WO2018130004A1 - 触控基板及其制备方法、显示装置 - Google Patents

触控基板及其制备方法、显示装置 Download PDF

Info

Publication number
WO2018130004A1
WO2018130004A1 PCT/CN2017/111836 CN2017111836W WO2018130004A1 WO 2018130004 A1 WO2018130004 A1 WO 2018130004A1 CN 2017111836 W CN2017111836 W CN 2017111836W WO 2018130004 A1 WO2018130004 A1 WO 2018130004A1
Authority
WO
WIPO (PCT)
Prior art keywords
touch
substrate
filler
refractive index
touch electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2017/111836
Other languages
English (en)
French (fr)
Inventor
操彬彬
曹可
艾力
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd, Hefei Xinsheng Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to US15/780,342 priority Critical patent/US11132092B2/en
Publication of WO2018130004A1 publication Critical patent/WO2018130004A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • the present disclosure relates to the field of display technologies, and in particular, to a touch substrate, a method for fabricating the same, and a display device.
  • Touch technology has been widely used in various display modes. Compared to a conventional display that only provides display functions, a touch display panel enables information interaction between the user and the display control host. Therefore, the touch display panel can completely or partially replace the commonly used input device, so that the display panel can not only display but also touch control.
  • a widely used touch display panel is a capacitive touch display panel. According to the relative positions of the capacitive touch unit and the array substrate (TFT substrate) and the package substrate in the display panel, there are three types of embedded, external, and external types.
  • An embodiment of the present disclosure provides a touch substrate, including:
  • a touch electrode layer is disposed on the substrate, and the touch electrode layer includes a plurality of touch electrodes
  • a filler disposed between any two adjacent touch electrodes of the touch electrode layer, wherein the orthographic projection of the filler on the substrate is at least partially located at two adjacent touch electrodes Between the orthographic projections of the substrate;
  • the filler has a refractive index n 3
  • the substrate has a refractive index n 1
  • the touch electrode has a refractive index n 2
  • the refractive index n 3 of the filler is equal to the refractive index n 2 of the touch electrode.
  • the filler completely fills a gap between each of the touch electrodes.
  • the material of the filler comprises a semiconductor material.
  • the touch electrode is formed by conversion of the semiconductor material, and the plurality of touches The control electrode and the filler are integrally formed.
  • the semiconductor material is an oxide semiconductor material.
  • the touch substrate further includes: a cover layer covering the touch electrode layer and the filler; wherein the cover layer has the same material as the filler.
  • Embodiments of the present disclosure provide a method of fabricating a touch substrate, including:
  • orthographic projection of the filler on the substrate is at least partially located between two adjacent touch electrodes at an orthographic projection of the substrate
  • the filler has a refractive index n 3
  • the substrate has a refractive index n 1
  • the touch electrode has a refractive index n 2
  • the refractive index n 3 of the filler is equal to the refractive index n 2 of the touch electrode.
  • the filler completely fills a gap between each of the touch electrodes.
  • the material of the filler includes a semiconductor material; the step of forming a touch electrode layer on the substrate; and forming a filler between any two adjacent touch electrodes of the touch electrode layer, specifically include:
  • the remaining photoresist is removed.
  • the semiconductor material is an oxide semiconductor material.
  • the method further includes: forming a cover layer covering the touch electrode layer and the filler; wherein the cover layer has the same material as the filler.
  • Embodiments of the present disclosure provide a display device including the touch substrate described above.
  • FIG. 1 is a top plan view of a touch substrate according to some embodiments of the present disclosure.
  • FIG. 2 is a cross-sectional view of an alternative implementation of a touch substrate according to some embodiments of the present disclosure
  • FIG. 3 is a top view of an alternative implementation of the touch substrate of some embodiments of the present disclosure Figure
  • FIG. 4 is a flow chart of a method of fabricating a touch substrate according to some embodiments of the present disclosure
  • FIG. 5 is a cross-sectional view of a touch substrate provided by some embodiments of the present disclosure.
  • the so-called equal and identical descriptions refer to substantially equal, substantially identical, which may be identical in value, or may be within an acceptable error range, such as a difference not higher than 10%, for example, the difference is not higher than 5%, for example, the difference is not higher than 2%.
  • some in-cell and all-embedded touch panels generally use a single-layer transparent conductive film as a signal transmitting or receiving unit, and the transparent conductive film may be indium tin oxide (ITO) or the like.
  • ITO indium tin oxide
  • the conductive film must be divided into independent units and form a periodic arrangement.
  • the pixels in the display panel are also periodically arranged, and the two periodic pattern overlays are easy to form moiré patterns (the moiré pattern is mainly caused by interference of two periodic patterns in spatial position). For example, irregular images appear when shooting a computer monitor using a camera, which brings inconvenience to the user.
  • the conductive film is a separate unit, there is a gap between the two units, and the gap position is a glass substrate, the refractive index of the glass substrate is about 1.52, and the refractive index of the conductive film is about 1.9-2.0.
  • the refractive index difference between the glass substrate and the conductive film is large, and thus the display effect is affected.
  • an embodiment of the present disclosure provides a touch substrate including a substrate 10 .
  • the touch electrode layer is disposed on the substrate 10 , and the touch electrode layer includes a plurality of touch electrodes 11 .
  • a filler 12 is disposed between any two adjacent touch electrodes 11 of the touch electrode layer.
