WO2017171205A1 - 잉크 조성물, 이로 제조된 경화 패턴, 이를 포함하는 발열체 및 이의 제조방법 - Google Patents
잉크 조성물, 이로 제조된 경화 패턴, 이를 포함하는 발열체 및 이의 제조방법 Download PDFInfo
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- WO2017171205A1 WO2017171205A1 PCT/KR2016/015175 KR2016015175W WO2017171205A1 WO 2017171205 A1 WO2017171205 A1 WO 2017171205A1 KR 2016015175 W KR2016015175 W KR 2016015175W WO 2017171205 A1 WO2017171205 A1 WO 2017171205A1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/102—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
- C09D11/037—Printing inks characterised by features other than the chemical nature of the binder characterised by the pigment
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
- C09D11/033—Printing inks characterised by features other than the chemical nature of the binder characterised by the solvent
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/84—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/84—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
- H05B3/86—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields the heating conductors being embedded in the transparent or reflecting material
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
- H05B2203/007—Heaters using a particular layout for the resistive material or resistive elements using multiple electrically connected resistive elements or resistive zones
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/013—Heaters using resistive films or coatings
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/017—Manufacturing methods or apparatus for heaters
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2214/00—Aspects relating to resistive heating, induction heating and heating using microwaves, covered by groups H05B3/00, H05B6/00
- H05B2214/02—Heaters specially designed for de-icing or protection against icing
Definitions
- the present specification relates to an ink composition, a curing pattern made of the ink composition, a heating element including the curing pattern, and a method of manufacturing the heating element.
- a heating glass may be used.
- the heating glass utilizes the concept of attaching a hot wire sheet to the glass surface or forming a hot wire directly on the glass surface, and applying heat to both terminals of the hot wire to generate heat from the hot wire, thereby raising the temperature of the glass surface.
- the first method is to form a transparent conductive thin film on the glass front.
- the transparent conductive thin film may be formed by using a transparent conductive oxide film such as ITO or by forming a thin metal layer, and then using a transparent insulating film above and below the metal layer to increase transparency.
- Using this method has the advantage of forming an optically excellent conductive film, but has a disadvantage in that it is not possible to implement a proper heat generation at a low voltage due to the relatively high resistance value.
- the second method uses a metal pattern or a wire, but may use a method of increasing transmittance by maximizing a region free of the metal pattern or the wire.
- the typical product using this method is heating glass made by inserting tungsten wire into PVB film used for automobile windshield bonding.
- the tungsten wire used has a diameter of 18 micrometers or more, so that a sufficient level of conductivity can be obtained at low voltage.However, the relatively thick tungsten wire makes the tungsten wire visible in view.
- a metal pattern may be formed on a PET film through a printing process, or a metal pattern may be formed on a PET (Polyethylene terephthalate) film and then formed through a photolithography process.
- the PET film having the metal pattern formed therebetween may be inserted between two sheets of polyvinyl butylal (PVB) film and then subjected to a glass bonding process to produce a heat generating product having a heat generating function.
- PVB polyvinyl butylal
- the present specification is to provide an ink composition, a curing pattern made of the ink composition, a heating element including the curing pattern and a method of manufacturing the heating element.
- the present specification is an aromatic epoxy resin; Thermal acid generators; And it provides an ink composition comprising an organic dye.
- the present specification has a light transmittance of 30% or less at a thickness of 300nm or less, derivatives combined with an epoxy group of an acid and an aromatic epoxy resin generated by a thermal acid generator; And it provides a curing pattern comprising an organic dye.
- a conductive heating pattern provided on the substrate and a curing pattern provided on the conductive heating pattern.
- the present specification comprises the steps of forming a metal film on the substrate; Forming a cured pattern on the metal film using the ink composition; And forming a conductive heating pattern by etching the metal film not provided with the curing pattern.
- the ink composition according to the present specification can be applied to a reverse offset printing method using a silicone blanket.
- the pattern made of the ink composition according to the present specification has the advantage of being durable at the lamination temperature of the bonding film.
- the visibility of the conductive heating pattern is reduced.
- FIG. 1 is a cross-sectional view of a heating element according to a first exemplary embodiment of the present specification.
- FIG. 2 is a cross-sectional view of a heating element according to a first exemplary embodiment of the present specification.
- FIG 3 is a cross-sectional view of a heating element according to a first exemplary embodiment of the present specification.
- the present specification is an aromatic epoxy resin; Thermal acid generators; And it provides an ink composition comprising an organic dye.
