WO2013159369A1 - 液晶面板的制作方法 - Google Patents

液晶面板的制作方法 Download PDF

Info

Publication number
WO2013159369A1
WO2013159369A1 PCT/CN2012/074988 CN2012074988W WO2013159369A1 WO 2013159369 A1 WO2013159369 A1 WO 2013159369A1 CN 2012074988 W CN2012074988 W CN 2012074988W WO 2013159369 A1 WO2013159369 A1 WO 2013159369A1
Authority
WO
WIPO (PCT)
Prior art keywords
liquid crystal
crystal panel
substrate
fabricating
color film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2012/074988
Other languages
English (en)
French (fr)
Inventor
王俊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US13/512,590 priority Critical patent/US9151980B2/en
Publication of WO2013159369A1 publication Critical patent/WO2013159369A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133354—Arrangements for aligning or assembling substrates

Definitions

  • the present invention relates to the field of liquid crystal display, and more particularly to a method for fabricating a liquid crystal panel which can effectively reduce or refine bubbles and dirt between liquid crystal panel film layers.
  • Thin film transistor liquid crystal display (Thin Film Transistor Liquid) in flat panel display device Crystal Dsiplay (TFT-LCD) has a small size, low power consumption, relatively low manufacturing cost and no radiation, and it has a dominant position in the current flat panel display device market.
  • the liquid crystal panel of a general TFT-LCD is composed of an array substrate (TFT substrate) and a color filter substrate (Color).
  • the filter substrate is bonded to each other.
  • the array substrate is generally used for 5 times of photolithography (5 mask) or 4 times of photolithography (4).
  • Mask Mask
  • the TFT substrate includes a plurality of array thin film layers such as a source layer 101, a gate layer 102, a drain layer 103, an active layer 104, an insulating layer 105, and a first electrode layer 106.
  • the CF substrate includes a plurality of color film layers such as a black matrix layer 201, a red-green-blue layer 202, and a second electrode layer 203.
  • the object of the present invention is to provide a method for fabricating a liquid crystal panel, which can change the surface properties of each film layer of the substrate of the liquid crystal panel, so as to make the bonding between the film layers more tight and effectively reduce or refine the interlayer between the liquid crystal panel films.
  • Air bubbles and dirt can solve the technical problem that bubbles and dirt are easily formed between the substrate film layers by the conventional method for fabricating a liquid crystal panel.
  • the present invention relates to a method for fabricating a liquid crystal panel, comprising the steps of: A, sequentially forming a plurality of array thin film layers on a first glass substrate to obtain an array substrate; and B, ultrasonically cleaning the array substrate to eliminate the
  • the method of fabricating the liquid crystal panel further comprises the steps of: forming a plurality of color film layers on the second glass substrate in sequence after the step A and the step B; Obtaining a color filter substrate; and B1, performing ultrasonic cleaning on the color filter substrate to eliminate bubbles and dirt between the color filter film layers; after the step B1, the method for fabricating the liquid crystal panel further includes the steps : C.
  • the ultrasonically cleaned array substrate and the corresponding color film substrate are attached to a liquid crystal cell.
  • the invention further relates to a method for fabricating a liquid crystal panel, comprising the steps of: A, sequentially forming a plurality of array thin film layers on a first glass substrate to obtain an array substrate; and B, ultrasonically cleaning the array substrate to eliminate the Air bubbles and dirt between the array film layers.
  • the array thin film layer includes a source layer, a gate layer, a drain layer, an insulating layer, and a first electrode layer.
  • the method for fabricating the liquid crystal panel further includes the steps of: A1, sequentially forming a plurality of color film films on the second glass substrate. a layer to obtain a color filter substrate; and B1, ultrasonic cleaning the color filter substrate to eliminate air bubbles and dirt between the color film layers.
  • the method for fabricating the liquid crystal panel before the step A and the step B, further includes the steps of: A1, sequentially forming a plurality of color film films on the second glass substrate. a layer to obtain a color filter substrate; and B1, ultrasonic cleaning the color filter substrate to eliminate air bubbles and dirt between the color film layers.
  • the method for fabricating the liquid crystal panel further includes the steps of: A1, sequentially forming a plurality of color film films on the second glass substrate. a layer to obtain a color filter substrate; and B1, ultrasonic cleaning the color filter substrate to eliminate air bubbles and dirt between the color film layers.
  • the color film layer includes a black matrix layer, a red green blue layer, and a second electrode layer.
  • the method further comprises: C. laminating the ultrasonically cleaned array substrate and the corresponding color filter substrate into a liquid crystal cell.
  • the ultrasonic wave in the ultrasonic cleaning is 20,000 to 1,000,000 Hz
  • the ultrasonic power is 0.1 to 20 watts/cm 2
  • the ultrasonic treatment time in the ultrasonic cleaning is 20 to 240 seconds.
  • the invention further relates to a method for fabricating a liquid crystal panel, comprising the steps of: A2, sequentially forming a plurality of color film layers on a second glass substrate to obtain a color film substrate; and B2, performing ultrasonic cleaning on the color film substrate In order to eliminate bubbles and dirt between the color film layers.
  • the color film layer includes a black matrix layer, a red green blue layer, and a second electrode layer.
  • the method further comprises: C2, bonding the color filter substrate after the ultrasonic cleaning and the corresponding array substrate to a liquid crystal cell.
  • the ultrasonic wave in the ultrasonic cleaning is 20,000 to 1,000,000 Hz
  • the ultrasonic power is 0.1 to 20 watts/cm 2
  • the ultrasonic treatment time in the ultrasonic cleaning is 20 to 240 seconds.
  • the surface property of each film layer of the substrate of the liquid crystal panel can be changed, so as to make the bonding between the film layers more tight and effectively reduce or refine bubbles and dirt between the liquid crystal panel film layers, thereby solving the production of the existing liquid crystal panel.
