WO2015092998A1 - 電子銃装置及び真空蒸着装置 - Google Patents
電子銃装置及び真空蒸着装置 Download PDFInfo
- Publication number
- WO2015092998A1 WO2015092998A1 PCT/JP2014/006086 JP2014006086W WO2015092998A1 WO 2015092998 A1 WO2015092998 A1 WO 2015092998A1 JP 2014006086 W JP2014006086 W JP 2014006086W WO 2015092998 A1 WO2015092998 A1 WO 2015092998A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- heating current
- unit
- current
- state
- filament
- Prior art date
Links
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 12
- 238000010438 heat treatment Methods 0.000 claims abstract description 341
- 238000010894 electron beam technology Methods 0.000 claims abstract description 120
- 239000000463 material Substances 0.000 claims description 57
- 238000001704 evaporation Methods 0.000 claims description 37
- 230000008020 evaporation Effects 0.000 claims description 30
- 239000000758 substrate Substances 0.000 claims description 7
- 238000001514 detection method Methods 0.000 description 57
- 238000010586 diagram Methods 0.000 description 15
- 238000007740 vapor deposition Methods 0.000 description 14
- 230000006870 function Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 238000012544 monitoring process Methods 0.000 description 6
- 238000003466 welding Methods 0.000 description 6
- 238000007738 vacuum evaporation Methods 0.000 description 5
- 238000010891 electric arc Methods 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000005856 abnormality Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3132—Evaporating
Definitions
- the present invention relates to an electron gun apparatus and a vacuum deposition apparatus used for a vacuum deposition method or the like.
- the electron gun device is a device that generates an electron beam by heating a filament.
- the electron gun device is used, for example, as a heating evaporation source in a vacuum evaporation method, and is configured to be able to evaporate the evaporation material by irradiating and heating the evaporation material disposed in the evaporation device.
- Such an electron gun apparatus typically includes a heating current power source for heating the filament, a coil for controlling the trajectory of the electron beam, a power source for the coil, and the like.
- Patent Document 4 a method of performing vapor deposition using, for example, two electron gun apparatuses is also known.
- the other electron gun apparatus is stopped when one electron gun apparatus is used.
- facilities such as a heating current power source and a coil power source of the other electron gun apparatus become excessive, which may increase the equipment cost.
- an object of the present invention is to provide an electron gun apparatus and a vacuum deposition apparatus that can generate a plurality of electron beams and that can simplify equipment. .
- an electron gun apparatus includes a first filament, a second filament, a power supply unit, a switching unit, and a control unit.
- the first filament can generate a first electron beam.
- the second filament can generate a second electron beam.
- the power supply unit applies a bias voltage to the heating current supply unit that supplies a heating current for generating an electron beam to one of the first filament and the second filament, and the heating current.
- the switching unit includes a first state in which a driving current obtained by applying the bias voltage to the heating current is supplied to the first filament, and a second state in which the driving current is supplied to the second filament. Are configured to be selectively switched.
- the control unit controls switching between the first state and the second state.
- An electron gun device includes a first filament, a second filament, a power supply unit, a switching unit, and a control unit.
- the first filament can generate a first electron beam.
- the second filament can generate a second electron beam.
- the power supply unit applies a bias voltage to the heating current supply unit that supplies a heating current for generating an electron beam to one of the first filament and the second filament, and the heating current.
- the switching unit includes a first state in which a driving current obtained by applying the bias voltage to the heating current is supplied to the first filament, and a second state in which the driving current is supplied to the second filament. Are configured to be selectively switched.
- the control unit controls switching between the first state and the second state.
- the switching unit can selectively supply the heating current from the heating current supply unit to one of the first filament and the second filament. Therefore, it becomes possible to generate either one of the first electron beam and the second electron beam by one heating current supply unit, and it is possible to omit a useless configuration and simplify the equipment.
- the heating current supply unit is Power supply for heating current; Having a first heating current circuit connected to the first filament;
- the switching unit is A second heating current circuit connected to the second filament;
- a heating current switching unit that connects the heating current power source and the first heating current circuit in the first state, and connects the heating current power source and the second heating current circuit in the second state; You may have.
- the heating current switching unit can selectively supply the heating current from the heating current power source to one of the first heating current circuit and the second heating current circuit.
- the switching unit is A bias switching unit that connects the bias supply unit and the first heating current circuit in the first state, and connects the bias supply unit and the second heating current circuit in the second state; You may have.
- the bias switching unit can connect the bias supply unit and the first and second heating current circuits, the heating current switching unit switches the path of the heating current before the bias voltage that becomes a high voltage is applied. It becomes possible.
- the heating current switching unit can switch the heating current on the heating power source side that is insulated from the bias voltage that becomes a high voltage, the heating current switching unit can be switched to a relatively simple relay or electromagnetic contactor. Etc. can be configured.
- the first heating current circuit is Including a first transformer capable of converting the voltage value of the heating current;
- the second heating current circuit is A second transformer that can convert the voltage value of the heating current may be included.
- the bias supply unit is connected to both the first heating current circuit and the second heating current circuit.
- control unit Determining whether the drive current is supplied to any one of the first heating current circuit and the second heating current circuit; In any case, when the drive current is not supplied, the supply of the heating current to the heating current power source may be stopped.
- the controller controls the supply of drive current to the first heating current circuit and the second heating current circuit, and detects abnormalities such as defective filament contact, heating power supply failure, and bias switching unit failure. Is possible. Therefore, it is possible to confirm the actual supply of the drive current and perform reliable switching, and it is possible to prevent defects in film formation due to abnormal switching.
- the control unit It is determined whether the bias voltage is applied to the heating current by the bias supply unit, and the first state and the second state are switched when the bias voltage is not applied. Good.
- the electron gun device is A first deflector capable of deflecting the first electron beam; A second deflector capable of deflecting the first electron beam,
- the power supply unit A deflection current supply unit that supplies a current to either one of the first deflector and the second deflector;
- the switching unit is A deflection current switching unit for connecting the deflection current supply unit and the first deflector in the first state and for connecting the deflection current supply unit and the second deflector in the second state; May be.
- control unit Determining whether a current is supplied to one of the first deflector and the second deflector by the deflection power supply unit; In any case, when the current is not supplied, the first state and the second state may be switched.
- the electron gun device is You may further comprise the connection part which connects the said power supply unit and the said switching unit detachably.
- the connection unit enables the switching unit to be connected later, and the power supply unit and the switching unit can be handled separately during storage or transportation. Therefore, storage and transportation can be facilitated and handling properties can be improved.
- a vacuum deposition apparatus includes a chamber that can be maintained in a vacuum, a support unit, a first evaporation material holding unit, a second evaporation material holding unit, and an electron gun.
- the support is disposed in the chamber and supports the substrate.
- the first evaporative material holding unit is disposed in the chamber and is maintained at a ground potential to hold the first evaporative material.
- the second evaporative material holding unit is disposed in the chamber and is maintained at a ground potential to hold the second evaporative material.
- the electron gun apparatus includes a first filament, a second filament, a power supply unit, a switching unit, and a control unit.
- the first filament can emit a first electron beam to the first evaporation material.
- the second filament can emit a second electron beam to the second evaporation material.
- the power supply unit applies a bias voltage to the heating current supply unit that supplies a heating current for generating an electron beam to one of the first filament and the second filament, and the heating current.
- the switching unit includes a first state in which a driving current obtained by applying the bias voltage to the heating current is supplied to the first filament, and a second state in which the driving current is supplied to the second filament. Are configured to be selectively switched.
- the control unit controls switching between the first state and the second state.
- the vacuum deposition apparatus it is possible to alternately generate the first electron beam and the second electron beam by one heating current supply unit, and it is possible to omit a useless configuration and simplify equipment. . Furthermore, since one chamber is provided, either the first electron beam or the second electron beam can be emitted to the chamber that is prepared for vapor deposition and is maintained in a vacuum atmosphere, and has a high safety configuration. It can be.
- FIG. 1 is a schematic view showing a vacuum vapor deposition apparatus according to the first embodiment of the present invention.
- the vacuum deposition apparatus 1 includes a chamber 2, a first evaporative material holding unit 3 a, a second evaporative material holding unit 3 b, a support unit 4, a main controller 5, and an electron gun device 100.
- the vacuum evaporation apparatus 1 heats the first evaporation material 31 a and the second evaporation material 31 b held by the first evaporation material holding unit 3 a and the second evaporation material holding unit 3 b using the electron gun device 100.
- the first evaporating material 31a and the second evaporating material 31b are evaporated in a vacuum and formed on the substrate W.
- the chamber 2 is a vacuum chamber configured to be maintained in a vacuum, and a vacuum pump (not shown) is connected to the chamber 2.
- a support part 4 for supporting a plurality of substrates W is attached.
- the support unit 4 may be configured with, for example, a dome-shaped jig capable of holding a plurality of substrates W.
- the support unit 4 may be configured to be rotated by a driving unit (not shown). . This makes it possible to form a film uniformly on the plurality of substrates W.
- the support part 4 is not limited to the said structure.
- the first evaporative material holding unit 3 a and the second evaporative material holding unit 3 b are disposed in the lower part of the chamber 2, for example, facing the support unit 4.
- the first evaporation material holding unit 3a holds the first evaporation material 31a
- the second evaporation material holding unit 3b holds the second evaporation material 31b.
- Each of the first evaporative material holding unit 3a and the second evaporative material holding unit 3b is typically configured as a crucible for containing the evaporative material.
- the vacuum evaporation apparatus 1 may have a hearth on which the crucible can be attached.
- the first evaporative material holding unit 3a and the second evaporative material holding unit 3b may have ring-shaped hearts that can hold the solid first and second evaporative materials 31a and 31b. Good.
- Each of the first evaporative material holding unit 3a and the second evaporative material holding unit 3b is maintained at the ground potential. Thereby, a positive potential can be maintained with respect to a first filament 110a and a second filament 110b described later.
- the main controller 5 controls the driving of the vacuum deposition apparatus 1 as a whole.
- the main controller 5 generates a switching control signal for controlling switching of emission of the first electron beam B1 and the second electron beam B2.
- the switching control signal is used for processing of the control unit 150 of the electron gun apparatus 100 described later.
- the electron gun apparatus 100 selectively emits one of the first electron beam B1 and the second electron beam B2 into the chamber 2.
