metalloid) elements in the B layer is such that the content ratio of Nb (niobium) or Cr (chromium) is 1% or more and 10% or less.
  • the content ratio of Nb or Cr in the B layer is preferably 2% or more.
  • the content ratio of Nb or Cr in the B layer is preferably 8% or less.
  • the content ratio of Nb or Cr in the B layer is more preferably 6% or less.
  • the B layer in this embodiment has an fcc structure.
  • the fcc structure means that the peak intensity due to the fcc structure indicates the maximum intensity in the intensity profile obtained from the X-ray diffraction pattern or the selected area diffraction pattern of the transmission electron microscope. Since the hard film having the maximum diffraction intensity due to the hcp structure is fragile, the durability as a coating cutting tool becomes poor. In particular, in wet processing, the durability tends to decrease.
  • the B layer preferably does not have the diffraction intensity due to the hcp structure in the X-ray diffraction pattern.
  • the B layer is preferable because it has a film structure in which the peak strength of the (200) plane is maximized in the fcc structure, so that it tends to exhibit excellent durability.
  • the average crystal grain size of the hard film constituting the B layer is preferably 5 nm or more and 50 nm or less. If the microstructure of the hard film becomes too fine, the structure of the hard film becomes close to amorphous, so that the toughness and hardness of the hard film decrease. In order to increase the crystallinity of the hard film and reduce the fragile amorphous phase, the average crystal grain size of the hard film is set to 5 nm or more. Further, if the microstructure of the hard film becomes too coarse, the hardness of the hard film tends to decrease and the durability of the coated cutting tool tends to decrease.
  • the average crystal grain size of the hard film is set to 50 nm or less. Furthermore, the average crystal grain size of the hard film is preferably 30 nm or less. The average crystal grain size of the hard film can be measured from the half-value range of X-ray diffraction.
  • the B layer may be provided directly above the A layer.
  • a laminated film containing the composition of the A layer and the B layer may be provided between the A layer and the B layer.
  • a hard film other than the composition of the A layer and the B layer may be provided between the A layer and the B layer.
  • Another hard film may be provided on the B layer.
  • the coated cutting tool according to the embodiment of the present invention is particularly preferable in that the effect of improving durability is more effectively exhibited by being applied to a small diameter end mill having a tool diameter of 2 mm or less. Further, it is preferable to apply the configuration of the coated cutting tool of the present embodiment to a small diameter end mill having a tool diameter of 1 mm or less.
  • the A layer is a thicker film than the B layer.
  • the durability of the coated cutting tool is enhanced.
  • the film thickness of the A layer is larger than 1.0 ⁇ m and the film thickness of the B layer is larger than 0.5 ⁇ m. If the film thickness of both the A layer and the B layer is made too large, peeling is likely to occur, and the durability of the coated cutting tool is lowered.
  • the upper limit of the film thickness of the A layer and the B layer differs depending on the composition of the hard film including the intermediate layer and the surface layer.
  • the upper limit of the film thickness of the A layer is less than 4 ⁇ m
  • the upper limit of the film thickness of the B layer is less than 3.5 ⁇ m
  • the upper limit of the total film thickness of the A layer and the B layer is 5 ⁇ m or less.
  • Example 1 An arc ion plating type film forming apparatus was used for forming the hard film.
  • the device includes multiple cathodes (arc evaporation sources), a vacuum vessel and a substrate rotation mechanism.
  • This device includes three cathodes C1, C2, and C3.
  • C1 is a cathode in which a coil magnet is arranged on the outer periphery of the target.
  • C2 and C3 are cathodes in which permanent magnets are arranged on the back surface and the outer periphery of the target.
  • the magnetic flux density in the vertical direction of the target is 14 mT or more near the center of the target.
  • the target mounted on C2 and C3 had different compositions depending on the sample.
  • the inside of the vacuum container is exhausted by a vacuum pump.
  • the film-forming gas is introduced into the vacuum vessel from the supply port.
  • a bias power supply is connected to each base material installed in the vacuum vessel.
  • the bias power supply applies a negative pressure DC bias voltage to each substrate.
  • the base material rotation mechanism includes a planetary, a plate-shaped jig on the planetary, and a pipe-shaped jig on the plate-shaped jig.
  • the planetary rotates at a speed of 3 revolutions per minute.
  • the plate-shaped jig and the pipe-shaped jig revolve on their own.
  • the composition is WC (bal.)-Co (8% by mass) -Cr (0.5% by mass) -VC (0.3% by mass), and the WC average particle size is 0.6 ⁇ m.
  • WC represents tungsten carbide
  • Co represents cobalt
  • Cr represents chromium
  • VC vanadium carbide.
  • Each base material was fixed to a pipe-shaped jig in a vacuum vessel, and the pre-deposition process was carried out as follows. First, the inside of the vacuum vessel was evacuated to 8 ⁇ 10 -3 Pa or less. Then, the base material was heated to 500 ° C. by a heater installed in the vacuum vessel, and vacuum exhaust was performed. As a result, the temperature of the base material was set to 500 ° C., and the pressure in the vacuum vessel was set to 8 ⁇ 10 -3 Pa or less.
  • ⁇ Ar bombard process> Then, Ar gas was introduced into the vacuum vessel, and the pressure inside the vessel was set to 0.67 Pa. Then, a current of 35 A was applied to the filament electrode, a negative pressure bias voltage of ⁇ 200 V was applied to the substrate, and Ar bombard was carried out for 4 minutes.
  • ⁇ Ti bombard process> Then, the vacuum was evacuated so that the pressure in the vacuum vessel was 8 ⁇ 10 -3 Pa or less. Subsequently, a bias voltage was applied to the base material, and an arc current of 150 A was supplied to C1 on which the Ti target was mounted to carry out the Ti bombard treatment.
  • carbides containing W and Ti were formed on the surface of the base material at 1 nm or more and 10 nm or less.
  • the composition of the carbide formed by the Ti bombard treatment was such that W was 60 atomic% or more and 90 atomic% or less and Ti was 10 atomic% or more and 40 atomic% or less in terms of the content ratio of metal elements.
  • ⁇ Film formation process> Immediately after the Ti bombard, the power supply to C1 was interrupted. Then, the gas in the vacuum vessel was replaced with nitrogen, the pressure in the vacuum vessel was set to 5 Pa, and the base material set temperature was set to 520 ° C. A power of 150 A was supplied to C2 on which the AlCrSi target was mounted, and the A layer was coated with the negative pressure bias voltage applied to the base material being 120 V and the cathode voltage being 30 V. After coating the A layer, the B layer was coated. In the coating of the B layer, a TiSiNb target, a TiSiW target, a TiSiTa target, or a TiSi target was used as a C3 target depending on the sample.
