WO2016189772A1 - 磁気抵抗効果素子 - Google Patents
磁気抵抗効果素子 Download PDFInfo
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- WO2016189772A1 WO2016189772A1 PCT/JP2016/000158 JP2016000158W WO2016189772A1 WO 2016189772 A1 WO2016189772 A1 WO 2016189772A1 JP 2016000158 W JP2016000158 W JP 2016000158W WO 2016189772 A1 WO2016189772 A1 WO 2016189772A1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/098—Magnetoresistive devices comprising tunnel junctions, e.g. tunnel magnetoresistance sensors
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/3227—Exchange coupling via one or more magnetisable ultrathin or granular films
- H01F10/3231—Exchange coupling via one or more magnetisable ultrathin or granular films via a non-magnetic spacer
- H01F10/3236—Exchange coupling via one or more magnetisable ultrathin or granular films via a non-magnetic spacer made of a noble metal, e.g.(Co/Pt) n multilayers having perpendicular anisotropy
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
- H01F10/3272—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/01—Manufacture or treatment
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/80—Constructional details
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/80—Constructional details
- H10N50/85—Magnetic active materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3286—Spin-exchange coupled multilayers having at least one layer with perpendicular magnetic anisotropy
Definitions
- the present invention relates to a magnetoresistive effect element, and more particularly to a magnetoresistive effect element suitable for a vertical TMR element used in an MRAM.
- TMR element As a magnetoresistive effect element whose electric resistance is changed by a magnetic field, a TMR element (also referred to as MTJ (Magnetic Tunnel Junction) element) that performs information storage and magnetic detection using the TMR (Tunnel Magneto Resistance) effect is known. Yes. In recent years, use of MTJ elements for MRAM (Magnetoretic Random Access Memory) and the like is expected.
- MRAM Magnetic Random Access Memory
- Non-Patent Document 1 discloses a perpendicular magnetization MTJ element.
- the perpendicular magnetization MTJ element includes a structure in which a free layer (magnetization free layer), a tunnel barrier layer, and a reference layer (magnetization fixed layer) are laminated, and the magnetization directions of the free layer and the reference layer are parallel to the lamination direction, respectively. .
- FIG. 10 shows an example of an MTJ element using the technique described in Non-Patent Document 1.
- the MTJ element 1000 shown in FIG. 10 is a perpendicular magnetization MTJ element (p-MTJ element) having a bottom pin structure.
- the MTJ element 1000 includes a lower electrode 1002 and a Ta layer (seed layer) 1003 on a substrate 1001.
- the MTJ element 1000 includes a Co / Pt stack 1004, a Co layer 1005, a Ru layer 1006, a Co layer 1007, a Pt layer 1008, a Co / Pt stack 1009, and a Ta layer (spacer layer) 1010 on the Ta layer 1003. Is provided.
- the MTJ element 1000 further includes a CoFeB layer 1011 as a reference layer, a MgO layer (barrier layer) 1012, a CoFeB layer 1013 as a free layer (magnetization free layer), a cap layer 1014, and an upper electrode 1015 on the Ta layer 1010.
- a CoFeB layer 1011 as a reference layer
- MgO layer (barrier layer) 1012
- CoFeB layer 1013 as a free layer (magnetization free layer)
- cap layer 1014 an upper electrode 1015 on the Ta layer 1010.
- the Co / Pt laminate 1004 of the MTJ element 1000 is obtained by alternately laminating a Co layer and a Pt layer by a predetermined number (N times).
- the multilayer body 1009 of the MTJ element 1000 is obtained by alternately laminating a Co layer and a Pt layer by a predetermined number (M times).
- FIG. 11 shows an example of a perpendicular magnetization MTJ element (p-MTJ element) using the technique described in Patent Document 1.
- the Co / Pt stacked body 1004 of the MTJ element 1000 is changed to a stacked body 2005 of a Co layer and a Ni layer.
- the Pt layer 1008 is further changed to the Ni layer 2009
- the Co / Pt stacked body 1009 is changed to the stacked body 2010 of the Co layer and the Ni layer.
- the present invention has been made to solve the above-described problems, and an object thereof is to provide a magnetoresistive effect element having a high MR ratio and a strong exchange coupling magnetic field.
- the magnetoresistive element of the present invention includes a barrier layer, a reference layer formed on one surface of the barrier layer, a free layer formed on the other surface of the barrier layer, and the barrier layer of the reference layer A pinned layer disposed on the opposite side of the pinned layer, the pinned layer comprising a layer laminated in the order of Pt, Co, Ru, Co, and Pt, and a layer containing Ni .
