WO2016195071A1 - 保護膜形成用複合シート - Google Patents
保護膜形成用複合シート Download PDFInfo
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- WO2016195071A1 WO2016195071A1 PCT/JP2016/066588 JP2016066588W WO2016195071A1 WO 2016195071 A1 WO2016195071 A1 WO 2016195071A1 JP 2016066588 W JP2016066588 W JP 2016066588W WO 2016195071 A1 WO2016195071 A1 WO 2016195071A1
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- protective film
- forming
- adhesive layer
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/08—Homopolymers or copolymers of acrylic acid esters
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/10—Homopolymers or copolymers of methacrylic acid esters
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
Definitions
- the present invention relates to a composite sheet for forming a protective film for forming a protective film on the back surface of a semiconductor chip.
- the present application claims priority based on Japanese Patent Application No. 2015-114714 filed in Japan on June 5, 2015, the contents of which are incorporated herein by reference.
- semiconductor devices have been manufactured using a mounting method called a so-called face down method.
- a semiconductor chip having electrodes such as bumps on a circuit surface is used, and the electrodes are bonded to a substrate. For this reason, the back surface opposite to the circuit surface of the chip may be exposed.
- a resin film made of an organic material is formed as a protective film on the exposed back surface of the chip and may be taken into the semiconductor device as a semiconductor chip with a protective film.
- the protective film is used to prevent the chip from cracking after the dicing process or packaging, or to adhere the obtained chip onto another member such as a die pad part or another semiconductor chip. .
- a protective film-forming composite sheet comprising an adhesive layer on a substrate and a protective film-forming film on the adhesive layer is used to form such a protective film.
- the protective film-forming composite sheet has a protective film-forming film having a protective film-forming ability, and a laminated structure of a base material and an adhesive layer functions as a dicing sheet. It can be said that the forming film and the dicing sheet are integrated.
- Such a protective film-forming composite sheet is used, for example, as follows. That is, after the protective film forming composite sheet is attached to the back surface of the semiconductor wafer (the surface opposite to the electrode forming surface) by the protective film forming film, the semiconductor wafer is made into semiconductor chips by dicing. Next, the pressure-sensitive adhesive layer is cured by irradiation with active energy rays, and the semiconductor chip is peeled off from the pressure-sensitive adhesive layer and picked up. On the other hand, the protective film-forming film is picked up together with the semiconductor chip, and finally exists in a state of a protective film cured on the back surface of the semiconductor chip.
- the protective film-forming film is uncured or partially cured at the time of picking up the semiconductor chip, and the semiconductor chip is bonded with a sealing material.
- an uncured or partially cured film for forming a protective film is used so that it is completely or almost completely cured (see Patent Document 1).
- the conventional protective film-forming composite sheet as disclosed in Patent Document 1 has a peeling force between the pressure-sensitive adhesive layer and the protective film-forming film depending on use conditions, particularly after the pressure-sensitive adhesive layer is cured. There is a problem that a chip is cracked or chipped when picking up a semiconductor chip because it is too large.
- the present invention has been made in view of the above circumstances, and includes a pressure-sensitive adhesive layer on a substrate, and a protective film-forming film on the pressure-sensitive adhesive layer.
- a protective film is formed on the back surface of a semiconductor chip.
- a protective sheet-forming composite sheet for preventing dicing between the adhesive layer and the protective film-forming film or the cured protective film before the adhesive layer is cured. It is an object of the present invention to provide a composite sheet for forming a protective film, which can be carried out and is sufficiently small after the pressure-sensitive adhesive layer is cured, and which can stably pick up semiconductor chips.
- the present invention comprises a pressure-sensitive adhesive layer on a substrate, and a protective film-forming film on the pressure-sensitive adhesive layer, the pressure-sensitive adhesive layer having active energy ray curability.
- the protective film-forming film is a protective film-forming composite sheet having thermosetting properties, and the protective film-forming composite sheet is attached to the back surface of the semiconductor wafer by the protective film-forming film,
- the protective film-forming film is cured by heating to form a protective film, and then the semiconductor wafer is diced into semiconductor chips, and then the adhesive layer is cured by irradiation with active energy rays, and then the semiconductor chips Is used for manufacturing a semiconductor chip with a protective film by picking up together with the protective film affixed to the back surface of the adhesive layer.
- At least the layer in contact with the protective film-forming film contains a (meth) acrylic acid alkyl ester copolymer, wherein the (meth) acrylic acid alkyl ester copolymer is an alkyl constituting an alkyl ester.
- a composite sheet for forming a protective film having a structural unit derived from a (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the group.
- the protective film-forming film comprises an epoxy resin, a thermosetting agent that dissolves by heating and exhibits curing activity with respect to the epoxy resin, and imidazoles. It is preferable to contain.
- the alkyl group constituting the alkyl ester preferably has 11 to 18 carbon atoms. That is, the present invention includes the following aspects. [1] A pressure-sensitive adhesive layer is provided on a substrate, and a protective film-forming film is provided on the pressure-sensitive adhesive layer.
- the pressure-sensitive adhesive layer has active energy ray curability
- the protective film-forming film is A protective sheet-forming composite sheet having thermosetting properties
- the protective film-forming composite sheet is affixed to the back surface of the semiconductor wafer with the protective film-forming film, and then the protective film-forming film is cured by heating to form a protective film, and then the semiconductor wafer is diced.
- the adhesive layer is cured by irradiation with active energy rays, and then the semiconductor chip is picked up together with the protective film attached to the back surface thereof to produce a semiconductor chip with a protective film
- the pressure-sensitive adhesive layer contains at least a (meth) acrylic acid alkyl ester copolymer in a layer in contact with the protective film-forming film,
- the said (meth) acrylic-acid alkylester copolymer is a composite sheet for protective film formation which has a structural unit induced
- the film for forming a protective film contains an epoxy resin, a thermosetting agent that dissolves by heating and exhibits curing activity with respect to the epoxy resin, and imidazoles.
- Composite sheet for protective film formation [3] The composite sheet for forming a protective film according to [1] or [2], wherein the alkyl group constituting the alkyl ester has 11 to 18 carbon atoms.
- a composite sheet for forming a protective film for forming a protective film on the back surface of a semiconductor chip comprising a pressure-sensitive adhesive layer on a base material and a protective film-forming film on the pressure-sensitive adhesive layer.
- the peeling force between the pressure-sensitive adhesive layer and the protective film-forming film or the protective film after curing of the protective film-forming film that is, a protective film that is a cured product of the protective film-forming film
- it is sufficiently large before the pressure-sensitive adhesive layer is cured and can be stably diced, and is sufficiently small after the pressure-sensitive adhesive layer is cured to stably perform the pick-up of the semiconductor chip.
- a composite sheet for forming a protective film is provided.
- the protective film-forming composite sheet according to the present invention comprises a pressure-sensitive adhesive layer on a base material, and a protective film-forming film on the pressure-sensitive adhesive layer, and the pressure-sensitive adhesive layer has active energy ray curability.
- the protective film-forming film is a thermosetting protective film-forming composite sheet, and the protective film-forming composite sheet is attached to the back surface of the semiconductor wafer with the protective film-forming film.
- the protective film-forming film is cured by heating to form a protective film, and then the semiconductor wafer is diced into semiconductor chips, and then the adhesive layer is cured by irradiation with active energy rays, and then the semiconductor
- the chip is used to manufacture a semiconductor chip with a protective film by picking up the chip together with the protective film affixed to the back surface, and the adhesive layer is In a layer in contact with at least the protective film-forming film, it contains a (meth) acrylic acid alkyl ester copolymer, and the (meth) acrylic acid alkyl ester copolymer contains an alkyl group constituting the alkyl ester.
- one side of the composite sheet for forming a protective film according to the present invention is: A protective sheet-forming composite sheet comprising a base material, an adhesive layer, and a protective film-forming film, The pressure-sensitive adhesive layer is laminated on the base material, and the protective film-forming film is laminated on the pressure-sensitive adhesive layer; The pressure-sensitive adhesive layer is Has active energy ray curability, In a layer that is in contact with at least the protective film-forming film, containing a (meth) acrylic acid alkyl ester copolymer, The (meth) acrylic acid alkyl ester copolymer is a copolymer having a structural unit derived from a (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the alkyl group constituting the alkyl ester; The protective film-forming film has thermosetting properties; Affixing the protective film-forming composite sheet
- the laminated structure of a base material and an adhesive layer may be called a "support sheet”.
- a composite sheet for forming a protective film a composite sheet obtained by curing the protective film-forming film by heating to form a protective film, and a composite sheet in which the adhesive layer is cured by irradiation with active energy rays, As long as the laminated structure of the base material, the pressure-sensitive adhesive layer or a cured product thereof, and the protective film is maintained, it is referred to as a protective sheet-forming composite sheet.
- the layer in contact with the protective film-forming film in the pressure-sensitive adhesive layer contains the (meth) acrylic acid alkyl ester copolymer in the specific range as described above.
- the protective film forming composite sheet when used, the protective film is applied from the substrate side of the protective film forming composite sheet before dicing the semiconductor wafer in a state where the protective film is attached to the back surface of the semiconductor wafer.
- the surface of the protective film is printed with a laser beam (hereinafter sometimes referred to as “laser printing”).
- laser printing gas is generated by the decomposition of the protective film from the laser light irradiation portion of the protective film accompanying laser printing, but the generated gas is sufficiently large as described above because the peeling force between the adhesive layer and the protective film is sufficiently large. Even if the pressure is received, peeling between the pressure-sensitive adhesive layer and the protective film is suppressed, and the occurrence of gas accumulation is suppressed.
- the dicing be stably performed as described above, but also the print applied to the protective film can be clearly recognized visually through the base material and the adhesive layer.
- the layer in contact with the protective film-forming film in the pressure-sensitive adhesive layer contains the (meth) acrylic acid alkyl ester copolymer in the specific range as described above. Therefore, after the adhesive layer is cured, the peeling force between the cured product of the adhesive layer and the protective film is sufficiently small, and the semiconductor chip with the protective film can be picked up stably and easily. Chip cracks and chipping are suppressed.
- each structure of the composite film for protective film formation concerning this invention is demonstrated in detail.
- the material of the base material is preferably various resins, and specific examples thereof include polyethylene (low density polyethylene (may be abbreviated as LDPE), linear low density polyethylene (sometimes abbreviated as LLDPE), High density polyethylene (may be abbreviated as HDPE)), polypropylene, ethylene / propylene copolymer, polybutene, polybutadiene, polymethylpentene, polyvinyl chloride fill, vinyl chloride copolymer, polyethylene terephthalate, polyethylene naphthalate, poly Butylene terephthalate, polyurethane, polyurethane acrylate, polyimide, ethylene / vinyl acetate copolymer, ionomer resin, ethylene / (meth) acrylic acid copolymer, ethylene / (meth) acrylic acid ester copolymer, polystyrene, polycarbonate , Fluororesin, hydrogenated product of any of these resins, modified products, include cross-linked product
- the thickness of the substrate can be appropriately selected depending on the purpose, but is preferably 50 to 300 ⁇ m, more preferably 60 to 100 ⁇ m. When the thickness of the substrate is within such a range, the flexibility of the composite sheet for forming a protective film and the adhesiveness to a semiconductor wafer or semiconductor chip are further improved.
- the “thickness” in the present specification can be determined by a method defined in JIS K 7130: 1999 (ISO 4593: 1993).
- the substrate may be composed of one layer (single layer) or may be composed of two or more layers.
- a base material consists of multiple layers
- these multiple layers may be the same as or different from each other. That is, all the layers may be the same, all the layers may be different, or only some of the layers may be the same. And when several layers differ from each other, the combination of these several layers is not specifically limited.
- the plurality of layers being different from each other means that at least one of the material and the thickness of each layer is different from each other.
- a base material consists of multiple layers, it is good to make it the total thickness of each layer be the thickness of said preferable base material.
- the surface may be subjected to oxidation treatment such as flame treatment, chromic acid treatment, and hot air treatment.
- the base material may have a surface subjected to primer treatment.
- the pressure-sensitive adhesive layer has active energy ray curability and contains a (meth) acrylic acid alkyl ester copolymer in at least a layer in contact with the protective film-forming film.
- the (meth) acrylic acid alkyl ester copolymer has a structural unit derived from a (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the alkyl group constituting the alkyl ester.
- “Induced” means that the chemical structure changes due to polymerization.
- active energy ray means an electromagnetic wave or charged particle beam having energy quanta, and examples thereof include ultraviolet rays and electron beams.
- Ultraviolet rays can be irradiated by using, for example, a high-pressure mercury lamp, a fusion H lamp, or a xenon lamp as an ultraviolet ray source.
- the electron beam can be emitted by an electron beam accelerator or the like.
- the thickness of the pressure-sensitive adhesive layer can be appropriately selected depending on the purpose, but is preferably 1 to 100 ⁇ m, more preferably 1 to 60 ⁇ m, and particularly preferably 1 to 30 ⁇ m.
- the pressure-sensitive adhesive layer is formed from a pressure-sensitive adhesive composition containing the (meth) acrylic acid alkyl ester copolymer or the like.
- the ratio of the content of components that do not vaporize at room temperature in the pressure-sensitive adhesive composition is usually the same as the ratio of the content of the components in the pressure-sensitive adhesive layer.
- “normal temperature” means a temperature that is not particularly cooled or heated, that is, a normal temperature, and examples thereof include a temperature of 15 to 25 ° C.
- the (meth) acrylic acid alkyl ester copolymer has a structural unit derived from a (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the alkyl group constituting the alkyl ester.
- the description of mere "(meth) acrylic acid alkyl ester” is (meth) acrylic acid having 8 or more carbon atoms in the above-mentioned "alkyl group constituting the alkyl ester” unless otherwise specified. It means “alkyl ester”.
- the alkyl group having 8 or more carbon atoms of the (meth) acrylic acid alkyl ester may be linear, branched or cyclic, and when it is cyclic, it may be monocyclic or polycyclic, It is preferably linear or branched.
- the number of carbon atoms of the alkyl group constituting the alkyl ester may be 8 or more, for example, 11 or more. Moreover, it is preferable that carbon number of the alkyl group which comprises the said alkyl ester is 18 or less. That is, the preferred range of the number of carbon atoms of the alkyl group constituting the alkyl ester is 8-18, and an example thereof is 11-18.
- Alkyl (meth) acrylic acid alkyl esters having 19 or more carbon atoms in the alkyl group constituting the alkyl ester are difficult to handle because of low solubility. That is, when the alkyl group constituting the alkyl ester has 18 or less carbon atoms, the solubility is good and the handling is easy.
- the (meth) acrylic acid alkyl ester copolymer in which the alkyl group constituting the alkyl ester has 8 or more carbon atoms, the (meth) acrylic acid alkyl ester copolymer having the carbon number of less than 7 is used.
- the pressure-sensitive adhesive layer has a lower polarity than when a coalescence is used. Therefore, for example, when the protective film-forming film contains a high-polarity material such as an epoxy resin, the transition from the protective film-forming film of the high-polarity material to the pressure-sensitive adhesive layer is performed in the protective film-forming composite sheet. It is suppressed. As a result, a decrease in thermosetting of the protective film-forming film is effectively suppressed. And since the thermosetting degree by heating of the film for protective film formation becomes high, the pick-up property of the semiconductor chip with a protective film mentioned later improves.
- (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the alkyl group include, for example, n-octyl (meth) acrylate, isooctyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, N-nonyl (meth) acrylate, isononyl (meth) acrylate, decyl (meth) acrylate, undecyl (meth) acrylate, dodecyl (meth) acrylate (also referred to as (meth) acrylate lauryl), (meth) Tridecyl acrylate, tetradecyl (meth) acrylate (also called myristyl (meth) acrylate), pentadecyl (meth) acrylate, hexadecyl (meth) acrylate (also called palmityl (meth) acrylate), (meth) acrylic H
- Examples of the (meth) acrylic acid alkyl ester copolymer include active energy ray-polymerizable polymers that polymerize upon irradiation with active energy rays.
- Preferred examples of such a copolymer include a hydroxyl group and a polymerizable group (for example, (meth) acryloyl group, vinyl group (ethenyl group), allyl group (2-propenyl group) and the like.
- a (meth) acryloyl group is preferred) in the side chain.
- those having a hydroxyl group and having a polymerizable group in the side chain via a urethane bond are more preferred.
- Such a (meth) acrylic acid alkyl ester copolymer is crosslinked, for example, by the reaction of the hydroxyl group of the copolymer with an isocyanate group in an isocyanate-based crosslinking agent described later.
- such a (meth) acrylic acid alkyl ester copolymer has a polymerizable group in the side chain, for example, by separately using a low molecular weight active energy ray polymerizable compound and irradiating with active energy rays. Releasing from the protective film by reducing the adhesiveness of the pressure-sensitive adhesive layer after the polymerization reaction is improved by carrying out the polymerization reaction without using such a compound separately from the case of performing the polymerization reaction.
- the preferable (meth) acrylic acid alkyl ester copolymer described above is obtained by polymerizing these monomers using, for example, a composition containing (meth) acrylic acid alkyl ester and a hydroxyl group-containing monomer. It may be obtained by reacting an isocyanate group of a compound having an isocyanate group and a polymerizable group with a hydroxyl group of the copolymer (pre-copolymer).
- More preferable examples of the (meth) acrylic acid alkyl ester copolymer include, for example, copolymerizing these monomers using the (meth) acrylic acid alkyl ester and the hydroxyl group-containing (meth) acrylic acid ester as essential monomers. What was obtained by making the isocyanate group of the compound which has an isocyanate group and a polymeric group react with the hydroxyl group of the pre-copolymer obtained in this way is mentioned.
- hydroxyl group-containing (meth) acrylic acid ester examples include hydroxymethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and the like.
- Examples of the compound having an isocyanate group and a polymerizable group include isocyanate compounds such as 2- (meth) acryloyloxyethyl isocyanate, meta-isopropenyl- ⁇ , ⁇ -dimethylbenzyl isocyanate, methacryloyl isocyanate, and allyl isocyanate. Of these, 2-methacryloyloxyethyl isocyanate is preferred.
