WO2020187744A1 - Improved coating processes - Google Patents

Improved coating processes Download PDF

Info

Publication number
WO2020187744A1
WO2020187744A1 PCT/EP2020/056864 EP2020056864W WO2020187744A1 WO 2020187744 A1 WO2020187744 A1 WO 2020187744A1 EP 2020056864 W EP2020056864 W EP 2020056864W WO 2020187744 A1 WO2020187744 A1 WO 2020187744A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
substrate
cva
coating
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2020/056864
Other languages
English (en)
French (fr)
Inventor
Shi XU
Tang ZHI
Zhang Yang RONG
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NANOFILM VACUUM COATING (SHANGHAI) CO Ltd
Schlich Ltd
Nanofilm Technologies International Ltd
Original Assignee
NANOFILM VACUUM COATING (SHANGHAI) CO Ltd
Schlich Ltd
Nanofilm Technologies International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NANOFILM VACUUM COATING (SHANGHAI) CO Ltd, Schlich Ltd, Nanofilm Technologies International Ltd filed Critical NANOFILM VACUUM COATING (SHANGHAI) CO Ltd
Priority to SG11202109137XA priority Critical patent/SG11202109137XA/en
Priority to EP20714895.8A priority patent/EP3938556A1/en
Priority to US17/437,648 priority patent/US20220162739A1/en
Priority to JP2021555506A priority patent/JP7382124B2/ja
Publication of WO2020187744A1 publication Critical patent/WO2020187744A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Definitions

  • PVD Physical Vapor Deposition
  • Tetrahedral hydrogen-free amorphous carbon is characterised in that it contains little or no hydrogen (less than 5%mol, typically less than 2%mol) and a high content of sp 3 hybridised carbon atoms (typically greater than 80% of the carbon atoms being in the sp 3 state).
  • the invention can provide a sputter coating with improved adhesion to another coating, e.g. one deposited by a FCVA method.
  • the invention also provides a method of depositing a coating comprising a first material and a second material on a substrate, the method comprising:
  • the coating comprises two co-deposited transition layers of the invention.
  • the first transition layer (layer c) promotes adhesion between the seed layer and the ta- C layer.
  • the second transition layer (layer e) promotes adhesion between the ta-C layer and the top, (coloured) sputtered layer.
  • the CVA station is an FCVA station, for depositing material via FCVA onto the substrate.
  • the sputtering station is suitably a magnetron sputtering station.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
PCT/EP2020/056864 2019-03-15 2020-03-13 Improved coating processes Ceased WO2020187744A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
SG11202109137XA SG11202109137XA (en) 2019-03-15 2020-03-13 Improved coating processes
EP20714895.8A EP3938556A1 (en) 2019-03-15 2020-03-13 Improved coating processes
US17/437,648 US20220162739A1 (en) 2019-03-15 2020-03-13 Improved coating processes
JP2021555506A JP7382124B2 (ja) 2019-03-15 2020-03-13 改良されたコーティングプロセス

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP19163306.4 2019-03-15
EP19163306 2019-03-15

Publications (1)

Publication Number Publication Date
WO2020187744A1 true WO2020187744A1 (en) 2020-09-24

Family

ID=65818247

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2020/056864 Ceased WO2020187744A1 (en) 2019-03-15 2020-03-13 Improved coating processes

Country Status (6)

Country Link
US (1) US20220162739A1 (https=)
EP (1) EP3938556A1 (https=)
JP (1) JP7382124B2 (https=)
CN (1) CN111690898B (https=)
SG (1) SG11202109137XA (https=)
WO (1) WO2020187744A1 (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022101416A1 (en) 2020-11-13 2022-05-19 Nanofilm Vacuum Coating (Shanghai) Co., Ltd. Piston rings and methods of manufacture
WO2022253859A1 (en) * 2021-06-04 2022-12-08 Nanofilm Technologies International Limited Anti-static coating
WO2024094870A1 (en) 2022-11-03 2024-05-10 Nanofilm Technologies International Limited Sealed electrical devices
WO2024094872A1 (en) 2022-11-03 2024-05-10 Nanofilm Technologies International Limited Coated solar cell

