WO2013071633A1 - 液晶面板及其制作方法 - Google Patents

液晶面板及其制作方法 Download PDF

Info

Publication number
WO2013071633A1
WO2013071633A1 PCT/CN2011/082830 CN2011082830W WO2013071633A1 WO 2013071633 A1 WO2013071633 A1 WO 2013071633A1 CN 2011082830 W CN2011082830 W CN 2011082830W WO 2013071633 A1 WO2013071633 A1 WO 2013071633A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
substrate
electrode layer
peripheral region
coating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2011/082830
Other languages
English (en)
French (fr)
Inventor
廖作敏
施明宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US13/380,908 priority Critical patent/US20130128194A1/en
Publication of WO2013071633A1 publication Critical patent/WO2013071633A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1345—Conductors connecting electrodes to cell terminals
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133388—Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/12—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode

Definitions

  • the present invention relates to the field of liquid crystal production technologies, and in particular, to a liquid crystal panel and a method of fabricating the same.
  • the liquid crystal panel includes a display area for displaying an image, and further includes a peripheral area surrounding the display area, the peripheral area being mainly used to turn on an external power source. Please refer to FIG. 1.
  • FIG. 1 is a cross-sectional view showing a peripheral region of a liquid crystal panel in the prior art.
  • the liquid crystal panel includes a thin film field effect transistor (Thin The Film Transistor (TFT) substrate 11 further includes a color filter (CF) substrate 21.
  • TFT thin film field effect transistor
  • CF color filter
  • a first electrode layer 12 is formed inside the TFT substrate 11
  • a second electrode layer 22 is formed inside the CF substrate 21
  • a gold dot 30 is disposed between the first electrode layer 12 and the second electrode layer 22.
  • the first electrode layer 12 of the peripheral region of the TFT substrate 11 is energized, and the first electrode layer 12 of the peripheral region provides a potential to the first electrode layer (not shown) in the display region.
  • the first electrode layer 12 of the peripheral region simultaneously conducts the potential to the second electrode layer 22 of the peripheral region of the CF substrate 21 through the gold dot glue 30, and further to the second electrode layer of the display region of the CF substrate 21 (not shown) ).
  • a voltage difference is formed between the display region of the TFT substrate 11 and the display region of the CF substrate 21, and the voltage difference drives the alignment of the liquid crystal molecules in the display regions of the first substrate 11 and the second substrate 12 to achieve a grating effect.
  • the above method requires coating the gold dot glue 30 between the first substrate 11 and the second substrate 21 which have been formed. Due to the complicated coating process of the gold dot glue 30, the price of the gold dot glue 30 is high, so that the liquid crystal panel is made. The production cost is high; moreover, if the gold dispensing 30 is unevenly coated, the display panel may appear mottled.
  • An object of the present invention is to provide a liquid crystal panel, which aims to solve the technical problem of the display panel mottled in the liquid crystal panel due to uneven coating of gold dot glue in the prior art, simplifying the coating process of the liquid crystal panel, and saving cost.
  • Another object of the present invention is to provide a method for fabricating a liquid crystal panel, which aims to solve the technical problem that the display panel is mottled due to uneven coating of gold dot glue in the prior art, and simplifies the coating process of the liquid crystal panel. ,cut costs.
  • the present invention constructs a liquid crystal panel including a first substrate and a second substrate, the first substrate having a first display area and a first peripheral area, the second substrate having a corresponding first display a second display area of the area and a second peripheral area corresponding to the first peripheral area, the first peripheral area is formed with a first electrode layer, and the second peripheral area is formed with a second electrode layer;
  • the first peripheral region is formed with a coating layer other than the first electrode layer, and the maximum vertical distance between the formed other coating layer and the inner side of the first substrate is a first contact distance;
  • a peripheral layer is formed with a coating layer other than the second electrode layer, and a maximum vertical distance between the formed other coating layer and the inner side of the second substrate is a second contact distance;
  • a sum of the first contact distance, the second contact distance, the thickness of the first electrode layer, and the thickness of the second electrode layer is equal to a distance between the first substrate and the inner side of the second substrate, After the first substrate and the second substrate are assembled, the first electrode layer and the second electrode layer are in contact with each other;
  • the coating layer other than the first electrode layer formed by the first peripheral region comprises one or more layers of a gate insulating layer, a semiconductor layer, an ohmic contact layer or a protective layer;
  • the other coating layer other than the second electrode layer formed by the peripheral region includes one or more of a light shielding layer or a color resist layer.
  • the color resist layer includes one of a red color resist layer, a green color resist layer or a blue color resist layer or is stacked by a plurality of layers.
  • Another object of the present invention is to provide a liquid crystal panel, which aims to solve the technical problem of the display panel mottled in the liquid crystal panel due to uneven coating of gold dot glue in the prior art, simplifying the coating process of the liquid crystal panel, and saving cost. .
  • the present invention constructs a liquid crystal panel including a first substrate and a second substrate, the first substrate having a first display area and a first peripheral area,
  • the second substrate has a second display area corresponding to the first display area and a second peripheral area corresponding to the first peripheral area, the first peripheral area is formed with a first electrode layer, and the second periphery a second electrode layer is formed in the region;
  • At least one of the first peripheral region and the second peripheral region is further formed with at least one coating layer, the coating layer causing at least one of the first electrode layer or the second electrode layer to protrude a contact distance such that the first electrode layer and the second electrode layer are in contact with each other after the first substrate and the second substrate are assembled.
  • the first peripheral region is formed with a coating layer other than the first electrode layer, and the maximum vertical distance between the formed other coating layer and the inner side of the first substrate is One contact distance
  • the second peripheral region is formed with a coating layer other than the second electrode layer, and the maximum vertical distance between the formed other coating layer and the inner side of the second substrate is a second contact distance;
  • the sum of the first contact distance, the second contact distance, the thickness of the first electrode layer, and the thickness of the second electrode layer is equal to a distance between the first substrate and the inner side of the second substrate.
  • the other coating layer other than the first electrode layer formed by the first peripheral region includes one or more of a gate insulating layer, a semiconductor layer, an ohmic contact layer, or a protective layer.
  • a gate insulating layer for insulating a semiconductor layer, an ohmic contact layer, or a protective layer.
  • the other coating layer other than the second electrode layer formed by the second peripheral region includes one or more of a light shielding layer or a color resist layer.
  • the color resist layer includes one of a red color resist layer, a green color resist layer or a blue color resist layer or is stacked by a plurality of layers.
