WO2012029781A1 - 太陽電池および太陽電池モジュール - Google Patents

太陽電池および太陽電池モジュール Download PDF

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Publication number
WO2012029781A1
WO2012029781A1 PCT/JP2011/069608 JP2011069608W WO2012029781A1 WO 2012029781 A1 WO2012029781 A1 WO 2012029781A1 JP 2011069608 W JP2011069608 W JP 2011069608W WO 2012029781 A1 WO2012029781 A1 WO 2012029781A1
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Prior art keywords
layer
photoelectric conversion
electrode layer
inorganic
solar cell
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PCT/JP2011/069608
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English (en)
French (fr)
Japanese (ja)
Inventor
木原　健
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大日本印刷株式会社
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Publication of WO2012029781A1 publication Critical patent/WO2012029781A1/ja

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
    • H10F19/80—Encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H10K30/88—Passivation; Containers; Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/542—Dye sensitized solar cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to a sealing structure for a solar cell and a solar cell module.
  • solar cells such as single crystal silicon solar cells, polycrystalline silicon solar cells, and amorphous silicon solar cells, compound semiconductor solar cells, dye-sensitized solar cells, and organic thin film solar cells. And organic solar cells.
  • organic solar cells such as organic thin-film solar cells and dye-sensitized solar cells that have been attracting attention and research and development as solar cells that have a low environmental impact and can reduce manufacturing costs.
  • Output stability and durability during the period are important issues.
  • organic semiconductor materials, and in dye-sensitized solar cells, dye sensitizers, oxide semiconductor materials, electrolyte materials, and the like are deteriorated due to external factors such as moisture and oxygen, and the performance deteriorates with time. Therefore, research on element sealing technology has been conducted (see, for example, Patent Document 1).
  • the barrier film one in which an inorganic barrier layer is formed on one side or both sides of a plastic film is generally known.
  • a barrier film as a support substrate having flexibility.
  • the barrier film is damaged such as cracks due to expansion / contraction during heating / cooling in the manufacturing process.
  • the barrier properties will be reduced.
  • scratches or the like may occur in the barrier film due to physical factors, which may reduce the barrier property.
  • a resin base material is used as a flexible support base material, and after forming an element directly on the resin base material, a barrier film is formed on the surface opposite to the element side of the resin base material. It is possible to paste.
  • a barrier film, a metal foil, etc. can be used as a flexible sealing substrate.
  • the inorganic barrier layer is present on the outermost surface (the outermost surface opposite to the element side) and is exposed during use. Since there is a possibility that the barrier property may be deteriorated due to damage, the barrier film is generally arranged so that the inorganic barrier layer is on the element side. Therefore, when a barrier film is used as the sealing substrate, the barrier film is disposed so that the inorganic barrier layer is on the element side regardless of whether the inorganic barrier layer is formed on one side or both sides of the plastic film. It will be.
  • the inorganic barrier layer of the barrier film that is the sealing substrate and the resin substrate that is the supporting substrate at the outer periphery of the substrate And will be pasted together.
  • the metal foil that is the sealing substrate and the resin substrate that is the supporting substrate at the outer peripheral portion of the substrate And will be pasted together.
  • the present invention has been made in view of the above-mentioned problems, and has as its main purpose to improve the adhesion reliability between a supporting substrate and a sealing substrate in a solar cell.
  • the present invention surrounds the periphery of the photoelectric conversion element on the transparent resin base material, the photoelectric conversion element formed on the transparent resin base material, and the transparent resin base material.
  • the photoelectric conversion comprising: an adhesive inorganic layer formed; an adhesive layer disposed on the adhesive inorganic layer; and a sealing substrate disposed on the adhesive layer and having an inorganic barrier layer.
  • a solar cell in which the transparent resin base material on which the element and the adhesive inorganic layer are formed and the inorganic barrier layer of the sealing base material are bonded via the adhesive layer To do.
  • the adhesive inorganic layer is formed on the transparent resin substrate so as to surround the periphery of the photoelectric conversion element, and the transparent resin substrate and the sealing formed with the photoelectric conversion element and the adhesive inorganic layer are sealed. Since the inorganic barrier layer of the substrate is bonded via the adhesive layer, the adhesive inorganic layer and the inorganic barrier layer are bonded via the adhesive layer around the photoelectric conversion element. Good adhesion can be obtained. Therefore, adhesion reliability can be improved, moisture and oxygen can be prevented from entering from the adhesion interface, and the durability of the solar cell can be improved.
  • the transparent resin base material and the sealing base material can be flexible, and a photoelectric conversion element can be formed on the transparent resin base material by Roll to Roll, Because the transparent resin base material on which the conversion element and the inorganic layer for adhesion are formed and the inorganic barrier layer of the sealing base material can be bonded, cost reduction and improvement in productivity and mass productivity are realized. It becomes possible.
  • the first electrode layer is a patterned metal electrode layer
  • the adhesive inorganic layer is made of the metal electrode layer. Since patterning is essential when forming a patterned metal electrode layer, it is possible to simultaneously form an inorganic layer for adhesion during this patterning, and to manufacture a highly reliable solar cell in a normal process Because you can. Moreover, since it becomes low resistance, it is because it is preferable that a 1st electrode layer has a patterned metal electrode layer. Furthermore, it is preferable that the sealing substrate is a metal foil because of its excellent barrier properties and impact resistance. In this case, an inorganic layer for bonding composed of a metal electrode layer and a metal foil are sealed around the photoelectric conversion element. This is because the base material is bonded via the adhesive layer, so that the adhesive force can be further strengthened.
  • the first electrode layer is a transparent electrode layer
  • the adhesive inorganic layer is composed of the transparent electrode layer. This is because the adhesive inorganic layer can be formed simultaneously with the formation of the transparent electrode layer, and a highly reliable solar cell can be manufactured without increasing the number of steps of separately forming the adhesive inorganic layer.
  • the sealing substrate is preferably a metal foil. This is because the metal foil is excellent in barrier properties and impact resistance and can further improve the durability of the solar cell.
  • the sealing substrate is preferably a barrier film. Since the barrier film can be light-transmitting, it is possible to apply both photo-curing and heat-curing when curing the adhesive used for the adhesive layer. It has the advantage of a wide choice.
  • the photoelectric conversion element is preferably an organic solar cell element having a photoelectric conversion layer containing an organic compound. Since the organic solar cell element is significantly deteriorated by moisture, the above-described configuration can further improve the durability.
  • the present invention provides a solar cell module in which a plurality of the above-described solar cells are connected in series or in parallel.
  • an adhesive inorganic layer is formed on the transparent resin substrate so as to surround the periphery of the photoelectric conversion element, and around the photoelectric conversion element, an adhesive inorganic layer and an inorganic barrier layer of the sealing substrate are formed. Is bonded through the adhesive layer, so that the adhesion reliability can be improved and the durability of the solar cell can be improved.
  • FIG. 2 is a sectional view taken along line AA in FIG. 1.
  • FIG. 2 is a sectional view taken along line AA in FIG. 1.
  • FIG. 7 is a sectional view taken along line BB in FIGS. 5 and 6. It is the schematic plan view and sectional drawing which show the other example of the solar cell of this invention.
  • the solar cell of the present invention was formed so as to surround the periphery of the photoelectric conversion element on the transparent resin substrate, the photoelectric conversion element formed on the transparent resin substrate, and the transparent resin substrate.
  • An adhesive inorganic layer, an adhesive layer disposed on the adhesive inorganic layer, a sealing substrate disposed on the adhesive layer and having an inorganic barrier layer, the photoelectric conversion element and the above The said transparent resin base material in which the inorganic layer for adhesion
  • FIGS. 1 and 2 are a schematic plan view and a sectional view showing an example of the solar cell of the present invention
  • FIG. 2 is a sectional view taken along line AA of FIG.
  • a solar cell 1 shown in FIGS. 1 and 2 is formed on a transparent resin substrate 2 and a transparent resin substrate 2, and a first electrode layer 11, a photoelectric conversion layer 12, and a second electrode layer 13 are sequentially stacked.
  • the adhesive layer 4 is disposed so as to cover the surface, and the sealing substrate 6 is disposed on the adhesive layer 4 and is composed of the inorganic barrier layer 5.
