WO2020179967A1 - Multi-vacuum deposition apparatus including plurality of moving crucibles disposed on up-and-down-moving bottom airtight closure part - Google Patents

Multi-vacuum deposition apparatus including plurality of moving crucibles disposed on up-and-down-moving bottom airtight closure part Download PDF

Info

Publication number
WO2020179967A1
WO2020179967A1 PCT/KR2019/004863 KR2019004863W WO2020179967A1 WO 2020179967 A1 WO2020179967 A1 WO 2020179967A1 KR 2019004863 W KR2019004863 W KR 2019004863W WO 2020179967 A1 WO2020179967 A1 WO 2020179967A1
Authority
WO
WIPO (PCT)
Prior art keywords
crucible
coupled
moving
chamber
vacuum deposition
Prior art date
Application number
PCT/KR2019/004863
Other languages
French (fr)
Korean (ko)
Inventor
김대일
박경배
조용흠
김찬귀
방재오
정희진
박수환
Original Assignee
주식회사 넵시스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 넵시스 filed Critical 주식회사 넵시스
Publication of WO2020179967A1 publication Critical patent/WO2020179967A1/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Definitions

  • the present invention relates to a vacuum deposition apparatus, and more particularly, to a multiple vacuum deposition apparatus capable of depositing a plurality of substrates at the same time by having a plurality of moving crucibles.
  • the vacuum deposition apparatus is an apparatus for coating a substrate such as a glass panel with a deposition material in a chamber in a vacuum state, and may evaporate the deposition material in a crucible to deposit a surface of the substrate. Atoms and molecules of the vaporized deposit form a thin film while condensing on a substrate having a relatively low temperature.
  • Patent Registration No. 1760257 (Vacuum deposition apparatus and vacuum deposition method for glass products using electron beams), a rotating disk is installed on the upper side of the chamber, and a cradle for fixing the substrate to the lower end of the rotating disk is provided. A number of crucibles are rotated around a rotation axis in the lower part of the chamber.
  • the present invention is to solve the problems of the prior art
  • the crucible can be varied by optimizing the deposition conditions of the substrate so that the deposited material is effectively deposited on the substrate,
  • the multiple vacuum deposition apparatus of the present invention for achieving this purpose may be configured to include a chamber, a crucible, and the like.
  • the chamber may have a floor sealing part that forms a space therein and is detachable and elevating below it.
  • the crucible portion can move radially along the inner surface of the bottom sealing portion of the chamber.
  • the crucible portion may be provided with a plurality.
  • the crucible portion may include a dopant crucible portion and a host crucible portion.
  • the dopant crucible portion is disposed in the center of the inner surface of the bottom sealing portion of the chamber and can move radially.
  • the host crucible portion is radially disposed on the inner surface of the bottom sealing portion of the chamber and can move radially.
  • the crucible part may be composed of a crucible, a rail part, a transfer part, an outer shaft rotation part, and the like.
  • Crucibles can contain deposits and produce vaporized deposits.
  • the rail portion is provided on the inner surface of the bottom sealing portion to guide the crucible horizontally in a radial direction.
  • the conveying unit can move the crucible along the rail unit.
  • the outer rotating shaft portion may be coupled through the bottom sealing portion of the chamber.
  • One side of the outer rotating shaft part may be coupled to one side of the transfer part to support one side of the transfer part so as to be capable of axial rotation.
  • the other side of the outer rotating shaft part may be coupled to the bottom sealing part to shield the interior of the chamber in a vacuum state.
  • the crucible unit may include a crucible shutter for opening and closing an upper opening of the crucible and a shutter rotation unit for rotating the crucible shutter.
  • the outer rotating shaft portion may be configured to be manually operated in combination with a worm gear.
  • the crucible conveying unit may include a crucible support, a first arm, an inner rotating shaft part, and a second arm.
  • One side of the crucible stand may be coupled to the crucible and the other side may be coupled to the rail unit.
  • One side of the first arm is coupled to the crucible stand and can move horizontally.
  • One side of the inner rotation shaft part may be coupled to the first arm to rotate the other side of the first arm.
  • One side of the second arm is coupled to the inner rotary shaft and the other is coupled to the outer rotary shaft, so that the inner rotary shaft is horizontally moved while rotating around the outer rotary shaft.
  • the multiple vacuum deposition apparatus of the present invention may include a dome portion, a revolving portion, a rotating portion, and the like.
  • the dome portion may be provided on the upper side of the chamber and may have a plurality of deposition material passage holes.
  • One side of the revolving portion is coupled to the upper outer side of the chamber and the other side is coupled to the dome portion inside the chamber, so that the dome portion can be lifted and rotated.
  • One side of the rotating unit may be coupled to the other side of the revolving unit to rotate and tilt, and the other side may support and rotate the substrate outside or inside the deposition material passage hole.
  • the rotating part may be provided with a plurality.
  • the multi-vacuum deposition apparatus of the present invention having such a configuration, a plurality of rotating parts and a plurality of crucible parts are provided so that a plurality of substrates can be simultaneously deposited, thereby enabling high-efficiency mass production.
  • the multiple vacuum deposition apparatus of the present invention it is possible to optimize the position and direction of the crucible and the substrate through the revolution of the revolving portion, the tilting and rotation of the rotating portion, and the radial horizontal movement of the crucible portion. Evaporation efficiency can be greatly increased.
  • the multiple vacuum deposition apparatus of the present invention since the lower part of the chamber can be selectively lifted and opened and closed, it is easy to replace the crucible or change the position without entering the chamber.
  • the multi-vacuum deposition apparatus of the present invention it is possible to secure work safety in crucible management, to manage contamination inside the chamber, and furthermore, work convenience is increased, and the crucible replacement time can be significantly reduced.
  • 1,2 is a cross-sectional view showing a multiple vacuum deposition apparatus according to the present invention.
  • FIG 3 is a perspective view showing a revolving part and a rotating part of a multiple vacuum deposition apparatus according to the present invention.
  • FIG. 4 is a plan view showing a crucible in a multiple vacuum deposition apparatus according to the present invention.
  • FIG. 5 is an oblique view showing a crucible transfer unit in a multiple vacuum deposition apparatus according to the present invention.
  • FIG. 6 is a cross-sectional view showing a rotating shaft portion of a crucible conveying unit in a multiple vacuum deposition apparatus according to the present invention.
  • 1,2 is a cross-sectional view showing a multiple vacuum deposition apparatus according to the present invention.
  • the multiple vacuum deposition apparatus of the present invention may include a chamber 100, a dome 200, an orbit 300, a rotating part 400, a crucible part 500, and the like. have.
  • the chamber 100 may form a closed space therein.
  • the chamber 100 may be composed of a chamber body 110, a bottom sealing part 120, a sealing ring 130, and the like.
  • the chamber body 110 may have a cylindrical shape in which a space is formed therein and a lower portion is opened.
  • the chamber body 110 may be provided with a vacuum pump (not shown) on one side for making the inside of the chamber 100 into a vacuum or maintaining a constant atmospheric pressure.
  • the vacuum pump (not shown) may be connected to an exhaust port (not shown) formed on one side wall or an upper wall of the chamber body 110.
  • the chamber body 110 may include a door (not shown) through which a substrate or the like enters and exits on a side wall.
  • the bottom sealing portion 120 may selectively open and close the lower opening of the chamber body 110 while elevating.
  • the bottom sealing part 120 may be configured in a disc shape.
  • the bottom sealing part 120 may support the crucible part 500 on the upper surface.
  • the sealing ring 130 may be provided on an upper surface of the edge of the bottom sealing portion 120 to seal between the chamber body 110 and the bottom sealing portion 120.
  • the dome part 200 may be provided on the upper side of the chamber 100 and may be configured to separate and close the upper side of the chamber 100 in a vertical direction.
  • the dome part 200 may have a shape in which the center is recessed upward.
  • the dome part 200 may rotate by being coupled to the revolving part 300.
  • the dome part 200 may move up and down together with the orbit part 300, that is, it may be elevated.
  • the dome part 200 may include a plurality of deposition material passing holes H.
  • the dome part 200 limits the moving space of the vaporized deposit to prevent the vaporized deposit from scattering over the entire inner wall of the chamber 100, and also, due to the revolution, a eddy air flow is generated under the dome part 200, resulting in vaporization.
  • the deposited material may be evenly distributed under the dome part 200.
  • the revolving part 300 may be coupled to the upper outer side of the chamber 100 and the other side may be inserted into the inner space of the chamber 100 through the upper wall of the chamber 100.
  • the revolving part 300 may include an revolving part shaft 310, an revolving part driving part 320, a revolving part frame 330, and the like.
  • the revolving part shaft 310 may penetrate the upper wall of the chamber 100 and extend into the inner space of the chamber 100.
  • the revolving part shaft 310 may have an inner end coupled to the dome part 200 to support and rotate the dome part 200.
  • the revolving part shaft 310 may move the dome part 200 up and down while moving up and down.
  • the revolving unit driving unit 320 may rotate and/or elevate the revolving unit shaft 310.
  • the revolving part frame 330 may be vertically or horizontally coupled to the revolving part shaft 310 in the inner space of the chamber 100.
