WO2020063538A1 - 触控面板、触控显示装置及触控面板制作方法 - Google Patents

触控面板、触控显示装置及触控面板制作方法 Download PDF

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Publication number
WO2020063538A1
WO2020063538A1 PCT/CN2019/107314 CN2019107314W WO2020063538A1 WO 2020063538 A1 WO2020063538 A1 WO 2020063538A1 CN 2019107314 W CN2019107314 W CN 2019107314W WO 2020063538 A1 WO2020063538 A1 WO 2020063538A1
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WIPO (PCT)
Prior art keywords
touch
layer
touch panel
base substrate
insulating layer
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Application number
PCT/CN2019/107314
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English (en)
French (fr)
Inventor
张贵玉
Original Assignee
京东方科技集团股份有限公司
合肥鑫晟光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 合肥鑫晟光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US16/652,182 priority Critical patent/US20210223913A1/en
Publication of WO2020063538A1 publication Critical patent/WO2020063538A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04102—Flexible digitiser, i.e. constructional details for allowing the whole digitising part of a device to be flexed or rolled like a sheet of paper
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04107—Shielding in digitiser, i.e. guard or shielding arrangements, mostly for capacitive touchscreens, e.g. driven shields, driven grounds

Definitions

  • the present disclosure relates to the field of display technology, and in particular, to a touch panel, a touch display device, and a method for manufacturing a touch panel.
  • OGS touch panel a touch panel using OGS touch technology (referred to as an OGS touch panel), a sensor touch layer is directly fabricated on a glass carrier (base substrate), so that the touch panel can have a smaller thickness.
  • An embodiment of the present disclosure provides a touch panel including: a base substrate; a touch layer disposed on the base substrate; and a transparent flexible insulating layer located between the touch layer and the base substrate.
  • the flexible insulating layer is in contact with a surface of the base substrate facing the touch layer.
  • the orthographic projection of the flexible insulating layer on the base substrate completely covers the orthographic projection of the touch layer on the base substrate.
  • the touch layer includes: a first touch pattern layer; and a second touch pattern layer, the first touch pattern layer is closer to the flexible insulating layer than the second touch pattern layer; wherein
  • the touch panel further includes: a first insulation layer, the first insulation layer is located between the first touch pattern layer and the second touch pattern layer; and a second insulation layer, the second insulation layer is located at The side of the second touch pattern layer facing away from the flexible insulating layer.
  • the flexible insulating layer is made of polyimide.
  • the flexible insulating layer has a thickness of 1 micrometer to 10 micrometers.
  • the base substrate is used as a protective cover of the touch panel.
  • the base substrate is a glass substrate.
  • the touch panel includes a display area and a non-display area located on the periphery of the display area.
  • the touch panel further includes a non-display area and the flexible insulating layer and the touch area. A border occludes the layers.
  • the orthographic projection of the flexible insulating layer on the base substrate coincides with the display area.
  • the orthographic projection of the flexible insulating layer on the base substrate covers the display area, and also at least partially overlaps the non-display area.
  • the touch layer includes: a first touch pattern layer; wherein the touch panel further includes: an additional substrate, the additional substrate is located on the touch panel facing away from the base substrate; One side; a second touch pattern layer, the second touch pattern layer being located on the side of the additional substrate facing the base substrate and closer to the additional substrate than the first touch pattern layer; and bonding Layer, the adhesive layer is located between the first touch pattern layer and the second touch pattern layer.
  • the touch layer includes: a first touch pattern layer; wherein the touch panel further includes: a support film, the support film is located on the touch panel facing away from the base substrate One side; a second touch pattern layer, the second touch pattern layer being located on the side of the support film facing the base substrate and closer to the support film than the first touch pattern layer; and bonding Layer, the adhesive layer is located between the first touch pattern layer and the second touch pattern layer.
  • the orthographic projection of each of the first touch pattern layer and the second touch pattern layer on the substrate falls into the flexible insulating layer on the substrate. Orthographic projection on the substrate.
  • An embodiment of the present disclosure further provides a touch display device, including the touch panel according to any one of the above embodiments.
  • An embodiment of the present disclosure further provides a method for manufacturing a touch panel, including: forming a transparent flexible insulating layer on a base substrate; and forming a touch layer on the flexible insulating layer.
  • the step of forming a flexible insulating layer on the base substrate includes: coating a flexible insulating material on the base substrate; and baking the flexible insulating material coated on the base substrate. Bake to form a flexible insulating layer.
  • the method before forming the touch layer, the method further includes: forming a frame shielding layer arranged on the flexible insulating layer around the display area of the touch panel.
  • FIG. 1 is a schematic top view of a touch panel according to an embodiment of the present disclosure
  • FIG. 2A schematically illustrates a cross-sectional view of the touch panel shown in FIG. 1 taken along line A-A;
  • FIG. 2B schematically illustrates a cross-sectional view of the touch panel shown in FIG. 1 taken along line A-A;
  • FIG. 3 schematically illustrates a cross-sectional view of a touch panel according to an embodiment of the present disclosure
  • FIG. 4 schematically illustrates an exemplary structure of a touch layer in a touch panel according to an embodiment of the present disclosure
  • FIG. 5 schematically illustrates a cross-sectional view of a touch panel according to an embodiment of the present disclosure
  • FIG. 6 is a schematic structural diagram of a touch display device according to an embodiment of the present disclosure.
  • FIG. 7 shows a flowchart of a method for manufacturing a touch panel according to an embodiment of the present disclosure
  • FIG. 8 shows a specific flowchart of step S10 in FIG. 7;
  • FIG. 9 shows a specific flowchart of step S30 in FIG. 7;
  • FIG. 10a to FIG. 10g sequentially show formation processes of various film layer structures in a manufacturing process of a touch panel according to an embodiment of the present disclosure
  • FIG. 11 is a schematic structural diagram of a touch display device according to still another embodiment of the present disclosure.
  • FIG. 12 is a schematic structural diagram of a touch display device according to another embodiment of the present disclosure.
  • the relative position relationship may also be corresponding.
  • an element such as a layer, film, region, or substrate is referred to as being “on” or “under” another element, the element can be “directly on” or “under” the other element, or There may be intermediate elements.
  • the expression “touch layer” or “touch pattern layer” refers to the layer where the touch electrodes are located.
  • the touch panel may include multiple touch electrodes, and the patterned touch electrodes are disposed on the substrate of the touch panel.
  • the patterned touch The layer where the electrodes are located is called a "touch layer” or a "touch pattern layer”.
  • the plurality of touch electrodes may include a plurality of patterned driving electrodes and a plurality of patterned sensing electrodes. In one example, the plurality of patterned driving electrodes and the plurality of patterned sensing electrodes may be located on the same layer.
  • the layer where the plurality of patterned driving electrodes and the plurality of patterned sensing electrodes are located may be referred to as " Touch layer "or” touch pattern layer. "
  • the plurality of patterned driving electrodes and the plurality of patterned sensing electrodes may be located in different layers.
  • the layer where the plurality of patterned driving electrodes and the plurality of patterned sensing electrodes are located One of the layers may be referred to as a first touch pattern layer, and the other may be referred to as a second touch pattern layer.