  • the sealing substrate 6 made of the inorganic barrier layer 5 is, for example, a metal foil.
  • attachment were formed, and the sealing base material 6 which consists of an inorganic barrier layer 5 are bonded through the adhesive bond layer 4.
  • the solar cell 1 has a light-receiving surface on the transparent resin base material 2 side.
  • the 1st electrode layer, photoelectric conversion layer, and 2nd electrode layer which comprise a photoelectric conversion element may not be laminated
  • FIGS. 1 and 3 are a schematic plan view and a sectional view showing another example of the solar cell of the present invention, and FIG. 3 is a sectional view taken along line AA of FIG.
  • a solar cell 1 shown in FIGS. 1 and 3 is formed on a transparent resin substrate 2 and a transparent resin substrate 2, and a first electrode layer 11, a photoelectric conversion layer 12, and a second electrode layer 13 are sequentially stacked.
  • the adhesive layer 4 is disposed so as to cover the sealing layer 4, and the sealing substrate 6 is disposed on the adhesive layer 4, and the inorganic barrier layer 5 is formed on the plastic film 7.
  • the sealing substrate 6 in which the inorganic barrier layer 5 is formed on the plastic film 7 is, for example, a barrier film.
  • attachment were formed, and the inorganic barrier layer 5 of the sealing base material 6 are bonded through the adhesive bond layer 4.
  • the solar cell 1 has a light-receiving surface on the transparent resin base material 2 side.
  • the 1st electrode layer, photoelectric conversion layer, and 2nd electrode layer which comprise a photoelectric conversion element may not be laminated
  • the adhesive layer and the sealing substrate are omitted.
  • the bonding inorganic layer 3 and the inorganic barrier layer 5 are both made of an inorganic material, it is possible to ensure good adhesive strength at the interface between the bonding inorganic layer 3 and the inorganic barrier layer 5. it can. Therefore, moisture permeation from the adhesion interface can be prevented at the outer peripheral portion of the solar cell 1.
  • the second electrode layer 13 is generally made of an inorganic material such as a metal, the adhesiveness is good even at the interface between the second electrode layer 13 and the inorganic barrier layer 5. Therefore, the transparent resin substrate 2 on which the photoelectric conversion element 10 and the bonding inorganic layer 3 are formed and the inorganic barrier layer 5 of the sealing substrate 6 can be brought into close contact over almost the entire surface.
  • the adhesive inorganic layer is formed on the transparent resin substrate so as to surround the periphery of the photoelectric conversion element, and the photoelectric conversion element and the adhesive inorganic layer are formed.
  • the inorganic barrier layer of the sealing substrate are bonded via an adhesive layer, so that the inorganic layer for bonding and the inorganic barrier layer are bonded via an adhesive layer around the photoelectric conversion element.
  • both the transparent resin base material and the sealing base material can have flexibility, and a roll-to-roll can form a photoelectric conversion element on the transparent resin base material.
  • the transparent resin substrate on which the photoelectric conversion element and the inorganic layer for adhesion are formed and the inorganic barrier layer of the sealing substrate can be bonded, and a highly reliable solar cell is efficiently manufactured at low cost. It becomes possible.
  • Adhesive Inorganic Layer The adhesive inorganic layer in the present invention is formed on the transparent resin substrate so as to surround the periphery of the photoelectric conversion element.
  • the material used for the inorganic layer for adhesion is not particularly limited as long as it is an inorganic material.
  • the material may have conductivity or insulation.
  • the conductive material is not particularly limited as long as it is an inorganic substance having conductivity, and examples thereof include metals, alloys, oxides, and nitrides.
  • the insulating material is not particularly limited as long as it is an inorganic material having insulating properties, and examples thereof include oxides and nitrides. These materials may be used alone or in combination of two or more.
  • the inorganic layer for adhesion may or may not have light transmittance.
  • attachment consists of at least one layer among the layers which comprise a photoelectric conversion element. This is because the adhesive inorganic layer can be formed at the same time as the production of the photoelectric conversion element, and a separate step of forming the adhesive inorganic layer is not necessary.
  • the bonding inorganic layer is composed of at least one layer constituting the photoelectric conversion element, the bonding inorganic layer is appropriately selected according to the configuration of the photoelectric conversion element and the solar cell.
  • the inorganic layer for adhesion can be composed of a first electrode layer or a second electrode layer.
  • the adhesive inorganic layer cannot be composed of the second electrode layer. It is preferable to consist of layers other than a 2nd electrode layer.
  • the adhesive inorganic layer is preferably composed of the first electrode layer or at least one of the layers constituting the first electrode layer. This is because when the first electrode layer is formed on the transparent resin substrate, the bonding inorganic layer can be formed simultaneously. In the formation of the first electrode layer, when patterning is performed after forming a metal thin film or conductive film on one surface of the transparent resin substrate, an adhesive inorganic layer can be simultaneously formed during patterning, and the number of processes is increased. It is possible to form an adhesive inorganic layer.
  • the adhesive inorganic layer is appropriately selected according to the configuration of the first electrode layer.
  • the first electrode layer may be a transparent electrode layer or a patterned metal electrode layer, and the transparent electrode layer and the patterned metal electrode layer are laminated in any order. Also good. Therefore, when the first electrode layer is a transparent electrode layer, the bonding inorganic layer can be a transparent electrode layer.
  • the inorganic layer for bonding can be composed of a metal electrode layer.
  • the bonding inorganic layer may be a metal electrode layer or a transparent electrode layer. It may be a thing.
  • the first electrode layer is a transparent electrode layer
  • the bonding inorganic layer is a transparent electrode layer
  • the first electrode layer is a patterned metal electrode layer
  • the inorganic layer for adhesion consists of a metal electrode layer.
  • the inorganic layer for adhesion is preferably composed of a metal electrode layer. Since the resistance can be low as will be described later, the first electrode layer may be a patterned metal electrode layer, or a transparent electrode layer and a patterned metal electrode layer may be laminated in any order. Preferably, patterning is required to form a patterned metal electrode layer, and therefore it is possible to form an adhesive inorganic layer without increasing the number of steps. Further, as will be described later, when the sealing substrate is a metal foil, the metal electrode layer and the metal foil are bonded through the adhesive layer around the photoelectric conversion element. This is because adhesion is possible.
  • the formation position of the bonding inorganic layer is not particularly limited as long as the bonding inorganic layer is formed on the transparent resin substrate so as to surround the photoelectric conversion element.
  • the bonding inorganic layer 3 may be formed so as to surround the entire periphery of the photoelectric conversion element 10.
  • 4B is a cross-sectional view taken along the line AA in FIG. 4A.
  • the bonding inorganic layer 3 is composed of the first electrode layer 11, and the bonding inorganic layer.
  • the layer 3 and the first electrode layer 11 are formed continuously, and the inorganic insulating layer 8 is formed between the bonding inorganic layer 3 and the second electrode layer 13. Further, as shown in FIGS.
  • the bonding inorganic layer 3 has a notch, and the bonding inorganic layer 3 having the notch is formed so as to surround the photoelectric conversion element 10. It may be. 7 is a cross-sectional view taken along the line BB of FIGS. 5 and 6.
  • the bonding inorganic layer 3 is composed of the first electrode layer 11, and a part of the bonding inorganic layer 3 is the first layer. It is formed continuously with one electrode layer 11.
  • attachment may be formed so that the circumference
  • 8B is a cross-sectional view taken along the line CC of FIG.
  • the bonding inorganic layers 3a and 3b are each composed of the first electrode layer 11, and The bonding inorganic layer 3 a is formed continuously with the first electrode layer 11.
  • the bonding inorganic layer 3 is formed so as to surround the entire periphery of the photoelectric conversion element 10, the photoelectric conversion element 10 is hermetically sealed from the adhesion interface. Moisture permeability can be effectively prevented. Further, as illustrated in FIGS.
  • FIG.4 (a) the photoelectric conversion element 10 is shown with the dashed-dotted line, and a part of the inorganic layer 3 for adhesion, or 3a, 3b is shown with the broken line.
  • the region not surrounded by the adhesive inorganic layer is as small as possible in order to ensure adhesive strength.
