WO2019047461A1 - 液晶面板及其制作方法 - Google Patents

液晶面板及其制作方法 Download PDF

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Publication number
WO2019047461A1
WO2019047461A1 PCT/CN2018/072016 CN2018072016W WO2019047461A1 WO 2019047461 A1 WO2019047461 A1 WO 2019047461A1 CN 2018072016 W CN2018072016 W CN 2018072016W WO 2019047461 A1 WO2019047461 A1 WO 2019047461A1
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WIPO (PCT)
Prior art keywords
light shielding
liquid crystal
crystal panel
shielding layer
array substrate
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PCT/CN2018/072016
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English (en)
French (fr)
Inventor
邵源
唐敏
陈孝贤
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Priority to US15/749,488 priority Critical patent/US20200133082A1/en
Publication of WO2019047461A1 publication Critical patent/WO2019047461A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133357—Planarisation layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13356—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements
    • G02F1/133562—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements on the viewer side
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device

Definitions

  • the present invention relates to the field of liquid crystal display technology, and in particular, to a liquid crystal panel and a method of fabricating the same.
  • the display panel of the conventional display includes an outer CF (Color Filter) substrate and an inner TFT (Thin Film Transistor) substrate, and the CF substrate side is the light emitting side of the display panel due to ambient light.
  • the array substrate of the conventional display will reflect the ambient light due to the presence of the metal signal line thereon, which is prone to the effect of the mirror surface, which will affect the display contrast and affect the final display effect.
  • the present invention provides a liquid crystal panel and a manufacturing method thereof, which can reduce external light reflection and improve display contrast of the liquid crystal panel.
  • a liquid crystal panel comprising an array substrate, a color filter substrate, a liquid crystal filled between the array substrate and the color filter substrate, and a light shielding layer, wherein the side of the array substrate is a light exiting side, and an inner surface of the array substrate A metal electrode line is disposed, the light shielding layer is disposed on an outer surface of the array substrate, and a projection of the pattern of the light shielding layer on the array substrate at least partially covers the metal electrode line.
  • the light shielding layer is a black ink layer.
  • the light shielding layer is formed on the array substrate by a yellow light process.
  • the projection of the pattern of the light shielding layer on the array substrate completely covers the metal electrode line.
  • the light shielding layer is a black matrix, and a projection of the light shielding layer on the array substrate surrounds an edge of each pixel.
  • the line width of the light shielding layer is larger than the line width of the metal electrode line that is opposite thereto.
  • the liquid crystal panel further includes a transparent planarization layer disposed on an outer surface of the array substrate and filled in a hollow region of the light shielding layer.
  • the liquid crystal panel further includes an upper polarizer, and the upper polarizer is attached to an outer surface of the planarization layer.
  • Another object of the present invention is to provide a method for fabricating a liquid crystal panel, comprising:
  • the array substrate is formed with the TFT device facing inward, and is processed by a color filter substrate having no black matrix to form a liquid crystal panel.
  • the forming of the light shielding layer further comprising: forming a transparent planarization layer on the substrate to fill the hollow region of the light shielding layer, and in the planarization layer A polarizer is attached to the surface.
  • the side of the array substrate is used as the light exiting side
  • the side of the color filter substrate is used as the light incident surface
  • the outer surface of the array substrate is provided with a light shielding layer corresponding to the metal electrode line on the inner surface thereof, and the light shielding layer is absorbed toward the inner side of the array substrate.
  • the ambient light incident on the metal electrode line reduces the reflection on the metal electrode line, improves the display contrast of the liquid crystal panel, and improves the display quality.
  • FIG. 1 is a schematic top plan view of a liquid crystal panel according to an embodiment of the present invention.
  • FIG. 2 is a schematic view showing the internal structure of a liquid crystal panel according to an embodiment of the present invention.
  • FIG. 3 is a flow chart showing a manufacturing process of a liquid crystal panel according to an embodiment of the present invention.
  • FIG. 4 is a block diagram of a method of fabricating a liquid crystal panel according to an embodiment of the present invention.