  • the touch layer is directly made on the glass carrier. Therefore, once the glass carrier is cracked, the electrodes in the touch layer will also break, resulting in loss. Touch function. Since the glass carrier is usually the outermost substrate of the touch panel, the risk of cracking is high, which brings great inconvenience to users. To this end, the inventor of the present application provides a touch panel with an improved structure, which can still effectively operate the touch layer when the outermost substrate of the touch panel is cracked.
  • FIG. 1 and 2A illustrate a touch panel 100 according to an embodiment of the present disclosure.
  • FIG. 1 is a top view of the touch panel 100.
  • Fig. 2A is a sectional view taken along line A-A of Fig. 1.
  • the touch panel 100 has a display area 10 and a non-display area 20.
  • the display area 10 is used for displaying an image, and the non-display area 20 is located on the outer periphery of the display area 10.
  • the display area 10 can be used for routing the leads of touch electrodes.
  • the touch panel 100 may include a base substrate 30, a touch layer 50 disposed on the base substrate 30, and a transparent flexible insulation located between the touch layer 50 and the base substrate 30. Layer 40.
  • the touch layer 50 may include, for example, various touch electrode patterns for implementing a touch operation.
  • the touch layer 50 is not directly formed on the base substrate 30, but is between the touch layer 50 and the base substrate 30.
  • a transparent flexible insulating layer 40 is provided. In this way, when the base substrate 30 is broken, the flexible insulating layer 40 can still be attached to the base substrate without breaking. At this time, the flexible insulation layer 40 can still bear the touch layer 50. Thus, the touch layer 50 can maintain an effective operation when the base substrate 30 is cracked.
  • the flexible insulating layer 40 may be made of an organic material such as a transparent polyimide (PI) or a protective layer (OC) material or an inorganic material. After the substrate is broken, glass fragments are adhered without breaking.
  • the thickness of the flexible insulating layer 40 may be between 1 micrometer and 10 micrometers.
  • the flexible insulating layer 40 may be in contact with a surface of the base substrate 30 facing the touch layer 50. This helps the flexible insulating layer 40 to adsorb the debris of the base substrate 30 when the base substrate 30 is broken.
  • the touch layer 50 is shown by only one layer. However, those skilled in the art should understand that the number of the touch layer 50 may be more than one layer. Any of the touch layer structures used in the present invention can be adopted.
  • the flexible insulating layer 40 may be in contact with a surface of the touch layer 50 that is closest to the base substrate 30 (the upper surface of the touch layer 50 in FIG. 2A). This facilitates the support of the flexible insulation layer 40 to the touch layer 50.
  • the orthographic projection of the flexible insulating layer 40 on the base substrate 30 may completely cover the orthographic projection of the touch layer 50 on the base substrate 30. That is, the flexible insulating layer 40 can completely cover the entire touch layer 50. This helps the flexible insulating layer 40 to provide complete protection for all parts of the touch layer 50.
  • a frame shielding layer 60 is also shown in FIG. 2A.
  • the frame shielding layer 60 is disposed in the non-display area 20, and is mainly used to shield the touch leads, screws, and other components located in the non-display area 20 to avoid affecting the display effect.
  • the frame shielding layer 60 may be disposed on the base substrate 30 or on the flexible insulating layer 40.
  • the frame shielding layer 60 may be opaque to better perform the shielding function.
  • the frame shielding layer 60 may be made of a black photoresist material, a white photoresist material, or a color photoresist material, and may be correspondingly referred to as a black frame, a white frame, or a color frame.
  • a frame shielding layer 60 is provided in the entire non-display area 20 to more clearly distinguish the display area 10 and the non-display area 20.
  • the flexible insulating layer 40 may completely occupy the entire display area 10 and the non-display area 20. As shown in FIG. 1 and FIG. 2A, the orthographic projection of the flexible insulating layer 40 on the base substrate 30 The display area 10 is covered and also at least partially overlaps the non-display area 20. Optionally, the flexible insulating layer 40 may be located only in the display area 10 of the touch panel. With reference to FIG. 1 and FIG. 2B, the orthographic projection of the flexible insulating layer 40 on the substrate 30 coincides with the display area 10. .
  • the orthographic projection of the frame shielding layer 60 on the base substrate 30 may coincide with the non-display area 20.
  • the orthographic projection of the frame shielding layer 60 on the base substrate 30 and the orthographic projection of the touch layer 50 on the base substrate 30 may not overlap.
  • the frame shielding layer 60 may be considered to be formed between the flexible insulation layer 40 and the touch layer 50. That is, the orthographic projection of the frame shielding layer 60 on the base substrate 30 and the orthographic projection of the touch layer 50 on the base substrate 30 may overlap. As shown in FIG. 3, both sides of the touch layer 50 may cover at least a part of the frame shielding layer 60.
  • the flexible insulating layer 40 can be formed first, and then the frame shielding layer 60 and the touch layer 50 can be formed, which is beneficial to the formation of a smoother flexible insulating layer 40 and also prevents the flexible insulating layer 40 interference to the original process.
  • such a structure also facilitates the extraction of the electrodes in the touch layer 50 and facilitates the electrical connection between the touch electrodes and the leads.
  • the touch layer 50 includes a first touch pattern layer 51 and a second touch pattern layer 52.
  • the first touch pattern layer 51 is closer to the flexible insulating layer 40 than the second touch pattern layer 52.
  • the touch panel 100 may further include a first insulating layer 53 and a second insulating layer 54.
  • the first insulating layer 53 is located between the first touch pattern layer 51 and the second touch pattern layer 52.
  • the second insulating layer 54 is located on a side of the second touch pattern layer 52 facing away from the flexible insulating layer 40.
  • the first touch pattern layer 51 may be disposed adjacent to the flexible insulating layer 40 to contact the flexible insulating layer 40.
  • the structure of the touch layer 50 in the touch panel according to the embodiment of the present disclosure is not limited thereto. According to the design requirements of the touch layer, the touch layer 50 may further include a single touch pattern layer or more than two touch layers. Pattern layer.
  • the first insulating layer 53 and the second insulating layer 54 may be transparent organic layers (such as a transparent protective layer (OC), a polyimide (PI) layer, etc.) or transparent inorganic layers (such as inorganic Silicon oxide materials, silicon oxynitride layers, etc.).
  • OC transparent protective layer
  • PI polyimide
  • the first insulating layer 53 and the second insulating layer 54 are not limited thereto.
  • the first touch pattern layer 51 and the second touch pattern layer 52 may have various electrode patterns.
  • the first touch pattern layer 51 may be provided with a plurality of first strip electrodes 58 extending along the first direction (horizontal direction in FIG. 4), and the second touch pattern layer 52 may be provided with A plurality of second strip electrodes 59 facing the second direction (vertical direction in FIG. 4).
  • the strip electrodes in the first touch pattern layer 51 and the electrodes in the second touch pattern layer 52 can be used as driving electrodes and sensing electrodes in a mutual capacitance touch sensor, respectively.
  • each of the strip electrodes described above may be formed of a metal grid line.
  • the first touch pattern layer 51 and the second touch pattern layer 52 may be formed of a metal layer, or may be formed of a non-metal layer (for example, a non-metal material such as indium tin oxide (ITO), carbon nanotubes, etc.).
