WO2020179967A1 - Appareil de dépôt multi-vide comprenant une pluralité de creusets mobiles disposés sur une partie de fermeture étanche à l'air inférieure qui se déplace vers le haut et vers le bas - Google Patents

Appareil de dépôt multi-vide comprenant une pluralité de creusets mobiles disposés sur une partie de fermeture étanche à l'air inférieure qui se déplace vers le haut et vers le bas Download PDF

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Publication number
WO2020179967A1
WO2020179967A1 PCT/KR2019/004863 KR2019004863W WO2020179967A1 WO 2020179967 A1 WO2020179967 A1 WO 2020179967A1 KR 2019004863 W KR2019004863 W KR 2019004863W WO 2020179967 A1 WO2020179967 A1 WO 2020179967A1
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WO
WIPO (PCT)
Prior art keywords
crucible
coupled
moving
chamber
vacuum deposition
Prior art date
Application number
PCT/KR2019/004863
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English (en)
Korean (ko)
Inventor
김대일
박경배
조용흠
김찬귀
방재오
정희진
박수환
Original Assignee
주식회사 넵시스
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Filing date
Publication date
Application filed by 주식회사 넵시스 filed Critical 주식회사 넵시스
Publication of WO2020179967A1 publication Critical patent/WO2020179967A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Definitions

  • the present invention relates to a vacuum deposition apparatus, and more particularly, to a multiple vacuum deposition apparatus capable of depositing a plurality of substrates at the same time by having a plurality of moving crucibles.
  • the vacuum deposition apparatus is an apparatus for coating a substrate such as a glass panel with a deposition material in a chamber in a vacuum state, and may evaporate the deposition material in a crucible to deposit a surface of the substrate. Atoms and molecules of the vaporized deposit form a thin film while condensing on a substrate having a relatively low temperature.
  • Patent Registration No. 1760257 (Vacuum deposition apparatus and vacuum deposition method for glass products using electron beams), a rotating disk is installed on the upper side of the chamber, and a cradle for fixing the substrate to the lower end of the rotating disk is provided. A number of crucibles are rotated around a rotation axis in the lower part of the chamber.
  • the present invention is to solve the problems of the prior art
  • the crucible can be varied by optimizing the deposition conditions of the substrate so that the deposited material is effectively deposited on the substrate,
  • the multiple vacuum deposition apparatus of the present invention for achieving this purpose may be configured to include a chamber, a crucible, and the like.
  • the chamber may have a floor sealing part that forms a space therein and is detachable and elevating below it.
  • the crucible portion can move radially along the inner surface of the bottom sealing portion of the chamber.
  • the crucible portion may be provided with a plurality.
  • the crucible portion may include a dopant crucible portion and a host crucible portion.
  • the dopant crucible portion is disposed in the center of the inner surface of the bottom sealing portion of the chamber and can move radially.
  • the host crucible portion is radially disposed on the inner surface of the bottom sealing portion of the chamber and can move radially.
  • the crucible part may be composed of a crucible, a rail part, a transfer part, an outer shaft rotation part, and the like.
  • Crucibles can contain deposits and produce vaporized deposits.
  • the rail portion is provided on the inner surface of the bottom sealing portion to guide the crucible horizontally in a radial direction.
  • the conveying unit can move the crucible along the rail unit.
  • the outer rotating shaft portion may be coupled through the bottom sealing portion of the chamber.
  • One side of the outer rotating shaft part may be coupled to one side of the transfer part to support one side of the transfer part so as to be capable of axial rotation.
  • the other side of the outer rotating shaft part may be coupled to the bottom sealing part to shield the interior of the chamber in a vacuum state.
  • the crucible unit may include a crucible shutter for opening and closing an upper opening of the crucible and a shutter rotation unit for rotating the crucible shutter.
  • the outer rotating shaft portion may be configured to be manually operated in combination with a worm gear.
  • the crucible conveying unit may include a crucible support, a first arm, an inner rotating shaft part, and a second arm.
  • One side of the crucible stand may be coupled to the crucible and the other side may be coupled to the rail unit.
  • One side of the first arm is coupled to the crucible stand and can move horizontally.
  • One side of the inner rotation shaft part may be coupled to the first arm to rotate the other side of the first arm.