  • the method has the technical problem of easily forming bubbles and dirt between the substrate film layers.
  • FIG. 1 is a schematic structural view of an array substrate of a conventional liquid crystal panel
  • FIG. 2 is a schematic structural view of a color filter substrate of a conventional liquid crystal panel
  • FIG. 3 is a flow chart of a first preferred embodiment of a method of fabricating a liquid crystal panel of the present invention
  • FIG. 4 is a flow chart showing a second preferred embodiment of a method of fabricating a liquid crystal panel of the present invention.
  • Fig. 5 is a flow chart showing a third preferred embodiment of the method of fabricating the liquid crystal panel of the present invention.
  • FIG. 3 is a flow chart of a first preferred embodiment of a method for fabricating a liquid crystal panel of the present invention.
  • the method for fabricating the liquid crystal panel of the present invention begins in step 301.
  • step 301 a plurality of array thin film layers are sequentially formed on the first glass substrate to obtain an array substrate, and then step 302 is performed.
  • step 302 the array substrate is ultrasonically cleaned to eliminate air bubbles and dirt between the array film layers, and then step 303 is performed.
  • step 303 the ultrasonically cleaned array substrate and the corresponding color filter substrate are attached to a liquid crystal cell.
  • step 303 ends in step 303.
  • a plurality of array thin film layers are sequentially formed on the first glass substrate by a plurality of photolithography processes to obtain an array substrate, wherein the array thin film layer includes a source layer, a gate layer, a drain layer, an insulating layer, and an ohmic layer. a contact layer, a metal layer, a first electrode layer, and the like.
  • the source layer, the gate layer and the drain layer together form a thin film field effect transistor, the gate layer is connected to the scan line, the source layer is connected to the data line, and the drain layer is connected to the first electrode layer, and the scan line and the data are realized.
  • the line controls the output voltage of the first electrode layer, thereby controlling the steering of the liquid crystal molecules in the liquid crystal panel.
  • the ohmic contact layer, various insulating layers, and metal layers ensure proper operation of various portions of the array substrate, such as thin film field effect transistors.
  • the first electrode layer may be a transparent conductive metal layer connected to the drain layer to control the steering of the liquid crystal molecules in the liquid crystal panel.
  • the material of the first electrode layer may be, for example, indium tin oxide (ITO), tin oxide (TO), indium zinc oxide (IZO), and indium tin zinc oxide (ITZO).
  • step 302 the array substrate obtained in step 301 is ultrasonically cleaned to eliminate air bubbles and dirt between the array film layers.
  • the prepared array substrate is placed in an ultrasonic cleaning container, and then in an ultrasonic cleaning container. Inject the cleaning solution until the entire array substrate is completely covered, adjust the frequency of the ultrasonic wave to 20,000 to 1,000,000 Hz, adjust the power of the ultrasonic wave to 0.1 to 20 watts/cm 2 , and perform ultrasonic waves for 20 to 240 seconds on the array substrate in the cleaning solution.
  • the specific ultrasonic frequency, ultrasonic power and cleaning time can be adjusted according to the cleaning situation (for example, the user needs to reduce or refine the bubble or dirt to a large size), such as poor cleaning effect, can be appropriately increased Ultrasonic power or extended cleaning time; if some bubbles and dirt can not be reduced or refined after repeated ultrasonic power adjustment, it can be cleaned by changing the frequency of ultrasonic waves (high frequency ultrasound (such as 500,000 Hz or more) Can effectively reduce or refine smaller particles of bubbles and dirt, while low-frequency ultrasound (such as 10 0,000 Hz or less) The effect of reducing or refining large particles of bubbles and dirt is better).
  • high frequency ultrasound such as 500,000 Hz or more
  • low-frequency ultrasound such as 10 0,000 Hz or less
  • the frequency of the ultrasonic wave is not easily lower than 20,000 Hz, because the ultrasonic wave below 20,000 Hz is not only easy to damage the surface of the array substrate, but the operating noise of the ultrasonic cleaning machine is too large, which easily affects the normal operation of the operator.
  • step 303 the array substrate ultrasonically cleaned in step 302 is attached to the corresponding color filter substrate to form a liquid crystal cell, and then the formed liquid crystal cell is assembled into the liquid crystal panel to finally form a liquid crystal panel.
  • the color film substrate as referred to here, such as air bubbles and dirt, conforms to the specifications, and does not require ultrasonic cleaning to save cost; if bubbles and dirt exceed the specifications and affect the normal use of the color filter substrate, ultrasonic cleaning is also required. See the related content of the second preferred embodiment described below.
  • step 303 ends in step 303.
  • the method for fabricating the liquid crystal panel in the embodiment enables the array film layers of the array substrate to be closely adhered under the action of ultrasonic waves, thereby reducing bubbles and dirt between the array film layers of the array substrate, thereby reducing bubbles, etc.
  • the influence of obstacles on the propagation and superposition of light increases the consistency of the contrast of the display screen of the display panel, thereby improving the display quality of the display panel.
  • FIG. 4 is a flow chart of a second preferred embodiment of the method for fabricating a liquid crystal panel of the present invention.
  • the method for fabricating the liquid crystal panel of the present invention begins in steps 401 and 403,
  • step 401 a plurality of array thin film layers are sequentially formed on the first glass substrate to obtain an array substrate, and then step 402 is performed.
  • step 402 the array substrate is ultrasonically cleaned to eliminate air bubbles and dirt between the array film layers, and then step 405 is performed.
  • step 403 a plurality of color film layers are sequentially formed on the second glass substrate to obtain a color film substrate, and then step 404 is performed.