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116695079B (zh) * 2023-06-09 2024-04-02 深圳市博源碳晶科技有限公司 一种导热绝缘金刚石复合材料基板及其制备方法和应用
CN117488247B (zh) * 2023-10-31 2026-03-31 中国航发动力股份有限公司 一种热障涂层的制备方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0306612A1 (de) 1987-08-26 1989-03-15 Balzers Aktiengesellschaft Verfahren zur Aufbringung von Schichten auf Substraten
EP0668369A1 (de) 1994-02-21 1995-08-23 Hauzer Holding B.V. PVD-Verfahren zur Abscheidung von mehrkomponentigen Hartstoffschichten
US20020007796A1 (en) 2000-04-10 2002-01-24 Gorokhovsky Vladimir I. Filtered cathodic arc deposition method and apparatus
WO2002070776A1 (en) 2001-03-05 2002-09-12 Commonwealth Scientific And Industrial Research O Rganisation Deposition process
US20170121810A1 (en) 2014-04-02 2017-05-04 Mahle Metal Leve S/A Sliding element, internal combustion engine and process for obtaining sliding element
US20180247797A1 (en) * 2011-09-07 2018-08-30 Vladimir Gorokhovsky Reactors For Plasma-Assisted Processes And Associated Methods
CN108823544A (zh) 2018-09-12 2018-11-16 杨杰平 基于氮化钛复合膜及其制备方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5306407A (en) * 1989-06-27 1994-04-26 Hauzer Holding Bv Method and apparatus for coating substrates
US5358615A (en) * 1993-10-04 1994-10-25 Motorola, Inc. Process for forming a sputter deposited metal film
US6923891B2 (en) * 2003-01-10 2005-08-02 Nanofilm Technologies International Pte Ltd. Copper interconnects
JP4939032B2 (ja) * 2005-02-08 2012-05-23 株式会社神戸製鋼所 硬質皮膜、および硬質皮膜の製造方法
CN100519828C (zh) * 2005-04-27 2009-07-29 北京实力源科技开发有限责任公司 一种真空镀膜方法和设备
JP4607687B2 (ja) * 2005-07-04 2011-01-05 株式会社神戸製鋼所 非晶質炭素膜の成膜方法
JP2007291429A (ja) * 2006-04-24 2007-11-08 Nissan Motor Co Ltd 硬質炭素被膜
CN100506527C (zh) * 2007-06-26 2009-07-01 广州有色金属研究院 金属碳化物/类金刚石(MeC/DLC)纳米多层膜材料及其制备方法
JP2009283107A (ja) * 2008-05-26 2009-12-03 Fuji Electric Device Technology Co Ltd テトラヘドラル・アモルファス・カーボン膜を主体とする保護膜および該保護膜を有する磁気記録媒体
US20110186420A1 (en) * 2008-06-09 2011-08-04 Nanofilm Technologies International Pte Ltd Method for rapid deposition of a coating on a substrate
DE102010028558A1 (de) * 2010-05-04 2011-11-10 Walter Ag PVD-Hybridverfahren zum Abscheiden von Mischkristallschichten
JP5226826B2 (ja) * 2011-04-25 2013-07-03 株式会社神戸製鋼所 ダイヤモンドライクカーボン硬質多層膜成形体の製造方法
US9793098B2 (en) * 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
CN106282935A (zh) * 2015-05-15 2017-01-04 新科实业有限公司 具有类金刚石涂层的材料及其制备方法
CN107022740A (zh) * 2016-01-29 2017-08-08 广东耐信镀膜科技有限公司 一种超硬多层复合类金刚石涂层及其制备方法
CN107022761B (zh) * 2017-04-28 2023-11-03 星弧涂层新材料科技（苏州）股份有限公司 基于类金刚石薄膜的复合厚膜及其镀膜方法
CN207313693U (zh) * 2017-04-28 2018-05-04 星弧涂层新材料科技（苏州）股份有限公司 基于类金刚石薄膜的复合厚膜
CN107779839B (zh) * 2017-11-15 2019-07-23 温州职业技术学院 基于阳极技术的dlc镀膜方法
CN109136872A (zh) * 2018-10-11 2019-01-04 华杰新材料科技（苏州）有限公司 一种不锈钢基材表面CrN涂层制备方法
CN109371360A (zh) * 2018-12-13 2019-02-22 纳峰真空镀膜（上海）有限公司 一种应用于低温材料上的耐磨类金刚石涂层的制备方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0306612A1 (de) 1987-08-26 1989-03-15 Balzers Aktiengesellschaft Verfahren zur Aufbringung von Schichten auf Substraten
EP0668369A1 (de) 1994-02-21 1995-08-23 Hauzer Holding B.V. PVD-Verfahren zur Abscheidung von mehrkomponentigen Hartstoffschichten
US20020007796A1 (en) 2000-04-10 2002-01-24 Gorokhovsky Vladimir I. Filtered cathodic arc deposition method and apparatus
WO2002070776A1 (en) 2001-03-05 2002-09-12 Commonwealth Scientific And Industrial Research O Rganisation Deposition process
US20180247797A1 (en) * 2011-09-07 2018-08-30 Vladimir Gorokhovsky Reactors For Plasma-Assisted Processes And Associated Methods
US20170121810A1 (en) 2014-04-02 2017-05-04 Mahle Metal Leve S/A Sliding element, internal combustion engine and process for obtaining sliding element
CN108823544A (zh) 2018-09-12 2018-11-16 杨杰平 基于氮化钛复合膜及其制备方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NEUVILLE S: "New application perspective for tetrahedral amorphous carbon coatings", QSCIENCE CONNECT, vol. 2014, pages 8, Retrieved from the Internet <URL:http://dx.doi.org/10.5339/connect.2014.8>