  • the plurality of photoelectric conversion elements 10 are grouped so as to surround the group of photoelectric conversion elements 10 as illustrated in FIG.
  • the bonding inorganic layer 3 may be formed, and although not shown, the bonding inorganic layer may be formed so as to surround the plurality of photoelectric conversion elements.
  • the bonding inorganic layer 3 is usually formed only on the outer peripheral portion of the transparent resin base material 2 as illustrated in FIG. In FIG. 9, the adhesive layer and the sealing substrate are omitted.
  • the shape of the bonding inorganic layer is not particularly limited as long as the bonding inorganic layer can be disposed on the transparent resin base so as to surround the photoelectric conversion element.
  • a square shape as shown in FIGS. 1 and 4A, a U shape as shown in FIG. 8A, a shape having a notch as shown in FIGS. can do.
  • the thickness of the adhesive inorganic layer is not particularly limited as long as the adhesive strength with the inorganic barrier layer of the sealing substrate can be secured.
  • the bonding inorganic layer is composed of a layer constituting the photoelectric conversion element, the thickness of the layer becomes the thickness of the bonding inorganic layer.
  • the width of the bonding inorganic layer is not particularly limited as long as the bonding strength with the inorganic barrier layer of the sealing substrate can be secured. Since it is considered that the durability is improved as the width of the adhesive inorganic layer is larger, it is preferable that the width of the adhesive inorganic layer is relatively larger in a solar cell requiring durability.
  • the method for forming the adhesive inorganic layer is not particularly limited as long as it can form the adhesive inorganic layer on the transparent resin substrate so as to surround the photoelectric conversion element. Any of them can be adopted, and it is appropriately selected according to the kind of the inorganic layer for bonding, the kind of material, and the like.
  • the bonding inorganic layer is composed of a layer constituting the photoelectric conversion element, the bonding inorganic layer is formed simultaneously with the formation of the layer.
  • an inorganic insulating layer is formed on a part of the bonding inorganic layer in order to take out electricity without short-circuiting the first electrode layer and the second electrode layer. May be.
  • the inorganic insulating layer 8 may be formed between the bonding inorganic layer 3 and the second electrode layer 13.
  • the material used for the inorganic insulating layer is not particularly limited as long as it is an inorganic material having an insulating property, and a general inorganic insulating layer material provided to prevent short-circuiting of electrodes can be employed, for example, Mention may be made of silicon oxide. More specifically, the inorganic insulating layer can be formed using polysilazane. As a method for forming the inorganic insulating layer, a wet process such as a sol-gel method or a polysilazane method based on a hydrolysis reaction of polysilazane is preferably used.
  • the thickness of the inorganic insulating layer is not particularly limited as long as it is a thickness capable of insulating the conductive inorganic layer and the first electrode layer or the second electrode layer, and is provided to prevent short-circuiting of the electrodes. It can be set as the thickness of a general inorganic insulating layer.
  • the sealing base material used for this invention has an inorganic barrier layer, and it was arrange
  • the term “having an inorganic barrier layer” as used in the sealing substrate is a concept including a case where the sealing substrate is formed of an inorganic barrier layer and a case where an inorganic barrier layer and an arbitrary layer are included.
  • the sealing base material is , Having an inorganic barrier layer on at least one of the outermost surfaces.
  • the sealing substrate is not particularly limited as long as it has an inorganic barrier layer on at least one of the outermost surfaces.
  • the sealing substrate includes the inorganic barrier layer 5 as illustrated in FIG. It may be a thing, and may have the inorganic barrier layer 5 and arbitrary layers (in FIG. 3, the plastic film 7) so that it may illustrate in FIG.
  • the sealing substrate has an inorganic barrier layer and an optional layer
  • the sealing substrate is not particularly limited as long as it has an inorganic barrier layer on at least one of the outermost surfaces.
  • the plastic film 7 may have an inorganic barrier layer 5 formed on one side, and although not shown, the plastic film may have an inorganic barrier layer formed on both sides.
  • a plurality of types of inorganic barrier layers may be laminated on one side or both sides of the film, or organic layers and inorganic barrier layers may be alternately laminated on one side or both sides of the plastic film.
  • the inorganic barrier layer may or may not have light transmittance. Further, the inorganic barrier layer may have conductivity or may have insulating properties.
  • the material used for the inorganic barrier layer constituting the sealing substrate is not particularly limited as long as it is an inorganic substance that exhibits barrier properties, and a general inorganic barrier layer material can be used, for example, Examples include metals, alloys, oxides, and nitrides. These materials may be used alone or in combination of two or more.
  • Examples thereof include compounds containing lead (Pb), zirconium (Zr), yttrium (Y), and the like.
  • a silicon compound or an aluminum compound is preferable.
  • the silicon compound include silicon oxynitride (SiON), silicon oxide (SiO 2 ), silicon oxynitride carbide (SiONC), silicon oxide carbide (SiOC), silicon nitride (SiN), and silicon nitride carbide (SiNC).
  • SiON silicon oxide
  • SiO 2 silicon oxynitride carbide
  • SiOC silicon oxide carbide
  • SiN silicon nitrid
  • the aluminum compound examples include aluminum oxide (Al 2 O 3 ), aluminum oxynitride (AlON), aluminum oxynitride carbide (AlONC), aluminum nitride (AlN), and aluminum nitride carbide (AlNC).
  • an oxide is preferable. This is because the oxide has light transmittance and is stable in the air atmosphere.
  • silicon oxide (SiO 2 ), silicon oxynitride (SiON), titanium oxide (TiO 2 ), indium tin oxide (ITO), antimony tin oxide (ATO), aluminum zinc oxide (AZO), Gallium zinc oxide (GZO), zinc oxide (ZnO), aluminum oxide (Al 2 O 3 ), or the like can be used.
  • a silicon compound is preferable, and silicon oxide (SiO 2 ) and silicon oxynitride (SiON) are preferable. This is because these materials are excellent in light transmittance and barrier properties.
  • the sealing base material since the transparent resin base material side is the light receiving surface, the sealing base material may or may not have optical transparency. Moreover, the sealing base material may have electroconductivity and may have insulation.
  • a sealing base material has flexibility. Roll-to-roll allows the transparent resin substrate with the photoelectric conversion element and the inorganic layer for bonding to be bonded to the inorganic barrier layer of the sealing substrate, improving productivity and mass productivity and reducing costs This is because it is possible to achieve this.
  • the sealing substrate has “flexibility” means that it bends when a force of 5 KN is applied in the bending test method of fine ceramics of JIS R 1601 or the bending test method of metal materials of JIS Z 2248. .
  • the sealing substrate is not particularly limited as long as it has an inorganic barrier layer, can seal the element, and has a predetermined strength, depending on the configuration of the sealing substrate. It is selected appropriately.
  • the sealing substrate is composed of an inorganic barrier layer
  • examples of the sealing substrate include metal foil.
  • the metal foil material include aluminum, copper, copper alloy, phosphor bronze, stainless steel (SUS), gold, gold alloy, nickel, nickel alloy, silver, silver alloy, tin, tin alloy, titanium, iron, and iron.
  • An alloy, zinc, molybdenum, etc. are mentioned.
  • aluminum is preferable because it is lightweight and inexpensive.
  • SUS is also preferable because it has excellent durability, oxidation resistance, and heat resistance, and has a low linear thermal expansion coefficient and excellent dimensional stability.
  • a sealing base material has an inorganic barrier layer and arbitrary layers
  • a barrier film is mentioned, for example.
  • the barrier film is not particularly limited as long as it has an inorganic barrier layer on at least one of the outermost surfaces, and a general barrier film can be used.
  • Commercially available barrier films can also be used.
  • An example of a commercially available barrier film is a tech barrier manufactured by Mitsubishi Plastics.
  • the sealing substrate is preferably a metal foil or a barrier film, and among them, a metal foil is preferable because of excellent barrier properties and impact resistance.
  • the thickness of the sealing substrate is appropriately selected according to the type of the sealing substrate and the use of the solar cell.
  • the thickness of the sealing substrate is usually about 30 ⁇ m to 1000 ⁇ m, preferably in the range of 30 ⁇ m to 500 ⁇ m, more preferably in the range of 30 ⁇ m to 200 ⁇ m.