- the ink composition may be for producing a darkening pattern of the heating element.
- the darkening pattern made of the ink composition may have a light transmittance of 30% or less at a thickness of 300 nm or less.
- the aromatic epoxy resin is a binder resin to control the mechanical properties of the pattern, the aromatic epoxy resin is not particularly limited as long as it is an aromatic resin having an epoxy group.
- the epoxy equivalent of the aromatic epoxy resin may be 150 g / eq or more and 500 g / eq or less.
- Epoxy equivalent is the number of grams (g / eq) of resin containing an epoxy group of 1 gram equivalent here, and is measured according to the method prescribed
- the weight average molecular weight of the aromatic epoxy resin is not particularly limited, but may be, for example, 1,000 or more and 20,000 or less. In this case, sufficient chemical resistance to the etchant may be secured to prevent cracking and peeling of the pattern during the etching process.
- the aromatic epoxy resin is an olso cresol novolac substituted with an epoxy group, a phenol novolac substituted with an epoxy group, a bisphenol A novolac substituted with an epoxy group, a bisphenol A substituted with an epoxy group, a bisphenol F substituted with an epoxy group, and a bisphenol substituted with an epoxy group It may include at least one of S.
- the content of the aromatic epoxy resin may be 5 wt% or more and 15 wt% or less. In this case there is an advantage of having a suitable viscosity for printing.
- the thermal acid generator is a compound that promotes a curing reaction by generating an acid while being decomposed by heat, and the acid generating temperature of the thermal acid generator is not particularly limited, but may be 90 ° C. or more and 120 ° C. or less. If the said decomposition start temperature is 90 degreeC or more, the photosensitive resin composition excellent in storage stability can be obtained, and if it is 120 degrees C or less, the coating film excellent in chemical resistance and hardness can be obtained.
- the thermal acid generator is not particularly limited as long as it can generate an acid at 90 ° C or more and 120 ° C or less, for example, 2-hydroxy hexyl paratoluenesulfonate; Triaryl sulfonium hexafluoroantimonate; Triaryl sulfonium hexafluorophosphate; Tetramethyl ammonium trifluoro metasulfonate; Triethylammonium fluorosulfonate; And it may include one or two or more selected from the group consisting of hexafluoroantimonate.
- the content of the thermal acid generator may be 0.01 wt% or more and 0.2 wt% or less.
- the heat resistance and chemical resistance of the printing composition are excellent.
- the content of the thermal acid generator is less than 0.01% by weight, there is a problem that the heat resistance and chemical resistance are lowered due to insufficient promotion of the curing reaction.
- the content of the thermal acid generator exceeds 0.2% by weight there is a problem that long-term storage stability is lowered.
- the organic dye is a compound having no inorganic substance, that is, a hydrocarbon compound mainly formed of carbon and hydrogen, and may optionally further have at least one of nitrogen and oxygen.
- the organic dyes include anilino azo dyes, pyridone azo dyes, pyrazole azo dyes, triphenylmethane dyes, phthalocyanine dyes, anthraquinone dyes, atrapyridone dyes, oxonol dyes, and benzylidene dyes. And xanthene dyes.
- the organic dye may include at least one of a black organic dye and a blue organic dye.
- the organic dye may include at least one of color index solvent black 27, color index solvent black 28, color index solvent black 29, color index solvent blue 67, color index solvent blue 70 and color index solvent 136.
- the content of the organic dye may be greater than or equal to 3.99 wt% and less than or equal to 10 wt%.
- the ink composition may further include a solvent.
- the solvent may include two or more solvents, and specifically, the solvent may include two or more solvents having different breaking points. More specifically, the solvent may include at least one low boiling point solvent having a boiling point of less than 100 ° C. and at least one high boiling point solvent having a boiling point of at least 180 ° C. Preferably, the solvent may include a low boiling first solvent, a low boiling second solvent and a high boiling point solvent.
- the boiling point of the low boiling point solvent may be less than 100 ° C., specifically, may be 95 ° C. or less, and more specifically 90 ° C. or less.
- the boiling point of the low boiling point solvent may be 50 ° C. or more. If the boiling point of the first solvent is too low, a problem may occur that the printing composition dries at the nozzle when the printing composition is applied to the blanket. In addition, the boiling point of the low boiling point solvent may be 50 ° C. or more to improve the leveling property immediately after the application of the printing composition.
