WO2017222495A1 - Procédé de fabrication d'une structure de film multicouche et structure de film multicouche - Google Patents

Procédé de fabrication d'une structure de film multicouche et structure de film multicouche Download PDF

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Publication number
WO2017222495A1
WO2017222495A1 PCT/US2016/026236 US2016026236W WO2017222495A1 WO 2017222495 A1 WO2017222495 A1 WO 2017222495A1 US 2016026236 W US2016026236 W US 2016026236W WO 2017222495 A1 WO2017222495 A1 WO 2017222495A1
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WO
WIPO (PCT)
Prior art keywords
main surface
adhesive
flexible substrate
multilayer film
film structure
Prior art date
Application number
PCT/US2016/026236
Other languages
English (en)
Inventor
Daniel P. Forster
Original Assignee
Applied Materials, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials, Inc. filed Critical Applied Materials, Inc.
Priority to CN201680087022.3A priority Critical patent/CN109311277A/zh
Priority to PCT/US2016/026236 priority patent/WO2017222495A1/fr
Publication of WO2017222495A1 publication Critical patent/WO2017222495A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B29D11/00788—Producing optical films
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04—Interconnection of layers
    • B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • E—FIXED CONSTRUCTIONS
    • E06—DOORS, WINDOWS, SHUTTERS, OR ROLLER BLINDS IN GENERAL; LADDERS
    • E06B—FIXED OR MOVABLE CLOSURES FOR OPENINGS IN BUILDINGS, VEHICLES, FENCES OR LIKE ENCLOSURES IN GENERAL, e.g. DOORS, WINDOWS, BLINDS, GATES
    • E06B9/00—Screening or protective devices for wall or similar openings, with or without operating or securing mechanisms; Closures of similar construction
    • E06B9/24—Screens or other constructions affording protection against light, especially against sunshine; Similar screens for privacy or appearance; Slat blinds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00634—Production of filters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00—Coating on the layer surface
    • B32B2255/10—Coating on the layer surface on synthetic resin layer or on natural or synthetic rubber layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00—Coating on the layer surface
    • B32B2255/20—Inorganic coating
    • B32B2255/205—Metallic coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/30—Properties of the layers or laminate having particular thermal properties
    • B32B2307/304—Insulating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/402—Coloured
    • B32B2307/4026—Coloured within the layer by addition of a colorant, e.g. pigments, dyes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/412—Transparent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/50—Properties of the layers or laminate having particular mechanical properties
    • B32B2307/546—Flexural strength; Flexion stiffness
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/50—Properties of the layers or laminate having particular mechanical properties
    • B32B2307/584—Scratch resistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/71—Resistive to light or to UV
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/732—Dimensional properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2605/00—Vehicles
    • B32B2605/006—Transparent parts other than made from inorganic glass, e.g. polycarbonate glazings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00—Additional features of adhesives in the form of films or foils
    • C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/31—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive effect being based on a Gecko structure
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates

Definitions

  • Embodiments of the present disclosure relate to methods of manufacturing flexible multilayer film structures configured to be attached to support elements, e.g. to glazing elements.
  • Embodiments of the present disclosure particularly relate to methods of manufacturing window films to be attached to support elements.
  • Further embodiments disclosed herein relate to methods of modifying at least one of the transmittivity and the reflectance of a support element, e.g. a glazing element, by attaching a multilayer film structure thereto, as well as to multilayer film structures.
  • a typical example of a multilayer film structure configured to be adhered to a support element is a window film or a solar control film.
  • a window film can be attached to a planar or curved support element such as a transparent or semitransparent glazing element, e.g. a window, in order to alter the solar radiation transmission of the window.
  • a window film By applying a window film to a window of a building, solar heat gain of the building may be reduced, and the comfort inside a building may be improved, while reducing the cooling load to be provided by an air conditioning unit
  • Some solar control films have a high thermal reflectivity. Such low emissivity films may reduce thermal energy loss through windows so that less heating energy may be needed in the case of low outdoor temperatures.
  • a multilayer film structure e.g. a window film
  • a support element e.g. a large-area support element
  • applying an adhesive layer between the multilayer film structure and the support element may be time consuming and may lead to an undulating or uneven surface of the attached multilayer film structure.
  • removal or exchange of the window film in case of a film defect may be problematic.
  • a method of manufacturing a multilayer film structure is provided, which is configured to be attached to a support element.
  • the method includes: providing a flexible substrate with a first main surface and a second main surface, wherein the first main surface is self-adhesive; and vacuum depositing a layer system on the second main surface.
  • the multilayer film structure may be a window film or a solar control film, which is configured to be attached to a transparent or semi- transparent glazing element, e.g. to a window.
