WO2017188117A1 - ビーム強度変換膜、及びビーム強度変換膜の製造方法 - Google Patents
ビーム強度変換膜、及びビーム強度変換膜の製造方法 Download PDFInfo
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- WO2017188117A1 WO2017188117A1 PCT/JP2017/015890 JP2017015890W WO2017188117A1 WO 2017188117 A1 WO2017188117 A1 WO 2017188117A1 JP 2017015890 W JP2017015890 W JP 2017015890W WO 2017188117 A1 WO2017188117 A1 WO 2017188117A1
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- film
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- charged particle
- beam intensity
- intensity conversion
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32321—Discharge generated by other radiation
- H01J37/3233—Discharge generated by other radiation using charged particles
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
Definitions
- the present invention relates to a beam intensity conversion film and a method for manufacturing the beam intensity conversion film.
- Accelerators that generate various charged particle beams such as cyclotrons require charged particle beam size adjustment and wide-range beam intensity control.
- a beam intensity conversion film having an opening such as a scraper that reduces the size of the charged particle beam, an attenuator that attenuates the intensity of the charged particle beam, or the like is used.
- Patent Document 1 discloses an attenuator made of a metal mesh as a moderator for generating low-speed positrons.
- This metal mesh is made of tungsten.
- Patent Document 2 discloses a self-supporting multilayer film containing both non-diamond-like carbon such as graphite or amorphous carbon and diamond-like carbon.
- the prior art as described above has (1) the durability of the intensity conversion film with respect to the charged particle beam is low, and (2) how to reduce the activation of the intensity conversion film and peripheral devices by the charged particle beam. There is a problem.
- the activation means not only the activation of the intensity conversion film itself but also the activation of peripheral devices by the reflected beam from the beam intensity conversion film.
- the strongly activated beam intensity conversion film and peripheral devices cannot be handled by humans, so it is necessary to stop the accelerator and replace the beam intensity conversion film while the degree of activation does not progress. This leads to a substantial reduction in accelerator driving time.
- the beam intensity conversion film (attenuator or scraper) in the accelerator is required to have high durability against temperature rise caused by beam irradiation.
- the durability required for the attenuator varies depending on the installation location and the aperture ratio, and the exchange frequency of the beam intensity conversion film also varies.
- an attenuator made of amorphous carbon having an aperture ratio of 50% is destroyed in an extremely short time by irradiation with a uranium beam, so that the conversion frequency of the conversion film is increased.
- Increasing the replacement frequency leads to a substantial reduction in accelerator driving time.
- the problem regarding the durability of the intensity conversion film with respect to such a charged particle beam is a particularly serious problem when the beam intensity conversion film is made of a carbon member as described in Patent Document 2. That is, the greatest problem of the beam intensity conversion film made of carbon is its durability.
- the present invention has been made in view of the above-mentioned problems, and an object thereof is a beam intensity conversion film made of carbon capable of reducing the degree of activation and having sufficient durability against a charged particle beam. And a method of manufacturing a beam intensity conversion film.
- the beam intensity conversion film of one embodiment of the present invention is a beam intensity conversion film having an opening through which a charged particle beam can pass, and is arranged such that the film surface intersects the beam axis of the charged particle beam.
- the graphite film is composed of a plurality of graphite films. Each graphite film has a thickness of 1 ⁇ m or more, and the thermal conductivity in the film surface direction of the graphite film is 20 times or more of the thermal conductivity in the film thickness direction. It is characterized by being.
- a beam intensity conversion film is a beam intensity conversion film having an opening through which a charged particle beam can pass, and is arranged so that the film surface intersects the beam axis of the charged particle beam.
- the graphite film has a film thickness of 1 ⁇ m or more, and the electric conductivity in the film surface direction of the graphite film is 100 times or more the electric conductivity in the film thickness direction. It is a feature.
- a method for manufacturing a beam intensity conversion film according to another aspect of the present invention is a method for manufacturing a beam intensity conversion film having an opening through which a charged particle beam can pass and comprising one or more graphite films.
- the graphite film is produced by firing a polymer film.
- a carbon member such as amorphous carbon which is said to have a relatively low degree of activation, has been used as a beam intensity conversion film having an opening through which a charged particle beam can pass.
- the beam intensity conversion film produced using amorphous carbon as a raw material is an unsatisfactory intensity conversion film from the viewpoint of durability.
- a very large heat load is applied.
- a beam intensity conversion film made of amorphous carbon and having an aperture ratio of 50% is almost instantaneously destroyed by irradiation with a high-energy uranium beam.
- amorphous carbon film has a low mechanical strength
- DLC diamond-like carbon
- a multilayer film production example as described in Patent Document 2, (i) a water-soluble release layer is formed on a polishing substrate, (ii) an amorphous carbon layer is deposited, and (iii) a DLC layer is formed.
- Complex processes such as deposition, (iv) deposition of an amorphous carbon layer, (v) peeling of the multilayer film from the substrate in submerged water, and (vi) drying of the multilayer film are required.
- the inventors of the present application are diligently developing with the aim of developing a beam strength conversion film made of carbon, which has excellent self-supporting property and mechanical strength, and has high durability enough to withstand the above-described heat load. I did it.
