WO2017210924A1 - 对透明基板进行曝光的方法 - Google Patents

对透明基板进行曝光的方法 Download PDF

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Publication number
WO2017210924A1
WO2017210924A1 PCT/CN2016/086809 CN2016086809W WO2017210924A1 WO 2017210924 A1 WO2017210924 A1 WO 2017210924A1 CN 2016086809 W CN2016086809 W CN 2016086809W WO 2017210924 A1 WO2017210924 A1 WO 2017210924A1
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WO
WIPO (PCT)
Prior art keywords
reticle
transparent substrate
light
different
polarization directions
Prior art date
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Ceased
Application number
PCT/CN2016/086809
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English (en)
French (fr)
Inventor
戴文
杜鹏
应见见
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US15/110,067 priority Critical patent/US10527947B2/en
Publication of WO2017210924A1 publication Critical patent/WO2017210924A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2032—Simultaneous exposure of the front side and the backside
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Definitions

  • the present invention relates to the field of liquid crystal technology, and in particular to a method of exposing a transparent substrate.
  • High-generation glass substrates in order to improve glass utilization and reduce costs, use Mixed Typesetting (Multi Mode) Glass, abbreviated MMG) technology, in which panels of different sizes are arranged on a glass substrate, in this way, the discarded substrate area is small, and the glass substrate has high cutting efficiency, so that liquid crystal panel manufacturers are favored.
  • MMG Mixed Typesetting
  • the technical problem to be solved by the present invention is to provide a method for exposing a transparent substrate, which can simplify the process process, shorten the process time, and improve the production efficiency.
  • a technical solution adopted by the present invention is to provide a method for exposing a transparent substrate, comprising: fixing a relative position of the first photomask, the second photomask, and the transparent substrate; The first reticle and the second reticle generate different light beams with different polarization directions to expose different regions of the transparent substrate; and the relative positions of the first reticle, the second reticle and the transparent substrate are fixed.
  • Exposing different regions of the transparent substrate includes: illuminating light generated by the first light source through the first reticle onto the transparent substrate; and simultaneously illuminating light generated by the second light source through the second light The cover is irradiated onto the transparent substrate.
  • the first reticle and the second reticle respectively comprise a light-transmitting region and a light-shielding region, and the light-transmitting region and the light-shielding region of the first reticle respectively correspond to the light-shielding region of the second reticle and transmit light region.
  • the fixing the relative positions of the first reticle, the second reticle and the transparent substrate comprises:
  • the first photomask, the second photomask, and the transparent substrate are placed vertically.
  • the cover generates light having different polarization directions to expose different regions of the transparent substrate, and controls light intensities of light rays having different polarization directions such that different regions of the transparent substrate are exposed to the same extent.
  • the cover produces light that is perpendicular to the polarization direction and exposes different regions of the transparent substrate.
  • another technical solution adopted by the present invention is to provide a method for exposing a transparent substrate, comprising: fixing a relative position of the first reticle, the second reticle, and the transparent substrate; The first reticle and the second reticle generate light having different polarization directions to expose different regions of the transparent substrate.
  • the fixing the relative positions of the first reticle, the second reticle and the transparent substrate comprises: disposing the transparent substrate between the first reticle and the second reticle, and the three are mutually Parallel; respectively, using the first reticle and the second reticle to generate different polarization directions to expose different regions of the transparent substrate: the light generated by the first light source passes through the first reticle Irradiating onto the transparent substrate; light generated by the second light source is irradiated onto the transparent substrate through the second mask.
  • the first reticle and the second reticle respectively comprise a light-transmitting region and a light-shielding region, and the light-transmitting region and the light-shielding region of the first reticle respectively correspond to the light-shielding region of the second reticle and transmit light region.
  • the fixing the relative positions of the first reticle, the second reticle and the transparent substrate comprises: horizontally placing the first reticle, the second reticle, and the transparent substrate; or the first light
  • the cover, the second mask, and the transparent substrate are placed vertically.
