WO2015109985A1 - 光阻干燥装置 - Google Patents

光阻干燥装置 Download PDF

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Publication number
WO2015109985A1
WO2015109985A1 PCT/CN2015/071071 CN2015071071W WO2015109985A1 WO 2015109985 A1 WO2015109985 A1 WO 2015109985A1 CN 2015071071 W CN2015071071 W CN 2015071071W WO 2015109985 A1 WO2015109985 A1 WO 2015109985A1
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Prior art keywords
photoresist
cavity
sieve plate
air
drying apparatus
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PCT/CN2015/071071
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English (en)
French (fr)
Inventor
徐彬
邓冲
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深圳市华星光电技术有限公司
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Publication of WO2015109985A1 publication Critical patent/WO2015109985A1/zh

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/12—Drying solid materials or objects by processes not involving the application of heat by suction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Definitions

  • the invention relates to a drying technology, in particular to a photoresist drying device for extracting a solvent in a photoresist.
  • Color Filer is one of the important components in a thin film transistor liquid crystal display panel (TFT-LCD). Fabrication of color filters includes photoresist coating, exposure, development, and photoresist on a glass substrate. Steps such as peeling and coating. In order to be coated on the glass substrate, a large amount of solvent is added to the photoresist. However, these solvents are not active ingredients, and after the photoresist coating is completed, a vacuum drying device (VCD) is required to light the light. The solvent in the resistor is removed so as not to affect subsequent exposure and development operations.
  • VCD vacuum drying device
  • the vacuum drying device removes the solvent in the photoresist, specifically, the glass substrate coated with the photoresist is placed on a carrier plate in a sealed cavity, and then the air in the cavity is extracted by an air pump to clean the solvent in the photoresist.
  • the vacuum drying device has two types of air suction holes above the cavity for pumping and a single air suction hole below the cavity for pumping. A plurality of suction holes are opened above the cavity to extract a large airflow, which tends to cause the upper surface of the photoresist to dry first, and the solvent in the photoresist cannot be easily extracted, resulting in photoresist and other areas near the hole. There is a large difference in the photoresist, resulting in color unevenness.
  • the pumping position for opening a single suction hole under the cavity is at the edge of the photoresist, that is, the exhaust airflow at the edge of the photoresist is large, and the solvent here is relatively easy to be extracted, and The central area of the photoresist is far from the pumping point.
  • the solvent here is difficult to extract. If the solvent in the central area of the photoresist is to be drained, it takes more pumping time, that is, the pumping efficiency is not high.
  • an embodiment of the present invention provides a photoresist drying device for extracting a solvent in a photoresist.
  • the photoresist drying device comprises a cavity, a sieve plate with a plurality of mesh openings and an air extraction unit.
  • the cavity includes a top wall having an air venting opening, a bottom wall opposite to the top wall, and a side wall connecting the top wall and the bottom wall, and the glass substrate coated with the photoresist is located in the cavity.
  • the suction hole is located at a center position of the top wall.
  • the screen plate is received in the cavity and located between the photoresist and the top wall, the sieve plate
  • the center is aligned with the air venting hole, and the plurality of mesh holes are arranged from the center to the center of the screen plate.
  • the pumping unit is located outside the chamber and is connected to the air vent to draw air from the chamber through the air vent.
  • the screen plate is mounted on the side wall and is in close contact with the side wall.
  • the screen plate, the top wall and the side wall together form a first ventilation chamber
  • the screen plate, the bottom wall and the side wall together form a second ventilation chamber
  • the first ventilation chamber and the second ventilation chamber The chamber is in communication through the plurality of screen openings.
  • the sieve plate is mounted on the side wall by gluing, snapping or screwing and is in close contact with the side wall.
  • the number of the plurality of mesh holes and the distance from a certain portion of the sieve plate to the center of the sieve plate satisfy a relationship: wherein n is the number of the plurality of mesh holes, and x is somewhere on the sieve plate The distance of the center of the sieve plate, h(x) is the distribution density of the sieve holes.