  • the touch layer 50 may have a single-layer structure, for example, for a touch panel using a self-capacitive touch sensor, it may also have a double-layer structure as described above, or may have a structure with more layers. Compared with the single-layer structure of the self-capacitive touch sensor, the double-layer structure of the mutual-capacitive touch sensor has better sensing accuracy.
  • Lead wires 55 of the electrodes in the touch pattern layer are also shown in FIG. 4.
  • the lead 55 can be used to electrically connect the electrodes to an integrated circuit or a power source, for example, it can be connected to a pin 56 in the interface 57 located at the periphery of the touch panel, and the pin 56 can be connected to an external circuit.
  • the leads 55 connected to respective electrodes in the first touch pattern layer 51 and the second touch pattern layer 52 may be disposed in the same layer, for example, the first touch pattern layer 51 or the second touch pattern layer 52 is provided in the same layer and vias are provided in the first insulating layer 53 located between the first touch pattern layer 51 and the second touch pattern layer 52 to electrically connect the leads 55 and electrodes provided in different layers thereof.
  • the lead 55 and the lead 56 may be disposed in the non-display area 20, and may be blocked by the frame shielding layer 60, for example.
  • the first stripe electrode 58 in the first touch pattern layer 51 and the second stripe electrode 59 in the second touch pattern layer 52 may be disposed in the display area 10 or the non-display area 20 as required.
  • the structure of the touch layer 50 is not limited to the above-mentioned form, and any touch layer structure known in the art and applicable to a touch panel may be adopted.
  • the touch display device 1000 includes a touch panel 100.
  • the touch panel 100 includes a display component 70 in addition to the touch structures such as the substrate 30, the touch layer 50, and the transparent flexible insulating layer 40 described above.
  • the display device 70 is located on a side of the touch layer 50 facing away from the base substrate 30 (in FIG. 6, the display device 70 is located below the touch layer 50).
  • the display module 70 is shown in the form of a liquid crystal display module.
  • the display module 70 may include a color filter substrate 71, an array substrate 73, and a liquid crystal layer 72 between the color filter substrate 71 and the array substrate 73. structure.
  • the structure of the display component 70 is not limited to this, and for example, it may also be an organic light emitting diode (OLED) display component, a quantum dot light emitting display component, or the like.
  • OLED organic light emitting diode
  • an adhesive layer 74 such as OCA or the like
  • the touch structure above the display component 70 includes only one substrate (ie, the substrate substrate 30), and a touch panel having such a structure may be generally referred to as an OGS touch panel.
  • the base substrate 30 also functions as a protective cover of the touch panel.
  • the protective cover of the touch panel is a cover where the touch panel faces the user, and components such as the touch layer and the display component are located on the side of the protective cover facing away from the user and are protected by the protective cover.
  • the base substrate 30 is a glass substrate for protecting various components provided on the touch panel.
  • An embodiment of the present disclosure also provides a touch panel manufacturing method 200. As shown in FIG. 7, the method may include the following steps:
  • Step S10 forming a transparent flexible insulating layer on the base substrate.
  • Step S30 forming a touch layer on the flexible insulating layer.
  • a transparent flexible insulating layer 40 can be formed on the base substrate 30 before the touch layer 50 is formed on the base substrate 30. As described above, when the base substrate 30 is broken, the flexible insulating layer 40 can protect the touch layer 50 from being damaged.
  • step S10 may further include:
  • Step S11 coating a flexible insulating material on the base substrate.
  • Step S12 baking the flexible insulating material coated on the base substrate to form a flexible insulating layer.
  • the flexible insulating layer 40 covers the entire surface of the base substrate 30 incompletely (for example, only a part of the non-display area is covered), the photolithography (exposure), development and other processes may also be performed after the above step S12.
  • the flexible insulating layer 40 is patterned. If it is desired that the flexible insulating layer 40 completely covers the entire surface of the base substrate 30, the patterning process may not be performed.
  • the above touch panel manufacturing method 200 may further include:
  • Step S20 (shown as a dashed frame in FIG. 7): forming a frame shielding layer arranged around the display area of the touch panel on the flexible insulating layer.
  • the frame shielding layer 60 can be used to block components in the non-display area of the touch panel.
  • the frame shielding layer 60 can be coated on the flexible insulating layer 40 with a black, white, or color photoresist material and then photolithography (exposure), development and other processes to the black, white or color photoresist material. Pattern to form black, white, or colored border shapes in the border mask.
  • the formation position of the frame shielding layer may correspond to a non-display area of the touch panel. It should be noted that, theoretically, a frame shielding layer 60 may be formed on the base substrate 30 first, and then a flexible insulating layer 40 may be formed.
  • the above step S30 may include:
  • Step S31 forming a first touch pattern layer on the flexible insulating layer
  • Step S32 forming a first insulating layer on the first touch pattern layer
  • Step S33 forming a second touch pattern layer on the first insulating layer.
  • Step S34 forming a second insulating layer on the second touch pattern layer.
  • the first metal layer may be formed by magnetron sputtering on the flexible insulating layer 40, and the first metal layer may be patterned to form a photoresist, exposure, development, and etching processes.
  • the first touch pattern layer 51 may be formed by magnetron sputtering on the flexible insulating layer 40, and the first metal layer may be patterned to form a photoresist, exposure, development, and etching processes.
  • a first insulating layer 53 may be formed on the first touch pattern layer 51 by a vapor deposition or coating process, and the first insulating layer 53 may be formed by applying photoresist, exposing, developing, etc. Patterning (or yellow light process).
  • the second metal layer can be magnetron sputtered on the first insulating layer 53 and the second metal layer can be formed by applying photoresist, exposing, developing, etc.
  • the metal layer is patterned to form the second touch pattern layer 52.
  • a second insulating layer 54 may be formed on the second touch pattern layer 52 by a vapor deposition or coating process, and the second insulating layer 54 may also be coated by photolithography. Patterns such as glue, exposure, and development.
  • the second insulating layer 54 can be used as a protective layer, for example.
  • the first touch pattern layer 51 and the second touch pattern layer 52 can be formed not only by patterning a metal layer, but also by forming a non-metal conductive layer (for example, ITO layer).
  • the base substrate 30, the flexible insulation layer 40, the frame shielding layer 60, the first touch pattern layer 51, the first insulation layer 53, the second touch pattern layer 52, and the second insulation layer 54 can be one by one according to the above steps. form.
  • the manufacturing method of the touch panel may further include steps such as forming leads, circuits, etc. related to the touch operation, and forming the display component 70.
  • steps such as forming leads, circuits, etc. related to the touch operation, and forming the display component 70.
  • these steps can adopt the same scheme as in the prior art, and are not repeated here.
  • the base substrate 30 may be manufactured independently, or may be formed by cutting a large substrate (such as a glass plate) into small pieces. This cutting process can also be performed after forming the above-mentioned various film layer structures on a large substrate.
  • the above has taken the OGS touch panel as an example to introduce the technical concept of the present disclosure.
  • the embodiments of the present disclosure are not limited to the OGS touch panel, and may also be applied to some GG touch panels or GF touch panels.
  • FIG. 11 shows an example of applying the technical idea of the present disclosure to a GG touch panel.
  • FIG. 11 illustrates a touch display device 1000 'according to an embodiment of the present disclosure as a whole.
