WO2016154822A1 - 一种终端设备用彩色玻璃板及其形成方法、终端设备 - Google Patents

一种终端设备用彩色玻璃板及其形成方法、终端设备 Download PDF

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WO2016154822A1
WO2016154822A1 PCT/CN2015/075314 CN2015075314W WO2016154822A1 WO 2016154822 A1 WO2016154822 A1 WO 2016154822A1 CN 2015075314 W CN2015075314 W CN 2015075314W WO 2016154822 A1 WO2016154822 A1 WO 2016154822A1
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Prior art keywords
film
glass substrate
colored
chemical vapor
vapor deposition
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PCT/CN2015/075314
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English (en)
French (fr)
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盛秋春
林耿
邓常猛
王晓飞
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华为技术有限公司
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Priority to CN201580026640.2A priority Critical patent/CN106458720A/zh
Priority to PCT/CN2015/075314 priority patent/WO2016154822A1/zh
Publication of WO2016154822A1 publication Critical patent/WO2016154822A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes

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  • the present invention relates to the field of terminal electronic products, and in particular, to a colored glass plate for a terminal device, a forming method thereof, and a terminal device.
  • the color of the cover glass at the present stage mainly comes from the processes of surface printing, filming and the like.
  • Offset printing is transferred to the blanket by a presensitized plate (PS) and transferred to the substrate.
  • PS presensitized plate
  • Flexo printing is a direct printing method, which is a developing environmentally friendly printing, also known as green printing.
  • offset printing and flexo printing are lacking in printing on the ground, and it is difficult to keep the ink color consistent, sometimes it needs to be printed twice or even multiple times.
  • Silk screen printing is a kind of supplementary printing, which is mainly reflected in higher ink hiding power and color intensity.
  • the thickness of the ink layer is thicker at 20-100 ⁇ m.
  • the screen printing ink layer is thick, but the printing speed is slow, and the rotary screen is relatively expensive.
  • the film is relatively simple in process, it is easy to fall off and has a thick thickness.
  • Embodiments of the present invention provide a color glass plate for a terminal device, a forming method thereof, and a terminal device, and propose a new method for obtaining a colored glass plate for a terminal device, and have cost, uniformity, thickness, etc. compared to the prior art. Advantage.
  • an embodiment of the present invention provides a method for forming a colored glass plate for a terminal device, comprising: placing a terminal device with a glass substrate in a cavity of a chemical vapor deposition device; and using the chemical vapor deposition method in the glass A film having a color is formed on the surface of the substrate to form the colored glass plate.
  • the film has a thickness between 20 and 1000 nm.
  • the deposition rate of the chemical vapor deposition apparatus is The deposition time is 1-60 mins.
  • the method further comprises: performing in situ on the substrate on which the film is formed annealing.
  • the in-situ annealing temperature is 350-500 ° C, and the processing time is 5-60 mins.
  • the method before the terminal device is placed in the cavity of the chemical vapor deposition device, the method further comprises: performing a chemical strengthening process on the glass substrate.
  • the chemical strengthening process of the glass substrate comprises: the glass substrate and the colored A strengthening layer is formed between the films; wherein the reinforcing layer is in contact with the glass substrate, and the colored film is in contact with the reinforcing layer.
  • a seventh possible implementation manner of the first aspect the forming a film having a color on the surface of the glass substrate by a chemical vapor deposition method, including: at a temperature of 300-500 In the cavity of °C, a film having a color is formed on the surface of the glass substrate by chemical vapor deposition.
  • the film is a metal film, or a metal oxide film, or an alloy film.
  • the material of the metal thin film is one of chromium, cobalt, nickel, iron, zinc, manganese, indium, and aluminum; and the material of the alloy thin film is chromium, cobalt, nickel, iron, zinc. At least two of manganese, indium and aluminum.
  • the material of the metal oxide film is tin dioxide, titanium dioxide, zirconium dioxide, zinc oxide At least one.
  • an embodiment of the present invention provides a colored glass plate for a terminal device, comprising: a glass substrate and a colored film disposed on the glass substrate; wherein the colored film is subjected to chemical vapor deposition form.
  • the film has a thickness between 20 and 1000 nm.
  • a reinforcing layer is further disposed on a side surface of the glass substrate opposite to the film having the color.
  • an embodiment of the present invention provides a terminal device, including the color glass plate for the terminal device of the second aspect.
  • Embodiments of the present invention provide a color glass plate for a terminal device, a method for forming the same, and a terminal device, the method comprising: providing a glass substrate for a terminal device; forming a film having a color on a surface of the glass substrate by a chemical vapor deposition method, The colored glass plate is formed.
  • the embodiment of the present invention only needs to increase the above-mentioned process for forming a thin film on the basis of the existing glass substrate production line, thereby avoiding a substantial increase in cost; on the other hand, since the chemical vapor deposition has a high film formation rate, the formed The film has high purity, uniformity, thinness and wear resistance, so the embodiment of the invention has greater advantages than the processes of surface printing, filming and the like in the prior art.
  • FIG. 1 is a schematic flow chart of forming a colored glass plate according to an embodiment of the present invention
  • FIG. 2 is a schematic flow chart of forming a colored glass plate according to Embodiment 1 of the present invention.
  • FIG. 3 is a schematic flow chart of forming a colored glass plate according to Embodiment 2 of the present invention.
  • the embodiment of the invention provides a method for forming a colored glass plate for a terminal device. As shown in FIG. 1 , the method includes the following steps:
  • the terminal device is placed in the cavity of the chemical vapor deposition device by a glass substrate, and may be placed by a machine or manually, and is not limited herein.