  • the revolving part frame 330 may couple and support a plurality of rotating parts 400 at an edge.
  • the revolving part frame 330 may rotate along with the rotation of the revolving part shaft 310 and rotate the revolving part 400 around the revolving part shaft 310, ie, revolve.
  • the revolving part frame 330 may individually tilt the rotating part 400 coupled to the edge.
  • the rotating part 400 supports and rotates the substrate and may be located outside the deposition material passage hole H.
  • the rotating part 400 may be symmetrically coupled to the edge of the rotating part frame 330.
  • the rotating part 400 may rotate together with the dome part 200 according to the rotation of the orbit frame 330, that is, it may orbit.
  • the rotating part 400 may include a rotating part main body 410, a substrate fixing part 420, and the like.
  • One side of the rotating part main body 410 may be tiltably coupled to the rotating part frame 330.
  • the substrate fixing part 420 may be coupled to the other side of the rotating body 410 to support and fix the substrate.
  • the substrate fixing part 420 may rotate the substrate while rotating.
  • the substrate fixing part 420 may be located outside the deposition material passing hole H or may be inserted into the deposition material passing hole H if necessary.
  • each rotating part 400 may be individually controlled, that is, tilted and rotated.
  • the crucible part 500 may vaporize the deposited material in the chamber 100 and supply it in the downward direction of the dome part 200.
  • the vaporized deposition material may pass through the deposition material passage hole H of the dome part 200 and may be deposited on the surface of the substrate fixed to the substrate fixing part 420.
  • the crucible part 500 includes a crucible 510, a rail part 520, a crucible transfer part 530, and the like, so that the crucible 510 is formed along the inner surface of the bottom sealing part 120 in the chamber 100. Can be moved horizontally.
  • the crucible part 500 may include a plurality of crucibles 510.
  • the crucible part 500 may horizontally move the crucible 510 along the rail part 520 and adjust the position of the crucible 510 so that vaporized deposits are optimally deposited on the substrate surface.
  • the crucible part 500 will be described in detail later with reference to FIGS. 3 to 5.
  • the method of replacing the crucible is, first, the vacuum in the chamber 100 is destroyed, and the bottom sealing portion 120 of the chamber 100 is lowered. Thereafter, the crucible 510 may be moved to the outside and then replaced.
  • the bottom sealing portion 120 of the chamber 100 is raised.
  • the chamber 100 is shielded from the outside, and then the inside of the chamber 100 is made into a vacuum, and then the deposition process may be performed.
  • the multi-deposition apparatus of the present invention having such a configuration can enable a large-sized evaporation apparatus to be implemented by a worker directly entering and working.
  • FIG 3 is a perspective view showing a revolving part and a rotating part of a multiple vacuum deposition apparatus according to the present invention.
  • the revolving unit frame 330 is coupled to the revolving unit shaft 310, can be lifted and rotated together according to the elevating and rotating of the revolving unit shaft 310, and can be configured in a plate shape. I can.
  • the rotating part 400 may include a rotating part main body 410, a substrate fixing part 420, a hood 430, and the like.
  • a plurality of the rotating part body 410 may be provided to be symmetrical along the edge of the rotating part shaft 330.
  • a tilting shaft 340 is provided at an edge end of the revolving part frame 330, and the upper side of the rotating part body 410 may be coupled to the tilting shaft 340 to rotate, that is, tilt.
  • the substrate fixing part 420 may be provided under the rotating part 400 to support and fix the substrate.
  • the hood 430 is coupled along the edge of the substrate fixing part 420, and when the substrate fixing part 420 is located outside the deposition material passing hole H, vaporization rising in the direction of the deposition material passing hole H It is possible to block the deposition material from moving to the upper side of the dome 200 by passing through the deposition material passage hole (H). Through this, it is possible to block or minimize waste of the vaporized deposit without being deposited on the substrate.
  • FIG. 4 is a plan view showing a crucible in a multiple vacuum deposition apparatus according to the present invention.
  • the crucible part 500 may include a host crucible 511, a dopant crucible 513, and the like.
  • Host crucibles 511 are spaced a predetermined distance from the center of the inner surface of the bottom sealing portion 120 may be arranged radially.
  • the host crucible 511 is supported by the host pedestal 531 and may horizontally move radially along the host rail part 521.
  • the dopant crucible 513 may be located at the center of the inner surface of the bottom sealing part 120.
  • the dopant crucible 513 is supported by the dopant pedestal 533 and may move radially along the dopant rail part 523.
  • the crucible part 500 may have a structure in which one dopant crucible 513 is radially surrounded by a plurality of host crucibles 511.
  • FIG. 5 is an oblique view showing a crucible transfer unit in a multiple vacuum deposition apparatus according to the present invention.
  • the host crucible part includes a host crucible 511, a crucible shutter 512, a host rotating part 514, a host rail part 521, a conveying part 530, an outer rotating shaft part 538, etc. It can be configured.
  • the host crucible 511 may contain a host deposition material therein.
  • the host crucible 511 may be provided with a heating wire to vaporize the host deposit.
  • the vaporized host deposit is discharged through the upper opening and can move to the substrate.
  • the crucible shutter 512 may selectively open and close the upper opening of the host crucible 511 while rotating horizontally from the upper side of the host crucible 511.
  • the shutter rotation unit 514 may be provided with a motor or the like to selectively rotate the crucible shutter 512.
  • the host rail part 521 may be radially disposed on the inner surface of the bottom sealing part 120 to guide the radially horizontal movement of the host crucible 511.
  • the host rail part 521 may be coupled to the lower side of the host cradle 531 supporting the host crucible 511 to guide the host cradle 531.
  • the transfer unit 530 is to radially move the host crucible 511 along the host rail unit 521, and the host pedestal 531, the first arm 532, the inner rotating shaft part 534, the second arm 536 ), etc.
  • the host pedestal 531 may support the host crucible 511 on the upper side and move horizontally by being coupled to the host rail unit 521 on the lower side.
  • One side of the first arm 532 may be coupled to the host pedestal 531 and the other side may be coupled to the inner rotation shaft portion 534.
  • the first arm 532 may horizontally move the host pedestal 531 while horizontally moving according to the axial rotation of the inner rotational shaft 534.
  • the inner rotation shaft portion 534 may be coupled between the first arm 532 and the second arm 536 to convert the horizontal movement of the second arm 536 into a horizontal movement of the first arm 532.
  • One side of the second arm 536 may be coupled to the inner rotation shaft portion 534 and the other side may be coupled to the outer rotation shaft portion 538.
  • the second arm 536 axially rotates the inner rotary shaft 534 while rotating around the outer rotary shaft 538, and as a result, the first arm 532 axially coupled to the inner rotary shaft 534 It can be moved horizontally.
  • the outer rotation shaft part 538 may be exposed to the outside of the chamber 100 by having an upper side coupled to the second arm 536 and a lower side passing through the bottom sealing part 120.
  • the outer rotating shaft part 538 may vacuum shield the inside of the chamber 100 by combining the outer surface with the bottom sealing part 120.
  • An external drive unit for rotating the second arm 536 may be coupled to a lower side of the outer rotation shaft part 538.
  • the external drive may use a rotation motor, a worm gear, or the like.
  • the worm gear may be useful when the outer rotation shaft part 538 is manually axially rotated.
  • FIG. 5 illustrates the host crucible 511, but the configuration of the transfer unit of FIG. 5 can be applied to the transfer of the dopant crucible 513 in the same manner.
  • FIG. 6 is a cross-sectional view showing a rotating shaft portion of a crucible conveying unit in a multiple vacuum deposition apparatus according to the present invention.
  • the outer rotating shaft portion 538 of FIG. 5 may include a shaft sealing portion 10, a magnetic fluid 20, a bearing portion 30, and the like.
  • the shaft sealing portion 10 may be sealedly coupled to the bottom sealing portion 120 while passing through the bottom sealing portion 120.
  • the magnetic fluid 20 is inserted between the shaft seal 10 and the second arm 536 to vacuum shield the interior of the chamber 100 and the second arm 536 when the second arm 536 rotates. I can.
  • the bearing part 30 is coupled to the shaft sealing part 10 on one side and the second arm 536 on the other side to allow the second arm 536 to slide smoothly with respect to the shaft sealing part 10. have.
  • the utility 600 includes a power line, a signal line, a coolant, and the like, and these may be connected to the shutter rotation unit 514 or the like through the inside of the outer rotation shaft unit 538.
  • the configuration of the outer rotation shaft part 538 shown in FIG. 6 can be similarly applied to the inner rotation shaft part 534, in this case, the shaft seal part 10 is coupled to the second arm 536, and the magnetic fluid ( 20) and the bearing unit 30 may be coupled between the second arm 536 and the first arm 532.
  • chamber 110 chamber body
  • rotating part 410 rotating part main body
  • dopant crucible 514 shutter rotating part
  • rail part 521 host rail part
  • dopant rail part 530 transfer part
  • dopant support 534 inner rotating shaft portion

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

A multi-vacuum deposition apparatus comprises a chamber which has an inner space formed therein and includes a detachable and up-and-down-moving bottom airtight closure part at the bottom thereof. A plurality of crucible parts radially moves along the inner surface of the bottom airtight closure part of the chamber.