  • the touch display device 1000 ' includes a touch panel 100'.
  • two touch layers are shown, namely a first touch pattern layer 51 and a second touch pattern layer 52.
  • the exemplary touch panel 100 ′ shown in FIG. 11 includes not only the base substrate 30 located at the outermost side of the touch panel, but also an additional substrate 80 (for example, by Made of materials such as glass), that is, the touch structure adopts a dual substrate structure.
  • the first touch pattern layer 51 is disposed on the base substrate 30, and the second touch pattern layer 52 is formed on the additional substrate 80, and then the base substrate 30 carrying the first touch pattern layer 51 and the substrate The additional substrates 80 of the second touch pattern layer 52 are adhered together.
  • a flexible insulating layer 40 is provided between the base substrate 30 and the first touch pattern layer 51.
  • the touch panel 100 ′ includes a base substrate 30 and an additional substrate 80, a first touch pattern layer 51 and a first touch pattern layer located between the base substrate 30 and the additional substrate 80.
  • Flexible insulation layer 40 a first insulating layer 53 (for example, can be used for planarization) may be further provided between the first adhesive layer 81 and the first touch pattern layer 51, but the first insulating layer 53 is not necessary.
  • the first touch pattern layer 51 is closer to the base substrate 30 than the second touch pattern layer 52.
  • the second touch pattern layer 52 is closer to the additional substrate 80 than the first touch pattern layer 51.
  • the touch panel 100 ′ may further be provided with a display component 70 (such as a liquid crystal display component, an OLED display component, and a quantum dot display component, etc.).
  • the display component 70 is located at On the side of the additional substrate 80 facing away from the base substrate 30 (or on the side of the touch panel 100 ′ facing away from the base substrate 30).
  • the flexible insulating layer 40 can also play a role in avoiding the touch layer 50 (the first touch pattern layer 51) when the substrate 30 is broken. ) The effect of fracture.
  • FIG. 12 shows another example of applying the technical concept of the present disclosure to a GF touch panel.
  • FIG. 12 illustrates a touch display device 1000 ′′ according to an embodiment of the present disclosure as a whole.
  • the touch display device 1000 ′′ includes a touch panel 100 ′′.
  • two touch layers are shown, That is, the first touch pattern layer 51 and the second touch pattern layer 52.
  • the touch display device 1000 "is similar to the touch display device 1000 'shown in FIG. Unlike the previous embodiment shown in FIG. 11, the additional substrate 80 in FIG. 11 is replaced with the support film 82 in FIG. 12 (for example, made of PET (polyethylene terephthalate)). .
  • PET polyethylene terephthalate
  • the first touch pattern layer 51 is disposed on the base substrate 30, and the second touch pattern layer 52 is formed on the supporting film 82, and then the base substrate 30 carrying the first touch pattern layer 51 and The support films 82 of the second touch pattern layer 52 are adhered together.
  • a flexible insulating layer 40 is provided between the base substrate 30 and the first touch pattern layer 51.
  • the touch panel 100 ′′ includes a base substrate 30 and a support film 82, a first touch pattern layer 51 and a first touch pattern layer located between the base substrate 30 and the support film 82.