- the first electron beam B1 or the second second electron beam B2 emitted from the electron gun apparatus 100 is incident on the first evaporating material 31a or the second evaporating material 31b by controlling each orbit. These are heated and evaporated.
- FIG. 1 shows a mode in which the first electron beam B1 is incident on the first evaporation material 31a.
- a detailed configuration of the electron gun apparatus 100 will be described.
- the electron gun apparatus 100 includes a first filament 110a, a second filament 110b, a first deflection coil 120a, a second deflection coil 120b, a power supply unit 130, a switching unit 140, a control unit 150, and a detection unit 160.
- the electron gun apparatus 100 emits the first electron beam B1 and the second second electron beam B2 alternately, whereby a film containing the evaporation material 31a on the substrate W and the evaporation material The film containing 31b can be alternately stacked.
- the electron gun apparatus 100 may be configured to continuously emit only one of the first electron beam B1 and the second second electron beam B2.
- the first filament 110a generates a first electron beam B1. Specifically, the first filament 110a is heated by a driving current in which a bias voltage is applied to a heating current described later, and emits thermoelectrons as a first electron beam B1.
- the first electron beam B1 is defined as thermoelectrons that are electrically extracted by an anode (not shown) that is provided apart from the first filament 110a that functions as a cathode.
- the emission method of the first electron beam B1 is not particularly limited.
- the first electron beam B1 may be emitted into the chamber 2 through, for example, a hole formed in the center of the anode, or electrically supplied by the anode provided in parallel with the first filament 110a.
- the first electron beam B1 may be generated by causing thermoelectrons emitted from the first filament 110a to collide with another cathode to emit the thermoelectrons from the cathode.
- a Wehnelt (not shown) for focusing the first electron beam B1 may be provided between the cathode and the anode.
- the first filament 110a emits the first electron beam B1 to the first evaporation material 31a.
- the second filament 110b generates the second electron beam B2, and is configured in the same manner as the first filament 110a. That is, specifically, the second filament 110b is heated by being energized and emits thermoelectrons that become the second electron beam B2.
- the second electron beam B2 is also defined as thermoelectrons that are electrically extracted by an anode (not shown) that is provided apart from the second filament 110b that functions as a cathode. In the present embodiment, the second filament 110b emits the second electron beam B2 to the second evaporation material 31b.
- the first deflection coil 120a functions as the first deflector according to the present embodiment, and deflects the first electron beam B1.
- the first deflection coil 120a is configured to be able to magnetically control the trajectory of the first electron beam B1 by controlling the current flowing through the first deflection coil 120a.
- the first deflection coil 120a allows the first evaporating material 31a to be irradiated with the first electron beam B1 in a desired trajectory.
- the second deflection coil 120b functions as a second deflector according to the present embodiment, and deflects the second electron beam B2. Similar to the first deflection coil 120a, the second deflection coil 120b is configured to be able to magnetically control the trajectory of the second electron beam B2 by controlling the current flowing therethrough. With the second deflection coil 120b, the second evaporating material 31b can be irradiated with the second electron beam B2 in a desired orbit.
- FIG. 2 is a circuit diagram of the power supply unit 130 and the switching unit 140.
- the power supply unit 130 supplies a drive current for generating the electron beams B1 and B2 to one of the first filament 110a and the second filament 110b.
- the power supply unit 130 includes a heating current supply unit 131, a bias supply unit 132, and a deflection power supply (deflection current supply unit) 133.
- the heating current supply unit 131 supplies a heating current for generating an electron beam to one of the first filament 110a and the second filament 110b. As shown in FIG. 2, the heating current supply unit 131 includes a heating current power source 134, a thyristor 135, and a first heating current circuit 136.
- the heating current power supply 134 is composed of an AC power supply, and supplies a current having a predetermined frequency as a heating current.
- the heating current power supply 134 is configured to be able to supply, for example, a drive current of about 50 A at the maximum to the first heating current circuit 136 and the second heating current circuit 144.
- the thyristor 135 is configured to control conduction and non-conduction of the heating current supplied from the heating current power supply 134, to conduct the heating current in the driving state, and not to conduct the heating current in the non-driving state.
- the first heating current circuit 136 is connected to the first filament 110a.
- the first heating current circuit 136 is configured to be connectable to the heating current power source 134 by the switching unit 140 as described later.
- the first heating current circuit 136 includes a first transformer 137 that can convert the voltage value of the heating current.
- the first transformer 137 can be configured as a transformer for heating current, and may have, for example, a primary coil and a secondary coil, each having a different number of turns.
- the primary coil can be connected to the power supply 134 for heating current via the thyristor 135, and the secondary coil is connected to the first filament 110a.
- the first transformer 137 can convert the heating current (drive current) to an appropriate voltage value. Further, it is possible to prevent a high voltage bias voltage from being applied to the heating current power supply 134 on the primary coil side and the like to cause problems.
- the bias supply unit 132 applies a bias voltage to the heating current.
- a current obtained by applying a bias voltage to the heating current can drive the first filament 110a or the second filament 110b as a drive current.
- the bias supply unit 132 is selectively connected to one of the first heating current circuit 136 and the second heating current circuit 144 by the switching unit 140.
- the bias supply unit 132 includes a bias power source 138 and a resistor 139.
- the bias power source 138 is configured by a DC power source, and the positive electrode side is connected to the resistance element 139 and the negative electrode side is connected to the heating current supply unit 131.
- One of the resistors 139 is connected to the positive electrode side of the bias power supply 138 and the other is maintained at the ground potential, and may have a resistance value of, for example, about 3 ⁇ .
- the bias power source 138 and the resistor 139 can apply a negative high voltage of about 10 kV, for example, as a bias to the heating current.
- the deflection power supply 133 functions as a deflection current supply unit according to the present embodiment, and supplies current to one of the first deflection coil 120a and the second deflection coil 120b.
- the deflection power supply 133 may be configured by superimposing an AC power supply having a predetermined frequency on a DC power supply. As a result, constant current control becomes possible, and a constant deflection magnetic field can be generated even when the temperature of the first and second deflection coils 120a and 120b rises.
- the deflection power source 133 is selectively connected to one of the first deflection coil 120 a and the second deflection coil 120 b via the switching unit 140.
- the deflection power source 133 is configured to be able to supply a current of about 1.5 A at the maximum to the first and second deflection coils 120a and 120b, for example.
- the switching unit 140 is configured to be able to selectively switch between a first state in which driving current is supplied to the first filament 110a and a second state in which driving current is supplied to the second filament 110b. . That is, the switching unit 140 is configured to be able to selectively switch the supply of the heating current between the first filament 110a and the second filament 110b.
- the first state is a state where the first electron beam B1 is generated by the first filament 110a
- the second state is the case where the second electron beam B2 is generated by the second filament 110b.
- the switching unit 140 includes a heating current switching unit 141, a bias switching unit 142, a deflection current switching unit 143, and a second heating current circuit 144.
- the second heating current circuit 144 is configured similarly to the first heating current circuit 136 and is connected to the second filament 110b.
- the second heating current circuit 144 is configured to be connected to the heating current power supply 134 of the power supply unit 130 by the heating current switching unit 141.
- the second heating current circuit 144 includes a second transformer 145 that can convert the voltage value of the heating current.
- the second transformer 145 can be configured as a transformer for heating current.
- the second transformer 145 may have a primary coil and a secondary coil with different numbers of turns.
- the primary coil can be connected to the power supply 134 for heating current
- the secondary coil is connected to the second filament 110b.
- the second transformer 145 can convert the voltage value of the heating current (drive current) into an appropriate voltage value. Further, it is possible to prevent a high voltage bias voltage from being applied to the heating current power supply 134 on the primary coil side and the like to cause problems.
- the heating current switching unit 141, the bias switching unit 142, and the deflection current switching unit 143 can be configured by, for example, a relay, an electromagnetic contactor, an SSR (Solid-State Relay) that is a semiconductor relay, or the like.
- a relay an electromagnetic contactor
- SSR Solid-State Relay
- the heating current switching unit 141 connects the heating current power source 134 and the first heating current circuit 136 in the first state, and connects the heating current power source 134 and the second heating current circuit 144 in the second state. Connecting.
- the heating current switching unit 141 includes a first contact 141a, a second contact 141b, and a switch member 141c.
- the first contact 141a includes a fixed contact connected to the first heating current circuit 136, and is connected to the primary coil side of the first transformer 137, for example.
- the second contact 141b includes a fixed contact connected to the second heating current circuit 144, and is connected to the primary coil side of the second transformer 145, for example.
- the switch member 141c is connected to the heating current power source 134 and includes a movable contact.
- the movable contact of the switch member 141c is connected to the first contact 141a in the first state. As a result, the heating current supplied from the heating current power supply 134 flows to the first heating current circuit 136. On the other hand, the movable contact of the switch member 141c is connected to the second contact 141b in the second state. As a result, the heating current supplied from the heating current power supply 134 flows to the second heating current circuit 144.
- the bias switching unit 142 connects the bias supply unit 132 and the first heating current circuit 136 in the first state, and connects the bias supply unit 132 and the second heating current circuit 144 in the second state.
- the bias switching unit 142 includes a first contact 142a, a second contact 142b, and a switch member 142c.
- the first contact 142a includes a fixed contact connected to the first heating current circuit 136, and is connected to the secondary coil side of the first transformer 137, for example.
- the second contact 142b includes a fixed contact connected to the second heating current circuit 144, and is connected to the secondary coil side of the second transformer 145, for example.
- the switch member 142c is connected to the bias power source 138 of the bias supply unit 132 and includes a movable contact.
- the movable contact of the switch member 142c is connected to the first contact 142a in the first state. As a result, the bias voltage supplied from the bias supply unit 132 is supplied to the first heating current circuit 136. On the other hand, the movable contact of the switch member 142c is connected to the second contact 142b in the second state. As a result, the bias voltage supplied from the bias supply unit 132 is supplied to the second heating current circuit 144.
- the deflection current switching unit 143 connects the deflection power source 133 and the first deflection coil 120a in the first state, and connects the deflection power source 133 and the second deflection coil 120b in the second state.
- the deflection current switching unit 143 includes a first contact 143a, a second contact 143b, and a switch member 143c.
- the first contact 143a includes a fixed contact connected to the first deflection coil 120a.
- the second contact 143b includes a fixed contact connected to the second deflection coil 120b.
- the switch member 143c is connected to the deflection power source 133 and includes a movable contact.
