WO2016072439A1 - Élément de conversion photoélectrique et cellule solaire - Google Patents
Élément de conversion photoélectrique et cellule solaire Download PDFInfo
- Publication number
- WO2016072439A1 WO2016072439A1 PCT/JP2015/081119 JP2015081119W WO2016072439A1 WO 2016072439 A1 WO2016072439 A1 WO 2016072439A1 JP 2015081119 W JP2015081119 W JP 2015081119W WO 2016072439 A1 WO2016072439 A1 WO 2016072439A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- photoelectric conversion
- conversion element
- ring
- formula
- nitrogen
- Prior art date
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 173
- 229910052751 metal Inorganic materials 0.000 claims abstract description 52
- 239000002184 metal Substances 0.000 claims abstract description 52
- 150000003863 ammonium salts Chemical class 0.000 claims abstract description 46
- 150000001450 anions Chemical class 0.000 claims abstract description 41
- 150000003839 salts Chemical class 0.000 claims abstract description 25
- 150000001768 cations Chemical class 0.000 claims abstract description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 20
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 16
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 11
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 10
- 125000002883 imidazolyl group Chemical group 0.000 claims abstract description 8
- 230000005525 hole transport Effects 0.000 claims description 53
- 239000006096 absorbing agent Substances 0.000 claims description 48
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 14
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 239000002250 absorbent Substances 0.000 abstract description 9
- 230000002745 absorbent Effects 0.000 abstract description 9
- 125000000623 heterocyclic group Chemical group 0.000 abstract description 4
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 279
- 239000000463 material Substances 0.000 description 39
- 230000000903 blocking effect Effects 0.000 description 36
- 150000001875 compounds Chemical class 0.000 description 36
- 239000000243 solution Substances 0.000 description 34
- 238000000034 method Methods 0.000 description 31
- 239000010408 film Substances 0.000 description 30
- 125000001424 substituent group Chemical group 0.000 description 21
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 20
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 17
- 239000010419 fine particle Substances 0.000 description 16
- 239000002904 solvent Substances 0.000 description 15
- 238000010304 firing Methods 0.000 description 14
- 125000004429 atom Chemical group 0.000 description 12
- -1 halide anion Chemical class 0.000 description 12
- 238000000576 coating method Methods 0.000 description 11
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 11
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- 229910052799 carbon Inorganic materials 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 239000006185 dispersion Substances 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- 150000002430 hydrocarbons Chemical group 0.000 description 9
- 125000000217 alkyl group Chemical group 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 239000011135 tin Substances 0.000 description 8
- 239000002041 carbon nanotube Substances 0.000 description 7
- 229910021393 carbon nanotube Inorganic materials 0.000 description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical group C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 6
- 125000000753 cycloalkyl group Chemical group 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 229910021389 graphene Inorganic materials 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 6
- 229910001887 tin oxide Inorganic materials 0.000 description 6
- 125000003342 alkenyl group Chemical group 0.000 description 5
- 125000000304 alkynyl group Chemical group 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 5
- 239000012212 insulator Substances 0.000 description 5
- 239000003921 oil Substances 0.000 description 5
- 125000000962 organic group Chemical group 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 125000003226 pyrazolyl group Chemical group 0.000 description 5
- 239000012266 salt solution Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- VBXZSFNZVNDOPB-UHFFFAOYSA-N 1,4,5,6-tetrahydropyrimidine Chemical compound C1CNC=NC1 VBXZSFNZVNDOPB-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 125000002091 cationic group Chemical group 0.000 description 4
- 150000004770 chalcogenides Chemical class 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 125000000392 cycloalkenyl group Chemical group 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 125000003386 piperidinyl group Chemical group 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 229930195734 saturated hydrocarbon Natural products 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 3
- FNQJDLTXOVEEFB-UHFFFAOYSA-N 1,2,3-benzothiadiazole Chemical group C1=CC=C2SN=NC2=C1 FNQJDLTXOVEEFB-UHFFFAOYSA-N 0.000 description 2
- SLLFVLKNXABYGI-UHFFFAOYSA-N 1,2,3-benzoxadiazole Chemical group C1=CC=C2ON=NC2=C1 SLLFVLKNXABYGI-UHFFFAOYSA-N 0.000 description 2
- UGUHFDPGDQDVGX-UHFFFAOYSA-N 1,2,3-thiadiazole Chemical group C1=CSN=N1 UGUHFDPGDQDVGX-UHFFFAOYSA-N 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- VSWICNJIUPRZIK-UHFFFAOYSA-N 2-piperideine Chemical compound C1CNC=CC1 VSWICNJIUPRZIK-UHFFFAOYSA-N 0.000 description 2
- XDXWNHPWWKGTKO-UHFFFAOYSA-N 207739-72-8 Chemical compound C1=CC(OC)=CC=C1N(C=1C=C2C3(C4=CC(=CC=C4C2=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC(=CC=C1C1=CC=C(C=C13)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)N(C=1C=CC(OC)=CC=1)C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 XDXWNHPWWKGTKO-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- DPOPAJRDYZGTIR-UHFFFAOYSA-N Tetrazine Chemical group C1=CN=NN=N1 DPOPAJRDYZGTIR-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 229910002113 barium titanate Inorganic materials 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 125000003354 benzotriazolyl group Chemical group N1N=NC2=C1C=CC=C2* 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000003575 carbonaceous material Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 229920001940 conductive polymer Polymers 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 239000002612 dispersion medium Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 239000002079 double walled nanotube Substances 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 125000003453 indazolyl group Chemical group N1N=C(C2=C1C=CC=C2)* 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000002048 multi walled nanotube Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000002892 organic cations Chemical class 0.000 description 2
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical group C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 125000004437 phosphorous atom Chemical group 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 125000004193 piperazinyl group Chemical group 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000000714 pyrimidinyl group Chemical group 0.000 description 2
- DMFMZFFIQRMJQZ-UHFFFAOYSA-N pyrrolidin-1-ium;iodide Chemical compound [I-].C1CC[NH2+]C1 DMFMZFFIQRMJQZ-UHFFFAOYSA-N 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000002109 single walled nanotube Substances 0.000 description 2
- 125000003003 spiro group Chemical group 0.000 description 2
- 238000005118 spray pyrolysis Methods 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- BRNULMACUQOKMR-UHFFFAOYSA-N thiomorpholine Chemical group C1CSCCN1 BRNULMACUQOKMR-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 125000001425 triazolyl group Chemical group 0.000 description 2
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- OLRBYEHWZZSYQQ-VVDZMTNVSA-N (e)-4-hydroxypent-3-en-2-one;propan-2-ol;titanium Chemical compound [Ti].CC(C)O.CC(C)O.C\C(O)=C/C(C)=O.C\C(O)=C/C(C)=O OLRBYEHWZZSYQQ-VVDZMTNVSA-N 0.000 description 1
- 125000000355 1,3-benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 1
- KEQTWHPMSVAFDA-UHFFFAOYSA-N 2,3-dihydro-1h-pyrazole Chemical group C1NNC=C1 KEQTWHPMSVAFDA-UHFFFAOYSA-N 0.000 description 1
- FFQALBCXGPYQGT-UHFFFAOYSA-N 2,4-difluoro-5-(trifluoromethyl)aniline Chemical compound NC1=CC(C(F)(F)F)=C(F)C=C1F FFQALBCXGPYQGT-UHFFFAOYSA-N 0.000 description 1
- LWNJUMGCXIAKPI-UHFFFAOYSA-N 2-(pyridin-2-ylmethoxy)benzaldehyde Chemical compound O=CC1=CC=CC=C1OCC1=CC=CC=N1 LWNJUMGCXIAKPI-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical group C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 description 1
- UUIMDJFBHNDZOW-UHFFFAOYSA-N 2-tert-butylpyridine Chemical compound CC(C)(C)C1=CC=CC=N1 UUIMDJFBHNDZOW-UHFFFAOYSA-N 0.000 description 1
- JZIBVTUXIVIFGC-UHFFFAOYSA-N 2H-pyrrole Chemical group C1C=CC=N1 JZIBVTUXIVIFGC-UHFFFAOYSA-N 0.000 description 1
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical group N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- WRYCSMQKUKOKBP-UHFFFAOYSA-N Imidazolidine Chemical group C1CNCN1 WRYCSMQKUKOKBP-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- RWRDLPDLKQPQOW-UHFFFAOYSA-O Pyrrolidinium ion Chemical compound C1CC[NH2+]C1 RWRDLPDLKQPQOW-UHFFFAOYSA-O 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- WOIHABYNKOEWFG-UHFFFAOYSA-N [Sr].[Ba] Chemical compound [Sr].[Ba] WOIHABYNKOEWFG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000004442 acylamino group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 125000001769 aryl amino group Chemical group 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- CIPKKELWTGKUJB-UHFFFAOYSA-N azepane Chemical group N1CCCCCC1.N1CCCCCC1 CIPKKELWTGKUJB-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- IQONKZQQCCPWMS-UHFFFAOYSA-N barium lanthanum Chemical compound [Ba].[La] IQONKZQQCCPWMS-UHFFFAOYSA-N 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910021523 barium zirconate Inorganic materials 0.000 description 1
- DQBAOWPVHRWLJC-UHFFFAOYSA-N barium(2+);dioxido(oxo)zirconium Chemical compound [Ba+2].[O-][Zr]([O-])=O DQBAOWPVHRWLJC-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910002115 bismuth titanate Inorganic materials 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 1
- 229910000024 caesium carbonate Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 150000008422 chlorobenzenes Chemical class 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 230000000779 depleting effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- NKZSPGSOXYXWQA-UHFFFAOYSA-N dioxido(oxo)titanium;lead(2+) Chemical compound [Pb+2].[O-][Ti]([O-])=O NKZSPGSOXYXWQA-UHFFFAOYSA-N 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- IVUXZQJWTQMSQN-UHFFFAOYSA-N distrontium;oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Sr+2].[Sr+2].[Ta+5].[Ta+5] IVUXZQJWTQMSQN-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000005980 hexynyl group Chemical group 0.000 description 1
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 1
- 229940071870 hydroiodic acid Drugs 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical group C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 1
- 150000004693 imidazolium salts Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 125000003387 indolinyl group Chemical group N1(CCC2=CC=CC=C12)* 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 239000011244 liquid electrolyte Substances 0.000 description 1
- 229910003473 lithium bis(trifluoromethanesulfonyl)imide Inorganic materials 0.000 description 1
- QSZMZKBZAYQGRS-UHFFFAOYSA-N lithium;bis(trifluoromethylsulfonyl)azanide Chemical compound [Li+].FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F QSZMZKBZAYQGRS-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000434 metal complex dye Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- LLWRXQXPJMPHLR-UHFFFAOYSA-N methylazanium;iodide Chemical compound [I-].[NH3+]C LLWRXQXPJMPHLR-UHFFFAOYSA-N 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 239000002070 nanowire Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- UKDIAJWKFXFVFG-UHFFFAOYSA-N potassium;oxido(dioxo)niobium Chemical compound [K+].[O-][Nb](=O)=O UKDIAJWKFXFVFG-UHFFFAOYSA-N 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000003072 pyrazolidinyl group Chemical group 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical group C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- SBYHFKPVCBCYGV-UHFFFAOYSA-N quinuclidine Chemical group C1CC2CCN1CC2 SBYHFKPVCBCYGV-UHFFFAOYSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- GROMGGTZECPEKN-UHFFFAOYSA-N sodium metatitanate Chemical compound [Na+].[Na+].[O-][Ti](=O)O[Ti](=O)O[Ti]([O-])=O GROMGGTZECPEKN-UHFFFAOYSA-N 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 150000003413 spiro compounds Chemical class 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 125000005420 sulfonamido group Chemical group S(=O)(=O)(N*)* 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 230000005068 transpiration Effects 0.000 description 1
- 125000005259 triarylamine group Chemical group 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to a photoelectric conversion element and a solar cell.
