WO2017041312A1 - 一种彩膜基板及其制造方法 - Google Patents

一种彩膜基板及其制造方法 Download PDF

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Publication number
WO2017041312A1
WO2017041312A1 PCT/CN2015/089530 CN2015089530W WO2017041312A1 WO 2017041312 A1 WO2017041312 A1 WO 2017041312A1 CN 2015089530 W CN2015089530 W CN 2015089530W WO 2017041312 A1 WO2017041312 A1 WO 2017041312A1
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WIPO (PCT)
Prior art keywords
layer
color resist
resist layer
light shielding
color
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PCT/CN2015/089530
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English (en)
French (fr)
Inventor
许勇
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深圳市华星光电技术有限公司
武汉华星光电技术有限公司
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Priority to US14/891,391 priority Critical patent/US20170068024A1/en
Publication of WO2017041312A1 publication Critical patent/WO2017041312A1/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Definitions

  • the present invention relates to the field of liquid crystal display technologies, and in particular, to a color film substrate and a method of fabricating the same.
  • the prior art method of forming a black matrix on a glass substrate not only increases the number of masks of the color film substrate manufacturing process, but also uses a material for manufacturing a black matrix, which makes the manufacturing process more complicated, and the black matrix The shading effect is not very good, and a small range of light leakage often occurs. This problem of the prior art is urgently needed to be solved.
  • the present invention also provides a method of manufacturing a color filter substrate, which can reduce the number of mask paths for manufacturing a color filter substrate.
  • a color film substrate comprising:
  • the glass substrate is provided with a light-shielding region and a light-transmitting region, and the color filter layer includes a first color resist layer, a second color resist layer, a third color resist layer, and a first light-shielding layer formed on the glass substrate.
  • the first light shielding layer covers the light shielding region
  • the second light shielding layer covers the first light shielding layer
  • the first light shielding layer and the second light shielding layer Forming an overlapping light shielding layer
  • the overlapping light shielding layer is used for light shielding
  • the first color resist layer, the second color resist layer and the third color resist layer cover the light transmissive area, the first color resist
  • the layer, the second color resist layer and the third color resist layer do not overlap each other, and the light blocking region is the first color resist layer, the second color resist layer and the third color a region between two adjacent layers of the resist layer, the light transmissive region being a region outside the light shielding region, a material of the first light shielding layer or the second light shielding layer and the first color resist layer
  • the one of the second color resist layer and the third color resist layer is made of the same material, and the first Light building material layer and the second light-shielding layer made of a material different.
  • the colors of the first color resist layer, the second color resist layer and the third color resist layer are different from each other, and their colors are respectively one of red, green and blue. .
  • the first color resist layer, the second color resist layer and the second color resist layer have the same thickness
  • the other one of the color resist layers has a thickness greater than two of the same thickness The thickness of each color resist layer.
  • the thickness of the two color resist layers having the same thickness and thickness of the first light shielding layer is the same, and the sum of the thickness of the first light shielding layer and the thickness of the second light shielding layer is equal to the color having a larger thickness The thickness of the resist layer.
  • a spacer is formed on the flat layer, and the spacer stands at a corresponding portion of the light shielding region.
  • a method of manufacturing a color film substrate comprising:
  • first color resist layer Forming a first color resist layer, a second color resist layer and a third color resist layer on the glass substrate, and the first color resist layer, the second color resist layer and the third color resist layer cover a light transmissive area of the glass substrate;
  • a portion of the first color resist layer or the second color resist layer covers the a first light shielding layer is formed on the light shielding region of the glass substrate, and a portion of the third color resist layer covers the first light shielding layer to form a second light shielding layer when the third color resist layer is formed.
  • the region is a region between the first color resist layer, the second color resist layer and the third color resist layer adjacent to each other, and the light transmissive region is an area outside the light shielding region.
  • the colors of the first color resist layer, the second color resist layer and the third color resist layer are different from each other, and their colors are one of red, green and blue, respectively.
  • the method further includes: forming a flat layer on the glass substrate, the flat layer covering the first color resist layer, the second color resist layer, the third color resist layer, the first a light shielding layer and the second light shielding layer.
  • the first color resist layer, the second color resist layer and the second color resist layer have the same thickness
  • the other one of the color resist layers has a thickness greater than two of the same thickness The thickness of each color resist layer.
  • the thickness of the two color resist layers having the same thickness and thickness of the first light shielding layer is the same, and the sum of the thickness of the first light shielding layer and the thickness of the second light shielding layer is equal to the color having a larger thickness The thickness of the resist layer.
  • the method further includes forming a gasket on the flat layer, the gasket standing at a corresponding portion of the light shielding region.
  • a color film substrate comprising:
  • the glass substrate is provided with a light-shielding region and a light-transmitting region, and the color filter layer includes a first color resist layer, a second color resist layer, a third color resist layer, and a first light-shielding layer formed on the glass substrate.
