WO2013011822A2 - Onium salt having trialkoxysilylalkyl group - Google Patents
Onium salt having trialkoxysilylalkyl group Download PDFInfo
- Publication number
- WO2013011822A2 WO2013011822A2 PCT/JP2012/066824 JP2012066824W WO2013011822A2 WO 2013011822 A2 WO2013011822 A2 WO 2013011822A2 JP 2012066824 W JP2012066824 W JP 2012066824W WO 2013011822 A2 WO2013011822 A2 WO 2013011822A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- carbamoyloxyethyl
- bis
- trifluoromethanesulfonyl
- imide
- trimethoxysilylpropyl
- Prior art date
Links
- 150000003839 salts Chemical class 0.000 title claims abstract description 77
- -1 phosphorous cation Chemical class 0.000 claims abstract description 323
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims abstract description 14
- 150000001450 anions Chemical class 0.000 claims abstract description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims abstract description 5
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical group C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 claims abstract description 5
- 150000001768 cations Chemical class 0.000 claims abstract description 5
- VXTFGYMINLXJPW-UHFFFAOYSA-N phosphinane Chemical group C1CCPCC1 VXTFGYMINLXJPW-UHFFFAOYSA-N 0.000 claims abstract description 5
- VBQCHPIMZGQLAZ-UHFFFAOYSA-N phosphorane Chemical group [PH5] VBQCHPIMZGQLAZ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 125000003386 piperidinyl group Chemical group 0.000 claims abstract description 5
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 5
- 125000004434 sulfur atom Chemical group 0.000 claims abstract description 5
- 239000004925 Acrylic resin Substances 0.000 claims description 19
- 229920000178 Acrylic resin Polymers 0.000 claims description 19
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- JHYNEQNPKGIOQF-UHFFFAOYSA-N 3,4-dihydro-2h-phosphole Chemical group C1CC=PC1 JHYNEQNPKGIOQF-UHFFFAOYSA-N 0.000 claims description 8
- 239000002216 antistatic agent Substances 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 6
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 claims description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- UNQNIRQQBJCMQR-UHFFFAOYSA-N phosphorine Chemical group C1=CC=PC=C1 UNQNIRQQBJCMQR-UHFFFAOYSA-N 0.000 abstract 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 abstract 1
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 abstract 1
- ZXMGHDIOOHOAAE-UHFFFAOYSA-N 1,1,1-trifluoro-n-(trifluoromethylsulfonyl)methanesulfonamide Chemical compound FC(F)(F)S(=O)(=O)NS(=O)(=O)C(F)(F)F ZXMGHDIOOHOAAE-UHFFFAOYSA-N 0.000 description 89
- 229910052757 nitrogen Inorganic materials 0.000 description 86
- 238000006243 chemical reaction Methods 0.000 description 49
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 48
- 229910052698 phosphorus Chemical group 0.000 description 47
- 239000000243 solution Substances 0.000 description 28
- 150000004820 halides Chemical group 0.000 description 25
- 239000002904 solvent Substances 0.000 description 25
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 21
- 238000005160 1H NMR spectroscopy Methods 0.000 description 19
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical group CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 16
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 229940071161 dodecylbenzenesulfonate Drugs 0.000 description 13
- 150000002513 isocyanates Chemical class 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 229910052783 alkali metal Inorganic materials 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 12
- 229910017053 inorganic salt Inorganic materials 0.000 description 12
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 239000012948 isocyanate Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000005342 ion exchange Methods 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- IOAMURNQJWBINV-UHFFFAOYSA-N trimethyl-[2-[3-(3-trimethoxysilylpropylamino)propanoyloxy]ethyl]azanium Chemical compound CO[Si](OC)(OC)CCCNCCC(=O)OCC[N+](C)(C)C IOAMURNQJWBINV-UHFFFAOYSA-N 0.000 description 8
- OKDZGGFDWYPBIX-UHFFFAOYSA-N trimethyl-[2-[3-(3-trimethoxysilylpropylsulfanyl)propanoyloxy]ethyl]azanium Chemical compound CO[Si](OC)(OC)CCCSCCC(=O)OCC[N+](C)(C)C OKDZGGFDWYPBIX-UHFFFAOYSA-N 0.000 description 8
- 238000005406 washing Methods 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- KVAMALWWXJBDDO-UHFFFAOYSA-N CCO[Si](OCC)(OCC)CCCSCCC(=O)OCC[N+](C)(C)C Chemical compound CCO[Si](OCC)(OCC)CCCSCCC(=O)OCC[N+](C)(C)C KVAMALWWXJBDDO-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 150000003949 imides Chemical class 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 5
- 150000001805 chlorine compounds Chemical group 0.000 description 5
- 239000012975 dibutyltin dilaurate Substances 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- KGWNHXCBHOVEOM-UHFFFAOYSA-N 2-pyridin-1-ium-1-ylethanol Chemical compound OCC[N+]1=CC=CC=C1 KGWNHXCBHOVEOM-UHFFFAOYSA-N 0.000 description 4
- KWXICGTUELOLSQ-UHFFFAOYSA-N 4-dodecylbenzenesulfonic acid Chemical group CCCCCCCCCCCCC1=CC=C(S(O)(=O)=O)C=C1 KWXICGTUELOLSQ-UHFFFAOYSA-N 0.000 description 4
- MSLCUVYSLNEOPW-UHFFFAOYSA-N C[N+](CCOC(CCNCCC[Si](OCC)(OCC)OCC)=O)(C)C Chemical compound C[N+](CCOC(CCNCCC[Si](OCC)(OCC)OCC)=O)(C)C MSLCUVYSLNEOPW-UHFFFAOYSA-N 0.000 description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 230000018044 dehydration Effects 0.000 description 4
- 238000006297 dehydration reaction Methods 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- 229910052744 lithium Inorganic materials 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- OVAYFAFSKURHDC-UHFFFAOYSA-N tributyl(2-hydroxyethyl)phosphanium Chemical compound CCCC[P+](CCO)(CCCC)CCCC OVAYFAFSKURHDC-UHFFFAOYSA-N 0.000 description 4
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 4
- AIUAMYPYEUQVEM-UHFFFAOYSA-N trimethyl(2-prop-2-enoyloxyethyl)azanium Chemical compound C[N+](C)(C)CCOC(=O)C=C AIUAMYPYEUQVEM-UHFFFAOYSA-N 0.000 description 4
- 238000010977 unit operation Methods 0.000 description 4
- HZNVUJQVZSTENZ-UHFFFAOYSA-N 2,3-dichloro-5,6-dicyano-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(C#N)=C(C#N)C1=O HZNVUJQVZSTENZ-UHFFFAOYSA-N 0.000 description 3
- LDLCZOVUSADOIV-UHFFFAOYSA-N 2-bromoethanol Chemical compound OCCBr LDLCZOVUSADOIV-UHFFFAOYSA-N 0.000 description 3
- YORUPAOOJILXSN-UHFFFAOYSA-O 2-pyridin-1-ium-1-ylethyl N-(3-trimethoxysilylpropyl)carbamate Chemical compound CO[Si](CCCNC(=O)OCC[N+]1=CC=CC=C1)(OC)OC YORUPAOOJILXSN-UHFFFAOYSA-O 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- RDXSPXDWLXIORL-UHFFFAOYSA-O tributyl-[2-(3-triethoxysilylpropylcarbamoyloxy)ethyl]phosphanium Chemical compound C(C)O[Si](CCCNC(=O)OCC[P+](CCCC)(CCCC)CCCC)(OCC)OCC RDXSPXDWLXIORL-UHFFFAOYSA-O 0.000 description 3
- HMGFJRKLUQWMHH-UHFFFAOYSA-N trimethyl-[2-[2-methyl-3-(3-trimethoxysilylpropylsulfanyl)propanoyl]oxyethyl]azanium Chemical compound CO[Si](OC)(OC)CCCSCC(C)C(=O)OCC[N+](C)(C)C HMGFJRKLUQWMHH-UHFFFAOYSA-N 0.000 description 3
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- OIALIKXMLIAOSN-UHFFFAOYSA-N 2-Propylpyridine Chemical compound CCCC1=CC=CC=N1 OIALIKXMLIAOSN-UHFFFAOYSA-N 0.000 description 2
- 239000001763 2-hydroxyethyl(trimethyl)azanium Substances 0.000 description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 2
- ZBAVMRHWFOONIQ-UHFFFAOYSA-M 2-pyridin-1-ium-1-ylethanol;bromide Chemical compound [Br-].OCC[N+]1=CC=CC=C1 ZBAVMRHWFOONIQ-UHFFFAOYSA-M 0.000 description 2
- MFEIKQPHQINPRI-UHFFFAOYSA-N 3-Ethylpyridine Chemical compound CCC1=CC=CN=C1 MFEIKQPHQINPRI-UHFFFAOYSA-N 0.000 description 2
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 description 2
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 2
- PUACTIIESPYWSI-UHFFFAOYSA-N 3-propan-2-ylpyridine Chemical compound CC(C)C1=CC=CN=C1 PUACTIIESPYWSI-UHFFFAOYSA-N 0.000 description 2
- MLAXEZHEGARMPE-UHFFFAOYSA-N 3-propylpyridine Chemical compound CCCC1=CC=CN=C1 MLAXEZHEGARMPE-UHFFFAOYSA-N 0.000 description 2
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 2
- FKNQCJSGGFJEIZ-UHFFFAOYSA-N 4-methylpyridine Chemical compound CC1=CC=NC=C1 FKNQCJSGGFJEIZ-UHFFFAOYSA-N 0.000 description 2
- JAWZAONCXMJLFT-UHFFFAOYSA-N 4-propylpyridine Chemical compound CCCC1=CC=NC=C1 JAWZAONCXMJLFT-UHFFFAOYSA-N 0.000 description 2
- SWDDLRSGGCWDPH-UHFFFAOYSA-N 4-triethoxysilylbutan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCCN SWDDLRSGGCWDPH-UHFFFAOYSA-N 0.000 description 2
- 235000019743 Choline chloride Nutrition 0.000 description 2
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 2
- 241001459693 Dipterocarpus zeylanicus Species 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- SGMZJAMFUVOLNK-UHFFFAOYSA-M choline chloride Chemical compound [Cl-].C[N+](C)(C)CCO SGMZJAMFUVOLNK-UHFFFAOYSA-M 0.000 description 2
- 229960003178 choline chloride Drugs 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- CEIPQQODRKXDSB-UHFFFAOYSA-N ethyl 3-(6-hydroxynaphthalen-2-yl)-1H-indazole-5-carboximidate dihydrochloride Chemical compound Cl.Cl.C1=C(O)C=CC2=CC(C3=NNC4=CC=C(C=C43)C(=N)OCC)=CC=C21 CEIPQQODRKXDSB-UHFFFAOYSA-N 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 125000004437 phosphorous atom Chemical group 0.000 description 2
- 239000006187 pill Substances 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 238000005956 quaternization reaction Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ASUUSZXVXTVKDD-UHFFFAOYSA-N triethoxy(4-isocyanatobutyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCCN=C=O ASUUSZXVXTVKDD-UHFFFAOYSA-N 0.000 description 2
- IXOCYJDFSAFVDS-UHFFFAOYSA-N trimethoxy(3-pyridin-1-ium-1-ylpropyl)silane Chemical compound CO[Si](OC)(OC)CCC[N+]1=CC=CC=C1 IXOCYJDFSAFVDS-UHFFFAOYSA-N 0.000 description 2
- FZGFBJMPSHGTRQ-UHFFFAOYSA-M trimethyl(2-prop-2-enoyloxyethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CCOC(=O)C=C FZGFBJMPSHGTRQ-UHFFFAOYSA-M 0.000 description 2
- USFMMZYROHDWPJ-UHFFFAOYSA-N trimethyl-[2-(2-methylprop-2-enoyloxy)ethyl]azanium Chemical compound CC(=C)C(=O)OCC[N+](C)(C)C USFMMZYROHDWPJ-UHFFFAOYSA-N 0.000 description 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- MWUISCCBFHLWLY-UHFFFAOYSA-N 1,2-dimethylpiperidine Chemical compound CC1CCCCN1C MWUISCCBFHLWLY-UHFFFAOYSA-N 0.000 description 1
- PXHHIBMOFPCBJQ-UHFFFAOYSA-N 1,2-dimethylpyrrolidine Chemical compound CC1CCCN1C PXHHIBMOFPCBJQ-UHFFFAOYSA-N 0.000 description 1
- ONQLCPDIXPYJSS-UHFFFAOYSA-N 1,3-dimethylpiperidine Chemical compound CC1CCCN(C)C1 ONQLCPDIXPYJSS-UHFFFAOYSA-N 0.000 description 1
- TVSMLBGFGKLKOO-UHFFFAOYSA-N 1,4-dimethylpiperidine Chemical compound CC1CCN(C)CC1 TVSMLBGFGKLKOO-UHFFFAOYSA-N 0.000 description 1
- CHZGFKQNNNCJPR-UHFFFAOYSA-N 1-[4-(chloromethyl)phenyl]pyrrolidin-2-one Chemical compound C1=CC(CCl)=CC=C1N1C(=O)CCC1 CHZGFKQNNNCJPR-UHFFFAOYSA-N 0.000 description 1
- AXWLKJWVMMAXBD-UHFFFAOYSA-N 1-butylpiperidine Chemical compound CCCCN1CCCCC1 AXWLKJWVMMAXBD-UHFFFAOYSA-N 0.000 description 1
- JSHASCFKOSDFHY-UHFFFAOYSA-N 1-butylpyrrolidine Chemical compound CCCCN1CCCC1 JSHASCFKOSDFHY-UHFFFAOYSA-N 0.000 description 1
- OFKCFUCRFXSKRV-UHFFFAOYSA-N 1-ethylphosphinane Chemical compound CCP1CCCCC1 OFKCFUCRFXSKRV-UHFFFAOYSA-N 0.000 description 1
- ONQBOTKLCMXPOF-UHFFFAOYSA-N 1-ethylpyrrolidine Chemical compound CCN1CCCC1 ONQBOTKLCMXPOF-UHFFFAOYSA-N 0.000 description 1
- BBYSGWAYRRMWOW-UHFFFAOYSA-N 1-hexylpiperidine Chemical compound CCCCCCN1CCCCC1 BBYSGWAYRRMWOW-UHFFFAOYSA-N 0.000 description 1
- OUKZCQQNMWXMNE-UHFFFAOYSA-N 1-hexylpyrrolidine Chemical compound CCCCCCN1CCCC1 OUKZCQQNMWXMNE-UHFFFAOYSA-N 0.000 description 1
- OQURWGJAWSLGQG-UHFFFAOYSA-N 1-isocyanatopropane Chemical compound CCCN=C=O OQURWGJAWSLGQG-UHFFFAOYSA-N 0.000 description 1
- OYPJXDVXVCRLRC-UHFFFAOYSA-N 1-methyl-2-(2-methylpropyl)pyrrolidine Chemical compound CC(C)CC1CCCN1C OYPJXDVXVCRLRC-UHFFFAOYSA-N 0.000 description 1
- BYSFOADOCJNCMQ-UHFFFAOYSA-N 1-methyl-2-propan-2-ylpyrrolidine Chemical compound CC(C)C1CCCN1C BYSFOADOCJNCMQ-UHFFFAOYSA-N 0.000 description 1
- JDRHIFCXIYRAKL-UHFFFAOYSA-N 1-methyl-2-propylpyrrolidine Chemical compound CCCC1CCCN1C JDRHIFCXIYRAKL-UHFFFAOYSA-N 0.000 description 1
- GNKZTPPJXZMTFW-UHFFFAOYSA-N 1-methyl-2h-phosphinine Chemical compound CP1CC=CC=C1 GNKZTPPJXZMTFW-UHFFFAOYSA-N 0.000 description 1
- WKJBDCNEMDIONX-UHFFFAOYSA-N 1-methylphosphinane Chemical compound CP1CCCCC1 WKJBDCNEMDIONX-UHFFFAOYSA-N 0.000 description 1
- AVFZOVWCLRSYKC-UHFFFAOYSA-N 1-methylpyrrolidine Chemical compound CN1CCCC1 AVFZOVWCLRSYKC-UHFFFAOYSA-N 0.000 description 1
- LQWJONARYDIOSE-UHFFFAOYSA-N 1-pentylpiperidine Chemical compound CCCCCN1CCCCC1 LQWJONARYDIOSE-UHFFFAOYSA-N 0.000 description 1
- NWRUFJHICAREBX-UHFFFAOYSA-N 1-pentylpyrrolidine Chemical compound CCCCCN1CCCC1 NWRUFJHICAREBX-UHFFFAOYSA-N 0.000 description 1
- KXIXHISTUVHOCY-UHFFFAOYSA-N 1-propan-2-ylpiperidine Chemical compound CC(C)N1CCCCC1 KXIXHISTUVHOCY-UHFFFAOYSA-N 0.000 description 1
- YQOPNAOQGQSUHF-UHFFFAOYSA-N 1-propan-2-ylpyrrolidine Chemical compound CC(C)N1CCCC1 YQOPNAOQGQSUHF-UHFFFAOYSA-N 0.000 description 1
- HLNRRPIYRBBHSQ-UHFFFAOYSA-N 1-propylpyrrolidine Chemical compound CCCN1CCCC1 HLNRRPIYRBBHSQ-UHFFFAOYSA-N 0.000 description 1
- QKHJTYGUWNTBPG-UHFFFAOYSA-N 2,4-dimethylmorpholine Chemical compound CC1CN(C)CCO1 QKHJTYGUWNTBPG-UHFFFAOYSA-N 0.000 description 1