  • Another object of the present invention is to provide a method for fabricating a liquid crystal panel, which aims to solve the technical problem that the display panel is mottled due to uneven coating of gold dot glue in the prior art, and simplifies the coating process of the liquid crystal panel. ,cut costs.
  • the present invention constructs a method for fabricating a liquid crystal panel, the method comprising the following steps:
  • first substrate having a first display area and a first peripheral area
  • second substrate having a second display area corresponding to the first display area and corresponding to the first periphery a second peripheral area of the area
  • the first substrate and the second substrate are assembled such that the first electrode layer and the second electrode layer are in contact with each other.
  • the at least one of the first peripheral region and the second peripheral region is formed with at least one coating layer, the coating layer making the first electrode
  • the step of at least one of the layer or the second electrode layer having a contact distance specifically includes:
  • the sum of the first contact distance, the second contact distance, the thickness of the first electrode layer, and the thickness of the second electrode layer is equal to a distance between the first substrate and the inner side of the second substrate.
  • the other coating layer other than the first electrode layer formed by the first peripheral region includes one of a gate insulating layer, a semiconductor layer, an ohmic contact layer or a protective layer. Layer or multiple layers.
  • the other coating layer other than the second electrode layer formed by the second peripheral region includes one or more layers of a light shielding layer or a color resist layer.
  • the color resist layer comprises one of a red color resist layer, a green color resist layer or a blue color resist layer or is stacked by a plurality of layers.
  • the present invention retains a coating layer other than the electrode layer in the peripheral region of the first substrate or the second substrate, and the corresponding electrode layer is extended by the remaining coating layer, thereby making the contact distance
  • the electrode layers of the peripheral region are in contact, thereby achieving electrical conduction, and the coating process of the gold dot glue in the prior art is omitted, which not only saves cost, but also avoids the prior art. Due to the phenomenon of picture mottle caused by the uneven coating of gold dispensing, the picture display quality of the liquid crystal panel is greatly improved.
  • FIG. 1 is a schematic structural view of a liquid crystal panel in the prior art
  • FIG. 2 is a schematic flow chart of a preferred embodiment of a method for fabricating a liquid crystal panel according to the present invention
  • 3A-3E are schematic views showing the formation of a preferred embodiment of the first substrate of the present invention.
  • 4A-4E are schematic views showing the formation of a preferred embodiment of a second substrate in the present invention.
  • Fig. 5 is a structural view showing a preferred embodiment of a liquid crystal panel of the present invention.
  • FIG. 2 is a schematic flow chart of a preferred embodiment of a method of fabricating a liquid crystal panel according to the present invention.
  • step S201 a first substrate (TFT substrate) is provided, and a first display region A and a first peripheral region B (please refer to FIGS. 3A-3E) of the first substrate are formed with the exception of the first electrode layer.
  • TFT substrate TFT substrate
  • Other coating layers TFT substrate
  • a gate electrode, a gate insulating layer, a semiconductor layer, an ohmic contact layer, and a protective layer are sequentially formed on the first display region A and the first peripheral region B of the first substrate.
  • step S202 the coating layer in the first display area A is patterned while retaining the coating layer in the first peripheral area B, and the coating layer in the remaining first peripheral area B is retained.
  • the maximum vertical distance from the inner side of the first substrate is the first contact distance D1 (please refer to FIG. 5).
  • the coating layer remaining in the first peripheral region B may be patterned to control the shape of the remaining coating layer, such as forming a pyramid shape.
  • step S203 a first electrode layer is formed on the first display area A and the first peripheral area B of the first substrate, and a first electrode layer of the first display area A is patterned to form An active component array is disposed within the first display area A.
  • the coating layer remaining on the first peripheral region B includes one or more of a gate insulating layer, an amorphous silicon layer, and an ohmic contact layer, and includes a first electrode layer.
  • step S204 a second substrate (CF substrate) is provided, and the second display region C and the second peripheral region D of the second substrate (please refer to FIGS. 4A-4E) are formed with a second electrode layer Other coating layers.
  • the second display area C of the second substrate corresponds to the first display area A of the first substrate
  • the second peripheral area D corresponds to the second peripheral area of the second substrate D.
  • step S205 the coating layer in the second display region C of the second substrate is patterned while the coating layer of the second peripheral region D is retained.
  • the coating layer of the remaining second peripheral region D may be patterned to control the shape of the retained coating layer, for example, to form a pyramid shape. And controlling the maximum vertical distance between the retained coating layer and the inner side of the second substrate to be a second contact distance D2 (please refer to FIG. 5).
  • step S206 a second electrode layer is formed on the second display region C and the second peripheral region D of the second substrate.
  • the coating layer remaining on the second peripheral region D includes a black matrix (Black One or two layers of a matrix, BM) layer or a color resist layer, and the remaining color resist layer is a red (R) color resist layer, a green (G) color resist layer or a blue (B) color resist layer.
  • BM black matrix
  • the coating layer remaining on the second peripheral region D includes a second electrode layer.
  • the first contact distance D1 and the second contact distance D2 constitute a contact distance, and the contact distance satisfies the following conditions: the first contact distance D1, the second contact distance D2, and the The sum of the thickness D3 of the first electrode layer and the thickness D4 of the second electrode layer is equal to the distance D5 between the first substrate and the second substrate (please refer to FIG. 5).
  • step S207 the first substrate and the second substrate are assembled such that the first electrode layer of the first peripheral region B contacts the second electrode layer of the second peripheral region D.
  • the present invention retains a coating layer other than the first electrode layer in a peripheral region of the first substrate, and a coating layer other than the second electrode layer in a peripheral region of the second substrate. After the substrate and the second substrate are connected, the first electrode layer of the peripheral region contacts the second electrode layer, thereby achieving electrical conduction, thereby eliminating the prior art gold dot coating process, which not only saves cost, Moreover, the phenomenon of picture mottle caused by uneven coating of gold dot glue in the prior art is avoided, and the picture display quality of the liquid crystal panel is greatly improved.
  • FIGS. 3A-3E are schematic diagrams showing a preferred embodiment of the first substrate.
  • a gate electrode 32 is formed on the display area A of the first substrate 31 and a peripheral area B.
  • the gate electrode 32 is formed by a first photomask process.
  • a gate insulating layer 33, a semiconductor layer 34, and an ohmic contact layer 35 are sequentially formed on the first substrate 31, and each of the coating layers covers the first display area A of the first substrate 31 and First peripheral area B.
  • the semiconductor layer 34 and the ohmic contact layer 35 on the first display region A and the first peripheral region B are patterned by exposure development of a second photomask process to form a semiconductor island on the gate insulating layer 33.