  • the orthographic projection of the filler 12 on the substrate 10 is at least partially located between the two adjacent touch electrodes 11 in the touch electrode layer between the orthographic projections of the substrate.
  • the filler 12 has a refractive index n 3
  • the substrate 10 has a refractive index n 1
  • the touch electrode 11 has a refractive index n 2 , and
  • the plurality of touch electrodes are self-capacitance touch electrodes disposed on the same layer to form a touch electrode layer.
  • the plurality of touch electrodes are mutual capacitance touch electrodes, and the same layer is disposed Placed to form a touch electrode layer.
  • the position at which the two electrodes intersect (the bridge is formed by insulating layer isolation, for example, can be isolated by the filler in the embodiment of the present disclosure) constitutes a capacitance for touch detection, and the two electrodes that intersect form the two poles of the capacitor.
  • the plurality of touch electrodes are mutual capacitance electrodes disposed in different layers, and in the same touch electrode layer, a filler is disposed between any two adjacent touch electrodes.
  • a plurality of touch electrodes are used as the receiving electrode Rx to form a touch electrode layer.
  • a filler is disposed between any two adjacent touch electrodes; and a plurality of touch electrodes are formed as the emitter electrode Tx.
  • a touch electrode layer is provided with a filler between any two adjacent touch electrodes in the touch electrode layer.
  • the orthographic projection of the filler 12 on the substrate 10 is at least partially located between the two adjacent touch electrodes 11 in the touch electrode layer between the orthographic projections of the substrate, for example, the filler 12 may be located.
  • the gap between the two adjacent touch electrodes 11 is not completely filled, that is, the adjacent projection electrodes 11 of the filler 12 in the front projection portion of the substrate 10 in the touch electrode layer are between the orthographic projections of the substrate.
  • the orthographic projection of the filler 12 on the substrate 10 and the orthographic projection of the touch electrode 11 on the substrate are not adjacent; for example, the filler 12 may be located in a gap between two adjacent touch electrodes 11 to be completely filled, that is, the filler 12 orthographic projection of the substrate 10 in the touch electrode layer between two adjacent touch electrodes 11 between the orthographic projections of the substrate, and the orthographic projection of the filler 12 on the substrate 10 and the orthographic projection of the touch electrode 11 on the substrate
  • the filler 12 may be located in a gap between two adjacent touch electrodes 11 , completely filled, and partially extended to the position of the touch electrode, that is, the orthographic projection of the filler 12 on the substrate 10 and the touch electrode. 11 is partially coincident with the orthographic projection of the substrate.
  • the substrate 10 of the touch substrate is usually made of glass, and the touch electrodes are made of optical glue or the like.
  • the materials such as optical glue and the glass material have similar refractive indexes, and the refractive index of the touch electrode 11 The difference is large, which makes the etching circuit more obvious and affects the user's viewing effect.
  • the filler 12 is disposed between the touch electrodes 11 , and the refractive index of the filler 12 is n 3 , the refractive index of the substrate 10 is n 1 , and the refractive index of the touch electrode 11 Is n 2 , and the relationship of the refractive indices of the three satisfies
  • the difference in refractive index between the two materials determines the reflectance at the interface, and the refractive index of the filler 12 is not much different from the refractive index of the touch electrode 11, the shadow elimination effect of the touch substrate in the embodiment of the present disclosure better.
  • the filling material 12 in the refractive index n 3 equal to the refractive index of the touch electrode 11 is n 2.
  • the touch electrode 11 and the adjacent filler 12 have the same refractive index, the reflectance of the upper surface of the touch electrode 11 and the adjacent filler 12 is also the same, so that a good elimination can be achieved. Shadow effect.
  • the filler 12 completely fills the gap between the respective touch electrodes 11. In this embodiment, there will be no exposed substrate 10 between the respective touch electrodes 11, so the effect is better.
  • the filler 12 is made of a semiconductor material
  • the touch electrode 11 is formed by conversion of the same semiconductor material as the filler 12, and the plurality of contacts
  • the control electrode 11 and the filler 12 are integrally formed. That is, in the touch electrode layer, the touch electrode 11 and the filler 12 constitute a whole layer structure. Therefore, the touch substrate of the embodiment is applied to the touch panel, and the periodic arrangement of the pixels in the display panel and the periodic arrangement of the touch electrodes 11 and the moiré formed by the superposition of the two patterns are effectively avoided.
  • the touch electrode 11 is formed by semiconductor material conversion (for example, doping ions or plasma treatment of the semiconductor material to achieve electrical conduction), the refractive index of the touch electrode 11 is equivalent to the refractive index of the filler 12, so The effect is good.
  • the semiconductor material may be selected from an oxide semiconductor material, and further may include indium gallium tin oxide (IGZO), indium zinc oxide (IZO), or the like. Of course, it is not limited to these materials, and other semiconductor materials can also be used.
  • IGZO indium gallium tin oxide
  • IZO indium zinc oxide
  • the plurality of touch electrodes 11 are arranged in a matrix, which is advantageous for detecting the touch points.
  • the touch substrate further includes a cover layer 13 covering the touch electrode layer formed by the touch electrode 11 and the filler 12;
  • the material of the cover layer 13 is the same as the material of the filler 12.
  • the filler 12 and the cover layer 13 can be made using the same material.
  • the filler 12 and the cover layer 13 can also be formed in the same process step.