  • a power of 150 A was supplied to C3 to which the target was mounted, and the B layer was coated with the negative pressure bias voltage applied to the base material being 50 V and the cathode voltage being 25 V. Then, the substrate was cooled to about 250 ° C. or lower and taken out from the vacuum vessel. Then, each sample after coating was subjected to a polishing treatment of the cutting edge by a blast treatment.
  • the composition of the hard film was measured by wavelength dispersive electron probe microanalysis (WDS-EPMA).
  • the measurement conditions were an acceleration voltage of 10 kV, a sample current of 5 ⁇ 10-8 A, an uptake time of 10 seconds, an analysis region diameter of 1 ⁇ m, and an analysis depth of approximately 1 ⁇ m.
  • the crystal structure was confirmed using an X-ray diffractometer (EMPYREAN vertical goniometer manufactured by Spectris Co., Ltd.).
  • Cutting was performed using the coated cutting tool of each sample prepared, and the durability of the coated cutting tool was evaluated from the exposed area of the base metal after the cutting.
  • the cutting conditions are shown below.
  • Cutting oil Mist blow (oil-based) -Number of machines processed: 7 pockets-Evaluation method: The exposed area of the base metal was observed at a magnification of 600 times using a scanning electron microscope after cutting, and the area where the cemented carbide base material of the tool was exposed was calculated. Commercially available
  • the A layer and the B layer were single-phase with an fcc structure in XRD diffraction. Further, when the intensity profile of the selected area diffraction pattern of the A layer was evaluated by the same method as in Japanese Patent No. 6410797, the value of Ih ⁇ 100 / Is of the A layer was 20 or less. The peak intensity of the fcc (200) plane of the B layer was the highest, and the average crystal grain size was 5 nm or more and 50 nm or less.
  • Example 1 to 3 of the present invention in which a small amount of Nb was added to the B layer on the upper layer of the A layer in which a certain amount of Si was contained and the film structure was refined, the exposed area of the base material was small and excellent durability was exhibited. ..
  • Example 3 of the present invention in which the total film thickness of the A layer and the B layer is large, the exposed area of the base material is small, and the durability is more excellent.
  • the exposed area of the base material was larger than that of the example of the present invention because the Si content was high.
  • Comparative Examples 2 and 3 a small amount of W (tungsten) and Ta (tantalum) were added instead of Nb, but the B layer was not sufficiently cured, and the exposed area of the base metal was larger than that of the example of the present invention.
  • Comparative Example 4 since a small amount of Nb was not added to the B layer, the exposed area of the base metal was larger than that of the example of the present invention.
  • Comparative Example 5 since the Si content ratio of the A layer was small, the columnar particles of the film structure were large, and even if the same B layer as in Example 1 of the present invention was provided, the exposed area of the base material was large.
  • Comparative Example 6 since the content ratio of Nb in the B layer was large, the concentrated phase of Nb became coarse and the exposed area of the base metal became large.
  • Example 2 In Example 2, a coating cutting tool was produced by forming a hard film composed of a layer A and a layer B on a base material using the same film forming apparatus as in Example 1. In Example 2, a TiSiN-based film containing Cr was formed as the B layer. As the base material of Example 2, the same kind of base material as that of Example 1 was used.
  • Example 2 In the hard film forming step in Example 2, the heating and vacuum exhaust steps, the Ar bombard step, and the Ti bombard step were carried out in the same manner as in Example 1, and then the film forming step was carried out.
  • a TiSiCr target was used instead of the TiSiNb target of Example 1 as a target for forming the B layer.
  • the heating and vacuum exhaust steps, the Ar bombard step, and the Ti bombard step are the same as in the first embodiment, and thus the description thereof will be omitted.
  • ⁇ Film formation process> Immediately after the Ti bombard, the power supply to C1 was interrupted. Then, the gas in the vacuum vessel was replaced with nitrogen, the pressure in the vacuum vessel was set to 5 Pa, and the base material set temperature was set to 520 ° C. A power of 150 A was supplied to C2 on which the AlCrSi target was mounted, and the A layer was coated with the negative pressure bias voltage applied to the base material being 120 V and the cathode voltage being 30 V. After coating the A layer, the B layer was coated. In the coating of the B layer, a TiSiCr target, a TiSiW target, a TiSiTa target, or a TiSi target was used as a C3 target depending on the sample.
  • a power of 150 A was supplied to C3 to which the target was mounted, and the B layer was coated with the negative pressure bias voltage applied to the base material being 50 V and the cathode voltage being 25 V. Then, the substrate was cooled to about 250 ° C. or lower and taken out from the vacuum vessel. Then, each sample after coating was subjected to a polishing treatment of the cutting edge by a blast treatment.
  • Example 2 both the A layer and the B layer were single-phase with an fcc structure in XRD diffraction in both the examples of the present invention and the comparative examples. Further, when the intensity profile of the selected area diffraction pattern of the A layer was evaluated by the same method as in Japanese Patent No. 6410797, the value of Ih ⁇ 100 / Is of the A layer was 20 or less. The peak intensity of the fcc (200) plane of the B layer was the highest, and the average crystal grain size was 5 nm or more and 50 nm or less.
  • Example 21 to 23 of the present invention in which a small amount of Cr was added to the B layer on the upper layer of the A layer in which a certain amount of Si was contained and the film structure was refined, the exposed area of the base material was small and excellent durability was exhibited. ..
  • Example 23 of the present invention in which the total film thickness of the A layer and the B layer is large, the exposed area of the base material is small, and the durability is more excellent.
  • the B layer of Comparative Example 21 contains a small amount of Cr, the Si content is high, so that the exposed area of the base material is larger than that of the example of the present invention.
  • Comparative Examples 22 and 23 a small amount of W (tungsten) and Ta (tantalum) were added instead of Cr, but the B layer was not sufficiently cured, and the exposed area of the base metal was larger than that of the example of the present invention.
  • Comparative Example 24 since a small amount of Cr was not added to the B layer, the exposed area of the base metal was larger than that of the example of the present invention.
  • Comparative Example 25 since the Si content ratio of the A layer was small, the columnar particles of the film structure were large, and even if the same B layer as in Example 21 of the present invention was provided, the exposed area of the base material was large.
  • Comparative Example 26 since the Cr content ratio of the B layer was large, the Cr concentrated phase became coarse and the exposed area of the base metal became large.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

