WO2016024456A1 - 水素ガスの精製方法及びその精製装置 - Google Patents
水素ガスの精製方法及びその精製装置 Download PDFInfo
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- WO2016024456A1 WO2016024456A1 PCT/JP2015/070225 JP2015070225W WO2016024456A1 WO 2016024456 A1 WO2016024456 A1 WO 2016024456A1 JP 2015070225 W JP2015070225 W JP 2015070225W WO 2016024456 A1 WO2016024456 A1 WO 2016024456A1
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
- C01B3/56—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by contacting with solids; Regeneration of used solids
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/10—Inorganic adsorbents
- B01D2253/102—Carbon
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/10—Inorganic adsorbents
- B01D2253/106—Silica or silicates
- B01D2253/108—Zeolites
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2256/00—Main component in the product gas stream after treatment
- B01D2256/16—Hydrogen
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
- B01D2257/702—Hydrocarbons
- B01D2257/7022—Aliphatic hydrocarbons
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D2257/00—Components to be removed
- B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
- B01D2257/702—Hydrocarbons
- B01D2257/7027—Aromatic hydrocarbons
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/40—Further details for adsorption processes and devices
- B01D2259/40011—Methods relating to the process cycle in pressure or temperature swing adsorption
- B01D2259/40013—Pressurization
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/40—Further details for adsorption processes and devices
- B01D2259/40011—Methods relating to the process cycle in pressure or temperature swing adsorption
- B01D2259/40028—Depressurization
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/40—Further details for adsorption processes and devices
- B01D2259/40083—Regeneration of adsorbents in processes other than pressure or temperature swing adsorption
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/40—Further details for adsorption processes and devices
- B01D2259/40083—Regeneration of adsorbents in processes other than pressure or temperature swing adsorption
- B01D2259/40086—Regeneration of adsorbents in processes other than pressure or temperature swing adsorption by using a purge gas
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/40—Further details for adsorption processes and devices
- B01D2259/40083—Regeneration of adsorbents in processes other than pressure or temperature swing adsorption
- B01D2259/40088—Regeneration of adsorbents in processes other than pressure or temperature swing adsorption by heating
- B01D2259/4009—Regeneration of adsorbents in processes other than pressure or temperature swing adsorption by heating using hot gas
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/40—Further details for adsorption processes and devices
- B01D2259/402—Further details for adsorption processes and devices using two beds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/002—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation
Definitions
- the present invention relates to a hydrogen gas purification method and a purification apparatus therefor, and more particularly to a hydrogen gas purification method and a purification apparatus capable of separating and removing impurity components such as methylcyclohexane and toluene from the hydrogen gas.
- Non-Patent Documents 1 and 2 below.
- an organic compound used as a hydrogen carrier can be handled in the same manner as petroleum and gasoline, and handling is easy.
- Existing infrastructure can also be used.
- the organic chemical hydride method includes a hydrogenation process in which hydrogen is immobilized by a hydrogenation reaction of a specific organic compound, and a dehydrogenation process in which hydrogen gas is extracted.
- the organic compound having a high hydrogen storage amount of about 6% by mass can be used as a hydrogen carrier.
- the hydrogenation step is represented by the following chemical reaction formula (1)
- the dehydrogenation step is represented by the following chemical reaction formula (2).
- the hydrogenation process represented by the chemical reaction formula (1) is a technique that is generally used as hydrogenation in a chemical plant.
- toluene is methylcyclohexane as described above
- benzene is cyclohexane and naphthalene is decalin
- a catalyst capable of efficiently proceeding with the reaction has been developed (see Non-Patent Document 2 below).
- organic compounds such as toluene and methylcyclohexane used as hydrogen carriers are mixed as impurity components.
- the abundance of this impurity component is considered to be at least about 0.1 to 2% by mass relative to the total mass.
- the purity of the hydrogen gas is required to be reduced to 2 ppm or less in terms of the total amount of carbon mixed in the hydrogen gas. (As defined in ISO 14687-2). Therefore, in order to supply and use hydrogen stored and transported by the organic chemical hydride method to the fuel cell vehicle, the amount of carbon, that is, the amount of organic compounds mixed in hydrogen gas is less than the above specified value, It is necessary to carry out purification.
- adsorption separation using an adsorbent can be considered.
- Examples of such an adsorption separation method include a pressure swing adsorption (PSA) method (see Patent Document 1 below) and a temperature swing adsorption (Thermal Swing Adsorption (TSA)) method.
- PSA pressure swing adsorption
- TSA temperature swing adsorption
- the purge gas in order to ensure the purity of the purified hydrogen gas, a part thereof is often used.
- the purge gas after use is exhausted, there is a problem that the recovery rate of purified hydrogen gas decreases.
- the present invention has been made in view of the above problems, and its purpose is to purify hydrogen gas that can be purified at a high recovery rate by removing impurity components from hydrogen gas extracted by an organic chemical hydride method or the like. It is to provide a method and a purification apparatus thereof.
- the hydrogen gas purification method according to the present invention uses a pair of adsorption towers each filled with an adsorbent to solve the above-described problems, and purifies the raw material hydrogen gas containing an impurity component.
- an adsorption step for separating the impurity component from the raw material hydrogen gas by adsorbing the impurity component to the adsorbent in the adsorption tower, and a purge gas heated to the adsorption tower after the adsorption step is completed.
- the adsorption cycle including at least a heat regeneration step for desorbing the impurity component from the adsorbent is repeated in each adsorption tower, and the adsorption step is performed in one of the adsorption towers.
- the other adsorption tower performs steps other than the adsorption step, and the heating regeneration step performs the adsorption process after the adsorption step is completed while circulating the purge gas. And performing feed to the column.
- the method for purifying hydrogen gas of the present invention repeatedly performs an adsorption cycle including at least an adsorption step and a heat regeneration step in each of two adsorption towers. Further, in the adsorption cycle, while the adsorption process is performed in one adsorption tower, processes other than the adsorption process are performed in the other adsorption tower. Therefore, in this invention, operation which makes an impurity component adsorb
- the heated purge gas is circulated and supplied to the adsorption tower after the adsorption step.
- the conventional purge gas is exhausted.
- the amount of purge gas can be greatly reduced and its recovery can be achieved.
- the recovery rate of purified hydrogen gas can be improved.
- the “adsorption tower after the adsorption process” means an adsorption tower that has completed the adsorption process, in addition to the adsorption tower immediately after the adsorption process, and that includes other processes.
- the adsorption cycle includes a depressurization step for discharging and depressurizing the residual gas remaining in the adsorption tower immediately after the adsorption step, and an adsorption step for the residual gas.
- a part of the purified hydrogen gas discharged from the adsorption tower inside is used as the purge gas, and the regeneration preparation step of supplying the adsorption tower after finishing the adsorption step while circulating the purge gas, It is preferable to include it before the heating regeneration step.
- the internal pressure of the adsorption tower after the adsorption step can be reduced to, for example, about atmospheric pressure.
- the residual gas exhausted in the decompression process and a portion of the purified hydrogen gas are mixed to form a purge gas.
- the purge gas Compared to the case where only the purified hydrogen gas is used as the purge gas.
- the amount of hydrogen gas used after the purification can be reduced.
- the adsorption cycle is a temperature at which the adsorbent can be adsorbed by circulating and supplying the purge gas as a cooling gas to the adsorption tower after the heating and regeneration step without heating at least the purge gas.
- the cooling gas once used after flowing through the adsorption tower in the cooling process was exhausted as it was.
- hydrogen gas is used as the cooling gas. Therefore, when the cooling process is performed by the conventional method, a loss corresponding to the exhausted hydrogen gas is generated. The recovery rate was reduced.
- at least heating is stopped with respect to the purge gas used in the heating regeneration step, and this is used as the cooling gas. Further, since this cooling gas is circulated and supplied to the adsorption tower after the heating regeneration step, loss of hydrogen gas after purification can be suppressed as compared with the conventional TSA method. The recovery rate can be further improved.
- the adsorption cycle is boosted by supplying a part of the purified hydrogen gas discharged from the adsorption tower in the adsorption process to the adsorption tower after the heating regeneration process.
- the adsorbent can be adsorbed by supplying at least a part of the purified hydrogen gas discharged from the adsorption tower in the adsorption step to the adsorption tower after the step and the pressure raising step without heating. It is preferable to further include a cooling step in which a part of the purified hydrogen gas is combined with the raw material hydrogen gas and supplied to the adsorption tower in the adsorption step after cooling to a temperature at which
- the cooling gas used for cooling is merged with the raw material hydrogen gas without being exhausted and supplied again to the adsorption tower during the adsorption process, so that loss of hydrogen gas after purification can be suppressed and recovered. The rate can be improved.
- the adsorption tower in the adsorption process is in a pressurized state, the pressure difference existing between the two adsorption towers can be eliminated by performing the above-mentioned pressure raising process on the adsorption tower that is going to perform the cooling process. Can do. As a result, the cooling gas used in the cooling process can be merged with the source hydrogen gas, and the pressure drop of the source hydrogen gas can be prevented.
- the adsorption cycle includes a regeneration preparation step of supplying the purge gas that is not heated to the adsorption tower immediately after the adsorption step, and a cooling gas to the adsorption tower immediately after the heating regeneration step.
- a cooling step of cooling the adsorbent filled by supplying, and the pressure in the tower of the adsorption tower for performing the steps other than the adsorption step is substantially the same as when performing the adsorption step.
- a portion of the purified hydrogen gas discharged from the adsorption tower in the adsorption step is supplied to the other adsorption tower as the purge gas, and then the purified hydrogen gas Is combined with the raw material hydrogen gas and supplied to the adsorption tower in the adsorption step, and the cooling step is a part of the purified hydrogen gas discharged from the adsorption tower in the adsorption step, cold After feeding to the other adsorption column as a gas, the hydrogen gas after the purification is combined with the raw material hydrogen gas, it is preferable that the supply to the adsorption tower in the adsorption step.
- the pressure in the tower of the adsorption tower for performing the steps other than the adsorption step is substantially the same as that in the adsorption step, the pressure in the tower of the adsorption tower before the regeneration preparation step is performed. There is no need to perform a decompression step of reducing the pressure to about atmospheric pressure. Furthermore, it is not necessary to perform a pressure increasing process for increasing the pressure in the tower in order to perform the adsorption process on the adsorption tower in which the adsorbent has been regenerated by the heating regeneration process. Therefore, in the said structure, the number of processes can be reduced and hydrogen gas can be refine
- a part of the purified hydrogen gas discharged from the adsorption tower during the adsorption step is used as a purge gas, so that it is possible to prevent impurity components from being mixed. can do.
- the purge gas is joined to the raw material hydrogen gas without being exhausted, and is supplied again to the adsorption tower in the adsorption process, so that loss of hydrogen gas after purification can be suppressed and the recovery rate can be improved.
- the cooling process as in the case of the regeneration preparation process and the heating regeneration process, since a part of the purified hydrogen gas is used as the cooling gas, the mixture of impurity components is prevented and the cooling gas after use is Since it joins with raw material hydrogen gas, the loss of the hydrogen gas after refinement
- purification can be suppressed and a yield can be aimed at.
- the purge gas in the heating regeneration step, is cooled to condense the impurity component contained in the purge gas into a liquid, and into hydrogen gas and the impurity component liquid contained in the purge gas. It is preferable to further perform a step of gas-liquid separation to recover the liquid of the impurity component. Thereby, the impurity component adsorbed by the adsorbent can be recovered as a solvent.