- Photoelectric conversion elements are used in various optical sensors, copiers, solar cells and the like. Solar cells are expected to be put into full-scale practical use as non-depleting solar energy. In particular, research and development of dye-sensitized solar cells using organic dyes or Ru bipyridyl complexes as sensitizers has been actively promoted, and the photoelectric conversion efficiency has reached about 11%.
- Patent Document 1 describes a photovoltaic device having a perovskite including a first cation, a second cation, and at least one halide anion or chalcogenide anion.
- R 1 to R 8 each independently represents a hydrogen atom, a substituted or unsubstituted C 1 to C 20 alkyl group, or a substituted or unsubstituted aryl group.
- Patent Document 2 describes a solid-state solar cell having an organic-inorganic perovskite layer containing a perovskite structure having an imidazolium salt as an organic cation.
- a solar cell using a perovskite compound exhibits high photoelectric conversion efficiency after production as described above.
- the photoelectric conversion efficiency gradually decreases with time, and stable battery characteristics cannot be exhibited. This problem is not solved even in the photovoltaic device described in Patent Document 1 and the solid-state solar cell described in Patent Document 2.
- An object of the present invention is to provide a photoelectric conversion element excellent in durability and a solar cell using the photoelectric conversion element.
- the present inventors have a great influence on the durability of the photoelectric conversion element and the solar cell. Found to affect. As a result of further investigation, when an ammonium cation having a specific nitrogen-containing ring structure is used as the ammonium cation, a decrease in photoelectric conversion efficiency over time is suppressed, and the photoelectric conversion element and the solar cell exhibit stable battery performance. I found out. The present invention has been completed based on these findings.
- a photoelectric conversion element having a first electrode having a photosensitive layer containing a light absorber on a conductive support and a second electrode facing the first electrode,
- R 11 , R 12 and R 21 each independently represent a hydrogen atom or an aliphatic hydrocarbon group having 1 to 12 carbon atoms.
- Q 11 represents an atomic group that combines with a nitrogen atom to form a nitrogen-containing aliphatic ring.
- Q 21 represents an atomic group that forms a nitrogen-containing heterocycle other than an imidazole ring by bonding to a —N + (R 21 ) ⁇ C— group.
- X 11 and X 21 each independently represent an anion.
- M 31 represents a metal cation and X 31 represents an anion.
- ⁇ 2> The photoelectric conversion element according to ⁇ 1>, wherein an ammonium cation forming an ammonium salt has a CLogP value of 0.4 or more and 10 or less.
- ⁇ 3> The photoelectric conversion element according to ⁇ 1> or ⁇ 2>, wherein X 11 or X 21 is an anion of a halogen atom.
- ⁇ 4> The photoelectric conversion element according to any one of ⁇ 1> to ⁇ 3>, wherein M 31 is Pb 2+ or Sn 2+ .
- ⁇ 5> The photoelectric conversion device according to any one of ⁇ 1> to ⁇ 4>, wherein the nitrogen-containing aliphatic ring is a nitrogen-containing saturated aliphatic ring.
- ⁇ 6> The photoelectric conversion element according to any one of ⁇ 1> to ⁇ 5>, wherein the nitrogen-containing aliphatic ring is a 5-membered ring or a 6-membered ring.
- ⁇ 7> The photoelectric conversion device according to any one of ⁇ 1> to ⁇ 4>, wherein the nitrogen-containing heterocycle is a nitrogen-containing aliphatic heterocycle or a nitrogen-containing aromatic heterocycle other than an imidazole ring.
- ⁇ 8> The photoelectric conversion element according to any one of ⁇ 1> to ⁇ 4> and ⁇ 7>, wherein the nitrogen-containing heterocycle is a 5-membered ring or a 6-membered ring.
- ⁇ 9> The photoelectric conversion element according to any one of ⁇ 1> to ⁇ 4>, ⁇ 7>, and ⁇ 8>, wherein the ammonium salt represented by the formula (2) is represented by the following formula (2A) .
- R 22 and R 23 each independently represent a hydrogen atom or an aliphatic hydrocarbon group having 1 to 12 carbon atoms.
- Q 22 represents an atomic group that forms a 5-membered nitrogen-containing aromatic heterocycle by bonding to the —N (R 22 ) —NH + ⁇ C (R 23 ) — group.
- X 22 represents an anion.
- R 22 and R 23 each independently represent a hydrogen atom or an aliphatic hydrocarbon group having 1 to 12 carbon atoms.
- X 22 represents an anion.
- ⁇ 11> The photoelectric conversion element according to any one of ⁇ 1> to ⁇ 10>, which has a porous layer between the conductive support and the photosensitive layer.
- ⁇ 12> The photoelectric conversion device according to any one of ⁇ 1> to ⁇ 11>, which has a hole transport layer between the first electrode and the second electrode.
- ⁇ 13> A solar cell using the photoelectric conversion element according to any one of ⁇ 1> to ⁇ 12>.
- the display of a compound is used to mean not only the compound itself but also its salt and its ion. Moreover, it is the meaning including what changed a part of structure in the range which does not impair the target effect. Furthermore, a compound that does not specify substitution or non-substitution is meant to include a compound having an arbitrary substituent as long as the intended effect is not impaired. The same applies to substituents and linking groups (hereinafter referred to as substituents and the like).
- each formula may be expressed as a sexual formula in order to understand the chemical structure of the compound. Accordingly, in each formula, the partial structure is referred to as a (substituted) group, ion, or atom. In this specification, these are represented by the above formula in addition to the (substituted) group, ion, atom, or the like. It may mean an element group or an element constituting a (substituted) group or ion.
- a numerical range expressed using “to” means a range including numerical values described before and after “to” as a lower limit value and an upper limit value.
- FIG. 1 is a cross-sectional view schematically showing a preferred embodiment of the photoelectric conversion element of the present invention.
- FIG. 2 is a cross-sectional view schematically showing a preferred embodiment having a thick photosensitive layer of the photoelectric conversion element of the present invention.
- FIG. 3 is a cross-sectional view schematically showing another preferred embodiment of the photoelectric conversion element of the present invention.
- FIG. 4 is a sectional view schematically showing still another preferred embodiment of the photoelectric conversion element of the present invention.
- FIG. 5 is a cross-sectional view schematically showing still another preferred embodiment of the photoelectric conversion element of the present invention.
- FIG. 6 is a cross-sectional view schematically showing still another preferred embodiment of the photoelectric conversion element of the present invention.
- the photoelectric conversion element of this invention has the 1st electrode which has the photosensitive layer containing a light absorber on a conductive support body, and the 2nd electrode facing a 1st electrode.
- the photosensitive layer and the second electrode are provided on the conductive support in this order.
- “having a photosensitive layer on a conductive support” means an embodiment having a photosensitive layer in contact with the surface of the conductive support, and another layer above the surface of the conductive support. It is meant to include embodiments having a photosensitive layer.
