WO2011162163A1 - Glass substrate and method for manufacturing glass substrate - Google Patents

Glass substrate and method for manufacturing glass substrate Download PDF

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Publication number
WO2011162163A1
WO2011162163A1 PCT/JP2011/063824 JP2011063824W WO2011162163A1 WO 2011162163 A1 WO2011162163 A1 WO 2011162163A1 JP 2011063824 W JP2011063824 W JP 2011063824W WO 2011162163 A1 WO2011162163 A1 WO 2011162163A1
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Prior art keywords
curved surface
glass substrate
end surface
grindstone
grinding
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PCT/JP2011/063824
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French (fr)
Japanese (ja)
Inventor
宮本 幹大
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旭硝子株式会社
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Application filed by 旭硝子株式会社 filed Critical 旭硝子株式会社
Priority to JP2012521443A priority Critical patent/JP5817722B2/en
Priority to KR1020127033183A priority patent/KR101755062B1/en
Priority to CN201180030160.5A priority patent/CN102947238B/en
Publication of WO2011162163A1 publication Critical patent/WO2011162163A1/en

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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/08Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
    • B24B9/10Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00Glasses, glazes or enamels with special properties
    • C03C2204/08Glass having a rough surface

Definitions

  • the present invention relates to a glass substrate and a method for manufacturing the glass substrate, and more particularly to a glass substrate whose end face is ground by a grindstone and a method for manufacturing the glass substrate.
  • a plurality of glass substrates used in a thin display device are processed on a single mother board, and when each processing step is completed, the glass substrate is cut to the size of each screen.
  • This motherboard has a side length of, for example, 2.2 m to 3 m.
  • the end face of the glass substrate is prone to crack if there are edges or minute irregularities, for example, the end face is ground into a chamfered shape or a semicircular shape to smooth the end face surface (for example, patents) Reference 1).
  • a cooling fluid (coolant) is supplied to the contact part of a grindstone and the end surface of a glass substrate, and the heat_generation
  • the cullet from the ground part is scattered as fine particles in the end surface grinding process, the cullet attached to the glass substrate is removed by a cleaning process after grinding.
  • the grinding shape of the end face (cross-sectional shape after grinding) is ground into a chamfered shape or semicircular shape without considering the amount of cullet generation (scattering amount), etc.
  • the amount of cullet generated may increase, or if the cooling due to the supply of coolant is insufficient during grinding, the glass substrate may be burned and discolored due to heat generation.
  • the cullet may not be sufficiently removed by the cleaning process. Therefore, in the end surface grinding process of a glass substrate, it is an important subject to suppress the amount of cullet scattering.
  • an object of the present invention is to provide a glass substrate and a method for manufacturing the glass substrate that have solved the above problems.
  • the present invention has the following means.
  • the present invention provides a glass substrate whose end face is ground by a grindstone.
  • the end face ground on the grindstone is An upper curved surface formed on an upper portion of the end surface;
  • a lower curved surface formed at a lower portion of the end surface;
  • An intermediate curved surface formed between the upper curved surface and the lower curved surface;
  • Each of the upper curved surface, the lower curved surface, and the intermediate curved surface has an arbitrary radius of curvature, At least the upper curved surface and the intermediate curved surface have different radii of curvature.
  • the upper curved surface, the lower curved surface, and the intermediate curved surface of the present invention are characterized by forming a continuous curved surface by changing the curvature radius of adjacent curved surfaces.
  • the upper curved surface, the lower curved surface, and the intermediate curved surface of the present invention are characterized by forming a continuous curved surface that approximates an approximately elliptical contour shape.
  • the upper curved surface, the lower curved surface, and the intermediate curved surface of the present invention each have a radius of curvature smaller than the thickness of the glass substrate.
  • the present invention is characterized in that a first recess is formed at the boundary between the upper curved surface and the intermediate curved surface, and a second recess is formed at the boundary between the lower curved surface and the intermediate curved surface.
  • the first and second recesses of the present invention are characterized by extending in a direction parallel to the main plane of the glass substrate so as to have a predetermined interval in the plate thickness direction.
  • the glass substrate of the present invention is characterized in that one side is a quadrangle having a length of 2.2 m or more.
  • the end surface of the glass substrate of the present invention has an average roughness Ra of 0.3 ⁇ m or less.
  • the thickness of the glass substrate of the present invention is 0.05 to 2.8 mm.