- the present invention when used for purifying hydrogen gas extracted by the organic chemical hydride method, it can be reused as a solvent used in the organic chemical hydride method.
- the hydrogen gas purification apparatus of the present invention includes a pair of adsorption towers each filled with an adsorbent, and purifies the hydrogen gas containing the impurity components.
- An adsorption step for separating the impurity components from the raw material hydrogen gas by adsorbing the impurity component to the adsorbent in the adsorption tower, and supplying a heated purge gas to the adsorption tower after the adsorption step.
- an adsorption cycle including at least a heat regeneration step for desorbing the impurity component from the adsorbent is repeated in each adsorption tower, and one of the pair of adsorption towers performing the adsorption step
- the raw hydrogen gas is supplied to the adsorption tower, and the raw hydrogen supply path for supplying the raw hydrogen gas is not supplied to the other adsorption tower for performing processes other than the adsorption process.
- the heating regeneration step purge gas circulating passage for supplying the adsorption tower in is connected to the purge gas circulating passage, characterized in that it comprises a heater for heating the purge gas.
- the hydrogen gas purification apparatus of the present invention repeatedly performs an adsorption cycle including at least an adsorption step and a heat regeneration step in each of the pair of adsorption towers. Further, in the adsorption cycle, while the adsorption process is performed in one adsorption tower, processes other than the adsorption process are performed in the other adsorption tower. Therefore, the raw material supply path also supplies the raw hydrogen gas to one adsorption tower that performs the adsorption step, but does not supply the raw hydrogen gas to the other adsorption tower. As a result, in the present invention, the operation of adsorbing the impurity component from the raw material hydrogen gas, separating it and purifying it can be carried out continuously.
- a purge gas circulation path is provided that circulates the heated purge gas and supplies it to the adsorption tower during the heating regeneration process.
- purified hydrogen gas As the purge gas, Compared with a conventional TSA purifier that exhausts gas, the amount of purge gas can be greatly reduced and recovered. As a result, it is possible to provide a hydrogen gas purification apparatus capable of improving the recovery rate of purified hydrogen gas.
- the adsorption cycle includes a depressurization step for discharging and depressurizing the residual gas remaining in the adsorption tower immediately after the adsorption step, and an adsorption step for the residual gas.
- a part of the purified hydrogen gas discharged from the adsorption tower inside is used as the purge gas, and the regeneration preparation step of supplying the adsorption tower after finishing the adsorption step while circulating the purge gas.
- a purified hydrogen gas introduction path for supplying a part of the purified hydrogen gas communicates with the purge gas circulation path through which the residual gas flows, which is included before the heating regeneration step.
- the purified hydrogen gas introduction path for supplying a part of the purified hydrogen gas is communicated with the purge gas circulation path through which the residual gas flows.
- the remaining gas and a part of the purified hydrogen gas can be mixed to form a purge gas. Therefore, compared with the case where only purified hydrogen gas is used as the purge gas, the amount of hydrogen gas used after the purification can be reduced.
- a part of the purified hydrogen gas is mixed with the purge gas when the amount of purge gas is insufficient in the heating regeneration process, and it takes a long time in the heating regeneration process. This is because gas purification becomes difficult. Therefore, in the said structure, a part of hydrogen gas after refinement
- the adsorption cycle can adsorb the adsorbent by circulating and supplying the purge gas as a cooling gas to the adsorption tower after the heating regeneration step without heating at least.
- a cooling step for cooling to a temperature, and a pressure increasing step for increasing the pressure by supplying a part of the purified hydrogen gas discharged from the adsorption tower in the adsorption step to the adsorption tower after the cooling step The pair of adsorption towers are branched from the purge gas circulation path, and a cooling gas circulation path for circulating and supplying the cooling gas to the adsorption tower in the cooling process, and an adsorption in the adsorption process
- the cooling gas once used after flowing through the adsorption tower in the cooling process was exhausted as it was.
- hydrogen gas is used as the cooling gas. Therefore, when the cooling process is performed by the conventional method, a loss corresponding to the exhausted hydrogen gas is generated. The recovery rate was reduced.
- at least heating is stopped with respect to the purge gas used in the heating regeneration step, and this is used as the cooling gas.
- the cooling gas is circulated using the cooling gas circulation path and the gas compressor and repeatedly used for cooling, the loss of hydrogen gas after purification can be suppressed as compared with the conventional TSA purification apparatus, and the purification The recovery rate of the subsequent hydrogen gas can be further improved.
- the adsorption cycle includes a depressurization step for discharging and depressurizing the residual gas remaining in the adsorption tower immediately after the adsorption step, and an adsorption step for the residual gas.
- a part of the purified hydrogen gas discharged from the adsorption tower inside is used as the purge gas, and the regeneration preparation step of supplying the adsorption tower after finishing the adsorption step while circulating the purge gas,
- the regeneration preparation step of supplying the adsorption tower after finishing the adsorption step while circulating the purge gas.
- it is preferable that another purified hydrogen gas introduction path is provided.
- the other purified hydrogen gas introduction path for supplying a part of the purified hydrogen gas to the adsorption tower that performs the regeneration preparation process from the adsorption tower in the adsorption process is provided.
- the regeneration preparation step the residual gas discharged in the decompression step and a part of the purified hydrogen gas can be mixed to form a purge gas. Therefore, compared with the case where only purified hydrogen gas is used as the purge gas, the amount of hydrogen gas used after the purification can be reduced.
- a part of the purified hydrogen gas is mixed with the purge gas when the amount of purge gas is insufficient in the heating regeneration process, and it takes a long time in the heating regeneration process. This is because gas purification becomes difficult. Therefore, in the said structure, a part of hydrogen gas after refinement
- the adsorption cycle is boosted by supplying a part of the purified hydrogen gas discharged from the adsorption tower in the adsorption process to the adsorption tower after the heating regeneration process. And by supplying at least a part of the purified hydrogen gas discharged from the adsorption tower in the adsorption step to the adsorption tower after the pressurization step without heating, the adsorbent can be adsorbed.
- the raw material supply path After cooling to a temperature, further comprising a cooling step of joining a part of the purified hydrogen gas with the raw material hydrogen gas and supplying to the adsorption tower in the adsorption step, the raw material supply path, A cooling gas introduction path branched from the purge gas circulation path is connected, and the cooling gas introduction path supplies purified hydrogen gas used as a cooling gas in the cooling step to the raw material supply path,
- the gas gas circulation path is provided with a gas compressor for sending the cooling gas used in the cooling process to the cooling gas introduction path, and the other purified hydrogen gas introduction path is also used for the adsorption step in the pressurization process or the cooling process. It is preferable to supply a part of the purified hydrogen gas discharged from the adsorption tower in the process to the adsorption tower in the pressurization process or the cooling process.
- a portion of the purified hydrogen gas discharged from the adsorption tower in the other purification hydrogen gas introduction path is supplied to the adsorption tower in the cooling process, and the purified hydrogen gas Is used as the cooling gas, so that impurity components can be prevented from being mixed in the cooling gas.
- the cooling gas used for cooling is not exhausted but is flowed to the raw material supply path through the cooling gas introduction path, and is then supplied again to the adsorption tower in the adsorption process together with the raw hydrogen gas. Gas loss can be suppressed, and the recovery rate can be improved.
- the adsorption tower in the adsorption process is in a pressurized state, a pressure increase in which a part of the purified hydrogen gas discharged from the adsorption tower in the adsorption process is introduced into the adsorption tower in which the cooling process is performed.
- the gas compressor sends the cooling gas used in the cooling process to the cooling gas introduction path, so that the cooling gas can be merged with the raw material hydrogen gas.
- the adsorption cycle includes a regeneration preparation step of supplying the purge gas that is not heated to the adsorption tower immediately after the adsorption step, and a cooling gas to the adsorption tower immediately after the heating regeneration step.
- a cooling step of cooling the adsorbent filled by supplying, and the pressure in the tower of the adsorption tower for performing the steps other than the adsorption step is substantially the same as when performing the adsorption step.
- a part of the purified hydrogen gas discharged from the adsorption tower in the adsorption process is supplied as the purge gas or the cooling gas to the adsorption tower for performing processes other than the adsorption process.
- purified hydrogen gas introduction path is connected, and a purge gas / cooling gas introduction path branched from the purge gas circulation path is connected to the raw material supply path.
- Purge gas and cooling gas introduction path is preferably hydrogen gas after purification used as the purge or cooling gas and supplies to the feed channel.
- the pressure in the tower of the adsorption tower for performing the steps other than the adsorption step is substantially the same as that in the adsorption step, the pressure in the tower of the adsorption tower before the regeneration preparation step is performed. There is no need to perform a decompression step of reducing the pressure to about atmospheric pressure. Furthermore, it is not necessary to perform a pressure increasing process for increasing the pressure in the tower in order to perform the adsorption process on the adsorption tower in which the adsorbent has been regenerated by the heating regeneration process. Therefore, in the purification apparatus having the above-described configuration, the number of steps can be reduced and hydrogen gas can be purified efficiently.
- a purified hydrogen gas introduction path is provided. Therefore, it is possible to prevent impurity components from being mixed in the purge gas or the cooling gas.
- the purge gas / cooling gas introduction path branched from the purge gas circulation path is connected to the raw material supply path, the purge gas or cooling gas after use can be merged with the raw material hydrogen gas without exhausting. Thereby, since the purified hydrogen gas as the purge gas or the cooling gas can be supplied again to the adsorption tower in the adsorption step, loss of the purified hydrogen gas can be suppressed and the recovery rate can be improved.
- the purge gas circulation path includes a cooler that cools the purge gas and condenses the impurity component contained in the purge gas into a liquid in the heating and regeneration step, and the impurity component. It is preferable to provide a gas-liquid separator that performs gas-liquid separation between the liquid and hydrogen gas contained in the purge gas and collects the liquid of the impurity component. Thereby, the impurity component adsorbed by the adsorbent can be recovered as a solvent. As a result, for example, when the present invention is used for purifying hydrogen gas extracted by an organic chemical hydride method, an aromatic compound applicable to the organic chemical hydride method can be recovered as being reusable. it can.
- the present invention has the following effects by the means described above. That is, according to the present invention, an adsorption cycle including at least an adsorption process and a heat regeneration process is performed in each of the two adsorption towers, and the adsorption cycle is performed while the adsorption process is performed in one adsorption tower. The process is repeated so that a process other than the adsorption process is performed in the other adsorption tower. Therefore, in the present invention, the operation of adsorbing and separating the impurity components from the raw hydrogen gas can be continuously performed, so that the purification efficiency of the hydrogen gas can be improved.
- the heated purge gas is circulated while being supplied to the adsorption tower after the adsorption process.
- the amount of purge gas can be greatly reduced and the recovery thereof becomes possible.
- FIG. 1 is a schematic system diagram showing a TSA-type hydrogen gas purification apparatus according to Embodiment 1 of the present invention. It is a figure which shows the process performed in each adsorption tower about each step of the purification method of the hydrogen gas which concerns on the said Embodiment 1, the opening / closing state of each valve in the said hydrogen gas refinement
- FIG. 2 is a schematic system diagram showing a gas flow state in step 1 in the method for purifying hydrogen gas according to the first embodiment.
- FIG. 3 is a schematic system diagram showing a gas flow state in step 2 in the method for purifying hydrogen gas according to the first embodiment.
- FIG. 3 is a schematic system diagram showing a gas flow state in step 3 in the method for purifying hydrogen gas according to the first embodiment.