- the preferred (meth) acrylic acid alkyl ester copolymer described above may be obtained by further reacting with any compound other than the essential monomers and compounds described above, and the optional compound may be, for example, a monomer.
- a compound obtained by copolymerizing monomers may also be used.
- the monomer that is an arbitrary compound include a hydroxyl group-free (meth) acrylic ester that does not correspond to the (meth) acrylic acid alkyl ester, (meth) acrylic acid, itaconic acid, and a non (meth) acrylic monomer. Is mentioned.
- Examples of the hydroxyl group-free (meth) acrylic acid ester include, for example, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, pentyl (meth) acrylate, (Meth) acrylic acid alkyl esters such as hexyl (meth) acrylate and heptyl (meth) acrylate, wherein the alkyl group constituting the alkyl ester is linear or branched and has 1 to 7 carbon atoms; ) (Meth) acrylic acid aralkyl esters such as benzyl acrylate; (meth) acrylic cycloalkenyl esters such as (meth) acrylic dicyclopentenyl esters; (meth) such as (meth) acrylic dicyclopentenyloxyethyl esters Acrylic acid cycloalkenyloxyalkyl ester; (meth) acrylic acid Bromide;
- non- (meth) acrylic monomer examples include vinyl acetate, acrylonitrile, styrene, N-methylolacrylamide and the like.
- the (meth) acrylic acid alkyl ester copolymer such as the (meth) acrylic acid alkyl ester, the hydroxyl group-containing (meth) acrylic acid ester, the compound having an isocyanate group and a polymerizable group, and the arbitrary compound.
- the components to be used may be either one kind or two or more kinds.
- the proportion of the alkyl group (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the alkyl group is 30 masses based on the total mass of all monomers used for the preparation of the (meth) acrylic acid alkyl ester copolymer. % Or more, and more preferably 35% by mass or more.
- the content of the structural unit derived from the (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the alkyl group described above is the total structural unit constituting the (meth) acrylic acid alkyl ester copolymer. It is preferable that it is 30 mass% or more with respect to the total mass, and it is more preferable that it is 35 mass% or more.
- the upper limit value of the content of the structural unit derived from the (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the alkyl group is not particularly limited, and the (meth) acrylic acid alkyl ester copolymer is not particularly limited. Can be selected from, for example, 85% by mass, 90% by mass, and 95% by mass, and may be 100% by mass. That is, the proportion of the alkyl group (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the above alkyl group is based on the total mass of all monomers used for the preparation of the (meth) acrylic acid alkyl ester copolymer.
- the content may be 30% by mass to 100% by mass, may be 30% by mass to 95% by mass, may be 30% by mass to 90% by mass, and may be 30% by mass to 85% by mass. There may be.
- the content may be 35% by mass or more and 100% by mass or less, may be 35% by mass or more and 95% by mass or less, and may be 35% by mass or more and 90% by mass or less. It may be 35 mass% or more and 85 mass% or less.
- the content may be not less than 40% by mass and not more than 80% by mass.
- the content of the structural unit derived from the (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the alkyl group constitutes the (meth) acrylic acid alkyl ester copolymer. It may be 30% by mass or more and 100% by mass or less, 30% by mass or more and 95% by mass or less, or 30% by mass or more and 90% by mass or less with respect to the total mass of all the structural units. 30 mass% or more and 85 mass% or less may be sufficient. As still another aspect, the content may be 35% by mass to 100% by mass, 35% by mass to 95% by mass, and 35% by mass to 90% by mass. It may be 35 mass% or more and 85 mass% or less. As still another aspect, the content may be 40% by mass or more and 80% by mass or less.
- the (meth) acrylic acid alkyl ester copolymer contained in the pressure-sensitive adhesive layer may be one kind or two or more kinds.
- the content of the (meth) acrylic acid alkyl ester copolymer is preferably 75% by mass or more and more preferably 80% by mass or more with respect to the total mass of the pressure-sensitive adhesive layer. And in order to form such an adhesive layer, content of the said (meth) acrylic-acid alkylester copolymer in the said adhesive composition of all the components other than the solvent in the said adhesive composition
- the total mass is preferably 75% by mass or more, and more preferably 80% by mass or more.
- the upper limit of the content of the (meth) acrylic acid alkyl ester copolymer in the pressure-sensitive adhesive layer is not particularly limited, and may be 100% by mass with respect to the total mass of the pressure-sensitive adhesive layer. Considering using other components in combination as described later, the content is preferably 97% by mass, more preferably 95% by mass. That is, content of the said (meth) acrylic-acid alkylester copolymer should just be 75 to 100 mass% with respect to the total mass of an adhesive layer, and is 75 to 97 mass%. It is preferably 80% by mass or more and 95% by mass or less.
- content of the (meth) acrylic-acid alkylester copolymer in the said adhesive composition is 75 mass% with respect to the total mass of all components other than the solvent in the said adhesive composition.
- the content may be 100% by mass or less, preferably 75% by mass or more and 97% by mass or less, and more preferably 80% by mass or more and 95% by mass or less.
- the pressure-sensitive adhesive composition include the (meth) )
- those further containing an isocyanate-based crosslinking agent and a photopolymerization initiator may be mentioned.
- the isocyanate-based crosslinking agent is not particularly limited as long as it is a crosslinking agent having an isocyanate group (—N ⁇ C ⁇ O). Preferred examples thereof include 2,4-tolylene diisocyanate; 2,6-tolylene diene.
- the isocyanate-based crosslinking agent contained in the pressure-sensitive adhesive composition may be only one type or two or more types.
- the content of the isocyanate-based crosslinking agent in the pressure-sensitive adhesive composition is preferably 0.01 to 20 parts by mass when the content of the (meth) acrylic acid alkyl ester copolymer is 100 parts by mass. More preferably, the content is 0.1 to 10 parts by mass.
- the photopolymerization initiator may be a known one, and specifically, for example, 4- (2-hydroxyethoxy) phenyl (2-hydroxy-2-propyl) ketone, ⁇ -hydroxy- ⁇ , ⁇ ′-dimethyl Acetophenone, 2-methyl-2-hydroxypropiophenone, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-1- ⁇ 4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] phenyl ⁇ -2 ⁇ -ketol compounds such as methyl-propan-1-one; methoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone, 2-methyl-1- [4- (methylthio) -Phenyl] -2-morpholinopropane-1 and other acetophenone compounds; benzoin ethyl ether, ben Benzoin ether compounds such as inisopropyl
- the content of the photopolymerization initiator in the pressure-sensitive adhesive composition is preferably 0.05 to 20 parts by mass when the content of the (meth) acrylic acid alkyl ester copolymer is 100 parts by mass. .
- the pressure-sensitive adhesive composition preferably further contains a solvent.
- the solvent is not particularly limited, and preferred solvents include, for example, hydrocarbons having 7 to 9 carbon atoms such as toluene and xylene; methanol, ethanol, 2-propanol, isobutyl alcohol (also 2-methylpropan-1-ol) An alcohol having 1 to 6 carbon atoms such as 1-butanol; an ester such as ethyl acetate; a ketone such as acetone or methyl ethyl ketone; an ether such as tetrahydrofuran; an amide such as dimethylformamide or N-methylpyrrolidone (that is, an amide bond).
- methyl ethyl ketone, toluene, and ethyl acetate are preferable.
- the solvent which the said adhesive composition contains only 1 type may be sufficient and 2 or more types may be sufficient.
- the content of the solvent is preferably such that the solid content concentration of the composition is 10 to 50% by mass with respect to the total mass of the composition. .
- the pressure-sensitive adhesive composition does not fall under any of the isocyanate-based crosslinking agent, photopolymerization initiator, and solvent within the range not impairing the effects of the present invention.
- Other components may be contained.
- the other components may be known ones and can be arbitrarily selected according to the purpose, and are not particularly limited. Preferred examples include dyes, pigments, deterioration inhibitors, antistatic agents, flame retardants, silicone compounds, Various additives, such as a chain transfer agent, are mentioned.
- the pressure-sensitive adhesive layer may be composed of one layer (single layer) or may be composed of two or more layers.
- an adhesive layer consists of multiple layers, these multiple layers may be the same or different from each other. That is, all the layers may be the same, all the layers may be different, or only some of the layers may be the same. And when several layers differ from each other, the combination of these several layers is not specifically limited.
- “the plurality of layers are different from each other” means the same as in the case of the above-described base material.
- this pressure-sensitive adhesive layer when the pressure-sensitive adhesive layer is composed of one layer (single layer), this pressure-sensitive adhesive layer must be the above-mentioned (meth) acrylic acid alkyl ester copolymer obtained by using the above-mentioned pressure-sensitive adhesive composition. It becomes the containing layer.
- the pressure-sensitive adhesive layer is composed of a plurality of layers, of these multiple layers, the layer that is at least in contact with the protective film-forming film (that is, the furthest away from the substrate in the thickness direction of the pressure-sensitive adhesive layer). (Hereinafter sometimes referred to as the uppermost layer) is necessarily a layer containing the (meth) acrylic acid alkyl ester copolymer obtained by using the above-mentioned pressure-sensitive adhesive composition.
- the pressure-sensitive adhesive layer is composed of a plurality of layers
- one or more layers other than the layer in contact with the protective film-forming film are all layers containing the (meth) acrylic acid alkyl ester copolymer.
- it may be a layer that does not contain the (meth) acrylic acid alkyl ester copolymer, or may be a layer that only partially contains the (meth) acrylic acid alkyl ester copolymer. Good.
- the composite film for forming a protective film has an advantage that it can be manufactured at low cost because the configuration is simplified.
- the layer that is in contact with the protective film-forming film that is, the uppermost layer
- the (meth) acrylic is referred to as the (meth) acrylic.
- the effect of this invention is acquired by setting it as the layer containing an acid alkylester copolymer.
- a layer that is in contact with the base material that is, a layer adjacent to the base material in the thickness direction of the pressure-sensitive adhesive layer, hereinafter may be referred to as the lowermost layer
- the protective film-forming composite sheet is further improved in stability during use.
- the pressure-sensitive adhesive layer not containing the (meth) acrylic acid alkyl ester copolymer may be, for example, the same as the conventional pressure-sensitive adhesive layer.
- the total thickness of each layer may be set to the thickness of the preferable pressure-sensitive adhesive layer.
- the protective film-forming film has thermosetting properties, may have pressure-sensitive adhesive properties, or may be affixed to various adherends by heating and softening.
- the protective film-forming film eventually becomes a protective film with high impact resistance after thermosetting, and this protective film also has excellent shear strength and maintains sufficient adhesive properties even under severe high temperature and high humidity conditions. obtain.
- the thickness of the protective film-forming film is not particularly limited, but is preferably 1 to 100 ⁇ m, more preferably 5 to 75 ⁇ m, and particularly preferably 5 to 50 ⁇ m.
- the thickness of the protective film-forming film is equal to or more than the lower limit value, the adhesive force to the adherend semiconductor wafer and semiconductor chip is further increased.
- the protective film which is a cured product, can be more easily cut using a shearing force when the semiconductor chip is picked up.
- the protective film-forming film is not particularly limited as long as it is a thermosetting film.
- Preferred examples of the protective film-forming film include those containing a polymer component (A) and a thermosetting component (B).
- the polymer component (A) is a component that can be regarded as formed by polymerization reaction of the polymerizable compound.
- the thermosetting component (B) is a component that can be cured (polymerized) by heat.
- the polymerization reaction includes a polycondensation reaction.
- the film for forming a protective film can be formed from a composition for forming a protective film containing components for constituting the film.
- the content ratio of components that do not vaporize at room temperature is usually the same as the content ratio of the components of the film for forming a protective film.
- Preferred protective film forming compositions include, for example, those containing a polymer component (A) and a thermosetting component (B), and the polymer component (A), thermosetting component (B) and curing. What contains a promoter (C) is more preferable.
- the polymer component (A) is a polymer compound for imparting film-forming properties, flexibility and the like to the protective film-forming film.
- the polymer component (A) may also correspond to the thermosetting component (B).
- a phenoxy resin, an acrylic resin having an epoxy group in a side chain, and the like correspond to the polymer component (A) and may also correspond to the thermosetting component (B).
- Such a component is handled as the polymer component (A).
- a polymer component (A) may be used individually by 1 type, and may use 2 or more types together.
- polymer component (A) examples include acrylic resins, polyesters, polyurethanes, acrylic urethane resins, silicone resins, rubber polymers, phenoxy resins, and the like, and acrylic resins are preferable.
- the weight average molecular weight (Mw) of the acrylic resin is preferably 10,000 to 2,000,000, and more preferably 100,000 to 1500,000.
- Mw weight average molecular weight
- the weight average molecular weight of the acrylic resin is equal to or higher than the lower limit, the adhesive force between the protective film described later and the pressure-sensitive adhesive layer after curing is suppressed, and the pickup property of the semiconductor chip with the protective film is further improved. To do.
- the weight average molecular weight of the acrylic resin is equal to or less than the above upper limit value, the protective film-forming film easily follows the uneven surface of the adherend, and between the adherend and the protective film-forming film. Generation of voids and the like is further suppressed.
- “weight average molecular weight” is a polystyrene equivalent value measured by gel permeation chromatography (GPC) method unless otherwise specified.
- the glass transition temperature (Tg) of the acrylic resin is preferably ⁇ 60 to 70 ° C., and more preferably ⁇ 30 to 50 ° C.
- Tg of the acrylic resin is equal to or higher than the lower limit, the peeling force between the protective film described later and the pressure-sensitive adhesive layer after curing is reduced, and the pick-up property of the semiconductor chip with the protective film is further improved.
- the Tg of the acrylic resin is equal to or less than the upper limit, the adhesive force between the protective film-forming film and the semiconductor wafer is increased, and the semiconductor wafer can be more stably fixed.
- Examples of the monomer constituting the acrylic resin include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, ( Isooctyl (meth) acrylate, n-octyl (meth) acrylate, n-nonyl (meth) acrylate, isononyl (meth) acrylate, decyl (meth) acrylate, undecyl (meth) acrylate, (meth) acrylic acid Dodecyl (lauryl (meth) acrylate), tridecyl (meth) acrylate, tetradecyl (meth) acrylate (myristyl (meth) acrylate), pentadecyl (meth) acrylate, hexadecyl (meth) acrylate ((
- the acrylic resin may be a copolymer of monomers such as acrylic acid, methacrylic acid, itaconic acid, vinyl acetate, acrylonitrile, styrene, and N-methylolacrylamide.
- the monomer constituting the acrylic resin may be only one type or two or more types.
- the acrylic resin may have a functional group that can be bonded to other compounds such as a vinyl group, a (meth) acryloyl group, an amino group, a hydroxyl group, a carboxy group, and an isocyanate group.
- the functional group may be bonded to another compound via a cross-linking agent (F) described later, or may be directly bonded to another compound not via the cross-linking agent (F).
- F cross-linking agent
- the content of the acrylic resin in the protective film-forming composition is other than the solvent in the protective film-forming composition. It is preferably 5 to 50% by mass based on the total mass of all components.
- the content of the acrylic resin is within such a range, the peeling force between the protective film and the cured pressure-sensitive adhesive layer is reduced, and the pick-up property of the semiconductor chip with the protective film is further improved.
- the protective film-forming film contains an acrylic resin as the polymer component (A)
- the content of the acrylic resin in the protective film-forming film is based on the total mass of the protective film-forming film. The content is preferably 5 to 50% by mass.
- thermoplastic resin other than an acrylic resin (hereinafter sometimes simply referred to as “thermoplastic resin”) may be used alone or in combination with an acrylic resin.
- the weight average molecular weight of the thermoplastic resin is preferably 1000 to 100,000, more preferably 3000 to 80,000.
- the glass transition temperature (Tg) of the thermoplastic resin is preferably ⁇ 30 to 150 ° C., and more preferably ⁇ 20 to 120 ° C.
- thermoplastic resin examples include polyester, polyurethane, phenoxy resin, polybutene, polybutadiene, and polystyrene.
- thermoplastic resin may be used alone or in combination of two or more.
- thermosetting component (B) is a component for curing the protective film-forming film to form a hard protective film.
- a thermosetting component (B) may correspond also to a polymer component (A), such a component is handled as a polymer component (A).
- a thermosetting component (B) may be used individually by 1 type, and may use 2 or more types together.
- thermosetting component (B) examples include epoxy thermosetting resins, thermosetting polyimide resins, polyurethanes, unsaturated polyesters, and silicone resins, and epoxy thermosetting resins are preferable.
- Epoxy thermosetting resin consists of an epoxy resin (B11) and a thermosetting agent (B12). Epoxy thermosetting resin may be used individually by 1 type, and may use 2 or more types together.
- Examples of the epoxy resin (B11) include known ones such as polyfunctional epoxy resins, biphenyl compounds, bisphenol A diglycidyl ether and hydrogenated products thereof, orthocresol novolac epoxy resins, dicyclopentadiene type epoxy resins, Biphenyl type epoxy resins, bisphenol A type epoxy resins, bisphenol F type epoxy resins, phenylene skeleton type epoxy resins, and the like, and bifunctional or higher functional epoxy compounds are listed. Among these, bisphenol A type epoxy resins and dicyclopentadiene type epoxy resins are preferable.
- an epoxy resin having an unsaturated hydrocarbon group may be used.
- an epoxy resin which has an unsaturated hydrocarbon group the compound formed by converting a part of epoxy group of a polyfunctional epoxy resin into the group containing an unsaturated hydrocarbon group is mentioned, for example.
- the number average molecular weight of the epoxy resin (B11) is not particularly limited, but is preferably 100 to 20000 from the viewpoints of the curability of the protective film-forming film and the strength and heat resistance of the protective film after curing.
- the “number average molecular weight” is a value in terms of polystyrene measured by a gel permeation chromatography (GPC) method.
- the epoxy equivalent of the epoxy resin (B11) is preferably 100 to 1100 g / eq, and more preferably 150 to 1000 g / eq.