  • a multilayer film structure configured to be attached to a support element.
  • the multilayer film structure includes a flexible substrate with a self-adhesive first main surface, wherein a layer system is vacuum deposited on a second main surface of the flexible substrate.
  • the multilayer film structure may be manufactured according to any of the methods described herein.
  • the multilayer film structure may be a window film or a solar control film configured to be attached to a transparent or semi-transparent glazing element, e.g. a window.
  • a method of modifying at least one of a transmittivity and a reflectance of a support element includes: providing a multilayer film structure, the multilayer film structure including: a flexible substrate with a self-adhesive first main surface, and a layer system vacuum deposited on a second main surace of the flexible substrate; and attaching the multilayer film structure to the support element by applying the self-adhesive first main surface of the flexible substrate to an attachment surface of the support element
  • providing the multilayer film structure may include manufacturing the multilayer film structure according to any of the methods described herein.
  • FIG. 1 illustrates a method of manufacturing a multilayer film structure according to embodiments described herein;
  • FIG. 2 shows a schematic sectional view of a vacuum deposition apparatus for manufacturing a multilayer film structure according to methods described herein;
  • FIG. 3 shows a schematic sectional view of a further vacuum deposition apparatus for manufacturing a multilayer film structure according to methods described herein;
  • FIG. 4 illustrates a method of modifying at least one of the tiansmittivity and the reflectance of a support element by attaching a multilayer film structure thereto, according to embodiments described herein;
  • FIG. 5 is a schematic sectional view (not to scale) of a multilayer film structure according to embodiments described herein that is attached to a support element;
  • FIG. 6 is a flow diagram of a method of manufacturing a multilayer film structure according to the methods described herein.
  • FIG. 7 is a flow diagram of a method of modifying at least one of the transnirttivity and the reflectance of a support element according to methods described herein.
  • Processing of flexible substrates is in high demand in the packaging industry, semiconductor industry and in other industries.
  • Processing may include coating of a flexible substrate with a material such as a metal in a vacuum chamber.
  • Systems performing this task may include a substrate support, e.g. a processing drum, coupled to a processing system for transporting the substrate through the vacuum chamber.
  • a substrate support e.g. a processing drum
  • a processing system for transporting the substrate through the vacuum chamber.
  • roll-to-roll coating systems can provide a high throughput.
  • An evaporation process such as a thermal evaporation process, can be utilized for depositing thin layer systems, e.g. including metal layers or metallized layers, onto flexible substrates, e.g. for display manufacturing.
  • Thin layer systems can alternatively or additionally be manufactured via PVD processes, e.g. sputtering, and CVD processes, particularly with PECVD processes.
  • Vacuum deposition of layer systems can be used for manufacturing multilayer film structures with a flexible substrate, on which the layer system is deposited.
  • FIG. 1 illustrates a method of manufacturing a multilayer film structure 100 according to embodiments described herein.
  • a flexible substrate 110 is provided, wherein the flexible substrate 110 has a first main surface 112 and a second main surface 114.
  • the first main surface 112 is a self-adhesive surface.
  • a "self-adhesive surface” as used herein may be a surface of a substrate which has adhesive or attachment capabilities.
  • the self-adhesive surface may be configured to adhere to an attachment surface of a support element, e.g. a smooth surface such as a glass surface when applied thereto.
  • a support element e.g. a smooth surface such as a glass surface when applied thereto.
  • no adhesive agent, bonding agent or ghie is to be applied to the self-adhesive surface for attaching the self-adhesive surace to the support element, because the self-adhesive surface is configured to adhere to the support element when applied thereto.
  • the self-adhesive surface may include microstructures with adhesive properties.
  • the microstructures may be biomimetic structures inspired by the adhesive abilities of the feet of arthropods or vertebrates, e.g. geckos.
  • Microstructures as used herein may also include structures with dimensions smaller than 1 um, e.g. between 0.01 um and 100 um.
  • the flexible substrate 110 with the self- adhesive first main surface 112 may be composed of a thin flexible film, e.g. a single- material film, wherein one of the two main surfaces of the thin flexible film may be processed to be self-adhesive, e.g. by micro-stiucturing or coating one of the main surfaces.
  • micro-structuring or coating may include applying microstructures with adhesion capabilities to one of the main surfaces of a thin flexible film
  • the flexible substrate 110 may include two or more layers, wherein the layer with the self-adhesive first main surface 112 may be an adhesive layer or a layer with adhesion properties, e.g. due to respective microstructures on or in a main surface thereof.
  • the layer with the self-adhesive first main surface 112 may be an adhesive layer or a layer with adhesion properties, e.g. due to respective microstructures on or in a main surface thereof.