- the other layer provided between the conductive support and the photosensitive layer does not deteriorate the battery performance of the solar cell.
- a porous layer, a blocking layer, an electron transport layer, a hole transport layer, and the like can be given.
- the photosensitive layer is provided in the form of a thin film on the surface of the porous layer (see FIG. 1). ), A mode (see FIGS. 2 and 6) provided on the surface of the porous layer (see FIG. 2 and FIG. 6), a mode provided on the surface of the blocking layer as a thin film, and a thick film on the surface of the blocking layer Aspect (see FIG.
- the photosensitive layer may be provided in a linear or dispersed form, but is preferably provided in a film form.
- the light absorber contained in the photosensitive layer is formed from an ammonium salt represented by the above formula (1) or the above formula (2) and a metal salt represented by the above formula (3).
- the photoelectric conversion element of the present invention is not particularly limited in structure other than the structure defined in the present invention, and a known structure relating to the photoelectric conversion element and the solar cell can be adopted.
- Each layer constituting the photoelectric conversion element of the present invention may be formed in a single layer or multiple layers depending on the purpose.
- the same reference numerals mean the same components (members). 1, 2, and 6 emphasize the size of the fine particles forming the porous layer 12. These fine particles are preferably clogged (deposited or adhered) in the horizontal and vertical directions with respect to the conductive support 11 to form a porous structure.
- the term “photoelectric conversion element 10” means the photoelectric conversion elements 10A, 10B, 10C, 10D, 10E, and 10F unless otherwise specified.
- the term “photosensitive layer 13” means the photosensitive layers 13A, 13B, and 13C unless otherwise specified.
- the hole transport layer 3 means the hole transport layers 3A and 3B unless otherwise specified.
- a photoelectric conversion element 10A shown in FIG. A system 100A shown in FIG. 1 is a system applied to a battery for causing an operation circuit M (for example, an electric motor) to perform work by the external circuit 6 using the photoelectric conversion element 10A.
- This photoelectric conversion element 10 ⁇ / b> A has a first electrode 1 ⁇ / b> A, a second electrode 2, and a hole transport layer 3 ⁇ / b> A between the first electrode 1 ⁇ / b> A and the second electrode 2.
- the first electrode 1A has a conductive support 11 composed of a support 11a and a transparent electrode 11b, a porous layer 12, and a photosensitive layer 13A on the porous layer 12.
- the blocking layer 14 is provided on the transparent electrode 11 b, and the porous layer 12 is formed on the blocking layer 14.
- the photoelectric conversion element 10A having the porous layer 12 improves the charge separation and charge transfer efficiency because the surface area of the photosensitive layer 13A is increased.
- the photoelectric conversion element 10B shown in FIG. 2 schematically shows a preferred embodiment in which the photosensitive layer 13A of the photoelectric conversion element 10A shown in FIG. In the photoelectric conversion element 10B, the hole transport layer 3B is thinly provided.
- the photoelectric conversion element 10B differs from the photoelectric conversion element 10A shown in FIG. 1 in the film thicknesses of the photosensitive layer 13B and the hole transport layer 3B, but is configured in the same manner as the photoelectric conversion element 10A except for these points. ing.
- a photoelectric conversion element 10C shown in FIG. 3 schematically shows another preferred embodiment of the photoelectric conversion element of the present invention.
- the photoelectric conversion element 10C is different from the photoelectric conversion element 10B illustrated in FIG. 2 in that the porous layer 12 is not provided, but is configured in the same manner as the photoelectric conversion element 10B except for this point.
- the photosensitive layer 13 ⁇ / b> C is formed in a thick film shape on the surface of the blocking layer 14.
- a photoelectric conversion element 10D shown in FIG. 4 schematically shows another preferred embodiment of the photoelectric conversion element of the present invention.
- This photoelectric conversion element 10D is different from the photoelectric conversion element 10C shown in FIG. 3 in that an electron transport layer 15 is provided instead of the blocking layer 14, but is otherwise configured in the same manner as the photoelectric conversion element 10C.
- the first electrode 1 ⁇ / b> D includes a conductive support 11 and an electron transport layer 15 and a photosensitive layer 13 ⁇ / b> C that are sequentially formed on the conductive support 11.
- This photoelectric conversion element 10D is preferable in that each layer can be formed of an organic material. As a result, the productivity of the photoelectric conversion element is improved, and it is possible to make it thinner or flexible.
- a photoelectric conversion element 10E shown in FIG. 5 schematically shows still another preferred embodiment of the photoelectric conversion element of the present invention.
- a system 100E including the photoelectric conversion element 10E is a system applied to battery use as in the system 100A.
- the photoelectric conversion element 10 ⁇ / b> E has a first electrode 1 ⁇ / b> E, a second electrode 2, and an electron transport layer 4 between the first electrode 1 ⁇ / b> E and the second electrode 2.
- the first electrode 1 ⁇ / b> E includes a conductive support 11 and a hole transport layer 16 and a photosensitive layer 13 ⁇ / b> C, which are sequentially formed on the conductive support 11.
- This photoelectric conversion element 10E is preferable in that each layer can be formed of an organic material, like the photoelectric conversion element 10D.
- a photoelectric conversion element 10F shown in FIG. 6 schematically shows still another preferred embodiment of the photoelectric conversion element of the present invention.
- the photoelectric conversion element 10F is different from the photoelectric conversion element 10B illustrated in FIG. 2 in that the hole transport layer 3B is not provided, but is configured in the same manner as the photoelectric conversion element 10B except for this point.
- the system 100 to which the photoelectric conversion element 10 is applied functions as a solar cell as follows. That is, in the photoelectric conversion element 10, light that has passed through the conductive support 11 or passed through the second electrode 2 and entered the photosensitive layer 13 excites the light absorber. The excited light absorber has high-energy electrons and can emit these electrons. The light absorber that has released electrons with high energy becomes an oxidant.
- the electrons emitted from the light absorber move between the light absorbers and reach the conductive support 11 from the photosensitive layer 13.
- the electrons that have reached the conductive support 11 work in the external circuit 6 and then pass through the second electrode 2 (if the hole transport layer 3 is present, further via the hole transport layer 3), Return to the photosensitive layer 13.
- the light absorber is reduced by the electrons returning to the photosensitive layer 13.
- the photoelectric conversion element 10E the electrons emitted from the light absorber reach the second electrode 2 from the photosensitive layer 13C through the electron transport layer 4, and after working in the external circuit 6, the conductive support 11 Then, the process returns to the photosensitive layer 13.
- the light absorber is reduced by the electrons returning to the photosensitive layer 13.
- the system 100 functions as a solar cell by repeating such excitation and electron transfer cycles of the light absorber.
- the way in which electrons flow from the photosensitive layer 13 to the conductive support 11 differs depending on the presence and type of the porous layer 12 and the like.
- the porous layer 12 can be formed with an insulator other than the conventional semiconductor.
- the porous layer 12 is formed of a semiconductor, electron conduction in which electrons move inside or between the semiconductor particles of the porous layer 12 also occurs.
- the porous layer 12 is formed of an insulator, electron conduction in the porous layer 12 does not occur.
- a relatively high electromotive force can be obtained by using aluminum oxide (Al 2 O 3 ) particles as the insulator particles.
- Al 2 O 3 aluminum oxide
- the blocking layer 14 as the other layer is formed of a conductor or a semiconductor, electron conduction in the blocking layer 14 occurs. Also, electron conduction occurs in the electron transport layer 15.
- the photoelectric conversion element and the solar cell of the present invention are not limited to the above-described preferred embodiments, and the configuration of each embodiment can be appropriately combined between the respective embodiments without departing from the spirit of the present invention.
- the photoelectric conversion element 10C or 10D may have a configuration in which the hole transport layer 3B is not provided as in the photoelectric conversion element 10F.
- materials and members used for the photoelectric conversion element or the solar cell can be prepared by ordinary methods using ordinary materials except for the light absorber.
- Patent Documents 1 and 2 can be referred to.
- dye-sensitized solar cells for example, Japanese Patent Application Laid-Open No. 2001-291534, US Pat. No. 4,927,721, US Pat. No. 4,684,537, US Pat. No. 5,084, 365, US Pat. No. 5,350,644, US Pat. No. 5,463,057, US Pat. No. 5,525,440, JP-A-7-249790, JP 2004-220974 A and JP 2008-135197 A can be referred to.
- the first electrode 1 has a conductive support 11 and a photosensitive layer 13 and functions as a working electrode in the photoelectric conversion element 10. As shown in FIGS. 1 to 6, the first electrode 1 preferably has at least one of a porous layer 12, a blocking layer 14, an electron transport layer 15 and a hole transport layer 16. The first electrode 1 preferably has at least the blocking layer 14 in terms of prevention of short circuit, and more preferably has the porous layer 12 and the blocking layer 14 in terms of light absorption efficiency and prevention of short circuit. Moreover, it is preferable that the 1st electrode 1 has the electron carrying layer 15 or the positive hole transport layer 16 at the point which can be formed with an organic material.
- the conductive support 11 is not particularly limited as long as it has conductivity and can support the photosensitive layer 13 and the like.
- the conductive support 11 is composed of a conductive material, for example, a metal, or a glass or plastic support 11a and a transparent electrode 11b as a conductive film formed on the surface of the support 11a.
- the structure having is preferable. When the strength of the conductive support 11 is sufficiently maintained, the support 11a is not necessarily required.
- a conductive support 11 in which a transparent metal electrode 11b is formed by coating a conductive metal oxide on the surface of a glass or plastic support 11a is more preferable.
