WO2017126386A1 - 光偏向デバイスおよびライダー装置 - Google Patents
光偏向デバイスおよびライダー装置 Download PDFInfo
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- WO2017126386A1 WO2017126386A1 PCT/JP2017/000625 JP2017000625W WO2017126386A1 WO 2017126386 A1 WO2017126386 A1 WO 2017126386A1 JP 2017000625 W JP2017000625 W JP 2017000625W WO 2017126386 A1 WO2017126386 A1 WO 2017126386A1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
- G02F1/295—Analog deflection from or in an optical waveguide structure]
- G02F1/2955—Analog deflection from or in an optical waveguide structure] by controlled diffraction or phased-array beam steering
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1225—Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/49—Scattering, i.e. diffuse reflection within a body or fluid
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
- G01S7/48—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
- G01S7/481—Constructional features, e.g. arrangements of optical elements
- G01S7/4817—Constructional features, e.g. arrangements of optical elements relating to scanning
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/125—Bends, branchings or intersections
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/34—Optical coupling means utilising prism or grating
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
- G02F1/295—Analog deflection from or in an optical waveguide structure]
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12061—Silicon
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12107—Grating
Definitions
- the present invention relates to an optical deflection device that controls a traveling direction of light and emits a deflected outgoing beam, and a rider apparatus including the optical deflection device.
- Light deflection as a beam scan that deflects and sweeps (scans) light in the fields of laser printers, laser displays, lidars used for 3D laser measurements, etc.
- LIDER Light Detection and Ranging, Laser Imaging Detection and Ranging
- the device is in use.
- a configuration using a mechanical mirror As an optical deflection device, a configuration using a mechanical mirror, a configuration using a phase array, a configuration using light leakage from a waveguide, and the like are known.
- Non-Patent Document 1 The configuration using the phase array utilizes the fact that the direction of the beam changes depending on the phase of the light when a lot of light interferes to form a beam, and a lot of light from the optical waveguide integrated on the substrate is used. And are radiated into the free space from the end face of the waveguide or by a diffraction grating.
- a waveguide having a multilayer film structure and a waveguide with a diffraction grating As a configuration using light leakage from a waveguide, there are a waveguide having a multilayer film structure and a waveguide with a diffraction grating.
- a leaky waveguide with a multilayer structure when light propagating through a waveguide sandwiched between multilayer films leaks and is emitted, a light beam is formed by utilizing the fact that the radiation angles at each position are aligned. Yes, the light beam can be scanned by changing the wavelength of light or the refractive index of the waveguide. Further, when the multilayer film is operated at a wavelength close to a condition (slow light condition) where the angular dispersion is large, sensitivity to the wavelength and refractive index is increased, and the beam scan angle can be increased.
- Non-Patent Document 2 Non-Patent Document 2
- Patent Document 1 In a waveguide with a diffraction grating, light is gradually leaked from the waveguide by a weak diffraction grating to form a light beam, and the light beam can be scanned by wavelength and waveguide refractive index.
- the structure using a mechanical mirror generally has a movable part in addition to a large size of several cm square or more.
- the configuration including the movable part has a problem that the reliability is low and the operation speed is limited to the kHz order.
- resistance to vibration is necessary, so low reliability is a big problem.
- the configuration using the phase array and the configuration using light leakage from the waveguide do not have a mechanical movable part, so the problem of the mechanical mirror configuration can be solved. There are points to consider.
- the phase of each waveguide In the configuration using the phase array, if the phase of each waveguide is slightly disturbed, the formed light beam becomes multi-peak, and the beam quality is greatly deteriorated.
- the number of waveguides is small, the phase of each waveguide can be corrected.
- the quality of the light beam is evaluated by the sharpness of the beam, the narrowness of the divergence angle, the number of resolution points, and the like.
- a large number of waveguides are indispensable for suppressing deterioration of the quality of the light beam, but it is difficult to adjust the phases of the large number of waveguides.
- Silicon photonics optical integration technology is an optical integration technology that monolithically integrates devices such as optical waveguides, light receiving elements, and optical modulators using Si-based materials on Si (silicon), and III-V group semiconductors are integrated in a hybrid manner. If it does, a light emitting element is also possible. Silicon photonics is an indispensable technology for optical integration technology because of its good compatibility with the Si-CMOS manufacturing process.
- a leaky waveguide with a multilayer structure makes it easy to adjust the leak rate, so that high beam quality can be obtained and the scan angle can be expanded using Bragg reflection under slow light conditions. There is no consistency with the technology silicon photonics.
- a waveguide with a diffraction grating can use silicon photonics optical integration technology, but since slow light does not appear, a large beam scan angle cannot be obtained using Bragg reflection under slow light conditions.
- an optical element such as a lens can be inserted outside to expand the beam scan angle, the beam divergence angle increases at the same time, so the number of resolution points is limited.
- the number of resolution points is defined by the ratio of the maximum beam scan angle to the beam divergence angle, and is generally used as a figure of merit of the beam deflection device.
- the beam scan angle is the fluctuation width of the emission angle when the emission beam is swept, and the larger the angle range that the emission angle can take, the larger the beam scan angle can be obtained.
- the non-mechanical optical deflection device is required to satisfy both the high beam quality and the wide angular range of deflection and the consistency with the optical integration technology of silicon photonics in the light beam.
- the optical deflection device of the present invention solves the above-mentioned problems, and combines the high beam quality by slow light, the emission angle in a wide angular range of deflection, and the consistency of the optical integration technology by silicon photonics in the device configuration.
- the purpose is to prepare.
- the optical deflection device of the present invention is a silicon photonics device having a periodic structure of refractive index, (1) A structure in which the light propagation part where light propagates is a fine structure formed on an optical waveguide layer having a high refractive index medium such as silicon. (2) The fine structure constituting the light propagation part is a slow light.
- the structure includes two periodic structures, a periodic structure that expresses and a periodic structure that emits light.
- the micro structure formed on the silicon in (1) makes it possible to form an optical deflection device by applying the optical integration technology of silicon photonics, and emits a periodic structure and light that develops the slow light of (2).
- the two periodic structures that enable the formation of a light beam with high beam quality and a wide angular range of deflection.
- the periodic structure of the optical deflection device is (a) A first periodic structure comprising an optical waveguide having a second low refractive index medium with a period a in the first refractive index medium of silicon and having at least one end in the periodic direction as an incident end.
- the first refractive index medium is provided with a second refractive index medium with a period ⁇ (a ⁇ ⁇ 2a) longer than the period a of the first periodic structure, and an emission part having a side end in the periodic direction as an emission end is configured.
- Comprising a second periodic structure (c)
- the arrangement position of the second periodic structure is the peripheral part (tail) of the intensity distribution of light propagating through the optical waveguide part of the first periodic structure.
- n is an equivalent refractive index of light propagating through the optical waveguide having the first periodic structure
- ⁇ is a wavelength near the Bragg wavelength).
- the emitting part is combined with the spilled component of the slow light of the optical waveguide part to be scattered and diffracted, and gradually radiates upward or obliquely with respect to the traveling direction of the waveguide part.
- the outgoing beam is radiated from a wide range along the traveling direction of the waveguide, and since the radiation is in phase, it becomes a high-quality sharp light beam.
- the propagation constant ⁇ greatly changes due to slight changes in the light wavelength ⁇ and the refractive index n of the waveguide.
- the propagation constant ⁇ of the first periodic structure changes, the coupling condition with the second periodic structure changes, and the angle ⁇ of the outgoing beam changes. Therefore, by changing the propagation constant ⁇ by changing the wavelength ⁇ of light or the refractive index n of the waveguide, the angle ⁇ of the outgoing beam can be changed.
- the step of the first periodic structure is configured to be larger than the step of the second periodic structure.
- the step of the periodic structure is the depth direction perpendicular to the traveling direction of the light formed by the periodic structure in the refractive index medium of the periodic structure. Depending on the size of the step, the step of the periodic structure Different in strength of action.
- the step of the first periodic structure is a hole provided in the photonic crystal when the first periodic structure is formed of a photonic crystal having a periodic hole in the refractive index medium.
- the step of the second periodic structure is uneven when the second periodic structure is constituted by a diffraction grating in which the refractive index medium is formed with irregularities, and is a photo with periodic holes in the refractive index medium. In the case of a nick crystal, this is the depth of the hole provided in the photonic crystal.