  • the cover generates light having different polarization directions to expose different regions of the transparent substrate, and controls light intensities of light rays having different polarization directions such that different regions of the transparent substrate are exposed to the same extent.
  • the cover produces light that is perpendicular to the polarization direction and exposes different regions of the transparent substrate.
  • the invention has the beneficial effects that the first photomask, the second photomask and the transparent substrate are fixed in position relative to the prior art; and the first photomask and the second photomask are respectively used.
  • Light rays having different polarization directions are generated to expose different regions of the transparent substrate. Since the first reticle, the second reticle, and the transparent substrate are directly fixed by using the first reticle and the second reticle separately, the first reticle and the second reticle are used to generate light having different polarization directions. Exposure to different areas of the transparent substrate, in this way, can simplify the exposure process, shorten the process time, and improve production efficiency.
  • FIG. 1 is a flow chart of an embodiment of a method for exposing a transparent substrate of the present invention
  • FIG. 2 is a schematic structural view of an embodiment of light alignment when a glass substrate is vertically placed in a method of exposing a transparent substrate according to the present invention
  • FIG. 3 is a schematic structural view showing an embodiment of light alignment when a glass substrate is horizontally placed in a method of exposing a transparent substrate according to the present invention
  • Figure 4 is a schematic view of a 8.5 generation line glass substrate mixed typesetting 8 pieces of 43 inch and 8 pieces of 22 inch;
  • FIG. 5 is a schematic view of two photomasks required for photoalignment of FIG. 4 by the method of exposing a transparent substrate according to the present invention
  • Fig. 6 is a schematic view showing the optical alignment of a conventional two-illuminated glass substrate in the prior art.
  • FIG. 1 is a flow chart of an embodiment of a method for exposing a transparent substrate according to the present invention, comprising:
  • Step S101 Fix the relative positions of the first reticle, the second reticle and the transparent substrate.
  • Step S102 The first reticle and the second reticle respectively generate different light beams with different polarization directions to expose different regions of the transparent substrate.
  • the first reticle and the second reticle may be respectively fixed on both sides of the transparent substrate, or the first reticle may be The second photomask is fixed on the same side of the transparent substrate.
  • the first mask and the second mask can transmit polarized light in different directions and respectively correspond to different exposure regions of the transparent substrate.
  • One is to provide polarized light in different directions, and the polarized light in different directions is transmitted through the first reticle and the second reticle respectively; the other is the first reticle and the second reticle.
  • the polarizer can be attached, and the light rays respectively pass through the first reticle and the second reticle to generate polarized light of different polarization directions.
  • the first reticle, the second reticle, and the transparent substrate are directly fixed by using the first reticle and the second reticle separately, the first reticle and the second reticle are used to generate light having different polarization directions. Exposure to different areas of the transparent substrate, in this way, can simplify the exposure process, shorten the process time, and improve production efficiency.
  • the step S101 may specifically include: disposing a transparent substrate between the first reticle and the second reticle, and the three are parallel to each other; and the transparent substrate is disposed between the first reticle and the second reticle, that is, The first mask and the second mask are disposed on both sides of the transparent substrate.
  • the positional space in which the first reticle and the second reticle are fixed can be made more convenient.
  • the step S102 may be specifically: the light generated by the first light source is irradiated onto the transparent substrate through the first mask; and the light generated by the second light source is irradiated onto the transparent substrate through the second mask.
  • the first reticle and the second reticle respectively comprise a light-transmitting region and a light-shielding region, and the light-transmitting region and the light-shielding region of the first reticle respectively correspond to the light-shielding region and the light-transmitting region of the second reticle. That is to say, the light-transmitting region of the first reticle is a light-shielding region in the second reticle; the light-shielding region of the first reticle is a light-transmitting region in the second reticle.