- the support 11a formed of plastic include a transparent polymer film described in paragraph No. 0153 of JP-A-2001-291534.
- ceramic Japanese Patent Laid-Open No. 2005-135902
- conductive resin Japanese Patent Laid-Open No. 2001-160425
- tin oxide As the conductive metal oxide, tin oxide (TO) is preferable, and fluorine-doped tin oxide such as indium-tin oxide (tin-doped indium oxide; ITO) and fluorine-doped tin oxide (FTO) is particularly preferable.
- the coating amount of the metal oxide at this time is preferably 0.1 to 100 g per 1 m 2 of the surface area of the support 11a. When the conductive support 11 is used, light is preferably incident from the support 11a side.
- the conductive support 11 is preferably substantially transparent.
- “substantially transparent” means that the transmittance of light (wavelength 300 to 1200 nm) is 10% or more, preferably 50% or more, and particularly preferably 80% or more.
- the thicknesses of the support 11a and the conductive support 11 are not particularly limited, and are set to appropriate thicknesses.
- the thickness is preferably 0.01 ⁇ m to 10 mm, more preferably 0.1 ⁇ m to 5 mm, and particularly preferably 0.3 ⁇ m to 4 mm.
- the film thickness of the transparent electrode 11b is not particularly limited, and is preferably 0.01 to 30 ⁇ m, more preferably 0.03 to 25 ⁇ m, and more preferably 0.05 to 20 ⁇ m. It is particularly preferred that
- the conductive support 11 or the support 11a may have a light management function on the surface.
- the surface of the conductive support 11 or the support 11a may have an antireflection film in which high refractive films and low refractive index oxide films are alternately stacked as described in JP-A-2003-123859.
- the light guide function described in JP-A-2002-260746 may be provided.
- -Blocking layer 14- In the present invention, like the photoelectric conversion elements 10A to 10C and 10F, preferably on the surface of the transparent electrode 11b, that is, the conductive support 11, the porous layer 12, the photosensitive layer 13, the hole transport layer 3, etc. Between the two, a blocking layer 14 is provided.
- a photoelectric conversion element and a solar cell for example, when the photosensitive layer 13 or the hole transport layer 3 and the transparent electrode 11b or the like are in electrical contact, a reverse current is generated.
- the blocking layer 14 functions to prevent this reverse current.
- the blocking layer 14 is also referred to as a short circuit prevention layer.
- This blocking layer may be provided also when a photoelectric conversion element has an electron carrying layer. For example, in the case of the photoelectric conversion element 10D, it may be provided between the conductive support 11 and the electron transport layer 15, and in the case of the photoelectric conversion element 10E, it is provided between the second electrode 2 and the electron transport layer 4. May be.
- the material for forming the blocking layer 14 is not particularly limited as long as it is a material capable of fulfilling the above functions, but is a substance that transmits visible light and is an insulating substance for the conductive support 11 (transparent electrode 11b) and the like. It is preferable that Specifically, the “insulating substance with respect to the conductive support 11 (transparent electrode 11b)” specifically refers to a material whose conduction band energy level forms the conductive support 11 (metal oxide forming the transparent electrode 11b). A compound (n-type semiconductor compound) that is equal to or higher than the energy level of the conduction band of the material and the like and lower than the energy level of the conduction band of the material constituting the porous layer 12 or the ground state of the light absorber.
- Examples of the material for forming the blocking layer 14 include silicon oxide, magnesium oxide, aluminum oxide, calcium carbonate, cesium carbonate, polyvinyl alcohol, and polyurethane.
- the material generally used for the photoelectric conversion material may be used, and examples thereof include titanium oxide, tin oxide, zinc oxide, niobium oxide, and tungsten oxide. Of these, titanium oxide, tin oxide, magnesium oxide, aluminum oxide and the like are preferable.
- the thickness of the blocking layer 14 is preferably 0.001 to 10 ⁇ m, more preferably 0.005 to 1 ⁇ m, and particularly preferably 0.01 to 0.1 ⁇ m.
- the thickness of each layer can be measured by observing the cross section of the photoelectric conversion element 10 using a scanning electron microscope (SEM) or the like.
- the porous layer 12 is preferably provided on the transparent electrode 11b.
- the porous layer 12 is preferably formed on the blocking layer 14.
- the porous layer 12 is a layer that functions as a scaffold for carrying the photosensitive layer 13 on the surface.
- the porous layer 12 is preferably a fine particle layer having pores, in which fine particles of the material forming the porous layer 12 are deposited or adhered.
- the porous layer 12 may be a fine particle layer in which two or more kinds of fine particles are deposited.
- the amount of light absorbent supported (adsorption amount) can be increased.
- the surface area of the porous layer 12 it is preferable to increase the surface area of the individual fine particles constituting the porous layer 12.
- the surface area of the fine particles is preferably 10 times or more, more than 100 times the projected area. It is more preferable.
- the particle diameter of the fine particles forming the porous layer 12 is preferably 0.001 to 1 ⁇ m as the primary particle in the average particle diameter using the diameter when the projected area is converted into a circle.
- the average particle diameter of the fine particles is preferably 0.01 to 100 ⁇ m as the average particle diameter of the dispersion.
- the material for forming the porous layer 12 is not particularly limited with respect to conductivity, and may be an insulator (insulating material), a conductive material, or a semiconductor (semiconductive material).
- Examples of the material for forming the porous layer 12 include metal chalcogenides (eg, oxides, sulfides, selenides, etc.), perovskite compounds, silicon oxides (eg, silicon dioxide, zeolite), or carbon nanotubes (carbon Nanowires, carbon nanorods and the like) can be used.
- the metal chalcogenide is not particularly limited, but is preferably titanium, tin, zinc, tungsten, zirconium, hafnium, strontium, indium, cerium, yttrium, lanthanum, vanadium, niobium, aluminum or tantalum oxide, cadmium sulfide. , Cadmium selenide and the like.
- Examples of the crystal structure of the metal chalcogenide include an anatase type, brookite type and rutile type, and anatase type and brookite type are preferable.
- the perovskite compound is not particularly limited, and examples thereof include transition metal oxides.
- transition metal oxides For example, strontium titanate, calcium titanate, barium titanate, lead titanate, barium zirconate, barium stannate, lead zirconate, strontium zirconate, strontium tantalate, potassium niobate, bismuth ferrate, strontium barium titanate , Barium lanthanum titanate, calcium titanate, sodium titanate, bismuth titanate.
- strontium titanate, calcium titanate and the like are preferable.
- the carbon nanotube has a shape obtained by rounding a carbon film (graphene sheet) into a cylindrical shape.
- Carbon nanotubes are single-walled carbon nanotubes (SWCNT) in which one graphene sheet is wound in a cylindrical shape, double-walled carbon nanotubes (DWCNT) in which two graphene sheets are wound in a concentric shape, and multiple graphene sheets are concentric
- SWCNT single-walled carbon nanotubes
- DWCNT double-walled carbon nanotubes
- MWCNT multi-walled carbon nanotubes
- any carbon nanotube is not particularly limited and can be used.
- the material for forming the porous layer 12 is preferably titanium, tin, zinc, zirconium, aluminum or silicon oxide, or carbon nanotube, more preferably titanium oxide or aluminum oxide.
- the porous layer 12 may be formed of at least one of the above-described metal chalcogenides, perovskite compounds, silicon oxides, and carbon nanotubes, and may be formed of a plurality of types.
- the thickness of the porous layer 12 is not particularly limited, but is usually in the range of 0.05 to 100 ⁇ m, preferably in the range of 0.1 to 100 ⁇ m. When used as a solar cell, the thickness is 0.1 to 50 ⁇ m. More preferably, 0.2 to 30 ⁇ m is more preferable, and 0.3 to 30 ⁇ m is particularly preferable.
- the electron transport layer 15 is preferably provided on the surface of the transparent electrode 11b.
- the electron transport layer 15 has a function of transporting electrons generated in the photosensitive layer 13 to the conductive support 11.
- the electron transport layer 15 is formed of an electron transport material that can exhibit this function.
- the electron transport material is not particularly limited, but an organic material (organic electron transport material) is preferable.
- the organic electron transport material examples include fullerene compounds such as [6,6] -Phenyl-C61-Butylic Acid Methyl Ester (PC 61 BM), perylene compounds such as perylene tetracarboxydiimide (PTCDI), and other tetracyanoquinodimethanes. Examples thereof include a low molecular compound such as (TCNQ) or a high molecular compound.
- the thickness of the electron transport layer 15 is not particularly limited, but is preferably 0.001 to 10 ⁇ m, and more preferably 0.01 to 1 ⁇ m.
- the hole transport layer 16 is preferably provided on the surface of the transparent electrode 11b.
- the hole transport layer 16 is the same as the hole transport layer 3 described later, except that the position where it is formed is different.
- the photosensitive layer 13 is preferably a porous layer 12 (photoelectric conversion elements 10A, 10B, and 10F), a blocking layer 14 (photoelectric conversion element 10C), an electron transport layer 15 (photoelectric conversion element 10D), or a hole transport layer. 16 (photoelectric conversion element 10E) is provided on the surface of each layer (including the inner surface of the recess when the surface on which the photosensitive layer 13 is provided is uneven).
