CN111690898B - 改进的镀膜工艺 - Google Patents

改进的镀膜工艺 Download PDF

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Publication number
CN111690898B
CN111690898B CN202010178790.8A CN202010178790A CN111690898B CN 111690898 B CN111690898 B CN 111690898B CN 202010178790 A CN202010178790 A CN 202010178790A CN 111690898 B CN111690898 B CN 111690898B
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layer
cva
film
substrate
depositing
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Chinese (zh)
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CN111690898A (zh
Inventor
史旭
唐智
章杨荣
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Nafeng Vacuum Coating Shanghai Co ltd
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Nafeng Vacuum Coating Shanghai Co ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/027—Graded interfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
CN202010178790.8A 2019-03-15 2020-03-15 改进的镀膜工艺 Active CN111690898B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP19163306.4 2019-03-15
EP19163306 2019-03-15

Publications (2)

Publication Number Publication Date
CN111690898A CN111690898A (zh) 2020-09-22
CN111690898B true CN111690898B (zh) 2024-04-26

Family

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Country Status (6)

Country Link
US (1) US20220162739A1 (https=)
EP (1) EP3938556A1 (https=)
JP (1) JP7382124B2 (https=)
CN (1) CN111690898B (https=)
SG (1) SG11202109137XA (https=)
WO (1) WO2020187744A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114483362B (zh) 2020-11-13 2024-05-28 纳峰真空镀膜（上海）有限公司 活塞环及制造方法
WO2022253859A1 (en) * 2021-06-04 2022-12-08 Nanofilm Technologies International Limited Anti-static coating
WO2024094870A1 (en) 2022-11-03 2024-05-10 Nanofilm Technologies International Limited Sealed electrical devices
WO2024094872A1 (en) 2022-11-03 2024-05-10 Nanofilm Technologies International Limited Coated solar cell
CN116695079B (zh) * 2023-06-09 2024-04-02 深圳市博源碳晶科技有限公司 一种导热绝缘金刚石复合材料基板及其制备方法和应用
CN117488247B (zh) * 2023-10-31 2026-03-31 中国航发动力股份有限公司 一种热障涂层的制备方法

Citations (17)

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US4877505A (en) * 1987-08-26 1989-10-31 Balzers Aktiengesellschaft Method and apparatus for application of coatings on substrates
WO1991000374A1 (de) * 1989-06-27 1991-01-10 Hauzer Holding Bv Verfahren und vorrichtung zur beschichtung von substraten
US5358615A (en) * 1993-10-04 1994-10-25 Motorola, Inc. Process for forming a sputter deposited metal film
WO2002070776A1 (en) * 2001-03-05 2002-09-12 Commonwealth Scientific And Industrial Research O Rganisation Deposition process
EP1688513A1 (en) * 2005-02-08 2006-08-09 Kabushiki Kaisha Kobe Seiko Sho Hard coating, target for forming hard coating, and method for forming hard coating
CN1854333A (zh) * 2005-04-27 2006-11-01 北京实力源科技开发有限责任公司 一种新的真空镀膜方法和设备
CN101081557A (zh) * 2007-06-26 2007-12-05 广州有色金属研究院 金属碳化物/类金刚石(MeC/DLC)纳米多层膜材料及其制备方法
WO2009151403A1 (en) * 2008-06-09 2009-12-17 Nanofilm Technologies International Pte Ltd A method for rapid deposition of a coating on a substrate
JP2011225995A (ja) * 2011-04-25 2011-11-10 Kobe Steel Ltd ダイヤモンドライクカーボン硬質多層膜成形体の製造方法
CN102933737A (zh) * 2010-05-04 2013-02-13 瓦尔特公开股份有限公司 用于沉积混合晶体层的pvd混合方法
CN107022740A (zh) * 2016-01-29 2017-08-08 广东耐信镀膜科技有限公司 一种超硬多层复合类金刚石涂层及其制备方法
CN107022761A (zh) * 2017-04-28 2017-08-08 星弧涂层新材料科技（苏州）股份有限公司 基于类金刚石薄膜的复合厚膜及其镀膜方法
CN107779839A (zh) * 2017-11-15 2018-03-09 温州职业技术学院 基于阳极技术的dlc镀膜方法
CN207313693U (zh) * 2017-04-28 2018-05-04 星弧涂层新材料科技（苏州）股份有限公司 基于类金刚石薄膜的复合厚膜
CN108823544A (zh) * 2018-09-12 2018-11-16 杨杰平 基于氮化钛复合膜及其制备方法
CN109136872A (zh) * 2018-10-11 2019-01-04 华杰新材料科技（苏州）有限公司 一种不锈钢基材表面CrN涂层制备方法
CN109371360A (zh) * 2018-12-13 2019-02-22 纳峰真空镀膜（上海）有限公司 一种应用于低温材料上的耐磨类金刚石涂层的制备方法