- step of the first periodic structure By making the step of the first periodic structure larger than the step of the second periodic structure, a slow light is generated in the first periodic structure, and when the leaching component is coupled to the second periodic structure, Light leaks from the second periodic structure at a low speed and is diffracted to be emitted as an outgoing beam.
- the optical waveguide portion having the first periodic structure is a slow light waveguide
- the slow light waveguide can be a photonic crystal waveguide composed of a photonic crystal.
- the diffraction grating of the emission part of the second periodic structure can also be composed of a photonic crystal.
- the configuration of the photonic crystal waveguide having the first periodic structure can be a plurality of forms.
- it can be in the form of an air bridge type slow light waveguide having an air layer between it and the clad on the silicon substrate, or in the form of a clad embedded slow light waveguide embedded in the clad.
- the configuration of the diffraction grating having the second periodic structure can also take a plurality of forms.
- it may be in the form of a surface diffraction grating, an air bridge type diffraction grating with an air layer, an embedded diffraction grating embedded in a cladding, or a form formed on a silicon substrate.
- a diffraction grating layer having a different refractive index is provided by sandwiching an air layer between the air bridge type slow light waveguides or between the clad of the clad buried type slow light waveguides.
- a diffraction grating can be formed.
- a diffraction grating layer having a different refractive index is embedded in the upper cladding, the upper cladding, or the lower cladding. Can form a diffraction grating.
- the diffraction grating can be formed by directly engraving the concave-convex shape on the silicon substrate portion in contact with the clad.
- the arrangement position where the diffraction grating is provided in the photonic crystal can be in a plurality of forms.
- the diffraction grating may be provided on both sides of the photonic crystal waveguide, or the diffraction grating may be provided on the upper surface of the photonic crystal waveguide.
- the photonic crystal waveguide that constitutes the slow light waveguide can be composed of a double-period structure having two types of periods, a short period and a long period, in the periodic structure of the photonic crystal.
- a slow light waveguide having a first periodic structure is formed by increasing the step, and a diffraction grating having a second periodic structure is formed by decreasing the step of the periodic structure having a long period.
- the first and second periodic structures may be a one-dimensional photonic crystal waveguide having a linear periodic structure, or a two-dimensional photonic crystal waveguide having a linear defect in a planar periodic structure. it can.
- the reflection unit can increase the amount of light in the outgoing light by reflecting the outgoing light directed in the inner direction out of the outgoing light emitted from the emitting unit toward the outer direction.
- Another configuration example of the double periodic structure is a double periodic structure in which two types of circular holes having different diameters are repeated along the waveguide in the plane of the photonic crystal.
- This double periodic structure includes a periodic structure in which large-diameter circular holes are repeated and a periodic structure in which small-diameter circular holes are repeated.
- the diameter of the large-diameter hole is 2 (r + ⁇ r), and the diameter of the small-diameter circular hole is 2 (r ⁇ r).
- the optical deflecting device of the present invention is configured to control the emission angle of the outgoing beam, as a wavelength control unit that controls the wavelength of incident light, and / or the refractive index of the first periodic structure and / or the second periodic structure.
- a refractive index control unit for controlling the above can be provided.
- the emission angle ⁇ of the outgoing beam is changed by changing the wavelength ⁇ of the incident light by the wavelength control unit and / or changing the refractive index n of the refractive index medium in the periodic structure by the refractive index control unit.
- a control unit may be provided to control the wavelength change of the wavelength control unit and / or the refractive index change of the refractive index control unit.
- the control unit can sequentially change the emission angle ⁇ in a time series by time-controlling the wavelength change and / or the refractive index change.
- the outgoing beam can be swept (scanned) by sequentially changing the outgoing angle ⁇ .
- An optical system that aligns the outgoing angle of the outgoing beam diffusing from the outgoing part in one direction is provided in front of the outgoing direction of the outgoing part.
- Two optical paths are switchably connected to both ends of the optical waveguide section via an optical path changeover switch optical path.
- the incident light is switched and incident on the two optical paths by the optical path switch optical path, and the incident light is switched and incident from both ends of the optical waveguide portion of the optical deflection device. Since the emission angle ⁇ also changes depending on the direction of the propagation constant ⁇ , the angle range of the emission angle ⁇ is widened by changing the direction of the light incident on the optical waveguide portion of the first periodic structure using the optical path switch.
- the optical deflection device of the present invention is applied not only to a one-dimensional beam sweep in which the direction of the angle change of the outgoing beam is performed in one direction, but also to a two-dimensional beam sweep in which the direction of the angle change of the outgoing beam is performed in two different directions. Can do.
- incident light is switched and incident on at least one of an array configuration configured by arranging a plurality of optical waveguide portions in parallel and a plurality of optical waveguide portions configured as an array.
- an optical system such as a cylindrical lens that aligns the outgoing angle of the outgoing beam in one direction in front of the outgoing direction of the array configuration.
- the two-dimensional beam sweep is performed by a combination of a beam sweep in the first emission direction depending on the direction of the emission part and a beam sweep in the second emission direction depending on the selection of the optical waveguide part by the incident light changeover switch.
- a second embodiment for performing two-dimensional beam sweep includes an array configuration configured by arranging a plurality of optical waveguide portions in parallel, and a phase adjuster for entering incident light phase-adjusted into the plurality of optical waveguide portions configured as an array.
- a two-dimensional sweep is performed by adjusting the phase of the incident light of each optical waveguide unit with a phase adjuster.
- the optical deflection device of the present invention can receive reflected light that is reflected by outgoing light, and can be applied to an apparatus that uses reflected light.
- a lidar apparatus that uses reflected light can include a light deflection device, a pulse light source that makes pulse light incident on the light deflection device, and a light detection unit that detects light received by the light deflection device. .
- the light deflection device inputs and outputs light in two directions, that is, emission of emitted light and incidence of reflected light caused by the emitted light.
- emission of the emitted light and incidence of the reflected light can be performed with a single light deflection device.
- the rider apparatus may include a switching unit that switches between the pulsed light directed to the optical deflection device and the light received by the optical deflection device.
- the first form of the switching unit can be constituted by a branch path provided in the optical waveguide between the pulse light source and the optical deflection device and having a light detection unit at one end.
- the second form of the switching unit can be configured by an optical switch that is provided in an optical waveguide between the pulse light source and the optical deflection device and switches between the pulse light source and the light detection unit.
- the third form of the switching unit can be configured by a light detection unit provided in an optical waveguide between the pulse light source and the optical deflection device, which can switch between optical waveguide and light detection.
- the fourth form of the switching unit can be configured with an element that combines a pulse light source and a light detection unit, and can switch between generation and detection of pulsed light. It can be operated as a photodiode by applying a bias.
- the optical deflecting device of the present invention is a leaky waveguide type optical deflecting device that is compatible with silicon photonics and exhibits a slow light effect, and has a high beam quality and large deflection. It is possible to have both the alignment of the emission direction by the angle and the optical integration technology of silicon photonics.
- FIGS. 1 to 3 a schematic configuration example and operation of the optical deflection device of the present invention will be described with reference to FIGS. 1 to 3, an output beam sweep operation will be described with reference to FIG. 4, and a slow motion by a photonic crystal will be described with reference to FIG.
- the light waveguide is described, the emission conditions of the slow light are described with reference to FIGS. 6 and 7, the configuration example of the optical waveguide is described with reference to FIGS.
- a configuration example will be described, a configuration example in which the emission angle is enlarged will be described with reference to FIGS. 13 and 14, a configuration example of two-dimensional beam sweep will be described with reference to FIGS. 15 and 16, and an optical deflection device will be described with reference to FIG.
- the application of the reflected light to the apparatus will be described, and the configuration of the rider apparatus of the present invention will be described with reference to FIG.
- FIG. 1 is a schematic diagram for explaining the configuration of the optical deflection device.
- FIG. 1A is a diagram for explaining a schematic configuration
- FIG. 1B is a diagram for explaining an outline of a periodic structure of an optical deflection device.
- an optical deflection device 1 includes an optical waveguide 2 that propagates incident light, and an emission part that diffracts the light that has oozed out of the optical waveguide 2 and emits an outgoing beam at an outgoing angle ⁇ . 3.
- the optical deflection device 1 has a refractive index periodic structure in which the refractive index changes periodically.