  • a liquid crystal panel according to an embodiment of the present invention includes an array substrate 11 , a color filter substrate 12 , a liquid crystal 13 filled between the array substrate 11 and the color filter substrate 12 , and a light shielding layer 14 , and the side of the array substrate 11 is a light exiting side.
  • the inner surface of the array substrate 11 is provided with metal electrode lines 15, and the light shielding layer 14 is disposed on the outer surface of the array substrate 11, and the projection of the pattern of the light shielding layer 14 on the array substrate 11 at least partially covers the metal electrode lines 15, and at the same time, the color film A black matrix layer is no longer disposed inside the substrate 12.
  • the viewer can view the display screen on the side of the array substrate 11.
  • the ambient light of the outside can also be incident from the array substrate 11 toward the color filter substrate 12 side.
  • the projection of the pattern of the light shielding layer 14 on the array substrate 11 at least partially covers the metal electrode line 15, the ambient light is incident. Absorbed by the light shielding layer 14, the metal electrode lines 15 on the array substrate 11, such as the Gate line (scanning line), the Data line (data line), etc., are weakened by the reflection effect on the ambient light, and the mirror effect is less likely to occur, and to some extent Eliminate the effects of ambient light on display contrast.
  • the projection of the pattern of the light shielding layer 14 on the array substrate 11 completely covers the metal electrode line 15, and the ambient light can be prevented from being incident on the metal electrode line 15 to the utmost extent.
  • the gate line in the array substrate 11 is a metal electrode line, and the other electrode lines are transparent electrodes.
  • the light shielding layer 14 includes a plurality of mutually parallel light shielding stripes, and the width of each stripe is not less than the width of the gate line.
  • the metal electrode line 15 may include, but is not limited to, a data line, a gate line, a touch electrode line (such as a touch driving electrode Tx, a touch sensing electrode Rx), and the like, and the pattern of the light shielding layer 14 is different according to the actual wiring of the metal line. And different.
  • the light shielding layer 14 includes grid-like staggered light shielding stripes, and the light shielding layer 14 serves as a black matrix on the array substrate.
  • the projection on 11 encloses the edge of each pixel.
  • the metal electrode line 15 further includes a touch electrode
  • the light shielding layer 14 further includes a portion for blocking the touch electrode line.
  • the light shielding layer 14 is a black ink layer
  • the array substrate 11 is a flexible substrate
  • the light shielding layer 14 is formed on the array substrate 11 by a yellow light process.
  • the line width of the light shielding layer 14 is larger than the line width of the metal electrode lines 15 facing it.
  • the light shielding layer 14 may be made of a material that absorbs ambient light such as indium tin oxide or a black resin material.
  • the thickness of the light shielding layer 14 is 1 to 3 ⁇ m, and the line width of the light shielding layer 14 is 15 to 25 ⁇ m.
  • the outer surface of the liquid crystal panel further has a transparent planarization layer 16 and an upper polarizer 17 disposed on the outer surface of the array substrate 11 and filled in the hollow region of the light shielding layer 14, the planarization layer 16 It can be a transparent photoresist and has a good flattening effect.
  • the planarization layer 16 is flush with the outer surface of the light shielding layer 14, so that the surface of the light shielding layer 14 is flattened, and the polarizing film 17 can be attached, and the upper polarizing film 17 is simultaneously attached to the outer surface of the light shielding layer 14 and the planarization layer 16.
  • the planarization layer 16 may be covered on the surface of the light shielding layer 14 in addition to being filled in the hollow region of the light shielding layer 14 to protect the light shielding layer 14 .
  • the bonding area (binding area) for setting the driving chip extending toward the inner side of the array substrate 11 is inwardly viewed, and the viewer cannot see from the appearance, and the frame is no longer required to be specially set.
  • the occlusion is to maintain the appearance, which is advantageous for the liquid crystal panel to better achieve a narrow frame.
  • the light shielding layer 14 is located on the outer surface of the array substrate 11, and the light shielding layer 14 can replace the function of the black matrix layer.
  • the black matrix layer is no longer needed on the inner side of the color filter substrate 12.
  • the liquid crystal panel can be made thinner, and the amount of liquid crystal can also be used. Reduce accordingly.