- FIG. 3 is a schematic system diagram showing a gas flow state in step 4 in the method for purifying hydrogen gas according to the first embodiment.
- FIG. 3 is a schematic system diagram showing a gas flow state in step 5 in the method for purifying hydrogen gas according to the first embodiment.
- FIG. 3 is a schematic system diagram showing a gas flow state in step 6 in the method for purifying hydrogen gas according to the first embodiment.
- FIG. 3 is a schematic system diagram showing a gas flow state in step 7 in the method for purifying hydrogen gas according to the first embodiment.
- FIG. 3 is a schematic system diagram showing a gas flow state in step 8 in the method for purifying hydrogen gas according to the first embodiment.
- FIG. 3 is a schematic system diagram showing a gas flow state in step 9 in the method for purifying hydrogen gas according to the first embodiment.
- FIG. 3 is a schematic system diagram showing a gas flow state in step 10 in the method for purifying hydrogen gas according to the first embodiment.
- It is a schematic system diagram showing the refinement
- FIG. 5 is a diagram showing a process performed in each adsorption tower, an open / close state of each valve in the hydrogen gas purification apparatus, a state of a gas compressor and a gas heater for each step of the hydrogen gas purification method according to the second embodiment. is there.
- FIG. 5 is a diagram showing a process performed in each adsorption tower, an open / close state of each valve in the hydrogen gas purification apparatus, a state of a gas compressor and a gas heater for each step of the hydrogen gas purification method according to the second embodiment. is there.
- FIG. 6 is a schematic system diagram showing a gas flow state in step 1 in the method for purifying hydrogen gas according to the second embodiment. It is a schematic system diagram showing the gas flow state in Step 2 in the method for purifying hydrogen gas according to the second embodiment.
- FIG. 5 is a schematic system diagram showing a gas flow state in step 3 in the method for purifying hydrogen gas according to the second embodiment. It is a schematic system diagram showing the gas flow state in Step 4 in the method for purifying hydrogen gas according to the second embodiment. It is a schematic system diagram showing the gas flow state in Step 5 in the method for purifying hydrogen gas according to the second embodiment. It is a schematic system diagram showing the gas flow state in Step 6 in the method for purifying hydrogen gas according to the second embodiment.
- FIG. 7 It is a schematic system diagram showing the gas flow state in Step 7 in the method for purifying hydrogen gas according to the second embodiment. It is a schematic system diagram showing the gas flow state in Step 8 in the method for purifying hydrogen gas according to the second embodiment. It is a schematic system diagram showing the gas flow state in Step 9 in the method for purifying hydrogen gas according to Embodiment 2. It is a schematic system diagram showing the gas flow state in Step 10 in the method for purifying hydrogen gas according to the second embodiment. It is a general
- FIG. 5 is a diagram illustrating a process performed in each adsorption tower, an open / close state of each valve in the hydrogen gas purification apparatus, a state of a gas compressor, and a gas heater for each step of the method for purifying hydrogen gas according to the third embodiment. is there.
- FIG. 6 is a schematic system diagram showing a gas flow state in step 1 in the method for purifying hydrogen gas according to the third embodiment. It is a schematic system diagram showing the gas flow state in Step 2 in the method for purifying hydrogen gas according to Embodiment 3.
- FIG. 6 is a schematic system diagram showing a gas flow state in step 3 in the method for purifying hydrogen gas according to the third embodiment.
- Embodiment 1 ⁇ Hydrogen gas purification equipment>
- the hydrogen gas purification apparatus according to Embodiment 1 will be described below with reference to FIG. However, parts that are not necessary for the description are omitted, and some parts are illustrated by being enlarged or reduced for easy explanation.
- the hydrogen gas purification apparatus 1 uses two towers, a first adsorption tower 10A and a second adsorption tower 10B, each filled with an adsorbent, to remove impurity components by a temperature swing adsorption (TSA) method. It is an apparatus for purifying the raw material hydrogen gas contained.
- TSA temperature swing adsorption
- the raw material hydrogen gas means hydrogen gas containing an organic compound as an impurity component.
- the hydrogen gas taken out by the organic chemical hydride method is mentioned, for example.
- Such hydrogen gas contains an aromatic compound such as toluene-methylcyclohexane (MCH), cyclohexane-benzene, naphthalene-decalin or a hydrogenated aromatic compound as an impurity component.
- the hydrogen gas purification apparatus 1 includes at least one of pentane, hexane, heptane, octane, benzene, alkylcyclopentane, and alkylcyclohexane as an impurity component in addition to the raw material hydrogen gas. Is also applicable. Therefore, the versatility of the hydrogen gas purification apparatus 1 is high.
- the use of the hydrogen gas purification apparatus 1 of the present embodiment is not limited.
- the concentration of the impurity component contained in the raw material hydrogen gas is in the range of several tens of ppm to several percent, it can be applied to the hydrogen gas purification apparatus 1.
- the adsorbent is not particularly limited, and can be appropriately selected according to the type of impurity component to be adsorbed.
- coconut shell activated carbon for example, Kuraray Chemical Co., Ltd. coconut shell activated carbon, model number: 2GG
- coal activated carbon for example, Kuraray Chemical Co., Ltd. coconut shell activated carbon, model number: 4GG
- Zeolite for example, zeolite 13X series
- activated carbon is relatively non-polar, exhibits a strong affinity for organic compounds, and does not deteriorate the adsorption performance even in the presence of moisture. Therefore, it is preferable as the adsorbent of the present embodiment.
- the pore diameter determines the selectivity of the adsorbate, and the specific surface area determines the adsorption capacity. Therefore, when various kinds of impurity components are to be adsorbed by gas, activated carbon having a wide pore size distribution is advantageous, and among these, the coconut shell activated carbon is particularly preferable. Thereby, the purification cost can be reduced.
- the filling amount of the adsorbent is not particularly limited, and can be appropriately set in consideration of factors such as the raw material hydrogen gas component, flow rate, adsorption cycle time, purified hydrogen gas purity, adsorption tower operating pressure and temperature.
- the raw material supply paths 21A and 21B communicate with the bottoms of the first adsorption tower 10A and the second adsorption tower 10B, respectively.
- the raw material supply passages 21A and 21B are provided with on-off valves 101A and 101B, respectively, and the supply and stop of the raw material hydrogen gas to the first adsorption tower 10A and the second adsorption tower 10B are controlled by opening and closing them. Control.
- the raw material supply paths 21 ⁇ / b> A and 21 ⁇ / b> B are branched from the raw material supply path 21.
- Purified hydrogen gas discharge passages 24A and 24B for discharging purified hydrogen gas are respectively provided at the tops of the first adsorption tower 10A and the second adsorption tower 10B. Communicate.
- the purified hydrogen gas discharge paths 24A and 24B are provided with on-off valves 106A and 106B, respectively, and the purified hydrogen gas is discharged or stopped from the first adsorption tower 10A or the second adsorption tower 10B by controlling the opening and closing of these valves. To control.
- the purified hydrogen gas discharge paths 24 ⁇ / b> A and 24 ⁇ / b> B are communicated with each other so as to join the purified hydrogen gas discharge path 24.
- Purge gas circulation paths 22A and 22B for circulating a purge gas are communicated with the raw material supply paths 21A and 21B, respectively. Further, the purge gas circulation paths 22 ⁇ / b> A and 22 ⁇ / b> B communicate with each other so as to join the purge gas circulation path 22.
- a first cooler 11, a gas-liquid separator 12, a gas compressor 13, and a gas heater (heater) 14 are sequentially provided.
- the first cooler 11 has a function of cooling the purge gas and condensing impurity components contained in the purge gas into a liquid.
- the gas-liquid separator 12 has a function of gas-liquid separation, for example, by collecting and separating the condensed liquid from the mixed fluid of the hydrogen gas contained in the residual gas and the impurity component that has become liquid.
- An organic solvent discharge path 29 is further connected to the gas-liquid separator 12, and the organic solvent of the impurity component separated from the gas and liquid is recovered by being discharged from the organic solvent discharge path 29.
- the gas compressor 13 has a function of discharging compressed purge gas or cooling gas in order to increase the supply pressure when the supply pressure of the purge gas or cooling gas is relatively low. Such a gas compressor 13 is not particularly limited, and a conventionally known one can be used.
- the gas heater 14 has a function of heating the purge gas. It does not specifically limit as the gas heater 14, For example, well-known things, such as an electrical stainless steel sheath heater and a steam type heater, are applicable.
- the purge gas circulation path 22 communicates with the purge gas circulation paths 25A and 25B so as to be branched. Further, the purge gas circulation paths 25A and 25B communicate with the purified hydrogen gas discharge paths 24A and 24B, respectively.
- the purge gas circulation passages 25A and 25B are provided with on-off valves 104A and 104B, respectively. By controlling the opening and closing of these valves, supply or stop of the purge gas to the purified hydrogen gas discharge passages 24A and 24B is controlled.
- the purge gas can be circulated and supplied to the first adsorption tower 10A or the second adsorption tower 10B.
- the purified hydrogen gas discharge path 24 communicates with the purified hydrogen gas introduction path 28 so that a part of the purified hydrogen gas is diverted.
- the purified hydrogen gas introduction path 28 is provided with an on-off valve 109. By controlling the opening / closing valve 109, a part of the purified hydrogen gas can be supplied to the purge gas circulation paths 25A and 25B.
- cooling gas circulation paths 26A and 26B are communicated with the purified hydrogen gas discharge paths 24A and 24B, respectively.
- the cooling gas circulation paths 26 ⁇ / b> A and 26 ⁇ / b> B communicate with the cooling gas circulation path 26, and the cooling gas circulation path 26 communicates with the purge gas circulation path 22.
- the purge gas circulation path 22 is divided into a cooling gas circulation path 23 between the gas compressor 13 and the gas heater 14.
- the cooling gas circulation path 23 is provided with a second cooler 15 for cooling the cooling gas, and is further connected so as to be divided into cooling gas circulation paths 23A and 23B.
- the cooling gas circulation paths 23A and 23B communicate with the raw material supply paths 21A and 21B, respectively.
- cooling gas circulation passages 23A and 23B are provided with on-off valves 103A and 103B, respectively, and by controlling the opening and closing of these, the supply or stoppage of the cooling gas to the raw material supply passages 21A and 21B is controlled.
- the circulating supply of the cooling gas to the first adsorption tower 10A or the second adsorption tower 10B is enabled.
- boosting passages 27A and 27B are communicated with the purified hydrogen gas discharge passages 24A and 24B.
- An on-off valve 107 is provided between the pressure increasing path 27A and the pressure increasing path 27B. By opening the on-off valve 107, the equal internal pressures in the first adsorption tower 10A and the second adsorption tower 10B can be equalized.
- the hydrogen gas purification method of the present embodiment employs the TSA method.
- each adsorption tower (1) an adsorption step, (2) a decompression step, (3) a regeneration preparation step, and (4) a heat regeneration
- the adsorption cycle of the process, (5) the cooling process, and (6) the pressure increasing process is repeated in sequence.
- processes other than the adsorption process are performed in the other adsorption tower, more specifically, (2) pressure reduction process to (6) pressure increase process.
- the adsorption step is a step in which an impurity component is adsorbed and separated from the raw material hydrogen gas using an adsorbent packed inside in an adsorption tower.
- Raw material hydrogen gas is introduced from the bottom of the adsorption tower and brought into contact with the adsorbent to adsorb only the impurity components. Thereby, purification of hydrogen gas is performed.
- the flow rate and temperature of the raw material hydrogen gas to be supplied can be appropriately set as necessary.
