WO2017016527A3 - 一种生长在Si衬底上的GaAs薄膜及其制备方法 - Google Patents
一种生长在Si衬底上的GaAs薄膜及其制备方法 Download PDFInfo
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- WO2017016527A3 WO2017016527A3 PCT/CN2016/095921 CN2016095921W WO2017016527A3 WO 2017016527 A3 WO2017016527 A3 WO 2017016527A3 CN 2016095921 W CN2016095921 W CN 2016095921W WO 2017016527 A3 WO2017016527 A3 WO 2017016527A3
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- substrate
- thin film
- gaas
- buffer layer
- film grown
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- 239000000758 substrate Substances 0.000 title abstract 7
- 239000010409 thin film Substances 0.000 title abstract 6
- 238000002360 preparation method Methods 0.000 title abstract 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract 6
- 238000000137 annealing Methods 0.000 abstract 3
- 238000011065 in-situ storage Methods 0.000 abstract 3
- 238000004140 cleaning Methods 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000007781 pre-processing Methods 0.000 abstract 1
- 230000001737 promoting effect Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
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- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
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- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/42—Gallium arsenide
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- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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Abstract
一种生长在Si衬底上的GaAs薄膜的制备方法,包括以下步骤:(1)Si(111)衬底清洗;(2)Si(111)衬底预处理;(3)Si(111)衬底脱氧化膜;(4)第一In xGa 1-xAs缓冲层的生长;(5)第一In xGa 1-xAs缓冲层的原位退火;(6)GaAs缓冲层的生长;(7)GaAs缓冲层的原位退火;(8)第二In xGa 1-xAs缓冲层的生长;(9)第二In xGa 1-xAs缓冲层的原位退火;(10)GaAs外延薄膜的生长。该申请还公开了生长在Si衬底上的GaAs薄膜。该申请得到的GaAs薄膜晶体质量好,表面平整,对半导体器件的制备,尤其是太阳电池领域,有着积极的促进意义。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG11201707558SA SG11201707558SA (en) | 2015-07-30 | 2016-08-18 | Gaas thin film grown on si substrate, and preparation method for gaas thin film grown on si substrate |
US15/563,599 US10541133B2 (en) | 2015-07-30 | 2016-08-18 | GaAs thin film grown on Si substrate, and preparation method for GaAs thin film grown on Si substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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CN201510466401.0 | 2015-07-30 | ||
CN201510466401.0A CN105023962B (zh) | 2015-07-30 | 2015-07-30 | 一种生长在Si衬底上的GaAs薄膜及其制备方法 |
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WO2017016527A2 WO2017016527A2 (zh) | 2017-02-02 |
WO2017016527A3 true WO2017016527A3 (zh) | 2017-06-22 |
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PCT/CN2016/095921 WO2017016527A2 (zh) | 2015-07-30 | 2016-08-18 | 一种生长在Si衬底上的GaAs薄膜及其制备方法 |
Country Status (4)
Country | Link |
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US (1) | US10541133B2 (zh) |
CN (1) | CN105023962B (zh) |
SG (1) | SG11201707558SA (zh) |
WO (1) | WO2017016527A2 (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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CN105023962B (zh) * | 2015-07-30 | 2017-03-08 | 华南理工大学 | 一种生长在Si衬底上的GaAs薄膜及其制备方法 |
CN105624792B (zh) * | 2016-03-24 | 2019-07-05 | 中国科学院半导体研究所 | 一种硅基GaAs单晶薄膜及其制备方法 |
CN105938856B (zh) * | 2016-06-27 | 2018-02-09 | 山东浪潮华光光电子股份有限公司 | 一种Si衬底GaAs单结太阳能电池结构及其制备方法 |
CN106435721A (zh) * | 2016-09-22 | 2017-02-22 | 东莞市联洲知识产权运营管理有限公司 | 一种GaAs/Si外延材料制备方法 |
CN107293611A (zh) * | 2017-07-04 | 2017-10-24 | 上海集成电路研发中心有限公司 | 短波红外二极管及其形成方法 |
TWI725418B (zh) * | 2019-04-24 | 2021-04-21 | 行政院原子能委員會核能研究所 | 磊晶於異質基板之結構及其製備方法 |
CN112420511A (zh) * | 2020-11-23 | 2021-02-26 | 陕西科技大学 | 一种GaAs衬底的退火处理方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07240370A (ja) * | 1994-02-28 | 1995-09-12 | Hikari Gijutsu Kenkyu Kaihatsu Kk | Iii−v族化合物薄膜の製造方法 |
TWI221001B (en) * | 2003-07-28 | 2004-09-11 | Univ Nat Chiao Tung | A method for growing a GaAs epitaxial layer on Ge/GeSi/Si substrate |
CN103762256A (zh) * | 2014-01-15 | 2014-04-30 | 华南理工大学 | 生长在Si衬底上的InGaAs薄膜及其制备方法 |
CN105023962A (zh) * | 2015-07-30 | 2015-11-04 | 华南理工大学 | 一种生长在Si衬底上的GaAs薄膜及其制备方法 |
CN204834639U (zh) * | 2015-07-30 | 2015-12-02 | 华南理工大学 | 一种生长在Si衬底上的GaAs薄膜 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6316680A (ja) * | 1986-07-08 | 1988-01-23 | Mitsubishi Electric Corp | GaAs太陽電池およびその製造方法 |
US5238869A (en) * | 1988-07-25 | 1993-08-24 | Texas Instruments Incorporated | Method of forming an epitaxial layer on a heterointerface |
US8299351B2 (en) * | 2009-02-24 | 2012-10-30 | Hong Kong Applied Science And Technology Research Institute Co., Ltd. | Epitaxial growth of III-V compounds on (111) silicon for solar cells |
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2015
- 2015-07-30 CN CN201510466401.0A patent/CN105023962B/zh active Active
-
2016
- 2016-08-18 WO PCT/CN2016/095921 patent/WO2017016527A2/zh active Application Filing
- 2016-08-18 US US15/563,599 patent/US10541133B2/en active Active
- 2016-08-18 SG SG11201707558SA patent/SG11201707558SA/en unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07240370A (ja) * | 1994-02-28 | 1995-09-12 | Hikari Gijutsu Kenkyu Kaihatsu Kk | Iii−v族化合物薄膜の製造方法 |
TWI221001B (en) * | 2003-07-28 | 2004-09-11 | Univ Nat Chiao Tung | A method for growing a GaAs epitaxial layer on Ge/GeSi/Si substrate |
CN103762256A (zh) * | 2014-01-15 | 2014-04-30 | 华南理工大学 | 生长在Si衬底上的InGaAs薄膜及其制备方法 |
CN105023962A (zh) * | 2015-07-30 | 2015-11-04 | 华南理工大学 | 一种生长在Si衬底上的GaAs薄膜及其制备方法 |
CN204834639U (zh) * | 2015-07-30 | 2015-12-02 | 华南理工大学 | 一种生长在Si衬底上的GaAs薄膜 |
Also Published As
Publication number | Publication date |
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US10541133B2 (en) | 2020-01-21 |
SG11201707558SA (en) | 2017-10-30 |
CN105023962B (zh) | 2017-03-08 |
WO2017016527A2 (zh) | 2017-02-02 |
CN105023962A (zh) | 2015-11-04 |
US20180090316A1 (en) | 2018-03-29 |
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