  • a drain electrode 36a and a source electrode 36b are formed on the semiconductor island on the first display region A by exposure and development in a third photomask process, and a channel C is formed on the drain electrode 36a and the source electrode 36b. between.
  • a protective layer 37 is formed on the channel C, the drain electrode 36a, and the source electrode 36b by exposure development of a fourth photomask process, wherein the protective layer 37 has at least one via hole 37a to expose a portion of the leakage current. Pole 36a.
  • a protective layer 37 is formed on the first peripheral region B.
  • the gate insulating layer 33, the semiconductor layer 34, the ohmic contact layer 35, and the protective layer 37 are retained on the first peripheral region B, and the maximum vertical distance between the protective layer 37 and the inner side of the first substrate 31 It is the first contact distance D1.
  • the first electrode layer 38 is formed on the protective layer 37 by exposure development of a fifth photomask process. Since the first electrode layer 38 covers the connection hole 37a (refer to FIG. 3D), the connection hole 37a of the protection layer 37 can be electrically connected to the drain electrode 36a, so that the active component (TFT) is completed on the first substrate 31.
  • the first electrode layer 38 is simultaneously formed on the protective layer 37 of the first peripheral region B. At this time, a gate electrode 32, a gate insulating layer 33, a semiconductor layer 34, an ohmic contact layer 35, and a protective layer 37 are left between the first electrode layer 38 and the first substrate 31 of the first peripheral region B.
  • the active device (TFT) array of the first substrate 31 is completed by five photomask processes.
  • the active device array can also be processed by four or fewer photomask processes. To be done.
  • FIGS. 4A-4E are schematic diagrams showing the formation of a preferred embodiment of the second substrate.
  • a BM layer 42 (ie, a light shielding layer) is formed on the second display area C and the second peripheral area D of the second substrate 41, and the BM layer 42 of the second display area C is exposed. Developing to form an opening shape retains the BM layer 42 on the second peripheral region D.
  • a patterned R color resist layer 43 is formed on the second display region C and the second peripheral region D.
  • the R color resist layer 43 is exposed and developed to form a patterned R color resist layer 431 while preserving the R color resist layer 43 on the second peripheral region D.
  • a G color resist layer 44 and a B color resist layer 45 are sequentially formed on the second display region C and the second peripheral region D. Exposing and developing the G color resist layer 44 and the B color resist layer 45 on the second display region C to form a patterned G color resist layer 441 and a patterned B color resist layer 451 while retaining the second periphery The G color resist layer 44 and the B color resist layer 45 on the region D.
  • an overcoat layer 46 and a second electrode layer 47 are sequentially formed on the second display region C, and a second electrode layer 47 is formed on the second peripheral region D.
  • a BM layer 42, an R color resist layer 43, a G color resist layer 44, and a B color resist layer 45 remain between the second electrode layer 47 and the second substrate 41 on the second peripheral region D.
  • the maximum vertical distance between the B color resist layer 45 and the inner side of the second substrate 41 is the second contact distance D2.
  • FIG. 5 is a schematic structural diagram of a preferred embodiment of a liquid crystal panel according to an embodiment of the present invention.
  • the liquid crystal panel includes a first substrate 31 and a second substrate 41, and the first substrate 31 has a first display area A (shown as 3A-3E) and a first peripheral area B, corresponding to the The two substrates 41 have a second display area C (as shown in 4A-4E) and a second peripheral area D.
  • first substrate 31 has a first display area A (shown as 3A-3E) and a first peripheral area B, corresponding to the
  • the two substrates 41 have a second display area C (as shown in 4A-4E) and a second peripheral area D.
  • the first peripheral region B is sequentially formed with a gate electrode 32, a gate insulating layer 33, a semiconductor layer 34, an ohmic contact layer 35, a protective layer 37, and a first electrode layer 38.
  • the maximum vertical distance between the protective layer 37 and the inner side of the first substrate 31 is the first contact distance D1.
  • the second substrate 41 is sequentially formed with a BM layer 42, an R color resist layer 43, a G color resist layer 44, a B color resist layer 45, and a second electrode layer 47.
  • the maximum vertical distance between the B color resist layer 45 and the inner side of the second substrate 41 is the second contact distance D2.
  • the first contact distance D1 and the second contact distance D2 constitute a contact distance, and the contact distance satisfies the following conditions: a first contact distance D1, a second contact distance D2, and the first electrode layer 38.
  • the sum of the thickness D3 and the thickness D4 of the second electrode layer 47 is equal to the distance D5 of the inside of the first substrate 31 and the second substrate 41.
  • the other coating layer other than the first electrode layer 38 formed by the first peripheral region B includes the gate insulating layer 33, the semiconductor layer 34, the ohmic contact layer 35 or the protective layer 37.
  • One or more layers may be formed as long as the first contact distance D1 can be formed.
  • the coating layer other than the second electrode layer 47 formed by the second peripheral region D includes a BM layer 42, an R color resist layer 43, a G color resist layer 44, and a B color resist layer.
  • One or more layers of 45 may be formed as long as the second contact distance D2 can be formed.
  • the coating layer of the first peripheral region B of the first substrate 31 is retained, and the remaining coating layer includes at least the first electrode layer 38, and the first electrode layer 38
  • the maximum vertical distance between the other coating layers and the inner side of the first substrate 31 is the first contact distance D1; during the formation of the second substrate 41, the coating layer of the second peripheral region D of the second substrate 41 remains. And the remaining coating layer includes at least the second electrode layer 47, and the maximum vertical distance between the coating layer other than the second electrode layer 47 and the inner side of the second substrate 41 is the second contact distance D2.
  • the sum of the first contact distance D1, the second contact distance D2, the thickness D3 of the first electrode layer 38, and the thickness D4 of the second electrode layer 47 is equal to between the first substrate 31 and the second substrate 41.
  • the first electrode layer 38 of the first peripheral region B of the first substrate 31 After the first electrode layer 38 of the first peripheral region B of the first substrate 31 is energized, the first electrode layer 38 of the first peripheral region B provides a potential to the first electrode layer 38 of the first display region A, and passes through The second electrode layer 47 of the second peripheral region D supplies a potential to the second electrode layer 47 of the second display region C, and finally passes through the control potential such that the first electrode layer 38 and the second display region C of the first display region A A voltage difference is formed between the second electrode layers 47, and the voltage difference drives the alignment of the liquid crystal molecules between the first substrate 31 and the second substrate 41 to achieve a grating effect.
  • the invention omits the coating process of the gold spot glue in the prior art, not only saves the cost, but also avoids the phenomenon of picture mottle caused by the uneven coating of the gold spot glue in the prior art, and greatly improves the liquid crystal.
  • the screen display quality of the panel is not only saves the cost, but also avoids the phenomenon of picture mottle caused by the uneven coating of the gold spot glue in the prior art, and greatly improves the liquid crystal.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)

