WO2015176336A1 - 可调整紫外光照射能量的紫外光清洗基板的方法 - Google Patents

可调整紫外光照射能量的紫外光清洗基板的方法 Download PDF

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Publication number
WO2015176336A1
WO2015176336A1 PCT/CN2014/079708 CN2014079708W WO2015176336A1 WO 2015176336 A1 WO2015176336 A1 WO 2015176336A1 CN 2014079708 W CN2014079708 W CN 2014079708W WO 2015176336 A1 WO2015176336 A1 WO 2015176336A1
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Prior art keywords
substrate
ultraviolet light
visor
ultraviolet
light
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PCT/CN2014/079708
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English (en)
French (fr)
Inventor
姚江波
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US14/381,200 priority Critical patent/US9700921B2/en
Publication of WO2015176336A1 publication Critical patent/WO2015176336A1/zh
Anticipated expiration legal-status Critical
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates

Definitions

  • the present invention relates to the field of liquid crystal display processing, and more particularly to a method for cleaning a substrate by ultraviolet light which can adjust the energy of ultraviolet light irradiation. Background technique
  • Liquid Crystal Display has many advantages such as thin body, power saving, no radiation, etc., such as mobile phones, personal digital assistants (PDA digital cameras, computer screens or laptop screens, etc.).
  • LCD Liquid Crystal Display
  • the existing thin film transistor liquid crystal display comprises a casing, a liquid crystal panel disposed in the casing, and a backlight module disposed in the casing (the backlight module), wherein the structure of the liquid crystal panel is composed of a thin film transistor array J (Thin Film Transistor) Array Substrate, TFT Array Substrate - a color filter substrate (Color Filter, CF and a liquid crystal layer disposed between the two substrates, which works by applying a driving voltage on two glass substrates) Controlling the rotation of the liquid crystal molecules of the liquid crystal layer, refracting the light of the backlight module to produce a picture.
  • a thin film transistor array J Thin Film Transistor
  • TFT Array Substrate a color filter substrate
  • CF Color Filter
  • the process of thin film transistor liquid crystal display generally includes: an Array process.
  • the main process is to manufacture a TFT substrate and a CF substrate; in the middle stage, a cell process is mainly to bond a TFT substrate and a CF substrate, and a liquid crystal panel is added between the two to form a liquid crystal panel; and a rear module assembly process is mainly
  • the LCD panel is assembled with other components such as backlight modules and PCBs.
  • the substrate needs to be cleaned several times to remove the organic substances adhered on the surface of the substrate to ensure the cleanness of the substrate.
  • a widely used method for cleaning a substrate is to clean the substrate by ultraviolet light using photosensitive oxidation of organic matter.
  • Ultraviolet lamps emit light waves with wavelengths of 185 nm and 254 nm, which have high energy. When these light waves are applied to the surface of the substrate, most of the organic substances have a strong absorption capacity for ultraviolet light of 185 nm wavelength, and absorb ultraviolet light at a wavelength of 185 nm. The energy of light is then broken down into ions, free atoms, excited molecules, and neutrons. Oxygen molecules in the air also produce ozone and atomic oxygen after absorbing ultraviolet light with a wavelength of 185 nm. Ozone also has a strong absorption effect on ultraviolet light of 254 nm wavelength, and ozone is decomposed into atomic oxygen and oxygen.
  • the decomposition of organic matter on the surface of the substrate can be converted into a volatile gas, such as carbon dioxide, water vapor, etc., to remove the organic matter, thereby ensuring the cleanliness of the substrate.
  • a volatile gas such as carbon dioxide, water vapor, etc.
  • an ultraviolet light is disposed above the substrate, and the substrate is transported by a roller, and the ultraviolet light is directly irradiated on the substrate.
  • the object of the present invention is to provide a method for cleaning a substrate by adjusting ultraviolet light irradiation energy, and the method can flexibly adjust the ultraviolet light energy for substrate cleaning, thereby effectively removing organic substances adhering to the surface of the substrate, and It can prevent the circuit pattern on the substrate from being damaged by static electricity, thereby improving product quality and yield.
  • the present invention provides a method of cleaning a substrate by ultraviolet light which can adjust the energy of ultraviolet light irradiation, comprising the following steps:
  • Step 1 Providing a UV lamp and a substrate to be cleaned by ultraviolet light;
  • Step 2 setting a plurality of light shielding plates between the ultraviolet light and the substrate to be cleaned by ultraviolet light; Step 3, rotating the light shielding plate, adjusting the area of the ultraviolet light emitted by the ultraviolet light to the substrate, thereby controlling the ultraviolet per unit time The energy of light impinging on the substrate;
  • Step 4 The ultraviolet lamp emits ultraviolet light to clean the substrate.
