WO2020019651A1 - 一种新型双面数字化曝光系统及工作流程 - Google Patents

一种新型双面数字化曝光系统及工作流程 Download PDF

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Publication number
WO2020019651A1
WO2020019651A1 PCT/CN2018/122482 CN2018122482W WO2020019651A1 WO 2020019651 A1 WO2020019651 A1 WO 2020019651A1 CN 2018122482 W CN2018122482 W CN 2018122482W WO 2020019651 A1 WO2020019651 A1 WO 2020019651A1
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Prior art keywords
exposure
loading
light source
exposed
double
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PCT/CN2018/122482
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English (en)
French (fr)
Inventor
汪孝军
廖平强
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中山新诺科技股份有限公司
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Publication of WO2020019651A1 publication Critical patent/WO2020019651A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2032—Simultaneous exposure of the front side and the backside
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Definitions

  • the invention relates to the technical field of double-sided exposure, in particular to a double-sided exposure machine and a double-sided exposure method.
  • Double-sided exposure machines usually use film transfer to expose double-sided circuit boards. Before the exposure, you need to make the film with the pattern to be transferred. Then, fix the film with the pattern on both sides to the upper and lower glass. Then, sandwich the circuit board with the pattern to be transferred between the upper and lower glass. The blue-violet high-brightness light source is exposed, and the circuit pattern is transferred to the circuit board to complete double-sided exposure.
  • single-sided exposure is usually used. First, one side of the circuit board is exposed, and after the exposure is completed, the other side is flipped, and then the other side of the circuit board is exposed, and finally the double-sided exposure of the circuit board is completed.
  • the laser direct writing exposure machine needs to perform a flip operation when performing double-sided exposure, and the flip operation will inevitably cause a problem of alignment after the flip, which not only increases the exposure process, but also affects the exposure accuracy due to the alignment accuracy problem. , Which affects the final exposure effect.
  • the double-sided exposure machine does not need to be reversed during exposure, reduces the exposure process, improves the exposure accuracy, and then improves the imaging quality of the exposure.
  • the double-sided exposure method is applied to the aforementioned double-sided exposure machine, which has higher exposure efficiency and facilitates automated operations. .
  • a double-sided exposure machine which includes a worktable with an exposure through hole; an exposure mechanism, which includes a first exposure component and a second exposure component, and the first exposure component and the second exposure component are respectively
  • the exposure area is provided on both sides of the worktable, and the exposure area is set corresponding to the exposure through hole; and a loading mechanism, the loading mechanism includes a first loading stage and a second loading stage, a first loading stage and a second loading
  • the tables can be moved along the table and exposed through the exposure area.
  • the first loading stage moves and exposes the first to-be-exposed part through the exposure area
  • the second loading stage loads the second to-be-exposed part
  • the first to-be-exposed part is first loaded after the exposure is completed.
  • the stage is retracted, the second loading stage is moved, and the second to-be-exposed part is exposed through the exposure area, and then the second loading stage is used for exposure while unloading and loading the first to-be-loaded part on the first loading stage.
  • the automatic exposure is realized, and the exposure efficiency is also improved. At the same time, no flip is required, the exposure process is reduced, and the exposure accuracy is improved.
  • the loading mechanism further includes a first driver and a second driver, the first driver is used to drive the first loading table to move along the table, and the second driver is used to drive the second loading table to move along the table.
  • the loading mechanism further includes a controller, a first sensor, and a second sensor.
  • the first sensor is used to detect the moving position of the first loading platform
  • the second sensor is used to detect the moving position of the second loading platform.
  • the first exposure component, the second exposure component, the first driver, the second driver, the first sensor, and the second sensor are all electrically connected to the controller.
  • the first loading stage is provided with a first loading portion for loading the first to-be-exposed piece
  • the second loading stage is provided with the second loading portion for loading the second to-be-exposed piece.
  • the first loading platform is provided with a first chute, and the table is provided with a first guide rail that moves in cooperation with the first chute; or the second loading platform is provided with a guide hole, and the table is provided with a guide Hole fits the second rail.
  • the first exposure component includes a first exposure element and a second exposure element.
  • the first exposure element is provided with a plurality of first light source elements.
  • the first light source elements are arranged at a distance and arranged in a row.
  • the two exposure elements are provided with a plurality of second light source elements.
  • the second light source elements are arranged at a distance and arranged in a row.
  • the first light source elements and the second light source elements are arranged side by side and are staggered.
  • the setting position corresponds to the position of the gap between the two second light source elements.
  • the second exposure component includes a third exposure element, and the third exposure element is provided with a plurality of third light source elements.
  • the third light source elements are arranged at a distance, are arranged side by side, and are arranged side by side in two rows.
  • the third light source device of one row and the third light source device of the other row are staggered, so that a gap between the setting position of the third light source device of one row and the two third light source devices of the other row is provided. Correspondence.
  • a double-sided exposure method is also provided, which can be applied to the double-sided exposure machine according to any one of the above technical solutions, and includes the following steps:
  • the first loading stage is located at the first initial position, and the first to-be-exposed piece is loaded on the first loading stage;
  • the second loading stage is located at the second initial position, and the second to-be-exposed part is loaded on the second loading stage, and the first initial position and the second initial position are respectively located on both sides of the exposure mechanism;
  • the first loading stage moves along the worktable, and passes through the exposure area to reach the first preset position, and the first preset position and the first initial position are respectively located on both sides of the exposure area; and at the same time, the first of the exposure mechanism
  • the exposure component and the second exposure component expose the first to-be-exposed member, and complete the exposure to the first to-be-exposed member to obtain a first exposure finished product;
  • the first loading platform returns to the first initial position along the workbench, and unloads the first exposure finished product
  • the second loading stage moves along the workbench, and passes through the exposure area to reach the second preset position, and the second preset position and the second initial position are respectively located on both sides of the exposure area; and at the same time, the first exposure component and the The second exposure component exposes the second to-be-exposed member, completes the exposure to the second to-be-exposed member, and obtains the second exposure finished product; and simultaneously loads the next first to-be-exposed member on the first loading table;
  • step (S7) Go to step (S3); and simultaneously load the next second to-be-exposed piece on the second loading table.