Abstract

一种液晶面板及其制作方法，所述液晶面板包括第一基板（31）和第二基板（41），所述第一基板（31）具有第一显示区（A）和第一外围区域（B），所述第二基板（41）具有对应所述第一显示区（A）的第二显示区（C）和对应所述第一外围区域（B）的第二外围区域（D），所述第一外围区域（B）形成有第一电极层（38），所述第二外围区域（D）形成有第二电极层（47），所述第一外围区域（B）及所述第二外围区域（D）的至少一者还形成有至少一涂布层，所述涂布层使得所述第一电极层（38）或所述第二电极层（47）的至少一者突出一接触距离（D1，D2），以使得所述第一基板（41）和所述第二基板（32）组装后，所述第一电极层（38）和第二电极层（47）相互接触。因此，节省了成本，提高了液晶面板的画面显示质量。

Description

液晶面板及其制作方法 技术领域
本发明涉及液晶生产技术领域，尤其涉及一种液晶面板及其制作方法。
 背景技术
随着液晶显示技术的不断发展，对液晶显示器功能的要求也越来越高。
液晶面板包括用于显示图像的显示区，还包括环绕所述显示区的外围区域，外围区域主要用来接通外部电源。请参阅图1，图1为现有技术中液晶面板的外围区域的剖视图。其中，液晶面板包括薄膜场效应晶体管（Thin Film Transistor，TFT）基板11，还包括彩色滤光（Color Filter，CF）基板21。
TFT基板11的内侧形成有第一电极层12，CF基板21的内侧形成有第二电极层22，第一电极层12和第二电极层22之间设置有金点胶30。
在垂直配向（Vertical Alignment，VA）或者扭曲向列型(Twisted Nematic，TN)显示模式下，对所述TFT基板11外围区域的第一电极层12通电，该外围区域的第一电极层12提供电位给显示区内的第一电极层（图未示），该外围区域的第一电极层12同时通过金点胶30将电位传导至CF基板21的外围区域的第二电极层22，进而传导至CF基板21的显示区的第二电极层（图未示）。最后通过控制电位，使得TFT基板11的显示区和CF基板21的显示区形成一电压差，该电压差驱动第一基板11和第二基板12的显示区内的液晶分子排列以达到光栅效果。
显然，上述方式需要在已经成型的第一基板11和第二基板21之间涂布金点胶30，由于金点胶30的涂布工艺复杂，金点胶30的价格较高，使得液晶面板的生产成本较高；而且，如果金点胶30涂布不均，会造成液晶面板出现显示画面斑驳的现象。
 技术问题
本发明的一个目的在于提供一种液晶面板，旨在解决现有技术中由于金点胶涂布不均，造成液晶面板出现显示画面斑驳的技术问题，简化液晶面板的涂布工艺，节省成本。
本发明的又一个目的在于提供一种液晶面板的制作方法，旨在解决现有技术中由于金点胶涂布不均，造成液晶面板出现显示画面斑驳的技术问题，简化液晶面板的涂布工艺，节省成本。
 技术解决方案
本发明构造了一种液晶面板，所述液晶面板包括第一基板和第二基板，所述第一基板具有第一显示区和第一外围区域，所述第二基板具有对应所述第一显示区的第二显示区和对应所述第一外围区域的第二外围区域，所述第一外围区域形成有第一电极层，所述第二外围区域形成有第二电极层；
所述第一外围区域形成有所述第一电极层之外的其它涂布层，该形成的其它涂布层与所述第一基板内侧的最大垂直距离为第一接触距离；所述第二外围区域形成有所述第二电极层之外的其它涂布层，该形成的其它涂布层与所述第二基板内侧的最大垂直距离为第二接触距离；
所述第一接触距离、所述第二接触距离、所述第一电极层的厚度以及所述第二电极层的厚度之和等于所述第一基板和所述第二基板内侧的距离，以使得所述第一基板和所述第二基板组装后，所述第一电极层和所述第二电极层相互接触；
其中，所述第一外围区域形成的所述第一电极层之外的其它涂布层包括栅极绝缘层、半导体层、欧姆接触层或者保护层中的一层或者多层；所述第二外围区域形成的所述第二电极层之外的其它涂布层包括遮光层或者色阻层中的一层或多层。
在本发明的液晶面板中，所述色阻层包括红色色阻层、绿色色阻层或者蓝色色阻层中的一层或者由多层堆叠而成。
本发明的另一个目的在于提供一种液晶面板，旨在解决现有技术中由于金点胶涂布不均，造成液晶面板出现显示画面斑驳的技术问题，简化液晶面板的涂布工艺，节省成本。
为解决上述技术问题及到达上述有益技术效果，本发明构造了一种液晶面板，所述液晶面板包括第一基板和第二基板，所述第一基板具有第一显示区和第一外围区域，所述第二基板具有对应所述第一显示区的第二显示区和对应所述第一外围区域的第二外围区域，所述第一外围区域形成有第一电极层，所述第二外围区域形成有第二电极层；
所述第一外围区域及所述第二外围区域的至少一者还形成有至少一涂布层，所述涂布层使得所述第一电极层或所述第二电极层的至少一者突出一接触距离，以使得所述第一基板和所述第二基板组装后，所述第一电极层和所述第二电极层相互接触。
在本发明的液晶面板中，所述第一外围区域形成有所述第一电极层之外的其它涂布层，该形成的其它涂布层与所述第一基板内侧的最大垂直距离为第一接触距离；
且所述第二外围区域形成有所述第二电极层之外的其它涂布层，该形成的其它涂布层与所述第二基板内侧的最大垂直距离为第二接触距离；
所述第一接触距离、所述第二接触距离、所述第一电极层的厚度以及所述第二电极层的厚度之和等于所述第一基板和所述第二基板内侧的距离。
在本发明的液晶面板中，所述第一外围区域形成的所述第一电极层之外的其它涂布层包括栅极绝缘层、半导体层、欧姆接触层或者保护层中的一层或者多层。
在本发明的液晶面板中，所述第二外围区域形成的所述第二电极层之外的其它涂布层包括遮光层或者色阻层中的一层或多层。
在本发明的液晶面板中，所述色阻层包括红色色阻层、绿色色阻层或者蓝色色阻层中的一层或者由多层堆叠而成。
本发明的又一个目的在于提供一种液晶面板的制作方法，旨在解决现有技术中由于金点胶涂布不均，造成液晶面板出现显示画面斑驳的技术问题，简化液晶面板的涂布工艺，节省成本。