  • Each of the visors in the step 2 is black.
  • Each of the visors in the step 2 is an elongated sheet.
  • the visor in the step 2 is located between the ultraviolet lamp and the substrate.
  • the visor in the step 2 is perpendicular to the ultraviolet lamp.
  • the substrate moves relative to the ultraviolet lamp, and the length direction of the visor is parallel to the direction in which the substrate moves.
  • the rotating visor in the step 3 is realized by a motor driving a gear mounted on the visor.
  • the gear is fixedly coupled to the visor through a connecting shaft, and the gear is mounted on the bearing, and a support shaft is mounted on the bearing so that the visor is rotatable relative to the support shaft.
  • the visor can be rotated in the range of 0 to 90 degrees.
  • the substrate is a glass substrate of a thin film transistor liquid crystal display.
  • the invention also provides a method for cleaning a substrate by ultraviolet light which can adjust the energy of ultraviolet light irradiation, comprising the following steps:
  • Step 1 Providing a UV lamp and a substrate to be cleaned by ultraviolet light;
  • Step 2 setting a plurality of light shielding plates between the ultraviolet light and the substrate to be cleaned by ultraviolet light; Step 3, rotating the light shielding plate, adjusting the area of the ultraviolet light emitted by the ultraviolet light to the substrate, thereby controlling the ultraviolet per unit time The energy of light impinging on the substrate; Step 4: The ultraviolet light emits ultraviolet light to clean the substrate;
  • each of the visors in the step 2 is black;
  • each of the visors in the step 2 is an elongated strip
  • the visor in the step 2 is located between the ultraviolet lamp and the substrate; wherein the visor in the step 2 is perpendicular to the ultraviolet lamp;
  • the rotating visor is realized by driving a gear mounted on the visor by a motor
  • the substrate moves relative to the ultraviolet light, and the length direction of the light shielding plate is parallel to the direction in which the substrate moves;
  • the gear is fixedly connected to the visor through a connecting shaft, and the gear is mounted on the bearing, and a bearing shaft is mounted on the bearing, so that the visor can be rotated relative to the support shaft (80); wherein the visor can Rotate in the range of 0 to 90 degrees;
  • the substrate is a glass substrate of a thin film transistor liquid crystal display.
  • the invention has the beneficial effects of the invention: the method for cleaning the substrate by adjusting the ultraviolet light irradiation energy of the invention, setting a plurality of light shielding plates between the ultraviolet light lamp and the substrate, adjusting the ultraviolet light lamp by rotating the light shielding plate to different angles
  • the emitted ultraviolet light illuminates the area on the substrate, thereby controlling the energy of the substrate for cleaning the substrate by ultraviolet light per unit time, which can effectively remove the adhesion.
  • the organic substance on the surface of the substrate cleans the substrate to cleanness, and avoids a large amount of static electricity generated by the metal layer of the excitation substrate, thereby preventing the circuit pattern on the substrate from being damaged by static electricity, and the method is flexible and simple to operate, and can improve product quality and Yield.
  • FIG. 1 is a flow chart of a method for cleaning a substrate by ultraviolet light that can adjust ultraviolet light irradiation energy according to the present invention
  • FIG. 2 is a schematic view showing a step 1 of a method for cleaning a substrate by ultraviolet light which can adjust ultraviolet light irradiation energy;
  • FIG. 3 is a schematic view showing a step 2 of a method for cleaning a substrate by ultraviolet light which can adjust ultraviolet light irradiation energy;
  • Figure 4 is a schematic view of the A direction corresponding to the visor of Figure 3; Schematic diagram
  • Figure 6 is a B-direction view corresponding to the visor, the motor, the connecting shaft, the support shaft and the gear in Figure 5;
  • Figure 7 is a C-direction view corresponding to the gear of Figure 6;
  • FIG. 8 is a schematic view showing the step 3 of the method for cleaning the substrate by ultraviolet light irradiation of the ultraviolet light irradiation energy in the step 3;
  • Fig. 9 is a schematic view showing the step 3 of the method for cleaning the substrate by ultraviolet light which can adjust the ultraviolet light irradiation energy in the step 3 of the method. detailed description
  • the present invention provides a method for cleaning a substrate by ultraviolet light which can adjust the energy of ultraviolet light irradiation, comprising the following steps:
  • Step 1 providing a UV lamp 10 and a substrate 20 to be cleaned by ultraviolet light;
  • Step 2 a plurality of visors 30 are disposed between the ultraviolet lamp (10) and the substrate (20) to be cleaned by ultraviolet light;
  • Step 3 rotating the visor 30, adjusting the ultraviolet light emitted by the ultraviolet lamp 10 to illuminate the substrate 20 The area above, thereby controlling the energy of ultraviolet light on the substrate 20 per unit time;
  • Step 4 The ultraviolet lamp 10 emits ultraviolet light to clean the substrate 20 0
  • the ultraviolet lamp 10 provided in the step 1 is a low-pressure mercury lamp or an excimer lamp, and is used as a light source for emitting ultraviolet light;
  • the substrate 20 to be cleaned is a glass substrate of a thin film transistor liquid crystal display. .
