WO2018024117A1 - 一种表面纹理识别显示装置 - Google Patents

一种表面纹理识别显示装置 Download PDF

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Publication number
WO2018024117A1
WO2018024117A1 PCT/CN2017/093823 CN2017093823W WO2018024117A1 WO 2018024117 A1 WO2018024117 A1 WO 2018024117A1 CN 2017093823 W CN2017093823 W CN 2017093823W WO 2018024117 A1 WO2018024117 A1 WO 2018024117A1
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WIPO (PCT)
Prior art keywords
light
surface texture
display device
contact plate
layer
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PCT/CN2017/093823
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English (en)
French (fr)
Inventor
吴俊纬
董学
王海生
刘英明
丁小梁
吕敬
Original Assignee
京东方科技集团股份有限公司
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Application filed by 京东方科技集团股份有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/750,302 priority Critical patent/US10438044B2/en
Publication of WO2018024117A1 publication Critical patent/WO2018024117A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/12—Fingerprints or palmprints
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14678—Contact-type imagers
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/12—Fingerprints or palmprints
    • G06V40/13—Sensors therefor
    • G06V40/1318—Sensors therefor using electro-optical elements or layers, e.g. electroluminescent sensing
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
    • G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
    • G06V40/12—Fingerprints or palmprints
    • G06V40/13—Sensors therefor
    • G06V40/1324—Sensors therefor by using geometrical optics, e.g. using prisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures

Definitions

  • Embodiments of the present disclosure relate to a surface texture recognition display device.
  • the Touch Screen Panel With the rapid development of display technology, the Touch Screen Panel has gradually spread throughout people's lives.
  • the touch screen can be divided into: resistive, capacitive, infrared, and surface acoustic wave, electromagnetic, vibration wave induction, and frustrated total internal reflection optical induction.
  • Embodiments of the present disclosure provide a surface texture recognition display device including: a substrate substrate and a contact plate overlapping each other, wherein the contact plate has a first surface configured to be in contact with a textured surface, the first surface a side of the contact plate facing away from the substrate substrate; and a plurality of pixel units between the substrate substrate and the contact plate, wherein at least one of the pixel units comprises: a photosensitive element, located at a light collecting element between the photosensitive element and the contact plate; a light blocking element between the light collecting element and the photosensitive element, wherein the light shielding element has light transmission a hole such that light passing through the contact plate and the concentrating element passes through the light transmission hole to reach the photosensitive element.
  • the main optical axis of the concentrating element is substantially perpendicular to the contact plate.
  • the concentrating element is a convex lens.
  • the shape of the light-transmissive aperture in the orthographic projection of the contact plate is substantially the same as the shape of the orthographic projection of the concentrating element in the contact plate.
  • the center of the light transmission aperture is located on the main optical axis of the concentrating element.
  • the main optical axis of the concentrating element is located in a cross section, and the center of the light transmission hole and the focus of the concentrating element are both located in the cross section and do not coincide with each other, the light transmission hole
  • the width d in the cross section satisfies: d ⁇ sl / f; wherein s represents the distance between the center of the light-transmitting hole and the focus of the concentrating element, and l represents the concentrating in the cross-section Maximum width of the light element, f Indicates the focal length of the concentrating element.
  • the center of the light-transmissive aperture coincides with the focus of the concentrating element.
  • the at least one pixel unit further includes: a first switching element, wherein a source of the first switching element is connected to the photosensitive element; a gate of the first switching element is connected to a scan line, The drain of the first switching transistor is connected to the signal line.
  • the at least one pixel unit further includes: a second switching element and a light emitting element; wherein the light emitting element includes a first electrode layer and a second electrode layer and a light emitting layer therebetween, the first electrode layer and The second switching element is connected.
  • the photosensitive element is a photodiode having a first electrode and a second electrode, the first electrode being coupled to a source of the first switching element, and the second electrode being coupled to a reference signal line.
  • the light emitting element is located on a side of the second switching element facing the contact plate; the photosensitive element is located between the second switching transistor and a second electrode of the light emitting element.
  • the concentrating element is located between the second electrode layer and the contact plate.
  • the second electrode overlaps the concentrating element and the shading element in a direction perpendicular to the base substrate.
  • the shading element is located between the first electrode layer and the second electrode layer.
  • the light shielding portion is located in the same layer as the first electrode layer.
  • the orthographic projection of the light shielding portion on the base substrate does not overlap with the orthographic projection of the first electrode layer on the base substrate.
  • the second electrode layer is configured to be transmissive to light emitted by the luminescent layer.
  • the source of the first switching element is in the same layer as the source of the second switching element; the drain of the first switching element is in the same layer as the drain of the second switching element
  • the gate of the first switching element is in the same layer as the gate of the second switching element; the active layer of the first switching element is in the same layer as the active layer of the second switching element.
  • the shading element is electrically conductive, and the second electrode of the photosensitive element is coupled to the reference signal line by the shading element.
  • FIG. 1 is a schematic structural view of a fingerprint identification display device
  • FIG. 2 is a schematic structural diagram of a surface texture recognition display device according to an embodiment of the present disclosure
  • FIG. 3 is a schematic diagram of a portion of an optical path of a surface texture recognition display device according to an embodiment of the present disclosure
  • FIGS. 4a to 4c are schematic diagrams showing relative positions between a light shielding portion and a collecting lens in a surface texture recognition display device according to an embodiment of the present disclosure
  • FIG. 5 is a partial circuit diagram of a surface texture recognition display device provided by an embodiment of the present disclosure.
  • 6a and 6b are schematic structural views of a surface texture recognition display device according to an embodiment of the present disclosure.
  • FIG. 7a and 7b are schematic structural views of a surface texture recognition display device according to an embodiment of the present disclosure.
  • FIG. 1 shows a fingerprint identification display device, which mainly includes a display panel 1 and a protective cover 2 on the display panel 1; wherein the display panel 1 has pixel regions arranged in a matrix, and each pixel region is provided with an organic battery.
  • the fingerprint recognition display device as shown in FIG. 1 , when the protective cover 2 is pressed by the finger, at least the package film 03 and the polarizer layer 04 of the display panel 1 are disposed between the photosensitive unit 02 and the finger.