为解决上述技术问题及到达上述有益技术效果，本发明构造了一种液晶面板的制作方法，所述方法包括以下步骤：
提供第一基板和第二基板，所述第一基板具有第一显示区和第一外围区域，所述第二基板具有对应所述第一显示区的第二显示区和对应所述第一外围区域的第二外围区域；
形成涂布层于所述第一外围区域，该形成的涂布层至少包括第一电极层；
形成涂布层于所述第二外围区域，该形成的涂布层至少包括第二电极层；
在所述第一外围区域及所述第二外围区域的至少一者还形成至少一涂布层，所述涂布层使得所述第一电极层或所述第二电极层的至少一者突出一接触距离；
将所述第一基板和所述第二基板组装，以使得所述第一电极层和所述第二电极层相互接触。
在本发明的液晶面板的制作方法中，所述在所述第一外围区域及所述第二外围区域的至少一者形成有至少一涂布层，所述涂布层使所述第一电极层或所述第二电极层的至少一者具有一接触距离的步骤具体包括：
在所述第一外围区域形成所述第一电极层之外的其它涂布层，并使得该形成的其它涂布层与所述第一基板内侧的最大垂直距离为第一接触距离；
在所述第二外围区域形成所述第二电极层之外的其它涂布层，并使得该形成的其它涂布层与所述第二基板内侧的最大垂直距离为第二接触距离；
所述第一接触距离、所述第二接触距离、所述第一电极层的厚度以及所述第二电极层的厚度之和等于所述第一基板和所述第二基板内侧的距离。
在本发明的液晶面板的制作方法中，所述第一外围区域形成的所述第一电极层之外的其它涂布层包括栅极绝缘层、半导体层、欧姆接触层或者保护层中的一层或者多层。
在本发明的液晶面板的制作方法中，所述第二外围区域形成的所述第二电极层之外的其它涂布层包括遮光层或者色阻层中的一层或多层。
在本发明的液晶面板的制作方法中，所述色阻层包括红色色阻层、绿色色阻层或者蓝色色阻层中的一层或者由多层堆叠而成。
 有益效果
本发明相对现有技术，通过在所述第一基板或者第二基板的外围区域保留电极层之外的其它涂布层，通过保留的涂布层撑出对应的电极层一接触距离，进而使得第一基板和第二基板组装后，所述外围区域的电极层接触，从而实现导电，省去了现有技术中金点胶的涂布工序，不仅节省了成本，而且避免了现有技术中由于金点胶的涂布不均造成的画面斑驳现象，极大的提高了液晶面板的画面显示质量。
 附图说明
图1为现有技术中液晶面板的结构示意图；
图2为本发明中液晶面板的制造方法的较佳实施例的流程示意图；
图3A-3E为本发明中第一基板的较佳实施例形成示意图；
图4A-4E为本发明中第二基板的较佳实施例形成示意图；
图5为本发明中液晶面板的较佳实施例结构图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。
图2为本发明中液晶面板的制造方法的较佳实施例的流程示意图。
在步骤S201中，提供第一基板（TFT基板），在所述第一基板的第一显示区A及第一外围区域B(请对照参阅图3A-3E)形成有除第一电极层之外的其它涂布层。
譬如，在所述第一基板的第一显示区A及第一外围区域B上依次形成栅极、栅极绝缘层、半导体层、欧姆接触层以及保护层。
在步骤S202中，图案化所述第一显示区A内的涂布层，同时保留所述第一外围区域B中的涂布层，并使得所保留的第一外围区域B中的涂布层与所述第一基板内侧的最大垂直距离为第一接触距离D1（请对照参阅图5）。
在具体实施过程中，可对所述第一外围区域B中保留的涂布层进行图案化处理，以控制所保留的涂布层的形状，譬如形成金字塔状。
在步骤S203中，在所述第一基板的第一显示区A及第一外围区域B形成第一电极层，并对所述第一显示区A的第一电极层进行图案化处理，以形成一主动组件阵列于所述第一显示区A内。
此时，所述第一外围区域B上保留的涂布层包括栅极绝缘层、非晶硅层、欧姆接触层中的一层或者多层，并包括第一电极层。
在步骤S204中，提供第二基板（CF基板），所述第二基板的第二显示区C和第二外围区域D（请对照参阅图4A-4E）形成有除第二电极层之外的其它涂布层。
其中，所述第二基板的所述第二显示区C对应所述第一基板的所述第一显示区A，所述第二外围区域D对应所述第二基板的所述第二外围区域D。
在步骤S205中，图案化所述第二基板的第二显示区C内的涂布层，同时保留所述第二外围区域D的涂布层。
在具体实施过程中，可对所保留的第二外围区域D的涂布层进行图案化处理，以控制所保留的涂布层的形状，譬如形成一金字塔状。并控制所保留的涂布层与所述第二基板内侧的最大垂直距离为第二接触距离D2（请参阅图5）。
在步骤S206中，在所述第二基板的第二显示区C和第二外围区域D形成第二电极层。
此时，所述第二外围区域D上所保留的涂布层包括黑色矩阵(Black Matrix，BM)层或者色阻层中的一层或者两层，且所保留的色阻层为红色（R）色阻层、绿色（G）色阻层或者蓝色（B）色阻层中的一层或者多层，而且所述第二外围区域D上所保留的涂布层包括第二电极层。
在本实施例中，所述第一接触距离D1和所述第二接触距离D2构成接触距离，该接触距离满足以下条件：所述第一接触距离D1、所述第二接触距离D2、所述第一电极层的厚度D3以及所述第二电极层的厚度D4之和等于第一基板和第二基板之间的距离D5（请参阅图5）。
在步骤S207中，将所述第一基板和第二基板组装，以使得所述第一外围区域B的第一电极层接触所述第二外围区域D的第二电极层。
本发明通过在所述第一基板的外围区域保留第一电极层之外的其它涂布层，在所述第二基板的外围区域保留第二电极层之外的其它涂布层，在将第一基板和第二基板连接后，所述外围区域的所述第一电极层接触第二电极层，从而实现导电，省去了现有技术中金点胶的涂布工序，不仅节省了成本，而且避免了现有技术中由于金点胶的涂布不均造成的画面斑驳现象，极大的提高了液晶面板的画面显示质量。
请参阅图3A-3E，图3A-3E为第一基板的较佳实施例形成示意图。
请参阅图3A，形成栅极32于第一基板31的显示区A以及外围区域B，该栅极32通过第一道光掩膜制程来形成。