  • the first light shielding layer covers the light shielding region
  • the second light shielding layer covers the first light shielding layer
  • the first light shielding layer and the second light shielding layer Forming an overlapping light shielding layer
  • the overlapping light shielding layer is used for light shielding
  • the first color resist layer, the second color resist layer and the third color resist layer cover the light transmissive area, the first color resist
  • the layer, the second color resist layer and the third color resist layer do not overlap each other
  • the light blocking region is the first color resist layer, the second color resist layer and the third color A region between two adjacent layers of the resist layer, the light transmissive region being a region outside the light shielding region.
  • the material of the first light shielding layer or the second light shielding layer and the color resistance of one of the first color resist layer, the second color resist layer and the third color resist layer are made of the same material, and the material of the first light shielding layer is different from the material of the second light shielding layer.
  • the colors of the first color resist layer, the second color resist layer and the third color resist layer are different from each other, and their colors are respectively one of red, green and blue.
  • the first color resist layer, the second color resist layer and the second color resist layer have the same thickness of the two color resist layers, and the other one of the color resist layers has a thickness greater than two of the same thickness The thickness of the color resist layer.
  • the thickness of the first light shielding layer and the thickness of the two color resist layers are the same, and the sum of the thickness of the first light shielding layer and the thickness of the second light shielding layer is equal to the color resistance of the thick thickness.
  • the thickness of the layer is the same, and the sum of the thickness of the first light shielding layer and the thickness of the second light shielding layer is equal to the color resistance of the thick thickness. The thickness of the layer.
  • a spacer is formed on the flat layer, and the spacer stands at a corresponding portion of the light shielding region.
  • a method of manufacturing a color film substrate comprising:
  • first color resist layer Forming a first color resist layer, a second color resist layer and a third color resist layer on the glass substrate, and the first color resist layer, the second color resist layer and the third color resist layer cover a light transmissive area of the glass substrate;
  • a portion of the first color resist layer or the second color resist layer covers the a first light shielding layer is formed on the light shielding region of the glass substrate, and a portion of the third color resist layer covers the first light shielding layer to form a second light shielding layer when the third color resist layer is formed.
  • the region is a region between the first color resist layer, the second color resist layer and the third color resist layer adjacent to each other, and the light transmitting region is a region outside the light shielding region.
  • the colors of the first color resist layer, the second color resist layer and the third color resist layer are different from each other, and their colors are respectively one of red, green and blue.
  • the method further includes: forming a flat layer on the glass substrate, the flat layer covering the first color resist layer, the second color resist layer, the third color resist layer, the first shading a layer and the second light shielding layer.
  • the method further includes forming a gasket on the flat layer, the gasket standing at a corresponding portion of the light shielding region.
  • a color film substrate of the present invention adopts a structure in which two color resist layers of different colors are superimposed, which can replace the black matrix and have a light shielding effect.
  • a method for manufacturing a color filter substrate according to the present invention which eliminates the manufacture of a black matrix, can reduce the number of masks for manufacturing a color filter substrate, and at the same time, also provides a good light shielding effect.
  • FIG. 1 is a schematic cross-sectional structural view of a color filter substrate of the present invention
  • FIG. 2 is a flow chart showing a method of manufacturing a color filter substrate of the present invention.
  • FIG. 1 is a schematic cross-sectional view of a color filter substrate according to the present invention.
  • a color filter substrate of the present embodiment includes a glass substrate 1 formed on the glass substrate 1. a color filter layer thereon, and a flat layer 7 formed on the color filter layer.
  • the glass substrate 1 is provided with a light-shielding region and a light-transmitting region, and the color filter layer includes a first color resist layer 2, a second color resist layer 3, and a third color resist formed on the glass substrate 1.
  • the first light shielding layer 5 and the second light shielding layer 6 form an overlapping light shielding layer, the overlapping light shielding layer is used for light shielding, and the first color resist layer 2, the second color resist layer 3 and the third color
  • the resist layer 4 covers the light-transmitting region, and the first color resist layer 2, the second color resist layer 3, and the third color resist layer 4 do not overlap each other, and the light-shielding region is the
  • the first color resist layer 2, the second color resist layer 3 and the third color resist layer 4 are adjacent to each other, and the light transmitting region is
  • the material of the first light shielding layer 5 or the second light shielding layer 6 and the first color resist layer 2, the second color resist layer 3, and the third color resist layer 4 are preferably One of the color resist layers is made of the same material, and the material of the first light shielding layer 5 is different from the material of the second light shielding layer 6.
  • the colors of the first color resist layer 2, the second color resist layer 3, and the third color resist layer 4 are different from each other, and their colors are red, green, and blue, respectively. One of them.
  • the first color resist layer 2, the second color resist layer 3 and the second color resist layer 4 have the same thickness of the two color resist layers, and the thickness of the other color resist layer is greater than the thickness. The thickness of the same two color resist layers.
  • the thickness of the two color resist layers having the same thickness and thickness of the first light shielding layer 5 is the same, and the sum of the thickness of the first light shielding layer 5 and the thickness of the second light shielding layer 6 is equal to the thickness.
  • the thickness of the larger color resist layer is the same, and the sum of the thickness of the first light shielding layer 5 and the thickness of the second light shielding layer 6 is equal to the thickness. The thickness of the larger color resist layer.