  • the second to-be-exposed member is loaded when the first to-be-exposed member is exposed through the operation flow of steps (S3) to (S7), and the next to-be-exposed member is to be loaded when the second to-be-exposed member is loaded.
  • the loading is performed to make full use of the time during the exposure to improve the exposure efficiency.
  • step (S3) the step of moving the first loading table along the table and passing through the exposure area to reach the first preset position, further includes: the first sensor detects the first loading table in real time And feedback to the controller, when the first loading platform moves to the first preset position, the controller controls the first driver to stop the first loading platform from moving; otherwise, the first loading platform continues to move along the worktable;
  • step (S5) the step of moving the second loading table along the table and passing through the exposure area to reach the second preset position also includes: the second loading table moves and triggers the second sensor, the second sensor The trigger information is fed back to the controller, and the controller controls the second driver to stop the second loading platform from moving.
  • the method before step (S3), further includes: the controller receives the first exposure information and the second exposure information, and determines the first light emission of the first light source device in the first exposure component based on the first exposure information, respectively. The information and the second light-emitting information of the second light source device, and determine the third light-emitting information of the third light source device in the second exposure component based on the second exposure information; in step (S3), the first exposure component and the second exposure component pair When the first to-be-exposed member is exposed, the first to-be-exposed member is exposed based on the first, second, and third light-emitting information.
  • FIG. 1 is a flowchart of a double-sided exposure method in an embodiment
  • FIG. 2 is a front view of a double-sided exposure machine in the embodiment
  • FIG. 3 is a left side view of the double-sided exposure machine in the embodiment.
  • FIG. 4 is a plan view of a double-sided exposure machine in the embodiment.
  • a double-sided exposure machine which includes a workbench 100 which is provided with an exposure through hole; an exposure mechanism, which includes a first exposure module 210 and a second exposure.
  • the module 220, the first exposure module 210 and the second exposure module 220 are respectively disposed on both sides of the workbench 100, and an exposure area 120 is formed on the workbench 100, and the exposure area 120 is arranged corresponding to the exposure through hole; and a loading mechanism, a loading mechanism
  • the first loading stage 310 and the second loading stage 320 are included. Both the first loading stage 310 and the second loading stage 320 can be moved along the workbench 100 and exposed through the exposure area 120.
  • the first loading stage 310 moves and exposes the first to-be-exposed piece through the exposure area 120
  • the second loading stage 320 loads the second to-be-exposed piece
  • the first loading stage 310 times after the first to-be-exposed piece is exposed.
  • the second loading stage 320 moves, and the second to-be-exposed part is exposed through the exposure area 120
  • the second loading stage 320 is used for unloading and loading the first to-be-exposed part on the first loading stage 310 while exposing, Not only is it convenient to realize automatic exposure, but it also improves the exposure efficiency, at the same time, it does not need to flip, reduces the exposure process, and improves the exposure accuracy.
  • the traditional laser direct writing exposure machine can only be exposed on one side, and cannot be exposed on both sides at the same time. After exposing one side, it needs to be flipped to expose the other side. Due to the need for flipping, not only the process flow is too much, but the flipping wastes time. Exposure efficiency is low, and alignment is required after flipping, which easily affects exposure accuracy due to alignment accuracy issues. At the same time, traditional double-sided exposure mostly uses film transfer, film production also increases the process flow, and film production costs are high, and film use It must be replaced after a period of time.
  • the first exposure module 210 and the second exposure module 220 are respectively disposed on both sides of the workbench 100, and the workbench 100 is provided with an exposure for passing light emitted by the second exposure module 220 or the first exposure module 210. Through holes, the first exposure module 210 and the second exposure module 220 can form an exposure area 120 in the corresponding area of the table 100.
  • the first exposure module 210 When the first to-be-exposed part on the first loading table 310 passes, the first exposure module 210 The front and back surfaces of the first to-be-exposed part are exposed simultaneously with the second exposure module 220, thereby achieving the effect of simultaneous exposure; at the same time, since the second loading stage 320 can also be moved on the workbench 100, the first loading stage can be used When the first to-be-exposed component on the 310 is exposed and subsequently unloaded, the second to-be-exposed part on the second loading table 320 is loaded and unloaded and exposed, so as to make full use of time and improve exposure efficiency. Furthermore, realignment is avoided, thereby improving exposure accuracy. In addition, compared with the traditional forward and reverse and multiple stitching exposure methods, the exposure efficiency and Exposure accuracy is greatly improved.
  • Each of the first loading stage 310 and the second loading stage 320 is provided with loading through holes, so that when the first to-be-exposed or the second to-be-exposed piece passes through the exposure area 120, the first exposure module 210 and the second exposure portion can be smoothly exposed.
  • the light of the component 220 is irradiated to the first to-be-exposed or the second to-be-exposed member, thereby performing exposure;
  • the corresponding setting of the exposure through hole and the exposure area 120 means that the light emitted by the first exposure component 210 or the second exposure component 220 can pass through the exposure through hole to reach the exposure area 120, so that the first to-be-exposed or second-to-be-exposed piece When passing, it is irradiated on the top for exposure.
  • Those skilled in the art can make specific settings according to the exposure needs, which will not be repeated here.
  • the first exposure component 210 and the second exposure component 220 are correspondingly arranged with a distance between them.
  • the exposure direction of the first exposure component 210 is opposite to the exposure direction of the second exposure component 220, thereby forming an exposure area 120 on the table 100.
  • Those skilled in the art can make specific settings as needed to meet the needs of double-sided exposure, which will not be repeated here.
  • first exposure component 210 and the second exposure component 220 are both fixedly disposed.
  • the first exposure module 210 and the second exposure module 220 that are fixedly set cannot move, and the corresponding relationship between the first exposure module 210 and the second exposure module 220 is set during installation, so that the first loading stage 310 moves to
  • the first exposure component 210 and the second-exposure component 220 simultaneously expose the front and back surfaces of the first to-be-exposed component, and the exposure contents correspond to each other.
  • the exposure accuracy Higher and more efficient exposure are both fixedly disposed.
  • the embodiment shown in FIG. 2 further includes a fixed support bracket 110.