请参阅图3B，在所述第一基板31上依次形成栅极绝缘层33、半导体层34及欧姆接触层35，上述各涂布层均覆盖所述第一基板31的第一显示区A和第一外围区域B。并通过第二道光掩膜制程的曝光显影来图案化所述第一显示区A和第一外围区域B上的半导体层34、欧姆接触层35，以形成半导体岛于栅极绝缘层33上。
请参阅图3C，通过第三道光掩膜制程的曝光显影在所述第一显示区A上形成漏电极36a及源电极36b于半导体岛上，并形成沟道C于漏电极36a及源电极36b之间。
请参阅图3D，通过第四道光掩膜制程的曝光显影来形成保护层37于沟道C、漏电极36a及源电极36b上，其中保护层37具有至少一接孔37a，以暴露出部分漏电极36a。同时，形成保护层37于所述第一外围区域B上。此时，所述第一外围区域B上保留有栅极绝缘层33、半导体层34、欧姆接触层35以及保护层37，且所述保护层37与所述第一基板31内侧的最大垂直距离为第一接触距离D1。
请参阅图3E，通过第五道光掩膜制程的曝光显影来形成第一电极层38于保护层37上。由于第一电极层38是覆盖于接孔37a（请参阅图3D）上，因而可利用保护层37的接孔37a来电性连接于漏电极36a，故完成主动组件(TFT)于第一基板31的第一显示区A上。在第五道光掩膜制程中，所述第一电极层38同时形成于所述第一外围区域B的保护层37上。此时，所述第一外围区域B的所述第一电极层38和第一基板31之间保留有栅极32、栅极绝缘层33、半导体层34、欧姆接触层35以及保护层37。
在本实施例中，第一基板31的主动组件(TFT)阵列是通过五道光掩膜制程来完成，在其它实施例中，主动组件阵列亦可通过四道或更少道的光掩膜制程来完成。
请参阅图4A-4E，图4A-4E为第二基板的较佳实施例的形成示意图。
请参阅图4A，形成BM层42（即遮光层）于所述第二基板41的第二显示区C及第二外围区域D上，并对所述第二显示区C的BM层42进行曝光显影，以形成开口形状，保留所述第二外围区域D上的BM层42。
请参阅图4B，在所述第二显示区C及第二外围区域D上形成图案化R色阻层43。
请参阅图4C，对所述R色阻层43进行曝光显影，以形成图案化R色阻层431，同时保留所述第二外围区域D上的R色阻层43。
请参阅图4D，在所述第二显示区C及第二外围区域D上依次形成G色阻层44和B色阻层45。对所述第二显示区C上的G色阻层44和B色阻层45进行曝光显影，以形成图案化G色阻层441和图案化B色阻层451，同时保留所述第二外围区域D上的G色阻层44和B色阻层45。
请参阅图4E，在所述第二显示区C上依次形成外敷层46以及第二电极层47，同时，在所述第二外围区域D上形成第二电极层47。此时，所述第二外围区域D上所述第二电极层47和所述第二基板41之间保留有BM层42、R色阻层43、G色阻层44和B色阻层45，其中，所述B色阻层45与所述第二基板41内侧的最大垂直距离为第二接触距离D2。
请参阅图5，图5为本发明实施例中液晶面板的较佳实施例结构示意图。
其中，所述液晶面板包括第一基板31和第二基板41，所述第一基板31具有第一显示区A(如3A-3E所示)和第一外围区域B，对应的，所述第二基板41具有第二显示区C(如4A-4E所示)和第二外围区域D。
在图5所示的实施例中，所述第一外围区域B依次形成有栅极32，栅极绝缘层33、半导体层34、欧姆接触层35、保护层37以及第一电极层38。其中，所述保护层37与所述第一基板31内侧的最大垂直距离为第一接触距离D1。
在图5所示的实施例中，所述第二基板41依次形成有BM层42、R色阻层43、G色阻层44、B色阻层45以及第二电极层47。其中，所述B色阻层45与所述第二基板41内侧的最大垂直距离为第二接触距离D2。
在本实施例中，所述第一接触距离D1和所述第二接触距离D2构成接触距离，该接触距离满足以下条件：第一接触距离D1、第二接触距离D2，以及第一电极层38的厚度D3和第二电极层47的厚度D4之和等于所述第一基板31和所述第二基板41内侧的距离D5。
在具体实施过程中，所述第一外围区域B形成的所述第一电极层38之外的其它涂布层包括栅极绝缘层33、半导体层34、欧姆接触层35或者保护层37中的一层或者多层，只要能够形成上述第一接触距离D1即可，此处不一一列举。
在具体实施过程中，所述第二外围区域D形成的所述第二电极层47之外的其它涂布层包括BM层42、R色阻层43、G色阻层44、B色阻层45中的一层或多层，只要能够形成上述第二接触距离D2即可，此处不一一列举。
本实施例在第一基板31形成过程中，通过保留第一基板31的第一外围区域B的涂布层，且保留的涂布层至少包括第一电极层38，所述第一电极层38之外的其它涂布层与所述第一基板31内侧的最大垂直距离为第一接触距离D1；在第二基板41形成过程中，保留第二基板41的第二外围区域D的涂布层，且保留的涂布层至少包括第二电极层47，所述第二电极层47之外的其它涂布层与所述第二基板41内侧的最大垂直距离为第二接触距离D2。其中，第一接触距离D1、第二接触距离D2、第一电极层38的厚度D3和第二电极层47的厚度D4之和等于所述第一基板31和所述第二基板41之间的距离D5。如此，在将所述第一基板31和所述第二基板41组装后，所述第一基板31的第一电极层38与所述第二基板41的第二电极层47接触，在对所述第一基板31的第一外围区域B的第一电极层38通电后，第一外围区域B的第一电极层38提供电位给所述第一显示区A的第一电极层38，并通过第二外围区域D的第二电极层47将电位提供给第二显示区C的第二电极层47，最后通过控制电位，使得第一显示区A的第一电极层38与第二显示区C的第二电极层47之间形成电压差，该电压差驱动第一基板31和第二基板41间的液晶分子排列以达到光栅效果。
本发明省去了现有技术中金点胶的涂布工序，不仅节省了成本，而且避免了现有技术中由于金点胶的涂布不均造成的画面斑驳现象，极大的提高了液晶面板的画面显示质量。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。
 本发明的实施方式
工业实用性
序列表自由内容

