WO2019028959A1 - 一种制造有机发光显示面板的基板及蒸镀装置 - Google Patents

一种制造有机发光显示面板的基板及蒸镀装置 Download PDF

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Publication number
WO2019028959A1
WO2019028959A1 PCT/CN2017/100705 CN2017100705W WO2019028959A1 WO 2019028959 A1 WO2019028959 A1 WO 2019028959A1 CN 2017100705 W CN2017100705 W CN 2017100705W WO 2019028959 A1 WO2019028959 A1 WO 2019028959A1
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Prior art keywords
substrate
spacer
organic light
display panel
film
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English (en)
French (fr)
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余威
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Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Priority to US15/572,168 priority Critical patent/US10217939B1/en
Publication of WO2019028959A1 publication Critical patent/WO2019028959A1/zh
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/331—Nanoparticles used in non-emissive layers, e.g. in packaging layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a substrate and an evaporation device for manufacturing an organic light emitting display panel.
  • the OLED display is widely used because of its self-luminous, fast response, wide viewing angle, and saturated color with respect to the liquid crystal display.
  • the OLED display is an organic light-emitting film formed on an OLED substrate in which an organic light-emitting film is sandwiched between a cathode and an anode, and an organic light-emitting film is caused to emit light by applying a voltage to the cathode and the anode.
  • the OLED organic light-emitting film is formed by successively depositing a multilayer film on a substrate by using an evaporation device.
  • the OLED evaporation technology utilizes an evaporation source.
  • the evaporation source is filled with an OLED material.
  • the evaporation source is heated in a vacuum environment to sublimate or vaporize the material, and then evaporated on the substrate through a mask.
  • the dotted line in Figure 1 gives the OLED.
  • the flow of material As shown in FIG. 1 , the evaporation source is at the bottom in the evaporation process, and the substrate 11 is located above the mask 21 .
  • the mask 21 is provided with a through hole 211 for facilitating vapor deposition
  • the substrate 11 is provided with a spacer 13 , such as As shown in FIG. 2, and the spacer 13 is disposed at the gap of the region 12 to be evaporated, generally, the smaller the gap between the substrate 11 and the mask 21, the weaker the shadow effect.
  • the gap 13 has a certain height, the gap between the substrate 11 and the mask 21 cannot be further reduced.
  • the vapor deposition material will diffuse to other colors to some extent. On, causing color mixing.
  • An object of the present invention is to provide a substrate and a vapor deposition device for manufacturing an organic light-emitting display panel, which can prevent the vapor deposition material from diffusing to other colors to cause color mixture.
  • the present invention provides a substrate for manufacturing an organic light emitting display panel, comprising:
  • first spacers on the substrate, and the first spacers are disposed at a gap of the film formation region;
  • the second spacer is disposed on a periphery of the film-forming region, and the material of the second spacer comprises a photoresist and a magnetic polymer microsphere;
  • the magnetic polymer microspheres have a particle size range of 30 Nm ⁇ 100 nm; the material of the first spacer is the same as the material of the second spacer.
  • the magnetic polymer microspheres are magnetic polypropylene aldehyde-based microspheres.
  • the first spacer and the second spacer are produced by the same process.
  • the height of the second spacer is equal to the height of the first spacer.
  • the number of the second spacers coincides with the number of the film-forming regions to be formed.
  • the invention provides a substrate for manufacturing an organic light emitting display panel, comprising:
  • first spacers on the substrate, and the first spacers are disposed at a gap of the film formation region;
  • a plurality of second spacers are disposed on the substrate, the second spacer is disposed on a periphery of the film-forming region, and a material of the second spacer includes a photoresist and magnetic polymer microspheres.
  • the magnetic polymer microspheres are magnetic polypropylene aldehyde-based microspheres.
  • the material of the first spacer is the same as the material of the second spacer.
  • the first spacer and the second spacer are produced by the same process.
  • the height of the second spacer is equal to the height of the first spacer.
  • the magnetic polymer microspheres have a particle diameter ranging from 30 nm. ⁇ 100nm.
  • the number of the second spacers coincides with the number of the film-forming regions to be formed.