  • Two fixed support brackets 110 are provided, and the first exposure module 210 and the second exposure module 220 are respectively provided on the corresponding fixed bracket 110, thereby realizing the position. Fixed purpose.
  • the fixing bracket 110 is a marble beam.
  • the first exposure module 210 is fixed at the upper portion
  • the second exposure module 220 is fixed at the lower portion
  • the table surface of the workbench 100 is between the first exposure module 210 and the second exposure module 220
  • the first loading platform 310 and The second loading stage 320 can be moved left and right along the workbench 100, so that when passing through the exposure area 120 between the first exposure module 210 and the second exposure module 220, the first to-be-exposed or second The exposure part performs exposure, and realizes the technical effect of performing front and back exposure at the same time without reversing.
  • the loading mechanism further includes a first driver and a second driver.
  • the first driver is used to drive the first loading table 310 to move along the workbench 100
  • the second driver is used to drive the second loading table 320. Move along the table 100.
  • the loading mechanism further includes a controller, a first sensor, and a second sensor.
  • the first sensor is used to detect the moving position of the first loading platform 310
  • the second sensor is used to detect the second loading platform.
  • the first exposure component 210, the second exposure component 220, the first driver, the second driver, the first sensor, and the second sensor are all electrically connected to the controller.
  • the setting of the controller is used to precisely control the coordination accuracy between the first loading stage 310, the second loading stage 320, the first exposure module 210 and the second exposure module 220; at the same time, the settings of the first sensor and the second sensor are improved.
  • the movement accuracy of the first loading stage 310 and the second loading stage 320 is improved to improve the accuracy of the exposure pattern.
  • the first loading platform 310 is provided with a first loading section for loading the first to-be-exposed piece
  • the second loading platform 320 is provided with the second loading section for loading the second to-be-exposed piece.
  • the first loading section and the second loading section are respectively used for installing the first to-be-exposed and the second to-be-exposed pieces.
  • first to-be-exposed and second-to-be-exposed pieces are in a stable position, avoiding displacement during movement or exposure Or tilt, which affects exposure efficiency and improves exposure accuracy.
  • the first loading platform 310 is provided with a first chute, and the table 100 is provided with a first guide rail that moves in cooperation with the first chute; or the second loading platform 320 is provided with a guide hole, The workbench 100 is provided with a second guide rail that cooperates with the guide hole.
  • the arrangement of the first chute and the first guide rail is an implementation manner.
  • the first chute and the first guide rail improve the movement accuracy of the first loading platform 310, thereby avoiding deviation of the first to-be-exposed part during the movement or exposure process. Shifting or tilting to improve the exposure accuracy; the arrangement of the guide hole and the second guide rail is another embodiment, which also serves to improve the movement accuracy of the second loading stage 320, thereby improving the exposure accuracy.
  • a person skilled in the art may select an installation method to ensure the smooth movement of the first loading platform 310 or the second loading platform 320 according to the needs.
  • the smooth movement setting structure of the first loading platform 310 and the second loading platform 320 may be the same structure or different structures. I won't repeat them here.
  • the first exposure module 210 includes a first exposure member 211 and a second exposure member 212.
  • the first exposure member 211 is provided with a plurality of first light source members 2111, and the first light source members 2111 are spaced apart.
  • the second light source parts 2121 are arranged in a row, and the second light source parts 2121 are arranged in a row.
  • the first light source part 2111 and the second light source part 2121 are arranged side by side. The positions are set and staggered so that the setting position of one first light source part 2111 corresponds to the position of the gap between the two second light source parts 2121.
  • the first exposure module 210 includes a first exposure member 211 and a second exposure member 212.
  • the first exposure member 211 and the second exposure member 212 are arranged side by side.
  • the first light source elements 2111 are arranged in a row
  • the second exposure element 212 is provided with six second light source elements 2121 and are arranged in a row.
  • the first exposure element 211 and the second exposure element 212 are staggered, that is, the first The setting height of an exposure element 211 is higher than the setting height of the second exposure element 212, so that the first light source element 2111 on the first exposure element 211 and the two adjacent second light source elements 2121 on the second exposure element 212 are respectively.
  • the exposed portion of the first light source element 2111 on the first exposure element 211 and the exposed portion of the second light source element 2121 are spliced together to form an exposure pattern.
  • the upper fixing bracket 110 is provided with two, the left fixing bracket 110 is used for fixing the first exposure member 211, and the right fixing bracket 110 is used for fixing the second exposure member 212.
  • the second exposure module 220 includes a third exposure member.
  • the third exposure member is provided with a plurality of third light source members 2211.
  • the third light source members 2211 are arranged at a distance, are arranged side by side, and are arranged side by side. It is arranged in two rows, in which one row of the third light source element 2211 and the other row of the third light source element 2211 are staggered, so that the setting position of one of the third light source elements 2211 in one row and two of the other row The positions of the gaps between the third light source elements 2211 correspond to each other.
  • the second exposure module 220 is in the form of a third exposure element.
  • the third exposure element is provided with two rows of third light source elements 2211, and each row is provided with six third exposure elements.
  • the light source parts 2211 and the third row of the third light source parts 2211 are staggered, so that the third light source part 2211 in one row corresponds to the position between the two adjacent third light source parts 2211 in the other row, and the exposure pattern is also realized.
  • the effect of stitching exposure is simpler and the cost is lower.
  • FIG. 1 further provides a double-sided exposure method, which can be applied to the double-sided exposure machine described in any one of the above embodiments, and includes the following steps:
  • the first loading stage 310 is located at the first initial position, and the first to-be-exposed piece is loaded on the first loading stage 310;
  • the second loading stage 320 is located at the second initial position, and the second to-be-exposed piece is loaded on the second loading stage 320, and the first initial position and the second initial position are respectively located on both sides of the exposure mechanism;
  • the first loading stage 310 moves along the workbench 100 and passes through the exposure area 120 to reach a first preset position, and the first preset position and the first initial position are respectively located on both sides of the exposure area 120; and simultaneously expose The first exposure component 210 and the second exposure component 220 of the mechanism expose the first to-be-exposed member, complete the exposure to the first to-be-exposed member, and obtain a first-exposure finished product;
  • the second loading stage 320 moves along the workbench 100 and passes through the exposure area 120 to reach a second preset position, and the second preset position and the second initial position are respectively located on both sides of the exposure area 120;
  • An exposure module 210 and a second exposure module 220 expose the second to-be-exposed part, complete the exposure to the second to-be-exposed part, and obtain a second exposure finished product; and simultaneously load the next first to-be-exposed part on the first loading table 310 Exposure piece
  • the second loading stage 320 returns to the second initial position along the workbench 100, and unloads the second exposure finished product;
  • the second to-be-exposed member is loaded when the first to-be-exposed member is exposed, and the next first to-be-exposed member is loaded when the second to-be-exposed member is loaded, thereby making full use of The operation is performed at the time of exposure, which improves the exposure efficiency.