  • the filler 12 and the cover layer 13 may be formed using deposition or sputtering. Therefore, the cover layer 13 can not only further improve the shadow elimination effect of the touch substrate, but also provide a planarized surface, which is advantageous for simplifying the subsequent fabrication process of the touch substrate.
  • Embodiments of the present disclosure provide a method of fabricating a touch substrate, which can be used to prepare the touch substrate described above.
  • the preparation method includes: forming a plurality of touch electrodes 11 as a touch electrode layer on the substrate 10, and forming a filler 12 between any two adjacent touch electrodes 11 of the touch electrode layer;
  • orthographic projection of the filler 12 on the substrate 10 is at least partially located between two adjacent touch electrodes 11 between the orthographic projections of the substrate 10;
  • the filler has a refractive index n 3
  • the substrate has a refractive index n 1
  • the touch electrode has a refractive index n 2
  • the substrate 10 in the touch substrate is usually made of glass, and the refractive index thereof is different from the refractive index of the touch electrode 11, so that the etching circuit is relatively obvious, which affects the user's viewing effect.
  • a filler 12 is disposed between the touch electrodes 11 , and the refractive index of the filler 12 is n 3 , the refractive index of the substrate 10 is n 1 , and the refractive index of the touch electrode 11 is n.
  • the difference in refractive index between the filler 12 and the touch electrode 11 is smaller than the substrate 10 and the touch electrode
  • the difference in refractive index between the filler 12 and the touch electrode 11 is smaller than the substrate 10 and the touch electrode
  • the filling material 12 in the refractive index n 3 equal to the refractive index of the touch electrode 11 is n 2.
  • the touch electrode 11 and the adjacent filler 12 have the same refractive index. Therefore, the reflectance of the upper surface of the touch electrode 11 and the adjacent filler 12 is also the same, so that a good image-removing effect can be achieved.
  • the filler 12 completely fills the gap between the touch electrodes 11 , that is, the bare substrate 10 will not exist between the touch electrodes 11 at this time, so the effect is better. .
  • the filler 12 is made of a semiconductor material
  • the touch electrode 11 is formed by converting the same semiconductor material as the filler 12 so that each of the touch electrodes 11 and the filler 12 are integrally formed. .
  • the preparation method of the touch substrate in this case will be described below in conjunction with a specific preparation method.
  • the method for preparing the touch substrate specifically includes the following steps:
  • Step 401 sequentially forming a semiconductor material layer and a photoresist layer on the substrate 10.
  • a layer of semiconductor material may be deposited on the substrate 10 and a layer of photoresist applied to the layer of semiconductor material as described above.
  • the semiconductor material is a transparent oxide semiconductor material or a metal oxide, and specifically may be indium gallium tin oxide (IGZO), indium zinc oxide (IZO), or the like. Of course, it is not limited to these materials, and other semiconductor materials can also be used.
  • IGZO indium gallium tin oxide
  • IZO indium zinc oxide
  • Step 402 Exposing and developing the photoresist layer to remove the photoresist corresponding to the plurality of electrode regions Q1, thereby exposing the semiconductor material corresponding to the plurality of electrode regions. At this time, the photoresist is still covered on the semiconductor material corresponding to the filler region.
  • Step 403 performing plasma processing or ion implantation on the semiconductor material in the plurality of electrode regions Q1 to form a plurality of touch electrodes 11 of the touch electrode layer; and retaining the plurality of electrode regions Q1
  • a semiconductor material other than the filler 12 is formed to form a filler 12 between any two adjacent touch electrodes 11.
  • the photoresist is still covered on the semiconductor material of the semiconductor region, and the photoresist is equivalent to a mask. Since the semiconductor material of the electrode region Q1 is exposed, the semiconductor material of the electrode region Q1 can be converted into a conductor material by plasma treatment or ion implantation, that is, the touch electrode 11 is formed in the semiconductor region.
  • the gas used is N 2, CF 4, H 2 or NH 3.
  • the semiconductor material is converted by ion implantation, and the ion implantation source is hydrogen ions.
  • Step 404 removing the remaining photoresist to complete the preparation of the touch substrate.
  • the touch electrodes 11 are formed by converting the same semiconductor material as the filler 12 such that the touch electrodes 11 and the filler 12 are integrally formed. That is, in the touch electrode layer, the touch electrode 11 and the filler 12 are formed in a whole layer structure. Therefore, the touch substrate can be applied to the touch panel, thereby effectively avoiding periodic arrangement of pixels in the display panel. And the touch electrodes 11 are periodically arranged, and the two patterns are superimposed to form a moiré. At the same time, since the touch electrode 11 is formed by conversion of a semiconductor material, the refractive index of the touch electrode 11 and the filler 12 are equivalent, so that the image removal effect is good.
  • the embodiment of the present disclosure further provides a display device including the touch substrate in Embodiment 1.
  • a filler 12 is disposed between each of the touch electrodes 11, and the refractive index of the filler 12 is n 3 , the refractive index of the substrate 10 is n 1 , and the refractive index of the touch electrode 11 Is n 2 , and the relationship of the refractive indices of the three meets
  • the subtractive effect of the touch substrate in this embodiment is relatively small. it is good.
  • the display device of the embodiment may be any product or component having a display function, such as a liquid crystal panel, an OLED panel, an electronic paper, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.
  • a display function such as a liquid crystal panel, an OLED panel, an electronic paper, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)
  • Laminated Bodies (AREA)