  • the step S101 may further be: placing the first reticle, the second reticle, and the transparent substrate horizontally; or placing the first reticle, the second reticle, and the transparent substrate vertically.
  • first reticle and the second reticle are on the same side of the transparent substrate
  • there are two solutions that is, placing the first reticle, the second reticle, and the transparent substrate horizontally, the first reticle and the second reticle
  • the upper or lower side of the transparent substrate; or the first reticle, the second reticle, and the transparent substrate are vertically placed, and the first reticle and the second reticle are simultaneously on the left or right side of the transparent substrate.
  • first reticle and the second reticle are on both sides of the transparent substrate
  • first reticle and the second reticle are on both sides of the transparent substrate
  • first reticle and the second reticle are on both sides of the transparent substrate
  • first reticle and the second reticle are on both sides of the transparent substrate
  • first reticle and the second reticle are on both sides of the transparent substrate
  • the transparent substrate are horizontally placed, and the first reticle and the second reticle are respectively
  • the first reticle, the second reticle, and the transparent substrate are vertically placed on the upper side and the lower side of the transparent substrate, and the first reticle and the second reticle are respectively on the left and right sides of the transparent substrate.
  • the step S102 may further include: generating light having different polarization directions by using the first mask and the second mask, respectively, and simultaneously exposing different regions of the transparent substrate.
  • the first reticle and the second reticle are used to simultaneously emit light having different polarization directions, which is advantageous for shortening the processing time.
  • the step S102 may further include: exposing different regions of the transparent substrate to light having different polarization directions by using the first mask and the second mask, respectively, and controlling light intensity of light having different polarization directions, so as to make the transparent substrate The extent of exposure in different areas is equal.
  • the light transmission may be different on both sides of the transparent substrate or in different places on the same side.
  • the light intensity of the light of different polarization directions may be controlled, for example: In areas with poor light, the light intensity of the light can be increased.
  • the step S102 may further include: exposing different regions of the transparent substrate by using the first reticle and the second reticle to generate light having a vertical polarization direction. That is to say, after the first mask and the second mask, the polarization directions of the polarized light generated are perpendicular to each other, and in this way, a pattern perpendicular to the direction after exposure can be obtained.
  • the step S102 may include: respectively, using the first reticle and the second reticle to generate light having different polarization directions, and exposing different regions of the transparent substrate to achieve optical alignment.
  • the transparent is basically a glass substrate as an example, and the light source is exemplified by ultraviolet polarized light.
  • the first reticle and the second reticle are respectively fixed on both sides of the glass substrate, and ultraviolet polarization sources having different polarization directions are respectively disposed.
  • the specific implementation plans are:
  • Solution 1 The glass substrate is placed vertically, and the UV polarized light on the left and right sides of the glass substrate respectively passes through the first and second reticle and the second reticle, and simultaneously aligns the regions of different sizes of the glass substrate.
  • figure 2 is a schematic structural view of an embodiment of light alignment when the glass substrate is placed vertically, from left to right, UV polarized light source 1 (indicated by an arrow) and first photomask 2 (shaded area is a light-shielding area, coated with opaque light) Material), glass substrate 3 (A and B regions respectively correspond to regions of different sizes of the glass substrate), second mask 4 (shaded region is a light-shielding region, coated with an opaque material), UV-polarized light source 5, wherein The glass substrate 3 and the first mask 2 and the second mask 4 can be fixed by a jig.
  • Solution 2 The glass substrate is horizontally placed, and the UV polarized light on the upper and lower sides of the glass substrate is respectively transmitted through the first and second photomasks of the upper and lower horizontal layers, and the optical alignment is performed on the regions of different sizes of the glass substrate. See Figure 3, figure 3 It is a schematic structural diagram of a light alignment method when the glass substrate is horizontally placed.