  • step (S7) the process proceeds to step (S4) to achieve the purpose of subsequent loop operations, which can perform double-sided exposure on more parts to be exposed in the same time, and has higher exposure accuracy.
  • step (S4) when the first loading table 310 returns, the returning speed is higher than the speed when the first to-be-exposed member is exposed, so as to return to the first initial position as soon as possible, and start to enter the second to-be-exposed member exposure.
  • the second loading stage 320 is the same when returning, and will not be repeated here.
  • steps (S1) to (S7) can be adjusted as appropriate according to the needs. For example, after the first loading platform 310 returns to the first initial position, the first exposed product is unloaded, and then the second is performed. In fact, the exposure of the to-be-exposed parts may actually start the exposure of the second to-be-exposed parts immediately after the first loading table 310 returns to the first initial position, and the unloading of the first exposure finished product and the next The same applies to the unloading and loading of the second loading table 320 as soon as the parts to be exposed are loaded, which will not be repeated here.
  • step (S3) while the first loading stage 310 moves along the workbench 100 and passes through the exposure area 120 to reach the first preset position, it further includes: the first sensor detects the first loading stage 310 in real time And feedback to the controller, when the first loading platform 310 moves to the first preset position, the controller controls the first driver to stop the first loading platform 310; otherwise, the first loading platform 310 continues along the work platform 100 moves
  • step (S5) the step of moving the second loading stage 320 along the workbench 100 and passing through the exposure area 120 to reach the second preset position also includes: the second loading stage 320 moves and triggers the second sensor The second sensor feedbacks trigger information to the controller, and the controller controls the second driver to stop the second loading stage 320 from moving.
  • the method further includes: the controller receives the first exposure information and the second exposure information, and determines the first light emission information and The second light-emitting information of the second light source device 2121 and the third light-emitting information of the third light source device 2211 in the second exposure component 220 are determined based on the second exposure information; in step (S3), the first exposure component 210 and the second exposure When the component 220 exposes the first to-be-exposed member, the first to-be-exposed member is exposed based on the first, second, and third light-emitting information.