  • Transparent optical adhesive layer 05 and protective cover 2 thus the distance between the finger and the photosensitive unit 02 Farther, the light emitted by the organic electroluminescent pixel unit 01 passes through these layers and forms a diffuse reflection when irradiated on the finger, and the divergence angle is relatively large, which causes the light at the same position of the fingerprint to pass through the layers. It will be irradiated onto a plurality of photosensitive cells 02, so that optical crosstalk occurs.
  • the protective cover 2 in the fingerprint identification display device is relatively thick, so the optical crosstalk problem is relatively serious, thereby seriously affecting the fingerprint recognition capability of the fingerprint identification display device.
  • the surface texture recognition display device is a display device having a surface texture recognition function.
  • the surface texture refers to, for example, a person's fingerprint and palm print, and the like.
  • the surface texture recognition display device includes: a substrate substrate 10 and a contact plate 20 disposed opposite each other; wherein a plurality of pixel units P are formed on the substrate substrate 10.
  • a photosensitive unit (ie, photosensitive member) 12 is disposed in at least a portion of the pixel unit P.
  • the contact plate 20 is located on a side of the photosensitive unit 12 facing away from the base substrate 10; each of the pixel units P includes, for example:
  • a collecting lens ie, a collecting member 13 corresponding to each of the photosensitive units 12 and located on a side of each of the photosensitive units 12 facing the contact plate 20, the collecting lens 13 for facing the contact plate 20 by the collecting lens 13
  • the light incident on one side is concentrated by the condensing lens 13 toward the main optical axis direction of the condensing lens 13; for example, the light is incident on the first surface S1 of the contact plate 20 before being incident on the condensing lens 13, for example.
  • the surface of the texture such as the surface of a finger of a person, passes through the contact plate to reach the collecting lens 13.
  • the light shielding portion 14 that is in one-to-one correspondence with each of the condensing lenses 13 and located between each of the condensing lenses 13 and the corresponding photosensitive unit 12, the light shielding portion 14 has a light transmission hole, and corresponds to The light concentrated by the main optical axis direction of the collecting lens 13 is irradiated to the corresponding photosensitive unit 12 at least partially through the light transmitting hole.
  • the surface texture recognition display device includes a substrate substrate, a contact plate, and a photosensitive unit on the substrate, which are in one-to-one correspondence with the photosensitive cells, and are located at the photosensitive plate facing the contact plate.
  • the side condensing lens is a light blocking portion that is in one-to-one correspondence with each condensing lens and is located between each condensing lens and a corresponding photosensitive unit.
  • a light blocking portion that is in one-to-one correspondence with each of the collecting lenses and located between each of the collecting lenses and the corresponding photosensitive unit.
  • each of the photosensitive unit and the contact plate is further provided with a light-transmitting hole and a collecting lens
  • the condensing lens is used to reflect back from the finger or the palm and illuminate the collecting lens.
  • the light converges in the direction of the main optical axis. Due to the arrangement of the light-transmissive holes, only some of the light that satisfies certain conditions can be illuminated onto the photosensitive unit, so that each photosensitive unit can only collect light of a specific transmission direction. Therefore, even if the light is single The distance between the element and the surface of the contact plate is large, and the optical crosstalk can also be reduced.
  • the concentrating lens can increase the light intensity, thereby improving the sensitivity of the touch.
  • the above-mentioned surface texture recognition display device provided by the embodiment of the present disclosure can be applied not only to fingerprint collection, palm print acquisition, or simultaneous acquisition of fingerprints and palm prints, but also applicable to collection of other textures, which is not limited herein.
  • the embodiments of the present disclosure are described by taking a texture as a fingerprint or a palm print as an example.
  • the contact plate is mainly used for contacting the textured surface.
  • the contact plate may be a transparent substrate, which is not limited herein.
  • the transparent substrate is, for example, a substrate transparent to light emitted from the light-emitting element 11.
  • a photosensitive unit is provided in all the pixel regions.
  • each of the pixel units P is arranged in a matrix, which is not limited herein.
  • the condensing lens 13 is a convex lens. Since the convex lens can converge the incident light parallel to the main optical axis at the same point of the main optical axis, that is, the focus O of the convex lens, so that only the incident light parallel to the main optical axis can be collected by the light transmitting hole, as shown in FIG. Therefore, each photosensitive unit 12 collects only incident light in a region covered by the corresponding condensing lens 13 and parallel to the main optical axis, and the light satisfying these conditions can only be located in the region covered by the condensing lens 13.
  • the fingerprint or palmprint reflects the light so that no optical crosstalk occurs regardless of the distance between the photosensitive unit 12 and the upper surface of the contact panel 20.
  • the shape of the orthographic projection of the light transmission hole H in the base substrate 10 is substantially the same as the shape of the orthographic projection of the convex lens 13 on the base substrate 10.
  • the center of the light transmission aperture eg, the geometric center
  • the shape of the light-transmitting hole in the orthographic projection of the contact plate is circular or square, and the shape of the orthographic projection of the convex lens on the contact plate also corresponds to a circle or a square, but the area of two circles or two squares may be equal, Can not be equal.
  • the width d of the light transmission hole in the cross section satisfies: d ⁇ sl/f;
  • s represents the distance between the center of the light-transmitting hole H and the focus O of the convex lens
  • l represents the maximum width of the convex lens in the cross section
  • f represents the focal length of the convex lens. This will ensure that all verticals The light from the convex lens can pass through the light transmission hole.
  • the distance between the light shielding portion 14 and the convex lens may be smaller than the focal length f of the convex lens; or as shown in FIG. 4b, the light shielding portion 14 and the convex lens The distance may be greater than the focal length f of the convex lens; or as shown in FIG. 4c, the distance between the light shielding portion 14 and the convex lens may be equal to the focal length f of the convex lens, that is, the focal point O of the convex lens coincides with the center A of the light transmission hole, which is not limited herein.
  • the relative position between the light shielding portion 14 and the convex lens can be determined according to actual conditions. However, as can be seen from the figure, the farther the light shielding portion 14 is from the focal point O of the convex lens, the larger the aperture of the light transmission hole on the light shielding portion 12.