  • the UV polarized light source 10 From top to bottom, the UV polarized light source 10, the first photomask 20 (the shaded area is a light-shielding region, coated with an opaque material), and the glass substrate 30 ( A region and B region respectively correspond to regions of different sizes of the glass substrate), a second photomask 40 (shaded region is a light-shielding region coated with an opaque material), a UV-polarized light source 50, wherein the glass substrate 30 and the first light
  • the cover 20 and the second mask 40 can be fixed by a jig.
  • a 8.5-generation line glass substrate can be mixed and typeset 8 pieces 43 Inch (zone A in Figure 4) and eight 22-inch (B area in Figure 4) two sizes, mixed layout can make the glass substrate more efficient.
  • Figure 5 It is the two masks that need to be used in the photo-alignment process of the glass substrate of FIG. 4, wherein the shaded area is a light-shielding area to shield the area that does not need illumination, and the arrow indicates the polarization direction of the ultraviolet-polarized light to meet the light alignment requirements of different areas. .
  • Figure 6 is a prior art In-Plane Switching (IPS)/Fringe Field Switch (Fringe Field) Switching, abbreviated FFS) panel traditional two-light glass substrate 300 for light alignment (Photo Alignment), in the first illumination, it is necessary to block the B region with the first mask 200, and then use the ultraviolet polarized light 100 to perform the optical alignment of the A region. Similarly, in the second illumination, the second mask is used. 400 blocks the A zone, and then uses the UV polarized light 500 to complete the optical alignment of the B zone. At this time, the optical alignment process of the 300A zone and the B zone of the entire glass substrate is completed.
  • IPS In-Plane Switching
  • FFS Fluor Field Switching
  • the present application can complete the photo-alignment process of the A and B regions of the entire glass substrate in one time by the scheme of FIG. 2 or FIG. 3.
  • the optical alignment of the entire glass substrate can be completed in one illumination process, and the production process can be greatly improved without changing the process or a new mask.
