WO2014208216A1 - 試料観察装置用のテンプレート作成装置及び試料観察装置 - Google Patents
試料観察装置用のテンプレート作成装置及び試料観察装置 Download PDFInfo
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- WO2014208216A1 WO2014208216A1 PCT/JP2014/063208 JP2014063208W WO2014208216A1 WO 2014208216 A1 WO2014208216 A1 WO 2014208216A1 JP 2014063208 W JP2014063208 W JP 2014063208W WO 2014208216 A1 WO2014208216 A1 WO 2014208216A1
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- sample observation
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
- G06F30/39—Circuit design at the physical level
- G06F30/398—Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM]
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
- G06T7/001—Industrial image inspection using an image reference approach
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/10—Image acquisition modality
- G06T2207/10056—Microscopic image
- G06T2207/10061—Microscopic image from scanning electron microscope
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Definitions
- the present invention relates to a template creation device and a sample observation device for a sample observation device.
- a pattern is obtained by image processing using a template for an image acquired by the device during automatic measurement.
- the measurement location is specified by performing detection.
- a template for image processing can be created using design data such as CAD instead of the SEM image.
- Design data such as CAD is processed and registered as a template, and an image is acquired by a sample observation device to perform pattern detection.
- pattern detection can be performed by performing a deformation process on a pattern registered as a template and comparing it with an image of a pattern to be measured.
- a template can be created without using a wafer.
- Patent Document 1 discloses a method of creating a template image for pattern detection from design data.
- a template image for pattern detection can be approximated to an actual pattern shape by deforming the pattern using information on the size of the pattern, the rounding amount of the corner portion, and the edge size. ing.
- a template can be created only by a process of changing the pattern size, the shape of a corner or an edge.
- the present invention provides a technique for appropriately creating a template for image processing by executing image processing considering a plurality of process processes in consideration of the process processes.
- a template creation apparatus for a sample observation apparatus that creates a template for image processing using design data, which includes a plurality of processes.
- a template creation device comprising: a storage unit that stores process information defining information related to processing; and a template creation unit that processes the design data using the process information and creates a template for image processing Is done.
- a sample observation apparatus including the template creation apparatus.
- the sample observation apparatus includes a pattern detection unit that performs image recognition processing on an image acquired by the sample observation apparatus using the template.
- the pattern detection unit may perform at least one process of pattern deformation, pattern addition, and pattern deletion on the template acquired from the template creation device.
- parameter information in which a plurality of parameters are set.
- parameter information in which parameters are set in an automatic deformation mode.
- registration of design data when a spacer is added twice.
- a charged particle beam apparatus that scans a charged particle beam (for example, electrons) on the surface of a sample and uses secondary generated electrons.
- a charged particle beam for example, electrons
- the embodiment described below can be applied to a charged particle beam apparatus.
- a typical example of the charged particle beam apparatus is an electron microscope (SEM).
- FIG. 1A is a diagram illustrating a configuration of a template creation device for a sample observation device.
- the template creation device 120 of this embodiment is connected to the sample observation device 110.
- the sample observation apparatus 110 includes a pattern measurement unit 111.
- the template creation device 120 includes a template creation unit 121 and a storage unit 122.
- the template creation device 120 can be realized as an image processing device using a general-purpose computer.
- the template creation unit 121 creates a template from design data and process information.
- the pattern measurement unit 111 performs pattern detection and measurement by executing image recognition processing on an image acquired by the sample observation apparatus using the created template.
- the storage unit 122 stores design data, process information, and templates described below.
- the template creation device 120 includes a central processing unit, an auxiliary storage device, a main storage device, and an input / output device.
- the central processing unit is configured by a processor (or a calculation unit) such as a CPU (Central Processing Unit).
- the auxiliary storage device is a hard disk, and the main storage device is a memory.
- the input / output device is a keyboard, a pointing device (such as a mouse), a display, or the like.
- the template creation unit 121 of the template creation device 120 and the pattern measurement unit 111 of the sample observation device 110 may be realized as functions of a program executed on a computer. That is, processing described below may be stored in a memory as program code, and the CPU may execute each program code. Further, the template creation unit 121 and the pattern measurement unit 111 may be realized by hardware, for example, by designing with an integrated circuit.
- the storage unit 122 is realized by the above-described auxiliary storage device or main storage device.
- the sample observation device 110 and the template creation device 120 are configured as separate devices, but the function of the template creation device 120 may be mounted on the sample observation device 110.
- FIG. 1B is a flow for explaining how to create a template for image processing and how to use the template.
- the design data 101 such as CAD is stored in the storage unit 122 described above.
- the design data 101 is generally in the GDSII format or OASIS format configured with information on the vertices of the figure.