- the movable contact of the switch member 143c is connected to the first contact 143a in the first state. As a result, the current supplied from the deflection power supply 133 is supplied to the first deflection coil 120a. On the other hand, the movable contact of the switch member 143c is connected to the second contact 143b in the second state. As a result, the current supplied from the deflection power supply 133 is supplied to the second deflection coil 120b.
- each element may include one fixed contact and one movable contact (see the bias switching unit 142 and the deflection current switching unit 143 in FIG. 2), or two of each. Good (see heating current switching unit 141 in FIG. 2).
- the detection unit 160 includes a driving current flowing through the first heating current circuit 136 and the second heating current circuit 144, a bias voltage applied to the first heating current circuit 136 and the second heating current circuit 144, and the first The current flowing through the deflection coil 120a and the second deflection coil 120b can be detected. That is, the detection unit 160 includes a first drive current detection unit 161a, a second drive current detection unit 161b, a bias voltage detection unit 162, a first deflection current detection unit 163a, and a second deflection current detection unit. 163b.
- the first drive current detection unit 161a and the second drive current detection unit 161b are provided in the first heating current circuit 136 and the second heating current circuit 144, respectively.
- the first drive current detection unit 161a is provided, for example, between the heating current switching unit 141 and the first transformer 137
- the second drive current detection unit 161b is, for example, the heating current switching unit 141 and the second It is provided between the transformer unit 145.
- a current transformer (CT) can be used for the first drive current detector 161a and the second drive current detector 161b.
- the bias voltage detection unit 162 is configured to be able to detect a bias voltage.
- the bias voltage detection unit 162 is provided between the bias switching unit 142 and the first heating current circuit 136 and between the bias switching unit 142 and the second heating current circuit 144, respectively.
- the bias voltage detection unit 162 is configured to be able to detect a voltage by, for example, a voltage dividing resistor, and specifically, a first resistor, a second resistor connected to the first resistor, and a ground potential. And a voltage detector connected between the first and second resistors.
- the first deflection current detection unit 163a is provided, for example, between the deflection current switching unit 143 and the first deflection coil 120a, and the second deflection current detection unit 163b is configured by the deflection current switching unit 143 and the second deflection coil. 120b is provided.
- a low resistor, a Hall element type current sensor, or the like can be used for the first deflection current detector 163a and the second deflection current detector 163b.
- control unit 150 controls switching between the first state and the second state.
- the control unit 150 is configured to be able to control the driving of each component of the power supply unit 130 and the switching unit 140 based on a control signal generated by the main controller 5 of the vacuum evaporation apparatus 1.
- the control unit 150 may be configured as a part of the main controller 5 or may be an independent configuration. In the case of an independent configuration, the control unit 150 may be configured by a computer having hardware such as a CPU (Central Processing Unit), a RAM (Random Access Memory), and a ROM (Read Only Memory).
- CPU Central Processing Unit
- RAM Random Access Memory
- ROM Read Only Memory
- the control unit 150 drives the heating current power source 134 and the deflection power source 133 and sets the thyristor 135 to the driving state. Further, the switch members 141c, 142c, and 143c of the heating current switching unit 141, the bias switching unit 142, and the deflection current switching unit 143 are connected to the first contacts 141a, 142a, and 143a, respectively. As a result, a drive current is supplied to the filament 110a to generate the first electron beam B1, and the first electron beam B1 is deflected by the first deflection coil 120a.
- the control unit 150 drives the heating current power source 134 and the deflection power source 133 and sets the thyristor 135 to a driving state. Further, the switch members 141c, 142c, and 143c of the heating current switching unit 141, the bias switching unit 142, and the deflection current switching unit 143 are connected to the second contacts 141b, 142b, and 143b, respectively. As a result, a drive current is supplied to the filament 110b to generate the second electron beam B2, and the second electron beam B2 is deflected by the deflection coil 120b.
- control unit 150 is configured to drive the current flowing through the first heating current circuit 136 and the second heating current circuit 144 based on the detection result of the detection unit 160 during the vapor deposition, as well as the first deflection coil 120a and The current flowing through the second deflection coil 120b is configured to be monitored. Specifically, the control unit 150 determines the currents of the first heating current circuit 136 and the second heating current circuit 144 based on outputs from the first driving current detection unit 161a and the second driving current detection unit 161b. The presence or absence of current flowing through the first deflection coil 120a and the second deflection coil 120b based on the outputs from the first deflection current detection unit 163a and the second deflection current detection unit 163b Can be determined.
- FIG. 3 is a flowchart illustrating an operation example of the control unit 150.
- the switching unit (ST100) that switches between the first state and the second state is performed, and then the current monitoring step (ST200) is performed during the vapor deposition in the vacuum vapor deposition apparatus 1.
- the switching process (ST100) includes the following ST101 to 110, and the current monitoring process (ST200) includes the following ST201 to 203.
- control unit 150 switches between the first state and the second state in order to switch from the state in which one electron beam is irradiated to the state in which the other electron beam is irradiated (ST100).
- Control unit 150 periodically determines whether a switching control signal generated by main controller 5 has been received (ST101). When the switching control signal has not been received (No in ST101), the reception of the switching control signal is again determined (ST101). When the switching control signal is received (Yes in ST101), control unit 150 determines whether bias supply unit 132 has stopped supplying the bias voltage based on the output from bias voltage detection unit 162 (ST102). ). If not stopped (No in ST102), the process based on the switching control signal is not performed, and the reception of the switching control signal is determined again (ST101).
- control section 150 determines whether or not the supply of current from deflection power supply 133 is stopped based on the outputs from first deflection current detection section 163a and second deflection current detection section 163b (ST104). ).
- a switching signal for selectively switching between the first state and the second state is transmitted to the switching unit 140.
- the heating current switching unit 141, the bias switching unit 142, and the deflection current switching unit 143 of the switching unit 140 that has received the switching signal switch the contact point to which the switch members 141c, 142c, and 143c are connected to the other contact point. , To switch between the first state and the second state.
- the power supply unit 130 stops the supply of the heating current from the heating current supply unit 131 by stopping the driving of the heating current power source 134 and not driving the thyristor 135.
- the control unit 150 After transmitting the switching signal to the switching unit 140, the control unit 150 transmits a signal for starting the supply of current to the deflection current switching unit 143 (ST106), and the first deflection coil 120a and the second deflection coil 133 are transmitted from the deflection power source 133. It is determined whether or not the supply of current to any one of the deflection coils 120b is started (ST107). If it has been started (Yes in ST107), similarly, it is determined whether or not supply of a bias voltage from the bias supply unit 132 to one of the first and second heating current circuits 136 and 144 has started. (ST108). If it has been started (Yes in ST108), it is determined that the switching has been completed, and the information is output to the main controller 5 (ST109).
- vapor deposition by the vacuum vapor deposition apparatus 1 is started, and the control unit 150 monitors the current path (ST200). That is, it is determined whether or not a current is flowing through one of the first heating current circuit 136 and the second heating current circuit 144 of the power supply unit 130 (ST201). When a current is flowing (Yes in ST201), the control unit 150 causes the first deflection coil 120a or the second heating current circuit 136 or the second heating current circuit 144 corresponding to the current to flow. It is determined whether or not a current is flowing through the deflection coil 120b (ST202). If current is flowing (Yes in ST202), control unit 150 continues operation of power supply unit 130, returns to ST201 again, and continues monitoring the current path (ST201).
- the first heating current circuit 136 or the second heating current circuit 144 when no current is flowing in either the first heating current circuit 136 or the second heating current circuit 144 (No in ST201), the first heating current circuit 136 or the second heating current circuit 144 is When no current flows through the corresponding first deflection coil 120a or second deflection coil 120b (No in ST202), the switching unit 140 may not be switched normally, so the power supply unit A switching abnormality signal is transmitted to 130 (ST203). As a result, the power supply unit 130 stops supplying the heating current from the heating current supply unit 131.
- control unit 150 causes the switching unit 140 to perform switching only when the supply of the bias voltage and the supply of the current from the deflection power supply 133 are stopped. Thereby, it is possible to perform switching safely while minimizing the risk of discharge or the like in the switching units 141, 142, and 143 of the switching unit 140.
- the controller 150 monitors the current path of the power supply unit 130 during vapor deposition. As a result, not only the switching instruction to the switching unit 140 but also whether or not the switching is actually performed can be confirmed. Therefore, it is possible to reduce the risk of film formation troubles due to failure of the switching units 141, 142, and 143 of the switching unit 140.
- control unit 150 confirms whether or not a current flows through the first and second deflection coils 120a and 120b corresponding to the first and second heating current circuits 136 and 144 by monitoring a current path. It becomes possible. As a result, the trajectory of the switched electron beam can be reliably controlled.
- the electron gun apparatus 100 having the above-described configuration is configured to generate the first and second electron beams B1 and B2 corresponding to the two evaporation materials 31a and 31b, respectively.
- a configuration having only the heating power source 134 and one deflection power source 133 is possible.
- the effects of the present embodiment will be described with reference to a comparative example.
- FIG. 4 is a circuit diagram of an electron gun apparatus 400 according to a comparative example of the present embodiment. Similar to the electron gun device 100, the electron gun device 400 is configured to be capable of alternately emitting the first electron beam B1 and the second second electron beam B2.
- the electron gun device 400 includes first and second filaments 410a and 410b, first and second heating current supply units 431a and 431b, a bias supply unit 432, first and second deflection power sources 433a, 433b, first and second deflection coils 420a and 420b, and a bias switching unit 460.
- the main difference from the electron gun apparatus 100 is that it has two heating current supply parts 431a and 431b and two deflection power sources 433a and 433b. Since the other points have the same configuration as that of the electron gun apparatus 100, the description thereof is omitted or simplified.
- the two heating current supply units 431a and 431b have heating current power sources 434a and 434b, respectively, and are connected to the first and second filaments 410a and 410b.
- the bias switching unit 460 is configured in the same manner as the bias switching unit 142 of the electron gun apparatus 100. That is, the bias supply unit 432 and the heating current supply unit 431a are connected in the first state in which the first electron beam B1 is emitted, and the bias supply unit in the second state in which the second electron beam B2 is emitted. 432 and the heating current supply unit 431b are connected.