- BBVSPSDWPYWMOR-UHFFFAOYSA-N 2-(2-Methylpropyl)pyridine Chemical compound CC(C)CC1=CC=CC=N1 BBVSPSDWPYWMOR-UHFFFAOYSA-N 0.000 description 1
- PPJBTPJCACXLGB-UHFFFAOYSA-N 2-butan-2-yl-1-methylpyrrolidine Chemical compound CCC(C)C1CCCN1C PPJBTPJCACXLGB-UHFFFAOYSA-N 0.000 description 1
- YRVJJJKVAKFOJV-UHFFFAOYSA-N 2-butan-2-ylpyridine Chemical compound CCC(C)C1=CC=CC=N1 YRVJJJKVAKFOJV-UHFFFAOYSA-N 0.000 description 1
- PWVDAYXZBXAOSA-UHFFFAOYSA-N 2-butyl-1-methylpyrrolidine Chemical compound CCCCC1CCCN1C PWVDAYXZBXAOSA-UHFFFAOYSA-N 0.000 description 1
- ADSOSINJPNKUJK-UHFFFAOYSA-N 2-butylpyridine Chemical compound CCCCC1=CC=CC=N1 ADSOSINJPNKUJK-UHFFFAOYSA-N 0.000 description 1
- SZIFAVKTNFCBPC-UHFFFAOYSA-N 2-chloroethanol Chemical compound OCCCl SZIFAVKTNFCBPC-UHFFFAOYSA-N 0.000 description 1
- IDQXZLKEWHBPCA-UHFFFAOYSA-N 2-ethyl-1-methylpyrrolidine Chemical compound CCC1CCCN1C IDQXZLKEWHBPCA-UHFFFAOYSA-N 0.000 description 1
- NRGGMCIBEHEAIL-UHFFFAOYSA-N 2-ethylpyridine Chemical compound CCC1=CC=CC=N1 NRGGMCIBEHEAIL-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- QSECPQCFCWVBKM-UHFFFAOYSA-N 2-iodoethanol Chemical compound OCCI QSECPQCFCWVBKM-UHFFFAOYSA-N 0.000 description 1
- IHZHYITXFSSZIZ-UHFFFAOYSA-N 2-isocyanatoethyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCN=C=O IHZHYITXFSSZIZ-UHFFFAOYSA-N 0.000 description 1
- PFYPDUUXDADWKC-UHFFFAOYSA-N 2-propan-2-ylpyridine Chemical compound CC(C)C1=CC=CC=N1 PFYPDUUXDADWKC-UHFFFAOYSA-N 0.000 description 1
- WQSWGYXEWBYSAT-UHFFFAOYSA-N 2-tert-butyl-1-methylpyrrolidine Chemical compound CN1CCCC1C(C)(C)C WQSWGYXEWBYSAT-UHFFFAOYSA-N 0.000 description 1
- UUIMDJFBHNDZOW-UHFFFAOYSA-N 2-tert-butylpyridine Chemical compound CC(C)(C)C1=CC=CC=N1 UUIMDJFBHNDZOW-UHFFFAOYSA-N 0.000 description 1
- TXZZSVASDZFPQY-UHFFFAOYSA-N 2-tributoxysilylethanamine Chemical compound CCCCO[Si](CCN)(OCCCC)OCCCC TXZZSVASDZFPQY-UHFFFAOYSA-N 0.000 description 1
- QHQNYHZHLAAHRW-UHFFFAOYSA-N 2-trimethoxysilylethanamine Chemical compound CO[Si](OC)(OC)CCN QHQNYHZHLAAHRW-UHFFFAOYSA-N 0.000 description 1
- PLYTVAFAKDFFKM-UHFFFAOYSA-N 3,4-dimethylmorpholine Chemical compound CC1COCCN1C PLYTVAFAKDFFKM-UHFFFAOYSA-N 0.000 description 1
- DEGXTCKEZCCZOP-UHFFFAOYSA-N 3-(2-Methylpropyl)pyridine Chemical compound CC(C)CC1=CC=CN=C1 DEGXTCKEZCCZOP-UHFFFAOYSA-N 0.000 description 1
- PYSGFFTXMUWEOT-UHFFFAOYSA-N 3-(dimethylamino)propan-1-ol Chemical compound CN(C)CCCO PYSGFFTXMUWEOT-UHFFFAOYSA-N 0.000 description 1
- QSNMFWFDOFQASV-UHFFFAOYSA-N 3-Butylpyridine Chemical compound CCCCC1=CC=CN=C1 QSNMFWFDOFQASV-UHFFFAOYSA-N 0.000 description 1
- UEOMUYCGCCSHAP-UHFFFAOYSA-N 3-butan-2-ylpyridine Chemical compound CCC(C)C1=CC=CN=C1 UEOMUYCGCCSHAP-UHFFFAOYSA-N 0.000 description 1
- FBUIIWHYTLCORM-UHFFFAOYSA-N 3-tert-butylpyridine Chemical compound CC(C)(C)C1=CC=CN=C1 FBUIIWHYTLCORM-UHFFFAOYSA-N 0.000 description 1
- UAHAMNBFDHWCPU-UHFFFAOYSA-N 3-tributoxysilylpropan-1-amine Chemical compound CCCCO[Si](CCCN)(OCCCC)OCCCC UAHAMNBFDHWCPU-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- WACPXLKEEAMYCH-UHFFFAOYSA-N 4-(2-methylpropyl)pyridine Chemical compound CC(C)CC1=CC=NC=C1 WACPXLKEEAMYCH-UHFFFAOYSA-N 0.000 description 1
- HGMLMFWWXQNLLV-UHFFFAOYSA-N 4-butan-2-ylpyridine Chemical compound CCC(C)C1=CC=NC=C1 HGMLMFWWXQNLLV-UHFFFAOYSA-N 0.000 description 1
- LMRKVKPRHROQRR-UHFFFAOYSA-N 4-butylmorpholine Chemical compound CCCCN1CCOCC1 LMRKVKPRHROQRR-UHFFFAOYSA-N 0.000 description 1
- LWMDPZVQAMQFOC-UHFFFAOYSA-N 4-butylpyridine Chemical compound CCCCC1=CC=NC=C1 LWMDPZVQAMQFOC-UHFFFAOYSA-N 0.000 description 1
- HVCNXQOWACZAFN-UHFFFAOYSA-N 4-ethylmorpholine Chemical compound CCN1CCOCC1 HVCNXQOWACZAFN-UHFFFAOYSA-N 0.000 description 1
- VJXRKZJMGVSXPX-UHFFFAOYSA-N 4-ethylpyridine Chemical compound CCC1=CC=NC=C1 VJXRKZJMGVSXPX-UHFFFAOYSA-N 0.000 description 1
- DWHLWJHNQZWFBA-UHFFFAOYSA-N 4-hexylmorpholine Chemical compound CCCCCCN1CCOCC1 DWHLWJHNQZWFBA-UHFFFAOYSA-N 0.000 description 1
- AONXMESMHBIONB-UHFFFAOYSA-N 4-isocyanatobutyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCN=C=O AONXMESMHBIONB-UHFFFAOYSA-N 0.000 description 1
- IERWMZNDJGYCIA-UHFFFAOYSA-N 4-pentylmorpholine Chemical compound CCCCCN1CCOCC1 IERWMZNDJGYCIA-UHFFFAOYSA-N 0.000 description 1
- XLZMWNWNBXSZKF-UHFFFAOYSA-N 4-propan-2-ylmorpholine Chemical compound CC(C)N1CCOCC1 XLZMWNWNBXSZKF-UHFFFAOYSA-N 0.000 description 1
- FRGXNJWEDDQLFH-UHFFFAOYSA-N 4-propan-2-ylpyridine Chemical compound CC(C)C1=CC=NC=C1 FRGXNJWEDDQLFH-UHFFFAOYSA-N 0.000 description 1
- NMILGIZTAZXMTM-UHFFFAOYSA-N 4-propylmorpholine Chemical compound CCCN1CCOCC1 NMILGIZTAZXMTM-UHFFFAOYSA-N 0.000 description 1
- YSHMQTRICHYLGF-UHFFFAOYSA-N 4-tert-butylpyridine Chemical compound CC(C)(C)C1=CC=NC=C1 YSHMQTRICHYLGF-UHFFFAOYSA-N 0.000 description 1
- FLAAGXZFWZZDEH-UHFFFAOYSA-N 4-tributoxysilylbutan-1-amine Chemical compound CCCCO[Si](CCCCN)(OCCCC)OCCCC FLAAGXZFWZZDEH-UHFFFAOYSA-N 0.000 description 1
- RBVMDQYCJXEJCJ-UHFFFAOYSA-N 4-trimethoxysilylbutan-1-amine Chemical compound CO[Si](OC)(OC)CCCCN RBVMDQYCJXEJCJ-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- BZDUAONCFQNKRS-UHFFFAOYSA-N C(=O)(OCC[N+](CCCC)(C)C)CCSCCC[Si](OC)(OC)OC Chemical compound C(=O)(OCC[N+](CCCC)(C)C)CCSCCC[Si](OC)(OC)OC BZDUAONCFQNKRS-UHFFFAOYSA-N 0.000 description 1
- ULZASYJKGPKBCW-UHFFFAOYSA-N C(C)P1CC=CC=C1 Chemical compound C(C)P1CC=CC=C1 ULZASYJKGPKBCW-UHFFFAOYSA-N 0.000 description 1
- XBKKYUVCJCLKQZ-UHFFFAOYSA-N C(CCC)O[Si](CCCNCCC(OCC[N+](C)(C)C)=O)(OCCCC)OCCCC Chemical compound C(CCC)O[Si](CCCNCCC(OCC[N+](C)(C)C)=O)(OCCCC)OCCCC XBKKYUVCJCLKQZ-UHFFFAOYSA-N 0.000 description 1
- OKFLJBZKSAUCPD-UHFFFAOYSA-N C(CCC)O[Si](CCCSCCC(OCC[N+](C)(C)C)=O)(OCCCC)OCCCC Chemical compound C(CCC)O[Si](CCCSCCC(OCC[N+](C)(C)C)=O)(OCCCC)OCCCC OKFLJBZKSAUCPD-UHFFFAOYSA-N 0.000 description 1
- OZENCOXDNLIYSA-UHFFFAOYSA-N C(CCC)O[Si](OCCCC)(OCCCC)CCCCN=C=O Chemical compound C(CCC)O[Si](OCCCC)(OCCCC)CCCCN=C=O OZENCOXDNLIYSA-UHFFFAOYSA-N 0.000 description 1
- UTFVMIPWQKBHAW-UHFFFAOYSA-N C(CCC)O[Si](OCCCC)(OCCCC)CCN=C=O Chemical compound C(CCC)O[Si](OCCCC)(OCCCC)CCN=C=O UTFVMIPWQKBHAW-UHFFFAOYSA-N 0.000 description 1
- TVQBEEQDPWQLFD-UHFFFAOYSA-N CC[PH4] Chemical compound CC[PH4] TVQBEEQDPWQLFD-UHFFFAOYSA-N 0.000 description 1
- ITNRXHNVDZEWGH-UHFFFAOYSA-N COC(OC)(OC)SCCCNC(OCC[n-]1ccccc1)=O Chemical compound COC(OC)(OC)SCCCNC(OCC[n-]1ccccc1)=O ITNRXHNVDZEWGH-UHFFFAOYSA-N 0.000 description 1
- HJVSAGZDVPFECH-UHFFFAOYSA-N CO[Si](CCCNCCC(OCC[N+](C)(C)CC)=O)(OC)OC Chemical compound CO[Si](CCCNCCC(OCC[N+](C)(C)CC)=O)(OC)OC HJVSAGZDVPFECH-UHFFFAOYSA-N 0.000 description 1
- JYWDTTJAAUQQIR-UHFFFAOYSA-N CO[Si](CCCNCCC(OCC[N+](C)(C)CCCC)=O)(OC)OC Chemical compound CO[Si](CCCNCCC(OCC[N+](C)(C)CCCC)=O)(OC)OC JYWDTTJAAUQQIR-UHFFFAOYSA-N 0.000 description 1
- PZTHYFYLKIGUEH-UHFFFAOYSA-N CO[Si](CCCNCCC(OCC[N+](CCC)(C)C)=O)(OC)OC Chemical compound CO[Si](CCCNCCC(OCC[N+](CCC)(C)C)=O)(OC)OC PZTHYFYLKIGUEH-UHFFFAOYSA-N 0.000 description 1
- OQSBRCQWNCPKTK-UHFFFAOYSA-N CO[Si](CCCNCCC(OCC[N+](CCCCC)(C)C)=O)(OC)OC Chemical compound CO[Si](CCCNCCC(OCC[N+](CCCCC)(C)C)=O)(OC)OC OQSBRCQWNCPKTK-UHFFFAOYSA-N 0.000 description 1
- LGQXCOIZMXKFEJ-UHFFFAOYSA-N CO[Si](CCCNCCC(OCC[N+](CCCCCC)(C)C)=O)(OC)OC Chemical compound CO[Si](CCCNCCC(OCC[N+](CCCCCC)(C)C)=O)(OC)OC LGQXCOIZMXKFEJ-UHFFFAOYSA-N 0.000 description 1
- WWKPROHAVDYJDY-UHFFFAOYSA-N CO[Si](CCCSCCC(OCC[N+](C)(C)CC)=O)(OC)OC Chemical compound CO[Si](CCCSCCC(OCC[N+](C)(C)CC)=O)(OC)OC WWKPROHAVDYJDY-UHFFFAOYSA-N 0.000 description 1
- XHJGUMREAAGYCP-UHFFFAOYSA-N CO[Si](CCCSCCC(OCC[N+](CCC)(C)C)=O)(OC)OC Chemical compound CO[Si](CCCSCCC(OCC[N+](CCC)(C)C)=O)(OC)OC XHJGUMREAAGYCP-UHFFFAOYSA-N 0.000 description 1
- ZCBYLJVAGHGZRS-UHFFFAOYSA-N CO[Si](CCCSCCC(OCC[N+](CCCCC)(C)C)=O)(OC)OC Chemical compound CO[Si](CCCSCCC(OCC[N+](CCCCC)(C)C)=O)(OC)OC ZCBYLJVAGHGZRS-UHFFFAOYSA-N 0.000 description 1
- IRJYUXQNXOYPEJ-UHFFFAOYSA-N CO[Si](CCCSCCC(OCC[N+](CCCCCC)(C)C)=O)(OC)OC Chemical compound CO[Si](CCCSCCC(OCC[N+](CCCCCC)(C)C)=O)(OC)OC IRJYUXQNXOYPEJ-UHFFFAOYSA-N 0.000 description 1
- 229910005143 FSO2 Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- KDXKERNSBIXSRK-YFKPBYRVSA-N L-lysine Chemical compound NCCCC[C@H](N)C(O)=O KDXKERNSBIXSRK-YFKPBYRVSA-N 0.000 description 1
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 description 1
- 239000004472 Lysine Substances 0.000 description 1
- HTLZVHNRZJPSMI-UHFFFAOYSA-N N-ethylpiperidine Chemical compound CCN1CCCCC1 HTLZVHNRZJPSMI-UHFFFAOYSA-N 0.000 description 1
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- YGGRZSJFFNIUSU-UHFFFAOYSA-M [Cl-].CO[Si](CCCNCCC(OCC[N+](C)(C)C)=O)(OC)OC Chemical compound [Cl-].CO[Si](CCCNCCC(OCC[N+](C)(C)C)=O)(OC)OC YGGRZSJFFNIUSU-UHFFFAOYSA-M 0.000 description 1
- DSPIPTITBIGHOL-UHFFFAOYSA-L [Cl-].[Cl-].CC(=C)C(=O)OCC[N+](C)(C)C.CC(=C)C(=O)OCC[N+](C)(C)C Chemical compound [Cl-].[Cl-].CC(=C)C(=O)OCC[N+](C)(C)C.CC(=C)C(=O)OCC[N+](C)(C)C DSPIPTITBIGHOL-UHFFFAOYSA-L 0.000 description 1
- IIOGJFPVSYFWPP-UHFFFAOYSA-N [PH4]C Chemical compound [PH4]C IIOGJFPVSYFWPP-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- DWYMPOCYEZONEA-UHFFFAOYSA-L fluoridophosphate Chemical compound [O-]P([O-])(F)=O DWYMPOCYEZONEA-UHFFFAOYSA-L 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- QRFPECUQGPJPMV-UHFFFAOYSA-N isocyanatomethyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CN=C=O QRFPECUQGPJPMV-UHFFFAOYSA-N 0.000 description 1
- XDKCYKDMFRYIMS-UHFFFAOYSA-N isocyanatomethyl(tripropoxy)silane Chemical compound N(=C=O)C[Si](OCCC)(OCCC)OCCC XDKCYKDMFRYIMS-UHFFFAOYSA-N 0.000 description 1
- 229910001496 lithium tetrafluoroborate Inorganic materials 0.000 description 1
- QSZMZKBZAYQGRS-UHFFFAOYSA-N lithium;bis(trifluoromethylsulfonyl)azanide Chemical compound [Li+].FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F QSZMZKBZAYQGRS-UHFFFAOYSA-N 0.000 description 1
- WAVGXIXQMBSEMK-UHFFFAOYSA-N lithium;phenol Chemical compound [Li].OC1=CC=CC=C1 WAVGXIXQMBSEMK-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- AXNCVDQWNPJQOM-UHFFFAOYSA-N n-triethoxysilylpropan-1-amine Chemical compound CCCN[Si](OCC)(OCC)OCC AXNCVDQWNPJQOM-UHFFFAOYSA-N 0.000 description 1
- MMQXTQWJTVJNQL-UHFFFAOYSA-N n-trimethoxysilylpropan-1-amine Chemical compound CCCN[Si](OC)(OC)OC MMQXTQWJTVJNQL-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 229940044652 phenolsulfonate Drugs 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- VMNZSPZHEZLXCQ-UHFFFAOYSA-M potassium;4-hydroxybenzenesulfonate Chemical compound [K+].OC1=CC=C(S([O-])(=O)=O)C=C1 VMNZSPZHEZLXCQ-UHFFFAOYSA-M 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052710 silicon Chemical group 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229940087596 sodium phenolsulfonate Drugs 0.000 description 1
- 229910001495 sodium tetrafluoroborate Inorganic materials 0.000 description 1
- BLXAGSNYHSQSRC-UHFFFAOYSA-M sodium;2-hydroxybenzenesulfonate Chemical compound [Na+].OC1=CC=CC=C1S([O-])(=O)=O BLXAGSNYHSQSRC-UHFFFAOYSA-M 0.000 description 1
- JHJUUEHSAZXEEO-UHFFFAOYSA-M sodium;4-dodecylbenzenesulfonate Chemical compound [Na+].CCCCCCCCCCCCC1=CC=C(S([O-])(=O)=O)C=C1 JHJUUEHSAZXEEO-UHFFFAOYSA-M 0.000 description 1
- KVCGISUBCHHTDD-UHFFFAOYSA-M sodium;4-methylbenzenesulfonate Chemical compound [Na+].CC1=CC=C(S([O-])(=O)=O)C=C1 KVCGISUBCHHTDD-UHFFFAOYSA-M 0.000 description 1
- 125000005463 sulfonylimide group Chemical group 0.000 description 1
- JCPYBTHJHRUCGT-UHFFFAOYSA-N tributoxy(isocyanatomethyl)silane Chemical compound N(=C=O)C[Si](OCCCC)(OCCCC)OCCCC JCPYBTHJHRUCGT-UHFFFAOYSA-N 0.000 description 1
- WGOZXQULGFEOTE-UHFFFAOYSA-N tributoxysilylmethanamine Chemical compound CCCCO[Si](CN)(OCCCC)OCCCC WGOZXQULGFEOTE-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- BOTMPGMIDPRZGP-UHFFFAOYSA-N triethoxy(isocyanatomethyl)silane Chemical compound CCO[Si](OCC)(OCC)CN=C=O BOTMPGMIDPRZGP-UHFFFAOYSA-N 0.000 description 1
- ROWWCTUMLAVVQB-UHFFFAOYSA-N triethoxysilylmethanamine Chemical compound CCO[Si](CN)(OCC)OCC ROWWCTUMLAVVQB-UHFFFAOYSA-N 0.000 description 1
- ARKBFSWVHXKMSD-UHFFFAOYSA-N trimethoxysilylmethanamine Chemical compound CO[Si](CN)(OC)OC ARKBFSWVHXKMSD-UHFFFAOYSA-N 0.000 description 1
- XDFFVDDBWQREAJ-UHFFFAOYSA-M trimethyl(2-prop-2-enoyloxyethyl)azanium;bromide Chemical compound [Br-].C[N+](C)(C)CCOC(=O)C=C XDFFVDDBWQREAJ-UHFFFAOYSA-M 0.000 description 1
- IVPAUJSYKHFIOD-UHFFFAOYSA-M trimethyl(2-prop-2-enoyloxyethyl)azanium;iodide Chemical compound [I-].C[N+](C)(C)CCOC(=O)C=C IVPAUJSYKHFIOD-UHFFFAOYSA-M 0.000 description 1
- FGKCGMMQJOWMFW-UHFFFAOYSA-M trimethyl-[2-(2-methylprop-2-enoyloxy)ethyl]azanium;bromide Chemical compound [Br-].CC(=C)C(=O)OCC[N+](C)(C)C FGKCGMMQJOWMFW-UHFFFAOYSA-M 0.000 description 1
- WUUHFRRPHJEEKV-UHFFFAOYSA-N tripotassium borate Chemical compound [K+].[K+].[K+].[O-]B([O-])[O-] WUUHFRRPHJEEKV-UHFFFAOYSA-N 0.000 description 1
- OJDWSXMZWYSCDJ-UHFFFAOYSA-N tripropoxysilylmethanamine Chemical compound CCCO[Si](CN)(OCCC)OCCC OJDWSXMZWYSCDJ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/16—Anti-static materials
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/54—Quaternary phosphonium compounds
- C07F9/5407—Acyclic saturated phosphonium compounds
Definitions
- the present invention relates to a novel onium salt having a trialkoxysilylalkyl group.
