WO2013189996A1 - Thermochromes glas mit beschichtung von farbneutralem vanadiumdioxid - Google Patents
Thermochromes glas mit beschichtung von farbneutralem vanadiumdioxid Download PDFInfo
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- WO2013189996A1 WO2013189996A1 PCT/EP2013/062770 EP2013062770W WO2013189996A1 WO 2013189996 A1 WO2013189996 A1 WO 2013189996A1 EP 2013062770 W EP2013062770 W EP 2013062770W WO 2013189996 A1 WO2013189996 A1 WO 2013189996A1
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- WIPO (PCT)
- Prior art keywords
- layer
- vanadium dioxide
- thermochromic
- doped
- glass
- Prior art date
Links
- 229910021542 Vanadium(IV) oxide Inorganic materials 0.000 title claims abstract description 52
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 title claims abstract description 52
- 238000000576 coating method Methods 0.000 title claims abstract description 30
- 239000011248 coating agent Substances 0.000 title claims abstract description 23
- 239000011521 glass Substances 0.000 title claims abstract description 23
- 229910052791 calcium Inorganic materials 0.000 claims abstract description 30
- 229910052788 barium Inorganic materials 0.000 claims abstract description 15
- 229910052712 strontium Inorganic materials 0.000 claims abstract description 15
- 239000011575 calcium Substances 0.000 claims description 31
- 229910052721 tungsten Inorganic materials 0.000 claims description 25
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 19
- 239000010937 tungsten Substances 0.000 claims description 19
- 229910052731 fluorine Inorganic materials 0.000 claims description 18
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 17
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 17
- 238000004544 sputter deposition Methods 0.000 claims description 16
- 239000011737 fluorine Substances 0.000 claims description 15
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 12
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 12
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 6
- 239000005083 Zinc sulfide Substances 0.000 claims description 6
- 239000004408 titanium dioxide Substances 0.000 claims description 6
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 6
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 6
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 5
- 239000005357 flat glass Substances 0.000 claims description 5
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000004033 plastic Substances 0.000 claims description 3
- 229920003023 plastic Polymers 0.000 claims description 3
- YOXKVLXOLWOQBK-UHFFFAOYSA-N sulfur monoxide zinc Chemical compound [Zn].S=O YOXKVLXOLWOQBK-UHFFFAOYSA-N 0.000 claims description 3
- 239000004753 textile Substances 0.000 claims description 3
- 239000011787 zinc oxide Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000013078 crystal Substances 0.000 claims description 2
- 230000035622 drinking Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- -1 aluminum oxynitride Chemical class 0.000 claims 1
- 229910000906 Bronze Inorganic materials 0.000 abstract description 4
- 239000010974 bronze Substances 0.000 abstract description 4
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 4
- 230000007935 neutral effect Effects 0.000 abstract description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 14
- 230000005540 biological transmission Effects 0.000 description 11
- 238000000151 deposition Methods 0.000 description 11
- 230000008021 deposition Effects 0.000 description 9
- 238000002834 transmittance Methods 0.000 description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000001419 dependent effect Effects 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 5
- 230000003595 spectral effect Effects 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 5
- 230000007704 transition Effects 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000010348 incorporation Methods 0.000 description 3
- 238000003980 solgel method Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000000411 transmission spectrum Methods 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 3
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- QUEDYRXQWSDKKG-UHFFFAOYSA-M [O-2].[O-2].[V+5].[OH-] Chemical compound [O-2].[O-2].[V+5].[OH-] QUEDYRXQWSDKKG-UHFFFAOYSA-M 0.000 description 1
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 1
- 229910001632 barium fluoride Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000009435 building construction Methods 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000004042 decolorization Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000012025 fluorinating agent Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- FVRNDBHWWSPNOM-UHFFFAOYSA-L strontium fluoride Chemical compound [F-].[F-].[Sr+2] FVRNDBHWWSPNOM-UHFFFAOYSA-L 0.000 description 1
- 229910001637 strontium fluoride Inorganic materials 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3447—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide
- C03C17/3452—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide comprising a fluoride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3464—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a chalcogenide
- C03C17/347—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a chalcogenide comprising a sulfide or oxysulfide
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K9/00—Tenebrescent materials, i.e. materials for which the range of wavelengths for energy absorption is changed as a result of excitation by some form of energy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/24—Doped oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/262—Light metals other than Al
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Definitions
- thermochromic glass coating or a method for producing the same.