- the electron gun apparatus 400 in the first state, one heating current power source 434a and the deflection current supply unit 433a are driven, but the other heating current power source 434b and the deflection power source 433b are stopped. In the second state, this is the opposite state. Therefore, even during the vapor deposition, one of the heating current power source and the deflection power source is always stopped, resulting in excessive facilities. Such an excess of equipment increases not only the cost of equipment installation but also the maintenance cost of the equipment and increases the installation space of the equipment.
- the electron gun apparatus 100 can be configured to have only one heating current supply unit 131 (heating current power supply 134) and a deflection power supply 133 by the switching unit 140. Therefore, even when the first and second electron beams B1 and B2 are emitted alternately, it is possible to simplify the equipment and solve the problem of equipment cost and installation space.
- the electron gun apparatus 100 can switch the path of the heating current by the heating current switching unit 141 before the high voltage bias is applied. If a high voltage is applied to the heating current switching unit 141, contact welding due to arc discharge may occur. Therefore, with the above-described configuration, it is possible to prevent the heating current switching unit such as contact welding from being troubled, and the heating current switching unit 141 can be configured with a relatively simple relay, electromagnetic contactor, or the like.
- FIG. 5 is a schematic view showing a vacuum deposition apparatus of a reference example of the present embodiment.
- the vacuum vapor deposition apparatus 6 includes two chambers 7 and 8, a first evaporative material holding unit 9 a, a second evaporative material holding unit 9 b, and an electron gun device 600.
- a first evaporation material holding part 9a holding the first evaporation material 91a and a second evaporation material holding part 9b holding the second evaporation material 91b are arranged, respectively. ing.
- the electron gun apparatus 600 has the same configuration as that of the electron gun apparatus 100, and includes a first state in which the first electron beam B1 is emitted to the chamber 7 and a second state in which the second electron beam B2 is emitted to the chamber 8. Selectively switch between states.
- configurations of the support unit, the main controller, and the like are omitted.
- the vacuum vapor deposition apparatus 1 of the present embodiment since it is configured to have only one chamber 2, the first and second electron beams B1, B1 are placed in the chamber 2 in an appropriate atmosphere ready for vapor deposition. Either one of B2 can be emitted. Thereby, it can be set as a safer structure.
- FIG. 6 is a circuit diagram of an electron gun apparatus according to the second embodiment of the present invention. Similar to the first embodiment, the electron gun apparatus 200 includes a first filament 210a, a second filament 210b, a first deflection coil 220a, a second deflection coil 220b, a power supply unit 230, a switching unit 240, and a control. Part 250 and connection part 260. The difference between the electron gun apparatus 200 and the electron gun apparatus 100 according to the first embodiment is that the switching unit 240 is configured to be detachable from the power supply unit 230 via the connection unit 260.
- the description of the same points as in the first embodiment will be omitted or simplified.
- the first filament 210a generates the first electron beam B1 as in the first embodiment.
- the first filament 210 a is connected to the first heating current circuit 236 of the power supply unit 230.
- the second filament 210b generates the second electron beam B2.
- the second filament 210 b is connected to the second heating current circuit 244 of the switching unit 240.
- the first deflection coil 220a functions as a first deflector as in the first embodiment, and deflects the first electron beam B1.
- the second deflection coil 220b functions as a second deflector and deflects the second electron beam B2.
- the first deflection coil 220 a and the second deflection coil 220 b are both connected to the deflection power source 233 via the deflection current switching unit 243 of the switching unit 240.
- the power supply unit 230 includes a heating current supply unit 231, a bias supply unit 232, and a deflection power supply (deflection current supply unit) 233.
- the heating current supply unit 231 supplies a heating current for generating an electron beam to one of the first filament 210a and the second filament 210b, and for the heating current as in the first embodiment.
- a power source 234, a thyristor 235, and a first heating current circuit 236 are included. Similar to the first embodiment, the first heating current circuit 236 includes a first transformer 237 that can convert the voltage value of the heating current.
- the bias supply unit 232 includes a bias power source 238 and a resistor 239, and applies a bias voltage to the heating current.
- the deflection power source 233 supplies a current to one of the first deflection coil 220a and the second deflection coil 220b.
- the switching unit 240 is configured to be able to selectively switch between a first state in which driving current is supplied to the first filament 210a and a second state in which driving current is supplied to the second filament 210b.
- the switching unit 240 includes a heating current switching unit 241, a bias switching unit 242, a deflection current switching unit 243, and a second heating current circuit 244.
- the second heating current circuit 244 is connected to the second filament 210b as in the first embodiment.
- the second heating current circuit 244 includes a second transformer 245 that can convert the voltage value of the heating current.
- the heating current switching unit 241 connects the heating current power source 234 and the first heating current circuit 236 in the first state, and connects the heating current power source 234 and the second heating current circuit 244 in the second state. Connecting.
- the heating current switching unit 241 includes a first contact 241a, a second contact 241b, and a switch member 241c.
- the bias switching unit 242 connects the bias supply unit 232 and the first heating current circuit 236 in the first state, and connects the bias supply unit 232 and the second heating current circuit 244 in the second state.
- the bias switching unit 242 includes a first contact 242a, a second contact 242b, and a switch member 242c.
- the deflection current switching unit 243 connects the deflection power source 233 and the first deflection coil 220a in the first state, and connects the deflection power source 233 and the second deflection coil 220b in the second state.
- the deflection current switching unit 243 includes a first contact 243a, a second contact 243b, and a switch member 243c.
- the control unit 250 controls switching between the first state and the second state.
- the control unit 250 is configured to be able to selectively switch between a switching mode and a two-source mode when a second power supply unit 280 described later is connected.
- the switching mode is selected.
- control may be performed so that one of the first electron beam B1 and the second electron beam B2 is emitted, and the same operation as in the first embodiment may be configured.
- the current flowing through the first deflection coil 220a and the second deflection coil 220b and the currents of the first heating current circuit 236 and the second heating current circuit 244 may be monitored.
- the electron gun apparatus 200 may include a detection unit having the same configuration as that of the first embodiment.
- connection unit 260 Next, the configuration of the connection unit 260 will be described.
- FIG. 7 is a principal circuit diagram showing the configuration of the connection unit 260 and the connection relationship.
- FIG. 7 shows only a part of the circuit diagram of FIG. 6 in order to show the connection relationship between the connection portion 260 and each element.
- the connection unit 260 includes a power supply unit side terminal unit 261 connected to the power supply unit 230 and a switching unit side terminal unit 262 connected to the switching unit 240.
- the power supply unit side terminal portion 261 includes a first terminal 261a, a second terminal 261b, a third terminal 261c, a fourth terminal 261d, a fifth terminal 261e, and a sixth terminal. Terminal 261f. Further, the switching unit side terminal portion 262 also includes the first terminal 262a, the second terminal 262b, the third terminal 262c, the fourth terminal 262d, the fifth terminal 262e, and the sixth terminal 262f. Including. Between the first terminal 261a and the first terminal 262a, between the second terminal 261b and the second terminal 262b, between the third terminal 261c and the third terminal 262c, the fourth terminal 261d and the fourth terminal 262d.
- the fifth terminal 261e and the fifth terminal 262e, and the sixth terminal 261f and the sixth terminal 262f are configured to be mutually connectable.
- Each of these terminals 261a to 261f, 262a to 262f may be configured by a spring terminal or the like, or the corresponding terminal may be configured to be connectable by a screw or the like.
- the first terminal 261a of the power supply unit side terminal portion 261 is connected to the heating current power source 234.
- the first terminal 262 a of the switching unit side terminal part 262 is connected to the switch member 241 c of the heating current switching part 241.
- the power supply unit side terminal portion 261 and the second terminal 261 b are connected to the first heating current circuit 236.
- the second terminal 262 b of the switching unit side terminal part 262 is connected to the first contact 241 a of the heating current switching part 241.
- the third terminal 261 c of the power supply unit side terminal portion 261 is connected to the first heating current circuit 236.
- the third terminal 262 c of the switching unit side terminal part 262 is connected to the first contact 242 a of the bias switching part 242.
- the fourth terminal 261 d of the power supply unit side terminal part 261 is connected to the bias supply part 232.
- the fourth terminal 262 d of the switching unit side terminal part 262 is connected to the switch member 242 c of the bias switching part 242.
- the fifth terminal 261e of the power supply unit side terminal portion 261 is connected to the deflection power supply 233.
- the fifth terminal 262e of the switching unit side terminal part 262 is connected to the switch member 243c of the deflection current switching part 243.
- the sixth terminal 261f of the power supply unit side terminal portion 261 is connected to the first deflection coil 220a.
- the sixth terminal 262f of the switching unit side terminal part 262 is connected to the first contact 243a of the deflection current switching part 243.
- the terminals 261a to 261f of the power supply unit side terminal portion 261 may be configured to be exposed and disposed in a part of a housing (not shown) of the power supply unit 230, for example.
- each of the terminals 262a to 262f of the switching unit side terminal portion 262 may be disposed so as to be exposed at a part of a casing (not shown) of the switching unit 240.
- the respective terminals 261a to 261f of the power supply unit side terminal portion 261 are arranged corresponding to the respective terminals 262a to 262f of the switching unit side terminal portion 262.
- the switching unit 240 can be detachably connected to the power supply unit 230 by the connecting portion 260 having the above-described configuration. Specifically, for example, by inserting the switching unit side terminal part 262 into the power supply unit side terminal part 261, the terminals 261a to 261f of the power supply unit side terminal part 261 and the terminals 262a of the switching unit side terminal part 262 are provided. To 262f are connected.
- this embodiment can also contribute to simplification of an installation similarly to 1st Embodiment.
- connection unit 260 allows the power supply unit 230 and the switching unit 240 to be handled separately during storage or transportation. As a result, the space for storage and transportation can be reduced, and the handleability can be improved.
- the power supply unit 230 may have a connection switching unit 270.
- the connection switching unit 270 is connected to the power unit side terminal unit 261 so that the power unit terminal unit 261 and the switching unit terminal unit 262 can be connected, the heating current supply unit 231 and the first filament 210a. Switches between the closed circuit states constituting the closed circuit without passing through the switching unit 240. 6 and 7 show a mode in which the power supply unit side terminal portion 261 is switched to the switching unit connection state. A specific configuration of the connection switching unit 270 will be described later.
- the second power supply unit 280 can be connected to the power supply unit 230 instead of the switching unit 240, and the electron gun apparatus 300 can be configured.
