WO2015046528A1 - Procédé de fabrication d'un substrat de verre pour disque magnétique, procédé de fabrication d'un disque magnétique et outil de dégrossissage - Google Patents

Procédé de fabrication d'un substrat de verre pour disque magnétique, procédé de fabrication d'un disque magnétique et outil de dégrossissage Download PDF

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Publication number
WO2015046528A1
WO2015046528A1 PCT/JP2014/075940 JP2014075940W WO2015046528A1 WO 2015046528 A1 WO2015046528 A1 WO 2015046528A1 JP 2014075940 W JP2014075940 W JP 2014075940W WO 2015046528 A1 WO2015046528 A1 WO 2015046528A1
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Prior art keywords
grinding
glass substrate
abrasive grains
magnetic disk
glass
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PCT/JP2014/075940
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English (en)
Japanese (ja)
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順平 深田
田村　健
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Hoya株式会社
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Application filed by Hoya株式会社 filed Critical Hoya株式会社
Priority to MYPI2016701089A priority Critical patent/MY188817A/en
Priority to JP2015539435A priority patent/JP6193387B2/ja
Priority to CN201480053025.6A priority patent/CN105580079B/zh
Priority to SG11201602377UA priority patent/SG11201602377UA/en
Publication of WO2015046528A1 publication Critical patent/WO2015046528A1/fr

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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Definitions

  • the present invention relates to a method for manufacturing a glass substrate for a magnetic disk mounted on a magnetic disk device such as a hard disk drive (HDD) and a method for manufacturing a magnetic disk.
  • a magnetic disk device such as a hard disk drive (HDD)
  • HDD hard disk drive
  • a magnetic disk as one of information recording media mounted on a magnetic disk device such as a hard disk drive (HDD).
  • a magnetic disk is configured by forming a thin film such as a magnetic layer on a substrate, and an aluminum substrate has been conventionally used as the substrate.
  • the ratio of the glass substrate capable of narrowing the distance between the magnetic head and the magnetic disk as compared with the aluminum substrate is gradually increasing.
  • the surface of the glass substrate is polished with high accuracy so as to increase the recording density so that the flying height of the magnetic head can be reduced as much as possible.
  • HDDs high recording capacity and lower prices. In order to achieve this, it is necessary to further improve the quality and cost of glass substrates for magnetic disks. It is coming.
  • high smoothness on the surface of the magnetic disk is indispensable for reducing the flying height (flying height) necessary for increasing the recording density.
  • a substrate surface with a high smoothness is required in the end. Therefore, it is necessary to polish the glass substrate surface with high accuracy.
  • further polishing is performed to reduce the surface roughness and microwaviness, thereby reducing the main surface. Has achieved extremely high smoothness.
  • a diamond pad is a diamond particle or agglomerates (concentrated abrasive grains) in which several diamond particles are hardened with a binder such as glass, and then a sheet using a support material such as a resin (for example, acrylic resin). It is fixed.
  • a resin layer containing diamond may be formed on the sheet, and then a groove may be formed in the resin layer to form a protrusion.
  • the diamond pad referred to here is not necessarily a general name, but is referred to as a “diamond pad” for convenience of explanation in this specification.
  • abrasive grains with a distorted shape are present between the surface plate and the glass and are non-uniform, so if the load on the abrasive grains is not constant and the load is concentrated, the surface of the surface plate Because of the low elasticity of cast iron, deep cracks enter the glass, the work-affected layer is deep, and the processing surface roughness of the glass also increases, so a large amount of removal was required in the subsequent mirror polishing process. It was difficult to reduce processing costs.
  • the abrasive grains are uniformly present on the surface of the sheet, so that the load is not concentrated, and in addition, the abrasive is fixed to the sheet using resin. Therefore, even if a load is applied to the abrasive grains, the high elastic action of the resin fixing the abrasive grains makes the cracks (deformed layer) on the processed surface shallow, and the processed surface roughness can be reduced. The load on the machine (such as machining allowance) is reduced, and processing costs can be reduced.
  • the surface roughness of the processed surface can be reduced, the load on the subsequent mirror polishing process is reduced, and the processing cost of the glass substrate is reduced.
  • reduction is possible, according to the study of the present inventors, it has been found that there are the following problems.
  • the present inventor also examined the cause, and found that uneven grinding, that is, partial grinding failure (a state where only a part of the glass substrate surface was ground and the rest was not ground) occurred. .
  • the above-mentioned defects are remarkably generated when a mirror-finished glass substrate produced by a float process or the like is processed, or when the abrasive grain size is reduced.
  • Patent Document 4 the fact that the execution pressure, that is, the processing rate is different between the upper and lower surface plates is used as it is, and the undulation is made uniform on the front and back surfaces of the substrate by reducing the undulation as the processing amount increases. It was converted.
  • Patent Document 4 it has been found that there are the following problems. In other words, processing with a difference in processing rate between the upper and lower surface plates as in the prior art is unstable, and even when the technique of Patent Document 4 is applied, Although the surface plate side was sufficiently ground, the surface of the lower surface plate side had a certain percentage of defects that the whole or part of the surface was not ground.
  • a glass substrate produced by the float process is usually a mirror surface having a surface roughness Ra of 5 nm or less, but it has also been found that the above-mentioned defects are remarkably generated when such a glass substrate having a mirror surface is processed.
  • the present invention has been made to solve such a conventional problem, and a first object of the present invention is to perform a stable grinding process in which grinding unevenness does not occur in a grinding process using fixed abrasive grains.
  • a method of manufacturing a glass substrate for a magnetic disk capable of reducing the occurrence rate of flatness defects after processing and capable of manufacturing a high-quality glass substrate, and a method of manufacturing a magnetic disk using the glass substrate obtained thereby, and A grinding tool suitable for the grinding process is provided.
  • the second object is to perform stable grinding even when there is a difference in the execution pressure between the upper and lower surface plates during grinding with fixed abrasive grains, and high quality. It is providing the manufacturing method of the glass substrate for magnetic discs which can manufacture this glass substrate, and the manufacturing method of a magnetic disc using the glass substrate obtained by it.
