WO2018205346A1 - 抗眩盖板的制造方法及显示装置 - Google Patents

抗眩盖板的制造方法及显示装置 Download PDF

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Publication number
WO2018205346A1
WO2018205346A1 PCT/CN2017/088631 CN2017088631W WO2018205346A1 WO 2018205346 A1 WO2018205346 A1 WO 2018205346A1 CN 2017088631 W CN2017088631 W CN 2017088631W WO 2018205346 A1 WO2018205346 A1 WO 2018205346A1
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Prior art keywords
cover plate
manufacturing
etched
etching
mask layer
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PCT/CN2017/088631
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English (en)
French (fr)
Inventor
杨勇
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武汉华星光电技术有限公司
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Priority to US15/543,988 priority Critical patent/US20180329121A1/en
Publication of WO2018205346A1 publication Critical patent/WO2018205346A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04M—TELEPHONIC COMMUNICATION
    • H04M1/00—Substation equipment, e.g. for use by subscribers
    • H04M1/02—Constructional features of telephone sets
    • H04M1/0202—Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
    • H04M1/0279—Improving the user comfort or ergonomics

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a method and a display device for manufacturing an anti-glare cover.
  • anti-glare treatment is one of the important ways of surface treatment of the cover plate. It is common practice to carry out wet etching on the surface of the cover plate to improve the roughness of the surface of the cover plate and increase the diffusion of the surface of the cover plate.
  • wet etching on the surface of the cover plate to improve the roughness of the surface of the cover plate and increase the diffusion of the surface of the cover plate.
  • sparkle phenomenon may occur on the high-resolution panel, and the method for improving the sparkle phenomenon is not found yet, resulting in high resolution of the anti-glare cover.
  • the application on the degree panel is limited.
  • the invention provides a method and a display device for manufacturing an anti-glare cover plate, which can improve the sparkle phenomenon of the cover plate on the high-resolution panel and improve the reading comfort of the panel.
  • a technical solution adopted by the present invention is to provide a method for manufacturing an anti-glare cover plate, the method comprising: washing the cover plate; using the first etching solution to cover the cover plate Performing pre-etching to form a rugged microstructure; depositing a mask layer having a non-uniform thickness on the pre-etched cap; and using the second etching solution on the metal film layer and
  • the pre-etched cover plate is etched to prepare a cover plate having a plurality of phase-separated curved microstructures; wherein the shape of the microstructure includes at least one of a curved shape, a tapered shape, and a truncated cone shape
  • the mask layer is one of a metal, a metal oxide, and a silicate.
  • another technical solution adopted by the present invention is to provide a method for manufacturing an anti-glare cover, the method comprising: washing the cover plate; using the first etching liquid to cover the cover The plate is pre-etched to form a rugged microstructure; a mask layer having a non-uniform thickness is deposited on the pre-etched cap plate; and the metal film layer is coated with a second etching solution And pre-etching the cover plate to etch to prepare a cover plate having a plurality of phase-separated curved microstructures.
  • another technical solution adopted by the present invention is to provide a display device including an anti-glare cover plate and a display panel, wherein the anti-glare cover plate and the display panel are
  • the method for manufacturing the anti-glare cover plate comprises: cleaning the cover plate; pre-etching the cover plate with a first etching solution to form a rugged microstructure; Depositing a mask layer having a non-uniform thickness on the pre-etched cap; etching the mask layer and the pre-etched cap plate with a second etching solution, To prepare a cover plate having a plurality of phase-separated curved microstructures; the shape of the microstructure includes at least one of an arc shape, a cone shape, and a truncated cone shape; the mask layer is metal, metal oxide, and silicon a kind of acid salt; each of the phase-separated curved microstructures has a cracked surface with a central angle of 50° to 80, and an etching between the adjacent arc-shaped microstructure
  • the invention has the beneficial effects that, different from the prior art, the present invention can prepare a plurality of phase-separated curved microstructures on the cover plate by multi-step etching, and can improve the sparkle of the cover plate on the surface of the high-resolution panel. Phenomenon is conducive to improving the comfort of panel reading.