- the periodic structure includes two periodic structures, a first periodic structure and a second periodic structure.
- the first periodic structure includes the second refractive index medium with a period a with respect to the first refractive index medium of the silicon substrate, and constitutes the optical waveguide section 2 having at least one end in the periodic direction as an incident end.
- the second periodic structure includes a second refractive index medium having a period ⁇ (a ⁇ ⁇ 2a) longer than the period a of the first periodic structure in the first refractive index medium.
- An emission part 3 serving as an emission end is configured.
- the first refractive index medium for example, a refractive index medium having a higher refractive index than that of the second refractive index medium can be selected.
- the second periodic structure is disposed close to the propagation distance of the propagation light of the optical waveguide unit 2 and is disposed in the periphery of the electric field intensity distribution of the propagation light propagating through the first periodic structure.
- the periodic structure of the optical deflection device 1 can be formed by silicon photonics optical integration technology.
- the light that has oozed out of the propagating light propagating through the optical waveguide section 2 is diffracted at the output angle ⁇ in combination with the second periodic structure of the output section 3, and is emitted as an output beam.
- FIG. 2 shows a configuration example of the optical deflection device 1.
- the optical waveguide unit 2 of the optical deflection device 1 has a second refractive index medium arranged at a period a between an upper clad 2b and a lower clad 2c of the first refractive index medium.
- the slow light waveguide 2a comprised is provided.
- the slow light waveguide 2a is formed by a first periodic structure in which a second refractive index medium is periodically arranged with a period a with respect to a clad having a refractive index of the first refractive index medium.
- As the first refractive index medium a medium having a higher refractive index than that of the second refractive index medium can be selected.
- the slow light waveguide 2a propagates incident light incident from one end in a slow light mode with a low group velocity.
- the emission part 3 of the optical deflection device 1 includes a surface diffraction grating 3a at a position adjacent to the upper cladding 2b.
- the surface diffraction grating 3a has an irregular shape with a period ⁇ .
- the concave / convex shape having the period ⁇ forms a second periodic structure having the period ⁇ between the refractive index n of the refractive index medium constituting the surface diffraction grating 3a and the refractive index n out of the external medium such as air.
- the propagation constant ⁇ greatly changes due to slight changes in the propagation state such as the wavelength ⁇ of light and the refractive index n of the waveguide.
- Such light propagates while having an electromagnetic field spread (a oozing component) around it.
- the emitting portion 3 having a periodic structure (second periodic structure) with a small step formed by a material having a small refractive index or shallow etching is disposed at a distance slightly touching the oozing component, the throwing component 3 is slow.
- the light is combined with this light and scattered and diffracted, and gradually emitted upward and obliquely. Radiation occurs in a wide range along the traveling direction of the waveguide and is in phase. Therefore, when the optical deflection device is viewed from the lateral direction along the propagation direction, the outgoing beam becomes a high-quality sharp light beam.
- the propagation constant ⁇ of the optical waveguide unit 2 changes, and the coupling condition with the second periodic structure of the emitting unit 3 Changes.
- the outgoing angle ⁇ of the outgoing beam changes.
- the light of the diffraction grating is not always emitted not only in the upper oblique direction but also in the lower oblique direction. Since the structure of the optical deflection device is asymmetrical in the vertical direction, light of exactly the same intensity is not emitted, but radiation in a downward oblique direction is also generated.
- FIG. 2B shows radiation in the upper oblique direction as upward diffracted light and radiation in the lower oblique direction as downward diffracted light.
- the optical deflection device 1 may be configured to include a reflecting portion below the lower clad 2c.
- FIG. 2C and FIG. 2D show a configuration example including a reflection unit.
- the configuration example shown in FIG. 2A shows a case where there is a high refractive index medium such as Si as the substrate of the structure.
- the downward radiated light is reflected at the boundary surface between the lower clad 2c and the high refractive index substrate 40, and is returned to the upper oblique direction.
- the radiation in the upward oblique direction can be enhanced as a whole.
- the configuration example shown in FIG. 2D is a configuration in which a reflection mirror 42 such as a metal reflection mirror or a multilayer film reflection mirror is inserted between the substrate 41 and the lower clad 2 c to further increase the radiation in the upward oblique direction. .
- the converted propagation constant ⁇ N becomes the wave number in the horizontal direction, and light is emitted into free space.
- n N ⁇ N / k 0 is set.
- the sensitivity of the emission angle ⁇ with respect to the wavelength ⁇ and the refractive index n is obtained based on the above formulas (1) and (2).
- Equation (5) shows that when the group refractive index ng is increased by the slow light waveguide, the wavelength sensitivity of the emission angle ⁇ increases substantially in proportion to the group refractive index ng , and the emission angle with respect to a slight change in the refractive index n. It shows that ⁇ greatly changes.
- the emission angle ⁇ can be greatly changed by a slight change in the wavelength ⁇ and the refractive index n.
- FIGS. 3 and 4 are diagrams for explaining the configuration for controlling the exit angle of the optical deflection device of the present invention.
- FIG. 3A is a schematic diagram of a configuration example for controlling the emission angle of the optical deflection device.
- the optical deflection device 1 includes a wavelength control unit 4 that controls the wavelength ⁇ of incident light incident on the optical waveguide unit 2 in addition to the optical waveguide unit 2 and the emission unit 3 having two periodic structures.
- a refractive index control unit 5 that controls the refractive index n of the optical waveguide unit 2 and / or the emission unit 3, and an emission angle control unit 6 that controls the wavelength control unit 4 and the refractive index control unit 5.
- the emission angle control unit 6 controls one of the wavelength control unit 4 and the refractive index control unit 5 or both control units, and controls the emission angle by controlling the wavelength and / or the refractive index.
- FIG. 3B is a schematic diagram for explaining a configuration example of an optical waveguide unit and an emission unit that control the emission angle of the optical deflection device.
- the first refractive index medium is a high refractive index medium
- the second refractive index medium is a low refractive index medium.
- the optical waveguide section 2 forms a slow light waveguide by a high refractive index medium 21 composed of upper and lower claddings and a low refractive index medium 22 periodically provided in the cladding.
- the optical waveguide unit 2 includes a refractive index changing unit 23 that controls the refractive index of the refractive index medium.
- the emitting unit 3 is constituted by a high refractive index medium 31 and a low refractive index medium 32 periodically provided in the high refractive index medium 31.
- the emitting unit 3 includes a refractive index changing unit 33 that controls the refractive index of the refractive index medium.
- the refractive index changing unit 23 and the refractive index changing unit 33 can be configured by, for example, a heater or a pn junction, and the carrier density is changed by temperature control by the heater or voltage application by the pn junction.
- the refractive index n is changed.
- the refractive index n is the refractive index of the optical waveguide determined by the refractive index of the high refractive index medium and the refractive index of the low refractive index medium.
- FIG. 4 (a) schematically shows changes in the emission angle ⁇ depending on the wavelength ⁇ and the refractive index n
- FIGS. 4 (b), 4 (c), and 4 (d) show the emission angle ⁇ and the wavelength ⁇ .
- the example of change of the refractive index n is shown.
- FIG. 4 shows an example in which the wavelength ⁇ and the refractive index n are changed stepwise in a time series. Due to this change, the emission angle ⁇ changes stepwise in a time series, and the outgoing beam is emitted to discrete irradiation points.
- the number of resolution points of the outgoing beam can be adjusted by adjusting the amount of change in wavelength ⁇ and refractive index n.
- the number of resolution points of the outgoing beam is the number of points irradiated within a predetermined interval, and corresponds to the irradiation density of discrete irradiation points.
- the emission angle ⁇ can be changed by the direction of the propagation constant ⁇ of the light propagating through the optical waveguide, and the light incident on the optical waveguide using the optical path switch can be changed.
- the emission angle ⁇ can also be changed by changing the direction, and the change range of the emission angle ⁇ can be expanded.
- the first refractive index medium is a high refractive index medium
- the second refractive index medium is a low refractive index medium.
- First periodic structure and slow light waveguide As an example of a first periodic structure that generates slow light, a photonic crystal waveguide can be considered.
- 5A to 5C show a first periodic structure example using a photonic crystal waveguide
- FIGS. 5A and 5B show a one-dimensional photonic crystal waveguide
- 5 (c) shows a two-dimensional photonic crystal waveguide.