- the low boiling point solvent is dimethyl carbonate; Methanol; Methyl ethyl ketone; Acetone; Ethyl acetate; ethanol; Isopropyl alcohol; 1,3-propyl alcohol; And it may include one or two or more selected from the group consisting of n-hexane.
- the high boiling point solvent is not particularly limited as long as the boiling point is 180 ° C. or higher, but gamma-valerolactone, deltavalerolactone, delta-valerolactone, gamma-butylrolactone, and gammahexalactone , At least one in the group consisting of gamma-octalactone, gammaoctacanotone, gammaoctacanotone, gamma-decanolactone, deltaoctanolactone, and deltadodecanolactone It may include.
- the content of the low boiling first solvent is 10% by weight or more and 80% by weight or less
- the content of the low boiling second solvent is 10% by weight or more and 80% by weight or less of the high boiling point solvent.
- the content may be 1 wt% or more and 15 wt% or less.
- the content of the aromatic epoxy resin is 5% by weight or more and 15% by weight or less
- the content of the thermal acid generator is 0.01% by weight or more and 0.2% by weight or less
- the content of the organic dye is 3.99. 10 wt% or more and 10 wt% or less
- the content of the low boiling point first solvent is 10 wt% or more and 80 wt% or less
- the content of the low boiling point second solvent is 10 wt% or more and 80 wt% or less
- the high boiling point solvent The content may be 1 wt% or more and 15 wt% or less.
- the ink composition may further include at least one additive of a surfactant, an adhesion promoter, and a curing agent.
- the surfactant, the adhesion promoter and the curing agent are not particularly limited, and may be employed as long as they are generally used in the art.
- the surfactant may be a conventional leveling agent, wetting agent and slip agent, and may be, for example, silicone-based, fluorine-based or polyether-based surfactants.
- the content of the surfactant may be 0.01 wt% or more and 1 wt% or less, or 0.01 wt% or more and 0.5 wt% or less of the total ink composition weight.
- the content of the surfactant is in the above range, there is an advantage of excellent coating and pattern implementability.
- melamine-based, styrene-based or acrylic oligomers or polymers may be used as the adhesion promoter.
- the weight average molecular weight of the oligomer or polymer may be 5,000 or less, specifically 3,000 or less, and more specifically 1,000 or less.
- the content of the adhesion improving agent may be 0.01 wt% or more and 1 wt% or less, or 0.01 wt% or more and 0.5 wt% or less of the total ink composition weight.
- the content of the adhesion promoter is in the above range, the adhesion of the pattern, heat resistance and chemical resistance is excellent.
- the curing agent may be a melamine-based curing agent, it may be a condensation product of the melamine derivative and formaldehyde.
- the melamine-based curing agent of the present specification Cyme1300, Cyme1301, Cyme1303, Cyme1323, Cyme1325, Cyme1326, Cyme1327, Cyme1370, Cyme1373, Cyme13717, Cyme1385 and Sanwa Chemical Co., Ltd. MW-30M, MW-390, MW-100LM, It may include one or two or more selected from the group consisting of MX-750LM.
- the content of the melamine-based curing agent may be 0.5 wt% or more and 10 wt% or less of the total ink composition weight.
- the content of the melamine-based curing agent is in the above range, there is an advantage of excellent heat resistance, chemical resistance, adhesion to the substrate and insulation properties of the offset printing composition.
- the present specification has a light transmittance of 30% or less at a thickness of 300 nm or less, a derivative in which an epoxy group of an acid and an aromatic epoxy resin generated by a thermal acid generator is bonded; And it provides a curing pattern comprising an organic dye.
- the present specification provides a cured pattern made of the ink composition and having a light transmittance of 30% or less at a thickness of 300 nm or less.
- the cured pattern may be a darkening pattern for reducing the reflection of the metal fine pattern.
- a conductive heating pattern provided on the substrate And a curing pattern provided on the conductive heating pattern.
- the material of the substrate is not particularly limited as long as it can serve to support the conductive heating pattern.
- the substrate may be a glass substrate or a flexible substrate.
- the flexible substrate may be a plastic substrate or a plastic film.
- the plastic substrate or the plastic film is not particularly limited, but for example, polyacrylate, polypropylene (PP, polypropylene), polyethylene terephthalate (PET), polyethylene ether phthalate, Polyethylene phthalate, polybuthylene phthalate, polyethylene naphthalate (PEN; polycarbonate), polystyrene (PS), polyether imide, poly It may include any one or more of polyether sulfone (polyether sulfone), polydimethyl siloxane (PDMS; polydimethyl siloxane), polyether ether ketone (PEEK; Polyetheretherketone) and polyimide (PI).