  • Two touch pattern layers 52 Two touch pattern layers 52, a first adhesive layer 81 between the first touch pattern layer 51 and the second touch pattern layer 52, and a touch pattern layer disposed between the first touch pattern layer 51 and the base substrate 30.
  • the flexible insulating layer 40 Similar to the foregoing embodiment, optionally, the first adhesive layer 81 and the first touch pattern layer 51 may further include a first insulating layer 53, but the first insulating layer 53 is not necessary. Among them, The first touch pattern layer 51 is closer to the substrate 30 than the second touch pattern layer 52. The second touch pattern layer 52 is closer to the support film 82 than the first touch pattern layer 51.
  • the touch panel 100 may further be provided with a display component 70 (such as a liquid crystal display component, an OLED display component, and a quantum dot display component, etc.).
  • the display component 70 is located on the backside of the support film 82.
  • the flexible insulating layer 40 can also play a role in avoiding the touch layer 50 (the first touch pattern layer 51) when the substrate 30 is broken. ) The effect of fracture.
  • the orthographic projection of the flexible insulating layer 40 on the base substrate 30 may completely cover the orthographic projection of each of the first touch pattern layer 51 and the second touch pattern layer 52 on the base substrate 30, that is, the first The orthographic projection of each of the touch pattern layer 51 and the second touch pattern layer 52 on the base substrate 30 falls into the orthographic projection of the flexible insulating layer 40 on the base substrate 30. That is, the flexible insulating layer 40 can completely cover all the touch electrodes. This helps the flexible insulation layer 40 to provide complete protection for all touch electrodes.
  • a frame shielding layer 60 may also be provided.
  • the frame shielding layer 60 may be located between the base substrate 30 and the first touch pattern layer 51, for example. between.
  • the display assembly 70 may also be bonded together by an adhesive layer 74 and an additional substrate 80 or a support film 82 located between them.

Abstract

一种触控面板（100、100'、100''）、一种触控显示装置（1000、1000'、1000''）及一种触控面板制作方法（200）。触控面板（100、100'、100''）包括：衬底基板（30）；设置于衬底基板（30）上的触控层（50）；和位于触控层（50）和衬底基板（30）之间的透明的柔性绝缘层（40）。

Description

触控面板、触控显示装置及触控面板制作方法
相关申请的交叉引用
本申请要求于2018年9月26日递交中国专利局的、申请号为201811144153.8的中国专利申请的权益，该申请的全部公开内容以引用方式并入本文。
技术领域
本公开涉及显示技术领域，尤其涉及一种触控面板、一种触控显示装置以及一种触控面板制作方法。
背景技术
随着人机交互产品的飞速发展，对于触控面板的需求也迅速增长。触控面板所采用的触控技术是多种多样的，主流技术有OGS、GG、GF、GFF、On-Cell、In-Cell等技术。其中OGS提供了单玻璃基板的解决方案。因为OGS触控技术具有轻薄化的优势，因此被终端客户所青睐，越来越多的产品采用OGS触控技术。在采用OGS触控技术的触控面板(简称OGS触控面板)中，传感器触控层是直接制作在玻璃载体(衬底基板)上的，从而使触控面板可以具有较小的厚度。
发明内容
本公开的实施例提供了一种触控面板，包括：衬底基板；设置于衬底基板上的触控层；和位于所述触控层和衬底基板之间的透明的柔性绝缘层。
在一些实施例中，所述柔性绝缘层与衬底基板的朝向所述触控层的表面相接触。
在一些实施例中，所述柔性绝缘层在所述衬底基板上的正投影完全覆盖所述触控层在所述衬底基板上的正投影。
在一些实施例中，所述触控层包括：第一触控图案层；以及第二触控图案层，第一触控图案层比第二触控图案层更靠近所述柔性绝缘层；其中所述触控面板还包括：第一绝缘层，所述第一绝缘层位于第一触控图案层和第二触控图案层之间；和第二绝缘层，所述第二绝缘层位于所述第二触控图案层的背对所述柔性绝缘层的一侧。
在一些实施例中，所述柔性绝缘层由聚酰亚胺制成。
在一些实施例中，所述柔性绝缘层具有1微米至10微米的厚度。
在一些实施例中，所述衬底基板用作所述触控面板的保护盖板。
在一些实施例中，所述衬底基板为玻璃基板。
在一些实施例中，所述触控面板包括显示区域和位于显示区域外周的非显示区域，所述触控面板还包括位于所述非显示区域中且位于所述柔性绝缘层和所述触控层之间的边框遮挡层。
在一些实施例中，所述柔性绝缘层在所述衬底基板上的正投影与所述显示区域重合。
在一些实施例中，所述柔性绝缘层在所述衬底基板上的正投影覆盖所述显示区域，并且还与所述非显示区域至少部分重叠。
在一些实施例中，所述触控层包括：第一触控图案层；其中所述触控面板还包括：附加基板，所述附加基板位于所述触控面板背对所述衬底基板的一侧；第二触控图案层，所述第二触控图案层位于所述附加基板面朝衬底基板的一侧上且比第一触控图案层更靠近所述附加基板；以及粘合层，所述粘合层位于所述第一触控图案层和第二触控图案层之间。
在一些实施例中，所述触控层包括：第一触控图案层；其中所述触控面板还包括：支撑膜，所述支撑膜位于所述触控面板背对所述衬底基板的一侧；第二触控图案层，所述第二触控图案层位于所述支撑膜面朝衬底基板的一侧上且比第一触控图案层更靠近所述支撑膜；以及粘合层，所述粘合层位于所述第一触控图案层和第二触控图案层之间。
在一些实施例中，所述第一触控图案层和所述第二触控图案层中的每一个在所述衬底基板上的正投影均落入所述柔性绝缘层在所述衬底基板上的正投影内。