  • the first exposure component 210 and the second exposure component 220 form a maskless exposure system (Digital Micromirror Device, DMD exposure system for short).
  • the maskless exposure system enlarges an image through a projection objective to achieve
  • the arrangement number of the first light source part 2111 and the second light source part 2121 or the third light source part 2211 of the DMD exposure system is determined according to the size of the exposure pattern, and the exposure accuracy is higher.

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  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

一种双面曝光机及双面曝光方法，双面曝光机包括工作台（100）；曝光机构，曝光机构包括第一曝光组件（210）和第二曝光组件（220），第一曝光组件和第二曝光组件在工作台形成曝光区；及装载机构，装载机构包括第一装载台（310）和第二装载台（320），第一装载台和第二装载台均能够沿工作台移动。第一装载台移动、并通过曝光区进行第一待曝光件的曝光，第二装载台装载第二待曝光件，第一待曝光件曝光完成后第一装载台回退，第二装载台移动、并通过曝光区进行第二待曝光件的曝光，进而利用第二装载台曝光的同时进行第一装载台上第一待装载件的卸载和装载，不仅便于实现自动化曝光，而且还提高了曝光效率，同时无需翻转，减少了曝光流程，提高了曝光精度。

Description

一种新型双面数字化曝光系统及工作流程 技术领域
本发明涉及双面曝光技术领域，特别是涉及一种双面曝光机及双面曝光方法。
背景技术
传统的双面曝光机，通常采用菲林转印进行双面电路板的曝光。曝光前，需要先制作待转印图案的菲林；然后，将带有两面图案的菲林分别固定在上下两面玻璃上；接着，将待转印图案的电路板夹在上下两块玻璃之间，使用蓝紫色高亮度光源进行曝光，将线路图案转印到线路板上，完成双面曝光。而对于激光直写曝光机，通常采用单面曝光。先对电路板的其中一面进行曝光，待曝光完成后进行翻转，然后再对电路板的另一面进行曝光，最后完成对电路板的双面曝光。
然而，激光直写曝光机在进行双面曝光时，需进行翻转操作，而翻转操作必然会产生翻转后进行对位的问题，不仅增加了曝光流程，同时也会因对位精度问题影响曝光精度，从而影响最终的曝光效果。
发明内容
基于此，有必要提供一种双面曝光机及双面曝光方法。该双面曝光机在进行曝光时无需翻转，减少曝光流程，提高曝光精度，进而提升曝光成像质量；该双面曝光方法应用于前述的双面曝光机，曝光效率更高，且便于实现自动化操作。
其技术方案如下：
一方面，提供了一种双面曝光机，包括工作台，工作台设有曝光通孔；曝光机构，曝光机构包括第一曝光组件和第二曝光组件，第一曝光组件和第二曝光组件分别设于工作台的两侧、并在工作台形成曝光区，曝光区与曝光通孔对应设置；及装载机构，装载机构包括第一装载台和第二装载台，第一装载台和 第二装载台均能够沿工作台移动、并通过曝光区进行曝光。
上述双面曝光机，曝光时，第一装载台移动、并通过曝光区进行第一待曝光件的曝光，第二装载台装载第二待曝光件，第一待曝光件曝光完成后第一装载台回退，第二装载台移动、并通过曝光区进行第二待曝光件的曝光，进而利用第二装载台曝光的同时进行第一装载台上第一待装载件的卸载和装载，不仅便于实现自动化曝光，而且还提高了曝光效率，同时无需翻转，减少了曝光流程，提高了曝光精度。
下面进一步对技术方案进行说明：
在其中一个实施例中，装载机构还包括第一驱动器和第二驱动器，第一驱动器用于驱动第一装载台沿工作台移动，第二驱动器用于驱动第二装载台沿工作台移动。
在其中一个实施例中，装载机构还包括控制器、第一传感器和第二传感器，第一传感器用于检测第一装载台的移动位置，第二传感器用于检测第二装载台的移动位置，第一曝光组件、第二曝光组件、第一驱动器、第二驱动器、第一传感器和第二传感器均与控制器电性连接。
在其中一个实施例中，第一装载台设有用于装载第一待曝光件的第一装载部，第二装载台设有用于装载第二待曝光件的第二装载部。
在其中一个实施例中，第一装载台设有第一滑槽，工作台设有与第一滑槽配合移动的第一导轨；或第二装载台设有导向孔，工作台设有与导向孔配合的第二导轨。
在其中一个实施例中，第一曝光组件包括第一曝光件和第二曝光件，第一曝光件设有多个第一光源件，第一光源件呈间距设置、并设成一排，第二曝光件设有多个第二光源件，第二光源件呈间距设置、并设成一排，第一光源件与第二光源件并列设置、并呈错开设置、使一个第一光源件的设置位置与两个第二光源件之间的间隙所在位置对应。
在其中一个实施例中，第二曝光组件包括第三曝光件，第三曝光件设有多个第三光源件，第三光源件呈间距设置、并成排设置且并列设成两排，其中的一排第三光源件与其中的另一排第三光源件呈错开设置、使其中一排的一个第 三光源件的设置位置与其中另一排的两个第三光源件之间的间隙所在位置对应。
另一方面，还提供了一种双面曝光方法，能够应用于上述任一个技术方案所述的双面曝光机，包括以下步骤：
(S1)、第一装载台位于第一初始位置、并在第一装载台装载第一待曝光件；
(S2)、第二装载台位于第二初始位置、并在第二装载台装载第二待曝光件，第一初始位置和第二初始位置分别位于曝光机构的两侧；
(S3)、第一装载台沿工作台移动、并通过曝光区、到达第一预设位置，第一预设位置和第一初始位置分别位于曝光区的两侧；且同时曝光机构的第一曝光组件和第二曝光组件对第一待曝光件进行曝光、并完成对第一待曝光件的曝光、得到第一曝光成品；
(S4)、第一装载台沿工作台返回至第一初始位置、并卸载第一曝光成品；
(S5)、第二装载台沿工作台移动、并通过曝光区、到达第二预设位置，第二预设位置和第二初始位置分别位于曝光区的两侧；且同时第一曝光组件和第二曝光组件对第二待曝光件进行曝光、并完成对第二待曝光件的曝光、得到第二曝光成品；且同时在第一装载台装载下一个第一待曝光件；
(S6)、第二装载台沿工作台返回至第二初始位置、并卸载第二曝光成品；
(S7)、进入步骤(S3)；且同时在第二装载台装载下一个第二待曝光件。
上述双面曝光方法，通过步骤(S3)至步骤(S7)的操作流程，使第一待曝光件进行曝光时第二待曝光件进行装载，第二待曝光件装载时下一个第一待曝光件进行装载，从而充分利用曝光时的时间进行操作，提高了曝光效率。