- PP polypropylene
- PET polyethylene terephthalate
- PET polyethylene ether phthalate
- the substrate is a flexible film
- the substrate having the conductive heating pattern may be wound and stored in a roll so that the substrate may be used in a roll-to-roll process.
- the thickness of the substrate is not particularly limited, but specifically, may be 20 ⁇ m or more and 250 ⁇ m or less.
- the height of the conductive heating pattern may be 10 ⁇ m or less, and when the height of the conductive heating pattern exceeds 10 ⁇ m, there is a disadvantage in that the recognition of the metal is increased by the reflection of light by the side of the metal pattern.
- the line height of the conductive heating pattern is in the range of 0.3 ⁇ m or more and 10 ⁇ m or less.
- the line height of the conductive heating pattern is in the range of 0.5 ⁇ m or more and 5 ⁇ m or less.
- the line of the conductive heating pattern means a distance from a surface in contact with the substrate to a surface opposing thereto.
- the deviation of the conductive heating pattern sentence is within 20%, preferably within 10%.
- the deviation means a percentage of the difference between the average sentence and the individual sentence based on the average sentence.
- the conductive heating pattern may be made of a thermally conductive material.
- the conductive heating pattern may be made of metal wires.
- the heating pattern preferably includes a metal having excellent thermal conductivity.
- the specific resistance value of the heating pattern material may be 1 microOhm cm or more and 10 microOhm cm or less.
- copper, silver, aluminum, or the like may be used.
- copper having a low price and excellent electrical conductivity is most preferred.
- the conductive heating pattern may include a pattern of metal lines formed of a straight line, a curve, a zigzag or a combination thereof.
- the conductive heating pattern may include a regular pattern, an irregular pattern, or a combination thereof.
- the total opening ratio of the conductive heating pattern that is, the ratio of the substrate region not covered by the conductive heating pattern is preferably 90% or more.
- the line width of the conductive heating pattern is 40 ⁇ m or less, specifically 3 ⁇ m to 20 ⁇ m or less.
- the interval between the lines of the conductive heating pattern is 50 ⁇ m to 1 mm.
- the cured pattern may be a darkening pattern for reducing reflection of the conductive heating pattern.
- the thickness of the cured pattern is not particularly limited, but may be, for example, 2 ⁇ m or less, and more specifically, 100 nm or more and 2 ⁇ m or less.
- the curing pattern may be provided in a region corresponding to the conductive heating pattern, and may be provided on at least a portion of the side surface as well as the upper surface of the conductive heating pattern, and may be provided on the upper surface and the entire side of the conductive heating pattern pattern.
- the darkening pattern may be provided on the upper surface of the conductive heating pattern, thereby reducing visibility of the reflectivity of the conductive heating pattern.
- the darkening pattern may be formed of a single layer or may be formed of two or more layers.
- the darkening pattern is preferably close to an achromatic color. However, it does not necessarily need to be achromatic, and even if it has color, it can be introduced if it has low reflectivity.
- the achromatic color means a color that appears when light incident on the surface of the object is not selectively absorbed and is evenly reflected and absorbed for the wavelength of each component.
- the darkening pattern may be a material having a standard deviation of 50% of the total reflectance for each wavelength band when measuring the total reflectance in the visible light region (400 nm to 800 nm).
- the darkening pattern may have a pattern shape having a line width equal to or larger than the line width of the conductive heating pattern.
- the darkening pattern When the darkening pattern has a pattern shape having a line width larger than the line width of the conductive heating pattern, when the user looks, the darkening pattern may give a greater effect of covering the conductive heating pattern, so that the conductive pattern itself There is an advantage that can effectively block the effect of the gloss or reflection of the. However, even if the line width of the darkening pattern is the same as the line width of the conductive pattern, the desired effect can be achieved in the present specification.
- the heating element may further include a bus bar provided at both ends of the conductive heating pattern.
- the heating element may further include a power supply connected to the bus bar.
- a black pattern may be provided to conceal the bus bar.
- the black pattern may be printed using a paste containing cobalt oxide.
- screen printing is suitable for screen printing, and the thickness may be set to 10 ⁇ m to 100 ⁇ m.
- the conductive heating pattern and the bus bar may be formed before or after forming the black pattern, respectively.
- the heating element may further include a transparent substrate provided on at least one of the surface opposite to the surface on which the curing pattern of the substrate is provided.