- the epoxy resin (B11) may be used alone or in combination of two or more.
- thermosetting agent (B12) functions as a curing agent for the epoxy resin (B11).
- a thermosetting agent (B12) the compound which has 2 or more of functional groups which can react with an epoxy group in 1 molecule is mentioned, for example.
- the functional group include a phenolic hydroxyl group, an alcoholic hydroxyl group, an amino group, a carboxy group, a group in which an acid group has been anhydrideized, and the like, and a phenolic hydroxyl group, an amino group, or an acid group has been anhydrideized. It is preferably a group, more preferably a phenolic hydroxyl group or an amino group, and particularly preferably an amino group.
- thermosetting agents (B12) examples include polyfunctional phenolic resins, biphenols, novolac-type phenolic resins, dicyclopentadiene-based phenolic resins, and aralkylphenolic resins.
- examples of the amine-based curing agent having an amino group include dicyandiamide (hereinafter sometimes abbreviated as “DICY”).
- the thermosetting agent (B12) may have an unsaturated hydrocarbon group.
- the thermosetting agent (B12) having an unsaturated hydrocarbon group for example, a compound in which a part of the hydroxyl group of the phenol resin is substituted with a group having an unsaturated hydrocarbon group, an aromatic ring of the phenol resin, Examples thereof include compounds in which a group having a saturated hydrocarbon group is directly bonded.
- the unsaturated hydrocarbon group in the thermosetting agent (B12) is the same as the unsaturated hydrocarbon group in the epoxy resin having an unsaturated hydrocarbon group described above.
- thermosetting agent (B12) may be used individually by 1 type, and may use 2 or more types together.
- thermosetting agent (B12) is a solid that is solid at normal temperature and does not exhibit curing activity with respect to the epoxy resin (B11), while it is dissolved by heating and exhibits curing activity with respect to the epoxy resin (B11). It is preferably a curing agent (hereinafter sometimes abbreviated as “solid dispersion type latent curing agent”). That is, the protective film-forming film preferably contains an epoxy resin (B11) and the solid dispersion type latent curing agent as a thermosetting agent (B12).
- the solid dispersion type latent curing agent is stably dispersed in the epoxy resin (B11) in the protective film-forming film at room temperature, but is compatible with the epoxy resin (B11) by heating, and the epoxy resin ( Reacts with B11).
- the storage stability of the protective film-forming composite sheet is significantly improved. For example, the movement of the curing agent from the protective film-forming film to the adjacent pressure-sensitive adhesive layer is suppressed, and a decrease in thermosetting of the protective film-forming film is effectively suppressed. And since the thermosetting degree by the heating of the film for protective film formation becomes higher, the pick-up property of the semiconductor chip with a protective film mentioned later improves more.
- solid dispersion type latent curing agent examples include onium salts, dibasic acid hydrazides, dicyandiamides, amine adducts of curing agents, and the like.
- the content of the thermosetting agent (B12) in the protective film-forming composition and the protective film-forming film is 0.1 to 500 parts by mass when the content of the epoxy resin (B11) is 100 parts by mass. It is preferably 1 to 200 parts by mass.
- the content of the thermosetting agent (B12) is equal to or more than the lower limit, curing of the protective film-forming film is more likely to proceed. Moreover, the moisture absorption rate of the film for protective film formation is reduced, and package reliability improves more because the said content of a thermosetting agent (B12) is below the said upper limit.
- the content of the thermosetting component (B) in the protective film-forming composition and the protective film-forming film is 1 to 100 parts by mass when the content of the polymer component (A) is 100 parts by mass. It is preferably 1.5 to 85 parts by mass, more preferably 2 to 70 parts by mass.
- the adhesive force (peeling force) between the protective film and the pressure-sensitive adhesive layer after curing becomes smaller, and the semiconductor chip with the protective film The pick-up property is improved.
- a hardening accelerator (C) is a component for adjusting the hardening rate of the composition for protective film formation.
- Preferred curing accelerators (C) include, for example, tertiary amines such as triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris (dimethylaminomethyl) phenol; 2-methylimidazole, 2-phenylimidazole Imidazoles such as 2-phenyl-4-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole (ie, at least one hydrogen atom is hydrogen Imidazole substituted with a group other than atoms); Organic phosphines such as tributylphosphine, diphenylphosphine, triphenylphosphine (phosphine in which at least one hydrogen atom is substituted with an organic group); tetrapheny
- a hardening accelerator (C) may be used individually by 1 type, and may use 2 or more types together.
- the composition for forming a protective film preferably contains the imidazole as a curing accelerator (C), particularly when the solid dispersion type latent curing agent is contained as the thermosetting agent (B12). That is, the protective film-forming film preferably contains an epoxy resin (B11), the solid dispersion type latent curing agent as a thermosetting agent (B12), and an imidazole as a curing accelerator (C). . That is, one side surface of the film for forming a protective film includes a polymer component (A), an epoxy resin (B11), the solid dispersion type latent curing agent as a thermosetting agent (B12), and a curing accelerator (C ) And imidazoles.
- C curing accelerator
- content of the hardening accelerator (C) in the composition for protective film formation and the film for protective film formation made content of a thermosetting component (B) 100 mass parts. Is preferably 0.01 to 10 parts by mass, more preferably 0.1 to 4 parts by mass.
- the content of the curing accelerator (C) is in such a range, the protective film-forming film has excellent adhesive properties even under high temperature and high humidity conditions, and is exposed to severe reflow conditions. Even so, high package reliability can be achieved.
- the effect by using a hardening accelerator (C) is acquired more notably because the said content of a hardening accelerator (C) is more than the said lower limit.
- the curing accelerator (C) since the content of the curing accelerator (C) is not more than the upper limit, the curing accelerator (C) is usually highly polar, but a protective film-forming film under high temperature and high humidity conditions. The reliability of the package is improved by suppressing the precipitation at the adhesive interface with the adherend.
- the protective film-forming film does not fall under these, if necessary. It may be formed from a composition for forming a protective film containing other components.
- a filler (D) As said other component which the composition for protective film formation and the film for protective film formation contain, a filler (D), a coupling agent (E), a crosslinking agent (F), a general purpose additive (G), etc., for example. Is mentioned.
- the composition for forming a protective film usually contains the filler (D), so that the thermal expansion coefficient can be easily adjusted. Therefore, package reliability can be improved by using such a composition for forming a protective film to optimize the thermal expansion coefficient of the cured protective film with respect to the semiconductor chip. Moreover, the moisture absorption rate of the protective film after hardening can also be reduced normally by using the composition for protective film formation containing a filler (D).
- the filler (D) may be either an organic filler or an inorganic filler, but is preferably an inorganic filler.
- Preferred inorganic fillers include, for example, powders such as silica, alumina, talc, calcium carbonate, titanium white, bengara, silicon carbide, and boron nitride; beads formed by spheroidizing these silicas; single crystal fibers such as silica; glass Examples thereof include fibers.
- the inorganic filler is preferably a silica filler or an alumina filler.
- the filler (D) may be used alone or in combination of two or more.
- the content of the filler (D) with respect to the total mass of components other than the solvent of the composition for forming a protective film (that is, the content of the filler (D) in the film for forming a protective film) ) Is preferably 5 to 80% by mass, more preferably 7 to 60% by mass. Adjustment of said thermal expansion coefficient becomes easier because content of a filler (D) is such a range.
- Coupling agent (E) By using a coupling agent (E) having a functional group that reacts with an inorganic compound or an organic compound, the adhesion and adhesion of the protective film-forming film to the adherend can be improved. Moreover, water resistance improves the protective film obtained by hardening
- the coupling agent (E) is preferably a compound having a functional group that reacts with the functional group of the polymer component (A), the thermosetting component (B), etc., and is preferably a silane coupling agent.
- Preferred examples of the silane coupling agent include ⁇ -glycidoxypropyltrimethoxysilane, ⁇ -glycidoxypropylmethyldiethoxysilane, ⁇ - (3,4-epoxycyclohexyl) ethyltrimethoxysilane, ⁇ - ( Methacryloxypropyl) trimethoxysilane, ⁇ -aminopropyltrimethoxysilane, N-6- (aminoethyl) - ⁇ -aminopropyltrimethoxysilane, N-6- (aminoethyl) - ⁇ -aminopropylmethyldiethoxysilane N-phenyl- ⁇ -aminopropyltrimethoxysilane, ⁇
- the coupling agent (E) may be used alone or in combination of two or more.
- the content of the coupling agent (E) in the protective film-forming composition and the protective film-forming film is the total of the polymer component (A) and the thermosetting component (B).
- the content is 100 parts by mass, it is preferably 0.03 to 20 parts by mass, more preferably 0.05 to 10 parts by mass, and particularly preferably 0.1 to 5 parts by mass.
- the content of the coupling agent (E) is equal to or higher than the lower limit, the effect of using the coupling agent (E) is more remarkably obtained, and the content of the coupling agent (E) is By being below the upper limit value, outgas generation is further suppressed.
- Crosslinking agent (F) When the above-mentioned acrylic resin having a functional group such as vinyl group, (meth) acryloyl group, amino group, hydroxyl group, carboxy group, or isocyanate group that can be bonded to another compound is used as the polymer component (A). In order to bond this functional group with another compound to crosslink, a crosslinking agent (F) can be used. By crosslinking using the crosslinking agent (F), the initial adhesive force and cohesive force of the protective film-forming film can be adjusted.
- a crosslinking agent (F) By crosslinking using the crosslinking agent (F), the initial adhesive force and cohesive force of the protective film-forming film can be adjusted.
- crosslinking agent (F) examples include organic polyvalent isocyanate compounds and organic polyvalent imine compounds.
- organic polyvalent isocyanate compound examples include aromatic polyvalent isocyanate compounds, aliphatic polyvalent isocyanate compounds, alicyclic polyvalent isocyanate compounds, trimers of these compounds, isocyanurates, and adducts (ethylene glycol, A reaction product with a low molecular active hydrogen-containing compound such as propylene glycol, neopentyl glycol, trimethylolpropane or castor oil, for example, xylylene diisocyanate adduct of trimethylolpropane), an organic polyvalent isocyanate compound and a polyol compound The terminal isocyanate urethane prepolymer etc. which are made to react are mentioned.
- organic polyvalent isocyanate compound examples include 2,4-tolylene diisocyanate; 2,6-tolylene diisocyanate; 1,3-xylylene diisocyanate; 1,4-xylene diisocyanate; diphenylmethane-4,4′-diisocyanate.
- organic polyvalent imine compound examples include N, N′-diphenylmethane-4,4′-bis (1-aziridinecarboxamide), trimethylolpropane-tri- ⁇ -aziridinylpropionate, and tetramethylolmethane.
- -Tri- ⁇ -aziridinylpropionate, N, N′-toluene-2,4-bis (1-aziridinecarboxamide) triethylenemelamine and the like.
- an isocyanate type crosslinking agent as a crosslinking agent (F)
- a hydroxyl-containing polymer as said acrylic resin which is a polymer component (A).
- the crosslinking agent (F) has an isocyanate group and the acrylic resin has a hydroxyl group, a crosslinked structure can be easily introduced into the protective film-forming film by the reaction between the crosslinking agent (F) and the acrylic resin.
- the content of the crosslinking agent (F) in the composition for forming a protective film is 0.01 to 20 parts by mass when the content of the polymer component (A) is 100 parts by mass. It is preferably 0.1 to 10 parts by mass, and more preferably 0.5 to 5 parts by mass.
- General-purpose additive (G) examples include known plasticizers, antistatic agents, antioxidants, pigments, dyes, gettering agents, and the like.
- the protective film-forming composition preferably further contains a solvent because its handleability is improved by dilution.
- the solvent contained in the composition for forming a protective film may be the same as the solvent in the above-mentioned pressure-sensitive adhesive composition.
- the solvent contained in the composition for forming a protective film may be only one type or two or more types.
- the content of the solvent is such that the solid content concentration of the protective film-forming composition is 35 to 75% by mass with respect to the total mass of the protective film-forming composition. It is preferable that the amount is as follows.
- composition for forming a protective film includes a polymer component (A), a thermosetting component (B), a curing accelerator (C), and optionally a solvent, a filler (D), And at least one selected from the group consisting of a coupling agent (E), a crosslinking agent (F), and a general-purpose additive (G).
- the thermosetting component (B) includes an epoxy resin (B11) and the solid dispersion type latent curing agent as a thermosetting agent (B12), and the curing accelerator (C) contains imidazoles. It is preferable to include.
- the composition for forming a protective film is obtained by blending the above-mentioned components for constituting this, and is obtained by the same method as in the case of the above-mentioned pressure-sensitive adhesive composition, for example, except that the blending components are different. It is done.
- a solvent it may be used by mixing the solvent with any compounding component other than the solvent and diluting the compounding component in advance, or by diluting any compounding component other than the solvent in advance. You may use it by mixing a solvent with these compounding ingredients, without leaving.
- the protective film-forming composite sheet may include a release film on an exposed surface such as the surface of the protective film-forming film or the surface of the pressure-sensitive adhesive layer.
- the release film may be peeled off (removed) during use of the protective film-forming composite sheet.
- FIG. 1 is a cross-sectional view schematically showing one embodiment of a composite sheet for forming a protective film according to the present invention.
- the protective film-forming composite sheet 1 shown here includes a pressure-sensitive adhesive layer 12 on a base material 11 and a protective film-forming film 13 on the pressure-sensitive adhesive layer 12. On the layer 12, it has the structure provided with the film 13 for protective film formation. Further, the protective film-forming composite sheet 1 further includes a release film 14 on the protective film-forming film 13.
- the pressure-sensitive adhesive layer 12 in contact with the protective film-forming film 13 has a structural unit derived from a (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the alkyl group constituting the alkyl ester. ) A layer containing an alkyl acrylate copolymer.
- the pressure-sensitive adhesive layer 12 is laminated on the surface 11 a of the substrate 11, and the protective film-forming film 13 is laminated on a part of the surface 12 a of the pressure-sensitive adhesive layer 12.
- the release film 14 is laminated on the exposed surface of the surface 12a of the pressure-sensitive adhesive layer 12 where the protective film-forming film 13 is not laminated and on the surface 13a (upper surface and side surfaces) of the protective film-forming film 13.
- a gap may exist between the release film 14 and the surface 12 a of the pressure-sensitive adhesive layer 12 or the surface 13 a of the protective film-forming film 13.
- the region indicated by reference numeral 130a the region on the pressure-sensitive adhesive layer 12 side
- the region on the film 13 side is likely to cause the voids between the release film 14. That is, in the region in the vicinity of the boundary between the protective film-forming film 13 and the pressure-sensitive adhesive layer 12 and in contact with the release film 14, a void is easily generated.
- the composite sheet 1 for forming a protective film shown in FIG. 1 has a back surface of a semiconductor wafer (not shown) attached to the front surface 13a of the protective film forming film 13 with the release film 14 removed.
- the exposed surface on which the protective film forming film 13 is not laminated is attached to a jig such as a ring frame and used.
- FIG. 2 is a cross-sectional view schematically showing another embodiment of the composite sheet for forming a protective film according to the present invention.
- the protective film forming composite sheet 2 shown here has a protective film forming film 23 laminated on the entire surface 12 a of the pressure-sensitive adhesive layer 12, and a jig adhesive on a part of the surface 23 a of the protective film forming film 23.
- Layer 15 is laminated, of the surface 23a of the protective film forming film 23, the exposed surface on which the jig adhesive layer 15 is not laminated, and the surface 15a (upper surface and side surfaces) of the jig adhesive layer 15 It is the same as the composite sheet 1 for forming a protective film shown in FIG. 1 except that a release film 14 is laminated thereon.
- the pressure-sensitive adhesive layer 12 in contact with the protective film-forming film 23 has a structural unit derived from a (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the alkyl group constituting the alkyl ester. ) It contains an acrylic acid alkyl ester copolymer.
- one side of the composite sheet for forming a protective film according to the present invention is: Including a base material, an adhesive layer, a protective film-forming film, an adhesive layer for a jig, and a release film,
- the pressure-sensitive adhesive layer is laminated on the base material
- the protective film-forming film is laminated on the entire surface of the pressure-sensitive adhesive layer
- the adhesive layer for jigs is laminated on a part of the surface of the protective film-forming film
- the release film is laminated on the exposed surface on which the jig adhesive layer is not laminated, and on the upper surface and side surfaces of the jig adhesive layer
- the pressure-sensitive adhesive layer in contact with the protective film-forming film has a structural unit derived from a (meth) acrylic acid alkyl ester having 8 to 18 carbon atoms in the alkyl group constituting the alkyl ester, Containing a (meth) acrylic acid alkyl ester copolymer, It
- the jig adhesive layer 15 may have, for example, a single-layer structure containing an adhesive component, or a plurality of layers in which layers containing an adhesive component are laminated on both surfaces of a core sheet. It may be of a structure.
- a gap may exist between the release film 14 and the surface 23a of the protective film-forming film 23 or the surface 15a of the jig adhesive layer 15.
- the surface 15 a of the jig adhesive layer 15 an area indicated by reference numeral 150 a (an area on the protective film forming film 23 side) and an area indicated by reference numeral 230 a in the surface 23 a of the protective film forming film 23.
- the gap portion is easily formed between the release film 14 and (the region on the jig adhesive layer 15 side). That is, in the vicinity of the boundary between the jig adhesive layer 15 and the protective film-forming film 23 and in the region in contact with the release film 14, voids are likely to occur.
- the protective film-forming composite sheet 2 shown in FIG. 2 has a semiconductor wafer (not shown) attached to the front surface 23a of the protective film-forming film 23 with the release film 14 removed.
- the upper surface of the surface 15a of the adhesive layer 15 is used by being attached to a jig such as a ring frame.
- FIG. 3 is a sectional view schematically showing still another embodiment of the composite sheet for forming a protective film according to the present invention.
- the protective film-forming composite sheet 3 shown here is an adhesive having a two-layer structure in which a first adhesive layer 321 and a second adhesive layer 322 are laminated in this order from the substrate 11 side instead of the adhesive layer 12. Except for having the agent layer 32, it is the same as the composite sheet 1 for forming a protective film shown in FIG.