  • One side of the second arm is coupled to the inner rotary shaft and the other is coupled to the outer rotary shaft, so that the inner rotary shaft is horizontally moved while rotating around the outer rotary shaft.
  • the multiple vacuum deposition apparatus of the present invention may include a dome portion, a revolving portion, a rotating portion, and the like.
  • the dome portion may be provided on the upper side of the chamber and may have a plurality of deposition material passage holes.
  • One side of the revolving portion is coupled to the upper outer side of the chamber and the other side is coupled to the dome portion inside the chamber, so that the dome portion can be lifted and rotated.
  • One side of the rotating unit may be coupled to the other side of the revolving unit to rotate and tilt, and the other side may support and rotate the substrate outside or inside the deposition material passage hole.
  • the rotating part may be provided with a plurality.
  • the multi-vacuum deposition apparatus of the present invention having such a configuration, a plurality of rotating parts and a plurality of crucible parts are provided so that a plurality of substrates can be simultaneously deposited, thereby enabling high-efficiency mass production.
  • the multiple vacuum deposition apparatus of the present invention it is possible to optimize the position and direction of the crucible and the substrate through the revolution of the revolving portion, the tilting and rotation of the rotating portion, and the radial horizontal movement of the crucible portion. Evaporation efficiency can be greatly increased.
  • the multiple vacuum deposition apparatus of the present invention since the lower part of the chamber can be selectively lifted and opened and closed, it is easy to replace the crucible or change the position without entering the chamber.
  • the multi-vacuum deposition apparatus of the present invention it is possible to secure work safety in crucible management, to manage contamination inside the chamber, and furthermore, work convenience is increased, and the crucible replacement time can be significantly reduced.
  • 1,2 is a cross-sectional view showing a multiple vacuum deposition apparatus according to the present invention.
  • FIG 3 is a perspective view showing a revolving part and a rotating part of a multiple vacuum deposition apparatus according to the present invention.
  • FIG. 4 is a plan view showing a crucible in a multiple vacuum deposition apparatus according to the present invention.
  • FIG. 5 is an oblique view showing a crucible transfer unit in a multiple vacuum deposition apparatus according to the present invention.
  • FIG. 6 is a cross-sectional view showing a rotating shaft portion of a crucible conveying unit in a multiple vacuum deposition apparatus according to the present invention.
  • 1,2 is a cross-sectional view showing a multiple vacuum deposition apparatus according to the present invention.
  • the multiple vacuum deposition apparatus of the present invention may include a chamber 100, a dome 200, an orbit 300, a rotating part 400, a crucible part 500, and the like. have.
  • the chamber 100 may form a closed space therein.
  • the chamber 100 may be composed of a chamber body 110, a bottom sealing part 120, a sealing ring 130, and the like.
  • the chamber body 110 may have a cylindrical shape in which a space is formed therein and a lower portion is opened.
  • the chamber body 110 may be provided with a vacuum pump (not shown) on one side for making the inside of the chamber 100 into a vacuum or maintaining a constant atmospheric pressure.
  • the vacuum pump (not shown) may be connected to an exhaust port (not shown) formed on one side wall or an upper wall of the chamber body 110.
  • the chamber body 110 may include a door (not shown) through which a substrate or the like enters and exits on a side wall.
  • the bottom sealing portion 120 may selectively open and close the lower opening of the chamber body 110 while elevating.
  • the bottom sealing part 120 may be configured in a disc shape.
  • the bottom sealing part 120 may support the crucible part 500 on the upper surface.
  • the sealing ring 130 may be provided on an upper surface of the edge of the bottom sealing portion 120 to seal between the chamber body 110 and the bottom sealing portion 120.
  • the dome part 200 may be provided on the upper side of the chamber 100 and may be configured to separate and close the upper side of the chamber 100 in a vertical direction.
  • the dome part 200 may have a shape in which the center is recessed upward.
  • the dome part 200 may rotate by being coupled to the revolving part 300.
  • the dome part 200 may move up and down together with the orbit part 300, that is, it may be elevated.
  • the dome part 200 may include a plurality of deposition material passing holes H.
  • the dome part 200 limits the moving space of the vaporized deposit to prevent the vaporized deposit from scattering over the entire inner wall of the chamber 100, and also, due to the revolution, a eddy air flow is generated under the dome part 200, resulting in vaporization.