- an onium salt having a trialkoxysilylalkyl group one in which a cation is a nitrogen atom or a phosphorus atom and a silicon atom bonded with an alkyl group, and an anion is bis (perfluoroalkylsulfonyl) imide is known.
- the onium salt can impart excellent antistatic properties to the fluororesin (see Patent Document 1).
- Patent Document 1 when the inventor applied the onium salt described in Patent Document 1 as an antistatic agent for an acrylic resin, the surface resistivity was 10 13 ⁇ / ⁇ or more, which was sufficient as an antistatic agent for an acrylic resin. It was found that it has no antistatic ability.
- An object of the present invention is to provide a novel onium salt having a trialkoxysilylalkyl group particularly useful as an antistatic agent for acrylic resins.
- the present inventor found an onium salt represented by the formula (1) and further used the onium salt as an antistatic agent in an acrylic resin.
- the inventors have found that antistatic properties can be imparted, and have completed the present invention. That is, the present invention provides the formula (1): Formula (1): (In the formula, Q + represents a nitrogen cation or a phosphor cation.
- R 1 to R 3 represent an alkyl group having 1 to 6 carbon atoms, and R 1 and R 2 are bonded to each other at the terminal to form a pyrrolidine ring or a piperidine ring.
- D represents CH 2 , CH (CH 3 ) or CH (CH 3 ) CH 2
- E represents NH or a sulfur atom
- m represents an integer of 0 to 3
- n represents an integer of 1 to 4.
- a ⁇ represents an anion.
- the onium salt (1) of the present invention is a useful compound because it can impart excellent antistatic properties to the acrylic resin.
- the onium salt (1) of the present invention has the formula (1): ((Where Q + Represents a nitrogen cation or a phosphorus cation.
- R 1 ⁇ R 3 Represents an alkyl group having 1 to 6 carbon atoms
- R 1 And R 2 May be bonded to each other at the terminal to form a pyrrolidine ring, piperidine ring, pyridine ring, phosphorane ring, phosphorinane ring or phospholine ring.
- R 3 Does not exist.
- R 4 Represents an alkyl group having 1 to 4 carbon atoms.
- D is CH 2 , CH (CH 3 ) Or CH (CH 3 ) CH 2 Indicates.
- E represents NH or a sulfur atom.
- m is an integer of 0 to 3
- n is an integer of 1 to 4.
- R in formula (1) 1 ⁇ R 3 Is an alkyl group having 1 to 6 carbon atoms, which may be linear or branched, and is preferably a linear alkyl group.
- R 1 And R 2 And may be bonded to each other at the terminal to form a pyrrolidine ring, piperidine ring, pyridine ring, phosphorane ring, phosphorinane ring or phospholine ring.
- R 3 Does not exist.
- R 4 Represents an alkyl group having 1 to 4 carbon atoms, preferably an alkyl group having 1 to 2 carbon atoms.
- D is CH 2 , CH (CH 3 ) Or CH (CH 3 ) CH 2 Indicates.
- E represents NH or a sulfur atom.
- m is an integer of 0 to 3, preferably 0 to 2.
- n is an integer of 1 to 4, preferably 1 to 3.
- a ⁇ represents an anion and (CF 3 SO 2 ) 2 N ⁇ , (FSO 2 ) 2 N ⁇ , BF 4 ⁇ , PF 6 ⁇ , CH 3 (CH 2 ) 10 CH 2 C 6 H 4 SO 3 ⁇ , CH 3 C 6 H 4 SO 3 ⁇ Or Cl ⁇ Is preferred.
- the onium salt (1) include N- ⁇ (3-trimethoxysilylpropyl) carbamoyloxyethyl) ⁇ -N, N, N, -trimethylammonium bis (trifluoromethanesulfonyl) imide, N- ⁇ (3-Trimethoxysilylpropyl) carbamoyloxyethyl) ⁇ -N-ethyl-N, N-dimethylammonium bis (trifluoromethanesulfonyl) imide, N- ⁇ (3-trimethoxysilylpropyl) carbamoyloxyethyl) ⁇ - N, N-dimethyl-N-propyl-ammonium bis (trifluoromethanesulfonyl) imide, N- ⁇ (3-trimethoxysilylpropyl) carbamoyloxyethyl) ⁇ -N-butyl-N, N-dimethylammonium bis ( Trifluoromethanes
- the onium salt (1) of the present invention can be produced by various methods.
- the typical method is demonstrated in the following Reaction formula 1 and Reaction formula 2.
- Q + , R 1 ⁇ R 4 , E, n and A ⁇ Is the same as above, Q is a nitrogen atom or a phosphorus atom, X ⁇ Represents a halogen ion, and M represents a metal atom.
- the onium salt (6) can be produced by an ion exchange reaction between the onium halide (4) and the alkali metal salt represented by the formula (5) (hereinafter referred to as alkali metal salt (5)).
- onium Salt (1a) can be produced.
- compound (2) includes N-methylpyrrolidine, N-methylpiperidine, N-methylmorpholine, N-ethylpyrrolidine, N-ethylpiperidine, N-ethylmorpholine, N-propylpyrrolidine, N-propyl.
- Piperidine N-propylmorpholine, N-isopropylpyrrolidine, N-isopropylpiperidine, N-isopropylmorpholine, N-butylpyrrolidine, N-butylpiperidine, N-butylmorpholine, N-pentylpyrrolidine, N-pentylpiperidine, N-pentyl Morpholine, N-hexylpyrrolidine, N-hexylpiperidine, N-hexylmorpholine, N-methyl-2-methylpyrrolidine, N-methyl-2-methylpiperidine, N-methyl-2-methylmorpholine, N-methyl-3- Methylpi Lysine, N-methyl-3-methylpiperidine, N-methyl-3-methylmorpholine, N-methyl-4-methylpiperidine, N-methyl-2-ethylpyrrolidine, N-methyl-2-propylpyrrolidine, N-methyl 2-isopropylpyrrolidine, N-methyl-2-butylpyr
- Examples of the haloalkyl alcohols (3) include 2-chloroethanol, 2-bromoethanol, 2-iodoethanol and the like.
- Examples of the alkali metal salt (5) include bis (trifluoromethanesulfonyl) imide lithium, bis (trifluoromethanesulfonyl) imide sodium, bis (trifluoromethanesulfonyl) imide potassium, lithium tetrafluoroborate, sodium tetrafluoroborate, tetrafluoro Potassium borate, lithium hexafluorophosphate, sodium hexafluorophosphate, potassium hexafluorophosphate, lithium phenol sulfonate, sodium phenol sulfonate, potassium phenol sulfonate, sodium p-toluene sulfonate, sodium p-dodecylbenzene sulfonate, etc.
- trialkoxysilylalkyl isocyanates (7) include trimethoxysilylmethyl isocyanate, trimethoxysilylethyl isocyanate, trimethoxysilylpropyl isocyanate, trimethoxysilylbutyl isocyanate, triethoxysilylmethyl isocyanate, triethoxysilylpropyl isocyanate, Triethoxysilylbutyl isocyanate, triethoxysilylbutyl isocyanate, tripropoxysilylmethyl isocyanate, tripropoxysilylethyl isocyanate, tripropoxysilylpropyl isocyanate, tripropoxysilylbutyl isocyanate, tributoxysilylmethyl isocyanate, tributoxysilylethyl isocyanate, tributoxy Cyril Pro Le isocyanate include tributoxysilyl butyl isocyanate.
- the quaternization reaction between the compound (2) and the haloalkyl alcohol (3) may or may not use a solvent.
- the solvent when using the solvent include alcohols such as methanol, ethanol and 2-propanol, acetonitrile, ethyl acetate, tetrahydrofuran, dimethylformamide and the like.
- the amount of the haloalkyl alcohol (3) used may be 0.7 mol or more, preferably 0.9 to 1.5 mol, relative to 1 mol of the compound (2).
- the amount of the alkali metal salt (5) used in the ion exchange reaction is usually 0.8 mol or more, preferably 0.9 mol to 1.2 mol, based on 1 mol of the onium halide (4).
- the amount is preferably 1 to 1.05 mol.
- the ion exchange reaction is usually performed in a solvent.
- the solvent include ketones such as acetone and methyl ethyl ketone, alcohols such as methanol, ethanol and 2-propanol, acetonitrile, ethyl acetate, tetrahydrofuran and dimethylformamide.
- the amount used is not particularly limited, but is usually 10 parts by weight or less, preferably 1 to 10 parts by weight, particularly preferably 2 to 6 parts by weight, based on 1 part by weight of onium halides (4).
- the onium halides (4) may be added after mixing the alkali metal salt (5) and the solvent.
- the reaction temperature in the ion exchange reaction is usually 10 ° C. or higher, preferably 10 to 60 ° C., particularly preferably 10 to 30 ° C.
- the solvent and the generated inorganic salt may be removed from the reaction solution.
- the reaction solution is filtered or washed with water to remove the precipitated inorganic salt, and then combined with unit operations such as concentration, filtration, extraction, etc. (6) can be isolated.
- the reaction solution is concentrated to precipitate the inorganic salt, filtered or washed with water to remove the inorganic salt, and then concentrated, filtered,
- the onium salt (6) can be isolated by appropriately combining unit operations such as extraction.
- the reaction of the obtained onium salt (6) and trialkoxysilylalkyl isocyanate (7) may or may not use a solvent.
- Examples of the solvent when using the solvent include acetone, acetonitrile, ethyl acetate, tetrahydrofuran, dichloromethane and the like.
- the amount of trialkoxysilylalkyl isocyanate (7) used may be 0.7 mol or more, preferably 0.9 to 1.5 mol, per 1 mol of onium salt (6).
- As a method for separating the onium salt (1a) from the reaction solution after completion of the reaction the same method as that for the onium salt (6) can be used.
- the onium salt (1b) can be produced by reacting the onium salt (9) with a trialkoxysilylalkyl compound represented by the formula (10) (hereinafter referred to as trialkoxysilylalkyl compound (10)).
- onium halides (8), for example, N- (2-acryloyloxyethyl) -N, N, N-trimethylammonium chloride, N- (2-acryloyloxyethyl) -N, N , N-trimethylammonium bromide, N- (2-acryloyloxyethyl) -N, N, N-trimethylammonium iodide, N- (2-methacryloyloxyethyl) -N, N, N-trimethylammonium chloride N- (2-methacryloyloxyethyl) -N, N, N-trimethylammonium chloride, N- (2-methacryloyloxyethyl) -N, N, N-trimethylammonium bromide, N- (2- (Methacryloyloxyethyl) -N, N, N-trimethylammonium iodide and the like.
- trialkoxysilylalkyl compounds (10) include trialkoxysilylalkylamines and trialkoxysilylalkylthiols.
- trialkoxysilylalkylamines include trimethoxysilylmethylamine, trimethoxysilylethylamine, trimethoxysilylpropylamine, trimethoxysilylbutylamine, triethoxysilylmethylamine, triethoxysilylpropylamine, triethoxysilylbutylamine, Triethoxysilylbutylamine, tripropoxysilylmethylamine, tripropoxysilylethylamine, tripropoxysilylpropylamine, tripropoxysilylbutylamine, tributoxysilylmethylamine, tributoxysilylethylamine, tributoxysilylpropylamine, tributoxysilylbutylamine, etc.
- trialkoxysilylalkylthiols include trimethoxysilylmethylthiol, trimethoxysilylethylthiol, trimethoxysilylpropylthiol, trimethoxysilylbutylthiol, triethoxysilylmethylthiol, triethoxysilylpropylthiol, triethoxysilyl Butylthiol, Triethoxysilylbutylthiol, Tripropoxysilylmethylthiol, Tripropoxysilylethylthiol, Tripropoxysilylpropylthiol, Tripropoxysilylbutylthiol, Tributoxysilylmethylthiol, Tributoxysilylethylthiol, Tributoxysilylpropylthiol , Tributoxysilylbutylthiol and the like.
- the amount of the alkali metal salt (5) used in the ion exchange reaction is usually 0.8 mol or more, preferably 0.9 mol to 1.2 mol, based on 1 mol of the onium halide (8).
- the amount is preferably 1 to 1.05 mol.
- the ion exchange reaction is usually performed in a solvent.
- the solvent include ketones such as acetone and methyl ethyl ketone, alcohols such as methanol, ethanol and 2-propanol, acetonitrile, ethyl acetate, tetrahydrofuran and dimethylformamide.
- the amount used is not particularly limited, but is usually 10 parts by weight or less, preferably 1 to 10 parts by weight, particularly preferably 2 to 6 parts by weight, based on 1 part by weight of the onium halides (8).
- the onium halides (8) may be added after mixing the alkali metal salt (5) and the solvent.
- the reaction temperature in the ion exchange reaction is usually 10 ° C. or higher, preferably 10 to 60 ° C., particularly preferably 10 to 30 ° C.
- the solvent and the generated inorganic salt may be removed from the reaction solution. If an inorganic salt is precipitated in the obtained reaction solution, the reaction solution is filtered or washed with water to remove the precipitated inorganic salt, and then combined with unit operations such as concentration, filtration, extraction, etc. (9) can be isolated. In addition, when the inorganic salt is not precipitated in the obtained reaction solution, the reaction solution is concentrated to precipitate the inorganic salt, filtered or washed with water to remove the inorganic salt, and then concentrated, filtered, The onium salt (9) can be isolated by appropriately combining unit operations such as extraction.
- the reaction of the obtained onium salt (9) and trialkoxysilylalkyl compound (10) may or may not use a solvent.
- the solvent when using the solvent include acetone, acetonitrile, ethyl acetate, tetrahydrofuran, dichloromethane and the like.
- the amount of trialkoxysilylalkyl compound (10) used may be 0.7 mol or more, preferably 0.9 to 1.5 mol, per 1 mol of onium salt (9).
- the same method as that for the onium salt (9) can be used.
- the onium salt (1) thus obtained is mixed with an acrylic resin monomer and an appropriate solvent (for example, ethyl acetate, toluene, etc.) to prepare a solution, and then the solution is applied to the surface of the resin. It can be used as an antistatic agent for acrylic resins by a method such as removing the solvent.
- a solution in which a photopolymerization initiator is added to a solution containing an acrylic resin monomer and an onium salt (1) is prepared, and the solution is applied to the surface of the resin and irradiated with ultraviolet rays to charge the acrylic resin. It can be used as an inhibitor, and an acrylic resin composition containing the onium salt (1) can be obtained.
- 1 H-NMR uses “AL-400” manufactured by JEOL Datum Co., Ltd., and 400 MHz using (CD 3 ) 2 CO as a solvent, except when the solvent used is described. Measured with Moreover, the surface resistance value was measured at an applied voltage of 500 V using Hiresta UP (MCP-HT450) manufactured by Mitsubishi Chemical Corporation.
- N- (2-hydroxyethyl) pyridinium bromide 522.4 g (2.56 mol), lithium bis (trifluoromethanesulfonyl) imido acid 771.7 g (2.69 mol), and ion-exchanged water 1357.8 g were added. Stir at room temperature for 2 hours.
- N- ⁇ (3-triethoxysilylpropyl) carbamoyloxyethyl) ⁇ pyridinium bis (trifluoromethanesulfonyl) imide.
- 1 H-NMR of the obtained N- ⁇ (3-triethoxysilylpropyl) carbamoyloxyethyl) ⁇ pyridinium bis (trifluoromethanesulfonyl) imide is shown below.
- N- [2- ⁇ 3- (3-trimethoxysilylpropylamino) -1-oxopropoxy ⁇ ethyl] -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide 80.8 g (yield 97.6%) was obtained.
- 1 H-NMR of the obtained N- [2- ⁇ 3- (3-trimethoxysilylpropylamino) -1-oxopropoxy ⁇ ethyl] -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide Is shown below.
- N- [2- ⁇ 3- (3-trimethoxysilylpropylthio) -2-methyl-1-oxopropoxy ⁇ ethyl] -trimethylammonium bis (trifluoromethanesulfonyl) imide 8 g (yield 96.7%) was obtained.
- N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide 1 H-NMR is shown below.
- N- (2-hydroxyethyl) pyridinium hexafluorophosphate 28.4 g (0.11 mol) was dissolved in acetonitrile 28.6 g, 3-trimethoxysilylpropyl isocyanate 23.1 g (0.11 mol), and 0.35 g (0.55 mmol) of dibutyltin dilaurate was added and reacted at room temperature for 5 hours.
- the oil layer was obtained by liquid separation, and the obtained oil layer was separated and washed twice with 100 g of ion-exchanged water.
- 1 H-NMR of the obtained tributyl (2-hydroxyethyl) phosphonium bis (trifluoromethanesulfonyl) imide is shown below.
- Application examples 2-8 instead of N- ⁇ (3-triethoxysilylpropyl) carbamoyloxyethyl) ⁇ -N, N, N, -trimethylammonium bis (trifluoromethanesulfonyl) imide of Application Example 1, the onium salts of the present invention shown in Table 1
- a test piece was prepared in the same manner as in Application Example 1 except that was used, and the surface resistance value of the adhesive of the test piece was measured in the same manner as in Application Example 1. The results are shown in Table 1.
- Comparative application example 1 Similar to Application Example 1 except that N- ⁇ (3-triethoxysilylpropyl) carbamoyloxyethyl) ⁇ -N, N, N, -trimethylammonium bis (trifluoromethanesulfonyl) imide of Application Example 1 was not used. A test piece was prepared, and the surface resistance value of the adhesive of the test piece was measured in the same manner as in Application Example 1. The results are shown in Table 1.
- the acrylic resin pressure-sensitive adhesive containing the onium salt of the present invention has a low surface resistance value.
- Application examples 9 and 10 Dipentaerythritol hexaacrylate (A-DPH: Shin-Nakamura Chemical Co., Ltd.) 0.50 g, Pentaerythritol triacrylate (A-TMN-3LM-N: Shin-Nakamura Chemical Co., Ltd.) 1.50 g, trimethylolpropane 0.50 g of triacrylate (A-TMPT: manufactured by Shin-Nakamura Chemical Co., Ltd.), 0.23 g of onium salt (1) shown in Table 2 and colloidal silica isopropyl alcohol dispersion (IPA-ST: silica solid content 30 wt%, (Made by Nissan Chemical Industries, Ltd.) 1.80 g is mixed, and 2.16 g of isopropyl alcohol and 0.15 g of 2-hydroxy-2-methylpropiophenone as a photopolymerization
- a monomer and photopolymerization agent-containing coating solution was prepared.
- the resulting coating solution was coated on a 100 ⁇ m thick polyester film using a bar coater so that the coating thickness when dried was about 5 ⁇ m.
- Acrylic resin hard coat film was prepared by irradiating ultraviolet rays from a high pressure mercury UV lamp (120 W / cm) from the coating film side under the condition of an integrated light quantity of about 400 mJ / cm 2 and curing treatment, and the obtained hard coat film The surface resistance value of was measured. The surface resistance value was 25 ⁇ 2 ° C., and the humidity was 50 ⁇ 5%. The results are shown in Table 2.