  • at least one layer of the flexible substrate may be a gecko-tape.
  • the complete area of the first main surface 112 may be self-adhesive.
  • the first main surface 112 does not comprise a region that does not adhere to a support element when applied thereto.
  • the first ⁇ surface 112 is at least partially self-adhesive. For example, 20% or more, 50% or more, 80% or more, or 95% or more of the area of the first main surface 112 are self-adhesive.
  • at least a periphery section of the first main surface 112 is self-adhesive, and/or the first main surface 112 is provided with a self-adhesive pattern.
  • a layer system 120 may be vacuum deposited on the second mam surface 114 of the flexible substrate 110 which is the substrate surface opposite to the self-adhesive first main surface 112.
  • the second main surface 114 may be configured such that one or more layers can be vacuum deposited thereon.
  • the substrate may include a haidcoat film, wherein an exposed surface of the hardcoat fibn constitutes the second main surface 114.
  • a layer system as used herein may be understood as a single thin material layer or as a stack of thin layers including two, three or more thin layers deposited on the second main surface 114 in succession.
  • the layer system includes at least one metal layer or at least one metallized layer and at least one cover layer covering the metal layer, e.g. a protection layer, particularly an oxide layer.
  • Vacuum deposition of a layer as used herein may be understood as coating the flexible substrate in a vacuum chamber 201.
  • the layer system 120 may be deposited by a vacuum deposition apparatus configured for processing a flexible substrate, e.g. a web, in a vacuum chamber 201.
  • the vacuum chamber 201 may include at least two vacuum processing regions, wherein each vacuum processing region is configured for depositing one or more thin layers on the flexible substrate.
  • a first vacuum processing region may be configured for deposition of a first material layer on the substrate
  • a second vacuum processing region may be configured for deposition of a second material layer on the first material layer.
  • Hie vacuum processing regions may be separated from each other, e.g. by gas separation units providing a narrow slit or gap between the vacuum processing regions for a substrate to be transported between the vacuum processing regions.
  • the vacuum chamber 201 may be provided such that a vacuum, i.e. a pressure below atmospheric pressure, e.g. a pressure below 10 mbar, below 1 mbar or below 0.1 mbar, may be generated in the vacuum chamber 201.
  • a vacuum i.e. a pressure below atmospheric pressure, e.g. a pressure below 10 mbar, below 1 mbar or below 0.1 mbar.
  • Various vacuum deposition techniques can be used for vacuum depositing the layer system on the second main surface 114 of the flexible substrate.
  • vacuum deposition may include introducing a process gas into the vacuum chamber 201 so that the process gas can chemically or physically interact with the second main surface 114 of the flexible substrate 110.
  • a second process gas may be introduced into the vacuum chamber 201 so that the second process gas can chemically or physically interact with the substrate. The second process gas can be different from the first process gas
  • FIG. 1 shows a vacuum processing apparatus including the vacuum chamber 201, wherein the flexible substrate 110 can be transported through the vacuum chamber 201 along a substrate transportation path.
  • the layer system 120 may be deposited on the second main surface 114 during transport of the flexible substrate 110 through the vacuum chamber.
  • the second main surface 114 of the flexible substrate 110 may be directed toward at least one deposition source 221 configured for providing a coating material, whereas the self-adhesive first main surface 112 may be directed away from the at least one deposition source 221. Accordingly, primarily or exclusively the second main surface 114 of the flexible substrate may be coated.
  • the self-adhesive first main surface 112 of the flexible substrate 110 may be covered with a protective layer so that no coating material can apply to the self-adhesive first main surface 112. Further, handling of the flexible substrate 110 may be easier, when the self-adhesive first main surface 112 is covered with the protective layer so that the flexible substrate 110 does not adhere to components of the vacuum chamber 201, e.g. to a substrate support.
  • a layer system 120 is deposited on a substrate which already includes a self-adhesive main surface. Accordingly, no additional adhesive agent or glue is needed for attaching the manufactured multilayer film structure 100 to a support element, e.g. to a glazing element. Rather, after vacuum deposition of the layer system 120, the multilayer film structure may be ready for use. Handling of the multilayer film structure can be simplified, as no additional adhesive agent or glue is to be applied to the multilayer film structure or to the support element.
  • the multi-layer film structure manufactured according to embodiments described herein can be uniformly attached to a large-area support element, e.g. to a window, as no additional viscous adhesive agent is to be used. Viscous adhesive agents or ghies may lead to an undulating or uneven surface of the multilayer film structure.
  • the self-adhesive first main surface can be attached to the support element in a quick and easy manner.