  • an array substrate such as a thin film transistor (Thin Film Transistor, abbreviated TFT) substrate or color filter (Color Filter, abbreviated CF)
  • TFT Thin Film Transistor
  • CF color filter
  • the transmittance of ultraviolet light on both sides of the substrate may be different.
  • the light intensity of the ultraviolet light outside the TFT or CF substrate may be appropriately increased to ensure the intensity of the ultraviolet light irradiated onto the alignment film during the optical alignment process is equal, and the process is improved. Uniformity.
  • the present application can improve the production efficiency and reduce the manufacturing process and production cost of the liquid crystal panel while ensuring the light alignment effect.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Polarising Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

一种对透明基板（3）进行曝光的方法，包括：将第一光罩（2）、第二光罩（4）与透明基板（3）的相对位置固定（S101）；分别利用第一光罩（2）、第二光罩（4）产生偏振方向不同的光线对透明基板（3）的不同区域进行曝光（S102）。通过上述方式，能够简化曝光制程工艺，缩短制程时间，使生产效率得到提高。

Description

对透明基板进行曝光的方法
【技术领域】
本发明涉及液晶技术领域，特别是涉及一种对透明基板进行曝光的方法。
【背景技术】
高世代玻璃基板，为了提高玻璃利用率，降低成本，采用混合排版（Multi Mode Glass，简写MMG）技术，即在玻璃基板上排布不同尺寸的板（panel），通过这种方式，可使丢弃的基板面积较小，玻璃基板切割效率高，因此得到液晶面板厂商青睐。
通常不同尺寸的panel在大玻璃基板上排列的方式不同，从而导致在进行光配向时，所需偏振光的偏振方向不同。在传统的光配向制程中，这种混合尺寸的光配向制程往往用到光罩。先对一个尺寸panel进行配向时，用光罩挡住其他方式排布的panel。因此需要进行多次光照配向，这样会造成制程时间增加，使生产效率降低。
【发明内容】
本发明主要解决的技术问题是提供一种对透明基板进行曝光的方法，能够简化制程工艺，缩短制程时间，提高生产效率。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种对透明基板进行曝光的方法，包括：将第一光罩、第二光罩与所述透明基板的相对位置固定；分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光；所述将第一光罩、第二光罩与所述透明基板的相对位置固定包括：将所述透明基板设置于所述第一光罩、第二光罩之间，且三者相互平行；所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光包括：利用第一光源产生的光线穿过所述第一光罩照射到所述透明基板上；且同时利用第二光源产生的光线穿过所述第二光罩照射到所述透明基板上。
其中，所述第一光罩、第二光罩均包括透光区域和遮光区域，并且所述第一光罩的透光区域、遮光区域分别对应所述第二光罩的遮光区域、透光区域。
其中，所述将第一光罩、第二光罩与所述透明基板的相对位置固定包括：
将所述第一光罩、第二光罩、透明基板水平放置；或
将所述第一光罩、第二光罩、透明基板竖直放置。
其中，所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光的步骤，包括：分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光，并控制所述偏振方向不同的光线的光强度，以使得所述透明基板的不同区域曝光的程度相等。
其中，所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光的步骤，包括：分别利用所述第一光罩、第二光罩产生偏振方向垂直的光线对所述透明基板的不同区域进行曝光。
其中，所述透明基板的不同区域的尺寸不同。
