WO2014064057A3 - Method for preparing a substantially clean monolayer of a two-dimensional material - Google Patents
Method for preparing a substantially clean monolayer of a two-dimensional material Download PDFInfo
- Publication number
- WO2014064057A3 WO2014064057A3 PCT/EP2013/071992 EP2013071992W WO2014064057A3 WO 2014064057 A3 WO2014064057 A3 WO 2014064057A3 EP 2013071992 W EP2013071992 W EP 2013071992W WO 2014064057 A3 WO2014064057 A3 WO 2014064057A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- monolayer
- substrate
- resin body
- dimensional material
- substrate surface
- Prior art date
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
- C01B32/186—Preparation by chemical vapour deposition [CVD]
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/194—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/02—Particle morphology depicted by an image obtained by optical microscopy
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/20—Particle morphology extending in two dimensions, e.g. plate-like
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Manufacturing & Machinery (AREA)
- Carbon And Carbon Compounds (AREA)
- Laminated Bodies (AREA)
Abstract
A method for preparing a substantially clean monolayer of a two-dimensional material comprises the steps of: providing a first substrate (S1) having a first substrate surface (F1); growing a monolayer (G) of the two-dimensional material on the first substrate surface; applying a resin capping layer (R) on the first substrate surface so as to integrally cover the monolayer; etching away the first substrate to obtain a resin body having a resin body surface (FR) with the monolayer attached thereto; providing a second substrate (S2) having a second substrate surface (F2) being substantially congruent to the resin body surface; forming an assembly of the resin body and the second substrate by contacting the mutually congruent resin body surface and second substrate surface; and subjecting the assembly thus obtained to a thermal annealing process in ambient air so as to completely remove the resin body. By carrying out the thermal annealing process in the presence of a platinum metal (PM) contacting either the monolayer or the resin body, a substantially clean monolayer of the two-dimensional material on the second substrate surface is formed.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP12189601.3 | 2012-10-23 | ||
EP12189601 | 2012-10-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2014064057A2 WO2014064057A2 (en) | 2014-05-01 |
WO2014064057A3 true WO2014064057A3 (en) | 2014-07-17 |
Family
ID=47076116
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2013/071992 WO2014064057A2 (en) | 2012-10-23 | 2013-10-21 | Method for preparing a substantially clean monolayer of a two-dimensional material |
Country Status (1)
Country | Link |
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WO (1) | WO2014064057A2 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104401968B (en) * | 2014-05-31 | 2016-03-30 | 福州大学 | A kind of method preparing three-dimensional Graphene based on 3D printing foamed metal |
PL224343B1 (en) * | 2014-06-25 | 2016-12-30 | Inst Tech Materiałów Elektronicznych | Method for graphene layer transfer |
JP2019504318A (en) * | 2016-01-08 | 2019-02-14 | ウニヴェルジテート・チューリッヒUniversitaet Zuerich | Method and apparatus for imaging a single molecule |
TWI646670B (en) * | 2017-04-07 | 2019-01-01 | 國立交通大學 | Two-dimensional material manufacturing method |
CN110092349B (en) | 2018-01-27 | 2022-08-16 | 清华大学 | Preparation method of suspended two-dimensional nano material |
CN110092351B (en) | 2018-01-27 | 2022-08-16 | 清华大学 | Method for transferring two-dimensional nano material by using carbon nano tube film |
CN110092350A (en) | 2018-01-27 | 2019-08-06 | 清华大学 | Utilize the method for carbon nano-tube compound film transfer two-dimension nano materials |
CN110098099B (en) | 2018-01-27 | 2020-09-29 | 清华大学 | Transmission electron microscope micro-grid and preparation method thereof |
EP3797089A4 (en) * | 2018-05-22 | 2022-03-09 | ETX Corporation | Method and apparatus for transfer of two-dimensional materials |
WO2020041650A1 (en) * | 2018-08-23 | 2020-02-27 | Massachusetts Institute Of Technology | Atomic precision control of wafer-scale two-dimensional materials |
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2013
- 2013-10-21 WO PCT/EP2013/071992 patent/WO2014064057A2/en active Application Filing
Non-Patent Citations (4)
Title |
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LI X ET AL: "Transfer of large-area graphene films for high-performance transparent conductive electrodes", NANO LETTERS, AMERICAN CHEMICAL SOCIETY, US, vol. 9, no. 12, 1 January 2009 (2009-01-01), pages 4359 - 363, XP002637070, ISSN: 1530-6984, [retrieved on 20091021], DOI: 10.1021/NL902623Y * |
NAIR R ET AL: "Graphene as a transparent conductive support for studying biological molecules by transmission electron microscopy", APPLIED PHYSICS LETTERS, AMERICAN INSTITUTE OF PHYSICS, US, vol. 97, no. 15, 11 October 2010 (2010-10-11), pages 153102 - 153102, XP012137269, ISSN: 0003-6951, DOI: 10.1063/1.3492845 * |
REINA A ET AL: "Transferring and identification of single- and few-layer graphene on arbitrary substrates", JOURNAL OF PHYSICAL CHEMISTRY PART C: NANOMATERIALS AND INTERFACES, AMERICAN CHEMICAL SOCIETY, US, vol. 112, no. 46, 24 October 2008 (2008-10-24), pages 17741 - 17744, XP002553259, ISSN: 1932-7447, DOI: 10.1021/JP807380S * |
SUK, J. W.; KITT, A.; MAGNUSON, C. W.; HAO, Y.; AHMED, S.; AN, J.; SWAN, A. K.; GOLDBERG, B. B.; RUOFF, R. S., ACS NANO, vol. 5, no. 9, 2011, pages 6916 - 6924, XP002720932 * |
Also Published As
Publication number | Publication date |
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WO2014064057A2 (en) | 2014-05-01 |
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