  • the step 2 is to provide a plurality of visors 30 between the ultraviolet lamp 10 and the substrate 20 to be cleaned by ultraviolet light.
  • the plurality of visors 30 are disposed on the ultraviolet ray.
  • the light lamp 10 is intermediate with the substrate 20 to be cleaned; each of the light shielding plates 30 is a black rectangular elongated sheet, and the plurality of light shielding plates 30 are arranged in parallel, and the number thereof can be determined according to the specific size of the substrate 20 to be cleaned by ultraviolet light.
  • the plurality of visors 30 are perpendicular to the ultraviolet light 10, and the plurality of visors 30 are laid flat.
  • each adjacent two visors 30 are spaced apart, and the spacing is D1.
  • the step 3 is to rotate the visor 30 to adjust the area of the ultraviolet light emitted from the ultraviolet lamp 10 to the substrate 20, thereby controlling the ultraviolet light to be irradiated onto the substrate 20 per unit time. energy of.
  • the rotating shutter 30 is realized by the motor 40 driving a gear 50 mounted on the shutter. Further, the gear 50 is fixedly connected to the visor 30 via a connecting shaft 60, and the gear 60 is mounted on the bearing 70. A bearing shaft 80 is mounted on the bearing 70.
  • the visor 30 is rotatable relative to the support shaft 80, which is coupled to the motor 40.
  • a driven gear 55 may be provided, and the driven gear 55 meshes with the gear 50 and is connected to the light shielding plate 30 through another connecting shaft 65, so that the gear 50 can drive the driven gear 55. And the visor 30 rotates.
  • the specific implementation of the step is: before the motor 40 is turned on, the rotation angle of the plurality of light shielding plates 30 is 0 degrees, which is perpendicular to the ultraviolet light 10, and the spacing between each adjacent two light shielding plates 30 is
  • the minimum value D1 is that the area of the ultraviolet light emitted by the ultraviolet lamp 10 blocked by the light shielding plate 30 is the largest, and the area irradiated onto the substrate 20 through the distance D1 is the smallest, and the ultraviolet light is irradiated to the substrate 20 in a corresponding unit time.
  • the motor has a minimum energy; the motor 40 is driven to drive the support shaft 80 and the bearing 70 to rotate, and the connecting shaft 60 and the driven gear 55 and the other connecting shaft 65 are rotated to respectively connect with the connecting shaft 60,
  • the corresponding visor 30 fixedly coupled to the other connecting shaft 65 is rotated in the range of 0 to 90 degrees.
  • the visor 30 is rotated by 45 degrees, the spacing between each adjacent two visors 30 is increased to D2, and the ultraviolet light emitted by the ultraviolet lamp 10 is blocked by the visor 30.
  • the area is reduced, the area irradiated onto the substrate 20 through the interval D2 is increased, and the energy of the ultraviolet light irradiated onto the substrate 20 per unit time is increased; as shown in FIG.
  • the light shielding plate 30 when the light shielding plate 30 is rotated 90 The distance between each adjacent two visors 30 is increased to a maximum value D3, and the area of the ultraviolet light emitted by the ultraviolet lamp 10 blocked by the visor 30 is minimized, and the transmission distance D3 is irradiated. The area on the substrate 20 is increased to At maximum, the energy of the ultraviolet light irradiated onto the substrate 20 per unit time is maximized.
  • the light-shielding plate 30 can be flexibly controlled from 0 to 90 degrees by controlling the motor 40 according to the actual situation of adhering organic matter on the surface of the substrate 20.
  • the ultraviolet light energy used for cleaning the substrate 20 is moderate, and the organic substance adhered to the surface of the substrate 20 can be effectively removed, and the substrate 20 is cleaned to Clean, and can avoid exciting a large amount of static electricity generated by the metal layer of the substrate, thereby preventing the circuit pattern on the substrate from being damaged by static electricity.