- the accelerator strength conversion film is exclusively used in a vacuum, it is necessary to use graphite having a high heat resistance of 3000 ° C. or higher in vacuum, and further the thermal conductivity in the direction of the film surface of the strength conversion film,
- the present invention has been achieved by using a graphite having high crystallinity and high orientation with a conductivity characteristic having anisotropy of a certain level or more.
- this graphite film can solve the problems of sufficient shielding properties and sufficient mechanical properties for the charged particle beam by setting the physical properties and thickness of the thermal and electrical conduction within the predetermined range.
- the headline and the present invention were completed.
- the degree of activation of the beam intensity conversion film and the reflection of the beam by the intensity conversion film is related to the material (element) used for the beam intensity conversion film.
- the material (element) used for the beam intensity conversion film For example, carbon (atomic number 12), which is a light element, can reduce the degree of activation of the beam conversion film itself and the reflection of charged particle beams, compared with titanium (atomic number 22) and tungsten (atomic number 74). it can.
- the degree of charged particle beam reflection is also related to the temperature of the beam intensity conversion film, and the degree of charged particle beam reflection increases when the temperature of the beam intensity conversion film is high. I was able to get a good knowledge.
- the temperature of the beam intensity conversion film rises due to the charged particle beam irradiation, and the degree of the charged particle beam reflection by the beam intensity conversion film increases due to this temperature rise.
- the temperature rise of the beam intensity conversion film can be suppressed, reflection of the charged particle beam can be suppressed.
- the graphite film of the present invention can reduce the degree of activation of peripheral devices as compared to conventional carbon films such as titanium and tungsten as well as amorphous carbon films. I found it. As already described, the effect that the graphite strength conversion film of the present invention consisting of only carbon elements is superior in terms of activation compared to metal films such as titanium and tungsten is the effect of the constituent elements of the film. So it is as expected. On the other hand, compared with the amorphous carbon film, the graphite film of the present invention can reduce the degree of activation of the peripheral device. This is due to the fact that the degree of the charged particle beam reflection of the beam intensity conversion film described above depends on the temperature rise of the film.
- the graphite film of the present invention is superior not only in thermal diffusion performance because of its superior thermal conductivity compared to amorphous carbon film, but also because much of the heat dissipation occurs due to the mechanism by radiation, the temperature of the graphite film itself is There is a feature that it is difficult to climb. Therefore, as a result, reflection of the charged particle beam can be reduced and the degree of activation of the peripheral device can be suppressed.
- the technical idea of the present invention based on this knowledge of the present invention cannot be predicted from the conventional knowledge, but has been completed independently by the present inventors.
- the film thickness of the graphite film necessary for shielding the beam by the intensity of the charged particle beam and an opening for allowing the beam to pass therethrough Is preferably controlled precisely. According to the present invention, it is possible to produce a graphite film of any film thickness, and since it is excellent in mechanical strength, it is easy to form a precise opening by a laser or the like, and is an extremely excellent method. I can say that.
- the beam intensity conversion film referred to here may be provided with an opening through which a charged particle beam can pass, so that the intensity of the incident charged particle beam and the intensity of the emitted charged particle beam are different.
- Examples of such a beam conversion film include an attenuator that attenuates the energy of the charged particle beam, and a scraper that adjusts the beam size of the charged particle beam.
- FIG. 1 shows a schematic configuration of an attenuator (beam intensity conversion film) 1 according to the present embodiment
- FIG. 1 (a) is a cross-sectional view
- FIG. 1 (b) is viewed from the emission direction of a charged particle beam. It is a front view.
- the attenuator 1 has an opening 1a through which a charged particle beam X can pass.
- the attenuator 1 is a film for attenuating the beam intensity of the incident charged particle beam X, and is arranged so that the film surface intersects the optical axis of the charged particle beam X.
- the attenuator 1 is composed of one or more graphite films, and the thickness of each graphite film is 1 ⁇ m or more. Since the attenuator 1 shields the charged particle beam X at a portion where the opening 1a is not formed, the attenuator 1 needs to have a certain thickness so that charged particles do not pass through.
- the thickness of the graphite film necessary for complete shielding depends on the intensity of the charged particle beam X. When the beam intensity is high, the thickness of the graphite film necessary for complete blocking is increased, and when the beam intensity is low, the necessary thickness is decreased. If the beam has a relatively low intensity of about 1 MeV, the charged particle beam X can be significantly shielded by a graphite film having a thickness of 1 ⁇ m or more.
- a charged particle beam X emitted from a charged particle beam source enters the attenuator 1, it passes through the attenuator 1 at a portion where the opening 1a is formed. On the other hand, the portion of the attenuator 1 where the opening 1a is not formed is shielded.
- the beam intensity of the charged particle beam X is attenuated by the attenuator 1.
- the charged particle beam X is in a state where the intensity is uneven for a while after passing through the opening of the attenuator 1, but thereafter becomes a uniform distribution and a beam intensity attenuated as intended is obtained.
- the degree of attenuation of the charged particle beam X by the attenuator 1 depends on the aperture ratio of the attenuator 1 (the ratio of the opening 1a to the area of the film surface of the attenuator 1). Therefore, the aperture ratio of the attenuator 1 can be appropriately set according to the beam intensity of the target charged particle beam X. Considering the strength of the graphite film constituting the attenuator 1, the aperture ratio of the attenuator 1 can be set at 1 to 80%.
- the opening 1a of the attenuator 1 is formed in a slit shape (a bowl shape).