- Comparative application example 3 Hard coat films were prepared in the same manner as in Application Examples 9 and 10 except that N- (3-trimethoxysilylpropyl) pyridinium bis (trifluoromethanesulfonyl) imide was used as the onium salt. The surface resistance value of the obtained hard coat film was measured. The results are shown in Table 2. From the results in Table 2, it was found that the acrylic resin hard coat film prepared by using the hard coat liquid containing the onium salt of the present invention showed a low surface resistance value.
- the onium salt (1) of the present invention is a useful compound because it can impart excellent antistatic properties to the acrylic resin.
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Abstract
Description
しかし、本発明者が特許文献1に記載のオニウム塩をアクリル樹脂の帯電防止剤として適用したところ、その表面抵抗率は1013Ω/□以上となり、アクリル樹脂用の帯電防止剤としては十分な帯電防止能を有しないことがわかった。 As an onium salt having a trialkoxysilylalkyl group, one in which a cation is a nitrogen atom or a phosphorus atom and a silicon atom bonded with an alkyl group, and an anion is bis (perfluoroalkylsulfonyl) imide is known. . It is known that the onium salt can impart excellent antistatic properties to the fluororesin (see Patent Document 1).
However, when the inventor applied the onium salt described in Patent Document 1 as an antistatic agent for an acrylic resin, the surface resistivity was 10 13 Ω / □ or more, which was sufficient as an antistatic agent for an acrylic resin. It was found that it has no antistatic ability.
即ち本発明は、式(1):
式(1):
((式中、Q+は窒素カチオン又はリンカチオンを示す。R1~R3は炭素数1~6のアルキル基を示し、R1とR2が末端で互いに結合してピロリジン環、ピペリジン環、ピリジン環、ホスホラン環、ホスホリナン環又はホスホリン環を形成してもよい。但し、ピリジン環又はホスホリン環を形成する場合は、R3は存在しない。R4は炭素数1~4のアルキル基を示す。DはCH2、CH(CH3)又はCH(CH3)CH2を示す。EはNH又は硫黄原子を示す。mは0~3の整数、nは1~4の整数である。)で表される第四級オニウムカチオンを示す。A−はアニオンを示す。)で表わされるオニウム塩(以下、オニウム塩(1)という)に関する。 As a result of intensive studies to solve the above-mentioned problems, the present inventor found an onium salt represented by the formula (1) and further used the onium salt as an antistatic agent in an acrylic resin. The inventors have found that antistatic properties can be imparted, and have completed the present invention.
That is, the present invention provides the formula (1):
Formula (1):
(In the formula, Q + represents a nitrogen cation or a phosphor cation. R 1 to R 3 represent an alkyl group having 1 to 6 carbon atoms, and R 1 and R 2 are bonded to each other at the terminal to form a pyrrolidine ring or a piperidine ring. , A pyridine ring, a phosphorane ring, a phosphorinane ring, or a phospholine ring, provided that a pyridine ring or a phospholine ring is not present, R 3 is not present, and R 4 is an alkyl group having 1 to 4 carbon atoms. D represents CH 2 , CH (CH 3 ) or CH (CH 3 ) CH 2 , E represents NH or a sulfur atom, m represents an integer of 0 to 3, and n represents an integer of 1 to 4. ) Represents a quaternary onium cation, and A − represents an anion.) (Referred to below as onium salt (1)).
本発明のオニウム塩(1)は、式(1):
((式中、Q+は窒素カチオン又はリンカチオンを示す。R1~R3は炭素数1~6のアルキル基を示し、R1とR2が末端で互いに結合してピロリジン環、ピペリジン環、ピリジン環、ホスホラン環、ホスホリナン環又はホスホリン環を形成してもよい。但し、ピリジン環又はホスホリン環を形成する場合は、R3は存在しない。R4は炭素数1~4のアルキル基を示す。DはCH2、CH(CH3)又はCH(CH3)CH2を示す。EはNH又は硫黄原子を示す。mは0~3の整数、nは1~4の整数である。)で表される第四級オニウムカチオンを示す。A−はアニオンを示す)で表わされるオニウム塩である。
式(1)中、R1~R3は炭素数1~6のアルキル基であり、直鎖及び分枝鎖状のいずれであってもよく、好ましくは直鎖状のアルキル基である。具体的には、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基等が挙げられ、炭素数1~4の直鎖状のアルキル基が好ましく、メチル基及びエチル基が特に好ましい。また、R1とR2とが末端で互いに結合してピロリジン環、ピペリジン環、ピリジン環、ホスホラン環、ホスホリナン環又はホスホリン環を形成してもよい。但し、ピリジン環又はホスホリン環を形成する場合は、R3は存在しない。R4は炭素数1~4のアルキル基を示し、好ましくは炭素数1~2のアルキル基である。DはCH2、CH(CH3)又はCH(CH3)CH2を示す。EはNH又は硫黄原子を示す。mは0~3の整数であり、好ましくは0~2である。nは1~4の整数であり、好ましくは1~3である。A−はアニオンを示し、(CF3SO2)2N−、(FSO2)2N−、BF4 −、PF6 −、CH3(CH2)10CH2C6H4SO3 −、CH3C6H4SO3 −又はCl−が好ましい。
オニウム塩(1)の具体例としては、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}}−N,N,N,−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−エチル−N,N−ジメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N,N−ジメチル−N−プロピル−アンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−ブチル−N,N−ジメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N,N−ジメチル−N−ペンチル−アンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−ヘキシル−N,N−ジメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N,−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリプロポキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N,−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリブトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N,−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=テトラフルオロボレート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=テトラフルオロボレート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=ヘキサフルオロホスフェート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=ヘキサフルオロホスフェート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=ビスフルオロスルホニルイミド、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=ビスフルオロスルホニルイミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=p−トルエンスルホナート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=p−トルエンスルホナート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=p−ドデシルベンゼンスルホナート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=p−ドデシルベンゼンスルホナート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=クロリド、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=クロリド、
N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N−エチル−N,N−ジメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N−ジメチル−N−プロピルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N−ブチル−N,N−ジメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N−ジメチル−N−ペンチル−アンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N−ジメチル−N−ヘキシルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリエトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリプロポキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリブトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=テトラフルオロボレート、N−[2−{3−(3−トリエトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=テトラフルオロボレート、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ヘキサフルオロホスフェート、N−[2−{3−(3−トリエトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ヘキサフルオロホスフェート、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビスフルオロスルホニルイミド、N−[2−{3−(3−トリエトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビスフルオロスルホニルイミド、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=p−トルエンスルホナート、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=p−トルエンスルホナート、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=p−ドデシルベンゼンスルホナート、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=p−ドデシルベンゼンスルホナート、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=クロリド、N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=クロリド、
N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N−エチル−N,N−ジメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N−ジメチル—N−プロピルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N−ブチル−N,N−ジメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N−ジメチル−N−ペンチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N−ジメチル−N−ヘキシルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリエトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリプロポキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリブトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド、N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=テトラフルオロボレート、N−[2−{3−(3−トリエトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=テトラフルオロボレート、N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ヘキサフルオロホスフェート、N−[2−{3−(3−トリエトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=テトラフルオロボレート、N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ヘキサフルオロホスフェート、N−[2−{3−(3−トリエトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ヘキサフルオロホスフェート、N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビスフルオロスルホニルイミド、N−[2−{3−(3−トリエトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビスフルオロスルホニルイミド、N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N,−トリメチルアンモニウム=p−トルエンスルホナート、N−[2−{3−(3−トリエトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=p−トルエンスルホナート、N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N,−トリメチルアンモニウム=p−ドデシルベンゼンスルホナート、N−[2−{3−(3−トリエトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=p−ドデシルベンゼンスルホナート、N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N,−トリメチルアンモニウム=クロリド、N−[2−{3−(3−トリエトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=クロリド、
N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリプロポキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリブトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=テトラフルオロボレート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=テトラフルオロボレート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=ヘキサフルオロホスフェート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=ヘキサフルオロホスフェート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=ビスフルオロスルホニルイミド、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=ビスフルオロスルホニルイミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=p−トルエンスルホネート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=p−トルエンスルホネート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=p−ドデシルベンゼンスルホナート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=p−ドデシルベンゼンスルホナート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=クロリド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=クロリド、
N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−エチルピロリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−プロピルピロリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−ブチルピロリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−ペンチルピロリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−ヘキシルピロリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリプロポキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリブトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=テトラフルオロボレート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=テトラフルオロボレート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=ヘキサフルオロホスフェート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=ヘキサフルオロホスフェート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=ビスフルオロスルホニルイミド、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=ビスフルオロスルホニルイミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=p−トルエンスルホナート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=p−トルエンスルホナート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=p−ドデシルベンゼンスルホナート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=p−ドデシルベンゼンスルホナート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=クロリド、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピロリジニウム=クロリド、
N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−エチルピペリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−プロピルピペリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−ブチルピペリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−ペンチルピペリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−ヘキシルピペリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリプロポキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリブトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=ビス(トリフルオロメタンスルホニル)イミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=テトラフルオロボレート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=テトラフルオロボレート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=ヘキサフルオロホスフェート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=ヘキサフルオロホスフェート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=ビスフルオロスルホニルイミド、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=ビスフルオロスルホニルイミド、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=p−トルエンスルホナート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=p−トルエンスルホナート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=p−ドデシルベンゼンスルホナート、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=p−ドデシルベンゼンスルホナート、N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=クロリド、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N−メチルピペリジニウム=クロリド、
P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−トリメチルホスホニウム=ビス(トリフルオロメタンスルホニル)イミド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−エチル−P,P−ジメチルホスホニウム=ビス(トリフルオロメタンスルホニル)イミド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P,P−ジメチル−P−プロピルホスホニウム=ビス(トリフルオロメタンスルホニル)イミド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−ブチル−P,P−ジメチルホスホニウム=ビス(トリフルオロメタンスルホニル)イミド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P,P−ジメチル−P−ペンチルホスホニウム=ビス(トリフルオロメタンスルホニル)イミド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−ヘキシル−P,P−ジメチルホスホニウム=ビス(トリフルオロメタンスルホニル)イミド、P−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−トリメチルホスホニウム=ビス(トリフルオロメタンスルホニル)イミド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−トリメチルホスホニウム=テトラフルオロボレート、P−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−トリメチルホスホニウム=テトラフルオロボレート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−トリメチルホスホニウム=ヘキサフルオロホスフェート、P−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−トリメチルホスホニウム=ヘキサフルオロホスフェート、P−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−トリメチルホスホニウム=ヘキサフルオロホスフェート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−トリメチルホスホニウム=ビスフルオロスルホニルイミド、P−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−トリメチルホスホニウム=ビスフルオロスルホニルイミド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−トリメチルホスホニウム=p−トルエンスルホナート、P−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−テトラメチルホスホニウム=p−ドデシルベンゼンスルホナート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−トリメチルホスホニウム=p−ドデシルベンゼンスルホナート、P−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−トリメチルホスホニウム=クロリド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P,P,P−トリメチルホスホニウム=クロリド、
P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホラニウム=ビス(トリフルオロメタンスルホニル)イミド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホラニウム=テトラフルオロボレート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホラニウム=ヘキサフルオロホスフェート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホラニウム=ビスフルオロスルホニルイミド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホラニウム=p−トルエンスルホナート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホスホラニウム=p−ドデシルベンゼンスルホナート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホスホラニウム=クロリド、
P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリナリウム=ビス(トリフルオロメタンスルホニル)イミド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリナリウム=テトラフルオロボレート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリナリウム=ヘキサフルオロホスフェート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリナリウム=ビスフルオロスルホニルイミド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリナリウム=p−トルエンスルホナート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリナリウム=p−ドデシルベンゼンスルホナート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリナリウム=p−ドデシルベンゼンクロリド、
P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリニウム=ビス(トリフルオロメタンスルホニル)イミド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリニウム=テトラフルオロボレート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリニウム=ヘキサフルオロホスフェート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリニウム=ビスフルオロスルホニルイミド、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリニウム=p−トルエンスルホナート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリニウム=p−ドデシルベンゼンスルホナート、P−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル)}−P−メチルホスホリニウム=クロリド等が挙げられるが、本発明はこれらに限定されるものではない。
本発明のオニウム塩(1)は、種々の方法で製造することができる。その代表的な方法を下記の反応式1及び反応式2において説明する。なお、当該反応式中、Q+、R1~R4、E、n及びA−は前記と同じであり、Qは窒素原子又はリン原子、X−はハロゲンイオン、Mは金属原子を示す。
反応式1:
式(2)で表される化合物(以下、化合物(2)という)と式(3)で表されるハロアルキルアルコール類(以下、ハロアルキルアルコール類(3)という)を四級化反応させて式(4)で表されるオニウム=ハライド(以下、オニウム=ハライド類(4)という)が製造される。次にオニウム=ハライド類(4)と式(5)で表されるアルカリ金属塩類(以下、アルカリ金属塩類(5)という)とのイオン交換反応により、オニウム塩(6)が製造できる。次にオニウム=ハライド類(4)又はオニウム塩(6)と式(7)で表されるトリアルコキシシリルアルキルイソシアネート類(以下、トリアルコキシシリルアルキルイソシアネート類(7)という)を反応させることでオニウム塩(1a)が製造できる。
反応式1において、化合物(2)としては、N−メチルピロリジン、N−メチルピペリジン、N−メチルモルホリン、N−エチルピロリジン、N−エチルピペリジン、N−エチルモルホリン、N−プロピルピロリジン、N−プロピルピペリジン、N−プロピルモルホリン、N−イソプロピルピロリジン、N−イソプロピルピペリジン、N−イソプロピルモルホリン、N−ブチルピロリジン、N−ブチルピペリジン、N−ブチルモルホリン、N−ペンチルピロリジン、N−ペンチルピペリジン、N−ペンチルモルホリン、N−ヘキシルピロリジン、N−ヘキシルピペリジン、N−ヘキシルモルホリン、N−メチル−2−メチルピロリジン、N−メチル−2−メチルピペリジン、N−メチル−2−メチルモルホリン、N−メチル−3−メチルピロリジン、N−メチル−3−メチルピペリジン、N−メチル−3−メチルモルホリン、N−メチル−4−メチルピペリジン、N−メチル−2−エチルピロリジン、N−メチル−2−プロピルピロリジン、N−メチル−2−イソプロピルピロリジン、N−メチル−2−ブチルピロリジン、N−メチル−2−イソブチルピロリジン、N−メチル−2−sec−ブチルピロリジン、N−メチル−2−tert−ブチルピロリジン、
ピリジン、2−メチルピリジン、3−メチルピリジン、4−メチルピリジン、2−エチルピリジン、3−エチルピリジン、4−エチルピリジン、2−プロピルピリジン、3−プロピルピリジン、4−プロピルピリジン、2−プロピルピリジン、3−プロピルピリジン、4−プロピルピリジン、2−イソプロピルピリジン、3−イソプロピルピリジン、4−イソプロピルピリジン、2−ブチルピリジン、3−ブチルピリジン、4−ブチルピリジン、2−イソブチルピリジン、3−イソブチルピリジン、4−イソブチルピリジン、2−sec−ブチルピリジン、3−sec−ブチルピリジン、4−sec−ブチルピリジン、2−tert−ブチルピリジン、3−tert−ブチルピリジン、4−tert−ブチルピリジン、P,P,P−トリメチルホスフィン、P,P,P−トリエチルホスフィン、P,P,P−トリプロピルホスフィン、P,P,P−トリブチルホスフィン、P,P,P−トリペンチルホスフィン、P,P,P−トリヘキシルホスフィン、P−メチルホスホラン、P−エチルホスホラン、P−メチルホスホリナン、P−エチルホスホリナン、P−メチルホスホリン、P−エチルホスホリン等が挙げられる。
ハロアルキルアルコール類(3)としては、例えば、2−クロロエタノール、2−ブロモエタノール、2−ヨードエタノール等が挙げられる。
アルカリ金属塩(5)としては、ビス(トリフルオロメタンスルホニル)イミドリチウム、ビス(トリフルオロメタンスルホニル)イミドナトリウム、ビス(トリフルオロメタンスルホニル)イミドカリウム、テトラフルオロホウ酸リチウム、テトラフルオロホウ酸ナトリウム、テトラフルオロホウ酸カリウム、リチウムヘキサフルオロホスフェート、ナトリウムヘキサフルオロホスフェート、カリウムヘキサフルオロホスフェート、フェノールスルホン酸リチウム、フェノールスルホン酸ナトリウム、フェノールスルホン酸カリウム、p−トルエンスルホン酸ナトリウム、p−ドデシルベンゼンスルホン酸ナトリウム等が挙げられる。
トリアルコキシシリルアルキルイソシアネート類(7)としては、例えば、トリメトキシシリルメチルイソシアネート、トリメトキシシリルエチルイソシアネート、トリメトキシシリルプロピルイソシアネート、トリメトキシシリルブチルイソシアネート、トリエトキシシリルメチルイソシアネート、トリエトキシシリルプロピルイソシアネート、トリエトキシシリルブチルイソシアネート、トリエトキシシリルブチルイソシアネート、トリプロポキシシリルメチルイソシアネート、トリプロポキシシリルエチルイソシアネート、トリプロポキシシリルプロピルイソシアネート、トリプロポキシシリルブチルイソシアネート、トリブトキシシリルメチルイソシアネート、トリブトキシシリルエチルイソシアネート、トリブトキシシリルプロピルイソシアネート、トリブトキシシリルブチルイソシアネート等が挙げられる。
化合物(2)とハロアルキルアルコール類(3)との四級化反応は、溶媒を使用してもしなくてもよい。溶媒を使用するときの溶媒としては、メタノール、エタノール、2−プロパノール等のアルコール類、アセトニトリル、酢酸エチル、テトラヒドロフラン、ジメチルホルムアミド等が挙げられる。
ハロアルキルアルコール類(3)の使用量は、化合物(2)1モルに対して0.7モル以上であればよく、好ましくは0.9~1.5モルである。
イオン交換反応におけるアルカリ金属塩(5)の使用量は、オニウム=ハライド類(4)1モルに対して、通常0.8モル以上、好ましくは0.9モル~1.2モルであり、より好ましくは1~1.05モルである。
イオン交換反応は通常溶媒中で行われる。溶媒としては、アセトン、メチルエチルケトン等のケトン類、メタノール、エタノール、2−プロパノール等のアルコール類、アセトニトリル、酢酸エチル、テトラヒドロフラン、ジメチルホルムアミド等が挙げられる。使用量は特に制限はないが、オニウム=ハライド類(4)1重量部に対して通常10重量部以下、好ましくは1~10重量部であり、特に好ましくは2~6重量部である。
オニウム=ハライド類(4)、アルカリ金属塩(5)及び溶媒の混合順序は特に限定されず、オニウム=ハライド類(4)と溶媒を混合した後にアルカリ金属塩(5)を添加してもよいし、アルカリ金属塩(5)と溶媒を混合した後にオニウム=ハライド類(4)を添加してもよい。
イオン交換反応における反応温度は、通常10℃以上、好ましくは10~60℃、特に好ましくは10~30℃である。
反応終了後の反応液からオニウム塩(6)を分離するには、溶媒及び生成する無機塩を反応液から除去すればよい。得られた反応液中に無機塩が析出していれば、反応液を濾過するか又は水洗して析出の無機塩を除き、次いで濃縮、濾過、抽出等の単位操作を適宜組み合わせて、オニウム塩(6)を単離することができる。また、得られた反応液中に無機塩が析出していない場合には、反応液を濃縮して無機塩を析出させ、濾過するか又は水洗して無機塩を除去した後、濃縮、濾過、抽出等の単位操作を適宜組み合わせて、オニウム塩(6)を単離することができる。
得られたオニウム塩(6)とトリアルコキシシリルアルキルイソシアネート類(7)の反応は溶媒を使用してもしなくてもよい。溶媒を使用するときの溶媒としては、アセトン、アセトニトリル、酢酸エチル、テトラヒドロフラン、ジクロロメタン等が挙げられる。
トリアルコキシシリルアルキルイソシアネート類(7)の使用量は、オニウム塩(6)1モルに対して0.7モル以上であればよく、好ましくは0.9~1.5モルである。
反応終了後の反応液からオニウム塩(1a)を分離する方法としては、オニウム塩(6)と同様の方法を用いることができる。
反応式2:
式(8)で表されるオニウム=ハライド類(以下、オニウム=ハライド類(8)という)とアルカリ金属塩(5)とのイオン交換反応により、オニウム塩(以下、オニウム塩(9)という)が製造できる。次にオニウム塩(9)と式(10)で表されるトリアルコキシシリルアルキル化合物(以下、トリアルコキシシリルアルキル化合物(10)という)を反応させることでオニウム塩(1b)が製造できる。
反応式2において、オニウム=ハライド類(8)としては、例えばN−(2−アクリロイルオキシエチル)−N,N,N−トリメチルアンモニウム=クロリド、N−(2−アクリロイルオキシエチル)−N,N,N−トリメチルアンモニウム=ブロミド、N−(2−アクリロイルオキシエチル)−N,N,N−トリメチルアンモニウム=ヨージド、N−(2−メタクロイルオキシエチル)−N,N,N−トリメチルアンモニウム=クロリド、N−(2−メタクロイルオキシエチル)−N,N,N−トリメチルアンモニウム=クロリド、N−(2−メタクロイルオキシエチル)−N,N,N−トリメチルアンモニウム=ブロマイド、N−(2−メタクロイルオキシエチル)−N,N,N−トリメチルアンモニウム=ヨージド等が挙げられる。
トリアルコキシシリルアルキル化合物(10)としては、トリアルコキシシリルアルキルアミン類及びトリアルコキシシリルアルキルチオール類が挙げられる。トリアルコキシシリルアルキルアミン類としては、例えば、トリメトキシシリルメチルアミン、トリメトキシシリルエチルアミン、トリメトキシシリルプロピルアミン、トリメトキシシリルブチルアミン、トリエトキシシリルメチルアミン、トリエトキシシリルプロピルアミン、トリエトキシシリルブチルアミン、トリエトキシシリルブチルアミン、トリプロポキシシリルメチルアミン、トリプロポキシシリルエチルアミン、トリプロポキシシリルプロピルアミン、トリプロポキシシリルブチルアミン、トリブトキシシリルメチルアミン、トリブトキシシリルエチルアミン、トリブトキシシリルプロピルアミン、トリブトキシシリルブチルアミン等が挙げられる。
トリアルコキシシリルアルキルチオール類としては、例えば、トリメトキシシリルメチルチオール、トリメトキシシリルエチルチオール、トリメトキシシリルプロピルチオール、トリメトキシシリルブチルチオール、トリエトキシシリルメチルチオール、トリエトキシシリルプロピルチオール、トリエトキシシリルブチルチオール、トリエトキシシリルブチルチオール、トリプロポキシシリルメチルチオール、トリプロポキシシリルエチルチオール、トリプロポキシシリルプロピルチオール、トリプロポキシシリルブチルチオール、トリブトキシシリルメチルチオール、トリブトキシシリルエチルチオール、トリブトキシシリルプロピルチオール、トリブトキシシリルブチルチオール等が挙げられる。
イオン交換反応におけるアルカリ金属塩(5)の使用量は、オニウム=ハライド類(8)1モルに対して、通常0.8モル以上、好ましくは0.9モル~1.2モルであり、より好ましくは1~1.05モルである。
イオン交換反応は通常溶媒中で行われる。溶媒としては、アセトン、メチルエチルケトン等のケトン類、メタノール、エタノール、2−プロパノール等のアルコール類、アセトニトリル、酢酸エチル、テトラヒドロフラン、ジメチルホルムアミド等が挙げられる。使用量は特に制限はないが、オニウム=ハライド類(8)1重量部に対して通常10重量部以下、好ましくは1~10重量部であり、特に好ましくは2~6重量部である。