Abstract

本公开实施例提供一种触控基板及其制备方法、显示装置。本公开实施例的触控基板包括基底，在所述基底上设置有触控电极层，触控电极层包括多个触控电极，在所述触控电极层的任意两相邻的所述触控电极之间设置填充物，所述填充物在所述基底的正投影至少部分位于两相邻的所述触控电极在基底的正投影之间；其中，所述填充物的折射率为n3，所述基底的折射率为n1，所述触控电极的折射率为n2，且|n2-n3|＜|n2-n1|。图1

Description

触控基板及其制备方法、显示装置
相关申请的交叉引用
本申请要求保护在2017年1月13日提交的申请号为201710025532.4的中国专利申请的优先权，该申请的全部内容以引用的方式结合到本文中。
技术领域
本公开属于显示技术领域，具体涉及一种触控基板及其制备方法、显示装置。
背景技术
触控技术已经广泛应用于各种显示模式。与仅提供显示功能的传统显示器比较，带有触控功能的显示面板能够使用户和显示控制主机之间进行信息交互。因此触控显示面板可以完全或者部分取代常用的输入装置，使得显示面板不仅能够显示还可以触控控制。
目前应用广泛的触控显示面板为电容触控显示面板。按照电容触控单元与显示面板中阵列基板(TFT基板)和封装基板的相对位置，包括内嵌式、外嵌式和外挂式三种类型。
发明内容
本公开的实施例提供了一种触控基板，包括：
基底；
触控电极层，设置在所述基底上，所述触控电极层包括多个触控电极；
填充物，设置在在所述触控电极层的任意两相邻的所述触控电极之间，所述填充物在所述基底的正投影至少部分位于两相邻的所述触控电极在基底的正投影之间；
其中，所述填充物的折射率为n3，所述基底的折射率为n1，所述触控电极的折射率为n2，且|n2-n3|＜|n2-n1|。
可选的是，所述填充物的折射率n3等于所述触控电极的折射率n2。
可选的是，所述填充物将各个所述触控电极之间的间隙完全填充。
可选的是，所述填充物的材料包括半导体材料。
可选的是，所述触控电极由所述半导体材料转换形成，并且所述多个触 控电极与所述填充物为一体成型结构。
可选的是，所述半导体材料为氧化物半导体材料。
可选的是，所述触控基板进一步包括：覆盖所述触控电极层和所述填充物的覆盖层；其中，所述覆盖层的材料与所述填充物的材料相同。
本公开的实施例提供了一种触控基板的制备方法，其包括：
在基底上形成触控电极层，以及
在触控电极层的任意两相邻的触控电极之间形成填充物；
其中，所述填充物在所述基底的正投影至少部分位于两相邻的所述触控电极在基底的正投影之间；
其中，所述填充物的折射率为n3，所述基底的折射率为n1，所述触控电极的折射率为n2，且|n2-n3|＜|n2-n1|。
可选的是，所述填充物的折射率n3等于所述触控电极的折射率n2。
可选的是，所述填充物将各个所述触控电极之间的间隙完全填充。
可选的是，所述填充物的材料包括半导体材料；所述在基底上形成触控电极层，以及在触控电极层的任意两相邻的触控电极之间形成填充物的步骤，具体包括：
在所述基底上依次形成半导体材料层和光刻胶层；
对光刻胶层进行曝光、显影，去除与多个电极区对应的光刻胶；
对所述多个电极区中的半导体材料进行等离子体处理或者离子注入，形成触控电极层的多个触控电极；保留所述多个电极区以外的半导体材料，以形成位于触控电极层的任意两相邻的触控电极之间的填充物；以及
去除剩余的光刻胶。
可选的是，所述半导体材料为氧化物半导体材料。
可选的是，所述方法还包括：形成覆盖所述触控电极层和所述填充物的覆盖层；其中，所述覆盖层的材料与所述填充物的材料相同。
本公开的实施例提供了一种显示装置，其包括上述的触控基板。
附图说明
图1为本公开的一些实施例的触控基板的俯视图；
图2为本公开的一些实施例的触控基板的一种可选的实现方式的截面图；
图3为本公开的一些实施例的触控基板的一种可选的实现方式的俯视 图；
图4为本公开的一些实施例的触控基板的制备方法的流程图；以及
图5为本公开的一些实施例提供的触控基板的截面图。
具体实施方式
下面将结合本公开实施例中的附图，对本公开实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本公开一部分实施例，而不是全部的实施例。基于本公开中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本公开专利保护的范围。
在下述实施例中，所称的相等、相同的描述指的是实质相等、实质相同，其可以是在数值上完全一样，也可以是在可接受的误差范围内一样，例如差值不高于10％，例如差值不高于5％，例如差值不高于2％等。