下面进一步对技术方案进行说明：
在其中一个实施例中，步骤(S3)中，在第一装载台沿工作台移动、并通过曝光区、到达第一预设位置的步骤同时，还包括：第一传感器实时检测第一装载台的位置、并反馈给控制器，当第一装载台运动至第一预设位置时，控制器控制第一驱动器使第一装载台停止移动；否则，第一装载台继续沿工作台移动；
或步骤(S5)中，在第二装载台沿工作台移动、并通过曝光区、到达第二 预设位置的步骤同时，还包括：第二装载台移动、并触发第二传感器，第二传感器反馈触发信息给控制器，控制器控制第二驱动器使第二装载台停止移动。
在其中一个实施例中，步骤(S3)之前，还包括：控制器接收第一曝光信息和第二曝光信息、并基于第一曝光信息分别确定第一曝光组件中第一光源件的第一发光信息和第二光源件的第二发光信息、并基于第二曝光信息确定第二曝光组件中第三光源件的第三发光信息；步骤(S3)中，第一曝光组件和第二曝光组件对第一待曝光件进行曝光时基于第一发光信息、第二发光信息和第三发光信息对第一待曝光件进行曝光。
附图说明
图1为实施例中双面曝光方法的流程图；
图2为实施例中双面曝光机的主视图；
图3为实施例中双面曝光机的左视图；
图4为实施例中双面曝光机的俯视图。
附图标注说明：
100、工作台，110、固定支架，120、曝光区，210、第一曝光组件，211、第一曝光件，2111、第一光源件，212、第二曝光件，2121、第二光源件，220、第二曝光组件，2211、第三光源件，310、第一装载台，320、第二装载台。
具体实施方式
下面结合附图对本发明的实施例进行详细说明：
需要说明的是，文中所称元件与另一个元件“固定”时，它可以直接在另一个元件上或者也可以存在居中的元件。当一个元件被认为是与另一个元件“连接”时，它可以是直接连接到另一个元件或者可能同时存在居中元件。相反，当元件被称作“直接在”另一元件“上”时，不存在中间元件。本文所使用的术语“垂直的”、“水平的”、“左”、“右”以及类似的表述只是为了说明的目的，并不表示是唯一的实施方式。
除非另有定义，本文所使用的所有的技术和科学术语与属于本发明的技术 领域的技术人员通常理解的含义相同。本文中在本发明的说明书中所使用的术语只是为了描述具体的实施方式的目的，不是旨在于限制本发明。本文所使用的术语“及/或”包括一个或多个相关的所列项目的任意的和所有的组合。
如图2至图4所示的实施例，提供了一种双面曝光机，包括工作台100，工作台100设有曝光通孔；曝光机构，曝光机构包括第一曝光组件210和第二曝光组件220，第一曝光组件210和第二曝光组件220分别设于工作台100的两侧、并在工作台100形成曝光区120，曝光区120与曝光通孔对应设置；及装载机构，装载机构包括第一装载台310和第二装载台320，第一装载台310和第二装载台320均能够沿工作台100移动、并通过曝光区120进行曝光。
曝光时，第一装载台310移动、并通过曝光区120进行第一待曝光件的曝光，第二装载台320装载第二待曝光件，第一待曝光件曝光完成后第一装载台310回退，第二装载台320移动、并通过曝光区120进行第二待曝光件的曝光，进而利用第二装载台320曝光的同时进行第一装载台310上第一待曝光件的卸载和装载，不仅便于实现自动化曝光，而且还提高了曝光效率，同时无需翻转，减少了曝光流程，提高了曝光精度。
传统的激光直写曝光机只能单面曝光，不能同时双面曝光，在曝光完一面后还需要翻转，以进行另一面的曝光，由于需要翻转，不仅工艺流程多，且翻转占用时间浪费，曝光效率低，且翻转后还需要进行对位，容易因对位精度问题影响曝光精度；同时，传统双面曝光多采用菲林转印，菲林制作同样增加工艺流程，且菲林制作成本高，菲林使用一段时间后还必须更换。
本实施例中，第一曝光组件210和第二曝光组件220分别设在工作台100的两侧，工作台100设有用于使第二曝光组件220或第一曝光组件210发出的光通过的曝光通孔，第一曝光组件210和第二曝光组件220从而能够在工作台100的相应区域形成一个曝光区120，当第一装载台310上的第一待曝光件通过时，第一曝光组件210和第二曝光组件220同时对第一待曝光件的正反面进行曝光，从而实现同时曝光的效果；同时，由于第二装载台320也可以在工作台100上移动，从而能够利用第一装载台310上第一待曝光组件进行曝光及后续卸载装载的时候对第二装载台320上的第二待曝光件进行装载卸载及曝光，从而 达到对时间的充分利用，提高曝光效率，由于无需翻转，进而避免了重新对位，从而提高了曝光精度，另外，一次曝光完成，相比传统正反转且多次拼接曝光的方式，曝光效率和曝光精度均大大提高。
需要说明的是：
第一装载台310和第二装载台320的中部均设有装载通孔，以使第一待曝光件或第二待曝光件通过曝光区120时能够顺利使第一曝光组件210和第二曝光组件220的光照射至第一待曝光件或第二待曝光件、从而进行曝光；
曝光通孔与曝光区120对应设置指能够使第一曝光组件210或第二曝光组件220发出的光通过曝光通孔，以到达曝光区120，从而在第一待曝光件或第二待曝光件通过时照射在上面进行曝光，本领域技术人员可根据曝光需要进行具体设置，这里不再赘述；
第一曝光组件210和第二曝光组件220对应设置，两者之间呈间距设置，第一曝光组件210的曝光方向与第二曝光组件220的曝光方向相对、从而在工作台100形成曝光区120，本领域技术人员可根据需要进行具体设置，以满足双面曝光的需要，这里不再赘述。
进一步地，第一曝光组件210和第二曝光组件220均呈固定设置。固定设置的第一曝光组件210和第二曝光组件220无法移动，在安装时设置好第一曝光组件210和第二曝光组件220之间的相互对应关系，从而在后续第一装载台310移动对第一待曝光件进行曝光时，第一曝光组件210和第二曝光组件220同时对第一待曝光件的正反面进行曝光，且曝光内容相互对应，相比需要翻转曝光的情况，不仅曝光精度更高，而且曝光效率也更高。
如图2所示的实施例，还包括固定设置的固定支架110，固定支架110设有两个，第一曝光组件210和第二曝光组件220分别设在对应的固定支架110上，从而实现位置固定的目的。
更进一步地，固定支架110为大理石横梁。
如图2所示，第一曝光组件210固定在上部，第二曝光组件220固定在下部，工作台100的台面在第一曝光组件210和第二曝光组件220之间，第一装载台310和第二装载台320均可以沿工作台100进行左右移动，从而在通过第 一曝光组件210和第二曝光组件220之间的曝光区120时，对其上的第一待曝光件或第二待曝光件进行曝光，实现同时进行正反面曝光且无需翻转的技术效果。
在上述任一个技术方案的基础上，装载机构还包括第一驱动器和第二驱动器，第一驱动器用于驱动第一装载台310沿工作台100移动，第二驱动器用于驱动第二装载台320沿工作台100移动。