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US4877505A (en) * 1987-08-26 1989-10-31 Balzers Aktiengesellschaft Method and apparatus for application of coatings on substrates
WO1991000374A1 (de) * 1989-06-27 1991-01-10 Hauzer Holding Bv Verfahren und vorrichtung zur beschichtung von substraten
US5358615A (en) * 1993-10-04 1994-10-25 Motorola, Inc. Process for forming a sputter deposited metal film
WO2002070776A1 (en) * 2001-03-05 2002-09-12 Commonwealth Scientific And Industrial Research O Rganisation Deposition process
EP1688513A1 (en) * 2005-02-08 2006-08-09 Kabushiki Kaisha Kobe Seiko Sho Hard coating, target for forming hard coating, and method for forming hard coating
CN1854333A (zh) * 2005-04-27 2006-11-01 北京实力源科技开发有限责任公司 一种新的真空镀膜方法和设备
CN101081557A (zh) * 2007-06-26 2007-12-05 广州有色金属研究院 金属碳化物/类金刚石(MeC/DLC)纳米多层膜材料及其制备方法
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WO2009151403A1 (en) * 2008-06-09 2009-12-17 Nanofilm Technologies International Pte Ltd A method for rapid deposition of a coating on a substrate
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CN102933737A (zh) * 2010-05-04 2013-02-13 瓦尔特公开股份有限公司 用于沉积混合晶体层的pvd混合方法
JP2011225995A (ja) * 2011-04-25 2011-11-10 Kobe Steel Ltd ダイヤモンドライクカーボン硬質多層膜成形体の製造方法
CN107022740A (zh) * 2016-01-29 2017-08-08 广东耐信镀膜科技有限公司 一种超硬多层复合类金刚石涂层及其制备方法
CN107022761A (zh) * 2017-04-28 2017-08-08 星弧涂层新材料科技（苏州）股份有限公司 基于类金刚石薄膜的复合厚膜及其镀膜方法
CN207313693U (zh) * 2017-04-28 2018-05-04 星弧涂层新材料科技（苏州）股份有限公司 基于类金刚石薄膜的复合厚膜
CN107779839A (zh) * 2017-11-15 2018-03-09 温州职业技术学院 基于阳极技术的dlc镀膜方法
CN108823544A (zh) * 2018-09-12 2018-11-16 杨杰平 基于氮化钛复合膜及其制备方法
CN109136872A (zh) * 2018-10-11 2019-01-04 华杰新材料科技（苏州）有限公司 一种不锈钢基材表面CrN涂层制备方法
CN109371360A (zh) * 2018-12-13 2019-02-22 纳峰真空镀膜（上海）有限公司 一种应用于低温材料上的耐磨类金刚石涂层的制备方法

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JP2022525212A (ja) 2022-05-11
SG11202109137XA (en) 2021-09-29
CN111690898A (zh) 2020-09-22
US20220162739A1 (en) 2022-05-26
JP7382124B2 (ja) 2023-11-16
EP3938556A1 (en) 2022-01-19
WO2020187744A1 (en) 2020-09-24

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