  • the deposited material may be evenly distributed under the dome part 200.
  • the revolving part 300 may be coupled to the upper outer side of the chamber 100 and the other side may be inserted into the inner space of the chamber 100 through the upper wall of the chamber 100.
  • the revolving part 300 may include an revolving part shaft 310, an revolving part driving part 320, a revolving part frame 330, and the like.
  • the revolving part shaft 310 may penetrate the upper wall of the chamber 100 and extend into the inner space of the chamber 100.
  • the revolving part shaft 310 may have an inner end coupled to the dome part 200 to support and rotate the dome part 200.
  • the revolving part shaft 310 may move the dome part 200 up and down while moving up and down.
  • the revolving unit driving unit 320 may rotate and/or elevate the revolving unit shaft 310.
  • the revolving part frame 330 may be vertically or horizontally coupled to the revolving part shaft 310 in the inner space of the chamber 100.
  • the revolving part frame 330 may couple and support a plurality of rotating parts 400 at an edge.
  • the revolving part frame 330 may rotate along with the rotation of the revolving part shaft 310 and rotate the revolving part 400 around the revolving part shaft 310, ie, revolve.
  • the revolving part frame 330 may individually tilt the rotating part 400 coupled to the edge.
  • the rotating part 400 supports and rotates the substrate and may be located outside the deposition material passage hole H.
  • the rotating part 400 may be symmetrically coupled to the edge of the rotating part frame 330.
  • the rotating part 400 may rotate together with the dome part 200 according to the rotation of the orbit frame 330, that is, it may orbit.
  • the rotating part 400 may include a rotating part main body 410, a substrate fixing part 420, and the like.
  • One side of the rotating part main body 410 may be tiltably coupled to the rotating part frame 330.
  • the substrate fixing part 420 may be coupled to the other side of the rotating body 410 to support and fix the substrate.
  • the substrate fixing part 420 may rotate the substrate while rotating.
  • the substrate fixing part 420 may be located outside the deposition material passing hole H or may be inserted into the deposition material passing hole H if necessary.
  • each rotating part 400 may be individually controlled, that is, tilted and rotated.
  • the crucible part 500 may vaporize the deposited material in the chamber 100 and supply it in the downward direction of the dome part 200.
  • the vaporized deposition material may pass through the deposition material passage hole H of the dome part 200 and may be deposited on the surface of the substrate fixed to the substrate fixing part 420.
  • the crucible part 500 includes a crucible 510, a rail part 520, a crucible transfer part 530, and the like, so that the crucible 510 is formed along the inner surface of the bottom sealing part 120 in the chamber 100. Can be moved horizontally.
  • the crucible part 500 may include a plurality of crucibles 510.
  • the crucible part 500 may horizontally move the crucible 510 along the rail part 520 and adjust the position of the crucible 510 so that vaporized deposits are optimally deposited on the substrate surface.
  • the crucible part 500 will be described in detail later with reference to FIGS. 3 to 5.
  • the method of replacing the crucible is, first, the vacuum in the chamber 100 is destroyed, and the bottom sealing portion 120 of the chamber 100 is lowered. Thereafter, the crucible 510 may be moved to the outside and then replaced.
  • the bottom sealing portion 120 of the chamber 100 is raised.
  • the chamber 100 is shielded from the outside, and then the inside of the chamber 100 is made into a vacuum, and then the deposition process may be performed.
  • the multi-deposition apparatus of the present invention having such a configuration can enable a large-sized evaporation apparatus to be implemented by a worker directly entering and working.
  • FIG 3 is a perspective view showing a revolving part and a rotating part of a multiple vacuum deposition apparatus according to the present invention.
  • the revolving unit frame 330 is coupled to the revolving unit shaft 310, can be lifted and rotated together according to the elevating and rotating of the revolving unit shaft 310, and can be configured in a plate shape. I can.
  • the rotating part 400 may include a rotating part main body 410, a substrate fixing part 420, a hood 430, and the like.
  • a plurality of the rotating part body 410 may be provided to be symmetrical along the edge of the rotating part shaft 330.