  • the manufacturing method of the liquid crystal panel of the present invention mainly has the following steps:
  • the shading material is patterned to form a light shielding layer 14;
  • the metal electrode line 15 and the TFT device are fabricated on the other side of the substrate, and the array process is continued to form the array substrate 11;
  • the side of the array substrate 11 on which the TFT device is formed faces inward, and the color filter substrate 12 having no black matrix is subjected to a process to form a liquid crystal panel.
  • the projection of the pattern of the light shielding layer on the substrate at least partially covers the metal electrode line 15, and preferably the pattern of the light shielding layer faces and completely covers the metal electrode line, that is, the pattern of the light shielding layer 14 is The projection on the array substrate 11 completely covers the metal electrode lines 15.
  • the substrate in the step S1 may be a glass substrate or various flexible substrates. Before the step of manufacturing the metal electrode lines or coating the light-shielding material on the substrate, it is generally necessary to clean and dry the substrate to prevent adsorption of impurities such as dust.
  • the thickness of the light shielding material is 1 to 3 ⁇ m, and the line width of the light shielding layer 14 is 15 to 25 ⁇ m.
  • a photoresist is formed on the surface of the light-shielding material by a yellow light process, and then exposed, developed, and etched by using a mask having a pattern matching with the metal electrode line 15. After the steps, a light shielding layer 14 of a predetermined pattern is formed on the surface of the substrate.
  • the method further includes the steps of: forming a transparent planarization layer 16 on the substrate, filling the hollow region of the light shielding layer 14 , and attaching the polarizer 17 to the surface of the planarization layer 16 . Generally, it is performed after the completion of step S3.
  • the side of the array substrate is used as the light exiting side