オニウム=ハライド類(8)、アルカリ金属塩(5)及び溶媒の混合順序は特に限定されず、オニウム=ハライド類(8)と溶媒を混合した後にアルカリ金属塩(5)を添加してもよいし、アルカリ金属塩(5)と溶媒を混合した後にオニウム=ハライド類(8)を添加してもよい。
イオン交換反応における反応温度は、通常10℃以上、好ましくは10~60℃、特に好ましくは10~30℃である。
反応終了後の反応液からオニウム塩(9)を分離するには、溶媒及び生成する無機塩を反応液から除去すればよい。得られた反応液中に無機塩が析出していれば、反応液を濾過するか又は水洗して析出の無機塩を除き、次いで濃縮、濾過、抽出等の単位操作を適宜組み合わせて、オニウム塩(9)を単離することができる。また、得られた反応液中に無機塩が析出していない場合には、反応液を濃縮して無機塩を析出させ、濾過するか又は水洗して無機塩を除去した後、濃縮、濾過、抽出等の単位操作を適宜組み合わせて、オニウム塩(9)を単離することができる。
得られたオニウム塩(9)とトリアルコキシシリルアルキル化合物(10)の反応は溶媒を使用してもしなくてもよい。溶媒を使用するときの溶媒としては、アセトン、アセトニトリル、酢酸エチル、テトラヒドロフラン、ジクロロメタン等が挙げられる。
トリアルコキシシリルアルキル化合物(10)の使用量は、オニウム塩(9)1モルに対して0.7モル以上であればよく、好ましくは0.9~1.5モルである。
反応終了後の反応液からオニウム塩(1b)を分離する方法としては、オニウム塩(9)と同様の方法を用いることができる。
このようにして得られたオニウム塩(1)は、アクリル樹脂モノマー及び適当な溶媒(例えば、酢酸エチル、トルエン等)と混合して溶液を調製した後、当該溶液を樹脂の表面に塗布し、溶媒を除去する等の方法により、アクリル樹脂用帯電防止剤として使用することができる。また、アクリル樹脂モノマー及びオニウム塩(1)を含有する溶液に、光重合開始剤を添加した溶液を調製し、当該溶液を樹脂の表面に塗布して、紫外線を照射することによってアクリル樹脂用帯電防止剤として使用することができ、また、オニウム塩(1)を含有するアクリル樹脂組成物を得ることができる。 Hereinafter, the present invention will be specifically described.
The onium salt (1) of the present invention has the formula (1):
((Where Q+Represents a nitrogen cation or a phosphorus cation. R1~ R3Represents an alkyl group having 1 to 6 carbon atoms, R1And R2May be bonded to each other at the terminal to form a pyrrolidine ring, piperidine ring, pyridine ring, phosphorane ring, phosphorinane ring or phospholine ring. However, when forming a pyridine ring or a phospholine ring, R3Does not exist. R4Represents an alkyl group having 1 to 4 carbon atoms. D is CH2, CH (CH3) Or CH (CH3) CH2Indicates. E represents NH or a sulfur atom. m is an integer of 0 to 3, and n is an integer of 1 to 4. ) Represents a quaternary onium cation. A−Represents an anion).
R in formula (1)1~ R3Is an alkyl group having 1 to 6 carbon atoms, which may be linear or branched, and is preferably a linear alkyl group. Specifically, for example, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group and the like can be mentioned, and a linear alkyl group having 1 to 4 carbon atoms is preferred, and Particularly preferred. R1And R2And may be bonded to each other at the terminal to form a pyrrolidine ring, piperidine ring, pyridine ring, phosphorane ring, phosphorinane ring or phospholine ring. However, when forming a pyridine ring or a phospholine ring, R3Does not exist. R4Represents an alkyl group having 1 to 4 carbon atoms, preferably an alkyl group having 1 to 2 carbon atoms. D is CH2, CH (CH3) Or CH (CH3) CH2Indicates. E represents NH or a sulfur atom. m is an integer of 0 to 3, preferably 0 to 2. n is an integer of 1 to 4, preferably 1 to 3. A−Represents an anion and (CF3SO2)2N−, (FSO2)2N−, BF4 −, PF6 −, CH3(CH2)10CH2C6H4SO3 −, CH3C6H4SO3 −Or Cl−Is preferred.
Specific examples of the onium salt (1) include N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}}-N, N, N, -trimethylammonium bis (trifluoromethanesulfonyl) imide, N- { (3-Trimethoxysilylpropyl) carbamoyloxyethyl)}-N-ethyl-N, N-dimethylammonium bis (trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}- N, N-dimethyl-N-propyl-ammonium bis (trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-butyl-N, N-dimethylammonium bis ( Trifluoromethanesulfonyl) imide, N- (3-Trimethoxysilylpropyl) carbamoyloxyethyl)}-N, N-dimethyl-N-pentyl-ammonium bis (trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)} -N-hexyl-N, N-dimethylammonium bis (trifluoromethanesulfonyl) imide, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N, -trimethylammonium bis (trifluoro) Lomethanesulfonyl) imide, N-{(3-tripropoxysilylpropyl) carbamoyloxyethyl)}-N, N, N, -trimethylammonium bis (trifluoromethanesulfonyl) imide, N-{(3-tributoxysilylpropyl) ) Carba Yloxyethyl)}-N, N, N, -trimethylammonium = bis (trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N-trimethylammonium = Tetrafluoroborate, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N-trimethylammonium = tetrafluoroborate, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)} -N, N, N-trimethylammonium = hexafluorophosphate, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N-trimethylammonium = hexafluorophosphate, N-{(3- Trimethoxysilylpro Pyll) carbamoyloxyethyl)}-N, N, N-trimethylammonium = bisfluorosulfonylimide, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N-trimethylammonium = bisfluoro Sulfonylimide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N-trimethylammonium = p-toluenesulfonate, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl) } -N, N, N-trimethylammonium = p-toluenesulfonate, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N-trimethylammonium = p-dodecylbenzenesulfonate, N-{(3-triethoxy Rylpropyl) carbamoyloxyethyl)}-N, N, N-trimethylammonium = p-dodecylbenzenesulfonate, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N-trimethylammonium = Chloride, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N-trimethylammonium chloride
N- [2- {3- (3-trimethoxysilylpropylamino) -1-oxopropoxy} ethyl-N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide, N- [2- {3- (3-Trimethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N-ethyl-N, N-dimethylammonium bis (trifluoromethanesulfonyl) imide, N- [2- {3- (3-trimethoxy Silylpropylamino) -1-oxopropoxy} ethyl] -N, N-dimethyl-N-propylammonium = bis (trifluoromethanesulfonyl) imide, N- [2- {3- (3-trimethoxysilylpropylamino)- 1-oxopropoxy} ethyl] -N-butyl-N, N-dimethylammonium bis (tri Fluoromethanesulfonyl) imide, N- [2- {3- (3-trimethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N-dimethyl-N-pentyl-ammonium bis (trifluoromethanesulfonyl) Imido, N- [2- {3- (3-trimethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N-dimethyl-N-hexylammonium bis (trifluoromethanesulfonyl) imide, N- [ 2- {3- (3-triethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide, N- [2- {3- (3 -Tripropoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N- Limethylammonium bis (trifluoromethanesulfonyl) imide, N- [2- {3- (3-tributoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium bis (trifluoro) Romethanesulfonyl) imide, N- [2- {3- (3-trimethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium = tetrafluoroborate, N- [2- { 3- (3-Triethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium = tetrafluoroborate, N- [2- {3- (3-trimethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium = hex Safluorophosphate, N- [2- {3- (3-triethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium = hexafluorophosphate, N- [2- {3 -(3-Trimethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium = bisfluorosulfonylimide, N- [2- {3- (3-triethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium bisfluorosulfonylimide, N- [2- {3- (3-trimethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N , N, N-trimethylammonium = p-toluenesulfonate, N- [2- {3- (3-to Methoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium = p-toluenesulfonate, N- [2- {3- (3-trimethoxysilylpropylamino) -1-oxo Propoxy} ethyl] -N, N, N-trimethylammonium = p-dodecylbenzenesulfonate, N- [2- {3- (3-trimethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N , N-trimethylammonium = p-dodecylbenzenesulfonate, N- [2- {3- (3-trimethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium chloride, N- [2- {3- (3-trimethoxysilylpropylamino) -1-oxopropoxy} e Le] -N, N, N-trimethylammonium = chloride,
N- [2- {3- (3-trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium = bis (trifluoromethanesulfonyl) imide, N- [2- {3 -(3-Trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N-ethyl-N, N-dimethylammonium bis (trifluoromethanesulfonyl) imide, N- [2- {3- (3-tri Methoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N-dimethyl-N-propylammonium = bis (trifluoromethanesulfonyl) imide, N- [2- {3- (3-trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N-butyl-N, N-dimethylammonium bis (trifluoro Methanesulfonyl) imide, N- [2- {3- (3-trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N-dimethyl-N-pentylammonium bis (trifluoromethanesulfonyl) imide, N- [2- {3- (3-trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N-dimethyl-N-hexylammonium bis (trifluoromethanesulfonyl) imide, N- [2- {3- (3-Triethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide, N- [2- {3- (3-tri Propoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethylammo Um = bis (trifluoromethanesulfonyl) imide, N- [2- {3- (3-tributoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium = bis (trifluoromethanesulfonyl) ) Imide, N- [2- {3- (3-trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium = tetrafluoroborate, N- [2- {3- (3-Triethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium = tetrafluoroborate, N- [2- {3- (3-trimethoxysilylpropylthio) -1 -Oxopropoxy} ethyl] -N, N, N-trimethylammonium = hexafluorophosphate, N- [2- {3- (3-triethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium = tetrafluoroborate, N- [2- {3- (3- Trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium = hexafluorophosphate, N- [2- {3- (3-triethoxysilylpropylthio) -1-oxopropoxy } Ethyl] -N, N, N-trimethylammonium = hexafluorophosphate, N- [2- {3- (3-trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethyl Ammonium = bisfluorosulfonylimide, N- [2- {3- (3-triethoxysilylpropylthio) -1- Xoxopropoxy} ethyl] -N, N, N-trimethylammonium bisfluorosulfonylimide, N- [2- {3- (3-trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N, -trimethylammonium = p-toluenesulfonate, N- [2- {3- (3-triethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium = p-toluene Sulfonate, N- [2- {3- (3-trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N, -trimethylammonium = p-dodecylbenzenesulfonate, N- [2 -{3- (3-triethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethyl Ammonium = p-dodecylbenzenesulfonate, N- [2- {3- (3-trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N, -trimethylammonium chloride, N- [ 2- {3- (3-triethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium chloride,
N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)} pyridinium = bis (trifluoromethanesulfonyl) imide, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)} pyridinium = bis (trifluoromethanesulfonyl) Imido, N-{(3-tripropoxysilylpropyl) carbamoyloxyethyl)} pyridinium = bis (trifluoromethanesulfonyl) imide, N-{(3-tributoxysilylpropyl) carbamoyloxyethyl)} pyridinium = bis (trifluoromethane Sulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)} pyridinium = tetrafluoroborate, N-{(3-triethoxysilylpropyl) carbamoyl Xylethyl)} pyridinium = tetrafluoroborate, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)} pyridinium = hexafluorophosphate, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)} pyridinium = hexa Fluorophosphate, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)} pyridinium = bisfluorosulfonylimide, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)} pyridinium = bisfluorosulfonylimide, N -{(3-trimethoxysilylpropyl) carbamoyloxyethyl)} pyridinium = p-toluenesulfonate, N-{(3-triethoxysilylpropyl) carbamoyloxye )} Pyridinium = p-toluenesulfonate, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)} pyridinium = p-dodecylbenzenesulfonate, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl) } Pyridinium = p-dodecylbenzenesulfonate, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)} pyridinium chloride, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)} pyridinium chloride,
N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpyrrolidinium = bis (trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N -Ethylpyrrolidinium bis (trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-propylpyrrolidinium bis (trifluoromethanesulfonyl) imide, N-{( 3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-butylpyrrolidinium = bis (trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-pentylpyrrolidi Ni-bis Trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-hexylpyrrolidinium bis (trifluoromethanesulfonyl) imide, N-{(3-triethoxysilylpropyl) carbamoyl Oxyethyl)}-N-methylpyrrolidinium = bis (trifluoromethanesulfonyl) imide, N-{(3-tripropoxysilylpropyl) carbamoyloxyethyl)}-N-methylpyrrolidinium = bis (trifluoromethanesulfonyl) Imido, N-{(3-tributoxysilylpropyl) carbamoyloxyethyl)}-N-methylpyrrolidinium = bis (trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl )}-N-methylpyrrolidinium = tetrafluoroborate, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpyrrolidinium = tetrafluoroborate, N-{(3-trimethoxy Silylpropyl) carbamoyloxyethyl)}-N-methylpyrrolidinium = hexafluorophosphate, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpyrrolidinium = hexafluorophosphate, N- {(3-Trimethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpyrrolidinium = bisfluorosulfonylimide, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpyrrolidinium = Bisfluorosulfoni Luimide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpyrrolidinium = p-toluenesulfonate, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N -Methylpyrrolidinium = p-toluenesulfonate, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpyrrolidinium = p-dodecylbenzenesulfonate, N-{(3-tri Ethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpyrrolidinium = p-dodecylbenzenesulfonate, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpyrrolidinium chloride N-{(3-triethoxysilylpropyl) carba Yl oxy-ethyl)} - N-methyl-pyrrolidinium = chloride,
N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpiperidinium = bis (trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N -Ethylpiperidinium bis (trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-propylpiperidinium bis (trifluoromethanesulfonyl) imide, N-{( 3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-butylpiperidinium = bis (trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-pentylpiperidi Ni-bis Trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-hexylpiperidinium = bis (trifluoromethanesulfonyl) imide, N-{(3-triethoxysilylpropyl) carbamoyl Oxyethyl)}-N-methylpiperidinium = bis (trifluoromethanesulfonyl) imide, N-{(3-tripropoxysilylpropyl) carbamoyloxyethyl)}-N-methylpiperidinium = bis (trifluoromethanesulfonyl) Imido, N-{(3-tributoxysilylpropyl) carbamoyloxyethyl)}-N-methylpiperidinium = bis (trifluoromethanesulfonyl) imide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl )}-N-methylpiperidinium = tetrafluoroborate, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpiperidinium = tetrafluoroborate, N-{(3-trimethoxy Silylpropyl) carbamoyloxyethyl)}-N-methylpiperidinium = hexafluorophosphate, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpiperidinium = hexafluorophosphate, N- {(3-Trimethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpiperidinium = bisfluorosulfonylimide, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpiperidinium = Bisfluorosulfoni Luimide, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpiperidinium = p-toluenesulfonate, N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N -Methylpiperidinium = p-toluenesulfonate, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpiperidinium = p-dodecylbenzenesulfonate, N-{(3-tri Ethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpiperidinium = p-dodecylbenzenesulfonate, N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-N-methylpiperidinium chloride N-{(3-triethoxysilylpropyl) carba Yl oxy-ethyl)} - N-methyl-piperidinium = chloride,
P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P, P, P-trimethylphosphonium = bis (trifluoromethanesulfonyl) imide, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)} -P-ethyl-P, P-dimethylphosphonium bis (trifluoromethanesulfonyl) imide, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P, P-dimethyl-P-propylphosphonium bis ( Trifluoromethanesulfonyl) imide, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P-butyl-P, P-dimethylphosphonium bis (trifluoromethanesulfonyl) imide, P-{(3-trimethoxy Silylpropyl) cal Moyloxyethyl)}-P, P-dimethyl-P-pentylphosphonium = bis (trifluoromethanesulfonyl) imide, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P-hexyl-P, P- Dimethylphosphonium = bis (trifluoromethanesulfonyl) imide, P-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-P, P, P-trimethylphosphonium = bis (trifluoromethanesulfonyl) imide, P-{(3 -Trimethoxysilylpropyl) carbamoyloxyethyl)}-P, P, P-trimethylphosphonium = tetrafluoroborate, P-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-P, P, P-trimethylphosphonium = Tetrafu Oroborate, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P, P, P-trimethylphosphonium = hexafluorophosphate, P-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-P , P, P-trimethylphosphonium = hexafluorophosphate, P-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-P, P, P-trimethylphosphonium = hexafluorophosphate, P-{(3-trimethoxy Silylpropyl) carbamoyloxyethyl)}-P, P, P-trimethylphosphonium = bisfluorosulfonylimide, P-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-P, P, P-trimethylphosphonium = bisfur Orosulfonylimide, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P, P, P-trimethylphosphonium = p-toluenesulfonate, P-{(3-triethoxysilylpropyl) carbamoyloxyethyl )}-P, P, P-tetramethylphosphonium = p-dodecylbenzenesulfonate, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P, P, P-trimethylphosphonium = p-dodecylbenzene Sulfonate, P-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-P, P, P-trimethylphosphonium chloride, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P, P, P-trimethylphosphonium chloride
P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P-methylphosphoranium = bis (trifluoromethanesulfonyl) imide, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P -Methylphosphoranium = tetrafluoroborate, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P-methylphosphoranium = hexafluorophosphate, P-{(3-trimethoxysilylpropyl) carbamoyl Oxyethyl)}-P-methylphosphoranium = bisfluorosulfonylimide, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P-methylphosphoranium = p-toluenesulfonate, P- { (3-Trimethoxysilylop Pills) carbamoyloxy-ethyl)} - P- methyl Hosuhosu Hora hexafluorophosphate = p-dodecylbenzene sulfonate, P - {(3- trimethoxysilylpropyl) carbamoyloxy-ethyl)} - P- methyl Hosuhosu Hora hexafluorophosphate = chloride,
P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P-methylphospholinarium bis (trifluoromethanesulfonyl) imide, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P -Methylphospholinarium = tetrafluoroborate, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P-methylphospholinarium = hexafluorophosphate, P-{(3-trimethoxysilylpropyl) carbamoyl Oxyethyl)}-P-methylphospholinarium = bisfluorosulfonylimide, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P-methylphospholinarium = p-toluenesulfonate, P- { (3-trimetoki Silylpropyl) carbamoyloxyethyl)}-P-methylphospholinarium = p-dodecylbenzenesulfonate, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P-methylphospholinarium = p-dodecyl Benzene chloride,
P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P-methylphosphorinium bis (trifluoromethanesulfonyl) imide, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P -Methylphosphorinium = tetrafluoroborate, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P-methylphosphorinium = hexafluorophosphate, P-{(3-trimethoxysilylpropyl) carbamoyl Oxyethyl)}-P-methylphosphorinium = bisfluorosulfonylimide, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P-methylphosphorinium = p-toluenesulfonate, P- { (3-Trimethoxysilylop Pill) carbamoyloxyethyl)}-P-methylphosphorinium = p-dodecylbenzenesulfonate, P-{(3-trimethoxysilylpropyl) carbamoyloxyethyl)}-P-methylphosphorinium chloride, and the like. However, the present invention is not limited to these.