基材の表面に、Ａｌを５０原子％以上、Ｃｒを２０原子％以上、ＡｌとＣｒを合計で８５原子％以上、Ｓｉを４原子％以上１５原子％以下含有する窒化物又は炭窒化物であり、面心立方格子構造のＡ層と、前記Ａ層の上に設けられるＢ層と、を有する被覆切削工具。Ｂ層は、金属（半金属を含む）元素の総量でＴｉを７０原子％以上９０原子％以下、Ｓｉを５原子％以上２０原子％以下、ＮｂまたはＣｒを１原子％以上１０原子％以下を含有する窒化物又は炭窒化物であり、面心立方格子構造である。

Description

被覆切削工具
　本発明は、エンドミル等の被覆切削工具に関する。
　本願は、２０１９年１１月２７日に、日本に出願された特願２０１９－２１４０８３号および特願２０１９－２１３８２６号に基づき優先権を主張し、それらの内容をここに援用する。
　ＡｌＣｒＳｉの窒化物又は炭窒化物は、耐熱性と耐摩耗性に優れる膜種であり、被覆切削工具に適用されている。本願出願人は、特許文献１～３において、Ｓｉの含有比率を高めて皮膜組織を微細化したＡｌＣｒＳｉの窒化物又は炭窒化物を提案している。特許文献１～３に開示されている被覆切削工具の中でも、上層にＴｉＳｉの窒化物又は炭窒化物を設けた被覆切削工具は、耐摩耗性が非常に優れており、高硬度鋼の切削加工において優れた耐久性を有する。
国際公開第２０１５／１４１７４３号 国際公開第２０１４／１５６６９９号 特開２０１６－０７８１３１号公報
　本発明者は、Ｓｉ含有比率が高く皮膜組織を微細化したＡｌＣｒＳｉの窒化物又は炭窒化物の上にＴｉＳｉの窒化物又は炭窒化物を設けた被覆切削工具は、高硬度鋼の切削加工においてｃＢＮ工具と比べても同等以上の耐摩耗性を示す傾向にあることを確認した。但し、工具径が１ｍｍ未満、更には工具径が０．５ｍｍ未満の小径工具に適用した場合、耐久性に改善の余地があることを本発明者は確認した。
　本発明の１つの態様は、基材の表面に、金属（半金属を含む）元素の総量でアルミニウム（Ａｌ）の含有比率が５０原子％以上、クロム（Ｃｒ）の含有比率が２０原子％以上、アルミニウム（Ａｌ）とクロム（Ｃｒ）の合計の含有比率が８５原子％以上、シリコン（Ｓｉ）の含有比率が４原子％以上１５原子％以下の窒化物又は炭窒化物である面心立方格子構造のＡ層と、前記Ａ層の上に設けられるＢ層と、を有する被覆切削工具である。
　前記Ｂ層は、金属（半金属を含む）元素の総量でＴｉ（チタン）の含有比率が７０原子％以上９０原子％以下、シリコン（Ｓｉ）の含有比率が５原子％以上２０原子％以下、ニオブ（Ｎｂ）またはクロム（Ｃｒ）の含有比率が１原子％以上１０原子％以下の窒化物又は炭窒化物であり、面心立方格子構造である。
　Ａ層の膜厚が１．０μｍよりも大きく、Ｂ層の膜厚が０．５μｍよりも大きいことが好ましい。
　本発明の１つの態様によれば、耐久性に優れる被覆切削工具が提供される。
　上記態様では、被覆切削工具の耐久性を改善することが可能となる。よって、例えば高硬度なプリハードン鋼の加工においても、金型製作のリードタイム短縮、金型の高精度化、調質による変寸の低減効果が期待され、産業上極めて有効である。
　本発明者は、皮膜組織を微細化したＡｌＣｒＳｉの窒化物又は炭窒化物をベースとした被覆切削工具について、上層に設けるＴｉＳｉの窒化物又は炭窒化物にＮｂまたはＣｒを微量添加することで耐久性が一層向上することを見出し、発明に到達した。以下、本発明の詳細について説明する。
　本発明の実施形態に係る被覆切削工具は、基材と、基材の表面に配置されたＡ層と、Ａ層の上に設けられるＢ層とを有する。本実施形態の被覆切削工具には、必要に応じて、基材と硬質皮膜との間に配置される中間皮膜、Ａ層とＢ層の間に配置される中間皮膜、Ｂ層の上層に配置される保護皮膜等の他の膜が付与されていてもよい。
　Ａ層は、ＡｌとＣｒを主体とする窒化物又は炭窒化物である。ＡｌとＣｒを主体とする窒化物又は炭窒化物は優れた耐摩耗性と耐熱性を有する膜種であり、被覆切削工具に適用することで工具の耐久性を高めることができる。Ａ層の構成材料は、より好ましくは、炭窒化物よりも耐熱性に優れる窒化物である。
　Ａｌは硬質皮膜に耐熱性を付与する元素である。硬質皮膜に対して、より優れた耐熱性を付与するために、Ａ層は、金属（半金属を含む、以下同様。）元素の含有比率（原子％、以下同様。）でＡｌを５０％以上にする。更には、Ａ層のＡｌの含有比率を５５％以上とすることが好ましい。一方、Ａ層のＡｌの含有比率が大きくなり過ぎると、六方最密充填構造（ｈｃｐ構造、以下同様。）が主体となり、被覆切削工具の耐久性が低下する傾向にある。そのため、Ａ層のＡｌの含有比率を７０％以下とすることが好ましい。
　ＣｒはＡ層の結晶構造を面心立方格子構造（ｆｃｃ構造、以下同様。）とし、被覆切削工具としての耐摩耗性と耐熱性を向上させる元素である。Ａ層のＣｒの含有比率が少なくなり過ぎると、耐摩耗性と耐熱性が低下するとともに、ｈｃｐ構造が主体となり、被覆切削工具の耐久性が低下する傾向にある。そのため、Ａ層のＣｒの含有比率は２０％以上にする。更には、Ａ層のＣｒの含有比率は３０％以上であることが好ましい。一方、Ａ層のＣｒの含有比率が大きくなり過ぎると、耐熱性が低下する傾向になる。そのため、Ａ層のＣｒの含有比率を４５％以下とすることが好ましい。
　Ａ層は、耐熱性および耐摩耗性を高いレベルで両立させるため、ＡｌとＣｒの合計の含有比率を８５％以上とする。更には、Ａ層のＡｌとＣｒの合計の含有比率を９０％以上とすることが好ましい。Ａ層のＡｌとＣｒの合計の含有比率は、９６％以下であることが好ましく、９５％以下であることがより好ましい。
　Ｓｉは、ＡｌとＣｒを主体とする窒化物又は炭窒化物の組織を微細化するために重要な元素である。Ｓｉを含有していないＡｌＣｒＮおよびＳｉ含有比率が小さいＡｌＣｒＳｉＮは柱状粒子が粗大となる。このような組織形態の硬質皮膜は皮膜破壊の起点となる結晶粒界が多くなるため、被覆切削工具の逃げ面摩耗が増大する傾向にある。一方、一定量のＳｉを含有するＡｌＣｒＳｉＮは組織が微細化し、例えば、電子顕微鏡による断面観察（２０，０００倍）において明確な柱状粒子が観察され難くなる。このような組織形態の硬質皮膜は、破壊の起点となる柱状粒界が少なくなり、被覆切削工具の逃げ面摩耗を抑制することができる。但し、Ａ層のＳｉの含有比率が大きくなると非晶質およびｈｃｐ構造が主体となり易くなり、被覆切削工具の耐久性が低下する。被覆切削工具の耐久性を低下させずに皮膜組織を十分に微細化するには、Ａ層は、Ｓｉの含有比率を４％以上１５％以下とすることが重要である。Ａ層のＳｉの含有比率は５％以上であることが好ましい。Ａ層のＳｉの含有比率は１０％以下であることが好ましい。