- the second pressure-sensitive adhesive layer 322 has the same area as the protective film-forming film 13, and the protective film-forming film 13 has a peripheral portion. They are arranged so as to overlap.
- the protective film-forming film 13 is provided on the surface 32a of the pressure-sensitive adhesive layer 32 opposite to the substrate side (that is, the surface 322a of the second pressure-sensitive adhesive layer 322). And the 1st adhesive layer 321 is provided so that the whole surface 11a of the base material 11 may be coat
- the area is larger than 322.
- the second pressure-sensitive adhesive layer 322 that is in contact with the protective film-forming film 13 is made of (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the alkyl group constituting the alkyl ester.
- the (meth) acrylic acid alkyl ester copolymer having a derived structural unit is contained.
- the 1st adhesive layer 321 which is not in contact with the film 13 for protective film formation may contain the said (meth) acrylic-acid alkylester copolymer, and does not need to contain it.
- one side of the composite sheet for forming a protective film according to the present invention is: A base material, a first pressure-sensitive adhesive layer, a second pressure-sensitive adhesive layer, a protective film-forming film, a jig adhesive layer, and a release film,
- the first pressure-sensitive adhesive layer is provided on the substrate so as to cover the upper surface of the substrate.
- the second pressure-sensitive adhesive layer is provided on the first pressure-sensitive adhesive layer,
- the protective film-forming film is provided on the second pressure-sensitive adhesive layer such that the second pressure-sensitive adhesive layer and a peripheral portion overlap each other.
- the release film has an upper surface and a side surface of the protective film-forming film, a side surface of the second pressure-sensitive adhesive layer, and a surface on which the second pressure-sensitive adhesive layer in the first pressure-sensitive adhesive layer is not laminated.
- the second pressure-sensitive adhesive layer has the same area as the protective film-forming film
- the first pressure-sensitive adhesive layer has a larger area than the second pressure-sensitive adhesive layer
- the second pressure-sensitive adhesive layer has a structural unit derived from a (meth) acrylic acid alkyl ester having 8 to 18 carbon atoms in the alkyl group constituting the alkyl ester, Containing coalescing, It is a composite sheet for forming a protective film.
- FIG. 4 is a cross-sectional view schematically showing still another embodiment of the protective film-forming composite sheet according to the present invention.
- the protective film-forming composite sheet 4 shown here is an adhesive having a two-layer structure in which a first adhesive layer 421 and a second adhesive layer 422 are laminated in this order from the substrate 11 side instead of the adhesive layer 12. Except for the provision of the agent layer 42, it is the same as the protective film-forming composite sheet 2 shown in FIG.
- the first adhesive layer 421 and the second adhesive layer 422 have the same area as the protective film forming film 23.
- the protective film-forming film 23 is provided on the surface 42 a of the pressure-sensitive adhesive layer 42 (that is, the surface 422 a of the second pressure-sensitive adhesive layer 422).
- the second pressure-sensitive adhesive layer 422 that is in contact with the protective film-forming film 23 is made of (meth) acrylic acid alkyl ester in which the alkyl group constituting the alkyl ester has 8 or more carbon atoms.
- the (meth) acrylic acid alkyl ester copolymer having a derived structural unit is contained.
- the 1st adhesive layer 421 which is not in contact with the film 23 for protective film formation may contain the said (meth) acrylic-acid alkylester copolymer, and does not need to contain it.
- one side of the composite sheet for forming a protective film according to the present invention is: A base material, a first pressure-sensitive adhesive layer, a second pressure-sensitive adhesive layer, a protective film-forming film, a jig adhesive layer, and a release film,
- the first pressure-sensitive adhesive layer is laminated on the base material
- the second pressure-sensitive adhesive layer is laminated on the first pressure-sensitive adhesive layer
- the protective film-forming film is laminated on the second pressure-sensitive adhesive layer
- the adhesive layer for jigs is laminated on a part of the surface of the protective film-forming film, Of the surface of the protective film forming film, the release film is laminated on the exposed surface on which the jig adhesive layer is not laminated, and on the upper surface and side surfaces of the jig adhesive layer,
- the first pressure-sensitive adhesive layer, the second pressure-sensitive adhesive layer 422, and the protective film-forming film 23 have the same area
- the composite sheet for forming a protective film according to the present invention is not limited to that shown in FIGS. 1 to 4, and a part of the configuration shown in FIGS. 1 to 4 is changed or deleted within a range not impairing the effects of the present invention.
- other configurations may be added to those described above.
- the second adhesive layer 322 has the same area as the protective film-forming film 13 when viewed from above and viewed from above, although the area is smaller than that of the first pressure-sensitive adhesive layer 321, the area of the second pressure-sensitive adhesive layer 322 may not be the same as that of the protective film-forming film 13. In this case, the second adhesive layer 322 may have the same area as the first adhesive layer 321.
- the adhesive layer has a two-layer structure, but the adhesive layer has three or more layers.
- a laminated structure may be used.
- the layer in contact with the protective film-forming film that is, the uppermost layer farthest from the base material in the thickness direction of the pressure-sensitive adhesive layer
- the meth) acrylic acid alkyl ester copolymer is contained, and the other layers may or may not contain the (meth) acrylic acid alkyl ester copolymer.
- peeling force before curing the adhesive layer is preferably 2000 mN / 25 mm or more, more preferably 2200 mN / 25 mm or more.
- the cured adhesive layer was peeled at an angle of 180 °, a temperature of 23 ° C., and a tensile speed of 300 mm / min.
- the peel force measured as the load when peeled from the protective film with the following (hereinafter, sometimes referred to as “peeling force after curing the adhesive layer”) is preferably 2000 mN / 25 mm or less, for example, 1700 mN / 25 mm or less. It is also possible to set it to 1200 mN / 25 mm or less, 700 mN / 25 mm or less, or the like.
- the ratio of the peeling force before curing the adhesive layer to the peeling force after curing the adhesive layer is preferably 1.5 or more, and can be, for example, 3 or more, 6 or more, 12 or more.
- the composite sheet for forming a protective film according to the present invention includes, for example, forming a pressure-sensitive adhesive layer from the pressure-sensitive adhesive composition on a substrate, and forming the protective film-forming film from the protective film-forming composition on the pressure-sensitive adhesive layer. It can manufacture by forming.
- the pressure-sensitive adhesive layer can be formed by applying a pressure-sensitive adhesive composition to the surface of the base material (the surface 11a of the base material 11 in FIGS. 1 and 2) and drying it. At this time, you may bridge
- the heating condition is preferably, for example, 100 to 130 ° C. for 1 to 5 minutes, but is not limited thereto.
- the pressure-sensitive adhesive layer can also be formed by applying a pressure-sensitive adhesive composition to the surface of the release layer of the release material and drying the pressure-sensitive adhesive layer on the surface of the base material and removing the release material.
- Application of the pressure-sensitive adhesive composition to the surface of the base material or the surface of the release layer of the release material may be performed by a known method, for example, an air knife coater, blade coater, bar coater, gravure coater, roll coater, roll knife coater. And a method using various coaters such as a curtain coater, a die coater, a knife coater, a screen coater, a Meyer bar coater and a kiss coater.
- the protective film-forming film can be formed from the protective film-forming composition in the same manner as in the case where the pressure-sensitive adhesive layer is formed on the substrate as described above, but usually the protective film is formed on the pressure-sensitive adhesive layer. It is difficult to apply the composition directly. Therefore, for example, the protective film-forming film formed by applying the protective film-forming composition to the surface of the peeling layer of the peeling material and drying it is bonded to the surface of the pressure-sensitive adhesive layer, and the peeling material is removed. A method in which a protective film-forming film is separately formed and bonded to the surface of the pressure-sensitive adhesive layer is preferable.
- the composite sheet for forming a protective film according to the present invention includes, for example, a pressure-sensitive adhesive layer formed from the pressure-sensitive adhesive composition, and the protective film-forming film formed from the protective film-forming composition.
- the pressure-sensitive adhesive layer and the protective film-forming film are laminated to form a laminate, and the surface of the pressure-sensitive adhesive layer of the laminate (the surface on which the protective film-forming film of the pressure-sensitive adhesive layer is not provided) It can also be manufactured by laminating a substrate to the substrate.
- the formation conditions of the pressure-sensitive adhesive layer and the protective film-forming film in this case are the same as those described above.
- a protective film-forming film previously cut into a predetermined size and shape may be provided on the pressure-sensitive adhesive layer.
- the method for using the composite sheet for forming a protective film according to the present invention is as follows. That is, first, the back surface of the semiconductor wafer is attached to the protective film forming film of the protective film forming composite sheet, and the protective film forming composite sheet is fixed to the dicing apparatus. Next, the protective film-forming film is cured by heating (for example, heating at 130 ° C. for 2 hours) to form a protective film. When a back grind tape is affixed to the surface (electrode formation surface) of the semiconductor wafer, the protective film is usually formed after removing the back grind tape from the semiconductor wafer.
- the semiconductor wafer is diced into semiconductor chips.
- printing can be performed on the surface of the protective film by irradiating the protective film with laser light from the base material side of the protective film-forming composite sheet.
- the peeling force between the pressure-sensitive adhesive layer and the protective film before curing is sufficiently large, so even if gas is generated by laser printing, the peeling between the pressure-sensitive adhesive layer and the protective film is suppressed.
- the occurrence of gas accumulation is suppressed.
- the semiconductor wafer can be firmly and stably fixed on the protective film-forming composite sheet, chip jumping or the like is suppressed during dicing, and dicing can be performed stably.
- laser printing peeling between the pressure-sensitive adhesive layer and the protective film is suppressed as described above, and the occurrence of gas accumulation is also suppressed. It can be clearly recognized visually through the adhesive layer.
- the pressure-sensitive adhesive layer is cured by irradiation with active energy rays (for example, ultraviolet rays, electron beams, etc.), and the semiconductor chip is peeled off from the cured pressure-sensitive adhesive layer together with the protective film stuck on the back surface thereof, and picked up.
- active energy rays for example, ultraviolet rays, electron beams, etc.
- the back surface of the semiconductor wafer is attached to the protective film forming film 13 of the composite sheet 1 for forming a protective film, and the exposed adhesive layer 12 is affixed to a dicing jig (not shown) such as a ring frame to fix the protective film forming composite sheet 1 to the dicing apparatus.
- a dicing jig such as a ring frame to fix the protective film forming composite sheet 1 to the dicing apparatus.
- dicing jig such as a ring frame
- the composite sheet 1 for protective film formation it is necessary to adjust so that the specific area
- the composite sheet 1 for forming a protective film there is no need to separately provide a configuration for attaching the composite sheet 1 to the jig.
- the back surface of the semiconductor wafer is attached to the protective film forming film 23 of the protective film forming composite sheet 2 and the jig adhesive layer 15 is used.
- a dicing jig such as a ring frame to fix the protective film forming composite sheet 2 to the dicing apparatus.
- the adhesive layer 12 is cured by irradiation with active energy rays, and the semiconductor chip with the protective film is picked up.
- the protective film-forming composite sheet 2 when used, it is not necessary to adjust the specific region of the pressure-sensitive adhesive layer 23 so as not to be cured, unlike when the protective film-forming composite sheet 1 is used. It is.
- the protective film forming composite sheet 2 unlike the protective film forming composite sheet 1, the protective film forming composite sheet 2 is required to have a jig adhesive layer 15. By providing the adhesive layer 15 for jigs, a wide range of compositions can be selected as the pressure-sensitive adhesive layer 12 according to the purpose.
- the protective film-forming composite sheet according to the present invention is a sheet suitable for curing a pressure-sensitive adhesive layer after curing a protective film-forming film to form a protective film, and dicing a semiconductor wafer.
- the protective film-forming film is completely or almost completely cured.
- the composite sheet for protective film formation concerning this invention, there exists an effect that the peeling force of an adhesive layer and a protective film changes notably before and after hardening of an adhesive layer. This is because the pressure-sensitive adhesive layer contains a specific range of (meth) acrylic acid alkyl ester copolymer as an essential component.
- Patent Document 1 Japanese Patent Laid-Open No. 2011-228450
- Patent Document 1 Japanese Patent Laid-Open No. 2011-228450
- the protective film when picking up a semiconductor chip, the protective film The forming film remains in an uncured or partially cured state, and at the same time when the semiconductor chip is bonded and cured with a sealing material, the uncured or partially cured protective film forming film is completely or almost completely cured. Fully cured. That is, when this conventional composite sheet for forming a protective film is used, in the stage of dicing the semiconductor wafer and picking up the semiconductor chip, the film (film) attached to the back surface of the wafer and the chip is in the present invention. The characteristics are completely different from the ones.
- This document does not disclose any composition of the pressure-sensitive adhesive layer and the protective film-forming film, which is suitable when the protective film-forming film is cured before dicing.
- a protective sheet-forming composite sheet comprising a base material, an adhesive layer, and a protective film-forming film, The pressure-sensitive adhesive layer is laminated on the base material, and the protective film-forming film is laminated on the pressure-sensitive adhesive layer;
- the pressure-sensitive adhesive layer is Has active energy ray curability, In a layer that is in contact with at least the protective film-forming film, containing a (meth) acrylic acid alkyl ester copolymer, The (meth) acrylic acid alkyl ester copolymer is a copolymer having a structural unit derived from a (meth) acrylic acid alkyl ester having 8 to 18 carbon atoms in the alkyl group constituting the alkyl ester;
- the protective film-forming film has thermosetting properties;
- the protective film-forming composite sheet is cut to a size of 25 mm ⁇ 150 mm, and then attached to a silicon wafer at 70 ° C., and then the protective film-
- the protective film-forming composite sheet has a (peeling strength before curing the pressure-sensitive adhesive layer) of 2000 mN / 25 mm or more, preferably 2300 mN / 25 mm or more and 6300 mN / 25 mm or less.
- the adhesive layer is cured
- the peeling force between the adhesive layer after curing and the protective film (peeling force after curing the adhesive layer) under the conditions of a peeling angle of 180 °, a measurement temperature of 23 ° C., and a tensile speed of 300 mm / min is 2000 mN / 25 mm. Or less, preferably 500 mN / 25 mm or more and 1500 mN / 25 mm or less.
- a protective sheet-forming composite sheet comprising a base material, an adhesive layer, and a protective film-forming film,
- the pressure-sensitive adhesive layer is laminated on the base material, and the protective film-forming film is laminated on the pressure-sensitive adhesive layer;
- the pressure-sensitive adhesive layer is Has active energy ray curability,
- At least the layer in contact with the protective film-forming film comprises a (meth) acrylic acid alkyl ester copolymer, an isocyanate-based crosslinking agent, a photopolymerization initiator, a solvent, and optionally other components.
- the (meth) acrylic acid alkyl ester copolymer is a copolymer having a structural unit derived from a (meth) acrylic acid alkyl ester having 8 to 18 carbon atoms in the alkyl group constituting the alkyl ester, Preferably at least one selected from the group consisting of 2-ethylhexyl acrylate, lauryl methacrylate and isostearyl acrylate;
- the content of the structural unit derived from a (meth) acrylic acid alkyl ester having 8 or more carbon atoms in the alkyl group is based on the total mass of all the structural units constituting the (meth) acrylic acid alkyl ester copolymer.
- the protective film-forming film has thermosetting properties; and the polymer component (A), Preferably, at least one selected from the group consisting of acrylic resin, polyester, polyurethane, acrylic urethane resin, silicone resin, rubber polymer, and phenoxy resin, More preferably an acrylic polymer;
- the protective film-forming composite sheet has a (peeling strength before curing the pressure-sensitive adhesive layer) of 2000 mN / 25 mm or more, preferably 2300 mN / 25 mm or more and 6300 mN / 25 mm or less.
- the adhesive layer is cured
- the peeling force between the adhesive layer after curing and the protective film (peeling force after curing the adhesive layer) under the conditions of a peeling angle of 180 °, a measurement temperature of 23 ° C., and a tensile speed of 300 mm / min is 2000 mN / 25 mm. Or less, preferably 500 mN / 25 mm or more and 1500 mN / 25 mm or less.
- Another aspect of the present invention is: Use of a composite sheet for protective film formation for manufacturing a semiconductor chip with a protective film, wherein the composite sheet for protective film formation includes a substrate, an adhesive layer, and a film for forming a protective film, The pressure-sensitive adhesive layer is laminated on the base material, and the protective film-forming film is laminated on the pressure-sensitive adhesive layer;
- the pressure-sensitive adhesive layer is Has active energy ray curability, In a layer that is in contact with at least the protective film-forming film, containing a (meth) acrylic acid alkyl ester copolymer,
- the (meth) acrylic acid alkyl ester copolymer is a copolymer having a structural unit derived from a (meth) acrylic acid alkyl ester having 8 to 18 carbon atoms in the alkyl group constituting the alkyl ester;
- the protective film-forming film has thermosetting properties;
- the protective film-forming composite sheet is cut to a size of 25 mm ⁇ 150 mm,
- the peeling force between the pressure-sensitive adhesive layer and the protective film before curing under the conditions of a peeling angle of 180 °, a measurement temperature of 23 ° C., and a tensile speed of 300 mm / min. is 2000 mN / 25 mm or more, preferably 2300 mN / 25 mm or more and 6300 mN / 25 mm or less.
- the adhesive layer is cured
- the peeling force between the adhesive layer after curing and the protective film (peeling force after curing the adhesive layer) under the conditions of a peeling angle of 180 °, a measurement temperature of 23 ° C., and a tensile speed of 300 mm / min is 2000 mN / 25 mm. Or less, preferably 500 mN / 25 mm or more and 1500 mN / 25 mm or less.
- a method of manufacturing a semiconductor chip with a protective film includes: Affixing the protective film-forming composite sheet to the back surface of the semiconductor wafer with the protective film-forming film; Curing the protective film-forming film in the attached protective film-forming composite sheet by heating to form a protective film; The semiconductor wafer on which the protective film is formed is diced into a semiconductor chip, and the adhesive layer in the composite sheet for forming the protective film is cured by irradiation with active energy rays, and then attached to the back surface of the semiconductor chip.