  • step 4 is that after the angle of the visor 30 is adjusted, the substrate 20 is moved relative to the ultraviolet lamp 10 by a roller (not shown), and the ultraviolet lamp 10 emits ultraviolet light for cleaning. Substrate 20. It is worth mentioning that the longitudinal direction of the visor 30 is parallel to the direction in which the substrate 20 moves.
  • the method for cleaning the substrate by adjusting the ultraviolet light irradiation energy of the present invention comprises setting a plurality of light shielding plates between the ultraviolet light lamp and the substrate, and adjusting the ultraviolet light lamp by rotating the light shielding plate to different angles.
  • the ultraviolet light is irradiated onto the area of the substrate, thereby controlling the energy of the substrate for cleaning the substrate by ultraviolet light per unit time, which can effectively remove the organic substances adhering to the surface of the substrate, clean the substrate to cleanliness, and avoid excitation.
  • the metal layer of the substrate generates a large amount of electrons Static electricity, so as to avoid the circuit pattern on the substrate being damaged by static electricity, and the method is flexible and simple to operate, and can improve product quality and yield.

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning In General (AREA)
  • Liquid Crystal (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

一种可调整紫外光照射能量的紫外光清洗基板的方法，包括如下步骤：步骤１、提供紫外光灯（１０）与待紫外光清洗的基板（２０）；步骤２、在紫外光灯（１０）与待紫外光清洗的基板（２０）之间设置数块遮光板（３０）；步骤３、转动遮光板（３０），调整紫外光灯（１０）发出的紫外光照射到基板（２０）上的面积，从而控制单位时间内紫外光照射到基板（２０）上的能量；步骤４、紫外光灯（１０）发出紫外光清洗基板（２０）。通过该方法可以灵活调节用于基板清洗的紫外光能量，达到既能有效去除黏附于基板表面的有机物，又能避免设于基板上的电路图形被静电击伤的目的。

Description

可调整紫外光照射能量的紫外光清洗基板的方法 技术领域
本发明涉及液晶显示器的制程领域，尤其涉及一种可调整紫外光照射 能量的紫外光清洗基板的方法。 背景技术
液晶显示器（ Liquid Crystal Display , LCD )具有机身薄、 省电、 无辐 射等众多优点，得到了广泛的应用，如：移动电话、个人数字助理（ PDA 数字相机、 计算机屏幕或笔记本电脑屏幕等。
现有的薄膜晶体管液晶显示器包括壳体、 设于壳体内的液晶面板及设 于壳体内的背光模组 ( Backlight module \ 其中，液晶面板的结构是由一薄 膜晶体管阵歹J基板 ( Thin Film Transistor Array Substrate , TFT Array Substrate —彩色滤光片基板 ( Color Filter , CF 以及一配置于两基板间 的液晶层（ Liquid Crystal Layer )所构成，其工作原理是通过在两片玻璃基 板上施加驱动电压来控制液晶层的液晶分子的旋转，将背光模组的光线折 射出来产生画面。