- the one-dimensional photonic crystal waveguide 2A in FIG. 5A is a configuration example in which circular holes are periodically arranged in a rectangular channel waveguide (such as a Si wire) made of a high refractive index medium such as a semiconductor.
- the one-dimensional photonic crystal waveguide 2B of (b) is a configuration example that periodically separates the rectangular channel waveguide of the high refractive index medium.
- the thickness of Si can be about 200 nm
- the width can be about 400 nm
- the diameter of the circular hole can be about 200 nm
- the period a can be about 400 nm.
- similar circular holes are arrayed two-dimensionally periodically, for example, in a triangular lattice array in a semiconductor (such as Si) slab having the same thickness. It is the structure which removed the circular hole. Also in the structure of the two-dimensional photonic crystal waveguide 2C, a photonic band gap is generated in the vicinity of the Bragg wavelength, the group refractive index ng is increased, and slow light is generated.
- the two-dimensional photonic crystal waveguide can maintain a large ng in a wider wavelength range than the one-dimensional photonic crystal waveguide.
- FIG. 5 (d) is a perspective view showing a two-dimensional photonic crystal waveguide sandwiched between silica clads.
- a surface diffraction grating having a second periodic structure is formed on the surface of a two-dimensional photonic crystal waveguide formed with a silica cladding.
- FIG. 6A is a diagram for explaining the radiation conditions by the first periodic structure, and shows a photonic band having only the first periodic structure.
- the region shown dark is the radiation condition to the air
- the region shown thin is the radiation condition to the cladding.
- the thick solid line indicates a photonic band of slow light that is coupled to the first periodic structure and propagates in the positive direction without radiation, and forms a waveguide mode.
- a thin solid line indicates a photonic band in which slow light cannot propagate due to the radiation because it is coupled to air or the clad only by the first periodic structure.
- a broken line indicates light propagating in the reverse direction.
- FIG. 6B shows a photonic band when the period ⁇ of the second periodic structure is 2a.
- the wave number of the waveguide mode is converted into the radiation condition in the radiation mode region to the air by the band shift by the wave vector 2 ⁇ / ⁇ of the second periodic structure, and obliquely upward in the same direction as the traveling direction. It is converted into light that is emitted.
- the slow light propagating through the first periodic structure is radiated into the air according to the radiation condition of the second periodic structure.
- FIG. 7A shows a case where ⁇ ⁇ 4a / 3. In this period ⁇ , some wavelengths do not satisfy the conditions for emitting air.
- FIG. 7C shows the case of 4a / 3 ⁇ ⁇ 2a. In this period ⁇ , multiple emissions occur.
- FIG. 7E shows a case where ⁇ > 2a. In this period ⁇ , since the number of times the photonic band is folded back increases, many radiation conditions appear.
- n c is the refractive index of the upper and lower clad determining the radiation condition.
- N 1 normally used in slow light
- ⁇ and n are expressed by the following equations (8) and (9), and the emission angle ⁇ is expressed by the following equation (14).
- the ⁇ 1 * ⁇ (n c ⁇ 1) k 0 to ⁇ k 0 (12)
- ⁇ sin ⁇ 1
- n 1 sin ⁇ 1 [ ⁇ (n c ⁇ 1)] to ⁇ 1 (14)
- ⁇ 0 ° to ⁇ 90 °
- ⁇ ⁇ 27 ° to ⁇ 90 °.
- variable wavelengths are realized in desktop variable wavelength laser devices and variable wavelength laser compact modules.
- the change of the propagation constant ⁇ when the band is shifted in the frequency direction (this may be called the wavelength direction).
- the change in the refractive index n corresponding to the wavelength change width of 35 nm is 0.085 when Si is used as a material, for example.
- This change in refractive index can be realized by heating at about 470 ° C.
- the change in the refractive index n corresponding to a wavelength change width of 15 nm is 0.036, and this change in refractive index can be realized by heating at about 200 ° C. This heating range is possible using silicon photonics technology.
- the change in the emission angle ⁇ is small because the group refractive index ng is small on the short wavelength side.
- the group refractive index ng is large on the long wavelength side, the emission angle ⁇ also changes abruptly. Even when the refractive index n is changed, the same characteristics as in the case of the wavelength ⁇ are exhibited. For example, when the wavelength ⁇ is fixed to the short wavelength side of the slow light propagation band and the refractive index n is increased, the group refractive index ng is initially small and the change in the emission angle ⁇ is small, but the group refractive index n is gradually increased. As g increases, the change in the emission angle ⁇ also increases.
- the change of the emission angle ⁇ with respect to the wavelength ⁇ and the refractive index n is thus non-linear.
- the group refractive index ng is constant with respect to the wavelength ⁇ and the refractive index n, the emission angle ⁇ is almost linear.
- the group refractive index ng can be set to a large and constant value in a specific wavelength range.
- FIG. 8 shows a configuration example in which the group refractive index ng can be a constant value.
- the two-dimensional photonic crystal waveguide 2D shows a configuration example in which the circular hole is excessively enlarged
- the two-dimensional photonic crystal waveguide 2E shows a configuration example in which the width of the core portion of the optical waveguide portion is narrowed.
- the crystal waveguide 2F shows a configuration example in which the size of a circular hole in a specific circular hole array is changed
- the two-dimensional photonic crystal waveguide 2G shows a configuration example in which only the refractive index of the core portion is increased.
- the crystal waveguide 2H shows a configuration example in which a specific circular hole array (lattice) position is shifted.
- FIG. 9A shows a configuration in which the circular hole row of the silica-clad photonic crystal waveguide is shifted along the waveguide, and the second row lattice is shifted.
- the group index n g is 12 times the group index n g of the Si wire waveguide.
- the emission angle ⁇ changes linearly with respect to the wavelength ⁇ and the refractive index n, so that the emission angle ⁇ can be easily controlled.
- a large deflection angle can be obtained by making the period ⁇ slightly smaller than 4a / 3.
- the slow light waveguide may be a coupled resonator waveguide in which a large number of photonic crystal resonators and ring resonators are arranged and mutually coupled in addition to the photonic crystal waveguide.
- the present invention can be applied to a configuration in which a multilayered waveguide is formed in the layer thickness direction and the thickness of one layer is increased to form a waveguide, and a photonic crystal waveguide is fused.
- the diffraction grating constituting the emission part 3 having the second periodic structure can have another structure.
- an air bridge type diffraction grating 3B is a configuration example in which a diffraction grating is disposed on an air bridge type slow light waveguide via an air layer
- the air bridge type diffraction grating 3C is a clad buried type slow light waveguide.
- the diffraction grating 3D is a configuration example in which a diffraction grating is provided on an upper clad of a slow light waveguide by providing an uneven shape on a layer (such as SiN) having a different refractive index on the upper clad of the slow light waveguide.
- the diffraction grating 3E is a configuration example in which a diffraction grating having a concavo-convex shape is embedded in a layer (SiN or the like) having a different refractive index in the upper cladding, and the diffraction grating 3F has a refractive index in the lower cladding.
- This is a configuration example in which a diffractive grating having a concavo-convex shape is embedded in a different layer (SiN, etc.). Is an example configuration it.
- the diffraction grating 3H is a configuration example in which concave and convex shapes are formed on both sides of the photonic crystal waveguide.
- a finite number of circular hole arrays are arranged on both wings of the waveguide core.
- the light can be radiated by forming a diffraction grating at the location where the light oozes.
- the diffraction grating 3I is a configuration example in which a shallow uneven shape is formed on the surface of the photonic crystal waveguide.
- the diffraction grating may be arranged with photonic crystals having different circular hole arrangement periods, and shallow irregularities with different periods directly on the photonic crystal waveguide. It is good also as a structure to form.
- the diffraction grating 3J is a configuration example in which another period is superimposed on the period of the photonic crystal itself to make the photonic crystal itself have a multi-period structure.
- a photonic crystal waveguide is used as a slow light waveguide, and the waveguide and the light emission mechanism are configured by one mechanism.
- the photonic crystal waveguide forms a waveguide by reflecting and propagating light by sandwiching the left and right sides of the waveguide with photonic crystals arranged in a circular hole.
- An optical deflecting device having a multi-periodic structure has a double-periodic structure in which two types of circular holes having different diameters are repeated along the waveguide forming the waveguide in the plane of the photonic crystal.