　Ａ層は、Ａｌ、Ｃｒ、Ｓｉ以外の他の金属元素を含有してもよい。例えば、Ａ層は、周期律表の４ａ族、５ａ族、６ａ族の元素およびＢ、Ｃｕ、Ｙ、Ｙｂから選択される１種又は２種以上の元素を含有することができる。これらの元素は、硬質皮膜の特性を改善するために、ＡｌＴｉＮ系やＡｌＣｒＮ系の硬質皮膜に添加されている元素であり、含有比率が過多にならなければ被覆切削工具の耐久性を著しく低下させることはない。
　但し、Ａ層がＡｌとＣｒとＳｉ以外の金属元素を多く含有すると、ＡｌとＣｒを主体とする窒化物又は炭窒化物の基礎特性が損なわれ被覆切削工具の耐久性が低下する恐れがある。そのため、Ａ層はＡｌとＣｒとＳｉ以外の金属元素を含有する場合でも、それらの合計の含有比率を１０％以下とすることが好ましい。更には、Ａ層はＡｌとＣｒとＳｉ以外の金属元素を含有する場合でも、それらの合計の含有比率を５％以下とすることが好ましい。
　本実施形態の被覆切削工具は、基材とＡ層との間に、金属、窒化物、炭窒化物、炭化物等の中間皮膜を設けてもよい。中間皮膜を設けることで、基材と硬質皮膜との間の密着性がより改善される場合がある。また、基材の表面をメタルボンバード処理してナノレベルの改質相を形成してもよい。中間皮膜は単層でもよいし、多層であってもよい。メタルボンバード処理した後に中間皮膜を設けてもよい。
　本実施形態におけるＡ層は、ｆｃｃ構造であることが重要である。本実施形態において、ｆｃｃ構造であるとは、Ｘ線回折パターン又は透過型電子顕微鏡の制限視野回折パターンから求められる強度プロファイルにおいて、ｆｃｃ構造に起因するピーク強度が最大強度を示すものである。ｈｃｐ構造に起因する回折強度が最大強度を示す硬質皮膜は脆弱であるため、被覆切削工具として耐久性が乏しくなる。特に、湿式加工においては、耐久性が低下する傾向にある。Ａ層は、Ｘ線回折パターンにおいて、ｈｃｐ構造に起因する回折強度を有しないことが好ましい。Ａ層は、ｆｃｃ構造の中でも（２００）面又は（１１１）面のピーク強度が最大になる皮膜組織を有することで優れた耐久性を示す傾向にあり好ましい。
　Ａ層は、Ｓｉの含有比率が高くなるとｈｃｐ構造のＡｌＮがミクロ組織中に存在し得る。硬質皮膜のミクロ組織に存在するｈｃｐ構造のＡｌＮ量の定量化には、硬質皮膜の加工断面を観察した際、透過型電子顕微鏡の制限視野回折パターンから求められる強度プロファイルを用いることができる。具体的には、透過型電子顕微鏡の制限視野回折パターンの強度プロファイルにおいて、Ｉｈ×１００／Ｉｓの関係を評価する。
　　Ｉｈ＝ｈｃｐ構造のＡｌＮの（０１０）面に起因するピーク強度
　　Ｉｓ＝ｆｃｃ構造の、ＡｌＮの（１１１）面、ＣｒＮの（１１１）面、ＡｌＮの（２００）面、ＣｒＮの（２００）面、ＡｌＮの（２２０）面、およびＣｒＮの（２２０）面に起因するピーク強度と、ｈｃｐ構造の、ＡｌＮの（０１０）面、ＡｌＮの（０１１）面、およびＡｌＮの（１１０）面に起因するピーク強度と、の合計
　上記の関係を評価することで、Ｘ線回折によりｈｃｐ構造のＡｌＮに起因するピーク強度が確認されない硬質皮膜において、ミクロレベルで含まれるｈｃｐ構造のＡｌＮを定量的に評価することができる。
　Ａ層は、ミクロ組織に存在するｈｃｐ構造のＡｌＮをより少なくして、Ｉｈ×１００／Ｉｓ≦２５の関係を満たしていることが好ましい。Ｉｈ×１００／Ｉｓ≦２５の関係を満たすことで、被覆切削工具の耐久性がより優れたものとなる。更には、Ａ層は、Ｉｈ×１００／Ｉｓ≦２０の関係を満たしていることが好ましい。
　続いてＢ層について説明する。
　Ｂ層はＡ層の上に配置される硬質皮膜である。Ｂ層は、耐摩耗性と耐熱性に優れる膜種であるＴｉＳｉの窒化物又は炭窒化物をベースとする。Ｂ層には、更に微量のＮｂまたはＣｒが添加されている。本発明者はＴｉＳｉＮの耐摩耗性を更に高めるために、第三元素の添加を検討した。そして、Ｓｉ含有比率を抑制したＴｉＳｉＮに対して、微量のＮｂまたはＣｒを添加することで硬度が高まり、被覆切削工具の耐摩耗性が向上することを確認した。耐摩耗性が向上したメカニズムの詳細は不明であるが、ＮｂまたはＣｒがＴｉＮのＴｉの一部に置換することで、ＴｉとＮｂまたはＣｒの原子半径差により格子に歪が生じて硬化したためと推察される。
　Ｂ層のＴｉの含有比率が少なすぎたり多すぎたりすると硬質皮膜の耐摩耗性と耐熱性が低下する。そのため、Ｂ層は金属（半金属を含む）元素の総量でＴｉ（チタン）の含有比率が６０％以上９０％以下とする。
　Ｂ層のＳｉの含有比率が少なすぎると、皮膜組織の微細化が不十分となり硬質皮膜の耐摩耗性が低下する。また、Ｂ層のＳｉの含有比率が多すぎると、皮膜組織が微細になり過ぎて非晶質に近くなるために、硬質皮膜の耐摩耗性が低下する。そのため、Ｂ層は金属（半金属を含む）元素の総量でＳｉ（シリコン）の含有比率が５％以上２０％以下とする。
　Ｂ層のＮｂまたはＣｒの含有比率が少なすぎると硬質皮膜の耐摩耗性の改善効果が十分でない。一方、Ｂ層のＮｂまたはＣｒの含有比率が多すぎると脆弱なＮｂまたはＣｒの濃化相が多く析出して硬質皮膜の耐摩耗性が低下する。そのため、Ｂ層は金属（半金属を含む）元素の総量でＮｂ（ニオブ）またはＣｒ（クロム）の含有比率が１％以上１０％以下とする。更には、Ｂ層のＮｂまたはＣｒの含有比率は２％以上であることが好ましい。Ｂ層のＮｂまたはＣｒの含有比率は８％以下であることが好ましい。Ｂ層のＮｂまたはＣｒの含有比率は６％以下であることがより好ましい。