  • the present invention provides a glass substrate manufacturing method in which an end face is ground with a grindstone. Corresponding to the upper curved surface formed at the upper part of the end surface, the lower curved surface formed at the lower part of the end surface, and the intermediate curved surface formed between the upper curved surface and the lower curved surface on the outer periphery of the grindstone Form a curved surface, The grindstone is rotated and relatively moved along the end surface of the glass substrate so that the upper curved surface, the lower curved surface, and the intermediate curved surface each have an arbitrary radius of curvature on the end surface of the glass substrate. It is characterized by that. (11) The present invention is characterized in that the upper curved surface, the lower curved surface, and the intermediate curved surface are processed so as to form a continuous curved surface by changing each radius of curvature.
  • the contact area where the end surface of the glass substrate contacts the grindstone is reduced by selecting the curvature radii of the upper curved surface, the lower curved surface, and the intermediate curved surface of the end surface ground by the grindstone to an arbitrary size. As a result, the amount of cullet and heat generated during grinding can be suppressed.
  • FIG. 1A is a longitudinal sectional view showing an embodiment of a glass substrate according to the present invention.
  • the glass substrate 10 is a rectangular large glass panel used for a thin display device such as a liquid crystal display, a plasma display, and organic electroluminescence.
  • the thickness t of the glass substrate 10 (the vertical dimension of the glass substrate 10 in FIG. 1A) is preferably 0.05 mm to 2.8 mm.
  • the main plane of the glass substrate 10 is desirably a quadrangle having a side of 2.2 m or more.
  • the end surface 12 of the glass substrate 10 is ground into a curved surface approximated to an elliptical shape.
  • the end surface 12 includes an upper curved surface 12a formed at the upper portion of the end surface 12, a lower curved surface 12b formed at the lower portion of the end surface 12, and an intermediate curved surface 12c formed between the upper curved surface 12a and the lower curved surface 12b.
  • Each of the curved surfaces 12a to 12c in the present embodiment is formed into a curved surface that approximates an approximate elliptical shape by the curvature radius R1 of the upper curved surface 12a, the curvature radius R2 of the lower curved surface 12b, and the curvature radius R3 of the intermediate curved surface 12c.
  • the radius of curvature of the ellipse changes so that the total distance from two points on the long side axis is constant.
  • the radius of curvature R1 to R3 is changed. It becomes possible to draw as a continuous curve.
  • the long side a is the same as the thickness t of the glass substrate 10.
  • 1A is a grinding region 20 to be removed by grinding. That is, the left side of the curved surfaces 12a to 12c is a grinding region 20 to be ground, and the right side of the curved surfaces 12a to 12c is the ground glass substrate 10.
  • average roughness Ra is 0.3 micrometer or less.
  • the angle ⁇ between the tangent line S1 of the end surface 12 of the glass substrate 10 with respect to the upper curved surface 12a and the tangent line S2 with respect to the lower curved surface 12b is set to 60 °.
  • the angle ⁇ is an opening angle of the grindstone 30 and can be set to an arbitrary angle.
  • the distance c to P is 0.23 mm, which is smaller than the conventional case where the end face 12 is chamfered or semicircular.
  • the contact area with the grindstone is reduced as compared with a conventional chamfered shape or a semicircular shape, so that heat generation during grinding is suppressed.
  • the end face 12 is ground into an elliptical shape, the cullet scattering direction moves from the main plane 14 to the end face side (in the direction away from the main plane 14) and the cullet adheres to the main plane 14 as the distance c decreases. The amount decreases.
  • FIG. 1B is a longitudinal sectional view showing a relative positional relationship between the grindstone and the end surface of the glass substrate in the end surface grinding step.
  • the end surface 12 of the glass substrate 10 is ground by rotating a grindstone 30.
  • the grindstone 30 has diamond abrasive grains and is rotatably supported by the rotating shaft 40.
  • the grindstone 30 has a processing groove having a concave curved surface that contacts the end surface 12 of the glass substrate 10 like a pulley, and a concave curved surface 32 corresponding to the curved surface shape of the end surface 12 of the glass substrate 10 and a concave curved surface 32.
  • An upper collar portion 34 disposed above and a lower collar portion 36 disposed below the concave curved surface 32.
  • the concave curved surface 32 is formed into an elliptical concave curved surface corresponding to the ground shape of the end surface 12 of the glass substrate 10. That is, the concave curved surface 32 is formed in an elliptical shape that is continuous by a curvature radius R1 corresponding to the upper curved surface 12a, a curvature radius R2 corresponding to the lower curved surface 12b, and a curvature radius R3 corresponding to the intermediate curved surface 12c. .
  • the grinding stone 30 of the diamond abrasive grains is processed into an arbitrary shape by forming the concave curved surface 32 by electric discharge machining. Therefore, the shape of the end surface 12 of the glass substrate 10 can be ground to an arbitrary shape by bringing the concave curved surface 32 into contact with the end surface 12 of the glass substrate 10 while rotating the grindstone 30.
  • FIG. 2 is a plan view schematically showing a grinding apparatus used in the end face grinding process.
  • the glass substrate 10 is sucked and held in a state of being placed on the upper surface of the suction table 50 of the grinding device.
  • the glass substrate 10 and the grindstone 30 are aligned so that the pair of grindstones 30 are in contact with the left and right end faces 12 of the glass substrate 10.