- the photosensitive layer 13 contains at least one light absorber formed from an ammonium salt represented by the following formula (1) or (2) and a metal salt represented by the following formula (3). What is necessary is just to contain 2 or more types. In the present invention, the photosensitive layer 13 may contain a light absorber different from this light absorber. Examples of different light absorbers include metal complex dyes or organic dyes.
- the photosensitive layer 13 may be a single layer or a laminate of two or more layers.
- a laminated structure in which layers made of different light absorbers are laminated may be used, and a hole transport material is included between the photosensitive layer and the photosensitive layer.
- a laminated structure having an intermediate layer may also be used.
- the form having the photosensitive layer 13 on the conductive support 11 is as described above.
- the photosensitive layer 13 is preferably provided on the surface of each of the layers so that excited electrons flow to the conductive support 11 or the second electrode 2.
- the photosensitive layer 13 may be provided on the entire surface of each of the above layers, or may be provided on a part of the surface.
- the film thickness of the photosensitive layer 13 is appropriately set according to the mode having the photosensitive layer 13 on the conductive support 11 and is not particularly limited. For example, 0.001 to 100 ⁇ m is preferable, 0.01 to 10 ⁇ m is more preferable, and 0.01 to 5 ⁇ m is particularly preferable.
- the total film thickness with the porous layer 12 is preferably 0.01 ⁇ m or more, more preferably 0.05 ⁇ m or more, further preferably 0.1 ⁇ m or more, and 0.3 ⁇ m or more. Particularly preferred. Further, the total film thickness is preferably 100 ⁇ m or less, more preferably 50 ⁇ m or less, and even more preferably 30 ⁇ m or less.
- the total film thickness can be in a range where the above values are appropriately combined. For example, 0.1 to 100 ⁇ m is preferable, 0.1 to 50 ⁇ m is more preferable, and 0.3 to 30 ⁇ m is particularly preferable.
- the film thickness of the photosensitive layer 13 is the interface with the porous layer 12 along the direction perpendicular to the surface of the porous layer 12. This is the distance from the interface with the hole transport layer 3 described later.
- the photosensitive layer when the photosensitive layer is provided in the form of a thick film (photosensitive layers 13B and 13C), the light absorber contained in the photosensitive layer may function as a hole transport material.
- the amount of the perovskite compound used is preferably an amount covering at least a part of the surface of the first electrode 1, and more preferably an amount covering the entire surface.
- the light absorber contained in the photosensitive layer 13 is formed from an ammonium salt represented by the following formula (1) or the following formula (2) and a metal salt represented by the following formula (3).
- R 11 , R 12 and R 21 each independently represent a hydrogen atom or an aliphatic hydrocarbon group having 1 to 12 carbon atoms.
- Q 11 represents an atomic group that combines with a nitrogen atom to form a nitrogen-containing aliphatic ring.
- Q 21 represents an atomic group that forms a nitrogen-containing heterocycle other than an imidazole ring by bonding to the —N + (R 21 ) ⁇ C— group.
- X 11 and X 21 each independently represent an anion.
- M 31 represents a metal cation and X 31 represents an anion.
- a ring formed by bonding of Q 11 to a nitrogen atom (referred to as a ring formed by Q 11 ) or Q 21 is bonded to a —N + (R 21 ) ⁇ C— group.
- a ring formed by Q 21 Formed by an ammonium cation having a ring formed by Q 21 (referred to as a ring formed by Q 21 ) and an anion X 11 or X 21 .
- the ammonium cation is preferably a monovalent or divalent cation, and more preferably a monovalent cation.
- the ring formed by Q 11 and Q 21 is a ring containing at least one quaternary nitrogen atom, but in the present specification, for the sake of convenience, it will be described as an electrically neutral ring.
- Q 11 is preferably an atomic group selected from a ring-constituting nonmetallic atomic group consisting of a carbon atom, a nitrogen atom, an oxygen atom, a sulfur atom and a phosphorus atom.
- Ring Q 11 is formed may be a nitrogen-containing aliphatic ring containing at least one quaternary nitrogen atom as a ring-constituting atom, a nitrogen-containing saturated alicyclic ring, nitrogen-containing unsaturated aliphatic exhibiting no aromaticity A ring is mentioned.
- nitrogen-containing unsaturated aliphatic ring are different rings and ring Q 21 is formed.
- Ring Q 11 is formed, a nitrogen-containing saturated alicyclic ring are preferred.
- the ring formed by Q 11 is preferably a 5-membered ring or a 6-membered ring.
- the ring formed by Q 11 may be a single ring, a condensed ring, or a spiro ring, and is preferably a single ring.
- Examples of the ring Q 11 is formed, for example, pyrrolidine ring, and an imidazolidine ring, a pyrazolidine ring, piperidine ring, piperazine ring, morpholine ring, thiomorpholine ring, quinuclidine ring, a nitrogen-containing saturated alicyclic ring such as indoline ring .
- examples of the ring formed by Q 11 include nitrogen-containing unsaturated aliphatic rings such as a 2-pyrroline ring, a 2-imidazoline ring, and a 3-pyrazolin ring. Of these, a pyrrolidine ring, a piperidine ring, a piperazine ring or a thiomorpholine ring is preferable.
- the nitrogen-containing aliphatic ring may have a substituent.
- the substituent that the nitrogen-containing aliphatic ring may have is not particularly limited, and examples thereof include an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, an alkoxy group, an alkylthio group, Amino group, alkylamino group, arylamino group, acyl group, alkoxycarbonyl group, aryloxycarbonyl group, acylamino group, sulfonamido group, carbamoyl group, sulfamoyl group, halogen atom, cyano group, hydroxy group or carboxy group . Each of these substituents may be further substituted with a substituent.
- R 11 and R 12 are a hydrogen atom or an aliphatic hydrocarbon group having 1 to 12 carbon atoms.
- the aliphatic hydrocarbon group may be a linear hydrocarbon group, a branched hydrocarbon group, or a cyclic hydrocarbon group.
- the aliphatic hydrocarbon group includes a saturated hydrocarbon group and an unsaturated hydrocarbon group, and a saturated hydrocarbon group is preferable.
- the saturated hydrocarbon group includes an alkyl group and a cycloalkyl group, and an alkyl group is preferable.
- Unsaturated hydrocarbon groups include alkenyl, alkynyl and cycloalkenyl groups.
- the alkyl group may be an alkyl group having 1 to 12 carbon atoms, and the carbon number thereof is preferably 1 to 10, and more preferably 1 to 8.
- Examples of the alkyl group include methyl, ethyl, propyl, butyl, pentyl, hexyl, octyl, decyl and dodecyl. Of these, methyl, ethyl, propyl, butyl, hexyl and octyl are preferred.
- the cycloalkyl group may be a cycloalkyl group having 3 to 12 carbon atoms, and the number of carbon atoms is preferably 3 to 10, and more preferably 3 to 8. Examples of the cycloalkyl group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl.
- the alkenyl group may be an alkenyl group having 2 to 12 carbon atoms, and the carbon number thereof is preferably 2 to 10, more preferably 2 to 8.
- Examples of the alkenyl group include ethenyl (vinyl), allyl, butenyl, and hexenyl.
- the cycloalkenyl group may be a cycloalkenyl group having 4 to 12 carbon atoms, and examples thereof include cyclopentenyl and cyclohexenyl.
- the alkynyl group may be an alkynyl group having 2 to 12 carbon atoms, and the carbon number is preferably 2 to 10 and more preferably 2 to 8. Examples of the alkynyl group include ethynyl, butynyl, and hexynyl.
- R 11 and R 12 are each preferably a hydrogen atom or an alkyl group, and more preferably at least one is a hydrogen atom.
- R 11 and R 12 may be bonded to atoms contained in the atomic group of Q 11 to form a ring.
- the ring Q 11 is formed, a bridged ring.
- Examples of such a bridged ring formed by R 11 or R 12 and Q 11 include a triethylenediamine (1,4-diazabicyclo [2.2.2] octane) ring.
- R 11 and R 12 may each have a substituent.
- the substituent that R 11 and R 12 may have is the same as the substituent that the nitrogen-containing aliphatic ring may have.
- X 11 represents an anion paired with an ammonium cation having a ring formed by Q 11 , and when the ammonium cation is multivalent, this valence and the total valence of X 11 may be the same valence. preferable.
- X 11 is preferably a monovalent anion, and includes an anion of a halogen atom or an anion of each atomic group of NCS ⁇ , NCO ⁇ , CH 3 COO ⁇ or HCOO ⁇ . Of these, an anion of a halogen atom is more preferable.
- a halogen atom a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are mentioned, for example.
- Anion X 11 may be a one anion, it may be two or more anionic. When X 11 is one of the anion is the anion of an iodine atom. On the other hand, in the case of two or more types of anions, two types of halogen atom anions, particularly bromine atom anions and iodine atom anions are preferred. The ratio of two or more types of anions is not particularly limited.
- Q 21 is preferably an atomic group selected from a ring-constituting nonmetallic atom group consisting of a carbon atom, a nitrogen atom, an oxygen atom, a sulfur atom, and a phosphorus atom.
- the ring formed by Q 21 may be a nitrogen-containing heterocycle (excluding an imidazole ring) containing a quaternary nitrogen atom and a carbon atom bonded to this atom through a double bond as a ring constituent atom. Examples include a heterocycle or a nitrogen-containing aromatic heterocycle other than an imidazole ring.
- the nitrogen-containing aliphatic heterocycle may be an unsaturated ring that does not exhibit aromaticity, and is also referred to as a nitrogen-containing unsaturated aliphatic heterocycle.
