WO2012008736A3 - 파지티브 타입 감광성 수지 조성물 및 이를 포함하는 유기 발광 소자 블랙 뱅크 - Google Patents

파지티브 타입 감광성 수지 조성물 및 이를 포함하는 유기 발광 소자 블랙 뱅크 Download PDF

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WO2012008736A3
WO2012008736A3 PCT/KR2011/005106 KR2011005106W WO2012008736A3 WO 2012008736 A3 WO2012008736 A3 WO 2012008736A3 KR 2011005106 W KR2011005106 W KR 2011005106W WO 2012008736 A3 WO2012008736 A3 WO 2012008736A3
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emitting device
organic light
positive
resin composition
photosensitive resin
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PCT/KR2011/005106
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English (en)
French (fr)
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WO2012008736A2 (ko
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김상우
신세진
김경준
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주식회사 엘지화학
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Priority to CN2011800344850A priority Critical patent/CN102985876A/zh
Priority to US13/810,131 priority patent/US8993209B2/en
Priority to JP2013518286A priority patent/JP2013533508A/ja
Publication of WO2012008736A2 publication Critical patent/WO2012008736A2/ko
Publication of WO2012008736A3 publication Critical patent/WO2012008736A3/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/127—Active-matrix OLED [AMOLED] displays comprising two substrates, e.g. display comprising OLED array and TFT driving circuitry on different substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K50/865—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. light-blocking layers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

본 발명은 파지티브 타입 감광성 수지 조성물 및 이를 포함하는 유기 발광 소자 블랙 뱅크에 관한 것으로, 보다 구체적으로 본 발명에 따른 감광성 수지 조성물을 포함하는 유기 발광 소자 블랙 뱅크는 추가적인 공정 없이 블랙 매트릭스의 기능이 추가될 수 있으므로, 유기 발광 소자의 제조공정을 단순화할 수 있고, 시인성을 보다 획기적으로 개선할 수 있다.
PCT/KR2011/005106 2010-07-14 2011-07-12 파지티브 타입 감광성 수지 조성물 및 이를 포함하는 유기 발광 소자 블랙 뱅크 WO2012008736A2 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN2011800344850A CN102985876A (zh) 2010-07-14 2011-07-12 正型光敏树脂组合物及包含其的有机发光装置遮屏
US13/810,131 US8993209B2 (en) 2010-07-14 2011-07-12 Positive-type photosensitive resin composition and black bank of an organic light-emitting device including same
JP2013518286A JP2013533508A (ja) 2010-07-14 2011-07-12 ポジティブ型感光性樹脂組成物およびこれを含む有機発光素子ブラックバンク

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2010-0067852 2010-07-14
KR20100067919 2010-07-14
KR20100067852 2010-07-14
KR10-2010-0067919 2010-07-14

Publications (2)

Publication Number Publication Date
WO2012008736A2 WO2012008736A2 (ko) 2012-01-19
WO2012008736A3 true WO2012008736A3 (ko) 2012-05-03

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/005106 WO2012008736A2 (ko) 2010-07-14 2011-07-12 파지티브 타입 감광성 수지 조성물 및 이를 포함하는 유기 발광 소자 블랙 뱅크

Country Status (6)

Country Link
US (1) US8993209B2 (ko)
JP (1) JP2013533508A (ko)
KR (1) KR101295464B1 (ko)
CN (1) CN102985876A (ko)
TW (1) TW201217908A (ko)
WO (1) WO2012008736A2 (ko)