  • the side of the color filter substrate is used as the light incident surface
  • the outer surface of the array substrate is provided with a light shielding layer corresponding to the metal electrode line on the inner surface thereof, and the light shielding layer is absorbed toward the inner side of the array substrate.
  • the ambient light incident on the metal electrode line reduces the reflection on the metal electrode line, improves the display contrast of the liquid crystal panel, and improves the display quality.
  • the light shielding layer is located on the outer surface of the array substrate, and the light shielding layer can replace the function of the black matrix layer.
  • the black matrix layer is no longer needed inside the color filter substrate, the liquid crystal panel can be made thinner, and the amount of liquid crystal can be correspondingly reduced.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一种液晶面板及其制作方法。液晶面板包括阵列基板(11)、彩膜基板(12)、填充于阵列基板(11)与彩膜基板(12)之间的液晶(13)以及遮光层(14)，阵列基板(11)所在侧为出光侧，阵列基板(11)的内表面设有金属电极线(15)，遮光层(14)设于阵列基板(11)的外表面，且遮光层(14)的图案在阵列基板(11)上的投影至少部分覆盖金属电极线(15)。通过将阵列基板(11)所在侧作为出光侧，彩膜基板(12)所在侧作为入光面，并在阵列基板(11)外表面设置有与其内表面的金属电极线(15)对应的遮光层(14)，利用遮光层(14)吸收朝阵列基板(11)内侧的金属电极线(15)射入的外界环境光，减少了金属电极线(15)上的反射，提高了液晶面板的显示对比度，提升了显示品质。

Description

液晶面板及其制作方法 技术领域
本发明涉及液晶显示技术领域，尤其涉及一种液晶面板及其制作方法。
背景技术
随着近年来显示器需求量的不断提高，一些新技术应运而生，而显示面板的亮度和对比度仍然是制约显示器整体显示质量的一个重要因素。当对比度较佳时，显示面板的整体色彩与显示效果都较为理想，如何提高显示面板的对比度已经成为当前研究的重点。而在提高对比度的方式上，除了提高发光单元的亮度外，如何降低外界光的反射也成为一个重要方面。
传统显示器的显示面板包括外侧的CF(Color Filter，即彩色滤光片)基板和内侧的TFT(Thin Film Transistor，即薄膜晶体管)基板，CF基板侧为显示面板的出光侧，由于外界环境光的进入，传统显示器的阵列基板会因为其上的金属信号线的存在而反射外界环境光，容易出现镜面的效果，从而会对显示对比度产生影响，影响最终的显示效果。
发明内容
鉴于现有技术存在的不足，本发明提供了一种液晶面板及其制作方法，可以降低外界光反射，提高液晶面板的显示对比度。
为了实现上述的目的，本发明采用了如下的技术方案：
一种液晶面板，包括阵列基板、彩膜基板、填充于所述阵列基板与所述彩膜基板之间的液晶以及遮光层，所述阵列基板所在侧为出光侧，所述阵列基板的内表面设有金属电极线，所述遮光层设于所述阵列基板的外表面，且所述遮光层的图案在所述阵列基板上的投影至少部分覆盖所述金属电极线。
作为其中一种实施方式，所述遮光层为黑色油墨层。
作为其中一种实施方式，所述遮光层通过黄光制程制作在所述阵列基板上。
作为其中一种实施方式，所述遮光层的图案在所述阵列基板上的投影完全 覆盖所述金属电极线。
作为其中一种实施方式，所述遮光层为黑色矩阵，所述遮光层在所述阵列基板上的投影包围每个像素的边缘。
作为其中一种实施方式，所述遮光层的线宽大于其正对的所述金属电极线的线宽。
作为其中一种实施方式，所述的液晶面板还包括透明的平坦化层，所述平坦化层设于所述阵列基板的外表面，并填充于所述遮光层的镂空区域内。