  • step 404 the color filter substrate is ultrasonically cleaned to eliminate air bubbles and dirt between the color film layers, and then step 405 is performed.
  • step 405 the ultrasonic cleaning of the color filter substrate and the corresponding ultrasonic cleaning array substrate are attached to a liquid crystal cell.
  • the method ends at step 405.
  • the present invention may optionally perform steps 403 and 404 concurrently with, after, or before step 401 and step 402.
  • Step 401 is the same as or similar to step 301.
  • Step 401 refers to the detailed description of step 301 above.
  • Step 402 is the same as or similar to step 302. For details, refer to the detailed description of step 302 above.
  • a plurality of color film layers are sequentially formed on the second glass substrate by a plurality of photolithography processes to obtain a color film substrate, wherein the color film layer includes a black matrix layer (Black) Matrix), red green blue layer (RGB), overcoat and second electrode layer.
  • the color film layer includes a black matrix layer (Black) Matrix), red green blue layer (RGB), overcoat and second electrode layer.
  • the electrode layer, the second electrode layer may be a transparent conductive metal layer, and the material of the second electrode layer may be, for example, indium tin oxide (ITO), tin oxide (TO), indium zinc oxide (IZO), and indium tin. Zinc oxide (ITZO).
  • ITO indium tin oxide
  • TO tin oxide
  • IZO indium zinc oxide
  • ITZO indium tin. Zinc oxide
  • step 404 the color filter substrate obtained in step 403 is ultrasonically cleaned to eliminate bubbles and dirt between the color film layers, and the prepared color film substrate is first placed in an ultrasonic cleaning container, and then ultrasonically Inject the cleaning solution into the cleaning container until the entire color film substrate is completely covered, adjust the frequency of the ultrasonic wave to 20,000 to 1,000,000 Hz, adjust the power of the ultrasonic wave to 0.1 to 20 watts/cm 2 , and perform 20 to the array substrate in the cleaning solution.
  • the specific ultrasonic frequency, ultrasonic power and cleaning time can be adjusted according to the cleaning situation, such as poor cleaning effect, can properly adjust the ultrasonic power and extend the cleaning time; such as some bubbles and dirt in the tone
  • multiple cleanings can not be reduced or refined.
  • the frequency of the ultrasonic waves can be changed for cleaning (high-frequency ultrasound can effectively reduce or refine smaller particles of bubbles and dirt, while low-frequency ultrasound is reduced or It is better to refine the bubbles and dirt of large particles.
  • the frequency of the ultrasonic wave is not easily lower than 20,000 Hz, because the ultrasonic wave below 20,000 Hz is not only easy to damage the surface of the array substrate, but the operating noise of the ultrasonic cleaning machine is too large, which easily affects the normal operation of the operator.
  • step 405 the array substrate ultrasonically cleaned in step 402 and the color filter substrate ultrasonically cleaned in step 404 are attached to a liquid crystal cell, and then the formed liquid crystal cell is assembled into a liquid crystal panel to finally form a liquid crystal panel.
  • the manufacturing method of the liquid crystal panel in this embodiment is based on the previous embodiment, and at the same time, the color film layers of the color film substrate are more closely adhered under the action of ultrasonic waves, and the color film film of the color film substrate is reduced.
  • the bubbles and dirt between the layers reduce the influence of obstacles such as bubbles on the propagation and superposition of light, further improve the consistency of the display screen contrast of the display panel, and further improve the display quality of the display panel.
  • FIG. 5 is a flow chart of a third preferred embodiment of the method for fabricating the liquid crystal panel of the present invention.
  • the method for fabricating the liquid crystal panel of the present invention begins in step 501.
  • step 501 a plurality of color film layers are sequentially formed on the second glass substrate to obtain a color film substrate, and then the process proceeds to step 502.
  • step 502 the color filter substrate is ultrasonically cleaned to eliminate air bubbles and dirt between the color film layers, and then proceeds to step 503.
  • the ultrasonic cleaning color filter substrate and the corresponding array substrate are attached to a liquid crystal cell.
  • the array substrate such as air bubbles and dirt, referred to here does not require ultrasonic cleaning to save cost. If bubbles and dirt exceed the specifications and affect the normal use of the array substrate, ultrasonic cleaning is also required. For details, see above. Related content of the first preferred embodiment.
  • Step 501 is the same as or similar to step 403.
  • Step 501 refers to the detailed description of step 403 above.
  • Step 502 is the same as or similar to step 404.
  • Step 502 refers to the detailed description of step 404 above.
  • step 503 the color filter substrate after ultrasonic cleaning in step 502 is attached to the corresponding array substrate to form a liquid crystal cell, and then the formed liquid crystal cell is assembled into the liquid crystal panel to finally form a liquid crystal panel.
  • the color film layers of the color filter substrate are more closely adhered under the action of ultrasonic waves, thereby reducing bubbles and dirt between the color film layers of the color filter substrate, thereby reducing
  • the influence of obstacles such as bubbles on the propagation and superposition of light increases the consistency of the contrast of the display screen of the display panel, thereby further improving the display quality of the display panel.
  • the manufacturing method of the liquid crystal panel of the present invention can change the surface properties of the film layers of the substrate of the liquid crystal panel, so as to make the bonding between the film layers more compact and effectively reduce or refine the array substrate of the liquid crystal panel and/or
  • the air bubbles and dirt between the film layers of the color filter substrate solve the technical problem that the conventional liquid crystal panel manufacturing method easily forms bubbles and dirt between the substrate film layers.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)