  • each grindstone 30 is adjusted according to the height position (Y direction position) of the end surface 12 of the glass substrate 10. That is, as shown in FIG. 1A, the height position of the center of the concave curved surface 32 of the grindstone 30 and the height position of the center O of the end surface 12 of the glass substrate 10 are set to coincide with each other.
  • the pair of grindstones 30 are fed in the X1 direction and the X2 direction while being rotationally driven to grind the left and right end faces 12 of the glass substrate 10. Moreover, at the time of end face grinding, a cooling liquid (coolant) is supplied to the contact part of the concave curved surface 32 of the grindstone 30 and the end face 12 of the glass substrate 10, and the heat_generation
  • the glass substrate 10 When the glass substrate 10 is rotated, the glass substrate 10 may be rotated together with the suction table 50 while being adsorbed by air suction, or only the glass substrate 10 is floated by air blowing. May be rotated 90 degrees, aligned and sucked.
  • each end surface 12 in the four directions of the glass substrate 10 is ground into an arbitrary shape by the grindstone 30. Moreover, since the cullet generated in the end surface grinding process is scattered in the rotation direction of the grindstone 30, it is scattered in the direction away from each end surface 12, and the adhesion amount of the main plane 14 is reduced.
  • Conventional grinding method Here, a conventional grinding method will be described.
  • FIG. 3 is a longitudinal sectional view for explaining a conventional glass substrate grinding method 1.
  • the end surface 12 of the glass substrate 10 is ground into a chamfered shape.
  • the angle between the outer surface of the end surface 12 and the chamfer is formed as a curved surface having the curvature radii R4 and R5.
  • FIG. 4 is a longitudinal sectional view for explaining a conventional glass substrate grinding method 2.
  • the end surface 12 of the glass substrate 10 is ground into a semicircular shape.
  • FIG. 5 is a longitudinal sectional view for explaining a first modification of the glass substrate according to the present invention.
  • the other conditions in the modified example 2 are the same as those described above.
  • the contact area with the grindstone is reduced as compared with the conventional chamfered shape or semicircular shape. Heat generation is suppressed. Further, when the end face 12 is ground into an elliptical shape, the cullet scattering direction moves from the main plane 14 to the end face side as the distance c decreases, and the amount of cullet attached to the main plane 14 decreases.
  • FIG. 6 is a longitudinal sectional view for explaining a second modification of the glass substrate according to the present invention.
  • the distance c and the ratio of the long side a to the short side b are different from those in the above embodiment, but it is preferable that 0.5 ⁇ b / a ⁇ 2.0.
  • the short side b is set to be smaller than that in the first embodiment and the first modification. Therefore, when the end surface 12 is ground into an elliptical shape, the contact area with the grindstone is reduced as compared with a conventional chamfered shape or a semicircular shape, so that heat generation during grinding is suppressed. Further, the distance c is smaller than that of the above-described embodiment and the first modification, and accordingly, the cullet scattering direction moves from the main plane 14 to the end face side, and the amount of cullet attached to the main plane 14 decreases. .
  • FIG. 7 is a longitudinal sectional view for explaining a third modification of the glass substrate according to the present invention.
  • FIG. 8 is a longitudinal sectional view showing the relative positional relationship between the grindstone of Modification 3 and the end face of the glass substrate.
  • the glass substrate 10 of Modification 3 has curved surfaces 12a to 12c having three different radii of curvature on the end surface 12, and the first curved surface 12a to 12c has a first A recess 12d and a second recess 12e are formed.
  • the curvature radii R1 to R3 of the curved surfaces 12a to 12c are set to values smaller than the thickness t of the glass substrate 10 and have a relationship of R1 ⁇ R2, R2 ⁇ R3, or R1 ⁇ R2 ⁇ R3. .
  • the first recess 12d is provided at the boundary between the upper curved surface 12a and the intermediate curved surface 12c
  • the second recess 12e is provided at the boundary between the intermediate curved surface 12c and the lower curved surface 12b.
  • the third modification it is possible to suppress the amount of cullet scattering toward the main plane 14 during the end face grinding process and to suppress the heat generation of the end face 12 as compared with the embodiment and the first and second modifications.
  • the end surface 12 of the modification 3 has the 1st recessed part 12d and the 2nd recessed part 12e which were recessed inside, the cullet which generate
  • the curvature radii R1 and R2 of the upper curved surface 12a and the lower curved surface 12b may be different radii as described above, or may be the same radius.
  • the upper curved surface 12a and the lower curved surface 12b are formed symmetrically in the vertical direction.
  • the recesses 12d and 12e are formed to extend in the X direction parallel to the main plane 14 of the glass substrate 10 so as to have a predetermined interval in the plate thickness direction. Therefore, it is possible to measure (inspect) the height adjustment deviation between the grindstone 30 and the glass substrate 10 during the end face grinding process from the positions of the recesses 12d and 12e after the grinding.
  • the end surface 12 of the glass substrate 10 is composed of a combination of three curved surfaces 12a to 12c having different curvature radii, and the concave portions 12d and 12e are formed at the boundaries of the curved surfaces 12a to 12c. It becomes possible to reduce the amount of cullet adhesion on the main plane 14 in the end surface grinding process.