　本実施形態におけるＢ層は、ｆｃｃ構造であることが重要である。本実施形態において、ｆｃｃ構造であるとは、Ｘ線回折パターン又は透過型電子顕微鏡の制限視野回折パターンから求められる強度プロファイルにおいて、ｆｃｃ構造に起因するピーク強度が最大強度を示すものである。ｈｃｐ構造に起因する回折強度が最大強度を示す硬質皮膜は脆弱であるため、被覆切削工具として耐久性が乏しくなる。特に、湿式加工においては、耐久性が低下する傾向にある。Ｂ層は、Ｘ線回折パターンにおいて、ｈｃｐ構造に起因する回折強度を有しないことが好ましい。Ｂ層は、ｆｃｃ構造の中でも（２００）面のピーク強度が最大になる皮膜組織を有することで優れた耐久性を示す傾向にあり好ましい。
　Ｂ層は、Ｂ層を構成する硬質皮膜の平均結晶粒径が５ｎｍ以上５０ｎｍ以下であることが好ましい。硬質皮膜のミクロ組織が微細になり過ぎると、硬質皮膜の組織が非晶質に近くなるため、硬質皮膜の靭性及び硬度が低下する。硬質皮膜の結晶性を高めて脆弱な非晶質相を低減するには、硬質皮膜の平均結晶粒径を５ｎｍ以上とする。また、硬質皮膜のミクロ組織が粗大になり過ぎると、硬質皮膜の硬度が低下して被覆切削工具の耐久性が低下する傾向にある。硬質皮膜に高い硬度を付与して被覆切削工具の耐久性を高めるためには、硬質皮膜の平均結晶粒径を５０ｎｍ以下とする。更には、硬質皮膜の平均結晶粒径は３０ｎｍ以下であることが好ましい。
　硬質皮膜の平均結晶粒径は、Ｘ線回折の半価幅から測定することができる。
　Ｂ層はＡ層の直上に設けても良い。密着性をより高めるために、Ａ層とＢ層の間には、Ａ層とＢ層の組成を含有する積層皮膜を設けても良い。また、Ａ層とＢ層の組成以外の硬質皮膜をＡ層とＢ層の間に設けても良い。Ｂ層の上には他の硬質皮膜を設けても良い。
　本発明の実施形態に係る被覆切削工具は、特に、工具径が２ｍｍ以下である小径エンドミルに適用されることで、耐久性の向上効果がより一層効果的に発揮される点で好ましい。更には、工具径が１ｍｍ以下の小径エンドミルに本実施形態の被覆切削工具の構成を適用することが好ましい。
　本発明の実施形態に係る被覆切削工具では、Ａ層がＢ層よりも厚い膜であることが好ましい。基材側に設けられるＡ層をＢ層よりも厚い膜とすることで被覆切削工具の耐久性が高まる。また、Ａ層の膜厚は１．０μｍよりも大きく、Ｂ層の膜厚は０．５μｍよりも大きいことが好ましい。
　Ａ層およびＢ層のいずれについても、膜厚を大きくしすぎると剥離が生じやすくなり、被覆切削工具の耐久性が低下する。Ａ層およびＢ層の膜厚の上限は、中間層および表面層を含む硬質皮膜の構成によって異なる。一例を挙げるならば、Ａ層の膜厚の上限は４μｍ未満、Ｂ層の膜厚の上限は３．５μｍ未満、Ａ層とＢ層の合計膜厚の上限は５μｍ以下とすることが好ましい。
（実施例１）
　＜成膜装置＞
　硬質皮膜の成膜には、アークイオンプレーティング方式の成膜装置を用いた。本装置は、複数のカソード（アーク蒸発源）、真空容器および基材回転機構を含む。
　本装置は、３基のカソードＣ１、Ｃ２、Ｃ３を備える。Ｃ１は、ターゲット外周にコイル磁石を配備したカソードである。Ｃ２およびＣ３は、ターゲット背面および外周に永久磁石を配備したカソードである。Ｃ２およびＣ３は、ターゲットの垂直方向の磁束密度がターゲット中央付近で１４ｍＴ以上である。Ｃ２とＣ３に装着されるターゲットは、試料によって組成を変化させた。
　真空容器内は、内部を真空ポンプにより排気される。成膜ガスは供給ポートより真空容器内に導入される。真空容器内に設置した各基材にはバイアス電源が接続される。バイアス電源は、各基材に負圧のＤＣバイアス電圧を印加する。
　基材回転機構は、プラネタリーとプラネタリー上のプレート状治具、プレート状治具上のパイプ状治具を有する。プラネタリーは毎分３回転の速さで回転する。プレート状治具、パイプ状治具は夫々自公転する。
　＜基材＞
　物性評価および切削試験用の基材として、組成がＷＣ（ｂａｌ．）－Ｃｏ（８質量％）－Ｃｒ（０．５質量％）－ＶＣ（０．３質量％）、ＷＣ平均粒度０．６μｍ、硬度９３．９ＨＲＡ、からなる超硬合金製の２枚刃ボールエンドミルを準備した。なお、ＷＣは炭化タングステンを、Ｃｏはコバルトを、Ｃｒはクロムを、ＶＣは炭化バナジウムを、それぞれ表す。
　＜加熱および真空排気工程＞
　各基材をそれぞれ真空容器内のパイプ状冶具に固定し、成膜前プロセスを以下のように実施した。まず、真空容器内を８×１０－３Ｐａ以下に真空排気した。その後、真空容器内に設置したヒーターにより、基材温度が５００℃になるまで加熱し、真空排気を行った。これにより、基材温度を５００℃、真空容器内の圧力を８×１０－３Ｐａ以下とした。
　＜Ａｒボンバード工程＞
　その後、真空容器内にＡｒガスを導入し、容器内圧を０．６７Ｐａとした。その後、フィラメント電極に３５Ａの電流を供給し、基材に－２００Ｖの負圧のバイアス電圧を印加し、Ａｒボンバードを４分間実施した。
　＜Ｔｉボンバード工程＞
　その後、真空容器内の圧力が８×１０－３Ｐａ以下になるように真空排気した。続いて、基材にバイアス電圧を印加して、Ｔｉターゲットが装着されたＣ１に１５０Ａのアーク電流を供給してＴｉボンバード処理を実施した。Ｔｉボンバード処理により、基材の表面に、ＷとＴｉを含有する炭化物を１ｎｍ以上１０ｎｍ以下で形成した。Ｔｉボンバード処理により形成される炭化物の組成は、金属元素の含有比率でＷが６０原子％以上９０原子％以下、Ｔｉが１０原子％以上４０原子％以下であった。
　＜成膜工程＞
　Ｔｉボンバード後、直ちにＣ１への電力供給を中断した。そして、真空容器内のガスを窒素に置き換え、真空容器内の圧力を５Ｐａ、基材設定温度を５２０℃とした。ＡｌＣｒＳｉターゲットが装着されたＣ２に１５０Ａの電力を供給し、基材に印加する負圧のバイアス電圧を１２０Ｖ、カソード電圧を３０ＶとしてＡ層を被覆した。
　Ａ層の被覆後、Ｂ層を被覆した。Ｂ層の被覆では、Ｃ３のターゲットして、ＴｉＳｉＮｂターゲット、ＴｉＳｉＷターゲット、ＴｉＳｉＴａターゲット、またはＴｉＳｉターゲットを試料に応じて用いた。上記ターゲットが装着されたＣ３に１５０Ａの電力を供給し、基材に印加する負圧のバイアス電圧を５０Ｖ、カソード電圧を２５ＶとしてＢ層を被覆した。その後、略２５０℃以下に基材を冷却して真空容器から取り出した。そして、被覆後の各試料はブラスト処理による刃先の研磨処理を行った。