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JP2013232314A (ja) * 2012-04-27 2013-11-14 Jsr Corp 感放射線性樹脂組成物、絶縁膜および有機ｅｌ素子
JP6155823B2 (ja) * 2012-07-12 2017-07-05 Jsr株式会社 有機ｅｌ素子、感放射線性樹脂組成物および硬化膜
KR20140023492A (ko) * 2012-08-16 2014-02-27 삼성코닝정밀소재 주식회사 스퍼터링 타겟 및 이에 의해 증착된 블랙 매트릭스를 포함하는 유기 발광 디스플레이 장치
KR20140023491A (ko) * 2012-08-16 2014-02-27 삼성코닝정밀소재 주식회사 스퍼터링 타겟 및 이에 의해 증착된 블랙 매트릭스를 포함하는 유기 발광 디스플레이 장치
KR101954220B1 (ko) * 2012-09-14 2019-03-06 삼성디스플레이 주식회사 박막 봉지 유닛, 이를 포함하는 유기 발광 표시 장치 및 그의 제조 방법
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KR102054030B1 (ko) 2015-10-19 2020-01-08 주식회사 엘지화학 수지 조성물 및 이를 이용하여 제조된 블랙뱅크를 포함하는 디스플레이 장치
KR102127033B1 (ko) * 2016-04-26 2020-06-25 주식회사 엘지화학 네가티브 타입 감광성 수지 조성물 및 이를 포함하는 유기 발광 소자 블랙 매트릭스
JP7106863B2 (ja) * 2016-06-16 2022-07-27 東レ株式会社 有機ｅｌ表示装置用感光性樹脂組成物
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TWI683182B (zh) * 2017-04-07 2020-01-21 日商昭和電工股份有限公司 感光性樹脂組成物及輻射線微影構造物之製造方法
TWI635359B (zh) * 2017-06-02 2018-09-11 律勝科技股份有限公司 感光性聚醯亞胺樹脂組合物及應用其之覆蓋膜的製造方法
WO2019059359A1 (ja) 2017-09-25 2019-03-28 東レ株式会社 着色樹脂組成物、着色膜、カラーフィルターおよび液晶表示装置
JP7010260B2 (ja) * 2018-04-18 2022-01-26 信越化学工業株式会社 光酸発生剤、化学増幅レジスト材料及びパターン形成方法
KR102287214B1 (ko) * 2018-09-17 2021-08-06 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 전자 소자
CN110649185B (zh) * 2019-09-26 2022-08-09 合肥京东方卓印科技有限公司 显示基板及其喷墨打印方法、显示装置
KR20210056012A (ko) * 2019-11-08 2021-05-18 주식회사 엘지화학 화합물, 바인더 수지, 네가티브형 감광성 수지 조성물 및 이를 이용하여 형성된 블랙뱅크를 포함하는 디스플레이 장치
KR20210056011A (ko) 2019-11-08 2021-05-18 주식회사 엘지화학 화합물, 착색제 분산액, 네가티브형 감광성 수지 조성물 및 이를 이용하여 형성된 블랙뱅크를 포함하는 디스플레이 장치
KR20210056014A (ko) 2019-11-08 2021-05-18 주식회사 엘지화학 바인더 수지, 네가티브형 감광성 수지 조성물 및 이를 이용하여 형성된 블랙뱅크를 포함하는 디스플레이 장치
CN111303420A (zh) * 2019-11-19 2020-06-19 上海极紫科技有限公司 一种可碱显影的正性聚酰亚胺光敏树脂及其制备方法
KR20210065487A (ko) 2019-11-27 2021-06-04 주식회사 엘지화학 바인더 수지, 감광성 수지 조성물, 블랙뱅크 및 이를 포함하는 디스플레이 장치
KR102637326B1 (ko) 2019-12-06 2024-02-15 주식회사 엘지화학 포지티브형 감광성 수지 조성물 및 이를 이용하여 형성된 블랙뱅크를 포함하는 디스플레이 장치
KR20210077641A (ko) 2019-12-17 2021-06-25 주식회사 엘지화학 화합물, 바인더 수지, 네가티브형 감광성 수지 조성물 및 이를 이용하여 형성된 블랙뱅크를 포함하는 디스플레이 장치
KR20210081032A (ko) 2019-12-23 2021-07-01 주식회사 엘지화학 고분자 수지 화합물, 이의 제조 방법 및 이를 포함하는 감광성 수지 조성물
KR20210081029A (ko) 2019-12-23 2021-07-01 주식회사 엘지화학 블랙뱅크용 감광성 수지 조성물
WO2021182499A1 (ja) 2020-03-13 2021-09-16 東レ株式会社 有機ｅｌ表示装置および感光性樹脂組成物

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