  • the terminal device may be, for example, an electronic device such as a mobile phone, an electronic photo album, or a tablet computer.
  • the main function is to present the displayed information on one side of the mobile phone (which may be referred to as a front side) so as to be received by the user, so that the substrate located on the front side of the mobile phone must be transparent, that is, It is necessary to ensure that the substrate on the front side is a transparent substrate, and in the embodiment of the present invention, a colored glass plate is formed by the following S02. Therefore, those skilled in the art can easily understand that the colored glass plate in the embodiment of the present invention is not used in the mobile phone.
  • the front side of the display is used for the back of the front of the phone.
  • the back of the current iPhone 4/4s phone is a glass plate.
  • the embodiment of the present invention provides the colored glass plate for the terminal device from the perspective of aesthetics and personalization, when the colored glass plate is used for the back surface of the mobile phone, it should also be the colored glass.
  • the colored side of the board is on the outside that can be seen by the user.
  • the colored surface of the colored glass plate is the side on which the colored film formed is formed.
  • the glass substrate in the colored glass plate may be a transparent glass substrate or Therefore, it is an opaque glass substrate, which is not limited herein.
  • Chemical vapor deposition is a film-forming technique that uses a reaction substance to chemically react under gaseous conditions to form a solid substance deposited on the surface of a substrate to produce a solid film.
  • the CVD preparation of the film may include the following processes: (1) diffusion of the reaction gas toward the surface of the substrate; (2) adsorption of the reaction gas to the surface of the substrate; (3) chemical reaction of the reaction gas on the surface of the substrate; (4) gas phase reaction generated on the surface of the substrate.
  • the product leaves the surface of the substrate, diffuses into the space or is pumped away by the pumping system; (5) leaves a film of a non-volatile solid phase reaction product on the surface of the substrate.
  • CVD reactions Several common types of CVD reactions are: thermal decomposition reactions, chemical synthesis reactions, and the like.
  • the general formula of the thermal decomposition reaction is: Where Q represents temperature, g represents gaseous state, and s represents solid state (ie, A is the final film material).
  • a chemical synthesis reaction refers to the mutual reaction of two or more gaseous reactants on the surface of a heated substrate.
  • the most common is nitrogen reduction halides to prepare various metal and semiconductor films.
  • CVD has the following advantages: (1) can produce metal film, metal oxide film, and multi-component alloy film; (2) high film formation rate; (3) CVD reaction can be carried out under normal pressure or low vacuum; (4) The prepared film has high purity, good uniformity, good compactness, and can achieve nanometer thickness; (5) the surface of the film is smooth.
  • the reaction material is not limited, and only the solid phase reaction product, that is, the film, which is finally deposited on the surface of the glass substrate, has a corresponding color, which is not limited herein. Further, those skilled in the art will appreciate that the finally obtained colored glass sheet will be used for the terminal device and used by the consumer, and therefore, the material of the above film should be a material that does not cause harm to humans.
  • the above color may not include black, but may include white.
  • An embodiment of the present invention provides a method for forming a colored glass plate for a terminal device, comprising: placing a terminal device with a glass substrate in a cavity of a chemical vapor deposition device; A colored film is formed on the surface of the glass substrate by chemical vapor deposition to form the colored glass plate.
  • the embodiment of the present invention only needs to increase the above-mentioned process for forming a thin film on the basis of the existing glass substrate production line, thereby avoiding a substantial increase in cost; on the other hand, since the chemical vapor deposition has a high film formation rate, the formed The film has high purity, uniformity, thinness and wear resistance, so the embodiment of the invention has greater advantages than the processes of surface printing, filming and the like in the prior art.
  • the film has a thickness of between 20 and 1000 nm.
  • the colorization of the glass substrate can be achieved, and the increase in the overall thickness can be avoided, which not only satisfies the demand for the lightness and thinness of the terminal electronic products, but also reduces the amount of raw materials used and reduces the cost as much as possible.
  • the film is formed by chemical vapor deposition
  • it is preferred to control the deposition rate of the chemical vapor deposition device to The deposition time is 1-60 mins.
  • film layers of different thicknesses can be obtained, which in turn can exhibit different film colors.
  • the method further comprises: annealing the substrate on which the film is formed in situ.
  • the color can be finely adjusted by in-situ annealing.
  • the performance of the colored glass plate can also be improved.
  • the annealing time, the temperature and the annealing atmosphere can be combined to control the degree of oxidation or nitridation of the film layer, thereby realizing the fine adjustment of the color of the film, which can reduce the deposition time to a certain extent, prolong the life of the device, and reduce cost.
  • the annealing atmosphere may be a gas such as oxygen or nitrogen, and may be specifically determined according to the material of the film to be deposited and the color of the film to be finely adjusted.
  • the in-situ annealing temperature is 350-500 ° C and the treatment time is 5-60 mins.
  • Embodiment 1 provides a method for forming a colored glass plate for a terminal device. As shown in FIG. 2, the method includes the following steps:
  • the deposition rate of the controllable chemical vapor deposition apparatus is The deposition time is 1-60 mins.
  • the temperature of the in-situ annealing can be controlled to be 350-500 ° C, and the treatment time is 5-60 min.
  • the annealing atmosphere for in-situ annealing may be a gas such as oxygen, nitrogen or the like, depending on the material of the deposited film.
  • the method further comprises: performing a chemical strengthening process on the glass substrate.
  • the glass substrate may be subjected to a chemical strengthening process, and then the glass substrate treated by the chemical strengthening process is placed in the cavity of the chemical vapor deposition apparatus.
  • the mechanical properties of the colored glass sheet can be enhanced and the damage resistance can be improved.