Description

승강하는 바닥 밀폐부에 다수의 이동 도가니를 갖는 다중 진공증착 장치Multiple vacuum evaporation device with multiple moving crucibles on the floor sealing part of the elevation
본 발명은 진공증착 장치에 관한 것으로, 상세하게는 다수의 이동 도가니를 구비하여 동시에 다수 기판을 증착할 수 있는 다중 진공증착 장치에 관한 것이다.The present invention relates to a vacuum deposition apparatus, and more particularly, to a multiple vacuum deposition apparatus capable of depositing a plurality of substrates at the same time by having a plurality of moving crucibles.
진공증착 장치는 진공 상태의 챔버 내부에서 유리 패널과 같은 기판을 증착물로 코팅하는 장치로, 도가니 내의 증착물을 증발시켜 기판 표면을 증착할 수 있다. 기화된 증착물의 원자, 분자는 상대적으로 낮은 온도를 갖는 기판에서 응축되면서 박막을 형성하게 된다.The vacuum deposition apparatus is an apparatus for coating a substrate such as a glass panel with a deposition material in a chamber in a vacuum state, and may evaporate the deposition material in a crucible to deposit a surface of the substrate. Atoms and molecules of the vaporized deposit form a thin film while condensing on a substrate having a relatively low temperature.
특허등록 제1760257호(전자빔을 이용한 유리제품의 진공증착 장치 및 진공증착 방법)를 보면, 챔버 내부의 상측에 회전 원판을 설치하고, 회전 원판의 하단에 기판을 고정하는 거치대를 구비하고 있다. 챔버 내부의 하부에는 다수의 도가니를 회전축을 중심으로 회전시키고 있다.In Patent Registration No. 1760257 (Vacuum deposition apparatus and vacuum deposition method for glass products using electron beams), a rotating disk is installed on the upper side of the chamber, and a cradle for fixing the substrate to the lower end of the rotating disk is provided. A number of crucibles are rotated around a rotation axis in the lower part of the chamber.
그런데, 이러한 종래기술은 다수의 거치대를 결합하여 대량 생산을 의도하고 있기는 하지만, 종류나 크기에 따른 도가니 선택에 초점을 두고 있어, 다수 기판을 동시에 증착하는데 사용하기에는 효율이 떨어질 수 있다.However, although this prior art is intended to mass-produce by combining a plurality of cradles, since it focuses on selection of a crucible according to a type or size, the efficiency may be inferior to use for simultaneously depositing a plurality of substrates.
본 발명은 이러한 종래기술의 문제점을 해결하기 위한 것으로,The present invention is to solve the problems of the prior art,
첫째, 다수의 대형 기판을 동시에 증착함으로써 생산 효율을 높일 수 있고,First, it is possible to increase production efficiency by depositing multiple large substrates simultaneously,
둘째, 기판의 증착 조건에 최적화시켜 도가니를 가변시킬 수 있어 증착물이 기판에 효과적으로 증착되게 하고,Second, the crucible can be varied by optimizing the deposition conditions of the substrate so that the deposited material is effectively deposited on the substrate,
셋째, 챔버 하부를 선택적으로 개폐하여 챔버 내부로 진입하지 않고도 도가니를 교체하거나 위치를 변경할 수 있는, 다중 진공증착 장치를 제공하고자 한다.Third, it is intended to provide a multi-vacuum deposition apparatus capable of selectively opening and closing a lower chamber to replace a crucible or change its position without entering the chamber.
이러한 목적을 달성하기 위한 본 발명의 다중 진공증착 장치는 챔버, 도가니부 등을 포함하여 구성할 수 있다.The multiple vacuum deposition apparatus of the present invention for achieving this purpose may be configured to include a chamber, a crucible, and the like.
챔버는 내부에 공간을 형성하고 하방에 분리 가능하고 승강하는 바닥 밀폐부를 구비할 수 있다.The chamber may have a floor sealing part that forms a space therein and is detachable and elevating below it.
도가니부는 챔버의 바닥 밀폐부의 내면을 따라 방사상으로 이동할 수 있다. 도가니부는 다수를 구비할 수 있다.The crucible portion can move radially along the inner surface of the bottom sealing portion of the chamber. The crucible portion may be provided with a plurality.
본 발명의 다중 진공증착 장치에서, 도가니부는 도펀트 도가니부, 호스트 도가니부를 포함할 수 있다. 도펀트 도가니부는 챔버의 바닥 밀폐부의 내면 중앙에 배치되고 방사상으로 이동할 수 있다. 호스트 도가니부는 챔버의 바닥 밀폐부의 내면에 방사상으로 다수가 배치되고 방사상으로 이동할 수 있다.In the multiple vacuum deposition apparatus of the present invention, the crucible portion may include a dopant crucible portion and a host crucible portion. The dopant crucible portion is disposed in the center of the inner surface of the bottom sealing portion of the chamber and can move radially. The host crucible portion is radially disposed on the inner surface of the bottom sealing portion of the chamber and can move radially.
본 발명의 다중 진공증착 장치에서, 도가니부는 도가니, 레일부, 이송부, 외측 축회전부 등으로 구성할 수 있다.In the multi-vacuum deposition apparatus of the present invention, the crucible part may be composed of a crucible, a rail part, a transfer part, an outer shaft rotation part, and the like.
도가니는 증착물을 내장하고 기화 증착물을 생성할 수 있다.Crucibles can contain deposits and produce vaporized deposits.
레일부는 바닥 밀폐부의 내면에 구비되어 도가니를 방사상으로 수평 가이드할 수 있다.The rail portion is provided on the inner surface of the bottom sealing portion to guide the crucible horizontally in a radial direction.
이송부는 레일부를 따라 도가니를 이동시킬 수 있다.The conveying unit can move the crucible along the rail unit.
외측 회전축부는 챔버의 바닥 밀폐부에 관통 결합할 수 있다. 외측 회전축부의 일측은 이송부의 일측에 결합하여 이송부의 일측을 축회전 가능하게 지지할 수 있다. 외측 회전축부의 타측은 바닥 밀폐부에 결합하여 챔버의 내부를 진공 상태로 차폐할 수 있다.The outer rotating shaft portion may be coupled through the bottom sealing portion of the chamber. One side of the outer rotating shaft part may be coupled to one side of the transfer part to support one side of the transfer part so as to be capable of axial rotation. The other side of the outer rotating shaft part may be coupled to the bottom sealing part to shield the interior of the chamber in a vacuum state.
본 발명의 다중 진공증착 장치에서, 도가니부는 도가니의 상측 개방구를 개폐하는 도가니 셔터와 도가니 셔터를 회전시키는 셔터 회전부를 포함할 수 있다.In the multi-vacuum deposition apparatus of the present invention, the crucible unit may include a crucible shutter for opening and closing an upper opening of the crucible and a shutter rotation unit for rotating the crucible shutter.
본 발명의 다중 진공증착 장치에서, 외측 회전축부는 웜기어와 결합하여 수동 조작이 가능하게 구성할 수 있다.In the multi-vacuum deposition apparatus of the present invention, the outer rotating shaft portion may be configured to be manually operated in combination with a worm gear.
본 발명의 다중 진공증착 장치에서, 도가니 이송부는 도가니 받침대, 제1 암, 내측 회전축부, 제2 암 등을 포함할 수 있다.In the multi-vacuum deposition apparatus of the present invention, the crucible conveying unit may include a crucible support, a first arm, an inner rotating shaft part, and a second arm.
도가니 받침대는 일측이 도가니에 결합하고 타측은 레일부에 결합할 수 있다.One side of the crucible stand may be coupled to the crucible and the other side may be coupled to the rail unit.
제1 암은 일측이 도가니 받침대에 결합하여 수평 이동할 수 있다.One side of the first arm is coupled to the crucible stand and can move horizontally.
내측 회전축부는 일측이 제1 암에 결합하여 제1 암의 타측을 축회전시킬 수 있다.One side of the inner rotation shaft part may be coupled to the first arm to rotate the other side of the first arm.
제2 암은 일측이 내측 회전축부에 결합하고 타측은 외측 회전축부에 결합하여 외측 회전축부를 중심으로 축회전하면서 내측 회전축부를 수평 이동시킬 수 있다.One side of the second arm is coupled to the inner rotary shaft and the other is coupled to the outer rotary shaft, so that the inner rotary shaft is horizontally moved while rotating around the outer rotary shaft.
본 발명의 다중 진공증착 장치는 돔부, 공전부, 자전부 등을 포함할 수 있다.The multiple vacuum deposition apparatus of the present invention may include a dome portion, a revolving portion, a rotating portion, and the like.
돔부는 챔버 내부의 상측에 구비되고 다수의 증착물 통과홀을 구비할 수 있다.The dome portion may be provided on the upper side of the chamber and may have a plurality of deposition material passage holes.
공전부는 일측이 챔버의 상부 외측에 결합하고 타측은 챔버의 내부에서 돔부에 결합하여 돔부를 승강 및 회전시킬 수 있다.One side of the revolving portion is coupled to the upper outer side of the chamber and the other side is coupled to the dome portion inside the chamber, so that the dome portion can be lifted and rotated.
자전부는 일측이 공전부의 타측에 결합하여 공전 및 틸팅하고 타측은 증착물 통과홀의 외측 또는 내측에서 기판을 지지 및 회전시킬 수 있다. 자전부는 다수를 구비할 수 있다.One side of the rotating unit may be coupled to the other side of the revolving unit to rotate and tilt, and the other side may support and rotate the substrate outside or inside the deposition material passage hole. The rotating part may be provided with a plurality.
이러한 구성을 갖는 본 발명의 다중 진공증착 장치에 의하면, 다수의 자전부와 다수의 도가니부를 구비하여 다수의 기판을 동시에 증착할 수 있게 구성함으로써, 고효율 대량 생산이 가능하다.According to the multi-vacuum deposition apparatus of the present invention having such a configuration, a plurality of rotating parts and a plurality of crucible parts are provided so that a plurality of substrates can be simultaneously deposited, thereby enabling high-efficiency mass production.
