WO2015039557A1 - 反射式滤光片及其制备方法、显示装置 - Google Patents
反射式滤光片及其制备方法、显示装置 Download PDFInfo
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- WO2015039557A1 WO2015039557A1 PCT/CN2014/085730 CN2014085730W WO2015039557A1 WO 2015039557 A1 WO2015039557 A1 WO 2015039557A1 CN 2014085730 W CN2014085730 W CN 2014085730W WO 2015039557 A1 WO2015039557 A1 WO 2015039557A1
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- photonic crystal
- light
- crystal layer
- reflective filter
- filter according
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- 238000004519 manufacturing process Methods 0.000 title abstract description 6
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 239000011241 protective layer Substances 0.000 claims description 10
- 238000002360 preparation method Methods 0.000 claims description 8
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- 238000001338 self-assembly Methods 0.000 claims description 5
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- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 3
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- 238000004544 sputter deposition Methods 0.000 claims description 3
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- 238000002310 reflectometry Methods 0.000 abstract description 4
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/26—Reflecting filters
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
- G02B1/005—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of photonic crystals or photonic band gap materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133553—Reflecting elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/32—Photonic crystals
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/05—Function characteristic wavelength dependent
- G02F2203/055—Function characteristic wavelength dependent wavelength filtering
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/34—Colour display without the use of colour mosaic filters
Definitions
- Reflective filter preparation method thereof, and display device
- Embodiments of the present invention relate to a reflective filter, a method of fabricating the reflective filter, and a display device using the reflective filter. Background technique
- the flat panel display device Compared with the conventional cathode ray tube display device, the flat panel display device has the advantages of being thin and light, having a low driving voltage, no flickering jitter, and a long service life.
- the flat panel display device is divided into an active light emitting display device and a passive light emitting display device.
- a Thin Film Transistor-Liquid Crystal Display (TFT-LCD) is a passive light emitting display device.
- TFT-LCD has been widely used in electronic products such as TVs, mobile phones, and display devices because of its stable image, vivid image, radiation elimination, space saving, and energy saving. It has occupied a dominant position in the field of flat display.
- the liquid crystal display device includes a transmissive display device, a transflective display device, and a reflective display device.
- a reflective sheet is added to the back surface of the display panel of the reflective display device, so that the incident ambient light is reflected by the reflective sheet and then emitted from the pixel region, thereby achieving the purpose of display.
- the reflective liquid crystal display device can make full use of the surrounding ambient light source as an illumination source to display images without setting a backlight module, thereby being more environmentally friendly. For example, in an outdoor or well-lit office, a reflective display is usually chosen.
- the display quality of the reflective display device is closely related to the brightness of the light reflected by the reflective filter. If the ambient light is brighter, the higher the reflectivity of the reflective sheet to the ambient light in the reflective display device, the contrast of the display device. The higher the picture, the clearer the displayed picture will be. However, the reflective sheet absorbs a considerable amount of light while reflecting ambient light, resulting in a decrease in the reflectance of the reflective display device to ambient light, causing a decrease in contrast of the display device. Summary of the invention
- Embodiments of the present invention provide a reflective filter capable of improving reflectance to ambient light; Further, embodiments of the present invention also provide a method of fabricating the reflective filter and a display device using the reflective filter.
- At least one embodiment of the present invention provides a reflective filter comprising a photonic crystal layer for reflecting light of a particular wavelength band.
- the photonic crystal layer includes a first photonic crystal region for reflecting light of a first wavelength band, a second photonic crystal region for reflecting light of a second wavelength band, and a third photoreflection region for reflecting a third photonic crystal region of the band light; a plurality of the first photonic crystal region, the second photonic crystal region, and the third photonic crystal region are alternately arranged in an array structure.
- the first band of light is red light
- the second band of light is green light
- the third band of light is blue light
- the photonic crystal layer has an opal-like structure; the photonic crystal layer is composed of a base material having a first refractive index and a second periodically formed in the base material The dielectric material of the refractive index is composed.
- the reflective filter further includes a protective layer disposed on the light incident surface and/or the transmitted light exit surface of the photonic crystal layer.
- the reflective filter further includes a base substrate; the photonic crystal layer is disposed on the base substrate.
- the base material having the first refractive index is air
- the dielectric material having the second refractive index periodically formed in the base material is a single microsphere.