- the composite sheet for forming a protective film includes a base material, the pressure-sensitive adhesive layer, and the film for forming a protective film, and the pressure-sensitive adhesive layer is laminated on the base material, and the film for forming a protective film Is laminated on the adhesive layer;
- the pressure-sensitive adhesive layer is Has active energy ray curability, In a layer that is in contact with at least the protective film-forming film, containing a (meth) acrylic acid alkyl ester copolymer,
- the (meth) acrylic acid alkyl ester copolymer is a copolymer having a structural unit derived from a (meth) acrylic acid alkyl ester having 8 to 18 carbon atoms in the alkyl group constituting the alkyl ester;
- the protective film-forming film has thermosetting properties. It is a manufacturing method of a semiconductor chip with a protective film.
- Example 1 ⁇ Manufacture of composite sheet for forming protective film> A composite sheet for forming a protective film having the structure shown in FIG. 1 was produced. More specifically, it is as follows.
- the pressure-sensitive adhesive composition comprises 6.6 parts by mass of a (meth) acrylic acid alkyl ester copolymer 100 parts by mass (solid content), a trifunctional xylylene diisocyanate crosslinking agent (“Takenate D110N” manufactured by Mitsui Takeda Chemical Co., Ltd.) Solid content), and 3.0 parts by mass (solid content) of a photopolymerization initiator (“Irgacure 127” manufactured by BASF), using a mixed solvent of methyl ethyl ketone, toluene and ethyl acetate, and a solid content concentration of 30 mass % Adjusted.
- a photopolymerization initiator Irgacure 127
- the (meth) acrylic acid alkyl ester copolymer is composed of 80 parts by mass of 2-ethylhexyl acrylate (hereinafter sometimes abbreviated as “2EHA”), 2-hydroxyethyl acrylate (hereinafter referred to as “HEA”). And a pre-copolymer obtained by copolymerizing 20 parts by mass with 2-methacryloyloxyethyl isocyanate (2-isocyanatoethyl methacrylate, hereinafter abbreviated as “MOI”).
- 2EHA 2-ethylhexyl acrylate
- HOA 2-hydroxyethyl acrylate
- MOI 2-methacryloyloxyethyl isocyanate
- a composition for forming a protective film was applied to the release-treated surface of a release film (“SP-PET 381031” manufactured by Lintec Corporation, thickness 38 ⁇ m) from which one side of a polyethylene terephthalate film was released by silicone treatment, and dried. Then, a protective film-forming film (thickness: 25 ⁇ m) was formed.
- the following components were blended in the amounts shown in Table 2 (solid content), and the solid content concentration was adjusted to 55% by mass using a mixed solvent of methyl ethyl ketone, toluene, and ethyl acetate. Is.
- this protective film-forming film is bonded to the surface of the pressure-sensitive adhesive layer of the support sheet obtained above, so that the surface opposite to the side on which the pressure-sensitive adhesive layer of the protective film-forming film is provided A protective sheet-forming composite sheet provided with the release film was obtained.
- the exposed protective film-forming film is applied to a dry polished surface of a silicon wafer (diameter 6 inches, thickness 100 ⁇ m) at 70 ° C.
- the exposed pressure-sensitive adhesive layer was attached to the ring frame and allowed to stand for 30 minutes.
- the protective film-forming composite sheet was heated at 130 ° C. for 2 hours to cure the protective film-forming film to form a protective film.
- the silicon wafer was diced into a size of 5 mm ⁇ 5 mm using a dicing apparatus to obtain a chip.
- test piece (1) For this test piece (1), using a precision universal testing machine ("Autograph AG-IS" manufactured by Shimadzu Corporation) under the conditions of a peeling angle of 180 °, a measurement temperature of 23 ° C, and a tensile speed of 300 mm / min, Perform a tensile test to peel off the previous adhesive layer and substrate laminate from the protective film, measure the load at this time, peel force between the adhesive layer and the protective film before curing (adhesive before curing) Note that the measured value of the load is the value measured when the support sheet is peeled off over a length of 100 mm, when it is first peeled off by a length of 10 mm, and finally when it is long.
- Autograph AG-IS manufactured by Shimadzu Corporation
- Example 2 ⁇ Manufacture and evaluation of composite sheet for protective film formation> [Example 2]
- the pressure-sensitive adhesive layer instead of the (meth) acrylic acid alkyl ester copolymer, instead of the above-mentioned one having a weight average molecular weight of 1100000, as shown in Table 1, 2EHA 40 parts by mass, vinyl acetate (hereinafter, “ The pre-copolymer obtained by copolymerizing 40 parts by mass (sometimes abbreviated as “VAc”) and 20 parts by mass of HEA is further added with 21.4 parts by mass of MOI (based on the total number of moles of hydroxyl groups in HEA).
- VAc vinyl acetate
- Example 1 except that an ultraviolet curable acrylic copolymer having a weight average molecular weight of 500,000, obtained by reacting the total number of moles of isocyanate groups in MOI of 0.8 times), was used.
- a composite sheet for forming a protective film was produced and evaluated by the same method as described above. The results are shown in Table 3.
- Example 3 At the time of forming the pressure-sensitive adhesive layer, instead of the (meth) acrylic acid alkyl ester copolymer having the weight average molecular weight of 1100000 described above, as shown in Table 1, lauryl methacrylate (hereinafter abbreviated as “LMA”).
- LMA lauryl methacrylate
- Example 4 At the time of forming the pressure-sensitive adhesive layer, as a (meth) acrylic acid alkyl ester copolymer, instead of the above-mentioned one having a weight average molecular weight of 1100000, as shown in Table 1, isostearyl acrylate (hereinafter referred to as “ISTA”) In addition to the pre-copolymer obtained by copolymerizing 80 parts by mass and 20 parts by mass of HEA (which may be abbreviated), 21.4 parts by mass of MOI (with respect to the total number of moles of hydroxyl groups in HEA) The same method as in Example 1 except that an ultraviolet curable acrylic copolymer having a weight average molecular weight of 600,000 obtained by reacting the total number of moles of isocyanate groups of 0.8 is used. Thus, a composite sheet for forming a protective film was manufactured and evaluated. The results are shown in Table 3.
- the (meth) acrylic acid alkyl ester copolymer had a (meth) acrylic acid copolymer in which the alkyl group constituting the alkyl ester had 8 or more carbon atoms.
- the peeling force between the adhesive layer and the protective film before curing is sufficiently large, and dicing can be performed stably.
- the peeling force between the adhesive layer and the protective film was sufficiently small, and the semiconductor chip could be picked up stably.
- the ratio of the peeling force before and after curing of the pressure-sensitive adhesive layer ([Peeling force before curing the pressure-sensitive adhesive layer] / [Peeling strength after curing the pressure-sensitive adhesive layer]) is 4.6 for Example 1, 4.2 for Example 2.
- Example 3 is 14.3 and Example 4 is 1.8, which is particularly large in Examples 1 to 3, and in particular, Example 3 is remarkably large, and an alkyl group constituting the alkyl ester. It was suggested that the effect of the present invention is particularly enhanced when the number of carbon atoms in the sample is 12 and a value in the vicinity thereof.
- the (meth) acrylic acid alkyl ester copolymer had 8 carbon atoms in the alkyl group constituting the alkyl ester.
- the peeling force between the pressure-sensitive adhesive layer before curing and the protective film is sufficiently large, and dicing can be performed stably.
- the peeling force between the cured pressure-sensitive adhesive layer and the protective film was not sufficiently reduced, and the semiconductor chip could not be picked up stably.
- the present invention is extremely useful industrially because it can be used to manufacture a semiconductor chip or the like whose back surface is protected by a protective film.
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Abstract
Description
本願は、2015年6月5日に、日本に出願された特願2015-114714号に基づき優先権を主張し、その内容をここに援用する。
本発明の保護膜形成用複合シートにおいては、前記アルキルエステルを構成するアルキル基の炭素数が11~18であることが好ましい。
即ち、本発明は以下の態様を含む。
[1]基材上に粘着剤層を備え、前記粘着剤層上に保護膜形成用フィルムを備えてなり、前記粘着剤層は活性エネルギー線硬化性を有し、前記保護膜形成用フィルムは熱硬化性を有する保護膜形成用複合シートであって、
前記保護膜形成用複合シートは、これを前記保護膜形成用フィルムにより半導体ウエハの裏面に貼付した後、前記保護膜形成用フィルムを加熱によって硬化させて保護膜とし、次いで、前記半導体ウエハをダイシングして半導体チップとした後、活性エネルギー線の照射によって前記粘着剤層を硬化させてから、前記半導体チップをその裏面に貼付された前記保護膜とともにピックアップすることによって、保護膜付き半導体チップを製造するために用いるものであり、
前記粘着剤層は、少なくとも前記保護膜形成用フィルムと接触している層において、(メタ)アクリル酸アルキルエステル共重合体を含有し、
前記(メタ)アクリル酸アルキルエステル共重合体は、アルキルエステルを構成するアルキル基の炭素数が8以上の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する、保護膜形成用複合シート。
[2]前記保護膜形成用フィルムが、エポキシ樹脂と、加熱によって溶解し、かつ前記エポキシ樹脂に対して硬化活性を示す熱硬化剤と、イミダゾール類と、を含有する、[1]に記載の保護膜形成用複合シート。
[3]前記アルキルエステルを構成するアルキル基の炭素数が11~18である、[1]又は[2]に記載の保護膜形成用複合シート。