- thermochromic coatings have a temperature varying transmittance for electromagnetic radiation, e.g. IR, VIS, UV and should be used in building construction as glass window or glass facade coatings to influence the indoor climate and save energy.
- vanadium dioxide VO 2 In DE69910322T2 a glass coating of vanadium dioxide VO 2 was described with alkali metal doping.
- the vanadium dioxide has a phase transition at about 68 ° C. Above this temperature it presents as a metallic phase and reflects electromagnetic radiation, especially in the infrared spectral range (500 to 2000 nm). Below this temperature is a semiconducting phase and allows infrared radiation through. This is called a thermochromic effect.
- the phase transition temperature can be reduced by doping with tungsten.
- the transmittance for visible light deteriorates, but can be increased by means of fluorine doping.
- the switching properties worsen when doped with fluorine.
- Vanadium dioxide has a bronze color. This is particularly disadvantageous since this color acts as a filter for the visible light. This considerably limits the transmission in the visible range of the electromagnetic radiation. The above-mentioned document gives no solution, since this coloration can be prevented neither by the layer thickness nor by further layers.
- DE3347918C2 proposes the reduction of the vanadium dioxide to vanadium trioxide V 2 O 3 , which is gray. Vandium trioxide has a phase transition at 168 K and is therefore not suitable for use as a thermochromic window glass coating. A suitable phase transition is present in the range 300 K to 373 K.
- the vanadium dioxide layer is applied by CVD.
- Object of the present invention is to eliminate or circumvent the disadvantages of the prior art. [Solution of the task]
- This object is achieved according to the invention by a glass coating, wherein the coating comprises vanadium dioxide. This is preferred
- Vanadium dioxide layer doped with tungsten and / or fluorine The decolorization of the vanadium dioxide is achieved by doping with alkaline earth elements, e.g. Calcium (Ca), strontium (Sr), barium (Ba) achieved individually or in combination.
- alkaline earth elements e.g. Calcium (Ca), strontium (Sr), barium (Ba) achieved individually or in combination.
- This doping of the vanadium dioxide layer with the alkaline earth elements takes place directly in the vanadium dioxide or in addition to doping with tungsten, fluorine or other elements (eg alkali metals-1HG: Li, Na, K, Rb, Cs, elements of the 3, 4. , 5 HG - eg B, Al, Ga, In, Si, Ge, Sn, Pb, P, As, Sb, Bi and transition metals, except Mg, Ca, Sr, Ba,).
- alkali metals-1HG Li, Na, K, Rb, Cs, elements of
- the co-doping with tungsten and calcium has shown that a synergy of the two effects described above is achieved. This has the consequence that on the one hand due to the tungsten installation, the switching temperature T c is reduced in the range of room temperature. On the other hand, the incorporation of calcium in the coatings produced in this way leads to an increase in the light transmittance, in particular in the visible spectral range, whereby the light absorption edge undergoes a blue shift. The visual appearance of such a coating changes with increasing calcium concentration from a bronze to a neutral color impression.
- the tungsten concentration in the thermochromic coatings according to the present invention is in the range of 0.01 to 3.0 atomic%, preferably 0.4 to 2.6 atomic%.
- the concentration of an alkaline earth metal of the group consisting of Ba, Sr and Ca, preferably calcium, is in the range of 0.01 to 15 atomic%, preferably 1.0 to 10.0 atomic%.
- the fluorine concentration is in the range of 0.01 to 2.0 atomic percent, preferably 0.5 to 1.5 atomic percent.
- the vanadium dioxide layer has a thickness of 10 to 300 nm, preferably in the range of 40 to 100 nm.
- a seed layer is preferably added, which promotes the crystallization of the vanadium dioxide layer even at low temperatures ( ⁇ 400 ° C).
- titanium dioxide or silicon oxide preferably titanium dioxide.
- the seed layer (also intermediate layer) has a thickness of 5 to 200 nm, preferably in the range of 10 to 70 nm.
- Post-oxidation of the doped vanadium dioxide layer, with W or F or an alkaline earth metal of the group comprising Ba, Sr, and Ca, or the codoped vanadium dioxide layer, with W or F and an alkaline earth metal of the group comprising Ba, Sr, and Ca, can be replaced by a Cover layer can be prevented.
- This cover layer also serves as an anti-reflection layer, thereby further improving the light transmittance. It has been shown that it is advantageous if the cover layer has a thickness of 10 to 300 nm, preferably 40 to 100 nm.
- the vanadium dioxide layer is deposited by a sputtering method, preferably a radio frequency sputtering method or DC sputtering method.