- the template creation device 120 can display the design data 101 on the screen of the input / output device or the like, such as displaying a figure by connecting the vertices in the design data with line segments, or filling the figure with an arbitrary color. Is possible.
- the design data 101 used for creating the template may be data other than the GDSII format and the OASIS format.
- process information 102 is also stored in the storage unit 122.
- process information defines the contents of a plurality of process processes executed when creating a pattern.
- the process information 102 is information not included in the design data 101, and the contents will be described later.
- the template creation unit 121 acquires design data 101 and process information 102. Then, the template creation unit 121 executes processing on the design data 101 using the process information 102 (103). The template creation unit 121 registers the processed design data as a template in the storage unit 122 (104).
- the sample observation device 110 acquires a captured image 105 of the pattern on the sample.
- the pattern measurement unit 111 performs pattern detection and measurement by executing image recognition processing on the captured image 105 acquired by the sample observation apparatus 110 using the created template (106).
- the template is registered by executing all processes in advance, but the present invention is not limited to this example.
- information necessary for pattern detection may be registered as a template, and the template may be created by executing all the processing processes in the preprocessing of pattern detection and measurement (106).
- the pattern measurement unit 111 of the sample observation apparatus 110 may execute at least one process of pattern deformation, pattern addition, and pattern deletion as preprocessing to create a final template.
- the template creation process is not limited to being performed by the template creation apparatus 120, and a part of the template creation process may be performed by the sample observation apparatus 110.
- parameters used for template creation may be automatically extracted from the captured image 105 of the sample observation apparatus 110 and registered in the storage unit 122 as a database. Then, the template creation apparatus 120 may execute a template creation process using the information in this database. Further, the template may be used in combination with the position information of the measurement point.
- FIG. 2 is a registration flow of design data 101 and process information 102.
- the registration of the following various types of information may be input via the input device of the template creation device 120, or may be input by a file in a predetermined format.
- the design data 101 is registered in the storage unit 122 of the template creation device 120 (201). Thereafter, a process (here, corresponding to the process 502 in FIGS. 5A to 5D) is registered in the storage unit 122 of the template creation apparatus 120 (202). Next, the processing contents and processing order corresponding to the registered process are registered (203). Then, parameters relating to the processing contents are set (204). Next, when input has not been completed for all processes, the process returns to step 202 (No in 205). When input is completed for all processes (205: Yes), template creation processing is executed (206).
- the design data 101 can be processed in the designated order. If the processing order of the design data 101 is different, the created template has a different shape. Therefore, by designating the processing order of processes, it is possible to make an appropriate modification.
- a template can be created if there is information on the processing contents, processing order, and parameters corresponding to the process, and the process registration (202) is not essential.
- process information, processing contents, processing order, and parameters may be selected from a database created in advance and registered in a batch. Further, only necessary information may be registered as process information 102 except for process information unnecessary for template creation.
- Fig. 3 shows an example of the design data registration screen.
- the design data 101 is stored in the storage unit 122 of the template creation device 120.
- the design data 101 does not necessarily have to be stored in the template creation device 120, and may be acquired from another device via a network.
- the “table” structure is used to explain the information of the present embodiment.
- the information does not necessarily have to be represented by a table data structure, such as a data structure such as a list or a queue, or any other information. It may be expressed as Therefore, “table”, “list”, “queue”, etc. may be simply referred to as “information” in order to show that they do not depend on the data structure.
- the design data 300 includes “Layer No.” (301), “Data Type” (302), “Status” (303), “Tone” (304), and “Process” (305). Is included as a configuration item.
- the design data 300 such as CAD, the data is divided into “Layer No.” (301) and “Data Type” (302), and “Layer No.” (301), “Data Type” (302) used in measurement. 302) is designated “Status” (303).
- the lower layer a plurality of layers can be specified. In that case, it is possible to specify “Lower1,” “Lower2,”... In “Status” (303) and set the layer under Lower1 as “Lower2.”
- the part where the pattern is removed by etching or the like can be set to “Status” (303) as “Cut Mask”, and the part to be processed is “Status” as “Area”. (303) can be set.
- an item “Process” (305) is added to the design data 300 of FIG.
- a layer (“Layer No.”, “Data Type”, multiple selection is possible) for registering the process information 102.
- the process information 102 can be registered on another screen. Details of the process information 102 will be described later.
- the process parameters and parameters may be the same for all measurement points, or a plurality of conditions may be registered by changing parameters according to measurement points, patterns, and regions.
- different process information 102 can be registered in the upper layer (Target) and the lower layer (Lower).
- the upper layer (Target) and the lower layer (Lower) can be processed separately and the information of the upper layer and the lower layer can be registered as templates.
- the processing is basically performed in the order of lower layer ⁇ upper layer, but it is possible to perform processing according to the registration status (processing order, etc.) of the process processing.