  • FIG. 1 is a schematic flow chart of an embodiment of a method for manufacturing an anti-glare cover of the present invention
  • FIG. 2 is a schematic structural view of an embodiment of a manufacturing process of the anti-glare cover of the present invention
  • FIG. 3 is a schematic structural view of the anti-glare cover plate of the present invention under a scanning electron microscope;
  • FIG. 4 is a schematic view showing the comparison of the display effect of the full HD resolution panel in the laminated/unfitted anti-glare cover plate according to the present invention.
  • FIG. 5 is a schematic view showing the comparison of optical characteristics of the curved micro-structured cover plate and the surface layer arc-shaped micro-structure cover plate having a surface cracked according to the present invention
  • Figure 6 is a schematic view showing the structure of an embodiment of the display device of the present invention.
  • FIG. 1 is a schematic flow chart of an embodiment of a method for manufacturing an anti-glare cover of the present invention
  • FIG. 2 is a schematic structural view of an embodiment of a manufacturing process of the anti-glare cover of the present invention, the method includes the following step:
  • the cover plate may be a transparent material, and may be any substrate such as glass, ceramic substrate or transparent plastic.
  • the invention is not limited herein.
  • the cleaned cover plate is pre-etched by using the first etching solution.
  • the first etching solution may be a mixed acid solution of hydrofluoric acid, phosphoric acid and sulfuric acid, and the concentration may be 0.5 wt. %-1wt%, in other embodiments, other concentrations of acid which can corrode the cover plate may also be used, and the invention is not further limited herein.
  • the purpose of the pre-etching is to etch the cap plate with a relatively thin etching acid solution, so that the uneven microstructure A is formed on the surface of the cap plate.
  • the etched trace of the microstructure A is relatively shallow, and its shape may be one of an arc shape, a cone shape, and a truncated cone shape.
  • FIG. 2 which mainly serves as an overall anti-glare effect.
  • a mask layer B having a non-uniform thickness is deposited on the pre-etched cover by vapor deposition or sputtering.
  • the deposition method of the mask layer B is not limited to the above two modes. In other embodiments. In the above, an electrochemical deposition vapor deposition method or the like can also be used, and is not specifically limited herein.
  • the mask layer B material may be a metal, a metal oxide, a silicate or any material that can react with the etching solution.
  • the thickness of the mask layer is uniform and the thickness is randomly distributed.
  • the mask layer B has a thickness ranging from about 50 nm to 1 ⁇ m, a thin film layer having a thickness between 50 nm and 200 nm, and a thicker film layer having a thickness between 500 nm and 1 ⁇ m, which can be seen in a thin film.
  • the thickness of the layer differs greatly from the thickness of the film at a thicker layer, as detailed in c) in Figure 2.
  • the thickness range of the film layer in this embodiment is only a schematic example.
  • the vapor deposition or sputtering process may be specifically controlled, for example, two different mask plates may be used in the evaporation process.
  • the evaporating time of one of the masks is longer, the thickness of the mask layer is thicker, the evaporation time of the other mask is relatively short, and the thickness of the mask layer is thin, so as to obtain the mask of the required thickness.
  • Membrane layer may be specifically controlled, for example, two different mask plates may be used in the evaporation process.
  • the second etching solution may be a mixed acid solution of hydrofluoric acid, phosphoric acid and sulfuric acid, and the concentration of the second etching liquid may be 10% by weight to 20% by weight.
  • the cover may be corroded.
  • concentrations of acid in the plate are not further limited herein.
  • etching the acid solution requires first dissolving the mask layer to etch the substrate on the surface of the cover plate, and the thickness of the mask layer is not Evenly, the etching time and etching amount of the etching acid on the surface of the cover plate are different, and the etching time for etching the acid solution in the thinner region of the mask layer is longer, and the etching depth is larger, and the mask layer is thicker.