  • the chemical strengthening process of the glass substrate may be: forming a strengthening layer between the glass substrate and the colored film; wherein the reinforcing layer is in contact with the glass substrate, A colored film is in contact with the reinforcing layer.
  • Embodiment 2 provides a method for forming a colored glass plate for a terminal device. As shown in FIG. 3, the method includes the following steps:
  • the thickness of the reinforcing layer may be about 40 ⁇ m.
  • a glass substrate with a reinforcing layer such as a Corning Gorilla Glass substrate, an Asahi Glass Long Tail Glass substrate, a Schott Xensation glass substrate, or the like can be used.
  • the deposition rate of the chemical deposition apparatus can be controlled to be The deposition time is 1-60 mins.
  • S204 Perform annealing in situ on the substrate on which the thin film is formed to form the colored glass plate.
  • the temperature of the in-situ annealing can be controlled to be 350-500 ° C, and the treatment time is 5-60 mins.
  • the annealing atmosphere for in-situ annealing may be a gas such as oxygen, nitrogen or the like, depending on the material of the deposited film.
  • the film is formed on the surface of the glass substrate by a chemical vapor deposition method
  • the colored glass plate may be formed by chemical vapor deposition in a cavity having a temperature of 300-500 ° C.
  • a film having a color is formed on the surface of the glass substrate to form the colored glass plate.
  • a cavity having a temperature of 400-500 ° C a film having a color is formed on the surface of the glass substrate by chemical vapor deposition, and the substrate on which the film is formed is annealed in situ, thereby The colored glass plate is formed.
  • the reaction temperature can be lowered to 500 ° C or lower by using an auxiliary method such as plasma, laser, or electron beam.
  • embodiments of the present invention preferably employ a plasma assisted method to lower the reaction temperature.
  • a plasma assisted method to lower the reaction temperature.
  • the principle is that a reactive substance is formed into a deposition apparatus cavity by a gas, and an activation energy is obtained from a glow discharge (Plasma) to activate and enhance a chemical reaction, thereby Realize chemical vapor deposition.
  • the formed color film may be a metal film, or a metal oxide film, or an alloy film.
  • the material when the film is a metal film, the material may be one of chromium, cobalt, nickel, iron, zinc, manganese, indium, and aluminum.
  • the material may be an alloy including at least two metal components of chromium, cobalt, nickel, iron, zinc, manganese, indium, and aluminum.
  • the material may be tin oxide such as tin dioxide (SnO 2 ), titanium oxide such as titanium dioxide (TiO 2 ), zirconia such as zirconium dioxide (ZrO 2 ), and at least zinc oxide (ZnO).
  • tin oxide such as tin dioxide (SnO 2 )
  • titanium oxide such as titanium dioxide (TiO 2 )
  • zirconia such as zirconium dioxide (ZrO 2 )
  • ZnO at least zinc oxide
  • the colored glass substrate can have a plurality of colors, but also corresponding characteristics such as light reflectivity, light absorption, and the like can be imparted.
  • the embodiments of the present invention are not limited to the materials mentioned above, and may be other non-ferrous metals or transition metals.
  • Colored glass sheets of different colors are obtained by using different materials and corresponding deposition times, deposition rates, etc., by way of some embodiments.
  • Example 1 a method for forming a colored glass plate for a terminal device, the method comprising the steps of: placing a terminal device with a Corning Gorilla third generation tempered glass substrate in a cavity of a chemical vapor deposition device; in chemical vapor deposition A blue chromium film is formed on the surface of the strengthened glass substrate by chemical vapor deposition in the apparatus to form a blue glass plate.
  • the gas flow rate of the reaction gas such as the hexacarbonyl chromium metal carbonyl complex is controlled to be 0.8 l/min
  • the deposition temperature is 450 ° C
  • the deposition rate is The deposition time was 3 mins.
  • Example 2 providing a method for forming a colored glass plate for another terminal device, the method comprising the steps of: placing the terminal device with a Corning Gorilla third generation tempered glass substrate in a cavity of a chemical vapor deposition device; by chemical vapor deposition A deep purple chrome film is formed on the surface of the tempered glass substrate to form a deep purple glass plate.
  • the gas flow rate of the control gas is controlled to be 0.8 l/min
  • the deposition temperature is 450 ° C
  • the deposition rate is The deposition time was 6 mins.
  • Example 3 provides a further method for forming a colored glass plate for a terminal device, the method comprising the steps of: placing a terminal device with a Corning Gorilla third generation tempered glass substrate in a cavity of a chemical vapor deposition device; The deposition method forms a blue-black chrome film on the surface of the tempered glass substrate to form a blue-black glass plate.
  • the gas flow rate of the control gas is controlled to be 0.8 l/min
  • the deposition temperature is 450 ° C
  • the deposition rate is The deposition time was 10 mins.
  • Example 4 providing a method for forming a colored glass plate for another terminal device, the method comprising the steps of: placing the terminal device with a Corning Gorilla third generation tempered glass substrate in a cavity of a chemical vapor deposition device; by chemical vapor deposition A blue chromium film is formed on the surface of the strengthened glass substrate; and the substrate on which the blue chromium film is formed is annealed in an oxygen atmosphere to form a dark red glass substrate.
  • the gas flow rate of the control gas is controlled to be 0.8 l/min
  • the deposition temperature is 450 ° C
  • the deposition rate is The deposition time was 3 mins.
  • the in-situ annealing time was 20 mins and the in-situ annealing temperature was lowered from 450 ° C to 200 ° C.
  • Example 5 providing a method for forming a color glass plate for a further terminal device, the method comprising the steps of: placing the terminal device in a cavity of a chemical vapor deposition device with a Schott Xensation tempered glass substrate; A light green tin dioxide film is formed on the surface of the tempered glass substrate to form a pale green glass plate.