  • an adhesive layer may be applied to a rear surface of a multilayer film structure after deposition of a layer system on a front surface thereof.
  • the layer system 120 is vacuum deposited on a flexible substrate with a self-adhesive first main surface. Both manufacture and handling of the multilayer film structure can be simplified.
  • the multilayer film structure manufactured according to methods described herein can be uniformly attached to an attachment surface of a support element after vacuum deposition of the layer system.
  • the self-adhesive first main surface 112 may be reusable.
  • the first main surface may retain the self-adhesive qualities even after many uses, e.g. after 5, 20, 100 or more uses.
  • Handling of the multilayer film structure can be further simplified. For example, in case the multilayer film structure should not be attached to the support element in a sufficiently precise way, removal and re-attachment may be possible. Further, exchange or removal of the multilayer film structure from the support element may be easily possible.
  • the multilayer film structure may be a window film or a solar control film, which may be configured to be attached to a transparent or semi- transparent glazing element, in particular to a window or another glass element
  • the window film may include the flexible substrate and a layer system deposited thereon, wherein the layer system may be configured for at least one or more of thermal insulation, blocking or reducing UV radiation, glare reduction, heat reduction, safety, security, and decoration.
  • the window film may be a low emissivity film ('low e window film”) which may reflect thermal radiation back into the interior of a room.
  • the low e window film may reflect solar heat away from the windows, reducing the cooling costs, while the transmittivity in the optical range (e.g. between 400 and 700 nm) may be high, e.g. above 80% so that the visible solar light may enter the room.
  • the transmittivity in the optical range e.g. between 400 and 700 nm
  • the layer system 120 which is vacuum deposited on the second main surface 114 of the flexible substrate 110 may be configured for modifying at least one of the transmittivity and the reflectance of the support element by attaching the multilayer film structure 100 thereto.
  • the transmittivity and the reflectance for at least one of thermal radiation, infrared radiation, visible radiation and UV radiation of the support element may be modified by attaching the multilayer film structure thereto.
  • the layer system 120 may be configured for reducing the transmittivity for at least one of infrared, visible, and UV light, e.g. by 20% or more, 50% or more or 90%.
  • the layer system 120 may include at least one reflective layer for at least partially reflecting incoming solar radiation or outgoing thermal radiation, e.g. a thin metal layer or a reflective ceramic layer.
  • the metal layer may be transparent or essentially transparent in the visible range.
  • the average transmittivity of the layer system in a wavelength range between 400 nm and 700 nm may be 80% or more, or 90% or more.
  • window films may allow certain wavelengths to pass and may be used to minimize temperature gradients.
  • the window film may be configured to be applied to existing windows and automotive glass.
  • the transmittivity of the window film for UV light may be 20% or less or 10% or less.
  • UV transmission may be reduced by 80% or more, or 90% or more.
  • the reflectance of the window film for thermal radiation may be 50% or more, or 80% or more.
  • incoming and/or outgoing thermal radiation can be reflected to a percentage of 50% or more, or 80% or more.
  • the transmittivity of the window film for visible radiation may be between 10% and 90%, e.g. between 30% and 70%. Glare can be reduced as appropriate ("solar control film").
  • the multilayer film structure according to embodiments described herein may be an insulation film, packaging film or another multilayer polymeric film, web or foil in the packaging industry, semiconductor industry and other industries, for example in the field of battery manufacturing.
  • the multilayer film structures according to embodiments described herein may be or include at least one of labels, advertisements, and digital signage films.
  • a removable layer may be applied to the self-adhesive first main surface of the substrate (e.g. a thin substrate with a thickness of 15 um or less), in order to prevent damaging of the substrate and/or of the layer system by increasing the thermal mass and the mechanical stability.
  • a removable heat conductivity layer e.g. a metal layer, may be applied to the self-adhesive first main surface during vacuum deposition, in order to improve heat transfer from the substrate to a cooled substrate support surface of a substrate support.
  • FIG. 2 illustrates a method of manufacturing a multilayer film structure 100 according to embodiments described herein in a vacuum processing apparatus including a vacuum chamber 201.
  • a flexible substrate 110 with the self-adhesive first main surface 112 and a second main surface 114 may be transported through the vacuum chamber 201 along a substrate transportation path.
  • a rotatable coating drum 210 may be provided as a substrate support for guiding the flexible substrate 110 along a substrate transportation path.
  • a flat substrate support can alternatively or additionally be used for supporting the flexible substrate 110.
  • the coating drum 210 may be rotatable around a rotation axis 212.
  • An outer roller surface of the coating drum 210 may be configured as a support surface 211 for supporting the flexible substrate 110 during transport.