Claims (12)

  1. 一种液晶面板，所述液晶面板包括第一基板和第二基板，所述第一基板具有第一显示区和第一外围区域，所述第二基板具有对应所述第一显示区的第二显示区和对应所述第一外围区域的第二外围区域，所述第一外围区域形成有第一电极层，所述第二外围区域形成有第二电极层，其特征在于：
    所述第一外围区域形成有所述第一电极层之外的其它涂布层，该形成的其它涂布层与所述第一基板内侧的最大垂直距离为第一接触距离；所述第二外围区域形成有所述第二电极层之外的其它涂布层，该形成的其它涂布层与所述第二基板内侧的最大垂直距离为第二接触距离；
    所述第一接触距离、所述第二接触距离、所述第一电极层的厚度以及所述第二电极层的厚度之和等于所述第一基板和所述第二基板内侧的距离，以使得所述第一基板和所述第二基板组装后，所述第一电极层和所述第二电极层相互接触；
    其中，所述第一外围区域形成的所述第一电极层之外的其它涂布层包括栅极绝缘层、半导体层、欧姆接触层或者保护层中的一层或者多层；所述第二外围区域形成的所述第二电极层之外的其它涂布层包括遮光层或者色阻层中的一层或多层。
  2. 根据权利要求1所述的液晶面板，其特征在于，所述色阻层包括红色色阻层、绿色色阻层或者蓝色色阻层中的一层或者由多层堆叠而成。
  3. 一种液晶面板，所述液晶面板包括第一基板和第二基板，所述第一基板具有第一显示区和第一外围区域，所述第二基板具有对应所述第一显示区的第二显示区和对应所述第一外围区域的第二外围区域，所述第一外围区域形成有第一电极层，所述第二外围区域形成有第二电极层，其特征在于：
    所述第一外围区域及所述第二外围区域的至少一者还形成有至少一涂布层，所述涂布层使得所述第一电极层或所述第二电极层的至少一者突出一接触距离，以使得所述第一基板和所述第二基板组装后，所述第一电极层和所述第二电极层相互接触。
  4. 根据权利要求3所述的液晶面板，其特征在于，所述第一外围区域形成有所述第一电极层之外的其它涂布层，该形成的其它涂布层与所述第一基板内侧的最大垂直距离为第一接触距离；
    且所述第二外围区域形成有所述第二电极层之外的其它涂布层，该形成的其它涂布层与所述第二基板内侧的最大垂直距离为第二接触距离；
    所述第一接触距离、所述第二接触距离、所述第一电极层的厚度以及所述第二电极层的厚度之和等于所述第一基板和所述第二基板内侧的距离。
  5. 根据权利要求4所述的液晶面板，其特征在于，所述第一外围区域形成的所述第一电极层之外的其它涂布层包括栅极绝缘层、半导体层、欧姆接触层或者保护层中的一层或者多层。
  6. 根据权利要求4所述的液晶面板，其特征在于，所述第二外围区域形成的所述第二电极层之外的其它涂布层包括遮光层或者色阻层中的一层或多层。
  7. 根据权利要求6所述的液晶面板，其特征在于，所述色阻层包括红色色阻层、绿色色阻层或者蓝色色阻层中的一层或者由多层堆叠而成。
  8. 一种液晶面板的制作方法，其特征在于，所述方法包括以下步骤：
    提供第一基板和第二基板，所述第一基板具有第一显示区和第一外围区域，所述第二基板具有对应所述第一显示区的第二显示区和对应所述第一外围区域的第二外围区域；
    形成涂布层于所述第一外围区域，该形成的涂布层至少包括第一电极层；
    形成涂布层于所述第二外围区域，该形成的涂布层至少包括第二电极层；
    在所述第一外围区域及所述第二外围区域的至少一者还形成至少一涂布层，所述涂布层使得所述第一电极层或所述第二电极层的至少一者突出一接触距离；
    将所述第一基板和所述第二基板组装，以使得所述第一电极层和所述第二电极层相互接触。
  9. 根据权利要求8所述的液晶面板的制作方法，其特征在于，所述在所述第一外围区域及所述第二外围区域的至少一者还形成至少一涂布层，所述涂布层使所述第一电极层或所述第二电极层的至少一者具有一接触距离的步骤具体包括：
    在所述第一外围区域形成所述第一电极层之外的其它涂布层，并使得该形成的其它涂布层与所述第一基板内侧的最大垂直距离为第一接触距离；
    在所述第二外围区域形成所述第二电极层之外的其它涂布层，并使得该形成的其它涂布层与所述第二基板内侧的最大垂直距离为第二接触距离；
    所述第一接触距离、所述第二接触距离、所述第一电极层的厚度以及所述第二电极层的厚度之和等于所述第一基板和所述第二基板内侧的距离。
  10. 根据权利要求9所述的液晶面板的制作方法，其特征在于，所述第一外围区域形成的所述第一电极层之外的其它涂布层包括栅极绝缘层、半导体层、欧姆接触层或者保护层中的一层或者多层。
  11. 根据权利要求9所述的液晶面板的制作方法，其特征在于，所述第二外围区域形成的所述第二电极层之外的其它涂布层包括遮光层或者色阻层中的一层或多层。
  12. 根据权利要求11所述的液晶面板的制作方法，其特征在于，所述色阻层包括红色色阻层、绿色色阻层或者蓝色色阻层中的一层或者由多层堆叠而成。
PCT/CN2011/082830 2011-11-18 2011-11-24 液晶面板及其制作方法 Ceased WO2013071633A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US13/380,908 US20130128194A1 (en) 2011-11-18 2011-11-24 Liquid crystal panel and manufacturing method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201110369510.2A CN102402080B (zh) 2011-11-18 2011-11-18 液晶面板及其制作方法
CN201110369510.2 2011-11-18