  • tin tetrachloride and nitrogen, water vapor and nitrogen may be separately introduced, and tetrahydrogen chloride and water vapor may be mixed by diffusion to undergo hydrolysis reaction, wherein the flow rate of the reaction gas is controlled to be 0.8 l/min, and the deposition temperature is 500. °C, the deposition rate is The deposition time was 8 mins.
  • a film of titanium oxide, zirconium oxide or zinc oxide can be formed on the surface of the glass at 300 to 500 ° C by oxidation and pyrolysis reaction of a metal alkyl group to obtain tempered glass of various colors.
  • Example 6 a method for forming a colored glass plate for a terminal device, the method comprising the steps of: placing a terminal device with a Corning Gorilla third generation tempered glass substrate in a cavity of a chemical vapor deposition device; by chemical vapor deposition A white titanium oxide film is formed on the surface of the tempered glass substrate to form a white glass plate.
  • the gas flow rate of the reaction gas Ti(OC 3 H 7 ) 4 can be controlled to be 50 mg/L, the deposition temperature is 300 ° C, and the deposition rate is The deposition time was 15 mins.
  • Example 7 providing another method for forming a colored glass plate for a terminal device, the method comprising the steps of: placing a terminal device with a Corning Gorilla third generation tempered glass substrate in a cavity of a chemical vapor deposition device; The deposition method forms a white yellowish zirconia film on the surface of the tempered glass substrate to form a whiteish yellowish glass plate.
  • the gas flow rate of the reaction gas ZrC 14 H 2 CO 2 Ar can be controlled to be 0.8 l/min, the deposition temperature is 330 ° C, and the deposition rate is The deposition time was 15 mins.
  • Example 9 providing another method for forming a colored glass plate for a terminal device, the method comprising the steps of: placing a terminal device with a Corning Gorilla third generation tempered glass substrate in a cavity of a chemical vapor deposition device; A deposition method forms a pale yellow zinc oxide film on the surface of the strengthened glass substrate to form a pale yellow glass plate.
  • the gas flow rate of the reaction gas diethyl zinc can be controlled to be 0.8 l / min, the deposition temperature is 300 ° C, and the deposition rate is The deposition time was 30 mins.
  • An embodiment of the present invention further provides a colored glass plate for a terminal device, the colored glass plate comprising: a glass substrate and a colored film disposed on the glass substrate; wherein the colored film is subjected to chemical vapor deposition The law is formed.