  • the present invention also provides an evaporation device for performing a vapor deposition process on a substrate placed on a mask, comprising:
  • a mask provided with a plurality of through holes for evaporation
  • the substrate includes:
  • first spacers between the substrate and the mask, and the first spacer is disposed at a gap of the film-forming region
  • the second spacer is disposed at a periphery of the film-forming region, and the material of the second spacer includes a photoresist And magnetic polymer microspheres.
  • the material of the first spacer is the same as the material of the second spacer.
  • the height of the second spacer is equal to the height of the first spacer.
  • the magnetic polymer microspheres are magnetic polyacryl aldehyde microspheres.
  • the first spacer and the second spacer are produced by the same process.
  • the magnetic polymer microspheres have a particle diameter ranging from 30 nm to 100 nm.
  • the number of the second spacers coincides with the number of the film formation regions to be formed.
  • the spacer and the mask can be masked.
  • the membrane sheets are in close contact, thereby preventing the vapor deposition material from diffusing to other colors to cause color mixing.
  • FIG. 1 is a schematic cross-sectional structural view of a substrate on which an organic light emitting display panel is manufactured
  • FIG. 2 is a plan view of a substrate on which an organic light emitting display panel is manufactured
  • FIG. 3 is a plan view of a substrate for manufacturing an organic light emitting display panel according to the present invention.
  • FIG. 4 is a schematic cross-sectional view showing a substrate of an organic light emitting display panel of the present invention.
  • FIG. 3 is a plan view of a substrate for manufacturing an organic light emitting display panel according to the present invention.
  • the substrate 30 for manufacturing an organic light emitting display panel of the present invention includes a substrate 31, a plurality of film formation regions 32, a plurality of first spacers 33, and a plurality of second spacers 34.
  • the substrate 30 is used to manufacture an organic light-emitting layer of an organic light-emitting display panel.
  • the substrate 31 is a conductive glass, that is, ITO glass.
  • the film-forming region 32 is located on the substrate 31, and a plurality of film-forming regions 32 are spaced apart from each other.
  • the film-forming region 32 is used to form an organic light-emitting layer, and specifically, the substrate 30 is evaporated by an evaporation source 40 to form an organic light-emitting layer.
  • the first spacer 33 is located on the substrate 31, and the first spacer 33 is disposed at a gap of the film formation region 32. Specifically, the first spacer 33 is spaced apart from the film formation region 32 to be formed.
  • the second spacer 34 is located on the substrate 31, and the second spacer 34 is disposed on the periphery of the film-forming region 32, that is, the periphery of each film-forming region 32 is provided with a second interval. Sub 34.
  • the number of the second spacers 34 coincides with the number of the film formation regions 32 to be formed.
  • the material of the second spacer 32 includes a photoresist and magnetic polymer microspheres. That is, the material of the second spacer 32 is a magnetic polymer microsphere mixed with a photoresist material.
  • the magnetic polymer microspheres have a particle size range of 30 nm ⁇ 100nm. Since the particle diameter is within this range, the magnetic properties are better, thereby enhancing the adsorption performance with the mask.
  • the magnetic polymer microspheres are magnetic polyacryl aldehyde microspheres.
  • the metal mask Since the magnetic properties exhibited by the magnetic polymer microspheres attract the mask, the metal mask is closely adhered to the second spacer 34, so that the organic light-emitting material evaporated to the substrate 30 is surrounded by the area to be vapor-deposited.
  • the second gap sub-block 34 blocks, and the shadow effect cannot occur, so that the color mixing problem is not caused.
  • the material of the second spacer 34 is different from the material of the first spacer 33.
  • the material of the first spacer 33 is a photoresist material.
  • the material of the first spacer 33 is the same as the material of the second spacer 34. That is, the material of the first spacer 33 also includes a photoresist and magnetic polymer microspheres. Since the magnetic properties exhibited by the magnetic polymer microspheres attract the mask, the metal mask 21 is closely adhered to the first spacer 33, which reduces the spacing between the substrate and the mask, further avoiding the shadow effect.
  • the first spacer 33 and the second spacer 34 are fabricated by the same process.
  • the first spacer 33 and the second spacer 34 are simultaneously prepared by a yellow light process such as coating development.
  • the heights of the second spacers 34 and the first spacers 33 are equal to simplify the process and reduce the production cost.