- the processing (deformation) of the upper layer pattern may be changed in accordance with the pattern shape of the lower layer.
- the deformation parameter of the upper layer pattern may be changed with respect to the overlapping portion when the upper layer and lower layer patterns overlap.
- the “Status” (303) of the core layer is set to “Target (Core ) ” May be set for distinction.
- the DSA process is formed by adding a BCP pattern to the upper layer (Target) guide pattern
- the “Status” (303) of the guide pattern is set as “Target (Guide)” to distinguish them. Also good. Since the process contents are registered in the process information 102, “Status” (303) may be simply registered as “Target” instead of “Target (Core)” and “Target (Guide)”.
- the setting of “Process” (305) is automatically selected from spacer processes such as SADP and SAQP, and when “Target (Guide)” is selected.
- the setting of “Process” (305) may be automatically selected from the DSA processes. This facilitates the registration of the process information 102.
- FIG. 4 is a display example of design data in the template creation device 120.
- design data 401 for the upper layer (Target), design data 402 for the lower layer (Lower), and design data 403 for the removal area (Cut ⁇ ⁇ Mask) are set and displayed. If the order of processing the design data is different, the image processing templates are different. Therefore, the processing order of process processing is registered as the process information 102, and the order in which the design data is processed is set.
- FIGS. 5A to 5D are examples of process information registration.
- the process information in FIGS. 5A to 5D is data set when the item “Process” (305) of the design data in FIG. 3 is designated as “present”.
- the process information of FIGS. 5A to 5D is registered in association with “Layer No.” (301) of the design data 300 of FIG.
- the process information shown in FIGS. 5A to 5D may be displayed and registered in a batch on the display of the template creation apparatus 120 or may be displayed and set individually.
- the registered process information is stored in the storage unit 122 of the template creation device 120.
- FIG. 5A is an example of process information in the case of “etching twice”.
- FIG. 5B is an example of process information in the case of “spacer addition twice”.
- FIG. 5C is an example of process information in the case of SAQP.
- FIG. 5D is an example of process information in the case of DSA.
- the process information 500 includes a process order 501, a process 502, a processing order 503, processing contents 504, and parameters 505 as configuration items.
- the process information 500 includes at least one of pattern deformation, pattern addition, and pattern deletion as the processing content 504.
- the process order 501 and the process 502 are registered, and information such as a processing order 503, processing contents 504, and parameters 505 necessary for template creation is set.
- the template is created by processing according to the processing order 503, the processing content 504, and the parameter 505.
- the design data can be processed in consideration of the process order.
- the process 502 and the processing content 504 are registered in association with each other, but only the processing order 503, the processing content 504, and the parameter 505 are set and handled without registering the process order 501 and the process 502. It doesn't matter.
- the processing order 503 and the processing content 504 may be set so that information regarding the process content 504 can be understood by a comment or the like.
- the resist pattern design data is excluded from the resist pattern deformation processing in a single deformation processing.
- the deformation process may be performed so as to have a shape after the etching process.
- the setting of the deformation process is a setting in which the deformation process is performed by the etching process without performing the deformation of the resist pattern. good.
- the resist pattern is deformed by simulation or the like, and then the deformation process by etching is performed. It is also possible to do this.
- FIGS. 6A to 6D are examples in which parameter information is registered for the processes and processing contents set in FIGS. 5A to 5D.
- the parameter information in FIGS. 6A to 6D is data set when the parameter 505 item of the process information 500 in FIGS. 5A to 5D is designated as “present”.
- the parameter information in FIGS. 6A to 6D is registered in association with the process 502 in FIGS. 5A to 5D.
- the parameter information in FIGS. 6A to 6D may be displayed and registered in a batch on the display of the template creation apparatus 120 or may be displayed and set individually.
- the registered parameter information is stored in the storage unit 122 of the template creation apparatus 120.
- FIG. 6A is an example of parameter information in the case of “twice etching”.
- FIG. 6B is an example of parameter information in the case of “spacer addition twice”.
- FIG. 6C is an example of parameter information in the case of SAQP.
- FIG. 6D is an example of parameter information in the case of DSA.
- the parameter information 600 includes a processing order 601, processing content 602, and parameters 603 as configuration items. Therefore, it is possible to set different parameters according to the processing contents such as pattern deformation, removal, and addition, that is, it is possible to set parameters according to the processing contents of the process. Since the template is created according to the input value of the parameter, it is possible to create a template with little deviation from the pattern shape.
- the processing contents 602 and the parameters 603 can be expanded and dealt with according to the process and design data.
- FIG. 7A to 7D are other examples in which parameter information is registered for the process and processing contents set in FIG. 5A.
- a plurality of parameter values can be set as shown in FIG. 7B, or a template can be created by changing values automatically (Auto) as shown in FIG. 7D.