  • the embodiment of the present invention only needs to increase the above-mentioned process for forming a thin film on the basis of the existing glass substrate production line, thereby avoiding a substantial increase in cost; on the other hand, since the chemical vapor deposition has a high film formation rate, the formed The film has high purity and uniformity, and has a thin film. Therefore, the embodiment of the present invention has a greater advantage than the processes of surface printing, filming and the like in the prior art.
  • the film has a thickness of between 20 and 1000 nm.
  • the colorization of the glass substrate can be achieved, and the increase in the overall thickness can be avoided, which not only satisfies the demand for the lightness and thinness of the terminal electronic products, but also reduces the amount of raw materials used and reduces the cost as much as possible.
  • a reinforcing layer is further disposed on a surface of the glass substrate opposite to the film having the color.
  • the mechanical properties of the colored glass sheet can be enhanced and the damage resistance can be improved.
  • the embodiment of the invention further provides a terminal device, which comprises the above-mentioned colored glass for the terminal device.
  • the terminal device may be an electronic device such as a mobile phone, an electronic photo album, or a tablet computer.

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Abstract

一种终端设备用彩色玻璃板形成方法，包括将终端设备用玻璃基板放置在化学气相沉积设备的腔体中；通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜，形成所述彩色玻璃板。还公开了一种终端设备用彩色玻璃板及终端设备。上述方法获得的终端设备用彩色玻璃板相对现有技术具有成本、均一性、厚度等优势。

Description

一种终端设备用彩色玻璃板及其形成方法、终端设备 技术领域
本发明涉及终端电子产品领域，尤其涉及一种终端设备用彩色玻璃板及其形成方法、终端设备。
背景技术
在差异化日渐成熟的消费者终端电子产品领域，从美学角度和个性化定制角度出发，产品外观成为了决定消费者能否购买这一终端产品的至关重要的因素。
对于终端电子产品的后盖板玻璃来说，迫切需要结合新的装饰处理工艺，用来实现具有差异化、个性化视觉外观或具有装饰美学效果的终端设备。
目前，若要求供应商开发彩色玻璃组成，比如掺杂着色离子，这又势必使得整条玻璃产线更换玻璃组分，最终所带来的成本将是巨大的。因而，现阶段后盖板玻璃的颜色主要来自于表面印刷、贴膜等工艺。
其中，表面印刷又分为胶印、柔印、丝印等。胶印是通过预涂感光板(Presensitized plate，简称PS)转移到橡皮布再转移到承印物上。柔印是一种直接印刷方式，其是发展中的环保印刷，也称为绿色印刷。但胶印和柔印在印刷实地时有欠缺，墨色保持一致有难度，有时需要印刷两次甚至多次。而丝印是一种补充印刷，主要体现在更高的油墨遮盖力和颜色强度，墨层厚度较厚，在20～100μm。丝印的印刷墨层厚，但印刷速度慢，且轮转式丝网相对又较贵。
贴膜虽然工艺相对简单，但是其容易脱落且厚度较厚。
发明内容
本发明的实施例提供一种终端设备用彩色玻璃板及其形成方法、终端设备，提出一种新的获得终端设备用彩色玻璃板的方法，并且相对现有技术具有成本、均一性、厚度等优势。
为达到上述目的，本发明的实施例采用如下技术方案：
第一方面，本发明实施例提供了一种终端设备用彩色玻璃板的形成方法，包括：将终端设备用玻璃基板放置在化学气相沉积设备的腔体中；通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜，形成所述彩色玻璃板。
在第一方面的第一种可能的实现方式中，所述薄膜的厚度为20-1000nm之间。
结合第一方面的第一种可能的实现方式，在第一方面的第二种可能的实现方式中，所述化学气相沉积设备的沉积速率为
Figure PCTCN2015075314-appb-000001
沉积时间为1-60mins。
在第一方面的第三种可能的实现方式中，在通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜之后，所述方法还包括：对形成有所述薄膜的基板进行原位退火。
结合第一方面的第三种可能的实现方式，在第一方面的第四种可能的实现方式中，原位退火的温度为350-500℃，处理时间为5-60mins。
在第一方面的第五种可能的实现方式中，将终端设备用玻璃基板放置在化学气相沉积设备的腔体中之前，所述方法还包括：对所述玻璃基板进行化学强化工艺处理。
结合第一方面的第五种可能的实现方式，在第一方面的第六种可能的实现方式中，对所述玻璃基板进行化学强化工艺处理包括：在所述玻璃基板和所述具有颜色的薄膜之间形成强化层；其中，所述强化层与所述玻璃基板接触，所述具有颜色的薄膜与所述强化层接触。
结合上述各种可能的实现方式，在第一方面的第七种可能的实现方式中，所述通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜，包括：在温度为300-500℃的腔体中，通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜。