  • the etching time of the etching acid solution is short, and the etching depth is shallow, thereby preparing an arc-shaped microstructured cover plate having a plurality of phase separations, wherein the phase-separated curved microstructure C can be specifically referred to in FIG. 2 ).
  • FIG. 3 is a schematic structural view of the anti-glare cover plate of the present invention under a scanning electron microscope.
  • FIG. 3 there is an etched gully between the adjacent curved microstructures of the cover plate, which is completely different from the conventional spherical concave structure.
  • the central angle of each curved microstructure is 50°.
  • Between ⁇ 80°, and the arc-shaped microstructure surface separated by each phase is cracked.
  • This structure is favorable for forming a light trap, even if the incoming light cannot escape, weakening the intensity of the reflected light, and passing the surface unevenness.
  • the structure is diffused to achieve an anti-glare effect.
  • FIG. 4 is a schematic diagram showing the comparison of the display effects of the full HD resolution panel in the laminated/unfitted anti-glare cover. As shown in Fig. 4, the sparkle phenomenon is hardly visible in the area where the anti-glare cover is attached, indicating that the anti-glare microstructure of the shape can improve the sparkle phenomenon of the display panel.
  • FIG. 5 is a schematic diagram showing the optical characteristics of the curved micro-structured cover plate and the surface layer arc-shaped microstructured cover plate on the surface of the present invention.
  • a), b) and c) in Fig. 5 are the contrast of reflectivity, transmittance and haze value of the curved micro-structured cover plate with surface cracked surface and the curved surface micro-structured cover plate of the surface layer, respectively.
  • the curved micro-structured cover with a cracked surface has a reflectivity of about 93.61%, a transmittance of about 1.96%, and a haze value of 71.13%, wherein the haze is 2.5° from the incident light.
  • the transmitted light intensity above the angle accounts for the percentage of the total transmitted light intensity.
  • the greater the haze means that the surface gloss of the cover plate is particularly lowered, and the image-affected contour is more blurred, and the anti-glare effect is better.
  • the reflectivity is about 93%
  • the transmittance is about 2.05%
  • the haze value is 22.02%.
  • the reflectivity and transmittance of the crack-like microstructured cover plate are slightly higher than that of the spherical micro-structured cover plate, indicating that the optical performance of the crack-like microstructured cover plate is slightly better than that of the spherical micro-structured cover plate, the turtle
  • the haze value of the cracked microstructured cover plate can be much higher than the haze value of the spherical micro-structured cover plate, indicating that the crack-like microstructure can produce a cover plate with a higher haze value, which is very good.
  • the anti-glare effect helps to improve the readability and reading comfort of the phone outdoors.
  • a plurality of phase-separated arc-shaped microstructures are prepared on the cover plate by multi-step etching, which can improve the sparkle phenomenon of the cover plate on the surface of the high-resolution panel, and is favorable for improving the reading comfort of the panel.
  • FIG. 6 is a schematic structural diagram of an embodiment of a display device according to the present invention.
  • the display device 20 includes an anti-glare cover D made by any of the above methods, and a display panel 21.
  • the anti-glare cover D is disposed on the display surface of the display panel 21, and the manufacturing method and the use description of the anti-glare cover D are described in the above embodiments, and details are not described herein again.
  • a plurality of phase-separated arc-shaped microstructures are prepared on the cover plate by multi-step etching, which can improve the sparkle phenomenon of the cover plate on the surface of the high-resolution panel, and is favorable for improving the reading comfort of the panel.
  • the present invention provides a method and a display device for manufacturing an anti-glare cover plate, and a plurality of phase-separated arc-shaped microstructures are prepared on a cover plate by multi-step etching. Improve the sparkle phenomenon of the cover on the surface of the high-resolution panel, which is beneficial to improve the comfort of the panel reading.