- the uneven shape is drawn in a mountain shape, but it is not limited to this mountain shape and may be an arbitrary shape.
- FIG. 11 is a diagram for explaining the configuration of an optical deflection device having a multi-period structure of 3J in FIG.
- the optical deflecting device 1 has circular holes 3b and 3c of a low refractive index medium such as SiO 2 arranged two-dimensionally in a slab made of a high refractive index medium such as a semiconductor such as Si in a triangular lattice arrangement, for example.
- the circular holes in the arrangement of the parts are removed, and the part from which the circular holes are removed constitutes a waveguide part made of a two-dimensional photonic crystal and constitutes an emission part that emits a radiated light beam.
- Optical deflection device 1 comprises two different diameters 2r 1 and circular hole 3b of 2r 2 with respect to the light propagation direction, the double periodic structure 4 repeating 3c.
- the double periodic structure 4 the slow light propagation light which is non-radiated in the periodic structure in which circular holes of the same diameter are arranged is converted into radiation conditions and is emitted into space.
- the double periodic structure included in the optical deflection device includes a periodic structure in which large-diameter circular holes are repeated and a periodic structure in which small-diameter circular holes are repeated.
- the diameter of the reference circle hole and 2r when the 2 ⁇ r differences width of diameter, the diameter 2r 1 circular hole having a large diameter is 2 (r + ⁇ r), the diameter 2r 2 of the small-diameter circular holes 2 (r- ⁇ r). Further, when the distance between the centers of the adjacent large-diameter circular holes 3b and small-diameter circular holes 3c is a, the interval ⁇ between the circular holes of each periodic structure is 2a.
- a device using a third row shift type silica clad SiLSPCW or a device using a second row shift type LSPCW can be used.
- the second-row shift type LSPCW having a large ng an increase in the light deflection angle ⁇ is expected.
- FIGS. 12A to 12D show a photonic band, a group refractive index ng spectrum, a radiation angle ⁇ with respect to the wavelength ⁇ , and a radiation loss ⁇ with respect to the wavelength ⁇ in the optical deflecting device having the multi-periodic structure of the present invention. ing.
- the photonic band representing the light propagation characteristic is the diameter of the circular hole even when the diameter r of the circular hole is changed by 2 ⁇ r. Does not change in the same way as when 2 is uniform at 2r.
- the group refractive index ng does not change with respect to the diameter change ⁇ r, indicating that a slow dispersion with a low dispersion in a wide band with ng of approximately 20 occurs.
- the characteristic of the light propagation characteristic indicates that the propagation constant ⁇ does not change with respect to the light propagation direction, and the angle ⁇ of the emitted light does not change as shown in FIG.
- the light radiation loss ⁇ can be changed by changing the diameter 2r of the circular hole by ⁇ r.
- FIG. 12B shows an example in which ⁇ r is 5 nm, 10 nm, 15 nm, and 20 nm, and shows that the radiation loss ⁇ increases as ⁇ r increases.
- the radiation loss ⁇ represents the rate at which propagating light leaks out of the plane from the optical transport path. The greater the ⁇ r, the greater the intensity of the radiation beam emitted out of the plane.
- the radiation loss ⁇ With respect to the wavelength ⁇ shown in FIG. 12D, if the second row shift type LSPCW having a large ng is used, the radiation loss ⁇ is expected to further increase. On the other hand, the radiation loss ⁇ increases as ⁇ r increases. Therefore, by controlling ⁇ r, it is possible to control the amount of light emitted so that other properties such as the radiation angle and the propagation constant in the propagation direction do not change much.
- FIG. 13 shows a configuration example in which the range of the deflection angle is expanded by switching the incident direction of incident light to the optical deflection device.
- the deflection angle (exit angle) ⁇ of the exit beam is 0 ° or more. If the incident direction of the incident light with respect to the optical deflection device is introduced in the opposite direction, the emission direction of the emission beam becomes symmetrical. Therefore, by switching the direction in which the incident light is incident with the optical path change-over switch 7, it is possible to enlarge in the range of ⁇ 90 ° or ⁇ 33 ° around 0 °.
- optical paths 8a and 8b are connected to the optical deflection device 1 at the input ends at both ends.
- the optical path switch 7 switches incident light to the optical path 8a or the optical path 8b.
- Lights whose incident directions are switched from the optical path 8a or the optical path 8b are incident on the optical deflection device 1 in opposite directions to the optical deflection device.
- the deflection angle (outgoing angle) ⁇ of the outgoing beam is a deflection around ⁇ 90 °.
- the outgoing beam has a deflection angle range in both the positive and negative directions with respect to 0 °.
- the configuration example shown in FIG. 13C is a configuration in which incident light is incident on the two optical deflection devices 1a and 1b by switching the incident light by the optical path switching switches 7, 7a and 7b.
- an optical path 8c is connected to one incident end via optical path switching switches 7 and 7a, and an optical path 8e is connected to the other incident end via optical path switching switches 7 and 7b.
- an optical path 8d is connected to one incident end via optical path switching switches 7 and 7a, and an optical path 8f is connected to the other incident end via optical path switching switches 7 and 7b. Is done.
- the optical path switching switch 7 and the optical path switching switch 7a are connected by an optical path 8a, and the optical path switching switch 7 and the optical path switching switch 7b are connected by an optical path 8b.
- the omnidirectional deflection can be performed by switching the incident light to the optical deflection devices 1a and 1b by the optical path switching switches 7, 7a and 7b, respectively.
- FIG. 14 shows a configuration for suppressing the spread of light emitted from the optical deflection device through an optical system lens.
- the light beam emitted from the emission unit 3 of the optical deflection device 1 is a sharp beam when the waveguide is viewed from the side along the light propagation direction, but left and right when the waveguide cross section orthogonal to the light propagation direction is viewed. Greatly expands.
- the cylindrical lens 9 a is arranged at an appropriate distance on the emission side of the emission unit 3 to suppress the spread of light.
- the cylindrical lens 9a has a uniform thickness in a direction along the waveguide, and has a curved shape in which the thickness is changed in a direction orthogonal to the waveguide. With this shape, the right and left spread of the light emitted from the emission part 3 is suppressed, and thereby a single peak beam is created.
- the configuration shown in FIG. 14B is a configuration in which the slow light waveguide is embedded in an optical member such as a plastic mold 9b and cylindrical lens processing is performed on the surface of the optical member, and is the same as the cylindrical lens in FIG. The effect is obtained.
- a thick SiO 2 cladding or a polymer cladding is formed on the top of the optical deflection device, and the surface of the cladding is processed into a lens shape. Also good.
- FIG. 15 shows a configuration example in which two-dimensional beam sweep is performed by a combination of an array configuration of slow light waveguides and a cylindrical lens.
- FIG. 15A a large number of slow light waveguides and diffraction gratings are arranged in parallel to constitute an array integrated 13, and a cylindrical lens 9 is disposed in the output direction on the output side of the array integrated 13.
- An optical amplifier and a phase adjuster 12 are connected to each slow light waveguide.
- a switching unit 11 is connected to the phase adjuster 12. The switching unit 11 switches the incident light from the incident waveguide 10 to select a slow light waveguide that enters the light, and the phase adjuster 12 adjusts the phase. The light enters the selected slow light waveguide.
- the switching unit 11 can use an optical path switching optical switch or a wavelength demultiplexer.
- the incident light incident through the incident waveguide 10 is emitted from any of the slow light waveguides.
- the angle within the cross section of the outgoing beam that comes out of the cylindrical lens 9a changes.
- a small cylindrical lens array 9c is arranged on each diffraction grating to suppress the spread of the emitted light, and then the light is applied to the large cylindrical lens 9a.
- the same function as that in FIG. 15B can be realized by the configuration of incidence.
- each slow light waveguide is designed so that the outgoing angle ⁇ of the outgoing beam can be changed according to the wavelength.
- the waveguide is switched by a heater or a pn junction optical switch, and the output angle ⁇ of the outgoing beam from the slow light waveguide is changed by the heater or pn junction. The effect of can be obtained.
- the slow light waveguide is switched by a wavelength demultiplexer, and the output beam is deflected by a heater or a pn junction, and the slow light waveguide is switched by a heater or a pn junction. It is good also as a structure which performs a deflection
- FIG. 15A shows a configuration in which one waveguide in the waveguide array is selected.
