WO2014064057A3 - Method for preparing a substantially clean monolayer of a two-dimensional material - Google Patents

Method for preparing a substantially clean monolayer of a two-dimensional material Download PDF

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Publication number
WO2014064057A3
WO2014064057A3 PCT/EP2013/071992 EP2013071992W WO2014064057A3 WO 2014064057 A3 WO2014064057 A3 WO 2014064057A3 EP 2013071992 W EP2013071992 W EP 2013071992W WO 2014064057 A3 WO2014064057 A3 WO 2014064057A3
Authority
WO
WIPO (PCT)
Prior art keywords
monolayer
substrate
resin body
dimensional material
substrate surface
Prior art date
Application number
PCT/EP2013/071992
Other languages
French (fr)
Other versions
WO2014064057A2 (en
Inventor
Jean-Nicolas LONGCHAMP
Conrad Escher
Hans-Werner Fink
Original Assignee
Universität Zürich
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universität Zürich filed Critical Universität Zürich
Publication of WO2014064057A2 publication Critical patent/WO2014064057A2/en
Publication of WO2014064057A3 publication Critical patent/WO2014064057A3/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/182Graphene
    • C01B32/184Preparation
    • C01B32/186Preparation by chemical vapour deposition [CVD]
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/182Graphene
    • C01B32/194After-treatment
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/01Particle morphology depicted by an image
    • C01P2004/02Particle morphology depicted by an image obtained by optical microscopy
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/01Particle morphology depicted by an image
    • C01P2004/04Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/20Particle morphology extending in two dimensions, e.g. plate-like

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Laminated Bodies (AREA)

Abstract

A method for preparing a substantially clean monolayer of a two-dimensional material comprises the steps of: providing a first substrate (S1) having a first substrate surface (F1); growing a monolayer (G) of the two-dimensional material on the first substrate surface; applying a resin capping layer (R) on the first substrate surface so as to integrally cover the monolayer; etching away the first substrate to obtain a resin body having a resin body surface (FR) with the monolayer attached thereto; providing a second substrate (S2) having a second substrate surface (F2) being substantially congruent to the resin body surface; forming an assembly of the resin body and the second substrate by contacting the mutually congruent resin body surface and second substrate surface; and subjecting the assembly thus obtained to a thermal annealing process in ambient air so as to completely remove the resin body. By carrying out the thermal annealing process in the presence of a platinum metal (PM) contacting either the monolayer or the resin body, a substantially clean monolayer of the two-dimensional material on the second substrate surface is formed.
PCT/EP2013/071992 2012-10-23 2013-10-21 Method for preparing a substantially clean monolayer of a two-dimensional material WO2014064057A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP12189601.3 2012-10-23
EP12189601 2012-10-23

Publications (2)

Publication Number Publication Date
WO2014064057A2 WO2014064057A2 (en) 2014-05-01
WO2014064057A3 true WO2014064057A3 (en) 2014-07-17

Family

ID=47076116

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2013/071992 WO2014064057A2 (en) 2012-10-23 2013-10-21 Method for preparing a substantially clean monolayer of a two-dimensional material

Country Status (1)

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WO (1) WO2014064057A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104401968B (en) * 2014-05-31 2016-03-30 福州大学 A kind of method preparing three-dimensional Graphene based on 3D printing foamed metal
PL224343B1 (en) * 2014-06-25 2016-12-30 Inst Tech Materiałów Elektronicznych Method for graphene layer transfer
JP2019504318A (en) * 2016-01-08 2019-02-14 ウニヴェルジテート・チューリッヒUniversitaet Zuerich Method and apparatus for imaging a single molecule
TWI646670B (en) * 2017-04-07 2019-01-01 國立交通大學 Two-dimensional material manufacturing method
CN110092349B (en) 2018-01-27 2022-08-16 清华大学 Preparation method of suspended two-dimensional nano material
CN110092351B (en) 2018-01-27 2022-08-16 清华大学 Method for transferring two-dimensional nano material by using carbon nano tube film
CN110092350A (en) 2018-01-27 2019-08-06 清华大学 Utilize the method for carbon nano-tube compound film transfer two-dimension nano materials
CN110098099B (en) 2018-01-27 2020-09-29 清华大学 Transmission electron microscope micro-grid and preparation method thereof
EP3797089A4 (en) * 2018-05-22 2022-03-09 ETX Corporation Method and apparatus for transfer of two-dimensional materials
WO2020041650A1 (en) * 2018-08-23 2020-02-27 Massachusetts Institute Of Technology Atomic precision control of wafer-scale two-dimensional materials

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
LI X ET AL: "Transfer of large-area graphene films for high-performance transparent conductive electrodes", NANO LETTERS, AMERICAN CHEMICAL SOCIETY, US, vol. 9, no. 12, 1 January 2009 (2009-01-01), pages 4359 - 363, XP002637070, ISSN: 1530-6984, [retrieved on 20091021], DOI: 10.1021/NL902623Y *
NAIR R ET AL: "Graphene as a transparent conductive support for studying biological molecules by transmission electron microscopy", APPLIED PHYSICS LETTERS, AMERICAN INSTITUTE OF PHYSICS, US, vol. 97, no. 15, 11 October 2010 (2010-10-11), pages 153102 - 153102, XP012137269, ISSN: 0003-6951, DOI: 10.1063/1.3492845 *
REINA A ET AL: "Transferring and identification of single- and few-layer graphene on arbitrary substrates", JOURNAL OF PHYSICAL CHEMISTRY PART C: NANOMATERIALS AND INTERFACES, AMERICAN CHEMICAL SOCIETY, US, vol. 112, no. 46, 24 October 2008 (2008-10-24), pages 17741 - 17744, XP002553259, ISSN: 1932-7447, DOI: 10.1021/JP807380S *
SUK, J. W.; KITT, A.; MAGNUSON, C. W.; HAO, Y.; AHMED, S.; AN, J.; SWAN, A. K.; GOLDBERG, B. B.; RUOFF, R. S., ACS NANO, vol. 5, no. 9, 2011, pages 6916 - 6924, XP002720932 *

Also Published As

Publication number Publication date
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