The onium salt (1) of the present invention can be produced by various methods. The typical method is demonstrated in the following Reaction formula 1 and Reaction formula 2. In the reaction formula, Q+, R1~ R4, E, n and A−Is the same as above, Q is a nitrogen atom or a phosphorus atom, X−Represents a halogen ion, and M represents a metal atom.
Reaction formula 1:
A compound represented by formula (2) (hereinafter referred to as compound (2)) and a haloalkyl alcohol represented by formula (3) (hereinafter referred to as haloalkyl alcohol (3)) are subjected to a quaternization reaction to form the formula ( 4) is produced (hereinafter referred to as onium = halides (4)). Next, the onium salt (6) can be produced by an ion exchange reaction between the onium halide (4) and the alkali metal salt represented by the formula (5) (hereinafter referred to as alkali metal salt (5)). Next, by reacting onium = halides (4) or onium salt (6) with trialkoxysilylalkyl isocyanate represented by formula (7) (hereinafter referred to as trialkoxysilylalkyl isocyanate (7)), onium Salt (1a) can be produced.
In Reaction Scheme 1, compound (2) includes N-methylpyrrolidine, N-methylpiperidine, N-methylmorpholine, N-ethylpyrrolidine, N-ethylpiperidine, N-ethylmorpholine, N-propylpyrrolidine, N-propyl. Piperidine, N-propylmorpholine, N-isopropylpyrrolidine, N-isopropylpiperidine, N-isopropylmorpholine, N-butylpyrrolidine, N-butylpiperidine, N-butylmorpholine, N-pentylpyrrolidine, N-pentylpiperidine, N-pentyl Morpholine, N-hexylpyrrolidine, N-hexylpiperidine, N-hexylmorpholine, N-methyl-2-methylpyrrolidine, N-methyl-2-methylpiperidine, N-methyl-2-methylmorpholine, N-methyl-3- Methylpi Lysine, N-methyl-3-methylpiperidine, N-methyl-3-methylmorpholine, N-methyl-4-methylpiperidine, N-methyl-2-ethylpyrrolidine, N-methyl-2-propylpyrrolidine, N-methyl 2-isopropylpyrrolidine, N-methyl-2-butylpyrrolidine, N-methyl-2-isobutylpyrrolidine, N-methyl-2-sec-butylpyrrolidine, N-methyl-2-tert-butylpyrrolidine,
Pyridine, 2-methylpyridine, 3-methylpyridine, 4-methylpyridine, 2-ethylpyridine, 3-ethylpyridine, 4-ethylpyridine, 2-propylpyridine, 3-propylpyridine, 4-propylpyridine, 2-propyl Pyridine, 3-propylpyridine, 4-propylpyridine, 2-isopropylpyridine, 3-isopropylpyridine, 4-isopropylpyridine, 2-butylpyridine, 3-butylpyridine, 4-butylpyridine, 2-isobutylpyridine, 3-isobutyl Pyridine, 4-isobutylpyridine, 2-sec-butylpyridine, 3-sec-butylpyridine, 4-sec-butylpyridine, 2-tert-butylpyridine, 3-tert-butylpyridine, 4-tert-butylpyridine, P , P, P-trimmer Ruphosphine, P, P, P-triethylphosphine, P, P, P-tripropylphosphine, P, P, P-tributylphosphine, P, P, P-tripentylphosphine, P, P, P-trihexylphosphine , P-methylphosphorane, P-ethylphosphorane, P-methylphosphorinane, P-ethylphosphorinane, P-methylphosphorin, P-ethylphosphorin and the like.
Examples of the haloalkyl alcohols (3) include 2-chloroethanol, 2-bromoethanol, 2-iodoethanol and the like.
Examples of the alkali metal salt (5) include bis (trifluoromethanesulfonyl) imide lithium, bis (trifluoromethanesulfonyl) imide sodium, bis (trifluoromethanesulfonyl) imide potassium, lithium tetrafluoroborate, sodium tetrafluoroborate, tetrafluoro Potassium borate, lithium hexafluorophosphate, sodium hexafluorophosphate, potassium hexafluorophosphate, lithium phenol sulfonate, sodium phenol sulfonate, potassium phenol sulfonate, sodium p-toluene sulfonate, sodium p-dodecylbenzene sulfonate, etc. Can be mentioned.
Examples of trialkoxysilylalkyl isocyanates (7) include trimethoxysilylmethyl isocyanate, trimethoxysilylethyl isocyanate, trimethoxysilylpropyl isocyanate, trimethoxysilylbutyl isocyanate, triethoxysilylmethyl isocyanate, triethoxysilylpropyl isocyanate, Triethoxysilylbutyl isocyanate, triethoxysilylbutyl isocyanate, tripropoxysilylmethyl isocyanate, tripropoxysilylethyl isocyanate, tripropoxysilylpropyl isocyanate, tripropoxysilylbutyl isocyanate, tributoxysilylmethyl isocyanate, tributoxysilylethyl isocyanate, tributoxy Cyril Pro Le isocyanate include tributoxysilyl butyl isocyanate.
The quaternization reaction between the compound (2) and the haloalkyl alcohol (3) may or may not use a solvent. Examples of the solvent when using the solvent include alcohols such as methanol, ethanol and 2-propanol, acetonitrile, ethyl acetate, tetrahydrofuran, dimethylformamide and the like.
The amount of the haloalkyl alcohol (3) used may be 0.7 mol or more, preferably 0.9 to 1.5 mol, relative to 1 mol of the compound (2).
The amount of the alkali metal salt (5) used in the ion exchange reaction is usually 0.8 mol or more, preferably 0.9 mol to 1.2 mol, based on 1 mol of the onium halide (4). The amount is preferably 1 to 1.05 mol.
The ion exchange reaction is usually performed in a solvent. Examples of the solvent include ketones such as acetone and methyl ethyl ketone, alcohols such as methanol, ethanol and 2-propanol, acetonitrile, ethyl acetate, tetrahydrofuran and dimethylformamide. The amount used is not particularly limited, but is usually 10 parts by weight or less, preferably 1 to 10 parts by weight, particularly preferably 2 to 6 parts by weight, based on 1 part by weight of onium halides (4).
The order of mixing the onium = halides (4), the alkali metal salt (5) and the solvent is not particularly limited, and the alkali metal salt (5) may be added after mixing the onium = halides (4) and the solvent. The onium halides (4) may be added after mixing the alkali metal salt (5) and the solvent.
The reaction temperature in the ion exchange reaction is usually 10 ° C. or higher, preferably 10 to 60 ° C., particularly preferably 10 to 30 ° C.
In order to separate the onium salt (6) from the reaction solution after completion of the reaction, the solvent and the generated inorganic salt may be removed from the reaction solution. If an inorganic salt is precipitated in the obtained reaction solution, the reaction solution is filtered or washed with water to remove the precipitated inorganic salt, and then combined with unit operations such as concentration, filtration, extraction, etc. (6) can be isolated. In addition, when the inorganic salt is not precipitated in the obtained reaction solution, the reaction solution is concentrated to precipitate the inorganic salt, filtered or washed with water to remove the inorganic salt, and then concentrated, filtered, The onium salt (6) can be isolated by appropriately combining unit operations such as extraction.
The reaction of the obtained onium salt (6) and trialkoxysilylalkyl isocyanate (7) may or may not use a solvent. Examples of the solvent when using the solvent include acetone, acetonitrile, ethyl acetate, tetrahydrofuran, dichloromethane and the like.
The amount of trialkoxysilylalkyl isocyanate (7) used may be 0.7 mol or more, preferably 0.9 to 1.5 mol, per 1 mol of onium salt (6).
As a method for separating the onium salt (1a) from the reaction solution after completion of the reaction, the same method as that for the onium salt (6) can be used.
Reaction formula 2:
An onium salt (hereinafter referred to as onium salt (9)) is obtained by an ion exchange reaction between onium = halides represented by formula (8) (hereinafter referred to as onium = halides (8)) and alkali metal salt (5). Can be manufactured. Next, the onium salt (1b) can be produced by reacting the onium salt (9) with a trialkoxysilylalkyl compound represented by the formula (10) (hereinafter referred to as trialkoxysilylalkyl compound (10)).
In Reaction Formula 2, as onium = halides (8), for example, N- (2-acryloyloxyethyl) -N, N, N-trimethylammonium chloride, N- (2-acryloyloxyethyl) -N, N , N-trimethylammonium bromide, N- (2-acryloyloxyethyl) -N, N, N-trimethylammonium iodide, N- (2-methacryloyloxyethyl) -N, N, N-trimethylammonium chloride N- (2-methacryloyloxyethyl) -N, N, N-trimethylammonium chloride, N- (2-methacryloyloxyethyl) -N, N, N-trimethylammonium bromide, N- (2- (Methacryloyloxyethyl) -N, N, N-trimethylammonium iodide and the like.
Examples of trialkoxysilylalkyl compounds (10) include trialkoxysilylalkylamines and trialkoxysilylalkylthiols. Examples of trialkoxysilylalkylamines include trimethoxysilylmethylamine, trimethoxysilylethylamine, trimethoxysilylpropylamine, trimethoxysilylbutylamine, triethoxysilylmethylamine, triethoxysilylpropylamine, triethoxysilylbutylamine, Triethoxysilylbutylamine, tripropoxysilylmethylamine, tripropoxysilylethylamine, tripropoxysilylpropylamine, tripropoxysilylbutylamine, tributoxysilylmethylamine, tributoxysilylethylamine, tributoxysilylpropylamine, tributoxysilylbutylamine, etc. Can be mentioned.
Examples of trialkoxysilylalkylthiols include trimethoxysilylmethylthiol, trimethoxysilylethylthiol, trimethoxysilylpropylthiol, trimethoxysilylbutylthiol, triethoxysilylmethylthiol, triethoxysilylpropylthiol, triethoxysilyl Butylthiol, Triethoxysilylbutylthiol, Tripropoxysilylmethylthiol, Tripropoxysilylethylthiol, Tripropoxysilylpropylthiol, Tripropoxysilylbutylthiol, Tributoxysilylmethylthiol, Tributoxysilylethylthiol, Tributoxysilylpropylthiol , Tributoxysilylbutylthiol and the like.
The amount of the alkali metal salt (5) used in the ion exchange reaction is usually 0.8 mol or more, preferably 0.9 mol to 1.2 mol, based on 1 mol of the onium halide (8). The amount is preferably 1 to 1.05 mol.
The ion exchange reaction is usually performed in a solvent. Examples of the solvent include ketones such as acetone and methyl ethyl ketone, alcohols such as methanol, ethanol and 2-propanol, acetonitrile, ethyl acetate, tetrahydrofuran and dimethylformamide. The amount used is not particularly limited, but is usually 10 parts by weight or less, preferably 1 to 10 parts by weight, particularly preferably 2 to 6 parts by weight, based on 1 part by weight of the onium halides (8).
The order of mixing the onium = halides (8), the alkali metal salt (5) and the solvent is not particularly limited, and the alkali metal salt (5) may be added after mixing the onium = halides (8) and the solvent. The onium halides (8) may be added after mixing the alkali metal salt (5) and the solvent.
The reaction temperature in the ion exchange reaction is usually 10 ° C. or higher, preferably 10 to 60 ° C., particularly preferably 10 to 30 ° C.
In order to separate the onium salt (9) from the reaction solution after completion of the reaction, the solvent and the generated inorganic salt may be removed from the reaction solution. If an inorganic salt is precipitated in the obtained reaction solution, the reaction solution is filtered or washed with water to remove the precipitated inorganic salt, and then combined with unit operations such as concentration, filtration, extraction, etc. (9) can be isolated. In addition, when the inorganic salt is not precipitated in the obtained reaction solution, the reaction solution is concentrated to precipitate the inorganic salt, filtered or washed with water to remove the inorganic salt, and then concentrated, filtered, The onium salt (9) can be isolated by appropriately combining unit operations such as extraction.
The reaction of the obtained onium salt (9) and trialkoxysilylalkyl compound (10) may or may not use a solvent. Examples of the solvent when using the solvent include acetone, acetonitrile, ethyl acetate, tetrahydrofuran, dichloromethane and the like.
The amount of trialkoxysilylalkyl compound (10) used may be 0.7 mol or more, preferably 0.9 to 1.5 mol, per 1 mol of onium salt (9).
As a method for separating the onium salt (1b) from the reaction solution after completion of the reaction, the same method as that for the onium salt (9) can be used.
The onium salt (1) thus obtained is mixed with an acrylic resin monomer and an appropriate solvent (for example, ethyl acetate, toluene, etc.) to prepare a solution, and then the solution is applied to the surface of the resin. It can be used as an antistatic agent for acrylic resins by a method such as removing the solvent. In addition, a solution in which a photopolymerization initiator is added to a solution containing an acrylic resin monomer and an onium salt (1) is prepared, and the solution is applied to the surface of the resin and irradiated with ultraviolet rays to charge the acrylic resin. It can be used as an inhibitor, and an acrylic resin composition containing the onium salt (1) can be obtained.