结合上述各种可能的实现方式，在第一方面的第八种可能的实现方式中，所述薄膜为金属薄膜、或金属氧化物薄膜、或合金薄膜。
结合第一方面的第八种可能的实现方式，在第一方面的第九种可能 的实现方式中，所述金属薄膜的材料为铬、钴、镍、铁、锌、锰、铟、铝中的的其中一种；所述合金薄膜的材料为铬、钴、镍、铁、锌、锰、铟、铝中至少两种。
结合第一方面的第八种可能的实现方式，在第一方面的第十种可能的实现方式中，所述金属氧化物薄膜的材料为二氧化锡，二氧化钛，二氧化锆，氧化锌中的至少一种。
第二方面，本发明实施例提供了一种终端设备用彩色玻璃板，包括：玻璃基板和设置在所述玻璃基板上的具有颜色的薄膜；其中，所述具有颜色的薄膜通过化学气相沉积法形成。
在第二方面的第一种可能的实现方式中，所述薄膜的厚度为20-1000nm之间。
在第二方面的第二种可能的实现方式中，在所述玻璃基板相对所述具有颜色的薄膜的一侧表面还设置有强化层。
第三方面，本发明实施例提供了一种终端设备，包括上述第二方面的终端设备用彩色玻璃板。
本发明的实施例提供一种终端设备用彩色玻璃板及其形成方法、终端设备，该方法包括：提供终端设备用玻璃基板；通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜，形成所述彩色玻璃板。一方面，本发明实施例只需在现有玻璃基板生产线的基础上增加上述形成薄膜的工艺即可，避免成本的大幅增加；另一方面，由于化学气相沉积具有成膜速率高，制成的薄膜纯度、均一性都较高、厚度较薄且耐磨，因而相对现有技术中的表面印刷、贴膜等工艺，本发明实施例具有更大的优势。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本发明实施例提供的一种形成彩色玻璃板的流程示意图；
图2为本发明实施例一提供的一种形成彩色玻璃板的流程示意图；
图3为为本发明实施例二提供的一种形成彩色玻璃板的流程示意图。
具体实施方式
本发明实施例提供了一种终端设备用彩色玻璃板的形成方法，如图1所示，该方法包括如下步骤：
S01、将终端设备用玻璃基板放置在化学气相沉积设备的腔体中。
其中，将终端设备用玻璃基板放置在化学气相沉积设备的腔体中，可以是通过机器放入，也可以是通过人工放入，在此不做限定。
所述终端设备例如可以是手机、电子相册、平板电脑等电子设备。
需要说明的是，以手机为例，其作用主要是将显示的信息呈现在手机的其中一面(可称为正面)，以能被用户接收到，因而位于手机正面的基板必须能透光，即需要保证位于正面的基板为透明基板，而本发明实施例中通过下述S02形成的是彩色玻璃板，因而本领域技术人员容易理解，本发明实施例中的所述彩色玻璃板并不用于手机显示的正面，而用于相对手机正面的背面。例如目前的iPhone 4/4s手机的背面便是玻璃板。
基于此，由于本发明的实施例是从美学角度和个性化定制角度出发来提供所述终端设备用彩色玻璃板，因而当该彩色玻璃板用于手机的背面时，也应该是所述彩色玻璃板的彩色面位于能被用户看到的外侧。
其中，所述彩色玻璃板的彩色面即为下述形成的具有颜色的薄膜所在的那一面。
这里，所述彩色玻璃板中的玻璃基板可以是透明玻璃基板也可 以是不透明玻璃基板，在此不做限定。
同理，电子相册、平板电脑等其他电子设备。
S02、通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜，形成所述彩色玻璃板。
化学气相沉积(Chemical vapor deposition，简称CVD)是利用反应物质在气态条件下发生化学反应，生成固态物质沉积在基体表面，进而制得固态薄膜的一种成膜技术。CVD制备薄膜可包括如下过程：(1)反应气体向基体表面扩散；(2)反应气体吸附于基体表面；(3)反应气体在基体表面发生化学反应；(4)在基体表面产生的气相副产物脱离基体表面，向空间扩散或被抽气系统抽走；(5)在基体表面留下不挥发的固相反应产物一薄膜。
常见的几种CVD反应类型有：热分解反应、化学合成反应等。
其中，热分解反应的通式为：
Figure PCTCN2015075314-appb-000002
其中，Q代表温度，g代表气态，s代表固态(即A是最终的薄膜材料)。
化学合成反应是指两种或两种以上的气态反应物在加热的基体表面上发生的相互反应。最常见的是氮气还原卤化物来制备各种金属、半导体薄膜。
CVD具有以下优点：(1)既可制作金属薄膜、金属氧化物薄膜，又可制作多组分合金薄膜；(2)成膜速率高；(3)CVD反应可在常压或低真空进行；(4)制成的薄膜纯度高、均一性好、致密性好，且可做到纳米级厚度；(5)薄膜表面平滑。
需要说明的是，本发明实施例不对反应物质进行限定，只有最终沉积在玻璃基板表面的固相反应产物即薄膜具有相应的颜色即可，具体在此不做限定。此外，本领域技术人员应该知道，最终获得的所述彩色玻璃板会被用于终端设备，并被消费者使用，因而，上述薄膜的材料应该是不会对人造成伤害的材料。
此外，上述的彩色可以不包括黑色，但可以包括白色。
本发明实施例提供了一种终端设备用彩色玻璃板的形成方法，包括：将终端设备用玻璃基板放置在化学气相沉积设备的腔体中； 通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜，形成所述彩色玻璃板。一方面，本发明实施例只需在现有玻璃基板生产线的基础上增加上述形成薄膜的工艺即可，避免成本的大幅增加；另一方面，由于化学气相沉积具有成膜速率高，制成的薄膜纯度、均一性都较高、厚度较薄且耐磨，因而相对现有技术中的表面印刷、贴膜等工艺，本发明实施例具有更大的优势。
优选的，所述薄膜的厚度为20-1000nm之间。
这样，既可以实现玻璃基板的彩色化，又可避免整体厚度的增加，不仅可以满足终端电子产品轻薄化的需求，而且可以减少原材料使用量，使成本尽可能降低。
进一步的，在采用化学气相沉积法形成上述薄膜时，优选控制化学气相沉积设备的沉积速率为
Figure PCTCN2015075314-appb-000003
沉积时间为1-60mins。
这里，通过选择不同的沉积速率和沉积时间，可获得不同厚度的膜层，进而可呈现不同的薄膜颜色。
优选的，在S02中，在通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜之后，所述方法还包括：对形成有所述薄膜的基板进行原位退火。
相对现有技术的表面印刷、贴膜一经制作完毕后对于颜色的微调很难进行，本发明实施例在通过化学气相沉积形成具有颜色的薄膜后，通过原位退火可方便的对其颜色进行微调。此外，经过退火后，还可以提高所述彩色玻璃板的性能。