作为其中一种实施方式，所述的液晶面板还包括上偏光片，所述上偏光片贴合在所述平坦化层的外表面。
本发明的另一目的在于提供一种液晶面板的制作方法，包括：
提供一基板；
在所述基板的一面整面涂布遮光材料；
对所述遮光材料图形化处理，形成遮光层，其中，所述遮光层的图案在所述基板上的投影完全覆盖金属电极线；
在所述基板的另一面制作金属电极线和TFT器件，形成阵列基板；
将所述阵列基板制作有所述TFT器件的一面朝内，与无黑色矩阵的彩膜基板对盒处理，形成液晶面板。
作为其中一种实施方式，在所述遮光层形成后，还包括：在所述基板上制作透明的平坦化层，使其填充于所述遮光层的镂空区域内，并在所述平坦化层表面贴附上偏光片。
本发明通过将阵列基板所在侧作为出光侧，彩膜基板所在侧作为入光面，并在阵列基板外表面设置有与其内表面的金属电极线对应的遮光层，利用遮光层吸收朝阵列基板内侧的金属电极线射入的外界环境光，减少了金属电极线上的反射，提高了液晶面板的显示对比度，提升了显示品质。
附图说明
图1为本发明实施例的液晶面板的俯视结构示意图；
图2为本发明实施例的液晶面板的内部结构示意图；
图3为本发明实施例的液晶面板的制作工艺流程图；
图4为本发明实施例的液晶面板的制作方法框图。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白，以下结合附图及实施例，对本发明进一步详细说明。应当理解，此处所描述的具体实施例仅仅用以解释本发明，并不用于限定本发明。
参阅图1，本发明实施例的液晶面板包括阵列基板11、彩膜基板12、填充于阵列基板11与彩膜基板12之间的液晶13以及遮光层14，阵列基板11所在侧为出光侧，阵列基板11的内表面设有金属电极线15，遮光层14设于阵列基板11的外表面，且遮光层14的图案在阵列基板11上的投影至少部分覆盖金属电极线15，同时，彩膜基板12内侧不再设置黑色矩阵层。
由于将阵列基板11所在侧作为出光侧，背光源从彩膜基板12侧射入，观看者可以在阵列基板11侧观看到显示画面。同时，外界的环境光也可以自阵列基板11朝彩膜基板12侧射入，由于遮光层14的图案在阵列基板11上的投影至少部分覆盖金属电极线15，环境光在射入时，一部分被遮光层14吸收，阵列基板11上的金属电极线15，如Gate线(扫描线)、Data线(数据线)等对环境光的反射效果被弱化，不易出现镜面效果，可以在一定程度上消除环境光对显示对比度的影响。这里，遮光层14的图案在阵列基板11上的投影完全覆盖金属电极线15，可以最大限度地避免环境光射入到金属电极线15上。
如图1所示，阵列基板11内仅仅gate线为金属电极线，其他电极线为透明电极，遮光层14包括多条互相平行的遮光条纹，每条条纹的宽度不小于gate线的宽度。这里，金属电极线15可以包括但不限于data线、gate线、触控电极线(如触控驱动电极Tx、触控感应电极Rx)等，遮光层14的图案根据实际的金属线的布线不同而不同。例如，当data线、gate线均为金属电极线时，为遮挡相互垂直的data线、gate线，遮光层14包括网格状的交错设置的遮光条纹，遮光层14作为黑色矩阵，在阵列基板11上的投影包围每个像素的边缘。又例如，在液晶面板为Incell面板时，金属电极线15还包括触控电极，遮光层14还包括用于遮挡触控电极线的部分。
这里，遮光层14为黑色油墨层，阵列基板11为柔性基板，遮光层14通过黄光制程制作在阵列基板11上。遮光层14的线宽大于其正对的金属电极线15 的线宽。遮光层14也可以是铟锡氧化物、黑色树脂材料等吸收环境光的材料制成。其中，遮光层14的厚度为1～3um，遮光层14的线条宽度为15～25um。
液晶面板的外表面还具有一层透明的平坦化层16和上偏光片17，该平坦化层16设于阵列基板11的外表面，并填充于遮光层14的镂空区域内，平坦化层16可以是透明光刻胶，具有较好的平坦化效果。平坦化层16与遮光层14外面平齐，使得遮光层14的表面为平坦化，可用于贴附上偏光片17，上偏光片17同时贴合在遮光层14与平坦化层16的外表面。另外，平坦化层16除了填充于遮光层14的镂空区域内，还可以覆盖在遮光层14表面，对遮光层14进行保护。
由于将阵列基板11所在侧作为出光侧，阵列基板11一侧延伸出的用于设置驱动芯片的bonding区(绑定区)朝内侧，观看者从外观无法看出，不再需要特意设置边框来遮挡以保持美观性，有利于液晶面板更好地实现窄边框化。另外，遮光层14位于阵列基板11的外表面，遮光层14可以代替黑色矩阵层的作用，彩膜基板12内侧不再需要设置黑色矩阵层，液晶面板可以做得更薄，液晶的用量也可以相应地减少。
结合图3和图4所示，本发明的液晶面板的制作方法主要有如下步骤：
S1、提供一基板；
S2、在基板的一面整面涂布遮光材料；
S3、对遮光材料图形化处理，形成遮光层14；
S4、在基板上的另一面制作金属电极线15和TFT器件等，继续array制程，形成阵列基板11；
S5、将阵列基板11制作有TFT器件的一面朝内，与无黑色矩阵的彩膜基板12对盒处理，形成液晶面板。