- the opening part 1a should just be the structure which penetrates the entrance side and exit side of the charged particle beam X in the attenuator 1, and is not limited to a structure as shown in (b) of FIG.
- the opening 1a may be, for example, a through hole such as a punch hole or a net-like structure.
- the opening may be composed of a plurality of attenuators.
- the aperture ratio can be adjusted by changing the relative arrangement of the attenuators 1.
- the opening ratio of the attenuator 1 is set to 50%, and the openings 1a are adjusted to coincide with each other.
- the aperture ratio can be adjusted by rotating the two attenuators 1 relative to each other and changing the angle between the openings 1a.
- the aperture ratio is 25%. Therefore, when the two attenuators 1 are used so that the openings 1a coincide with each other, the aperture ratio is within a range of 25% and 50% by rotating the two attenuators 1 relative to each other. Can be adjusted.
- the two attenuators 1 are adjusted so that the openings 1a are alternately arranged, that is, the opening 1a of one attenuator 1 and a portion (shielding portion) other than the opening 1a of the other attenuator 1
- the aperture ratio is 0%, but the aperture ratio is adjusted within the range of 0% and 25% by rotating the two attenuators 1 relative to each other. can do.
- the graphite film constituting the attenuator 1 needs to have a certain thickness so as to shield the charged particle beam X in the non-opening portion and prevent the charged particles from passing through. If the graphite film has a film thickness exceeding 1 ⁇ m, it is possible to significantly shield the low-energy charged particle beam X. On the other hand, in order to completely shield a higher energy charged particle beam, a thicker film is required. In such a case, a method of forming a thicker film by stacking a plurality of graphite films used in the present embodiment and heating under pressure is effective.
- the graphite film in the present embodiment has high crystallinity / orientation, and is characterized in that the basal (network) surface of graphite constituting the graphite film is aligned in parallel with the film surface of the graphite film. Such orientation can be evaluated by the thermal conductivity of the graphite film.
- the graphite film in the present embodiment is characterized in that the thermal conductivity in the film surface direction is 20 times or more of the thermal conductivity in the film thickness direction, and other configurations are not particularly limited as long as it exceeds 20 times. .
- the graphite film constituting the attenuator 1 has a thickness of 1 ⁇ m or more, and its orientation can be evaluated by the electric conductivity of the graphite film.
- the graphite film in this embodiment is characterized in that the electric conductivity in the film surface direction is 100 times or more the thermal conductivity in the electric direction. Other configurations are not particularly limited as long as it exceeds 100 times.
- the characteristic of electric conductivity is a very effective method for managing the performance of the graphite film.
- the aperture ratio of the graphite film constituting the attenuator 1 is 1 to 80%. If the aperture ratio is within this range, the aperture shape and the aperture method are not particularly limited.
- the graphite film constituting the attenuator 1 preferably has a thermal conductivity in the film surface direction of 1000 W / (m ⁇ K) or more from the viewpoint of high heat dissipation characteristics, high durability, and excellent mechanical strength. .
- Such a graphite film is preferable because it has high strength and high thermal conductivity.
- the film thickness here refers to the length of the attenuator 1 in the transmission direction of the charged particle beam X.
- the graphite film constituting the attenuator 1 preferably has an electric conductivity of 12000 S / cm or more in the film surface direction from the viewpoint of high quality, high durability, and excellent mechanical strength.
- the replacement frequency of the attenuator 1 varies depending on the aperture ratio, installation location, and the like.
- the attenuator 1 and peripheral devices are activated at the time of replacement, there is a risk that an operator will be exposed. Further, when these members are activated, the treatment as radioactive waste becomes a problem.
- the degree of activation increases due to heat generation, and not only the attenuator 1 but also its peripheral members are activated.
- the manufacturing method of the graphite film in this embodiment is not specifically limited, For example, the method of producing a graphite film by heat-processing a polymer film is mentioned. Specifically, the method for producing a graphite film as an example of this embodiment includes a carbonization step for carbonizing an aromatic polyimide film and a graphitization step for graphitizing the carbonized aromatic polyimide film.
- the aromatic polyimide film which is a starting material, is carbonized by preheating under reduced pressure or in nitrogen gas.
- the heat treatment temperature for carbonization is preferably 500 ° C. or higher, more preferably 600 ° C. or higher, and most preferably 700 ° C. or higher.
- pressure may be applied in the thickness direction of the film or tensile tension in the direction parallel to the film surface so that the starting polymer film is not wrinkled.
- Graphitization process After carbonized polyimide film is taken out once, it may be transferred to a graphitization furnace and then graphitization may be performed, or carbonization and graphitization may be performed continuously.
- Graphitization is performed under reduced pressure or in an inert gas, and argon and helium are suitable as the inert gas.
- the heat treatment temperature (firing temperature) is 2400 ° C. or higher, preferably 2600 ° C. or higher, more preferably 2800 ° C. or higher, and most preferably 3000 ° C. or higher.
- pressure may be applied in the thickness direction of the film, or tension may be applied in the direction parallel to the film surface.
- the polymer film used in this embodiment is a graphite in which the anisotropy of the thermal conductivity and the electrical conductivity in the film direction and the film thickness direction is within the above-described range by carbonization treatment or graphitization treatment, or both of these treatments.