  • the thickness of the sealing substrate is usually about 50 ⁇ m to 2000 ⁇ m, preferably in the range of 100 ⁇ m to 1800 ⁇ m, more preferably in the range of 100 ⁇ m to 1500 ⁇ m. If the sealing substrate is too thin, barrier properties cannot be expected, and if it is too thick, flexibility may not be obtained.
  • Transparent resin base material The transparent resin base material used for this invention supports a photoelectric conversion element etc.
  • the transparent resin substrate side serves as the light receiving surface
  • the transparent resin substrate has light transmittance.
  • a transparent resin base material has flexibility.
  • a photoelectric conversion element can be produced on a transparent resin substrate, and the transparent resin substrate on which the photoelectric conversion element and the inorganic layer for adhesion are formed is bonded to the inorganic barrier layer of the sealing substrate. This is because productivity and mass productivity can be improved and costs can be reduced.
  • flexible transparent resin base materials are excellent in processability, and are useful in realizing lightweight, thin, and hard-to-break solar cells, and can be applied to various applications such as curved surfaces. Because it spreads.
  • Examples of the resin used for such a transparent resin substrate include fluorine resin, polyethylene, polypropylene, polyvinyl chloride, polyvinyl fluoride, polystyrene, ABS resin, polyamide, polyacetal, polyester, polycarbonate, modified polyphenylene ether, and polysulfone.
  • Polyarylate polyetherimide, polyethersulfone, polyamideimide, polyimide, polyphenylene sulfide, liquid crystalline polyester, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polymicroxylene dimethylene terephthalate, polyoxymethylene, polyether Sulfone, polyether ether ketone, polyacrylate, acrylonitrile-styrene resin, phenol resin, urine Resins, melamine resins, unsaturated polyester resins, epoxy resins, polyurethane, silicone resin, amorphous polyolefins, and the like. You may use these as a 1 type, or 2 or more types of copolymer.
  • the thickness of the transparent resin substrate is appropriately selected depending on the use of the solar cell, etc., but is usually about 50 ⁇ m to 2000 ⁇ m, preferably within the range of 100 ⁇ m to 1800 ⁇ m, more preferably within the range of 100 ⁇ m to 200 ⁇ m. is there. If the transparent resin substrate is too thin, sufficient strength cannot be obtained, and if it is too thick, flexibility may not be obtained.
  • Adhesive layer The adhesive layer in this invention is arrange
  • attachment were formed through the adhesive bond layer and the inorganic barrier layer of a sealing base material are bonded.
  • the formation position of the adhesive layer is not particularly limited as long as the adhesive layer is disposed on the adhesive inorganic layer, and the adhesive layer is disposed on at least a part of the adhesive inorganic layer. Just do it.
  • the adhesive bond layer may be arrange
  • the adhesive bond layer is arrange
  • the gap between the photoelectric conversion element and the sealing substrate can be eliminated, and the transparent resin substrate and the sealing substrate on which the photoelectric conversion element and the inorganic layer for adhesion are formed are formed. This is because the adhesive force with the inorganic barrier layer can be improved and the penetration of moisture and oxygen can be more effectively suppressed.
  • the adhesive used for the adhesive layer is particularly limited as long as it can paste the transparent resin base material on which the photoelectric conversion element and the inorganic layer for adhesion are formed and the inorganic barrier layer of the sealing base material.
  • a general adhesive used for sealing a solar cell can be used, and among them, a synthetic resin adhesive is preferable.
  • a synthetic resin adhesive for example, a thermosetting adhesive or a photocurable adhesive can be used.
  • epoxy resin, acrylic resin, ionomer resin, urethane resin, ethylene vinyl acetate copolymer resin, and the like can be mentioned.
  • High Milan (thermosetting adhesive) manufactured by Mitsui DuPont Polychemical Co., Ltd.
  • thermosetting adhesive examples include 3021J (UV curable adhesive) manufactured by ThreeBond Co., Ltd.
  • thermosetting adhesive examples include 3021J (UV curable adhesive) manufactured by ThreeBond Co., Ltd.
  • a thermosetting adhesive is preferable.
  • the sealing substrate has light transmittance, both a thermosetting adhesive and a photocurable adhesive can be used.
  • the method for arranging the adhesive is not particularly limited as long as the method can arrange the adhesive on the entire surface of the transparent resin substrate or the sealing substrate.
  • a method of applying a liquid adhesive And a method of disposing a sheet-like adhesive.
  • the method for applying the liquid adhesive is not particularly limited as long as it is a method capable of applying the liquid adhesive to the entire surface of the transparent resin substrate or the sealing substrate.
  • the micro gravure coating method is used. , Gravure coating method, bar coating method, roll coating method, wire bar coating method, dip coating method, flexographic printing method, offset printing method, screen printing method and the like.
  • the target for arranging the adhesive may be on the inorganic barrier layer of the sealing substrate, or on the transparent resin substrate on which the photoelectric conversion element and the bonding inorganic layer are formed.
  • a liquid adhesive it is preferable to apply a liquid adhesive on the inorganic barrier layer of the sealing substrate in order to reduce the influence of the liquid adhesive on the photoelectric conversion element. .
  • Photoelectric conversion element The photoelectric conversion element in the present invention is formed on a transparent resin substrate.
  • any solar cell can be used as long as it constitutes a solar cell and sealing is necessary or suitable.
  • silicon such as a single crystal silicon solar cell element, a polycrystalline silicon solar cell element, and an amorphous silicon solar cell element.
  • Organic solar cell elements such as solar cell elements, compound semiconductor solar cell elements, organic thin film solar cell elements, and dye-sensitized solar cell elements. Among these, organic solar cell elements having a photoelectric conversion layer containing an organic compound are preferable because deterioration due to moisture is remarkable.
  • organic solar cell elements as described above, for example, organic thin film solar cell elements and Examples thereof include a dye-sensitized solar cell element. In particular, an organic thin film solar cell element is suitable.
  • the photoelectric conversion element will be described.
  • the case where the first electrode layer, the photoelectric conversion layer, and the second electrode layer constituting the photoelectric conversion element are formed in this order will be described.
  • the layers are not necessarily laminated in this order, and the layers may be arranged side by side without being laminated.
  • any one of the first electrode layer, the photoelectric conversion layer, and the second electrode layer may also serve as another layer.
  • the 1st electrode layer used for this invention is formed on a transparent resin base material.
  • the first electrode layer is not particularly limited as long as it becomes an electrode on the light receiving surface side, and may be a transparent electrode layer. It may be a metal electrode layer having a shape, or a transparent electrode layer and a metal electrode layer having a pattern shape laminated in any order.
  • the first electrode layer is a patterned metal electrode layer or when the transparent electrode layer and the patterned metal electrode layer are laminated, the resistance can be reduced and the generated power can be efficiently used. It can collect current well.
  • the transparent electrode layer and the patterned metal electrode layer will be described.
  • the material of the transparent electrode layer used in the present invention is not particularly limited as long as it has conductivity and light transmittance.
  • ITO indium tin oxide
  • indium examples thereof include conductive inorganic oxides such as zinc oxide (IZO), aluminum zinc oxide (AZO), fluorine-containing tin oxide (FTO), tin oxide, and zinc oxide.
  • the transparent electrode layer may be a single layer or a multilayer in which materials having different work functions are laminated.
  • the thickness of the transparent electrode layer is appropriately selected according to the type of photoelectric conversion element.
  • the thickness of the transparent electrode layer should be within a range of 0.1 nm to 500 nm when the thickness is a single layer and the total thickness when the layer is a multilayer. In particular, the thickness is preferably in the range of 1 nm to 300 nm. If the thickness of the transparent electrode layer is thinner than the above range, the sheet resistance of the transparent electrode layer becomes too large, and the generated charge may not be sufficiently transmitted to the external circuit, while the thickness of the transparent electrode layer is more than the above range. This is because if it is thick, the total light transmittance is lowered, and the photoelectric conversion efficiency may be lowered.
  • the transparent electrode layer may be formed on one surface on the transparent resin substrate, or may be formed in a pattern.
  • a method for forming the transparent electrode layer a general method for forming an electrode can be used.