　硬質皮膜の組成は、波長分散型電子線プローブ微小分析（ＷＤＳ－ＥＰＭＡ）により測定した。測定条件は、加速電圧１０ｋＶ、試料電流５×１０－８Ａ、取り込み時間１０秒、分析領域直径１μｍ、分析深さが略１μｍで５点測定してその平均値から求めた。
　Ｘ線回折装置（スペクトリス株式会社製　ＥＭＰＹＲＥＡＮ　垂直型ゴニオメーター）を用いて結晶構造を確認した。測定条件は、管電圧４５ｋＶ、管電流４０ｍＡ、Ｘ線源Ｃｕｋα（λ＝０．１５４１８ｎｍ）、Ｘ線入射角３度、発散スリット１/２°、コリメーター０．２７ｍｍ、２θ＝２０～７０度とした。
　作製した各試料の被覆切削工具を用いて切削加工を行い、切削加工後の母材露出面積から被覆切削工具の耐久性を評価した。切削条件を以下に示す。
（条件）
・工具：２枚刃超硬ボールエンドミル
・型番：ＥＰＤＢＥＨ２００３－０．５－ＴＨ３　ボール半径０．１５ｍｍ・切削方法：ポケット加工（１ｍｍ×３ｍｍ×深さ０．４ｍｍ）・被削材：ＡＳＰ２３（６４ＨＲＣ）
・切り込み：軸方向、０．０１３ｍｍ、径方向、０．０１３ｍｍ・切削速度：３７．７ｍ／ｍｉｎ
・一刃送り量：０．００４５ｍｍ／刃
・切削油：ミストブロー（油性）
・加工個数：７ポケット
・評価方法：母材露出面積は、切削加工後、走査型電子顕微鏡を用いて倍率６００倍で観察し、工具の超硬基材が露出した面積を算出した。母材露出面積の算出には市販の画像解析ソフトを用いた。評価結果を表１に纏める。
Figure JPOXMLDOC01-appb-T000001
　本発明例および比較例の何れもＡ層とＢ層はＸＲＤ回折においてｆｃｃ構造の単相であった。また、Ａ層は、特許第６４１０７９７号と同様の方法で、Ａ層の制限視野回折パターンの強度プロファイルを評価した場合、Ａ層のＩｈ×１００／Ｉｓの値は２０以下であった。また、Ｂ層はｆｃｃ（２００）面のピーク強度が最大であり、平均結晶粒径は５ｎｍ以上５０ｎｍ以下であった。
　Ｓｉを一定量含有して皮膜組織を微細化したＡ層の上層にＢ層に微量のＮｂを添加した本発明例１～３はいずれも母材の露出面積が小さく優れた耐久性を示した。特に、Ａ層とＢ層の総膜厚が厚い本発明例３は母材露出面積が小さくなり、より優れた耐久性を示した。
　一方、比較例１のＢ層は微量のＮｂを添加しているがＳｉの含有量が多いため、本発明例に比べて母材露出面積が大きくなった。
　比較例２、３はＮｂに変えてＷ（タングステン）とＴａ（タンタル）を微量添加したが、Ｂ層の硬化が十分でなく、本発明例に比べて母材露出面積が大きくなった。
　比較例４は、Ｂ層にＮｂを微量添加していないため、本発明例に比べて母材露出面積が大きくなった。
　比較例５は、Ａ層のＳｉ含有比率が小さいため皮膜組織の柱状粒子が大きく、本発明例１と同じＢ層を設けても母材露出面積が大きくなった。
　比較例６は、Ｂ層のＮｂの含有比率が大きいためＮｂの濃化相が粗大となり、母材露出面積が大きくなった。
　（実施例２）
　実施例２では、実施例１と同一の成膜装置を用いて、基材上にＡ層とＢ層とからなる硬質皮膜を成膜することで被覆切削工具を作製した。実施例２ではＢ層として、Ｃｒを含むＴｉＳｉＮ系の皮膜を形成した。実施例２の基材には、実施例１と同種の基材を用いた。
　実施例２における硬質皮膜の形成工程では、実施例１と同様に、加熱および真空排気工程、Ａｒボンバード工程、Ｔｉボンバード工程を実施した後、成膜工程を実施した。成膜工程では、Ｂ層を形成するためのターゲットとして、実施例１のＴｉＳｉＮｂターゲットに代えて、ＴｉＳｉＣｒターゲットを用いた。
　加熱および真空排気工程、Ａｒボンバード工程、およびＴｉボンバード工程については、実施例１と同様であるから説明を省略する。
　＜成膜工程＞
　Ｔｉボンバード後、直ちにＣ１への電力供給を中断した。そして、真空容器内のガスを窒素に置き換え、真空容器内の圧力を５Ｐａ、基材設定温度を５２０℃とした。ＡｌＣｒＳｉターゲットが装着されたＣ２に１５０Ａの電力を供給し、基材に印加する負圧のバイアス電圧を１２０Ｖ、カソード電圧を３０ＶとしてＡ層を被覆した。
　Ａ層の被覆後、Ｂ層を被覆した。Ｂ層の被覆では、Ｃ３のターゲットして、ＴｉＳｉＣｒターゲット、ＴｉＳｉＷターゲット、ＴｉＳｉＴａターゲット、またはＴｉＳｉターゲットを試料に応じて用いた。上記ターゲットが装着されたＣ３に１５０Ａの電力を供給し、基材に印加する負圧のバイアス電圧を５０Ｖ、カソード電圧を２５ＶとしてＢ層を被覆した。その後、略２５０℃以下に基材を冷却して真空容器から取り出した。そして、被覆後の各試料はブラスト処理による刃先の研磨処理を行った。
Figure JPOXMLDOC01-appb-T000002
　実施例２において、本発明例および比較例の何れもＡ層とＢ層はＸＲＤ回折においてｆｃｃ構造の単相であった。また、Ａ層は、特許第６４１０７９７号と同様の方法で、Ａ層の制限視野回折パターンの強度プロファイルを評価した場合、Ａ層のＩｈ×１００／Ｉｓの値は２０以下であった。また、Ｂ層はｆｃｃ（２００）面のピーク強度が最大であり、平均結晶粒径は５ｎｍ以上５０ｎｍ以下であった。
　Ｓｉを一定量含有して皮膜組織を微細化したＡ層の上層にＢ層に微量のＣｒを添加した本発明例２１～２３はいずれも母材の露出面積が小さく優れた耐久性を示した。特に、Ａ層とＢ層の総膜厚が厚い本発明例２３は母材露出面積が小さくなり、より優れた耐久性を示した。
　一方、比較例２１のＢ層は微量のＣｒを添加しているがＳｉの含有量が多いため、本発明例に比べて母材露出面積が大きくなった。
　比較例２２、２３はＣｒに変えてＷ（タングステン）とＴａ（タンタル）を微量添加したが、Ｂ層の硬化が十分でなく、本発明例に比べて母材露出面積が大きくなった。
　比較例２４は、Ｂ層にＣｒを微量添加していないため、本発明例に比べて母材露出面積が大きくなった。
　比較例２５は、Ａ層のＳｉ含有比率が小さいため皮膜組織の柱状粒子が大きく、本発明例２１と同じＢ層を設けても母材露出面積が大きくなった。
　比較例２６は、Ｂ層のＣｒの含有比率が大きいためＣｒの濃化相が粗大となり、母材露出面積が大きくなった。