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Abstract

一种抗眩盖板(D)的制造方法及显示装置(20)，方法包括：洗净盖板(D)；采用第一刻蚀液对盖板(D)进行预刻蚀，以形成凹凸不平的微结构(A)；在进行预刻蚀后的盖板(D)上沉积一层且厚度不均匀的掩膜层(B)；采用第二刻蚀液对金属膜层及预刻蚀后的盖板(D)进行刻蚀，以制备出具有多个相分离弧形微结构(C)的盖板(D)。能够改善盖板(D)在高解析度面板上的sparkle现象，提升面板阅读的舒适度。

Description

抗眩盖板的制造方法及显示装置
【技术领域】
本发明涉及显示技术领域，特别是涉及一种抗眩盖板的制造方法及显示装置。
【背景技术】
人们在使用手机时时常受到高亮环境光及鬼影现象的困扰，为此人们常通过在手机盖板表面进行抗眩抗反射处理。目前，抗眩处理为盖板表面处理的重要方式之一，常用的做法是在盖板表面进行湿刻蚀提高盖板表面的粗糙度，增加盖板表面的漫射。然而，当盖板表面的抗眩微结构尺寸过大时，在高解析度面板上会造成闪烁（sparkle）现象，且目前暂未找出改善sparkle现象的方法，造成抗眩盖板在高解析度面板上应用受到限制。
【发明内容】
本发明提供一种抗眩盖板的制造方法及显示装置，能够改善盖板在高解析度面板上的sparkle现象，提升面板阅读的舒适度。
为解决上述技术问题，本发明采用的一种技术方案是：提供一种抗眩盖板的制造方法，所述方法包括：洗净所述盖板；采用第一刻蚀液对所述盖板进行预刻蚀，以形成凹凸不平的微结构；在所述进行预刻蚀后的盖板上沉积一层且厚度不均匀的掩膜层；采用第二刻蚀液对所述金属膜层及所述预刻蚀后的盖板进行刻蚀，以制备出具有多个相分离弧形微结构的盖板；其中，所述微结构的形状包括弧形、锥形及圆台状中的至少一种；所述掩膜层为金属、金属氧化物及硅酸盐的一种。
为解决上述技术问题，本发明采用的另一种技术方案是：提供一种抗眩盖板的制造方法，所述方法包括：洗净所述盖板；采用第一刻蚀液对所述盖板进行预刻蚀，以形成凹凸不平的微结构；在所述进行预刻蚀后的盖板上沉积一层且厚度不均匀的掩膜层；采用第二刻蚀液对所述金属膜层及所述预刻蚀后的盖板进行刻蚀，以制备出具有多个相分离弧形微结构的盖板。
为解决上述技术问题，本发明采用的又一种技术方案是：提供一种显示装置，所述显示装置包括抗眩盖板以及显示面板，其中，所述抗眩盖板与所述显示面板的显示面贴合设置；其中，所述抗眩盖板的制造方法包括：洗净所述盖板；采用第一刻蚀液对所述盖板进行预刻蚀，以形成凹凸不平的微结构；在所述进行预刻蚀后的盖板上沉积一层且厚度不均匀的掩膜层；采用第二刻蚀液对所述掩膜层及所述预刻蚀后的盖板进行刻蚀，以制备出具有多个相分离弧形微结构的盖板；所述微结构的形状包括弧形、锥形及圆台状中的至少一种；所述掩膜层为金属、金属氧化物及硅酸盐的一种；每一所述相分离的弧形微结构的表面呈龟裂状，其圆心角为50°~80，且相邻所述相分离的弧形微结构之间存在刻蚀形成的沟壑；所述第一刻蚀液为氢氟酸、磷酸及硫酸的混合酸液，且所述第一刻蚀液的浓度为0.5wt%-1wt%，所述第二刻蚀液为氢氟酸、磷酸及硫酸的混合酸液，且所述第二刻蚀液的浓度为10wt%-20wt%。本发明的有益效果是：区别于现有技术的情况，本发明通过多步刻蚀在盖板上制备出多个相分离的弧形微结构，能够改善盖板在高解析度面板表面的sparkle现象，有利于提升面板阅读的舒适度。
【附图说明】
图1为本发明抗眩盖板的制造方法一实施例的流程示意图；
图2为本发明抗眩盖板的制造过程一实施方式的结构示意图；
图3为本发明抗眩盖板扫在描电子显微镜下的结构示意图；