- the polymer film is at least one kind selected from among them.
- an aromatic polyimide film is preferable as a raw material film for the graphite film in the present embodiment.
- the anisotropy of thermal conductivity between the film surface direction and the film thickness direction in the graphite film used in the present embodiment is 20 times or more, more preferably 30 times or more, and most preferably 50 times or more. preferable.
- anisotropy of thermal conductivity between the film surface direction and the film thickness direction means the ratio of the thermal conductivity in the film surface direction to the thermal conductivity in the film thickness direction (thermal conductivity in the film surface direction / Thermal conductivity in the film thickness direction).
- the specific thermal conductivity in the film surface direction is 1000 W / (m ⁇ K) or more, preferably 1200 W / (m ⁇ K) or more, and preferably 1400 W / (m ⁇ K) or more. More preferably, it is 1600 W / (m ⁇ K) or more.
- a graphite film having a thermal conductivity in the film surface direction of 1000 W / (m ⁇ K) or more has a thermal conductivity of 2.5 to 4 times or more that of a metal material (eg, copper, aluminum, etc.). Become.
- the thermal conductivity in the film surface direction of the graphite film is calculated by the following equation (1).
- A ⁇ ⁇ d ⁇ Cp (1)
- A is the thermal conductivity in the film surface direction of the graphite film
- ⁇ is the thermal diffusivity in the film surface direction of the graphite film
- d is the density of the graphite film
- Cp is the specific heat capacity of the graphite film.
- the density, thermal diffusivity, and specific heat capacity of the graphite film in the film surface direction are determined by the methods described below.
- the density of the graphite film was determined by measuring the weight and thickness of a graphite film sample cut into a shape of 100 mm ⁇ 100 mm, and calculating the measured weight value as the calculated volume value (100 mm ⁇ 100 mm ⁇ thickness). ).
- the specific heat capacity of the graphite film was measured from 20 ° C. to 260 ° C. under a temperature rising condition of 10 ° C./min using a differential scanning calorimeter DSC220CU which is a thermal analysis system manufactured by SII Nano Technology.
- the thermal conductivity in the film thickness direction of the graphite film can be calculated in the same manner by using ⁇ as the thermal diffusivity in the film thickness direction of the graphite film in the above formula (1).
- the thermal diffusivity in the film surface direction of the graphite film was measured using a commercially available thermal diffusivity measuring apparatus based on the optical alternating current method (for example, “LaserPit” manufactured by ULVAC-RIKO Co., Ltd.).
- a graphite film sample cut into a 4 mm ⁇ 40 mm shape was measured in a 20 ° C. atmosphere at a laser frequency of 10 Hz.
- the thermal diffusivity in the film thickness direction of the graphite film is measured by a pulse heating method using a laser.
- the temperature response (temperature change) on the back side of the film after heating with a laser irradiated on one side of the film is measured, and the half time (t 1/2 ) of the time (t) until the temperature reaches a certain temperature. Is calculated using the following equation (2).
- ⁇ is the thermal diffusivity
- ⁇ 0 is the thermal diffusion time
- d is the sample thickness
- t 1/2 is the half time
- 0.1388 is the apparatus constant of the apparatus used.
- the film thickness of the graphite film in this embodiment is 1 ⁇ m or more. More preferably, they are 2 micrometers or more and 1 mm or less, Especially preferably, they are 3 micrometers or more and 500 micrometers or less. In the case of such a film thickness, even when a charged particle beam is irradiated, the temperature rise of the attenuator 1 can be suppressed, and as a result, the peripheral device is not easily activated, which is preferable. It is difficult to produce a graphite film having physical properties in the range of the present embodiment by the polymer baking method and having a thickness of 50 ⁇ m or more. In such a case, a plurality of graphite films may be pressurized.
- a graphite film having a thickness of 200 ⁇ m four graphite films having a thickness of 50 ⁇ m may be pressed and pressure-bonded, and by pressing and pressing 10 sheets, graphite having a thickness of 500 ⁇ m may be formed.
- a film can be produced.
- the thickness of the graphite film is measured by the following method. Using a thickness gauge (HEIDENH: AIN-CERTO, manufactured by HEIDENHAIN Co., Ltd.), the thickness of the graphite film sample cut into a 50 mm ⁇ 50 mm shape at any 10 points in a constant temperature room at 25 ° C. And the thickness of the graphite film is calculated as an average value of the measured values.
- a thickness gauge HEIDENH: AIN-CERTO, manufactured by HEIDENHAIN Co., Ltd.
- the electric conductivity in the film surface direction of the graphite film in the present embodiment is not particularly limited, but is preferably 12000 S / cm or more, more preferably 14000 S / cm or more, and more preferably 16000 S / cm or more. It is preferably 18000 S / cm or more.
- the graphite film preferably has an anisotropy (orientation) in which the electric conductivity in the film surface direction is 100 times or more the electric conductivity in the film thickness direction.
- the electrical conductivity of the graphite film is measured by applying a constant current by a four-probe method (for example, Loresta GP manufactured by Mitsubishi Chemical Analytech Co., Ltd.).
- the density of the graphite film in the present embodiment is not particularly limited, but is preferably 1.70 g / cm 3 or more, more preferably 1.80 g / cm 3 or more, more preferably 1.90 g / cm 3 or more, and 2.00 g / cm 2. More preferably, it is cm 3 or more. If the density of the graphite film is 1.60 g / cm 3 or more, it is preferable because the graphite film itself is excellent in self-supporting properties and mechanical strength characteristics.