在发明人所知的技术中，部分内嵌式和全部外嵌式的触控面板通常使用单层的透明导电薄膜作为信号发射或者接收单元，该透明导电薄膜可以是氧化铟锡(ITO)等。为了实现触控功能，该导电薄膜必须分为独立的单元，并且形成周期性的排布。此外，显示面板内的像素也是周期性排布，这两种周期性的图形叠加很容易形成摩尔纹(摩尔纹主要是由两种周期性的图形在空间位置上发生干涉造成的一种现象，例如使用相机拍摄电脑显示器时会出现不规则图形)，给使用者带来使用上的不便。同时，由于导电薄膜是独立的单元，因此在两个单元中间存在间隙，而间隙位置处是玻璃基板，玻璃基板的折射率约为1.52，导电薄膜的折射率约为1.9-2.0。玻璃基板和导电薄膜的折射率差距较大，因此会影响显示效果。
结合图1所示，本公开的实施例提供一种触控基板，包括基底10，在基底10上设置触控电极层，触控电极层包括多个触控电极11。触控电极层的任意两相邻的触控电极11之间设置有填充物12。填充物12在基底10的正投影至少部分位于触控电极层中的两相邻的触控电极11在基底的正投影之间。该填充物12的折射率为n3，基底10的折射率为n1，触控电极11的折射率为n2，且|n2-n3|＜|n2-n1|。
在本公开的一些实施例中，多个触控电极为自电容触控电极，其同层设置以形成触控电极层。
在本公开的一些实施例中，多个触控电极为互电容触控电极，其同层设 置以形成触控电极层。两个电极交叉的位置(以绝缘层隔离形成过桥，例如可以本公开实施例中的填充物进行隔离)构成触控检测用电容，交叉的两个电极分别构成了电容的两极。
在本公开的一些实施例中，多个触控电极为不同层设置的互电容电极，在同一触控电极层中，任意两相邻的触控电极之间设置有填充物。例如多个触控电极作为接收电极Rx形成一触控电极层，在该触控电极层中，任意两相邻的触控电极之间设置有填充物；多个触控电极作为发射电极Tx形成一触控电极层，在该触控电极层中，任意两相邻的触控电极之间设置有填充物。
在本公开的一些实施例中，填充物12在基底10的正投影至少部分位于触控电极层中的两相邻的触控电极11在基底的正投影之间，例如可以是填充物12位于两相邻的触控电极11之间的间隙，不完全填充，即填充物12在基底10的正投影部分位于触控电极层中的两相邻的触控电极11在基底的正投影之间，填充物12在基底10的正投影与触控电极11在基底的正投影不临接；例如可以是填充物12位于两相邻的触控电极11之间的间隙，完全填充，即填充物12在基底10的正投影位于触控电极层中的两相邻的触控电极11在基底的正投影之间，且填充物12在基底10的正投影与触控电极11在基底的正投影临接；例如可以是填充物12位于两相邻的触控电极11之间的间隙，完全填充，且部分延伸到触控电极的位置，即填充物12在基底10的正投影与触控电极11在基底的正投影局部重合。
在发明人知晓的技术中，触控基板的基底10通常采用玻璃材质，触控电极之间为光学胶或类似材质，光学胶等材料与玻璃材质折射率相近，与触控电极11的折射率相差较大，使得刻蚀线路比较明显，影响用户的观看效果。而在本公开的实施例中，在各个触控电极11之间设置填充物12，且该填充物12的折射率为n3，基底10的折射率为n1，触控电极11的折射率为n2，且这三者的折射率的关系满足|n2-n3|＜|n2-n1|。即，填充物12与触控电极11的折射率差值，小于基底10与触控电极11的折射率差值。由于两种材料的折射率差异决定了界面处的反射率，并且填充物12的折射率与触控电极11的折射率相差不大，因此，本公开实施例中的触控基板的消影效果较好。
可选地，所述填充物12的折射率n3等于所述触控电极11的折射率n2。此时，由于触控电极11和相邻的填充物12具有相同的折射率，因此，触控电极11和相邻的填充物12的上表面的反射率也是相同的，故可以达到良好的消影效果。
可选地，填充物12将各个所述触控电极11之间的间隙完全填充。在该实施例中，在各个触控电极11之间将不会存在裸露的基底10，故效应效果较好。
结合图2和3所示，在本公开的一些实施例中，填充物12采用半导体材料，触控电极11是由与填充物12的材料相同的半导体材料转换形成的，并且所述多个触控电极11与所述填充物12为一体成型结构。即，在触控电极层中，触控电极11与填充物12构成一整层结构。因此，将实施例的触控基板应用至触控面板中，可有效避免显示面板内的像素周期性排布和触控电极11周期性的排布，两种图形叠加而形成的摩尔纹。同时，由于触控电极11是由半导体材料转换(例如对半导体材料进行掺杂离子或等离子体处理实现导电)形成的，因此触控电极11的折射率和填充物12的折射率相当，故消影效果好。
其中，上述的半导体材料可选为氧化物半导体材料，进一步的还可以包括氧化铟镓锡(IGZO)、氧化铟锌(IZO)等。当然，也不局限于这几种材料，也可以采用其他半导体材料。
在本公开的一些实施例中，在触控电极层中，多个触控电极11呈矩阵排布，该设置方式有利于触控点的检测。
可选地，如图5所示，在本公开的一些实施例中，所述触控基板进一步包括覆盖所述触控电极11构成的触控电极层和所述填充物12的覆盖层13；其中，所述覆盖层13的材料与所述填充物12的材料相同。例如可以使用相同的材料来制作所述填充物12和所述覆盖层13。并且，还可以在同一个工艺步骤中形成所述填充物12和所述覆盖层13。例如，可以使用沉积或溅射的方式来形成所述填充物12和所述覆盖层13。由此，所述覆盖层13不仅能进一步改进所述触控基板的消影效果，还可以提供平坦化的表面，有利于简化触控基板的后续制作工艺。