- the ring formed by Q 21 is preferably a 5-membered ring or a 6-membered ring.
- the ring formed by Q 21 may be any of a single ring, a condensed ring, or a spiro ring, and a single ring is preferable.
- Examples of the ring formed by Q 21 include nitrogen-containing unsaturated aliphatic heterocycles such as 1,4,5,6-tetrahydropyrimidine and 1,2,3,4-tetrahydropyridine.
- the ring formed by Q 21 includes 2H-pyrrole ring, pyrazole ring, triazole ring, thiazole ring, oxazole ring, thiadiazole ring, oxadiazole ring, benzopyrazole ring, benzotriazole ring, benzoxazole ring, benzothiazole.
- nitrogen-containing aromatic heterocycles such as a ring, benzothiadiazole ring, benzooxadiazole ring, pyridine ring, pyrimidine ring, pyrazine ring, pyridazine ring, triazine ring, tetrazine ring, quinoline ring, isoquinoline ring or quinazoline ring.
- a pyrazole ring is preferable.
- the ring formed by Q 21 is preferably a 1,4,5,6-tetrahydropyrimidine ring or a pyrazole ring.
- the nitrogen-containing heterocycle may have a substituent.
- the substituent that the nitrogen-containing heterocycle may have is the same as the substituent that the nitrogen-containing aliphatic ring may have.
- R 21 has the same meaning as R 11 and R 12 , and preferred ones are also the same.
- R 21 may have a substituent.
- the substituent that R 21 may have is the same as the substituent that the nitrogen-containing aliphatic ring may have.
- X 21 represents an anion, which is synonymous with X 11 , and preferred ones are also the same.
- ammonium salt represented by the formula (2) is preferably an ammonium salt represented by the following formula (2A).
- R 22 and R 23 each independently represent a hydrogen atom or an aliphatic hydrocarbon group having 1 to 12 carbon atoms.
- Q 22 represents an atomic group that forms a 5-membered nitrogen-containing aromatic heterocycle by bonding to the —N (R 22 ) —NH + ⁇ C (R 23 ) — group.
- X 22 represents an anion.
- R 22 and R 23 are respectively synonymous with R 21 , and preferred ones are also the same.
- R 22 and R 23 may be the same group or different groups.
- Q 22 is synonymous with Q 21 except that it is bonded to a —N (R 22 ) —NH + ⁇ C (R 23 ) — group to form a 5-membered nitrogen-containing aromatic heterocycle, and is preferable Is the same.
- examples of the ring formed by Q 22 include nitrogen-containing aromatics such as a pyrazole ring, a triazole ring, a thiadiazole ring, an oxadiazole ring, a benzopyrazole ring, a benzotriazole ring, a benzooxadiazole ring, and a benzothiadiazole ring.
- a heterocycle is mentioned. Of these, a pyrazole ring is preferable.
- X 22 has the same meaning as X 21 , and preferred ones are also the same.
- ammonium salt represented by the formula (2) is more preferably an ammonium salt represented by the following formula (2a).
- R 22 and R 23 each independently represent a hydrogen atom or an aliphatic hydrocarbon group having 1 to 12 carbon atoms, and may be the same or different.
- R 22 and R 23 has the same meaning as R 22 and R 23 of formula (2A), it is preferable also the same.
- X 22 represents an anion, which has the same meaning as X 22 in formula (2A), and preferred examples thereof are also the same.
- ammonium salt represented by the formula (2) is also preferably an ammonium salt represented by the following formula (2B).
- R 24 , R 25 and R 26 each independently represent a hydrogen atom or an aliphatic hydrocarbon group having 1 to 12 carbon atoms.
- Q 23 represents an atomic group that forms a 6-membered nitrogen-containing heterocycle by combining with a —N + (R 24 ) ⁇ C (R 25 ) —N (R 26 ) — group.
- X 23 represents an anion.
- R 24 , R 25 and R 26 have the same meanings as R 22 and R 23 in formula (2A), and preferred ones are also the same.
- R 25 and R 26 may combine with each other to form a ring.
- examples of the ring formed by R 25 and R 26 include a pyrrolidine ring, a piperidine ring, and a hexamethyleneimine (azacycloheptane) ring.
- Q 23 has the same meaning as Q 21 except that it is bonded to a —N + (R 24 ) ⁇ C (R 25 ) —N (R 26 ) — group to form a 6-membered nitrogen-containing heterocycle, The preferred ones are the same.
- the ring Q 23 forms includes a nitrogen-containing aliphatic hetero ring and nitrogen-containing aromatic heterocyclic ring, for example, 1,4,5,6-tetrahydropyrimidine ring, a pyrimidine ring, a triazine ring, tetrazine ring, quinazoline A ring etc. are mentioned.
- Ring Q 23 is formed, preferably a nitrogen-containing aliphatic hetero ring, more preferably 1,4,5,6-tetrahydropyrimidine ring.
- X 23 has the same meaning as X 21 , and preferred ones are also the same.
- ammonium salt represented by the formula (2) is more preferably an ammonium salt represented by the following formula (2b).
- each of R 24 , R 25 and R 26 independently represents a hydrogen atom or an aliphatic hydrocarbon group having 1 to 12 carbon atoms, and may be the same or different from each other.
- R 24 , R 25 and R 26 have the same meanings as R 24 , R 25 and R 26 in formula (2B), respectively, and preferred ones are also the same.
- X 23 represents an anion, which is synonymous with X 23 in formula (2B), and preferred examples thereof are also the same.
- the ammonium cation forming the ammonium salt preferably has a CLogP value of 0.4 or more and 10 or less.
- the CLogP value means a common logarithm of a distribution coefficient P (Partition Coefficient). Specifically, it is a physical property value that expresses how a chemical substance is distributed in a two-phase equilibrium of oil (generally 1-octanol) and water as a quantitative value. Is done.
- CLogP Log (C oil / C water )
- C oil represents the molar concentration in the oil phase
- C water represents the molar concentration in the aqueous phase.
- CLogP value is positively increased, the oil solubility is increased.
- ClogP value is negative and the absolute value is increased, the water solubility is increased.
- the CLogP value has a negative correlation with the water solubility of chemical substances, and is widely used as a parameter for estimating hydrophilicity / hydrophobicity. In principle, it is actually measured in a distribution experiment considering its definition, but estimation from the structural formula is an effective means. For this reason, the calculated CLogP value is frequently used.
- the CLogP value is measured by ChemDrawPro ver. Manufactured by CambridgeSoft. It is a value calculated by 12.0.
- ammonium cation which forms the ammonium salt represented by Formula (1) and Formula (2) below is shown with a CLogP value, this invention is not limited to these.
- A1 is given as a compound number to specific examples of ammonium cations that form the ammonium salt represented by the formula (1).
- A2 is given as a compound number to specific examples of the ammonium cation forming the ammonium salt represented by the formula (2).
- the metal cation M 31 forming the metal salt is not particularly limited, but a cation of a metal atom other than the Group 1 element of the periodic table is preferable.
- the metal cation M 31 is preferably a divalent cation, particularly preferably Pb 2+ (Pb metal salt) or Sn 2+ (Sn metal salt).
- M 31 may be one type of metal cation or two or more types of metal cations. In the case of two or more kinds of metal cations, two kinds of Pb 2+ and Sn 2+ are preferable.
- the ratio of the metal cation at this time is not specifically limited.
- the anion X 31 is synonymous with the anion X 11 .
- X 31 is one kind of anion, it is the same as that of the anion X 11 except that an anion of a chlorine atom is preferable.
- the light absorber formed from the ammonium salt and the metal salt is preferably a compound represented by the following formula (I).
- A represents a cationic organic group.
- M represents a metal atom other than Group 1 elements of the periodic table.
- X represents an anionic atom (atomic group).
- a represents 1 or 2
- the cationic organic group A is an organic group that becomes an ammonium cation that forms an ammonium salt represented by the formulas (1) and (2). Preferred examples of the cationic organic group A are the same as those of the ammonium cation.
- Metal atom M has the same meaning as the metal atom described metal cation M 31, it is preferable also the same.
- the anionic atom X is an anionic atom (atomic group) which becomes the anion X 11 , X 21 or the anion X 31 .
- Preferred anionic atoms X are the same as the preferred anions X 11 , X 21 or anions X 31 .
- the compound represented by the formula (I) is a compound represented by the following formula (I-1) when a is 1, and is represented by the following formula (I-2) when a is 2. It is a compound.
- A represents a cationic organic group and has the same meaning as A in the formula (I), and the preferred ones are also the same.
- M represents a metal atom other than the Group 1 element of the periodic table, and is synonymous with M in the above formula (I), and preferred ones are also the same.
- X represents an anionic atom (atomic group) and is synonymous with X in the formula (I), and preferred ones are also the same.
- Examples of the compound represented by the formula (I) include perovskite compounds.
- the compound represented by formula (I) may be either a compound represented by formula (I-1), a compound represented by formula (I-2), or a mixture thereof. Therefore, the light absorber preferably contains at least one compound represented by the formula (I), and it is necessary to clearly distinguish which compound is strictly based on the composition formula, molecular formula, crystal structure, and the like. Absent.
- the light absorber can be synthesized by heating an ammonium salt and a metal salt, for example.
- a synthesis method Akihiro Kojima, Kenjiro Teshima, Yasuo Shirai, and Tsutomu Miyasaka, “Organal Halide Perovskits as Visible-Lisgit-Ligitt-Lift-Slit. Am. Chem. Soc. 2009, 131 (17), 6050-6051.