  • the present inventor has found that micro-waviness exists on the surface of the diamond pad provided with diamond abrasive grains (concentrated abrasive grains).
  • diamond abrasive grains Concentrated abrasive grains.
  • the present inventor has sought a solution capable of performing stable grinding by paying attention to the relationship between the protruding amount of the abrasive grains protruding from the concentrated abrasive grains and the micro waviness on the surface of the diamond pad. As a result, the present invention has been completed.
  • the present inventor makes processing unstable when continuously batch-processed, and the upper surface plate side of the glass substrate is often ground, and the surface of the lower surface plate side is wholly or partially.
  • Grinding is performed together with the grinding fluid, but the grinding fluid is inevitably concentrated on the lower surface plate during processing.
  • grinding waste sludge is generated with the grinding process.
  • the glass binder around the abrasive grains is a grinding scrap and a binder. Glass which is the same material is likely to adhere, and this is considered to occur particularly remarkably on the lower surface plate side, and the above-mentioned defects are likely to occur.
  • the present inventor cannot perform stable grinding by a method that uses the difference in execution pressure, that is, the machining rate as it is with the upper and lower surface plate as in the prior art. Even when there is a difference in execution pressure between the surface plates, the present invention has been sought for a solution that can make the processing rate of the upper and lower surface plates uniform and can perform stable grinding. It came to complete. That is, in order to solve the above problems, the present invention has the following configuration.
  • a method of manufacturing a glass substrate for a magnetic disk including a grinding process for grinding a main surface of a glass substrate, wherein the grinding process includes a plurality of aggregated abrasive grains in which a plurality of abrasive grains are bonded with a glass binder, A grinding tool including a resin bonded to the abrasive grains, wherein a protruding amount from the resin around the abrasive grains on the grinding surface of the grinding tool is a stylus type surface roughness meter.
  • a method for producing a glass substrate for a magnetic disk comprising grinding a main surface of a glass substrate using a grinding tool higher than the maximum height of the surface shape measured using
  • a method for manufacturing a glass substrate for a magnetic disk comprising a dressing process of a grinding tool and a grinding process for grinding a main surface of a glass substrate, wherein a plurality of grinding abrasive grains bonded with a glass binder, and a plurality of abrasive grains
  • a grinding tool including a resin that binds the concentrated abrasive grains, and the amount of protrusion from the resin around the grinding abrasive grains on the grinding surface of the grinding tool in advance causes the grinding surface to become a stylus surface.
  • a magnetic treatment characterized in that dressing is performed so as to be higher than the maximum height of the surface shape measured using a roughness meter, and the glass substrate main surface is ground using the dressed grinding tool.
  • a method for producing a glass substrate for a disk comprising a dressing process of a grinding tool and a grinding process for grinding a main surface of a glass substrate, wherein a plurality of grinding abrasive grains bonded with a glass binder, and
  • a grinding tool for grinding a glass substrate surface comprising a collecting abrasive grain in which a plurality of abrasive grains are bonded with a glass binder, and a resin binding the plurality of the collecting abrasive grains, the collecting abrasive grain
  • a grinding tool characterized in that the protruding amount of the abrasive grains protruding from the surface is higher than the maximum height of the surface shape measured on the surface of the grinding tool using a stylus type surface roughness meter.
  • (Configuration 7) Grinding that grinds the main surface of a glass substrate by sandwiching a glass substrate between an upper surface plate and a lower surface plate each having a fixed abrasive grindstone in which a plurality of abrasive grains are bonded via a glass binder.
  • a method of manufacturing a glass substrate for a magnetic disk including processing, wherein a fixed abrasive grindstone and a lower surface plate on the upper surface plate side so that the ratio of the collected abrasive grains on which the sludge is not fixed is larger in the lower surface plate
  • a magnetic disk manufacturing method comprising: forming at least a magnetic recording layer on a glass substrate for a magnetic disk manufactured by the method for manufacturing a glass substrate for a magnetic disk according to any one of Structures 1 to 4 and 6 to 11. Method.
  • the present invention it is possible to perform stable grinding without occurrence of uneven grinding in the grinding process using fixed abrasive grains, and the occurrence rate of flatness defects after processing can be reduced. Thereby, it is possible to manufacture a high-quality glass substrate at low cost. Furthermore, a highly reliable magnetic disk can be obtained using the glass substrate obtained thereby. Moreover, the grinding tool suitable for the said grinding process can be provided. In addition, according to the present invention, stable grinding can be performed even when there is a difference in execution pressure between the upper and lower surface plates during the grinding process in the grinding process using the fixed abrasive grains. Thereby, a high quality glass substrate can be manufactured. Further, a highly reliable magnetic disk using the glass substrate obtained thereby can be manufactured.
  • a glass substrate for a magnetic disk is usually manufactured through shape processing, main surface grinding, end surface polishing, main surface polishing, chemical strengthening, and the like.
  • a glass substrate is obtained by cutting into a predetermined size from a sheet-like glass produced by a float method or a downdraw method.
  • a sheet-like plate glass produced by pressing from molten glass may be used.
  • the present invention is suitable when a glass substrate having a mirror-like main surface is used at the start of grinding.
  • the glass substrate is subjected to a grinding process for improving dimensional accuracy and shape accuracy.
  • a main surface of the glass substrate is generally ground using a double-side grinding apparatus and using hard abrasive grains such as diamond.
  • a predetermined plate thickness and flatness are processed, and a predetermined surface roughness is obtained.
  • the present invention relates to the improvement of this grinding process.
  • the grinding process in the present invention is, for example, a grinding process using a grinding wheel including diamond particles as a fixed abrasive.
  • a double-side grinding apparatus for example, an upper and lower surface plate to which a diamond pad is attached as a grinding tool. Both main surfaces of the glass substrate are brought into close contact with each other by moving the glass substrate and the upper and lower surface plates relatively while holding the glass substrate with a predetermined pressure by the upper and lower surface plates Grinding at the same time.
  • a lubricating liquid (coolant) is supplied to cool the working surface or to promote the processing.
  • the grinding tool (fixed abrasive grindstone) used for the grinding treatment in the present invention is, for example, a diamond pad, and its configuration is schematically shown in FIG.