本発明に係る保護膜形成用複合シートは、基材上に粘着剤層を備え、前記粘着剤層上に保護膜形成用フィルムを備えてなり、前記粘着剤層は活性エネルギー線硬化性を有し、前記保護膜形成用フィルムは熱硬化性を有する保護膜形成用複合シートであって、前記保護膜形成用複合シートは、これを前記保護膜形成用フィルムにより半導体ウエハの裏面に貼付した後、前記保護膜形成用フィルムを加熱によって硬化させて保護膜とし、次いで、前記半導体ウエハをダイシングして半導体チップとした後、活性エネルギー線の照射によって前記粘着剤層を硬化させてから、前記半導体チップをその裏面に貼付された前記保護膜とともにピックアップすることによって、保護膜付き半導体チップを製造するために用いるものであり、前記粘着剤層は、少なくとも前記保護膜形成用フィルムと接触している層において、(メタ)アクリル酸アルキルエステル共重合体を含有し、前記(メタ)アクリル酸アルキルエステル共重合体は、アルキルエステルを構成するアルキル基の炭素数が8以上の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有するものである。
すなわち、本発明に係る保護膜形成用複合シートの1つの側面は、
基材と、粘着剤層と、保護膜形成用フィルムとを含む保護膜形成用複合シートであって、
前記粘着剤層は前記基材上に積層されており、前記保護膜形成用フィルムは前記粘着剤層上に積層されており;
前記粘着剤層は、
活性エネルギー線硬化性を有し、
少なくとも前記保護膜形成用フィルムと接触している層において、(メタ)アクリル酸アルキルエステル共重合体を含有し、
前記(メタ)アクリル酸アルキルエステル共重合体は、アルキルエステルを構成するアルキル基の炭素数が8以上の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する共重合体であり;
前記保護膜形成用フィルムは熱硬化性を有し;
前記保護膜形成用フィルムにより前記保護膜形成用複合シートを半導体ウエハの裏面に貼付すること、
前記貼付された保護膜形成用複合シートにおける前記保護膜形成用フィルムを加熱によって硬化させて保護膜を形成すること、
前記保護膜が形成された半導体ウエハをダイシングして半導体チップとすること、及び
活性エネルギー線の照射によって前記粘着剤層を硬化させてから、前記半導体チップの裏面に貼付された前記保護膜とともに、前記半導体チップをピックアップすること、を含む保護膜付き半導体チップ製造のための、
保護膜形成用複合シートである。なお、本明細書においては、基材及び粘着剤層の積層構造体を、「支持シート」と称することがある。また、前記保護膜形成用複合シートにおいて、前記保護膜形成用フィルムを加熱によって硬化させて保護膜とした複合シートや、前記粘着剤層を活性エネルギー線の照射によって硬化させた複合シートも、前記基材、粘着剤層又はその硬化物、及び保護膜の積層構造が維持されている限り、保護膜形成用複合シートと称する。
以下、本発明に係る保護膜形成用複合シートの各構成について、詳細に説明する。
基材の材質は、各種樹脂であることが好ましく、その具体的な例としては、ポリエチレン(低密度ポリエチレン(LDPEと略すことがある)、直鎖低密度ポリエチレン(LLDPEと略すことがある)、高密度ポリエチレン(HDPE等と略すことがある))、ポリプロピレン、エチレン・プロピレン共重合体、ポリブテン、ポリブタジエン、ポリメチルペンテン、ポリ塩化ビニルフィル、塩化ビニル共重合体、ポリエチレンテレフタレート、ポリエチレンナフタレート、ポリブチレンテレフタレート、ポリウレタン、ポリウレタンアクリレート、ポリイミド、エチレン・酢酸ビニル共重合体、アイオノマー樹脂、エチレン・(メタ)アクリル酸共重合体、エチレン・(メタ)アクリル酸エステル共重合体、ポリスチレン、ポリカーボネート、フッ素樹脂、これらのいずれかの樹脂の水添加物、変性物、架橋物又は共重合物等が挙げられる。
なお、本明細書において、「(メタ)アクリル酸」とは、「アクリル酸」及び「メタクリル酸」の両方を包含する概念とする。
本明細書における「厚さ」は、JIS K 7130 :1999(ISO 4593:1993)で規定される手法により求めることができる。
なお、基材が複数層からなる場合には、各層の合計の厚さが、上記の好ましい基材の厚さとなるようにするとよい。
前記粘着剤層は、活性エネルギー線硬化性を有し、少なくとも前記保護膜形成用フィルムと接触している層において、(メタ)アクリル酸アルキルエステル共重合体を含有する。ただし、前記(メタ)アクリル酸アルキルエステル共重合体は、アルキルエステルを構成するアルキル基の炭素数が8以上の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する。
「誘導される」とは、重合するために化学構造が変化することを意味する。
なお、本明細書において、「活性エネルギー線」とは、電磁波又は荷電粒子線の中でエネルギー量子を有するものを意味し、その例として、紫外線、電子線等が挙げられる。
紫外線は、例えば、紫外線源として高圧水銀ランプ、ヒュージョンHランプ又はキセノンランプ等を用いることで照射できる。電子線は、電子線加速器等によって発生させたものを照射できる。
次に、前記(メタ)アクリル酸アルキルエステル共重合体を含有する前記粘着剤組成物、並びに前記粘着剤組成物及び粘着剤の含有成分について説明する。
((メタ)アクリル酸アルキルエステル共重合体)
前記(メタ)アクリル酸アルキルエステル共重合体は、アルキルエステルを構成するアルキル基の炭素数が8以上の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する。なお、本明細書において、単なる「(メタ)アクリル酸アルキルエステル」との記載は、特に断りのない限り、上記の「アルキルエステルを構成するアルキル基の炭素数が8以上の(メタ)アクリル酸アルキルエステル」を意味するものとする。
上記のなかでも、(メタ)アクリル酸2-エチルヘキシル、(メタ)アクリル酸ラウリル、(メタ)アクリル酸イソステアリルが好ましい。
換言すると、上述のアルキル基の炭素数が8以上の(メタ)アクリル酸アルキルエステルから誘導される構成単位の含有量は、前記(メタ)アクリル酸アルキルエステル共重合体を構成する全構成単位の総質量に対して、30質量%以上であることが好ましく、35質量%以上であることがより好ましい。
すなわち、上述のアルキル基の炭素数が8以上の(メタ)アクリル酸アルキルエステルの割合は、前記(メタ)アクリル酸アルキルエステル共重合体の調整に用いた全てのモノマーの総質量に対して、30質量%以上100質量%以下であればよく、30質量%以上95質量%以下であってもよく、30質量%以上90質量%以下であってもよく、30質量%以上85質量%以下であってもよい。
さらに別の側面として、上記含有量は、35質量%以上100質量%以下であってもよく、35質量%以上95質量%以下であってもよく、35質量%以上90質量%以下であってもよく、35質量%以上85質量%以下であってもよい。
さらに別の側面として、上記含有量は、40質量%以上80質量%以下であってもよい。
またさらに別の側面として、上述のアルキル基の炭素数が8以上の(メタ)アクリル酸アルキルエステルから誘導される構成単位の含有量は、前記(メタ)アクリル酸アルキルエステル共重合体を構成する全構成単位の総質量に対して、30質量%以上100質量%以下であればよく、30質量%以上95質量%以下であってもよく、30質量%以上90質量%以下であってもよく、30質量%以上85質量%以下であってもよい。
またさらに別の側面として、上記含有量は、35質量%以上100質量%以下であってもよく、35質量%以上95質量%以下であってもよく、35質量%以上90質量%以下であってもよく、35質量%以上85質量%以下であってもよい。
またさらに別の側面として、上記含有量は、40質量%以上80質量%以下であってもよい。
すなわち、前記(メタ)アクリル酸アルキルエステル共重合体の含有量は、粘着剤層の総質量に対して、75質量%以上100質量%以下であればよく、75質量%以上97質量%以下であることが好ましく、80質量%以上95質量%以下であることがより好ましい。
また別の側面として、前記粘着剤組成物中の(メタ)アクリル酸アルキルエステル共重合体の含有量は、前記粘着剤組成物中の溶媒以外の全成分の総質量に対して、75質量%以上100質量%以下であればよく、75質量%以上97質量%以下であることが好ましく、80質量%以上95質量%以下であることがより好ましい。
前記イソシアネート系架橋剤は、イソシアネート基(-N=C=O)を有する架橋剤であれば特に限定されず、好ましいものとしては、例えば、2,4-トリレンジイソシアネート;2,6-トリレンジイソシアネート;1,3-キシリレンジイソシアネート;1,4-キシレンジイソシアネート;ジフェニルメタン-4,4’-ジイソシアネート;ジフェニルメタン-2,4’-ジイソシアネート;3-メチルジフェニルメタンジイソシアネート;ヘキサメチレンジイソシアネート;イソホロンジイソシアネート;ジシクロヘキシルメタン-4,4’-ジイソシアネート;ジシクロヘキシルメタン-2,4’-ジイソシアネート;トリメチロールプロパン等のポリオールのすべて若しくは一部の水酸基に、トリレンジイソシアネート、ヘキサメチレンジイソシアネート及びキシリレンジイソシアネートの少なくとも1種を付加した化合物;リジンジイソシアネート等が挙げられる。
前記光重合開始剤は、公知のものでよく、具体的には、例えば、4-(2-ヒドロキシエトキシ)フェニル(2-ヒドロキシ-2-プロピル)ケトン、α-ヒドロキシ-α,α’-ジメチルアセトフェノン、2-メチル-2-ヒドロキシプロピオフェノン、1-ヒドロキシシクロヘキシルフェニルケトン、2-ヒロドキシ-1-{4-[4-(2-ヒドロキシ-2-メチル-プロピオニル)-ベンジル]フェニル}-2-メチル-プロパン-1-オン等のα-ケトール系化合物;メトキシアセトフェノン、2,2-ジメトキシ-2-フェニルアセトフェノン、2,2-ジエトキシアセトフェノン、2-メチル-1-[4-(メチルチオ)-フェニル]-2-モルホリノプロパン-1等のアセトフェノン系化合物;ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、アニソインメチルエーテル等のベンゾインエーテル系化合物;ベンジルジメチルケタール等のケタール系化合物;2-ナフタレンスルホニルクロリド等の芳香族スルホニルクロリド系化合物;1-フェノン-1,1-プロパンジオン-2-(o-エトキシカルボニル)オキシム等の光活性オキシム系化合物;ベンゾフェノン、ベンゾイル安息香酸、3,3’-ジメチル-4-メトキシベンゾフェノン等のベンゾフェノン系化合物;チオキサンソン、2-クロロチオキサンソン、2-メチルチオキサンソン、2,4-ジメチルチオキサンソン、イソプロピルチオキサンソン、2,4-ジクロロチオキサンソン、2,4-ジエチルチオキサンソン、2,4-ジイソプロピルチオキサンソン等のチオキサンソン系化合物;カンファーキノン;ハロゲン化ケトン;アシルホスフィノキシド;アシルホスフォナート等が挙げられる。
前記粘着剤組成物は、前記(メタ)アクリル酸アルキルエステル共重合体以外に、さらに溶媒を含有するものが好ましい。
前記溶媒は、特に限定されないが、好ましい溶媒としては、例えば、トルエン、キシレン等の炭素数7~9の炭化水素;メタノール、エタノール、2-プロパノール、イソブチルアルコール(2-メチルプロパン-1-オールともいう)、1-ブタノール等の炭素数1~6のアルコール;酢酸エチル等のエステル;アセトン、メチルエチルケトン等のケトン;テトラヒドロフラン等のエーテル;ジメチルホルムアミド、N-メチルピロリドン等のアミド(すなわち、アミド結合を有する化合物)等が挙げられる。
上記のなかでも、メチルエチルケトン、トルエン、酢酸エチルが好ましい。
前記粘着剤組成物が含有する溶媒は、1種のみでもよいし、2種以上でもよい。
前記粘着剤組成物は、前記(メタ)アクリル酸アルキルエステル共重合体以外に、本発明の効果を損なわない範囲内において、前記イソシアネート系架橋剤、光重合開始剤及び溶媒のいずれにも該当しないその他の成分を含有していてもよい。
前記その他の成分は公知のものでよく、目的に応じて任意に選択でき、特に限定されないが、好ましいものとしては、例えば、染料、顔料、劣化防止剤、帯電防止剤、難燃剤、シリコーン化合物、連鎖移動剤等の各種添加剤が挙げられる。
一方、前記粘着剤層が複数層からなる場合には、上述のように、これら複数層のうち、保護膜形成用フィルムと接触している層(すなわち、最上層)を、前記(メタ)アクリル酸アルキルエステル共重合体を含有する層とすることで、本発明の効果が得られる。さらに、これら複数層のうち、前記基材と接触している層(すなわち、粘着剤層の厚さ方向において、基材に隣接している層、以下最下層ということがある)を、例えば、基材との密着性が特に高くなるような層とすることで、前記保護膜形成用複合シートは、使用時の安定性がより向上する。このように、前記粘着剤層を複数層からなる積層体とすることで、粘着剤層を全体として二以上の特性を有する層に調節できるという利点を有する。
前記保護膜形成用フィルムは、熱硬化性を有するものであり、感圧接着性を有していてもよいし、加熱して軟化させることで各種被着体に貼付可能であってもよい。保護膜形成用フィルムは、熱硬化を経て最終的には耐衝撃性が高い保護膜となり、この保護膜はせん断強度にも優れ、厳しい高温・高湿度条件下においても十分な接着特性を保持し得る。
好ましい保護膜形成用フィルムとしては、例えば、重合体成分(A)及び熱硬化性成分(B)を含有するものが挙げられる。重合体成分(A)は、重合性化合物が重合反応して形成されたとみなせる成分である。
また、熱硬化性成分(B)は、熱により硬化(重合)反応し得る成分である。なお、本発明において重合反応には、重縮合反応も含まれる。
保護膜形成用フィルムは、これを構成するための成分を含有する保護膜形成用組成物から形成できる。保護膜形成用組成物中の、常温で気化しない成分同士の含有量の比率は、通常、保護膜形成用フィルムの前記成分同士の含有量の比率と同じとなる。
好ましい保護膜形成用組成物としては、例えば、重合体成分(A)及び熱硬化性成分(B)を含有するものが挙げられ、重合体成分(A)、熱硬化性成分(B)及び硬化促進剤(C)を含有するものがより好ましい。 次に、前記保護膜形成用組成物及び保護膜形成用フィルムの含有成分について説明する。
重合体成分(A)は、保護膜形成用フィルムに造膜性や、可撓性等を付与するための重合体化合物である。重合体成分(A)は、熱硬化性成分(B)にも該当する場合がある。
例えば、フェノキシ樹脂や、側鎖にエポキシ基を有するアクリル系樹脂等は、重合体成分(A)に該当し、かつ熱硬化性成分(B)にも該当することがある。このような成分は、重合体成分(A)として取り扱う。
重合体成分(A)は、1種を単独で用いてもよいし、2種以上を併用してもよい。
アクリル系樹脂の重量平均分子量(Mw)は、10000~2000000であることが好ましく、100000~1500000であることがより好ましい。アクリル系樹脂の重量平均分子量が前記下限値以上であることで、後述する保護膜と、硬化後の前記粘着剤層との接着力が抑制されて、保護膜付き半導体チップのピックアップ性がより向上する。
また、アクリル系樹脂の重量平均分子量が前記上限値以下であることで、被着体の凹凸面へ保護膜形成用フィルムが追従し易くなり、被着体と保護膜形成用フィルムとの間でボイド等の発生がより抑制される。
なお、本明細書において、「重量平均分子量」とは、特に断りのない限り、ゲル・パーミエーション・クロマトグラフィー(GPC)法により測定されるポリスチレン換算値である。
(メタ)アクリル酸シクロアルキル、(メタ)アクリル酸ベンジル、(メタ)アクリル酸イソボルニル、(メタ)アクリル酸ジシクロペンタニル、(メタ)アクリル酸ジシクロペンテニル、(メタ)アクリル酸ジシクロペンテニルオキシエチル、(メタ)アクリル酸イミド等の環状骨格を有する(メタ)アクリル酸エステル;
(メタ)アクリル酸ヒドロキシメチル、(メタ)アクリル酸2-ヒドロキシエチル、(メタ)アクリル酸2-ヒドロキシプロピル等の水酸基含有(メタ)アクリル酸エステル;
(メタ)アクリル酸グリシジル等のグリシジル基含有(メタ)アクリル酸エステルが挙げられる。
また、アクリル系樹脂は、アクリル酸、メタクリル酸、イタコン酸、酢酸ビニル、アクリロニトリル、スチレン、N-メチロールアクリルアミド等のモノマーが共重合されたものでもよい。
アクリル系樹脂を構成するモノマーは、1種のみでもよいし、2種以上でもよい。
このように、保護膜形成用フィルムが、重合体成分(A)としてアクリル系樹脂を含有する場合、保護膜形成用フィルムのアクリル系樹脂の含有量は、保護膜形成用フィルムの総質量に対して、5~50質量%であることが好ましい。
熱硬化性成分(B)は、保護膜形成用フィルムを硬化させて、硬質の保護膜を形成するための成分である。熱硬化性成分(B)は、重合体成分(A)にも該当する場合があるが、このような成分は重合体成分(A)として取り扱う。
熱硬化性成分(B)は、1種を単独で用いてもよいし、2種以上を併用してもよい。
エポキシ系熱硬化性樹脂は、エポキシ樹脂(B11)及び熱硬化剤(B12)からなる。
エポキシ系熱硬化性樹脂は、1種を単独で用いてもよいし、2種以上を併用してもよい。
不飽和炭化水素基を有するエポキシ樹脂としては、例えば、多官能系エポキシ樹脂のエポキシ基の一部が不飽和炭化水素基を含む基に変換されてなる化合物が挙げられる。
ここでいう「数平均分子量」は、ゲル浸透クロマトグラフィー(GPC)法により測定したポリスチレン換算の値である。
エポキシ樹脂(B11)のエポキシ当量は、100~1100g/eqであることが好ましく、150~1000g/eqであることがより好ましい。
熱硬化剤(B12)としては、例えば、1分子中にエポキシ基と反応し得る官能基を2個以上有する化合物が挙げられる。前記官能基としては、例えば、フェノール性水酸基、アルコール性水酸基、アミノ基、カルボキシ基、酸基が無水物化された基等が挙げられ、フェノール性水酸基、アミノ基、又は酸基が無水物化された基であることが好ましく、フェノール性水酸基又はアミノ基であることがより好ましく、アミノ基であることが特に好ましい。
熱硬化剤(B12)のうち、アミノ基を有するアミン系硬化剤としては、例えば、ジシアンジアミド(以下、「DICY」と略記することがある)等が挙げられる。
不飽和炭化水素基を有する熱硬化剤(B12)としては、例えば、フェノール樹脂の水酸基の一部が、不飽和炭化水素基を有する基で置換されてなる化合物、フェノール樹脂の芳香環に、不飽和炭化水素基を有する基が直接結合してなる化合物等が挙げられる。
熱硬化剤(B12)における前記不飽和炭化水素基は、上述の不飽和炭化水素基を有するエポキシ樹脂における不飽和炭化水素基と同様のものである。
前記固体分散型潜在性硬化剤は、常温では保護膜形成用フィルムにおいて、エポキシ樹脂(B11)中に安定して分散しているが、加熱によってエポキシ樹脂(B11)と相溶し、エポキシ樹脂(B11)と反応する。前記固体分散型潜在性硬化剤を用いることで、前記保護膜形成用複合シートの保存安定性が顕著に向上する。例えば、保護膜形成用フィルムから隣接する前記粘着剤層へのこの硬化剤の移動が抑制され、保護膜形成用フィルムの熱硬化性の低下が効果的に抑制される。そして、保護膜形成用フィルムの加熱による熱硬化度がより高くなるため、後述する保護膜付き半導体チップのピックアップ性がより向上する。
また、熱硬化剤(B12)の前記含有量が前記上限値以下であることで、保護膜形成用フィルムの吸湿率が低減されて、パッケージ信頼性がより向上する。
硬化促進剤(C)は、保護膜形成用組成物の硬化速度を調整するための成分である。
好ましい硬化促進剤(C)としては、例えば、トリエチレンジアミン、ベンジルジメチルアミン、トリエタノールアミン、ジメチルアミノエタノール、トリス(ジメチルアミノメチル)フェノール等の第3級アミン;2-メチルイミダゾール、2-フェニルイミダゾール、2-フェニル-4-メチルイミダゾール、2-フェニル-4,5-ジヒドロキシメチルイミダゾール、2-フェニル-4-メチル-5-ヒドロキシメチルイミダゾール等のイミダゾール類(すなわち、少なくとも1個の水素原子が水素原子以外の基で置換されたイミダゾール);トリブチルホスフィン、ジフェニルホスフィン、トリフェニルホスフィン等の有機ホスフィン類(少なくとも1個の水素原子が有機基で置換されたホスフィン);テトラフェニルホスホニウムテトラフェニルボレート、トリフェニルホスフィンテトラフェニルボレート等のテトラフェニルボロン塩等が挙げられる。
上記のなかでも、2-フェニル-4,5-ジヒドロキシメチルイミダゾールが好ましい。
すなわち、保護膜形成用フィルムの1つの側面は、重合体成分(A)と、エポキシ樹脂(B11)と、熱硬化剤(B12)として前記固体分散型潜在性硬化剤と、硬化促進剤(C)としてイミダゾール類と、を含む。
保護膜形成用組成物及び保護膜形成用フィルムが含有する前記他の成分としては、例えば、充填材(D)、カップリング剤(E)、架橋剤(F)、汎用添加剤(G)等が挙げられる。
保護膜形成用組成物は、通常、充填材(D)を含有することにより、熱膨張係数の調整が容易となる。したがって、このような保護膜形成用組成物を用いて、硬化後の保護膜の熱膨張係数を半導体チップに対して最適化することで、パッケージ信頼性を向上させることができる。
また、通常、充填材(D)を含有する保護膜形成用組成物を用いることにより、硬化後の保護膜の吸湿率を低減することもできる。