- Auto Auto
- the parameter may be changed within a predetermined numerical range.
- a variation value for example, ⁇ 10% or ⁇ 10 nm with respect to the dimension of the design data or the target dimension
- image processing may be performed in consideration of variations.
- the template creation device 120 may be configured to automatically extract parameter information such as deformation processing from the image acquired by the sample observation device 110 and the design data 101 used for the template.
- the template creation device 120 may store parameter information extracted automatically as a database in the storage unit 122 in advance. This facilitates parameter setting when creating a template for a similarly shaped pattern.
- a database may be created in advance.
- the storage unit 122 of the template creation apparatus 120 includes (1) etching twice, (2) adding spacers twice, (3) SADP, (4) SAQP, (5) DSA (shrink process), (6) Process information corresponding to a process such as DSA (subdivision process) and a combination of these process information may be stored in a database format. The operator may select and register parameters as appropriate from the database.
- processing contents may be patterned, and the dimension, interval, and shape information of the pattern to be finally formed may be set as processing contents and parameters.
- an example of creating a template of a pattern created by performing the etching process twice will be described as the first embodiment.
- an etching pattern is created by the first etching process, and then the edge of the pattern is removed by the second etching process.
- FIG. 8A is an example of registration of design data 300 when the etching process is performed twice.
- FIG. 8B is an example of registration of process information 500 when the etching process is performed twice.
- process information 500 “etching (first time)” and “etching (second time)” are set to the design data 300 in this order.
- FIG. 8C is an example of registration of parameter information 600 when the etching process is performed twice.
- the amount of size deformation is set in “Resize”
- the rounding amount of the corner is set in “Smoothing”
- the edge width value is set in “Edge ⁇ Width ”
- “ Edge shape is set in “Edge Shape”.
- “data 1 (target)” is set as target data
- “data 2 (removed)” is set data used for removal.
- the value of edge width is set in “Width”
- the edge shape is set in “Edge Shape”.
- FIG. 9 shows an example of creating a template when the etching process is performed twice.
- the subject of the following processing is the template creation unit 121 of the template creation device 120.
- the template creation unit 121 performs a deformation process on the resist pattern design data 901 by the deformation process, and creates a pattern 911 having a shape created by the first etching process. Thereafter, the template creation unit 121 removes the Cut Mask (902) portion in the second etching process, and creates an image of the pattern 912 after the second etching.
- the deformation process related to the first etching process is executed by performing the deformation of the size, corner, and edge in the same manner as in Patent Document 1.
- the amount of size deformation is set in “Resize”
- the rounding amount of the corner is set in “Smoothing”
- the edge width is set in “Edge Width”.
- the value is set and the edge shape is set to “Edge Shape”.
- the template creation unit 121 executes deformation processing using these parameter information.
- the edge 912a generated by being removed by the second etching has a different shape from the edge 912b after the first etching process by setting the pattern removal parameters “Edge ⁇ Width ”and“ EdgepeShape ”. It is possible to process. That is, it becomes possible to process the edge shape according to a plurality of processes.
- FIG. 10 is another example of template creation when the etching process is performed twice.
- the portion 913 removed by the second etching is retained as information without removing the portion removed by the second etching with respect to the pattern 911 created by the first etching. You may keep it.
- the pattern measurement unit 111 may perform pattern detection (image recognition processing) by masking the portion 913 with respect to the pattern 911. That is, as a template for pattern detection, information on the pattern shape 911 after the first etching and information on the portion 913 of “Cut ⁇ Mask” to be removed by the second etching may be held.
- the creation of the pattern detection image may be adjusted according to the etching state. This makes it possible to detect the pattern by adjusting the template as appropriate immediately before pattern detection.
- the present invention is not limited to this process.
- at least one of pattern deformation, pattern addition, and pattern deletion may be transmitted to the pattern measurement unit 11 as template information.
- the pattern measurement unit 111 can execute at least one process of pattern deformation, pattern addition, and pattern deletion immediately before pattern detection to create a final template.
- the deformation parameter may be set to Auto (Auto) and automatically changed.
- the pattern can be detected by automatically changing the size at the time of pattern detection.
- data of a plurality of templates may be created as a template, and pattern detection may be performed using the plurality of templates.
- FIG. 18 is another example of template creation when the etching process is performed twice.
- design data 1803 created by removing the pattern 1802 removed by the second etching from the resist pattern design data 1801 may be used.
- a final pattern 1813 can be created by executing a deformation process corresponding to the first etching process on the design data 1803.
- the conditions for deformation may be changed according to the positions of the first and second etched patterns. For example, a setting may be made such that the second etched portion is not subjected to deformation processing. Further, the parameters of the deformation process may be changed for each part of the pattern.