  • the photoresist drying device further includes a carrier plate, the carrier plate is fixed on the bottom wall, and the glass substrate coated with the photoresist is carried on the carrier board, and the photoresist is away from the carrier board.
  • the photoresist drying device further includes a plurality of support bars, one end of each support bar is fixed on the bottom wall, and the other end is fixedly connected to the carrier plate.
  • the air pumping unit comprises an air pump, a valve and a ventilation pipe, one end of the air pipe is connected to the air pump, and the other end is installed in the air hole to communicate with the cavity, the valve is installed in the air pump
  • the air duct is used to control the area of the air duct communicating with the air pump.
  • the cavity is a cylinder
  • the sieve plate is a cylinder
  • the cavity is a rectangular parallelepiped
  • the sieve plate has a rectangular parallelepiped shape.
  • the top wall of the photoresist drying device provided by the invention only has one air venting hole, and the air suction airflow is smaller than the plurality of air venting holes, and the sieve plate with a plurality of mesh holes has uniformity and stability to the airflow. It can avoid the color unevenness of the photoresist caused by the large airflow or the unstable airflow.
  • the air vent is provided above the cavity for pumping, the pumping position is for the entire photoresist, and is not limited to the edge of the photoresist, and therefore, the pumping efficiency is high.
  • FIG. 1 is a perspective view of a photoresist drying apparatus according to a first embodiment of the present invention.
  • Figure 2 is a partial cross-sectional view of the photoresist drying apparatus of Figure 1.
  • Figure 3 is a plan view of the screen plate in the photoresist drying apparatus of Figure 1.
  • Figure 4 is a graph showing the relationship between the number of sieve holes on the sieve plate of the same area.
  • Figure 5 is a perspective view showing a photoresist drying apparatus according to a second embodiment of the present invention.
  • Figure 6 is a plan view of the screen plate in the photoresist drying apparatus of Figure 5.
  • the photoresist drying apparatus 100 includes a cavity 10, a plurality of support rods 20, a carrier plate 30, a sieve plate 40, and an air extraction unit 50.
  • the photoresist drying device 100 is configured to extract a solvent coated in the photoresist 300 on the glass substrate 200 when the color filter is formed, and the solvent is favorable for the photoresist 300 to be coated on the glass substrate 200, but the solvent Not an active ingredient.
  • the cavity 10 has a rectangular parallelepiped structure and has a receiving cavity 102.
  • the cavity 10 includes a top wall 12, a bottom wall 14, and four side walls 16.
  • the top wall 12 and the bottom wall 14 are respectively located at opposite ends of the cavity 10, and the top wall 12 is parallel to the bottom wall 14.
  • the four side walls 16 are vertically perpendicular to each other, and the four side walls 16 are perpendicularly connected to the top wall 12 and the bottom wall 14.
  • the top wall 12, the bottom wall 14 and the four side walls 16 together define the receiving cavity 102.
  • a suction hole 120 is defined in the center of the top wall 12.
  • the air vent 120 is in communication with the receiving cavity 102. In this embodiment, the air vent 120 is a circular through hole.
  • the other positions of the top wall 12, the bottom wall 14 and the four side walls 16 are all solid structures, and no air venting holes are provided.
  • the plurality of support rods 20 and the carrier plate 30 are located in the receiving cavity 102.
  • the carrier plate 30 is a flat plate structure, and the carrier plate 30 includes an upper surface 32 and a lower surface 34.
  • the upper surface 32 and the lower surface 34 are respectively located on opposite sides of the carrier plate 30, and the upper surface 32 is parallel to the lower surface 34.
  • the upper surface 32 is for receiving the glass substrate 200 coated with the photoresist 300.
  • One end of each of the support rods 20 is fixed to the bottom wall 14 and perpendicular to the bottom wall 14, and the other end of each of the support rods 20 is fixedly coupled to the lower surface 34 and perpendicular to the lower surface 34.
  • the upper surface 32 and the lower surface 34 are both parallel to the bottom wall 14, and the photoresist 300 is away from the upper surface 32.