- the magnetoresistive effect element according to the present invention a magnetoresistive effect element having a high MR ratio and a strong exchange coupling magnetic field can be realized. Further, the yield of the post-process is good and the material cost can be suppressed because the amount of Pt used is small.
- the magnetoresistive effect element according to the present invention it is possible to realize a magnetoresistive effect element in which magnetization reversal of the magnetization fixed layer hardly occurs by forming a pinned layer having a strong exchange coupling magnetic field.
- FIG. 1 It is a schematic diagram which shows the structure of the MTJ element which concerns on 1st Embodiment of this invention. It is a schematic block diagram of the substrate processing system which performs the film-forming process of the MTJ element based on one Embodiment of this invention.
- 2 is a flowchart showing a method for manufacturing the MTJ element of FIG. 1. It is a figure which shows MR ratio of the MTJ element of FIG. It is a schematic diagram which shows the structure of the perpendicular magnetization film for perpendicular
- FIG. 1 is a schematic diagram showing a configuration of an exemplary MTJ (Magnetic Tunnel Junction) element 4000 that performs the film forming method according to the present embodiment.
- the MTJ element is used for, for example, an MRAM (Magnetic Random Access Memory), a magnetic sensor, or the like.
- the MTJ element 4000 is a perpendicular magnetization type MTJ element (p-MTJ element) having a bottom pin structure.
- the MTJ element 4000 includes a lower electrode 4002 and a Ta layer (seed layer) 4003 on a substrate 4001.
- the MTJ element 4000 includes a NiCr (seed layer) 4004, a Co / Ni stacked body 4005, a Co / Pt layer 4006, a Co layer 4007, a Ru layer 4008, a Co layer 4009, a Pt layer 4010, a Co / Ni layer 4005 on a Ta layer 4003.
- a Ni laminate 4011 and a Ta layer (spacer layer) 4012 are provided.
- the MTJ element 4000 further includes a CoFeB layer 4013 as a reference layer, an MgO layer 4014 as a barrier layer, a CoFeB layer 4015 as a free layer (magnetization free layer), a cap layer 4016, and an upper electrode 4017 on the Ta layer 4012.
- a CoFeB layer 4013 as a reference layer
- an MgO layer 4014 as a barrier layer
- a CoFeB layer 4015 as a free layer (magnetization free layer)
- cap layer 4016 a cap layer 4016
- an upper electrode 4017 on the Ta layer 4012.
- the Co / Ni laminated body 4005 of the MTJ element 4000 is obtained by alternately laminating Co layers and Ni layers by a predetermined number (N times).
- the Co / Ni laminated body 4011 is obtained by alternately repeating a predetermined number (M times) of Co layers and Ni layers.
- the CoFeB layer 4013 is formed on one surface of the MgO layer 4014, and the CoFeB layer 4015 is formed on the other surface of the MgO layer 4014.
- a stacked structure from the Co / Ni stacked body 4005 to the Co / Ni stacked body 4011 is referred to as a SAF structure pinned layer (hereinafter referred to as a pinned layer).
- the pinned layer is an antiferromagnetic layer, and is arranged on the opposite side of the CoFeB layer 4013 to the MgO layer 4014. Specifically, the pinned layer is disposed on the opposite side of the CoFeB layer 4013 to the side where the barrier layer 4014 is disposed, and is disposed below the CoFeB layer 4013.
- the pinned layer has a large exchange coupling magnetic field that suppresses the magnetization reversal of the reference layer.
- the pinned layer of the MTJ element 4000 has a laminated structure in which the laminated structure portion of the Co layer 4007, the Ru layer 4008, and the Co layer 4009 is sandwiched between the Pt layer of the Co / Pt layer 4006 and the Pt layer 4010. Yes. That is, the pinned layer has a structure in which Pt (4006) / Co (4007) / Ru (4008) / Co (4009) / Pt (4010) are stacked in this order.
- the decrease can be suppressed.
- the Pt layer sandwiching the Co layer (4007, 4009) sandwiching the Ru4008 from the outside is referred to as a diffusion preventing layer.
- Ni which a diffusion prevention layer prevents diffusion is Ni contained in the Co / Ni laminated body 4005,4011. More specifically, the MTJ element 4000 has a pinned layer in the order of Ni / Co / Pt (4006) / Co (4007) / Ru (4008) / Co (4009) / Pt (4010) / Co / Ni. It has a laminated structure.