  • the center of the light transmission hole is located at the focus of the convex lens. This minimizes the aperture of the light-transmitting aperture, so that light concentrated on the main optical axis at a point other than the focus can be prevented from being irradiated onto the photosensitive unit through the light-transmitting hole to the utmost extent.
  • the focus refers to the focus on the side of the convex lens facing the photosensitive unit.
  • the convex lens may be a biconvex structure (ie, having two opposite protruding curved surfaces), or may be a plano-convex structure (ie, having a plane and a protrusion). Surface), not limited here.
  • the convex lens has a plano-convex structure, and the plane of the convex lens faces the side of the light shielding portion, and the convex surface of the convex lens faces the side of the contact plate.
  • the convex lens can be formed by embossing.
  • the method further includes: a control switch transistor 15 connected in a pixel region in one-to-one correspondence with each of the photosensitive cells 12 (as a An example of a switching element); an identification scan line 16 for loading a corresponding control switching transistor 15 with an identification scan signal, and for loading a negative bias or reading a photosensitive unit to the photosensitive unit 12 via a corresponding control switching transistor 15
  • the output of the electrical signal of 12 is identified by the output line 17.
  • Each of the identification scanning lines 16 corresponds to each row of photosensitive cells 12, and each of the identification output lines 17 corresponds to each column of photosensitive cells 12; or each of the identification scanning lines 16 corresponds to each column of photosensitive cells 12, and each identification output line 17 corresponds one-to-one with each row of photosensitive cells 12.
  • the pixel circuit includes at least one pixel switching transistor 112 (as a second An example of a switching element); the pixel switching transistor 112 is identical in structure to the control switching transistor 15, and the pixel switching transistor 112 is disposed in the same layer as the component that controls the same function in the switching transistor 15. This makes it possible to prepare the control switching transistor while preparing the pixel switching transistor, so that it is not necessary to separately increase the process of fabricating the control switching transistor.
  • the photosensitive unit 12 is a photodiode
  • the organic electroluminescent structure 111 is located on a side of the pixel switching transistor 112 facing the contact plate 20;
  • a photodiode is located between the control switching transistor 15 and the organic electroluminescent structure 111.
  • one electrode of the photodiode is connected to the corresponding control switch transistor 15;
  • the surface texture recognition display device further includes: a reference signal line 18 connected to the other electrode of each photodiode.
  • the switching transistor generally includes a gate, an active layer, a source, and a drain.
  • the organic electroluminescent structure 111 includes a first electrode layer 111a and a light emitting layer sequentially located above the pixel switching transistor 112. 111b and the second electrode layer 111c;
  • the condensing lens 13 is located between the second electrode layer 111c and the contact plate 20.
  • the first electrode layer may be a cathode layer, and the second electrode layer may be an anode layer.
  • the first electrode layer may also be an anode layer, and the second electrode layer may be a cathode. Layers are not limited here.
  • the second electrode layer 111c is configured to be capable of transmitting light emitted from the light emitting layer.
  • Light condensed via the condensing lens 13 can propagate, for example, through the second electrode layer 111c.
  • the light shielding portion 14 is located between the first electrode layer 111a and the second electrode layer 111c, and the light shielding portion 14 is on the base substrate.
  • the orthographic projection of 10 does not overlap with the orthographic projection of the first electrode layer 111a on the base substrate 10.
  • the light shielding portion 14 is located in the same layer as the first electrode layer 111a and is independent of each other.
  • the display device generally includes a display panel, wherein the display panel includes an array substrate and an opposite substrate. Therefore, in the surface texture recognition display device provided by the embodiment of the present disclosure, the contact plate may refer to the opposite substrate in the existing display panel.
  • the contact plate may also be a protective cover on the outer side of the existing display panel, which is not limited herein.
  • the organic electroluminescent structure 111 may be employed as the original light source of the photosensitive unit 12, that is, when the object having the grain contacts the contact plate, the organic electroluminescent structure emits The light passes through the contact plate and is irradiated on the object with the grain and is reflected by the object having the grain; and the light reflected by the object having the grain passes through the contact plate and the collecting lens and then the main optical axis of the collecting lens. The direction is concentrated; finally, the light concentrated in the direction of the main optical axis of the collecting lens at least partially passes through the light transmitting hole and is irradiated onto the corresponding photosensitive unit.
  • a light shielding portion and a condensing lens are disposed above each photosensitive unit, and further, other film layers in the surface texture recognition display device are provided, which are not detailed herein. Said.
  • the substrate substrate 10, the gate electrode 30 sequentially disposed on the substrate substrate 10, the gate insulating layer 31, and the active layer 32, a first dielectric layer 33, a reference signal line 18, a second dielectric layer 34, a source 35 and a drain 36 disposed in the same layer, a first insulating layer 37, an identification output line 17 disposed in the same layer, a first connection portion 38, and The second connecting portion 39, the photosensitive unit 12, the second insulating layer 40, the first electrode layer 111a, the third connecting portion 41 and the light blocking portion 14, which are disposed in the same layer, the pixel defining layer 42, the light emitting layer 111b, and the second electrode layer 111c
  • the encapsulating film 43, the collecting lens 13, the polarizing layer 44, the transparent optical adhesive layer 45, and the contact plate 20 ie, the protective cover.
  • the first electrode layer 111a is an anode layer
  • the second electrode layer 111c is a cathode layer
  • the first electrode layer 111a is connected to the drain 36 of the pixel switching transistor 112
  • the identification output line 17 is connected to the source 35 of the control switching transistor 15.
  • One end of the photosensitive unit 12 is connected to the drain 36 of the control switching transistor 15 through the second connecting portion 39, and the other end of the photosensitive unit 12 is connected to the reference signal line 18 through the third connecting portion 41 and the first connecting portion 38.
  • the photosensitive unit is a photodiode
  • the photodiode generally includes a P electrode and a semiconductor layer. And N electrodes.
  • a transparent conductive layer is further disposed between the photodiode and the third connecting portion, which is not limited herein.