- the supply pressure of the raw material hydrogen gas is preferably set to the same value as the adsorption pressure inside the adsorption tower.
- the implementation period of this step is not particularly limited, and it is sufficient that the other adsorption tower is carried out while the steps from (2) pressure reduction step to (6) pressure increase step are being performed.
- the decompression step is a step of reducing the internal pressure of the adsorption tower after the adsorption step, for example, to near atmospheric pressure. Specifically, the residual gas remaining in the adsorption tower is discharged from the bottom of the tower. In this step, the organic solvent stored in the gas-liquid separator 12 is also recovered. This organic solvent is generated when the purge gas is cooled to condense the impurity component into a liquid and then gas-liquid is separated into hydrogen gas contained in the purge gas and the impurity component liquid in the heating regeneration process described later. It is a liquid of impurity components.
- the period during which the depressurization step is performed is not particularly limited, and at least if the pressure in the adsorption tower is reduced to atmospheric pressure, the next step can be performed.
- the regeneration preparation step is a step for circulating the purge gas used in the heating regeneration step described later at a constant supply pressure. Specifically, first, the residual gas is discharged from the adsorption tower after the decompression step, and when this residual gas is circulated, a part of purified hydrogen gas discharged from the other adsorption tower in the adsorption step is introduced. Do. In this step, as a result of using only the residual gas remaining inside the adsorption tower after the depressurization step as a purge gas, when the supply pressure is insufficient, such a supply pressure shortage is compensated by introducing purified hydrogen gas. is there. When the pressure of the purge gas reaches a certain value, the introduction of purified hydrogen gas is stopped.
- the specific value of the purge gas pressure in the regeneration preparation step is not particularly limited. However, in this step, the purge gas is not heated. Further, the flow rate of the purge gas is not particularly limited, and can be set as necessary. The implementation period of this step is not particularly limited, and at least if the purge gas reaches a certain pressure, the next step can be performed. Further, the flow direction of the purge gas is preferably set in a direction from the tower top to the tower bottom of the adsorption tower.
- the heating regeneration process is a process for making the adsorbent packed in the adsorption tower into a reusable state. Specifically, the purge gas circulated and supplied to the adsorption tower is heated by the gas heater 14, and the heated purge gas is brought into contact with the adsorbent to desorb the impurity components adsorbed on the adsorbent. Plan. By performing this step, the adsorbent is regenerated and the impurity components can be adsorbed again. In addition, since this process is performed by circulating a heated purge gas, the amount of purge gas exhausted can be greatly reduced as compared with the conventional TSA method in which a large amount of hydrogen gas is supplied as a purge gas and then exhausted. . As a result, the recovery rate of purified hydrogen gas can be improved.
- the heating of the adsorbent in the heating regeneration process is performed until a temperature at which the impurity component to be desorbed vaporizes. Accordingly, the heating temperature of the purge gas by the gas heater 14 can be appropriately set according to the type of impurity component to be desorbed. Usually, when the temperature at the bottom of the adsorption tower is used as a reference, the activated carbon is used in the range of 150 ° C. to 250 ° C. Further, in the case of zeolite, it is performed within a range of 200 ° C to 300 ° C. The upper limit value of the heating temperature is preferably set in consideration of the heat-resistant temperature of the adsorbent.
- the implementation period of this process is not particularly limited, and at least the desorption with respect to the adsorbent is completed, the process can proceed to the next process.
- the flow rate of the purge gas is not particularly limited, and can be set as necessary.
- the flow direction of the purge gas is preferably set in a direction from the tower top to the tower bottom of the adsorption tower.
- a process of separating and collecting the impurity component contained in the purge gas as an organic solvent can be performed.
- the purge gas is cooled to condense the impurity component into a liquid, and then gas-liquid separation is performed between the hydrogen gas contained in the purge gas and the impurity component liquid.
- the cooling step is a step of cooling the adsorbent filled in the tower by flowing a cooling gas through the adsorption tower. Thereby, the adsorption capacity of the adsorbent is regenerated.
- the cooling gas used in this step is the purge gas cooled to a certain temperature.
- purified hydrogen gas is used as the cooling gas, and the cooling gas once used in the cooling process is exhausted as it is.
- the cooling gas is cooled using the first cooler 11 and the second cooler 15. Moreover, it is preferable that cooling is performed until it becomes substantially equal to the temperature of raw material hydrogen gas, for example.
- a part of the purified hydrogen gas discharged from the adsorption tower during the adsorption process is introduced into the adsorption tower after the cooling process, so that the pressure in the towers of both adsorption towers is equalized. It is a process of planning. Thereby, the pressure in the tower of the adsorption tower after the cooling process can be increased to a pressure more suitable for performing the adsorption process.
- each implementation period of the depressurization process to the pressurization process may be performed so as to be within the implementation period in which the adsorption process is performed in the other adsorption tower, and is appropriately adjusted within the range.
- the above-described operation is performed, which will be further described below in conjunction with the operation of the hydrogen gas purification apparatus 1 of the present embodiment.
- the first adsorption tower 10A and the second adsorption tower 10B perform any one of the above-described steps in the respective steps 1 to 10.
- each step will be described in detail.
- Step 1 As shown in FIG.2 and FIG.3, in the 1st adsorption tower 10A of step 1, an adsorption
- the raw material hydrogen gas is purified by the impurity components being adsorbed and separated by the adsorbent in the first adsorption tower 10A.
- the purified hydrogen gas is discharged from the top of the tower via the purified hydrogen gas discharge paths 24A and 24.
- the on-off valve 106A in the purified hydrogen gas discharge path 24A is opened.
- a decompression step is performed in the second adsorption tower 10B. That is, the on-off valve 102B is opened, and the residual gas remaining in the second adsorption tower 10B is discharged from the bottom of the tower through the purge gas circulation path 22B. Then, when the inside of the second adsorption tower 10B is depressurized, for example, to atmospheric pressure (0 MPaG), the on-off valve 108 is closed and the depressurization step (that is, step 1) ends. In the depressurization step, the on-off valve 108 is also opened, whereby the organic solvent of the impurity component stored in the gas-liquid separator 12 is discharged through the organic solvent discharge passage 29 and collected.
- the recovered organic solvent can be reused, for example, as an organic chemical hydride (aromatic compound) used in the organic chemical hydride method.
- Step 2 As shown in FIG.2 and FIG.4, in the 1st adsorption tower 10A of step 2, an adsorption
- a regeneration preparation step is performed in the second adsorption tower 10B. That is, the on-off valve 102B is in a state opened after the pressure reducing step. Further, by opening the on-off valve 109, a part of the purified hydrogen gas discharged from the first adsorption tower 10A is diverted from the purified hydrogen gas discharge path 24 to the purified hydrogen gas introduction path 28. Further, since the on-off valve 104B is also opened, the purified hydrogen gas flows from the purified hydrogen gas introduction path 28 to the purge gas circulation path 25B, and merges with the residual gas in the purge gas circulation path 25B to become purge gas. This purge gas is supplied to the second adsorption tower 10B from the top of the tower.
- the gas compressor 13 is also driven, so that the purge gas circulates through the purge gas circulation paths 22B, 22, 25B.
- the introduction of part of the purified hydrogen gas is stopped by closing the on-off valve 109 when the suction pressure of the gas compressor 13 reaches a certain value.
- the regeneration preparation step that is, step 2 is completed.
- Step 3 As shown in FIGS. 2 and 5, the adsorption process is continuously performed in the first adsorption tower 10 ⁇ / b> A of Step 3.
- a heating regeneration step is performed in the second adsorption tower 10B. That is, following the step 2, the purge gas is circulated and the gas heater 14 is driven to heat the purge gas.
- the temperature of the adsorbent rises and the impurity components are desorbed.
- the on-off valves 104B and 102B are closed and the gas heater 14 is stopped.
- a heating regeneration process (namely, step 3) is complete
- the set temperature is determined in consideration of the temperature at which the impurity component to be desorbed evaporates.
- impurity components contained in the purge gas are also separated. That is, the purge gas flowing through the purge gas circulation paths 22 ⁇ / b> B and 22 is supplied to the first cooler 11 and is cooled by the first cooler 11. Thereby, an impurity component is condensed and it becomes a liquid (organic solvent). It does not specifically limit as cooling temperature, What is necessary is just the temperature below which an impurity component condenses at least. Further, the mixed fluid of the purge gas and the organic solvent of the impurity component is supplied to the gas-liquid separator 12 via the purge gas circulation path 22 and is gas-liquid separated in the gas-liquid separator 12. Here, since the on-off valve 108 is opened, the organic solvent of the impurity component is discharged and collected through the organic solvent discharge passage 29.
- Step 4 As shown in FIGS. 2 and 6, the adsorption process is continuously performed in the first adsorption tower 10 ⁇ / b> A of Step 4.
- a cooling step is performed in the second adsorption tower 10B. That is, by opening the on-off valves 103B and 105B, the purge gas is circulated through the cooling gas circulation path 26B, the purge gas circulation path 22 and the cooling gas circulation paths 23 and 23B as the cooling gas, and then the second adsorption tower 10B. Supplied to the bottom of the tower. Then, the adsorbent is cooled by the cooling gas coming into contact with the adsorbent filled in the second adsorption tower. Thereafter, the cooling gas is discharged from the top of the tower and flows again through the cooling gas circulation path 26B. The cooling gas is cooled in the first cooler 11 and the second cooler 15.
- the second cooler 15 is provided in order to cool the discharged cooling gas because the temperature of the cooling gas discharged from the gas compressor 13 is high.
- the on-off valves 103B and 105B are closed, and the cooling process (that is, step 4) ends.
- Step 5 As shown in FIG.2 and FIG.7, in the 1st adsorption tower 10A of step 5, an adsorption
- a pressure increasing process is performed. That is, when the on-off valve 107 is opened, a part of the purified hydrogen gas discharged from the first adsorption tower 10A is supplied to the second adsorption tower 10B via the pressure increase paths 27A and 27B. Thereby, equalization of the internal pressures of the first adsorption tower 10A and the second adsorption tower 10B can be achieved, and the internal pressure of the second adsorption tower 10B is made more suitable for the adsorption process.
- the on-off valve 107 is closed, and the pressure increasing process (ie, step 5) is completed.
- Steps 6-10 As shown in FIG. 2, in steps 6 to 10, the adsorption cycle is switched between the first adsorption tower 10A and the second adsorption tower 10B. That is, with the completion of step 5, the adsorption process in the first adsorption tower 10A is completed, and the adsorption process is started in the second adsorption tower 10B.
- the detailed operation of the hydrogen gas purification apparatus 1 in Steps 6 to 10 is as shown in FIGS. 8 to 12, and the same operation as in Steps 1 to 5 is performed using the first adsorption tower 10A and the second adsorption tower. This is performed in reverse in 10B. Therefore, those details are omitted.
- the hydrogen gas purification apparatus 2 of the present embodiment uses two towers, a first adsorption tower 10A and a second adsorption tower 10B, each filled with an adsorbent, and temperature swing is performed.
- This is an apparatus for purifying a raw material hydrogen gas containing an impurity component by an adsorption (TSA) method.
- TSA adsorption
- the raw material supply paths 21A and 21B communicate with the bottoms of the first adsorption tower 10A and the second adsorption tower 10B, respectively.
- the raw material supply passages 21A and 21B are provided with on-off valves 101A and 101B, respectively.
- the raw material supply paths 21 ⁇ / b> A and 21 ⁇ / b> B are branched from the raw material supply path 21.