  • the screen plate 40 is received in the receiving cavity 102 and located between the photoresist 300 and the top wall 12 .
  • the shape and size of the screen 40 are completely matched with the shape and size of the cross section of the receiving cavity 102. That is, the sieve plate 40 also has a rectangular parallelepiped structure, and the length and width of the sieve plate 40 are the same as the length and width of the cross section of the receiving cavity 102, respectively.
  • the screen plate 40 is mounted on the four side walls 16 by gluing, snapping or screwing, and is in close contact with the four side walls 16, and the center 42 of the screen plate 40 is aligned with the air vent 120.
  • the screen plate 40, the top wall 12 and the four side walls 16 together form a first ventilation chamber 101.
  • the screen plate 40, the bottom wall 14 and the four side walls 16 together form a second ventilation chamber. 103.
  • the sieve plate 40 is provided with a plurality of sieve holes 44, and the first ventilation cavity 101 and the second ventilation cavity 103 communicate with each other through the plurality of mesh holes 44.
  • the plurality of mesh holes 44 are all circular through holes.
  • the number of the plurality of screen openings 44 and the distance from the screen 42 to the center 42 of the screen deck 40 satisfy the relationship: Where n is the number of the plurality of screen openings 44, x is the distance from the screen 42 to the center 42 of the screen deck 40, and h(x) is the distribution density of the screen openings 44.
  • the plurality of screen openings 44 are arranged from the center 42 away from the screen deck 40 from a sparse to a dense arrangement. That is, the distribution of the screen holes 44 farther from the air vent 120 (i.e., from the center 42) is closer than the distance from the air vent 120 (i.e., from the center 42). Referring to FIG. 4, if a region A is selected at a position closer to the air vent 120 (ie, from the center 42), a region is selected at a distance from the air vent 120 (ie, from the center 42).
  • the pumping unit 50 includes an air pump 52, a valve 54, and a vent tube 56.
  • One end of the air duct 56 is connected to the air pump 52, and the other end is installed in the air suction hole 120 to communicate with the receiving cavity 102.
  • the valve 54 is mounted on the vent tube 56 adjacent to the air pump 52 for controlling the area of communication between the vent tube 56 and the air pump 52. Specifically, when the valve 54 is fully opened, the air duct 56 is completely in communication with the air pump 52. At this time, the air pump 52 can unimpededly draw air from the air receiving chamber 102 through the air duct 56. When the valve 54 is fully closed, the air duct 56 is completely out of communication with the air pump 52.
  • the air pump 52 cannot be evacuated from the air receiving chamber 102 through the air duct 56. If the valve 54 opens half of the vent tube 56 and shields the vent tube 56, the vent tube 56 is still in communication with the sump pump 52. At this time, the pumping of the air pump 52 is not as smooth as when it is fully open.
  • the pumping unit 50 can control not only the degree of pumping (including the amount of pumping, the pumping rate, etc.) but also the degree of pumping by controlling the working horsepower of the pump 52 itself.
  • valve 54 is opened to communicate the air duct 56 with the air pump 52 (including all communicating and partially communicating), and the air pump 52 is evacuated from the receiving cavity 102 through the air duct 56.
  • the second receiving cavity The gas in the 103 passes through the plurality of mesh holes 44 and enters the first receiving cavity 101, and is then withdrawn through the air venting holes 120 and the air venting pipe 56.
  • the extraction of the gas in the second housing chamber 103 can discharge the solvent in the photoresist 300.
  • the top wall 12 is only provided with one air vent 120, the air flow is smaller than that of the plurality of air vents, and the screen 40 has a uniform and stable effect on the air flow, thereby avoiding a large airflow or The airflow is unstable, causing color unevenness of the photoresist 300.
  • the air vent 120 is provided above the cavity 10 for pumping, the pumping position is for the entire photoresist 300, and is not limited to the edge of the photoresist 300. Therefore, the photoresist drying apparatus 100 The pumping efficiency is higher.