  • the method for fabricating the surface texture recognition display device comprises the steps of: (1) forming a gate electrode 30; (2) forming a gate insulating layer 31; (3) forming The source layer 32; (4) forming the first dielectric layer 33; (5) forming the reference signal line 18; (6) forming the second dielectric layer 34; (7) forming the source 35 and the drain 36; An insulating layer 37; (9) forming the identification output line 17, the first connecting portion 38 and the second connecting portion 39; (10) forming the photosensitive unit 12; (11) forming the second insulating layer 40; (12) forming the light blocking portion 14; (13) forming a first electrode layer 111a and a third connecting portion 41; (14) forming a pixel defining layer 42; (15) forming a light emitting layer 111b; (16) forming a second electrode layer 111c; (17) forming a package
  • the substrate substrate 10, the gate electrode 30 sequentially disposed on the substrate substrate 10, the gate insulating layer 31, and the active layer 32, a first dielectric layer 33, a reference signal line 18, a second dielectric layer 34, a source 35 and a drain 36 disposed in the same layer, a first insulating layer 37, an identification output line 17 disposed in the same layer, a first connection portion 38, and a second connecting portion 39, a photosensitive unit 12, a second insulating layer 40, a first electrode layer 111a and a third connecting portion 41 disposed in the same layer, a first pixel defining layer 42, a light blocking portion 14, and a second pixel defining layer 43,
  • the light-emitting layer 111b, the second electrode layer 111c, the encapsulation film 44, the condensing lens 13, the polarizing layer 45, the transparent optical adhesive layer 46, and the contact plate 20 ie, the protective cover.
  • the first electrode layer 111a is an anode layer
  • the second electrode layer 111c is a cathode layer
  • the first electrode layer 111a is connected to the drain 36 of the pixel switching transistor 112
  • the identification output line 17 is connected to the source 35 of the control switching transistor 15.
  • One end of the photosensitive unit 12 is connected to the drain 36 of the control switching transistor 15 through the second connecting portion 39, and the other end of the photosensitive unit 12 passes through the light shielding portion 14, the third connecting portion 41, and the first connecting portion 38 and the reference signal line 18.
  • the light shielding portion 14 is electrically conductive.
  • the photosensitive unit is a photodiode
  • the photodiode generally includes a P electrode, a semiconductor layer, and an N electrode.
  • a transparent conductive layer is further disposed between the photodiode and the third connecting portion, and is not used here. limited.