图4为本发明全高清解析度面板在贴合/未贴合抗眩盖板的显示效果对比示意图；
图5为本发明的表面呈龟裂状的弧形微结构盖板与表面层弧面状微结构盖板光学特性测量对比示意图；
图6本发明显示装置一实施方式的结构示意图。
【具体实施方式】
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅是本发明的一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
请参阅图1及图2，图1为本发明抗眩盖板的制造方法一实施例的流程示意图，图2为本发明抗眩盖板的制造过程一实施方式的结构示意图，该方法包括如下步骤：
S1，洗净盖板。
参阅图2中a），所述的盖板可以为透明材质，具体可以是玻璃、陶瓷基板或者透明塑料等任意形式的基板，此处本发明不做具体限定。
S2，采用第一刻蚀液对盖板进行预刻蚀，以形成凹凸不平的微结构。
将上述洗净后的盖板采用第一刻蚀液进行预刻蚀，在本实施例中，第一刻蚀液可以为氢氟酸、磷酸及硫酸的混合酸液，且浓度可以为0.5wt%-1wt%，在其它实施例中，也可以采用可以腐蚀该盖板的其他浓度的酸液，此处本发明不做进一步限定。其中，在该步骤中，预刻蚀的目的是采用浓度较稀的的刻蚀酸液对盖板进行刻蚀，以使得在盖板表面形成凹凸不平的微结构A。该微结构A的刻蚀痕迹比较浅，其形状可以为弧形、锥形及圆台状中的一种，具体参见图2中b)，其主要是起整体抗眩的效果。
S3，在进行预刻蚀后的盖板上沉积一层且厚度不均匀的掩膜层。
采用蒸镀或者溅镀的方式，在预刻蚀后的盖板上沉积一层厚度不均匀的掩膜层B，当然该掩膜层B的沉积方法不限于上述两种方式，在其它实施例中，还可以采用电化学沉积气相沉积法等等，此处不做具体限定。其中，该掩膜层B材料可以为金属、金属氧化物、硅酸盐或者任何可以和刻蚀液进行反应的材料。
具体地，在盖板不同位置，其掩膜层的厚度均匀性不一且厚度随机分布。具体地，该掩膜层B的厚度范围约为50nm~1μm，在较薄处膜层厚度在50nm-200nm之间，较厚处膜层厚度在500nm-1μm之间，可见在较薄处膜层厚度与较厚处膜层厚度相差较大，具体参见图2中c)。当然，本实施例中的膜层厚度范围只是示意性举例，在其它实施例中，具体可以通过对蒸镀或者溅镀工艺进行控制，例如在蒸镀时可以使用两块不同的掩膜板，使其中一块掩膜板的蒸镀时间较长，保证掩膜层的厚度较厚，另一块掩膜板的蒸镀时间相对较短，掩膜层的厚度较薄，从而以得到需要厚度的掩膜层。
S4，采用第二刻蚀液对掩膜层及预刻蚀后的盖板进行刻蚀，以制备出具有多个相分离的弧形微结构盖板。
再沉积完掩膜层后，采用第二刻蚀液对掩膜层及预刻蚀后的盖板进行刻蚀。其中，第二刻蚀液可以为氢氟酸、磷酸及硫酸的混合酸液，且第二刻蚀液的浓度可以为10wt%-20wt%，在其它实施例中，也可以采用可以腐蚀该盖板的其他浓度的酸液，此处本发明不做进一步限定。
在本实施例中，由于在盖板表面有一层厚度不均匀的掩膜层，刻蚀酸液需要先对掩膜层进行溶解才能刻蚀到盖板表面基材，该掩膜层的厚度不均匀，造成刻蚀酸液在盖板表面蚀刻的时间和蚀刻量不同，且在掩膜层较薄区域刻蚀酸液的蚀刻时间较长，且刻蚀深度较大，掩膜层较厚区域刻蚀酸液的蚀刻时间较短，且蚀刻深度较浅，从而制备出具有多个相分离的弧形微结构盖板，其中该相分离的弧形微结构C具体可以参见图2中的d）。
请进一步参阅图3，图3为本发明抗眩盖板扫在描电子显微镜下的结构示意图。如图3，该盖板相邻的弧形微结构之间存在刻蚀形成的沟壑，完全不同于传统的球状凹面结构，从测量的数据可知，每一弧形微结构的圆心角在50°~80°之间，且每一相分离的弧形微结构表面呈龟裂状，此种结构有利于形成光阱，即使进入的光无法逃出，减弱反射光的强度，并通过表面不平整结构产生漫射，从而达到抗眩的效果。