薄膜晶体管液晶显示器的制程过程一般包括：前段阵列 ( Array )制程， 主要是制造 TFT基板及 CF基板；中段成盒 ( Cell )制程，主要是将 TFT 基板与 CF基板贴合，在二者之间添加液晶，形成液晶面板；及后段模组组 装制程，主要是将液晶面板与背光模组、 PCB等其它零部件进行组装。 其 中，在前段阵列制程与中段成盒制程过程中，需要对基板进行多次清洗， 以去除基板表面黏附的有机物，保证基板的洁净。 目前，得到广泛应用的 清洗基板的方法是利用有机物的光敏氧化作用通过紫外光对基板进行清 洗。 紫外光灯发射波长为 185nm和 254nm的光波，具有很高的能量，这些 光波作用到基板表面时，由于大多数有机物对 185nm波长的紫外光具有较 强的吸收能力，并在吸收 185nm波长的紫外光的能量后分解成离子、 游离 态原子、 受激分子和中子。 空气中的氧气分子在吸收了 185nm波长的紫外 光后也会产生臭氧和原子氧，臭氧对 254nm波长的紫外光同样具有强烈的 吸收作用，臭氧又分解为原子氧和氧气。 在原子氧的作用下，基板表面上 的有机物的分解物可化合成可挥发的气体，如二氧化碳、 水蒸气等脱离基 板表面，实现清除有机物，保证基板的洁净。 具体实施方式为， 在基板上 方设置紫外光灯，基板通过滚轮方式输送，紫外光直接照射于基板上，去
P余有机物。 但在此清洗过程中，不能对紫外光的能量进行灵活调节，尤其 是采用紫外光清洗 TFT基板时，容易造成高能量的紫外光激发基板的金属 层电子产生大量静电，最终导致设于基板上的电路图形被静电击伤，影响 产品品质及良率。
因此，需要一种改进的基板清洗方法，既能有效去除黏附于基板表面 的有机物，又能避免电路图形被静电击伤。 发明内容
本发明的目的在于提供一种可调整紫外光照射能量的紫外光清洗基板 的方法，通过该方法可以灵活调节用于基板清洗的紫外光能量，达到既能 有效去除黏附于基板表面的有机物，又能避免设于基板上的电路图形被静 电击伤，从而提高产品品质及良率。
为实现上述目的，本发明提供一种可调整紫外光照射能量的紫外光清 洗基板的方法，包括如下步骤：
步骤 1、 提供紫外光灯与待紫外光清洗的基板；
步骤 2、 在紫外光灯与待紫外光清洗的基板之间设置数块遮光板； 步骤 3、转动遮光板 ,调整紫外光灯发出的紫外光照射到基板上的面积， 从而控制单位时间内紫外光照射到基板上的能量；
步骤 4、 紫外光灯发出紫外光清洗基板。
所述步骤 2中的每一遮光板为黑色。 所述步骤 2中的每一遮光板为长条状薄片。
所述步骤 2中的遮光板位于所述紫外光灯与基板中间。
所述步骤 2中的遮光板与所述紫外光灯垂直。
所述步骤 4中基板相对紫外光灯移动，遮光板的长度方向与基板移动 的方向平行。
所述步骤 3 中转动遮光板是通过马达驱动安装于遮光板上的齿轮来实 现的。
所述齿轮通过一连接轴固定连接于遮光板，且齿轮安装于轴承上，该 轴承上安装一支撑轴，从而遮光板可相对于支撑轴转动。
所述遮光板能在 0度到 90度范围内转动。
所述基板为薄膜晶体管液晶显示器的玻璃基板。
本发明还提供一种可调整紫外光照射能量的紫外光清洗基板的方法， 包括如下步骤：
步骤 1、 提供紫外光灯与待紫外光清洗的基板；
步骤 2、 在紫外光灯与待紫外光清洗的基板之间设置数块遮光板； 步骤 3、转动遮光板 ,调整紫外光灯发出的紫外光照射到基板上的面积， 从而控制单位时间内紫外光照射到基板上的能量； 步骤 4、 紫外光灯发出紫外光清洗基板；
其中，所述步骤 2中的每一遮光板为黑色；
其中，所述步骤 2中的每一遮光板为长条状薄片；
其中，所述步骤 2中的遮光板位于所述紫外光灯与基板中间； 其中，所述步骤 2中的遮光板与所述紫外光灯垂直；
其中，所述步骤 3 中转动遮光板是通过马达驱动安装于遮光板上的齿 轮来实现的；
其中，所述步骤 4中基板相对紫外光灯移动，遮光板的长度方向与基 板移动的方向平行；
其中，所述齿轮通过一连接轴固定连接于遮光板，且齿轮安装于轴承 上，该轴承上安装一支撑轴，从而遮光板可相对于支撑轴（ 80 )转动； 其中，所述遮光板能在 0度到 90度范围内转动；
其中，所述基板为薄膜晶体管液晶显示器的玻璃基板。
本发明的有益效果：本发明的可调整紫外光照射能量的紫外光清洗基 板的方法，在紫外光灯与基板之间设置数块遮光板，通过转动遮光板至不 同的角度，调整紫外光灯发出的紫外光照射到基板上的面积，从而控制单 位时间内紫外光照射到基板上的用于清洗基板的能量，既能有效去除黏附 于基板表面的有机物，将基板清洗至洁净，又能避免激发基板的金属层电 子产生大量静电，从而避免基板上的电路图形被静电击伤，且该方法操作 灵活、 简便，能够提高产品品质及良率。
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本 发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发 明加以限制。 附图说明
下面结合附图通过对本发明的具体实施方式详细描述，将使本发明的 技术方案及其它有益效果显而易见。
图 1 为本发明可调整紫外光照射能量的紫外光清洗基板的方法的流程 图；
图 2为本发明可调整紫外光照射能量的紫外光清洗基板的方法的步骤 1 的示意图；