- the higher the density of the graphite film the higher the ratio of interaction with the charged particle beam, so that the effect as an attenuator is excellent.
- a high-density graphite film there is no gap between the graphite layers to be formed, so that the thermal conductivity tends to be high.
- the density of the graphite film is low, the attenuation efficiency of the charged particle beam is poor, and the thermal conductivity is also lowered due to the influence of the air layer between the graphite layers constituting the graphite film, which is not preferable.
- heat is easily accumulated in the hollow portion as the air layer due to poor thermal conductivity, or expansion of the air layer existing in the hollow portion occurs due to a temperature rise due to heating.
- the low density graphite film is easily deteriorated and broken. Further, when the density of the graphite film is high, the charged particle beam is not easily scattered when passing through the graphite film. For this reason, even when a graphite film is laminated, a charged particle beam is hardly scattered by a high-density graphite film. For these reasons, it is preferable that the density of the graphite film is large. Specifically, 1.70 g / cm 3 or more is preferable, 1.80 g / cm 3 or more is preferable, 1.90 g / cm 3 or more is more preferable, 2.00 g / cm 3 or more is more preferable, and 2.10 g / Cm 3 or more is more preferable. Further, regarding the upper limit of the density of the graphite film, the density of the graphite film is a theoretical value of 2.26 g / cm 3 or less, and may be 2.24 g / cm 3 or less.
- the density of the graphite film was determined by measuring the weight and thickness of a graphite film sample cut into a shape of 100 mm ⁇ 100 mm, and calculating the measured weight value as the calculated volume value (100 mm ⁇ 100 mm ⁇ thickness). ) To calculate.
- the aperture ratio of the graphite film constituting the beam intensity conversion film of this embodiment is preferably in the range of 1% to 80%.
- the opening ratio is not particularly limited as long as it is within the above preferable range, but is more preferably in the range of 2% to 70%, further preferably in the range of 5% to 60%, and in the range of 10% to 50%. The range is most preferable.
- the method for forming the opening is not particularly limited, and processing using a laser or the like, mechanical processing, or the like may be used as necessary.
- graphite made of carbon can form an opening having a desired shape and aperture ratio by laser processing.
- the laser processing is preferably performed in the air, and carbon is dissipated as carbon dioxide gas in the air, so that the opening can be easily formed.
- the laser used for processing is not particularly limited as long as graphite can be processed.
- the shape of the opening is also not particularly limited, and can be freely selected from the above-described bowl shape, hole shape, mesh shape, and the like.
- the graphite film of this embodiment is also excellent in terms of mechanical strength.
- the graphite film of the present invention is used as a self-supporting film, the graphite film can be used by being attached to a metal frame or sandwiched between two metal frames.
- one of the evaluation methods for a graphite film having a film thickness in the range of 1 ⁇ m to 50 ⁇ m, where mechanical strength is a problem is a bending test.
- the number of bends in the MIT bending resistance test of the graphite film in the above range is preferably 100 times or more, more preferably 200 times or more, still more preferably 500 times or more, and particularly preferably 1000 times or more.
- the MIT bending resistance test of graphite film is performed as follows. Three test pieces of 1.5 ⁇ 10 cm are extracted. Using a MIT fatigue resistance tester model D manufactured by Toyo Seiki Co., Ltd., the test load is 100 gf (0.98 N), the speed is 90 times / minute, and the radius of curvature R of the bending clamp is 2 mm. In an atmosphere of 23 ° C., the number of bending until the bending angle is 135 degrees to the left and right is measured.
- the attenuator 1 is composed of one graphite film.
- the attenuator 1 may be composed of a plurality of graphite films.
- the attenuator 1 may be a laminate of graphite films in order to achieve a film thickness that is durable against irradiation with a higher energy charged particle beam X.
- a laminate can be produced by laminating a plurality of graphite films having a film thickness of 1 to 50 ⁇ m produced by the above-described method by a method such as press bonding. Thereby, the attenuator 1 having a film thickness of 50 ⁇ m or more having excellent characteristics such as thermal conductivity in the surface direction can be realized.
- the thickness of the beam intensity conversion film made of this laminate is not particularly limited. In order to produce a beam intensity conversion film having a thickness of usually 100 ⁇ m or more, it is extremely effective to have a laminate structure.
- the graphite films may be provided individually one by one in the accelerator.
- the aperture ratio of each graphite film is set so as to correspond to a plurality of energy intensities of the target charged particle beam X.
- the arrangement of the individual graphite films can be appropriately set according to the type of experiment using the charged particle beam X or the configuration of the accelerator.
- the individual graphite films may be arranged so as to intersect with one beam axis of the charged particle beam X, or intersect one-to-one with a plurality of beam axes of the charged particle beam X. It may be arranged as follows.
- the beam intensity conversion film according to the present embodiment is different from the first embodiment in that it is a scraper.
- FIG. 2 is a cross-sectional view showing a schematic configuration of the scraper 2 as a beam intensity conversion film according to the present embodiment.
- an opening 2a is formed in the scraper 2 (beam intensity conversion film) according to the present embodiment.