  • the photoresist drying device 500 provided by the second embodiment of the present invention is different from the photoresist drying device 100 provided by the first embodiment in that the cavity 50 has a cylindrical structure and the sieve
  • the plate 60 also has a cylindrical structure.
  • the cavity 50 includes a side wall 56 that is disposed within the cavity 50 and is mounted to the side wall 56.
  • the screen plate 60 has a diameter that is the same as the inner diameter of the cavity 50.
  • the working principle of the photoresist drying apparatus 500 in this embodiment is exactly the same as that of the photoresist drying apparatus 100 in the first embodiment, and the efficiencies can be achieved, and are not described herein again.
  • the photoresist drying apparatuses 100 and 500 provided by the present invention are not limited to use only for removing the solvent in the photoresist when the color filter is formed, and can also be used for the solvent in the photoresist when other components are fabricated, such as production.

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  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

一种光阻干燥装置（100），用于抽取光阻（300）中的溶剂。该光阻干燥装置包括腔体（10）、开设有多个筛孔（44）的筛板（40）及抽气单元（50）。该腔体包括开设有一个抽气孔（120）的顶壁（12）、与该顶壁相对的底壁（14）以及连接该顶壁与该底壁的侧壁（16），涂布有该光阻的玻璃基板（200）位于该腔体内。该筛板收容在该腔体内并位于该光阻与该顶壁之间。该抽气单元位于该腔体外并与该抽气孔连接以通过该抽气孔从该腔体内抽气。

Description

光阻干燥装置 技术领域
本发明涉及干燥技术，尤其涉及一种抽取光阻内溶剂的光阻干燥装置。
背景技术
彩色滤光片(Color Filer，CF)是薄膜晶体管液晶显示面板(TFT-LCD)中的重要元件之一，制作彩色滤光片包括在玻璃基板上进行光阻涂布、曝光、显影、光阻剥离以及镀膜等步骤。为了方便被涂布在玻璃基板上，光阻内加入了大量的溶剂(solvent)，然而，这些溶剂并非有效成分，光阻涂布完成后，需要使用真空干燥装置(Vacuum Dry，VCD)将光阻内的溶剂去除，以不影响后续的曝光显影等动作。