参阅图4，图4为本发明全高清解析度面板在贴合/未贴合抗眩盖板的显示效果对比示意图。如图4，贴合该抗眩盖板的区域几乎不可见sparkle现象，说明此种形貌抗眩微结构可以很好的改善显示面板的sparkle现象。
请进一步参阅图5，图5为本发明的表面呈龟裂状的弧形微结构盖板与表面层弧面状微结构盖板光学特性测量对比示意图。其中，图5中的a)、b)及c）分别为表面呈龟裂状的弧形微结构盖板与表面层弧面状微结构盖板的反射率、透射率及雾度值的对比示意图。由图可知，表面呈龟裂状的弧形微结构盖板的反射率约为93.61%，透过率约为1.96%，雾度值为71.13%，其中是雾度是指偏离入射光2.5°角以上的透射光强占总透射光强的百分数，雾度越大意味着盖板表面光泽度尤其成像度下降，成像影响轮廓越模糊,抗眩效果越好。再来看表面层弧面状微结构盖板，其反射率约为93%，透过率约为2.05%，雾度值为22.02%。其中，龟裂状微结构盖板的反射率和透过率均略高于球面状微结构盖板，说明龟裂状微结构盖板的光学性能略好于球面状微结构的盖板，龟裂状微结构盖板的雾度值可达远高于球面状微结构盖板的雾度值，说明该龟裂状微结构形貌可以制备出雾度值较高的盖板，具有很好的抗眩效果，利于提升手机在户外的可读性和阅读的舒适性。
上述实施方式中，通过多步刻蚀在盖板上制备出多个相分离的弧形微结构，能够改善盖板在高解析度面板表面的sparkle现象，有利于提升面板阅读的舒适度。
请参阅图6，图6为本发明显示装置一实施方式的结构示意图。该显示装置20包括由上述任一方法所制成的抗眩盖板D，以及显示面板21。其中，该抗眩盖板D与显示面板21的显示面贴合设置，且该抗眩盖板D的制造方法以及使用说明详见上述实施方式中的描述，此处不再赘述。
上述实施方式中，通过多步刻蚀在盖板上制备出多个相分离的弧形微结构，能够改善盖板在高解析度面板表面的sparkle现象，有利于提升面板阅读的舒适度。
综上所述，本领域技术人员容易理解，本发明提供一种抗眩盖板的制造方法及显示装置，通过多步刻蚀在盖板上制备出多个相分离的弧形微结构，能够改善盖板在高解析度面板表面的sparkle现象，有利于提升面板阅读的舒适度。
以上仅为本发明的实施方式，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (17)

  1. 一种抗眩盖板的制造方法，其中，所述方法包括：
    洗净所述盖板；
    采用第一刻蚀液对所述盖板进行预刻蚀，以形成凹凸不平的微结构；
    在所述进行预刻蚀后的盖板上沉积一层且厚度不均匀的掩膜层；
    采用第二刻蚀液对所述掩膜层及所述预刻蚀后的盖板进行刻蚀，以制备出具有多个相分离弧形微结构的盖板；
    其中，所述微结构的形状包括弧形、锥形及圆台状中的至少一种；
    所述掩膜层为金属、金属氧化物及硅酸盐的一种。
  2. 根据权利要求1所述的制造方法，其中，所述掩膜层的厚度为50nm~1μm。
  3. 根据权利要求1所述的制造方法，其中，每一所述相分离的弧形微结构的表面呈龟裂状。
  4. 根据权利要求3所述的制造方法，其中，每一所述相分离的弧形微结构的圆心角为50°~80°。
  5. 根据权利要求3所述的制造方法，其中，相邻所述相分离的弧形微结构之间存在刻蚀形成的沟壑。
  6. 根据权利要求1所述的制造方法，其中，所述第一刻蚀液为氢氟酸、磷酸及硫酸的混合酸液，且所述第一刻蚀液的浓度为0.5wt%-1wt%。