本公开的实施例提供一种触控基板的制备方法，该方法可以用于制备上述的触控基板。该制备方法包括：在基底10上形成多个触控电极11作为触控电极层，以及在触控电极层的任意两相邻的触控电极11之间形成填充物12；
其中，填充物12在基底10的正投影至少部分位于两相邻的触控电极11在基底10的正投影之间；
其中，所述填充物的折射率为n3，所述基底的折射率为n1，所述触控电 极的折射率为n2，且|n2-n3|＜|n2-n1|。
在发明人知晓的技术中，触控基板中基底10通常采用玻璃材质，其折射率与触控电极11的折射率相差较大，使得刻蚀线路比较明显，影响用户的观看效果。在本公开实施例中，在各个触控电极11之间设置填充物12，且该填充物12的折射率为n3，基底10的折射率为n1，触控电极11的折射率为n2，且这三者的折射率的关系满足|n2-n3|＜|n2-n1|，即填充物12与触控电极11的折射率差值，小于基底10与触控电极11的折射率差值。由于两种材料的折射率差异决定了界面处的反射率，并且填充物12的折射率与触控电极11的折射率相差不大，因此，本实施例中的触控基板的消影效果较好。
可选地，所述填充物12的折射率n3等于所述触控电极11的折射率n2。此时，由于触控电极11和相邻的填充物12具有相同的折射率。因此，触控电极11和相邻的填充物12的上表面的反射率也是相同的，故可以达到良好的消影效果。
可选地，填充物12将各个所述触控电极11之间的间隙完全填充，也就是说，此时在各个触控电极11之间将不会存在裸露的基底10，故效应效果较好。
可选地，填充物12采用半导体材料，触控电极11是由与填充物12的材料相同的半导体材料转换形成的，以使各个所述触控电极11与所述填充物12为一体成型结构。以下结合具体制备方法对该种情况的触控基板的制备方法进行说明。
结合图2-4，该触控基板的制备方法具体包括如下步骤：
步骤401、在所述基底10上依次形成半导体材料层和光刻胶层。具体地，可以在基底10上沉积半导体材料层，并在半导体材料层上述涂敷一层光刻胶。
可选地，该半导体材料为透明的氧化物半导体材料或金属氧化物，具体的可以为氧化铟镓锡(IGZO)、氧化铟锌(IZO)等。当然，也不局限于这几种材料，也可以采用其他半导体材料。
步骤402、对光刻胶层进行曝光、显影，去除与多个电极区Q1对应的光刻胶，从而暴露与多个电极区对应的半导体材料。此时，在对应于填充物区域的半导体材料上仍然覆盖光刻胶。
步骤403、对所述多个电极区Q1中的半导体材料进行等离子体处理或者离子注入，形成触控电极层的多个触控电极11；保留所述多个电极区Q1 以外的半导体材料，以形成位于任意两相邻的触控电极11之间的填充物12。
在该步骤中，在半导体区的半导体材料上仍然覆盖光刻胶，该光刻胶相当于掩模板。由于电极区Q1的半导体材料裸露，此时可以采用等离子体处理或者离子注入的方式将电极区Q1的半导体材料转化为导体材料，也即在半导体区形成触控电极11。
可选地，采用等离子体处理进行半导体材料的转换，所采用的气体为N2、CF4、H2或NH3。
可选地，采用离子注入进行半导体材料的转换，离子注入源为氢离子。
步骤404、去除剩余的光刻胶，完成触控基板的制备。
本实施例中，触控电极11是由与填充物12相同的半导体材料转换形成的，以使各个所述触控电极11与所述填充物12为一体成型结构。也即在触控电极层中，触控电极11与填充物12构成是一整层结构，因此将该触控基板应用至触控面板中，可有效的避免显示面板内的像素周期性排布和触控电极11周期性的排布，两种图形叠加而形成的摩尔纹。同时，由于触控电极11是由半导体材料转换形成的，因此触控电极11和填充物12的折射率相当，故消影效果好。
本公开实施例还提供了一种显示装置，其包括实施例1中的触控基板。
在本实施例的显示装置中，在各个触控电极11之间设置填充物12，且该填充物12的折射率为n3，基底10的折射率为n1，触控电极11的折射率为n2，且这三者的折射率的关系满足|n2-n3|＜|n2-n1|，即填充物12与触控电极11的折射率差值，小于基底10与触控电极11的折射率差值。由于两种材料的折射率差异决定了界面处的反射率，并且填充物12的折射率与触控电极11的折射率相差不大，因此，本实施例中的触控基板的消影效果较好。
其中，本实施例的显示装置可以为液晶面板、OLED面板、电子纸、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
可以理解的是，以上实施方式仅仅是为了说明本公开的原理而采用的示例性实施方式，然而本公开并不局限于此。对于本领域内的普通技术人员而言，在不脱离本公开的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本公开的保护范围。