真空干燥装置去除光阻内的溶剂，具体为将涂布有光阻的玻璃基板放置在一密封腔体内的承载板上，然后利用抽气泵抽取腔体内的空气以将光阻内的溶剂抽取干净。目前，真空干燥装置有在腔体上方开设多个抽气孔进行抽气及在腔体下方开设单个抽气孔进行抽气两种类型。在腔体上方开设多个抽气孔进行抽气的抽气气流较大，容易造成光阻上表面先干燥，而光阻内的溶剂无法轻易被抽取出来，导致孔位附近的光阻与其他区域的光阻存在较大差异，产生色不均现象。由于承载板的阻隔，在腔体下方开设单个抽气孔进行抽气的抽气位置是在光阻的边缘，即光阻的边缘的抽气气流很大，此处的溶剂较易被抽取，而光阻中心区域离抽气点较远，此处的溶剂较难被抽取，若要将光阻中心区域的溶剂抽干，则需要花较多的抽气时间，即抽气效率不高。
因此，有必要提供能够解决上述问题的光阻干燥装置。
发明内容
为了解决上述技术问题，本发明实施例提供了一种光阻干燥装置，用于抽取光阻中的溶剂。该光阻干燥装置包括腔体、开设有多个筛孔的筛板及抽气单元。该腔体包括开设有一个抽气孔的顶壁、与该顶壁相对的底壁以及连接该顶壁与该底壁的侧壁，涂布有该光阻的玻璃基板位于该腔体内。该抽气孔位于该顶壁的中心位置。该筛板收容在该腔体内并位于该光阻与该顶壁之间，该筛板 的中心与该抽气孔对准，该多个筛孔自远离该筛板的中心呈由疏到密排布。该抽气单元位于该腔体外并与该抽气孔连接以通过该抽气孔从该腔体内抽气。
其中，该筛板安装在该侧壁上且与该侧壁紧密接触。
其中，该筛板、该顶壁及该侧壁共同围成第一通风腔，该筛板、该底壁及该侧壁共同围成第二通风腔，该第一通风腔与该第二通风腔通过该多个筛孔连通。
其中，该筛板通过胶合、卡合或者螺合方式安装在该侧壁上并与该侧壁均紧密接触。
其中，该多个筛孔的数量与该筛板上某处到该筛板的中心的距离满足关系式：，其中，n为该多个筛孔的数量，x为该筛板上某处到该筛板的中心的距离，h(x)为筛孔的分布密度。
其中，该光阻干燥装置还包括一个承载板，该承载板固设在该底壁上，该涂布有该光阻的玻璃基板承载在该承载板上，且该光阻远离该承载板。
其中，该光阻干燥装置还包括多个支撑杆，每个支撑杆的一端固设在该底壁上，另一端与该承载板固定连接。
其中，该抽气单元包括一个抽气泵、一个阀门以及一个通风管，该通风管的一端与该抽气泵连接，另一端装设在该抽气孔内以与该腔体连通，该阀门装设在该通风管上用以控制该通风管与该抽气泵的相通的面积。
其中，该腔体呈圆柱体，该筛板呈圆柱体。
其中，该腔体呈长方体，该筛板呈长方体。
本发明所提供的光阻干燥装置的顶壁仅开设有一个抽气孔，抽气气流相较开设多个抽气孔要小，而且开设有多个筛孔的筛板对该气流有均匀及稳定作用，可以避免因抽气气流较大或气流不稳造成光阻的色不均现象。另外，由于是在该腔体的上方设置抽气孔进行抽气，抽气位置针对的是整个光阻，而不局限于在该光阻的边缘，因此，抽气效率较高。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付 出创造性劳动性的前提下，还可以根据这些附图获得其他的附图。
图1是本发明第一实施例所提供的光阻干燥装置的立体示意图。
图2是图1中的光阻干燥装置的部分剖面示意图。
图3是图1中的光阻干燥装置中的筛板的平面示意图。
图4是相同面积的筛板上的筛孔的数量关系图。
图5是本发明第二实施例所提供光阻干燥装置中的立体示意图。
图6是图5中的光阻干燥装置中的筛板的平面示意图。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
实施例一
请参阅图1及图2，本发明第一实施例提供的光阻干燥装置100包括一个腔体10、多个支撑杆20、一个承载板30、一个筛板40以及一个抽气单元50。该光阻干燥装置100用于抽取制作彩色滤光片时涂布在玻璃基板200上的光阻300内的溶剂，该溶剂有利于该光阻300涂布在该玻璃基板200上，但该溶剂并非为有效成分。