在上述任一个技术方案的基础上，装载机构还包括控制器、第一传感器和第二传感器，第一传感器用于检测第一装载台310的移动位置，第二传感器用于检测第二装载台320的移动位置，第一曝光组件210、第二曝光组件220、第一驱动器、第二驱动器、第一传感器和第二传感器均与控制器电性连接。
控制器的设置用于精确控制第一装载台310、第二装载台320和第一曝光组件210及第二曝光组件220之间的协调配合精度；同时，第一传感器和第二传感器的设置提高了第一装载台310和第二装载台320的移动精度，以提高曝光图形的精度。
在上述任一个技术方案的基础上，第一装载台310设有用于装载第一待曝光件的第一装载部，第二装载台320设有用于装载第二待曝光件的第二装载部。
第一装载部和第二装载部分别用于安装第一待曝光件和第二待曝光件，时第一待曝光件和第二待曝光件的位置稳固，避免移动或曝光过程中发生偏移或倾斜，从而影响曝光效率，提高曝光精度。
在上述任一个技术方案的基础上，第一装载台310设有第一滑槽，工作台100设有与第一滑槽配合移动的第一导轨；或第二装载台320设有导向孔，工作台100设有与导向孔配合的第二导轨。
第一滑槽和第一导轨的设置是一种实施方式，第一滑槽和第一导轨提高了第一装载台310的移动精度，从而避免第一待曝光件在运动或曝光过程中发生偏移或倾斜，从而提高曝光精度；导向孔和第二导轨的设置是另一种实施方式，起到的作用同样是为了提高第二装载台320的移动精度，从而提高曝光精度。本领域技术人员可根据需要选用保证第一装载台310或第二装载台320平稳移动的设置方式，第一装载台310和第二装载台320的平稳移动设置结构可相同 结构也可不同结构，这里不再赘述。
在上述任一个技术方案的基础上，第一曝光组件210包括第一曝光件211和第二曝光件212，第一曝光件211设有多个第一光源件2111，第一光源件2111呈间距设置、并设成一排，第二曝光件212设有多个第二光源件2121，第二光源件2121呈间距设置、并设成一排，第一光源件2111与第二光源件2121并列设置、并呈错开设置、使一个第一光源件2111的设置位置与两个第二光源件2121之间的间隙所在位置对应。
如图4所示，第一曝光组件210包括第一曝光件211和第二曝光件212，第一曝光件211和第二曝光件212呈左右并列设置，第一曝光件211上设有六个第一光源件2111、并设成一排，第二曝光件212上设有六个第二光源件2121、并设成一排，第一曝光件211和第二曝光件212呈错开设置即第一曝光件211的设置高度高于第二曝光件212的设置高度，从而使第一曝光件211上的第一光源件2111分别与第二曝光件212上相邻两个第二光源件2121之间的设置位置对应，在曝光时，第一曝光件211上的第一光源件2111曝光部分与第二光源件2121之间的曝光部分拼接共同形成曝光图形。
如图2所示，上部的固定支架110设有两个，左侧的固定支架110用于固定第一曝光件211，右侧的固定支架110用于固定第二曝光件212。
在上述任一个技术方案的基础上，第二曝光组件220包括第三曝光件，第三曝光件设有多个第三光源件2211，第三光源件2211呈间距设置、并成排设置且并列设成两排，其中的一排第三光源件2211与其中的另一排第三光源件2211呈错开设置、使其中一排的一个第三光源件2211的设置位置与其中另一排的两个第三光源件2211之间的间隙所在位置对应。
这里给出了另一种曝光件的实施方式：第二曝光组件220采用一个第三曝光件的形式，第三曝光件上设有两排第三光源件2211，每排设有六个第三光源件2211，两排第三光源件2211呈错开设置，使其中一排第三光源件2211分别与另一排的相邻两个第三光源件2211之间的位置对应，同样实现对曝光图形进行拼接曝光的效果，且结构更为简单，成本低廉。
如图1所示的实施例，还提供了一种双面曝光方法，能够应用于上述任一 个实施例所述的双面曝光机，包括以下步骤：
(S1)、第一装载台310位于第一初始位置、并在第一装载台310装载第一待曝光件；
(S2)、第二装载台320位于第二初始位置、并在第二装载台320装载第二待曝光件，第一初始位置和第二初始位置分别位于曝光机构的两侧；
(S3)、第一装载台310沿工作台100移动、并通过曝光区120、到达第一预设位置，第一预设位置和第一初始位置分别位于曝光区120的两侧；且同时曝光机构的第一曝光组件210和第二曝光组件220对第一待曝光件进行曝光、并完成对第一待曝光件的曝光、得到第一曝光成品；
(S4)、第一装载台310沿工作台100返回至第一初始位置、并卸载第一曝光成品；
(S5)、第二装载台320沿工作台100移动、并通过曝光区120、到达第二预设位置，第二预设位置和第二初始位置分别位于曝光区120的两侧；且同时第一曝光组件210和第二曝光组件220对第二待曝光件进行曝光、并完成对第二待曝光件的曝光、得到第二曝光成品；且同时在第一装载台310装载下一个第一待曝光件；
(S6)、第二装载台320沿工作台100返回至第二初始位置、并卸载第二曝光成品；
(S7)、进入步骤(S3)；且同时在第二装载台320装载下一个第二待曝光件。
通过步骤(S3)至步骤(S7)的操作流程，使第一待曝光件进行曝光时第二待曝光件进行装载，第二待曝光件装载时下一个第一待曝光件进行装载，从而充分利用曝光时的时间进行操作，提高了曝光效率。
如图1所示，步骤(S7)之后，进入步骤(S4)，实现后续循环操作的目的，在相同时间内能够对更多的待曝光件进行双面曝光，且曝光精度更高。
进一步地，步骤(S4)中，第一装载台310返回时，返回速度高于进行第一待曝光件曝光时的速度，以尽快返回至第一初始位置，并开始进入第二待曝光件曝光的过程，从而实现曝光效率更高的技术效果；第二装载台320返回时 同理，这里不再赘述。
需要说明的是，前述的步骤(S1)至步骤(S7)根据需要可适当调整操作顺序，如第一装载台310返回至第一初始位置后进行第一曝光成品的卸载，之后再进行第二待曝光件的曝光，实际上，也可以在第一装载台310返回至第一初始位置后随即开始第二待曝光件的曝光，而在曝光过程中进行第一曝光成品的卸载和下一个第一待曝光件的装载，第二装载台320的卸载和装载同理，这里不再赘述。
进一步地，步骤(S3)中，在第一装载台310沿工作台100移动、并通过曝光区120、到达第一预设位置的步骤同时，还包括：第一传感器实时检测第一装载台310的位置、并反馈给控制器，当第一装载台310运动至第一预设位置时，控制器控制第一驱动器使第一装载台310停止移动；否则，第一装载台310继续沿工作台100移动；
或步骤(S5)中，在第二装载台320沿工作台100移动、并通过曝光区120、到达第二预设位置的步骤同时，还包括：第二装载台320移动、并触发第二传感器，第二传感器反馈触发信息给控制器，控制器控制第二驱动器使第二装载台320停止移动。