  • another spacer is provided on a periphery of a region to be evaporated of the substrate, and since the material of the spacer includes magnetic polymer microspheres, the spacer and the mask can be made It fits snugly to prevent the evaporation material from spreading to other colors and causing color mixing.
  • the present invention also provides an evaporation device for performing a vapor deposition process on a substrate placed on a mask plate, as shown in FIGS. 3 and 4, the vapor deposition device includes: a mask plate 21, The substrate 30 and the evaporation source 40; the evaporation source 40 is located below the mask 21 for providing an organic light-emitting material to form an organic light-emitting layer on the substrate 30.
  • the vapor deposition device is deposited by vapor deposition, it is necessary to provide it in a vacuum-tight space.
  • the vapor deposition apparatus may further include a heating device (not shown) that heats the evaporation source 40 to remove impurities on the surface of the evaporation source 40.
  • the mask plate 21 is provided with a plurality of through holes 211 for vapor deposition.
  • the material of the mask 21 may be metal.
  • the organic light-emitting material is supplied to the substrate 30 through the through holes 211 on the mask 21 to form an organic light-emitting layer, and the flow direction of the organic light-emitting material is indicated by a broken line in FIG.
  • the substrate 30 is used to manufacture an organic light-emitting layer of an organic light-emitting display panel.
  • the substrate 30 includes a substrate 31, a plurality of film formation regions 32, a plurality of first spacers 33, and a plurality of second spacers 34.
  • the substrate 31 is a conductive glass, that is, ITO glass.
  • the film-forming region 32 is located on the substrate 31, and a plurality of film-forming regions 32 are spaced apart from each other.
  • the film-forming region 32 is used to form an organic light-emitting layer, and specifically, the substrate 30 is evaporated by an evaporation source 40 to form an organic light-emitting layer.
  • the first spacer 33 is located on the substrate 31, and the first spacer 33 is disposed at a gap of the film-forming region 32, specifically, the first spacer 33 is located on the substrate 31 and Between the mask plates 21.
  • the first spacer 33 is spaced apart from the film formation area 32 to be formed.
  • the second spacer 34 is located on the substrate 31 and is located between the substrate 31 and the mask 21.
  • the second spacers 34 are disposed on the periphery of the film-forming region 32, that is, the periphery of each film-forming region 32 is provided with a second spacer 34, and the number of the second spacers 34 is The number of film formation regions 32 is said to be the same.
  • the material of the second spacer 32 includes a photoresist and magnetic polymer microspheres. That is, the material of the second spacer 32 is a magnetic polymer microsphere mixed with a photoresist material.
  • the magnetic polymer microspheres have a particle size range of 30 nm ⁇ 100nm. Since the particle diameter is within this range, the magnetic properties are better, thereby enhancing the adsorption force with the mask.
  • the magnetic polymer microspheres are magnetic polyacryl aldehyde microspheres.
  • the metal mask 21 Since the magnetic properties exhibited by the magnetic polymer microspheres attract the mask 21, the metal mask 21 is closely adhered to the second spacer 34, so that the organic light-emitting material evaporated to the substrate 30 is to be evaporated. The second gap 34 around is blocked, and the shadow effect cannot occur, so that the color mixing problem is not caused.
  • the material of the second spacer 34 is different from the material of the first spacer 33.
  • the material of the first spacer 33 is a photoresist material.
  • the material of the first spacer 33 is the same as the material of the second spacer 34. That is, the material of the first spacer 33 also includes a photoresist and magnetic polymer microspheres. Since the magnetic properties exhibited by the magnetic polymer microspheres attract the mask 21, the metal mask 21 is closely adhered to the first spacer 33, thereby reducing the spacing between the substrate and the mask, further avoiding the shadow effect. .
  • the first spacer 33 and the second spacer 34 are fabricated by the same process.
  • the first spacer 33 and the second spacer 34 are simultaneously prepared by a yellow light process such as coating development.
  • the heights of the second spacers 34 and the first spacers 33 are equal to simplify the process and reduce the production cost.
  • another spacer is provided on the periphery of the region to be vapor-deposited of the substrate, and since the material of the spacer includes magnetic polymer microspheres, the spacer can be closely adhered to the mask. Thereby blocking the evaporation material from diffusing to other colors to cause color mixing.