Description

液晶面板的制作方法 技术领域
本发明涉及液晶显示领域，特别是涉及一种可有效的减少或细化液晶面板薄膜层间的气泡以及污物的液晶面板的制作方法。
 背景技术
在平板显示装置中，薄膜晶体管液晶显示器（Thin Film Transistor Liquid Crystal Dsiplay，TFT-LCD）具有体积小、功耗低、制造成本相对较低和无辐射等特点，在当前的平板显示装置市场中占据了主导地位。一般TFT-LCD的液晶面板是由阵列基板（TFT基板）和彩膜基板（Color Filter基板）相互贴合而成，目前阵列基板一般采用5次光刻（5 mask）或4次光刻（4 mask）工艺制造，每次光刻都需要经过清洗、干燥、成膜及刻蚀等几个步骤；彩膜基板也同样需要经过多次光刻工艺才能够完成制作。因为每次光刻都至少要沉积一层薄膜层，所以无论是TFT基板还是CF基板上均具有多个薄膜层。如图1所示，TFT基板包括例如源极层101、栅极层102、漏极层103、有源层104、绝缘层105以及第一电极层106等多个阵列薄膜层。如图2所示，CF基板包括例如黑色矩阵层201、红绿蓝色层202以及第二电极层203等多个彩膜薄膜层。
在上述的光刻工艺过程中，在TFT基板或者CF基板上沉积的各薄膜层（阵列薄膜层或彩膜薄膜层）之间很容易形成气泡和污物，从而导致显示面板的显示区域存在局部显示对比度不一致的缺陷，进而影响显示面板的画面显示品质。
故，有必要提供一种液晶面板的制作方法，以解决现有技术所存在的问题。
 技术问题
本发明的目的在于提供一种液晶面板的制作方法，可改变液晶面板的基板各薄膜层的表面性质，以便使各薄膜层之间结合更紧密以及有效的减少或细化液晶面板薄膜层间的气泡以及污物，以解决现有的液晶面板的制作方法在基板薄膜层间容易形成气泡和污物的技术问题。
 技术解决方案
本发明涉及一种液晶面板的制作方法，其中包括步骤：A、在第一玻璃基板上依次形成多个阵列薄膜层以得到阵列基板；以及B、对所述阵列基板进行超声波清洗以消除所述阵列薄膜层之间的气泡及污物；在所述步骤A及步骤B的之后，所述液晶面板的制作方法还包括步骤：A1、在第二玻璃基板上依次形成多个彩膜薄膜层以得到彩膜基板；以及B1、对所述彩膜基板进行超声波清洗以消除所述彩膜薄膜层之间的气泡及污物；在所述步骤B1之后，所述液晶面板的制作方法还包括步骤：C、将所述超声波清洗后的阵列基板和相应的彩膜基板贴合成液晶盒。
本发明还涉及一种液晶面板的制作方法，其中包括步骤：A、在第一玻璃基板上依次形成多个阵列薄膜层以得到阵列基板；以及B、对所述阵列基板进行超声波清洗以消除所述阵列薄膜层之间的气泡及污物。
在本发明所述的液晶面板的制作方法中，所述阵列薄膜层包括源极层、栅极层、漏极层、绝缘层以及第一电极层。
在本发明所述的液晶面板的制作方法中，在所述步骤A及步骤B的同时，所述液晶面板的制作方法还包括步骤：A1、在第二玻璃基板上依次形成多个彩膜薄膜层以得到彩膜基板；以及B1、对所述彩膜基板进行超声波清洗以消除所述彩膜薄膜层之间的气泡及污物。
在本发明所述的液晶面板的制作方法中，在所述步骤A及步骤B的之前，所述液晶面板的制作方法还包括步骤：A1、在第二玻璃基板上依次形成多个彩膜薄膜层以得到彩膜基板；以及B1、对所述彩膜基板进行超声波清洗以消除所述彩膜薄膜层之间的气泡及污物。
在本发明所述的液晶面板的制作方法中，在所述步骤A及步骤B的之后，所述液晶面板的制作方法还包括步骤：A1、在第二玻璃基板上依次形成多个彩膜薄膜层以得到彩膜基板；以及B1、对所述彩膜基板进行超声波清洗以消除所述彩膜薄膜层之间的气泡及污物。
在本发明所述的液晶面板的制作方法中，所述彩膜薄膜层包括黑色矩阵层、红绿蓝色层以及第二电极层。
在本发明所述的液晶面板的制作方法中，所述步骤B之后还包括：C、将所述超声波清洗后的阵列基板和相应的彩膜基板贴合成液晶盒。
在本发明所述的液晶面板的制作方法中，所述超声波清洗中的超声波频率为20,000至1,000,000赫兹，超声波功率为0.1至20瓦/平方厘米，所述超声波清洗中的超声波处理时间为20至240秒。
本发明还涉及一种液晶面板的制作方法，其中包括步骤：A2、在第二玻璃基板上依次形成多个彩膜薄膜层以得到彩膜基板；以及B2、对所述彩膜基板进行超声波清洗以消除所述彩膜薄膜层之间的气泡及污物。
在本发明所述的液晶面板的制作方法中，所述彩膜薄膜层包括黑色矩阵层、红绿蓝色层以及第二电极层。
在本发明所述的液晶面板的制作方法中，所述步骤B2之后还包括：C2、将所述超声波清洗后的彩膜基板和相应的阵列基板贴合成液晶盒。