実施例1
N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドの合成
反応容器に塩化コリン503.1g(3.60mol)、ビス(トリフルオロメタンスルホニル)イミド酸リチウム1086.2g(3.78mol)、イオン交換水1838.9gを加えて室温で2時間攪拌した。イオン交換水で2回洗浄した後、脱水して1−(2−ヒドロキシエチル)−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド949.2g(収率68.5%)を得た。
得られたN−(2−ヒドロキシエチル)−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド31.1g(80.9mmol)をアセトニトリル31.1gに溶解させ、3−トリエトキシシリルプロピルイソシアネート20.0g(80.9mmol)、及びジラウリン酸ジブチルスズ0.24g(0.38mmol)を加えて室温で5時間反応させた。その後、濃縮・乾燥してN−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドを43.6g(収率85.3%)得た。得られた1−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N,−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドの1H−NMRを次に示す。
1H−NMR δ(ppm):6.50−6.60(br,1H),4.59(t,2H),3.88(t,2H),3.80(q,6H),3.41(s,9H),3.05−3.15(m,2H),1.55−1.65(m,2H),1.18(t,9H),1.57(t,2H)
実施例2
N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=ビス(トリフルオロメタンスルホニル)イミドの合成
反応容器にピリジン240.7g(3.04mol)、2−ブロモエタノール450.4g(3.60mol)、アセトニトリル1035.6gを加えて80℃で24時間攪拌した。冷却してアセトニトリルで洗浄後、乾燥してN−(2−ヒドロキシエチル)ピリジニウム=ブロミド522.6g(収率84.3%)を得た。
得られたN−(2−ヒドロキシエチル)ピリジニウム=ブロミド522.4g(2.56mol)、ビス(トリフルオロメタンスルホニル)イミド酸リチウム771.7g(2.69mol)、イオン交換水1357.8gを加えて室温で2時間攪拌した。イオン交換水で2回洗浄した後、脱水してN−(2−ヒドロキシエチル)ピリジニウム=ビス(トリフルオロメタンスルホニル)イミド743.4g(収率71.8%)を得た。
得られたN−(2−ヒドロキシエチル)ピリジニウム=ビス(トリフルオロメタンスルホニル)イミド39.2g(97.0mmol)をアセトニトリル39.2gに溶解させ、3−トリエトキシシリルプロピルイソシアネート24.0g(97.0mmol)、及びジラウリン酸ジブチルスズ0.31g(0.49mmol)を加えて室温で5時間反応させた。その後、濃縮・乾燥してN−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=ビス(トリフルオロメタンスルホニル)イミドを61.0g(収率73.7%)得た。得られたN−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}ピリジニウム=ビス(トリフルオロメタンスルホニル)イミドの1H−NMRを次に示す。
1H−NMR δ(ppm):9.21(d,2H),8.82(t,1H),8.34(t,2H),8.40−8.55(br,1H),5.25(t,2H),4.69(t,2H),3.85(q,6H),3.09(q,2H),1.50−1.60(m,2H),1.21(t,9H),0.68(t,2H)
実施例3
N−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドの合成
反応容器に[2−(アクリロイロキシ)エチル]トリメチルアンモニウム=クロリド720.5g(3.72mol)、ビス(トリフルオロメタンスルホニル)イミド酸リチウム1090.1g(3.40mol)、イオン交換水995.0gを加えて室温で3時間攪拌した。イオン交換水で2回洗浄した後、脱水して[2−(アクリロイロキシ)エチル]トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド1527.0g(収率93.6%)を得た。
得られた[2−(アクリロイロキシ)エチル]トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド58.7g(133.9mmol)をアセトニトリル58.7gに溶解させ、3−トリメトキシシリルプロピルアミン24.0g(133.9mmol)を加えて室温で5時間反応させた。その後、濃縮・乾燥してN−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドを80.8g(収率97.6%)得た。得られたN−[2−{3−(3−トリメトキシシリルプロピルアミノ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドの1H−NMRを次に示す。
1H−NMR δ(ppm):4.65(t,2H),3.95(t,2H),3.51(s,9H),3.45(s,9H),2.83(t,2H),2.50−2.60(m,4H),1.45−1.55(m,2H),0.60(t,2H)
実施例4
N−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドの合成
実施例3と同様にして[2−(アクリロイロキシ)エチル]トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドを得た。
得られた[2−(アクリロイロキシ)エチル]トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド53.6g(122.3mmol)をアセトニトリル46.6gに溶解させ、3−トリメトキシシリルプロパンチオール24.0g(122.3mmol)を加えて室温で5時間反応させた。その後、濃縮・乾燥してN−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドを74.9g(収率96.4%)得た。得られたN−[2−{3−(3−トリメトキシシリルプロピルチオ)−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドの1H−NMRを次に示す。
1H−NMR δ(ppm):4.68(t,2H),3.95(t,2H),3.51(s,9H),3.45(s,9H),2.75−2.80(m,2H),2.65−2.75(m,2H),2.55(t,2H),1.60−1.70(m,2H),0.70(t,2H)
実施例5
N−[2−{3−(3−トリメトキシシリルプロピルチオ)−2−メチル−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドの合成
反応容器にメタクロイルコリン=クロリド798.2g(3.84mol)、ビス(トリフルオロメタンスルホニル)イミド酸リチウム1125.8g(3.92mol)、イオン交換水2141.4gを加えて室温で3時間攪拌した。イオン交換水で2回洗浄した後、脱水してメタクロイルコリン=ビス(トリフルオロメタンスルホニル)イミド1703.5g(収率96.3%)を得た。
得られたメタクロイルコリン=ビス(トリフルオロメタンスルホニル)イミド55.3g(122.3mmol)をアセトニトリル47.7gに溶解させ、3−トリメトキシシリルプロパンチオール24.1g(122.3mmol)を加えて室温で5時間反応させた。その後、濃縮・乾燥してN−[2−{3−(3−トリメトキシシリルプロピルチオ)−2−メチル−1−オキソプロポキシ}エチル]−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドを76.8g(収率96.7%)得た。得られたN−[2−{3−(3−トリメトキシシリルプロピルチオ)−2−メチル−1−オキソプロポキシ}エチル]−N,N,N−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドの1H−NMRを次に示す。
1H−NMR δ(ppm):4.69(t,2H),3.98(t,2H),3.53(s,9H),3.46(s,9H),2.75−2.85(m,2H),2.70−2.80(m,1H),2.50−2.60(t,2H),1.60−1.70(m,2H),1.22(d,3H),0.80(t,2H)
実施例6
N−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル}ピリジニウム=ヘキサフルオロホスフェートの合成
実施例2に記載された方法で合成したN−(2−ヒドロキシエチル)ピリジニウム=ブロマイド75.9g(0.37mol)、カリウムヘキサフルオロホスフェート69.9g(0.38mol)、メタノール45.6g、アセトニトリル182.4gを加えて室温で24時間攪拌した。析出した固体を濾別し、濃縮した。析出した固体を濾別した後、カリウムヘキサフルオロホスフェート68.8g(0.37mol)を加えて室温で4時間攪拌した。固体を濾別し、濃縮・乾燥することでN−(2−ヒドロキシエチル)ピリジニウム=ヘキサフルオロホスフェート66.2g(収率72.7%)を得た。
得られたN−(2−ヒドロキシエチル)ピリジニウム=ヘキサフルオロホスフェート28.4g(0.11mol)をアセトニトリル28.6gに溶解させ、3−トリメトキシシリルプロピルイソシアネート23.1g(0.11mol)、及びジラウリン酸ジブチルスズ0.35g(0.55mmol)を加えて室温で5時間反応させた。その後、濃縮して、トルエン27.3gで洗浄した後、乾燥することでN−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル}ピリジニウム=ヘキサフルオロホスフェートを44.8g(収率89.6%)得た。得られたN−{(3−トリメトキシシリルプロピル)カルバモイルオキシエチル}ピリジニウム=ヘキサフルオロホスフェートの1H−NMRを次に示す。
1H−NMR δ(ppm):9.18(d,2H),8.82(t,1H),8.32(t,2H),6.45−6.55(br,1H),5.13(t,2H),4.69(t,2H),3.57(s,9H),3.06(q,2H),1.50−1.65(m,2H),1.61(t,2H)
実施例7
P−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル}−P,P,P−トリブチルホスホニウム=ビス(トリフルオロメタンスルホニル)イミドの合成
反応容器に2−ブロモエタノール129.7g(1.04mol)をとり、80℃に加熱した後、攪拌しながらトリブチルホスフィン200.0g(0.99mol)を1時間かけて滴下し、80℃で一晩攪拌を続けた。得られた反応液を室温まで冷却し、ヘキサン200mlで2回洗浄を行った。洗浄後の反応液にイオン交換水100g、活性炭(フタムラ化学製活性炭太閤Y)10gを加えて50℃で1時間攪拌を行ったあと、活性炭をろ過で除いて、トリブチル(2−ヒドロキシエチル)ホスホニウム=ブロミドの水溶液を得た。
得られた水溶液に76.1%のビス(トリフルオロメタンスルホニル)イミド酸リチウム水溶液447.50g(1.19mol)を加えて室温で2時間攪拌を行った。得られた反応液を静置すると2層に分離したため、オイル層を分液によって取得し、得られたオイル層をイオン交換水100gで2回分液洗浄した。得られたオイル層を50℃で濃縮・乾燥し、トリブチル(2−ヒドロキシエチル)ホスホニウム=ビス(トリフルオロメタンスルホニル)イミド287.5g(収率55.1%)を得た。得られたトリブチル(2−ヒドロキシエチル)ホスホニウム=ビス(トリフルオロメタンスルホニル)イミドの1H−NMRを次に示す。
1H−NMR(CDCl3)δ(ppm):4.00(td,2H),3.29(t,1H),2.42(m,2H),2.16(m,6H),1.51(m,12H),0.97(t,9H)
反応容器に、トリブチル(2−ヒドロキシエチル)ホスホニウム=ビス(トリフルオロメタンスルホニル)イミド50.0g(0.09mol)、アセトニトリル50.0g及びジラウリン酸ジブチルスズ0.03g(0.05mmol)をとり、室温下で攪拌をしながら、3−トリエトキシシリルプロピルイソシアネート23.5g(0.09mol)を滴下し後、室温下で5時間反応させた。得られた反応液をヘキサン150mLで洗浄し、得られた反応液を50℃で濃縮・乾燥させ、P−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル}−P,P,P−トリブチルホスホニウム=ビス(トリフルオロメタンスルホニル)イミド69.6g(収率94.8%)を得た。得られたP−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル}−P,P,P−トリブチルホスホニウム=ビス(トリフルオロメタンスルホニル)イミドの1H−NMRを次に示す。
1H−NMR(CDCl3)δ(ppm):5.54(t,1H),4.39(td,2H),3.82(q,6H),3.16(q,2H),2.58(m,2H),2.18(m,6H),1.62(m,2H),1.51(m,12H),1.22(m,9H),0.97(t,9H),0.61(t,2H)
実施例8
N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル}}−N,N,N−トリメチルアンモニウム=クロリドの合成
反応容器に、塩化コリン5.01g(30mmol)、アセトニトリル10.0g、ジラウリン酸ジブチルスズ0.01g(0.02mmol)及び3−トリエトキシシリルプロピルイソシアネート8.88g(30mmol)を仕込み、窒素雰囲気下、80℃で14時間撹拌した。得られた反応液を濃縮・乾燥させることにより、N−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル}}−N,N,N−トリメチルアンモニウム=クロリド13.68g(収率98.7%)を得た。得られたN−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル}}−N,N,N−トリメチルアンモニウム=クロリドの1H−NMRを次に示す。
1H−NMR(DMSO−d6)δ(ppm):7.55−7.40(1H,brs),4.45−4.30(2H,brs),3.73(q,6H),3.68−3.55(brt,2H),3.14(s,9H),3.00−2.90(brt,2H),1.48−1.40(m,2H,),0.52(t,2H)
応用例1
綜研化学株式会社製のアクリル樹脂系粘着剤SKダイン909A 100重量部をアクリル樹脂として用い、これに実施例1で得たN−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N,−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミド5重量部、及び希釈剤として酢酸エチル100重量部を加えて溶解し、コート液を調整した。このコート液をポリエステルフィルム上にバーコーターを用いて粘着剤の乾燥時の厚みが約10μmになるようにコートし、80℃で3分間加熱・乾燥させて試験片を作成した。得られた試験片を25℃、40%RHの雰囲気中に2時間保持させた後、25℃、40%RHの雰囲気中で試験片の粘着剤の表面抵抗値を測定した。その結果を表1に示す。
応用例2~8
応用例1のN−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N,−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドの代わりに表1に示す本発明のオニウム塩を用いた以外は応用例1と同様にして試験片を作成し、かかる試験片の粘着剤の表面抵抗値を応用例1と同様にして測定した。それらの結果を表1に示す。
比較応用例1
応用例1のN−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N,−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドを用いなかった場合以外は応用例1と同様にして試験片を作成し、かかる試験片の粘着剤の表面抵抗値を応用例1と同様にして測定した。その結果を表1に示す。
比較応用例2
応用例1のN−{(3−トリエトキシシリルプロピル)カルバモイルオキシエチル)}−N,N,N,−トリメチルアンモニウム=ビス(トリフルオロメタンスルホニル)イミドの代わりに特開2010−248165号公報に記載された方法で合成したN−(3−トリメトキシシリルプロピル)ピリジニウム=ビス(トリフルオロメタンスルホニル)イミドを用いた場合以外は応用例1と同様にして試験片を作成し、かかる試験片の粘着剤の表面抵抗値を応用例1と同様にして測定した。その結果を表1に示す。
応用例9及び10
ジペンタエリスリトールヘキサアクリレート(A−DPH:新中村化学工業株式会社製)0.50g、ペンタエリスリトールトリアクリレート(A−TMN−3LM−N:新中村化学工業株式会社製)1.50g、トリメチロールプロパントリアクリレート(A−TMPT:新中村化学工業株式会社製)0.50g、表2に示すオニウム塩(1)0.23g及びコロイダルシリカのイソプロピルアルコール分散液(IPA−ST:シリカ固形分30wt%、日産化学工業株式会社製)1.80gを混合し、得られた混合液にイソプロピルアルコール2.16g及び光重合開始剤として2−ヒドロキシー2−メチルプロピオフェノン0.15gを混合することによってアクリル樹脂モノマー及び光重合剤含有コート液を調製した。
得られたコート液を厚さ100μmのポリエステルフィルムの上にバーコーターを用いて、乾燥時のコーティングの厚みが約5μmになるようにコートした。塗膜側より高圧水銀UVランプ(120W/cm)の紫外線を積算光量約400mJ/cm2の条件で照射し、硬化処理することによって、アクリル樹脂ハードコート被膜を作製し、得られたハードコート被膜の表面抵抗値を測定した。表面抵抗値は25±2℃、湿度50±5%の条件下、ハードコート被膜部分を測定した。その結果を表2に示す。
比較応用例3
オニウム塩として、N−(3−トリメトキシシリルプロピル)ピリジニウム=ビス(トリフルオロメタンスルホニル)イミドを用いた以外は応用例9及び10と同様にしてハードコート被膜を作製した。得られたハードコート被膜の表面抵抗値を測定した。この結果を表2に示す。
Example 1
Synthesis of N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide
To the reaction vessel, 503.1 g (3.60 mol) of choline chloride, 1086.2 g (3.78 mol) of lithium bis (trifluoromethanesulfonyl) imidate and 1838.9 g of ion-exchanged water were added and stirred at room temperature for 2 hours. After washing twice with ion-exchanged water, dehydration was performed to obtain 949.2 g (yield 68.5%) of 1- (2-hydroxyethyl) -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide. Obtained.
The obtained N- (2-hydroxyethyl) -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide (31.1 g, 80.9 mmol) was dissolved in acetonitrile (31.1 g) to give 3-triethoxysilyl. 20.0 g (80.9 mmol) of propyl isocyanate and 0.24 g (0.38 mmol) of dibutyltin dilaurate were added and reacted at room temperature for 5 hours. Then, it was concentrated and dried to obtain 43.6 g of N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide (yield 85.3). %)Obtained. 1 H-NMR of the obtained 1-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N, -trimethylammonium bis (trifluoromethanesulfonyl) imide is shown below.
1 H-NMR δ (ppm): 6.50-6.60 (br, 1H), 4.59 (t, 2H), 3.88 (t, 2H), 3.80 (q, 6H), 3 .41 (s, 9H), 3.05-3.15 (m, 2H), 1.55-1.65 (m, 2H), 1.18 (t, 9H), 1.57 (t, 2H) )
Example 2
Synthesis of N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)} pyridinium bis (trifluoromethanesulfonyl) imide
To the reaction vessel, 240.7 g (3.04 mol) of pyridine, 450.4 g (3.60 mol) of 2-bromoethanol and 1035.6 g of acetonitrile were added and stirred at 80 ° C. for 24 hours. After cooling, washing with acetonitrile, and drying, 522.6 g (yield 84.3%) of N- (2-hydroxyethyl) pyridinium bromide was obtained.
The obtained N- (2-hydroxyethyl) pyridinium bromide 522.4 g (2.56 mol), lithium bis (trifluoromethanesulfonyl) imido acid 771.7 g (2.69 mol), and ion-exchanged water 1357.8 g were added. Stir at room temperature for 2 hours. After washing twice with ion-exchanged water, dehydration was performed to obtain 743.4 g (yield 71.8%) of N- (2-hydroxyethyl) pyridinium bis (trifluoromethanesulfonyl) imide.
39.2 g (97.0 mmol) of the obtained N- (2-hydroxyethyl) pyridinium bis (trifluoromethanesulfonyl) imide was dissolved in 39.2 g of acetonitrile, and 24.0 g (97.97) of 3-triethoxysilylpropyl isocyanate was obtained. 0 mmol) and 0.31 g (0.49 mmol) of dibutyltin dilaurate were added and reacted at room temperature for 5 hours. Then, it concentrated and dried and obtained 61.0g (yield 73.7%) of N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)} pyridinium = bis (trifluoromethanesulfonyl) imide. 1 H-NMR of the obtained N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)} pyridinium bis (trifluoromethanesulfonyl) imide is shown below.
1 H-NMR δ (ppm): 9.21 (d, 2H), 8.82 (t, 1H), 8.34 (t, 2H), 8.40-8.55 (br, 1H), 5 .25 (t, 2H), 4.69 (t, 2H), 3.85 (q, 6H), 3.09 (q, 2H), 1.50-1.60 (m, 2H), 1. 21 (t, 9H), 0.68 (t, 2H)
Example 3
Synthesis of N- [2- {3- (3-trimethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide
To the reaction vessel, add [2- (acryloyloxy) ethyl] trimethylammonium chloride 720.5 g (3.72 mol), 1090.1 g (3.40 mol) of lithium bis (trifluoromethanesulfonyl) imidate and 995.0 g of ion-exchanged water. And stirred at room temperature for 3 hours. After washing twice with ion-exchanged water, dehydration was performed to obtain 1527.0 g (yield 93.6%) of [2- (acryloyloxy) ethyl] trimethylammonium bis (trifluoromethanesulfonyl) imide.
58.7 g (133.9 mmol) of the obtained [2- (acryloyloxy) ethyl] trimethylammonium bis (trifluoromethanesulfonyl) imide was dissolved in 58.7 g of acetonitrile, and 24.0 g of 3-trimethoxysilylpropylamine (133 .9 mmol) was added and reacted at room temperature for 5 hours. Then, it was concentrated and dried to give N- [2- {3- (3-trimethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide. 80.8 g (yield 97.6%) was obtained. 1 H-NMR of the obtained N- [2- {3- (3-trimethoxysilylpropylamino) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide Is shown below.
1 H-NMR δ (ppm): 4.65 (t, 2H), 3.95 (t, 2H), 3.51 (s, 9H), 3.45 (s, 9H), 2.83 (t , 2H), 2.50-2.60 (m, 4H), 1.45-1.55 (m, 2H), 0.60 (t, 2H)
Example 4
Synthesis of N- [2- {3- (3-trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide
In the same manner as in Example 3, [2- (acryloyloxy) ethyl] trimethylammonium bis (trifluoromethanesulfonyl) imide was obtained.
53.6 g (122.3 mmol) of the obtained [2- (acryloyloxy) ethyl] trimethylammonium bis (trifluoromethanesulfonyl) imide was dissolved in 46.6 g of acetonitrile, and 24.0 g of 3-trimethoxysilylpropanethiol (122 .3 mmol) was added and reacted at room temperature for 5 hours. Then, it was concentrated and dried to give N- [2- {3- (3-trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide. 74.9 g (yield 96.4%) was obtained. 1 H-NMR of the obtained N- [2- {3- (3-trimethoxysilylpropylthio) -1-oxopropoxy} ethyl] -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide Is shown below.
1 H-NMR δ (ppm): 4.68 (t, 2H), 3.95 (t, 2H), 3.51 (s, 9H), 3.45 (s, 9H), 2.75-2 .80 (m, 2H), 2.65-2.75 (m, 2H), 2.55 (t, 2H), 1.60-1.70 (m, 2H), 0.70 (t, 2H) )
Example 5
Synthesis of N- [2- {3- (3-trimethoxysilylpropylthio) -2-methyl-1-oxopropoxy} ethyl] -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide
To the reaction vessel were added 798.2 g (3.84 mol) of methacroylcholine chloride, 1125.8 g (3.92 mol) of lithium bis (trifluoromethanesulfonyl) imidoate, and 2141.4 g of ion-exchanged water, and the mixture was stirred at room temperature for 3 hours. . After washing twice with ion-exchanged water, dehydration was performed to obtain 1703.5 g (yield 96.3%) of methacryloylcholine bis (trifluoromethanesulfonyl) imide.