- the MTJ element 4000 is not limited to the configuration shown here, and if the upper and lower sides of the SAF structure are sandwiched between Pt layers, the number of layers can be increased and decreased as long as the function of the perpendicular magnetization type element is not impaired. Even if it is the structure which performed arbitrary changes, such as a change and reversal of the upper and lower lamination
- NiCr (seed layer) 4004 can be replaced with another layer not containing other Ni.
- FIG. 2 is a schematic configuration diagram of the substrate processing system 1 that performs the film forming process of the MTJ element 4000.
- the substrate processing system 1 is a cluster-type vacuum processing apparatus, and includes a plurality of substrate processing chambers 2, a load lock chamber 4, a substrate cooling device 100, and a temperature raising device 200.
- the plurality of substrate processing chambers 2 may perform the same processing on the substrate S or may perform different processing.
- the plurality of substrate processing chambers 2, the load lock chamber 4, the substrate cooling device 100, and the temperature raising device 200 are connected via the transfer chamber 3, and a gate valve that can be opened and closed is provided at each connection portion. It has been.
- the substrate S is transferred among the substrate processing chambers 2, the load lock chamber 4, the substrate cooling device 100, and the temperature raising device 200 in the predetermined processing order by the transfer robot 7 provided in the transfer chamber 3.
- An autoloader 5 for supplying the substrate S is provided outside the load lock chamber 4.
- FIG. 3 is a flowchart showing a method for manufacturing the perpendicular magnetization MTJ element 4000 according to this embodiment.
- the film forming method according to the present embodiment will be described using the cluster type substrate processing system 1 shown in FIG. Note that an in-line substrate processing system may be used as the apparatus used in the film forming method according to the present embodiment.
- the substrate S is carried into the load lock chamber 4 of the substrate processing system 1 (step S101).
- the substrate S is moved to a predetermined substrate processing chamber 2, and a lower layer film forming process is performed (step S102).
- impurities and the like attached on the substrate are removed by an etching method, and then a lower electrode 4002, a Ta layer (seed layer) 4003, and a NiCr layer (seed layer) 4004 are sequentially deposited.
- step S103 the first step of moving the substrate S to the predetermined substrate processing chamber 2 and forming the Co / Ni stacked body 4005 (perpendicular magnetization layer 1) is performed (step S103).
- step S104 a second step of forming a Co / Pt stack 4006 is performed (step S104).
- step S105 a third process for forming the Co layer 4007 is performed (step S105).
- step S106 a fourth process for forming the Ru layer 4008 is performed (step S106).
- step S107 a fifth step of forming a Co layer 4009 is performed (step S107).
- step S108 a sixth step of forming a Pt layer 4010 is performed (step S108).
- step S109 the seventh step of forming a Co / Ni stacked body 4011 is performed (step S109).
- the substrate S is sequentially moved to a predetermined substrate processing chamber 2 to perform an upper layer film forming step (step S110) for sequentially forming layers above the Ta layer 4012.
- the MgO layer 4014 is deposited by radio frequency (RF) sputtering using an MgO target.
- RF radio frequency
- the Mg layer formed on the CoFeB layer 4013 as a free layer may be oxidized by sputtering using an Mg target.
- the film formation process and the oxidation process may be performed in the same substrate processing chamber 2 or may be performed in different substrate processing chambers 2.
- each layer formed in the film forming process (steps S102 to S110) of this embodiment is formed by a sputtering method, but may be formed by any other film forming method.
- the substrate S is moved to the transfer position (substrate unloading position) in the load lock chamber 4 (step S112). Thereafter, the substrate S is sent to a process downstream of the substrate processing system 1, and an annealing process (step S113) is performed by an apparatus different from the substrate processing system 1.
- An annealing process is an annealing process performed in order to crystallize the CoFeB layer (4013, 4015) of an amorphous state, and to obtain a desired magnetic characteristic.
- the annealing process (step S113) can also be performed in the substrate processing system 1 by changing the chamber configuration of the substrate processing system 1.
- FIG. 4 is a diagram showing an MR ratio with respect to RA (area resistance) of the MTJ elements 2000 and 3000 manufactured by using the film forming method according to the present embodiment.
- the RA and MR ratio were measured for each of the MTJ element manufactured using the film forming method according to this embodiment and the MTJ element manufactured using the conventional film forming method.