- the transparent substrate refers to a transparent substrate of the final product for applying the heating element, for example, the transparent substrate may be a glass substrate, preferably may be automotive glass.
- the transparent substrate When the transparent substrate is provided on the cured pattern, it may further include an adhesive film provided between the transparent substrate and the cured pattern.
- the transparent substrate When the transparent substrate is provided on the opposite side of the surface provided with the curing pattern of the substrate, the transparent substrate may further include an adhesive film provided between the opposite side of the surface provided with the curing pattern of the substrate.
- the adhesive film means having adhesiveness at or above the process temperature used in the thermal bonding process.
- the adhesive film means that the adhesive film may exhibit adhesiveness with a transparent substrate in a thermal bonding process used to manufacture a heating element in the art.
- the pressure, temperature, and time of the thermal bonding process vary depending on the type of adhesive film, but for example, the thermal bonding process may be performed at a temperature selected in the range of 130 to 150 ° C., and pressure may be applied as necessary.
- PVB polyvinylbutyral
- EVA ethylene vinyl acetate
- PU polyurethane
- PO Polyolefin
- the thickness of the said adhesive film is 190 micrometers or more and 2,000 micrometers or less.
- the conductive heating pattern may be stably supported and at the same time, sufficient adhesive force with the transparent substrate may be obtained. Even when the thickness of the adhesive film is 2,000 ⁇ m or less, since the supportability and adhesiveness can be sufficiently obtained as described above, an unnecessary increase in thickness can be prevented.
- the glass transition temperature (Tg) of the adhesive film is 55 ° C or more and 90 ° C or less. Even when the adhesive film has such a low glass transition temperature (Tg), the conductive heating pattern without the adhesive damage of the adhesive film, or unintentional deformation or damage of the film in the conductive heating pattern forming process by the method described below Can be formed.
- the heating element according to the present invention may be connected to a power source for heat generation, in which the amount of heat is preferably 100 to 1000 W, preferably 300 to 700 W per m 2 .
- the heating element according to the present invention has excellent heat generating performance even at low voltage, for example, 30 V or less, preferably 15 V or less, and thus may be usefully used in automobiles and the like.
- the resistance in the heating element is 2 ohms / square or less, preferably 1 ohms / square or less, preferably 0.5 ohms / square or less.
- the obtained resistance has the same meaning as the sheet resistance.
- the heating element may be a heating element for automobile glass.
- the heating element may be a heating element for a windshield of an automobile.
- a step of forming a metal film on the substrate Forming a cured pattern on the metal film using the ink composition; And forming a conductive heating pattern by etching the metal film not provided with the curing pattern.
- the metal layer may be formed by deposition, plating, or lamination of a metal foil, and the conductive pattern formed on the metal layer serves as an etch protection pattern to etch a metal layer that is not covered by the hardening pattern. Can be formed.
- the method of manufacturing the heating element includes forming a curing pattern on the metal film using the ink composition.
- the ink composition may refer to the description of the ink composition described above.
- the method of forming the cured pattern is not particularly limited, but may be formed by a roll printing method. Specifically, the method of forming the cured pattern may be a reverse offset printing method using a silicon-based blanket.
- the hardness of the silicone blanket used in the reverse offset printing method may be Shore A hardness 20 to 70.
- the silicon-based blanket means that the outer circumferential portion of the blanket is made of a silicon-based material.
- the silicon-based material is not particularly limited as long as it includes silicon and includes a curable group, but hardness may be 20 to 70, and specifically, hardness may be 30 to 60.
- the hardness means Shore A hardness.
- a part of the blanket may come into contact with the intaglio of the cliché due to the deformation of the blanket, resulting in poor pattern accuracy.
- a material having a hardness of 70 or less can be selected in consideration of the ease of selection of the blanket material.
- a polydimethyl siloxane (PDMS) curable material may be used as the silicon blanket material.
- the blanket material may further include additives known in the art without departing from the object of the present invention.
- Forming the cured pattern may include curing the ink pattern formed of the ink composition by heat treatment.
- the thermal acid generator generates an acid by heat, and the epoxy of the aromatic epoxy resin is ring-opened by the generated acid to form a crosslink.
- the heat treatment temperature of the heat treatment step is a temperature at which the thermal acid generator can generate an acid, and if the ink pattern includes a thermal acid generator having an acid generation temperature of 90 ° C. or more and 120 ° C. or less, the heat treatment temperature is 90 ° C. or more and 130 ° C. or less. Can be.