  • the diamond pad 1 shown in FIG. 1 has an abrasive agglomerate (referred to as “gathered abrasive” in the present invention) 3 in which some diamond particles 5 (see FIG. 2) are hardened with a binder such as glass. It is affixed to the sheet 2 using a support material such as resin (for example, acrylic resin).
  • resin for example, acrylic resin
  • the term “fixed abrasive grain” means a grinding abrasive grain fixed in a grinding wheel (grinding tool) such as the above-mentioned concentrated abrasive grain unless otherwise specified.
  • the average particle diameter of the abrasive grains means the average particle diameter of the abrasive grains.
  • the present inventor has conducted intensive studies focusing on the relationship between the protruding amount of the abrasive grains protruding from the concentrated abrasive grains and the micro waviness on the surface of the diamond pad, and as a result, the abrasive grains protruded from the concentrated abrasive grains. It has been found that stable grinding can be performed by grinding using a diamond pad (grinding tool) whose protrusion amount is higher than the fine waviness on the surface of the diamond pad.
  • the grinding process in the present invention includes, as in the above-described configuration 1, a concentrated abrasive in which a plurality of abrasive grains are bonded with a glass binder, and a resin in which the plurality of the concentrated abrasive grains are bonded.
  • a grinding tool such as a diamond pad, wherein the amount of protrusion from the resin around the abrasive grains on the grinding surface of the grinding tool is measured using a stylus type surface roughness meter
  • the glass substrate main surface is ground using a grinding tool that is higher than the maximum height of the shape.
  • the fine undulations existing on the surface of the grinding tool will inhibit the abrasive grains from contacting the glass surface. Since there are many abrasive grains that cannot sufficiently act on the surface (weak effect on the glass surface), the above-mentioned partial grinding failure occurs, and as a result, the occurrence rate of flatness failure after processing increases.
  • the abrasive grains are made of glass even if there are micro waviness on the surface of the grinding tool. Since the contact with the surface is not hindered, the abrasive grains work stably on the glass surface, and stable grinding can be performed without uneven grinding. It is also possible to improve the later flatness defect rate to 0%, for example.
  • the maximum height of the surface shape of the grinding tool described above is the maximum height difference Rz (JIS B 0601) in the line roughness curve measured with a stylus type surface roughness meter on the grinding surface of the grinding tool surface. : 2001), which is used as an index of the size of the micro-waviness existing on the surface of the grinding tool.
  • the measurement width (measurement length) is preferably 2 to 3 mm on the surface of the grinding tool.
  • the measurement width is 2.5 mm.
  • the measurement location is the grinding surface in contact with the surface of the substrate to be processed among the surfaces of the grinding tool, so if there are grooves or the like on the surface of the grinding surface, make sure to avoid that part. Needless to say.
  • the protrusion amount of the abrasive grain of said grinding tool is measured as follows. 10% and 50% from the inner circumference when the distance from the inner circumference to the outer circumference is 100% with respect to the grinding tools on the upper and lower surface plates (usually formed in a disk shape) before grinding. A total of 6 samples (pad pieces) each having a size of 2.5 mm ⁇ 2.5 mm are cut out from the 90% position.
  • the maximum height difference between the concentrated abrasive grains and the resin part around the concentrated abrasive grains is measured by cross-sectional shape analysis, etc., and the average of the height differences of all the concentrated abrasive grains The value is defined as the protruding amount of the abrasive grains of the grinding tool of the surface plate. The protruding amount is adjusted so that it is almost equal between the upper and lower surface plates.
  • the protruding amount of the grinding abrasive grains of the present invention is higher than the maximum height of the surface shape
  • a double-sided grinding device used for grinding is also applied to dressing, and the surface of a grinding tool such as a diamond pad provided on the upper and lower surface plates is controlled to have an appropriate thickness variation # 400.
  • the dressing process can be performed with the # 3000 grindstone in contact with the upper and lower surface plates of the double-side grinding apparatus rotated. The smaller the count, the more the resin near the fixed abrasive is scraped and the greater the amount of protrusion.
  • the maximum height of the micro waviness on the surface of the grinding tool can be adjusted by appropriately changing the maximum height of the micro waviness on the surface of the grindstone used for dressing.
  • it may be processed using a dressing grindstone having a value smaller than the target value of the maximum height of the microwaviness on the surface of the grinding tool.
  • the rotation speed of the surface plate may be appropriately selected within the range of 1 to 30 rpm and the surface plate load on the dressing grindstone within the range of 10 to 200 g / cm 2 .
  • the material of the grindstone used for the dressing process is not particularly limited, but for example, an alumina grindstone is suitable.
  • the dressing process may be performed step by step using a plurality of dressing grindstones having different counts and micro waviness. For example, after first adjusting the protrusion of the grinding tool surface using a dressing stone with a small count and large microwaviness, use a dressing stone with a large count and small microwaviness. It is easy to obtain the desired characteristics of the grinding tool surface by adjusting the height.
  • the fine waviness of the dressing grindstone can be measured in the same manner as the fine waviness on the surface of the grinding tool.
  • the abrasive grains are preferably diamond grains.
  • the average particle diameter of the diamond abrasive grains is preferably in the range of 1.5 to 12 ⁇ m.
  • the average particle diameter of the diamond abrasive grains is less than the above range, the cut into the mirror-like glass substrate becomes shallow and the biting into the glass substrate is difficult to proceed.
  • the average particle diameter of the diamond abrasive grains exceeds the above range, the roughness of the finish becomes rough, so that there is a possibility that the machining allowance load in the subsequent process becomes large.
  • the abrasive grain with an average particle diameter of 3.0 micrometers or less.
  • the abrasive grain cannot stably act on the glass substrate, and the occurrence of the above-mentioned grinding unevenness was remarkable. Since the grinding tool managed so that the protruding amount of the abrasive grains is higher than the maximum height of the surface shape of the grinding tool is applied, such a conventional problem can be solved.
  • the average grain size of the concentrated abrasive grains is preferably 15 to 50 ⁇ m.
  • the average particle diameter is a point where the cumulative curve is 50% when the cumulative curve is obtained with the total volume of the powder group in the particle size distribution measured by the laser diffraction method as 100%. (Hereinafter referred to as “cumulative average particle diameter (50% diameter)”).