- the conventional film forming method and the film forming method of the present invention are manufactured according to the flowchart of FIG.
- a colored circle (O) is a measurement result of the MTJ element 1000 manufactured by the conventional film forming method with the MTJ element structure shown in FIG.
- Black triangles ( ⁇ ) are the measurement results of the MTJ element manufactured by the conventional film formation method with the MTJ element structure shown in FIG.
- a black square ( ⁇ ) is a measurement result of the MTJ element 4000 manufactured by the film forming method according to this embodiment.
- the MTJ element for measurement 5000 includes a Ta layer (spacer layer) 2011, a CoFeB layer 2012 as a reference layer, an MgO layer (barrier layer) 2013, a free layer (magnetization) from the MTJ element 2000 shown in FIG.
- a Ru layer (Cap layer) 5011 is formed on the Co / Ni stack 5010 (perpendicular magnetization layer 2) except for the CoFeB layer 2014, the cap layer 2015, and the upper electrode 2016 as a free layer), and is subjected to the heat treatment step. It is a thing.
- the structure from the lower electrode 5002 of the measuring MTJ element 5000 to the Co / Ni stacked body 5010 is the same as that of the lower electrode 2002 of the MTJ element 2000 to the Co / Ni stacked body 2010.
- the perpendicular magnetization type MTJ element 6000 corresponds to the MTJ element of the present embodiment, and includes a Ta layer (spacer layer) 4012, a CoFeB layer 4013 as a reference layer, an MgO from the MTJ element 4000 shown in FIG. Except for the layer (barrier layer) 4014, the CoFeB layer 4015 as the free layer (magnetization free layer), the cap layer 4016, and the upper electrode 4017, the Ru layer (Cap) on the Co / Ni stacked body 4011 (perpendicular magnetization layer 2) Layer) 6012 is formed and subjected to a heat treatment step.
- the structure from the lower electrode 6002 of the measuring MTJ element 6000 to the Co / Ni stacked body 6011 is the same as that of the lower electrode 4002 of the MTJ element 4000 to the Co / Ni stacked body 4011.
- FIG. 6 shows the measurement results of the perpendicular magnetization curves (M-H loop) of the MTJ elements 5000 and 6000 for measurement.
- VSM was used for the measurement of the perpendicular magnetization curve.
- the horizontal axis indicates the strength of the magnetic field applied to the MTJ element, and the vertical axis indicates the magnetization of each layer in the MTJ element.
- the broken line is the measurement result of the measurement MTJ element 5000 without the Pt layer as the diffusion prevention layer
- the solid line is the measurement result of the MTJ element 6000 with the Pt layer as the diffusion prevention layer.
- the MTJ element according to any measurement result is manufactured according to the flowchart of FIG. As shown in FIG. 6, the measurement result (solid line) of the MTJ element 6000 has a larger exchange coupling magnetic field (Hex) than the measurement result (broken line) of the measurement MTJ element 5000.
- FIG. 7 is a diagram showing the relationship between the number of Co / Ni stacks and the exchange coupling magnetic field (Hex) in the MTJ elements 5000 and 6000 for measurement.
- the exchange coupling magnetic field (Hex) was calculated from the VSM measurement result with and without the diffusion prevention layer.
- the horizontal axis in FIG. 7 indicates the number of Co / Ni stacks, and the vertical axis indicates the exchange coupling magnetic field (Hex).
- the MTJ element 6000 having the diffusion prevention layer has a larger exchange coupling magnetic field (Hex) than the measurement MTJ element 5000 having no diffusion prevention layer.
- the magnetoresistive effect element of this embodiment has a high MR ratio equivalent to that of the conventional one and a large exchange coupling magnetic field. Therefore, the magnetoresistive element of this embodiment can prevent unintentional magnetization reversal of the magnetization fixed layer due to an external magnetic field. Further, since the amount of Pt used is smaller than that of the conventional magnetoresistive element shown in FIG. 10, the yield is good because the damping constant of the element circuit can be suppressed from being lowered after the post-process. Further, since the amount of Pt used is less than that of the conventional magnetoresistive element shown in FIG. 10, the material cost can be suppressed. Furthermore, according to the method for manufacturing a perpendicular magnetization MTJ element of the present invention, the above-described magnetoresistance effect element can be manufactured.
- the MTJ element 4000 according to the first embodiment has a structure having a reference layer 4013 under the tunnel barrier layer 4014 (bottom pin structure), but also has a structure having a reference layer on the tunnel barrier layer (top pin structure).