在本发明所述的液晶面板的制作方法中，所述超声波清洗中的超声波频率为20,000至1,000,000赫兹，超声波功率为0.1至20瓦/平方厘米，所述超声波清洗中的超声波处理时间为20至240秒。
 有益效果
可改变液晶面板的基板各薄膜层的表面性质，以便使各薄膜层之间结合更紧密以及有效的减少或细化液晶面板薄膜层间的气泡以及污物，解决了现有的液晶面板的制作方法在基板薄膜层间容易形成气泡和污物的技术问题。
 附图说明
图1为现有的液晶面板的阵列基板的结构示意图；
图2为现有的液晶面板的彩膜基板的结构示意图；
图3为本发明的液晶面板的制作方法的第一优选实施例的流程图；
图4为本发明的液晶面板的制作方法的第二优选实施例的流程图；
图5为本发明的液晶面板的制作方法的第三优选实施例的流程图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。
本发明涉及一种液晶面板的制作方法，如图3所示，图3为本发明的液晶面板的制作方法的第一优选实施例的流程图。本发明的液晶面板的制作方法开始于步骤301，
在步骤301中，在第一玻璃基板上依次形成多个阵列薄膜层以得到阵列基板，随后执行步骤302。
在步骤302中，对阵列基板进行超声波清洗以消除阵列薄膜层之间的气泡及污物，随后执行步骤303。
在步骤303中，将超声波清洗后的阵列基板和相应的彩膜基板贴合成液晶盒。
该方法结束于步骤303。
下面将详细说明本优选实施例的液晶面板的制作方法的流程。
在步骤301中，通过多次光刻处理在第一玻璃基板上依次形成多个阵列薄膜层以得到阵列基板，其中阵列薄膜层包括源极层、栅极层、漏极层、绝缘层、欧姆接触层、金属层以及第一电极层等。源极层、栅极层以及漏极层共同形成薄膜场效应晶体管，栅极层与扫描线连接，源极层与数据线连接，漏极层与第一电极层连接，实现通过扫描线和数据线控制第一电极层的输出电压的目的，从而控制液晶面板中液晶分子的转向。欧姆接触层、各种绝缘层以及金属层可保证阵列基板的各部分（如薄膜场效应晶体管）的正常工作。第一电极层可为透明导电金属层，与漏极层连接以控制液晶面板中液晶分子的转向。第一电极层的材料可为，例如，铟锡氧化物（ITO）、锡氧化物（TO）、铟锌氧化物（IZO）以及铟锡锌氧化物（ITZO）。
在步骤302中，对步骤301中得到的阵列基板进行超声波清洗以消除阵列薄膜层之间的气泡及污物，首先将制作好的阵列基板放入到超声波清洗容器中，然后在超声波清洗容器中注入清洗液直至完全覆盖整个阵列基板，将超声波的频率调至为20,000至1,000,000赫兹，超声波的功率调至为0.1至20瓦/平方厘米，对清洗液中的阵列基板进行20至240秒的超声波清洗处理，具体的超声波频率、超声波功率以及清洗时间可根据清洗情况进行适当调整(例如使用者需要将气泡或污物减少或细化到多大的尺寸)，如清洗效果较差，可以适当调高超声波功率或延长清洗时间；如有些气泡和污物在调高超声波功率后多次清洗仍无法减少或细化，这时可以通过改变超声波的频率来进行清洗（高频超声（如500,000赫兹以上）可以有效的减少或细化更小颗粒的气泡和污物，而低频超声（如100,000赫兹以下）减少或细化大颗粒的气泡和污物的效果较好）。但超声波的频率不易低于20,000赫兹，因为低于20,000赫兹的超声波不仅容易对阵列基板表面形成破坏，而且此时超声波清洗机的工作噪音过大，容易影响操作人员的正常工作。
在步骤303中，将在步骤302中超声波清洗后的阵列基板与相应的彩膜基板贴合成液晶盒，随后将形成的液晶盒进行液晶面板的组装，最终形成液晶面板。此处所指的彩膜基板如气泡和污物符合规格，则不需要进行超声波清洗以节省成本；如气泡和污物超出规格，影响彩膜基板的正常使用，则也需要进行超声波清洗，具体参见下述的第二优选实施例的相关内容。
该方法结束于步骤303。
本实施例中的液晶面板的制作方法使得阵列基板的各阵列薄膜层在超声波的作用下，贴合更加紧密，减少了阵列基板的阵列薄膜层之间的气泡以及污物，从而减少了气泡等障碍物对光线的传播和叠加产生的影响，提高了显示面板的显示画面对比度的一致性，进而提高了显示面板的画面显示品质。
请参照图4，图4为本发明的液晶面板的制作方法的第二优选实施例的流程图。本发明的液晶面板的制作方法开始于步骤401和步骤403，
在步骤401中，在第一玻璃基板上依次形成多个阵列薄膜层以得到阵列基板，随后执行步骤402。
在步骤402中，对阵列基板进行超声波清洗以消除阵列薄膜层之间的气泡及污物，随后执行步骤405。
在步骤403中，在第二玻璃基板上依次形成多个彩膜薄膜层以得到彩膜基板，随后执行步骤404。
在步骤404中，对所述彩膜基板进行超声波清洗以消除所述彩膜薄膜层之间的气泡及污物，随后执行步骤405。