  • the first color resist layer 2 and the second color resist layer 3 have the same thickness
  • the third color resist is The thickness of the layer 4 is greater than the thickness of the first color resist layer 2, and it is also preferable that the thickness of the second light shielding layer 6 is smaller than the thickness of the first light shielding layer 5, and the thickness of the first light shielding layer 5 is added
  • the thickness of the second light shielding layer 6 is equal to the thickness of the third color resist layer 4.
  • the flat layer 7 further has a spacer 8 standing on the corresponding portion of the light shielding region.
  • the spacer 8 of the present embodiment is further divided into a support pad 8 and a pressure-proof pad 8 to protect the color filter substrate in all directions.
  • the shading principle of the present invention is as follows:
  • the first light shielding layer 5 can only transmit red light and absorb green and blue light. At this time, the red light passing through the first light shielding layer 5 is directed toward the second light shielding layer 6. Since the color of the second light shielding layer 6 is blue, the second light shielding layer 6 will take a photo. The red light is absorbed by the red light, so that the overlapping light shielding layer composed of the first light shielding layer 5 and the second light shielding layer 6 can well prevent light leakage of the color filter substrate.
  • first color resist layer 2 Forming a first color resist layer 2, a second color resist layer 3 and a third color resist layer 4 on the glass substrate, and the first color resist layer 2, the second color resist layer 3 and the third
  • the color resist layer 4 covers the light transmitting region of the glass substrate 1.
  • one of the first color resist layer 2 or the second color resist layer 3 is in the color resist layer Forming a first light shielding layer 5 on a portion of the light shielding region of the glass substrate 1 , and forming a portion of the third color resist layer 4 over the first light shielding layer 5 when the third color resist layer 4 is formed Forming a second light shielding layer 6 on the region between the first color resist layer 2, the second color resist layer 3 and the third color resist layer 4 adjacent to each other,
  • the light transmitting region is a region outside the light shielding region.
  • the colors of the first color resist layer 2, the second color resist layer 3, and the third color resist layer 4 are different from each other, and their colors are respectively one of red, green, and blue.
  • the step further includes forming a flat layer 7 on the glass substrate 1, the flat layer 7 covering the first color resist layer 2, the second color resist layer 3, and the third layer.
  • the step includes forming a spacer 8 on the flat layer 7, the spacer 8 standing at a corresponding portion of the light-shielding region.
  • the present embodiment assumes that a portion of the first color resist layer 2 forms the first light shielding layer 5 on the light shielding region when the first color resist layer 2 is formed, as shown in FIG.
  • the method of the embodiment includes the following steps:
  • Step S101 forming the first color resist layer 2 on the glass substrate 1, and a portion of the first color resist layer 2 is formed on the light shielding region.
  • Step S102 forming a second color resist layer 3 on the glass substrate 1, and the second color resist layer 3 does not overlap with the first color resist layer 2 and the first light shielding layer 5.
  • the second color resist layer 3 does not overlap with the first color resist layer 2 and the first light shielding layer 5, which not only saves the use material of the second color resist layer 3, but also reduces The work of patterning.
  • Step S103 forming a third color resist layer 4 on the glass substrate 1, and a portion of the third color resist layer 4 covers the first light shielding layer 5 on the light shielding region to form a second light shielding layer. 6.
  • the first light shielding layer 5 is at a lower position, that is, the first light shielding layer 5 and the The glass substrates 1 are connected, and the second light shielding layer 6 covers the upper surface of the first light shielding layer 5.
  • Step S104 forming a flat layer 5 on the glass substrate 1, the flat layer 5 covering the first color resist layer 2, the second color resist layer 3, and the third color resist layer 4. This step is to flatten the surface of the color filter layer because the overlapping color resist layer of the first color resist layer 2 and the third color resist layer 4 in the light shielding region causes the surface of the color filter layer Uneven.

