WO2012067457A3 - 아크릴레이트계 화합물을 포함하는 감광성 조성물 - Google Patents

아크릴레이트계 화합물을 포함하는 감광성 조성물 Download PDF

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Publication number
WO2012067457A3
WO2012067457A3 PCT/KR2011/008820 KR2011008820W WO2012067457A3 WO 2012067457 A3 WO2012067457 A3 WO 2012067457A3 KR 2011008820 W KR2011008820 W KR 2011008820W WO 2012067457 A3 WO2012067457 A3 WO 2012067457A3
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WO
WIPO (PCT)
Prior art keywords
photosensitive composition
acrylate compound
present
strength
thin film
Prior art date
Application number
PCT/KR2011/008820
Other languages
English (en)
French (fr)
Other versions
WO2012067457A2 (ko
Inventor
이건우
곽상규
이창순
김혜현
Original Assignee
주식회사 엘지화학
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 엘지화학 filed Critical 주식회사 엘지화학
Priority to US13/988,469 priority Critical patent/US9034561B2/en
Priority to JP2013538665A priority patent/JP5688159B2/ja
Priority to CN201180065403.9A priority patent/CN103329043B/zh
Publication of WO2012067457A2 publication Critical patent/WO2012067457A2/ko
Publication of WO2012067457A3 publication Critical patent/WO2012067457A3/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/582—Recycling of unreacted starting or intermediate materials

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

본 발명은 아다만틸 구조를 포함하는 아크릴레이트계 화합물을 포함하는 감광성 조성물에 대한 것이다. 본 발명에 따른 감광성 조성물을 이용하여 박막의 강도를 손상시키지 않고 박리가 용이한 유기 박막의 제조가 가능해진다.
PCT/KR2011/008820 2010-11-19 2011-11-17 아크릴레이트계 화합물을 포함하는 감광성 조성물 WO2012067457A2 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US13/988,469 US9034561B2 (en) 2010-11-19 2011-11-17 Photosensitive composition comprising an acrylate compound
JP2013538665A JP5688159B2 (ja) 2010-11-19 2011-11-17 アクリレート系化合物を含む感光性組成物
CN201180065403.9A CN103329043B (zh) 2010-11-19 2011-11-17 包含丙烯酸酯化合物的光敏组合物

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20100115557 2010-11-19
KR10-2010-0115557 2010-11-19

Publications (2)

Publication Number Publication Date
WO2012067457A2 WO2012067457A2 (ko) 2012-05-24
WO2012067457A3 true WO2012067457A3 (ko) 2012-09-20

Family

ID=46084542

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/008820 WO2012067457A2 (ko) 2010-11-19 2011-11-17 아크릴레이트계 화합물을 포함하는 감광성 조성물

Country Status (6)

Country Link
US (1) US9034561B2 (ko)
JP (1) JP5688159B2 (ko)
KR (1) KR101356869B1 (ko)
CN (1) CN103329043B (ko)
TW (1) TWI473824B (ko)
WO (1) WO2012067457A2 (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101690814B1 (ko) * 2012-05-31 2017-01-10 주식회사 엘지화학 감광성 수지 조성물, 상기 감광성 수지 조성물로 제조된 감광재, 이를 포함하는 컬러필터 및 이를 포함하는 디스플레이 장치
JP5846061B2 (ja) * 2012-07-09 2016-01-20 信越化学工業株式会社 パターン形成方法
JP6085438B2 (ja) * 2012-09-27 2017-02-22 株式会社タムラ製作所 硬化性組成物
KR101953923B1 (ko) 2013-07-23 2019-05-22 동우 화인켐 주식회사 열경화성 수지 조성물 및 그 조성물로 형성된 보호막을 구비한 컬러 필터 및 표시 장치
WO2016158864A1 (ja) * 2015-04-01 2016-10-06 東レ株式会社 感光性樹脂組成物、導電性パターンの製造方法、基板、タッチパネル及びディスプレイ
CN105549325A (zh) * 2015-12-11 2016-05-04 阜阳欣奕华材料科技有限公司 金刚烷衍生物单体、彩色光阻剂及其制备方法、彩色滤光片
WO2018029747A1 (ja) * 2016-08-08 2018-02-15 東レ株式会社 感光性樹脂組成物、導電性パターンの製造方法、基板、タッチパネル及びディスプレイ
KR102351294B1 (ko) 2017-11-08 2022-01-17 주식회사 이엔에프테크놀로지 감광성 수지 조성물

Citations (4)

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US4332964A (en) * 1980-06-11 1982-06-01 Battelle Development Corporation Unsaturated esters of adamantane containing diols and thermo-resistant cross-linked polymers therefrom
KR20060111569A (ko) * 2003-12-15 2006-10-27 가부시끼가이샤 도꾸야마 중합성 불포화 카르복실산 아다만틸 에스테르류의 제조방법
KR20090086954A (ko) * 2006-10-25 2009-08-14 이데미쓰 고산 가부시키가이샤 아다만탄 유도체, 그 제조 방법, 수지 조성물 및 그 경화물
KR20100050081A (ko) * 2008-11-05 2010-05-13 주식회사 엘지화학 불포화 이중 결합을 가진 옥심 에스테르를 함유한 광중합 개시제 및 이를 포함한 감광성 수지 조성물

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Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4332964A (en) * 1980-06-11 1982-06-01 Battelle Development Corporation Unsaturated esters of adamantane containing diols and thermo-resistant cross-linked polymers therefrom
KR20060111569A (ko) * 2003-12-15 2006-10-27 가부시끼가이샤 도꾸야마 중합성 불포화 카르복실산 아다만틸 에스테르류의 제조방법
KR20090086954A (ko) * 2006-10-25 2009-08-14 이데미쓰 고산 가부시키가이샤 아다만탄 유도체, 그 제조 방법, 수지 조성물 및 그 경화물
KR20100050081A (ko) * 2008-11-05 2010-05-13 주식회사 엘지화학 불포화 이중 결합을 가진 옥심 에스테르를 함유한 광중합 개시제 및 이를 포함한 감광성 수지 조성물

Also Published As

Publication number Publication date
TW201233696A (en) 2012-08-16
WO2012067457A2 (ko) 2012-05-24
CN103329043A (zh) 2013-09-25
US9034561B2 (en) 2015-05-19
CN103329043B (zh) 2016-06-29
KR20120054540A (ko) 2012-05-30
KR101356869B1 (ko) 2014-01-28
US20130244182A1 (en) 2013-09-19
JP2013543993A (ja) 2013-12-09
JP5688159B2 (ja) 2015-03-25
TWI473824B (zh) 2015-02-21

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