본 발명의 다중 진공증착 장치에 의하면, 공전부의 공전, 자전부의 틸팅 및 자전, 도가니부의 방사상 수평 이동 등을 통해 도가니와 기판의 위치, 방향 등을 최적화시킬 수 있어, 다수 기판을 증착할 때 증착 효율을 크게 높일 수 있다.According to the multiple vacuum deposition apparatus of the present invention, it is possible to optimize the position and direction of the crucible and the substrate through the revolution of the revolving portion, the tilting and rotation of the rotating portion, and the radial horizontal movement of the crucible portion. Evaporation efficiency can be greatly increased.
본 발명의 다중 진공증착 장치에 의하면, 챔버의 하부를 선택적으로 승강시켜 개폐할 수 있으므로, 챔버 내부로 진입하지 않고도 도가니를 교체하거나 위치를 변경하기가 수월하다.According to the multiple vacuum deposition apparatus of the present invention, since the lower part of the chamber can be selectively lifted and opened and closed, it is easy to replace the crucible or change the position without entering the chamber.
또한, 본 발명의 다중 진공증착 장치에 의하면, 도가니 관리에서 작업 안전성을 확보할 수 있고, 챔버 내부의 오염 관리가 가능하며, 나아가 작업 편의성이 증대되어 도가니 교체 시간을 대폭 줄일 수 있다.In addition, according to the multi-vacuum deposition apparatus of the present invention, it is possible to secure work safety in crucible management, to manage contamination inside the chamber, and furthermore, work convenience is increased, and the crucible replacement time can be significantly reduced.
도 1,2는 본 발명에 따른 다중 진공증착 장치를 도시하는 단면도이다.1,2 is a cross-sectional view showing a multiple vacuum deposition apparatus according to the present invention.
도 3은 본 발명에 따른 다중 진공증착 장치의 공전부 및 자전부를 도시하는 사시도이다.3 is a perspective view showing a revolving part and a rotating part of a multiple vacuum deposition apparatus according to the present invention.
도 4는 본 발명에 따른 다중 진공증착 장치에서 도가니부를 도시하는 평면도이다.4 is a plan view showing a crucible in a multiple vacuum deposition apparatus according to the present invention.
도 5는 본 발명에 따른 다중 진공증착 장치에서 도가니 이송부를 도시하는 사면도이다.5 is an oblique view showing a crucible transfer unit in a multiple vacuum deposition apparatus according to the present invention.
도 6은 본 발명에 따른 다중 진공증착 장치에서 도가니 이송부의 회전축부를 도시하는 단면도이다.6 is a cross-sectional view showing a rotating shaft portion of a crucible conveying unit in a multiple vacuum deposition apparatus according to the present invention.
이하, 첨부도면을 참조하여 본 발명을 상세히 설명한다.Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.
도 1,2는 본 발명에 따른 다중 진공증착 장치를 도시하는 단면도이다.1,2 is a cross-sectional view showing a multiple vacuum deposition apparatus according to the present invention.
도 1,2에 도시한 바와 같이, 본 발명의 다중 진공증착 장치는 챔버(100), 돔부(200), 공전부(300), 자전부(400), 도가니부(500) 등을 포함할 수 있다.1,2, the multiple vacuum deposition apparatus of the present invention may include a chamber 100, a dome 200, an orbit 300, a rotating part 400, a crucible part 500, and the like. have.
챔버(100)는 내부에 밀폐 공간을 형성할 수 있다. 챔버(100)는 챔버 본체(110), 바닥 밀폐부(120), 밀폐링(130) 등으로 구성할 수 있다.The chamber 100 may form a closed space therein. The chamber 100 may be composed of a chamber body 110, a bottom sealing part 120, a sealing ring 130, and the like.
챔버 본체(110)는 내부에 공간을 형성하고 하부가 개방되는 원통 형태로 구성할 수 있다. 챔버 본체(110)는 챔버(100) 내부를 진공으로 만들거나 일정 기압으로 유지하기 위한 진공펌프(미도시)를 일측에 구비할 수 있다. 진공펌프(미도시)는 챔버 본체(110)의 일측벽 또는 상부벽에 형성되는 배기구(미도시)에 연결될 수 있다. 챔버 본체(110)는 기판 등이 출입하는 도어(미도시)를 측벽에 구비할 수 있다.The chamber body 110 may have a cylindrical shape in which a space is formed therein and a lower portion is opened. The chamber body 110 may be provided with a vacuum pump (not shown) on one side for making the inside of the chamber 100 into a vacuum or maintaining a constant atmospheric pressure. The vacuum pump (not shown) may be connected to an exhaust port (not shown) formed on one side wall or an upper wall of the chamber body 110. The chamber body 110 may include a door (not shown) through which a substrate or the like enters and exits on a side wall.
바닥 밀폐부(120)는 승강하면서 챔버 본체(110)의 하측 개방구를 선택적으로 개폐할 수 있다. 바닥 밀폐부(120)는 원판 형태로 구성할 수 있다. 바닥 밀폐부(120)는 상면에 도가니부(500)를 지지할 수 있다.The bottom sealing portion 120 may selectively open and close the lower opening of the chamber body 110 while elevating. The bottom sealing part 120 may be configured in a disc shape. The bottom sealing part 120 may support the crucible part 500 on the upper surface.
밀폐링(130)은 바닥 밀폐부(120)의 가장자리 상면에 구비되어 챔버 본체(110)와 바닥 밀폐부(120) 사이를 밀폐할 수 있다.The sealing ring 130 may be provided on an upper surface of the edge of the bottom sealing portion 120 to seal between the chamber body 110 and the bottom sealing portion 120.
돔부(200)는 챔버(100) 내부의 상측에 구비되어 챔버(100) 내부의 상측을 상하로 분리 폐쇄하는 형태로 구성할 수 있다. 돔부(200)는 중앙이 상방으로 함몰되는 형상일 수 있다. 돔부(200)는 공전부(300)에 결합하여 회전할 수 있다. 돔부(200)는 공전부(300)와 함께 상하로 이동, 즉 승강할 수 있다. 돔부(200)는 다수의 증착물 통과홀(H)을 구비할 수 있다.The dome part 200 may be provided on the upper side of the chamber 100 and may be configured to separate and close the upper side of the chamber 100 in a vertical direction. The dome part 200 may have a shape in which the center is recessed upward. The dome part 200 may rotate by being coupled to the revolving part 300. The dome part 200 may move up and down together with the orbit part 300, that is, it may be elevated. The dome part 200 may include a plurality of deposition material passing holes H.
돔부(200)는 기화된 증착물의 이동공간을 제한하여 기화 증착물이 챔버(100)의 내벽 전체로 흩어지는 것을 차단할 수 있고, 또한 공전으로 인해 돔부(200) 하측에서 소용돌이 기류가 발생하고 그 결과 기화 증착물이 돔부(200) 하측에 고르게 분포되게 할 수 있다.The dome part 200 limits the moving space of the vaporized deposit to prevent the vaporized deposit from scattering over the entire inner wall of the chamber 100, and also, due to the revolution, a eddy air flow is generated under the dome part 200, resulting in vaporization. The deposited material may be evenly distributed under the dome part 200.
공전부(300)는 일측이 챔버(100)의 상부 외측에 결합하고 타측은 챔버(100)의 상부벽을 관통하여 챔버(100)의 내부공간으로 삽입될 수 있다. 공전부(300)는 공전부 샤프트(310), 공전부 구동부(320), 공전부 프레임(330) 등을 포함할 수 있다.One side of the revolving part 300 may be coupled to the upper outer side of the chamber 100 and the other side may be inserted into the inner space of the chamber 100 through the upper wall of the chamber 100. The revolving part 300 may include an revolving part shaft 310, an revolving part driving part 320, a revolving part frame 330, and the like.
공전부 샤프트(310)는 챔버(100)의 상부벽을 관통하여 챔버(100)의 내부공간으로 연장할 수 있다. 공전부 샤프트(310)는 내측 단부가 돔부(200)에 결합하여 돔부(200)를 지지 및 회전시킬 수 있다. 공전부 샤프트(310)는 상하로 이동하면서 돔부(200)를 상하로 승강시킬 수 있다.The revolving part shaft 310 may penetrate the upper wall of the chamber 100 and extend into the inner space of the chamber 100. The revolving part shaft 310 may have an inner end coupled to the dome part 200 to support and rotate the dome part 200. The revolving part shaft 310 may move the dome part 200 up and down while moving up and down.
공전부 구동부(320)는 공전부 샤프트(310)를 회전 및/또는 승강시킬 수 있다.The revolving unit driving unit 320 may rotate and/or elevate the revolving unit shaft 310.
공전부 프레임(330)은 챔버(100)의 내부공간에서 공전부 샤프트(310)에 수직, 즉 수평으로 결합할 수 있다. 공전부 프레임(330)은 가장자리에 다수의 자전부(400)를 결합 지지할 수 있다. 공전부 프레임(330)은 공전부 샤프트(310)의 회전에 따라 같이 회전하면서 자전부(400)를 공전부 샤프트(310)를 중심으로 축회전, 즉 공전시킬 수 있다. 공전부 프레임(330)은 가장자리에 결합하는 자전부(400)를 개별적으로 틸팅할 수 있다.The revolving part frame 330 may be vertically or horizontally coupled to the revolving part shaft 310 in the inner space of the chamber 100. The revolving part frame 330 may couple and support a plurality of rotating parts 400 at an edge. The revolving part frame 330 may rotate along with the rotation of the revolving part shaft 310 and rotate the revolving part 400 around the revolving part shaft 310, ie, revolve. The revolving part frame 330 may individually tilt the rotating part 400 coupled to the edge.