- FIG. 8 is a circuit diagram of an electron gun apparatus 300 according to a reference example of the present embodiment.
- the electron gun apparatus 300 includes a first power supply unit 230 and a second power supply unit 280.
- the first power supply unit 230 has the same configuration as that of the power supply unit 230 of the electron gun apparatus 200, and therefore will be described using the same reference numerals as those of the power supply unit 230.
- the first power supply unit 230 is connected to the first filament 210a and configured to be able to supply a drive current for generating the first electron beam B1.
- the second power supply unit 280 is connected to the second filament 210b and configured to be able to supply a drive current for generating the second electron beam B2. That is, the electron gun apparatus 300 is configured to be able to emit the first electron beam B1 and the second electron beam B2 alternately or simultaneously.
- the heating current supply unit 231 of the first power supply unit 230 supplies a heating current for generating the first electron beam B1 to the first filament 210a.
- the deflection power source 233 supplies power to the first deflection coil 220a.
- the bias supply unit 232 applies a bias voltage to the heating current. As will be described later, the bias supply unit 232 applies a bias voltage to at least one of the first heating current circuit 236 of the first power supply unit 230 and the second heating current circuit 286 of the second power supply unit 280. To do.
- the bias supply unit 232 is connected to the bias connection unit 282 of the second power supply unit 280, as will be described later.
- connection switching unit 270 includes a first connection switching unit 271 and a second connection switching unit 272, as shown in FIGS.
- the first connection switching unit 271 is configured to be able to switch the arrangement of the first terminal 261a and the second terminal 261b. Specifically, in the switching unit connection state, the first terminal 261a and the second terminal 261b are disposed so as to be exposed to a part of the casing (not shown) of the power supply unit 230 (see FIGS. 6 and 7). . On the other hand, in the closed circuit state, the first terminal 261a and the second terminal 261b are connected to each other (see FIG. 8).
- the configuration of the first connection switching unit 271 is not particularly limited, and may include, for example, an urging member connected to each of the first terminal 261a and the second terminal 261b (not shown).
- the urging member urges the first terminal 261a and the second terminal 261b, but with the insertion of the switching unit side terminal portion 262, the urging state is released, It may be configured to be switched to the switching unit connection state.
- the second connection switching unit 272 is configured to be able to switch the arrangement of the fifth terminal 261e and the sixth terminal 261f. Specifically, in the switching unit connected state, the fifth terminal 261e and the sixth terminal 261f are arranged so as to be exposed at a part of the casing (not shown) of the power supply unit 230 (see FIGS. 6 and 7). . On the other hand, in the closed circuit state, the fifth terminal 261e and the sixth terminal 261f are connected to each other (see FIG. 8).
- the specific configuration of the second connection switching unit 272 is not particularly limited, and may be configured similarly to the first connection switching unit 271, for example.
- the connection switching unit 270 switches the power supply unit side terminal unit 261 (see FIGS. 6 and 7) of the connection unit 260 to a closed circuit state when connecting the second power supply unit 280.
- the first power supply unit 230 includes a closed circuit including the heating power supply 234, the first transformer 237, and the first filament 210a, and a closed circuit including the deflection power supply 233 and the deflection coil 220a. Consists of two closed circuits.
- the second power supply unit 280 has a heating current supply unit 281, a bias connection unit 282, and a deflection power supply 283.
- the heating current supply unit 281 has a heating current power source 284, a thyristor 285, and a second heating current circuit 286, for example, similarly to the heating current supply unit 231, and the second filament 210b has second electrons.
- a heating current for generating the beam B2 is supplied.
- Second heating current circuit 286 includes a second transformer 287.
- the deflection power supply 283 supplies power to the second deflection coil 220b.
- the bias connection unit 282 is configured to be able to connect the bias supply unit 232 to at least one of the first heating current circuit 236 and the second heating current circuit 286.
- the bias connection unit 282 includes, for example, a first contact 282a, a second contact 282b, a first connection terminal 282c, a second connection terminal 282d, a first switch member 282e, and a second switch. Member 282f.
- the first contact point 282a is configured to be connectable to the first heating current circuit 236 via the first connection terminal 282c.
- the first connection terminal 282c is configured to be connectable to the third terminal 261c of the power supply unit side terminal portion 261.
- the second contact 282b is connected to the second heating current circuit 286.
- the second connection terminal 282d is configured to be connectable to the fourth terminal 261d of the power supply unit side terminal portion 261.
- the first switch member 282e and the second switch member 282f are both connected to the second connection terminal 282d.
- the first switch member 282e has a closed state connected to the first contact 282a and an open state not connected to the first contact 282a. In the closed state, the bias supply unit 232 and the first contact 282 a are connected, and a bias voltage is applied to the heating current of the first heating current circuit 236.
- the second switch member 282f has a closed state connected to the second contact 282b and an open state not connected to the second contact 282b. In the closed state, the bias supply unit 232 and the second contact 282 b are connected, and a bias voltage is applied to the heating current of the second heating current circuit 286.
- the bias voltage is the same as that of both the first heating current circuit 236 and the second heating current circuit 286. Applied to heating current. In this case, the sum of the voltage values of the bias voltages applied to the first and second heating current circuits 236 and 286 may be within the rated voltage range of the bias supply unit 232.
- the second power supply unit 280 has a closed circuit including a heating current power supply 284, a second transformer 287, and a second filament 210b, and a closed circuit including a deflection power supply 283 and a deflection coil 220b. It is configured to include two closed circuits.
- the control unit 250 selects the 2-source mode as described above.
- the control unit 250 has a first state in which the driving current is supplied to the first filament 210a, a second state in which the driving current is supplied to the second filament 210b, and the driving current to the first filament 210a. It is configured to be able to selectively switch between the third state supplied to both the filament 210a and the second filament 210b.
- the control unit 250 drives the heating current power source 234 and the deflection power source 233 and connects the first switch member 282e of the bias connection unit 282 and the first contact 282a.
- the first electron beam B1 is emitted by the drive current supplied to the first filament 210a, and the first electron beam B1 is deflected by the deflection coil 220a.
- the control unit 250 drives the heating current power source 284 and the deflection power source 283, and connects the second switch member 282f of the bias connection unit 282 and the second contact 282b.
- the second electron beam B2 is emitted by the drive current supplied to the second filament 210b, and the second electron beam B2 is deflected by the deflection coil 220b.
- the control unit 250 drives the first heating current power source 234, the second heating current power source 284, the first deflection power source 233, and the second deflection power source 283, as well as the bias.
- the first switch member 282e and the first contact 282a, and the second switch member 282f and the second contact 282b of the connection portion 282 are connected to each other. Accordingly, the first and second electron beams B1 and B2 are emitted by the drive current supplied to the first filaments 210a and 210b, and the first and second electron beams B1 and B1 are emitted by the deflection coils 220a and 210b. Each B2 is deflected.
- one of the switching unit 240 and the second power supply unit 280 can be selectively connected to the first power supply unit 230. That is, the electron gun apparatus 200 including the switching unit 240 can cope with the case where the first and second electron beams B1 and B2 are alternately generated, and the electron gun apparatus including the second power supply unit 280. By 300, it becomes possible to cope with the case where the first and second electron beams B1 and B2 are emitted simultaneously. That is, the first power supply unit 230 of the electron gun device 200 and the electron gun device 300 can be made common, and productivity can be improved, and any of the electron gun device 200 and the electron gun device 300 can be improved. It can easily respond to requests. In addition, the inventory space can be reduced.
- control unit 250 can be shared by the electron gun apparatuses 200 and 300 by the above-described mode switching, which can further contribute to productivity improvement and inventory space reduction.
- FIG. 9 is a circuit diagram of an electron gun apparatus according to the third embodiment of the present invention. Since the heating current switching unit 141 and the deflection current switching unit 143 switch a relatively low voltage current, an inexpensive relay or electromagnetic contactor can be used. On the other hand, when the bias voltage is switched, there is a tendency to be expensive because a vacuum relay or the like corresponding to a high voltage is used. Therefore, the present inventors pay attention to the fact that the electron beam is generated only when the bias voltage is superimposed on the heating current, and the bias voltage is always connected to both heating current circuits, and the heating current is switched without switching the bias voltage.
- the electron gun apparatus 500 has been conceived to switch the filament from which the electron beam is emitted by the switching.
- the electron gun apparatus 500 includes a first filament 110a, a second filament 110b, a first deflection coil 120a, a second deflection coil 120b, a power supply unit 530, a switching unit 540, a control unit 550, and a detection unit 160.
- the switching unit 540 does not have a bias switching unit.
- symbol is attached
- the electron gun apparatus 500 can be configured to emit either one of the first and second electron beams into one chamber as shown in FIG.
- the power supply unit 530 supplies a drive current for generating the electron beams B1 and B2 to one of the first filament 110a and the second filament 110b.
- the power supply unit 530 includes a heating current supply unit 131, a bias supply unit 532, and a deflection power supply (deflection current supply unit) 133.
- the bias supply unit 532 applies a bias voltage to the heating current.
- the bias supply unit 532 is connected to both the first heating current circuit 136 and the second heating current circuit 144.
- the bias supply unit 532 includes a bias power source 538 connected to both the first heating current circuit 136 and the second heating current circuit 144, and a resistor 539.
- the bias power source 538 and the resistor 539 have the same configuration as the bias power source 138 and the resistor 139, respectively, and thus description thereof is omitted.
- the switching unit 540 is configured to be able to selectively switch between a first state in which driving current is supplied to the first filament 110a and a second state in which driving current is supplied to the second filament 110b. . That is, the switching unit 540 is configured to be able to selectively switch the supply of the heating current between the first filament 110a and the second filament 110b.
- the switching unit 540 includes the heating current switching unit 141, the deflection current switching unit 143, and the second heating current circuit 144, but does not include the bias switching unit.
- the deflection current switching unit 143 can be disposed on the primary side of the first and second transformers 137 and 145 in the same manner as the heating current switching unit 141.
- resistance interlocks for detecting coil defects may be provided in the vicinity of the first deflection coil 120a and the second deflection coil 120b.
- the resistance value interlock can detect a resistance failure by monitoring the voltage and current of the deflection coil.
- the deflection coil deteriorates with long-term use of the deflection coil, an interlayer short circuit between the windings occurs, and a coil failure that does not reach a prescribed magnetic field may occur.