  • the cumulative average particle diameter (50% diameter) is a value that can be measured using a particle diameter / particle size distribution measuring device.
  • the load during processing is preferably 100 g / cm 2 to 150 g / cm 2 .
  • the processing load is below the above range, the abrasive grains do not act on the surface of the glass substrate on the mirror surface, and the grinding is difficult to proceed.
  • the processing load exceeds the above range, the bite of the abrasive grains with respect to the glass increases, so that the finish roughness becomes rough, and the machining allowance load in the subsequent process may increase.
  • a fixed abrasive grindstone in which a plurality of abrasive grains are bonded via a glass binder is provided between an upper surface plate and a lower surface plate, each provided on a grinding surface.
  • the fixed abrasive wheel on the upper platen side and the fixed abrasive on the lower platen side so that the difference in processing speed between the upper and lower platen becomes smaller
  • the dressing process is performed under different conditions for each surface of the grain grindstone.
  • processing with a difference in processing rate with an up-and-down surface plate like the prior art is unstable, and the upper surface plate side of the glass substrate is sufficient when batch processing is performed continuously. Although it is ground, the surface of the lower surface plate side has a defect that the whole or a part is not ground.
  • the above-described defects are remarkably generated.
  • a glass binder around the abrasive grains is used.
  • glass which is grinding waste generated during processing, is likely to adhere, and this is considered to be particularly prominent on the lower surface plate side where the grinding liquid tends to concentrate, and the above-described defects are likely to occur.
  • the present inventor cannot perform stable grinding by a method that uses the difference in execution pressure, that is, the machining rate as it is with the upper and lower surface plate as in the prior art.
  • the upper surface is set so that the difference in processing speed is reduced between the upper and lower surface plates. It has been found that it is preferable to perform dressing under different conditions on the respective surfaces of the fixed abrasive wheel on the board side and the fixed abrasive wheel on the lower surface plate side.
  • the dressing process it is preferable to remove the attached grinding scraps from the surface of the fixed abrasive grindstone. Then, the dressing treatment is performed under different conditions for each surface of the fixed abrasive wheel on the upper surface plate side and the fixed abrasive wheel on the lower surface plate side so that the processing speed decreases between the upper and lower surface plates. In this case, it is preferable to perform a removal process in which the amount of grinding scraps removed from the surface of the fixed abrasive wheel provided on the lower surface plate side is larger than that of the fixed abrasive wheel provided on the upper surface plate side.
  • the double-sided grinding machine used for grinding is also applied to the dressing process, with a fixed abrasive grain surface in contact with, for example, a # 400-3000 grinding wheel, and the upper and lower surface plates of the double-sided grinding machine rotated. Can be dressed.
  • the material of the grindstone used for the dressing process is not particularly limited, for example, an alumina grindstone, a silicon carbide grindstone, or the like is preferable.
  • the dressing process is performed under different conditions for each surface of the fixed abrasive wheel on the upper surface plate side and the fixed abrasive wheel on the lower surface plate side so that the difference in processing speed is reduced between the upper and lower surface plates.
  • conditions such as the number of platen rotations at the time of dressing, the processing time, and the number of processings (frequency) are changed on the upper and lower surface plates. Accordingly, it is possible to perform a removal process in which the amount of grinding waste removed from the surface of the fixed abrasive wheel provided on the lower surface plate side is larger than that of the fixed abrasive wheel provided on the upper surface plate side.
  • the above-mentioned dressing processing time is suitably in the range of, for example, about 5 to 120 seconds. Set too long.
  • the processing time of the upper surface plate can be set in the range of 5 to 60 seconds
  • the processing time of the lower surface plate can be set in the range of 20 to 120 seconds.
  • the number of times of dressing for example, it is appropriate to carry out every 10 to 100 batches (100 sheets per batch).
  • the dressing processing is performed every 20 to 100 batch processing for the upper surface plate processing and every 10 to 50 batch processing for the lower surface processing.
  • the conditions such as the surface plate rotation speed, processing time, processing frequency (frequency), etc. at the time of dressing need not be changed on the upper and lower surface plates. At least one of the conditions may be changed.
  • the dressing conditions can be set so that the effective abrasive grain ratio after dressing (which can be confirmed with a microscope) is an appropriate ratio between the upper and lower surfaces so that the difference in processing speed is reduced between the upper and lower surface plates. .
  • the fixed abrasive is preferably a diamond abrasive.
  • the average particle diameter of the diamond abrasive grains is preferably about 1 to 10 ⁇ m.
  • the average particle diameter of the diamond abrasive grains is less than the above, the cut into the mirror-like glass substrate becomes shallow, and the bite into the glass substrate is difficult to proceed.
  • the average particle diameter of the diamond abrasive grains exceeds the above, the roughness of the finish becomes rough, so there is a possibility that the machining allowance load in the subsequent process becomes large.
  • the surface of the glass substrate put into the grinding process is suitable when, for example, Ra is in a mirror surface state of 5 nm or less.
  • a grinding tool in which fixed abrasive grains are dispersed such as a diamond pad
  • the surface roughness of the glass substrate after completion of the grinding treatment is preferably finished in the range of 0.080 to 0.130 ⁇ m in Ra.
  • the glass constituting the glass substrate is preferably an amorphous aluminosilicate glass.
  • a glass substrate can be finished to a smooth mirror surface by mirror polishing the surface, and the strength after processing is good.
  • an aluminosilicate glass for example, a glass containing SiO2 as a main component and containing 20 wt% or less of Al2O3 is preferable. Further, it is more preferable to use glass containing SiO2 as a main component and containing Al2O3 or less by 15% by weight or less.
  • SiO2 is 62% by weight to 75% by weight
  • Al2O3 is 5% by weight to 15% by weight
  • Li2 ⁇ O is 4% by weight to 10% by weight
  • Na2O is 4% by weight to 12% by weight
  • ZrO2 is contained in an amount of 5.5% to 15% by weight as a main component
  • the weight ratio of Na2O / ZrO2 is 0.5 to 2.0
  • the weight ratio of Al2O3 / ZrO2 is 0.4 to 2.5.