자전부(400)는 기판을 지지 및 회전시키는 것으로 증착물 통과홀(H)의 외측에 위치할 수 있다. 자전부(400)는 공전부 프레임(330)의 가장자리에 다수가 대칭되게 결합할 수 있다. 자전부(400)는 공전 프레임(330)의 회전에 따라 돔부(200)와 함께 회전, 즉 공전할 수 있다.The rotating part 400 supports and rotates the substrate and may be located outside the deposition material passage hole H. The rotating part 400 may be symmetrically coupled to the edge of the rotating part frame 330. The rotating part 400 may rotate together with the dome part 200 according to the rotation of the orbit frame 330, that is, it may orbit.
자전부(400)는 자전부 본체(410), 기판 고정부(420) 등을 포함할 수 있다.The rotating part 400 may include a rotating part main body 410, a substrate fixing part 420, and the like.
자전부 본체(410)는 일측이 공전부 프레임(330)에 틸팅 가능하게 결합할 수 있다.One side of the rotating part main body 410 may be tiltably coupled to the rotating part frame 330.
기판 고정부(420)는 자전부 본체(410)의 타측에 결합하여 기판을 지지 고정할 수 있다. 기판 고정부(420)는 회전하면서 기판을 회전시킬 수 있다. 기판 고정부(420)는 증착물 통과홀(H)의 외측에 위치하거나 필요에 따라 증착물 통과홀(H)의 내측으로 삽입될 수 있다. The substrate fixing part 420 may be coupled to the other side of the rotating body 410 to support and fix the substrate. The substrate fixing part 420 may rotate the substrate while rotating. The substrate fixing part 420 may be located outside the deposition material passing hole H or may be inserted into the deposition material passing hole H if necessary.
자전부(400)는 다수를 구비하는 경우, 각 자전부(400)는 개별적으로 제어, 즉 틸팅 및 회전될 수 있다.When a plurality of rotating parts 400 are provided, each rotating part 400 may be individually controlled, that is, tilted and rotated.
도가니부(500)는 챔버(100) 내에서 증착물을 기화시켜 돔부(200)의 하측 방향으로 공급할 수 있다. 기화 증착물은 돔부(200)의 증착물 통과홀(H)을 통과하여 기판 고정부(420)에 고정된 기판 표면에 증착할 수 있다.The crucible part 500 may vaporize the deposited material in the chamber 100 and supply it in the downward direction of the dome part 200. The vaporized deposition material may pass through the deposition material passage hole H of the dome part 200 and may be deposited on the surface of the substrate fixed to the substrate fixing part 420.
도가니부(500)는 도가니(510), 레일부(520), 도가니 이송부(530) 등을 포함하여 구성하여, 챔버(100) 내에서 바닥 밀폐부(120)의 내면을 따라 도가니(510)를 수평으로 이동시킬 수 있다. 도가니부(500)는 도가니(510)를 다수 구비할 수 있다.The crucible part 500 includes a crucible 510, a rail part 520, a crucible transfer part 530, and the like, so that the crucible 510 is formed along the inner surface of the bottom sealing part 120 in the chamber 100. Can be moved horizontally. The crucible part 500 may include a plurality of crucibles 510.
도가니부(500)는 레일부(520)를 따라 도가니(510)를 수평으로 이동시키면서 기화 증착물이 기판 표면에 최적으로 증착되도록 도가니(510)의 위치를 조절할 수 있다.The crucible part 500 may horizontally move the crucible 510 along the rail part 520 and adjust the position of the crucible 510 so that vaporized deposits are optimally deposited on the substrate surface.
도가니부(500)에 대해서는 뒤에서 도 3~5를 참조하여 상세히 설명한다.The crucible part 500 will be described in detail later with reference to FIGS. 3 to 5.
이러한 구성을 갖는 본 발명의 다중 증착장치에서, 도가니를 교체하는 방법은, 먼저, 챔버(100) 내의 진공을 파기하고, 챔버(100)의 바닥 밀폐부(120)를 하강시킨다. 이후, 도가니(510)를 외곽으로 이동시킨 후 교체할 수 있다.In the multiple deposition apparatus of the present invention having such a configuration, the method of replacing the crucible is, first, the vacuum in the chamber 100 is destroyed, and the bottom sealing portion 120 of the chamber 100 is lowered. Thereafter, the crucible 510 may be moved to the outside and then replaced.
이후, 교체한 도가니(510)를 공정 위치로 이동시킨 후, 챔버(100)의 바닥 밀폐부(120)를 상승시킨다. 바닥 밀폐부(120)가 상승하면, 챔버(100)가 외부와 차폐되고, 이후 챔버(100) 내부를 진공으로 만든 후, 증착 공정을 진행할 수 있다.Thereafter, after moving the replaced crucible 510 to the process position, the bottom sealing portion 120 of the chamber 100 is raised. When the bottom sealing part 120 rises, the chamber 100 is shielded from the outside, and then the inside of the chamber 100 is made into a vacuum, and then the deposition process may be performed.
이러한 구성을 갖는 본 발명의 다중 증착장치는 작업자가 직접 들어가서 작업할 정도의 대형 증착장치를 구현하는 것을 가능하게 할 수 있다. The multi-deposition apparatus of the present invention having such a configuration can enable a large-sized evaporation apparatus to be implemented by a worker directly entering and working.
도 3은 본 발명에 따른 다중 진공증착 장치의 공전부 및 자전부를 도시하는 사시도이다.3 is a perspective view showing a revolving part and a rotating part of a multiple vacuum deposition apparatus according to the present invention.
도 3에 도시한 바와 같이, 공전부 프레임(330)은 공전부 샤프트(310)에 결합하여, 공전부 샤프트(310)의 승강 및 회전에 따라 함께 승강 및 회전할 수 있으며, 플레이트 형태로 구성할 수 있다.As shown in Figure 3, the revolving unit frame 330 is coupled to the revolving unit shaft 310, can be lifted and rotated together according to the elevating and rotating of the revolving unit shaft 310, and can be configured in a plate shape. I can.
자전부(400)는 자전부 본체(410), 기판 고정부(420), 후드(430) 등을 포함할 수 있다. The rotating part 400 may include a rotating part main body 410, a substrate fixing part 420, a hood 430, and the like.
자전부 본체(410)는 공전부 샤프트(330)의 가장자리를 따라 다수가 대칭되게 구비될 수 있다. 공전부 프레임(330)의 가장자리 단부에는 틸팅축(340)이 구비되어 있고, 자전부 본체(410)는 상측이 틸팅축(340)에 결합하여 축회전, 즉 틸팅될 수 있다.A plurality of the rotating part body 410 may be provided to be symmetrical along the edge of the rotating part shaft 330. A tilting shaft 340 is provided at an edge end of the revolving part frame 330, and the upper side of the rotating part body 410 may be coupled to the tilting shaft 340 to rotate, that is, tilt.
기판 고정부(420)는 자전부(400)의 하측에 구비되어 기판을 지지 고정할 수 있다.The substrate fixing part 420 may be provided under the rotating part 400 to support and fix the substrate.
후드(430)는 기판 고정부(420)의 가장자리를 따라 결합하는 것으로, 기판 고정부(420)가 증착물 통과홀(H)의 외측에 위치하는 경우, 증착물 통과홀(H) 방향으로 상승하는 기화 증착물이 증착물 통과홀(H)을 통과하여 돔부(200) 상측으로 이동하는 것을 차단할 수 있다. 이를 통해, 기화 증착물이 기판에 증착되지 않고 낭비되는 것을 차단 내지 최소화할 수 있다.The hood 430 is coupled along the edge of the substrate fixing part 420, and when the substrate fixing part 420 is located outside the deposition material passing hole H, vaporization rising in the direction of the deposition material passing hole H It is possible to block the deposition material from moving to the upper side of the dome 200 by passing through the deposition material passage hole (H). Through this, it is possible to block or minimize waste of the vaporized deposit without being deposited on the substrate.
도 4는 본 발명에 따른 다중 진공증착 장치에서 도가니부를 도시하는 평면도이다.4 is a plan view showing a crucible in a multiple vacuum deposition apparatus according to the present invention.
도 4에 도시한 바와 같이, 도가니부(500)는 호스트 도가니(511), 도펀트 도가니(513) 등을 포함할 수 있다.As shown in FIG. 4, the crucible part 500 may include a host crucible 511, a dopant crucible 513, and the like.
호스트 도가니(511)는 바닥 밀폐부(120)의 내면 중심에서 소정 간격 이격되어 다수가 방사상으로 배치될 수 있다. 호스트 도가니(511)는 호스트 받침대(531)에 지지되어 호스트 레일부(521)를 따라 방사상으로 수평 이동할 수 있다. Host crucibles 511 are spaced a predetermined distance from the center of the inner surface of the bottom sealing portion 120 may be arranged radially. The host crucible 511 is supported by the host pedestal 531 and may horizontally move radially along the host rail part 521.
도펀트 도가니(513)는 바닥 밀폐부(120)의 내면 중심에 위치할 수 있다. 도펀트 도가니(513)는 도펀트 받침대(533)에 지지되어 도펀트 레일부(523)를 따라 방사상으로 이동할 수 있다.The dopant crucible 513 may be located at the center of the inner surface of the bottom sealing part 120. The dopant crucible 513 is supported by the dopant pedestal 533 and may move radially along the dopant rail part 523.
도 4에 도시한 바와 같이, 도가니부(500)는 하나의 도펀트 도가니(513)를 다수의 호스트 도가니(511)가 방사상으로 둘러싸는 구조를 배치할 수 있다.As shown in FIG. 4, the crucible part 500 may have a structure in which one dopant crucible 513 is radially surrounded by a plurality of host crucibles 511.
도 5는 본 발명에 따른 다중 진공증착 장치에서 도가니 이송부를 도시하는 사면도이다.5 is an oblique view showing a crucible transfer unit in a multiple vacuum deposition apparatus according to the present invention.
도 5에 도시한 바와 같이, 호스트 도가니부는 호스트 도가니(511), 도가니 셔터(512), 호스트 회전부(514), 호스트 레일부(521), 이송부(530), 외측 회전축부(538) 등을 포함하여 구성할 수 있다.5, the host crucible part includes a host crucible 511, a crucible shutter 512, a host rotating part 514, a host rail part 521, a conveying part 530, an outer rotating shaft part 538, etc. It can be configured.