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  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
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Abstract

提供一种制造有机发光显示面板的基板（30）及蒸镀装置，该基板（30）包括：多个间隔设置的待成膜区域（32），位于所述衬底（31）上，所述待成膜区域（32）用于形成有机发光层；多个第二间隔子（34），位于所述衬底（31）上，所述第二间隔子（34）设置在所述待成膜区域（32）的周缘，所述第二间隔子（34）的材料包括光阻和磁性高分子微球。

Description

一种制造有机发光显示面板的基板及蒸镀装置 技术领域
本发明涉及显示技术领域，特别是涉及一种制造有机发光显示面板的基板及蒸镀装置。
 背景技术
由于OLED显示器相对于液晶显示器有自发光、响应快、视角广、色彩饱和等优点，被广泛地应用。OLED显示器是在OLED基板上制作有机发光薄膜，其中有机发光薄膜夹在在阴极和阳极之间，通过给阴极和阳极施加电压，使有机发光薄膜发光。
OLED的有机发光薄膜的制作过程是利用蒸镀设备，将多层薄膜相继沉积在基板上而形成。OLED蒸镀技术是利用一蒸发源，蒸发源内部充填OLED材料，在真空环境下蒸发源加热使材料升华或气化，再透过掩膜板蒸镀于基板上，图1中虚线给出OLED材料的流向。如图1所示，蒸镀过程中蒸发源在最下方，基板11位于掩膜板21上方，掩膜板21上设置有便于蒸镀的通孔211，基板11上设置有间隙子13，如图2所示，且间隙子13设置在待蒸镀区域12的间隙处，通常基板11与掩膜板21之间的间隙越小，阴影效应越弱。但是由于间隙子13有一定的高度，使得基板11与掩膜板21之间的间隙无法进一步减小，对于高分辨率的基板来说，会使蒸镀材会在一定程度上扩散至其他颜色上，造成混色。
因此，有必要提供一种制造有机发光显示面板的基板及蒸镀装置，以解决现有技术所存在的问题。
 技术问题
本发明的目的在于提供一种制造有机发光显示面板的基板及蒸镀装置，能够避免蒸镀材扩散至其他颜色上造成混色。
 技术解决方案
为解决上述技术问题，本发明提供一种制造有机发光显示面板的基板，其包括：
衬底；
多个间隔设置的待成膜区域，位于所述衬底上，所述待成膜区域用于形成有机发光层；
多个第一间隔子，位于所述衬底上，且所述第一间隔子设置在所述待成膜区域的间隙处；
多个第二间隔子，位于所述衬底上，且所述第二间隔子设置在所述待成膜区域的周缘，所述第二间隔子的材料包括光阻和磁性高分子微球；所述磁性高分子微球的粒径范围为30 nm ~100nm；所述第一间隔子的材料与所述第二间隔子的材料相同。
在本发明的制造有机发光显示面板的基板中，所述磁性高分子微球为磁性聚丙烯醛类微球。
在本发明的制造有机发光显示面板的基板中，所述第一间隔子和所述第二间隔子是通过同一制程工艺制得的。
在本发明的制造有机发光显示面板的基板中，所述第二间隔子的高度和所述第一间隔子的高度相等。
在本发明的制造有机发光显示面板的基板中，所述第二间隔子的数量与所述待成膜区域的数量一致。
本发明提供一种制造有机发光显示面板的基板，其包括：
衬底；
多个间隔设置的待成膜区域，位于所述衬底上，所述待成膜区域用于形成有机发光层；
多个第一间隔子，位于所述衬底上，且所述第一间隔子设置在所述待成膜区域的间隙处；
多个第二间隔子，位于所述衬底上，所述第二间隔子设置在所述待成膜区域的周缘，所述第二间隔子的材料包括光阻和磁性高分子微球。
在本发明的制造有机发光显示面板的基板中，所述磁性高分子微球为磁性聚丙烯醛类微球。
在本发明的制造有机发光显示面板的基板中，所述第一间隔子的材料与所述第二间隔子的材料相同。