- the hole transport layer 3 has a function of replenishing electrons to the oxidant of the light absorber.
- the hole transport layer 3 may be a liquid layer such as a liquid electrolyte, or may be a solid layer (solid layer). In the present invention, a solid layer is preferable.
- the hole transport layer 3 is preferably provided between the photosensitive layer 13 of the first electrode 1 and the second electrode 2 as in the photoelectric conversion elements 10A to 10D.
- the hole transport material for forming the hole transport layer 3 is not particularly limited, and examples thereof include inorganic materials such as CuI, CuNCS, graphene oxide (GO), and paragraph numbers 0209-0212 of JP-A-2001-291534. And the organic hole transport material described in the above.
- the organic hole transport material is preferably a conductive polymer such as polythiophene, polyaniline, polypyrrole and polysilane, a spiro compound in which two rings share a tetrahedral structure such as C and Si, and triarylamine. And aromatic amine compounds such as triphenylene compounds, nitrogen-containing heterocyclic compounds, and liquid crystalline cyano compounds.
- the hole transporting material is preferably an organic hole transporting material that can be applied by solution and becomes solid.
- organic hole transporting material Specifically, 2,2 ′, 7,7′-tetrakis- (N, N-di-p-methoxyphenyl) Amine) -9,9-spirobifluorene (Spiro-OMeTAD), poly (3-hexylthiophene-2,5-diyl), 4- (diethylamino) benzaldehyde diphenylhydrazone, polyethylenedioxythiophene (PEDOT), etc. It is done.
- the thickness of the hole transport layer 3 is not particularly limited, but is preferably 50 ⁇ m or less, more preferably 1 nm to 10 ⁇ m, further preferably 5 nm to 5 ⁇ m, and particularly preferably 10 nm to 1 ⁇ m.
- the total film thickness of the porous layer 12, the photosensitive layer 13, and the hole transport layer 3 is not particularly limited, but is preferably 0.1 to 200 ⁇ m, for example, 5 to 50 ⁇ m is more preferable, and 0.5 to 5 ⁇ m is more preferable.
- the photoelectric conversion element 10 ⁇ / b> E has an electron transport layer 4 between the photosensitive layer 13 ⁇ / b> C and the second electrode 2.
- the electron transport layer 4 is the same as the electron transport layer 15 except that the electron transport destination is the second electrode and the position where the electron transport layer 4 is formed is different.
- the second electrode 2 functions as a positive electrode in the solar cell.
- the 2nd electrode 2 will not be specifically limited if it has electroconductivity, Usually, it can be set as the same structure as the electroconductive support body 11. FIG. If the strength is sufficiently maintained, the support 11a is not necessarily required.
- the structure of the second electrode 2 is preferably a structure having a high current collecting effect. In order for light to reach the photosensitive layer 13, at least one of the conductive support 11 and the second electrode 2 must be substantially transparent. In the solar cell of this invention, it is preferable that the electroconductive support body 11 is transparent and sunlight is entered from the support body 11a side. In this case, it is more preferable that the second electrode 2 has a property of reflecting light.
- Examples of the material for forming the second electrode 2 include platinum (Pt), gold (Au), nickel (Ni), copper (Cu), silver (Ag), indium (In), ruthenium (Ru), palladium ( Examples thereof include metals such as Pd), rhodium (Rh), iridium (Ir), osnium (Os), and aluminum (Al), the above-described conductive metal oxides, carbon materials, and conductive polymers.
- the carbon material may be a conductive material formed by bonding carbon atoms to each other, and examples thereof include fullerene, carbon nanotube, graphite, and graphene.
- the second electrode 2 is preferably a metal or conductive metal oxide thin film (including a thin film formed by vapor deposition), or a glass substrate or a plastic substrate having this thin film.
- a metal or conductive metal oxide thin film including a thin film formed by vapor deposition
- a glass substrate or a plastic substrate having this thin film.
- glass substrate or plastic substrate glass having a thin film of gold or platinum or glass on which platinum is deposited is preferable.
- the film thickness of the second electrode 2 is not particularly limited, but is preferably 0.01 to 100 ⁇ m, more preferably 0.01 to 10 ⁇ m, and particularly preferably 0.01 to 1 ⁇ m.
- a spacer or a separator can be used instead of the blocking layer 14 or the like or together with the blocking layer 14 or the like.
- a hole blocking layer may be provided between the second electrode 2 and the hole transport layer 3.
- the solar cell of this invention is comprised using the photoelectric conversion element of this invention.
- a photoelectric conversion element 10 provided with an external circuit 6 can be used as a solar cell.
- the external circuit connected to the first electrode 1 (conductive support 11) and the second electrode 2 can be used without particular limitation.
- the solar cell to which the photoelectric conversion element of the present invention is applied is not particularly limited, and examples thereof include solar cells described in Patent Documents 1 and 2.
- the photoelectric conversion element and the solar cell of the present invention have a photosensitive layer containing the above light absorber. Thereby, durability is high and the stable battery performance is exhibited.
- the photoelectric conversion element and solar cell of the present invention can be produced according to known production methods, for example, the methods described in Patent Documents 1 and 2, etc. Below, the manufacturing method of the photoelectric conversion element and solar cell of this invention is demonstrated easily.
- a blocking layer 14 is formed on the surface of the conductive support 11.
- the blocking layer 14 can be formed by, for example, a method of applying a dispersion containing the insulating material or a precursor compound thereof to the surface of the conductive support 11 and baking it, or a spray pyrolysis method.
- the material forming the porous layer 12 is preferably used as fine particles, and more preferably used as a dispersion containing fine particles.
- the method for forming the porous layer 12 is not particularly limited, and examples thereof include a wet method, a dry method, and other methods (for example, a method described in Chemical Review, Vol. 110, page 6595 (2010)). It is done. In these methods, the dispersion (paste) is applied to the surface of the conductive support 11 or the surface of the blocking layer 14, and then fired at a temperature of 100 to 800 ° C. for 10 minutes to 10 hours, for example, in air. preferable. Thereby, microparticles
- the firing temperature other than the last firing is preferably performed at a temperature lower than the last firing temperature (the last firing temperature).
- the firing temperature other than the last can be set within a range of 50 to 300 ° C.
- the final firing temperature can be set to be higher than the firing temperature other than the last within the range of 100 to 600 ° C.
- the firing temperature is preferably 60 to 500 ° C.
- the amount of the porous material applied when forming the porous layer 12 is appropriately set according to the thickness of the porous layer 12 and the number of times of application, and is not particularly limited.
- the coating amount of the porous material per 1 m 2 of the surface area of the conductive support 11 is preferably 0.5 to 500 g, and more preferably 5 to 100 g.
- the electron transport layer 15 or the hole transport layer 16 When the electron transport layer 15 or the hole transport layer 16 is provided, it can be formed in the same manner as the hole transport layer 3 or the electron transport layer 4 described later.
- the method for providing the photosensitive layer 13 includes a wet method and a dry method, and is not particularly limited.
- a wet method is preferred, and for example, a method of contacting with a light absorbent solution containing an absorbent is preferred.
- a light absorbent solution for forming the photosensitive layer 13 is prepared.
- the light absorber solution contains an ammonium salt represented by the above formula (1) or formula (2) and a metal salt represented by formula (3). In this light absorber solution, the molar ratio between the ammonium salt and the metal salt is appropriately determined according to the light absorber to be formed.
- the molar ratio of the ammonium salt to the metal salt is preferably 1: 1 to 10: 1.
- This light absorber solution can be prepared by preferably heating after mixing an ammonium salt and a metal salt in a predetermined molar ratio.
- This forming liquid is usually a solution, but may be a suspension.
- the heating conditions are not particularly limited, but the heating temperature is preferably 30 to 200 ° C, more preferably 60 to 150 ° C.
- the heating time is preferably 0.5 to 100 hours, more preferably 1 to 3 hours.
- the solvent or dispersion medium those described later can be used.
- the light absorber solution thus prepared is a layer for forming the photosensitive layer 13 on the surface thereof (in the photoelectric conversion element 10, any one of the porous layer 12, the blocking layer 14, the electron transport layer 15 and the hole transport layer 16).
- the surface of the layer). Specifically, it is preferable to apply or immerse the light absorbent solution.
- the contact temperature is preferably 5 to 100 ° C.
- the immersion time is preferably 5 seconds to 24 hours, more preferably 20 seconds to 1 hour.
- drying by heat is preferable, and drying is usually performed by heating to 20 to 300 ° C., preferably 50 to 170 ° C.
- the photosensitive layer can also be formed according to the method for synthesizing the perovskite compound.
- ammonium salt solution containing the said ammonium salt and the metal salt solution containing the said metal salt are apply
- any solution may be applied first, but a metal salt solution is preferably applied first.
- the molar ratio of ammonium salt to metal salt, coating conditions and drying conditions in this method are the same as in the above method.
- an ammonium salt or a metal salt can be deposited.
- Still other methods include dry methods such as vacuum deposition using a compound or mixture from which the solvent of the light absorber solution has been removed.
- a method in which the ammonium salt and the metal salt are vapor-deposited simultaneously or sequentially is also included. As a result, a light absorber is formed and becomes the photosensitive layer 13.
- the hole transport layer 3 or the electron transport layer 4 is preferably formed on the photosensitive layer 13 thus provided.
