CN107817541B - 抗眩盖板的制作方法 - Google Patents

抗眩盖板的制作方法 Download PDF

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CN107817541B
CN107817541B CN201711043727.8A CN201711043727A CN107817541B CN 107817541 B CN107817541 B CN 107817541B CN 201711043727 A CN201711043727 A CN 201711043727A CN 107817541 B CN107817541 B CN 107817541B
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杨勇
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Wuhan China Star Optoelectronics Technology Co Ltd
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Abstract

本发明提供了一种抗眩盖板的制作方法，其包括步骤：S1、配制包括可交联高分子单体有机物和交联引发剂的交联前驱体溶液；S2、将交联前驱体溶液涂覆在盖板表面，以形成交联前驱体层；S3、对交联前驱体层先后进行预交联处理和交联处理，以在盖板上形成网状交联层；S4、以网状交联层作为掩膜，采用酸液蚀刻盖板，在盖板表面形成抗眩微结构；S5、去除抗眩微结构表面的掩膜，获得抗眩盖板。本发明通过在盖板上制作网状交联层，利用了网状交联层的无序性以及小尺寸的特性，由此获得的抗眩盖板即可具有小尺寸的抗眩微结构，从而表现出闪烁轻微、抗眩效果好的优异性能。克服了传统湿蚀刻工艺无法达到小尺寸抗眩微结构以及光罩工艺较高的制备成本的弊端。