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  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
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Abstract

一种彩膜基板，包括一玻璃基板（1）、彩色滤光层及一平坦层（7），彩色滤光层包括三个色阻层（2,3,4）和两个遮光层（5,6），且两个遮光层（5,6）在遮光区域重叠。还提供了一种彩膜基板的制造方法，包括在玻璃基板上依次形成三个色阻层（2,3,4），其中第一（2）或第二色阻层（3）中的一个色阻层的一部分形成第一遮光层（5），第三色阻层（4）的一部分形成第二遮光层（6）。

Description

一种彩膜基板及其制造方法 技术领域
本发明涉及液晶显示屏技术领域，特别涉及一种彩膜基板及其制造方法。
 背景技术
随着时代的发展，液晶显示技术的发展也越来越快，具有高迁移率，高开口率的多晶硅技术逐渐取代了传统的非晶硅技术，受到大家的普遍欢迎。但是多晶硅技术的制程非常复杂，生产起来比较困难。比如现有技术的液晶显示面板的彩膜基板的生产就比较复杂，需要光罩的道数较多，这是因为现有技术的这种彩膜基板需要先在玻璃基板上形成一层黑色矩阵来遮光，不然就会使得不同色阻之间的衔接处即遮光区域出现漏光现象，降低液晶显示面板的显示效果。但是现有技术的这种先在玻璃基板上形成黑色矩阵的做法，不仅增加了彩膜基板制造工艺的光罩道数，多使用了制造黑色矩阵的材料，使得制造工艺比较复杂，而且黑色矩阵的遮光效果也不是很好，常常出现小范围的漏光现象。现有技术的这种问题急需解决。
 技术问题
本发明的目的在于提供一种彩膜基板，该彩膜基板的结构可以替代黑色矩阵，起到遮光的效果。本发明还提供了一种彩膜基板的制造方法，该制造方法可以减少制造彩膜基板的光罩道数。
 技术解决方案
本发明的技术方案如下：
一种彩膜基板，其包括：
一玻璃基板；
彩色滤光层，形成于所述玻璃基板上；以及
一平坦层，形成于所述彩色滤光层上；
其中所述玻璃基板设有遮光区域与透光区域，所述彩色滤光层包括形成于所述玻璃基板上的第一色阻层、第二色阻层、第三色阻层、第一遮光层以及第二遮光层，所述第一遮光层覆盖在所述遮光区域上，所述第二遮光层覆盖在所述第一遮光层上，所述第一遮光层与所述第二遮光层形成重叠遮光层，所述重叠遮光层用于遮光，所述第一色阻层、所述第二色阻层与所述第三色阻层覆盖所述透光区域，所述第一色阻层、所述第二色阻层以及所述第三色阻层相互之间均不重叠，所述遮光区域为所述第一色阻层、所述第二色阻层与所述第三色阻层两两相邻之间的区域，所述透光区域为所述遮光区域之外的区域，所述第一遮光层或所述第二遮光层的制作材料与所述第一色阻层、所述第二色阻层及所述第三色阻层中的一个所述色阻层的制作材料相同，且所述第一遮光层的制作材料与所述第二遮光层的制作材料不同。
优选地，其中所述第一色阻层、所述第二色阻层及所述第三色阻层的颜色两两不相同，且它们的颜色分别为红色、绿色与蓝色中的一种。
优选地，其中所述第一色阻层、所述第二色阻层与所述第三色阻层的其中两个色阻层的厚度相同，其余一个色阻层的厚度大于厚度相同的两个色阻层的厚度。
优选地，其中所述第一遮光层的厚度与厚度相同的两个色阻层的厚度相同，所述第一遮光层的厚度与所述第二遮光层的厚度之和等于厚度较大的色阻层的厚度。
优选地，其中在所述平坦层上形成有衬垫，所述衬垫立于所述遮光区域对应处。
一种彩膜基板的制造方法， 其包括：
在玻璃基板上依次形成第一色阻层、第二色阻层与第三色阻层，且所述第一色阻层、所述第二色阻层与所述第三色阻层覆盖所述玻璃基板的透光区域；
其中在形成所述第一色阻层与形成所述第二色阻层时，所述第一色阻层或所述第二色阻层中的一个所述色阻层的一部分覆盖在所述玻璃基板的遮光区域上形成第一遮光层，在形成所述第三色阻层时，所述第三色阻层的一部分覆盖在所述第一遮光层上形成第二遮光层，所述遮光区域为所述第一色阻层、所述第二色阻层与所述第三色阻层两两相邻之间的区域，所述透光区域为所述遮光区域之外的区域，所述第一色阻层、第二色阻层及第三色阻层的颜色两两不相同，且它们的颜色分别为红色、绿色与蓝色中的一种。
优选地，其还包括：在所述玻璃基板上形成平坦层，所述平坦层覆盖所述第一色阻层、所述第二色阻层、所述第三色阻层、所述第一遮光层及所述第二遮光层。
优选地，其中所述第一色阻层、所述第二色阻层与所述第三色阻层的其中两个色阻层的厚度相同，其余一个色阻层的厚度大于厚度相同的两个色阻层的厚度。
优选地，其中所述第一遮光层的厚度与厚度相同的两个色阻层的厚度相同，所述第一遮光层的厚度与所述第二遮光层的厚度之和等于厚度较大的色阻层的厚度。
优选地，其中还包括，在所述平坦层上形成衬垫，所述衬垫立于所述遮光区域对应处。
一种彩膜基板，包括：
一玻璃基板；
彩色滤光层，形成于所述玻璃基板上；以及
一平坦层，形成于所述彩色滤光层上；