  • Amorphous aluminosilicate glass that does not contain the following phosphorous oxide can be used.
  • SiO2 is 50 to 75%
  • Al 2 O 3 is 0 to 5%
  • BaO is 0. ⁇ 2%
  • MgO, CaO, SrO and BaO in total 14-35%
  • molar ratio [(MgO + CaO) / (MgO + CaO + SrO + BaO)] is in the range of 0.85 to 1
  • molar ratio [Al2O3 / (MgO + CaO) ] In the range of 0 to 0.30 can be preferably used.
  • the glass may contain more than 0% and not more than 10 mol% in total.
  • the content of Al 2 O 3 in the glass composition is preferably 15% by weight or less.
  • Al 2 O 3 content is 5 mol% or less.
  • mirror polishing is performed to obtain a highly accurate plane.
  • the amount of removal in the subsequent mirror polishing process can be reduced, the processing load can be reduced, and the processing cost can be reduced.
  • a polishing pad of a polisher such as polyurethane while supplying a slurry (polishing liquid) containing a metal oxide abrasive such as cerium oxide or colloidal silica.
  • a slurry polishing liquid
  • a metal oxide abrasive such as cerium oxide or colloidal silica.
  • a glass substrate having high smoothness is obtained, for example, by polishing with a cerium oxide-based abrasive (first polishing process) and then with final polishing (mirror polishing) (second polishing process) using colloidal silica abrasive grains. It is possible.
  • the surface of the glass substrate after mirror polishing is preferably a mirror surface having an arithmetic average surface roughness Ra of 0.2 nm or less, more preferably 0.1 nm or less.
  • the arithmetic average roughness Ra is a roughness calculated in accordance with Japanese Industrial Standard (JIS) B0601.
  • JIS Japanese Industrial Standard
  • the surface roughness (the arithmetic average roughness Ra) is practically preferable to be the surface roughness of the surface shape obtained when measuring 5 ⁇ m square with a resolution of 256 ⁇ 256 with an atomic force microscope (AFM). .
  • chemical strengthening treatment can be performed.
  • a method of the chemical strengthening treatment for example, a low-temperature ion exchange method in which ion exchange is performed in a temperature range not exceeding the glass transition temperature is preferable.
  • the chemical strengthening treatment is a process in which a molten chemical strengthening salt is brought into contact with a glass substrate, whereby an alkali metal element having a relatively large atomic radius in the chemical strengthening salt and a relatively small atomic radius in the glass substrate.
  • This is a treatment in which an alkali metal element is ion-exchanged, an alkali metal element having a large ion radius is permeated into the surface layer of the glass substrate, and compressive stress is generated on the surface of the glass substrate. Since the chemically strengthened glass substrate is excellent in impact resistance, it is particularly preferable for mounting on a HDD for mobile use, for example.
  • the present invention also provides a method for manufacturing a magnetic disk using the above glass substrate for a magnetic disk.
  • the magnetic disk is produced by forming at least a magnetic recording layer (magnetic layer) on the magnetic disk glass substrate according to the present invention.
  • a magnetic recording layer magnetic layer
  • a hexagonal CoCrPt-based or CoPt-based ferromagnetic alloy having a large anisotropic magnetic field can be used.
  • a method of forming the magnetic layer it is preferable to use a method of forming a magnetic layer on a glass substrate by a sputtering method, for example, a DC magnetron sputtering method.
  • a protective layer and a lubricating layer may be formed on the magnetic recording layer.
  • the protective layer an amorphous carbon-based protective layer is suitable.
  • a lubricating layer a lubricant having a functional group at the end of the main chain of the perfluoropolyether compound can be used.
  • Example 1-1 (1) Substrate preparation, (2) Shape processing, (3) End surface polishing, (4) Main surface grinding, (5) Main surface polishing (first polishing), (6) Chemical strengthening, (7) Main A glass substrate for a magnetic disk of this example was manufactured through surface polishing (second polishing).
  • Substrate preparation A large glass plate made of aluminosilicate glass having a thickness of 1 mm produced by the float method was prepared, and cut into a 70 mm ⁇ 70 mm square piece using a diamond cutter. Subsequently, it processed into the disk shape of outer diameter 65mm and internal diameter 20mm using the diamond cutter.
  • this aluminosilicate glass SiO 2 : 62 to 75 wt%, ZrO 2: 5.5 to 15 wt%, Al 2 O 3 : 5 to 15 wt%, Li 2 O: 4 to 10 wt%, Na 2 O
  • a chemically strengthenable amorphous glass containing 4 to 12% by weight was used.
  • the surface of the obtained substrate was a mirror surface with a surface roughness Ra of 5 nm or less.
  • This main surface grinding process uses a double-sided grinding machine, and collects aggregated abrasive grains obtained by solidifying a plurality of diamond abrasive grains with a glass binder and a resin binding the plurality of aggregated abrasive grains.
  • a glass substrate held by a carrier was set between the upper and lower surface plates to which the fixed abrasive grindstone (diamond pad) provided was attached.
  • the diamond pad a diamond pad having an average particle diameter (D50) of diamond abrasive grains of about 3.0 ⁇ m and an average particle diameter (D50) of concentrated abrasive grains of 30 ⁇ m was used. Moreover, it carried out using the lubricating liquid.
  • the rotation speed of the surface plate and the load on the glass substrate were adjusted as appropriate.
  • dressing was performed using an alumina grindstone before grinding.
  • the protruding amount of the abrasive grains was 2 ⁇ m and the maximum height of the surface shape was measured.
  • the thickness was 0.5 ⁇ m.
  • the first polishing was performed using a hard polisher (hard foamed urethane) as the polisher.
  • the polishing liquid was pure water in which cerium oxide was dispersed as an abrasive, and the load and polishing time were appropriately set.
  • the glass substrate after the first polishing step was sequentially immersed in cleaning baths of neutral detergent, pure water, IPA (isopropyl alcohol), and IPA (steam drying), ultrasonically cleaned, and dried.
  • Chemical strengthening was performed on the glass substrate after the cleaning.