图 3为本发明可调整紫外光照射能量的紫外光清洗基板的方法的步骤 2 的示意图；
图 4为对应图 3中遮光板的 A向示意图； 的示意图；
图 6为对应图 5中的遮光板、 马达、 连接轴、 支撑轴及齿轮的 B向视 图；
图 7为对应图 6中的齿轮的 C向视图；
图 8为本发明可调整紫外光照射能量的紫外光清洗基板的方法的步骤 3 中遮光板转动 45度时的示意图；
图 9为本发明可调整紫外光照射能量的紫外光清洗基板的方法的步骤 3 中遮光板转动 90度时的示意图。 具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明 的优选实施例及其附图进行详细描述。
请参阅图 1至图 9 ,本发明提供一种可调整紫外光照射能量的紫外光清 洗基板的方法，包括如下步骤：
步骤 1、 提供紫外光灯 10与待紫外光清洗的基板 20；
步骤 2、 在紫外光灯 ( 10 )与待紫外光清洗的基板 ( 20 )之间设置数块 遮光板 30；
步骤 3、转动遮光板 30 ,调整紫外光灯 10发出的紫外光照射到基板 20 上的面积，从而控制单位时间内紫外光照射到基板 20上的能量；
步骤 4、 紫外光灯 10发出紫外光清洗基板 200
具体的，请参阅图 2 ,所述步骤 1中提供的紫外光灯 10为低压水银灯 或准分子灯，用作发射紫外光的光源；所述待清洗的基板 20为薄膜晶体管 液晶显示器的玻璃基板。
请参阅图 3、 图 4 ,所述步骤 2为在紫外光灯 10与待紫外光清洗的基 板 20之间设置数块遮光板 30 ,优选的，所述数块遮光板 30设置于所述紫 外光灯 10与待清洗的基板 20中间；所述每一遮光板 30为黑色的矩形长条 状薄片，数块遮光板 30平行排布，其数量可根据待紫外光清洗的基板 20 的具体尺寸调整；此步骤中，所述数块遮光板 30与所述紫外光灯 10垂直， 数块遮光板 30平铺设置，优选的，每相邻的两块遮光板 30间隔设置，间 距为 Dl。
请参阅图 5、 图 6及图 7 ,所述步骤 3为转动遮光板 30 ,调整紫外光灯 10发出的紫外光照射到基板 20上的面积，从而控制单位时间内紫外光照射 到基板 20上的能量。所述转动遮光板 30是通过马达 40驱动安装于遮光板 上的齿轮 50来实现的。 进一步的，所述齿轮 50通过一连接轴 60固定连接 于遮光板 30 ,且齿轮 60安装于轴承 70上，该轴承 70上安装一支撑轴 80 , 从而遮光板 30可相对于支撑轴 80转动，该支撑轴 80连接马达 40。为节省 动力及生产成本，可设置一从动齿轮 55 ,该从动齿轮 55与所述齿轮 50啮 合，并通过另一连接轴 65连接于遮光板 30 ,从而齿轮 50可带动该从动齿 轮 55及遮光板 30转动。 该步骤的具体实施方式为：开启马达 40之前，所 述数块遮光板 30的转动角度为 0度，其与所述紫外光灯 10垂直，每相邻 的两块遮光板 30之间间距为最小值 D1 ,此时，紫外光灯 10发出的紫外光 被所述遮光板 30遮挡的面积最大，透过间距 D1照射到基板 20上的面积最 小，相应的单位时间内紫外光照射到基板 20上的能量最小；开启马达 40 , 该马达 40驱动所述支撑轴 80及轴承 70转动，带动所述连接轴 60、及从动 齿轮 55与另一连接轴 65转动，使得分别与连接轴 60、及另一连接轴 65固 定连接的相应遮光板 30在 0度至 90度范围内转动。 如图 8所示，当所述 遮光板 30转动 45度时，每相邻的两块遮光板 30之间的间距增大为 D2 , 紫外光灯 10发出的紫外光被所述遮光板 30遮挡的面积减小，透过间距 D2 照射到基板 20上的面积增大，相应的单位时间内紫外光照射到基板 20上 的能量增大；如图 9所示，当所述遮光板 30转动 90度时，每相邻的两块 遮光板 30之间的间距增大为最大值 D3 ,紫外光灯 10发出的紫外光被所述 遮光板 30遮挡的面积减至最小，透过间距 D3照射到基板 20上的面积增至 最大，相应的单位时间内紫外光照射到基板 20上的能量增至最大。 可结合 薄膜晶体管液晶显示器的前段阵列及中段成盒所包括的其它制程过程，根 据基板 20表面黏附有机物的实际情况，通过控制所述马达 40来灵活控制 所述遮光板 30在 0度至 90度范围内转动，控制单位时间内紫外光照射到 所述基板 20上的能量，使用于清洗所述基板 20的紫外光能量适中，既能 有效除黏附于基板 20表面的有机物，将基板 20清洗至洁净，又能避免激 发基板的金属层电子产生大量静电，从而避免基板上的电路图形被静电击 伤。
所述步骤 4的具体实施方式为，调整好所述遮光板 30的角度后，基板 20通过滚轮（未图示）带动的方式相对紫外光灯 10移动，所述紫外光灯 10发出紫外光清洗基板 20。 值得一提的是，所述遮光板 30的长度方向与 基板 20移动的方向平行。
综上所述，本发明的可调整紫外光照射能量的紫外光清洗基板的方法 , 在紫外光灯与基板之间设置数块遮光板，通过转动遮光板至不同的角度， 调整紫外光灯发出的紫外光照射到基板上的面积，从而控制单位时间内紫 外光照射到基板上的用于清洗基板的能量，既能有效去除黏附于基板表面 的有机物，将基板清洗至洁净，又能避免激发基板的金属层电子产生大量 静电，从而避免基板上的电路图形被静电击伤，且该方法操作灵活、 简便 , 能够提高产品品质及良率。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术 方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形 都应属于本发明权利要求的保护范围。