其中所述玻璃基板设有遮光区域与透光区域，所述彩色滤光层包括形成于所述玻璃基板上的第一色阻层、第二色阻层、第三色阻层、第一遮光层以及第二遮光层，所述第一遮光层覆盖在所述遮光区域上，所述第二遮光层覆盖在所述第一遮光层上，所述第一遮光层与所述第二遮光层形成重叠遮光层，所述重叠遮光层用于遮光，所述第一色阻层、所述第二色阻层与所述第三色阻层覆盖所述透光区域，所述第一色阻层、所述第二色阻层以及所述第三色阻层相互之间均不重叠，所述遮光区域为所述第一色阻层、所述第二色阻层与所述第三色阻层两两相邻之间的区域，所述透光区域为所述遮光区域之外的区域。
优选地，所述第一遮光层或所述第二遮光层的制作材料与所述第一色阻层、所述第二色阻层及所述第三色阻层中的一个所述色阻层的制作材料相同，且所述第一遮光层的制作材料与所述第二遮光层的制作材料不同。
优选地，所述第一色阻层、所述第二色阻层及所述第三色阻层的颜色两两不相同，且它们的颜色分别为红色、绿色与蓝色中的一种。
优选地，所述第一色阻层、所述第二色阻层与所述第三色阻层的其中两个色阻层的厚度相同，其余一个色阻层的厚度大于厚度相同的两个色阻层的厚度。
优选地，所述第一遮光层的厚度与厚度相同的两个色阻层的厚度相同，所述第一遮光层的厚度与所述第二遮光层的厚度之和等于厚度较大的色阻层的厚度。
优选地，在所述平坦层上形成有衬垫，所述衬垫立于所述遮光区域对应处。
一种彩膜基板的制造方法，包括：
在玻璃基板上依次形成第一色阻层、第二色阻层与第三色阻层，且所述第一色阻层、所述第二色阻层与所述第三色阻层覆盖所述玻璃基板的透光区域；
其中在形成所述第一色阻层与形成所述第二色阻层时，所述第一色阻层或所述第二色阻层中的一个所述色阻层的一部分覆盖在所述玻璃基板的遮光区域上形成第一遮光层，在形成所述第三色阻层时，所述第三色阻层的一部分覆盖在所述第一遮光层上形成第二遮光层，所述遮光区域为所述第一色阻层、所述第二色阻层与所述第三色阻层两两相邻之间的区域，所述透光区域为所述遮光区域之外的区域。
优选地，所述第一色阻层、所述第二色阻层及所述第三色阻层的颜色两两不相同，且它们的颜色分别为红色、绿色与蓝色中的一种。
优选地，还包括：在所述玻璃基板上形成平坦层，所述平坦层覆盖所述第一色阻层、所述第二色阻层、所述第三色阻层、所述第一遮光层及所述第二遮光层。
优选地，还包括，在所述平坦层上形成衬垫，所述衬垫立于所述遮光区域对应处。
 有益效果
本发明的一种彩膜基板，采用了两种不同颜色的色阻层叠加的结构，可以替代黑色矩阵，起到遮光的效果。本发明的一种彩膜基板的制造方法，该制造方法取消了黑色矩阵的制造，可以减少制造彩膜基板的光罩道数，同时也起到了很好的遮光作用。
 附图说明
图1为本发明的一种彩膜基板的截面结构示意图；
图2为本发明的一种彩膜基板的制造方法流程图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是以相同标号表示。
实施例1
如图1所示，为本发明的一种彩膜基板的截面结构示意图，从图1可以看出，本实施例的一种彩膜基板，包括一玻璃基板1、形成于所述玻璃基板1上的彩色滤光层，以及形成于所述彩色滤光层上的平坦层7。
其中，所述玻璃基板1设有遮光区域与透光区域，所述彩色滤光层包括形成于所述玻璃基板1上的第一色阻层2、第二色阻层3、第三色阻层4、第一遮光层5以及第二遮光层6，所述第一遮光层5覆盖在所述遮光区域上，所述第二遮光层6覆盖在所述第一遮光层5上，所述第一遮光层5与所述第二遮光层6形成重叠遮光层，所述重叠遮光层用于遮光，所述第一色阻层2、所述第二色阻层3与所述第三色阻层4覆盖所述透光区域，所述第一色阻层2、所述第二色阻层3以及所述第三色阻层4相互之间均不重叠，所述遮光区域为所述第一色阻层2、第二色阻层3与第三色阻层4两两相邻之间的区域，所述透光区域为所述遮光区域之外的区域。
本实施例优选所述第一遮光层5或所述第二遮光层6的制作材料与所述第一色阻层2、所述第二色阻层3及所述第三色阻层4中的一个所述色阻层的制作材料相同，且所述第一遮光层5的制作材料与所述第二遮光层6的制作材料不同。本实施例还优选所述第一色阻层2、所述第二色阻层3及所述第三色阻层4的颜色两两不相同，且它们的颜色分别为红色、绿色与蓝色中的一种。
本实施例优选所述第一色阻层2、所述第二色阻层3与所述第三色阻层4的其中两个色阻层的厚度相同，其余一个色阻层的厚度大于厚度相同的两个色阻层的厚度。
本实施例还优选所述第一遮光层5的厚度与厚度相同的两个色阻层的厚度相同，所述第一遮光层5的厚度与所述第二遮光层6的厚度之和等于厚度较大的色阻层的厚度。
为了节省使用色阻层的材料与图案化处理的时间，作为一个特例，本实施例优选所述第一色阻层2与所述第二色阻层3的厚度相同，所述第三色阻层4的厚度大于所述第一色阻层2的厚度，还优选所述第二遮光层6的厚度小于所述第一遮光层5的厚度，所述第一遮光层5的厚度加上所述第二遮光层6的厚度等于所述第三色阻层4的厚度。
最后，本实施例还优选所述平坦层7上还设有衬垫8，所述衬垫8立于所述遮光区域对应处。本实施例的所述衬垫8还分为支撑衬垫8和防压衬垫8，全方位地保护彩膜基板。
本发明的遮光原理如下：