本公开的实施例还提供了一种触控显示装置，包括：如上述任一实施例所述的触控面板。
本公开的实施例还提供了一种触控面板制作方法，包括：在衬底基板上形成透明的柔性绝缘层；以及在所述柔性绝缘层上形成触控层。
在一些实施例中，在衬底基板上形成柔性绝缘层的步骤包括：将柔性绝缘材料涂布在所述衬底基板上；和对涂布在所述衬底基板上的柔性绝缘材料进行烘烤以形成柔性绝缘层。
在一些实施例中，在形成所述触控层之前，所述方法还包括：在柔性绝缘层上形成围绕触控面板的显示区域布置的边框遮挡层。
附图说明
为了更清楚地说明本公开文本的实施例的技术方案，下面将对实施例的附图进行简要说明，应当知道，以下描述的附图仅仅涉及本公开文本的一些实施例，而非对本公开文本的限制，其中：
图1示出根据本公开的一种实施例的触控面板的俯视示意图；
图2A示意性地示出如图1所示的触控面板沿着线A-A截得的剖视图；
图2B示意性地示出如图1所示的触控面板沿着线A-A截得的剖视图；
图3示意性地示出根据本公开的一种实施例的触控面板的剖视图；
图4示意性地示出根据本公开的一种实施例的触控面板中的触控层的示例性结构；
图5示意性地示出根据本公开的一种实施例的触控面板的剖视图；
图6示出根据本公开的一种实施例的触控显示装置的结构示意图；
图7示出根据本公开的一种实施例的触控面板制作方法的流程图；
图8示出图7中步骤S10的具体流程图；
图9示出图7中步骤S30的具体流程图；
图10a至图10g依次示出根据本公开的一种实施例的触控面板的制作过程中各种膜层结构的形成过程；
图11示出根据本公开的再一种实施例的触控显示装置的结构示意图；以及
图12示出根据本公开的又一种实施例的触控显示装置的结构示意图。
具体实施方式
为更清楚地阐述本公开的目的、技术方案及优点，以下将结合附图对本公开的实施例进行详细的说明。应当理解，下文对于实施例的描述旨在对本公开的总体构思进 行解释和说明，而不应当理解为是对本公开的限制。在说明书和附图中，相同或相似的附图标记指代相同或相似的部件或构件。为了清晰起见，附图不一定按比例绘制，并且附图中可能省略了一些公知部件和结构。
除非另外定义，本公开使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的组成部分。措词“一”或“一个”不排除多个。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同，而不排除其他元件或者物件。“连接”或者“相连”等类似的词语并非限定于物理的或者机械的连接，而是可以包括电性的连接，不管是直接的还是间接的。“上”、“下”、“左”、“右”“顶”或“底”等等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相对位置关系也可能相应地改变。当诸如层、膜、区域或衬底基板之类的元件被称作位于另一元件“上”或“下”时，该元件可以“直接”位于另一元件“上”或“下”，或者可以存在中间元件。
在本文中，除非另有说明，表述“触控层”或“触控图案层”指的是触控电极所在的层。例如，为了实现触控功能，触控面板可以包括多个触控电极，图案化的触控电极设置在触控面板的衬底基板上，在本文中，为了方便描述，将图案化的触控电极所在的层称为“触控层”或“触控图案层”。再例如，多个触控电极可以包括多个图案化的驱动电极和多个图案化的感应电极。在一个示例中，多个图案化的驱动电极和多个图案化的感应电极可以位于同一层，此时，多个图案化的驱动电极和多个图案化的感应电极所在的层可以称为“触控层”或“触控图案层”。在另一个示例中，多个图案化的驱动电极和多个图案化的感应电极可以位于不同的层，此时，多个图案化的驱动电极所在的层和多个图案化的感应电极所在的层中的一个可以称为第一触控图案层，另一个可以称为第二触控图案层。
如前所述，在现有的OGS触控面板中，触控层是直接制作在玻璃载体上的，因此，一旦玻璃载体发生破裂，则触控层中的电极也将出现断裂，从而导致丧失触控功能。而由于该玻璃载体通常为触控面板最外边的衬底基板，发生破裂的风险较高，因而这给使用者带来极大不便。为此，本申请的发明人提供了一种具有改进结构的触控面板，其能够在触控面板的最外边的基板发生破裂时，触控层仍能够有效地进行操作。
图1和图2A示出了根据本公开的实施例的一种触控面板100。图1为该触控面板100的俯视图。图2A是图1的沿着线A-A截得的剖视图。从图1中可以看出，该触控面板100具有显示区域10和非显示区域20。显示区域10用于显示图像，而非显示区域20位于显示区域10的外周，例如可以用于布设触控电极的引线等。如图2A所示，触控面板100可以包括：衬底基板30、设置于衬底基板30上的触控层50和位于所述触控层50和衬底基板30之间的透明的柔性绝缘层40。触控层50例如可以包括各种触控电极图案，用于实现触控操作。从图2A中可以看出，在根据本公开的实施例的触控面板100中，触控层50不是直接形成在衬底基板30上，而是在触控层50和衬底基板30之间提供了透明的柔性绝缘层40。这样，当衬底基板30发生破裂时，柔性绝缘层40仍可以贴附在衬底基板上而不断裂。此时，柔性绝缘层40仍能够对触控层50起到承载作用。于是，触控层50可以在衬底基板30发生破裂时，保持有效的操作。
在本公开的实施例中，柔性绝缘层40例如可以由透明的聚酰亚胺(PI)或保护层(OC)材料等有机材料或无机材料制成，其可弯曲，具有柔性，能够在玻璃基板破裂后粘附玻璃碎片而不断裂。作为示例，柔性绝缘层40的厚度可以在1微米至10微米之间。作为示例，所述柔性绝缘层40可以与衬底基板30的朝向所述触控层50的表面相接触。这有助于柔性绝缘层40在衬底基板30破裂时对于衬底基板30的碎屑的吸附。
为了简明起见，在图2A中，触控层50仅以一层示出，然而，本领域技术人员应当理解，触控层50的数量可以多于一层，本领域中现有的触控面板中所采用触控层结构均可以采用。作为示例，所述柔性绝缘层40可以与触控层50中最靠近衬底基板30的表面(在图2A中是触控层50的上表面)相接触。这有利于柔性绝缘层40对触控层50的支撑。
作为示例，柔性绝缘层40在衬底基板30上的正投影可以完全覆盖该触控层50在衬底基板30上的正投影。也就是说，柔性绝缘层40可以完全地覆盖整个触控层50。这有助于柔性绝缘层40提供对于触控层50的所有部分的完全保护。
在图2A中还示出了边框遮挡层60。边框遮挡层60设置在非显示区域20中，主要用于遮挡位于非显示区域20中的触控引线、螺钉等部件，以避免其影响显示效果。作为示例，边框遮挡层60可以设置在衬底基板30上或柔性绝缘层40上。边框遮挡层60可以是不透明的，以更好地起到遮挡作用。作为示例，边框遮挡层60可以由黑色光阻材料、白色光阻材料或彩色光阻材料制成，可相应地称为黑色边框、白色边框或 彩色边框。在图1示出的实施例中，整个非显示区域20中都设有边框遮挡层60，以将显示区域10和非显示区域20更清晰地区分开。
在本公开的实施例中，柔性绝缘层40可以完全地占据整个显示区域10和非显示区域20，结合图1和图2A所示，柔性绝缘层40在所述衬底基板30上的正投影覆盖显示区域10，并且还与非显示区域20至少部分重叠。可选地，柔性绝缘层40也可以仅位于触控面板的显示区域10中，结合图1和图2B所示，柔性绝缘层40在所述衬底基板30上的正投影与显示区域10重合。
例如，边框遮挡层60在衬底基板30上的正投影可以与非显示区域20重合。
例如，如图2A和图2B所示，边框遮挡层60在衬底基板30上的正投影与触控层50在衬底基板30上的正投影可以不重叠。
例如，为了避免柔性绝缘层40对于触控层50的形成工艺的影响并且有利于形成触控层50，边框遮挡层60可以考虑形成在柔性绝缘层40和触控层50之间。也就是说，边框遮挡层60在衬底基板30上的正投影与触控层50在衬底基板30上的正投影可以重叠。如图3所示，触控层50的两侧可以覆盖边框遮挡层60的至少一部分。这样，在触控面板的制作工艺中，可以先形成柔性绝缘层40，之后再形成边框遮挡层60和触控层50，这有利于形成更平整的柔性绝缘层40，也可以防止柔性绝缘层40对于原有工艺的干扰。另外，这样的结构也方便引出触控层50中的电极，有利于触控电极与引线的电连接。