Claims (2)

  1. 　基材の表面に、金属（半金属を含む）元素の総量でアルミニウム（Ａｌ）の含有比率が５０原子％以上、クロム（Ｃｒ）の含有比率が２０原子％以上、アルミニウム（Ａｌ）とクロム（Ｃｒ）の合計の含有比率が８５原子％以上、ケイ素（Ｓｉ）の含有比率が４原子％以上１５原子％以下の窒化物又は炭窒化物である面心立方格子構造のＡ層と、前記Ａ層の上に設けられるＢ層と、を有する被覆切削工具において、
    　前記Ｂ層は、金属（半金属を含む）元素の総量でＴｉ（チタン）の含有比率が７０原子％以上９０原子％以下、シリコン（Ｓｉ）の含有比率が５原子％以上２０原子％以下、ニオブ（Ｎｂ）またはクロム（Ｃｒ）の含有比率が１原子％以上１０原子％以下の窒化物又は炭窒化物であり面心立方格子構造であることを特徴とする被覆切削工具。
  2. 　前記Ａ層の膜厚は１．０μｍよりも大きく、前記Ｂ層の膜厚は０．５μｍよりも大きいことを特徴とする請求項１に記載の被覆切削工具。
PCT/JP2020/039604 2019-11-27 2020-10-21 被覆切削工具 WO2021106440A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN202080067356.0A CN114531856A (zh) 2019-11-27 2020-10-21 包覆切削工具
KR1020227009568A KR20220050204A (ko) 2019-11-27 2020-10-21 피복 절삭 공구
EP20892552.9A EP4066970B1 (en) 2019-11-27 2020-10-21 Coated cutting tool
US17/762,809 US20220331882A1 (en) 2019-11-27 2020-10-21 Coated cutting tool