  • the metal electrode layer used in the present invention is formed in a pattern on a transparent resin substrate.
  • the metal electrode layer usually has a smaller resistance than the transparent electrode layer.
  • a metal or an alloy is usually used as a material of the metal electrode layer.
  • a metal or an alloy is usually used.
  • Al, Au, Ag, and Cu are preferable.
  • the metal electrode layer may be a single layer made of the above-described metal or alloy, and in order to improve adhesion to the transparent resin substrate or the transparent electrode layer, contact with the layer made of the above-mentioned metal or alloy.
  • a layer may be appropriately laminated.
  • the material for the contact layer include nickel (Ni), chromium (Cr), nickel chromium (Ni—Cr), titanium (Ti), and tantalum (Ta).
  • the contact layer is provided to obtain adhesion between the metal electrode layer and the transparent resin base material or transparent electrode layer, and may be formed only on one side of the above-mentioned metal or alloy layer. May be.
  • the shape of the metal electrode layer is not particularly limited as long as it is a pattern, and is appropriately selected depending on desired conductivity, light transmittance, strength, and the like.
  • the metal electrode layer may have a mesh-like mesh portion and a frame portion arranged around the mesh portion, or may be composed of a mesh-like mesh portion.
  • the frame part is arranged so as to surround the four sides of the mesh part.
  • it may be arranged so as to surround three sides of the mesh part, may be arranged so as to surround two sides of the mesh part, or may be arranged on one side of the mesh part.
  • the frame part is arrange
  • the shape of the mesh portion is not particularly limited as long as it is a mesh shape, and is appropriately selected depending on desired conductivity, light transmittance, strength, and the like.
  • a polygon such as a triangle, a quadrangle, and a hexagon, a circular lattice, and the like can be given.
  • Polygonal or circular “lattice” refers to a shape in which polygonal or circular openings are periodically arranged.
  • polygonal or circular lattice shape for example, polygonal openings may be arranged in a straight line or zigzag.
  • the shape of the mesh portion is preferably a hexagonal lattice shape or a parallelogram lattice shape. This is because the current flowing through the mesh portion can be prevented from being concentrated locally.
  • the hexagonal openings are arranged in a zigzag (so-called honeycomb shape).
  • the acute angle of the parallelogram is preferably within the range of 40 ° to 80 °, more preferably within the range of 50 ° to 70 °, and even more preferably 55 ° to 65 °. Within the range of °.
  • the metal electrode layer itself basically does not transmit light, light enters the photoelectric conversion layer from the opening of the mesh portion of the metal electrode layer. Therefore, it is preferable that the opening part of the mesh part of a metal electrode layer is comparatively large. Specifically, the ratio of the openings in the mesh portion of the metal electrode layer is preferably about 50% to 98%, more preferably in the range of 70% to 98%, and still more preferably 80% to 98%. Is within the range.
  • the pitch of the openings in the mesh part of the metal electrode layer and the line width of the mesh part are appropriately selected according to the area of the entire metal electrode layer and the like.
  • the line width of the frame part is appropriately selected according to the area of the entire metal electrode layer and the like.
  • the thickness of the metal electrode layer is not limited as long as it does not cause a short circuit between the first electrode layer and the second electrode layer, and is formed between the first electrode layer and the second electrode layer. It is appropriately selected according to the thickness of the photoelectric conversion layer or the like and the type of the photoelectric conversion element.
  • the thickness of the metal electrode layer is preferably in the range of 100 nm to 1000 nm, more preferably in the range of 200 nm to 800 nm, more preferably in the range of 200 nm to 500 nm. It is preferably in the range of 200 nm to 400 nm.
  • the lamination order of the transparent electrode layer and the patterned metal electrode layer is not particularly limited, A transparent electrode layer and a patterned metal electrode layer may be laminated in this order on the transparent resin substrate, or a patterned metal electrode layer and a transparent electrode layer may be laminated in this order on the transparent resin substrate. Especially, it is preferable that it is laminated
  • the method for forming the metal electrode layer is not particularly limited, and examples thereof include a method in which a metal thin film is formed on one surface and then patterned in a mesh shape, and a method in which a mesh conductor is directly formed. These methods are appropriately selected according to the material and configuration of the metal electrode layer.
  • the method for forming the metal thin film is preferably a vacuum film forming method such as a vacuum deposition method, a sputtering method, or an ion plating method.
  • the metal species formed by the vacuum film formation method has less inclusions than the plating film and can reduce the specific resistance, and can also reduce the specific resistance as compared with those formed using Ag paste or the like.
  • a vacuum film formation method is also suitable as a method for forming a metal thin film having a thickness of 1 ⁇ m or less, preferably 500 nm or less, with a precise thickness and a uniform thickness.
  • the method for patterning the metal thin film is not particularly limited as long as it can be accurately formed into a desired pattern, and examples thereof include a photoetching method.
  • Second electrode layer The second electrode layer used in the present invention is an electrode facing the first electrode layer.
  • the second electrode layer since the transparent resin substrate side is the light receiving surface, the second electrode layer may or may not have light transmittance.
  • the material of the second electrode layer is not particularly limited as long as it has conductivity, and metals, alloys, inorganic fluorides, inorganic oxides, and the like can be used.
  • metals, alloys, inorganic fluorides, inorganic oxides, and the like can be used.
  • the second electrode layer may be a single layer or a multilayer in which materials having different work functions are stacked. Examples of the second electrode layer in which different materials are laminated include those in which any one of Ca, LiF, LiCa, MoO 3 or VO 5 and any one of Al or Ag is laminated.
  • the thickness of the second electrode layer is appropriately selected according to the type of photoelectric conversion element.
  • the thickness of the second electrode layer is within the range of 0.1 nm to 500 nm in the case of a single layer and the total thickness in the case of a multilayer. In particular, it is preferably in the range of 1 nm to 300 nm.
  • the thickness of the second electrode layer is thinner than the above range, the sheet resistance of the second electrode layer becomes too large, and the generated charge may not be sufficiently transmitted to the external circuit.
  • the second electrode layer may be formed on one surface of the photoelectric conversion layer, or may be formed in a pattern.
  • a method for forming the second electrode layer a general electrode forming method can be used.
  • Photoelectric conversion layer used for this invention is suitably selected according to the kind of photoelectric conversion element.
  • the photoelectric conversion element is a silicon-based solar cell element such as a single crystal silicon solar cell element, a polycrystalline silicon solar cell element, or an amorphous silicon solar cell element
  • the photoelectric conversion layer is formed of single crystal silicon or polycrystalline silicon, respectively.
  • a layer containing amorphous silicon is a layer containing gallium-arsenic, copper-indium-selenium, copper-indium-gallium-selenium, cadmium-tellurium, or the like.
  • the photoelectric conversion layer is a layer containing an organic semiconductor, and the organic compound contained in the photoelectric conversion layer is an organic semiconductor.
  • the photoelectric conversion element is a dye-sensitized solar cell element
  • the photoelectric conversion layer is a layer containing an oxide semiconductor on which a dye sensitizer is supported, and the organic compound contained in the photoelectric conversion layer is a dye sensitizer. It is.
  • the photoelectric conversion layer of the photoelectric conversion element a known layer can be appropriately used according to the type of the photoelectric conversion element.
  • the photoelectric conversion element is an organic solar cell element.
  • An organic thin film solar cell element is particularly preferable.
  • a photoelectric conversion layer in the case where the photoelectric conversion element is an organic thin film solar cell element which is one of the organic solar cell elements will be described as an example.
  • the “photoelectric conversion layer” in the organic thin film solar cell element refers to a member that contributes to charge separation of the organic thin film solar cell and has a function of transporting generated electrons and holes toward electrodes in opposite directions.
  • the photoelectric conversion layer may be a single layer having both an electron-accepting function and an electron-donating function (first aspect), or an electron-accepting layer having an electron-accepting function and an electron-donating function.
  • a layer in which an electron donating layer having n is laminated may be used (second embodiment).
  • the 1st aspect of the photoelectric converting layer in an organic thin-film solar cell element is a single layer which has both an electron-accepting function and an electron-donating function, and an electron-donating material and an electron-accepting material are used. It contains.