- the purified hydrogen gas discharge paths 24A and 24B communicate with the tops of the first adsorption tower 10A and the second adsorption tower 10B, respectively.
- the purified hydrogen gas discharge passages 24A and 24B are provided with on-off valves 106A and 106B, respectively.
- the purified hydrogen gas discharge paths 24A and 24B communicate with each other so as to join the purified hydrogen gas discharge path 24.
- the purge gas circulation paths 22A and 22B are communicated with the raw material supply paths 21A and 21B, respectively. Further, the purge gas circulation paths 22 ⁇ / b> A and 22 ⁇ / b> B communicate with each other so as to join the purge gas circulation path 22. Further, the purge gas circulation path 22 is sequentially provided with a first cooler 11, a gas-liquid separator 12, a gas compressor 13, a gas heater 14, and an on-off valve 110. In addition, an organic solvent discharge path 29 is connected to the gas-liquid separator 12.
- the purge gas circulation path 22 communicates with the purge gas circulation paths 25A and 25B so as to be branched. Further, these purge gas circulation paths 25A and 25B communicate with purified hydrogen gas discharge paths 24A and 24B, respectively.
- the purge gas circulation paths 25A and 25B are provided with on-off valves 104A and 104B, respectively.
- the purge gas circulation path 22 is divided into the cooling gas circulation path 23 between the gas compressor 13 and the gas heater 14.
- the cooling gas circulation path 23 is provided with a second cooler 15 for cooling the cooling gas and an opening / closing valve 111 for controlling the open / close state. Further, the second cooler 15 communicates with the cooling gas introduction path 31, and the cooling gas introduction path 31 communicates with the raw material supply path 21.
- the cooling gas can be introduced into the raw material supply path 21, and the cooling gas can be circulated and supplied to the first adsorption tower 10 ⁇ / b> A or the second adsorption tower 10 ⁇ / b> B.
- the purified hydrogen gas discharge paths 24A and 24B are connected to other purified hydrogen gas introduction paths 30A and 30B, and between the other purified hydrogen gas introduction path 30A and the other purified hydrogen gas introduction path 30B.
- An on-off valve 112 is provided. By opening the on-off valve 112, a part of the purified hydrogen gas can be introduced between the first adsorption tower 10A and the second adsorption tower 10B. Further, equalization of the equal internal pressure of the first adsorption tower 10A and the second adsorption tower 10B can be achieved.
- the adsorption process, the heating regeneration process, and the pressure increasing process in the present embodiment are the same as those in the first embodiment.
- a part of the purified hydrogen gas is used as the cooling gas. Therefore, it is possible to prevent the impurity component from being mixed in the cooling gas.
- the cooling gas used for cooling is cooled by the first cooler 11 and the second cooler 15, mixed with the raw material hydrogen gas, and supplied to the adsorption tower performing the adsorption process again. Therefore, loss of purified hydrogen gas can be suppressed and the recovery rate can be improved.
- the cooling by the first cooler 11 and the second cooler 15 is performed until the temperature of the raw material hydrogen gas becomes substantially equal.
- the pressure increasing step is performed before the cooling step in order to merge the cooling gas used in the cooling step with the source hydrogen gas and prevent a decrease in the supply pressure of the source hydrogen gas. is there. That is, although the adsorption tower in the adsorption process is in a pressurized state, a pressure raising process for introducing a part of the purified hydrogen gas discharged from the adsorption tower in the adsorption process to the adsorption tower in which the cooling process is performed is performed. By doing so, the pressure difference existing between the two adsorption towers is eliminated. Thereby, the used cooling gas can be merged with the raw material hydrogen gas.
- the above operation is performed, which will be further described below together with the operation of the hydrogen gas purification apparatus 2 of the present embodiment.
- the first adsorption tower 10A and the second adsorption tower 10B perform any one of the above-described steps in the respective steps 1 to 10. Hereinafter, each step will be described in detail.
- Step 1 As shown in FIGS. 14 and 15, the adsorption process is performed in the first adsorption tower 10 ⁇ / b> A of Step 1. That is, the on-off valve 101A is opened, and the raw material hydrogen gas is supplied from the raw material supply passages 21 and 21A to the bottom of the first adsorption tower 10A.
- the raw material hydrogen gas is purified by the impurity components being adsorbed and separated by the adsorbent in the first adsorption tower 10A.
- the purified hydrogen gas is discharged from the top of the tower via the purified hydrogen gas discharge paths 24A and 24.
- the on-off valve 106A in the purified hydrogen gas discharge path 24A is opened.
- a decompression step is performed in the second adsorption tower 10B. That is, the on-off valve 102B is opened, and the residual gas remaining in the second adsorption tower 10B is discharged from the bottom of the tower through the purge gas circulation path 22B. Then, when the inside of the second adsorption tower 10B is depressurized, for example, to atmospheric pressure (0 MPaG), the on-off valve 108 is closed and the depressurization step (that is, step 1) ends. In the depressurization step, the on-off valve 108 is also opened, whereby the organic solvent of the impurity component stored in the gas-liquid separator 12 is discharged through the organic solvent discharge passage 29 and collected.
- the recovered organic solvent can be reused, for example, as an organic chemical hydride (aromatic compound) used in the organic chemical hydride method.
- Step 2 As shown in FIG.14 and FIG.16, in the 1st adsorption tower 10A of step 2, an adsorption
- a regeneration preparation step is performed in the second adsorption tower 10B. That is, the on-off valve 102B is in a state opened after the pressure reducing step. Further, by opening the on-off valve 112, a part of the purified hydrogen gas discharged from the first adsorption tower 10A is supplied to the second adsorption tower 10B via the purified hydrogen gas introduction paths 30A and 30B. Thereby, purified hydrogen gas is also circulated as purge gas. Further, in this step, the on-off valves 104B and 110 are opened, and the gas compressor 13 is also driven. As a result, the purge gas flows through the purge gas circulation paths 22B, 22 and 25B. The introduction of a part of the purified hydrogen gas is stopped by closing the on-off valve 112 when the suction pressure of the gas compressor 13 reaches a certain value. Thereby, the regeneration preparation step (that is, step 2) is completed.
- Step 3 As shown in FIGS. 14 and 17, the adsorption process is continuously performed in the first adsorption tower 10 ⁇ / b> A of Step 3.
- a heating regeneration step is performed in the second adsorption tower 10B. That is, following the step 2, the purge gas is circulated and the gas heater 14 is driven to heat the purge gas.
- the temperature of the adsorbent rises and the impurity components are desorbed.
- the on-off valves 104B and 110 are closed and the gas heater 14 is stopped.
- a heating regeneration process (namely, step 3) is complete
- the set temperature is determined in consideration of the temperature at which the impurity component to be desorbed evaporates.
- impurity components contained in the purge gas are also separated. That is, the purge gas flowing through the purge gas circulation paths 22B and 22 is cooled in the first cooler 11. Thereby, an impurity component is condensed and it becomes a liquid (organic solvent). It does not specifically limit as cooling temperature, What is necessary is just the temperature below which an impurity component condenses at least. Further, the mixed fluid of the purge gas and the organic solvent of the impurity component is supplied to the gas-liquid separator 12 via the purge gas circulation path 22 and is gas-liquid separated in the gas-liquid separator 12. Here, since the on-off valve 108 is opened, the organic solvent of the impurity component is discharged and collected through the organic solvent discharge passage 29.
- Step 4 As shown in FIGS. 14 and 18, the adsorption process is continuously performed in the first adsorption tower 10 ⁇ / b> A of Step 4.
- the second adsorption tower 10B a pressure increasing process is performed. That is, when the on-off valve 112 is opened, a part of the purified hydrogen gas discharged from the first adsorption tower 10A is supplied to the second adsorption tower 10B via the purified hydrogen gas introduction paths 30A and 30B. Thereby, equalization of the internal pressure of the first adsorption tower 10A and the second adsorption tower 10B can be achieved, and the internal pressure of the second adsorption tower 10B is brought into a pressurized state capable of a cooling process.
- the pressure increasing step that is, step 4 ends.
- Step 5 As shown in FIGS. 14 and 19, the adsorption process is continuously performed in the first adsorption tower 10 ⁇ / b> A of Step 5.
- a cooling step is performed in the second adsorption tower 10B. That is, the on-off valve 112 is in a state opened after the pressure increasing step. Thereby, the cooling gas comes into contact with the adsorbent filled in the second adsorption tower, and the adsorbent is cooled. Further, by opening the on-off valves 102B and 111, the used cooling gas is circulated through the purge gas circulation paths 22B and 22 and the cooling gas circulation paths 23 and 31, and then supplied to the raw material supply path 21. Further, during this circulation, the cooling gas is cooled in the first cooler 11 and the second cooler 15. The second cooler 15 is provided in order to cool the discharged cooling gas because the temperature of the cooling gas discharged from the gas compressor 13 is high. When the temperature at the bottom of the second adsorption tower 10B reaches the set temperature, the on-off valves 102B, 111, 112 are closed, and the cooling process (that is, step 5) is completed.
- Steps 6-10 As shown in FIG. 14, in steps 6 to 10, the adsorption cycle is switched between the first adsorption tower 10A and the second adsorption tower 10B. That is, with the completion of step 5, the adsorption process in the first adsorption tower 10A is completed, and the adsorption process is started in the second adsorption tower 10B.
- the detailed operation of the hydrogen gas purification apparatus 2 in Steps 6 to 10 is as shown in FIGS. 20 to 24. The same operations as in Steps 1 to 5 are performed using the first adsorption tower 10A and the second adsorption tower. This is performed in reverse in 10B. Therefore, those details are omitted.
- Embodiment 3 ⁇ Hydrogen gas purification equipment>
- a hydrogen gas purification apparatus according to Embodiment 3 will be described below with reference to FIG.
- symbol is attached
- the hydrogen gas purification apparatus 3 of the present embodiment uses two towers, a first adsorption tower 10A and a second adsorption tower 10B, each filled with an adsorbent,
- This is an apparatus for purifying raw material hydrogen gas containing an impurity component by a temperature swing adsorption (TSA) method.
- TSA temperature swing adsorption
- the raw material supply paths 21A and 21B communicate with the bottoms of the first adsorption tower 10A and the second adsorption tower 10B, respectively.
- the raw material supply passages 21A and 21B are provided with on-off valves 101A and 101B, respectively.
- the raw material supply paths 21 ⁇ / b> A and 21 ⁇ / b> B are branched from the raw material supply path 21.
- the purified hydrogen gas discharge paths 24A and 24B communicate with the tops of the first adsorption tower 10A and the second adsorption tower 10B, respectively.
- the purified hydrogen gas discharge passages 24A and 24B are provided with on-off valves 106A and 106B, respectively.
- the purified hydrogen gas discharge paths 24A and 24B communicate with each other so as to join the purified hydrogen gas discharge path 24.
- the purge gas circulation paths 22A and 22B are communicated with the raw material supply paths 21A and 21B, respectively. Further, the purge gas circulation paths 22 ⁇ / b> A and 22 ⁇ / b> B communicate with each other so as to join the purge gas circulation path 22. Further, the purge gas circulation path 22 is sequentially provided with a first cooler 11 and a gas-liquid separator 12. In addition, an organic solvent discharge path 29 is connected to the gas-liquid separator 12.
- the gas / liquid separator 12 is connected to a purge gas / cooling gas introduction path 32 for guiding purge gas or cooling gas to the raw material supply path 21.