其中，所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光包括：分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光，实现光配向。
为解决上述技术问题，本发明采用的另一个技术方案是：提供一种对透明基板进行曝光的方法，包括：将第一光罩、第二光罩与所述透明基板的相对位置固定；分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光。
其中，所述将第一光罩、第二光罩与所述透明基板的相对位置固定包括：将所述透明基板设置于所述第一光罩、第二光罩之间，且三者相互平行；所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光包括：利用第一光源产生的光线穿过所述第一光罩照射到所述透明基板上；利用第二光源产生的光线穿过所述第二光罩照射到所述透明基板上。
其中，所述第一光罩、第二光罩均包括透光区域和遮光区域，并且所述第一光罩的透光区域、遮光区域分别对应所述第二光罩的遮光区域、透光区域。
其中，所述将第一光罩、第二光罩与所述透明基板的相对位置固定包括：将所述第一光罩、第二光罩、透明基板水平放置；或将所述第一光罩、第二光罩、透明基板竖直放置。
其中，所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光包括：分别利用所述第一光罩、第二光罩产生偏振方向不同的光线同时对所述透明基板的不同区域进行曝光。
其中，所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光的步骤，包括：分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光，并控制所述偏振方向不同的光线的光强度，以使得所述透明基板的不同区域曝光的程度相等。
其中，所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光的步骤，包括：分别利用所述第一光罩、第二光罩产生偏振方向垂直的光线对所述透明基板的不同区域进行曝光。
其中，所述透明基板的不同区域的尺寸不同。
其中，所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光包括：分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光，实现光配向。
本发明的有益效果是：区别于现有技术的情况，本发明将第一光罩、第二光罩与所述透明基板的相对位置固定；分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光。由于不需要分开两次使用第一光罩、第二光罩，直接将第一光罩、第二光罩以及透明基板都固定，利用第一光罩、第二光罩产生偏振方向不同的光线对透明基板的不同区域进行曝光，通过这种方式，能够简化曝光制程工艺，缩短制程时间，使生产效率得到提高。
【附图说明】
图1是本发明对透明基板进行曝光的方法一实施方式的流程图；
图2是本发明对透明基板进行曝光的方法中玻璃基板竖直放置时光配向一实施方式的结构示意图；
图3是本发明对透明基板进行曝光的方法中玻璃基板水平放置时光配向一实施方式的结构示意图；
图4是8.5世代线玻璃基板混合排版8片43 inch和8片22 inch两种尺寸的示意图；
图5是利用本发明对透明基板进行曝光的方法对图4进行光配向时需要使用到的两张光罩的示意图；
图6是现有技术中传统两次光照玻璃基板进行光配向的示意图。
【具体实施方式】
下面结合附图和实施方式对本发明进行详细说明。
参阅图1，图1是本发明对透明基板进行曝光的方法一实施方式的流程图，包括：
步骤S101：将第一光罩、第二光罩与透明基板的相对位置固定。
步骤S102：分别利用第一光罩、第二光罩产生偏振方向不同的光线对透明基板的不同区域进行曝光。
根据实际应用需要，将第一光罩、第二光罩与透明基板的相对位置固定，可以将第一光罩、第二光罩分别固定在透明基板的两侧，也可以将第一光罩、第二光罩固定在透明基板的同一侧。
第一光罩、第二光罩可以透过不同方向的偏振光，且分别对应透明基板不同的曝光区域。这至少有两种方式实现，一种是提供不同方向的偏振光，让不同方向的偏振光分别透过第一光罩和第二光罩；另一种是第一光罩和第二光罩可以附带偏光器的作用，光线分别通过第一光罩和第二光罩后分别产生不同偏振方向的偏振光。
因此，透过第一光罩、第二光罩后，产生偏振方向不同的光线，这些偏振方向不同的光线可以对透明基板的不同区域进行曝光。
由于不需要分开两次使用第一光罩、第二光罩，直接将第一光罩、第二光罩以及透明基板都固定，利用第一光罩、第二光罩产生偏振方向不同的光线对透明基板的不同区域进行曝光，通过这种方式，能够简化曝光制程工艺，缩短制程时间，使生产效率得到提高。
其中，步骤S101具体可以包括：将透明基板设置于第一光罩、第二光罩之间，且三者相互平行；将透明基板设置于第一光罩、第二光罩之间，也即是将第一光罩、第二光罩设置在透明基板的两侧，通过这种方式，能够为同时曝光透明基板的不同区域提供条件，从而为进一步缩短制程时间，提高生产效率提供技术准备，且能够使得第一光罩、第二光罩固定的位置空间更加便利。