  • vacuum deposition may include guiding the flexible substrate 110 on the support surface 211 of the coating drum 210, wherein the self-adhesive first main surface 112 may be directed toward the coating drum 210.
  • the temperature of the substrate support particularly of the outer support surface of the coating drum, may be kept below 200°C, in particular below 100°C, e.g. in a range between 30°C and 80°C during vacuum deposition. Damage of the self-adhesive first main surface 112 can be prevented and the self- adhesive properties may be maintained.
  • two or more deposition sources 222, 224 are provided for depositing two or more layers of the layer system 120 on the second main surface 114 of the flexible substrate.
  • the two or more deposition sources 222, 224 may be arranged radially outside the coating drum 210. While the second main surface 114 may be directed away from the substrate support toward the deposition sources 222, 224 during deposition, the self-adhesive first main surface 112 may be directed toward the support surface 211 of the substrate support. For example, the self-adhesive first main surface 112 may be directed toward an outer roller surface of the coating drum 210.
  • the self-adhesive first main surface 112 may be an exposed outer surface of the flexible substrate 110 during vacuum deposition. In mis case, in some embodiments, the self-adhesive first main surface 112 may come into direct contact with the support surface 211 of the substrate support during processing. For example, the first main surface 112 may adhere to the substrate support when being transported thereon, and may be detached afterward from the substrate support.
  • the self-adhesive first main surface 112 may include a multi-use adhesion mechanism to be adhered to and removed from an attachment surface multiple times.
  • the self-adhesive first main surface 112 may be covered with a protection layer 111 during vacuum deposition of the layer system 120.
  • a protection layer 111 may be applied to the self-adhesive first main surface 112 before vacuum deposition.
  • the protection layer 111 may be configured as a release liner to be removed from the self-adhesive first main surface before attachment of the multilayer film structure to the support element
  • a first protection layer and a second protection layer may be provided over the first main surface 112.
  • the first protection layer may be a release liner directly covering the first main surface 112 of the substrate and/or the second protection layer may be a protective coating provided on top of the first protection layer, e.g. an interleaf layer configured to facilitate processing of the flexible substrate in the vacuum processing apparatus.
  • both the first and second protection layers can be removed from the substrate.
  • the protection layer 111 may serve not only to prevent contamination of the self-adhesive surface during handling, transport and deposition, but may also avoid undesirable adhesion of the self-adhesive surface to components of the vacuum processing apparatus or to other components. For example, it may be possible to wind the multilayer film structure in the form or a roll, when the self-adhesive first main surface 112 is partially or entirely covered with a protection layer.
  • a first deposition source may be provided for vacuum deposition of a first layer of the layer system 120, and a second deposition source may be provided subsequently for vacuum deposition of a second layer of the layer system 120, e.g. on top of the first layer. More than two deposition sources 222, 224 for depositing more than two layers may be provided.
  • vacuum deposition may include at least one of direct current (DC) sputtering, pulsed DC sputtering, alternating current (AC) sputtering, AC -superimposed DC sputtering, radio frequency (RF) sputtering, chemical vapour deposition (CVD), hot filament CVD (HFCVD), plasma enhanced CVD (PECVD), atomic layer deposition (ALD), atomic layer CVD (ALCVD), physical vapour deposition (PVD), and evaporation.
  • DC direct current
  • AC alternating current
  • RF radio frequency
  • At least one of the deposition sources 222, 224 may be configured as an evaporation source or as a CVD source with a gas inlet for introducing a process gas and with a gas outlet for removing a reaction gas from the vacuum chamber.
  • At least one of the deposition sources may be configured as a sputter source including a target to be sputtered for providing the material to be deposited. Magnetron sputtering can be used.
  • the sputter source may include a rotatable target, e.g. a cylindrical target rotatable around a cylinder axis.
  • a flat sputter target may be provided.
  • the sputter source may comprise an array of targets, e.g. an array of rotatable targets.
  • the layer system 120 to be vacuum deposited may include at least one metal layer or metallized layer, particularly at least one of an aluminum layer and a silver layer.
  • the metal layer or metallized layer can reduce visible light transmission as appropriate.
  • the metal layer may be vacuum deposited directly on the flexible substrate, which may be a polymeric substrate. In some embodiments, the metal layer is deposited between two oxide layers.
  • the layer system may be a conductive layer system with two oxide layers and a metal layer, particularly a silver layer, interposed between the two oxide layers on the flexible substrate.
  • the surface resistivity of the layer system may be less than 2.9, and/or the mean Haacke quality factor ( ⁇ 10 / ⁇ ) of the layer system for the wavelengths 435, 545 and 610 nm may be greater than 0.085 "1 .
  • the Haacke quality factor is defined in the Journal of Applied Physics, Vol. 47, pages 4086- 4089 (1976).