  7. 根据权利要求1所述的制造方法，其中，所述第二刻蚀液为氢氟酸、磷酸及硫酸的混合酸液，且所述第二刻蚀液的浓度为10wt%-20wt%。
  8. 一种抗眩盖板的制造方法，其中，所述方法包括：
    洗净所述盖板；
    采用第一刻蚀液对所述盖板进行预刻蚀，以形成凹凸不平的微结构；
    在所述进行预刻蚀后的盖板上沉积一层且厚度不均匀的掩膜层；
    采用第二刻蚀液对所述掩膜层及所述预刻蚀后的盖板进行刻蚀，以制备出具有多个相分离弧形微结构的盖板。
  9. 根据权利要求8所述的制造方法，其中，所述微结构的形状包括弧形、锥形及圆台状中的至少一种。
  10. 根据权利要求8所述的制造方法，其中，所述掩膜层为金属、金属氧化物及硅酸盐的一种。
  11. 根据权利要求8所述的制造方法，其中，所述掩膜层的厚度为50nm~1μm。
  12. 根据权利要求8所述的制造方法，其中，每一所述相分离的弧形微结构的表面呈龟裂状。
  13. 根据权利要求12所述的制造方法，其中，每一所述相分离的弧形微结构的圆心角为50°~80°。
  14. 根据权利要求12所述的制造方法，其中，相邻所述相分离的弧形微结构之间存在刻蚀形成的沟壑。
  15. 根据权利要求8所述的制造方法，其中，所述第一刻蚀液为氢氟酸、磷酸及硫酸的混合酸液，且所述第一刻蚀液的浓度为0.5wt%-1wt%。
  16. 根据权利要求8所述的制造方法，其中，所述第二刻蚀液为氢氟酸、磷酸及硫酸的混合酸液，且所述第二刻蚀液的浓度为10wt%-20wt%。
  17. 一种显示装置，其中，所述显示装置包括抗眩盖板以及显示面板，其中，所述抗眩盖板与所述显示面板的显示面贴合设置；
    其中，所述抗眩盖板的制造方法包括：
    洗净所述盖板；
    采用第一刻蚀液对所述盖板进行预刻蚀，以形成凹凸不平的微结构；
    在所述进行预刻蚀后的盖板上沉积一层且厚度不均匀的掩膜层；
    采用第二刻蚀液对所述掩膜层及所述预刻蚀后的盖板进行刻蚀，以制备出具有多个相分离弧形微结构的盖板；
    所述微结构的形状包括弧形、锥形及圆台状中的至少一种；
    所述掩膜层为金属、金属氧化物及硅酸盐的一种；
    每一所述相分离的弧形微结构的表面呈龟裂状，其圆心角为50°~80，且相邻所述相分离的弧形微结构之间存在刻蚀形成的沟壑；
    所述第一刻蚀液为氢氟酸、磷酸及硫酸的混合酸液，且所述第一刻蚀液的浓度为0.5wt%-1wt%，所述第二刻蚀液为氢氟酸、磷酸及硫酸的混合酸液，且所述第二刻蚀液的浓度为10wt%-20wt%。
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Families Citing this family (6)

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Publication number Priority date Publication date Assignee Title
CN107817541B (zh) 2017-10-31 2019-09-17 武汉华星光电技术有限公司 抗眩盖板的制作方法
CN107728372B (zh) * 2017-10-31 2020-06-09 武汉华星光电技术有限公司 显示模组及其制作方法
CN107818736B (zh) * 2017-10-31 2019-05-21 武汉华星光电技术有限公司 显示装置的盖板及其制作方法
CN107608013B (zh) * 2017-11-10 2020-04-17 信利光电股份有限公司 一种渐变防眩光盖板及其制作方法、电子设备