该腔体10呈长方体结构并具有一个收容腔102。该腔体10包括一个顶壁12、一个底壁14以及四个侧壁16。该顶壁12与该底壁14分别位于该腔体10的相背两端，且该顶壁12与该底壁14平行。该四个侧壁16彼此首位垂直相接，且该四个侧壁16垂直连接该顶壁12及该底壁14。该顶壁12、该底壁14以及该四个侧壁16共同围成该收容腔102。该顶壁12的中心位置开设有一个抽气孔120。该抽气孔120与该收容腔102连通。本实施例中，该抽气孔120为圆形通孔。该顶壁12的其他位置、该底壁14以及该四个侧壁16上均为实体结构，并未开设抽气孔。
该多个支撑杆20及该承载板30均位于该收容腔102内。该承载板30为平板结构，该承载板30包括一个上表面32及一个下表面34。该上表面32及该下表面34分别位于该承载板30相背的两侧，且该上表面32与该下表面34平行。 该上表面32用于承放涂布有光阻300的玻璃基板200。每个支撑杆20的一端固设在该底壁14上并与该底壁14垂直，每个支撑杆20的另一端固定连接在该下表面34上并与该下表面34垂直。此时，该上表面32及该下表面34均与该底壁14平行，该光阻300远离该上表面32。
请一并参阅图2及图3，该筛板40收容在该收容腔102内并位于该光阻300与该顶壁12之间。该筛板40的形状及尺寸与该收容腔102的截面的形状及尺寸完全匹配。即，该筛板40也呈长方体结构，且该筛板40的长度及宽度与该收容腔102的截面的长度及宽度分别相同。该筛板40通过胶合、卡合或者螺纹连接等方式安装在该四个侧壁16上并与该四个侧壁16均紧密接触，该筛板40的中心42与该抽气孔120对准。该筛板40、该顶壁12及该四个侧壁16共同围成一个第一通风腔101，该筛板40、该底壁14及该四个侧壁16共同围成一个第二通风腔103。该筛板40上开设有多个筛孔44，该第一通风腔101与该第二通风腔103通过该多个筛孔44连通。本实施例中，该多个筛孔44均为圆形通孔。
该多个筛孔44的数量与该筛板40上某处到该筛板40的中心42的距离满足关系式：。其中，n为该多个筛孔44的数量，x为该筛板40上某处到该筛板40的中心42的距离，h(x)为筛孔44的分布密度。该公式的推导过程如下：首先，假定该抽气孔120的孔径为d，该筛板40与该顶壁12之间的距离为D，d与D均为常数，则该筛板40上方各个位置的压强P是x的函数，记为P＝f(x)。由于各个位置的压强P各不相同，距离该抽气孔120较近位置的压强P较大，距离该抽气孔120较远位置的压强P较小。该筛孔44的分布密度ρ与压强P存在一定函数关系，因此筛孔44的分布密度ρ也可做为距离x的函数，记做ρ＝h(x)。选取距离该筛板40的中心42为x处且宽度为d(x)的圆环形，其面积则S＝2πxd(x)，该圆环形内的筛孔44的分布密度则为ρ＝[n/2πxd(x)]，带入之前的ρ＝h(x)并积分后即可得到公式。
由该公式可以看出，该多个筛孔44自远离该筛板40的中心42呈由疏到密排布。即，距离该抽气孔120(也即距离该中心42)较远的地方比距离该抽气孔120(也即距离该中心42)较近的地方的筛孔44的分布密度要大。请结合图4，若在距离该抽气孔120(也即距离该中心42)较近的地方选取一片区域A，在距离该抽气孔120(也即距离该中心42)较远的地方选取一片区域B，且该区域A与该区 域B的面积相同(SA＝SB)，则该区域A内的筛孔44的数量NA小于该区域B内的筛孔44的数量NB，即NA＜NB。
该抽气单元50包括一个抽气泵52、一个阀门54以及一个通风管56。该通风管56的一端与该抽气泵52连接，另一端装设在该抽气孔120内以与该收容腔102连通。该阀门54装设在该通风管56上靠近该抽气泵52处，该阀门54用以控制该通风管56与该抽气泵52的相通的面积。具体地，当该阀门54全开，则该通风管56与该抽气泵52完全相通，此时，该抽气泵52可以畅通无阻地通过该通风管56从该收容腔102内抽气。当该阀门54全闭，则该通风管56与该抽气泵52完全不连通，此时，该抽气泵52无法通过该通风管56从该收容腔102内抽气。若该阀门54开启了一半该通风管56且遮蔽了一半该通风管56，则该通风管56与该抽气泵52仍然连通，此时，该抽气泵52的抽气不如全开时顺畅。由此，该抽气单元50不仅可以通过控制抽气泵52自身的工作马力来控制抽气程度(包括抽气量、抽气速率等)，还可以通过该阀门54的开启程度来控制抽气程度。