- the template creation unit 121 performs the second etching process after the first etching process (deformation process). It is possible to execute a first process for performing an etching process (deleting process) or a second process for performing a first etching process (deformation process) after the second etching process (deleting process). In this example, the transformation process and the deletion process are combined. However, for example, a template can be created by changing the processing order of the processes in the same manner as the combination of the pattern addition process and the pattern deletion process.
- image processing is performed by appropriately performing processing such as pattern addition, removal, and deformation in consideration of the process on a pattern that has been subjected to a plurality of process processing (etching processing is performed twice). Templates can be created. Thereby, pattern detection can be performed stably.
- FIG. 11A is an example of registration of design data 300 when spacers are deposited twice.
- FIG. 11B is an example of registration of process information 500 when spacers are deposited twice.
- process information 500 “etching”, “add spacer 1”, and “add spacer 2” are set to the design data 300 in this order.
- FIG. 11C is an example of registration of parameter information 600 when spacers are deposited twice. Description of parameter information that has already been described is omitted.
- the spacer width is set in “SpacerSpaceWidth”
- the boundary information between the pattern and the spacer 1 is set in “Boundary (I: Inside)”
- “Edge ⁇ Width (O: “Outside” ” sets the outer edge width of the spacer
- “ Edge Shape (O: Outside) ” sets the outer edge shape of the spacer.
- FIG. 12 is an example of creating a template when spacers are deposited twice.
- the subject of the following processing is the template creation unit 121 of the template creation device 120.
- a deformation process is executed on the resist pattern design data 1201 to create a pattern 1202 when processed by an etching process.
- a processing process for adding the spacer 1 1203 is performed on the pattern 1202 after the etching process.
- an image is created by adding the spacer 2 (1204) to the outside of the spacer 1 (1203).
- the shape of the spacer 2 (1204) can be changed according to the shape of the spacer 1 (1203) by setting the parameter 603 or the like. Is possible.
- an image obtained by performing edge extraction on the image with the spacer 2 added is created as a template.
- the boundary information between the pattern 1202 and the spacer 1 (1203) is set in “Boundary (I)”, and to “Boundary (I)” as the parameter 603 of “add spacer 2”.
- the information of the boundary between the spacer 1 (1203) and the spacer 2 (1204) is set.
- the template creation unit 121 uses the “Boundary (I)” parameter so that the contrast (gray level) of the spacer portion is different from the pattern before adding the spacer.
- a template for pattern detection can be created. Thereby, the pattern detection can be performed by recognizing the boundary between the pattern and the spacer.
- Boundary Set (Clear) to (I) As shown in FIG. 12, when “Clear” is set in Boundary (I) of “Add spacer 2”, an image is obtained by adding spacer 2 (1204) having a contrast different from that of spacer 1 (1203). Created.
- the template creation unit 121 creates a plurality of templates, one that distinguishes boundaries and the other that does not distinguish boundaries. This makes it possible to detect a pattern using a plurality of templates.
- information on appearance such as the boundary of the spacer portion (Boundary) and the shape of the edge (Edge Shape) may be stored in the storage unit 122 in advance as a database. Good. This makes it possible to easily set parameters.
- pattern detection may be performed based on the shape, peak position, and width of the signal waveform by converting the image signal into a waveform.
- waveform information from a captured image acquired in advance may be stored in the storage unit 122 as a database. By using this database, pattern detection becomes possible.
- process information related to spacers which is information not included in design data such as CAD
- a template is created using the process information.
- FIG. 13A is an example of registration of SAQP design data 300.
- FIG. 13B is a registration example of the SAQP process information 500.
- the process information 500 is set to execute “etching”, “spacer 1 addition”, “pattern removal”, “spacer 2 addition”, and “spacer 1 removal” in this order for the design data 300.
- FIG. 13C is a registration example of the SAQP parameter information 600. The contents of the parameters are the same as in the above-described embodiment.
- FIG. 14 shows an example of creating a template in the case of SAQP.
- a template for SAQP pattern detection is created based on the design data 1401 of the SAQP core pattern.
- the subject of the following processing is the template creation unit 121 of the template creation device 120.
- the resist pattern design data 1401 is deformed, and a pattern 1402 when processed by etching is created.
- a spacer 1 1403 is added to the pattern 1402 after the etching process.
- the core pattern 1402 to which the spacer 1 (1403) is added is removed by the pattern removal process.
- the edge width and shape of the edge of the portion where the core pattern 1402 is in contact with the spacer 1 (1403) can be set based on the information of the parameter 603 of “pattern removal”.
- the process is completed by adding the spacer 1 and removing the core pattern.
- the spacer 2 (1404) is added to the spacer 1 (1403).
- the parameter of the boundary between the spacer 1 (1403) and the spacer 2 (1404) and the information of the edge of the spacer 2 (1404) can also be set as the parameter 603 of the parameter information 600.