CN108983338A (zh) * 2018-08-31 2018-12-11 信利光电股份有限公司 一种显示屏盖板及显示设备
CN110228950B (zh) * 2019-05-22 2021-12-03 湖南天羿领航科技有限公司 一种防眩光玻璃的制备方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102448904A (zh) * 2009-03-31 2012-05-09 康宁股份有限公司 具有防眩光表面的玻璃及其制备方法
KR20120063263A (ko) * 2010-12-07 2012-06-15 현대중공업 주식회사 태양전지의 텍스쳐링 방법
CN103193392A (zh) * 2013-04-11 2013-07-10 友达光电股份有限公司 一种具有防眩功能的玻璃基板的制造方法
CN203901858U (zh) * 2013-12-31 2014-10-29 信利半导体有限公司 一种防眩玻璃、触控盖板及触控装置
CN105906218A (zh) * 2016-04-21 2016-08-31 中国建材国际工程集团有限公司 防眩光玻璃的制备方法
CN105938268A (zh) * 2016-07-05 2016-09-14 武汉华星光电技术有限公司 一种具有抗眩功能的液晶显示面板
CN106032074A (zh) * 2015-03-11 2016-10-19 南昌欧菲光学技术有限公司 显示装置、玻璃盖板及其制作方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4406553B2 (ja) * 2003-11-21 2010-01-27 財団法人神奈川科学技術アカデミー 反射防止膜の製造方法
WO2014011328A1 (en) * 2012-07-09 2014-01-16 Corning Incorporated Anti-glare and anti-sparkle transparent structures
KR101508274B1 (ko) * 2013-06-04 2015-04-07 (주)에스이피 모재의 표면에 마스킹에 의한 돌기 형성 방법 및 장치

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102448904A (zh) * 2009-03-31 2012-05-09 康宁股份有限公司 具有防眩光表面的玻璃及其制备方法
KR20120063263A (ko) * 2010-12-07 2012-06-15 현대중공업 주식회사 태양전지의 텍스쳐링 방법
CN103193392A (zh) * 2013-04-11 2013-07-10 友达光电股份有限公司 一种具有防眩功能的玻璃基板的制造方法
CN203901858U (zh) * 2013-12-31 2014-10-29 信利半导体有限公司 一种防眩玻璃、触控盖板及触控装置
CN106032074A (zh) * 2015-03-11 2016-10-19 南昌欧菲光学技术有限公司 显示装置、玻璃盖板及其制作方法
CN105906218A (zh) * 2016-04-21 2016-08-31 中国建材国际工程集团有限公司 防眩光玻璃的制备方法
CN105938268A (zh) * 2016-07-05 2016-09-14 武汉华星光电技术有限公司 一种具有抗眩功能的液晶显示面板

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