这里，在原位退火时可结合退火时间、温度与退火气氛，来控制膜层的氧化或氮化程度，以实现上述薄膜的颜色微调，在一定程度上可减少沉积时间，延长设备寿命，降低成本。
其中，所述退火气氛可以是氧气、氮气等气体，具体可根据沉积的所述薄膜的材料以及需要微调的薄膜颜色而定，在此不做限定。
进一步优选的，原位退火的温度为350-500℃，处理时间为5-60mins。
这样，可以减少形成所述彩色玻璃板的处理时间，减低成本。
实施例一，提供一种终端设备用彩色玻璃板的形成方法，如图2所示，该方法包括如下步骤：
S101、将终端设备用玻璃基板放置在化学气相沉积设备的腔体中。
S102、通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜。
其中，在该步骤中，可控制化学气相沉积设备的沉积速率为
Figure PCTCN2015075314-appb-000004
Figure PCTCN2015075314-appb-000005
沉积时间为1-60mins。
S103、对形成有所述薄膜的基板进行原位退火，形成所述彩色玻璃板。
其中，在该步骤中，可控制原位退火的温度为350-500℃，处理时间为5-60min。
这里，原位退火的退火气氛可以是氧气、氮气等气体，具体可根据沉积的所述薄膜的材料而定。
优选的，将终端设备用玻璃基板放置在化学气相沉积设备的腔体中之前，所述方法还包括：对所述玻璃基板进行化学强化工艺处理。
即：可以先对玻璃基板进行化学强化工艺处理，然后，将经化学强化工艺处理后的玻璃基板放置在所述化学气相沉积设备的腔体中。
这样，可以增强该彩色玻璃板的机械性能，提高抗损坏能力。
进一步的，对所述玻璃基板进行化学强化工艺处理具体可以是：在所述玻璃基板和所述具有颜色的薄膜之间形成强化层；其中，所述强化层与所述玻璃基板接触，所述具有颜色的薄膜与所述强化层接触。
实施例二，提供一种终端设备用彩色玻璃板的形成方法，如图3所示，该方法包括如下步骤：
S201、在所述玻璃基板的一侧表面形成强化层。
其中，所述强化层的厚度可以为40μm左右。
此外，可以采用目前现有的带有强化层的玻璃基板，例如康宁大猩猩玻璃基板，旭硝子龙尾玻璃基板，肖特Xensation玻璃基板等。
S202、将形成有强化层的玻璃基板放置在化学气相沉积设备的腔体中。
S203、通过化学气相沉积法在所述玻璃基板的具有强化层一侧的表面形成具有颜色的薄膜。
其中，在该步骤中，可控制化学沉积设备的沉积速率为
Figure PCTCN2015075314-appb-000006
Figure PCTCN2015075314-appb-000007
沉积时间为1-60mins。
S204、对形成有所述薄膜的基板进行原位退火，形成所述彩色玻璃板。
其中，在该步骤中，可控制原位退火的温度为350-500℃，处理时间为5-60mins。
这里，原位退火的退火气氛可以是氧气、氮气等气体，具体可根据沉积的所述薄膜的材料而定。
基于上述，优选的，上述通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜，形成所述彩色玻璃板具体可以是：在温度为300-500℃的腔体中，通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜，形成所述彩色玻璃板。当然，也可以是：在温度为400-500℃的腔体中，通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜，并对形成有所述薄膜的基板进行原位退火，从而形成所述彩色玻璃板。
通过控制化学气相沉积时腔体内的温度，可避免对玻璃基板在高温下导致的变形，性能下降等问题。
其中，可通过利用等离子体、激光、电子束等辅助方法降低反应温度至500℃以下。
基于几种降低反应温度的方法，本发明实施例优选采用等离子体辅助方法降低反应温度。对于等离子体化学气相沉积，其原理为：反应物质以气体形成进入沉积设备腔体内，在反应气体从辉光放电(Plasma，等离子体)中获得激活能，激活并增强化学反应，从而 实现化学气相沉积。
基于上述，形成的具有颜色的薄膜可以是金属薄膜、或金属氧化物薄膜、或合金薄膜。
其中，当所述薄膜为金属薄膜时，其材料可以为铬、钴、镍、铁、锌、锰、铟、铝中的其中一种。
当所述薄膜为合金薄膜时，其材料可以为包括铬、钴、镍、铁、锌、锰、铟、铝中至少两种金属组分的合金。
当所述薄膜为氧化物薄膜时，其材料可以为氧化锡例如二氧化锡(SnO2)，氧化钛例如二氧化钛(TiO2)，氧化锆例如二氧化锆(ZrO2)，氧化锌(ZnO)中的至少一种。
基于所述薄膜的材料的不同，不仅可以使所述彩色玻璃基板具有多种颜色，而且还可以赋予其相应的特性，如反光性、吸光性等。
当然，本发明实施例并不限于上述提到的材料，还可以为其他有色金属或过渡金属。
下面通过一些实施例具体描述采用不同材料以及相应的沉积时间、沉积速率等获得不同颜色的彩色玻璃板。
示例1，提供一种终端设备用彩色玻璃板的形成方法，该方法包括如下步骤：将终端设备用康宁大猩猩第三代强化玻璃基板放置在化学气相沉积设备的腔体中；在化学气相沉积设备中通过化学气相沉积法在所述强化玻璃基板表面形成蓝色铬膜，形成蓝色玻璃板。
其中，可控制反应气体例如六羰基铬金属羰基配合物的气体流量为0.8l/min，沉积温度为450℃，沉积速率为
Figure PCTCN2015075314-appb-000008
沉积时间为3mins。
示例2，提供另一终端设备用彩色玻璃板的形成方法，该方法包括如下步骤：将终端设备用康宁大猩猩第三代强化玻璃基板放置在化学气相沉积设备的腔体中；通过化学气相沉积法在所述强化玻璃基板表面形成深紫色铬膜，形成深紫色玻璃板。
其中，可控制反应气体的气体流量为0.8l/min，沉积温度为450℃，沉积速率为
Figure PCTCN2015075314-appb-000009
沉积时间为6mins。
示例3，提供又一种终端设备用彩色玻璃板的形成方法，该方法包括如下步骤：将终端设备用康宁大猩猩第三代强化玻璃基板放置在化学气相沉积设备的腔体中；通过化学气相沉积法在所述强化玻璃基板表面形成蓝黑色铬膜，形成蓝黑色玻璃板。
其中，可控制反应气体的气体流量为0.8l/min，沉积温度为450℃，沉积速率为
Figure PCTCN2015075314-appb-000010
沉积时间为10mins。
示例4，提供另一终端设备用彩色玻璃板的形成方法，该方法包括如下步骤：将终端设备用康宁大猩猩第三代强化玻璃基板放置在化学气相沉积设备的腔体中；通过化学气相沉积法在所述强化玻璃基板表面形成蓝色铬膜；在氧气气氛下，对形成有所述蓝色铬膜的基板进行原位退火，形成暗红色玻璃基板。