- the resistance value interlock can detect such a coil failure by detecting an abnormal resistance value.
- the detection unit 160 includes a driving current flowing through the first heating current circuit 136 and the second heating current circuit 144, a bias voltage applied to the first heating current circuit 136 and the second heating current circuit 144, and the first The current flowing through the deflection coil 120a and the second deflection coil 120b can be detected. That is, the detection unit 160 includes a first drive current detection unit 161a, a second drive current detection unit 161b, a bias voltage detection unit 162, a first deflection current detection unit 163a, and a second deflection current detection unit. 163b.
- the bias voltage detection unit 162 is provided between at least one of the bias supply unit 532 and the first heating current circuit 136 and between the bias supply unit 532 and the second heating current circuit 144.
- the control unit 550 controls switching between the first state and the second state. Further, in the first state, the control unit 550 drives the heating current power source 134 and the deflection power source 133 and sets the thyristor 135 to the driving state. Further, the switch members 141c and 143c of the heating current switching unit 141 and the deflection current switching unit 143 are connected to the first contacts 141a and 143a, respectively. As a result, a drive current is supplied to the filament 110a to generate the first electron beam B1, and the first electron beam B1 is deflected by the first deflection coil 120a.
- the control unit 550 drives the heating current power source 134 and the deflection power source 133 and sets the thyristor 135 to the driving state. Further, the switch members 141c and 143c of the heating current switching unit 141 and the deflection current switching unit 143 are connected to the second contacts 141b and 143b, respectively. As a result, a drive current is supplied to the filament 110b to generate the second electron beam B2, and the second electron beam B2 is deflected by the deflection coil 120b.
- the bias is supplied from the bias supply unit 532 to the heating current regardless of whether the state is the first state or the second state.
- the drive current can be supplied to either the filament 110a or the filament 110b by switching in the heating current switching unit 141 without having a bias switching unit.
- control unit 550 is configured to drive the first heating current circuit 136 and the second heating current circuit 144, the first heating current circuit 136, and the second heating current circuit 136 based on the detection result of the detection unit 160.
- the bias voltage applied to the heating current circuit 144 and the current flowing through the first deflection coil 120a and the second deflection coil 120b can be monitored.
- the control unit 550 periodically determines whether a switching control signal generated by the main controller (see FIG. 1) has been received. When the switching control signal is received, the control unit 550 transmits a signal for stopping the supply of the bias voltage to the bias supply unit 532 and the signal for stopping the supply of current to the heating current power source 134. Send. The control unit 550 determines whether the supply of current from the heating current power supply 134 is stopped based on the outputs from the first drive current detection unit 161a and the second drive current detection unit 161b. If not stopped, the control unit 550 transmits an error signal to the power supply unit 530. As a result, the power supply unit 530 stops driving the heating current power supply 134 and stops the thyristor 135 from being driven, thereby stopping the supply of the heating current from the heating current supply unit 131.
- control unit 550 determines whether or not a bias voltage is applied based on the output from the bias voltage detection unit 162.
- a signal for stopping the supply of current is transmitted to the deflection power source 133 and output from the first deflection current detection unit 163a and the second deflection current detection unit 163b. Based on the above, it is determined whether or not the current supply from the deflection power source 133 is stopped.
- the control unit 550 transmits a switching signal for switching the contact to which the switch member 143c is connected to the other contact to the deflection current switching unit 143. To do.
- an error signal is transmitted to the power supply unit 530 without transmitting a switching signal.
- the control unit 550 After transmitting the switching signal, the control unit 550 transmits a signal for starting the supply of current to the deflection power source 133, and sets the current value of the deflection power source 133 to a predetermined value. Then, the control unit 550 controls the first deflection coil 120a and the second deflection coil 120b from the deflection power source 133 based on the outputs from the first deflection current detection unit 163a and the second deflection current detection unit 163b. It is determined whether or not a current is supplied to one desired deflection coil. If it is determined that no current is supplied to the desired deflection coil, the control unit 550 transmits an error signal to the power supply unit 530.
- the deflection current is switched in the operation example in a state where the deflection current is not supplied, problems such as contact welding of the deflection current switching unit 143 can be prevented. Further, the deflection current is switched in a state where no drive current is supplied, and after the drive current is switched, the first deflection current detection unit 163a and the second deflection current detection unit 163b can perform a desired deflection coil. It can be determined whether or not a current is supplied to. Thereby, an electron beam is prevented from being emitted in an unintended direction, and the electron gun apparatus 500 can be operated more safely.
- the control unit 550 determines whether or not the heating current power supply 134 is stopped. When it is determined that the current is not driven, the control unit 550 further performs the first drive. Based on the outputs from the current detection unit 161a and the second drive current detection unit 161b, it is determined whether or not the supply of current from the heating current power supply 134 is stopped. If not stopped, the control unit 550 transmits an error signal to the power supply unit 530.
- the control unit 550 transmits a switching signal for switching the contact with which the switch member 141c is connected to the other contact to the heating current switching unit 141, and the current value of the heating current power supply 134 is Is set to a predetermined value. Thereafter, the control unit 550 sets a desired circuit among the first and second heating current circuits 136 and 144 based on outputs from the first drive current detection unit 161a and the second drive current detection unit 161b. It is determined whether a heating current is supplied. If not supplied, an error signal is transmitted to the power supply unit 530. Thus, since the switching of the heating current in this operation example can be performed in a state where no heating current is supplied, problems such as contact welding of the heating current switching unit 141 can be prevented.
- Device 500 can be operated.
- the control unit 550 transmits a signal for starting driving to the bias supply unit 532. Then, the control unit 550 determines whether a bias voltage is applied based on the output from the bias voltage detection unit 162. If it is determined that the bias voltage is applied, the switching is completed and the information is output to the main controller.
- the bias supply unit 532 is connected to both the first and second heating current circuits 136 and 144, the heating current switching unit can be switched without switching the bias voltage.
- the filament that emits the electron beam can be switched.
- the bias switching unit is not provided, it is possible to eliminate risks such as arc discharge in the bias switching unit and contact welding due thereto.
- either one of the first and second electron beams can be emitted into one chamber. Therefore, an electron beam can be emitted to a chamber having an appropriate atmosphere ready for vapor deposition, and a safer configuration can be obtained.
- the control unit 550 stops supplying the current from the deflection power source 133 based on the outputs from the first deflection current detection unit 163a and the second deflection current detection unit 163b. It can be determined whether or not. Thereby, switching in the energized state in the deflection current switching unit 143 can be prevented, and contact failure of the deflection current switching unit 143 due to arc discharge or the like can be prevented.
- the resistance value of the deflection current circuit may become an abnormally high value at the moment of switching.
- the resistance value interlock detects an abnormal value and determines that the coil is defective. There is a risk of being. Therefore, according to the present embodiment, such a misjudgment can be prevented by performing a switching operation of the deflection current switching unit 143 after determining whether or not the current supply from the deflection power source 133 is stopped. It becomes possible.
- control part 550 can confirm whether it is an appropriate energization state with reference to the output from the detection part 160 after switching of the deflection current switching part 143 and the heating current switching part 141. .
- the control part 550 can confirm whether it is an appropriate energization state with reference to the output from the detection part 160 after switching of the deflection current switching part 143 and the heating current switching part 141. .
- the first and second heating current circuits may not have the first and second transformers.
- the bias power source of the bias supply unit is configured to be connectable between the heating current switching unit and the heating current power source, for example. Also good.
- the heating current supply unit has been described as having a thyristor, it may not be present, and may have other elements as necessary.
- the deflection current supply unit may include a deflection power supply, a thyristor, and the like.
- the first drive current detection unit 161 a and the second drive current detection unit 161 b are provided between the heating current switching unit 141 and the first and second transformers 137 and 145. In addition to being provided, for example, it may also be provided on the high voltage (secondary) side of the first transformer 137 and the second transformer 145, respectively.