  • this photoelectric conversion layer since charge separation occurs using a pn junction formed in the photoelectric conversion layer, it functions as a photoelectric conversion layer alone.
  • the electron donating material is not particularly limited as long as it has a function as an electron donor, but it is preferable that the material can be formed by a wet coating method.
  • a polymer material is preferred.
  • a conductive polymer is a so-called ⁇ -conjugated polymer, which is composed of a ⁇ -conjugated system in which double bonds or triple bonds containing carbon-carbon or hetero atoms are alternately linked to single bonds, and exhibits semiconducting properties. It is. In the conductive polymer material, ⁇ conjugation is developed in the polymer main chain, so that charge transport in the main chain direction is basically advantageous.
  • the electron transfer mechanism of the conductive polymer is mainly hopping conduction between molecules by ⁇ stacking, it is advantageous not only for the main chain direction of the polymer but also for the charge transport in the film thickness direction of the photoelectric conversion layer. is there.
  • the conductive polymer material can be easily formed by a wet coating method using a coating solution in which the conductive polymer material is dissolved or dispersed in a solvent, a large-area organic thin film solar cell Can be manufactured at low cost without requiring expensive equipment.
  • Examples of the electron-donating conductive polymer material include polyphenylene, polyphenylene vinylene, polysilane, polythiophene, polycarbazole, polyvinyl carbazole, porphyrin, polyacetylene, polypyrrole, polyaniline, polyfluorene, polyvinyl pyrene, polyvinyl anthracene, and derivatives thereof. And copolymers thereof, or phthalocyanine-containing polymers, carbazole-containing polymers, organometallic polymers, and the like.
  • thiophene-fluorene copolymer polyalkylthiophene, phenylene ethynylene-phenylene vinylene copolymer, phenylene ethynylene-thiophene copolymer, phenylene ethynylene-fluorene copolymer, fluorene-phenylene vinylene copolymer
  • a thiophene-phenylene vinylene copolymer is preferably used. This is because the energy level difference is appropriate for many electron-accepting materials.
  • a phenylene ethynylene-phenylene vinylene copolymer Poly [1,4-phenyleneethynylene-1,4- (2,5-dioctadodecyloxyphenylene) -1,4-phenyleneethene-1,2-diyl-1,4- ( 2,5-dioctadodecyloxyphenylene) ethene-1,2-diyl]
  • the electron-accepting material is not particularly limited as long as it has a function as an electron acceptor, but it is preferable that it can be formed into a film by a wet coating method.
  • a conductive polymer material is preferable. This is because the conductive polymer material has the advantages as described above.
  • Examples of the electron-accepting conductive polymer material include polyphenylene vinylene, polyfluorene, and derivatives thereof, and copolymers thereof, or carbon nanotubes, fullerene derivatives, CN group or CF 3 group-containing polymers, and the like. And —CF 3 substituted polymer.
  • polyphenylene vinylene derivative examples include CN-PPV (Poly [2-Methoxy-5- (2′-ethylhexyloxy) -1,4- (1-cyanovinylene) phenylene]), MEH-CN-PPV (Poly [2 -Methoxy-5- (2′-ethylhexyloxy) -1,4- (1-cyanovinylene) phenylene]) and the like.
  • an electron accepting material doped with an electron donating compound, an electron donating material doped with an electron accepting compound, or the like can be used.
  • a conductive polymer material doped with an electron donating compound or an electron accepting compound is preferably used.
  • Conductive polymer materials are basically advantageous in charge transport in the direction of the main chain because of the development of ⁇ conjugation in the polymer main chain, and are doped with electron-donating compounds and electron-accepting compounds. This is because electric charges are generated in the ⁇ -conjugated main chain, and the electrical conductivity can be greatly increased.
  • Examples of the electron-accepting conductive polymer material doped with the electron-donating compound include the above-described electron-accepting conductive polymer material.
  • a Lewis base such as an alkali metal such as Li, K, Ca, or Cs or an alkaline earth metal can be used.
  • the Lewis base acts as an electron donor.
  • the electron-donating conductive polymer material doped with the electron-accepting compound include the above-described electron-donating conductive polymer material.
  • a Lewis acid such as FeCl 3 (III), AlCl 3 , AlBr 3 , AsF 6 or a halogen compound can be used. In addition, Lewis acid acts as an electron acceptor.
  • the film thickness of the photoelectric conversion layer As the film thickness of the photoelectric conversion layer, the film thickness generally employed in bulk heterojunction organic thin-film solar cells can be employed. Specifically, it can be set within the range of 0.2 nm to 3000 nm, and preferably within the range of 1 nm to 600 nm. This is because when the film thickness is thicker than the above range, the volume resistance in the photoelectric conversion layer may increase. On the other hand, if the film thickness is thinner than the above range, light may not be sufficiently absorbed.
  • the mixing ratio of the electron-donating material and the electron-accepting material is appropriately adjusted to an optimal mixing ratio depending on the type of material used.
  • the method for forming the photoelectric conversion layer is not particularly limited as long as it can be uniformly formed in a predetermined film thickness, but a wet coating method is preferably used. This is because if the wet coating method is used, the photoelectric conversion layer can be formed in the air, and the cost can be reduced and the area can be easily increased.
  • the method for applying the photoelectric conversion layer forming coating liquid is not particularly limited as long as it is a method capable of uniformly applying the photoelectric conversion layer forming coating liquid.
  • a die coating method or a spin coating method is used. Dip coating method, roll coating method, bead coating method, spray coating method, bar coating method, gravure coating method, ink jet method, screen printing method, offset printing method and the like.
  • coating method of the coating liquid for photoelectric conversion layer formation is a method which can adjust thickness mainly according to an application amount.
  • Methods that can adjust the thickness mainly according to the coating amount include, for example, a die coating method, a bead coating method, a bar coating method, a gravure coating method, an ink jet method, a screen printing method, and an offset printing method. Can be mentioned.
  • the printing method is suitable for increasing the area of the organic thin film solar cell.
  • a drying treatment for drying the formed coating film may be performed. It is because productivity can be improved by removing the solvent etc. which are contained in the coating liquid for photoelectric conversion layer formation at an early stage.
  • a drying method for example, a general method such as heat drying, air drying, vacuum drying, infrared heat drying, or the like can be used.
  • the 2nd aspect of the photoelectric converting layer in an organic thin-film solar cell element is a laminate of an electron accepting layer having an electron accepting function and an electron donating layer having an electron donating function. It is.
  • the electron-accepting layer and the electron-donating layer will be described.
  • the electron-accepting layer used in this embodiment has an electron-accepting function and contains an electron-accepting material.
  • the electron-accepting material is not particularly limited as long as it has a function as an electron acceptor, but is preferably a material that can be formed into a film by a wet coating method.
  • a polymer material is preferred. This is because the conductive polymer material has the advantages as described above. Specific examples include the same electron-accepting conductive polymer materials used for the photoelectric conversion layer of the first aspect.
  • a film thickness generally employed in a bilayer type organic thin film solar cell can be employed. Specifically, it can be set within a range of 0.1 nm to 1500 nm, and preferably within a range of 1 nm to 300 nm. This is because if the film thickness is larger than the above range, the volume resistance in the electron-accepting layer may be increased. On the other hand, if the film thickness is thinner than the above range, light may not be sufficiently absorbed.
  • the method for forming the electron-accepting layer can be the same as the method for forming the photoelectric conversion layer of the first aspect.
  • the electron donating layer used in this embodiment has an electron donating function and contains an electron donating material.
  • the electron donating material is not particularly limited as long as it has a function as an electron donor, but it is preferable that the material can be formed by a wet coating method.
  • a polymer material is preferred. This is because the conductive polymer material has the advantages as described above. Specific examples include the same electron donating conductive polymer materials used for the photoelectric conversion layer of the first aspect.
  • a film thickness generally employed in a bilayer type organic thin film solar cell can be employed. Specifically, it can be set within a range of 0.1 nm to 1500 nm, and preferably within a range of 1 nm to 300 nm. This is because if the film thickness is larger than the above range, the volume resistance in the electron donating layer may be increased. On the other hand, if the film thickness is thinner than the above range, light may not be sufficiently absorbed.