在步骤405中，将超声波清洗后的彩膜基板和相应的超声波清洗后的阵列基板贴合成液晶盒。
该方法结束于步骤405。
本发明可选择在进行步骤401及步骤402的同时、之后或之前，进行步骤403以及步骤404。
下面将详细说明本优选实施例的液晶面板的制作方法的流程。
步骤401与上述的步骤301相同或相似，具体请参见上述步骤301的具体描述。
步骤402与上述的步骤302相同或相似，具体请参见上述步骤302的具体描述。
在步骤403中，通过多次光刻处理在第二玻璃基板上依次形成多个彩膜薄膜层以得到彩膜基板，其中彩膜薄膜层包括黑色矩阵层（Black Matrix）、红绿蓝色层（RGB）、平流层（overcoat）以及第二电极层。首先在第二玻璃基板上光刻形成黑色矩阵层；然后依次在相应的第二玻璃基板相应的位置上光刻形成红绿蓝色层（三种色层），使得黑色矩阵层位于各色层的交界处以避免漏光及各像素之间的混色；随后在红绿蓝色层上沉积平流层，使彩膜基板的段差减小，彩膜基板的表面变得平坦；最后在平流层上制作第二电极层，第二电极层可为透明导电金属层，第二电极层的材料可为，例如，铟锡氧化物（ITO）、锡氧化物（TO）、铟锌氧化物（IZO）以及铟锡锌氧化物（ITZO）。
在步骤404中，对步骤403中得到的彩膜基板进行超声波清洗以消除彩膜薄膜层之间的气泡及污物，首先将制作好的彩膜基板放入到超声波清洗容器中，然后再超声波清洗容器中注入清洗液直至完全覆盖整个彩膜基板，将超声波的频率调至为20,000至1,000,000赫兹，超声波的功率调至为0.1至20瓦/平方厘米，对清洗液中的阵列基板进行20至240秒的超声波清洗处理，具体的超声波频率、超声波功率以及清洗时间可根据清洗情况进行适当调整，如清洗效果较差，可以适当调高超声波功率和延长清洗时间；如有些气泡和污物在调高超声波功率后多次清洗仍无法减少或细化，这时可以通过改变超声波的频率来进行清洗（高频超声可以有效的减少或细化更小颗粒的气泡和污物，而低频超声减少或细化大颗粒的气泡和污物的效果较好）。但超声波的频率不易低于20,000赫兹，因为低于20,000赫兹的超声波不仅容易对阵列基板表面形成破坏，而且此时超声波清洗机的工作噪音过大，容易影响操作人员的正常工作。
在步骤405中，将在步骤402中超声波清洗后的阵列基板与在步骤404中超声波清洗后的彩膜基板贴合成液晶盒，随后将形成的液晶盒进行液晶面板的组装，最终形成液晶面板。
本实施例中的液晶面板的制作方法在上一实施例的基础上，同时使得彩膜基板的各彩膜薄膜层在超声波的作用下，贴合更加紧密，减少了彩膜基板的彩膜薄膜层间的气泡以及污物，从而减少了气泡等障碍物对光线的传播和叠加产生的影响，进一步提高了显示面板的显示画面对比度的一致性，进而进一步提高了显示面板的画面显示品质。
请参照图5，图5为本发明的液晶面板的制作方法的第三优选实施例的流程图。本发明的液晶面板的制作方法开始于步骤501，
在步骤501中，在第二玻璃基板上依次形成多个彩膜薄膜层以得到彩膜基板，随后来到步骤502。
在步骤502中，对所述彩膜基板进行超声波清洗以消除所述彩膜薄膜层之间的气泡及污物，随后来到步骤503。
在步骤503中，将所述超声波清洗后的彩膜基板和相应的阵列基板贴合成液晶盒。此处所指的阵列基板如气泡和污物符合规格，则不需要进行超声波清洗以节省成本；如气泡和污物超出规格，影响阵列基板的正常使用，则也需要进行超声波清洗，具体参见上述的第一优选实施例的相关内容。
该方法结束于步骤503。
下面将详细说明本优选实施例的液晶面板的制作方法的流程。
步骤501与上述的步骤403相同或相似，具体请参见上述步骤403的具体描述。
步骤502与上述的步骤404相同或相似，具体请参见上述步骤404的具体描述。
在步骤503中，将在步骤502中超声波清洗后的彩膜基板与相应的阵列基板贴合成液晶盒，随后将形成的液晶盒进行液晶面板的组装，最终形成液晶面板。
本实施例中的液晶面板的制作方法使得彩膜基板的各彩膜薄膜层在超声波的作用下，贴合更加紧密，减少了彩膜基板的彩膜薄膜层间的气泡以及污物，从而减少了气泡等障碍物对光线的传播和叠加产生的影响，提高了显示面板的显示画面对比度的一致性，进而进一步提高了显示面板的画面显示品质。
由上述可知，本发明的液晶面板的制作方法可改变液晶面板的基板各薄膜层的表面性质，以便使各薄膜层之间结合更紧密以及有效的减少或细化液晶面板的阵列基板和/或彩膜基板的薄膜层间的气泡以及污物，解决了现有的液晶面板的制作方法在基板薄膜层间容易形成气泡和污物的技术问题。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。
 本发明的实施方式
工业实用性
序列表自由内容