- the purge gas / cooling gas introduction path 32 is provided with an opening / closing valve 113 for controlling the opening / closing state. Thereby, it is possible to introduce the purge gas or the cooling gas into the raw material supply path 21, and the circulation of the purge gas or the cooling gas to the first adsorption tower 10A or the second adsorption tower 10B is enabled.
- Another purified hydrogen gas introduction path 33 is communicated with the purified hydrogen gas discharge path 24.
- a gas compressor 13 and a gas heater 14 are sequentially provided in the purified hydrogen gas introduction path 33.
- the purified hydrogen gas introduction path 33 communicates with the purge gas circulation paths 25A and 25B so as to be branched.
- the purge gas circulation paths 25A and 25B are provided with on-off valves 104A and 104B, respectively.
- the adsorption process of the present embodiment is the same as in the first and second embodiments.
- the purified hydrogen gas used as the purge gas is mixed with the raw hydrogen gas and supplied to the adsorption tower that is performing the adsorption step again. Different from the case. Thereby, in this Embodiment, the loss of purified hydrogen gas can be suppressed and the recovery rate can be improved.
- the purified hydrogen gas used as the purge gas is mixed with the raw hydrogen gas and supplied to the adsorption tower that is performing the adsorption process again. This differs from the first and second embodiments.
- the cooling gas used for cooling is cooled with the 1st cooler 11, is mixed with raw material hydrogen gas, and is supplied to the adsorption tower which is performing the adsorption process again. Therefore, loss of purified hydrogen gas can be suppressed and the recovery rate can be improved.
- the cooling by the first cooler 11 is performed until the temperature of the raw material hydrogen gas becomes substantially equal.
- the hydrogen gas purification device 3 of the present embodiment can simplify the device structure as compared with the hydrogen gas purification devices 1 and 2 of the first and second embodiments.
- the above-described operation is performed.
- the operation will be further described below in conjunction with the operation of the hydrogen gas purification device 3 of the present embodiment.
- the first adsorption tower 10A and the second adsorption tower 10B perform any one of the above-described steps in the respective steps 1 to 6.
- each step will be described in detail.
- Step 1 As shown in FIGS. 26 and 27, in the first adsorption tower 10A of Step 1, an adsorption process is performed. That is, the on-off valve 101A is opened, and the raw material hydrogen gas is supplied from the raw material supply passages 21 and 21A to the bottom of the first adsorption tower 10A.
- the raw material hydrogen gas is purified by the impurity component being adsorbed and separated by the adsorbent in the first adsorption tower 10A.
- the purified hydrogen gas is discharged from the top of the tower via the purified hydrogen gas discharge paths 24A and 24.
- the on-off valve 106A in the purified hydrogen gas discharge path 24A is opened.
- a regeneration preparation step is performed in the second adsorption tower 10B. That is, the on-off valve 104B is opened and the gas compressor 13 is driven to supply a part of the purified hydrogen gas discharged from the purified hydrogen gas discharge path 24 to the second adsorption tower 10B as a purge gas. Further, in this step, the on-off valve 102B is opened, and the purge gas is supplied to the raw material supply path 21 via the purge gas circulation path 22 and the purge gas / cooling gas introduction path 32.
- the on-off valve 108 is also opened, whereby the organic solvent of the impurity component stored in the gas-liquid separator 12 is discharged through the organic solvent discharge passage 29 and collected.
- the recovered organic solvent can be reused, for example, as an organic chemical hydride (aromatic compound) used in the organic chemical hydride method.
- Step 2 As shown in FIGS. 26 and 28, in the first adsorption tower 10A of Step 2, the adsorption process is continuously performed.
- a heating regeneration step is performed in the second adsorption tower 10B. That is, the on-off valves 104A, 102B, and 113 are continuously opened. Subsequently to Step 1, the purge gas is circulated, the gas heater 14 is driven, and the purge gas is heated. When the heated purge gas comes into contact with the adsorbent in the second adsorption tower 10B, the temperature of the adsorbent rises and the impurity components are desorbed. When the temperature at the bottom of the second adsorption tower 10B reaches the set temperature, the gas heater 14 is stopped. Thereby, a heating regeneration process (namely, step 3) is complete
- the set temperature is determined in consideration of the temperature at which the impurity component to be desorbed evaporates.
- impurity components contained in the purge gas are also separated. That is, the purge gas flowing through the purge gas circulation path 22 is cooled in the first cooler 11. Thereby, an impurity component is condensed and it becomes a liquid (organic solvent). Further, the mixed fluid of the purge gas and the organic solvent of the impurity component is supplied to the gas-liquid separator 12 via the purge gas circulation path 22 and is gas-liquid separated in the gas-liquid separator 12. Since the on-off valve 108 is opened, the organic solvent of the impurity component is discharged through the organic solvent discharge passage 29.
- the recovered organic solvent can be reused, for example, as an organic chemical hydride (aromatic compound) used in the organic chemical hydride method.
- Step 3 As shown in FIGS. 26 and 29, in the first adsorption tower 10A of Step 3, the adsorption process is continuously performed.
- a cooling step is performed in the second adsorption tower 10B. That is, the on-off valves 104B, 102B, and 113 are continuously opened. As a result, the cooling gas comes into contact with the adsorbent filled in the second adsorption tower 10B, and the adsorbent is cooled. Also, by opening the on-off valves 102B and 113, the used cooling gas is circulated through the purge gas circulation paths 22B and 22 and the purge gas / cooling gas introduction path 32 and then supplied to the raw material supply path 21. Further, during this circulation, the cooling gas is cooled in the first cooler 11. When the temperature at the bottom of the second adsorption tower 10B reaches the set temperature, the on-off valves 102B and 104B are closed, and the cooling process (ie, step 5) is completed.
- the organic solvent as an impurity component is discharged through the organic solvent discharge path 29.
- Steps 4-6 As shown in FIG. 26, in steps 4 to 6, the adsorption cycle is switched between the first adsorption tower 10A and the second adsorption tower 10B. That is, with the completion of step 3, the adsorption process in the first adsorption tower 10A is completed, and the adsorption process is started in the second adsorption tower 10B.
- the detailed operation of the hydrogen gas purification apparatus 3 in steps 4 to 6 is as shown in FIGS. 31 to 32. The same operation as in steps 1 to 3 is performed for the first adsorption tower 10A and the second adsorption tower. This is performed in reverse in 10B. Therefore, those details are omitted.
- the hydrogen gas refining apparatuses 1 to 3 can be provided with a PSA apparatus for enabling the exhausted purified hydrogen gas to be purified by the PSA method.
- other impurity components for example, methane, ethane, etc.
- the component adsorbed by the adsorbent is only the other impurity component, so that the amount of purge gas can be reduced also in the PSA apparatus. Recovery rate can be maintained.
- the hydrogen gas purification apparatus 1 shown in FIG. 1 (see FIG. 1) is used to repeat the adsorption cycle shown in FIGS. went.
- the sizes of the first adsorption tower 10A and the second adsorption tower 10B were as follows. Tower diameter: 500mm Adsorbent filling height at adsorption tower diameter: 1.5m Adsorption tower height (between TL): 2 m The filling amount of the adsorbent was 120 kg.
- coconut shell activated carbon coconut shell activated carbon manufactured by Kuraray Chemical Co., Ltd., model number: 2GG was used.
- the adsorbent of the coconut shell activated carbon showed excellent adsorption ability for toluene and MCH, but hardly adsorbed for hydrogen (for example, partial pressure of 1 kPa).
- the static adsorption capacities were respectively toluene: 90 NL / kg (37 wt%), MCH: 73 NL / kg (32 wt%), and hydrogen: 0.1 NL / kg or less (0.001 wt% or less). Therefore, the adsorption amounts of toluene, MCH, and hydrogen under the operating conditions described in each example were set as follows. Toluene: 114 NL / kg (47% by mass) (toluene concentration 5400 ppm) MCH: 87NL / kg (38 mass%) (MCH concentration 5400ppm) Hydrogen: 0.001% by mass or less
- Example 1 The hydrogen gas purification apparatus 1 shown in FIG. 1 was used to simulate the purification of the raw material hydrogen gas by repeating the adsorption cycles shown in FIGS.
- the raw material hydrogen gas had a toluene-containing concentration of 5400 ppm (0.9 MPaG, saturated steam amount at 30 ° C.) and a methylcyclohexane-containing concentration of 0 ppm.
- the purification conditions were as follows.
- the adsorption cycle time (one cycle) was 8 hours.
- Adsorption time 4 hours
- Raw material hydrogen gas flow rate 305 Nm 3 / h
- the amount of purified hydrogen gas discharged from the adsorption tower per cycle 1.41Nm 3
- Heating regeneration time 1.5 hours Heating regeneration temperature (column bottom temperature): 160 ° C Purge gas temperature: 40 ° C Hydrogen constant pressure specific heat: 0.304 kcal / (K ⁇ Nm 3 ) Purge gas flow rate: 160 Nm 3 / h Tower pressure: 0.01 MPaG
- Cooling time 1.0 hour Cooling temperature (column top temperature): 40 ° C Cooling gas temperature: 40 ° C Cooling gas flow rate: 160 Nm 3 / h Tower pressure: 0.01 MPaG
- the toluene-containing concentration in the purified hydrogen gas could be reduced to 1 ppm or less.
- the hydrogen recovery rate of hydrogen gas was 99.88 mol%.
- Example 2 In this example, the raw material hydrogen gas was a toluene-containing concentration of 2700 ppm and a methylcyclohexane-containing concentration of 2700 ppm.
- the amount of purified hydrogen gas discharged from the adsorption tower per cycle was 1.57 Nm 3 .
- purification simulation of raw material hydrogen gas was performed in the same manner as in Example 1. As a result, the toluene-containing concentration and the methylcyclohexane-containing concentration in the purified hydrogen gas could be reduced to 1 ppm or less.
- the hydrogen recovery rate of hydrogen gas was 99.87 mol%.
- Example 3 In this example, the source hydrogen gas was a toluene-containing concentration of 0 ppm and a methylcyclohexane-containing concentration of 5400 ppm.
- the amount of purified hydrogen gas discharged from the adsorption tower per cycle was set to 1.74 Nm 3 .
- purification simulation of raw material hydrogen gas was performed in the same manner as in Example 1. As a result, the concentration of methylcyclohexane contained in the purified hydrogen gas could be reduced to 1 ppm or less.
- the hydrogen recovery rate of hydrogen gas was 99.86 mol%.