在本发明的制造有机发光显示面板的基板中，所述第一间隔子和所述第二间隔子是通过同一制程工艺制得的。
在本发明的制造有机发光显示面板的基板中，所述第二间隔子的高度和所述第一间隔子的高度相等。
在本发明的制造有机发光显示面板的基板中，所述磁性高分子微球的粒径范围为30 nm ~100nm。
在本发明的制造有机发光显示面板的基板中，所述第二间隔子的数量与所述待成膜区域的数量一致。
本发明还提供一种蒸镀装置，所述蒸镀装置用于对放置于掩膜板上的基板进行蒸镀处理，其包括：
蒸镀源，用于提供有机发光材料；
掩膜板，设置有多个用于蒸镀的通孔；以及
基板，包括：
衬底；
多个间隔设置的待成膜区域，位于所述衬底上，所述待成膜区域用于形成有机发光层；
多个第一间隔子，位于所述衬底和所述掩膜板之间，且所述第一间隔子设置在所述待成膜区域的间隙处；
多个第二间隔子，位于所述衬底和所述掩膜板之间，且所述第二间隔子设置在所述待成膜区域的周缘，所述第二间隔子的材料包括光阻和磁性高分子微球。
在本发明的蒸镀装置中，所述第一间隔子的材料与所述第二间隔子的材料相同。
在本发明的蒸镀装置中，所述第二间隔子的高度和所述第一间隔子的高度相等。
在本发明的蒸镀装置中，所述磁性高分子微球为磁性聚丙烯醛类微球。
在本发明的蒸镀装置中，所述第一间隔子和所述第二间隔子是通过同一制程工艺制得的。
在本发明的蒸镀装置中，所述磁性高分子微球的粒径范围为30 nm ~100nm。
在本发明的蒸镀装置中，所述第二间隔子的数量与所述待成膜区域的数量一致。
 有益效果
本发明的制造有机发光显示面板的基板及蒸镀装置，通过在基板的待蒸镀区域的周缘设置间隙子，且由于该间隔子的材料包括磁性高分子微球，能够使该间隙子与掩膜板紧密贴合，从而阻挡蒸镀材扩散至其他颜色上造成混色。
 附图说明
图1为现有制造有机发光显示面板的基板的剖面结构示意图；
图2为现有制造有机发光显示面板的基板的俯视图；
图3为本发明制造有机发光显示面板的基板的俯视图；
图4为本发明制造有机发光显示面板的基板的剖面结构示意图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是以相同标号表示。
请参照图3和4，图3为本发明制造有机发光显示面板的基板的俯视图。
如图3和4所示，本发明制造有机发光显示面板的基板30包括衬底31、多个待成膜区域32、多个第一间隔子33以及多个第二间隔子34。该基板30用于制造有机发光显示面板的有机发光层。该衬底31为导电玻璃，也即ITO玻璃。
该待成膜区域32位于所述衬底31上，多个待成膜区域32之间相互间隔。所述待成膜区域32用于形成有机发光层，具体地通过蒸镀源40对基板30进行蒸镀以形成有机发光层。
该第一间隔子33位于所述衬底31上，且所述第一间隔子33设置在所述待成膜区域32的间隙处。具体地所述第一间隔子33与待成膜区域32间隔设置。
该第二间隔子34位于所述衬底31上，所述第二间隔子34设置在所述待成膜区域32的周缘，也即每个待成膜区域32的周缘都设置有第二间隔子34。所述第二间隔子34的数量与所述待成膜区域32的数量一致。
其中所述第二间隔子32的材料包括光阻和磁性高分子微球。也即第二间隔子32的材料是在光阻材料中混合有磁性高分子微球。该磁性高分子微球的粒径范围为30 nm ~100nm。由于粒径位于此范围内，磁性更好，从而增强了与掩膜板的吸附性能。在一实施方式中，所述磁性高分子微球为磁性聚丙烯醛类微球。
由于磁性高分子微球表现出的磁性会吸住掩膜板，使金属掩膜板与第二间隙子34紧密贴合，进而使得蒸镀到基板30的有机发光材料被待蒸镀区域四周的第二间隙子34阻挡，无法发生阴影效应，从而不会造成混色问题。
在一实施方式中，所述第二间隔子34的材料与所述第一间隔子33的材料不同。所述第一间隔子33的材料为光阻材料。