- a coating via CVD, other PVD methods, sol-gel method and this plasma-assisted can be achieved.
- targets of the elements, elemental oxides or elemental fluorides of vanadium, tungsten, calcium, strontium, barium are used individually or in combination. This is through
- Sputtering in an argon-oxygen atmosphere allows the transfer of the elements to the glass as a carrier feasible.
- the ratio of the mass flows of the gases argon and oxygen is preferably in the range from 5.7 to 1.4.
- additional gaseous fluorine doping is tetrafluoromethane (CF 4 ) or
- Trifluoromethane (CHF 3 ) was added to the argon.
- the ratio of the mass flows of the gases argon, oxygen and CF 4 to each other preferably in the range of 5.7 to 1, 4 to 0.3.
- Similar conditions apply to the addition of other fluorinating agents such as CHF 3 .
- the fluorinated elements are, for example, calcium fluoride,
- Strontium fluoride and or barium fluoride used as substrates An employment of fluorinated elements and fluorine-containing gas is also an embodiment.
- the glass At a deposition temperature of room temperature up to 400 ° C, the glass is first coated with a titanium dioxide layer as a seed layer and then applied a vanadium dioxide layer with the dopants.
- the doped vanadium dioxide layer is preferably covered with a cover layer, which is preferably formed as an antireflection layer.
- thermochromic layer is used for glass (e.g., window glass, glass tubes, drinking glasses), plastics, textiles, solar cells (photovoltaic), solar collectors (hot water treatment).
- glass e.g., window glass, glass tubes, drinking glasses
- plastics e.g., plastics, textiles, solar cells (photovoltaic), solar collectors (hot water treatment).
- solar cells photovoltaic
- solar collectors hot water treatment
- Fig. 1 shows according to the present invention, the basic structure of a thermochromic coating 10, as it can be applied to a window glass pane 12, for example.
- a thermochromic coating 10
- a window glass pane 12 for example.
- a titanium oxide layer 14 with reactive high-frequency or radio-frequency Sputtering deposited on a glass substrate 12.
- the titanium oxide layer thus formed forms a seed layer on the glass substrate 12.
- the power of the high-frequency generator during sputtering is preferably in the range of 100 to 600 W (corresponding to 1.2 to 7.4 W / cm 2 ), most preferably 300 W (corresponding to 3.7 W / cm 2 ) when depositing the titanium oxide layer.
- the deposition temperature is preferably in the range of room temperature to 600 ° C, most preferably about 300 ° C.
- a vanadium dioxide layer is applied to the titanium dioxide layer by a tungsten or calcium-containing vanadium target or vanadium oxide target with a reactive high-frequency or radio-frequency cathode sputtering.
- the vanadium dioxide layer 16 is the thermochromic layer.
- the layer contains approx. 3.3% Ca with 0.2% W and 0.3% F, remainder V0 2 .
- the coating contains 8.9% Ca with 0.4% W residue V0 2 .
- a coating with 8.9% Ca residue V0 2 was prepared.
- a coating with about 9% Sr residue V0 2 was produced.
- a coating with about 9% Ba residue V0 2 was prepared.
- the power of the high-frequency generator during sputtering when depositing the doped vanadium dioxide layer is preferably in the range of 100 to 600 W (corresponding to 1.2 to 7.4 W / cm 2 ), most preferably 300 W (corresponding to 3.7 W / cm 2 ) while the deposition temperature is preferably in the range of 100 to 600 ° C, most preferably about 400 ° C.
- a vanadium dioxide layer co-doped with fluorine and an alkaline earth metal of the group comprising Ba, Sr, and Ca, and vanadium dioxide layer co-doped with tungsten and an alkaline earth metal of the group comprising Ba, Sr, and Ca contains the following Preferred preferred formulas for the thermochromic layer, wherein M denotes the corresponding alkaline earth metal:
- a tri-doped vanadium dioxide layer is formed with fluorine, tungsten, and an alkaline earth metal of the group comprising Ba, Sr, and Ca.
- the composition can be described by the following formula, wherein M denotes the alkaline earth metal:
- thermochromic doped vanadium dioxide layer 16 On the thermochromic doped vanadium dioxide layer 16, a covering layer or covering layer 18, which is likewise deposited using high-frequency cathode sputtering, is then applied, which preferably consists of zinc sulfide. Furthermore, aluminum oxynitride, aluminum nitride, aluminum oxide, zinc oxysulfide or zinc oxide or mixed phases of these compounds (including zinc sulfide) are used instead of zinc sulfide.