  • the method for fabricating the surface texture recognition display device comprises the steps of: (1) forming a gate electrode 30; (2) forming a gate insulating layer 31; (3) forming The source layer 32; (4) forming the first dielectric layer 33; (5) forming the reference signal line 18; (6) forming the second dielectric layer 34; (7) forming the source 35 and the drain 36; An insulating layer 37; (9) forming the identification output line 17, the first connecting portion 38 and the second connecting portion 39; (10) forming the photosensitive unit 12; (11) forming the second insulating layer 40; (12) forming the first The electrode layer 111a and the third connecting portion 41, (13) form a first pixel defining layer 42, (14) a light blocking portion 14, (15) a second pixel defining layer 43, (16) forming a light emitting layer 111b; (17) forming The second electrode layer 111c; (18) forms the encapsulation film 44; (19) forms the condensing
  • the surface texture recognition display device includes a substrate substrate, a contact plate, and a photosensitive unit located in at least a portion of the pixel area of the base substrate, corresponding to each photosensitive unit, and located in each photosensitive
  • the condensing lens facing the contact plate on the side of the contact plate and the condensing lens in one-to-one correspondence with each of the condensing lenses and located between the condensing lens and the corresponding photosensitive unit. Since each of the photosensitive unit and the contact plate is further provided with a light-transmitting hole and a collecting lens, when the finger or the palm touches the contact plate, the condensing lens is used to reflect back from the finger or the palm and illuminate the collecting lens.
  • the light converges in the direction of the main optical axis, but due to the arrangement of the light-transmitting holes, only some of the light that satisfies certain conditions can be irradiated onto the photosensitive unit, so that each photosensitive unit can only collect light of a specific transmission direction, so even the photosensitive unit and The distance between the surface of the contact plate is large, and the optical crosstalk can also be reduced.
  • the concentrating lens can increase the light intensity, thereby improving the sensitivity of the touch.

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Abstract

一种表面纹理识别显示装置，包括彼此重叠的衬底基板（10）和接触板（20），其中，所述接触板（20）具有构造为与具有纹理的表面接触的第一表面（S1），该第一表面（S1）位于所述接触板（20）的背离所述衬底基板（10）的一侧；以及多个像素单元（P），位于所述衬底基板（10）和所述接触板（20）之间，其中，至少一个所述像素单元（P）包括：感光元件（12），位于所述衬底基板（10）上；聚光元件（13），位于所述感光元件（12）与所述接触板（20）之间；遮光元件（14），位于所述聚光元件（13）与所述感光元件（12）之间，其中，所述遮光元件（14）具有透光孔（H），使得通过所述接触板（20）和所述聚光元件（13）的光线穿过所述透光孔（H）到达所述感光元件（12）。

Description

一种表面纹理识别显示装置 技术领域
本公开的实施例涉及一种表面纹理识别显示装置。
背景技术
随着显示技术的飞速发展，触摸屏(Touch Screen Panel)已经逐渐遍及人们的生活中。目前，触摸屏按照工作原理可以分为：电阻式、电容式、红外线式以及表面声波式、电磁式、振波感应式以及受抑全内反射光学感应式等。
发明内容
本公开的实施例提供一种表面纹理识别显示装置，包括：彼此重叠的衬底基板和接触板，其中，所述接触板具有构造为与具有纹理的表面接触的第一表面，该第一表面位于所述接触板的背离所述衬底基板的一侧；以及多个像素单元，位于所述衬底基板和所述接触板之间，其中，至少一个所述像素单元包括：感光元件，位于所述衬底基板上；聚光元件，位于所述感光元件与所述接触板之间；遮光元件，位于所述聚光元件与所述感光元件之间，其中，所述遮光元件具有透光孔，使得通过所述接触板和所述聚光元件的光线穿过所述透光孔到达所述感光元件。
在一个示例中，所述聚光元件的主光轴实质垂直于所述接触板。
在一个示例中，所述聚光元件为凸透镜。
在一个示例中，所述透光孔在所述接触板的正投影的形状与所述聚光元件在所述接触板的正投影的形状实质相同。
在一个示例中，所述透光孔的中心位于所述聚光元件的主光轴上。
在一个示例中，所述聚光元件的主光轴位于一截面中，所述透光孔的中心与所述聚光元件的焦点均位于所述截面中且彼此不重合，所述透光孔在所述截面中的宽度d满足：d≥sl/f；其中，s表示所述透光孔的中心与所述聚光元件的焦点之间的距离，l表示在所述截面中所述聚光元件的最大宽度，f 表示所述聚光元件的焦距。
在一个示例中，所述透光孔的中心与所述聚光元件的焦点重合。
在一个示例中，所述至少一个像素单元还包括：第一开关元件，其中，第一开关元件的源极与所述感光元件连接；所述第一开关元件的栅极与扫描线连接，所述第一开关晶体管的漏极与信号线连接。