- the phase adjuster 12 is connected to the array integration 15 in which the heaters or pn junctions having different lengths are provided in the slow light waveguides arranged in an array, so that the incident light is introduced. Incident light from the waveguide 10 is distributed toward each waveguide through the power distributor 14, and after adjusting the phase of each distribution light, the incident light enters the slow light waveguide.
- the array integration 15 constitutes a phase array in which light is incident on all slow light waveguides and gradually changes in phase. With this configuration, sharp beam radiation and deflection angle changes due to phase changes are realized.
- This phase array configuration eliminates the need for a cylindrical lens because an outgoing beam is formed by simultaneously emitting a plurality of lights having different phases.
- the power distribution of incident light is strong when the central waveguide is strong and gradually weakens as the surrounding waveguides become such that the envelope of the power distribution becomes a Gaussian distribution.
- the quality of the outgoing beam formed after this is improved.
- a configuration as used in an arrayed waveguide diffraction grating that is, the light of the incident waveguide is once connected to a wide slab waveguide, and the light is Gaussian distributed inside.
- a configuration may be adopted in which a desired number of arrayed waveguides are connected to the end of the slab waveguide by free propagation.
- FIG. 17 is a diagram for explaining application of the optical deflection device to an apparatus using reflected light.
- FIG. 18 is a view for explaining the form of the rider apparatus.
- FIG. 18 (a) shows a first form.
- the rider device 100A according to the first embodiment has a configuration in which the incident waveguide 80 is branched and the light detection unit 60 (photodiode) is disposed at one end of the branch path.
- the light pulse reflected and returned to the light deflection device 1 is passed through the optical filter 70 and then guided to the light detection unit 60 through the branch path to be detected.
- FIG. 18B shows a second form.
- the optical switch 90 is inserted into the incident waveguide 80, and after the optical pulse of the pulse light source 50 passes, it is switched to the photodetection unit 60 (photodiode) side and reflected and returned. The light pulse is guided to the light detection unit 60 (photodiode) with high efficiency.
- FIG. 18 (c) shows a third form.
- a photodiode having a pn junction formed in a Si waveguide causes subband gap absorption via crystal defects, and can detect light in a long wavelength band that cannot be detected originally.
- the photodiode having the pn junction described above is inserted as the light detection unit 60 in the middle of the incident waveguide 80, and the reverse bias is applied after the light pulse of the pulse light source 50 passes. Change to detect the reflected light pulse.
- FIG. 18 (d) shows a fourth embodiment.
- the rider apparatus 100D of the fourth embodiment includes a pulse light source / light detection unit 51 that doubles as a pulse light source and a light detection unit.
- the pulse light source / light detection unit 51 can also operate as a photodiode by applying a reverse bias to a semiconductor laser serving as a pulse light source. According to this configuration, after emitting the light pulse, the pulse light source / light detection unit 51 applies the reverse bias to operate as the photodiode, and detects the light pulse reflected and returned.
- the optical deflection device is effective in removing an excessive noise component in the above-described lidar (LIDAR) function.
- an optical filter 70 of a wavelength filter is inserted in the incident waveguide 80.
- the optical filter 70 is not an essential configuration, and the same function can be realized even if the optical filter 70 is omitted.
- the optical filter 70 is a filter that can pass the wavelength of the optical pulse of the pulse light source.
- the wavelength of the pulse light source is changed, it is more preferable to use a variable wavelength filter that can change the passing wavelength in synchronization with the wavelength change. In this case, the light reflected and returned passes through the optical filter 70 and reaches the light detection unit (photodiode).
- the optical deflection device 1 there are various wavelengths of light in the environment, and light having a wavelength different from the wavelength of the pulsed light source arrives at the diffraction grating of the optical deflection device 1 as a noise component. If the arrival directions of light having different wavelengths are the same as those of the original light beam, noise components having different wavelengths cannot be coupled to the optical waveguide. On the other hand, some noise components that arrive at the diffraction grating from other directions can be coupled back to the optical waveguide.
- the optical filter can remove noise components coupled to the optical waveguide in this way. This removal of the noise component is effective for improving the S / N ratio when detecting the LIDAR reflected signal.
- the optical deflection device of the present invention a highly directional light beam can be deflected without using mechanical parts. Therefore, the conventional optical deflector, which is as large as the cm order, can be downsized to the mm order. Further, the reliability can be improved, the power consumption can be reduced, and the operation speed can be increased, and a large change in beam angle and a large number of resolution points can be obtained by a slight change in wavelength or refractive index.
- the optical deflection device of the present invention can be manufactured by a silicon photonics CMOS compatible process.
- a silicon photonics CMOS compatible process By using a silicon photonics CMOS compatible process, a photonic crystal slow light waveguide can be formed. According to this slow light waveguide, a large change can be given to the propagation constant ⁇ in a certain wavelength range due to a change in wavelength or a change in refractive index by external control.
- the refractive index can be changed by various configurations such as a configuration in which a heater is formed on or in the cladding along the slow light waveguide without being hidden, and a configuration in which a pn junction is formed in the Si slab. This refractive index changing structure has been demonstrated in a photonic crystal modulator.
- the slow light waveguide can be connected to the Si wire waveguide with a low loss of 1 dB or less, and the Si wire waveguide is optically connected to the external optical fiber with a loss of about 1.5 dB via a spot size converter. can do.
- ⁇ ⁇ ⁇ ⁇ Prepare a fiber output laser light source outside.
- the optical output can be increased in advance by a semiconductor optical amplifier or an erbium-doped optical fiber amplifier.
- the input-resistant continuous power of the spot size converter is about 200 mW, and when it is desired to input a higher power, an optical pulse is used. If it is a sufficiently narrow pulse, it is possible to input even with a peak power of 50 W or more.
- a GaInAsP semiconductor is pasted in the middle of the Si wire waveguide, and the propagating light is coupled to the semiconductor. It is possible to use a configuration that operates as an optical amplifier and increases the optical power inside.
- the switching mechanism for a large number of waveguides includes a 1 ⁇ N changeover switch in which Mach-Zehnder type optical switches are cascade-connected, a coupled microring resonator type wavelength demultiplexer, an arrayed waveguide diffraction grating, and a grating wavelength demultiplexer Etc. can be used.
- Si photonic crystal slow light waveguide using CMOS compatible process refractive index change by heater and pn junction, light beam formation by diffraction grating directly formed on Si, and change of beam angle with wavelength have been proven.
- the light used is not limited to near-infrared light, but the device is made of a Si-related material that is transparent to visible light, such as SiN. There are applications to readers.
- the optical deflection device of the present invention is a laser radar (LIDER) installed in automobiles, drones, robots, etc., 3D scanners for monitoring the surrounding environment easily installed on personal computers and smartphones, surveillance systems, optical exchanges and data centers. It can be applied to a space matrix optical switch.