- This cover layer 18 serves the thermochromic layer 16 as protection against post-oxidation and as an anti-reflection layer, whereby the light transmittance is increased, especially in the visible spectral range.
- the power of the high frequency generator during sputtering is preferably in the range of 100 to 600 W (corresponding to 1.2 to 7.4 W / cm 2 ), most preferably 200 W (corresponding to 2.5 W / cm) in the deposition of the zinc sulfide cap layer 2 ), while the deposition temperature is preferably in the range of room temperature to 400 ° C, most preferably at room temperature.
- FIG. 2 shows the wavelength-dependent transmission behavior for a calcium-doped or tungsten-calcium-codoped high-frequency cathode sputtering system, vanadium dioxide layer 16 deposited on glass, without titanium dioxide layer 14 and without anti-reflection top layer.
- a vanadium dioxide layer doped only with tungsten is shown for comparison.
- the layers were produced at a deposition temperature of about 600 ° C (without gaseous fluorine doping).
- the low temperature phase measured at 20 ° C and the high temperature phase at 100 ° C of the three layers can be seen.
- the only layer doped with calcium has a significantly higher transmission with respect to the tungsten-only doped layer for the range from 300 to 2500 nm.
- the layer codoped with calcium and tungsten shows less transmission for the range of 300 to 2500 nm than the layer doped with calcium only, but higher transmission than the layer doped with tungsten alone.
- the difference in transmission between the low-temperature and high-temperature phases is significantly greater compared to the other layers.
- FIG. 3 shows the wavelength-dependent transmission behavior of vanadium dioxide layers 16 doped with different calcium concentrations and deposited on the high-frequency sputtering system with a 20 nm thick titanium oxide intermediate layer 14 but without an anti-reflection topcoat. The layers were produced at a deposition temperature of about 400 ° C.
- FIG. 4 shows a table which includes the switching temperatures, the absorption edges (band gap) and the determined element concentrations as well as the spectral transmittance of the high (measured at 100 ° C.) and low-temperature (measured at 20 ° C.) for different thermochromic coatings the same conditions for the film formation, as shown in the measured layers in Fig. 2.
- the co-doping with tungsten and calcium has a synergistic effect, ie the codoped layers have a shifting of the switching temperature to lower temperatures caused mainly by the tungsten and a shift of the absorption edge to higher energies or lower wavelengths, respectively Doping with calcium.
- FIG. 5 depicts the wavelength-dependent transmission behavior for a strontium-doped and barium-doped and an undoped vanadium dioxide layer 16 deposited on glass at the high-frequency cathode sputtering system without an intermediate titanium oxide layer 14 and without an anti-reflection cover layer.
- the layers were produced at a deposition temperature of about 650 ° C.
- the determined barium or strontium concentrations are about 9 atomic percent.
- the strontium and barium doped layers of FIG. 5 exhibit a similar switching behavior.
- the transmission in the range of 300 to 2500 nm is significantly higher and the absorption edge is only at higher energies or lower wavelengths than in the undoped vanadium dioxide layer in Fig. 5.
- Increasing the transmittance, especially in the blue spectral range, has the consequence the optical appearance of the thermochromic coating is substantially improved over the vanadium dioxide layers doped with fluorine or tungsten which are known from the prior art, and the switching temperature is shifted into the region of room temperature due to simultaneous tungsten or fluorine incorporation.
- thermochromic coating according to the invention also increases in the high-temperature phase compared to the tungsten-doped vanadium dioxide coating, the difference in transmission between the high and low temperature phases remains approximately the same for sample Ca48 (see FIG Fig. 4) it even rises.
- Textiles or plastics are coated at temperatures of about 100 ° C to 200 ° C with doped vanadium dioxide.
- the doped vanadium dioxide layer is to be applied to a seed layer, wherein in addition to the sputtering, PVD or sol-gel methods can be used. For sol-gel methods, it is important to ensure as even a layer thickness as possible.
- thermochromic coating for window glass shows a basic structure of a thermochromic coating for window glass according to the present invention
- FIG. 2 wavelength-dependent transmission spectrum of a) with Ca, b) with W and c) doped with W and Ca thermochromic vanadium dioxide coating
- FIG. 3 shows wavelength-dependent transmission spectra of thermochromic vanadium dioxide coatings doped with different Ca concentrations
- FIG. Fig. 4 is a table of switching temperatures and absorption edges (bandgap) of different thermochromic vanadium dioxide-based coatings
- Fig. 5 wavelength-dependent transmission spectra of doped with Ba and Sr doped and undoped thermochromic vanadium dioxide coating.