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Abstract
Description
すなわち、本発明に係る水素ガスの精製方法は、前記の課題を解決する為に、吸着剤が各々充填された一対の吸着塔を用いて、不純物成分を含有する原料水素ガスを精製する水素ガスの精製方法であって、前記吸着塔で、前記不純物成分を前記吸着剤に吸着させることにより、前記原料水素ガスから分離する吸着工程と、前記吸着工程を終えた吸着塔に対し、加熱したパージガスを供給することにより、前記吸着剤から前記不純物成分を脱着させる加熱再生工程とを少なくとも含む吸着サイクルを、各吸着塔においてそれぞれ繰り返し行い、かつ、一方の吸着塔で前記吸着工程が行われている間は、他方の吸着塔で当該吸着工程以外の工程を行うものであり、前記加熱再生工程は、前記パージガスを循環させながら、前記吸着工程を終えた吸着塔に対し供給を行うことを特徴とする。
即ち、本発明によれば、少なくとも吸着工程と加熱再生工程を含む吸着サイクルが、2つの吸着塔においてそれぞれ行われ、かつ、吸着サイクルは、一方の吸着塔で吸着工程が行われている間は、他方の吸着塔で当該吸着工程以外の工程が行われるように繰り返される。そのため、本発明においては、原料水素ガスから不純物成分を吸着させて分離し精製する操作を、連続的に行うことができ、水素ガスの精製の効率化が図れる。
<水素ガスの精製装置>
本実施の形態1に係る水素ガスの精製装置について、図1を参照しながら以下に説明する。但し、説明に不要な部分は省略し、また説明を容易にする為に拡大または縮小等して図示した部分がある。
次に、本実施の形態1に係る水素ガスの精製方法について、図2~図12を参照しながら以下に説明する。
本実施の形態の水素ガスの精製方法はTSA法を採用したものであり、各吸着塔においては、(1)吸着工程、(2)減圧工程、(3)再生準備工程、(4)加熱再生工程、(5)冷却工程、(6)昇圧工程の吸着サイクルを順次繰り返す。また、一方の吸着塔で吸着工程が行われている間、他方の吸着塔では当該吸着工程以外の工程、より具体的には(2)減圧工程~(6)昇圧工程が行われ、この様な切り換えを行いながら2つの吸着塔を稼働させることにより、連続的かつ効率的に原料水素ガスの精製を可能にしている。
図2及び図3に示すように、ステップ1の第1吸着塔10Aにおいては、吸着工程が行われる。すなわち、開閉弁101Aは開弁され、原料供給路21、21Aから第1吸着塔10Aの塔底部に対し原料水素ガスが供給される。原料水素ガスは、第1吸着塔10A内で不純物成分が吸着剤により吸着分離されることにより、精製される。そして、精製水素ガスは、塔頂部から精製水素ガス排出路24A、24を介して排出される。尚、精製水素ガス排出路24Aにおける開閉弁106Aは開弁されている。
図2及び図4に示すように、ステップ2の第1吸着塔10Aにおいては、引き続き吸着工程が行われる。
図2及び図5に示すように、ステップ3の第1吸着塔10Aにおいては、引き続き吸着工程が行われる。
図2及び図6に示すように、ステップ4の第1吸着塔10Aにおいては、引き続き吸着工程が行われる。
図2及び図7に示すように、ステップ5の第1吸着塔10Aにおいては、引き続き吸着工程が行われる。
図2に示すように、ステップ6~10においては、第1吸着塔10Aと第2吸着塔10Bにおいて吸着サイクルが切り替わる。すなわち、ステップ5の終了と共に、第1吸着塔10Aにおける吸着工程が終了し、第2吸着塔10Bにおいて吸着工程が開始される。ステップ6~10における水素ガスの精製装置1の詳細な動作については、図8~図12に示す通りであり、前記ステップ1~5と同様の操作を、第1吸着塔10Aと第2吸着塔10Bにおいて逆にして行うものである。従って、それらの詳細については省略する。
<水素ガスの精製装置>
本実施の形態2に係る水素ガスの精製装置について、図13を参照しながら以下に説明する。尚、前記実施の形態1に係る水素ガスの精製装置1と同様の機能を有する構成要素については、同一の符号を付して詳細な説明を省略する。
次に、本実施の形態2に係る水素ガスの精製方法について、図14~図24を参照しながら以下に説明する。
本実施の形態では、各吸着塔において、(1)吸着工程、(2)減圧工程、(3)再生準備工程、(4)加熱再生工程、(5)昇圧工程、(6)冷却工程の吸着サイクルを順次繰り返すものであり、前記実施の形態1の態様と比較して、冷却工程の前に昇圧工程を行う点が異なる。
図14及び図15に示すように、ステップ1の第1吸着塔10Aにおいては、吸着工程が行われる。すなわち、開閉弁101Aは開弁され、原料供給路21、21Aから第1吸着塔10Aの塔底部に対し原料水素ガスが供給される。原料水素ガスは、第1吸着塔10A内で不純物成分が吸着剤により吸着分離されることにより、精製される。そして、精製水素ガスは、塔頂部から精製水素ガス排出路24A、24を介して排出される。尚、精製水素ガス排出路24Aにおける開閉弁106Aは開弁されている。
図14及び図16に示すように、ステップ2の第1吸着塔10Aにおいては、引き続き吸着工程が行われる。
図14及び図17に示すように、ステップ3の第1吸着塔10Aにおいては、引き続き吸着工程が行われる。
図14及び図18に示すように、ステップ4の第1吸着塔10Aにおいては、引き続き吸着工程が行われる。
図14及び図19に示すように、ステップ5の第1吸着塔10Aにおいては、引き続き吸着工程が行われる。
図14に示すように、ステップ6~10においては、第1吸着塔10Aと第2吸着塔10Bにおいて吸着サイクルが切り替わる。すなわち、ステップ5の終了と共に、第1吸着塔10Aにおける吸着工程が終了し、第2吸着塔10Bにおいて吸着工程が開始される。ステップ6~10における水素ガスの精製装置2の詳細な動作については、図20~図24に示す通りであり、前記ステップ1~5と同様の操作を、第1吸着塔10Aと第2吸着塔10Bにおいて逆にして行うものである。従って、それらの詳細については省略する。
<水素ガスの精製装置>
本実施の形態3に係る水素ガスの精製装置について、図25を参照しながら以下に説明する。尚、前記実施の形態1に係る水素ガスの精製装置1又は実施の形態2に係る水素ガスの精製装置2と同様の機能を有する構成要素については、同一の符号を付して詳細な説明を省略する。
次に、本実施の形態3に係る水素ガスの精製方法について、図26~図32を参照しながら以下に説明する。
本実施の形態では、各吸着塔において、(1)吸着工程、(2)再生準備工程、(3)加熱再生工程、(4)冷却工程の吸着サイクルを順次繰り返すものであり、前記実施の形態1の態様と比較して、減圧工程及び昇圧工程が省略された点が異なる。
図26及び図27に示すように、ステップ1の第1吸着塔10Aにおいては、吸着工程が行われる。すなわち、開閉弁101Aは開弁され、原料供給路21、21Aから第1吸着塔10Aの塔底部に対し原料水素ガスが供給される。原料水素ガスは、第1吸着塔10A内で不純物成分が吸着剤により吸着分離されることにより精製される。そして、精製水素ガスは、塔頂部から精製水素ガス排出路24A、24を介して排出される。尚、精製水素ガス排出路24Aにおける開閉弁106Aは開弁されている。
図26及び図28に示すように、ステップ2の第1吸着塔10Aにおいては、引き続き吸着工程が行われる。
図26及び図29に示すように、ステップ3の第1吸着塔10Aにおいては、引き続き吸着工程が行われる。
図26に示すように、ステップ4~6においては、第1吸着塔10Aと第2吸着塔10Bにおいて吸着サイクルが切り替わる。すなわち、ステップ3の終了と共に、第1吸着塔10Aにおける吸着工程が終了し、第2吸着塔10Bにおいて吸着工程が開始される。ステップ4~6における水素ガスの精製装置3の詳細な動作については、図31~図32に示す通りであり、前記ステップ1~3と同様の操作を、第1吸着塔10Aと第2吸着塔10Bにおいて逆にして行うものである。従って、それらの詳細については省略する。
前記各実施の形態で説明した水素ガスの精製方法においては、さらに、TSA法を行うための工程を追加してもよい。この場合、水素ガスの精製装置1~3においては、排出された精製水素ガスに対して、PSA法による精製を可能にするためのPSA装置を設けることができる。これにより、吸着工程で吸着塔により吸着できなかった他の不純物成分(例えば、メタン、エタンなど)を除去することができる。そして、PSA装置における吸着塔においては、吸着剤により吸着される成分が前記他の不純物成分のみとなることから、PSA装置においてもパージガス量を削減することができ、その結果、精製水素ガスの高回収率を維持できる。
以下に述べる各実施例においては、図1に示す水素ガスの精製装置1(図1参照)を用いて、図2~図13に示す吸着サイクルを繰り返すことにより、原料水素ガスの精製のシミュレーションを行った。また、第1吸着塔10A、第2吸着塔10Bのサイズは以下の通りとした。
塔径:500mm
吸着塔径での吸着剤充填高さ:1.5m
吸着塔高さ(T.L間):2m
また、吸着剤の充填量は120kgとした。
吸着剤として、ヤシ殻系活性炭(クラレケミカル(株)製ヤシ殻系活性炭、型番:2GG)を用いた。
先ず、トルエン(純度99.5重量%以上、和光純薬工業株式会社製)、及びメチルシクロへキサン(以下、「MCH」という。純度98重量%以上、和光純薬工業株式会社製)の吸着量(静的吸着容量)について、自動ガス/蒸気吸着量測定装置(型番:BELSORP-18、日本ベル株式会社製)を用いて測定した。トルエンの試料の質量は0.1128g、MCHの試料の質量は0.1064gとした。また、吸着温度は303Kとした。結果を図33に示す。
トルエン:114NL/kg(47質量%)(トルエン濃度5400ppm)
MCH:87NL/kg(38質量%)(MCH濃度5400ppm)
水素:0.001質量%以下
図1に示す水素ガスの精製装置1を用いて、図2~図13に示す吸着サイクルを繰り返すことにより、原料水素ガスの精製のシミュレーションを行った。
吸着時間:4時間
原料水素ガス流量:305Nm3/h
1サイクル当りに吸着塔に供給される原料水素ガスの供給量=305Nm3/hr×4hr=1220Nm3
1サイクル当りに吸着塔から排出される精製水素ガス量=1.41Nm3
供給圧力:0.9MPaG
原料水素ガスの温度:40℃
塔内圧力:0.9MPaG
<減圧工程>
減圧時間:0.5時間
再生準備時間:0.5時間
塔内圧力:0.01MPaG
加熱再生時間:1.5時間
加熱再生温度(塔底部温度):160℃
パージガス温度:40℃
水素定圧比熱:0.304kcal/(K・Nm3)
パージガス流量:160Nm3/h
塔内圧力:0.01MPaG
冷却時間:1.0時間
冷却温度(塔頂部温度):40℃
冷却ガス温度:40℃
冷却ガス流量:160Nm3/h
塔内圧力:0.01MPaG
昇圧時間:0.5時間
水素ガス回収率(mol%)=(1サイクル当りに吸着塔に導入される原料水素ガス量-1サイクル当りに吸着塔から排出される精製水素ガス量)/(1サイクル当りに吸着塔に供給される原料水素ガス量)×100
本実施例では、原料水素ガスを、トルエン含有濃度2700ppm、メチルシクロヘキサン含有濃度2700ppmのものとした。また、1サイクル当りに吸着塔から排出される精製水素ガス量を1.57Nm3とした。それ以外は、前記実施例1と同様にして原料水素ガスの精製シミュレーションを行った。
その結果、精製水素ガス中におけるトルエン含有濃度及びメチルシクロヘキサン含有濃度を1ppm以下に低減することができた。また、水素ガスの水素回収率は99.87mol%であった。