  • a chemical strengthening solution in which potassium nitrate and sodium nitrate were mixed was prepared, the chemical strengthening solution was heated to 380 ° C., and the cleaned and dried glass substrate was immersed for about 4 hours to perform chemical strengthening treatment.
  • Example 1-2 In the main surface grinding process of Example 1-1, a diamond pad having an average grain size of approximately 9.0 ⁇ m, a protruding amount of abrasive grains of 7 ⁇ m, and a maximum surface shape height of 5 ⁇ m was used. Except for this, grinding was carried out in the same manner as in Example 1-1 to produce a magnetic disk glass substrate.
  • Example 1-3 In the main surface grinding of Example 1-1, a diamond pad was used in which the average grain size of the diamond abrasive grains was about 1.5 ⁇ m, the protruding amount of the abrasive grains was 3 ⁇ m, and the maximum height of the surface shape was 1 ⁇ m. Except for this, grinding was carried out in the same manner as in Example 1-1 to produce a magnetic disk glass substrate.
  • Example 1-4 In the main surface grinding process of Example 1-1, a diamond pad in which the average grain size of the diamond abrasive grains is about 1.5 ⁇ m, the protruding amount of the abrasive grains is 2 ⁇ m, and the maximum height of the surface shape is 0.5 ⁇ m. Except for the use, grinding was performed in the same manner as in Example 1-1 to produce a magnetic disk glass substrate. (Example 1-5) In the main surface grinding process of Example 1-1, except that a diamond pad having an average grain size of about 12 ⁇ m, a protruding amount of grinding grain of 9 ⁇ m, and a maximum surface shape height of 6 ⁇ m was used. Were ground in the same manner as in Example 1-1 to produce a magnetic disk glass substrate.
  • Example 1-1 In the main surface grinding process of Example 1-1, a diamond pad having an average grain size of approximately 3.0 ⁇ m, a protruding amount of the abrasive grain of 2 ⁇ m, and a maximum surface shape height of 2 ⁇ m was used. Except for this, grinding was carried out in the same manner as in Example 1-1 to produce a magnetic disk glass substrate.
  • Comparative Example 1-2 In the main surface grinding process of Example 1-1, a diamond pad was used in which the average grain size of the diamond abrasive grains was about 3.0 ⁇ m, the protruding amount of the abrasive grains was 2 ⁇ m, and the maximum height of the surface shape was 3 ⁇ m. Except for this, grinding was carried out in the same manner as in Example 1-1 to produce a magnetic disk glass substrate.
  • Example 1-3 In the main surface grinding of Example 1-1, a diamond pad having an average grain size of about 3.0 ⁇ m, a protruding amount of grinding grain of 2 ⁇ m, and a maximum surface shape height of 5 ⁇ m was used. Except for this, grinding was carried out in the same manner as in Example 1-1 to produce a magnetic disk glass substrate.
  • Comparative Example 1-4 In the main surface grinding process of Example 1-1, a diamond pad having an average grain size of approximately 9.0 ⁇ m, a protruding amount of abrasive grains of 7 ⁇ m, and a maximum surface shape height of 7 ⁇ m was used. Except for this, grinding was carried out in the same manner as in Example 1-1 to produce a magnetic disk glass substrate.
  • Example 1-5 In the main surface grinding process of Example 1-1, a diamond pad having an average grain size of approximately 9.0 ⁇ m, a protruding amount of the abrasive grain of 7 ⁇ m, and a maximum surface shape height of 8 ⁇ m was used. Except for this, grinding was carried out in the same manner as in Example 1-1 to produce a magnetic disk glass substrate.
  • Comparative Example 1-6 In the main surface grinding process of Example 1-1, a diamond pad in which the average grain size of the diamond abrasive grains was about 9.0 ⁇ m, the protruding amount of the abrasive grains was 7 ⁇ m, and the maximum height of the surface shape was 10 ⁇ m was used. Except for this, grinding was carried out in the same manner as in Example 1-1 to produce a magnetic disk glass substrate.
  • Example 1--7 In the main surface grinding process of Example 1-1, a diamond pad was used in which the average grain size of the diamond abrasive grains was about 1.5 ⁇ m, the protruding amount of the abrasive grains was 2 ⁇ m, and the maximum height of the surface shape was 2 ⁇ m. Except for this, grinding was carried out in the same manner as in Example 1-1 to produce a magnetic disk glass substrate.
  • the main surface grinding was performed for a total of 100 sheets per batch.
  • the flatness of 20 sheets per batch is measured for a glass substrate after grinding using a flat nesting tester, and a predetermined standard (3 ⁇ m or less) is regarded as a good product, and this standard is not satisfied.
  • the occurrence rate of glass substrates was calculated, and the results are shown in Table 1. Further, the results of the surface roughness (Ra) measured by AFM on the glass substrate after the grinding process are shown in Table 2 as ratios based on the values of Example 1.
  • the flatness of 20 sheets per batch was measured for a glass substrate after grinding using a flat nesting tester, and a predetermined standard (3 ⁇ m or less)
  • the occurrence rate of glass substrates exceeding that (the occurrence rate of defective flatness) was calculated, and the results are shown in Table 1.
  • the abrasive grain size is the average particle size (D50) of the diamond fine particles contained in the concentrated abrasive grains.
  • the abrasive grain protrusion amount is the aggregate abrasive grains from the resin portion around them. Is a distance protruding from the plane.
  • Example 1-1 using the fixed abrasive grindstone in which the protruding amount of the abrasive grains is higher than the maximum height of the surface shape the abrasive grains stably act on the glass surface.
  • the flatness defect occurrence rate is 0%, and stable grinding without uneven grinding can be performed. 2.
  • the maximum height is 5 ⁇ m and the protruding amount of the abrasive grains is 7 ⁇ m, so that the protruding amount of the abrasive grains is larger than the maximum height of the surface shape.
  • Example 1-2 using a high fixed abrasive grindstone, the abrasive grains stably act on the glass surface, and the flatness defect occurrence rate is 0%.
  • the surface roughness of the substrate after processing increases compared to Example 1-1 (see Table 2). This is probably because the abrasive grain size is large and the grinding force acting on the glass surface is large.