55.3 g (122.3 mmol) of the obtained methacryloylcholine bis (trifluoromethanesulfonyl) imide was dissolved in 47.7 g of acetonitrile, and 24.1 g (122.3 mmol) of 3-trimethoxysilylpropanethiol was added to room temperature. For 5 hours. Then, it was concentrated and dried to give N- [2- {3- (3-trimethoxysilylpropylthio) -2-methyl-1-oxopropoxy} ethyl] -trimethylammonium bis (trifluoromethanesulfonyl) imide. 8 g (yield 96.7%) was obtained. Of the resulting N- [2- {3- (3-trimethoxysilylpropylthio) -2-methyl-1-oxopropoxy} ethyl] -N, N, N-trimethylammonium bis (trifluoromethanesulfonyl) imide 1 H-NMR is shown below.
1 H-NMR δ (ppm): 4.69 (t, 2H), 3.98 (t, 2H), 3.53 (s, 9H), 3.46 (s, 9H), 2.75-2 .85 (m, 2H), 2.70-2.80 (m, 1H), 2.50-2.60 (t, 2H), 1.60-1.70 (m, 2H), 1.22 (D, 3H), 0.80 (t, 2H)
Example 6
Synthesis of N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl} pyridinium = hexafluorophosphate
N- (2-hydroxyethyl) pyridinium bromide 75.9 g (0.37 mol), potassium hexafluorophosphate 69.9 g (0.38 mol), methanol 45.6 g, acetonitrile synthesized by the method described in Example 2 182.4 g was added and stirred at room temperature for 24 hours. The precipitated solid was filtered off and concentrated. After separating the precipitated solid by filtration, 68.8 g (0.37 mol) of potassium hexafluorophosphate was added and stirred at room temperature for 4 hours. The solid was separated by filtration, concentrated and dried to obtain 66.2 g of N- (2-hydroxyethyl) pyridinium = hexafluorophosphate (yield 72.7%).
The obtained N- (2-hydroxyethyl) pyridinium = hexafluorophosphate 28.4 g (0.11 mol) was dissolved in acetonitrile 28.6 g, 3-trimethoxysilylpropyl isocyanate 23.1 g (0.11 mol), and 0.35 g (0.55 mmol) of dibutyltin dilaurate was added and reacted at room temperature for 5 hours. Then, after concentration, washing with 27.3 g of toluene, and drying, 44.8 g of N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl} pyridinium = hexafluorophosphate (yield 89.6%) )Obtained. 1 H-NMR of the obtained N-{(3-trimethoxysilylpropyl) carbamoyloxyethyl} pyridinium = hexafluorophosphate is shown below.
1 H-NMR δ (ppm): 9.18 (d, 2H), 8.82 (t, 1H), 8.32 (t, 2H), 6.45-6.55 (br, 1H), 5 .13 (t, 2H), 4.69 (t, 2H), 3.57 (s, 9H), 3.06 (q, 2H), 1.50-1.65 (m, 2H), 1. 61 (t, 2H)
Example 7
Synthesis of P-{(3-triethoxysilylpropyl) carbamoyloxyethyl} -P, P, P-tributylphosphonium bis (trifluoromethanesulfonyl) imide
After taking 129.7 g (1.04 mol) of 2-bromoethanol in a reaction vessel and heating to 80 ° C., 200.0 g (0.99 mol) of tributylphosphine was added dropwise over 1 hour with stirring, and the mixture was stirred at 80 ° C. for 1 hour. Stirring was continued overnight. The resulting reaction solution was cooled to room temperature and washed twice with 200 ml of hexane. To the reaction solution after washing, 100 g of ion-exchanged water and 10 g of activated carbon (activated charcoal Y made by Futamura Chemical Co., Ltd.) were added and stirred at 50 ° C. for 1 hour. The activated carbon was removed by filtration, and tributyl (2-hydroxyethyl) phosphonium. = An aqueous solution of bromide was obtained.
To the obtained aqueous solution was added 447.50 g (1.19 mol) of a 76.1% aqueous solution of bis (trifluoromethanesulfonyl) imido acid, and the mixture was stirred at room temperature for 2 hours. When the obtained reaction liquid was allowed to stand, it was separated into two layers. Therefore, the oil layer was obtained by liquid separation, and the obtained oil layer was separated and washed twice with 100 g of ion-exchanged water. The obtained oil layer was concentrated and dried at 50 ° C. to obtain 287.5 g (yield 55.1%) of tributyl (2-hydroxyethyl) phosphonium = bis (trifluoromethanesulfonyl) imide. 1 H-NMR of the obtained tributyl (2-hydroxyethyl) phosphonium bis (trifluoromethanesulfonyl) imide is shown below.
1 H-NMR (CDCl 3 ) δ (ppm): 4.00 (td, 2H), 3.29 (t, 1H), 2.42 (m, 2H), 2.16 (m, 6H), 1 .51 (m, 12H), 0.97 (t, 9H)
In a reaction vessel, take 50.0 g (0.09 mol) of tributyl (2-hydroxyethyl) phosphonium = bis (trifluoromethanesulfonyl) imide, 50.0 g of acetonitrile, and 0.03 g (0.05 mmol) of dibutyltin dilaurate at room temperature. While stirring at 23.5 g (0.09 mol) of 3-triethoxysilylpropyl isocyanate was added dropwise and reacted at room temperature for 5 hours. The obtained reaction solution was washed with 150 mL of hexane, the obtained reaction solution was concentrated and dried at 50 ° C., and P-{(3-triethoxysilylpropyl) carbamoyloxyethyl} -P, P, P-tributylphosphonium. = 69.6 g of bis (trifluoromethanesulfonyl) imide (yield 94.8%). 1 H-NMR of the obtained P-{(3-triethoxysilylpropyl) carbamoyloxyethyl} -P, P, P-tributylphosphonium bis (trifluoromethanesulfonyl) imide is shown below.
1 H-NMR (CDCl 3 ) δ (ppm): 5.54 (t, 1H), 4.39 (td, 2H), 3.82 (q, 6H), 3.16 (q, 2H), 2 .58 (m, 2H), 2.18 (m, 6H), 1.62 (m, 2H), 1.51 (m, 12H), 1.22 (m, 9H), 0.97 (t, 9H), 0.61 (t, 2H)
Example 8
Synthesis of N-{(3-triethoxysilylpropyl) carbamoyloxyethyl}}-N, N, N-trimethylammonium chloride
A reaction vessel was charged with 5.01 g (30 mmol) of choline chloride, 10.0 g of acetonitrile, 0.01 g (0.02 mmol) of dibutyltin dilaurate and 8.88 g (30 mmol) of 3-triethoxysilylpropyl isocyanate, and in a nitrogen atmosphere, Stir at 80 ° C. for 14 hours. The obtained reaction solution was concentrated and dried to obtain 13.68 g of N-{(3-triethoxysilylpropyl) carbamoyloxyethyl}}-N, N, N-trimethylammonium chloride (yield 98.7%). ) 1 H-NMR of the obtained N-{(3-triethoxysilylpropyl) carbamoyloxyethyl}}-N, N, N-trimethylammonium chloride is shown below.
1 H-NMR (DMSO-d6) δ (ppm): 7.55-7.40 (1H, brs), 4.45-4.30 (2H, brs), 3.73 (q, 6H), 3 .68-3.55 (brt, 2H), 3.14 (s, 9H), 3.00-2.90 (brt, 2H), 1.48-1.40 (m, 2H,),. 52 (t, 2H)
Application example 1
N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N obtained in Example 1 was used as an acrylic resin by using 100 parts by weight of acrylic resin adhesive SK Dyne 909A manufactured by Soken Chemical Co., Ltd. 5 parts by weight of N, N, -trimethylammonium bis (trifluoromethanesulfonyl) imide and 100 parts by weight of ethyl acetate as a diluent were added and dissolved to prepare a coating solution. This coating solution was coated on a polyester film using a bar coater so that the thickness of the pressure-sensitive adhesive when dried was about 10 μm, and heated and dried at 80 ° C. for 3 minutes to prepare a test piece. The obtained test piece was held in an atmosphere of 25 ° C. and 40% RH for 2 hours, and then the surface resistance value of the adhesive of the test piece was measured in an atmosphere of 25 ° C. and 40% RH. The results are shown in Table 1.
Application examples 2-8
Instead of N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N, -trimethylammonium bis (trifluoromethanesulfonyl) imide of Application Example 1, the onium salts of the present invention shown in Table 1 A test piece was prepared in the same manner as in Application Example 1 except that was used, and the surface resistance value of the adhesive of the test piece was measured in the same manner as in Application Example 1. The results are shown in Table 1.
Comparative application example 1
Similar to Application Example 1 except that N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N, -trimethylammonium bis (trifluoromethanesulfonyl) imide of Application Example 1 was not used. A test piece was prepared, and the surface resistance value of the adhesive of the test piece was measured in the same manner as in Application Example 1. The results are shown in Table 1.
Comparative application example 2
In place of N-{(3-triethoxysilylpropyl) carbamoyloxyethyl)}-N, N, N, -trimethylammonium bis (trifluoromethanesulfonyl) imide in Application Example 1, described in JP2010-248165A A test piece was prepared in the same manner as in Application Example 1 except that N- (3-trimethoxysilylpropyl) pyridinium bis (trifluoromethanesulfonyl) imide synthesized by the above-described method was used. The surface resistance was measured in the same manner as in Application Example 1. The results are shown in Table 1.
Application examples 9 and 10
Dipentaerythritol hexaacrylate (A-DPH: Shin-Nakamura Chemical Co., Ltd.) 0.50 g, Pentaerythritol triacrylate (A-TMN-3LM-N: Shin-Nakamura Chemical Co., Ltd.) 1.50 g, trimethylolpropane 0.50 g of triacrylate (A-TMPT: manufactured by Shin-Nakamura Chemical Co., Ltd.), 0.23 g of onium salt (1) shown in Table 2 and colloidal silica isopropyl alcohol dispersion (IPA-ST: silica solid content 30 wt%, (Made by Nissan Chemical Industries, Ltd.) 1.80 g is mixed, and 2.16 g of isopropyl alcohol and 0.15 g of 2-hydroxy-2-methylpropiophenone as a photopolymerization initiator are mixed with the resulting mixture to obtain an acrylic resin. A monomer and photopolymerization agent-containing coating solution was prepared.
The resulting coating solution was coated on a 100 μm thick polyester film using a bar coater so that the coating thickness when dried was about 5 μm. Acrylic resin hard coat film was prepared by irradiating ultraviolet rays from a high pressure mercury UV lamp (120 W / cm) from the coating film side under the condition of an integrated light quantity of about 400 mJ / cm 2 and curing treatment, and the obtained hard coat film The surface resistance value of was measured. The surface resistance value was 25 ± 2 ° C., and the humidity was 50 ± 5%. The results are shown in Table 2.
Comparative application example 3
Hard coat films were prepared in the same manner as in Application Examples 9 and 10 except that N- (3-trimethoxysilylpropyl) pyridinium bis (trifluoromethanesulfonyl) imide was used as the onium salt. The surface resistance value of the obtained hard coat film was measured. The results are shown in Table 2.
Claims (8)
- 式(1):
((式中、Q+は窒素カチオン又はリンカチオンを示す。R1~R3は炭素数1~6のアルキル基を示し、R1とR2が末端で互いに結合してピロリジン環、ピペリジン環、ピリジン環、ホスホラン環、ホスホリナン環又はホスホリン環を形成してもよい。但し、ピリジン環又はホスホリン環を形成する場合は、R3は存在しない。R4は炭素数1~4のアルキル基を示す。DはCH2、CH(CH3)又はCH(CH3)CH2を示す。EはNH又は硫黄原子を示す。mは0~3の整数、nは1~4の整数である。)で表される第四級オニウムカチオンを示す。A−はアニオンを示す。)で表わされるオニウム塩。 Formula (1):
(In the formula, Q + represents a nitrogen cation or a phosphor cation. R 1 to R 3 represent an alkyl group having 1 to 6 carbon atoms, and R 1 and R 2 are bonded to each other at the terminal to form a pyrrolidine ring or a piperidine ring. , A pyridine ring, a phosphorane ring, a phosphorinane ring, or a phospholine ring, provided that a pyridine ring or a phospholine ring is not present, R 3 is not present, and R 4 is an alkyl group having 1 to 4 carbon atoms. D represents CH 2 , CH (CH 3 ) or CH (CH 3 ) CH 2 , E represents NH or a sulfur atom, m represents an integer of 0 to 3, and n represents an integer of 1 to 4. ) Represents a quaternary onium cation, and A − represents an anion. - Q+が窒素カチオンである請求項1記載のオニウム塩。 The onium salt according to claim 1, wherein Q + is a nitrogen cation.
- Q+がリンカチオンである請求項1記載のオニウム塩。 The onium salt according to claim 1, wherein Q + is a phosphorus cation.
- A−が含フッ素アニオン又はハロゲンイオンである請求項1~3のいずれかに記載のオニウム塩。 A - onium salt according to any one of claims 1 to 3, which is a fluorine-containing anion or a halide ion.
- A−が(CF3SO2)2N−、(FSO2)2N−、BF4 −、PF6 −又はCl−である請求項1~3のいずれかに記載のオニウム塩。 A - is (CF 3 SO 2) 2 N -, (FSO 2) 2 N -, BF 4 -, PF 6 - or Cl - onium salt according to any one of claims 1 to 3, which is.
- A−がCH3(CH2)10CH2C6H4SO3 −又はCH3C6H4SO3 −である請求項1~3のいずれかに記載のオニウム塩。 A - is CH 3 (CH 2) 10 CH 2 C 6 H 4 SO 3 - onium salt according to any one of the is claims 1 to 3 - or CH 3 C 6 H 4 SO 3 .
- 請求項1~6のいずれかに記載のオニウム塩を少なくとも1種含有することを特徴とするアクリル樹脂用帯電防止剤。 An antistatic agent for acrylic resin, comprising at least one onium salt according to any one of claims 1 to 6.
- 請求項7に記載の帯電防止剤を少なくとも1種含有することを特徴とするアクリル樹脂組成物。 An acrylic resin composition comprising at least one antistatic agent according to claim 7.
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KR1020147002021A KR101991272B1 (en) | 2011-06-24 | 2012-06-25 | Onium salt having trialkoxysilylalkyl group |
CN201280020083.XA CN103596965B (en) | 2011-06-24 | 2012-06-25 | There is the salt of trialkoxysilylalkyl |
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JP2014108993A (en) * | 2012-12-03 | 2014-06-12 | Koei Chem Co Ltd | Polysiloxane copolymer having quaternary salt structure and antistatic agent containing the same |
EP2860183A1 (en) * | 2013-03-25 | 2015-04-15 | Sumitomo Riko Company Limited | Reactive ionic liquid and ion-immobilized metal oxide particles produced using same, ion-immobilized elastomer, and transducer |
JP2017048149A (en) * | 2015-09-02 | 2017-03-09 | 広栄化学工業株式会社 | Onium salt having alkoxysilylalkyl group |
WO2019073397A1 (en) * | 2017-10-10 | 2019-04-18 | Ppg Industries Ohio, Inc. | Ionic liquids |
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JP6130093B2 (en) * | 2011-08-29 | 2017-05-17 | 藤森工業株式会社 | Adhesive composition containing antistatic agent and adhesive film |
JP6196470B2 (en) * | 2013-05-21 | 2017-09-13 | 広栄化学工業株式会社 | Novel onium salt and antistatic agent containing the same |
JP6203595B2 (en) * | 2013-10-15 | 2017-09-27 | 広栄化学工業株式会社 | Pyridinium bis (fluorosulfonyl) imide and method for producing the same |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000178540A (en) * | 1998-12-18 | 2000-06-27 | Altech Co Ltd | Antistatic agent for inorganic substance |
JP2009256564A (en) * | 2007-09-26 | 2009-11-05 | Fujifilm Corp | Composition for formation of hydrophilic film, and hydrophilic member |
JP2011505422A (en) * | 2007-12-04 | 2011-02-24 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | Fluoroalkylsilane |
WO2012043303A1 (en) * | 2010-09-27 | 2012-04-05 | 東海ゴム工業株式会社 | Development roller for electrophotography device |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5275562B2 (en) * | 2006-03-10 | 2013-08-28 | 日本化学工業株式会社 | Powdered silica composite particles and production method thereof, silica composite particle dispersion, and resin composition |
JP2008195664A (en) * | 2007-02-14 | 2008-08-28 | Univ Kanagawa | Compound having phosphoric acid ester bond and method for producing the same |
KR101288294B1 (en) * | 2007-12-25 | 2013-07-26 | 닛뽕소다 가부시키가이샤 | Onium salt-containing polymer |
JP5602996B2 (en) * | 2008-02-08 | 2014-10-08 | 日本化学工業株式会社 | Powdered silica composite particles and production method thereof, silica composite particle dispersion, and resin composition |
JP5621982B2 (en) * | 2008-08-18 | 2014-11-12 | 日産化学工業株式会社 | Silicon-containing resist underlayer film forming composition having onium group |
JP5628504B2 (en) * | 2009-03-24 | 2014-11-19 | 広栄化学工業株式会社 | Onium salt having trialkoxysilylalkyl group |
KR101614541B1 (en) * | 2009-07-28 | 2016-04-21 | 고에이 가가쿠 고교 가부시키가이샤 | Onium salt composition |
-
2012
- 2012-03-29 JP JP2012078024A patent/JP6190572B2/en active Active
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- 2012-06-25 WO PCT/JP2012/066824 patent/WO2013011822A2/en active Application Filing
- 2012-06-25 KR KR1020147002021A patent/KR101991272B1/en active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000178540A (en) * | 1998-12-18 | 2000-06-27 | Altech Co Ltd | Antistatic agent for inorganic substance |
JP2009256564A (en) * | 2007-09-26 | 2009-11-05 | Fujifilm Corp | Composition for formation of hydrophilic film, and hydrophilic member |
JP2011505422A (en) * | 2007-12-04 | 2011-02-24 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | Fluoroalkylsilane |
WO2012043303A1 (en) * | 2010-09-27 | 2012-04-05 | 東海ゴム工業株式会社 | Development roller for electrophotography device |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014108993A (en) * | 2012-12-03 | 2014-06-12 | Koei Chem Co Ltd | Polysiloxane copolymer having quaternary salt structure and antistatic agent containing the same |
EP2860183A1 (en) * | 2013-03-25 | 2015-04-15 | Sumitomo Riko Company Limited | Reactive ionic liquid and ion-immobilized metal oxide particles produced using same, ion-immobilized elastomer, and transducer |
US9954162B2 (en) | 2013-03-25 | 2018-04-24 | Sumitomo Riko Company Limited | Reactive ionic liquid, and ion-immobilized metal oxide particle, ion-immobilized elastomer, and transducer using same |
EP2860183B1 (en) * | 2013-03-25 | 2018-04-25 | Sumitomo Riko Company Limited | Reactive ionic liquid and ion-immobilized metal oxide particles produced using same, ion-immobilized elastomer, and transducer |
JP2017048149A (en) * | 2015-09-02 | 2017-03-09 | 広栄化学工業株式会社 | Onium salt having alkoxysilylalkyl group |
WO2019073397A1 (en) * | 2017-10-10 | 2019-04-18 | Ppg Industries Ohio, Inc. | Ionic liquids |
CN111386278A (en) * | 2017-10-10 | 2020-07-07 | Ppg工业俄亥俄公司 | Ionic liquids |
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KR20140042880A (en) | 2014-04-07 |
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