- LIDER laser radar
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Abstract
Description
(1) 光が伝搬する光伝搬部を、シリコン等の高屈折率媒質を有する光導波層上に形成される微細構造とする構成
(2) 光伝搬部を構成する微細構造を、スローライトを発現する周期構造と、光を放射する周期構造の2つの周期構造とする構成
を備える。
(a) シリコンの第1の屈折率媒質に第2の低屈折率媒質を周期aで備え、周期方向の少なくとも一端を入射端とする光導波部を構成する第1の周期構造
(b) 第1の屈折率媒質に第2の屈折率媒質を第1の周期構造の周期aよりも長い周期Λ(a<Λ<2a)で備え、周期方向の側端を出射端とする出射部を構成する第2の周期構造
を備え、
(c) 第2の周期構造の配置位置は、第1の周期構造の光導波部を伝搬する光の強度分布の周辺部(尾部)である構成
(d) 周期aはa=λ/2nである(nは第1の周期構造の光導波部を伝搬する光の等価屈折率、λはブラッグ波長付近の波長)構成
を備える。
2重周期構造の他の構成例は、フォトニック結晶の面内に、導波路に沿って2種類の異なる直径の円孔を繰り返す二重周期構造である。この二重周期構造は、大径の円孔を繰り返す周期構造と、小径の円孔を繰り返す周期構造とを備え、基準の円孔の直径を2r、直径の相違幅を2Δrとしたとき、大径の円孔の直径は2(r+Δr)であり、小径の円孔の直径は2(r-Δr)である。
出射ビームの出射角度θの変化において、出射角度θの感度は光の波長λや第1の周期構造を構成する屈折率媒質の屈折率nと関連して変化し、わずかな波長変化や屈折率変化によって出射角度θは大きく変化する。
出射部から拡散する出射ビームの出射角度を一方向に揃える光学系(シリンドリカルレンズ)を、出射部の出射方向の前方に備える。この光学系によって、出射部から拡散する周期ビームの広がりを一方向に揃えて、出射ビームのビーム品質を向上させることができる。
光導波部の両端に、光路切替スイッチ光路を介して2つの光路を切り替え自在に接続する。光路切替スイッチ光路によって2つの光路に入射光を切り替えて入射し、光偏向デバイスの光導波部の両端から入射光を切り替えて入射する。出射角度θは伝搬定数βの向きによっても変わるため、光路切替スイッチを使って第1の周期構造の光導波部に入射する光の向きを変えることによって、出射角度θの角度範囲を広げる。
本願発明の光偏向デバイスは、出射ビームの角度変化の方向を一方向で行う1次元ビーム掃引に適用する他、出射ビームの角度変化の方向を異なる二方向で行う2次元ビーム掃引に適用することができる。
本願発明の光偏向デバイスは、出射光が反射して戻る反射光を受光することができ、反射光を用いた装置に適用することができる。反射光を利用するライダー装置は、光偏向デバイスと、光偏向デバイスにパルス光を入射するパルス光源と、光偏向デバイスで受けた光を検出する光検出部とを備えた構成とすることができる。光偏向デバイスは、出射光の出射とこの出射光に起因する反射光の入射の2方向で光を入出力する。ライダー装置では、出射光の出射と反射光の入射とを、一つの光偏向デバイスで行うことができる。ライダー装置は、光偏向デバイスに向かうパルス光と光偏向デバイスで受けた光とを切り替える切替部を備える構成としてもよい。
・光偏向デバイスの構成
図1は光偏向デバイスの構成を説明するための概略図である。図1(a)は概略構成を説明するための図であり、図1(b)は光偏向デバイスの周期構造の概略を説明するための図である。
次に、スローライトによる出射角度θの制御について説明する。
・出射角度の変化
群速度が小さい光であるスローライトの伝搬定数βは光の波長λや第1の周期構造を構成する屈折率媒質の屈折率nに依存して変化する。このスローライト光が第2の周期構造に結合すると、伝搬定数βがβN=β-(2π/Λ)Nに変換される。ここでNは整数である。
θ=sin-1(βN/k0)=sin-1nN …(1)
となる。ここでnN=βN/k0としている。
β-(2π/Λ)N≦k0 …(2)
波長λに対する出射角度θの感度は以下の式(3)で表される。
dθ/dλ=(βN+λdβ/dλ)/[2π√{1-(βN/k0)2}]
=(nN+ng)/[λ√(1-nN 2)] …(3)
ここで、ngはスローライト導波路の群屈折率(群速度の低下率)である。
ng=c・dβ/dω=(λ2/2π)・dβ/dλ
で与えられるが、スローライト導波路ではngが数十以上の大きな値である。
屈折率nに対する出射角度θの感度は以下の式(5)で表される。
dθ/dn=*(ng/n)/[√(1-nN 2)]・(dλ/dn)/(λ/n)
=*ng/[n√(1-nN 2)] …(5)
図3,図4は、本願発明の光偏向デバイスの出射角度を制御する構成を説明するための図である。
次に、フォトニック結晶によるスローライト構造について、スローライト導波路及び回折格子の構成例を図5~7を用いて説明する。なお、ここでは、第1の屈折率媒質を高屈折率媒質とし、第2の屈折率媒質を低屈折率媒質とする例を示している。
スローライトを発生させる第1の周期構造の例として、フォトニック結晶導波路が考えられる。図5(a)~図5(c)はフォトニック結晶導波路による第1の周期構造例を示し、図5(a),5(b)は1次元のフォトニック結晶導波路を示し、図5(c)は2次元のフォトニック結晶導波路を示している。
以下、周期構造によるスローライトの放射条件について説明する。図6(a)は第1の周期構造による放射条件を説明するための図であり、第1の周期構造のみのフォトニックバンドを示している。
第2の周期構造の周期Λは様々な値を取り得るが、典型例はΛ=2aである。図6(b)は第2の周期構造の周期Λが2aであるときのフォトニックバンドを示している。この周期構造では、第2の周期構造がもつ波数ベクトル2π/Λによるバンドシフトによって、導波路モードの波数は、空気への放射モード領域の放射条件に変換され、進行方向と同じ方向の斜め上方に放射される光に変換される。
放射条件を満たさないため、光は放射されない。
(b) a<Λ<2aの範囲:
斜めの方に放射される。
(b1) Λ<4a/3の場合:
図7(a)はΛ<4a/3の場合を示している。この周期Λでは、一部の波長は空気への放射条件を満たさなくなる。
(b2) Λ=*4a/3の場合:
図7(b)はΛ=*4a/3の場合を示している。この周期Λでは、全てのスローライトモードが空気への放射条件に入り、複数の放射は起こらない。スローライトモードは負方向の放射条件の縁にあるので、放射は進行方向とは逆方向の水平近い角度で偏向される。
(b3) 4a/3<Λ<2aの場合:
図7(c)は4a/3<Λ<2aの場合を示している。この周期Λでは、複数の放射が起こる。
(b4) Λ=2aの場合:
図7(d)はΛ=2aの場合を示している。この周期Λでは、再びスローライトモードが全て放射条件となり、かつ複数の放射は起こらない。
(b5) Λ>2aの場合:
図7(e)はΛ>2aの場合を示している。この周期Λでは、フォトニックバンドの折り返し回数が多くなるので、放射条件が多数現れる。
Λ=*4a/3、又はΛ=2aの条件を満たすものが好適である。
次に、波長λや屈折率nが十分に変えられる状況で得られる最大の偏向角について説明する。
β=(2π/a)N-0.25nc(2π/a)~(2π/a)N-0.50(2π/a)
=*(4N-nc)k0~(4N-2)k0 …(6)
ここで、ncは放射条件を決める上下クラッドの屈折率である.