假设所述第一遮光层5的颜色为红色，所述第二遮光层6的颜色为蓝色，那么所述第一遮光层5只能透过红色光线，并吸收绿色和蓝色的光线，此时，透过所述第一遮光层5的红色光线照向所述第二遮光层6，由于所述第二遮光层6的颜色是蓝色，因此所述第二遮光层6会把照向它的红色光线吸收掉，这样所述第一遮光层5和所述第二遮光层6组成的重叠遮光层就能够很好地防止彩膜基板的漏光现象。
实施例2
本实施例的一种彩膜基板的制造方法，包括：
在玻璃基板上依次形成第一色阻层2、第二色阻层3与第三色阻层4，且所述第一色阻层2、所述第二色阻层3与所述第三色阻层4覆盖所述玻璃基板1的透光区域。
其中，在形成所述第一色阻层2与形成所述第二色阻层3时，所述第一色阻层2或所述第二色阻层3中的一个所述色阻层的一部分覆盖在所述玻璃基板1的遮光区域上形成第一遮光层5，在形成所述第三色阻层4时，所述第三色阻层4的一部分覆盖在所述第一遮光层5上形成第二遮光层6，所述遮光区域为所述第一色阻层2、所述第二色阻层3与所述第三色阻层4两两相邻之间的区域，所述透光区域为所述遮光区域之外的区域。
本实施例优选所述第一色阻层2、第二色阻层3及第三色阻层4的颜色两两不相同，且它们的颜色分别为红色、绿色与蓝色中的一种。
本实施例还优选所述步骤包括：在所述玻璃基板1上形成平坦层7，所述平坦层7覆盖所述第一色阻层2、所述第二色阻层3、所述第三色阻层4、所述第一遮光层5及所述第二遮光层6。
本实施例还优选所述步骤包括，在所述平坦层7上形成衬垫8，所述衬垫8立于所述遮光区域对应处。
作为一个特例，本实施例假定在形成第一色阻层2的时候，所述第一色阻层2的一部分在所述遮光区域上形成所述第一遮光层5，如图2所示，为本实施例的一种彩膜基板的制造方法的流程图，从中更可以看出，本实施例的方法包括以下步骤：
步骤S101：在所述玻璃基板1上形成所述第一色阻层2，且所述第一色阻层2的一部分形成在所述遮光区域上。
步骤S102：在所述玻璃基板1上形成第二色阻层3，所述第二色阻层3与所述第一色阻层2和所述第一遮光层5均不重叠。本步骤中，所述第二色阻层3与所述第一色阻层2和所述第一遮光层5均不重叠的做法，不仅节省了第二色阻层3的使用材料，也减少了图案化处理的工作。
步骤S103：在所述玻璃基板1上形成第三色阻层4，且所述第三色阻层4的一部分覆盖上所述遮光区域上的所述第一遮光层5上形成第二遮光层6。这样，在所述遮光区域上重叠的所述第一遮光层5和所述第二遮光层6中，所述第一遮光层5处于下面的位置，即所述第一遮光层5与所述玻璃基板1相连接，所述第二遮光层6覆盖在第一遮光层5的上面。本步骤的这种做法，节省了图案化的工作。
步骤S104：在所述玻璃基板1上形成平坦层5，所述平坦层5覆盖所述第一色阻层2、第二色阻层3及第三色阻层4。本步骤是为了使所述彩色滤光层表面变得平坦，因为在所述遮光区域有第一色阻层2和第三色阻层4的重叠色阻层，造成了彩色滤光层表面的不平整。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种彩膜基板，其包括：
    一玻璃基板；
    彩色滤光层，形成于所述玻璃基板上；以及
    一平坦层，形成于所述彩色滤光层上；
    其中所述玻璃基板设有遮光区域与透光区域，所述彩色滤光层包括形成于所述玻璃基板上的第一色阻层、第二色阻层、第三色阻层、第一遮光层以及第二遮光层，所述第一遮光层覆盖在所述遮光区域上，所述第二遮光层覆盖在所述第一遮光层上，所述第一遮光层与所述第二遮光层形成重叠遮光层，所述重叠遮光层用于遮光，所述第一色阻层、所述第二色阻层与所述第三色阻层覆盖所述透光区域，所述第一色阻层、所述第二色阻层以及所述第三色阻层相互之间均不重叠，所述遮光区域为所述第一色阻层、所述第二色阻层与所述第三色阻层两两相邻之间的区域，所述透光区域为所述遮光区域之外的区域，所述第一遮光层或所述第二遮光层的制作材料与所述第一色阻层、所述第二色阻层及所述第三色阻层中的一个所述色阻层的制作材料相同，且所述第一遮光层的制作材料与所述第二遮光层的制作材料不同。
  2. 根据权利要求1所述的彩膜基板，其中所述第一色阻层、所述第二色阻层及所述第三色阻层的颜色两两不相同，且它们的颜色分别为红色、绿色与蓝色中的一种。
  3. 根据权利要求1所述的彩膜基板，其中所述第一色阻层、所述第二色阻层与所述第三色阻层的其中两个色阻层的厚度相同，其余一个色阻层的厚度大于厚度相同的两个色阻层的厚度。
  4. 根据权利要求3所述的彩膜基板，其中所述第一遮光层的厚度与厚度相同的两个色阻层的厚度相同，所述第一遮光层的厚度与所述第二遮光层的厚度之和等于厚度较大的色阻层的厚度。
  5. 根据权利要求1所述的彩膜基板，其中在所述平坦层上形成有衬垫，所述衬垫立于所述遮光区域对应处。
  6. 一种彩膜基板的制造方法， 其包括：
    在玻璃基板上依次形成第一色阻层、第二色阻层与第三色阻层，且所述第一色阻层、所述第二色阻层与所述第三色阻层覆盖所述玻璃基板的透光区域；
    其中在形成所述第一色阻层与形成所述第二色阻层时，所述第一色阻层或所述第二色阻层中的一个所述色阻层的一部分覆盖在所述玻璃基板的遮光区域上形成第一遮光层，在形成所述第三色阻层时，所述第三色阻层的一部分覆盖在所述第一遮光层上形成第二遮光层，所述遮光区域为所述第一色阻层、所述第二色阻层与所述第三色阻层两两相邻之间的区域，所述透光区域为所述遮光区域之外的区域，所述第一色阻层、第二色阻层及第三色阻层的颜色两两不相同，且它们的颜色分别为红色、绿色与蓝色中的一种。