Claims

杈 利 要 求
1、 一种可调整紫外光照射能量的紫外光清洗基板的方法，包括如下步 骤：
步骤 1、 提供紫外光灯与待紫外光清洗的基板；
步骤 2、 在紫外光灯与待紫外光清洗的基板之间设置数块遮光板； 步骤 3、转动遮光板 ,调整紫外光灯发出的紫外光照射到基板上的面积， 从而控制单位时间内紫外光照射到基板上的能量；
步骤 4、 紫外光灯发出紫外光清洗基板。
2、 如权利要求 1所述的可调整紫外光照射能量的紫外光清洗基板的方 法，其中，所述步骤 2中的每一遮光板为黑色。
3、 如权利要求 1所述的可调整紫外光照射能量的紫外光清洗基板的方 法，其中，所述步骤 2中的每一遮光板为长条状薄片。
4、 如权利要求 1所述的可调整紫外光照射能量的紫外光清洗基板的方 法，其中，所述步骤 2中的遮光板位于所述紫外光灯与基板中间。
5、 如权利要求 1所述的可调整紫外光照射能量的紫外光清洗基板的方 法，其中，所述步骤 2中的遮光板与所述紫外光灯垂直。
6、 如权利要求 1所述的可调整紫外光照射能量的紫外光清洗基板的方 法 ,其中，所述步骤 4中基板相对紫外光灯移动，遮光板的长度方向与基 板移动的方向平行。
7、 如权利要求 1所述的可调整紫外光照射能量的紫外光清洗基板的方 法 ,其中，所述步骤 3 中转动遮光板是通过马达驱动安装于遮光板上的齿 轮来实现的。
8、 如权利要求 7所述的可调整紫外光照射能量的紫外光清洗基板的方 法 ,其中，所述齿轮通过一连接轴固定连接于遮光板，且齿轮安装于轴承 上，该轴承上安装一支撑轴，从而遮光板可相对于支撑轴转动。
9、 如权利要求 7所述的可调整紫外光照射能量的紫外光清洗基板的方 法 ,其中，所述遮光板能在 0度到 90度范围内转动。
10、 如权利要求 1所述的可调整紫外光照射能量的紫外光清洗基板的 方法，其中，所述基板为薄膜晶体管液晶显示器的玻璃基板。
11、 一种可调整紫外光照射能量的紫外光清洗基板的方法，包括如下 1、 提供紫外光灯与待紫外光清洗的基板；
2、 在紫外光灯与待紫外光清洗的基板之间设置数块遮光板；
Figure imgf000014_0001
3、转动遮光板 ,调整紫外光灯发出的紫外光照射到基板上的面积 , 从而控制单位时间内紫外光照射到基板上的能量；
步骤 4、 紫外光灯发出紫外光清洗基板；
其中，所述步骤 2中的每一遮光板为黑色；
其中，所述步骤 2中的每一遮光板为长条状薄片；
其中，所述步骤 2中的遮光板位于所述紫外光灯与基板中间； 其中，所述步骤 2中的遮光板与所述紫外光灯垂直；
其中，所述步骤 3 中转动遮光板是通过马达驱动安装于遮光板上的齿 轮来实现的；
其中，所述步骤 4中基板相对紫外光灯移动，遮光板的长度方向与基 板移动的方向平行；
其中，所述齿轮通过一连接轴固定连接于遮光板，且齿轮安装于轴承 上，该轴承上安装一支撑轴，从而遮光板可相对于支撑轴转动；
其中，所述遮光板能在 0度到 90度范围内转动；
其中，所述基板为薄膜晶体管液晶显示器的玻璃基板。
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Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104624568B (zh) * 2014-12-18 2016-07-27 深圳市华星光电技术有限公司 一种清洗设备
CN104858193B (zh) * 2015-06-12 2017-05-03 深圳市华星光电技术有限公司 玻璃基板的紫外光清洗装置
CN105573051A (zh) * 2016-03-22 2016-05-11 上海华力微电子有限公司 一种掩模板的存储方法
US10307154B2 (en) 2016-09-27 2019-06-04 Arthrex, Inc. Circular suture constructs and methods for use
JP6508433B2 (ja) * 2016-11-02 2019-05-08 ウシオ電機株式会社 紫外線処理装置
CN106405926A (zh) * 2016-11-30 2017-02-15 武汉华星光电技术有限公司 一种彩色滤光片的制备方法
CN107051979B (zh) * 2017-05-09 2020-08-07 京东方科技集团股份有限公司 一种紫外光清洗基板的方法及系统
CN107656401B (zh) * 2017-11-17 2020-06-05 深圳市华星光电半导体显示技术有限公司 光照组件及紫外线液晶照射机
CN110303009B (zh) * 2019-06-26 2020-10-16 深圳市华星光电技术有限公司 紫外光清洁装置