在一个示例中，所述至少一个像素单元还包括：第二开关元件和发光元件；其中，发光元件包括第一电极层和第二电极层以及位于其间的发光层，所述第一电极层与所述第二开关元件连接。
在一个示例中，所述感光元件为具有第一电极和第二电极的光敏二极管，所述第一电极与所述第一开关元件的源极连接，所述第二电极与参考信号线连接。
在一个示例中，所述发光元件位于所述第二开关元件面向所述接触板一侧；所述感光元件位于所述第二开关晶体管与所述发光元件的第二电极之间。
在一个示例中，所述聚光元件位于所述第二电极层与所述接触板之间。
在一个示例中，在垂直于所述衬底基板的方向上，所述第二电极与所述聚光元件和所述遮光元件重叠。
在一个示例中，所述遮光元件位于所述第一电极层与第二电极层之间。
在一个示例中，所述遮光部与所述第一电极层位于同一层。
在一个示例中，所述遮光部在所述衬底基板的正投影与所述第一电极层在所述衬底基板的正投影不重叠。
在一个示例中，所述第二电极层构造为能够透射所述发光层发出的光线。
在一个示例中，所述第一开关元件的源极与所述第二开关元件的源极位于同层；所述第一开关元件的漏极与所述第二开关元件的漏极位于同层；所述第一开关元件的栅极与所述第二开关元件的栅极位于同层；所述第一开关元件的有源层与所述第二开关元件的有源层位于同层。
在一个示例中，所述遮光元件是导电的，所述感光元件的所述第二电极通过所述遮光元件与所述参考信号线连接。
这样，可以降低光串扰。
附图说明
为了更清楚地说明本公开实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本公开的一些实施例，而非对本公开的限制。
图1示出一种指纹识别显示装置的结构示意图；
图2为本公开实施例提供的表面纹理识别显示装置的结构示意图；
图3为本公开实施例提供的表面纹理识别显示装置在有手指触控时的部分光路原理图；
图4a至图4c分别为本公开实施例提供的表面纹理识别显示装置中遮光部与聚光透镜之间的相对位置示意图；
图5本公开实施例提供的表面纹理识别显示装置的部分电路图；
图6a和图6b分别为本公开实施例提供的表面纹理识别显示装置的结构示意图；
图7a和图7b分别为本公开实施例提供的表面纹理识别显示装置的结构示意图。
具体实施方式
为使本公开实施例的目的、技术方案和优点更加清楚，下面将结合本公开实施例的附图，对本公开实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本公开的一部分实施例，而不是全部的实施例。基于所描述的本公开的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本公开保护的范围。
附图中各部件的形状和大小不反映真实比例，目的只是示意说明本公开内容。
在触摸屏基于安全性的个人验证系统中，使用指纹进行识别的方法得到了广泛的使用。图1示出一种指纹识别显示装置，主要包括显示面板1，位于显示面板1上的保护盖板2；其中显示面板1中具有呈矩阵排列的像素区域，每个像素区域中设置有有机电致发光像素单元01和感光单元02。但是在上述指纹识别显示装置中，如图1所示，当有手指按压保护盖板2时，由于感光单元02与手指之间至少还设置有显示面板1的封装薄膜03、偏光片层04、透明光学胶层05和保护盖板2，因此手指与感光单元02之间的距离 较远，而有机电致发光像素单元01发出的光经过这些膜层后照射在手指上时会形成漫反射，且发散角相当大，这就导致指纹同一位置处的光再经过这些膜层后会照射到多个感光单元02上，从而发生光串扰。而且，指纹识别显示装置中的保护盖板2比较厚，因此光串扰问题比较严重，从而严重影响了指纹识别显示装置的指纹识别能力。
本公开实施例提供了一种表面纹理识别显示装置。这里，表面纹理识别显示装置是具有表面纹理识别功能的显示装置。表面纹理例如是指人的指纹和掌纹等等。如图2所示，该表面纹理识别显示装置包括：相对设置的衬底基板10和接触板20；其中衬底基板10上形成有多个像素单元P。至少部分像素单元P中设置有感光单元(即，感光元件)12。接触板20位于感光单元12背离衬底基板10一侧；每个像素单元P例如包括：
与各感光单元12一一对应、且位于各感光单元12面向接触板20一侧的聚光透镜(即，聚光构件)13，该聚光透镜13用于将由聚光透镜13面向接触板20一侧入射的光经聚光透镜13后向聚光透镜13的主光轴方向会聚；例如，该光在入射到聚光透镜13之前，例如经过与接触板20的第一表面S1接触的具有纹理的表面(例如人的手指表面)的反射而穿过所述接触板，而达到聚光透镜13。
与各聚光透镜13一一对应、且位于各聚光透镜13与对应的感光单元12之间的的遮光部(即，遮光构件)14，遮光部14具有一个透光孔，且沿对应的聚光透镜13的主光轴方向会聚的光至少部分穿过该透光孔照射在对应的感光单元12上。
本公开实施例提供的上述表面纹理识别显示装置，包括相对设置的衬底基板，接触板，位于衬底基板上的感光单元，与各感光单元一一对应、且位于各感光单元面向接触板一侧的聚光透镜，与各聚光透镜一一对应、且位于各聚光透镜与对应的感光单元之间的的遮光部。与各聚光透镜一一对应、且位于各聚光透镜与对应的感光单元之间的的遮光部。由于在每一感光单元与接触板之间还设置有透光孔和聚光透镜，这样当手指或手掌接触接触板时，利用聚光透镜使由手指或手掌反射回来且照射到聚光透镜的光向主光轴方向会聚。由于有透光孔的设置，因此只有部分满足特定条件的光才能照到感光单元上，从而实现各感光单元仅采集特定传输方向的光。因此，即使感光单 元与接触板上表面的距离较大，也可以降低光串扰。并且，聚光透镜可以增加光强度，从而提高触控的灵敏度。
需要说明的是，本公开实施例提供的上述表面纹理识别显示装置，不仅可以适用于指纹采集、掌纹采集或指纹和掌纹同时采集，还可以适用与其它纹路的采集，在此不作限定。为了便于说明，本公开实施例均是以纹路为指纹或掌纹为例进行说明的。
进一步需要说明的是，在本公开实施例提供的上述表面纹理识别显示装置中，接触板主要用于与具有纹理的表面接触。例如，接触板可选为透明基板，在此不作限定。这里，透明基板例如是对发光元件11发出的光透明的基板。例如，在本公开实施例提供的上述表面纹理识别显示装置中，为了提高识别精度，在所有像素区域中均设置有感光单元。
进一步地，在本公开实施例提供的上述表面纹理识别显示装置中，各像素单元P呈矩阵排列，在此不作限定。
例如，在本公开实施例提供的上述表面纹理识别显示装置中，如图3所示，聚光透镜13为凸透镜。由于凸透镜可以使与主光轴平行的入射光会聚于主光轴的同一点上即凸透镜的焦点O上，从而可以利用透光孔仅采集与主光轴平行的入射光，如图3所示，这样相当于各感光单元12仅采集对应的聚光透镜13所覆盖的区域内、且平行主光轴的入射光，而满足这些条件的光只能是位于聚光透镜13所覆盖的区域内的指纹或掌纹所反射的光，从而不管感光单元12与接触板20上表面的距离多远，均不会产生光串扰。
例如，在本公开实施例提供的上述表面纹理识别显示装置中，透光孔H在衬底基板10的正投影的形状与凸透镜13在衬底基板10的正投影的形状实质相同。透光孔的中心(例如，几何中心)位于凸透镜的主光轴上。
例如透光孔在接触板的正投影的形状为圆形或正方形，凸透镜在接触板的正投影的形状也对应为圆形或正方形，但是两个圆形或两个正方形的面积可以相等，也可以不相等。例如，在本公开实施例提供的上述表面纹理识别显示装置中，如图4a至图4c所示，在沿凸透镜的主光轴的任意截面中，透光孔在截面中的宽度d满足：d≥sl/f；