  7. 根据权利要求6所述的制造方法，其还包括：在所述玻璃基板上形成平坦层，所述平坦层覆盖所述第一色阻层、所述第二色阻层、所述第三色阻层、所述第一遮光层及所述第二遮光层。
  8. 根据权利要求6所述的制造方法，其中所述第一色阻层、所述第二色阻层与所述第三色阻层的其中两个色阻层的厚度相同，其余一个色阻层的厚度大于厚度相同的两个色阻层的厚度。
  9. 根据权利要求6所述的制造方法，其中所述第一遮光层的厚度与厚度相同的两个色阻层的厚度相同，所述第一遮光层的厚度与所述第二遮光层的厚度之和等于厚度较大的色阻层的厚度。
  10. 根据权利要求6所述的制造方法，其中还包括，在所述平坦层上形成衬垫，所述衬垫立于所述遮光区域对应处。
  11. 一种彩膜基板，其包括：
    一玻璃基板；
    彩色滤光层，形成于所述玻璃基板上；以及
    一平坦层，形成于所述彩色滤光层上；
    其中所述玻璃基板设有遮光区域与透光区域，所述彩色滤光层包括形成于所述玻璃基板上的第一色阻层、第二色阻层、第三色阻层、第一遮光层以及第二遮光层，所述第一遮光层覆盖在所述遮光区域上，所述第二遮光层覆盖在所述第一遮光层上，所述第一遮光层与所述第二遮光层形成重叠遮光层，所述重叠遮光层用于遮光，所述第一色阻层、所述第二色阻层与所述第三色阻层覆盖所述透光区域，所述第一色阻层、所述第二色阻层以及所述第三色阻层相互之间均不重叠，所述遮光区域为所述第一色阻层、所述第二色阻层与所述第三色阻层两两相邻之间的区域，所述透光区域为所述遮光区域之外的区域。
  12. 根据权利要求11所述的彩膜基板，其中所述第一遮光层或所述第二遮光层的制作材料与所述第一色阻层、所述第二色阻层及所述第三色阻层中的一个所述色阻层的制作材料相同，且所述第一遮光层的制作材料与所述第二遮光层的制作材料不同。
  13. 根据权利要求11所述的彩膜基板，其中所述第一色阻层、所述第二色阻层及所述第三色阻层的颜色两两不相同，且它们的颜色分别为红色、绿色与蓝色中的一种。
  14. 根据权利要求11所述的彩膜基板，其中所述第一色阻层、所述第二色阻层与所述第三色阻层的其中两个色阻层的厚度相同，其余一个色阻层的厚度大于厚度相同的两个色阻层的厚度。
  15. 根据权利要求14所述的彩膜基板，其中所述第一遮光层的厚度与厚度相同的两个色阻层的厚度相同，所述第一遮光层的厚度与所述第二遮光层的厚度之和等于厚度较大的色阻层的厚度。
  16. 根据权利要求11所述的彩膜基板，其中在所述平坦层上形成有衬垫，所述衬垫立于所述遮光区域对应处。
  17. 一种彩膜基板的制造方法，其包括：
    在玻璃基板上依次形成第一色阻层、第二色阻层与第三色阻层，且所述第一色阻层、所述第二色阻层与所述第三色阻层覆盖所述玻璃基板的透光区域；
    其中在形成所述第一色阻层与形成所述第二色阻层时，所述第一色阻层或所述第二色阻层中的一个所述色阻层的一部分覆盖在所述玻璃基板的遮光区域上形成第一遮光层，在形成所述第三色阻层时，所述第三色阻层的一部分覆盖在所述第一遮光层上形成第二遮光层，所述遮光区域为所述第一色阻层、所述第二色阻层与所述第三色阻层两两相邻之间的区域，所述透光区域为所述遮光区域之外的区域。
  18. 根据权利要求17所述的制造方法，其中所述第一色阻层、第二色阻层及第三色阻层的颜色两两不相同，且它们的颜色分别为红色、绿色与蓝色中的一种。
  19. 根据权利要求17所述的制造方法，其中还包括：在所述玻璃基板上形成平坦层，所述平坦层覆盖所述第一色阻层、所述第二色阻层、所述第三色阻层、所述第一遮光层及所述第二遮光层。
  20. 根据权利要求17所述的制造方法，其中还包括，在所述平坦层上形成衬垫，所述衬垫立于所述遮光区域对应处。
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017203848A (ja) * 2016-05-10 2017-11-16 株式会社ジャパンディスプレイ 表示装置用基板、表示装置及び表示装置用基板の製造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105511189B (zh) * 2016-02-16 2018-10-26 深圳市华星光电技术有限公司 Va型coa液晶显示面板
CN106249494A (zh) * 2016-08-18 2016-12-21 深圳市华星光电技术有限公司 一种阵列基板及显示面板
CN106483719B (zh) * 2016-12-29 2019-08-02 深圳市华星光电技术有限公司 一种电子设备、阵列基板及其制作方法
CN108919547B (zh) * 2018-07-10 2020-08-07 武汉华星光电半导体显示技术有限公司 彩膜基板的制作方法
CN109901335B (zh) * 2019-03-27 2023-08-25 京东方科技集团股份有限公司 一种显示面板及显示装置