  • the two oxide layers may be selected to have a thickness of less than 50 nm, particularly between 30 nm and 40 nm, and the metal layer may have a thickness of less than 20 nm, e.g. about 15 nm.
  • Glare suppression by the oxide layers may be especially good if, in addition to indium, at least one of the oxide layers includes cerium, e.g. up to 10 at.% cerium.
  • the metal layer may be a silver layer, wherein the stability of the silver layer can be enhanced by addition of up to 10 wt.% of copper, e.g. addition of 0.5 to 3 wL%.
  • the layer system 120 may include an indium cerium oxide layer, a copper-doped silver layer, and a covering indium cerium oxide layer. [0071] ⁇ n some embodiments, the layer system 120 may include at least one UV absorption layer or UV protection layer. Alternatively or additionally, the flexible substrate may be configured as a UV absorption layer, e.g. as a polymer film containing an ultraviolet absorber.
  • the layer system 120 may include at least one scratch resistant layer, e.g. as the topmost layer and/or as a layer covering a metal layer.
  • the layer system 120 may include two or more metal layers. At least one polymeric film and/or oxide film may be provided between two adjacent metal layers.
  • the layer system 120 may include an anti-reflection layer stack for reflection reduction, e.g. in the visible range.
  • the layer system 120 may include at least one coloured layer, e.g. a layer with at least one colorant.
  • at least one layer may include one or more dyes, e.g. an organic dye.
  • the layer system 120 may be configured for providing a shading effect when applied to a support element.
  • the flexible substrate may include a transparent polymeric film, particularly a polyester film, more particularly a PET film.
  • a PET film polyethylene terephthalate film
  • the flexible substrate is a PET-film, wherein the first main surface of the PET-film is microstructured such as to have adhesion properties when applied to a glazing element.
  • the thickness of the flexible substrate may be 500 um or less, particularly 300 um or less. In some embodiments, the thickness of the flexible substrate is in a range between 20 um and 300 um, particularly between 30 um and 100 um.
  • FIG. 3 shows a schematic sectional view of a roll-to-roll vacuum deposition apparatus, in which the above described methods may be practiced.
  • the roll-to-roll vacuum deposition apparatus is configured for depositing a layer system 120 on a flexible substrate 110.
  • the vacuum deposition apparatus 300 may include at least a first vacuum processing region 312 and a second vacuum processing region 314 which may be separated from each other by at least one gas separation unit 316, wherein a gas separation passage 318 configured as a passageway for the flexible substrate 110 is provided therebetween.
  • the vacuum deposition apparatus 300 shown in FIG. 3 includes a vacuum chamber 301.
  • Various vacuum deposition techniques can be used to deposit the layer system on the flexible substrate 110.
  • the flexible substrate 110 is guided, as indicated by arrow X, into the vacuum chamber 301.
  • the flexible substrate 110 can be guided into the vacuum chamber 301 from an unwinding station.
  • the flexible substrate is directed by rollers 322 to a substrate support configured for supporting the flexible substrate during processing and or deposition.
  • the substrate support can be a coating drum 210, which is rotatable around a rotation axis 212. From the coating drum 210, the flexible substrate 110 is guided to a further roller 324 and out of the vacuum chamber 301, as indicated by the second arrow X.
  • the embodiment depicted in FIG. 3 includes a first deposition source 222 provided in the first vacuum processing region 312, and a second deposition source 224 provided in the second vacuum processing region 314.
  • the flexible substrate 110 is supported by the coating drum while being processed.
  • more man two deposition sources can be provided.
  • four, five, six, or even more deposition sources can be provided.
  • the vacuum processing regions may be separated from adjacent vacuum processing regions and from a main volume of the vacuum chamber 301 by gas separation units 316.
  • the flexible substrate 110 has a self-adhesive first main surface 112 which can be covered with a protection layer 111 configured as a release liner.
  • the flexible substrate may be guided on the support surface 211 of the rotatable coating drum 210, wherein the first main surface 112 is directed toward the rotatable coating drum.
  • the first main surface 112 does not directly come into contact with the roller surface.
  • the layer system 120 comprising two or more layers is vacuum deposited on the second main surface 114 of the flexible substrate which is directed away from the rotatable coating drum 210 via the first deposition source 222 in the first vacuum processing region 312 and via the second deposition source 224 in the second vacuum processing region.
  • the multilayer film structure 100 may be ready for use.
  • the protection layer 111 covering the first main surface 112 may be removed, and the first main surface 112 may be attached to a support element 150.
  • FIG. 4 illustrates a method of modifying at least one of the transmittivity and the reflectance of a support element ISO, e.g. a glazing element, particularly a glass element such as a window.