其中，可控制反应气体的气体流量为0.8l/min，沉积温度为450℃，沉积速率为
Figure PCTCN2015075314-appb-000011
沉积时间为3mins。原位退火的时间为20mins，原位退火温度由450℃降至200℃。
示例5，提供又一终端设备用彩色玻璃板的形成方法，该方法包括如下步骤：将终端设备用肖特Xensation强化玻璃基板放置在化学气相沉积设备的腔体中；通过化学气相沉积法在所述强化玻璃基板表面形成淡绿色二氧化锡薄膜，形成淡绿色玻璃板。
其中，可分别通入四氯化锡和氮气及水蒸气和氮气，并通过扩散使四氯化锡和水蒸气混合发生水解反应，其中可控制反应气体流量为0.8l/min，沉积温度为500℃，沉积速率为
Figure PCTCN2015075314-appb-000012
沉积时间为8mins。
此外，还可利用金属烷基的氧化和热解反应，在300～500℃的玻璃表面上形成氧化钛，氧化锆，氧化锌等薄膜，从而得到各种颜色的强化玻璃。
示例6，提供一种终端设备用彩色玻璃板的形成方法，该方法包括如下步骤：将终端设备用康宁大猩猩第三代强化玻璃基板放置在化学气相沉积设备的腔体中；通过化学气相沉积法在所述强化玻璃基板表面形成白色氧化钛膜，形成白色玻璃板。
其中，可控制反应气体Ti(O-C3H7)4的气体流量为50mg/L，沉积温度为300℃，沉积速率为
Figure PCTCN2015075314-appb-000013
沉积时间为15mins。
示例7，提供又一种终端设备用彩色玻璃板的形成方法，该方法包括如下步骤：将终端设备用康宁大猩猩第三代强化玻璃基板放置在化学气相沉积设备的腔体中；通过化学气相沉积法在所述强化玻璃基板表面形成白色略带黄色氧化锆膜，形成白色略带黄色的玻璃板。
其中，可控制反应气体ZrC14H2CO2Ar的气体流量为0.8l/min，沉积温度为330℃，沉积速率为
Figure PCTCN2015075314-appb-000014
沉积时间为15mins。
示例9，提供另一种终端设备用彩色玻璃板的形成方法，该方法包括如下步骤：将终端设备用康宁大猩猩第三代强化玻璃基板放置在化学气相沉积设备的腔体中；通过化学气相沉积法在所述强化玻璃基板表面形成浅黄色氧化锌膜，形成浅黄色玻璃板。
其中，可控制反应气体二乙基锌的气体流量为0.8l/min，沉积温度为300℃，沉积速率为
Figure PCTCN2015075314-appb-000015
沉积时间为30mins。
本发明实施例还提供了一种终端设备用彩色玻璃板，该彩色玻璃板包括：玻璃基板和设置在所述玻璃基板上的具有颜色的薄膜；其中，所述具有颜色的薄膜通过化学气相沉积法形成。
一方面，本发明实施例只需在现有玻璃基板生产线的基础上增加上述形成薄膜的工艺即可，避免成本的大幅增加；另一方面，由于化学气相沉积具有成膜速率高，制成的薄膜纯度、均一性都较高，且厚度较薄的薄膜，因而相对现有技术中的表面印刷、贴膜等工艺，本发明实施例具有更大的优势。
优选的，所述薄膜的厚度为20-1000nm之间。
这样，既可以实现玻璃基板的彩色化，又可避免整体厚度的增加，不仅可以满足终端电子产品轻薄化的需求，而且可以减少原材料使用量，使成本尽可能降低。
优选的，在所述玻璃基板相对所述具有颜色的薄膜的一侧表面还设置有强化层。
这样，可以增强该彩色玻璃板的机械性能，提高抗损坏能力。
本发明实施例还提供了一种终端设备，包括上述的终端设备用彩色玻璃。
其中，所述终端设备可以是手机，电子相册，平板电脑等电子设备。

Claims (15)

  1. 一种终端设备用彩色玻璃板的形成方法，其特征在于，包括：
    将终端设备用玻璃基板放置在化学气相沉积设备的腔体中；
    通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜，形成所述彩色玻璃板。
  2. 根据权利要求1所述的方法，其特征在于，所述薄膜的厚度为20-1000nm之间。
  3. 根据权利要求2所述的方法，其特征在于，所述化学气相沉积设备的沉积速率为
    Figure PCTCN2015075314-appb-100001
    沉积时间为1-60mins。
  4. 根据权利要求1所述的方法，其特征在于，在通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜之后，所述方法还包括：
    对形成有所述薄膜的基板进行原位退火。
  5. 根据权利要求4所述的方法，其特征在于，原位退火的温度为350-500℃，处理时间为5-60mins。
  6. 根据权利要求1所述的方法，其特征在于，将终端设备用玻璃基板放置在化学气相沉积设备的腔体中之前，所述方法还包括：
    对所述玻璃基板进行化学强化工艺处理。
  7. 根据权利要求6所述的方法，其特征在于，对所述玻璃基板进行化学强化工艺处理包括：
    在所述玻璃基板和所述具有颜色的薄膜之间形成强化层；其中，所述强化层与所述玻璃基板接触，所述具有颜色的薄膜与所述强化层接触。
  8. 根据权利要求1至7任一项所述的方法，其特征在于，所述通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜，包括：
    在温度为300-500℃的腔体中，通过化学气相沉积法在所述玻璃基板表面形成具有颜色的薄膜。
  9. 根据权利要求1至8任一项所述的方法，其特征在于，所述 薄膜为金属薄膜、或金属氧化物薄膜、或合金薄膜。
  10. 根据权利要求9所述的方法，其特征在于，所述金属薄膜的材料为铬、钴、镍、铁、锌、锰、铟、铝中的其中一种；
    所述合金薄膜的材料为铬、钴、镍、铁、锌、锰、铟、铝中的至少两种。
  11. 根据权利要求9所述的方法，其特征在于，所述金属氧化物薄膜的材料为二氧化锡，二氧化钛，二氧化锆，氧化锌中的至少一种。
  12. 一种终端设备用彩色玻璃板，其特征在于，包括：
    玻璃基板和设置在所述玻璃基板上的具有颜色的薄膜；
    其中，所述具有颜色的薄膜通过化学气相沉积法形成。
  13. 根据权利要求12所述的彩色玻璃板，其特征在于，所述薄膜的厚度为20-1000nm之间。
  14. 根据权利要求12所述的彩色玻璃板，其特征在于，在所述玻璃基板相对所述具有颜色的薄膜的一侧表面还设置有强化层。
  15. 一种终端设备，其特征在于，包括权利要求12至14任一项所述的终端设备用彩色玻璃板。
PCT/CN2015/075314 2015-03-27 2015-03-27 一种终端设备用彩色玻璃板及其形成方法、终端设备 WO2016154822A1 (zh)

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