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022101416A1 (en) 2020-11-13 2022-05-19 Nanofilm Vacuum Coating (Shanghai) Co., Ltd. Piston rings and methods of manufacture
WO2022253859A1 (en) * 2021-06-04 2022-12-08 Nanofilm Technologies International Limited Anti-static coating
WO2024094870A1 (en) 2022-11-03 2024-05-10 Nanofilm Technologies International Limited Sealed electrical devices
WO2024094872A1 (en) 2022-11-03 2024-05-10 Nanofilm Technologies International Limited Coated solar cell

Also Published As

Publication number Publication date
CN111690898B (zh) 2024-04-26
JP2022525212A (ja) 2022-05-11
SG11202109137XA (en) 2021-09-29
CN111690898A (zh) 2020-09-22
US20220162739A1 (en) 2022-05-26
JP7382124B2 (ja) 2023-11-16
EP3938556A1 (en) 2022-01-19

Similar Documents

Publication Publication Date Title
WO2020187744A1 (en) Improved coating processes
CN110894605B (zh) 耐腐蚀碳基涂层
US5679448A (en) Method of coating the surface of a substrate and a coating material
US6287711B1 (en) Wear-resistant coating and component
US20240093344A1 (en) Hard carbon coatings with improved adhesion strength by means of hipims and method thereof
JP5096371B2 (ja) 相対的に柔らかい支持材と相対的に硬い装飾層を有する物品およびその製造方法
US11643733B2 (en) ta-C based coatings with improved hardness
CN110578123A (zh) 高硬度AlTiN/AlTiSiN多层纳米复合涂层及其制备工艺
CN111183269A (zh) 具有耐蚀滑动面的涂覆阀门部件
CN110578122A (zh) 一种AlTiN/AlTiSiN多层纳米复合涂层的制备工艺
CN109097743A (zh) 一种超硬W-Cr-Al-Ti-N纳米梯度多层膜及其制备方法
CN112410727B (zh) 一种新型WCrSiN梯度涂层及其制备方法
US8372524B2 (en) Coated article
CN110684954B (zh) 金属制品及其制备方法和手机后壳
KR102168776B1 (ko) 이중층 크롬 나이트라이드 코팅된 물품들 및 관련된 방법들
CN112458417A (zh) 一种多元层状加硬涂层生长工艺
WO2022069686A1 (en) Ai-rich aicrn coating layers produced by pvd from metallic targets
CN110578114A (zh) 一种掺杂的类石墨复合薄膜及其制备方法、含有掺杂的类石墨复合薄膜的部件
US20240011145A1 (en) Molybdenum nitride based multilayer coating for wear and friction reduction
CN116904926A (zh) 一种多元复合氮化物涂层及其制备方法
EP4731803A1 (en) Coated plastic or metal substrate and method for producing a metal-looking coaching
JP2004244688A (ja) 窒化チタン被覆チタン材およびその製造方法
CN115961244A (zh) 液压阀杆用新型pvd硬质耐磨润滑涂层的制备方法
CN114574802A (zh) 一种新型碳化铬涂层及其制备方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 20714895

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2021555506

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2020714895

Country of ref document: EP