进一步地，步骤(S3)之前，还包括：控制器接收第一曝光信息和第二曝光信息、并基于第一曝光信息分别确定第一曝光组件210中第一光源件2111的第一发光信息和第二光源件2121的第二发光信息、并基于第二曝光信息确定第二曝光组件220中第三光源件2211的第三发光信息；步骤(S3)中，第一曝光组件210和第二曝光组件220对第一待曝光件进行曝光时基于第一发光信息、第二发光信息和第三发光信息对第一待曝光件进行曝光。
本实施例中，可选地，第一曝光组件210和第二曝光组件220形成无掩模曝光系统(Digital Micromirror Device，简称DMD曝光系统)，无掩模曝光系统通过投影物镜将图像放大，实现一次性曝光，DMD曝光系统的第一光源件2111和第二光源件2121或第三光源件2211的排布数量根据曝光图案的尺寸决定，曝光精度更高。
以上所述实施例的各技术特征可以进行任意的组合，为使描述简洁，未对 上述实施例中的各个技术特征所有可能的组合都进行描述，然而，只要这些技术特征的组合不存在矛盾，都应当认为是本说明书记载的范围。
以上所述实施例仅表达了本发明的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对发明专利范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本发明构思的前提下，还可以做出若干变形和改进，这些都属于本发明的保护范围。因此，本发明专利的保护范围应以所附权利要求为准。

Claims (10)

  1. 一种双面曝光机，其特征在于，包括：
    工作台，所述工作台设有曝光通孔；
    曝光机构，所述曝光机构包括第一曝光组件和第二曝光组件，所述第一曝光组件和所述第二曝光组件分别设于所述工作台的两侧、并在所述工作台形成曝光区，所述曝光区与所述曝光通孔对应设置；及
    装载机构，所述装载机构包括第一装载台和第二装载台，所述第一装载台和所述第二装载台均能够沿所述工作台移动、并通过所述曝光区进行曝光。
  2. 根据权利要求1所述的双面曝光机，其特征在于，所述装载机构还包括第一驱动器和第二驱动器，所述第一驱动器用于驱动所述第一装载台沿所述工作台移动，所述第二驱动器用于驱动所述第二装载台沿所述工作台移动。
  3. 根据权利要求2所述的双面曝光机，其特征在于，所述装载机构还包括控制器、第一传感器和第二传感器，所述第一传感器用于检测所述第一装载台的移动位置，所述第二传感器用于检测所述第二装载台的移动位置，所述第一曝光组件、所述第二曝光组件、所述第一驱动器、所述第二驱动器、所述第一传感器和所述第二传感器均与所述控制器电性连接。
  4. 根据权利要求1所述的双面曝光机，其特征在于，所述第一装载台设有用于装载第一待曝光件的第一装载部，所述第二装载台设有用于装载第二待曝光件的第二装载部。
  5. 根据权利要求1所述的双面曝光机，其特征在于，所述第一装载台设有第一滑槽，所述工作台设有与所述第一滑槽配合移动的第一导轨；
    或所述第二装载台设有导向孔，所述工作台设有与所述导向孔配合的第二导轨。
  6. 根据权利要求1-5任一项所述的双面曝光机，其特征在于，所述第一曝光组件包括第一曝光件和第二曝光件，所述第一曝光件设有多个第一光源件，所述第一光源件呈间距设置、并设成一排，所述第二曝光件设有多个第二光源件，所述第二光源件呈间距设置、并设成一排，所述第一光源件与所述第二光 源件并列设置、并呈错开设置、使一个所述第一光源件的设置位置与两个所述第二光源件之间的间隙所在位置对应。
  7. 根据权利要求1-5任一项所述的双面曝光机，其特征在于，所述第二曝光组件包括第三曝光件，所述第三曝光件设有多个第三光源件，所述第三光源件呈间距设置、并成排设置且并列设成两排，其中的一排所述第三光源件与其中的另一排所述第三光源件呈错开设置、使其中一排的一个所述第三光源件设置位置与其中另一排的两个所述第三光源件之间的间隙所在位置对应。
  8. 一种双面曝光方法，能够应用于如权利要求1-7任一项所述的双面曝光机，其特征在于，包括以下步骤：
    (S1)、第一装载台位于第一初始位置、并在所述第一装载台装载第一待曝光件；
    (S2)、第二装载台位于第二初始位置、并在所述第二装载台装载第二待曝光件，所述第一初始位置和所述第二初始位置分别位于曝光机构的两侧；
    (S3)、所述第一装载台沿工作台移动、并通过所述曝光区、到达第一预设位置，所述第一预设位置和所述第一初始位置分别位于所述曝光区的两侧；且同时所述曝光机构的所述第一曝光组件和所述第二曝光组件对所述第一待曝光件进行曝光、并完成对所述第一待曝光件的曝光、得到第一曝光成品；
    (S4)、所述第一装载台沿所述工作台返回至所述第一初始位置、并卸载所述第一曝光成品；
    (S5)、所述第二装载台沿所述工作台移动、并通过所述曝光区、到达第二预设位置，所述第二预设位置和所述第二初始位置分别位于所述曝光区的两侧；且同时所述第一曝光组件和所述第二曝光组件对所述第二待曝光件进行曝光、并完成对所述第二待曝光件的曝光、得到第二曝光成品；且同时在所述第一装载台装载下一个第一待曝光件；
    (S6)、所述第二装载台沿所述工作台返回至所述第二初始位置、并卸载所述第二曝光成品；
    (S7)、进入所述步骤(S3)；且同时在所述第二装载台装载下一个第二待曝光件。
  9. 根据权利要求8所述的双面曝光方法，其特征在于，所述步骤(S3)中，在所述第一装载台沿所述工作台移动、并通过所述曝光区、到达所述第一预设位置的步骤同时，还包括：第一传感器实时检测所述第一装载台的位置、并反馈给控制器，当所述第一装载台运动至所述第一预设位置时，所述控制器控制第一驱动器使所述第一装载台停止移动；否则，所述第一装载台继续沿所述工作台移动；
    或所述步骤(S5)中，在所述第二装载台沿所述工作台移动、并通过所述曝光区、到达所述第二预设位置的步骤同时，还包括：所述第二装载台移动、并触发所述第二传感器，所述第二传感器反馈触发信息给所述控制器，所述控制器控制第二驱动器使所述第二装载台停止移动。
  10. 根据权利要求8或9所述的双面曝光方法，其特征在于，所述步骤(S3)之前，还包括：所述控制器接收第一曝光信息和第二曝光信息、并基于所述第一曝光信息分别确定所述第一曝光组件中第一光源件的第一发光信息和第二光源件的第二发光信息、并基于所述第二曝光信息确定所述第二曝光组件中第三光源件的第三发光信息；所述步骤(S3)中，所述第一曝光组件和所述第二曝光组件对所述第一待曝光件进行曝光时基于所述第一发光信息、所述第二发光信息和所述第三发光信息对所述第一待曝光件进行曝光。
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