  • a tilting shaft 340 is provided at an edge end of the revolving part frame 330, and the upper side of the rotating part body 410 may be coupled to the tilting shaft 340 to rotate, that is, tilt.
  • the substrate fixing part 420 may be provided under the rotating part 400 to support and fix the substrate.
  • the hood 430 is coupled along the edge of the substrate fixing part 420, and when the substrate fixing part 420 is located outside the deposition material passing hole H, vaporization rising in the direction of the deposition material passing hole H It is possible to block the deposition material from moving to the upper side of the dome 200 by passing through the deposition material passage hole (H). Through this, it is possible to block or minimize waste of the vaporized deposit without being deposited on the substrate.
  • FIG. 4 is a plan view showing a crucible in a multiple vacuum deposition apparatus according to the present invention.
  • the crucible part 500 may include a host crucible 511, a dopant crucible 513, and the like.
  • Host crucibles 511 are spaced a predetermined distance from the center of the inner surface of the bottom sealing portion 120 may be arranged radially.
  • the host crucible 511 is supported by the host pedestal 531 and may horizontally move radially along the host rail part 521.
  • the dopant crucible 513 may be located at the center of the inner surface of the bottom sealing part 120.
  • the dopant crucible 513 is supported by the dopant pedestal 533 and may move radially along the dopant rail part 523.
  • the crucible part 500 may have a structure in which one dopant crucible 513 is radially surrounded by a plurality of host crucibles 511.
  • FIG. 5 is an oblique view showing a crucible transfer unit in a multiple vacuum deposition apparatus according to the present invention.
  • the host crucible part includes a host crucible 511, a crucible shutter 512, a host rotating part 514, a host rail part 521, a conveying part 530, an outer rotating shaft part 538, etc. It can be configured.
  • the host crucible 511 may contain a host deposition material therein.
  • the host crucible 511 may be provided with a heating wire to vaporize the host deposit.
  • the vaporized host deposit is discharged through the upper opening and can move to the substrate.
  • the crucible shutter 512 may selectively open and close the upper opening of the host crucible 511 while rotating horizontally from the upper side of the host crucible 511.
  • the shutter rotation unit 514 may be provided with a motor or the like to selectively rotate the crucible shutter 512.
  • the host rail part 521 may be radially disposed on the inner surface of the bottom sealing part 120 to guide the radially horizontal movement of the host crucible 511.
  • the host rail part 521 may be coupled to the lower side of the host cradle 531 supporting the host crucible 511 to guide the host cradle 531.
  • the transfer unit 530 is to radially move the host crucible 511 along the host rail unit 521, and the host pedestal 531, the first arm 532, the inner rotating shaft part 534, the second arm 536 ), etc.
  • the host pedestal 531 may support the host crucible 511 on the upper side and move horizontally by being coupled to the host rail unit 521 on the lower side.
  • One side of the first arm 532 may be coupled to the host pedestal 531 and the other side may be coupled to the inner rotation shaft portion 534.
  • the first arm 532 may horizontally move the host pedestal 531 while horizontally moving according to the axial rotation of the inner rotational shaft 534.
  • the inner rotation shaft portion 534 may be coupled between the first arm 532 and the second arm 536 to convert the horizontal movement of the second arm 536 into a horizontal movement of the first arm 532.
  • One side of the second arm 536 may be coupled to the inner rotation shaft portion 534 and the other side may be coupled to the outer rotation shaft portion 538.
  • the second arm 536 axially rotates the inner rotary shaft 534 while rotating around the outer rotary shaft 538, and as a result, the first arm 532 axially coupled to the inner rotary shaft 534 It can be moved horizontally.
  • the outer rotation shaft part 538 may be exposed to the outside of the chamber 100 by having an upper side coupled to the second arm 536 and a lower side passing through the bottom sealing part 120.
  • the outer rotating shaft part 538 may vacuum shield the inside of the chamber 100 by combining the outer surface with the bottom sealing part 120.
  • An external drive unit for rotating the second arm 536 may be coupled to a lower side of the outer rotation shaft part 538.
  • the external drive may use a rotation motor, a worm gear, or the like.
  • the worm gear may be useful when the outer rotation shaft part 538 is manually axially rotated.
  • FIG. 5 illustrates the host crucible 511, but the configuration of the transfer unit of FIG. 5 can be applied to the transfer of the dopant crucible 513 in the same manner.