- the spacer 1 (1403) is removed to create a pattern of only the spacer 2 (1404), and the created image is registered as a template. Note that the edge width and shape information of the portion in contact with the spacer 2 (1404) when the spacer 1 (1403) is removed can be set by the parameter 603 of “spacer 1 removal”.
- the difference between the edge shape on the line side and the edge shape on the space side can be distinguished as the edge information of the spacer.
- the difference in edge shape may be stored in advance in the storage unit 122 as a database.
- a template reflecting the edge information of the spacer can be used in pattern detection, and as a result, pattern detection can be performed stably.
- pattern detection may be performed based on the shape, peak position, and width of the signal waveform by using the image signal as a waveform.
- the final pattern of the finished pattern can be changed according to the process without inputting the dimension of the pattern generated in the intermediate processing. It is also possible to cope with this by registering the pitch width, line width, space width, edge information, and the like.
- process information related to the core pattern and spacer portion which is information not included in design data such as CAD, is registered, and a template is created using the process information.
- templates for SADP and SAQP can be created.
- FIG. 15A shows an example of registration of DSA design data 300.
- FIG. 15B is an example of registration of DSA process information 500.
- process information 500 “etching” and “add BCP” are set to the design data 300 in this order.
- FIG. 15C is an example of registration of DSA parameter information 600.
- the contents of the parameters are the same as in the above-described embodiment. Description of parameter information that has already been described is omitted.
- target data is set in “Data 1 (Target)”
- type of pattern here, Shrink Pattern
- Resize is set for the amount of size deformation
- Boundary is set for boundary information between the guide pattern and the BCP pattern.
- FIG. 16 is an example of creating a template for DSA.
- a pattern created by DSA Directed-self assembly
- a block polymer (BCP) is placed in a guide pattern to form a pattern.
- the BCP part in the guide pattern often does not exist as design data.
- Pattern detection is performed by adding information on the pattern formed by the BCP portion to the guide pattern.
- This example shows a setting example of a shrink process for a hole created by adding BCP to a guide pattern for a hole.
- the subject of the following processing is the template creation unit 121 of the template creation device 120.
- a deformation process is executed on the guide pattern design data 1601 to create an etched guide pattern 1602. Thereafter, the BCP pattern 1603 is added to the guide pattern 1602 subjected to the deformation process. In the example of FIG. 16, a pattern further reduced by 50% from the deformed guide pattern 1602 is added as a BCP pattern 1603.
- an image obtained by performing edge extraction on the image to which the BCP pattern 1603 is added is created as a template.
- the present embodiment is an example of a hole shrink process, but is similarly applicable to a subdivision process such as a line pattern.
- a BCP subdivision process pattern in the guide pattern.
- process information related to the DCP portion which is information not included in design data such as CAD, is registered, and a template is created using the process information. This makes it possible to create a DSA template.
- FIG. 17 shows an example in which the upper layer (Target) and the lower layer (Lower) are individually processed. It is assumed that different process information 500 is registered for the upper layer (Target) and the lower layer (Lower).
- deformation processing is executed on the design data 1701 of the upper layer (Target), and a deformed pattern 1711 is created. Thereafter, edge extraction processing is executed for the pattern 1711 to create a pattern 1721 after edge extraction.
- a deformation process is executed on the lower layer (Lower) design data 1702 to create a deformed pattern 1712.
- edge extraction processing is performed on the pattern 1712 to create a pattern 1722 after edge extraction.
- an upper layer (Target) pattern 1721 and a lower layer (Lower) pattern 1722 are overlapped to create a template. According to the present embodiment, it is possible to process the upper layer (Target) and the lower layer (Lower) separately and register the information of the upper layer and the lower layer as a template.
- this invention is not limited to the Example mentioned above, Various modifications are included.
- the above-described embodiments have been described in detail for easy understanding of the present invention, and are not necessarily limited to those having all the configurations described.
- a part of the configuration of one embodiment may be replaced with the configuration of another embodiment, and the configuration of another embodiment may be added to the configuration of one embodiment.
- the present invention may be implemented by software program code that implements the functions of the embodiments.
- a storage medium in which the program code is recorded is provided to an information processing apparatus such as a computer, and the information processing apparatus (or CPU) reads the program code stored in the storage medium.
- the program code itself read from the storage medium realizes the functions of the above-described embodiments, and the program code itself and the storage medium storing it constitute the present invention.
- a storage medium for supplying such program code for example, a flexible disk, CD-ROM, DVD-ROM, hard disk, optical disk, magneto-optical disk, CD-R, magnetic tape, nonvolatile memory card, ROM Etc. are used.
- the configuration of the embodiment may be realized by hardware, for example, by designing a part or all of them with an integrated circuit.