Λ=2aの場合には、スローライトのβは2π/Λ=2π/2a=*2k0によって波数変換されるので、以下の式(7)で表される。
βN=*(4N-nc)k0~(4N-4)k0 …(7)
β1=*(2-NC)k0~0 …(8)
nN=n1=β1/k0=*(2-nc)~0 …(9)
θ=sin-1n1=sin-1(2-nc)~0 …(10)
Λ=4a/3の場合には、スローライトのβが2π/Λ=3π/2a=*3k0によって波数変換されるので、以下の式(11)で表される。
βN=*(4N―3―nc)k0~(4N-5)k0 …(11)
β1=*-(nc-1)k0~-k0 …(12)
nN=n1=β1/k0=*-(nc-1)~-1 …(13)
θ=sin-1n1=sin-1[-(nc-1)]~-1 …(14)
空気クラッドではθ=0°~-90°となり、シリカクラッドではθ=-27°~-90°となる。
スローライトの伝搬条件を満たす波長範囲は、フォトニック結晶導波路がエアブリッジ構造の場合にはλ=*1550nm付近で35nm程度の範囲であり、シリカクラッドの場合では15nm程度である。これらの範囲において、前記したような最大のビーム偏向が得られる。
a/λ=*0.258
β=0.55(2π/a)~0.63(2π/a)=*2.13k0~2.44k0
で計算される。
n1=-0.87~-0.56
θ=-60°~-34°
π/Λ=(2π/λ)(λ/a)(a/Λ)=2.13+1
によって波数変換され、屈折率n1及び出射角度θは以下の値となる。
n1=-1~-0.69
θ=-90°~-44°
この場合、波長1550nm付近で10nmの範囲で波長変化させるだけで偏向角90-44=46°の範囲を実現することができる。
次に、図10を用いて回折格子の構成例について説明する。
第2の周期構造による出射部3を構成する回折格子は,表面回折格子のほかに、他の構造とすることができる。
光偏向デバイス1は、Si等の半導体などの高屈折率媒質からなるスラブに、SiO2等の低屈折率媒質の円孔3b,3cを2次元周期的に例えば三角格子配列で配列し、一部の配列の円孔を取り除いた構成であり、円孔を取り除いた部分は2次元フォトニック結晶による導波部を構成すると共に、放射光ビームを放射する出射部を構成する。
以下、出射ビームの偏向角を調整する構成について、図13,14を用いて説明する。
図13は光偏向デバイスに対する入射光の入射方向を切り替えることによって偏向角の範囲を拡大する構成例を示している。
図14は光偏向デバイスから出射される光の広がりを光学系レンズを介して抑制する構成を示している。
以下、出射ビームを2次元的に掃引する構成について、図15,16を用いて説明する。
図15はスローライト導波路のアレイ構成とシリンドリカルレンズとの組み合わせによって、2次元的なビーム掃引を行う構成例を示している。
上記した光ビームを放射する光偏向デバイスは、反射光を用いた装置に適用することができる。図17は光偏向デバイスの反射光を用いた装置への適用を説明するための図である。
1a,1b 光偏向デバイス
2 光導波部
2A 1次元フォトニック結晶導波路
2B 1次元フォトニック結晶導波路
2C~2H 2次元フォトニック結晶導波路
2a スローライト導波路
2b 上部クラッド
2c 下部クラッド
3 出射部
3B エアブリッジ型回折格子
3C エアブリッジ型回折格子
3D~3J 回折格子
3a 表面回折格子
3b,3c 円孔
4 波長制御部
5 屈折率制御部
6 出射角度制御部
7,7a,7b スイッチ
8a~8f 光路
9,9a シリンドリカルレンズ
9b プラスチックモールド
10 入射導波路
11 切り替え部
12 位相調整器
13 アレイ集積
14 パワー分配器
15 アレイ集積
21 高屈折率媒質
22 低屈折率媒質
23 屈折率変更部
31 高屈折率媒質
32 低屈折率媒質
33 屈折率変更部
40 高屈折率基板
41 基板
42 反射鏡
50 パルス光源
60 光検出部
70 光フィルタ
80 入射導波路
90 光スイッチ
100 ライダー装置
Claims (21)
- 屈折率の周期構造を備えたシリコンフォトニクスデバイスであり、
前記周期構造は、
シリコン基材の第1の屈折率媒質に、周期aで屈折率を異にする第2の屈折率媒質を備え、周期方向の少なくとも一端を入射端とする光導波部を構成する第1の周期構造と、
第1の屈折率媒質に、前記第1の周期構造の周期aよりも長い周期Λ(a<Λ<2a)で屈折率を異にする第2の屈折率媒質を備え、周期方向の側端を出射端とする出射部を構成する第2の周期構造とを備え、
前記第2の周期構造の配置位置は、前記第1の周期構造の光導波部を伝搬する光の強度分布の周辺部であり、
前記周期aはa=λ/2n(nは第1の周期構造の光導波部の伝搬光の等価屈折率、λはブラッグ波長付近の波長)であることを特徴とする、光偏向デバイス。 - 前記第1の周期構造及び前記第2の周期構造において、第1の周期構造の刻みは第2の周期構造の刻みよりも大きいことを特徴とする、請求項1に記載の光偏向デバイス。
- 前記第1の周期構造の光導波部はスローライト導波路であり、
前記第2の周期構造の出射部は回折格子であることを特徴とする、請求項1又は2に記載の光偏向デバイス。 - 前記スローライト導波路はフォトニック結晶の周期構造で構成されるフォトニック結晶導波路であることを特徴とする請求項3に記載の光偏向デバイス。
- 前記フォトニック結晶導波路は、
シリコン基板上のクラッドとの間に空気層を備えるエアブリッジ型スローライト導波路、
又は、
クラッド内に埋め込まれるクラッド埋込型スローライト導波路であることを特徴とする請求項4に記載の光偏向デバイス。 - 前記回折格子は、屈折率媒質に周期的に設けた凹凸構造、又はフォトニック結晶の周期構造で構成されることを特徴とする請求項3に記載の光偏向デバイス。
- 前記回折格子は、
前記エアブリッジ型スローライト導波路の間、又はクラッド埋込型スローライト導波路のクラッドとの間に、空気層を備えるエアブリッジ型回折格子、
又は、
前記クラッド埋込型スローライト導波路を埋め込むクラッドにおいて、上クラッドの上部、上クラッド、あるいは下クラッドのクラッド内に埋め込まれる埋込型回折格子、
又は、
シリコン基板に形成した回折格子の何れか一つであることを特徴とする、請求項6に記載の光偏向デバイス。 - 前記回折格子は、
前記フォトニック結晶導波路の両側、
又は、
前記フォトニック結晶導波路の上部表面に設けることを特徴とする、請求項4に記載の光偏向デバイス。 - 前記フォトニック結晶導波路は、フォトニック結晶の周期構造を短周期と長周期構造の2種類の周期を備える2重周期構造を備え、
短周期の周期構造は第1の周期構造のスローライト導波路を構成し、
長周期の周期構造は第2の周期構造の回折格子を構成することを特徴とする、請求項4に記載の光偏向デバイス。 - 前記第1の周期構造は、直線状の周期構造を有する1次元フォトニック結晶導波路、又は、平面状の周期構造に直線欠陥部を有する2次元フォトニック結晶導波路であることを特徴とする、請求項1から9に記載の光偏向デバイス。
- 前記第2の周期構造の下方の基板側に、前記出射部から出射した出射光を反射する反射部を備えることを特徴とする、請求項1から10に記載の光偏向デバイス。
- フォトニック結晶の面内に、導波路に沿って2種類の異なる直径の円孔を繰り返す二重周期構造を備えた光偏向デバイス。
- 前記二重周期構造は、大径の円孔を繰り返す周期構造と、小径の円孔を繰り返す周期構造とを備え、
基準の円孔の直径を2r、直径の相違幅を2Δrとしたとき、
大径の円孔の直径は2(r+Δr)であり、
小径の円孔の直径は2(r-Δr)であることを特徴とする請求項12に記載の光偏向デバイス。 - 入射光の波長変更を制御する波長制御部、及び/又は、第1の周期構造及び/又は第2の周期構造の屈折率変更を制御する屈折率制御部を備え、
前記波長制御部による入射光の波長変更、及び/又は、前記屈折率制御部による周期構造内の屈折率媒質の屈折率変更によって、出射ビームの出射角度を変更することを特徴とする、請求項1から13に記載の光偏向デバイス。 - 前記波長制御部の波長変更及び/又は前記屈折率制御部の屈折率変更を制御する制御部を備え、
前記制御部は波長変更及び/又は屈折率変更の時間制御による出射角度の逐次変更により、1次元ビーム掃引することを特徴とする、請求項14に記載の光偏向デバイス。 - 前記出射部から拡散する出射ビームの出射角度を一方向に揃える光学系を備えることを特徴とする、請求項1から15の何れか一つに記載の光偏向デバイス。
- 前記光学系は、前記出射部の出射側に配置されるシリンドリカルレンズ、又は前記出射部の出射側に出射方向に順に配置されるマイクロレンズアレイ及びシリンドリカルレンズであることを特徴とする、請求項16に記載の光偏向デバイス。
- 前記光導波部の両端に対して、入射光を入射する光路を切り替える光路切替スイッチを備えることを特徴とする、請求項1から17に記載の光偏向デバイス。
- 複数の前記光導波部の平行配置で構成されるアレイ構成と、
前記複数の光導波部の少なくとも何れか一つに入射光を切り替えて入射する入射光切替スイッチとを備え、
前記出射部の方向に依存する第1の出射方向のビーム掃引と、前記入射光切替スイッチによる光導波部の選択に依存する第2の出射方向のビーム掃引とにより2次元ビーム掃引することを特徴とする、請求項16又は17に記載の光偏向デバイス。 - 複数の前記光導波部の平行配置で構成されるアレイ構成と、
前記複数の光導波部に位相調整した入射光を入射する位相調整器とからなる位相アレイを備え、
前記位相調整器の位相調整によって2次元掃引することを特徴とする、請求項15に記載の光偏向デバイス。 - 請求項1から20の何れかに記載の光偏向デバイスと、
前記光偏向デバイスにパルス光を入射するパルス光源と、
前記光偏向デバイスで受けた光を検出する光検出部と、
を備えたライダー装置。
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