好ましい無機充填材としては、例えば、シリカ、アルミナ、タルク、炭酸カルシウム、チタンホワイト、ベンガラ、炭化珪素、窒化ホウ素等の粉末;これらシリカ等を球形化したビーズ;これらシリカ等の単結晶繊維;ガラス繊維等が挙げられる。
これらの中でも、無機充填材は、シリカフィラー又はアルミナフィラーであることが好ましい。
カップリング剤(E)として、無機化合物又は有機化合物と反応する官能基を有するものを用いることにより、保護膜形成用フィルムの被着体に対する接着性及び密着性を向上させることができる。また、カップリング剤(E)を含有することで、保護膜形成用フィルムを硬化して得られた保護膜は、耐熱性を損なうことなく、耐水性が向上する。
好ましい前記シランカップリング剤としては、例えば、γ-グリシドキシプロピルトリメトキシシラン、γ-グリシドキシプロピルメチルジエトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、γ-(メタクリロキシプロピル)トリメトキシシラン、γ-アミノプロピルトリメトキシシラン、N-6-(アミノエチル)-γ-アミノプロピルトリメトキシシラン、N-6-(アミノエチル)-γ-アミノプロピルメチルジエトキシシラン、N-フェニル-γ-アミノプロピルトリメトキシシラン、γ-ウレイドプロピルトリエトキシシラン、γ-メルカプトプロピルトリメトキシシラン、γ-メルカプトプロピルメチルジメトキシシラン、ビス(3-トリエトキシシリルプロピル)テトラスルファン、メチルトリメトキシシラン、メチルトリエトキシシラン、ビニルトリメトキシシラン、ビニルトリアセトキシシラン、イミダゾールシラン等が挙げられる。
重合体成分(A)として、他の化合物と結合可能な、ビニル基、(メタ)アクリロイル基、アミノ基、水酸基、カルボキシ基、イソシアネート基等の官能基を有する、上述のアクリル系樹脂を用いる場合、この官能基を他の化合物と結合させて架橋するために、架橋剤(F)を用いることができる。架橋剤(F)を用いて架橋することにより、保護膜形成用フィルムの初期接着力及び凝集力を調節できる。
汎用添加剤(G)としては、例えば、公知の可塑剤、帯電防止剤、酸化防止剤、顔料、染料、ゲッタリング剤等が挙げられる。
保護膜形成用組成物は、希釈によってその取り扱い性が向上することから、さらに溶媒を含有するものが好ましい。
保護膜形成用組成物が含有する溶媒は、上述の粘着剤組成物における溶媒と同様のものでよい。
保護膜形成用組成物が含有する溶媒は、1種のみでもよいし、2種以上でもよい。
保護膜形成用組成物が溶媒を含有する場合の溶媒の含有量は、前記保護膜形成用組成物の総質量に対して、前記保護膜形成用組成物の固形分濃度が35~75質量%となる量であることが好ましい。
保護膜形成用フィルムの別の側面は、重合体成分(A)と、熱硬化性成分(B)と、硬化促進剤(C)と、所望により、充填材(D)、カップリング剤(E)、架橋剤(F)及び汎用添加剤(G)からなる群から選択される少なくとも1つと、を含む。
さらに、前記熱硬化性成分(B)は、エポキシ樹脂(B11)と、熱硬化剤(B12)として前記固体分散型潜在性硬化剤とを含み、かつ前記硬化促進剤(C)はイミダゾール類を含むことが好ましい。
溶媒を用いる場合には、溶媒を溶媒以外のいずれかの配合成分と混合してこの配合成分を予め希釈しておくことで用いてもよいし、溶媒以外のいずれかの配合成分を予め希釈しておくことなく、溶媒をこれら配合成分と混合することで用いてもよい。
ここに示す保護膜形成用複合シート1は、基材11上に粘着剤層12を備え、粘着剤層12上に保護膜形成用フィルム13を備えてなるものであり、支持シート10の粘着剤層12上に、保護膜形成用フィルム13を備えた構成を有する。また、保護膜形成用複合シート1は、さらに保護膜形成用フィルム13上に剥離フィルム14を備えている。保護膜形成用フィルム13と接触している粘着剤層12は、アルキルエステルを構成するアルキル基の炭素数が8以上の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する、前記(メタ)アクリル酸アルキルエステル共重合体を含有する層である。
なお、剥離フィルム14と、粘着剤層12の表面12a又は保護膜形成用フィルム13の表面13aと、の間には、空隙部が存在していてもよい。例えば、保護膜形成用フィルム13の表面13aのうち、符号130aで示す領域(粘着剤層12側の領域)と、粘着剤層12の表面12aのうち、符号120aで示す領域(保護膜形成用フィルム13側の領域)とは、剥離フィルム14との間で前記空隙部が生じ易い。すなわち、保護膜形成用フィルム13と、粘着剤層12との境界近傍でかつ剥離フィルム14と接する領域においては、空隙部が生じ易い。
ここに示す保護膜形成用複合シート2は、粘着剤層12の表面12aの全面に保護膜形成用フィルム23が積層され、保護膜形成用フィルム23の表面23aの一部に治具用接着剤層15が積層され、保護膜形成用フィルム23の表面23aのうち、治具用接着剤層15が積層されていない露出面と、治具用接着剤層15の表面15a(上面及び側面)の上に、剥離フィルム14が積層されている点以外は、図1に示す保護膜形成用複合シート1と同じものである。保護膜形成用フィルム23と接触している粘着剤層12は、アルキルエステルを構成するアルキル基の炭素数が8以上の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する、前記(メタ)アクリル酸アルキルエステル共重合体を含有するものである。
すなわち、本発明に係る保護膜形成用複合シートの1つの側面は、
基材と、粘着剤層と、保護膜形成用フィルムと、治具用接着剤層と、剥離フィルムと、を含み、
前記粘着剤層は前記基材上に積層されており、
前記粘着剤層の表面全面に前記保護膜形成用フィルムが積層されており、
前記保護膜形成用フィルムの表面の一部に前記治具用接着剤層が積層されており、
前記保護膜形成用フィルムの表面のうち、前記治具用接着剤層が積層されていない露出面と、前記治具用接着剤層の上面及び側面上に、前記剥離フィルムが積層されており、
前記保護膜形成用フィルムと接触している前記粘着剤層は、アルキルエステルを構成するアルキル基の炭素数が8以上18以下の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する、前記(メタ)アクリル酸アルキルエステル共重合体を含有する、
保護膜形成用複合シートである。
すなわち、治具用接着剤層15と保護膜形成用フィルム23との境界近傍で、かつ剥離フィルム14と接する領域においては、空隙部が生じ易い、
ここに示す保護膜形成用複合シート3は、粘着剤層12に代えて、基材11側から第1粘着剤層321及び第2粘着剤層322がこの順に積層されてなる2層構造の粘着剤層32を備えている点以外は、図1に示す保護膜形成用複合シート1と同じものである。
保護膜形成用複合シート3を上方から見下ろして平面視したときに、第2粘着剤層322は、保護膜形成用フィルム13と面積が同じであり、保護膜形成用フィルム13とは周縁部が重なるように配置されている。保護膜形成用フィルム13は、粘着剤層32における基材側とは反対側の表面32a(すなわち、第2粘着剤層322の表面322a)上に設けられている。そして、第1粘着剤層321は、基材11の表面11aの全面を被覆する様に設けられており、上記のように平面視したときに、第1粘着剤層321は第2粘着剤層322よりも面積が大きい。
すなわち、本発明に係る保護膜形成用複合シートの1つの側面は、
基材と、第1の粘着剤層と、第2の粘着剤層と、保護膜形成用フィルムと、治具用接着剤層と、剥離フィルムと、を含み、
前記第1の粘着剤層は、前記基材上に、前記基材上面を被覆する様に設けられており、
前記第2の粘着剤層は前記第1の粘着剤層上に設けられており、
前記保護膜形成用フィルムは、前記第2の粘着剤層上に、前記第2の粘着剤層と周縁部が重なるように設けられており、
前記剥離フィルムは、前記保護膜形成用フィルムの上面及び側面と、前記第2の粘着剤層の側面と、前記第1の粘着剤層における前記第2の粘着剤層が積層されていない面上に積層されており、
上方から見下ろして平面視したときに、
前記第2粘着剤層は、前記保護膜形成用フィルムと面積が同じであり、
前記第1粘着剤層は前記第2粘着剤層よりも面積が大きく、
前記第2粘着剤層は、アルキルエステルを構成するアルキル基の炭素数が8以上18以下の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する、前記(メタ)アクリル酸アルキルエステル共重合体を含有する、
保護膜形成用複合シートである。
ここに示す保護膜形成用複合シート4は、粘着剤層12に代えて、基材11側から第1粘着剤層421及び第2粘着剤層422がこの順に積層されてなる2層構造の粘着剤層42を備えている点以外は、図2に示す保護膜形成用複合シート2と同じものである。
保護膜形成用複合シート4を上方から見下ろして平面視したときに、第1粘着剤層421及び第2粘着剤層422は、いずれも保護膜形成用フィルム23と面積が同じである。
保護膜形成用フィルム23は、粘着剤層42の表面42a(すなわち、第2粘着剤層422の表面422a)上に設けられている。
すなわち、本発明に係る保護膜形成用複合シートの1つの側面は、
基材と、第1の粘着剤層と、第2の粘着剤層と、保護膜形成用フィルムと、治具用接着剤層と、剥離フィルムと、を含み、
前記第1の粘着剤層は前記基材上に積層されており、
前記第2の粘着剤層は前記第1の粘着剤層上に積層されており、
前記第2の粘着剤層上に前記保護膜形成用フィルムが積層されており、
前記保護膜形成用フィルムの表面の一部に前記治具用接着剤層が積層されており、
前記保護膜形成用フィルムの表面のうち、前記治具用接着剤層が積層されていない露出面と、前記治具用接着剤層の上面及び側面上に、前記剥離フィルムが積層されており、
上方から見下ろして平面視したときに、
前記第1粘着剤層、前記第2粘着剤層422、及び前記保護膜形成用フィルム23は面積が同じであり、
前記保護膜形成用フィルムと接触している前記第2の粘着剤層は、アルキルエステルを構成するアルキル基の炭素数が8以上18以下の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する、前記(メタ)アクリル酸アルキルエステル共重合体を含有する、
保護膜形成用複合シートである。
例えば、図3に示す保護膜形成用複合シート3においては、これを上方から見下ろして平面視したときに、第2粘着剤層322は、保護膜形成用フィルム13と面積が同じであり、第1粘着剤層321よりも面積が小さくなっているが、第2粘着剤層322は、保護膜形成用フィルム13と面積が同じでなくてもよく、例えば、保護膜形成用フィルム13よりも面積が大きくてもよく、この場合、第2粘着剤層322は第1粘着剤層321と面積が同じであってもよい。
本発明に係る保護膜形成用複合シートは、例えば、基材上に前記粘着剤組成物から粘着剤層を形成し、前記粘着剤層上に前記保護膜形成用組成物から保護膜形成用フィルムを形成することで製造できる。
この場合の粘着剤層及び保護膜形成用フィルムの形成条件は、上述の方法と同じである。
本発明に係る保護膜形成用複合シートの使用方法は、以下に示すとおりである。
すなわち、まず、保護膜形成用複合シートの保護膜形成用フィルムに半導体ウエハの裏面を貼付するとともに、保護膜形成用複合シートをダイシング装置に固定する。
次いで、保護膜形成用フィルムを加熱(例えば、130℃で2時間加熱)によって硬化させて保護膜とする。半導体ウエハの表面(電極形成面)にバックグラインドテープが貼付されている場合には、通常、このバックグラインドテープを半導体ウエハから取り除いてから、保護膜を形成する。
これに対して、例えば、先に説明した文献「特開2011-228450号公報」(特許文献1)に記載の従来の保護膜形成用複合シートの場合、半導体チップのピックアップを行うときには、保護膜形成用フィルムは未硬化又は部分硬化された状態にとどまっており、半導体チップをボンディングして封止材でキュアするときに同時に、この未硬化又は部分硬化の保護膜形成用フィルムが完全に又はほぼ完全に硬化される。すなわち、この従来の保護膜形成用複合シートを用いた場合、半導体ウエハのダイシング及び半導体チップのピックアップを行う段階において、これらウエハ及びチップの裏面に貼付されているフィルム(膜)は、本発明におけるものとは特性が全く相違する。そして、この文献には、保護膜形成用フィルムの硬化をダイシングの前に行う場合に適した、粘着剤層及び保護膜形成用フィルムの組成については、何ら開示されていない。
基材と、粘着剤層と、保護膜形成用フィルムとを含む保護膜形成用複合シートであって、
前記粘着剤層は前記基材上に積層されており、前記保護膜形成用フィルムは前記粘着剤層上に積層されており;
前記粘着剤層は、
活性エネルギー線硬化性を有し、
少なくとも前記保護膜形成用フィルムと接触している層において、(メタ)アクリル酸アルキルエステル共重合体を含有し、
前記(メタ)アクリル酸アルキルエステル共重合体は、アルキルエステルを構成するアルキル基の炭素数が8以上18以下の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する共重合体であり;
前記保護膜形成用フィルムは熱硬化性を有し;
前記保護膜形成用複合シートを25mm×150mmの大きさに切断した後、シリコンウエハに70℃で貼付し、次いで、前記保護膜形成用複合シートを130℃で2時間加熱して、前記保護膜形成用フィルムを硬化させて保護膜を形成させたとき、剥離角度180°、測定温度23℃、引張速度300mm/分の条件下での硬化前の前記粘着剤層と前記保護膜との剥離力(粘着剤層硬化前剥離力)が、2000mN/25mm以上であり、好ましくは2300mN/25mm以上、6300mN/25mm以下である、保護膜形成用複合シートである。
さらに、前記保護膜形成用複合シートは、照度220mW/cm2、光量190mJ/cm2の条件で、前記保護膜形成用複合シートに紫外線を照射して、前記粘着剤層を硬化させたとき、剥離角度180°、測定温度23℃、引張速度300mm/分の条件下での、硬化後の前記粘着剤層と前記保護膜との剥離力(粘着剤層硬化後剥離力)が、2000mN/25mm以下であり、好ましくは500mN/25mm以上、1500mN/25mm以下であってもよい。
基材と、粘着剤層と、保護膜形成用フィルムとを含む保護膜形成用複合シートであって、
前記粘着剤層は前記基材上に積層されており、前記保護膜形成用フィルムは前記粘着剤層上に積層されており;
前記粘着剤層は、
活性エネルギー線硬化性を有し、
少なくとも前記保護膜形成用フィルムと接触している層が、(メタ)アクリル酸アルキルエステル共重合体と、イソシアネート系架橋剤と、光重合開始剤と、溶媒と、所望によりその他の成分と、を含む(メタ)アクリル酸アルキルエステル共重合体を含有し、
前記(メタ)アクリル酸アルキルエステル共重合体は、アルキルエステルを構成するアルキル基の炭素数が8以上18以下の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する共重合体であり、好ましくはアクリル酸2-エチルヘキシル、メタクリル酸ラウリル及びアクリル酸イソステアリルからなる群から選択される少なくとも1つであり;
前記アルキル基の炭素数が8以上の(メタ)アクリル酸アルキルエステルから誘導される構成単位の含有量は、前記(メタ)アクリル酸アルキルエステル共重合体を構成する全構成単位の総質量に対して、30質量%以上100質量%以下であり、好ましくは、35~85質量%以下であり、より好ましくは40~80質量%以下であり;
前記保護膜形成用フィルムは熱硬化性を有し;かつ
重合体成分(A)、
好ましくはアクリル系樹脂、ポリエステル、ポリウレタン、アクリルウレタン樹脂、シリコーン樹脂、ゴム系ポリマー、及びフェノキシ樹脂からなる群から選択される少なくとも1つ、
より好ましくはアクリル系重合体と;
熱硬化性成分(B)、
好ましくはエポキシ樹脂(B11)及び熱硬化剤(B12)、
より好ましくは、多官能系エポキシ樹脂、ビフェニル化合物、ビスフェノールAジグリシジルエーテル及びその水添物、オルソクレゾールノボラックエポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂、ビフェニル型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、フェニレン骨格型エポキシ樹脂、及び2官能以上のエポキシ化合物からなる群から選択される少なくとも1つと、オニウム塩、二塩基酸ヒドラジド、ジシアンジアミド、及び硬化剤のアミン付加物からなる群から選択される少なくとも1つ、
さらにより好ましくは、ビスフェノールA型エポキシ樹脂及びジシクロペンタジエン型エポキシ樹脂からなる群から選択される少なくとも1つと、ジシアンジアミドと;
硬化促進剤(C)、好ましくは2-フェニル-4,5-ジヒドロキシメチルイミダゾールと;
所望により、溶媒、充填材(D)、カップリング剤(E)、架橋剤(F)及び汎用添加剤(G)からなる群から選択される少なくとも1つと、
を含み;
前記保護膜形成用複合シートを25mm×150mmの大きさに切断した後、シリコンウエハに70℃で貼付し、次いで、前記保護膜形成用複合シートを130℃で2時間加熱して、前記保護膜形成用フィルムを硬化させて保護膜を形成させたとき、剥離角度180°、測定温度23℃、引張速度300mm/分の条件下での硬化前の前記粘着剤層と前記保護膜との剥離力(粘着剤層硬化前剥離力)が、2000mN/25mm以上であり、好ましくは2300mN/25mm以上、6300mN/25mm以下である、保護膜形成用複合シートである。
さらに、前記保護膜形成用複合シートは、照度220mW/cm2、光量190mJ/cm2の条件で、前記保護膜形成用複合シートに紫外線を照射して、前記粘着剤層を硬化させたとき、剥離角度180°、測定温度23℃、引張速度300mm/分の条件下での、硬化後の前記粘着剤層と前記保護膜との剥離力(粘着剤層硬化後剥離力)が、2000mN/25mm以下であり、好ましくは500mN/25mm以上、1500mN/25mm以下であってもよい。
保護膜付き半導体チップ製造のための、保護膜形成用複合シートの使用であって
前記保護膜形成用複合シートは、基材と、粘着剤層と、保護膜形成用フィルムとを含み、
前記粘着剤層は前記基材上に積層されており、前記保護膜形成用フィルムは前記粘着剤層上に積層されており;
前記粘着剤層は、
活性エネルギー線硬化性を有し、
少なくとも前記保護膜形成用フィルムと接触している層において、(メタ)アクリル酸アルキルエステル共重合体を含有し、
前記(メタ)アクリル酸アルキルエステル共重合体は、アルキルエステルを構成するアルキル基の炭素数が8以上18以下の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する共重合体であり;
前記保護膜形成用フィルムは熱硬化性を有し;
前記保護膜形成用複合シートを25mm×150mmの大きさに切断した後、シリコンウエハに70℃で貼付し、次いで、前記保護膜形成用複合シートを130℃で2時間加熱して、前記保護膜形成用フィルムを硬化させて保護膜を形成させたとき、剥離角度180°、測定温度23℃、引張速度300mm/分の条件下での硬化前の前記粘着剤層と前記保護膜との剥離力(粘着剤層硬化前剥離力)が、2000mN/25mm以上であり、好ましくは2300mN/25mm以上、6300mN/25mm以下である、
前記保護膜形成用複合シートの使用である。
さらに、前記保護膜形成用複合シートは、照度220mW/cm2、光量190mJ/cm2の条件で、前記保護膜形成用複合シートに紫外線を照射して、前記粘着剤層を硬化させたとき、剥離角度180°、測定温度23℃、引張速度300mm/分の条件下での、硬化後の前記粘着剤層と前記保護膜との剥離力(粘着剤層硬化後剥離力)が、2000mN/25mm以下であり、好ましくは500mN/25mm以上、1500mN/25mm以下であってもよい。
前記製造方法は、
保護膜形成用フィルムにより保護膜形成用複合シートを半導体ウエハの裏面に貼付すること、
前記貼付された保護膜形成用複合シートにおける前記保護膜形成用フィルムを加熱によって硬化させて保護膜を形成すること、
前記保護膜が形成された半導体ウエハをダイシングして半導体チップとすること、及び
活性エネルギー線の照射によって前記保護膜形成用複合シートにおける粘着剤層を硬化させてから、前記半導体チップの裏面に貼付された前記保護膜とともに、前記半導体チップをピックアップすること、を含み;
前記保護膜形成用複合シートは、基材と、前記粘着剤層と、前記保護膜形成用フィルムとを含み、前記粘着剤層は前記基材上に積層されており、前記保護膜形成用フィルムは前記粘着剤層上に積層されており;
前記粘着剤層は、
活性エネルギー線硬化性を有し、
少なくとも前記保護膜形成用フィルムと接触している層において、(メタ)アクリル酸アルキルエステル共重合体を含有し、
前記(メタ)アクリル酸アルキルエステル共重合体は、アルキルエステルを構成するアルキル基の炭素数が8以上18以下の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する共重合体であり;