Claims (14)

  1. 一种触控基板，包括：
    基底；
    触控电极层，设置在所述基底上，所述触控电极层包括多个触控电极；
    填充物，设置在在所述触控电极层的任意两相邻的所述触控电极之间，所述填充物在所述基底的正投影至少部分位于两相邻的所述触控电极在基底的正投影之间；
    其中，所述填充物的折射率为n3，所述基底的折射率为n1，所述触控电极的折射率为n2，且|n2-n3|＜|n2-n1|。
  2. 根据权利要求1所述的触控基板，其中，所述填充物的折射率n3等于所述触控电极的折射率n2。
  3. 根据权利要求1所述的触控基板，其中，所述填充物将各个所述触控电极之间的间隙完全填充。
  4. 根据权利要求1所述的触控基板，其中，所述填充物的材料包括半导体材料。
  5. 根据权利要求4所述的触控基板，其中，所述触控电极由所述半导体材料转换形成，并且所述多个触控电极与所述填充物为一体成型结构。
  6. 根据权利要求4所述的触控基板，其中，所述半导体材料为氧化物半导体材料。
  7. 根据权利要求1所述的触控基板，包括：覆盖所述触控电极层和所述填充物的覆盖层；其中，所述覆盖层的材料与所述填充物的材料相同。
  8. 一种触控基板的制备方法，包括：
    在基底上形成触控电极层，以及
    在触控电极层的任意两相邻的触控电极之间形成填充物；
    其中，所述填充物在所述基底的正投影至少部分位于两相邻的所述触控电极在基底的正投影之间；
    其中，所述填充物的折射率为n3，所述基底的折射率为n1，所述触控电极的折射率为n2，且|n2-n3|＜|n2-n1|。
  9. 根据权利要求8所述的触控基板的制备方法，其中，所述填充物的折射率n3等于所述触控电极的折射率n2。
  10. 根据权利要求8所述的触控基板的制备方法，其中，所述填充物将 各个所述触控电极之间的间隙完全填充。
  11. 根据权利要求8所述的触控基板的制备方法，其中，所述填充物的材料包括半导体材料；并且其中，在基底上形成触控电极层，以及在触控电极层的任意两相邻的触控电极之间形成填充物包括：
    在所述基底上依次形成半导体材料层和光刻胶层；
    对光刻胶层进行曝光、显影，去除与多个电极区对应的光刻胶；
    对所述多个电极区中的半导体材料进行等离子体处理或者离子注入，形成触控电极层的多个触控电极；保留所述多个电极区以外的半导体材料，以形成位于触控电极层的任意两相邻的触控电极之间的填充物；以及
    去除剩余的光刻胶。
  12. 根据权利要求11所述的触控基板的制备方法，其中，所述半导体材料为氧化物半导体材料。
  13. 根据权利要求8所述的触控基板的制备方法，还包括：形成覆盖所述触控电极层和所述填充物的覆盖层；其中，所述覆盖层的材料与所述填充物的材料相同。
  14. 一种显示装置，包括权利要求1-7中任一项所述的触控基板。
PCT/CN2017/111836 2017-01-13 2017-11-20 触控基板及其制备方法、显示装置 Ceased WO2018130004A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US15/780,342 US11132092B2 (en) 2017-01-13 2017-11-20 Touch substrate, manufacturing method thereof and display device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201710025532.4 2017-01-13
CN201710025532.4A CN106775167B (zh) 2017-01-13 2017-01-13 触控基板及其制备方法、显示装置

Publications (1)

Publication Number Publication Date
WO2018130004A1 true WO2018130004A1 (zh) 2018-07-19

Family

ID=58945888

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2017/111836 Ceased WO2018130004A1 (zh) 2017-01-13 2017-11-20 触控基板及其制备方法、显示装置

Country Status (3)

Country Link
US (1) US11132092B2 (zh)
CN (1) CN106775167B (zh)
WO (1) WO2018130004A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106775167B (zh) * 2017-01-13 2020-12-18 京东方科技集团股份有限公司 触控基板及其制备方法、显示装置
KR102452606B1 (ko) * 2017-09-19 2022-10-07 삼성전자주식회사 모아레 시인 방지용 패턴 구조체 및 이를 이용한 디스플레이 장치
US10862064B1 (en) 2020-04-30 2020-12-08 Au Optronics Corporation Organic light emitting diode (OLED) display panel with reflective electrode

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100141600A1 (en) * 2008-12-08 2010-06-10 Samsung Elecironics Co., Ltd. Touch screen
CN104298381A (zh) * 2013-07-17 2015-01-21 宸鸿科技(厦门)有限公司 触控面板、应用于触控面板之光学匹配胶及前述制造方法
CN104375686A (zh) * 2013-08-17 2015-02-25 宸新科技(厦门)有限公司 触控面板
CN104699310A (zh) * 2015-03-31 2015-06-10 合肥京东方光电科技有限公司 触摸屏及其制备方法
CN106775167A (zh) * 2017-01-13 2017-05-31 京东方科技集团股份有限公司 触控基板及其制备方法、显示装置