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Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
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EP13732868.8A EP2864267B1 (de) | 2012-06-21 | 2013-06-19 | Thermochromes glas mit beschichtung von farbneutralem vanadiumdioxid |
US14/409,989 US9309147B2 (en) | 2012-06-21 | 2013-06-19 | Thermochromic glass comprising a coating of neutral-colour vanadium dioxide |
KR1020157001512A KR102079411B1 (ko) | 2012-06-21 | 2013-06-19 | 무색 바나듐 디옥사이드가 코팅된 서모크로믹 유리 |
JP2015517749A JP6385923B2 (ja) | 2012-06-21 | 2013-06-19 | ガラス用のサーモクロミック層、サーモクロミックコーティング、ガラス、サーモクロミック層の製造方法、サーモクロミックコーティングの製造方法およびサーモクロミック層の使用方法 |
CN201380031997.0A CN104583145B (zh) | 2012-06-21 | 2013-06-19 | 具无色二氧化钒涂层的热变色玻璃 |
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DE102012012219.5 | 2012-06-21 | ||
DE102012012219.5A DE102012012219B4 (de) | 2012-06-21 | 2012-06-21 | Thermochrome Schicht für Glas, Verfahren zur Herstellung einer thermochromen Schicht und Verwendung einer thermochromen Schicht |
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CN116426265A (zh) * | 2023-04-10 | 2023-07-14 | 贵州民族大学 | 一种钨镁掺杂二氧化钒热致变色薄膜的制备方法 |
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KR101761864B1 (ko) * | 2015-10-23 | 2017-08-07 | (주)세온 | 직물 처리 장치 |
WO2017077797A1 (ja) * | 2015-11-06 | 2017-05-11 | コニカミノルタ株式会社 | サーモクロミックフィルム及びサーモクロミック複合体 |
EP3411511A1 (de) * | 2016-02-04 | 2018-12-12 | Ecole Polytechnique Federale de Lausanne (EPFL) | Beschichtung für optische und elektronische anwendungen |
FR3054676B1 (fr) | 2016-07-28 | 2018-08-31 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif thermochrome tout-solide, et procede de preparation de ce dispositif |
WO2018105238A1 (ja) * | 2016-12-06 | 2018-06-14 | コニカミノルタ株式会社 | 二酸化バナジウム含有粒子、サーモクロミックフィルム及び二酸化バナジウム含有粒子の製造方法 |
US10737948B2 (en) * | 2018-09-05 | 2020-08-11 | University Of South Carolina | Polar oxysulfide for nonlinear optical applications |
KR102559753B1 (ko) * | 2018-11-01 | 2023-07-27 | 삼성전자주식회사 | 조리장치 |
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2012
- 2012-06-21 DE DE102012012219.5A patent/DE102012012219B4/de active Active
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- 2013-06-19 WO PCT/EP2013/062770 patent/WO2013189996A1/de active Application Filing
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- 2013-06-19 EP EP13732868.8A patent/EP2864267B1/de active Active
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GB2114965A (en) * | 1982-02-01 | 1983-09-01 | Ppg Industries Inc | Vanadium oxide coatings |
EP0994081A1 (de) * | 1998-10-13 | 2000-04-19 | Glaverbel | Sonnenschutzbeschichtetes Glas |
US20020037421A1 (en) * | 2000-05-23 | 2002-03-28 | Saint-Gobain Glass France | Glazing coated with at least one layer having thermochromic properties |
US20030054177A1 (en) * | 2001-09-20 | 2003-03-20 | National Inst. Of Advanced Ind. Science And Tech. | Multifunctional energy efficient window coating |
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CN116426265B (zh) * | 2023-04-10 | 2024-05-14 | 贵州民族大学 | 一种钨镁掺杂二氧化钒热致变色薄膜的制备方法 |
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KR20150036136A (ko) | 2015-04-07 |
DE102012012219A1 (de) | 2013-12-24 |
CN104583145A (zh) | 2015-04-29 |
KR102079411B1 (ko) | 2020-02-19 |
JP2015527958A (ja) | 2015-09-24 |
US9309147B2 (en) | 2016-04-12 |
JP6385923B2 (ja) | 2018-09-05 |
DE102012012219B4 (de) | 2014-12-24 |
EP2864267A1 (de) | 2015-04-29 |
EP2864267B1 (de) | 2017-12-27 |
US20150203398A1 (en) | 2015-07-23 |
CN104583145B (zh) | 2018-10-19 |
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