- the program code is stored in a storage device of an information processing device or a storage medium such as a CD-RW or CD-R, and is used when used.
- the CPU of the information processing apparatus may read and execute the program code stored in the storage device or the storage medium.
- program code for realizing the functions described in this embodiment can be implemented by a wide range of programs or script languages such as assembler, C / C ++, perl, Shell, PHP, Java (registered trademark).
- control lines and information lines in the drawings indicate what is considered necessary for the explanation, and not all control lines and information lines on the product are necessarily shown. All the components may be connected to each other.
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Abstract
Description
本発明に関連する更なる特徴は、本明細書の記述、添付図面から明らかになるものである。また、上記した以外の、課題、構成及び効果は、以下の実施例の説明により明らかにされる。
図1Aは、試料観察装置用のテンプレート作成装置の構成を示す図である。本実施例のテンプレート作成装置120は、試料観察装置110に接続されている。試料観察装置110は、パターン計測部111を備える。また、テンプレート作成装置120は、テンプレート作成部121と、記憶部122とを備える。
本実施例では、複数回スペーサを堆積したパターンのテンプレートを作成する例を説明する。図11Aは、スペーサを2回堆積させた場合の設計データ300の登録例である。また、図11Bは、スペーサを2回堆積させた場合のプロセス情報500の登録例である。プロセス情報500では、設計データ300に対して、「エッチング」、「スペーサ1追加」、及び「スペーサ2追加」を当該順で実行することが設定されている。
本実施例では、スペーサプロセスのSAQPのテンプレートを作成する例を説明する。図13Aは、SAQPの設計データ300の登録例である。また、図13Bは、SAQPのプロセス情報500の登録例である。プロセス情報500では、設計データ300に対して、「エッチング」、「スペーサ1追加」、「パターン除去」、「スペーサ2追加」、及び「スペーサ1除去」を当該順で実行することが設定されている。また、図13Cは、SAQPのパラメータ情報600の登録例である。パラメータの内容については上述した実施例と同様である。
本実施例では、DSA(Directed-self assembly)で作成したパターンのテンプレートを作成する例を説明する。図15Aは、DSAの設計データ300の登録例である。また、図15Bは、DSAのプロセス情報500の登録例である。プロセス情報500では、設計データ300に対して、「エッチング」、及び「BCP追加」を当該順で実行することが設定されている。
本実施例では、複数の層に対して加工処理を実行してテンプレートを作成する例について説明する。図17は、上層(Target)と下層(Lower)とを個別に加工処理を行う例である。前提として、上層(Target)と下層(Lower)とに対して、異なるプロセス情報500が登録されているとする。
102 プロセス情報
103 加工
104 画像認識用テンプレート作成
105 撮影画像
106 画像認識
110 試料観察装置
111 パターン計測部
120 テンプレート作成装置
121 テンプレート作成部
122 記憶部
300 設計データ
401 上層(Target)の設計データ
402 下層(Lower)の設計データ
403 除去領域(Cut Mask)の設計データ
500 プロセス情報
600 パラメータ情報
901 設計データのパターン
902 除去領域(Cut Mask)の設計データ
911 変形後のパターン
912 一部パターン除去後のパターン
913 除去領域(Cut Mask)の情報
1201 設計データのパターン
1202 変形後のパターン
1203 スペーサ1
1204 スペーサ2
1401 設計データのコアのパターン
1402 変形後のコアのパターン
1403 スペーサ1
1404 スペーサ2
1601 設計データのガイドパターン
1602 変形後のガイドパターン
1603 BCPパターン
1604 ガイドパターンとBCPパターンの境界
Claims (16)
- 設計データを用いて画像処理用のテンプレートを作成する試料観察装置用のテンプレート作成装置であって、
複数のプロセス処理に関する情報を定義したプロセス情報を格納する記憶部と、
前記プロセス情報を用いて前記設計データを加工処理し、前記画像処理用のテンプレートを作成するテンプレート作成部と、
を備えることを特徴とする試料観察装置用のテンプレート作成装置。 - 請求項1に記載の試料観察装置用のテンプレート作成装置において、