- the hole transport layer 3 can be formed by applying a hole transport material solution containing a hole transport material and drying it.
- the hole transport material solution has a coating solution concentration of 0.1 to 1.0 M in that it has excellent coating properties, and if it has the porous layer 12, it easily penetrates into the pores of the porous layer 12. (Mol / L) is preferred.
- the electron transport layer 4 can be formed by applying an electron transport material solution containing an electron transport material and drying it.
- the second electrode 2 After forming the hole transport layer 3 or the electron transport layer 4, the second electrode 2 is formed, and a photoelectric conversion element is manufactured.
- the film thickness of each layer can be adjusted by appropriately changing the concentration of each dispersion or solution and the number of coatings. For example, when the photosensitive layers 13B and 13C having a large film thickness are provided, the light absorber solution may be applied and dried a plurality of times.
- Each of the above-mentioned dispersions and solutions may contain additives such as a dispersion aid and a surfactant as necessary.
- Examples of the solvent or dispersion medium used in the photoelectric conversion element and solar cell manufacturing method include, but are not limited to, the solvents described in JP-A No. 2001-291534.
- an organic solvent is preferable, and an alcohol solvent, an amide solvent, a nitrile solvent, a hydrocarbon solvent, a lactone solvent, a halogen solvent, and a mixed solvent of two or more of these are preferable.
- the mixed solvent a mixed solvent of an alcohol solvent and a solvent selected from an amide solvent, a nitrile solvent, or a hydrocarbon solvent is preferable.
- methanol, ethanol, isopropanol, ⁇ -butyrolactone, chlorobenzene, acetonitrile, dimethylformamide (DMF) or dimethylacetamide, or a mixed solvent thereof is preferable.
- the application method of the solution or dispersant forming each layer is not particularly limited, and spin coating, extrusion die coating, blade coating, bar coating, screen printing, stencil printing, roll coating, curtain coating, spray coating, dip coating, inkjet
- a known coating method such as a printing method or a dipping method can be used. Of these, spin coating, screen printing, dipping, and the like are preferable.
- the photoelectric conversion element produced as described above can be used as a solar cell by connecting the external circuit 6 to the first electrode 1 (transparent electrode 11b) and the second electrode 2.
- Example 1 (Production of photoelectric conversion elements (sample numbers 101 to 104 and sample numbers c1 and c2))
- the photoelectric conversion element 10A shown in FIG. 1 was manufactured by the following procedure.
- the film thickness of the photosensitive layer 13 is large, it corresponds to the photoelectric conversion element 10B shown in FIG.
- conductive support 11 A fluorine-doped SnO 2 conductive film (transparent electrode 11b, film thickness 300 nm) was formed on a glass substrate (support 11a, thickness 2.2 mm) to produce a conductive support 11.
- a blocking layer 14 (thickness: 100 nm) made of titanium oxide is formed on the SnO 2 conductive film of the conductive support 11 at 450 ° C. by spray pyrolysis using the prepared 0.02M blocking layer solution. did.
- the prepared titanium oxide paste was applied onto the blocking layer 14 by screen printing and baked.
- the titanium oxide paste was applied and fired twice.
- As the firing temperature the first firing was performed at 130 ° C., and the second firing was performed at 500 ° C. for 1 hour.
- the obtained titanium oxide fired body was immersed in a 40 mM TiCl 4 aqueous solution, heated at 60 ° C. for 1 hour, and then heated at 500 ° C. for 30 minutes to form a porous layer 12 (thickness of TiO 2). 500 nm).
- ammonium salt of sample number c1 methylammonium iodide is an ammonium salt described in Examples of Patent Document 1.
- dimethylimidazolium cation of the ammonium salt of sample number c2 is a cation represented by the formula (30) of Patent Document 2 (both R 1 and R 4 are methyl).
- each purified ammonium salt and PbCl 2 as a metal salt were mixed at a molar ratio of 2: 1 and stirred and mixed in ⁇ -butyrolactone at 60 ° C. for 12 hours, and then a polytetrafluoroethylene (PTFE) syringe filter. Filtration was performed to prepare a light absorber solution having a concentration of 40% by mass.
- PTFE polytetrafluoroethylene
- Each light absorber solution thus prepared was applied onto the porous layer 12 by a spin coating method (2000 rpm for 60 seconds, followed by 3000 rpm for 60 seconds).
- the applied light absorbent solution was dried with a hot plate under normal pressure in a nitrogen atmosphere at 100 ° C. for 40 minutes to synthesize a light absorbent.
- a part of the light absorber contained a perovskite compound.
- the photosensitive layer 13 containing the light absorber film thickness 600 nm (including the thickness of the porous layer 12 of 500 nm) was provided on the porous layer 12 to produce the first electrode 1.
- the prepared hole transporting material solution is applied onto the photosensitive layer 13 of the first electrode 1 by spin coating, and the applied hole transporting material solution is dried to form a solid hole transporting layer 3 (film). A thickness of 0.5 ⁇ m) was formed.
- the photoelectric conversion element of each sample number was subjected to a battery characteristic test within 1 hour after production.
- the battery characteristic test is performed by irradiating each photoelectric conversion element with 1000 W / m 2 of pseudo-sunlight from a xenon lamp through an AM1.5 filter using a solar simulator “WXS-85H” (manufactured by WACOM). It was.
- the current-voltage characteristic was measured using an IV tester to determine the initial photoelectric conversion efficiency ⁇ 1 (%).
- the durability of the photoelectric conversion element was evaluated according to the following evaluation criteria based on the calculated conversion efficiency ratio.
- “B” is a passing level of this test, and “A” is an excellent level.
- “C” has a large decrease in conversion efficiency, and does not reach the pass level (required level) of this test.
- the ratio of photoelectric conversion efficiency is A: 0.6 or more and 1.0 or less B: 0.4 or more and less than 0.6 C: Less than 0.4
- photoelectric conversion elements 10C to 10E were manufactured in the same manner as in Example 1 except that the form of the photoelectric conversion element was changed to each form shown in FIGS. .
- the obtained photoelectric conversion elements were evaluated for durability in the same manner as in Example 1. As a result, all of the photoelectric conversion elements were as excellent as the photoelectric conversion elements of Sample Nos. 101 to 104 in Example 1.
- Electron transport layer 16 Hole transport layer 2 First Two electrodes 3A, 3B Hole transport layer 4
- Electron transport layer 6 External circuit (lead) 10A, 10B, 10C, 10D, 10E, 10F Photoelectric conversion elements 100A, 100B, 100C, 100D, 100E, 100F System M that applies photoelectric conversion elements to battery applications Electric motor
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Abstract
La présente invention porte sur un élément de conversion photoélectrique qui comprend une première électrode, qui présente une couche photosensible contenant un absorbeur de lumière sur un corps de support conducteur, et une seconde électrode, qui fait face à la première électrode, l'absorbeur de lumière étant formé d'un sel d'ammonium représenté par la formule (1) ou la formule (2) et d'un sel métallique représenté par la formule (3) ; sur une cellule solaire qui utilise cet élément de conversion photoélectrique. Dans la formule (1) et la formule (2), R11, R12 et R21 représentent chacun indépendamment un atome d'hydrogène ou un groupe hydrocarbure aliphatique contenant de 1 à 12 atomes de carbone ; Q11 représente un groupe atomique qui se combine avec un atome d'azote et forme un cycle aliphatique contenant de l'azote ; Q21 représente un groupe atomique qui se combine avec un groupe -N+(R21)=C- et forme un cycle hétérocyclique contenant de l'azote autre qu'un cycle imidazole ; X11 et X21 représentent chacun indépendamment un anion. Dans la formule (3), M31 représente un cation métallique et X31 représente un anion.
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007053102A (ja) * | 2005-08-18 | 2007-03-01 | Samsung Sdi Co Ltd | 色素増感太陽電池用色素および色素増感太陽電池 |
JP2009530847A (ja) * | 2006-03-20 | 2009-08-27 | ゼネラル・エレクトリック・カンパニイ | 向上した効率を示す光電子デバイス |
JP2013058400A (ja) * | 2011-09-08 | 2013-03-28 | Japan Carlit Co Ltd:The | 色素増感太陽電池用電解液およびそれを用いた色素増感太陽電池 |
EP2693503A1 (fr) * | 2012-08-03 | 2014-02-05 | Ecole Polytechnique Fédérale de Lausanne (EPFL) | Cellule solaire à hétérojonction comprenant une couche pérovskite d'halogénures organo-métalliques et sa fabrication |
-
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007053102A (ja) * | 2005-08-18 | 2007-03-01 | Samsung Sdi Co Ltd | 色素増感太陽電池用色素および色素増感太陽電池 |
JP2009530847A (ja) * | 2006-03-20 | 2009-08-27 | ゼネラル・エレクトリック・カンパニイ | 向上した効率を示す光電子デバイス |
JP2013058400A (ja) * | 2011-09-08 | 2013-03-28 | Japan Carlit Co Ltd:The | 色素増感太陽電池用電解液およびそれを用いた色素増感太陽電池 |
EP2693503A1 (fr) * | 2012-08-03 | 2014-02-05 | Ecole Polytechnique Fédérale de Lausanne (EPFL) | Cellule solaire à hétérojonction comprenant une couche pérovskite d'halogénures organo-métalliques et sa fabrication |
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US10388465B2 (en) | 2017-03-07 | 2019-08-20 | Kabushiki Kaisha Toshiba | Semiconductor elements and method for manufacturing the same |
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