前記保護膜形成用フィルムは熱硬化性を有する、
保護膜付き半導体チップの製造方法である。
<保護膜形成用複合シートの製造>
図1に示す構成の保護膜形成用複合シートを製造した。より具体的には、以下のとおりである。
基材であるポリプロピレンフィルム(厚さ80μm、三菱樹脂社製)の一方の表面上に、粘着剤組成物を塗布し、乾燥させて、紫外線硬化型の粘着剤層(厚さ10μm)を形成して、支持シートを得た。前記粘着剤組成物は、(メタ)アクリル酸アルキルエステル共重合体100質量部(固形分)、3官能キシリレンジイソシアネート系架橋剤(三井武田ケミカル社製「タケネートD110N」)6.6質量部(固形分)、及び光重合開始剤(BASF社製「イルガキュア127」)3.0質量部(固形分)を含有し、メチルエチルケトン、トルエン及び酢酸エチルの混合溶媒を用いて、固形分濃度を30質量%に調節したものである。また、前記(メタ)アクリル酸アルキルエステル共重合体は、アクリル酸2-エチルヘキシル(以下、「2EHA」と略記することがある)80質量部と、アクリル酸2-ヒドロキシルエチル(以下、「HEA」と略記することがある)20質量部とを共重合させて得られたプレ共重合体に、さらに2-メタクリロイルオキシエチルイソシアネート(メタクリル酸2-イソシアナトエチル、以下、「MOI」と略記することがある)21.4質量部(HEA中の水酸基の総モル数に対して、2-メタクリロイルオキシエチルイソシアネート中のイソシアネート基の総モル数が0.8倍となる量)を反応させて得られた、重量平均分子量1100000の紫外線硬化型アクリル系共重合体である。(メタ)アクリル酸アルキルエステル共重合体製造時のモノマー成分の配合量を表1に示す。なお、表1中、モノマー成分の欄の「-」との記載は、そのモノマー成分が未配合であることを意味する。
ポリエチレンテレフタレート製フィルムの片面がシリコーン処理により剥離処理された剥離フィルム(リンテック社製「SP-PET381031」、厚さ38μm)の前記剥離処理面に、保護膜形成用組成物を塗布し、乾燥させて、保護膜形成用フィルム(厚さ25μm)を形成した。前記保護膜形成用組成物は、下記の各成分を表2に示す量(固形分)で配合し、メチルエチルケトン、トルエン及び酢酸エチルの混合溶媒を用いて、固形分濃度を55質量%に調節したものである。
次いで、この保護膜形成用フィルムを、上記で得られた支持シートの粘着剤層の表面上に貼り合わせることで、保護膜形成用フィルムの粘着剤層が設けられた側とは反対側の表面に前記剥離フィルムを備えた保護膜形成用複合シートを得た。
(A)-1:アクリル酸メチル85質量部、及びアクリル酸2-ヒドロキシエチル15質量部を共重合してなるアクリル系重合体(重量平均分子量370000、ガラス転移温度6℃)
(熱硬化性成分(B))
・エポキシ樹脂(B11)
(B11)-1:ビスフェノールA型エポキシ樹脂(三菱化学社製「jER828」、エポキシ当量184~194g/eq)
(B11)-2:ビスフェノールA型エポキシ樹脂(三菱化学社製「jER1055」、エポキシ当量800~900g/eq)
(B11)-3:ジシクロペンタジエン型エポキシ樹脂(DIC社製「エピクロンHP-7200HH」、エポキシ当量255~260g/eq)
・熱硬化剤(B12)
(B12)-1:ジシアンジアミド(固体分散型潜在性硬化剤、ADEKA社製「アデカハードナーEH-3636AS」、活性水素量21g/eq)
(硬化促進剤(C))
(C)-1:2-フェニル-4,5-ジヒドロキシメチルイミダゾール(四国化成工業社製「キュアゾール2PHZ」)
(充填材(D))
(D)-1:シリカフィラー(アドマテックス社「SC2050MA」、平均粒子径0.5μm)
(カップリング剤(E))
(E)-1:シランカップリング剤(日本ユニー社製「A-1110」)
(汎用添加剤(G))
(G)-1:カーボンブラック(着色剤、三菱化学社製「#MA650」、平均粒径28nm)
[ダイシング時のチップ飛びの抑制]
上記で得られた保護膜形成用複合シートから剥離フィルムを除去した後、露出した保護膜形成用フィルムを、シリコンウエハ(直径6インチ、厚さ100μm)のドライポリッシュ研削面に70℃で貼付するとともに、露出した粘着剤層をリングフレームに貼付して、30分間静置した。
次いで、保護膜形成用複合シートを130℃で2時加熱して、保護膜形成用フィルムを硬化させて保護膜を形成した。
次いで、ダイシング装置を用いて、5mm×5mmの大きさにシリコンウエハをダイシングして、チップを得た。このとき、チップ飛びの有無を目視で確認し、チップ飛びが1個もなかった場合を「A」とし、チップ飛びが1個以上あった場合を「B」とした。結果を表3に示す。
上記で得られた保護膜形成用複合シートから剥離フィルムを除去した後、露出した保護膜形成用フィルムを、シリコンウエハ(直径6インチ、厚さ100μm)のドライポリッシュ研削面に70℃で貼付するとともに、露出した粘着剤層をリングフレームに貼付して、30分間静置した。
次いで、保護膜形成用複合シートを130℃で2時間加熱して、保護膜形成用フィルムを硬化させて保護膜を形成した。
次いで、ダイシング装置を用いて、5mm×5mmの大きさにシリコンウエハをダイシングして、チップを得た。そして、紫外線照射装置(リンテック社製「RAD2000m/8」)を用いて、照度220mW/cm2、光量190mJ/cm2の条件で、基材側から保護膜形成用複合シートに、高圧水銀灯を光源とする紫外線を照射して、粘着剤層を硬化させた。
次いで、ダイボンダー(キャノンマシナリー社製「BESTEM-D02」)を用いて、20個のチップをピックアップし、割れ又は欠けが生じたチップが1個もなかった場合を「A」とし、割れ又は欠けが生じたチップが1個以上あった場合を「B」とした。結果を表3に示す。
上記で得られた保護膜形成用複合シートを25mm×150mmの大きさに切断した後、剥離フィルムを除去して、露出した保護膜形成用フィルムを、ラミネーター(Fuji社製「LAMIPACKERLPD3214」)を用いて、シリコンウエハ(直径6インチ、厚さ500μm)のドライポリッシュ研削面に70℃で貼付した。
次いで、保護膜形成用複合シートを130℃で2時間加熱して、保護膜形成用フィルムを硬化させて保護膜を形成し、試験片(1)を作製した。
この試験片(1)について、精密万能試験機(島津製作所製「オートグラフAG-IS)を用いて、剥離角度180°、測定温度23℃、引張速度300mm/分の条件で、支持シート(硬化前の粘着剤層と基材との積層体)を保護膜から剥がす引っ張り試験を行い、このときの荷重を測定して、硬化前の粘着剤層と保護膜との剥離力(硬化前粘着剤層剥離力)とした。なお、前記荷重の測定値としては、支持シートを長さ100mmに渡って剥がしたときの測定値のうち、最初に長さ10mm分だけ剥がしたときと、最後に長さ10mm分だけ剥がしたときの、それぞれの測定値を有効値から除外したものを採用した。
結果を表3に示す。表3中の「剥離力(mN/25mm)」の欄における「粘着剤層硬化前」の数値が該当する結果である。
上記のものと同じ試験片(1)を作製した。
次いで、紫外線照射装置(リンテック社製「RAD2000m/8」)を用いて、照度220mW/cm2、光量190mJ/cm2の条件で、基材側から保護膜形成用複合シートに、高圧水銀灯を光源とする紫外線を照射して、粘着剤層を硬化させて、試験片(2)を作製した。
この試験片(2)について、上記の試験片(1)の場合と同じ方法で、支持シート(硬化後の粘着剤層と基材との積層体)を保護膜から剥がす引っ張り試験を行い、硬化後の粘着剤層と保護膜との剥離力(硬化後粘着剤層剥離力)とした。結果を表3に示す。表3中の「剥離力(mN/25mm)」の欄における「粘着剤層硬化後」の数値が該当する結果である。
[実施例2]
粘着剤層の形成時において、(メタ)アクリル酸アルキルエステル共重合体として、上述の重量平均分子量1100000のものに代えて、表1に示すように、2EHA40質量部と、酢酸ビニル(以下、「VAc」と略記することがある)40質量部と、HEA20質量部とを共重合させて得られたプレ共重合体に、さらにMOI21.4質量部(HEA中の水酸基の総モル数に対して、MOI中のイソシアネート基の総モル数が0.8倍となる量)を反応させて得られた、重量平均分子量500000の紫外線硬化型アクリル系共重合体を用いた点以外は、実施例1と同じ方法で、保護膜形成用複合シートを製造及び評価した。結果を表3に示す。
粘着剤層の形成時において、(メタ)アクリル酸アルキルエステル共重合体として、上述の重量平均分子量1100000のものに代えて、表1に示すように、メタクリル酸ラウリル(以下、「LMA」と略記することがある)80質量部と、HEA20質量部とを共重合させて得られたプレ共重合体に、さらにMOI21.4質量部(HEA中の水酸基の総モル数に対して、MOI中のイソシアネート基の総モル数が0.8倍となる量)を反応させて得られた、重量平均分子量600000の紫外線硬化型アクリル系共重合体を用いた点以外は、実施例1と同じ方法で、保護膜形成用複合シートを製造及び評価した。結果を表3に示す。
粘着剤層の形成時において、(メタ)アクリル酸アルキルエステル共重合体として、上述の重量平均分子量1100000のものに代えて、表1に示すように、アクリル酸イソステアリル(以下、「ISTA」と略記することがある)80質量部と、HEA20質量部とを共重合させて得られたプレ共重合体に、さらにMOI21.4質量部(HEA中の水酸基の総モル数に対して、MOI中のイソシアネート基の総モル数が0.8倍となる量)を反応させて得られた、重量平均分子量600000の紫外線硬化型アクリル系共重合体を用いた点以外は、実施例1と同じ方法で、保護膜形成用複合シートを製造及び評価した。結果を表3に示す。
粘着剤層の形成時において、(メタ)アクリル酸アルキルエステル共重合体として、上述の重量平均分子量1100000のものに代えて、表1に示すように、アクリル酸ブチル(以下、「BA」と略記することがある)40質量部と、VAc40質量部と、HEA20質量部とを共重合させて得られたプレ共重合体に、さらにMOI21.4質量部(HEA中の水酸基の総モル数に対して、MOI中のイソシアネート基の総モル数が0.8倍となる量)を反応させて得られた、重量平均分子量600000の紫外線硬化型アクリル系共重合体を用いた点以外は、実施例1と同じ方法で、保護膜形成用複合シートを製造及び評価した。結果を表3に示す。
粘着剤層の形成時において、(メタ)アクリル酸アルキルエステル共重合体として、上述の重量平均分子量1100000のものに代えて、表1に示すように、BA40質量部と、メタクリル酸メチル(以下、「MMA」と略記することがある)40質量部と、HEA20質量部とを共重合させて得られたプレ共重合体に、さらにMOI21.4質量部(HEA中の水酸基の総モル数に対して、MOI中のイソシアネート基の総モル数が0.8倍となる量)を反応させて得られた、重量平均分子量600000の紫外線硬化型アクリル系共重合体を用いた点以外は、実施例1と同じ方法で、保護膜形成用複合シートを製造及び評価した。結果を表3に示す。
粘着剤層の硬化前後における剥離力の比([粘着剤層硬化前剥離力]/[粘着剤層硬化後剥離力])は、実施例1は4.6、実施例2は4.2、実施例3は14.3、実施例4は1.8となっており、実施例1~3で特に大きくなっており、なかでも実施例3は際立って大きく、前記アルキルエステルを構成するアルキル基の炭素数が12とその近傍の値である場合に、本発明の効果が特に高くなることが示唆された。
Claims (3)
- 基材上に粘着剤層を備え、前記粘着剤層上に保護膜形成用フィルムを備えてなり、前記粘着剤層は活性エネルギー線硬化性を有し、前記保護膜形成用フィルムは熱硬化性を有する保護膜形成用複合シートであって、
前記保護膜形成用複合シートは、これを前記保護膜形成用フィルムにより半導体ウエハの裏面に貼付した後、前記保護膜形成用フィルムを加熱によって硬化させて保護膜とし、次いで、前記半導体ウエハをダイシングして半導体チップとした後、活性エネルギー線の照射によって前記粘着剤層を硬化させてから、前記半導体チップをその裏面に貼付された前記保護膜とともにピックアップすることによって、保護膜付き半導体チップを製造するために用いるものであり、
前記粘着剤層は、少なくとも前記保護膜形成用フィルムと接触している層において、(メタ)アクリル酸アルキルエステル共重合体を含有し、
前記(メタ)アクリル酸アルキルエステル共重合体は、アルキルエステルを構成するアルキル基の炭素数が8以上の(メタ)アクリル酸アルキルエステルから誘導される構成単位を有する、保護膜形成用複合シート。 - 前記保護膜形成用フィルムが、エポキシ樹脂と、加熱によって溶解し、かつ前記エポキシ樹脂に対して硬化活性を示す熱硬化剤と、イミダゾール類と、を含有する、請求項1に記載の保護膜形成用複合シート。
- 前記アルキルエステルを構成するアルキル基の炭素数が11~18である、請求項1又は2に記載の保護膜形成用複合シート。
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021037624A (ja) * | 2019-08-30 | 2021-03-11 | リンテック株式会社 | 保護膜形成用複合シート |
JP2021081595A (ja) * | 2019-11-19 | 2021-05-27 | 日東電工株式会社 | 粘着剤付き光学フィルムおよびその製造方法 |
KR20220082726A (ko) | 2020-12-10 | 2022-06-17 | 린텍 가부시키가이샤 | 보호막이 형성된 워크의 제조 방법 및 보호막 형성 필름이 형성된 워크의 제조 방법 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI641494B (zh) * | 2015-11-04 | 2018-11-21 | 日商琳得科股份有限公司 | 第一保護膜形成用片、第一保護膜形成方法以及半導體晶片的製造方法 |
CN109789666B (zh) * | 2017-03-30 | 2024-06-04 | 琳得科株式会社 | 保护膜形成用复合片 |
KR102596665B1 (ko) * | 2018-09-11 | 2023-11-01 | 린텍 가부시키가이샤 | 보호막 형성용 필름, 보호막 형성용 복합 시트, 검사 방법 및 식별 방법 |
US20230108829A1 (en) | 2021-10-01 | 2023-04-06 | Nitto Denko Corporation | Pressure-sensitive adhesive composition to be used in pressure-sensitive adhesive tape for semiconductor processing and pressure-sensitive adhesive tape using the pressure-sensitive adhesive composition |
US20230107095A1 (en) | 2021-10-01 | 2023-04-06 | Nitto Denko Corporation | Backgrinding tape |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011228450A (ja) * | 2010-04-19 | 2011-11-10 | Nitto Denko Corp | ダイシングテープ一体型半導体裏面用フィルム |
JP2014105248A (ja) * | 2012-11-26 | 2014-06-09 | Sekisui Chem Co Ltd | 後硬化テープ及び接合部材の接合方法 |
WO2014142151A1 (ja) * | 2013-03-13 | 2014-09-18 | リンテック株式会社 | 保護膜形成用複合シート、保護膜形成用複合シートの製造方法および保護膜付チップの製造方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
MY138566A (en) * | 2004-03-15 | 2009-06-30 | Hitachi Chemical Co Ltd | Dicing/die bonding sheet |
JP4493643B2 (ja) * | 2006-12-06 | 2010-06-30 | 日東電工株式会社 | 再剥離型粘着剤組成物、及び粘着テープ又はシート |
JP4994429B2 (ja) * | 2008-08-04 | 2012-08-08 | 日東電工株式会社 | ダイシング・ダイボンドフィルム |
JP5210346B2 (ja) * | 2010-04-19 | 2013-06-12 | 電気化学工業株式会社 | 粘着シート及び電子部品の製造方法 |
KR101311647B1 (ko) * | 2010-07-07 | 2013-09-25 | 후루카와 덴키 고교 가부시키가이샤 | 웨이퍼 가공용 테이프 및 그것을 이용한 반도체 가공 방법 |
WO2012018083A1 (ja) * | 2010-08-06 | 2012-02-09 | 日東電工株式会社 | 電子部品の製造方法 |
JP5781302B2 (ja) * | 2010-12-28 | 2015-09-16 | 日東電工株式会社 | 放射線硬化型粘着剤組成物及び粘着シート |
WO2012165368A1 (ja) * | 2011-05-27 | 2012-12-06 | 電気化学工業株式会社 | 粘着シート |
WO2014030699A1 (ja) * | 2012-08-23 | 2014-02-27 | リンテック株式会社 | 保護膜形成層付ダイシングシートおよびチップの製造方法 |
JP6180139B2 (ja) * | 2013-03-11 | 2017-08-16 | リンテック株式会社 | 保護膜形成用複合シートおよび保護膜形成用フィルム付チップの製造方法 |
WO2014157426A1 (ja) * | 2013-03-27 | 2014-10-02 | リンテック株式会社 | 保護膜形成用複合シート |
WO2014157520A1 (ja) * | 2013-03-28 | 2014-10-02 | リンテック株式会社 | 保護膜形成用複合シート、保護膜付きチップ、及び保護膜付きチップの製造方法 |
WO2014199993A1 (ja) * | 2013-06-14 | 2014-12-18 | 電気化学工業株式会社 | 半導体検査用の耐熱性粘着シート |
JP5950869B2 (ja) * | 2013-06-20 | 2016-07-13 | 古河電気工業株式会社 | 半導体ウエハ表面保護用粘着テープ |
KR20210130275A (ko) * | 2013-08-01 | 2021-10-29 | 린텍 가부시키가이샤 | 보호막 형성용 복합 시트 |
-
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011228450A (ja) * | 2010-04-19 | 2011-11-10 | Nitto Denko Corp | ダイシングテープ一体型半導体裏面用フィルム |
JP2014105248A (ja) * | 2012-11-26 | 2014-06-09 | Sekisui Chem Co Ltd | 後硬化テープ及び接合部材の接合方法 |
WO2014142151A1 (ja) * | 2013-03-13 | 2014-09-18 | リンテック株式会社 | 保護膜形成用複合シート、保護膜形成用複合シートの製造方法および保護膜付チップの製造方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021037624A (ja) * | 2019-08-30 | 2021-03-11 | リンテック株式会社 | 保護膜形成用複合シート |
JP7500169B2 (ja) | 2019-08-30 | 2024-06-17 | リンテック株式会社 | 保護膜形成用複合シート |
JP2021081595A (ja) * | 2019-11-19 | 2021-05-27 | 日東電工株式会社 | 粘着剤付き光学フィルムおよびその製造方法 |
WO2021100490A1 (ja) * | 2019-11-19 | 2021-05-27 | 日東電工株式会社 | 粘着剤付き光学フィルムおよびその製造方法 |
JP7312679B2 (ja) | 2019-11-19 | 2023-07-21 | 日東電工株式会社 | 粘着剤付き光学フィルムおよびその製造方法 |
KR20220082726A (ko) | 2020-12-10 | 2022-06-17 | 린텍 가부시키가이샤 | 보호막이 형성된 워크의 제조 방법 및 보호막 형성 필름이 형성된 워크의 제조 방법 |
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