  • the method for forming the electron donating layer can be the same as the method for forming the photoelectric conversion layer of the first aspect.
  • the photoelectric conversion element in this invention may have another layer as needed other than a 1st electrode layer, a photoelectric converting layer, and a 2nd electrode layer.
  • the other layers will be described taking the case where the photoelectric conversion element is an organic thin film solar cell element as an example.
  • the first electrode layer usually takes out an electrode (hole extraction electrode) for taking out holes generated in the photoelectric conversion layer
  • the second electrode layer takes out electrons generated in the photoelectric conversion layer.
  • Electrode electron extraction electrode
  • a hole extraction layer 14 may be formed between the photoelectric conversion layer 12 and the first electrode layer 11 as illustrated in FIG.
  • An electron extraction layer 15 may be formed between the layer 12 and the second electrode layer 13.
  • the hole extraction layer is a layer provided so that holes can be easily extracted from the photoelectric conversion layer to the hole extraction electrode. Thereby, since the hole extraction efficiency from the photoelectric conversion layer to the hole extraction electrode is increased, the photoelectric conversion efficiency can be improved.
  • the material used for the hole extraction layer is not particularly limited as long as it is a material that stabilizes the extraction of holes from the photoelectric conversion layer to the hole extraction electrode.
  • conductive organic compounds such as doped polyaniline, polyphenylene vinylene, polythiophene, polypyrrole, polyparaphenylene, polyacetylene, triphenyldiamine (TPD), or electron donation such as tetrathiofulvalene, tetramethylphenylenediamine, etc.
  • An organic material that forms a charge transfer complex composed of an organic compound and an electron-accepting compound such as tetracyanoquinodimethane and tetracyanoethylene.
  • a thin film of metal such as Au, In, Ag, Pd, etc. can be used.
  • a thin film of metal or the like may be formed alone or in combination with the above organic material.
  • PEDOT polyethylenedioxythiophene
  • TPD triphenyldiamine
  • the film thickness of the hole extraction layer is preferably within a range of 10 nm to 200 nm when the organic material is used, and within a range of 0.1 nm to 5 nm when the metal thin film is used. Is preferred.
  • the electron extraction layer is a layer provided so that electrons can be easily extracted from the photoelectric conversion layer to the electron extraction electrode. Thereby, since the electron extraction efficiency from the photoelectric conversion layer to the electron extraction electrode is increased, the photoelectric conversion efficiency can be improved.
  • the material used for the electron extraction layer is not particularly limited as long as it is a material that stabilizes the extraction of electrons from the photoelectric conversion layer to the electron extraction electrode.
  • conductive organic compounds such as doped polyaniline, polyphenylene vinylene, polythiophene, polypyrrole, polyparaphenylene, polyacetylene, triphenyldiamine (TPD), or electron donation such as tetrathiofulvalene, tetramethylphenylenediamine, etc.
  • An organic material that forms a charge transfer complex composed of an organic compound and an electron-accepting compound such as tetracyanoquinodimethane and tetracyanoethylene.
  • the metal dope layer with an alkali metal or alkaline-earth metal is mentioned.
  • Suitable materials include bathocuproin (BCP) or bathophenantrone (Bphen) and metal doped layers such as Li, Cs, Ba, Sr.
  • one photoelectric conversion element 10 may be formed on the transparent resin substrate 2 as illustrated in FIG. 1, and the transparent resin group as illustrated in FIG.
  • a plurality of photoelectric conversion elements 10 may be formed on the material 2.
  • the number of photoelectric conversion elements is not particularly limited.
  • the connection of the plurality of photoelectric conversion elements is not limited as long as a desired electromotive force can be obtained, may be only in series, may be only in parallel, or may be a combination of series and parallel.
  • the barrier film may be bonded via the adhesive bond layer to the surface on the opposite side to the photoelectric conversion element side of a transparent resin base material.
  • a general barrier film can be used as the barrier film.
  • the solar cell of this invention may have another structural member other than the above-mentioned structural member as needed.
  • the solar cell of the present invention may have functional layers such as a protective sheet, a filler layer, a protective hard coat layer, a strength support layer, an antifouling layer, a high light reflection layer, and a light containment layer.
  • an adhesive layer may be formed between the functional layers depending on the layer configuration.
  • the manufacturing method of the solar cell of the present invention is not particularly limited as long as it is a method capable of manufacturing the above-described solar cell, but the first electrode layer and the adhesive inorganic layer on the transparent resin substrate.
  • a photoelectric conversion element forming step of forming a photoelectric conversion element having the second electrode layer, and a sealing having the transparent resin substrate or the inorganic barrier layer so as to cover the photoelectric conversion element and the adhesive inorganic layer An adhesive placement step of placing an adhesive on the substrate, the transparent resin substrate on which the photoelectric conversion element and the adhesive inorganic layer are formed, and the inorganic barrier layer of the sealing substrate. And a sealing process for bonding via It is preferable. This is because the first electrode layer and the bonding inorganic layer are formed at the same time, so that the solar cell of the present invention can be produced without increasing the number of steps of separately forming the bonding inorganic layer.
  • FIGS. 11A to 11D are process diagrams showing an example of a method for manufacturing a solar cell according to the present invention, in which the first electrode layer is a transparent electrode layer.
  • the 1st electrode layer 11 which is the transparent electrode layer 11a
  • attachment which consists of the transparent electrode layer 11a are formed simultaneously on the transparent resin base material 2 (1st Electrode layer forming step).
  • the photoelectric conversion layer 12 and the second electrode layer 13 are sequentially stacked on the first electrode layer 11 to form the photoelectric conversion element 10 (photoelectric conversion element forming step).
  • FIG. 11B the photoelectric conversion layer 12 and the second electrode layer 13 are sequentially stacked on the first electrode layer 11 to form the photoelectric conversion element 10 (photoelectric conversion element forming step).
  • photoelectric conversion element forming step photoelectric conversion element forming step
  • FIG. 11C after applying the liquid adhesive 4a on the sealing substrate 6 made of the inorganic barrier layer 5 (adhesive placement step), as shown in FIG. 11D.
  • the transparent resin substrate 2 on which the photoelectric conversion element 10 and the bonding inorganic layer 3 are formed and the sealing substrate 6 coated with the adhesive 4a are laminated, and the adhesive 4a is cured (sealing step). ).
  • attachment were formed are bonded through the adhesive bond layer 4, and the photoelectric conversion element 10 is sealed. .
  • FIG. 12A a metal thin film 21 is formed on one surface on the transparent resin substrate 2.
  • FIG. 12B the metal thin film 21 is patterned by photoetching to simultaneously form the patterned metal electrode layer 11b and the bonding inorganic layer 3 composed of the metal electrode layer 11b.
  • FIG. 12C the transparent electrode layer 11 a is formed on the patterned metal electrode layer 11 b to form the first electrode layer 11.
  • FIG. 12A to 12C show the first electrode layer forming step.
  • the photoelectric conversion layer 12 and the second electrode layer 13 are sequentially stacked on the first electrode layer 11 to form the photoelectric conversion element 10 (photoelectric conversion element forming step).
  • the transparent resin in which the photoelectric conversion element 10 and the inorganic layer 3 for bonding are formed
  • the base material 2 and the sealing base material 6 to which the adhesive is applied are laminated, and the adhesive is cured (sealing process).
  • attachment were formed via the adhesive bond layer 4, and the sealing base material 6 were bonded.
  • the photoelectric conversion element 10 is sealed.
  • FIGS. 13A to 13D are process diagrams showing another example of the method for manufacturing a solar cell according to the present invention, in which the first electrode layer is a patterned metal electrode layer.
  • a metal thin film 21 is formed on one surface of the transparent resin substrate 2, and then, as shown in FIG. 13B, the metal thin film 21 is patterned by photoetching.
  • the first electrode layer 11 that is the patterned metal electrode layer 11b and the inorganic layer 3 for adhesion composed of the metal electrode layer 11b are simultaneously formed (first electrode layer forming step). Subsequently, as illustrated in FIG.
  • the photoelectric conversion layer 12 and the second electrode layer 13 are sequentially stacked on the first electrode layer 11 to form the photoelectric conversion element 10 (photoelectric conversion element forming step).