- the scraper 2 is a film for reducing the beam size of the incident charged particle beam X, and is disposed so that the film surface intersects the optical axis of the charged particle beam X.
- the scraper 2 is composed of one or a plurality of graphite films, and the film thickness of each graphite film is 1 ⁇ m or more.
- the charged particle beam X emits only the beam component incident on the central portion of the scraper 2 in which the opening 2a is formed.
- a relatively low energy beam component incident on the outer portion where the opening 2 a is not formed is shielded by the scraper 2. Therefore, the charged particle beam X is a small beam having a uniform intensity by removing the outer relatively low energy beam component by the scraper 2.
- the charged particle beam passes through an opening of a beam intensity conversion film (attenuator 1, scraper 2, etc.) made of a graphite film, and the beam is shielded by a portion other than the opening.
- the energy of the charged particle beam X shielded by the beam intensity conversion film varies depending on the accelerator.
- the collision stopping power (energy loss) of the target substance (here, the beam intensity conversion film) against the charged particles is expressed by the following Bethe equation (3).
- e is the elementary charge of the electron
- m is the mass of the electron
- v is the velocity of the electron
- z is the number of nuclear charges of the incident particle
- Z is the atomic number of the target substance
- N is the number of atoms in the unit volume of the target substance.
- I is the average excitation potential of the target substance
- ⁇ is v / c, where c is the speed of light.
- FIG. 3 is a graph showing the relationship between the stopping power based on Bethe's formula (3) and the kinetic energy of the particles.
- the collision stopping power (energy loss) of the target substance with respect to charged particles increases from B where the kinetic energy of the particles is low to B, and becomes maximum at B. And it decreases in proportion to I / v 2 from B to C, and becomes the minimum at C. Then, from C to D, the logarithmic term of Bethe's formula (3) becomes effective and gradually increases.
- the charged particle beam X incident on the beam intensity conversion film (Attenuator 1, Scraper 2, etc.) of Embodiments 1 and 2 is often a charged particle beam in the energy range of A to C, and its region is relatively low. Energy. However, being used in a relatively low energy region does not mean that the required strength conversion film may have low durability.
- the energy of the charged particle beam X in B is on the order of MeV (for example, 1 MeV), and the energy on C is in the order of GeV (for example, 3 GeV).
- the blocking ability of the target substance in B is about 100 times higher than the blocking ability of the target substance in C. That is, it means that the energy of charged particles is converted into heat in the target substance and effectively lost.
- the strength conversion film in the energy range of B to C used in the present invention Since the number of charged particles varies depending on each accelerator, the durability required for the intensity conversion film is not described only by the stopping power, but the intensity conversion films of Embodiments 1 and 2 are mainly used. There is no doubt that high durability is required in the energy region of 100 MeV. Under such severe conditions, the above-mentioned graphite film constituting the beam intensity conversion film of Embodiments 1 and 2 can withstand the above requirements as long as it has the physical properties and film thickness in the above-mentioned range. .
- a beam intensity conversion film is a beam intensity conversion film having an opening through which a charged particle beam can pass, and is arranged so that the film surface intersects the beam axis of the charged particle beam.
- the graphite film is composed of one or a plurality of graphite films. Each graphite film has a thickness of 1 ⁇ m or more, and the thermal conductivity in the film surface direction of the graphite film is 20 times the thermal conductivity in the film thickness direction. It is characterized by being more than double.
- this graphite film has the characteristic that the thermal conductivity of the film surface direction of the said graphite film is 20 times or more of the thermal conductivity of a film thickness direction.
- This characteristic is an index indicating the orientation, and indicates that the graphite film in the beam intensity conversion film according to an embodiment of the present invention has a high orientation. Since the graphite film having such a configuration is basically formed only of carbon, the degree of activation of the film itself can be reduced.
- the heat generated by the beam irradiation is smoothly diffused in the direction of the film surface, so that the temperature increase of the strength conversion film can be prevented and the durability is improved. Further, as described later, the activation of peripheral devices can be reduced by suppressing the temperature rise.
- the above-described characteristics relating to thermal conductivity indicate that this graphite film has high crystallinity. Therefore, the graphite film according to the present invention can have high heat resistance. Graphite with high crystallinity has excellent heat resistance of 3000 ° C. or higher in vacuum, and has superior durability against charged particle beams even compared to conventional strength conversion films made of titanium. Yes.
- a beam intensity conversion film is a beam intensity conversion film having an opening through which a charged particle beam can pass, and is arranged so that the film surface intersects the beam axis of the charged particle beam.
- Each graphite film has a film thickness of 1 ⁇ m or more, and the electric conductivity in the film surface direction of the graphite film is 100 times or more the electric conductivity in the film thickness direction. It is characterized by.
- the electric conductivity in the film surface direction of the graphite film has a characteristic that the electric conductivity in the film thickness direction is 100 times or more.
- This characteristic is an index indicating orientation, and indicates that the graphite film in the beam intensity conversion film according to one embodiment of the present invention has high crystallinity and orientation. Therefore, according to the above configuration, it is possible to realize a beam intensity conversion film made of carbon, having sufficient durability against a charged particle beam, and capable of reducing the degree of activation.
- the electrical conductivity characteristic is an extremely effective method for managing the performance of the graphite film.
- anisotropy of electrical conductivity is also an indicator that the graphite film has high crystallinity, and the graphite film can have high heat resistance.