工作时，该阀门54开启使该通风管56与该抽气泵52相通(包括全部相通及部分相通)，该抽气泵52通过该通风管56从该收容腔102内抽气，该第二收容腔103内的气体穿过该多个筛孔44后进入该第一收容腔101内，然后通过该抽气孔120及该通风管56被抽出。该第二收容腔103内的气体的抽出可将光阻300内的溶剂排出。由于该顶壁12仅开设有一个抽气孔120，抽气气流相较开设多个抽气孔要小，而且该筛板40对该气流也有均匀及稳定作用，因此可以避免因抽气气流较大或气流不稳造成光阻300的色不均现象。另外，由于是在该腔体10的上方设置抽气孔120进行抽气，抽气位置针对的是整个光阻300，而不局限于在该光阻300的边缘，因此，该光阻干燥装置100的抽气效率较高。
实施例二
请参阅图5及图6，本发明第二实施例提供的光阻干燥装置500与第一实施例提供的光阻干燥装置100的不同之处在于：该腔体50呈圆柱体结构，该筛板60也呈圆柱体结构。该腔体50包括一个侧壁56，该筛板60位于该腔体50内并装设在该侧壁56上，该筛板60的直径与该腔体50的内径相同。本实施例中的光阻干燥装置500的工作原理与第一实施例中的光阻干燥装置100的工作原理以及能达到的功效完全相同，在此不再赘述。
另外，本发明所提供的光阻干燥装置100及500并不局限于仅用于去除制作彩色滤光片时的光阻内的溶剂，还可以用于制作其他元件时光阻内的溶剂，比如生产触控面板(touch panel)时光阻内的溶剂。
以上所揭露的仅为本发明较佳实施例而已，当然不能以此来限定本发明之权利范围，因此依本发明权利要求所作的等同变化，仍属本发明所涵盖的范围。

Claims (10)

  1. 一种光阻干燥装置，用于抽取光阻中的溶剂，其中，该光阻干燥装置包括：
    腔体，该腔体包括开设有一个抽气孔的顶壁、与该顶壁相对的底壁以及连接该顶壁与该底壁的侧壁，涂布有该光阻的玻璃基板位于该腔体内，该抽气孔位于该顶壁的中心位置；
    开设有多个筛孔的筛板，该筛板收容在该腔体内并位于该光阻与该顶壁之间，该筛板的中心与该抽气孔对准，该多个筛孔自远离该筛板的中心呈由疏到密排布；
    抽气单元，位于该腔体外并与该抽气孔连接以通过该抽气孔从该腔体内抽气。
  2. 如权利要求1所述的光阻干燥装置，其中，该筛板安装在该侧壁上且与该侧壁紧密接触。
  3. 如权利要求2所述的光阻干燥装置，其中，该筛板、该顶壁及该侧壁共同围成第一通风腔，该筛板、该底壁及该侧壁共同围成第二通风腔，该第一通风腔与该第二通风腔通过该多个筛孔连通。
  4. 如权利要求3所述的光阻干燥装置，其中，该筛板通过胶合、卡合或者螺合方式安装在该侧壁上并与该侧壁均紧密接触。
  5. 如权利要求4所述的光阻干燥装置，其中，该多个筛孔的数量与该筛板上某处到该筛板的中心的距离满足关系式：，其中，n为该多个筛孔的数量，x为该筛板上某处到该筛板的中心的距离，h(x)为筛孔的分布密度。
  6. 如权利要求5所述的光阻干燥装置，其中，该光阻干燥装置还包括一个承载板，该承载板固设在该底壁上，该涂布有该光阻的玻璃基板承载在该承载板上，且该光阻远离该承载板。
  7. 如权利要求6所述的光阻干燥装置，其中，该光阻干燥装置还包括多个支撑杆，每个支撑杆的一端固设在该底壁上，另一端与该承载板固定连接。
  8. 如权利要求7所述的光阻干燥装置，其中，该抽气单元包括一个抽气泵、一个阀门以及一个通风管，该通风管的一端与该抽气泵连接，另一端装设在该抽气孔内以与该腔体连通，该阀门装设在该通风管上用以控制该通风管(56)与该抽气泵相通的面积。
  9. 如权利要求1所述的光阻干燥装置，其中，该腔体呈圆柱体，该筛板呈圆柱体。
  10. 如权利要求1所述的光阻干燥装置，其中，该腔体呈长方体，该筛板呈长方体。
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