在另一实施方式中，所述第一间隔子33的材料与所述第二间隔子34的材料相同。也即所述第一间隔子33的材料也包括光阻和磁性高分子微球。由于磁性高分子微球表现出的磁性会吸住掩膜板，使金属掩膜板21与第一间隙子33紧密贴合，缩小了基板和掩膜板之间的间距，进一步避免阴影效应。
在一实施方式中，所述第一间隔子33和所述第二间隔子34是通过同一制程工艺制得的。比如，通过涂布显影等黄光工艺同时制备第一间隔子33和第二间隔子34。
在一实施方式中，所述第二间隔子34和所述第一间隔子33的高度相等，以简化制程工艺，降低生产成本。
本发明的制造有机发光显示面板的基板，通过在基板的待蒸镀区域的周缘设置另一间隙子，且由于该间隔子的材料包括磁性高分子微球，能够使该间隙子与掩膜板紧密贴合，从而阻挡蒸镀材扩散至其他颜色上造成混色。
本发明还提供一种蒸镀装置，所述蒸镀装置用于对放置于掩膜板上的基板进行蒸镀处理，如图3和4所示，该蒸镀装置包括：掩膜板21、基板30以及蒸镀源40；蒸镀源40位于掩膜板21的下方，用于提供有机发光材料，以在基板30上形成有机发光层。蒸镀装置在蒸镀成膜时，需要设置在真空密闭的空间内。该蒸镀装置还可包括加热装置（图中未示出），该加热装置可对蒸镀源40进行加热，以去除蒸镀源40表面的杂质。
该掩膜板21上设置有多个用于蒸镀的通孔211。该掩膜板21的材料可为金属。在具体蒸镀过程中，通过掩膜板21上的通孔211向基板30提供有机发光材料以形成有机发光层，有机发光材料的流向方向如图4中虚线所示。
该基板30用于制造有机发光显示面板的有机发光层。该基板30包括衬底31、多个待成膜区域32、多个第一间隔子33以及多个第二间隔子34。该衬底31为导电玻璃，也即ITO玻璃。
该待成膜区域32位于所述衬底31上，多个待成膜区域32之间相互间隔。所述待成膜区域32用于形成有机发光层，具体地通过蒸镀源40对基板30进行蒸镀以形成有机发光层。
该第一间隔子33位于所述衬底31上，且所述第一间隔子33设置在所述待成膜区域32的间隙处，具体地该第一间隔子33位于所述衬底31和所述掩膜板21之间。其中所述第一间隔子33与待成膜区域32间隔设置。
该第二间隔子34位于所述衬底31上，且位于所述衬底31和所述掩膜板21之间。所述第二间隔子34设置在所述待成膜区域32的周缘，也即每个待成膜区域32的周缘都设置有第二间隔子34，所述第二间隔子34的数量与所述待成膜区域32的数量一致。
其中所述第二间隔子32的材料包括光阻和磁性高分子微球。也即第二间隔子32的材料是在光阻材料中混合有磁性高分子微球。该磁性高分子微球的粒径范围为30 nm ~100nm。由于粒径位于此范围内时，磁性更好，从而增强了与掩膜板的吸附力。在一实施方式中，所述磁性高分子微球为磁性聚丙烯醛类微球。
由于磁性高分子微球表现出的磁性会吸住掩膜板21，使金属掩膜板21与第二间隙子34紧密贴合，进而使得蒸镀到基板30的有机发光材料被待蒸镀区域四周的第二间隙子34阻挡，无法发生阴影效应，从而不会造成混色问题。
在一实施方式中，所述第二间隔子34的材料与所述第一间隔子33的材料不同。所述第一间隔子33的材料为光阻材料。
在另一实施方式中，所述第一间隔子33的材料与所述第二间隔子34的材料相同。也即所述第一间隔子33的材料也包括光阻和磁性高分子微球。由于磁性高分子微球表现出的磁性会吸住掩膜板21，使金属掩膜板21与第一间隙子33紧密贴合，缩小了基板和掩膜板之间的间距，进一步避免阴影效应。
在一实施方式中，所述第一间隔子33和所述第二间隔子34是通过同一制程工艺制得的。比如，通过涂布显影等黄光工艺同时制备第一间隔子33和第二间隔子34。
在一实施方式中，所述第二间隔子34和所述第一间隔子33的高度相等，以简化制程工艺，降低生产成本。
本发明的蒸镀装置，通过在基板的待蒸镀区域的周缘设置另一间隙子，且由于该间隔子的材料包括磁性高分子微球，能够使该间隙子与掩膜板紧密贴合，从而阻挡蒸镀材扩散至其他颜色上造成混色。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (19)