此时，步骤S102可以具体是：利用第一光源产生的光线穿过第一光罩照射到透明基板上；利用第二光源产生的光线穿过第二光罩照射到透明基板上。
其中，第一光罩、第二光罩均包括透光区域和遮光区域，并且第一光罩的透光区域、遮光区域分别对应第二光罩的遮光区域、透光区域。也即是说，第一光罩的透光区域，在第二光罩中为遮光区域；第一光罩的遮光区域，在第二光罩中为透光区域。
其中，步骤S101还可以是：将第一光罩、第二光罩、透明基板水平放置；或将第一光罩、第二光罩、透明基板竖直放置。
如果第一光罩、第二光罩在透明基板的同一侧，则有两种方案，分别是将第一光罩、第二光罩、透明基板水平放置，第一光罩、第二光罩同时在透明基板的上边或下边；或将第一光罩、第二光罩、透明基板竖直放置，第一光罩、第二光罩同时在透明基板的左边或右边。
如果第一光罩、第二光罩在透明基板的两侧，也有两种方案：分别是将第一光罩、第二光罩、透明基板水平放置，第一光罩、第二光罩分别在透明基板的上边和下边；或将第一光罩、第二光罩、透明基板竖直放置，第一光罩、第二光罩分别在透明基板的左边和右边。
其中，步骤S102还可以包括：分别利用第一光罩、第二光罩产生偏振方向不同的光线同时对透明基板的不同区域进行曝光。
也就是说，在对透明基板的不同区域进行曝光的时候，利用第一光罩、第二光罩产生偏振方向不同的光线同时曝光，这样有利于缩短制程时间。
其中，步骤S102还可以包括：分别利用第一光罩、第二光罩产生偏振方向不同的光线对透明基板的不同区域进行曝光，并控制偏振方向不同的光线的光强度，以使得透明基板的不同区域曝光的程度相等。
透明基板的两侧，或者同一侧的不同地方，对光线的透过情况可能存在差别，为了使得透明基板的不同区域曝光的程度相等，可以控制不同偏振方向的光线的光强度，例如：对于透光性不好的区域，可以增大光线的光强度。
其中，步骤S102还可以包括：分别利用第一光罩、第二光罩产生偏振方向垂直的光线对透明基板的不同区域进行曝光。也即是说，经过第一光罩、第二光罩后，产生的偏振光的偏振方向是互相垂直的，通过这种方式，可以得到经过曝光后，方向垂直的图案。
其中，透明基板的不同区域的尺寸不同。
其中，步骤S102可以包括：分别利用第一光罩、第二光罩产生偏振方向不同的光线对透明基板的不同区域进行曝光，实现光配向。
下面以光配向为例，来具体说明本申请的方法。其中，透明基本以玻璃基板为例，光源以紫外偏振光为例。在玻璃基板的两侧分别固定第一光罩和第二光罩，并分别配置偏振方向不同的紫外偏振光源。具体实施方案分别为：
方案一：玻璃基板竖直放置，玻璃基板左右两侧的UV偏振光分别透过左右竖直的第一光罩、第二光罩，同时对玻璃基板不同尺寸的区域进行光配向。参见图2，图 2是玻璃基板竖直放置时光配向一实施方式的结构示意图，从左到右依次为UV偏振光源1（箭头所示）、第一光罩2（阴影区域为遮光区域，涂覆有不透光材料）、玻璃基板3（A区和B区分别对应着玻璃基板不同尺寸的区域）、第二光罩4（阴影区域为遮光区域，涂覆有不透光材料）、UV偏振光源5，其中玻璃基板3和第一光罩2、第二光罩4可用夹具固定。
方案二：玻璃基板水平放置，玻璃基板上下两侧的UV偏振光分别透过上下水平的第一光罩、第二光罩，同时对玻璃基板不同尺寸的区域进行光配向。参见图3，图 3 是玻璃基板水平放置时光配向一实施方式的结构示意图，从上到下依次为UV偏振光源10、第一光罩20（阴影区域为遮光区域，涂覆有不透光材料）、玻璃基板30（A区和B区分别对应着玻璃基板不同尺寸的区域）、第二光罩40（阴影区域为遮光区域，涂覆有不透光材料）、UV偏振光源50，其中玻璃基板30和第一光罩20、第二光罩40可用夹具固定。
以8.5世代线玻璃基板（2.5m*2.2m）为例，如图4所示，一片8.5代线玻璃基板可以混合排版8片43 inch（图 4 中的A区）和8片22 inch（图4 中的B区）两种尺寸，混合排版可以让玻璃基板的利用率更高。图5 是图4的玻璃基板光配向过程中需要使用到的两张光罩，其中阴影区域为遮光区域以遮蔽不需要照光的区域，箭头表示紫外偏振光的偏振方向，以满足不同区域的光配向需求。图 6是现有技术中平面转换（In-Plane Switching，简写IPS）/边缘场开关（Fringe Field Switching，简写FFS）面板传统两次光照玻璃基板300进行光配向（Photo Alignment）的示意图，在第一次光照时，需要用第一光罩200挡住B区，然后用紫外偏振光100给A区进行光配向，同理在第二次光照时，用第二光罩400挡住A区，再用紫外偏振光500给B区完成光配向，这个时候即完成了整个玻璃基板300A区和B区的光配向过程。
本申请可以通过图2或图3的方案，一次性即可完成整个玻璃基板A区和B区的光配向过程。在一次光照过程中即可完成同时对整个玻璃基板的光配向，并且无需改变制程或者新的光罩，大大提升生产效率。考虑到阵列基板（例如薄膜晶体管（Thin Film Transistor，简写TFT）基板）或彩色滤光片（Color Filter，简写CF）基板两侧紫外光透过率可能不同，可以适当增加TFT或CF基板外侧的紫外光的光强度，以保证光配向过程中照射到配向膜上的紫外光强度相等，提高制程的均一性。
总的来说，本申请在确保光配向效果的同时，可以提高生产效率，降低液晶面板的制作工艺和生产成本。
以上所述仅为本发明的实施方式，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (16)