本実施例では、原料水素ガスを、トルエン含有濃度0ppm、メチルシクロヘキサン含有濃度5400ppmのものとした。また、1サイクル当りに吸着塔から排出される精製水素ガス量を1.74Nm3とした。それ以外は、前記実施例1と同様にして原料水素ガスの精製シミュレーションを行った。
その結果、精製水素ガス中におけるメチルシクロヘキサン含有濃度を1ppm以下に低減することができた。また、水素ガスの水素回収率は99.86mol%であった。
各実施例1~3のシミュレーション結果から、本実施例の水素ガスの精製装置であると、不純物成分であるトルエン及びメチルシクロヘキサンを1ppm以下に低減することが可能であることが示された。これにより、例えば、燃料電池車への活用を可能にする水素ガスの利用基準も満たすことが分かった。また、水素ガスの回収率も99.86~99.88mol%であり、従来のTSA法と比較して精製後の水素ガスの損失を低減できることが確認された。
10A 第1吸着塔
10B 第2吸着塔
11 第1冷却器
12 気液分離器
13 ガス圧縮機
14 ガスヒーター(加熱器)
15 第2冷却器
21、21A、21B 原料供給路
22、22A、22B パージガス循環路
23、23A、23B 冷却ガス循環路
24、24A、24B 精製水素ガス排出路
25A、25B パージガス循環路
26、26A、26B 冷却ガス循環路
27A、27B 昇圧路
28 精製水素ガス導入路
29 有機溶剤排出路
30A、30B 他の精製水素ガス導入路
31 冷却ガス導入路
32 パージガス・冷却ガス導入路
33 精製水素ガス導入路
101A~106A、101B~106B、107~113 開閉弁
Claims (13)
- 吸着剤が各々充填された一対の吸着塔を用いて、不純物成分を含有する原料水素ガスを精製する水素ガスの精製方法であって、
前記吸着塔で、前記不純物成分を前記吸着剤に吸着させることにより、前記原料水素ガスから分離する吸着工程と、
前記吸着工程を終えた吸着塔に対し、加熱したパージガスを供給することにより、前記吸着剤から前記不純物成分を脱着させる加熱再生工程とを少なくとも含む吸着サイクルを、各吸着塔においてそれぞれ繰り返し行い、
かつ、一方の吸着塔で前記吸着工程が行われている間は、他方の吸着塔で当該吸着工程以外の工程を行うものであり、
前記加熱再生工程は、前記パージガスを循環させながら、前記吸着工程を終えた吸着塔に対し供給を行う水素ガスの精製方法。 - 前記吸着サイクルは、
前記吸着工程直後の吸着塔に対し、その内部に残留している前記残留ガスを排出させて減圧させる減圧工程と、
前記残留ガスに、前記吸着工程中の吸着塔から排出される精製後の水素ガスの一部を混合させて前記パージガスとし、当該パージガスを循環させながら、前記吸着工程を終えた前記吸着塔に供給する再生準備工程とを、
前記加熱再生工程の前に含む請求項1に記載の水素ガスの精製方法。 - 前記吸着サイクルは、
前記加熱再生工程後の吸着塔に対し、前記パージガスを少なくとも加熱しないで、冷却ガスとして循環させ供給することにより、前記吸着剤を吸着可能となる温度まで冷却させる冷却工程と、
前記冷却工程後の吸着塔に、前記吸着工程中の吸着塔から排出される精製後の水素ガスの一部を供給することにより昇圧させる昇圧工程とをさらに含む請求項1又は2に記載の水素ガスの精製方法。 - 前記吸着サイクルは、
前記加熱再生工程後の吸着塔に、前記吸着工程中の吸着塔から排出される精製後の水素ガスの一部を供給することにより昇圧させる昇圧工程と、
前記昇圧工程後の吸着塔に対し、前記吸着工程中の吸着塔から排出される精製後の水素ガスの一部を、少なくとも加熱しない状態で供給することにより、前記吸着剤を吸着可能となる温度まで冷却した後、当該精製後の水素ガスの一部を前記原料水素ガスと合流させて、前記吸着工程中の吸着塔に供給する冷却工程をさらに含む請求項1又は2に記載の水素ガスの精製方法。 - 前記吸着サイクルは、
前記吸着工程直後の吸着塔に対し、加熱されていない前記パージガスを供給する再生準備工程と、
前記加熱再生工程直後の吸着塔に対し冷却ガスを供給することにより、充填されている前記吸着剤を冷却する冷却工程とをさらに含み、
前記吸着工程以外の工程を行う吸着塔の塔内の圧力は、当該吸着工程を行うときと略同一であり、
前記再生準備工程及び加熱再生工程は、
前記吸着工程中の吸着塔から排出される精製後の水素ガスの一部を、前記パージガスとして他方の吸着塔に供給した後、当該精製後の水素ガスを前記原料水素ガスと合流させ、当該吸着工程中の吸着塔に供給するものであり、
前記冷却工程は、
前記吸着工程中の吸着塔から排出される精製後の水素ガスの一部を、前記冷却ガスとして他方の吸着塔に供給した後、当該精製後の水素ガスを前記原料水素ガスと合流させ、当該吸着工程中の吸着塔に供給するものである請求項1に記載の水素ガスの精製方法。 - 前記加熱再生工程では、前記パージガスを冷却して、当該パージガス中に含まれる不純物成分を液体に凝縮させ、当該パージガス中に含まれる水素ガスと不純物成分の液体とに気液分離して、当該不純物成分の液体を回収する工程をさらに行う請求項1~5の何れか1項に記載の水素ガスの精製方法。
- 吸着剤が各々充填された一対の吸着塔を備え、不純物成分を含有する原料水素ガスを精製する水素ガスの精製装置であって、
前記吸着塔で、前記不純物成分を前記吸着剤に吸着させることにより、前記原料水素ガスから分離する吸着工程と、
前記吸着工程を終えた吸着塔に対し、加熱したパージガスを供給することにより、前記吸着剤から前記不純物成分を脱着させる加熱再生工程とを少なくとも含む吸着サイクルを、各吸着塔においてそれぞれ繰り返し行うものであり、
前記一対の吸着塔のうち、前記吸着工程を行う一方の吸着塔には前記原料水素ガスを供給し、当該吸着工程以外の工程を行う他方の吸着塔には当該原料水素ガスを供給しない原料供給路と、
加熱された前記パージガスを循環させながら、前記加熱再生工程中の吸着塔に供給するパージガス循環路と、
前記パージガス循環路に接続され、前記パージガスを加熱する加熱器とを備える水素ガスの精製装置。 - 前記吸着サイクルは、
前記吸着工程直後の吸着塔に対し、その内部に残留している前記残留ガスを排出させて減圧させる減圧工程と、
前記残留ガスに、前記吸着工程中の吸着塔から排出される精製後の水素ガスの一部を混合させて前記パージガスとし、当該パージガスを循環させながら、前記吸着工程を終えた前記吸着塔に供給する再生準備工程とを、前記加熱再生工程の前に含み、
前記残留ガスが流れる前記パージガス循環路には、前記精製後の水素ガスの一部を供給する精製水素ガス導入路が連通されている請求項7に記載の水素ガスの精製装置。 - 前記吸着サイクルは、
前記加熱再生工程後の吸着塔に対し、前記パージガスを少なくとも加熱しないで、冷却ガスとして循環させ供給することにより、前記吸着剤を吸着可能となる温度まで冷却させる冷却工程と、
前記冷却工程後の吸着塔に、前記吸着工程中の吸着塔から排出される精製後の水素ガスの一部を供給することにより昇圧させる昇圧工程とをさらに含み、
前記一対の吸着塔には、
前記パージガス循環路から分岐しており、前記冷却工程中の吸着塔に対し前記冷却ガスを循環して供給させるための冷却ガス循環路と、
前記吸着工程中の吸着塔から前記昇圧工程中の吸着塔に対し、精製後の水素ガスの一部を供給するための昇圧路とが設けられ、
さらに、前記パージガス循環路には、前記冷却工程において前記冷却ガスを前記冷却ガス循環路に送り出すためのガス圧縮機が設けられている請求項8に記載の水素ガスの精製装置。 - 前記吸着サイクルは、
前記吸着工程直後の吸着塔に対し、その内部に残留している前記残留ガスを排出させて減圧させる減圧工程と、
前記残留ガスに、前記吸着工程中の吸着塔から排出される精製後の水素ガスの一部を混合させて前記パージガスとし、当該パージガスを循環させながら、前記吸着工程を終えた前記吸着塔に供給する再生準備工程とを、前記加熱再生工程の前に含み、
前記一対の吸着塔の間には、前記吸着工程中の吸着塔から前記再生準備工程を行う吸着塔に対し、精製後の水素ガスの一部を供給するための他の精製水素ガス導入路が設けられている請求項7に記載の水素ガスの精製装置。 - 前記吸着サイクルは、
前記加熱再生工程後の吸着塔に、前記吸着工程中の吸着塔から排出される精製後の水素ガスの一部を供給することにより昇圧させる昇圧工程と、
前記昇圧工程後の吸着塔に対し、前記吸着工程中の吸着塔から排出される精製後の水素ガスの一部を、少なくとも加熱しない状態で供給することにより、前記吸着剤を吸着可能となる温度まで冷却した後、当該精製後の水素ガスの一部を前記原料水素ガスと合流させて、前記吸着工程中の吸着塔に供給する冷却工程をさらに含み、
前記原料供給路には、前記パージガス循環路から分岐した冷却ガス導入路が接続されており、当該冷却ガス導入路は前記冷却工程で冷却ガスとして使用した精製後の水素ガスを当該原料供給路に供給するものであり、
前記パージガス循環路には、前記冷却工程で使用した冷却ガスを前記冷却ガス導入路に送り出すガス圧縮機が設けられ、
前記他の精製水素ガス導入路は、前記昇圧工程又は冷却工程においても、前記吸着工程中の吸着塔から排出される精製後の水素ガスの一部を、当該昇圧工程中又は冷却工程中の吸着塔に供給する請求項10に記載の水素ガスの精製装置。 - 前記吸着サイクルは、
前記吸着工程直後の吸着塔に対し、加熱されていない前記パージガスを供給する再生準備工程と、
前記加熱再生工程直後の吸着塔に対し冷却ガスを供給することにより、充填されている前記吸着剤を冷却する冷却工程とをさらに含み、
前記吸着工程以外の工程を行う吸着塔の塔内の圧力は、当該吸着工程を行うときと略同一であり、
前記パージガス循環路には、前記吸着工程中の吸着塔から排出される精製後の水素ガスの一部を、前記パージガス又は冷却ガスとして、当該吸着工程以外の工程を行う吸着塔に供給するための、さらに他の精製水素ガス導入路が接続されており、
前記原料供給路には、前記パージガス循環路から分岐したパージガス・冷却ガス導入路が接続されており、当該パージガス・冷却ガス導入路は、前記パージガス又は冷却ガスとして使用された精製後の水素ガスを当該原料供給路に供給するものである請求項7に記載の水素ガスの精製装置。 - 前記パージガス循環路には、
前記加熱再生工程において、前記パージガスを冷却させて、当該パージガス中に含まれる不純物成分を液体に凝縮させる冷却器と、
前記不純物成分の液体と前記パージガスに含まれる水素ガスに気液分離させ、当該不純物成分の液体を回収する気液分離器とが設けられている請求7~12の何れか1項に記載の水素ガスの精製装置。
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CN114522508A (zh) * | 2022-04-24 | 2022-05-24 | 北京中科富海低温科技有限公司 | 一种氢气吸附器再生系统及其方法 |
CN115744825A (zh) * | 2022-10-20 | 2023-03-07 | 上海电气电站设备有限公司 | 一种用于氢气冷却发电机的氢气提纯方法 |
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KR102395967B1 (ko) | 2022-05-09 |
EP3181517A4 (en) | 2017-08-09 |
EP3181517A1 (en) | 2017-06-21 |
KR20170042655A (ko) | 2017-04-19 |
JP2016040210A (ja) | 2016-03-24 |
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