- connection switching unit 270 is described. However, a configuration without the connection switching unit 270 is also possible.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Toxicology (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
上記第1のフィラメントは、第1の電子ビームを発生することが可能である。
上記第2のフィラメントは、第2の電子ビームを発生することが可能である。
上記電源ユニットは、上記第1のフィラメント及び上記第2のフィラメントのうちのいずれか一方に電子ビームを発生させるための加熱電流を供給する加熱電流供給部と、上記加熱電流にバイアス電圧を印加するバイアス供給部とを有する。
上記切替ユニットは、上記加熱電流に上記バイアス電圧が印加された駆動電流を上記第1のフィラメントに供給する第1の状態と、上記駆動電流を上記第2のフィラメントに供給する第2の状態とを選択的に切り替えることが可能に構成される。
上記制御部は、上記第1の状態と上記第2の状態との切り替えを制御する。
上記第1のフィラメントは、第1の電子ビームを発生することが可能である。
上記第2のフィラメントは、第2の電子ビームを発生することが可能である。
上記電源ユニットは、上記第1のフィラメント及び上記第2のフィラメントのうちのいずれか一方に電子ビームを発生させるための加熱電流を供給する加熱電流供給部と、上記加熱電流にバイアス電圧を印加するバイアス供給部とを有する。
上記切替ユニットは、上記加熱電流に上記バイアス電圧が印加された駆動電流を上記第1のフィラメントに供給する第1の状態と、上記駆動電流を上記第2のフィラメントに供給する第2の状態とを選択的に切り替えることが可能に構成される。
上記制御部は、上記第1の状態と上記第2の状態との切り替えを制御する。
加熱電流用電源と、
上記第1のフィラメントに接続された第1の加熱電流回路を有し、
上記切替ユニットは、
上記第2のフィラメントに接続された第2の加熱電流回路と、
上記第1の状態で上記加熱電流用電源と第1の加熱電流回路とを接続し、上記第2の状態で上記加熱電流用電源と第2の加熱電流回路とを接続する加熱電流切替部とを有していてもよい。
上記第1の状態で上記バイアス供給部と上記第1の加熱電流回路とを接続し、上記第2の状態で上記バイアス供給部と上記第2の加熱電流回路とを接続するバイアス切替部をさらに有してもよい。
上記加熱電流の電圧値を変換することが可能な第1の変圧部を含み、
上記第2の加熱電流回路は、
上記加熱電流の電圧値を変換することが可能な第2の変圧部を含んでもよい。
上記第1の加熱電流回路及び上記第2の加熱電流回路のうちのいずれか一方に上記駆動電流が供給されているか否か判定し、
いずれにも上記駆動電流が供給されていない場合に、上記加熱電流用電源に対し上記加熱電流の供給を停止させてもよい。
上記バイアス供給部により上記加熱電流に上記バイアス電圧が印加されているか否かを判定し、上記バイアス電圧が印加されていない場合に、上記第1の状態と上記第2の状態とを切り替えてもよい。
上記第1の電子ビームを偏向させることが可能な第1の偏向器と、
上記第1の電子ビームを偏向させることが可能な第2の偏向器と
をさらに具備し、
上記電源ユニットは、
上記第1の偏向器及び上記第2の偏向器のうちのいずれか一方に電流を供給する偏向電流供給部をさらに有し、
上記切替ユニットは、
上記第1の状態で上記偏向電流供給部と第1の偏向器とを接続し、上記第2の状態で上記偏向電流供給部と第2の偏向器とを接続する偏向電流切替部を有してもよい。
上記偏向用電源供給部により上記第1の偏向器及び上記第2の偏向器のうちのいずれか一方に電流が供給されているか否かを判定し、
いずれにも上記電流が供給されていない場合に、上記第1の状態と上記第2の状態とを切り替えてもよい。
上記電源ユニットと上記切替ユニットとを着脱自在に接続する接続部をさらに具備してもよい。
上記接続部により、切替ユニットを後づけで接続することが可能となり、保管時や輸送時に電源ユニットと切替ユニットとを別個に取り扱うことが可能となる。したがって、保管や輸送を容易にし、取り扱い性を高めることができる。
上記支持部は、上記チャンバに配置され、基板を支持する。
上記第1の蒸発材料保持部は、上記チャンバに配置され、グランド電位に維持されて第1の蒸発材料を保持する。
上記第2の蒸発材料保持部は、上記チャンバに配置され、グランド電位に維持されて第2の蒸発材料を保持する。
上記電子銃装置は、第1のフィラメントと、第2のフィラメントと、電源ユニットと、切替ユニットと、制御部とを具備する。
上記第1のフィラメントは、上記第1の蒸発材料に対して第1の電子ビームを出射することが可能である。
上記第2のフィラメントは、上記第2の蒸発材料に対して第2の電子ビームを出射することが可能である。
上記電源ユニットは、上記第1のフィラメント及び上記第2のフィラメントのうちのいずれか一方に電子ビームを発生させるための加熱電流を供給する加熱電流供給部と、上記加熱電流にバイアス電圧を印加するバイアス供給部とを有する。
上記切替ユニットは、上記加熱電流に上記バイアス電圧が印加された駆動電流を上記第1のフィラメントに供給する第1の状態と、上記駆動電流を上記第2のフィラメントに供給する第2の状態とを選択的に切り替えることが可能に構成される。
上記制御部は、上記第1の状態と上記第2の状態との切り替えを制御する。
図1は、本発明の第1の実施形態に係る真空蒸着装置を示す概略図である。真空蒸着装置1は、チャンバ2、第1の蒸発材料保持部3a、第2の蒸発材料保持部3b、支持部4、メインコントローラ5及び電子銃装置100を備える。真空蒸着装置1は、第1の蒸発材料保持部3a、第2の蒸発材料保持部3bに保持された第1の蒸発材料31a及び第2の蒸発材料31bを、電子銃装置100を用いて加熱することで、第1の蒸発材料31a及び第2の蒸発材料31bを真空中で蒸発させ、基板W上に成膜するものである。
第1の蒸発材料保持部3a及び第2の蒸発材料保持部3b各々は、グランド電位に維持される。これにより、後述する第1のフィラメント110a及び第2のフィラメント110bに対して正の電位を維持することができる。
電子銃装置100は、第1のフィラメント110a、第2のフィラメント110b、第1の偏向コイル120a、第2の偏向コイル120b、電源ユニット130、切替ユニット140、制御部150及び検出部160を有する。電子銃装置100は、本実施形態において、第1の電子ビームB1及び第2の第2の電子ビームB2を交互に出射することで、基板W上に、蒸発材料31aを含む膜と、蒸発材料31bを含む膜とを交互に積層させることが可能に構成される。あるいは、電子銃装置100は、第1の電子ビームB1及び第2の第2の電子ビームB2のいずれか一方のみを連続的に出射する構成であってもよい。
第1の電子ビームB1の出射方法は特に限定されない。例えば、第1の電子ビームB1は、例えば、アノード中央に形成された孔等を介してチャンバ2内へ出射されてもよいし、第1のフィラメント110aに平行に設けられた上記アノードによって電気的に引き出され、第1のフィラメント110aと同電位であるウェネルト(図示せず)を介してチャンバ2内へ出射されてもよい。あるいは、第1のフィラメント110aから出射された熱電子を他のカソードに衝突させることで当該カソードから熱電子を放出させ、第1の電子ビームB1を発生させてもよい。また、このカソードとアノードとの間に、第1の電子ビームB1を集束させるためのウェネルト(図示せず)を設けてもよい。
第1のフィラメント110aは、本実施形態において、第1の蒸発材料31aに対して第1の電子ビームB1を出射する。
第2のフィラメント110bは、本実施形態において、第2の蒸発材料31bに対して第2の電子ビームB2を出射する。
図6は、本発明の第2の実施形態に係る電子銃装置の回路図である。電子銃装置200は、第1の実施形態と同様に、第1のフィラメント210a、第2のフィラメント210b、第1の偏向コイル220a、第2の偏向コイル220b、電源ユニット230、切替ユニット240、制御部250、及び接続部260を有する。電子銃装置200が第1の実施形態に係る電子銃装置100と異なる点は、切替ユニット240が、接続部260を介して電源ユニット230から着脱自在に構成される点である。以下、第1の実施形態と同様の点については、その説明を省略又は簡略化する。
図8は、本実施形態の参考例に係る電子銃装置300の回路図である。電子銃装置300は、第1の電源ユニット230と、第2の電源ユニット280とを有する。なお、第1の電源ユニット230は、電子銃装置200の電源ユニット230と同様の構成を有するため、電源ユニット230と同様の符号を用いて説明する。
図9は、本発明の第3の実施形態に係る電子銃装置の回路図である。
上述の加熱電流切替部141及び偏向電流切替部143は、比較的低電圧の電流を切り替えることから、安価なリレーや電磁接触器等を用いることができた。一方、バイアス電圧を切り替える場合には、高電圧に対応する真空リレー等を用いることから高価になる傾向があった。
そこで、本発明者らは、加熱電流にバイアス電圧が重畳されてはじめて電子ビームが発生されることに着目し、バイアス電圧は常時双方の加熱電流回路に接続され、バイアス電圧を切り替えずに加熱電流の切り替えによって電子ビームが出射されるフィラメントを切り替える電子銃装置500に想到した。
また、電子銃装置500は、本実施形態においても、図1に示すように1つのチャンバ内に第1及び第2の電子ビームのいずれか一方を出射する構成とすることができる。
抵抗不良を検知することができる。偏向コイルは、一般に、長期の使用によってコイル巻線の劣化が進み、巻線間の層間ショート等が発生し、規定の磁場に達しないコイル不良が発生するおそれがある。抵抗値インターロックは、異常な抵抗値を検出することでこのようなコイル不良を検出することができる。
このように、本動作例における偏向電流の切替は、偏向電流が供給されていない状態で行うため、偏向電流切替部143の接点溶着等の不具合を防止することができる。また、上記偏向電流の切替は、駆動電流が供給されていない状態で行い、かつ、駆動電流切替後に、第1の偏向電流検出部163a及び第2の偏向電流検出部163bにより、所望の偏向コイルに電流が供給されているか判定することができる。これにより、意図しない方向へ電子ビームが出射されることを防止し、より安全に電子銃装置500を運転することができる。
このように、本動作例における加熱電流の切替は、加熱電流が供給されていない状態で行うことができるため、加熱電流切替部141の接点溶着等の不具合を防止することができる。また、上記切替は、偏向電流が所望の偏向コイルに切り替えられた後に行うことができるため、加熱電流の供給後、意図しない方向へ電子ビームが出射されることを防止し、より安全に電子銃装置500を運転することができる。
さらに、バイアス切替部を有さないことから、バイアス切替部におけるアーク放電や、それに伴う接点の溶着等のリスクを排除することができる。
110a,210a…第1のフィラメント
110b,210b…第2のフィラメント
120a,220a…第1の偏向コイル(第1の偏向器)
120b,220b…第2の偏向コイル(第2の偏向器)
130,230,530…電源ユニット
131,231…加熱電流供給部
132,232…バイアス供給部
133,233…偏向電流供給部
134,234…加熱電流用電源
136,236…第1の加熱電流回路
137,237…第1の変圧部
140,240,540…切替ユニット
141,241…加熱電流切替部
142,242…バイアス切替部
143,243…偏向電流切替部
144,244…第2の加熱電流回路
145,245…第2の変圧部
150,250,550…制御部
260…接続部
Claims (11)
- 第1の電子ビームを発生することが可能な第1のフィラメントと、
第2の電子ビームを発生することが可能な第2のフィラメントと、
前記第1のフィラメント及び前記第2のフィラメントのうちのいずれか一方に電子ビームを発生させるための加熱電流を供給する加熱電流供給部と、前記加熱電流にバイアス電圧を印加するバイアス供給部とを有する電源ユニットと、
前記加熱電流に前記バイアス電圧が印加された駆動電流を前記第1のフィラメントに供給する第1の状態と、前記駆動電流を前記第2のフィラメントに供給する第2の状態とを選択的に切り替えることが可能に構成された切替ユニットと、
前記第1の状態と前記第2の状態との切り替えを制御する制御部と
を具備する電子銃装置。 - 請求項1に記載の電子銃装置であって、
前記加熱電流供給部は、
加熱電流用電源と、
前記第1のフィラメントに接続された第1の加熱電流回路とを有し、
前記切替ユニットは、
前記第2のフィラメントに接続された第2の加熱電流回路と、
前記第1の状態で前記加熱電流用電源と第1の加熱電流回路とを接続し、前記第2の状態で前記加熱電流用電源と第2の加熱電流回路とを接続する加熱電流切替部とを有する
電子銃装置。 - 請求項2に記載の電子銃装置であって、
前記切替ユニットは、
前記第1の状態で前記バイアス供給部と前記第1の加熱電流回路とを接続し、前記第2の状態で前記バイアス供給部と前記第2の加熱電流回路とを接続するバイアス切替部をさらに有する
電子銃装置。 - 請求項2又は3に記載の電子銃装置であって、
前記第1の加熱電流回路は、
前記加熱電流の電圧値を変換することが可能な第1の変圧部を含み、
前記第2の加熱電流回路は、
前記加熱電流の電圧値を変換することが可能な第2の変圧部を含む
電子銃装置。 - 請求項2に記載の電子銃装置であって、
前記バイアス供給部は、前記第1の加熱電流回路及び前記第2の加熱電流回路の双方に接続される
電子銃装置。 - 請求項2から5のいずれか一項に記載の電子銃装置であって、
前記制御部は、
前記第1の加熱電流回路及び前記第2の加熱電流回路のうちのいずれか一方に前記駆動電流が供給されているか否か判定し、
いずれにも前記駆動電流が供給されていない場合に、前記加熱電流用電源に対し前記加熱電流の供給を停止させる
電子銃装置。 - 請求項1から6のいずれか一項に記載の電子銃装置であって、