- the present invention can be applied.
- FIG. 8 shows an MTJ element 9000 as an example of a perpendicular magnetization type MTJ element (p-MTJ element) having a top pin structure.
- a lower electrode 9002 includes a lower electrode 9002, a Ta layer (seed layer) 9003, a CoFeB layer 9004 as a free layer (magnetization free layer), an MgO layer (barrier layer) 9005, and a CoFeB as a reference layer.
- Layer 9006, Ta layer (spacer layer) 9007, NiCr (seed layer) 9008, Co / Ni laminated body 9009, Co / Pt layer 9010, Co layer 9011, Ru layer 9012, Co layer 9013, Pt layer 9014, Co / Ni A stacked body 9015, a cap layer 9016, and an upper electrode layer 9017 are stacked in this order.
- the Co / Ni laminated body 9009 is obtained by alternately repeating a predetermined number (M times) of Co layers and Ni layers. Further, the Co / Ni laminated body 9015 is obtained by alternately repeating a predetermined number (N times) of Co layers and Ni layers.
- the laminated structure from the Co / Ni laminated body 9009 to the Co / Ni laminated body 9015 is referred to as a SAF structure pinned layer (hereinafter referred to as a pinned layer).
- the pinned layer is an antiferromagnetic layer and is disposed on the opposite side of the CoFeB layer 9006 from the MgO layer 9005. Specifically, the pinned layer is disposed on the opposite side of the CoFeB layer 9006 on the side where the barrier layer 9005 is disposed, and is disposed on the upper layer than the CoFeB layer 9006.
- the outer side of the Co layer (9011, 9013) sandwiching the Ru layer 9012 is a Pt layer (9010, 9014), thereby preventing Ni from diffusing into the Co layer (9011, 9013) at the Ru interface, and the exchange coupling magnetic field. There is an effect to suppress the decrease of the.
- the Pt layer sandwiching the Co layers (9011, 9013) sandwiching the Ru 9012 from the outside is referred to as a diffusion preventing layer.
- the MTJ element 9000 is not limited to the configuration shown here. If the top and bottom of the SAF structure are sandwiched between Pt layers, the number of layers can be increased or decreased within the range that does not impair the function of the perpendicular magnetization type element. Even if it is the structure which performed arbitrary changes, such as a change and reversal of the upper and lower lamination
- FIG. 9 is a flowchart showing a method for manufacturing the MTJ element 9000 according to this embodiment.
- the film forming method according to the present embodiment will be described using the cluster type substrate processing system 1 shown in FIG.
- an in-line substrate processing system may be used as the apparatus used in the film forming method according to the present embodiment.
- the substrate S is carried into the load lock chamber 4 of the substrate processing system 1 (step S201).
- a lower layer film forming process for sequentially forming a film on the substrate side from the Co / Ni laminated body 9009 is performed (step S202).
- impurities and the like attached on the substrate are removed by an etching method, and then the lower electrode 9002, Ta layer (seed layer) 9003, CoFeB layer (free layer) 9004, MgO layer (barrier layer) 9005, A CoFeB layer (reference layer) 9006, a Ta layer (spacer layer) 9007, and a NiCr layer (seed layer) 9008 are sequentially formed.
- the MgO layer 9005 is deposited by radio frequency (RF) sputtering using an MgO target.
- RF radio frequency
- the Mg layer formed on the CoFeB layer 9004 as a free layer may be oxidized by sputtering using an Mg target.
- a first step of forming a Co / Ni stacked body 9009 (perpendicular magnetization layer 1) is performed (step S203).
- a second step of forming a Co / Pt layer 9010 is performed (step S204).
- a third step for forming the Co layer 9011 is performed (step S205).
- a fourth process for forming a Ru layer 9012 is performed (step S206).
- a fifth step of forming a Co layer 9013 is performed (step S207).
- a sixth step of forming a Pt layer 9014 is performed (step S208).
- a seventh step of forming a Co / Ni stacked body 9015 is performed (step S209).
- step S210 for sequentially forming layers above the Co / Ni stacked body 9015 is performed.
- the upper layer deposition step (step S210) the Cap layer 9016 and the upper electrode layer 9017 are deposited.
- each layer formed in the film forming process (steps S202 to S210) of this embodiment is formed by a sputtering method, but may be formed by any other film forming method.