  • a support element ISO e.g. a glazing element, particularly a glass element such as a window.
  • the method includes providing a flexible multilayer film structure 100 according to any of the embodiments described herein.
  • the multilayer film structure 100 may include a flexible substrate 110 and a layer system 120 vacuum deposited on a second main surface 114 thereof.
  • the multilayer film structure 100 is a window film or a solar control film. It is noted that a layer system 120 vacuum deposited on a flexible substrate 110 is distinguishable from a layer system attached to a substrate via a different material bonded connection, e.g. via an adhesive agent or a glue.
  • the method may further include attaching the multilayer film structure 100 to the support element 150 by applying the self-adhesive first main surface 112 of the flexible substrate 110 to an attachment surface 151 of the support element ISO.
  • the multilayer film structure 100 may be a window film or a solar control film, and attaching the multilayer film structure 100 may include applying the self-adhesive first main surface 112 to an inner surface of a window, i.e. a main surface of a window directed to the interior of a building.
  • the first main surface 112 of the flexible substrate 110 may be provided with nucrostructures 161 with adhesive capability.
  • FIG. 5 An example of a flexible substrate 110 with first main surface 112 provided with nucrostructures 161 is shown in FIG. 5 in a schematic way (not to scale). In particular, the microstructures depicted in FIG.5 have been significantly enlarged.
  • the microstructures 161 with adhesive capability include synthetic setae 162.
  • the flexible substrate 110 may be or may comprise a "synthetic setae material".
  • the adhesive capabilities of the self-adhesive surface may be related to the adhesive properties of a gecko foot
  • the natural adhesive capability of the gecko foot allows the animal to adhere to surfaces of many types under most conditions.
  • the adhesive capability of the gecko foot is provided by numerous hair-type extensions, called setae, on the feet of the gecko.
  • synthetic setae mate rial is to be understood as a synthetic material which emulates the natural adhesive capability of the gecko foot and which includes similar adhesive capabilities to the gecko foot
  • synthetic setae material may be synonymously used with the term “synthetic gecko setae material” or with the term “gecko tape material”.
  • the substrate may be partially or entirely inorganic.
  • the self-adhesive microstructure of the first main surface may be substantially 100% inorganic.
  • the microstructure of the self-adhesive first main surface may include nanotubes.
  • the microstructure of the self-adhesive surface includes carbon nanotubes.
  • one of the main surfaces of a polymeric substrate e.g. a PET substrate
  • the contact and release cycles for adherence of the flexible substrate in wet and dry environments can be increased.
  • the surface structure of the self-adhesive first main surface may be provided by a MEMS (mkroelectromechanical system) or NEMS (nanoelectromechanical) fabrication technique, including at least one of photolitography, electron beam litography, plasma etching, deep reactive ion etching, CVD.
  • the synthetic setae 162 may provide an increase of surface area of the first main surface 112, so that van der Waals forces between the synthetic setae 162 and a substantially fiat attachment surface 151 of a glazing element may alone be high enough to provide the adhesive strength.
  • the adhesion strength between the first main surface 112 and a glass surface may be 0.01 N/cm 2 or more, 0.1 N/cm 2 or more, or 1 N/cm 2 or more in a direction perpendicular to the glass surface.
  • the first main surface 112 of the flexible substrate 110 may include at least one of carbon nano tubes, micro fibers, microfilaments, micro- fingers, gecko inspired surface elements, micro hook-and-loop elements, micro suction pads with suction capabilities, and microvoids.
  • the flexible substrate may be or comprise a film with a first main surface that sticks to a flat surface of a support element without any viscous adhesive agent, bonding agent, or glue.
  • the film may be easy to stick on to the support element and easy to remove (re -useable adhesive).
  • the self-adhesive first main surface may include at least one of microvoids or micro suction pads with suction capabilities when applied to a flat attachment surface.
  • the self-adhesive first main surface may be the outer surface of an adhesive layer, e.g. a pressure-sensitive adhesive layer or a dry adhesive layer.
  • the first main surface may be an electroadhesive surface.
  • the first main surface may be electrostatically charged.
  • the flexible substrate may be at least partially made from a material suitable for material deposition.
  • a top layer of the substrate may be made from a material suitable for material deposition.
  • the substrate may be at least partially made from a polymer material, e.g. PET.
  • a multilayer film structure 100 to be attached to a support element is provided.
  • the multilayer film structure may be manufactured according to any of the manufacturing methods disclosed herein.
  • the multilayer film structure 100 includes a self-adhesive first main surface 112 and a layer system 120 which is vacuum deposited on a second main surface 114 of the flexible substrate 110.