- the heat treatment time of the heat treatment step is not particularly limited, but may be 1 minute or more and 30 minutes or less.
- the forming of the conductive heating pattern may include a hardening pattern on the metal film as an etch protection pattern, and may form a conductive heating pattern by etching a metal film not covered by the hardening pattern.
- the method may further include laminating a transparent substrate on the curing pattern and at least one of the opposite surfaces of the surface on which the curing pattern of the substrate is provided.
- the method may further include forming an adhesive film on the cured pattern, or laminating the transparent substrate provided with the adhesive film to contact the cured pattern and the adhesive film.
- the transparent substrate is provided on the opposite side of the surface provided with the curing pattern of the substrate, further comprising the step of forming an adhesive film on the opposite side of the surface provided with the curing pattern of the substrate, or the adhesive film is provided
- the transparent substrate may be laminated so that the substrate and the adhesive film contact each other.
- an ink composition in the composition shown in Table 1 To prepare an ink composition in the composition shown in Table 1. Using the ink composition, a darkening pattern was formed on the metal film by a reverse offset printing process. The metal film on which the darkening pattern was formed was heat-treated at 130 ° C. for 10 minutes, and the metal of the region not provided with the pattern was removed through an etching process to form a final conductive heating pattern with the darkening pattern.
- Polyvinyl butyral (PVB) films were provided on the upper and opposite surfaces of the substrate on which the conductive heating pattern was formed and placed between two glasses, and then laminated using vacuum lamination at 120 ° C. for 10 minutes.
- Example 1 Example 2 Example 3
- the compatibility of the ink composition was determined after the preparation of the ink composition by using a filter of 1 ⁇ m pore size to determine whether it can be used in the filter, in this case, the case that can be used after the filter, the case is not possible to use after the filter.
- the pattern of the ink composition is formed in the following manner, when the pattern can be implemented in the 100% area of the total printing area as A, when the pattern can be implemented in the 80% area as B, the pattern is realized in the 50% area. A case where C is possible and X where a case is impossible to implement in the entire printing area is shown.
- the pattern formation method is as follows.
- the ink composition was applied on a silicon blanket at a rate of 80 mm / sec to form a coating film having a thickness of 15 ⁇ m before drying, which was transferred to a cliché having a negative heating pattern to form a pattern corresponding to the cliché on the blanket.
- the printing composition pattern formed on the blanket was transferred onto the metal film to form a pattern, and the pattern realization area relative to the total printing area was measured.
- the etching resistance of the pattern formed by the pattern forming method was determined by observing the ink film retention and the degree of metal pattern implementation after etching using an etching process using a sulfuric acid permeate etching solution. During the etching process, the temperature of the etching solution was 25 ⁇ 1 ° C., and etching was performed by applying 1.5 times more time after the metal film was immersed and removed from the pattern-free region.
- the case where the ink coating film is maintained in the area and the metal pattern is formed is shown as C, and the case where the ink coating film disappears and the metal pattern is not formed at the entire printing area is shown as X.
- the durability of the pattern formed through the printing and etching method was determined after the PVB laminated on the pattern for 20 minutes to 180 minutes under the conditions of 100 °C or more and 160 °C or less, the pattern retention characteristics were determined, where the pattern is maintained (Circle), the case where a pattern was not hold
- the ink composition was spin-coated on a 10 ⁇ 10 size glass substrate and dried at 110 ° C. for 180 seconds on a hot plate to form an ink coating film having a thickness of 300 nm.
- the formed ink coating film was evaluated for transmittance using a transmittance analyzer (UV / Vis Spectrometer Solidspec 3700, Shimadzu) at a wavelength of 300 to 780 nm. The results are shown in Table 2 below.
- Example 1 Using the ink composition of Example 1, (1) the pattern formed on the metal film, (2) the metal film was etched, and (3) the PVB laminated on the pattern was measured by an optical microscope and shown in FIG. 4. did.