JP7601882B2 (ja) * 2020-01-03 2024-12-17 ユーブイ パートナーズ，インコーポレイティド 殺菌システム及び殺菌方法
CN112371678A (zh) * 2020-10-16 2021-02-19 河北光兴半导体技术有限公司 基板玻璃清洁装置
WO2023084669A1 (ja) * 2021-11-11 2023-05-19 日本電信電話株式会社 紫外光照射システム及び照射方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1269602A (zh) * 2000-04-11 2000-10-11 北京高力通科技开发公司 紫外光表面清洗机
US20040173237A1 (en) * 2003-03-06 2004-09-09 Lg.Philips Lcd Co., Ltd. System for cleaning substrates of flat panel display devices and method of cleaning using the same
JP2009183949A (ja) * 2009-05-11 2009-08-20 Gs Yuasa Corporation 紫外光洗浄装置および紫外光洗浄装置用紫外線ランプ
CN101603640A (zh) * 2008-06-09 2009-12-16 优志旺电机株式会社 紫外线照射装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3133054B2 (ja) * 1990-07-26 2001-02-05 大日本スクリーン製造株式会社 基板の洗浄処理方法及び洗浄処理装置
JP3590470B2 (ja) * 1996-03-27 2004-11-17 アルプス電気株式会社 洗浄水生成方法および洗浄方法ならびに洗浄水生成装置および洗浄装置
US6191428B1 (en) * 1998-06-30 2001-02-20 Joseph J. Gilberti Ultraviolet shutter
US7045746B2 (en) * 2003-11-12 2006-05-16 Mattson Technology, Inc. Shadow-free shutter arrangement and method
JP2008251913A (ja) * 2007-03-30 2008-10-16 Ｈｏｙａ Ｃａｎｄｅｏ Ｏｐｔｒｏｎｉｃｓ株式会社 耐紫外線材料、ならびにこれを用いたシール部材、緩衝部材、遮光部材、光源装置、及び処理装置
JP2009066579A (ja) * 2007-09-18 2009-04-02 Harison Toshiba Lighting Corp 紫外線照射装置
US8426778B1 (en) * 2007-12-10 2013-04-23 Novellus Systems, Inc. Tunable-illumination reflector optics for UV cure system
US8584612B2 (en) * 2009-12-17 2013-11-19 Lam Research Corporation UV lamp assembly of degas chamber having rotary shutters
US9017933B2 (en) * 2010-03-29 2015-04-28 Tokyo Electron Limited Method for integrating low-k dielectrics
CN201794490U (zh) * 2010-09-25 2011-04-13 张福全 一种可调节式遮阳百叶窗
JP2013202429A (ja) * 2012-03-27 2013-10-07 Seiko Epson Corp 紫外線照射装置
CN103406302B (zh) * 2013-08-23 2015-08-12 深圳市华星光电技术有限公司 基于紫外线的清洗方法及清洗装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1269602A (zh) * 2000-04-11 2000-10-11 北京高力通科技开发公司 紫外光表面清洗机
US20040173237A1 (en) * 2003-03-06 2004-09-09 Lg.Philips Lcd Co., Ltd. System for cleaning substrates of flat panel display devices and method of cleaning using the same
CN101603640A (zh) * 2008-06-09 2009-12-16 优志旺电机株式会社 紫外线照射装置
JP2009183949A (ja) * 2009-05-11 2009-08-20 Gs Yuasa Corporation 紫外光洗浄装置および紫外光洗浄装置用紫外線ランプ

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