WO2018146841A1 - めっき液、及び、めっき製品の製造方法 - Google Patents

めっき液、及び、めっき製品の製造方法 Download PDF

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Publication number
WO2018146841A1
WO2018146841A1 PCT/JP2017/030445 JP2017030445W WO2018146841A1 WO 2018146841 A1 WO2018146841 A1 WO 2018146841A1 JP 2017030445 W JP2017030445 W JP 2017030445W WO 2018146841 A1 WO2018146841 A1 WO 2018146841A1
Authority
WO
WIPO (PCT)
Prior art keywords
plating
mol
plating solution
chromium
concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2017/030445
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
縄舟　秀美
西脇　宏
敏一 村田
秀浩 吉岡
美幸 亀川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuso Company Ltd
Fuso Co Ltd
Techno Roll Co Ltd
Original Assignee
Fuso Company Ltd
Fuso Co Ltd
Techno Roll Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuso Company Ltd, Fuso Co Ltd, Techno Roll Co Ltd filed Critical Fuso Company Ltd
Priority to EP17800356.2A priority Critical patent/EP3388558A1/en
Priority to US15/576,892 priority patent/US20200040477A1/en
Priority to KR1020177033982A priority patent/KR20190115481A/ko
Publication of WO2018146841A1 publication Critical patent/WO2018146841A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used

Definitions

  • a base plating step of applying a base plating to the preprocessed product between the pretreatment step and the plating step, or a preprocessed product (hereinafter, An intermediate plating step of further applying intermediate plating to the “underplating product” may be performed.
  • trivalent chromium plating is performed as finish plating for a product subjected to intermediate plating (hereinafter also referred to as “intermediate plating product”).
  • the current density is 2 A / dm 2 or more and 20 A / dm 2 or less.
  • the current density is more preferably 2A / dm 2 or more 15A / dm 2 or less, and particularly preferably 2A / dm 2 or more 13A / dm 2 or less.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
PCT/JP2017/030445 2017-02-08 2017-08-25 めっき液、及び、めっき製品の製造方法 Ceased WO2018146841A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP17800356.2A EP3388558A1 (en) 2017-02-08 2017-08-25 Metal plating solution and method for producing metal plated product
US15/576,892 US20200040477A1 (en) 2017-02-08 2017-08-25 Plating solution and method for producing plated product
KR1020177033982A KR20190115481A (ko) 2017-02-08 2017-08-25 도금액, 및 도금 제품의 제조 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017021006A JP6547232B2 (ja) 2017-02-08 2017-02-08 めっき液ならびにめっき製品の製造方法
JP2017-021006 2017-02-08

Publications (1)

Publication Number Publication Date
WO2018146841A1 true WO2018146841A1 (ja) 2018-08-16

Family

ID=63107327

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2017/030445 Ceased WO2018146841A1 (ja) 2017-02-08 2017-08-25 めっき液、及び、めっき製品の製造方法

Country Status (6)

Country Link
US (1) US20200040477A1 (https=)
EP (1) EP3388558A1 (https=)
JP (1) JP6547232B2 (https=)
KR (1) KR20190115481A (https=)
TW (1) TW201835387A (https=)
WO (1) WO2018146841A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA3090378C (en) * 2018-02-09 2022-08-30 Nippon Steel Corporation Steel sheet for containers and method for producing steel sheet for containers
JP6624400B1 (ja) * 2018-07-04 2019-12-25 株式会社大都技研 遊技台
CN117488300B (zh) 2024-01-02 2024-03-29 仪征亚新科双环活塞环有限公司 一种具有硬质镀层的活塞环及其制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000249340A (ja) 1999-02-25 2000-09-12 Ngk Spark Plug Co Ltd グロープラグ及びその製造方法
JP2011099126A (ja) * 2008-01-24 2011-05-19 Okuno Chemical Industries Co Ltd ３価クロムめっき浴
JP2016113662A (ja) * 2014-12-15 2016-06-23 株式会社Ｊｃｕ ３価クロムめっき液および３価クロムめっき方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000249340A (ja) 1999-02-25 2000-09-12 Ngk Spark Plug Co Ltd グロープラグ及びその製造方法
JP2011099126A (ja) * 2008-01-24 2011-05-19 Okuno Chemical Industries Co Ltd ３価クロムめっき浴
JP2016113662A (ja) * 2014-12-15 2016-06-23 株式会社Ｊｃｕ ３価クロムめっき液および３価クロムめっき方法

Also Published As

Publication number Publication date
US20200040477A1 (en) 2020-02-06
TW201835387A (zh) 2018-10-01
KR20190115481A (ko) 2019-10-14
JP2018127667A (ja) 2018-08-16
JP6547232B2 (ja) 2019-07-24
EP3388558A1 (en) 2018-10-17

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