- the thermal conductivity in the film surface direction of each graphite film is preferably 1000 W / (m ⁇ K) or more.
- Such a high thermal conductivity in the plane direction suppresses a rise in the temperature of the film, and for the reason described later, it is possible to reduce the degree of activation of peripheral devices by beam reflection of the intensity conversion film.
- the electric conductivity in the film surface direction of the graphite film is preferably 12000 S / cm or more. Since measurement of electric conductivity is extremely easy compared to heat conduction, the electric conductivity characteristic is a very effective method for managing the performance of the graphite film.
- the aperture ratio of the graphite film is 1 to 80%.
- the beam intensity conversion film according to an embodiment of the present invention may be a laminate in which a plurality of the graphite films are laminated. As the thickness of the graphite film increases, the shielding property and durability of the intensity conversion film against irradiation with a charged particle beam improve.
- stacks the several graphite film of this invention this laminated body may be produced by crimping
- the thickness of the beam intensity conversion film made of this laminate is not particularly limited, but it is extremely effective to use such a laminate configuration in order to produce a beam intensity conversion film with a thickness of usually 100 ⁇ m or more. is there.
- the beam intensity conversion film according to an embodiment of the present invention, the density of the graphite film, 1.70 g / cm 3 or more, preferably 2.26 g / cm 3 or less.
- a method for manufacturing a beam intensity conversion film according to an embodiment of the present invention is a method for manufacturing a beam intensity conversion film having an opening through which a charged particle beam can pass and configured by one or a plurality of graphite films.
- the graphite film is produced by firing a polymer film.
- the present invention can be used in the field of accelerators.
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Abstract
Description
以下、本発明の一実施形態について、詳細に説明する。図1は、本実施形態に係るアッテネータ(ビーム強度変換膜)1の概略構成を示し、図1の(a)は断面図であり、図1の(b)は荷電粒子ビームの出射方向からみた正面図である。
アッテネータ1を構成するグラファイト膜は、非開口部では荷電粒子ビームXを遮蔽し、荷電粒子が通過しないように、ある程度の膜厚が必要である。1μmを超える膜厚のグラファイト膜であれば、低エネルギーの荷電粒子ビームXを有意に遮蔽することが可能である。一方、より高いエネルギーの荷電粒子ビームを完全に遮蔽するためには、さらに厚い膜厚が必要となる。その様な場合には、本実施形態にて使用される複数枚のグラファイト膜を積層して加圧下加熱などの方法により、より厚い膜を作製する方法が有効である。一般的に、本実施形態に使用されるような高い配向性と結晶性とを有する厚いグラファイト膜を作製することは極めて難しいが、本実施形態に使用するグラファイト膜を複数枚積層する事により、高い配向性や結晶性を有し、100μm以上の厚さを有するアッテネータを作製する事ができる。
本実施形態におけるグラファイト膜の製造方法は、特に限定されないが、例えば、高分子膜を熱処理することによって、グラファイト膜を作製する方法が挙げられる。具体的には、本実施形態の一例のグラファイト膜の製造方法は、芳香族ポリイミドフィルムを炭化する炭化工程と、炭化した芳香族ポリイミドフィルムを黒鉛化する黒鉛化工程と、を含む。
炭化工程は、出発物質である芳香族ポリイミドフィルムを減圧下もしくは窒素ガス中で予備加熱処理して炭化を行う。炭化の熱処理温度としては、500℃以上であることが好ましく、より好ましくは600℃以上、700℃以上で熱処理することが最も好ましい。炭素化処理の過程で、出発高分子フィルムにシワが発生しないように、フィルムの破損が起きない程度にフィルムの厚み方向に圧力、またはフィルム面と並行方向に引張り張力を加えてもよい。