CN110275341B (zh) * 2019-06-28 2022-04-12 厦门天马微电子有限公司 显示面板和显示装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5039204A (en) * 1989-12-30 1991-08-13 Samsung Electron Devices Co. Ltd. Color filter layer of a liquid crystal display
JPH07318950A (ja) * 1994-05-27 1995-12-08 Sony Corp 電気光学表示セルのスペーサ形成方法
US20030082465A1 (en) * 2001-10-31 2003-05-01 Keiji Takizawa Color filter substrate and method for making the same, electro-optical device and method for making the same, and electronic apparatus
CN101675377A (zh) * 2007-06-11 2010-03-17 夏普株式会社 彩色滤光片基板的制造方法、液晶显示装置的制造方法、彩色滤光片基板、和液晶显示装置
CN102681067A (zh) * 2011-12-15 2012-09-19 京东方科技集团股份有限公司 彩色滤光片及其制备方法
CN102681068A (zh) * 2012-05-11 2012-09-19 深圳市华星光电技术有限公司 彩色滤光片及其制作方法
CN202975541U (zh) * 2012-11-29 2013-06-05 深圳市华星光电技术有限公司 液晶显示装置及其彩色滤光片基板

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4852862B2 (ja) * 2005-03-31 2012-01-11 凸版印刷株式会社 カラーフィルタの製造方法及びカラー液晶表示装置の製造方法
CN103163581A (zh) * 2011-12-15 2013-06-19 群康科技(深圳)有限公司 彩色滤光片的制造方法及具有该彩色滤光片的显示装置
CN102799020A (zh) * 2012-08-23 2012-11-28 友达光电股份有限公司 内嵌式触控显示器及其制造方法
CN104280925A (zh) * 2013-07-03 2015-01-14 群创光电股份有限公司 显示面板及显示装置
CN203688941U (zh) * 2014-01-24 2014-07-02 京东方科技集团股份有限公司 彩色滤光片及显示装置
CN104698521B (zh) * 2015-03-03 2017-05-10 昆山龙腾光电有限公司 彩色滤光片及其制作方法及液晶显示装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5039204A (en) * 1989-12-30 1991-08-13 Samsung Electron Devices Co. Ltd. Color filter layer of a liquid crystal display
JPH07318950A (ja) * 1994-05-27 1995-12-08 Sony Corp 電気光学表示セルのスペーサ形成方法
US20030082465A1 (en) * 2001-10-31 2003-05-01 Keiji Takizawa Color filter substrate and method for making the same, electro-optical device and method for making the same, and electronic apparatus
CN101675377A (zh) * 2007-06-11 2010-03-17 夏普株式会社 彩色滤光片基板的制造方法、液晶显示装置的制造方法、彩色滤光片基板、和液晶显示装置
CN102681067A (zh) * 2011-12-15 2012-09-19 京东方科技集团股份有限公司 彩色滤光片及其制备方法
CN102681068A (zh) * 2012-05-11 2012-09-19 深圳市华星光电技术有限公司 彩色滤光片及其制作方法
CN202975541U (zh) * 2012-11-29 2013-06-05 深圳市华星光电技术有限公司 液晶显示装置及其彩色滤光片基板

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017203848A (ja) * 2016-05-10 2017-11-16 株式会社ジャパンディスプレイ 表示装置用基板、表示装置及び表示装置用基板の製造方法

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