  1. 一种制造有机发光显示面板的基板，其包括：
    衬底；
    多个间隔设置的待成膜区域，位于所述衬底上，所述待成膜区域用于形成有机发光层；
    多个第一间隔子，位于所述衬底上，且所述第一间隔子设置在所述待成膜区域的间隙处；
    多个第二间隔子，位于所述衬底上，且所述第二间隔子设置在所述待成膜区域的周缘，所述第二间隔子的材料包括光阻和磁性高分子微球；所述磁性高分子微球的粒径范围为30 nm ~100nm；所述第一间隔子的材料与所述第二间隔子的材料相同。
  2. 根据权利要求1所述的制造有机发光显示面板的基板，其中所述磁性高分子微球为磁性聚丙烯醛类微球。
  3. 根据权利要求1所述的制造有机发光显示面板的基板，其中所述第一间隔子和所述第二间隔子是通过同一制程工艺制得的。
  4. 根据权利要求1所述的制造有机发光显示面板的基板，其中所述第二间隔子的高度和所述第一间隔子的高度相等。
  5. 根据权利要求1所述的制造有机发光显示面板的基板，其中所述第二间隔子的数量与所述待成膜区域的数量一致。
  6. 一种制造有机发光显示面板的基板，其包括：
    衬底；
    多个间隔设置的待成膜区域，位于所述衬底上，所述待成膜区域用于形成有机发光层；
    多个第一间隔子，位于所述衬底上，且所述第一间隔子设置在所述待成膜区域的间隙处；
    多个第二间隔子，位于所述衬底上，且所述第二间隔子设置在所述待成膜区域的周缘，所述第二间隔子的材料包括光阻和磁性高分子微球。
  7. 根据权利要求6所述的制造有机发光显示面板的基板，其中所述磁性高分子微球为磁性聚丙烯醛类微球。
  8. 根据权利要求6所述的制造有机发光显示面板的基板，其中所述第一间隔子的材料与所述第二间隔子的材料相同。
  9. 根据权利要求6所述的制造有机发光显示面板的基板，其中所述第一间隔子和所述第二间隔子是通过同一制程工艺制得的。
  10. 根据权利要求6所述的制造有机发光显示面板的基板，其中所述第二间隔子的高度和所述第一间隔子的高度相等。
  11. 根据权利要求6所述的制造有机发光显示面板的基板，其中所述磁性高分子微球的粒径范围为30 nm ~100nm。
  12. 根据权利要求6所述的制造有机发光显示面板的基板，其中所述第二间隔子的数量与所述待成膜区域的数量一致。
  13. 一种蒸镀装置，其中所述蒸镀装置用于对放置于掩膜板上的基板进行蒸镀处理，包括：
    蒸镀源，用于提供有机发光材料；
    掩膜板，设置有多个用于蒸镀的通孔；以及
    基板，包括：
    衬底；
    多个间隔设置的待成膜区域，位于所述衬底上，所述待成膜区域用于形成有机发光层；
    多个第一间隔子，位于所述衬底和所述掩膜板之间，且所述第一间隔子设置在所述待成膜区域的间隙处；
    多个第二间隔子，位于所述衬底和所述掩膜板之间，且所述第二间隔子设置在所述待成膜区域的周缘，所述第二间隔子的材料包括光阻和磁性高分子微球。
  14. 根据权利要求13所述的蒸镀装置，其中所述第一间隔子的材料与所述第二间隔子的材料相同。
  15. 根据权利要求13所述的蒸镀装置，其中所述第二间隔子的高度和所述第一间隔子的高度相等。
  16. 根据权利要求13所述的蒸镀装置，其中所述磁性高分子微球为磁性聚丙烯醛类微球。
  17. 根据权利要求13所述的蒸镀装置，其中所述第一间隔子和所述第二间隔子是通过同一制程工艺制得的。
  18. 根据权利要求13所述的蒸镀装置，其中所述磁性高分子微球的粒径范围为30 nm ~100nm。
  19. 根据权利要求13所述的蒸镀装置，其中所述第二间隔子的数量与所述待成膜区域的数量一致。
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