其中，s表示透光孔H的中心与凸透镜的焦点O之间的距离，l表示在截面中凸透镜的最大宽度，f表示凸透镜的焦距。这样可以保证所有垂直入 射凸透镜的光线均可以通过透光孔。
例如，在本公开实施例提供的上述表面纹理识别显示装置中，如图4a所示，遮光部14与凸透镜的距离可以小于凸透镜的焦距f；或者如图4b所示，遮光部14与凸透镜的距离也可以大于凸透镜的焦距f；或者如图4c所示，遮光部14与凸透镜的距离也可以等于凸透镜的焦距f，即凸透镜的焦点O与透光孔的中心A重合，在此不作限定，可以根据实际情况确定遮光部14与凸透镜之间的相对位置。但是从图中可以看出，遮光部14距离凸透镜的焦点O越远，遮光部12上的透光孔的孔径越大。
例如，在本公开实施例提供的上述表面纹理识别显示装置中，透光孔的中心位于凸透镜的焦点。这样可以使透光孔的孔径最小，从而可以最大程度的避免会聚于主光轴上除了焦点之外的其它点上的光通过透光孔照射到感光单元上。
需要说明的是，本公开实施例提供的上述表面纹理识别显示装置中，焦点均是指位于凸透镜面向感光单元一侧的焦点。
例如，在本公开实施例提供的上述表面纹理识别显示装置中，凸透镜可以是双凸结构(即，具有两个相反的突出曲面)，也可以是平凸结构(即，具有一个平面和一个突出曲面)，在此不作限定。
例如，为了便于制作，在本公开实施例提供的上述表面纹理识别显示装置中，凸透镜为平凸结构，且凸透镜的平面面向遮光部一侧，凸透镜的凸面面向接触板一侧。例如，该凸透镜可以采用压印的方式形成。
进一步地，在本公开实施例提供的上述表面纹理识别显示装置中，如图5所示，还包括：与各感光单元12一一对应连接的且位于像素区域中的控制开关晶体管15(作为第一开关元件的示例)；用于向对应的控制开关晶体管15加载识别扫描信号的识别扫描线16，以及用于通过对应的控制开关晶体管15向感光单元12加载负向偏压或读取感光单元12的输出电信号的识别输出线17。
各识别扫描线16与各行感光单元12一一对应，各识别输出线17与各列感光单元12一一对应；或，各识别扫描线16与各列感光单元12一一对应，各识别输出线17与各行感光单元12一一对应。
例如，在本公开实施例提供的上述表面纹理识别显示装置中，如图2所 示，还包括位于各像素区域中的像素电路和与像素电路电连接的有机电致发光结构111，如图6a和图6b所示；像素电路中包括有至少一个像素开关晶体管112(作为第二开关元件的示例)；像素开关晶体管112与控制开关晶体管15结构相同，且像素开关晶体管112与控制开关晶体管15中相同功能的部件同层设置。这样可以在制备像素开关晶体管的同时制备控制开关晶体管，从而不需要单独增加制作控制开关晶体管的工艺。
进一步地，在本公开实施例提供的上述表面纹理识别显示装置中，如图6a和图6b所示，感光单元12为光敏二极管；
有机电致发光结构111位于像素开关晶体管112面向接触板20一侧；
光敏二极管位于控制开关晶体管15与有机电致发光结构111之间。
进一步地，在本公开实施例提供的上述表面纹理识别显示装置中，如图5所示，光敏二极管的一个电极与对应的控制开关晶体管15连接；
表面纹理识别显示装置还包括：与各光敏二极管的另一个电极连接的参考信号线18。
例如，在本公开实施例提供的上述表面纹理识别显示装置，开关晶体管一般包括栅极、有源层、源极和漏极。
进一步地，在本公开实施例提供的上述表面纹理识别显示装置中，如图6a和图6b所示，有机电致发光结构111包括依次位于像素开关晶体管112上方的第一电极层111a、发光层111b和第二电极层111c；
聚光透镜13位于第二电极层111c与接触板20之间。
例如，本公开实施例提供的上述表面纹理识别显示装置中，第一电极层可以为阴极层，第二电极层为阳极层，当然第一电极层也可以为阳极层，第二电极层为阴极层，在此不作限定。
例如，第二电极层111c构造为能够透射发光层发出的光线。经由聚光透镜13会聚的光例如能够传播通过所述第二电极层111c。
进一步地，在本公开实施例提供的上述表面纹理识别显示装置中，如图6a所示，遮光部14位于第一电极层111a与第二电极层111c之间，且遮光部14在衬底基板10的正投影与第一电极层111a在衬底基板10的正投影不重叠。
或者，在本公开实施例提供的上述表面纹理识别显示装置中，如图6b 所示，遮光部14与第一电极层111a位于同一层且相互独立。
例如，显示装置一般包括显示面板，其中显示面板包括阵列基板和对向基板，因此在本公开实施例提供的上述表面纹理识别显示装置中，接触板可以是指现有显示面板中的对向基板，当然，接触板也可以是现有显示面板外侧的保护盖板，在此不作限定。
例如，在本公开实施例提供的上述表面纹理识别显示装置中，可以采用有机电致发光结构111作为感光单元12的原始光源，即当具有纹路的物体接触接触板时，有机电致发光结构发出的光经接触板后照射在具有纹路的物体上并被该具有纹路的物体反射；而被具有纹路的物体所反射回来的光依次经过接触板和聚光透镜后向聚光透镜的主光轴方向会聚；最后沿聚光透镜的主光轴方向会聚的光至少部分穿过透光孔后照射在对应的感光单元上。
在本公开实施例提供的上述表面纹理识别显示装置中，在每个感光单元上方设置有遮光部和聚光透镜，此外，还设置有表面纹理识别显示装置中的其它膜层，在此不作详述。
下面通过实施例详细说明本公开实施例提供的上述表面纹理识别显示装置中遮光部和聚光透镜的位置，但是不限于此，仅是为了举例说明。
在本公开实施例提供的上述表面纹理识别显示装置中，如图7a所示，包括：衬底基板10，依次位于衬底基板10上的栅极30，栅绝缘层31，有源层32，第一介质层33，参考信号线18，第二介质层34，同层设置的源极35和漏极36，第一绝缘层37，同层设置的识别输出线17、第一连接部38和第二连接部39，感光单元12，第二绝缘层40，同层设置的第一电极层111a、第三连接部41和遮光部14，像素限定层42，发光层111b，第二电极层111c，封装薄膜43，聚光透镜13，偏光层44、透明光学胶层45，接触板20(即保护盖板)。
其中，第一电极层111a为阳极层，第二电极层111c为阴极层，第一电极层111a与像素开关晶体管112的漏极36相连，识别输出线17与控制开关晶体管15的源极35相连，感光单元12的一端通过第二连接部39与控制开关晶体管15的漏极36相连，感光单元12的另一端通过第三连接部41以及第一连接部38与参考信号线18相连。
例如，感光单元为光敏二极管，光敏二极管一般包括P电极、半导体层 和N电极。
例如，在光敏二极管与第三连接部之间还设置有透明导电层，在此不作限定。
以如图7a所示的表面纹理识别显示装置为例，该表面纹理识别显示装置的制作方法包括以下步骤：(1)形成栅极30；(2)形成栅绝缘层31；(3)形成有源层32；(4)形成第一介质层33；(5)形成参考信号线18；(6)形成第二介质层34；(7)形成源极35和漏极36；(8)形成第一绝缘层37；(9)形成识别输出线17、第一连接部38和第二连接部39；(10)形成感光单元12；(11)形成第二绝缘层40；(12)形成遮光部14；(13)形成第一电极层111a和第三连接部41；(14)形成像素限定层42；(15)形成发光层111b；(16)形成第二电极层111c；(17)形成封装薄膜43；(18)形成聚光透镜13；(19)形成偏光层44；(20)形成透明光学胶层45；(21)形成接触板20。