  • the first main surface 112 may be provided with microstructures 161 with adhesive capabilities, in particular with synthetic setae 162.
  • the adhesion mechanism of the self-adhesive surface may be configured according to any of the embodiments disclosed herein.
  • the layer system 120 may include one or more of the features described above in an arbitrary combination.
  • the layer system 120 is configured to provide a window film or a solar control film for modifying at least one of a transmittivity and a reflectance of a support element, when the multilayer film structure is applied thereto.
  • FIG. 6 is a flow diagram of a method of manufacturing a multilayer film structure according to the methods described herein.
  • a flexible substrate with a first main surface and a second main surface is provided, wherein the first main surface is self-adhesive.
  • a layer system is vacuum deposited on the second main surface.
  • the multilayer film structure is a window film or a solar control film, and the layer system is configured for modifying at least one of a transmittrvity and a reflectance of a glazing element, when the multilayer film structure is applied thereto.
  • the first main surface is provided with microstructures with adhesive capability, in particular with synthetic setae .
  • FIG. 7 is a flow diagram of a method of modifying at least one of the transmittivily and the reflectance of a support element according to methods described herein.
  • a multilayer film structure is provided, wherein the multilayer film structure may be manufactured according to any of the methods described herein.
  • the self-adhesive first main surface of the flexible substrate may be optionally covered with a protection layer, e.g. a release liner.
  • a protection layer e.g. a release liner.
  • the protection layer is removed from the first main surface of the flexible substrate so that the first main surface is exposed.
  • the multilayer film structure 100 is attached to a support element, e.g. to a glazing element, particularly to a window, by applying the self-adhesive first main surface of the flexible substrate to an attachment surface of the support element.

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  • Materials Engineering (AREA)
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Abstract

Selon un aspect, la présente invention concerne un procédé de fabrication d'une structure de film multicouche (100) conçue pour être fixée à un élément de support. Le procédé consiste à fournir un substrat flexible (110) ayant une première surface principale (112) et une seconde surface principale (114), la première surface principale étant auto-adhésive ; et à déposer sous vide un système de couche (120) sur la seconde surface principale (114). Selon d'autres aspects, l'invention porte sur un procédé de modification d'un pouvoir de transmission et/ un pouvoir de réflexion d'un élément de support (150) par la fixation d'une structure de film multicouche (100) à celui-ci ainsi que sur une structure de film multicouche (100).
PCT/US2016/026236 2016-06-22 2016-06-22 Procédé de fabrication d'une structure de film multicouche et structure de film multicouche WO2017222495A1 (fr)

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PCT/US2016/026236 WO2017222495A1 (fr) 2016-06-22 2016-06-22 Procédé de fabrication d'une structure de film multicouche et structure de film multicouche

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Cited By (2)

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WO2022125442A1 (fr) * 2020-12-08 2022-06-16 Applied Materials, Inc. Pré-lithiation et revêtements d'anode exempts de métal lithium
CN115236773A (zh) * 2022-07-01 2022-10-25 天津山河光电科技有限公司 超表面器件及其制作方法、光学成像系统

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CN112869261A (zh) * 2021-02-22 2021-06-01 中国长江三峡集团有限公司 仿生壁虎皮肤的自贴合高气密性口罩及方法

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US6365284B1 (en) * 1999-06-04 2002-04-02 Crown Operations International, Ltd. Flexible solar-control laminates
US6707610B1 (en) * 2002-09-20 2004-03-16 Huper Optik International Pte Ltd Reducing the susceptibility of titanium nitride optical layers to crack
US20090011232A1 (en) * 2007-07-05 2009-01-08 University Of Dayton Aligned carbon nanotubes for dry adhesives and methods for producing same
DE102013219903A1 (de) * 2013-10-01 2015-04-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Oberflächenbeschichtung mit Seltenerdmetalloxiden

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US6707610B1 (en) * 2002-09-20 2004-03-16 Huper Optik International Pte Ltd Reducing the susceptibility of titanium nitride optical layers to crack
US20090011232A1 (en) * 2007-07-05 2009-01-08 University Of Dayton Aligned carbon nanotubes for dry adhesives and methods for producing same
DE102013219903A1 (de) * 2013-10-01 2015-04-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Oberflächenbeschichtung mit Seltenerdmetalloxiden

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Publication number Priority date Publication date Assignee Title
WO2022125442A1 (fr) * 2020-12-08 2022-06-16 Applied Materials, Inc. Pré-lithiation et revêtements d'anode exempts de métal lithium
CN115236773A (zh) * 2022-07-01 2022-10-25 天津山河光电科技有限公司 超表面器件及其制作方法、光学成像系统

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