  1. 一种对透明基板进行曝光的方法，其中，包括：
    将第一光罩、第二光罩与所述透明基板的相对位置固定；
    分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光；
    所述将第一光罩、第二光罩与所述透明基板的相对位置固定包括：
    将所述透明基板设置于所述第一光罩、第二光罩之间，且三者相互平行；
    所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光包括：
    利用第一光源产生的光线穿过所述第一光罩照射到所述透明基板上；且同时利用第二光源产生的光线穿过所述第二光罩照射到所述透明基板上。
  2. 根据权利要求1所述的方法，其中，所述第一光罩、第二光罩均包括透光区域和遮光区域，并且所述第一光罩的透光区域、遮光区域分别对应所述第二光罩的遮光区域、透光区域。
  3. 根据权利要求1所述的方法，其中，
    所述将第一光罩、第二光罩与所述透明基板的相对位置固定包括：
    将所述第一光罩、第二光罩、透明基板水平放置；或
    将所述第一光罩、第二光罩、透明基板竖直放置。
  4. 根据权利要求1所述的方法，其中，所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光的步骤，包括：
    分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光，并控制所述偏振方向不同的光线的光强度，以使得所述透明基板的不同区域曝光的程度相等。
  5. 根据权利要求1所述的方法，其中，所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光的步骤，包括：分别利用所述第一光罩、第二光罩产生偏振方向垂直的光线对所述透明基板的不同区域进行曝光。
  6. 根据权利要求1所述的方法，其中，所述透明基板的不同区域的尺寸不同。
  7. 根据权利要求1所述的方法，其中，所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光包括：
    分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光，实现光配向。
  8. 一种对透明基板进行曝光的方法，其中，包括：
    将第一光罩、第二光罩与所述透明基板的相对位置固定；
    分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光。
  9. 根据权利要求8所述的方法，其中，
    所述将第一光罩、第二光罩与所述透明基板的相对位置固定包括：
    将所述透明基板设置于所述第一光罩、第二光罩之间，且三者相互平行；
    所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光包括：
    利用第一光源产生的光线穿过所述第一光罩照射到所述透明基板上；利用第二光源产生的光线穿过所述第二光罩照射到所述透明基板上。
  10. 根据权利要求9所述的方法，其中，所述第一光罩、第二光罩均包括透光区域和遮光区域，并且所述第一光罩的透光区域、遮光区域分别对应所述第二光罩的遮光区域、透光区域。
  11. 根据权利要求8所述的方法，其中，
    所述将第一光罩、第二光罩与所述透明基板的相对位置固定包括：
    将所述第一光罩、第二光罩、透明基板水平放置；或
    将所述第一光罩、第二光罩、透明基板竖直放置。
  12. 根据权利要求8所述的方法，其中，
    所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光包括：
    分别利用所述第一光罩、第二光罩产生偏振方向不同的光线同时对所述透明基板的不同区域进行曝光。
  13. 根据权利要求8所述的方法，其中，所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光的步骤，包括：
    分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光，并控制所述偏振方向不同的光线的光强度，以使得所述透明基板的不同区域曝光的程度相等。
  14. 根据权利要求8所述的方法，其中，所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光的步骤，包括：分别利用所述第一光罩、第二光罩产生偏振方向垂直的光线对所述透明基板的不同区域进行曝光。
  15. 根据权利要求8所述的方法，其中，所述透明基板的不同区域的尺寸不同。
  16. 根据权利要求8所述的方法，其中，所述分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光包括：
    分别利用所述第一光罩、第二光罩产生偏振方向不同的光线对所述透明基板的不同区域进行曝光，实现光配向。
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