호스트 도가니(511)는 내부에 호스트 증착물을 내장할 수 있다. 호스트 도가니(511)는 열선을 구비하여 호스트 증착물을 기화시킬 수 있다. 기화된 호스트 증착물은 상측 개방구를 통해 배출되어 기판으로 이동할 수 있다.The host crucible 511 may contain a host deposition material therein. The host crucible 511 may be provided with a heating wire to vaporize the host deposit. The vaporized host deposit is discharged through the upper opening and can move to the substrate.
도가니 셔터(512)는 호스트 도가니(511)의 상측에서 수평으로 회전하면서 호스트 도가니(511)의 상측 개방구를 선택적으로 개폐할 수 있다.The crucible shutter 512 may selectively open and close the upper opening of the host crucible 511 while rotating horizontally from the upper side of the host crucible 511.
셔터 회전부(514)는 모터 등을 구비하여 도가니 셔터(512)를 선택적으로 회전시킬 수 있다.The shutter rotation unit 514 may be provided with a motor or the like to selectively rotate the crucible shutter 512.
호스트 레일부(521)는 바닥 밀폐부(120)의 내면에서 방사상으로 배치되어 호스트 도가니(511)의 방사상 수평 이동을 가이드할 수 있다. 호스트 레일부(521)는 호스트 도가니(511)를 지지하는 호스트 받침대(531)의 하측에 결합하여 호스트 받침대(531)를 가이드할 수 있다.The host rail part 521 may be radially disposed on the inner surface of the bottom sealing part 120 to guide the radially horizontal movement of the host crucible 511. The host rail part 521 may be coupled to the lower side of the host cradle 531 supporting the host crucible 511 to guide the host cradle 531.
이송부(530)는 호스트 도가니(511)를 호스트 레일부(521)를 따라 방사상으로 이동시키는 것으로, 호스트 받침대(531), 제1 암(532), 내측 회전축부(534), 제2 암(536) 등을 포함할 수 있다.The transfer unit 530 is to radially move the host crucible 511 along the host rail unit 521, and the host pedestal 531, the first arm 532, the inner rotating shaft part 534, the second arm 536 ), etc.
호스트 받침대(531)는 상측에 호스트 도가니(511) 등을 지지하고 하측에는 호스트 레일부(521)에 결합하여 수평으로 이동할 수 있다. The host pedestal 531 may support the host crucible 511 on the upper side and move horizontally by being coupled to the host rail unit 521 on the lower side.
제1 암(532)은 일측이 호스트 받침대(531)에 결합하고 타측은 내측 회전축부(534)에 결합할 수 있다. 제1 암(532)은 내측 회전축부(534)의 축회전에 따라 수평 이동하면서 호스트 받침대(531)를 수평 이동시킬 수 있다.One side of the first arm 532 may be coupled to the host pedestal 531 and the other side may be coupled to the inner rotation shaft portion 534. The first arm 532 may horizontally move the host pedestal 531 while horizontally moving according to the axial rotation of the inner rotational shaft 534.
내측 회전축부(534)는 제1 암(532)과 제2 암(536) 사이에 결합하여 제2 암(536)의 수평 이동을 제1 암(532)의 수평 이동으로 변환할 수 있다.The inner rotation shaft portion 534 may be coupled between the first arm 532 and the second arm 536 to convert the horizontal movement of the second arm 536 into a horizontal movement of the first arm 532.
제2 암(536)은 일측은 내측 회전축부(534)에 결합하고 타측은 외측 회전축부(538)에 결합할 수 있다. 제2 암(536)은 외측 회전축부(538)를 중심으로 축회전하면서 내측 회전축부(534)를 축회전시키고, 그 결과로서 내측 회전축부(534)에 축결합된 제1 암(532)을 수평 이동시킬 수 있다.One side of the second arm 536 may be coupled to the inner rotation shaft portion 534 and the other side may be coupled to the outer rotation shaft portion 538. The second arm 536 axially rotates the inner rotary shaft 534 while rotating around the outer rotary shaft 538, and as a result, the first arm 532 axially coupled to the inner rotary shaft 534 It can be moved horizontally.
외측 회전축부(538)는 상측이 제2 암(536)에 결합하고 하측은 바닥 밀폐부(120)를 관통하여 챔버(100) 외부로 노출될 수 있다. 외측 회전축부(538)는 외면이 바닥 밀폐부(120)와 결합하여 챔버(100) 내부를 진공 차폐할 수 있다. 외측 회전축부(538)의 하측에는 제2 암(536)를 회전시키는 외부 구동부가 결합될 수 있다. 외부 구동부는 회전 모터, 웜기어 등을 이용할 수 있다. 웜기어는 외측 회전축부(538)을 수동으로 축회전시키는 경우에 유용할 수 있다.The outer rotation shaft part 538 may be exposed to the outside of the chamber 100 by having an upper side coupled to the second arm 536 and a lower side passing through the bottom sealing part 120. The outer rotating shaft part 538 may vacuum shield the inside of the chamber 100 by combining the outer surface with the bottom sealing part 120. An external drive unit for rotating the second arm 536 may be coupled to a lower side of the outer rotation shaft part 538. The external drive may use a rotation motor, a worm gear, or the like. The worm gear may be useful when the outer rotation shaft part 538 is manually axially rotated.
도 5는 호스트 도가니(511)를 예시하여 설명하고 있으나, 도 5의 이송부 구성은 도펀트 도가니(513)의 이송에도 동일하게 적용할 수 있다.5 illustrates the host crucible 511, but the configuration of the transfer unit of FIG. 5 can be applied to the transfer of the dopant crucible 513 in the same manner.
도 6은 본 발명에 따른 다중 진공증착 장치에서 도가니 이송부의 회전축부를 도시하는 단면도이다.6 is a cross-sectional view showing a rotating shaft portion of a crucible conveying unit in a multiple vacuum deposition apparatus according to the present invention.
도 6에 도시한 바와 같이, 도 5의 외측 회전축부(538)는 축 밀폐부(10), 자성 유체(20), 베어링부(30) 등을 포함하여 구성할 수 있다.As shown in FIG. 6, the outer rotating shaft portion 538 of FIG. 5 may include a shaft sealing portion 10, a magnetic fluid 20, a bearing portion 30, and the like.
축 밀폐부(10)는 바닥 밀폐부(120)를 관통하면서 외면이 바닥 밀폐부(120)에 밀폐 결합할 수 있다. The shaft sealing portion 10 may be sealedly coupled to the bottom sealing portion 120 while passing through the bottom sealing portion 120.
자성 유체(20)는 축 밀폐부(10)와 제2 암(536) 사이에 삽입되어 제2 암(536)이 회전할 때 챔버(100) 내부와 제2 암(536) 사이를 진공 차폐할 수 있다.The magnetic fluid 20 is inserted between the shaft seal 10 and the second arm 536 to vacuum shield the interior of the chamber 100 and the second arm 536 when the second arm 536 rotates. I can.
베어링부(30)는 일측이 축 밀폐부(10)에 결합하고 타측은 제2 암(536)에 결합하여 제2 암(536)이 축 밀폐부(10)에 대해 원활하게 미끄럼 회전되게 할 수 있다. The bearing part 30 is coupled to the shaft sealing part 10 on one side and the second arm 536 on the other side to allow the second arm 536 to slide smoothly with respect to the shaft sealing part 10. have.
유틸리티(600)는 전력선, 신호선, 냉각수 등을 포함하는데, 이들은 외측 회전축부(538) 내부를 통해 셔터 회전부(514) 등과 연결될 수 있다.The utility 600 includes a power line, a signal line, a coolant, and the like, and these may be connected to the shutter rotation unit 514 or the like through the inside of the outer rotation shaft unit 538.
도 6에 도시한 외측 회전축부(538)의 구성은 내측 회전축부(534)에도 유사하게 적용할 수 있는데, 이 경우 축 밀폐부(10)는 제2 암(536)에 결합하고, 자성 유체(20)와 베어링부(30)는 제2 암(536)과 제1 암(532) 사이에 결합할 수 있다.The configuration of the outer rotation shaft part 538 shown in FIG. 6 can be similarly applied to the inner rotation shaft part 534, in this case, the shaft seal part 10 is coupled to the second arm 536, and the magnetic fluid ( 20) and the bearing unit 30 may be coupled between the second arm 536 and the first arm 532.
이상 본 발명을 여러 실시예에 기초하여 설명하였으나, 이는 본 발명을 예증하기 위한 것이다. 통상의 기술자라면, 이러한 실시예를 다양하게 변경하거나 수정할 수 있을 것이다. 그러나, 본 발명의 권리범위는 아래의 특허청구범위에 의해 정해지므로, 그러한 변경이나 수정은 본 발명의 권리범위에 포함되는 것으로 해석될 수 있다.The present invention has been described above based on several embodiments, but this is for illustrating the present invention. Those skilled in the art will be able to variously change or modify these embodiments. However, since the scope of the present invention is defined by the claims below, such changes or modifications can be interpreted as being included in the scope of the present invention.
[부호의 설명][Explanation of code]
100 : 챔버 110 : 챔버 본체100: chamber 110: chamber body
120 : 챔버 바닥 밀폐부 130 : 밀폐링120: chamber bottom sealing portion 130: sealing ring
200 : 돔부 300 : 공전부200: dome part 300: revolution part
310 : 공전부 샤프트 320 : 공전부 구동부310: idle shaft 320: idle drive unit
330 : 공전부 프레임 340 : 틸팅축330: revolution part frame 340: tilting axis
400 : 자전부 410 : 자전부 본체400: rotating part 410: rotating part main body
420 : 기판 고정부 430 : 후드420: substrate fixing portion 430: hood
500 : 도가니부 510 : 도가니500: crucible part 510: crucible
511 : 호스트 도가니 512 : 도가니 셔터511: host crucible 512: crucible shutter
513 : 도펀트 도가니 514 : 셔터 회전부513: dopant crucible 514: shutter rotating part
520 : 레일부 521 : 호스트 레일부520: rail part 521: host rail part
523 : 도펀트 레일부 530 : 이송부523: dopant rail part 530: transfer part
531 : 호스트 받침대 532 : 제1 암531: host pedestal 532: first arm
533 : 도펀트 받침대 534 : 내측 회전축부533: dopant support 534: inner rotating shaft portion
536 : 제2 암 538 : 외측 회전축부536: second arm 538: outer rotating shaft portion
600 : 유틸리티 10 : 축 밀폐부600: utility 10: shaft seal
20 : 자성 유체 30 : 베어링부20: magnetic fluid 30: bearing part
H : 증착물 통과홀H: Through hole for deposit