图4和图5示出了根据本公开的一种实施例的触控面板中的触控层的示例性结构。例如，图4和图5所示的实施例具体示出了图3中所示的触控层50的一个示例。在图5中可以看出，触控层50包括第一触控图案层51和第二触控图案层52。第一触控图案层51比第二触控图案层52更靠近柔性绝缘层40。该触控面板100还可以包括第一绝缘层53和第二绝缘层54。第一绝缘层53位于第一触控图案层51和第二触控图案层52之间。第二绝缘层54位于第二触控图案层52的背对柔性绝缘层40的一侧。作为示例，第一触控图案层51可以设置成邻靠所述柔性绝缘层40以与柔性绝缘层40相接触。根据本公开的实施例的触控面板中的触控层50的结构不限于此，根据触控层的设计需要，触控层50还可以包括单个触控图案层或多于两个的触控图案层。
作为示例，第一绝缘层53和第二绝缘层54可以是透明的有机层(例如透明的保护层(OC)、聚酰亚胺(PI)层等)或者是透明的无机物层(例如无机硅氧材料、氮氧硅层等)。但在本公开的实施例中，第一绝缘层53和第二绝缘层54不限于此。
第一触控图案层51和第二触控图案层52中可以具有各种电极图案。例如，第一触控图案层51中可以设置有沿着第一方向(在图4中是水平方向)延伸的多个第一条状电极58，第二触控图案层52中可以设置有沿着第二方向(在图4中是竖直方向)的多个第二条状电极59。第一触控图案层51中的条状电极和第二触控图案层52中的电极可以分别用作互电容式触控传感器中的驱动电极和感应电极。作为示例，上述每个条状电极可以由金属网格线形成。上述第一触控图案层51和第二触控图案层52可以由金属层形成，也可以由非金属层(例如氧化锡铟(ITO)、碳纳米管等非金属材料)形成。触控层50可以是单层结构，例如对于采用自电容式触控传感器的触控面板，也可以是如上所述的双层结构，还可以是更多层的结构。采用上述互电容式触控传感器的双层结构，与自电容式触控传感器的单层结构相比，具有更好的感测精度。
在图4中还示出了触控图案层中电极的引线55。该引线55可以用于将这些电极电连接至集成电路或电源，例如其可以连接至位于触控面板外周处的接口57中的引脚56，该引脚56可以与外部的电路连接。作为示例，与第一触控图案层51和第二触控图案层52中的各个电极相连的引线55可以设置在同一层中，例如与第一触控图案层51或第二触控图案层52同层设置并在位于第一触控图案层51和第二触控图案层52之间的第一绝缘层53中设置过孔以将引线55和与其异层设置的电极进行电连接。在本公开的实施例中，上述引线55及引脚56可以设置于非显示区域20中，例如可以由边框遮挡层60进行遮挡。第一触控图案层51中的上述第一条状电极58和第二触控图案层52中的上述第二条状电极59可以根据需要设置在显示区域10中或非显示区域20中。
在本公开的实施例中，关于触控层50的结构不限于上述形式，任何本领域已知的可应用于触控面板中的触控层结构均可采用。
本公开的实施例还提供了一种触控显示装置1000。如图6所示，该触控显示装置1000包括触控面板100。该触控面板100中除去上述的衬底基板30、触控层50和透明的柔性绝缘层40等触控结构之外，还包括显示组件70。该显示组件70位于触控层50的背朝衬底基板30的一侧(在图6中，该显示组件70位于触控层50的下方)。在 图6中，显示组件70以液晶显示组件的形式示出，例如，该显示组件70可以包括彩膜基板71、阵列基板73以及位于彩膜基板71和阵列基板73之间的液晶层72等结构。当然，在本公开的实施例中，显示组件70的结构不限于此，例如其还可以是有机发光二极管(OLED)显示组件、量子点发光显示组件等等。在显示组件70和触控层50之间例如可以设有粘合层74(如OCA等)。在图6示出的示例中，显示组件70上方的触控结构中仅包括一块基板(即衬底基板30)，具有这种结构的触控面板通常可称为OGS触控面板。换句话说，衬底基板30还用作触控面板的保护盖板。应该理解，触控面板的保护盖板是触控面板面对用户的盖板，触控层、显示组件等部件都位于保护盖板背向用户的一侧，被所述保护盖板保护。例如，衬底基板30为玻璃基板，用于保护触控面板上设置的各个部件。
本公开的实施例还提供了一种触控面板制作方法200。如图7所示，该方法可以包括以下步骤：
步骤S10：在衬底基板上形成透明的柔性绝缘层；以及
步骤S30：在所述柔性绝缘层上形成触控层。
通过上述方法，可以在将触控层50形成到衬底基板30上之前先在衬底基板30上形成透明的柔性绝缘层40。如前所述，在衬底基板30破裂时，该柔性绝缘层40可以保护触控层50免于被破坏。
对于步骤S10，作为示例，如图8所示，步骤S10还可以包括：
步骤S11：将柔性绝缘材料涂布在所述衬底基板上；和
步骤S12：对涂布在所述衬底基板上的柔性绝缘材料进行烘烤以形成柔性绝缘层。
在一示例中，如果期望柔性绝缘层40不完整地覆盖整个衬底基板30的表面(例如仅覆盖一部分非显示区域)，还可以在上述步骤S12之后，通过光刻(曝光)、显影等工艺对柔性绝缘层40进行图案化。如果期望柔性绝缘层40完整的覆盖整个衬底基板30的表面，则可以不进行该图案化过程。
作为示例，如图7所示，上述触控面板制作方法200还可以包括：
步骤S20(在图7中以虚线框示出)：在柔性绝缘层上形成围绕触控面板的显示区域布置的边框遮挡层。
如前所述，该边框遮挡层60可以用于遮挡触控面板的非显示区域中的部件。具体地，该边框遮挡层60可以通过在上述柔性绝缘层40上涂覆黑色、白色或彩色光阻材 料并通过光刻(曝光)、显影等工艺来对所该黑色、白色或彩色光阻材料进行图案化，以形成边框遮挡层中的黑色边框、白色边框或彩色边框形状。该边框遮挡层的形成位置可以与触控面板的非显示区域对应。需要说明的是，从理论上讲，也可以先在衬底基板30上形成边框遮挡层60，然后再形成柔性绝缘层40。
以触控层50包括第一触控图案层51和第二触控图案层52的情形为例，如图9所示，上述步骤S30可以包括：
步骤S31：在所述柔性绝缘层上形成第一触控图案层；
步骤S32：在第一触控图案层上形成第一绝缘层；
步骤S33：在第一绝缘层上形成第二触控图案层；和
步骤S34：在第二触控图案层上形成第二绝缘层。
对于步骤S31，例如，可以通过在柔性绝缘层40上磁控溅射第一金属层，并通过涂布光刻胶、曝光、显影、蚀刻等工艺来对该第一金属层进行图案化以形成该第一触控图案层51。
对于步骤S32，例如，可以通过气相沉积或涂布工艺来在第一触控图案层51上形成第一绝缘层53，该第一绝缘层53可以通过涂布光刻胶、曝光、显影等二工艺(或称为黄光制程)来进行图案化。
对于步骤S33，类似于上述步骤S31，例如，可以通过在第一绝缘层53上磁控溅射第二金属层，并通过涂布光刻胶、曝光、显影、蚀刻等工艺来对该第二金属层进行图案化以形成该第二触控图案层52。
对于步骤S34，类似于上述步骤S32，例如，可以通过气相沉积或涂布工艺来在第二触控图案层52上形成第二绝缘层54，该第二绝缘层54也可以通过涂布光刻胶、曝光、显影等工艺来进行图案化。第二绝缘层54例如可以用作保护层。
需要说明的是，在上述步骤S31和S33中，第一触控图案层51和第二触控图案层52不仅可以通过对于金属层的图案化而形成，还可以通过对于非金属导电层(例如ITO层)的图案化而形成。
图10a至图10g示出了一种示例性的触控面板的完整的制作流程。其中，衬底基板30、柔性绝缘层40、边框遮挡层60、第一触控图案层51、第一绝缘层53、第二触控图案层52和第二绝缘层54可以根据上述步骤逐一地形成。
本领域技术人员应当理解，触控面板的制作方法还可以包括形成与触控操作相关的引线、电路等以及形成显示组件70等步骤。对于本公开而言，这些步骤可以采用与现有技术中完全相同的方案，在此不再赘述。
作为示例，在实际工艺中，衬底基板30可以是独立制作，也可以是通过将大的基板(如玻璃板)切割成小块来形成。该切割过程也可以在大的基板上形成上述各种膜层结构之后进行。
上述已经以OGS触控面板为例，对本公开的技术构思进行了介绍。然而，本公开的实施例并不限于OGS触控面板，也可以用于某些GG触控面板或GF触控面板。