- n the photon
- the effective refractive index of the crystal layer is the angle between the incident light and the normal of the photonic crystal layer, and c is a constant associated with the photonic crystal layer preparation method.
- the single: microspheres comprise one or more of polystyrene microspheres, polydecyl methacrylate microspheres, and silica microspheres.
- the photonic crystal layer comprises a plurality of layers of monodisperse microspheres.
- the number of layers of the monodisperse microspheres is not less than 10.
- Another embodiment of the present invention also provides a method for preparing a reflective filter, comprising: A photonic crystal layer for reflecting light of a specific wavelength band is formed.
- the forming a photonic crystal layer for reflecting light of a particular wavelength band comprises:
- first photonic crystal region for reflecting light of the first wavelength band
- second photonic crystal region for reflecting light of the second wavelength band
- third photonic crystal region for reflecting light of the third wavelength band on the base substrate
- the photonic crystal layer is formed using a self-assembly process.
- the method comprises: preparing a solution containing a monodisperse microsphere material; using one or more of a quasi-equilibrium evaporation method, a gravity sedimentation method, a spin coating method, and a sputtering deposition method A photonic crystal layer is formed on the base substrate.
- Another embodiment of the present invention also provides a display device comprising any of the above-described reflective filters.
- the display device further includes a light absorbing unit, the light absorbing unit is located on a light transmitting side of the reflective filter and is configured to absorb the light transmitting through the reflective filter. Light.
- the light absorbing unit is a protective layer disposed on a light transmitting surface of the photonic crystal layer; or the photonic crystal layer is disposed on a base substrate, the light absorbing unit It is the base substrate.
- FIG. 1 is a schematic cross-sectional structural view of a reflective filter according to an embodiment of the present invention
- FIG. 2 is a schematic top plan view of a reflective filter according to an embodiment of the present invention.
- FIG. 3 is a schematic cross-sectional view showing a display device in an embodiment of the present invention. detailed description
- Photonic Crystal is an emerging optical material. Since the photonic crystal material has a crystal structure with a repeating refractive index period, the Bragg scattered light will be modulated to form an energy band structure, which generates a photonic band gap (PBG), which is strong at the center of the photonic band gap. The reflection peak, thus the photonic crystal material has a reflectivity of approximately 100% for light located in the photonic band gap band.
- the reflective filter and the reflective display device provided by the embodiments of the present invention employ a photonic crystal. The reflective filter, the reflective filter manufacturing method, and the reflective display device in the embodiments of the present invention will be described in detail below with reference to specific implementations.
- Embodiments of the present invention provide a reflective filter that includes a photonic crystal layer for reflecting light in a particular band.
- a reflective filter can utilize different photonic crystal regions of a photonic crystal layer having different photonic band gaps to reflect light in different wavelength bands. Due to the reflectivity of the specific photonic crystal filter to ambient light, the contrast of the display device is improved, the display of the display device is made clearer, and the user experience is enhanced.
- FIG. 1 is a schematic cross-sectional view of a reflective filter according to an embodiment of the present invention.
- the retroreflective filter 1 includes a photonic crystal layer for reflecting light of a specific wavelength band and a base substrate 2 on which the photonic crystal layer is disposed.
- the reflective filter provided by the embodiment of the present invention may also not include a substrate.
- the photonic crystal layer of the reflective filter 1 comprises three photonic crystal regions, namely a first photonic crystal region 11 for reflecting light of the first wavelength band, a second photonic crystal region 12 for reflecting light of the second wavelength band, and A third photonic crystal region 13 that reflects light of the third wavelength band.
- the plurality of first photonic crystal regions 11, second photonic crystal regions 12, and third photonic crystal regions 13 are alternately arranged in an array structure as shown in Fig. 2.
- the photonic crystal layer of this embodiment is used to reflect three colors of common RGB (red, green, and blue), that is, the first band light is red light, the second band light is green light, and the third band light is blue light.
- the light reflected by the photonic crystal layer may also be light of other wavelengths, such as CMY (cyan, magenta, yellow) three-color light and the like.
- the photonic crystal layer can also reflect light of four or more different wavelength bands.
- the reflective filter provided in the embodiment can be used to reflect RGBK (red, green, blue, black), CMYK (cyan, magenta, yellow, black), etc., and thus can be used for RGBK (red, green, blue, respectively).
- the black), CMYK (cyan, magenta, yellow, black) displays are not limited to the modes listed in the embodiments of the present invention.