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011118109A1 (ja) * 2010-03-23 2011-09-29 株式会社朝日ラバー 可撓性反射基材、その製造方法及びその反射基材に用いる原材料組成物
US8854326B2 (en) * 2011-03-10 2014-10-07 Wintek Corporation Touch panel and touch-sensitive display device
KR102088769B1 (ko) * 2014-04-02 2020-04-16 한국전자통신연구원 터치 스크린 패널 제작 방법 및 터치 스크린 패널
CN104461157B (zh) * 2014-12-25 2018-01-30 合肥鑫晟光电科技有限公司 触摸面板的制作方法、触摸面板、触摸屏和显示装置
CN204406009U (zh) * 2015-03-09 2015-06-17 京东方科技集团股份有限公司 阵列基板和显示装置
CN104699308B (zh) * 2015-03-31 2017-10-17 合肥鑫晟光电科技有限公司 一种触控面板的制作方法、触控面板及触控显示装置
CN104699309B (zh) * 2015-03-31 2017-06-13 合肥京东方光电科技有限公司 一种触摸屏、其制作方法及显示装置
CN104865728A (zh) * 2015-04-29 2015-08-26 重庆京东方光电科技有限公司 彩膜基板、彩膜基板的制造方法、触摸屏及显示装置
CN104765181A (zh) * 2015-05-06 2015-07-08 京东方科技集团股份有限公司 触控显示面板及其制备方法、触控显示装置
CN105677096B (zh) * 2016-01-04 2018-09-11 京东方科技集团股份有限公司 一种触控基板及其制作方法和显示面板
CN105607158B (zh) * 2016-01-04 2018-07-06 重庆京东方光电科技有限公司 一种基板、基板制造方法、触摸屏和显示装置
CN205405015U (zh) * 2016-03-11 2016-07-27 京东方科技集团股份有限公司 一种显示面板及显示装置
CN106020562B (zh) * 2016-08-04 2019-03-01 京东方科技集团股份有限公司 一种触控屏及其制作方法、外挂式触摸屏
CN107025027A (zh) * 2016-08-12 2017-08-08 京东方科技集团股份有限公司 触控基板及其制作方法、显示面板和显示装置
CN106354305B (zh) * 2016-08-25 2019-09-03 京东方科技集团股份有限公司 一种触控显示模组、其制作方法及显示装置
CN106168868B (zh) * 2016-09-30 2023-08-01 合肥鑫晟光电科技有限公司 触控基板消影检测方法及制造方法、触控基板及触控装置
KR102645631B1 (ko) * 2016-11-22 2024-03-08 삼성디스플레이 주식회사 벤디드 표시 장치
CN106502473B (zh) * 2017-01-04 2019-04-26 京东方科技集团股份有限公司 触控基板及其制备方法、触摸屏
CN107704135A (zh) * 2017-10-12 2018-02-16 京东方科技集团股份有限公司 一种触控面板及其制作方法、触控显示装置
CN109725777B (zh) * 2019-03-21 2022-09-09 合肥鑫晟光电科技有限公司 触控基板及其制作方法、触控显示装置
CN110456943B (zh) * 2019-08-13 2023-11-03 京东方科技集团股份有限公司 触控基板及其制作方法、触控显示面板和触控显示装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100141600A1 (en) * 2008-12-08 2010-06-10 Samsung Elecironics Co., Ltd. Touch screen
CN104298381A (zh) * 2013-07-17 2015-01-21 宸鸿科技(厦门)有限公司 触控面板、应用于触控面板之光学匹配胶及前述制造方法
CN104375686A (zh) * 2013-08-17 2015-02-25 宸新科技(厦门)有限公司 触控面板
CN104699310A (zh) * 2015-03-31 2015-06-10 合肥京东方光电科技有限公司 触摸屏及其制备方法
CN106775167A (zh) * 2017-01-13 2017-05-31 京东方科技集团股份有限公司 触控基板及其制备方法、显示装置

Also Published As

Publication number Publication date
US20210173516A1 (en) 2021-06-10
CN106775167B (zh) 2020-12-18
US11132092B2 (en) 2021-09-28
CN106775167A (zh) 2017-05-31

Similar Documents

Publication Publication Date Title
US10572079B2 (en) Touch substrate, fabricating method thereof, display panel and display device
US20180356925A1 (en) Touch substrate, method for fabricating the same, touch panel
WO2018099174A1 (zh) 触摸屏及其制作方法、触控显示装置
WO2016197692A1 (zh) 阵列基板、其制备方法及显示装置
US20130106746A1 (en) Systems for displaying images
US20160062518A1 (en) Touch substrate and fabricating method thereof, and touch display apparatus
US9417745B2 (en) Touch screen, the manufacturing method of the touch screen and display device
US9433102B2 (en) Touch screen panel and method for manufacturing the same, and display device
TWI488078B (zh) 觸控面板及其製造方法
WO2015089965A1 (zh) 显示基板及其制作方法、触摸屏和显示装置
WO2015143862A1 (zh) 触摸屏、其制作方法及显示装置
WO2016029548A1 (zh) 触摸屏、其制作方法及触摸显示装置
CN106502441B (zh) 触控面板及其制作方法
WO2016155234A1 (zh) 触摸屏、其制作方法及显示装置
CN205028254U (zh) 触控面板
WO2018130004A1 (zh) 触控基板及其制备方法、显示装置
CN204129400U (zh) 一种coa基板和显示装置
CN106681559A (zh) 触控面板及其制造方法、触控显示装置
KR101690600B1 (ko) 터치 스크린 일체형 표시장치 및 그 제조 방법
US20150062455A1 (en) Touch screen panel and method for manufacturing the same, and display device
CN110362235B (zh) 一种触控显示面板及显示装置
CN206470512U (zh) 阵列基板、显示面板以及显示装置
US9983706B2 (en) Manufacturing method of touch panel
CN106855669A (zh) 阵列基板及其制造方法、显示面板以及显示装置
WO2020063538A1 (zh) 触控面板、触控显示装置及触控面板制作方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17892007

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17892007

Country of ref document: EP

Kind code of ref document: A1

32PN Ep: public notification in the ep bulletin as address of the adressee cannot be established

Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 112(1) EPC (EPO FORM 1205A DATED 250220)

122 Ep: pct application non-entry in european phase

Ref document number: 17892007

Country of ref document: EP

Kind code of ref document: A1