图11给出了将本公开的技术构思用于GG触控面板的一种示例。图11整体示出了根据本公开的实施例的一种触控显示装置1000’。而触控显示装置1000’包括触控面板100’。在该示例中，示出了两个触控层，即第一触控图案层51和第二触控图案层52。与之前图6所示的实施例不同的是，图11中所示的示例性触控面板100’中不仅包括位于触控面板最外侧的衬底基板30，还包括一附加基板80(例如由玻璃等材料制成)，即触控结构采用采用双基板结构。该第一触控图案层51设置于衬底基板30上，而第二触控图案层52形成于附加基板80上，然后将载有第一触控图案层51的衬底基板30与载有第二触控图案层52的附加基板80粘合在一起。在该示例中，柔性绝缘层40设置在衬底基板30和第一触控图案层51之间。具体地，在如图11所示的实施例中，触控面板100’包括衬底基板30和附加基板80、位于衬底基板30和附加基板80之间的第一触控图案层51和第二触控图案层52、位于第一触控图案层51和第二触控图案层52之间的第一粘合层81以及设置在第一触控图案层51和衬底基板30之间的柔性绝缘层40。可选地，在第一粘合层81和第一触控图案层51之间还可以具有第一绝缘层53(例如可用于平坦化)，但第一绝缘层53并非必需。其中，第一触控图案层51比第二触控图案层52更靠近衬底基板30。第二触控图案层52比第一触控图案层51更靠近附加基板80。在图11示出的示例性触控显示装置1000’中，触控面板100’还可以设置有显示组件70(例如液晶显示组件、OLED显示组件和量子点显示组件等)，该显示组件70位于附加基板80的背对衬底基板30的一侧上(或者说是触控面板100’的背对衬底基板30的一侧上)。在图11示出的基于GG触控技术的触控面板100’的示例中，柔性绝缘层40也同样可以起到在衬底基板30破裂时避免触控层50(第一触控图案层51)断裂的作用。
图12给出了将本公开的技术构思用于GF触控面板的另一种示例。图12整体示出了根据本公开的实施例的一种触控显示装置1000”。而触控显示装置1000”包括触控面板100”。在该示例中，示出了两个触控层，也就是第一触控图案层51和第二触控图案层52。该触控显示装置1000”与如图11所示的触控显示装置1000’是类似的。而与之前图11所示的实施例不同的是，图11中的附加基板80被替换成了图12中的支撑膜82(例如由PET(聚对苯二酸乙二醇酯)制成)。该第一触控图案层51设置于衬底基板30上，而第二触控图案层52形成于支撑膜82上，然后将载有第一触控图案层51的衬底基板30与载有第二触控图案层52的支撑膜82粘合在一起。在该示例中，柔性绝缘层40设置在衬底基板30和第一触控图案层51之间。具体地，在如图12所示的实施例中，触控面板100”包括衬底基板30和支撑膜82、位于衬底基板30和支撑膜82之间的第一触控图案层51和第二触控图案层52、位于第一触控图案层51和第二触控图案层52之间的第一粘合层81以及设置在第一触控图案层51和衬底基板30之间的柔性绝缘层40。类似于前述实施例，可选地，在第一粘合层81和第一触控图案层51还可以具有第一绝缘层53，但第一绝缘层53并非必需。其中，第一触控图案层51比第二触控图案层52更靠近衬底基板30。第二触控图案层52比第一触控图案层51更靠近支撑膜82。在图12示出的示例性触控显示装置1000”中，触控面板100”还可设置有显示组件70(例如液晶显示组件、OLED显示组件和量子点显示组件等)，该显示组件70位于支撑膜82的背对衬底基板30的一侧上(或者说是触控面板100”的背对衬底基板30的一侧上)。在图12示出的基于GF触控技术的触控面板100”的示例中，柔性绝缘层40也同样可以起到在衬底基板30破裂时避免触控层50(第一触控图案层51)断裂的作用。
作为示例，柔性绝缘层40在衬底基板30上的正投影可以完全覆盖第一触控图案层51和第二触控图案层52中的每一个在衬底基板30上的正投影，即第一触控图案层51和第二触控图案层52中的每一个在所述衬底基板30上的正投影均落入柔性绝缘层40在所述衬底基板30上的正投影内。也就是说，柔性绝缘层40可以完全地覆盖全部触控电极。这有助于柔性绝缘层40提供对于所有触控电极的完全保护。
作为示例，在图11和图12中所示的触控面板的示例中，也可以设置有边框遮挡层60，该边框遮挡层60例如可以位于衬底基板30和第一触控图案层51之间。作为 示例，在图11和图12中所示的触控显示装置的示例中，显示组件70也可以通过位于它们之间的粘合层74和附加基板80或支撑膜82粘合在一起。
本领域技术人员应当理解，在显示组件上还需要设置诸如阴极、阳极等等已知的膜层结构以实现必要的功能。这些膜层结构可以根据需要来选择设计，并通过现有技术中已知的制作工艺进行制作。由于仅涉及本领域的已知技术，在此，不再对于这些膜层结构及制作工艺进行详细说明。
虽然结合附图对本公开进行了说明，但是附图中公开的实施例旨在对本公开的实施例进行示例性说明，而不能理解为对本公开的一种限制。附图中的尺寸比例仅仅是示意性的，并不能理解为对本公开的限制。
上述实施例仅例示性的说明了本公开的原理及构造，而非用于限制本公开，本领域的技术人员应明白，在不偏离本公开的总体构思的情况下，对本公开所作的任何改变和改进都在本公开的范围内。本公开的保护范围，应如本申请的权利要求书所界定的范围为准。

Claims (18)

  1. 一种触控面板，包括：
    衬底基板；
    设置于衬底基板上的触控层；和
    位于所述触控层和衬底基板之间的透明的柔性绝缘层。
  2. 根据权利要求1所述的触控面板，其中，所述柔性绝缘层与衬底基板的朝向所述触控层的表面相接触。
  3. 根据权利要求1所述的触控面板，其中，所述柔性绝缘层在所述衬底基板上的正投影完全覆盖所述触控层在所述衬底基板上的正投影。
  4. 根据权利要求1-3中任一项所述的触控面板，其中，所述触控层包括：
    第一触控图案层；以及
    第二触控图案层，第一触控图案层比第二触控图案层更靠近所述柔性绝缘层；
    其中所述触控面板还包括：
    第一绝缘层，所述第一绝缘层位于第一触控图案层和第二触控图案层之间；和
    第二绝缘层，所述第二绝缘层位于所述第二触控图案层的背对所述柔性绝缘层的一侧。
  5. 根据权利要求1-3中任一项所述的触控面板，其中，所述柔性绝缘层由聚酰亚胺制成。
  6. 根据权利要求1-3中任一项所述的触控面板，其中，所述柔性绝缘层具有1微米至10微米的厚度。
  7. 根据权利要求1-3中任一项所述的触控面板，其中，所述衬底基板用作所述触控面板的保护盖板。
  8. 根据权利要求7所述的触控面板，其中，所述衬底基板为玻璃基板。
  9. 根据权利要求1-3中任一项所述的触控面板，其中，所述触控面板包括显示区域和位于显示区域外周的非显示区域，所述触控面板还包括位于所述非显示区域中且位于所述柔性绝缘层和所述触控层之间的边框遮挡层。
  10. 根据权利要求9所述的触控面板，其中，所述柔性绝缘层在所述衬底基板上的正投影与所述显示区域重合。
  11. 根据权利要求9所述的触控面板，其中，所述柔性绝缘层在所述衬底基板上的正投影覆盖所述显示区域，并且还与所述非显示区域至少部分重叠。
  12. 根据权利要求1-3中任一项所述的触控面板，其中，所述触控层包括：
    第一触控图案层；
    其中所述触控面板还包括：
    附加基板，所述附加基板位于所述触控面板背对所述衬底基板的一侧；
    第二触控图案层，所述第二触控图案层位于所述附加基板面朝衬底基板的一侧上且比第一触控图案层更靠近所述附加基板；以及
    粘合层，所述粘合层位于所述第一触控图案层和第二触控图案层之间。
  13. 根据权利要求1-3中任一项所述的触控面板，其中，所述触控层包括：
    第一触控图案层；
    其中所述触控面板还包括：
    支撑膜，所述支撑膜位于所述触控面板背对所述衬底基板的一侧；
    第二触控图案层，所述第二触控图案层位于所述支撑膜面朝衬底基板的一侧上且比第一触控图案层更靠近所述支撑膜；以及
    粘合层，所述粘合层位于所述第一触控图案层和第二触控图案层之间。
  14. 根据权利要求12或13所述的触控面板，其中，所述第一触控图案层和所述第二触控图案层中的每一个在所述衬底基板上的正投影均落入所述柔性绝缘层在所述衬底基板上的正投影内。
  15. 一种触控显示装置，包括：
    根据权利要求1至14中任一项所述的触控面板。
  16. 一种触控面板制作方法，包括：
    在衬底基板上形成透明的柔性绝缘层；以及
    在所述柔性绝缘层上形成触控层。
  17. 根据权利要求16所述的触控面板制作方法，其中，在衬底基板上形成柔性绝缘层的步骤包括：
    将柔性绝缘材料涂布在所述衬底基板上；和
    对涂布在所述衬底基板上的柔性绝缘材料进行烘烤以形成柔性绝缘层。
  18. 根据权利要求16所述的触控面板制作方法，其中，在形成所述触控层之前，所述方法还包括：
    在柔性绝缘层上形成围绕触控面板的显示区域布置的边框遮挡层。
PCT/CN2019/107314 2018-09-26 2019-09-23 触控面板、触控显示装置及触控面板制作方法 WO2020063538A1 (zh)

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