  • photoelectric conversion element forming step the photoelectric conversion element forming step.
  • the transparent resin in which the photoelectric conversion element 10 and the inorganic layer 3 for bonding are formed
  • the base material 2 and the sealing base material 6 to which the adhesive is applied are laminated, and the adhesive is cured (sealing process).
  • attachment were formed via the adhesive bond layer 4, and the sealing base material 6 were bonded.
  • the photoelectric conversion element 10 is sealed.
  • a photoelectric conversion element formation process has the 1st electrode layer formation process which forms the 1st electrode layer and the inorganic layer for adhesion
  • a 1st electrode layer formation process is a process of forming a 1st electrode layer and the inorganic layer for adhesion
  • the first electrode layer forming step is appropriately selected according to the configuration of the first electrode layer.
  • the 1st electrode layer is a transparent electrode layer so that it may illustrate in Drawing 11 (a)
  • the inorganic layer for adhesion which consists of a transparent electrode layer can be formed simultaneously.
  • Examples of the method for forming the transparent electrode layer include a method in which a conductive film is formed on one surface of a transparent resin base material and then patterned by photoetching, and a pattern vapor deposition method using a metal mask.
  • the pattern vapor deposition method using a metal mask has an advantage that the process advantage is high because the number of steps is small.
  • the bonding inorganic layer made of the metal electrode layer is simultaneously formed. Can be formed. Further, when the first electrode layer is a patterned metal electrode layer as illustrated in FIGS. 13A to 13B, an adhesive inorganic layer made of the metal electrode layer can be formed simultaneously. Examples of the method for forming the patterned metal electrode layer include a method in which a metal thin film is formed on one surface on a transparent resin substrate and then patterned by photoetching, and a pattern deposition method using a metal mask.
  • Adhesive placement step In the adhesive placement step, the adhesive is placed on the transparent resin substrate or the sealing substrate having the inorganic barrier layer so that the photoelectric conversion element and the bonding inorganic layer are covered. It is a process of arranging. Since the method of arranging the adhesive has been described above, the description thereof is omitted here.
  • sealing step In the sealing step, the photoelectric conversion element and the transparent resin base material on which the adhesive inorganic layer is formed and the inorganic barrier layer of the sealing base material are pasted via the adhesive. It is a process to combine. In this step, the transparent resin base material on which the photoelectric conversion element and the inorganic layer for adhesion are formed and the inorganic barrier layer of the sealing base material are placed facing each other, and are brought into close contact with the adhesive to cure the adhesive. By doing so, sealing can be performed.
  • the method for curing the adhesive is appropriately selected depending on the type of adhesive, and light irradiation or heating is usually used.
  • the solar cell module of the present invention is characterized in that a plurality of the above-described solar cells are connected in series or in parallel.
  • connection of a plurality of solar cells is not limited as long as a desired electromotive force can be obtained, may be only in series, only in parallel, or a combination of series and parallel.
  • the solar cell has been described in detail in the section “A. Solar Cell” above, and thus the description thereof is omitted here.
  • the present invention is not limited to the above embodiment.
  • the above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and exhibits the same function and effect. Are included in the technical scope.
  • a Cr / Cu layer having a thickness of 10 nm / 300 nm was formed by sputtering on the entire surface of one side of a 100 ⁇ m thick PET substrate.
  • the solar cell portion provided with the 50 mm ⁇ photoelectric conversion element located in the central portion of the PET substrate and the outer periphery located at the outer peripheral portion of the PET substrate are 60 mm ⁇ and 5 mm wide.
  • the metal electrode layer was formed by patterning by a photo-etching process in such a shape as to leave a Cr / Cu layer located at the bonding portion where the letter-shaped bonding inorganic layer is provided. At this time, a mesh-shaped metal electrode layer having an opening ratio of 80% was formed on the solar cell portion of 50 mm ⁇ . After forming the metal electrode layer, ITO was deposited on the metal electrode layer located in the 50 mm ⁇ solar cell portion by a pattern vapor deposition method using a metal mask to form a transparent electrode layer. As described above, the first electrode layer in which the mesh-shaped metal electrode layer and the transparent electrode layer were laminated, and the adhesive inorganic layer made of the metal electrode layer were formed.
  • perhydropolysilazane (Aquamica NP110, manufactured by AZ Electronic Materials Co., Ltd.) is applied onto the inorganic layer for adhesion on which the second electrode layer is provided, and baked at 150 ° C. for 15 minutes in the atmosphere to form an insulating layer Formed.
  • a hole extraction layer was formed on the first electrode layer by coating by a spin coating method.
  • PEDOT / PSS manufactured by HCStarc, Clevious
  • baking at 150 ° C. for 15 minutes in the air after drying.
  • a solution obtained by dissolving 2 wt% of P3HT / PCBM in an orthodichlorobenzene solvent in an N 2 atmosphere was applied by a spin coating method. After drying, baking was performed at 150 ° C. for 15 minutes to form a photoelectric conversion layer.
  • an Al foil (15 ⁇ m thickness) is laminated on the second electrode layer side via a sheet-like thermosetting adhesive (manufactured by Mitsui DuPont Polychemical Co., Ltd., High Milan, 30 ⁇ m thickness), and 150 ° C., 10 min by a vacuum laminator. It was heat-cured under the following conditions. Thereby, the organic thin film solar cell element was sealed, and the organic thin film solar cell was produced.
  • a sheet-like thermosetting adhesive manufactured by Mitsui DuPont Polychemical Co., Ltd., High Milan, 30 ⁇ m thickness
  • the performance maintenance rate of 90% was 90%, whereas in the organic thin-film solar cell in which the inorganic layer for adhesion was not formed, the performance was maintained for 100 h. The rate was 10%. From the above, it was confirmed that the durability of the solar cell was improved by forming the inorganic layer for adhesion.

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Photovoltaic Devices (AREA)
  • Electroluminescent Light Sources (AREA)
PCT/JP2011/069608 2010-09-03 2011-08-30 太陽電池および太陽電池モジュール WO2012029781A1 (ja)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016031293A1 (ja) * 2014-08-29 2016-03-03 ローム株式会社 有機薄膜太陽電池およびその製造方法、電子機器
US20230006158A1 (en) * 2019-12-03 2023-01-05 Nanoflex Power Corporation Protective encapsulation of solar sheets

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101838732B1 (ko) * 2016-11-24 2018-03-15 장성은 태양전지 모듈
JP2022143679A (ja) * 2021-03-18 2022-10-03 株式会社リコー 光電変換素子、電子機器、及び電源モジュール

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000307137A (ja) * 1999-04-19 2000-11-02 Dainippon Printing Co Ltd 太陽電池のカバーフィルム、およびそれを用いた太陽電池モジュール
JP2000349325A (ja) * 1999-06-04 2000-12-15 Kanegafuchi Chem Ind Co Ltd 薄膜太陽電池モジュール
WO2008038553A1 (en) * 2006-09-28 2008-04-03 Sanyo Electric Co., Ltd. Solar cell module
JP2008311152A (ja) * 2007-06-15 2008-12-25 Tomoegawa Paper Co Ltd 電子機器積層体

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000307137A (ja) * 1999-04-19 2000-11-02 Dainippon Printing Co Ltd 太陽電池のカバーフィルム、およびそれを用いた太陽電池モジュール
JP2000349325A (ja) * 1999-06-04 2000-12-15 Kanegafuchi Chem Ind Co Ltd 薄膜太陽電池モジュール
WO2008038553A1 (en) * 2006-09-28 2008-04-03 Sanyo Electric Co., Ltd. Solar cell module
JP2008311152A (ja) * 2007-06-15 2008-12-25 Tomoegawa Paper Co Ltd 電子機器積層体

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016031293A1 (ja) * 2014-08-29 2016-03-03 ローム株式会社 有機薄膜太陽電池およびその製造方法、電子機器
JP2016051805A (ja) * 2014-08-29 2016-04-11 ローム株式会社 有機薄膜太陽電池およびその製造方法、電子機器
US20230006158A1 (en) * 2019-12-03 2023-01-05 Nanoflex Power Corporation Protective encapsulation of solar sheets

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