- the photonic crystal layer in the embodiment of the present invention is composed of a base material having a first refractive index and a dielectric material having a second refractive index periodically formed in the base material.
- opal-like (Opal) structures and inverse opal (Inverse Opal) structures are two common photonic crystal structures. Protein-like photonic crystals have the same cubic close-packed structure as natural opals, also known as artificial opals.
- the opal-like photonic crystal may be formed of a base material having a first refractive index and a dielectric material having a second refractive index periodically formed in the base material, such as air or the like, the dielectric material may be Monodisperse microspheres, such as polystyrene (PS) microspheres, polymethylmethacrylate (PMMA) microspheres or silica (Si0 2 ) microspheres.
- PS polystyrene
- PMMA polymethylmethacrylate
- Si0 2 silica
- the above-mentioned base material is usually preferably air.
- This opal-like structure can be used as a template to fill an inorganic material having a higher refractive index in the gap of the microspheres, and remove the template to obtain a photonic crystal having an inverse opal structure.
- the accuracy of structural "replication" depends on various factors such as van der Waals interactions, wettability of the template surface, filling of template voids, curing The volume shrinkage of the matrix during the process, etc., so small changes in a certain factor will lead to defects in the inverse opal structure, and structural disorder often occurs, which will seriously affect the optical properties of the photonic crystal. Therefore, the photonic crystal layer in the embodiment of the present invention preferably includes the above photonic crystal having an opal-like structure.
- the photonic crystal layer may be formed by stacking a plurality of layers of monodisperse microspheres.
- the single: microspheres may be, for example, any one or more of polystyrene microspheres, polydecylmercaptoacrylate microspheres, and silica microspheres.
- the number of layers of monodisperse microspheres is more than about 10 layers, significant photonic crystal characteristics are exhibited.
- the more the number of layers of monodisperse microspheres the higher the reflection efficiency of the photonic crystal layer. Therefore, the number of layers of the monodisperse microspheres in the embodiment of the present invention is limited to 10 layers, and the upper limit is not particularly limited.
- the photon band can be accurately calculated from the Bragg scattering equation.
- n is the effective refractive index of the photonic crystal layer, that is, the refractive index of the photonic crystal layer as a whole.
- the photonic crystal is formed of polystyrene microspheres.
- « > / « PS 2 x 74% + « air 2 x 26%
- n PS the refractive index of polystyrene
- n PS 1.59
- ⁇ the refractive index of air
- R the radius of the polystyrene microspheres.
- the photonic crystal has no defects, the photon
- the reflected light of the band gap is monochromatic light. It is known that most display devices are difficult to generate monochromatic (single wavelength) light, which makes it difficult to further increase the color gamut of the display device. However, in the embodiment of the present invention, the light reflected by the photonic band gap is almost monochromatic light. Therefore, the display color gamut of the display device can be greatly improved, that is, the wide color gamut display can be realized more easily.
- the angle between the incident light and the normal of the photonic crystal layer, c is a constant associated with the photonic crystal layer preparation method.
- the red wavelength is 700.0 nm
- the green wavelength is 546.1 nm
- the blue wavelength is 435.8 nm.
- the photonic crystal formed by the microspheres reflects red light when the particle diameter (diameter) of the polystyrene microspheres is 293.7 nm, and reflects green light when the particle diameter of the polystyrene microspheres is 229. lnm, in the polystyrene microspheres. The blue light is reflected when the particle diameter is 182.8 nm.
- an embodiment of the present invention also provides a protective layer for the photonic crystal layer.
- the protective layer may be disposed on the light incident surface and the transmitted light exit surface of the photonic crystal layer, or may be separately provided on only one of the light incident surface or the transmitted light exit surface.
- the photonic crystal layer in one embodiment of the present invention is disposed on the base substrate, that is, the transmitted light exit surface of the photonic crystal layer is in direct contact with the base substrate, and therefore, the base substrate can also function as a protective layer.
- the method for producing a reflective filter comprising: forming a photonic crystal layer for reflecting light of a specific wavelength band.
- the reflective filter preparation method provided by one embodiment of the present invention further includes the step of providing the substrate 2 .