Claims (15)

  1. 一种液晶面板的制作方法，其中包括步骤：
    A、在第一玻璃基板上依次形成多个阵列薄膜层以得到阵列基板；以及
    B、对所述阵列基板进行超声波清洗以消除所述阵列薄膜层之间的气泡及污物；
    在所述步骤A及步骤B的之后，所述液晶面板的制作方法还包括步骤：
    A1、在第二玻璃基板上依次形成多个彩膜薄膜层以得到彩膜基板；以及
    B1、对所述彩膜基板进行超声波清洗以消除所述彩膜薄膜层之间的气泡及污物；
    在所述步骤B1之后，所述液晶面板的制作方法还包括步骤：
    C、将所述超声波清洗后的阵列基板和相应的彩膜基板贴合成液晶盒。
  2. 一种液晶面板的制作方法，其中包括步骤：
    A、在第一玻璃基板上依次形成多个阵列薄膜层以得到阵列基板；以及
    B、对所述阵列基板进行超声波清洗以消除所述阵列薄膜层之间的气泡及污物。
  3. 根据权利要求2所述的液晶面板的制作方法，其中所述阵列薄膜层包括源极层、栅极层、漏极层、绝缘层以及第一电极层。
  4. 根据权利要求2所述的液晶面板的制作方法，其中在所述步骤A及步骤B的同时，所述液晶面板的制作方法还包括步骤：
    A1、在第二玻璃基板上依次形成多个彩膜薄膜层以得到彩膜基板；以及
    B1、对所述彩膜基板进行超声波清洗以消除所述彩膜薄膜层之间的气泡及污物。
  5. 根据权利要求4所述的液晶面板的制作方法，其中所述彩膜薄膜层包括黑色矩阵层、红绿蓝色层以及第二电极层。
  6. 根据权利要求2所述的液晶面板的制作方法，其中
    在所述步骤A及步骤B的之前，所述液晶面板的制作方法还包括步骤：
    A1、在第二玻璃基板上依次形成多个彩膜薄膜层以得到彩膜基板；以及
    B1、对所述彩膜基板进行超声波清洗以消除所述彩膜薄膜层之间的气泡及污物。
  7. 根据权利要求6所述的液晶面板的制作方法，其中所述彩膜薄膜层包括黑色矩阵层、红绿蓝色层以及第二电极层。
  8. 根据权利要求2所述的液晶面板的制作方法，其中
    在所述步骤A及步骤B的之后，所述液晶面板的制作方法还包括步骤：
    A1、在第二玻璃基板上依次形成多个彩膜薄膜层以得到彩膜基板；以及
    B1、对所述彩膜基板进行超声波清洗以消除所述彩膜薄膜层之间的气泡及污物。
  9. 根据权利要求8所述的液晶面板的制作方法，其中所述彩膜薄膜层包括黑色矩阵层、红绿蓝色层以及第二电极层。
  10. 根据权利要求2所述的液晶面板的制作方法，其中所述步骤B之后还包括：
    C、将所述超声波清洗后的阵列基板和相应的彩膜基板贴合成液晶盒。
  11. 根据权利要求2所述的液晶面板的制作方法，其中所述超声波清洗中的超声波频率为20,000至1,000,000赫兹，超声波功率为0.1至20瓦/平方厘米，所述超声波清洗中的超声波处理时间为20至240秒。
  12. 一种液晶面板的制作方法，其中包括步骤：
    A2、在第二玻璃基板上依次形成多个彩膜薄膜层以得到彩膜基板；以及
    B2、对所述彩膜基板进行超声波清洗以消除所述彩膜薄膜层之间的气泡及污物。
  13. 根据权利要求12所述的液晶面板的制作方法，其中所述彩膜薄膜层包括黑色矩阵层、红绿蓝色层以及第二电极层。
  14. 根据权利要求12所述的液晶面板的制作方法，其中所述步骤B2之后还包括：
    C2、将所述超声波清洗后的彩膜基板和相应的阵列基板贴合成液晶盒。
  15. 根据权利要求12所述的液晶面板的制作方法，其中所述超声波清洗中的超声波频率为20,000至1,000,000赫兹，超声波功率为0.1至20瓦/平方厘米，所述超声波清洗中的超声波处理时间为20至240秒。
PCT/CN2012/074988 2012-04-25 2012-05-02 液晶面板的制作方法 Ceased WO2013159369A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US13/512,590 US9151980B2 (en) 2012-04-25 2012-05-02 Method for manufacturing liquid crystal panel