  • FIG. 6 is a cross-sectional view showing a rotating shaft portion of a crucible conveying unit in a multiple vacuum deposition apparatus according to the present invention.
  • the outer rotating shaft portion 538 of FIG. 5 may include a shaft sealing portion 10, a magnetic fluid 20, a bearing portion 30, and the like.
  • the shaft sealing portion 10 may be sealedly coupled to the bottom sealing portion 120 while passing through the bottom sealing portion 120.
  • the magnetic fluid 20 is inserted between the shaft seal 10 and the second arm 536 to vacuum shield the interior of the chamber 100 and the second arm 536 when the second arm 536 rotates. I can.
  • the bearing part 30 is coupled to the shaft sealing part 10 on one side and the second arm 536 on the other side to allow the second arm 536 to slide smoothly with respect to the shaft sealing part 10. have.
  • the utility 600 includes a power line, a signal line, a coolant, and the like, and these may be connected to the shutter rotation unit 514 or the like through the inside of the outer rotation shaft unit 538.
  • the configuration of the outer rotation shaft part 538 shown in FIG. 6 can be similarly applied to the inner rotation shaft part 534, in this case, the shaft seal part 10 is coupled to the second arm 536, and the magnetic fluid ( 20) and the bearing unit 30 may be coupled between the second arm 536 and the first arm 532.
  • chamber 110 chamber body
  • rotating part 410 rotating part main body
  • dopant crucible 514 shutter rotating part
  • rail part 521 host rail part
  • dopant rail part 530 transfer part
  • dopant support 534 inner rotating shaft portion

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

La présente invention concerne un appareil de dépôt multi-vide comprenant une chambre à l'intérieur de laquelle est formé un espace interne ainsi qu'une partie de fermeture étanche à l'air inférieure détachable et capable de se déplacer vers le haut et vers le bas au fond de celle-ci. Une pluralité de parties creuset se déplace radialement le long de la surface interne de la partie de fermeture étanche à l'air inférieure de la chambre.
PCT/KR2019/004863 2019-03-05 2019-04-23 Appareil de dépôt multi-vide comprenant une pluralité de creusets mobiles disposés sur une partie de fermeture étanche à l'air inférieure qui se déplace vers le haut et vers le bas WO2020179967A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020190025153A KR20200106654A (ko) 2019-03-05 2019-03-05 승강하는 바닥 밀폐부에 다수의 이동 도가니를 갖는 다중 진공증착 장치
KR10-2019-0025153 2019-03-05

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WO2020179967A1 true WO2020179967A1 (fr) 2020-09-10

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08236449A (ja) * 1995-02-28 1996-09-13 Nec Corp 蒸着装置
JP2003129224A (ja) * 2001-10-26 2003-05-08 Matsushita Electric Works Ltd 真空蒸着装置及び真空蒸着方法
JP2004353030A (ja) * 2003-05-28 2004-12-16 Tokki Corp 蒸着装置
KR20140062951A (ko) * 2012-11-15 2014-05-27 (주)비엠씨 증착원 이동형 증착 장치
JP2017008409A (ja) * 2015-06-18 2017-01-12 キヤノントッキ株式会社 真空蒸着装置、蒸着膜の製造方法および有機電子デバイスの製造方法
US10011898B2 (en) * 2015-07-23 2018-07-03 Boe Technology Group Co., Ltd. Crucible device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08236449A (ja) * 1995-02-28 1996-09-13 Nec Corp 蒸着装置
JP2003129224A (ja) * 2001-10-26 2003-05-08 Matsushita Electric Works Ltd 真空蒸着装置及び真空蒸着方法
JP2004353030A (ja) * 2003-05-28 2004-12-16 Tokki Corp 蒸着装置
KR20140062951A (ko) * 2012-11-15 2014-05-27 (주)비엠씨 증착원 이동형 증착 장치
JP2017008409A (ja) * 2015-06-18 2017-01-12 キヤノントッキ株式会社 真空蒸着装置、蒸着膜の製造方法および有機電子デバイスの製造方法
US10011898B2 (en) * 2015-07-23 2018-07-03 Boe Technology Group Co., Ltd. Crucible device

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