  • Comparative Examples 1-5 and 1-6 in which the abrasive grain size is 9.0 ⁇ m and the protruding amount of the grinding grain is lower than the maximum height of the surface shape, Comparative Examples 1-5 and 1-6 with respect to the glass surface
  • the action of the abrasive grains was weak, and the flatness failure was an occurrence rate of 80%. 3.
  • the protruding amount of abrasive grains is A and the maximum height of micro-waviness on the ground surface is B
  • the grain size of the abrasive grains (diamond fine particles) is 3 ⁇ m or less.
  • the defect rate is likely to deteriorate. That is, it can be seen that the present invention is particularly effective when the grain size of the abrasive grains (diamond fine particles) is 3 ⁇ m or less.
  • Example 2-1 Through the same steps as in Example 1-1, a glass substrate for a magnetic disk of the following example was produced.
  • Substrate preparation A large glass plate made of amorphous aluminosilicate glass having a thickness of 1 mm manufactured by the float method was prepared, and cut into 70 mm ⁇ 70 mm square pieces using a diamond cutter. Subsequently, it processed into the disk shape of outer diameter 65mm and internal diameter 20mm using the diamond cutter.
  • This aluminosilicate glass contains SiO2: 62-75 wt%, ZrO2: 5.5-15 wt%, Al2O3: 5-15 wt%, Li2O: 4-10 wt%, Na2O: 4-12 wt% Glass that can be chemically strengthened was used.
  • This main surface grinding process uses a double-sided grinding machine, and the upper and lower surfaces where a fixed abrasive grindstone (diamond pad) containing agglomerate grains obtained by solidifying a plurality of diamond particles with a glass binder is attached.
  • a glass substrate held by a carrier was set between the surface plates.
  • a diamond pad a diamond pad was used in which the average grain size (D50) of the diamond abrasive grains was about 2.5 ⁇ m and the average grain diameter (D50) of the concentrated abrasive grains was 25 ⁇ m.
  • D50 average grain size
  • D50 average grain diameter
  • dressing of the fixed abrasive grindstone was performed on the way. Specifically, first, brushing was performed to remove the grinding liquid and sludge adhering to the surface of the fixed abrasive grains. Next, dressing was performed in a state where the # 1000 alumina grindstone was brought into contact with the surface of the fixed abrasive grains and the upper and lower surface plates of the double-side grinding apparatus were rotated.
  • the platen rotation speed, processing time, and processing frequency (frequency) at the time of dressing were set as follows.
  • Surface plate rotation speed 20 rpm (same for upper and lower surface plates) Processing time (once): Upper surface plate 60 seconds, lower surface plate 120 seconds
  • Processing frequency Upper surface plate is processed every 20 batches (1 batch is 100 sheets), and lower surface plate is processed every 20 batches
  • Example 1-1 Main surface polishing (first polishing) Next, the first polishing for removing the scratches and distortions remaining in the grinding process described above was performed in the same manner as in Example 1-1. (6) Chemical Strengthening Next, the glass substrate that had been cleaned was chemically strengthened in the same manner as in Example 1-1. (7) Main surface polishing (second polishing) Next, the second polishing was performed in the same manner as in Example 1-1.
  • Example 2-2 In the main surface grinding process of Example 2-1, the number of platen rotations, the processing time, and the number of processing (frequency) during dressing were set as follows.
  • Surface plate rotation speed 20 rpm (same for upper and lower surface plates) Processing time (once): Upper surface plate 10 seconds, lower surface plate 20 seconds Processing frequency: Upper surface plate is processed every 40 batches continuously, Lower surface plate is processed every 20 batches, except for the same as Example 2-1. Thus, a glass substrate for a magnetic disk was produced.
  • Example 2-3 In the main surface grinding process of Example 2-1, the number of platen rotations, the processing time, and the number of processing (frequency) during dressing were set as follows.
  • Surface plate rotation speed 20 rpm (same for upper and lower surface plates) Processing time (once): Upper surface plate 10 seconds, lower surface plate 20 seconds Processing frequency: Upper surface plate is processed every 100 batches continuously, Lower surface plate is processed every 50 batches, except for the same as Example 2-1. Thus, a glass substrate for a magnetic disk was produced.
  • Example 2-1 In the main surface grinding process of Example 2-1, the number of platen rotations, the processing time, and the number of processing (frequency) during dressing were set as follows.
  • Surface plate rotation speed 20 rpm (same for upper and lower surface plates)
  • Processing time once: Upper surface plate 10 seconds, lower surface plate 10 seconds (same upper and lower surface plates)
  • Processing frequency Upper surface plate is processed every 50 batches, lower surface plate is processed every 50 batches (same upper and lower surface plates)
  • a glass substrate for a magnetic disk was produced in the same manner as in Example 2-1, except for this.
  • the ratio of the concentrated abrasive grains (collected abrasive grains to which sludge is not fixed) that acts effectively at the time after the end of the dressing process after 200 batches of the main surface grinding step is calculated.
  • Table 3 shows the results of investigation using the upper and lower surface plates. In addition, it judged with sludge having adhered when the sludge covered almost the whole collection abrasive grain, and when adhesion of sludge to the collection abrasive grain was slight, it did not determine with adhesion.
  • the ratio of the effective fixed abrasive grains was confirmed by observing the surface of the diamond pad with a microscope and observing a fixed number (upper and lower 100) of fixed abrasive grains. Further, Table 3 shows the ratio of the processing speeds of the upper and lower surface plates of the 201st batch (lower surface processing speed / upper surface processing speed). The ratio of the processing speed is preferably closer to 1, but when it is 1.05 to 0.95, the processing balance of the upper and lower surface plates is improved, and stable processing can be continued.
  • the frequency of occurrence of defects in a state where the whole or a part of the substrate surface on the lower surface plate side is not processed is represented by a defective batch rate, and the results are shown in Table 4.
  • the defective batch rate is preferably less than 5%.
  • On the upper surface plate side no processing defects were found on any of the substrates.
  • a total of 201 batch processes were performed. Whether or not it is defective can be determined by visually observing the main surface of the glass substrate using a condenser lamp and whether or not the mirror surface remains.
  • the grinding process using the fixed abrasive grains of the present invention is performed properly, the substrate surface becomes white and cloudy and is not a mirror surface. However, when the grinding process is not performed, the portion remains a mirror surface and no cloudiness is observed.