需要特别注意的是，制作完成后，遮光层的图案在基板上的投影至少部分覆盖金属电极线15，最好是遮光层的图案正对并完全覆盖金属电极线，即遮光层14的图案在阵列基板11上的投影完全覆盖金属电极线15。
步骤S1中的基板可以是玻璃基板或各种柔性基板，在基板上进行金属电极线制作或者涂布遮光材料步骤前，一般还需要对基板进行清洗并烘干，防止粉尘等杂质吸附。步骤S2中，遮光材料的厚度为1～3um，遮光层14的线条宽度为15～25um。在步骤S3中，对遮光材料图形化处理时，采用黄光制程，在遮光 材料表面形成一层光刻胶，然后利用具有与金属电极线15的图案匹配的掩膜版进行曝光、显影、蚀刻等步骤后，在基板表面形成预定图案的遮光层14。
在遮光层形成后，还包括如下步骤：在基板上制作透明的平坦化层16，使其填充于遮光层14的镂空区域内，并在平坦化层16表面贴附上偏光片17，该步骤一般在步骤S3完成后即进行。
本发明通过将阵列基板所在侧作为出光侧，彩膜基板所在侧作为入光面，并在阵列基板外表面设置有与其内表面的金属电极线对应的遮光层，利用遮光层吸收朝阵列基板内侧的金属电极线射入的外界环境光，减少了金属电极线上的反射，提高了液晶面板的显示对比度，提升了显示品质。另外，遮光层位于阵列基板的外表面，遮光层可以代替黑色矩阵层的作用，彩膜基板内侧不再需要设置黑色矩阵层，液晶面板可以做得更薄，液晶的用量也可以相应地减少。
以上所述仅是本申请的具体实施方式，应当指出，对于本技术领域的普通技术人员来说，在不脱离本申请原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本申请的保护范围。

Claims (19)

  1. 一种液晶面板，其中，包括阵列基板、彩膜基板、填充于所述阵列基板与所述彩膜基板之间的液晶以及遮光层，所述阵列基板所在侧为出光侧，所述阵列基板的内表面设有金属电极线，所述遮光层设于所述阵列基板的外表面，且所述遮光层的图案在所述阵列基板上的投影至少部分覆盖所述金属电极线。
  2. 根据权利要求1所述的液晶面板，其中，所述遮光层为黑色油墨层。
  3. 根据权利要求2所述的液晶面板，其中，所述遮光层通过黄光制程制作在所述阵列基板上。
  4. 根据权利要求1所述的液晶面板，其中，所述遮光层的图案在所述阵列基板上的投影完全覆盖所述金属电极线。
  5. 根据权利要求1所述的液晶面板，其中，所述遮光层为黑色矩阵，所述遮光层在所述阵列基板上的投影包围每个像素的边缘。
  6. 根据权利要求4所述的液晶面板，其中，所述遮光层的线宽大于其正对的所述金属电极线的线宽。
  7. 根据权利要求1所述的液晶面板，其中，还包括透明的平坦化层，所述平坦化层设于所述阵列基板的外表面，并填充于所述遮光层的镂空区域内。
  8. 根据权利要求7所述的液晶面板，其中，还包括上偏光片，所述上偏光片贴合在所述平坦化层的外表面。
  9. 根据权利要求4所述的液晶面板，其中，还包括透明的平坦化层，所述平坦化层设于所述阵列基板的外表面，并填充于所述遮光层的镂空区域内。
  10. 根据权利要求9所述的液晶面板，其中，还包括上偏光片，所述上偏光片贴合在所述平坦化层的外表面。
  11. 根据权利要求5所述的液晶面板，其中，还包括透明的平坦化层，所述平坦化层设于所述阵列基板的外表面，并填充于所述遮光层的镂空区域内。
  12. 根据权利要求11所述的液晶面板，其中，还包括上偏光片，所述上偏光片贴合在所述平坦化层的外表面。
  13. 根据权利要求6所述的液晶面板，其中，还包括透明的平坦化层，所述平坦化层设于所述阵列基板的外表面，并填充于所述遮光层的镂空区域内。
  14. 根据权利要求13所述的液晶面板，其中，还包括上偏光片，所述上偏光片贴合在所述平坦化层的外表面。
  15. 一种液晶面板的制作方法，其中，包括：
    提供一基板；
    在所述基板的一面整面涂布遮光材料；
    对所述遮光材料图形化处理，形成遮光层；
    在所述基板的另一面制作金属电极线和TFT器件，形成阵列基板；
    将所述阵列基板制作有所述TFT器件的一面朝内，与无黑色矩阵的彩膜基板对盒处理，形成液晶面板；
    其中，所述遮光层的图案在所述基板上的投影至少部分覆盖金属电极线。
  16. 根据权利要求15所述的液晶面板的制作方法，其中，在所述遮光层形成后，还包括：在所述基板上制作透明的平坦化层，使其填充于所述遮光层的镂空区域内，并在所述平坦化层表面贴附上偏光片。
  17. 根据权利要求15所述的液晶面板的制作方法，其中，所述遮光层的图案在所述基板上的投影完全覆盖金属电极线。
  18. 根据权利要求16所述的液晶面板的制作方法，其中，在基板上进行金属电极线制作或者涂布遮光材料步骤前，还对基板进行清洗并烘干。
  19. 根据权利要求16所述的液晶面板的制作方法，其中，涂布的遮光材料的厚度为1～3um，所述遮光层的线条宽度为15～25um。
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