- forming a photonic crystal layer for reflecting light of a specific wavelength band includes: forming a first photonic crystal region 11 for reflecting light of the first wavelength band on the base substrate 2, and a second photonic crystal region for reflecting light of the second wavelength band 12 and a third photonic crystal region 13 for reflecting light of the third wavelength band, the plurality of first photonic crystal regions 11, the second photonic crystal region 12, and the third photonic crystal region 13 are alternately arranged in an array structure.
- the parameters of the material, the thickness, the monodisperse microsphere diameter and the like of the photonic crystal layer are set according to the above-mentioned reflective filter, and will not be described herein.
- the method includes the following steps.
- a monodisperse microsphere material for example, polystyrene microspheres, polydecyl methacrylate microspheres or silica microspheres, etc.
- a monodisperse microsphere material for example, polystyrene microspheres, polydecyl methacrylate microspheres or silica microspheres, etc.
- ethanol and water are mixed into a mixed solution of ethanol and water to obtain a mixed dispersion of monodisperse globules.
- a solution of the material for example, polystyrene microspheres, polydecyl methacrylate microspheres or silica microspheres, etc.
- a photonic crystal layer is formed on the base substrate 2 by one or more of self-assembly methods such as quasi-equilibrium evaporation, gravity sedimentation, spin coating, and sputter deposition.
- a solution in which a monodisperse microsphere material is mixed is naturally evaporated, and a photonic crystal is obtained by self-assembly using a surface tension of the solution.
- a monodisperse microsphere material is used to form an opal-like structure spontaneously under the action of a gravitational field to obtain a photonic crystal.
- the monodisperse microsphere material is ordered and self-assembled by the action of centrifugal force.
- the formation of the photonic crystal in the embodiment of the present invention can also be achieved by other means.
- an exposure technique can be used to mix a small amount of photoresist in a monodisperse microsphere material and After being applied to the base substrate 2, exposure and development are carried out to form a photonic crystal.
- physical methods such as micromechanical methods, drilling methods, and the like can be utilized.
- an etching method, a layer-by-layer superposition method, a two-photon polymerization method, a hologram printing method, or the like can be used.
- Embodiments of the present invention also provide a display device as shown in FIG.
- the display device includes the display panel 3 and the reflective filter 1 according to any of the above embodiments, and the display panel 3 is located on the light incident side of the reflective filter.
- the reflective filter can also be used to prepare a color filter substrate, and the color filter substrate and the array substrate are paired to form a display panel.
- the photonic crystal layer provided on the reflective filter 1 contains a plurality of photonic crystal regions, and different kinds of photonic crystal regions are used to reflect light of different wavelength bands.
- the display panel 3 may be a liquid crystal display panel, an electrophoretic display panel, an electrowetting display panel, or an electrochromic display panel or the like.
- the display device provided by the embodiment of the present invention may further include a light absorbing unit 4 located on the transmitted light exit side of the reflective filter 1 and configured to absorb the light transmitted through the reflective filter 1 to avoid the light. After reflection, it affects the image display.
- the protective layer may be provided as a light absorbing unit; when the photonic crystal layer is directly disposed on the base substrate, the base substrate may simultaneously serve as a light absorbing unit. Therefore, the display device can greatly improve the reflectance of ambient light, thereby improving the contrast of the display device, making the display of the display device clearer and enhancing the user experience.
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Abstract
Description
Claims
Priority Applications (1)
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US14/649,866 US20150316694A1 (en) | 2013-09-17 | 2014-09-02 | Reflective Filter, Manufacture Method Thereof, and Display Device |
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CN2013104255541A CN103472516A (zh) | 2013-09-17 | 2013-09-17 | 反射式滤光片及其制备方法、显示装置 |
CN201310425554.1 | 2013-09-17 |
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CN103472516A (zh) * | 2013-09-17 | 2013-12-25 | 京东方科技集团股份有限公司 | 反射式滤光片及其制备方法、显示装置 |
CN105720069B (zh) * | 2014-12-01 | 2019-02-05 | 联想(北京)有限公司 | 一种显示装置及电子设备 |
CN104765155B (zh) * | 2015-03-31 | 2017-08-01 | 深圳市光科全息技术有限公司 | 一种虚拟影像显示系统 |
CN105301860A (zh) * | 2015-11-09 | 2016-02-03 | 昆山龙腾光电有限公司 | 蓝相液晶显示面板 |
CN105572955A (zh) * | 2016-02-24 | 2016-05-11 | 京东方科技集团股份有限公司 | 阵列基板及其制作方法、显示面板、触控面板 |
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