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Abstract
Description
실시예1 | 실시예2 | 실시예3 | 실시예4 | 비교예1 | 비교예2 | 비교예3 | |||
바인더 | 종류 | A | B | B | B | C | B | B | |
함량 | 7wt% | 7wt% | 5wt% | 7wt% | 7wt% | 7wt% | 7wt% | ||
에폭시당량 (g/eq) | 200~230 | 190~220 | 190~220 | 300~320 | 0 | 190~220 | 190~220 | ||
유기 염료 | 4wt% | 4wt% | 6wt% | 4wt% | 4wt% | 4wt% | 4wt% | ||
열산발생제 | 0.15wt% | 0.15wt% | 0.15wt% | 0.15wt% | 0.15wt% | 0.15wt% | - | ||
용매 | ① | 48wt% | 48wt% | 48wt% | 48wt% | 48wt% | 48wt% | 48wt% | |
② | 28wt% | 28wt% | 28wt% | 28wt% | 28wt% | 28wt% | 28wt% | ||
③ | 10wt% | 10wt% | 10wt% | 10wt% | 10wt% | 10wt% | 10wt% | ||
계면활성제 | 0.5wt% | 0.5wt% | 0.5wt% | 0.5wt% | 0.5wt% | 0.5wt% | 0.5wt% | ||
밀착증진제 | 0.85wt% | 0.85wt% | 0.85wt% | 0.85wt% | 0.85wt% | 0.85wt% | 0.85wt% | ||
경화제 | 1.5wt% | 1.5wt% | 1.5wt% | 1.5wt% | 1.5wt% | 1.5wt% | 1.5wt% |
Claims (19)
- 방향족 에폭시 수지; 열산 발생제; 및 유기 염료를 포함하는 잉크 조성물.
- 청구항 1에 있어서, 상기 방향족 에폭시 수지의 에폭시 당량은 150g/eq 이상 500 g/eq 이하인 것인 잉크 조성물.
- 청구항 1에 있어서, 상기 방향족 에폭시 수지는 에폭시기가 치환된 올쏘 크레졸 노볼락, 에폭시기가 치환된 페놀 노볼락, 에폭시기가 치환된 비스페놀 A 노볼락, 에폭시기가 치환된 비스페놀 A, 에폭시기가 치환된 비스페놀 F 및 에폭시기가 치환된 비스페놀 S 중 적어도 하나를 포함하는 것인 잉크 조성물.
- 청구항 1에 있어서, 상기 열산 발생제의 산 발생 온도는 90℃ 이상 120℃ 이하인 것인 잉크 조성물.
- 청구항 1에 있어서, 상기 유기 염료는 아닐리노 아조계 염료, 피리돈 아조계 염료, 피라졸 아조계 염료, 트리페닐메탄계 염료, 프탈로시아닌계 염료, 안트라퀴논계 염료, 아트라피리돈계 염료, 옥소놀계 염료, 벤질리덴 염료 및 크산텐 염료 중 적어도 하나를 포함하는 것인 잉크 조성물.
- 청구항 1에 있어서, 상기 유기 염료는 칼라인덱스 솔벤트 블랙 27, 칼라인덱스 솔벤트 블랙 28, 칼라인덱스 솔벤트 블랙 29, 칼라인덱스 솔벤트 블루 67, 칼라인덱스 솔벤트 블루 70 및 칼라인덱스 솔벤트 136 중 적어도 하나를 포함하는 것인 잉크 조성물.
- 청구항 1에 있어서, 계면활성제, 밀착증진제, 경화제 및 용매 중 적어도 하나를 더 포함하는 잉크 조성물.
- 청구항 7에 있어서, 상기 용매는 끊는점이 상이한 2 이상의 용매를 포함하는 것인 잉크 조성물.
- 청구항 7에 있어서, 상기 용매는 1 이상의 저비점 용매 및 1 이상의 고비점 용매를 포함하는 것인 잉크 조성물.
- 청구항 1에 있어서, 상기 잉크 조성물 총 중량을 기준으로, 상기 방향족 에폭시 수지의 함량은 5중량% 이상 15중량% 이하이고, 상기 열산 발생제의 함량은 0.01중량% 이상 0.2중량% 이하이며, 상기 유기 염료의 함량은 3.99중량% 이상 10중량% 이하인 것인 잉크 조성물.
- 청구항 9에 있어서, 상기 잉크 조성물 총 중량을 기준으로, 상기 방향족 에폭시 수지의 함량은 5중량% 이상 15중량% 이하이고, 상기 열산 발생제의 함량은 0.01중량% 이상 0.2중량% 이하이며, 상기 유기 염료의 함량은 3.99중량% 이상 10중량% 이하이고, 상기 저비점 제1 용매의 함량은 10중량% 이상 80중량% 이하이며, 상기 저비점 제2 용매의 함량은 10중량% 이상 80중량% 이하이고, 상기 고비점 용매의 함량은 1중량% 이상 15 중량% 이하인 것인 잉크 조성물.