在本公开实施例提供的上述表面纹理识别显示装置中，如图7b所示，包括：衬底基板10，依次位于衬底基板10上的栅极30，栅绝缘层31，有源层32，第一介质层33，参考信号线18，第二介质层34，同层设置的源极35和漏极36，第一绝缘层37，同层设置的识别输出线17、第一连接部38和第二连接部39，感光单元12，第二绝缘层40，同层设置的第一电极层111a和第三连接部41，第一像素限定层42，遮光部14，第二像素限定层43，发光层111b，第二电极层111c，封装薄膜44，聚光透镜13，偏光层45、透明光学胶层46，接触板20(即保护盖板)。
其中，第一电极层111a为阳极层，第二电极层111c为阴极层，第一电极层111a与像素开关晶体管112的漏极36相连，识别输出线17与控制开关晶体管15的源极35相连，感光单元12的一端通过第二连接部39与控制开关晶体管15的漏极36相连，感光单元12的另一端通过遮光部14、第三连接部41以及第一连接部38与参考信号线18相连。这里，遮光部14是导电的。
例如，感光单元为光敏二极管，光敏二极管一般包括P电极、半导体层和N电极。
例如，在光敏二极管与第三连接部之间还设置有透明导电层，在此不作 限定。
以如图7b所示的表面纹理识别显示装置为例，该表面纹理识别显示装置的制作方法包括以下步骤：(1)形成栅极30；(2)形成栅绝缘层31；(3)形成有源层32；(4)形成第一介质层33；(5)形成参考信号线18；(6)形成第二介质层34；(7)形成源极35和漏极36；(8)形成第一绝缘层37；(9)形成识别输出线17、第一连接部38和第二连接部39；(10)形成感光单元12；(11)形成第二绝缘层40；(12)形成第一电极层111a和第三连接部41，(13)形成第一像素限定层42，(14)遮光部14，(15)第二像素限定层43，(16)形成发光层111b；(17)形成第二电极层111c；(18)形成封装薄膜44；(19)形成聚光透镜13；(20)形成偏光层45；(21)形成透明光学胶层46；(22)形成接触板20。
本公开实施例提供的上述表面纹理识别显示装置，包括相对设置的衬底基板，接触板，位于衬底基板的至少部分像素区域中的感光单元，与各感光单元一一对应、且位于各感光单元面向接触板一侧的聚光透镜，与各聚光透镜一一对应、且位于各聚光透镜与对应的感光单元之间的的遮光部。由于在每一感光单元与接触板之间还设置有透光孔和聚光透镜，这样当手指或手掌接触接触板时，利用聚光透镜使由手指或手掌反射回来且照射到聚光透镜的光向主光轴方向会聚，但是由于有透光孔的设置，因此只有部分满足特定条件的光才能照到感光单元上，从而实现各感光单元仅采集特定传输方向的光，因此即使感光单元与接触板上表面的距离较大，也可以降低光串扰。并且，聚光透镜可以增加光强度，从而提高触控的灵敏度。
显然，本领域的技术人员可以对本公开进行各种改动和变型而不脱离本公开的精神和范围。这样，倘若本公开的这些修改和变型属于本公开权利要求及其等同技术的范围之内，则本公开也意图包含这些改动和变型在内。
本申请要求于2016年8月4日递交的中国专利申请第201610633369.5号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (19)

  1. 一种表面纹理识别显示装置，包括：
    彼此重叠的衬底基板和接触板，其中，所述接触板具有构造为与具有纹理的表面接触的第一表面，该第一表面位于所述接触板的背离所述衬底基板的一侧；以及
    多个像素单元，位于所述衬底基板和所述接触板之间，其中，至少一个所述像素单元包括：
    感光元件，位于所述衬底基板上；
    聚光元件，位于所述感光元件与所述接触板之间；
    遮光元件，位于所述聚光元件与所述感光元件之间，其中，所述遮光元件具有透光孔，使得通过所述接触板和所述聚光元件的光线穿过所述透光孔到达所述感光元件。
  2. 如权利要求1所述的表面纹理信息采集器，其中，所述聚光元件的主光轴实质垂直于所述接触板。
  3. 如权利要求1或2所述的表面纹理信息采集器，其中，所述聚光元件为凸透镜。
  4. 如权利要求1至3中任一项所述的表面纹理信息采集器，其中，所述透光孔在所述接触板的正投影的形状与所述聚光元件在所述接触板的正投影的形状实质相同。
  5. 如权利要求1至4中任一项所述的表面纹理信息采集器，其中，所述透光孔的中心位于所述聚光元件的主光轴上。
  6. 如权利要求1至5中任一项所述的表面纹理信息采集器，其中，所述聚光元件的主光轴位于一截面中，所述透光孔的中心与所述聚光元件的焦点均位于所述截面中且彼此不重合，所述透光孔在所述截面中的宽度d满足：d≥sl/f；
    其中，s表示所述透光孔的中心与所述聚光元件的焦点之间的距离，l表示在所述截面中所述聚光元件的最大宽度，f表示所述聚光元件的焦距。
  7. 如权利要求1至6中任一项所述的表面纹理信息采集器，其中，所述透光孔的中心与所述聚光元件的焦点重合。
  8. 如权利要求1至7中任一项所述的表面纹理识别显示装置，其中，所述至少一个像素单元还包括：第一开关元件，其中，第一开关元件的源极与所述感光元件连接；所述第一开关元件的栅极与扫描线连接，所述第一开关晶体管的漏极与信号线连接。
  9. 如权利要求8所述的表面纹理识别显示装置，其中，所述至少一个像素单元还包括：第二开关元件和发光元件；其中，发光元件包括第一电极层和第二电极层以及位于其间的发光层，所述第一电极层与所述第二开关元件连接。
  10. 如权利要求9所述的表面纹理识别显示装置，其中，所述感光元件为具有第一电极和第二电极的光敏二极管，所述第一电极与所述第一开关元件的源极连接，所述第二电极与参考信号线连接。
  11. 如权利要求9或10所述的表面纹理识别显示装置，其中，
    所述发光元件位于所述第二开关元件面向所述接触板一侧；
    所述感光元件位于所述第二开关晶体管与所述发光元件的第二电极之间。
  12. 如权利要求9至11中任一项所述的表面纹理识别显示装置，其中，所述聚光元件位于所述第二电极层与所述接触板之间。
  13. 如权利要求9至12中任一项所述的表面纹理识别显示装置，其中，在垂直于所述衬底基板的方向上，所述第二电极与所述聚光元件和所述遮光元件重叠。
  14. 如权利要求9至13中任一项所述的表面纹理识别显示装置，其中，所述遮光元件位于所述第一电极层与第二电极层之间。
  15. 如权利要求9至13中任一项所述的表面纹理识别显示装置，其中，所述遮光部与所述第一电极层位于同一层。
  16. 如权利要求9至15中任一项所述的表面纹理识别显示装置，其中，所述遮光部在所述衬底基板的正投影与所述第一电极层在所述衬底基板的正投影不重叠。
  17. 如权利要求9至16中任一项所述的表面纹理识别显示装置，其中，所述第二电极层构造为能够透射所述发光层发出的光线。
  18. 如权利要求9至17中任一项所述的表面纹理识别显示装置，其中， 所述第一开关元件的源极与所述第二开关元件的源极位于同层；所述第一开关元件的漏极与所述第二开关元件的漏极位于同层；所述第一开关元件的栅极与所述第二开关元件的栅极位于同层；所述第一开关元件的有源层与所述第二开关元件的有源层位于同层。
  19. 如权利要求10所述的表面纹理识别显示装置，其中，所述遮光元件是导电的，所述感光元件的所述第二电极通过所述遮光元件与所述参考信号线连接。
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