Publications (1)

Publication Number Publication Date
WO2013071633A1 true WO2013071633A1 (zh) 2013-05-23

Family

ID=45884443

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2011/082830 Ceased WO2013071633A1 (zh) 2011-11-18 2011-11-24 液晶面板及其制作方法

Country Status (2)

Country Link
CN (1) CN102402080B (zh)
WO (1) WO2013071633A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103019447B (zh) * 2012-12-21 2015-11-25 北京京东方光电科技有限公司 一种彩膜基板制作方法及彩膜基板、显示装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1550827A (zh) * 2003-05-15 2004-12-01 ���ǵ�����ʽ���� 液晶显示装置及其制造方法
CN101000424A (zh) * 2006-01-11 2007-07-18 三星电子株式会社 滤色器基板及包括该滤色器基板的液晶显示屏板
JP2009116064A (ja) * 2007-11-07 2009-05-28 Toshiba Matsushita Display Technology Co Ltd 液晶表示装置
CN102043297A (zh) * 2009-10-19 2011-05-04 三星电子株式会社 显示基板及其制造方法和具有该显示基板的显示设备
US20110194062A1 (en) * 2010-02-11 2011-08-11 Samsung Mobile Display Co., Ltd. Liquid crystal display device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100964797B1 (ko) * 2003-12-23 2010-06-21 엘지디스플레이 주식회사 액정 표시 장치 및 그 제조 방법
CN102109628A (zh) * 2011-01-28 2011-06-29 深圳市华星光电技术有限公司 彩色滤光片构造及其制造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1550827A (zh) * 2003-05-15 2004-12-01 ���ǵ�����ʽ���� 液晶显示装置及其制造方法
CN101000424A (zh) * 2006-01-11 2007-07-18 三星电子株式会社 滤色器基板及包括该滤色器基板的液晶显示屏板
JP2009116064A (ja) * 2007-11-07 2009-05-28 Toshiba Matsushita Display Technology Co Ltd 液晶表示装置
CN102043297A (zh) * 2009-10-19 2011-05-04 三星电子株式会社 显示基板及其制造方法和具有该显示基板的显示设备
US20110194062A1 (en) * 2010-02-11 2011-08-11 Samsung Mobile Display Co., Ltd. Liquid crystal display device

Also Published As

Publication number Publication date
CN102402080B (zh) 2015-01-21
CN102402080A (zh) 2012-04-04

Similar Documents

Publication Publication Date Title
WO2012100444A1 (zh) 彩色滤光片构造及其制造方法
WO2016161665A1 (zh) 一种液晶显示面板及液晶显示装置
WO2018133134A1 (zh) Coa基板及液晶显示面板
WO2017008316A1 (zh) 一种阵列基板及液晶显示面板
WO2019015020A1 (zh) 一种液晶显示面板的制作方法
WO2019085067A1 (zh) 液晶显示面板及其制备方法
WO2014107890A1 (zh) 彩色滤光片基板及其制造方法和液晶面板
WO2017088230A1 (zh) Coa基板、液晶显示面板及液晶显示装置
WO2016201729A1 (zh) 一种阵列基板及其制作方法、液晶显示器
WO2018006479A1 (zh) 阵列基板及其制作方法、以及液晶显示面板
WO2018032551A1 (zh) 液晶显示面板及液晶显示装置
WO2019051968A1 (zh) 彩膜基板的制作方法
WO2016145685A1 (zh) 一种彩膜基板的制作方法、彩膜基板以及液晶显示面板
WO2019015191A1 (zh) 一种显示面板及其制程
WO2020062491A1 (zh) 彩色滤光片和显示面板
WO2019214168A1 (zh) 彩膜基板及其制备方法、显示装置
WO2016173021A1 (zh) 显示面板及显示装置
WO2016095243A1 (zh) 液晶面板及其制备方法
CN106324881B (zh) 显示装置、显示面板及其制备方法
WO2019015146A1 (zh) 一种显示面板及其制程
WO2019041480A1 (zh) Coa显示面板及其制作方法、coa显示装置
WO2016123797A1 (zh) 一种阵列基板、液晶显示面板及装置
WO2016123819A1 (zh) 触控显示面板的制作方法
WO2016065666A1 (zh) 一种tft基板及其制造方法
WO2017049663A1 (zh) 一种彩膜阵列基板及其制造方法、显示装置

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 13380908

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 11875756

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 11875756

Country of ref document: EP

Kind code of ref document: A1