- 청구항 1에 있어서, 상기 잉크 조성물은 발열체의 암색화 패턴 제조용인 것인 잉크 조성물.
- 300nm 이하의 두께에서 광투과도가 30% 이하이고,열산 발생제에 의해 발생된 산과 방향족 에폭시 수지의 에폭시기가 결합된 유도체; 및 유기 염료를 포함하는 경화 패턴.
- 기재; 상기 기재 상에 구비된 전도성 발열 패턴; 및 상기 전도성 발열 패턴 상에 구비된 청구항 13의 경화 패턴을 포함하는 발열체.
- 청구항 14에 있어서, 상기 경화 패턴은 암색화 패턴인 것인 발열체.
- 기재 상에 금속막을 형성하는 단계;청구항 1 내지 12 중 어느 한 항에 따른 잉크 조성물을 이용하여 상기 금속막 상에 경화 패턴을 형성하는 단계; 및상기 경화 패턴이 구비되지 않은 금속막을 식각하여 전도성 발열 패턴을 형성하는 단계를 포함하는 발열체의 제조방법.
- 청구항 16에 있어서, 상기 경화 패턴을 형성하는 방법은 리버스 오프셋 인쇄법인 것인 발열체의 제조방법.
- 청구항 16에 있어서, 상기 경화 패턴을 형성하는 단계는 잉크 조성물로 형성된 잉크 패턴을 열처리하여 경화하는 단계를 포함하는 발열체의 제조방법.
- 청구항 16에 있어서, 상기 전도성 발열 패턴을 형성한 후, 상기 경화 패턴 상에 및 상기 기재의 경화 패턴이 구비된 면의 반대면 중 적어도 하나에 투명 기재를 합지하는 단계를 더 포함하는 발열체의 제조방법.
Priority Applications (4)
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US16/084,523 US11026298B2 (en) | 2016-04-01 | 2016-12-23 | Ink composition, cured patterns produced thereby, heating element including same, and manufacturing method therefor |
CN201680084369.2A CN109071980B (zh) | 2016-04-01 | 2016-12-23 | 油墨组合物、由此形成的固化图案、包括固化图案的加热元件及其制备方法 |
JP2018548080A JP6743900B2 (ja) | 2016-04-01 | 2016-12-23 | インク組成物、これで製造された硬化パターン、これを含む発熱体およびその製造方法 |
EP16897225.5A EP3412737B1 (en) | 2016-04-01 | 2016-12-23 | Ink composition, cured patterns produced thereby, heating element including same, and manufacturing method therefor |
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KR1020160040409A KR102143261B1 (ko) | 2016-04-01 | 2016-04-01 | 잉크 조성물, 이로 제조된 경화 패턴, 이를 포함하는 발열체 및 이의 제조방법 |
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- 2016-12-23 JP JP2018548080A patent/JP6743900B2/ja active Active
- 2016-12-23 CN CN201680084369.2A patent/CN109071980B/zh active Active
- 2016-12-23 WO PCT/KR2016/015175 patent/WO2017171205A1/ko active Application Filing
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KR20060112926A (ko) * | 2005-04-28 | 2006-11-02 | 신충균 | 전기 히팅 미러 제조 방법 및 그 미러 |
US20110102528A1 (en) * | 2009-10-30 | 2011-05-05 | Fujifilm Corporation | Composition, resist film, pattern forming method, and inkjet recording method |
JP2011227999A (ja) * | 2010-04-15 | 2011-11-10 | Creative Technology Corp | 面状発熱体 |
JP2014169400A (ja) * | 2013-03-04 | 2014-09-18 | Tokyo Ohka Kogyo Co Ltd | 硬化性組成物 |
KR20150062984A (ko) * | 2013-11-29 | 2015-06-08 | 주식회사 엘지화학 | 발열체 및 이의 제조방법 |
Non-Patent Citations (1)
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Also Published As
Publication number | Publication date |
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EP3412737B1 (en) | 2021-05-26 |
US20190098706A1 (en) | 2019-03-28 |
US11026298B2 (en) | 2021-06-01 |
EP3412737A4 (en) | 2019-01-09 |
KR102143261B1 (ko) | 2020-08-10 |
KR20170112798A (ko) | 2017-10-12 |
CN109071980A (zh) | 2018-12-21 |
JP6743900B2 (ja) | 2020-08-19 |
CN109071980B (zh) | 2021-09-21 |
EP3412737A1 (en) | 2018-12-12 |
JP2019515975A (ja) | 2019-06-13 |
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