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN2012101241542A CN102662267A (zh) 2012-04-25 2012-04-25 液晶面板的制作方法
CN201210124154.2 2012-04-25

Publications (1)

Publication Number Publication Date
WO2013159369A1 true WO2013159369A1 (zh) 2013-10-31

Family

ID=46771785

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2012/074988 Ceased WO2013159369A1 (zh) 2012-04-25 2012-05-02 液晶面板的制作方法

Country Status (2)

Country Link
CN (1) CN102662267A (zh)
WO (1) WO2013159369A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112553571A (zh) * 2020-12-09 2021-03-26 四川富乐德科技发展有限公司 一种Open Mask表面IZO蒸镀材料的清洗方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1575870A (zh) * 2003-06-30 2005-02-09 东京応化工业株式会社 基板清洗装置和基板清洗方法
JP2005131602A (ja) * 2003-10-31 2005-05-26 Sharp Corp 洗浄装置
CN1645194A (zh) * 2004-01-19 2005-07-27 Nec液晶技术株式会社 制造液晶显示设备的方法
CN101345189A (zh) * 2007-07-12 2009-01-14 株式会社瑞萨科技 基板的清洗方法和清洗装置
CN101605615A (zh) * 2007-02-07 2009-12-16 株式会社日立工业设备技术 超声波洗涤方法
CN202087088U (zh) * 2011-05-19 2011-12-28 中芯国际集成电路制造(上海)有限公司 超声波除泡装置和涂布装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2749508B1 (fr) * 1996-06-07 2001-09-07 Oreal Compositions cosmetiques detergentes a usage capillaire et utilisation
JP2004122097A (ja) * 2002-07-29 2004-04-22 Soshio Kk ガラス面に付着した異物の除去方法及び除去装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1575870A (zh) * 2003-06-30 2005-02-09 东京応化工业株式会社 基板清洗装置和基板清洗方法
JP2005131602A (ja) * 2003-10-31 2005-05-26 Sharp Corp 洗浄装置
CN1645194A (zh) * 2004-01-19 2005-07-27 Nec液晶技术株式会社 制造液晶显示设备的方法
CN101605615A (zh) * 2007-02-07 2009-12-16 株式会社日立工业设备技术 超声波洗涤方法
CN101345189A (zh) * 2007-07-12 2009-01-14 株式会社瑞萨科技 基板的清洗方法和清洗装置
CN202087088U (zh) * 2011-05-19 2011-12-28 中芯国际集成电路制造(上海)有限公司 超声波除泡装置和涂布装置

Also Published As

Publication number Publication date
CN102662267A (zh) 2012-09-12

Similar Documents

Publication Publication Date Title
WO2020206725A1 (zh) 液晶显示面板及显示装置
CN202512549U (zh) 一种触摸液晶显示装置、液晶显示面板及上部基板
CN202404339U (zh) 阵列基板及包括该阵列基板的显示装置
CN102709237B (zh) 薄膜场效应晶体管阵列基板及其制造方法、电子器件
WO2016074254A1 (zh) 液晶显示面板及液晶显示面板的制造方法
WO2015085641A1 (zh) 阵列基板及其制作方法及应用该阵列基板的液晶显示面板
WO2017088179A1 (zh) 用于液晶面板中的阵列基板及其制作方法
WO2018233415A1 (zh) 一种显示面板及显示装置
WO2020093458A1 (zh) 阵列基板及其制备方法、液晶显示面板、显示装置
WO2018036027A1 (zh) Ips型阵列基板的制作方法及ips型阵列基板
GB2531203A (en) Manufacturing method for TFT-LCD array substrate, liquid crystal panel and liquid crystal display
WO2018166015A1 (zh) 一种显示面板及其制程和显示装置
WO2021035847A1 (zh) 液晶显示面板及其制作方法与无边框液晶显示装置
CN104297977B (zh) 显示基板及其制作方法、液晶面板
WO2020206785A1 (zh) 显示面板及显示模组
WO2020062489A1 (zh) 液晶显示模组、液晶显示器及显示设备
CN110690229A (zh) 显示面板及显示面板的制作方法
CN104779203A (zh) 一种阵列基板及其制造方法、显示装置
WO2018166014A1 (zh) 一种显示面板和显示装置
WO2013159369A1 (zh) 液晶面板的制作方法
CN107134432B (zh) 一种阵列基板制程
WO2018196193A1 (zh) 阵列基板及其制造方法、显示面板
WO2019100496A1 (zh) Va型薄膜晶体管阵列基板及其制作方法
CN104112710B (zh) 阵列基板的制作方法、阵列基板及液晶显示装置
US20170146852A1 (en) Glass substrate having black matrix, preparing method thereof and liquid crystal panel

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 13512590

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12875561

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 12875561

Country of ref document: EP

Kind code of ref document: A1