前記制御部は、
前記バイアス供給部により前記加熱電流に前記バイアス電圧が印加されているか否かを判定し、前記バイアス電圧が印加されていない場合に、前記第1の状態と前記第2の状態とを切り替える
電子銃装置。 - 請求項1から7のいずれか一項に記載の電子銃装置であって、
前記第1の電子ビームを偏向させることが可能な第1の偏向器と、
前記第1の電子ビームを偏向させることが可能な第2の偏向器と
をさらに具備し、
前記電源ユニットは、
前記第1の偏向器及び前記第2の偏向器のうちのいずれか一方に電流を供給する偏向電流供給部をさらに有し、
前記切替ユニットは、
前記第1の状態で前記偏向電流供給部と第1の偏向器とを接続し、前記第2の状態で前記偏向電流供給部と第2の偏向器とを接続する偏向電流切替部を有する
電子銃装置。 - 請求項8に記載の電子銃装置であって、
前記制御部は、
前記偏向用電源供給部により前記第1の偏向器及び前記第2の偏向器のうちのいずれか一方に電流が供給されているか否かを判定し、
いずれにも前記電流が供給されていない場合に、前記第1の状態と前記第2の状態とを切り替える
電子銃装置。 - 請求項1から9のいずれか一項に記載の電子銃装置であって、
前記電源ユニットと前記切替ユニットとを着脱自在に接続する接続部をさらに具備する
電子銃装置。 - 真空に維持されることが可能なチャンバと、
前記チャンバに配置され、基板を支持する支持部と、
前記支持部に対向して前記チャンバに配置され、グランド電位に維持されて第1の蒸発材料を保持する第1の蒸発材料保持部と、
前記支持部に対向して前記チャンバに配置され、グランド電位に維持されて第2の蒸発材料を保持する第2の蒸発材料保持部と、
電子銃装置と
を具備し、
前記電子銃装置は、
前記第1の蒸発材料に対して第1の電子ビームを出射することが可能な第1のフィラメントと、
前記第2の蒸発材料に対して第2の電子ビームを出射することが可能な第2のフィラメントと、
前記第1のフィラメント及び前記第2のフィラメントのうちのいずれか一方に電子ビームを発生させるための加熱電流を供給する加熱電流供給部と、前記加熱電流にバイアス電圧を印加するバイアス供給部とを有する電源ユニットと、
前記加熱電流に前記バイアス電圧が印加された駆動電流を前記第1のフィラメントに供給する第1の状態と、前記駆動電流を前記第2のフィラメントに供給する第2の状態とを選択的に切り替えることが可能に構成された切替ユニットと、
前記第1の状態と前記第2の状態との切り替えを制御する制御部とを有する
真空蒸着装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020167004895A KR20160035053A (ko) | 2013-12-20 | 2014-12-05 | 전자총 장치 및 진공 증착 장치 |
CN201480051603.2A CN105555994B (zh) | 2013-12-20 | 2014-12-05 | 电子枪装置以及真空蒸镀装置 |
JP2015553358A JP6232448B2 (ja) | 2013-12-20 | 2014-12-05 | 電子銃装置及び真空蒸着装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013-264142 | 2013-12-20 | ||
JP2013264142 | 2013-12-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2015092998A1 true WO2015092998A1 (ja) | 2015-06-25 |
Family
ID=53402377
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2014/006086 WO2015092998A1 (ja) | 2013-12-20 | 2014-12-05 | 電子銃装置及び真空蒸着装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6232448B2 (ja) |
KR (1) | KR20160035053A (ja) |
CN (1) | CN105555994B (ja) |
TW (1) | TWI568868B (ja) |
WO (1) | WO2015092998A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111607762B (zh) * | 2020-05-13 | 2021-03-16 | 北京航空航天大学 | 一种实现电子束物理气相沉积自动蒸发陶瓷靶材的装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11233059A (ja) * | 1998-02-19 | 1999-08-27 | Jeol Ltd | 電子ビーム発生装置 |
JP2000096215A (ja) * | 1998-09-25 | 2000-04-04 | Toshiba Corp | セラミック被覆製造装置とその製造方法及びセラミック被覆部材 |
JP2003014899A (ja) * | 2001-06-29 | 2003-01-15 | Nissin High Voltage Co Ltd | 多ヘッド電子線照射装置のビーム切れ検出運転継続機構 |
JP2005026112A (ja) * | 2003-07-03 | 2005-01-27 | Sony Corp | 電子銃の運用方法、電子銃を備えた電子ビーム装置 |
JP2005194552A (ja) * | 2004-01-05 | 2005-07-21 | Eiko Engineering Co Ltd | ハイブリッドebセルとそれを使用した成膜材料蒸発方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3397672A (en) * | 1965-11-10 | 1968-08-20 | United States Steel Corp | Control system for vapor-deposition coating apparatus |
CN100526500C (zh) * | 2007-10-31 | 2009-08-12 | 中国科学院上海光学精密机械研究所 | 电子束蒸发速率自动控制设备及其控制方法 |
CN100516285C (zh) * | 2007-12-06 | 2009-07-22 | 南开大学 | 电子束加热蒸发方法与装置及其用途 |
JP2013191353A (ja) * | 2012-03-13 | 2013-09-26 | Shimadzu Corp | 熱電界放出エミッタ電子銃 |
-
2014
- 2014-12-05 CN CN201480051603.2A patent/CN105555994B/zh active Active
- 2014-12-05 JP JP2015553358A patent/JP6232448B2/ja active Active
- 2014-12-05 WO PCT/JP2014/006086 patent/WO2015092998A1/ja active Application Filing
- 2014-12-05 KR KR1020167004895A patent/KR20160035053A/ko not_active Application Discontinuation
- 2014-12-12 TW TW103143555A patent/TWI568868B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11233059A (ja) * | 1998-02-19 | 1999-08-27 | Jeol Ltd | 電子ビーム発生装置 |
JP2000096215A (ja) * | 1998-09-25 | 2000-04-04 | Toshiba Corp | セラミック被覆製造装置とその製造方法及びセラミック被覆部材 |
JP2003014899A (ja) * | 2001-06-29 | 2003-01-15 | Nissin High Voltage Co Ltd | 多ヘッド電子線照射装置のビーム切れ検出運転継続機構 |
JP2005026112A (ja) * | 2003-07-03 | 2005-01-27 | Sony Corp | 電子銃の運用方法、電子銃を備えた電子ビーム装置 |
JP2005194552A (ja) * | 2004-01-05 | 2005-07-21 | Eiko Engineering Co Ltd | ハイブリッドebセルとそれを使用した成膜材料蒸発方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI568868B (zh) | 2017-02-01 |
KR20160035053A (ko) | 2016-03-30 |
TW201527565A (zh) | 2015-07-16 |
CN105555994B (zh) | 2018-05-29 |
JP6232448B2 (ja) | 2017-11-15 |
JPWO2015092998A1 (ja) | 2017-03-16 |
CN105555994A (zh) | 2016-05-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2341524B1 (en) | Emitter design including emergency operation mode in case of emitter-damage for medical x-ray application | |
EP2973638B1 (en) | Cold-cathode switching device and converter | |
JP6232448B2 (ja) | 電子銃装置及び真空蒸着装置 | |
JP4803941B2 (ja) | 間接的に加熱される陰極イオン源のための陰極組立体 | |
CN111088479B (zh) | e形多电子束蒸镀装置及电子枪电路 | |
US5856674A (en) | Filament for ion implanter plasma shower | |
KR100505040B1 (ko) | 이온 소스 및 이를 갖는 이온 주입 장치 | |
JP6264539B2 (ja) | X線管装置 | |
JP2007193950A (ja) | 放電安定性に優れた中空カソード放電ガン | |
WO2020190290A1 (en) | Systems and methods for fast-switching direct current circuit breaker | |
Delpech et al. | Maintenance and preparation of the 3.7 GHz LHCD system for WEST operation | |
JP2014107158A (ja) | 放射線発生装置 | |
US10741351B1 (en) | Multi-apertured conduction heater | |
JP2004296242A (ja) | X線高電圧装置 | |
Champion et al. | Techniques for Achieving High Reliability Operation of the Spallation Neutron Source High Power Radio-Frequency System | |
Moss et al. | Techniques for Achieving High Reliability Operation of the Spallation Neutron Source High Power Radio-Frequency System | |
JP2023170738A (ja) | 電子銃、3次元積層造形装置及び電子顕微鏡 | |
US20240194435A1 (en) | X-ray source with anode exchange arrangement, and associated method | |
US20230207246A1 (en) | Power supply device, microwave tube device, power supply method, and recording medium | |
KR20230052068A (ko) | 전자총 구동용 전원 시스템 | |
JP2020030944A (ja) | フィラメント回路及び電子顕微鏡 | |
JP2005274424A (ja) | 非走査型電子線照射装置 | |
JP2004014464A (ja) | ガス放電管の駆動方法 | |
US1723858A (en) | Circuit breaker | |
CN118658762A (zh) | 一种高效训管的x射线管和x射线管的训管方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 201480051603.2 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 14870834 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2015553358 Country of ref document: JP Kind code of ref document: A |
|
ENP | Entry into the national phase |
Ref document number: 20167004895 Country of ref document: KR Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 14870834 Country of ref document: EP Kind code of ref document: A1 |