  • the one where the ratio (%) of the effective fixed abrasive on the lower surface plate side is higher is better.
  • the difference between the upper and lower surface plates is preferably within 20%, more preferably 10% or less (Example 2-1).
  • the difference in the effective abrasive grain ratio between the upper and lower surface plates is that the lower surface plate is more than 5% than the upper surface plate, and the processing balance is improved and the defective batch rate is improved. 2.
  • Comparative Example 2-1 in which the dressing treatment was performed on the surfaces of the fixed abrasive wheel on the upper platen side and the fixed abrasive wheel on the lower platen side, the lower platen side with a small effective pressure was used.
  • the ratio of the effective fixed abrasive grains is lower than the ratio of the effective fixed abrasive grains on the upper surface plate side, and this causes the processing balance in the upper and lower surface plates to deteriorate and the frequency of occurrence of defects increases.
  • the following film forming steps were performed on the magnetic disk glass substrates obtained in Examples 1-1 and 2-1 to obtain a magnetic disk for perpendicular magnetic recording. That is, an adhesion layer made of a Ti-based alloy thin film, a soft magnetic layer made of a CoTaZr alloy thin film, an underlayer made of a Ru thin film, a perpendicular magnetic recording layer made of a CoCrPt alloy, a protective layer, and a lubricating layer are sequentially formed on the glass substrate. Filmed. As the protective layer, a hydrogenated carbon layer was formed. The lubricating layer was formed by dipping a liquid lubricant of alcohol-modified perfluoropolyether.
  • the obtained magnetic disk was installed in an HDD equipped with a DFH head, and a load / unload durability test was conducted for one month while operating the DFH function in a high temperature and high humidity environment of 80 ° C. and 80% RH. There were no particular obstacles and good results were obtained.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Abstract

La présente invention se rapporte à un procédé de fabrication d'un substrat de verre pour disque magnétique qui permet de fabriquer un substrat de verre de grande qualité, et qui assure également un dégrossissage homogène pendant un traitement de dégrossissage à l'abrasif fixe sans créer la moindre irrégularité de dégrossissage. Ce procédé de fabrication d'un substrat de verre pour disque magnétique consiste à dégrossir la surface principale d'un substrat de verre au moyen d'un outil de dégrossissage qui contient des grains abrasifs concentrés obtenus par liaison d'une pluralité de grains abrasifs à l'aide d'une matière à liage de verre, ainsi qu'une résine servant à lier la pluralité de grains abrasifs concentrés, l'importance du dépassement, par rapport à la résine environnante, des grains abrasifs qui se trouvent sur la surface de dégrossissage de l'outil de dégrossissage étant supérieure à la hauteur maximale du profil de surface obtenu suite à la mesure de la surface de dégrossissage au moyen d'un instrument de mesure de la rugosité de surface du type à pointe.
PCT/JP2014/075940 2013-09-28 2014-09-29 Procédé de fabrication d'un substrat de verre pour disque magnétique, procédé de fabrication d'un disque magnétique et outil de dégrossissage WO2015046528A1 (fr)

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MYPI2016701089A MY188817A (en) 2013-09-28 2014-09-29 Method for manufacturing glass substrate as a base of magnetic-disk glass substrate, method for manufacturing magnetic-disk glass substrate, method for manufacturing magnetic disk, and grinding tool
JP2015539435A JP6193387B2 (ja) 2013-09-28 2014-09-29 磁気ディスク用ガラス基板の元となるガラス基板の製造方法、磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法、並びに研削工具
CN201480053025.6A CN105580079B (zh) 2013-09-28 2014-09-29 磁盘用玻璃基板的制造方法和磁盘的制造方法、以及磨削工具
SG11201602377UA SG11201602377UA (en) 2013-09-28 2014-09-29 Method for manufacturing magnetic-disk glass substrate, methodfor manufacturing magnetic disk, and grinding tool

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011156627A (ja) * 2010-02-02 2011-08-18 Asahi Glass Co Ltd 磁気記録媒体用ガラス基板の製造方法
JP2011230220A (ja) * 2010-04-27 2011-11-17 Asahi Glass Co Ltd ガラス基板の研磨方法、及び該ガラス基板の研磨方法を用いたガラス基板の製造方法
WO2012090378A1 (fr) * 2010-12-27 2012-07-05 コニカミノルタオプト株式会社 Procédé de fabrication de substrat en verre pour support d'enregistrement magnétique d'informations
JP2013071212A (ja) * 2011-09-28 2013-04-22 Hoya Corp 基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法および修正キャリア

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101633151B (zh) * 2007-09-10 2011-01-05 友达光电股份有限公司 研磨装置及其定位方法
JP5580130B2 (ja) * 2010-07-20 2014-08-27 Ｈｏｙａ株式会社 研削パッド、磁気ディスク用ガラス基板の製造方法
JP6126790B2 (ja) * 2011-03-31 2017-05-10 Hoya株式会社 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法
US8974561B2 (en) * 2011-09-30 2015-03-10 Hoya Corporation Manufacturing method of glass substrate for magnetic disk, magnetic disk, and magnetic recording / reproducing device
MY168569A (en) * 2011-12-30 2018-11-13 Hoya Corp Method of manufacturing a substrate, method of manufacturing a magnetic disk glass substrate and method of manufacturing a magnetic disk

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011156627A (ja) * 2010-02-02 2011-08-18 Asahi Glass Co Ltd 磁気記録媒体用ガラス基板の製造方法
JP2011230220A (ja) * 2010-04-27 2011-11-17 Asahi Glass Co Ltd ガラス基板の研磨方法、及び該ガラス基板の研磨方法を用いたガラス基板の製造方法
WO2012090378A1 (fr) * 2010-12-27 2012-07-05 コニカミノルタオプト株式会社 Procédé de fabrication de substrat en verre pour support d'enregistrement magnétique d'informations
JP2013071212A (ja) * 2011-09-28 2013-04-22 Hoya Corp 基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法および修正キャリア

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CN105580079A (zh) 2016-05-11
CN109285565B (zh) 2020-06-26
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