- the substrate S is moved to the transfer position (substrate unloading position) in the load lock chamber 4 (step S212). Thereafter, the substrate S is sent to a downstream process of the substrate processing system 1, and an annealing process (step S213) is performed by an apparatus different from the substrate processing system 1.
- the annealing process is an annealing process for crystallizing the amorphous CoFeB layer (9004, 9006). Note that the annealing process (step S213) can be performed in the substrate processing system 1 by changing the chamber configuration of the substrate processing system 1.
- the MTJ element 9000 having the top pin structure of the second embodiment is basically the same as that of the first embodiment, the RA (area resistance) and the MR ratio are not affected by the presence or absence of the diffusion prevention layer.
- the MTJ element 9000 of the present embodiment has a high MR ratio and a large exchange coupling magnetic field, similar to the MTJ element 4000 described above. Therefore, unintended magnetization reversal of the reference layer due to an external magnetic field can be prevented. Further, the yield of the post-process is good and the material cost can be suppressed because the amount of Pt used is small. Furthermore, according to the method for manufacturing a perpendicular magnetization MTJ element of the present invention, the above-described magnetoresistance effect element can be manufactured.
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Abstract
Description
図1は、本実施形態に係る成膜方法を行う例示的なMTJ(Magnetic Tunnel Junction:磁気抵抗効果素子)素子4000の構成を示す模式図である。MTJ素子は、例えばMRAM(Magnetic Random Access Memory)、磁気センサ等に用いられる。
第1実施形態に係るMTJ素子4000は、トンネルバリア層4014の下にリファレンス層4013を有する構造(ボトムピン構造)であるが、トンネルバリア層の上にリファレンス層を有する構造(トップピン構造)にも、本発明を適用することができる。図8にトップピン構造の垂直磁化型MTJ素子(p-MTJ素子)の例としてMTJ素子9000を示す。
Claims (2)
- バリア層と、
前記バリア層の一方の表面に形成されたリファレンス層と、
前記バリア層の他方の表面に形成されたフリー層と、
前記リファレンス層の前記バリア層とは逆側に配置されたピン層と、を有し、
前記ピン層は、Pt,Co,Ru,Co,Ptの順番で積層された層、およびNiを含む層を備えることを特徴とする磁気抵抗効果素子。 - 前記ピン層は、Ni,Co,Pt,Co,Ru,Co,Pt,Co,Niの順番で積層された構造を備えることを特徴とする請求項1に磁気抵抗効果素子。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016522821A JP5952519B1 (ja) | 2015-05-22 | 2016-01-14 | 磁気抵抗効果素子 |
KR1020167028980A KR101800237B1 (ko) | 2015-05-22 | 2016-01-14 | 자기저항 효과 소자 |
DE112016002318.9T DE112016002318B4 (de) | 2015-05-22 | 2016-01-14 | Magnetowiderstandseffektbauelement |
SG11201708865PA SG11201708865PA (en) | 2015-05-22 | 2016-01-14 | Magnetoresistance effect element |
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JP2021523569A (ja) * | 2018-05-08 | 2021-09-02 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 磁気トンネル接合構造及びその製造方法 |
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SG11201601116UA (en) | 2015-02-02 | 2016-09-29 | Canon Anelva Corp | Method of manufacturing perpendicular mtj device |
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US10388853B2 (en) * | 2017-12-29 | 2019-08-20 | Spin Memory, Inc. | Magnetic memory having a pinning synthetic antiferromagnetic structure (SAF) with cobalt over platinum (Pt/Co) bilayers |
KR101993186B1 (ko) | 2018-12-04 | 2019-06-27 | 이용근 | 셔트 타입 연속 포장기 |
KR102632986B1 (ko) * | 2019-10-01 | 2024-02-05 | 에스케이하이닉스 주식회사 | 전자 장치 |
CN116243222B (zh) * | 2023-03-16 | 2023-09-29 | 珠海多创科技有限公司 | 一种磁电阻器件及其制造方法、磁传感装置 |
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Publication number | Publication date |
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TW201705564A (zh) | 2017-02-01 |
DE112016002318T5 (de) | 2018-03-08 |
SG11201708865PA (en) | 2017-11-29 |
KR101800237B1 (ko) | 2017-11-22 |
US9853207B2 (en) | 2017-12-26 |
DE112016002318B4 (de) | 2021-01-14 |
KR20170013206A (ko) | 2017-02-06 |
US20160380187A1 (en) | 2016-12-29 |
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