Description

抗眩盖板的制作方法
技术领域
本发明属于液晶显示器制作技术领域，具体来讲，涉及一种抗眩盖板的制作方法。
背景技术
随着液晶显示器的普及，人们在高亮环境中使用液晶显示器常常会受到高亮环境光的困扰；为此，在液晶显示器表面的盖板上进行抗眩抗反射处理来减轻反射光和眩光的影响，越来越成为人们的共识。然而，随着液晶面板解析度的提高，对液晶显示器表面抗眩处理的要求也越来越高，制备微结构颗粒尺寸小、清晰度高、抗眩抗反射效果好的盖板成为一种趋势，这对盖板的表面处理工艺提出了更高的要求。但是，通过传统湿蚀刻工艺制备的抗眩微结构盖板，由于受到蚀刻液浓度及液体张力等工艺本身的影响，致使抗眩微结构盖板表面的微结构尺寸颗粒一般为5μm以上；因此，随着液晶面板解析度的提高，传统湿蚀刻工艺已不能满足微结构的颗粒尺寸要求；若利用光罩工艺进行制备，则存在成本较高的问题，不利于盖板表面处理技术的推广。
因此，如何廉价地制作微结构尺寸颗粒更小的抗眩盖板的方法是亟待解决的问题。
发明内容
为解决上述现有技术存在的问题，本发明提供了一种抗眩盖板的制作方法，该制作方法可以低廉地制作无序的尺寸颗粒低于5μm的抗眩盖板。
为了达到上述发明目的，本发明采用了如下的技术方案：
一种抗眩盖板的制作方法，包括步骤：
S1、配制交联前驱体溶液；其中，所述交联前驱体溶液为有机溶剂溶解的可交联高分子单体有机物和交联引发剂形成的有机溶液；
S2、将所述交联前驱体溶液涂覆在盖板表面，以形成交联前驱体层；
S3、对所述交联前驱体层先后进行预交联处理和交联处理，以在所述盖板上形成网状交联层；
S4、以所述网状交联层作为掩膜，采用酸液蚀刻所述盖板，在所述盖板表面形成抗眩微结构；
S5、去除所述抗眩微结构表面的掩膜，获得抗眩盖板。
进一步地，在所述步骤S3中，在所述盖板上形成所述网状交联层后，还将具有所述网状交联层的盖板浸入溶胀剂中，以使所述网状交联层发生溶胀。
进一步地，在所述交联前驱体溶液中，所述可交联高分子单体有机物的物质的量浓度为10-4mol/L～10-2mol/L。
进一步地，所述可交联高分子单体有机物包括环氧乙烷类单体、甲基丙烯酸甲酯类单体、苯乙烯类单体、硅氧烷类单体。
进一步地，所述交联引发剂为光引发剂或热引发剂。
进一步地，在所述交联前驱体溶液中，所述交联引发剂的物质的量浓度为10-8mol/L～10-6mol/L。
进一步地，当所述交联引发剂为光引发剂时，所述步骤S3的具体方法包括：
采用紫外光照射所述交联前驱体层，使所述交联前驱体层发生预交联反应；
增加紫外光照射剂量继续照射所述交联前驱体层，使所述交联前驱体层继续发生交联反应，在所述盖板上形成所述网状交联层；
当所述交联引发剂为热引发剂时，所述步骤S3的具体方法包括：
加热具有所述交联前驱体层的盖板，使所述交联前驱体层发生预交联反应；
升高加热温度继续加热具有所述交联前驱体层的盖板，使所述交联前驱体层继续发生交联反应，在所述盖板上形成所述网状交联层。
进一步地，所述交联前驱体层继续发生交联反应至交联度大于90％，在所述盖板上形成所述网状交联层。
进一步地，在所述步骤S4中，所述酸液中氢离子的质量浓度为5％～10％。
进一步地，在所述步骤S5中，去除所述抗眩微结构表面的掩膜的具体方法包括：采用紫外线或X射线照射具有所述抗眩微结构的盖板表面，以破坏所述网状交联层中的交联结构；去除所述抗眩微结构表面的结构被破坏的网状交联层。
本发明通过在盖板上制作网状交联层，并以该网状交联层作为掩膜，继而蚀刻该盖板并去除掩膜即可获得抗眩盖板；根据本发明的抗眩盖板的制作方法利用了网状交联层的无序性以及小尺寸的特性，由此获得的抗眩盖板即可具有小尺寸的抗眩微结构，从而表现出闪烁轻微、抗眩效果好的优异性能。相比现有技术中的抗眩盖板的一般制作方法，不仅克服了传统湿蚀刻工艺无法达到小尺寸抗眩微结构的弊端，而且避免了光罩工艺较高的制备成本的弊端。
附图说明
通过结合附图进行的以下描述，本发明的实施例的上述和其它方面、特点和优点将变得更加清楚，附图中：
图1是根据本发明的实施例的抗眩盖板的制作方法的步骤流程图；
图2-图7是根据本发明的实施例的的抗眩盖板的制作方法的工艺流程图。
具体实施方式
以下，将参照附图来详细描述本发明的实施例。然而，可以以许多不同的形式来实施本发明，并且本发明不应该被解释为限制于这里阐述的具体实施例。相反，提供这些实施例是为了解释本发明的原理及其实际应用，从而使本领域的其他技术人员能够理解本发明的各种实施例和适合于特定预期应用的各种修改。在附图中，为了清楚起见，可以夸大元件的形状和尺寸，并且相同的标号将始终被用于表示相同或相似的元件。
本发明提供了一种抗眩盖板的制作方法，以下将参照实施例来详细描述该抗眩盖板的制作方法。
参照图1，根据本实施例的抗眩盖板的制作方法包括下述步骤：
步骤S1、配制交联前驱体溶液。
具体来讲，该交联前驱体溶液是以有机溶剂溶解可交联高分子单体有机物和交联引发剂所形成的有机溶液。
一般地，在该交联前驱体溶液中，控制可交联高分子单体有机物的物质的量浓度为10-4mol/L～10-2mol/L即可；且该可交联高分子单体有机物包括环氧乙烷类单体、甲基丙烯酸甲酯类单体、苯乙烯类单体、硅氧烷类单体，也就是说，可交联高分子单体有机物可以是环氧乙烷及其衍生物、甲基丙烯酸甲酯及其衍生物、苯乙烯及其衍生物、或硅氧烷及其衍生物等可以在交联引发剂的作用下发生交联反应、继而形成网状交联聚合物的有机小分子单体。
优选地，交联引发剂可以是光引发剂或热引发剂。
更为优选地，一般控制交联前驱体溶液中的交联引发剂的含量为微克级即可；即交联前驱体溶液中的交联引发剂的物质的量浓度控制为10-8mol/L～10-6mol/L即可。
步骤S2、将交联前驱体溶液涂覆在盖板11表面，以形成交联前驱体层12；如图2所示。
步骤S3、对交联前驱体层12先后进行预交联处理和交联处理，以在盖板11上形成网状交联层13；如图3所示。
基于通过交联所形成的网状交联层13的作用在于作为后续蚀刻工艺中的掩膜，因此网状交联层13内部的孔洞大小及形状即决定了预制作的抗眩盖板表面的抗眩微结构的大小和形状；由此需要先行通过预交联来控制交联度，从而控制掩膜的形貌。
具体来讲，若交联引发剂为光引发剂，则该步骤的具体方法为：(a)采用紫外光照射交联前驱体层12，使交联前驱体层12发生预交联反应；(b)增加紫外光照射剂量继续照射交联前驱体层12，使交联前驱体层12继续发生交联反应，在盖板1上形成网状交联层13。
若交联引发剂为热引发剂，则该步骤的具体方法为：(A)加热具有交联前驱体层12的盖板11，使交联前驱体层11发生预交联反应；(B)升高加热温度继续加热具有交联前驱体层12的盖板11，使交联前驱体层12继续发生交联反应，在盖板11上形成网状交联层13。
更为具体地，一般认为交联前驱体层12继续发生交联反应至交联度大于90％即可在盖板11上形成网状交联层13。
步骤S4、以网状交联层13作为掩膜，采用酸液蚀刻盖板11，在盖板11表面形成抗眩微结构1a；如图4所示。
具体来讲，酸液中氢离子的质量浓度为5％～10％；优选地，该酸液为质量比为10:1:1的氢氟酸、硫酸和磷酸的混合酸液。
一般来讲，通过控制蚀刻酸液的浓度和/或蚀刻速率来获得不同尺寸的抗眩微结构1a。
步骤S5、去除抗眩微结构1a表面的掩膜，获得抗眩盖板1；如图5所示。
具体地，去除抗眩微结构1a表面的掩膜网状交联层13的具体方法包括：(1)采用紫外线或X射线照射具有抗眩微结构1a的盖板11表面，以破坏网状交联层13中的交联结构，打断分子间的化学键；(2)去除抗眩微结构1a表面的结构被破坏的网状交联层。
综上可以看出，抗眩盖板1中抗眩微结构1a的尺寸及形状由网状交联层13内部的空隙决定，由此值得说明的是，其一，若预制作较小尺寸的抗眩微结构1a，则控制交联前驱体溶液中可交联高分子单体有机物的浓度偏大，而若预制作较大尺寸的抗眩微结构1a，则控制交联前驱体溶液中可交联高分子单体有机物的浓度偏小即可；其二，通过上述预交联控制交联度，具体可通过紫外光的合适波长、照射时间或通过加热温度、加热时间等来控制；其三，若经过交联形成的网状交联层13的空隙尺寸仍偏大，则优选将具有网状交联层13的盖板11浸入溶胀剂中，以使网状交联层13发生溶胀，如此即可缩小该网状交联层13的空隙，以形成较小尺寸的抗眩微结构1a，如图6和图7所示。
虽然已经参照特定实施例示出并描述了本发明，但是本领域的技术人员将理解：在不脱离由权利要求及其等同物限定的本发明的精神和范围的情况下，可在此进行形式和细节上的各种变化。