Claims (7)

  1. 진공증착 장치에 있어서,In the vacuum deposition apparatus,
    내부에 공간을 형성하고, 하방에 분리 가능하고 승강하는 바닥 밀폐부를 구비하는 챔버;A chamber formed with a space therein and provided with a bottom sealing portion that is detachable and elevating below;
    상기 챔버의 바닥 밀폐부의 내면을 따라 방사상으로 이동하는 다수의 도가니부를 포함하는, 승강하는 바닥 밀폐부에 다수의 이동 도가니를 갖는 다중 진공증착 장치.A multi-vacuum deposition apparatus having a plurality of moving crucibles in the elevated floor sealing portion, including a plurality of crucibles moving radially along the inner surface of the bottom sealing portion of the chamber.
  2. 제1항에 있어서, 상기 도가니부는The method of claim 1, wherein the crucible part
    상기 바닥 밀폐부의 내면 중앙에 배치되고 방사상으로 이동하는 도펀트 도가니부;A dopant crucible part disposed in the center of the inner surface of the bottom sealing part and moving radially;
    상기 바닥 밀폐부의 내면에 방사상으로 배치되고 방사상으로 이동하는 다수의 호스트 도가니부를 포함하는, 승강하는 바닥 밀폐부에 다수의 이동 도가니를 갖는 다중 진공증착 장치.A multi-vacuum deposition apparatus having a plurality of moving crucibles on the floor sealing portion to be elevated and including a plurality of host crucibles disposed radially on the inner surface of the bottom sealing portion and moving radially.
  3. 제2항에 있어서, 상기 도가니부는The method of claim 2, wherein the crucible part
    증착물을 내장하는 도가니;A crucible containing a deposit;
    상기 바닥 밀폐부의 내면에 구비되어 상기 도가니를 방사상으로 수평 가이드하는 레일부;A rail part provided on an inner surface of the bottom sealing part to radially horizontally guide the crucible;
    상기 레일부를 따라 상기 도가니를 이동시키는 이송부;A transfer part for moving the crucible along the rail part;
    상기 챔버의 바닥 밀폐부에 관통 결합하고, 일측은 상기 이송부의 일측에 결합하여 상기 이송부의 일측을 축회전 가능하게 지지하고, 타측은 상기 바닥 밀폐부에 결합하여 상기 챔버의 내부를 진공 상태로 차폐하는 외측 회전축부를 포함하는, 승강하는 바닥 밀폐부에 다수의 이동 도가니를 갖는 다중 진공증착 장치.It is coupled through the bottom sealing part of the chamber, one side is coupled to one side of the transfer unit to support one side of the transfer unit so as to be axially rotatable, and the other side is coupled to the bottom sealing unit to shield the inside of the chamber in a vacuum state. A multi-vacuum deposition apparatus having a plurality of moving crucibles on a bottom sealing portion that rises and falls, including an outer rotating shaft portion.
  4. 제3항에 있어서, 상기 도가니부는The method of claim 3, wherein the crucible part
    상기 도가니의 상측 개방구를 개폐하는 도가니 셔터;A crucible shutter for opening and closing the upper opening of the crucible;
    상기 도가니 셔터를 회전시키는 셔터 회전부를 포함하는, 승강하는 바닥 밀폐부에 다수의 이동 도가니를 갖는 다중 진공증착 장치.Multiple vacuum evaporation apparatus having a plurality of moving crucibles in a bottom sealing portion for elevating and descending, including a shutter rotation unit for rotating the crucible shutter.
  5. 제3항에 있어서,The method of claim 3,
    상기 외측 회전축부는 웜기어와 결합하여 수동 조작이 가능한, 승강하는 바닥 밀폐부에 다수의 이동 도가니를 갖는 다중 진공증착 장치.The outer rotary shaft portion is coupled to the worm gear and can be manually operated, the multiple vacuum deposition apparatus having a plurality of moving crucibles on the elevating floor sealing portion.
  6. 제3항에 있어서, 상기 도가니 이송부는The method of claim 3, wherein the crucible transfer unit
    일측은 상기 도가니에 결합하고 타측은 상기 레일부에 결합하는 도가니 받침대;One side is coupled to the crucible and the other side is a crucible support coupled to the rail unit;
    일측이 상기 도가니 받침대에 결합하여 수평 이동하는 제1 암;A first arm having one side coupled to the crucible support and moving horizontally;
    일측이 상기 제1 암에 결합하여 상기 제1 암의 타측을 축회전시키는 내측 회전축부;An inner rotation shaft portion having one side coupled to the first arm to rotate the other side of the first arm;
    일측은 상기 내측 회전축부에 결합하고 타측은 외측 회전축부에 결합하여 상기 외측 회전축부를 중심으로 축회전하면서 상기 내측 회전축부를 수평 이동시키는 제2 암을 포함하는, 승강하는 바닥 밀폐부에 다수의 이동 도가니를 갖는 다중 진공증착 장치.A plurality of moving crucibles on the bottom sealing part for ascending and descending, including a second arm that is coupled to the inner rotation shaft part on one side and the outer rotation shaft part on the other side to horizontally move the inner rotation shaft part while axially rotating around the outer rotation shaft part Multiple vacuum deposition apparatus having a.
  7. 제1항 내지 제6항 중 어느 한 항에 있어서,The method according to any one of claims 1 to 6,
    상기 챔버 내부의 상측에 구비되고, 다수의 증착물 통과홀을 구비하는 돔부;A dome portion provided on the upper side of the chamber and having a plurality of deposition material passage holes;
    일측은 상기 챔버의 상부 외측에 결합하고 타측은 상기 챔버의 내부에서 상기 돔부에 결합하여 상기 돔부를 승강 및 회전시키는 공전부;One side is coupled to the upper and outer side of the chamber and the other side is coupled to the dome portion in the interior of the chamber to lift and rotate the dome portion;
    일측은 상기 공전부의 타측에 결합하여 공전 및 틸팅하고 타측은 상기 증착물 통과홀의 외측 또는 내측에서 기판을 지지 및 회전시키는 다수의 자전부를 포함하는, 승강하는 바닥 밀폐부에 다수의 이동 도가니를 갖는 다중 진공증착 장치.One side is coupled to the other side of the revolving part to revolve and tilt, and the other side has a plurality of moving crucibles in the elevating floor sealing part including a plurality of rotating parts supporting and rotating the substrate outside or inside the deposit passage hole. Multiple vacuum deposition equipment.
PCT/KR2019/004863 2019-03-05 2019-04-23 Multi-vacuum deposition apparatus including plurality of moving crucibles disposed on up-and-down-moving bottom airtight closure part WO2020179967A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2019-0025153 2019-03-05
KR1020190025153A KR20200106654A (en) 2019-03-05 2019-03-05 Multiple Vacuum Evaporation Apparatus with Movable Crucible Units on Bottom Wall of Chamber

