WO2012015277A3 - 마이크로 나노 조합구조물, 마이크로 나노 조합구조의 제조방법 및 마이크로 나노 조합구조가 집적된 광소자의 제조방법 - Google Patents

마이크로 나노 조합구조물, 마이크로 나노 조합구조의 제조방법 및 마이크로 나노 조합구조가 집적된 광소자의 제조방법 Download PDF

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Publication number
WO2012015277A3
WO2012015277A3 PCT/KR2011/005625 KR2011005625W WO2012015277A3 WO 2012015277 A3 WO2012015277 A3 WO 2012015277A3 KR 2011005625 W KR2011005625 W KR 2011005625W WO 2012015277 A3 WO2012015277 A3 WO 2012015277A3
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micro
nano combined
combined structure
manufacturing
optical device
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PCT/KR2011/005625
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English (en)
French (fr)
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WO2012015277A2 (ko
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송영민
이용탁
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광주과학기술원
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Priority to US13/813,063 priority Critical patent/US20130128362A1/en
Priority to CN2011800375914A priority patent/CN103038671A/zh
Publication of WO2012015277A2 publication Critical patent/WO2012015277A2/ko
Publication of WO2012015277A3 publication Critical patent/WO2012015277A3/ko

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Biophysics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Led Devices (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Optical Integrated Circuits (AREA)

Abstract

본 발명은 마이크로 나노 조합구조물, 마이크로 나노 조합구조의 제조방법 및 마이크로 나노 조합구조가 집적된 광소자의 제조방법에 관한 것으로, 기판 상에 마이크로 구조를 형성하는 단계와, 상기 마이크로 구조가 형성된 기판 상에 금속박막을 증착하는 단계와, 상기 금속박막을 열처리하여 금속입자로 변형시키는 단계와, 상기 마이크로 구조가 형성된 기판 상면에 광파장 이하의 주기를 갖는 끝이 뾰족한 쐐기형의 무반사 나노구조가 형성되도록 상기 금속입자를 마스크로 하여 상기 마이크로 구조가 형성된 기판의 전면을 식각하는 단계를 포함함으로써, 제조 공정이 간단하며, 공기와 반도체 물질간의 굴절률차로 인해 발생하는 빛의 반사량을 최소화할 수 있을 뿐만 아니라 광소자(optical device) 분야에 용이하게 적용할 수 있는 효과가 있다.
PCT/KR2011/005625 2010-07-30 2011-07-29 마이크로 나노 조합구조물, 마이크로 나노 조합구조의 제조방법 및 마이크로 나노 조합구조가 집적된 광소자의 제조방법 WO2012015277A2 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US13/813,063 US20130128362A1 (en) 2010-07-30 2011-07-29 Micro/nano combined structure, manufacturing method of micro/nano combined structure, and manufacturing method of an optical device having a micro/nano combined structure integrated therewith
CN2011800375914A CN103038671A (zh) 2010-07-30 2011-07-29 微纳米组合结构物及其制备方法及光学器件的制备方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2010-0074098 2010-07-30
KR1020100074098A KR101250450B1 (ko) 2010-07-30 2010-07-30 마이크로 나노 조합구조의 제조방법 및 마이크로 나노 조합구조가 집적된 광소자의 제조방법

Publications (2)

Publication Number Publication Date
WO2012015277A2 WO2012015277A2 (ko) 2012-02-02
WO2012015277A3 true WO2012015277A3 (ko) 2012-05-18

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PCT/KR2011/005625 WO2012015277A2 (ko) 2010-07-30 2011-07-29 마이크로 나노 조합구조물, 마이크로 나노 조합구조의 제조방법 및 마이크로 나노 조합구조가 집적된 광소자의 제조방법

Country Status (4)

Country Link
US (1) US20130128362A1 (ko)
KR (1) KR101250450B1 (ko)
CN (1) CN103038671A (ko)
WO (1) WO2012015277A2 (ko)

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Also Published As

Publication number Publication date
WO2012015277A2 (ko) 2012-02-02
KR101250450B1 (ko) 2013-04-08
CN103038671A (zh) 2013-04-10
KR20120021427A (ko) 2012-03-09
US20130128362A1 (en) 2013-05-23

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