前記複数のプロセス処理に関する情報は、プロセスの処理順序に関する情報と、プロセスの処理内容に関する情報と、プロセスのパラメータに関する情報とを含むことを特徴とする試料観察装置用のテンプレート作成装置。 - 請求項1に記載の試料観察装置用のテンプレート作成装置において、
前記複数のプロセス処理に関する情報は、パターンの変形、パターンの追加、及び、パターンの削除の少なくとも1つのプロセスの情報を含むことを特徴とする試料観察装置用のテンプレート作成装置。 - 請求項3に記載の試料観察装置用のテンプレート作成装置において、
前記複数のプロセス処理に関する情報は、第1のパターンに対して第2のパターンを追加するプロセスの情報を含み、
前記テンプレート作成部は、前記第1のパターンと前記第2のパターンとを区別可能な形式で前記テンプレートを作成することを特徴とする試料観察装置用のテンプレート作成装置。 - 請求項4に記載の試料観察装置用のテンプレート作成装置において、
前記テンプレート作成部は、前記第1のパターンと前記第2のパターンとが異なるコントラストになるように前記テンプレートを作成することを特徴とする試料観察装置用のテンプレート作成装置。 - 請求項3に記載の試料観察装置用のテンプレート作成装置において、
前記複数のプロセス処理に関する情報は、第1のパターンに対して第2のパターンを追加するプロセスの情報を含み、
前記テンプレート作成部は、前記加工処理として第1のパターンに接触するように第2のパターンを追加する場合、前記第1のパターンの形状に合わせて前記第2のパターンを変形させることを特徴とする試料観察装置用のテンプレート作成装置。 - 請求項3に記載の試料観察装置用のテンプレート作成装置において、
前記複数のプロセス処理に関する情報は、第1のパターンを変形あるいは追加するプロセスの情報と、第2のパターンを削除するプロセスの情報とを含み、
前記テンプレート作成部は、前記第1のパターンを変形あるいは追加した後に前記第2のパターンを削除する第1の処理、あるいは、前記第2のパターンを削除した後に第1のパターンを変形あるいは追加する第2の処理のいずれかを実行することを特徴とする試料観察装置用のテンプレート作成装置。 - 請求項3に記載の試料観察装置用のテンプレート作成装置において、
前記複数のプロセス処理に関する情報は、第1のパターンに対して第2のパターンを削除するプロセスの情報を含み、
前記テンプレート作成部は、前記第1のパターンにおいてパターンが削除された領域と、前記第1のパターンにおいてパターンが削除されない領域とで異なる変形処理を実行することを特徴とする試料観察装置用のテンプレート作成装置。 - 請求項8に記載の試料観察装置用のテンプレート作成装置において、
前記パターンが削除された領域は、前記第1のパターンにおいてパターンが削除されたエッジであり、前記パターンが削除されない領域は、前記第1のパターンにおいてパターンが削除されないエッジであることを特徴とする試料観察装置用のテンプレート作成装置。 - 請求項2に記載の試料観察装置用のテンプレート作成装置において、
前記複数のプロセス処理に関する情報は、第1の層に関するプロセスの情報と、前記第1の層の下にある第2の層に関するプロセスの情報とを含み、
前記テンプレート作成部は、前記第1の層と前記第2の層とを個別に加工処理し、前記加工処理された前記第1の層の画像と前記第2の層の画像を重ね合わせることにより、前記テンプレートを作成することを特徴とする試料観察装置用のテンプレート作成装置。 - 請求項2に記載の試料観察装置用のテンプレート作成装置において、
前記プロセスのパラメータに関する情報は、1つのパラメータについて複数のパラメータの情報を含むか、あるいは、1つのパラメータについてばらつきに関する情報を含み、
前記テンプレート作成部は、前記複数のパラメータ、あるいは、前記パラメータのばらつきに関する情報を用いて、前記テンプレートを複数作成することを特徴とする試料観察装置用のテンプレート作成装置。 - 請求項2に記載の試料観察装置用のテンプレート作成装置において、
前記テンプレート作成部は、前記プロセスのパラメータに関する情報を所定の幅で自動的に変更することにより、前記テンプレートを複数作成することを特徴とする試料観察装置用のテンプレート作成装置。 - 請求項2に記載の試料観察装置用のテンプレート作成装置において、
前記プロセスのパラメータに関する情報は、前記試料観察装置の撮像画像及び前記設計データから抽出した情報であることを特徴とする試料観察装置用のテンプレート作成装置。 - 請求項1に記載のテンプレート作成装置を備える試料観察装置であって、
前記テンプレートを用いて前記試料観察装置で取得した画像に対して画像認識処理を実行するパターン検出部を備えることを特徴とする試料観察装置。 - 請求項14に記載の試料観察装置において、
前記パターン検出部は、前記テンプレート作成装置から取得した前記テンプレートに対して、パターンの変形、パターンの追加、及び、パターンの削除の少なくとも1つの処理を実行することを特徴とする試料観察装置。 - 請求項15に記載の試料観察装置において、
前記複数のプロセス処理に関する情報は、第1のパターンに対して第2のパターンを削除するプロセスの情報を含み、
前記テンプレート作成部は、前記テンプレートとして、前記第1のパターンの画像と、前記第2のパターンに関する情報とを作成し、
前記パターン検出部は、前記第1のパターンの画像から前記第2のパターンを削除したテンプレートを用いて、前記画像認識処理を実行することを特徴とする試料観察装置。
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