Publications (1)

Publication Number Publication Date
WO2020179967A1 true WO2020179967A1 (en) 2020-09-10

Family

ID=72338634

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2019/004863 WO2020179967A1 (en) 2019-03-05 2019-04-23 Multi-vacuum deposition apparatus including plurality of moving crucibles disposed on up-and-down-moving bottom airtight closure part

Country Status (2)

Country Link
KR (1) KR20200106654A (en)
WO (1) WO2020179967A1 (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08236449A (en) * 1995-02-28 1996-09-13 Nec Corp Vapor-depositing device
JP2003129224A (en) * 2001-10-26 2003-05-08 Matsushita Electric Works Ltd Apparatus and process for vacuum deposition
JP2004353030A (en) * 2003-05-28 2004-12-16 Tokki Corp Vapor deposition apparatus
KR20140062951A (en) * 2012-11-15 2014-05-27 (주)비엠씨 Deposition apparatus containing moving deposition source
JP2017008409A (en) * 2015-06-18 2017-01-12 キヤノントッキ株式会社 Vacuum evaporation device, production method of evaporation film and production method of organic electronic device
US10011898B2 (en) * 2015-07-23 2018-07-03 Boe Technology Group Co., Ltd. Crucible device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08236449A (en) * 1995-02-28 1996-09-13 Nec Corp Vapor-depositing device
JP2003129224A (en) * 2001-10-26 2003-05-08 Matsushita Electric Works Ltd Apparatus and process for vacuum deposition
JP2004353030A (en) * 2003-05-28 2004-12-16 Tokki Corp Vapor deposition apparatus
KR20140062951A (en) * 2012-11-15 2014-05-27 (주)비엠씨 Deposition apparatus containing moving deposition source
JP2017008409A (en) * 2015-06-18 2017-01-12 キヤノントッキ株式会社 Vacuum evaporation device, production method of evaporation film and production method of organic electronic device
US10011898B2 (en) * 2015-07-23 2018-07-03 Boe Technology Group Co., Ltd. Crucible device

Also Published As

Publication number Publication date
KR20200106654A (en) 2020-09-15

Similar Documents

Publication Publication Date Title
WO2020013431A1 (en) Apparatus for multi-substrate vacuum deposition through revolving, rotating, and tilting
WO2015057023A1 (en) Substrate treatment apparatus
WO2014168331A1 (en) Substrate processing device
JP3178824B2 (en) High productivity multi-station type processing equipment for compound single wafer.
EP0287384A2 (en) Dial deposition and processing apparatus
WO2021256772A1 (en) Rotation shaft sealing device and semiconductor substrate processing device using same
WO2014157827A1 (en) Chamber-type high-speed atomic layer deposition device
WO2021033909A1 (en) Chemical vapor deposition device used to deposit thin film layer on powder particle-type material
WO2016167555A1 (en) Substrate processing apparatus
WO2021162447A2 (en) Substrate processing device
WO2011037343A2 (en) Polycrystalline silicon ingot production device provided with a rotating door opening and shutting device
WO2020179967A1 (en) Multi-vacuum deposition apparatus including plurality of moving crucibles disposed on up-and-down-moving bottom airtight closure part
WO2013022127A1 (en) Mocvd apparatus
JPH05270997A (en) Atomic layer epitaxial device and atomic layer epitaxy
WO2013122311A1 (en) Substrate processing module and substrate processing apparatus including same
WO2022010105A1 (en) Deposition apparatus
WO2020004880A1 (en) Substrate processing device and substrate processing method
WO2010101413A2 (en) Gate valve assembly and substrate-processing system comprising same
WO2020138970A2 (en) Substrate treatment apparatus
WO2016167554A1 (en) Substrate processing apparatus
WO2022220338A1 (en) Substrate processing apparatus provided with lift portion
WO2024080411A1 (en) Deposition device
WO2015102420A1 (en) Lifting device for substrate transfer apparatus and substrate transfer apparatus comprising same
EP4041935A1 (en) Substrate support unit, and apparatus and method for depositing a layer using the same
WO2018135858A1 (en) Deposition source and deposition apparatus having the same

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19917568

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19917568

Country of ref document: EP

Kind code of ref document: A1