黒鉛化工程では、炭化したポリイミドフィルムを一度取り出した後、黒鉛化用の炉に移し変えてから黒鉛化を行ってもよいし、炭化から黒鉛化を連続的に行ってもよい。黒鉛化は、減圧下もしくは不活性ガス中で行われるが、不活性ガスとしてはアルゴン、ヘリウムが適当である。熱処理温度(焼成温度)としては2400℃以上、好ましくは2600℃以上、更に好ましくは2800℃以上、最も好ましくは3000℃以上まで処理するとよい。なお、黒鉛化工程において、フィルムの厚み方向に圧力を加えてもよく、フィルム面と平行方向に張力を加えてもよい。
本実施形態で使用するグラファイト膜における膜面方向と膜厚方向との熱伝導度の異方性は20倍以上であり、30倍以上であることはより好ましく、50倍以上であることは最も好ましい。ここでいう「膜面方向と膜厚方向との熱伝導度の異方性」とは、膜厚方向の熱伝導度に対する膜面方向の熱伝導度の比率(膜面方向の熱伝導度/膜厚方向の熱伝導度)である。
ここで、Aは、グラファイト膜の膜面方向の熱伝導度、αは、グラファイト膜の膜面方向の熱拡散率、dは、グラファイト膜の密度、Cpは、グラファイト膜の比熱容量をそれぞれ表わしている。なお、グラファイト膜の膜面方向の密度、熱拡散率、および比熱容量は、以下に述べる方法で求める。
本実施形態におけるグラファイト膜の膜厚は、1μm以上である。より好ましくは2μm以上、1mm以下であり、特に好ましくは3μm以上、500μm以下である。このような膜厚の場合、荷電粒子ビームを照射した場合でも、アッテネータ1の温度上昇を抑えることができ、結果的に周辺機器が放射化し難いため好ましい。高分子焼成法によって本実施形態の範囲の物性を有し、しかも50μm以上の厚さを有するグラファイト膜を作製することは難しい。このような場合には、複数枚のグラファイト膜を加圧すればよい。また、圧着してより厚いグラファイト膜を作製することも有効である。例えば、200μmの厚さのグラファイト膜を作製するためには、50μmの厚さのグラファイト膜4枚を加圧・圧着すればよく、10枚を加圧・圧着する事により500μmの厚さのグラファイト膜を作製する事が出来る。
本実施形態におけるグラファイト膜の膜面方向の電気伝導度は、特に限定されないが、12000S/cm以上であることが好ましく、14000S/cm以上であることが好ましく、16000S/cm以上であることがより好ましく、18000S/cm以上であることが最も好ましい。
本実施形態におけるグラファイト膜の密度は、特に限定されないが、1.70g/cm3以上が好ましく、1.80g/cm3以上が好ましく、1.90g/cm3以上がより好ましく、2.00g/cm3以上がより好ましい。グラファイト膜の密度が1.60g/cm3以上であれば、グラファイト膜自体の自己支持性、機械的強度特性に優れるので好ましい。
本実施形態のビーム強度変換膜を構成するグラファイト膜の開口率は、1%~80%の範囲であることが好ましい。開口率は、上記好ましい範囲内であれば特に限定されないが、2%~70%の範囲であることがより好ましく、5%~60%の範囲であることがさらに好ましく、10%~50%の範囲であることが最も好ましい。
本実施形態のグラファイト膜は機械的な強度の点からも優れている。本発明のグラファイト膜は自立膜として用いられるが、グラファイト膜は金属製の枠に貼り付けて、あるいは金属製の2枚の枠に挟んで用いる事ができる。
本発明の他の実施形態について、図2に基づいて説明すれば、以下のとおりである。なお、説明の便宜上、前記実施形態にて説明した部材と同じ機能を有する部材については、同じ符号を付記し、その説明を省略する。
荷電粒子ビームは、グラファイト膜からなるビーム強度変換膜(アッテネータ1、スクレーバ2等)の開口部を通過し、開口部以外の部分によりビームは遮蔽される。ビーム強度変換膜によって遮蔽される荷電粒子ビームXのエネルギーは、加速器によって異なる。
本発明の一実施形態に係るビーム強度変換膜は、荷電粒子ビームが通過可能な開口部を有するビーム強度変換膜であって、膜面が荷電粒子ビームのビーム軸と交差するように配された1または複数のグラファイト膜から構成され、各グラファイト膜の膜厚は各グラファイト膜の厚さは1μm以上であり、前記グラファイト膜の膜面方向の熱伝導度が膜厚方向の熱伝導度の20倍以上であることを特徴としている。
1a 開口部
2 スクレーバ(ビーム強度変換膜)
2a 開口部
Claims (8)
- 荷電粒子ビームが通過可能な開口部を有するビーム強度変換膜であって、
膜面が荷電粒子ビームのビーム軸と交差するように配された1または複数のグラファイト膜から構成され、各グラファイト膜の厚さは1μm以上であり、前記グラファイト膜の膜面方向の熱伝導度が膜厚方向の熱伝導度の20倍以上であることを特徴とするビーム強度変換膜。 - 荷電粒子ビームが通過可能な開口部を有するビーム強度変換膜であって、
膜面が荷電粒子ビームのビーム軸と交差するように配された1または複数のグラファイト膜から構成され、各グラファイト膜の厚さは1μm以上であり、前記グラファイト膜の膜面方向の電気伝導度が膜厚方向の電気伝導度の100倍以上であることを特徴とするビーム強度変換膜。 - 各グラファイト膜の膜面方向の熱伝導度は、1000W/(m・K)以上であることを特徴とする請求項1に記載のビーム強度変換膜。
- 前記グラファイト膜の膜面方向の電気伝導度は、12000S/cm以上であることを特徴とする特徴とする請求項2に記載のビーム強度変換膜。
- 前記グラファイト膜の開口率が1~80%であることを特徴とする請求項1~4の何れか1項に記載のビーム強度変換膜。
- 前記グラファイト膜の密度は、1.70g/cm3以上、2.26g/cm3以下であることを特徴とする請求項1~5の何れか1項に記載のビーム強度変換膜。
- 前記グラファイト膜が複数枚積層された積層体からなることを特徴とする請求項1~6の何れか1項に記載のビーム強度変換膜。
- 荷電粒子ビームが通過可能な開口部を有し、1または複数のグラファイト膜から構成されたビーム強度変換膜の製造方法であって、
前記グラファイト膜を、高分子膜を焼成することにより作製することを特徴とするビーム強度変換膜の製造方法。
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CN108780670A (zh) | 2018-11-09 |
CN108780670B (zh) | 2022-04-05 |
US11177116B2 (en) | 2021-11-16 |
EP3451347A1 (en) | 2019-03-06 |
JPWO2017188117A1 (ja) | 2018-12-06 |
US20190088450A1 (en) | 2019-03-21 |
JP6534775B2 (ja) | 2019-06-26 |
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