Claims (10)

1.一种抗眩盖板的制作方法，其特征在于，包括步骤：
S1、配制交联前驱体溶液；其中，所述交联前驱体溶液为有机溶剂溶解的可交联高分子单体有机物和交联引发剂形成的有机溶液；
S2、将所述交联前驱体溶液涂覆在盖板表面，以形成交联前驱体层；
S3、对所述交联前驱体层先后进行预交联处理和交联处理，以在所述盖板上形成网状交联层；
S4、以所述网状交联层作为掩膜，采用酸液蚀刻所述盖板，在所述盖板表面形成抗眩微结构；
S5、去除所述抗眩微结构表面的掩膜，获得抗眩盖板。
2.根据权利要求1所述的制作方法，其特征在于，在所述步骤S3中，在所述盖板上形成所述网状交联层后，还将具有所述网状交联层的盖板浸入溶胀剂中，以使所述网状交联层发生溶胀。
3.根据权利要求1或2所述的制作方法，其特征在于，在所述交联前驱体溶液中，所述可交联高分子单体有机物的物质的量浓度为10-4mol/L～10-2mol/L。
4.根据权利要求3所述的制作方法，其特征在于，所述可交联高分子单体有机物包括环氧乙烷类单体、甲基丙烯酸甲酯类单体、苯乙烯类单体、硅氧烷类单体。
5.根据权利要求1或2所述的制作方法，其特征在于，所述交联引发剂为光引发剂或热引发剂。
6.根据权利要求5所述的制作方法，其特征在于，在所述交联前驱体溶液中，所述交联引发剂的物质的量浓度为10-8mol/L～10-6mol/L。
7.根据权利要求5所述的制作方法，其特征在于，当所述交联引发剂为光引发剂时，所述步骤S3的具体方法包括：
采用紫外光照射所述交联前驱体层，使所述交联前驱体层发生预交联反应；
增加紫外光照射剂量继续照射所述交联前驱体层，使所述交联前驱体层继续发生交联反应，在所述盖板上形成所述网状交联层；
当所述交联引发剂为热引发剂时，所述步骤S3的具体方法包括：
加热具有所述交联前驱体层的盖板，使所述交联前驱体层发生预交联反应；
升高加热温度继续加热具有所述交联前驱体层的盖板，使所述交联前驱体层继续发生交联反应，在所述盖板上形成所述网状交联层。
8.根据权利要求7所述的制作方法，其特征在于，所述交联前驱体层继续发生交联反应至交联度大于90％，在所述盖板上形成所述网状交联层。
9.根据权利要求1或2所述的制作方法，其特征在于，在所述步骤S4中，所述酸液为质量比为10:1:1的氢氟酸、硫酸和磷酸的混合酸液。
10.根据权利要求1或2所述的制作方法，其特征在于，在所述步骤S5中，去除所述抗眩微结构表面的掩膜的具体方法包括：
采用紫外线或X射线照射具有所述抗眩微结构的盖板表面，以破坏所述网状交联层中的交联结构；
去除所述抗眩微结构表面的结构被破坏的网状交联层。
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