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2019-214083 2019-11-27
JP2019214083A JP7406079B2 (ja) 2019-11-27 2019-11-27 被覆切削工具
JP2019-213826 2019-11-27
JP2019213826A JP7406078B2 (ja) 2019-11-27 2019-11-27 被覆切削工具

Publications (1)

Publication Number Publication Date
WO2021106440A1 true WO2021106440A1 (ja) 2021-06-03

Family

ID=76129323

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2020/039604 WO2021106440A1 (ja) 2019-11-27 2020-10-21 被覆切削工具

Country Status (5)

Country Link
US (1) US20220331882A1 (ja)
EP (1) EP4066970B1 (ja)
KR (1) KR20220050204A (ja)
CN (1) CN114531856A (ja)
WO (1) WO2021106440A1 (ja)

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6410797B2 (ja) 1979-04-04 1989-02-22 Hotsuhotenperatooru Reakutoorubau Gmbh
JP2006137982A (ja) * 2004-11-11 2006-06-01 Hitachi Tool Engineering Ltd 硬質皮膜被覆部材及びその被覆方法
JP2011093085A (ja) * 2009-10-01 2011-05-12 Hitachi Tool Engineering Ltd 硬質皮膜被覆工具
JP2013233603A (ja) * 2012-05-08 2013-11-21 Sumitomo Electric Hardmetal Corp 表面被覆切削工具
WO2014156699A1 (ja) 2013-03-29 2014-10-02 日立ツール株式会社 被覆切削工具
US20150023751A1 (en) * 2012-03-07 2015-01-22 Seco Tools Ab Nanolaminated coated cutting tool
WO2015141743A1 (ja) 2014-03-18 2015-09-24 日立金属株式会社 被覆切削工具及びその製造方法
JP2016078131A (ja) 2014-10-10 2016-05-16 日立金属株式会社 被覆切削工具
WO2017037955A1 (ja) * 2015-09-04 2017-03-09 オーエスジー株式会社 硬質被膜および硬質被膜被覆部材
JP2019213826A (ja) 2018-06-14 2019-12-19 株式会社ユニバーサルエンターテインメント 遊技機
JP2019214083A (ja) 2018-06-11 2019-12-19 坂崎彫刻工業株式会社 シートカッティング装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2098611B1 (en) * 2008-03-07 2013-02-13 Seco Tools AB Layered coated cutting tool
JP2017001147A (ja) * 2015-06-12 2017-01-05 日立金属株式会社 被覆切削工具
WO2017073653A1 (ja) * 2015-10-28 2017-05-04 三菱マテリアル株式会社 表面被覆切削工具
JP2019171482A (ja) * 2018-03-26 2019-10-10 三菱マテリアル株式会社 表面被覆切削工具

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6410797B2 (ja) 1979-04-04 1989-02-22 Hotsuhotenperatooru Reakutoorubau Gmbh
JP2006137982A (ja) * 2004-11-11 2006-06-01 Hitachi Tool Engineering Ltd 硬質皮膜被覆部材及びその被覆方法
JP2011093085A (ja) * 2009-10-01 2011-05-12 Hitachi Tool Engineering Ltd 硬質皮膜被覆工具
US20150023751A1 (en) * 2012-03-07 2015-01-22 Seco Tools Ab Nanolaminated coated cutting tool
JP2013233603A (ja) * 2012-05-08 2013-11-21 Sumitomo Electric Hardmetal Corp 表面被覆切削工具
WO2014156699A1 (ja) 2013-03-29 2014-10-02 日立ツール株式会社 被覆切削工具
WO2015141743A1 (ja) 2014-03-18 2015-09-24 日立金属株式会社 被覆切削工具及びその製造方法
JP2016078131A (ja) 2014-10-10 2016-05-16 日立金属株式会社 被覆切削工具
WO2017037955A1 (ja) * 2015-09-04 2017-03-09 オーエスジー株式会社 硬質被膜および硬質被膜被覆部材
JP2019214083A (ja) 2018-06-11 2019-12-19 坂崎彫刻工業株式会社 シートカッティング装置
JP2019213826A (ja) 2018-06-14 2019-12-19 株式会社ユニバーサルエンターテインメント 遊技機

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP4066970A4

Also Published As

Publication number Publication date
KR20220050204A (ko) 2022-04-22
EP4066970A1 (en) 2022-10-05
EP4066970B1 (en) 2024-04-17
CN114531856A (zh) 2022-05-24
US20220331882A1 (en) 2022-10-20
EP4066970A4 (en) 2023-04-12

Similar Documents

Publication Publication Date Title
JP6410797B2 (ja) 被覆切削工具及びその製造方法
RU2602577C2 (ru) Нанослойное покрытие для высококачественных инструментов
WO2019098363A1 (ja) 被覆切削工具
WO2020189256A1 (ja) 被覆切削工具
JP5700171B2 (ja) 被覆切削工具
JP2023179643A (ja) 被覆工具
JP2012228735A (ja) 耐摩耗性に優れる被覆工具およびその製造方法
WO2022202729A1 (ja) 被覆切削工具
JP6844704B2 (ja) 被覆切削工具
WO2021106440A1 (ja) 被覆切削工具
JP7406079B2 (ja) 被覆切削工具
JP7406078B2 (ja) 被覆切削工具
JP6794604B1 (ja) 切削工具
WO2020189252A1 (ja) 被覆切削工具
WO2023181927A1 (ja) 被覆部材
JP7410383B2 (ja) 被覆切削工具
WO2021131232A1 (ja) 被覆切削工具
JP7031791B2 (ja) 被覆切削工具
CN112262007B (zh) 切削工具
JP2024075109A (ja) 被覆切削工具
JPWO2020213263A1 (ja) 切削工具

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 20892552

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 20227009568

Country of ref document: KR

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 2020892552

Country of ref document: EP

Effective date: 20220627