Abstract

The amount of adhesion of cullet to the major planar surface of a glass substrate due to the grinding of an end surface is reduced. An end surface (12) of a glass substrate (10) is ground into an elliptical shape. The ellipse is defined by the ratio of a long side (a) and a short side (b) and is formed into a continuous elliptical curved surface by the curvature radius (R1) of an upper curved surface (12a), the curvature radius (R2) of a lower curved surface (12b), and the curvature radius (R3) of an intermediate curved surface (12c). The curvature radiuses (R1-R3) have the relationships of R1 ≤ R2, and R2 ≤ R3 or the relationships of R1 = R2, R3 > R2, and R3 > R1. The distance (c) from the center (O) of the end surface (12) to the boundaries (P) at which tangential lines (S1, S2) depart from the major planar surface of the substrate (10) is less than the distance in conventional cases in which the end surface (12) is chamfered or formed into a semicircular shape. The configuration changes the direction of scatter of cullet, which is produced in the step of end surface grinding, to cause the cullet to scatter further toward the end surface (12) side, and as a result, the amount of adhesion of the cullet to the major planar surface (14) of the glass substrate (10) is reduced.

Description

ガラス基板及びガラス基板の製造方法Glass substrate and method for manufacturing glass substrate
 本発明はガラス基板及びガラス基板の製造方法に係り、特に砥石により端面を研削されるガラス基板及びガラス基板の製造方法に関する。 The present invention relates to a glass substrate and a method for manufacturing the glass substrate, and more particularly to a glass substrate whose end face is ground by a grindstone and a method for manufacturing the glass substrate.
 例えば、液晶ディスプレイやプラズマディスプレイ、有機エレクトロルミネッセンスなどの薄型ディスプレイ装置では、大型画面の開発が進められている。薄型ディスプレイ装置に用いられるガラス基板は、1枚のマザーボードに複数個分が加工され、各加工工程が終了すると、各画面の大きさに切断される。このマザーボードは、一辺の長さが例えば、2.2m~3mを有する。 For example, for thin display devices such as liquid crystal displays, plasma displays, and organic electroluminescence, development of large screens is in progress. A plurality of glass substrates used in a thin display device are processed on a single mother board, and when each processing step is completed, the glass substrate is cut to the size of each screen. This motherboard has a side length of, for example, 2.2 m to 3 m.
 また、ガラス基板の端面は、エッジや微小な凹凸があるとクラックが発生しやすいため、例えば、端面を面取り形状または半円形状に研削加工して端面の表面を滑らかにしている(例えば、特許文献1参照)。また、ガラス基板の端面研削工程では、砥石とガラス基板の端面との接触部分に冷却液(クーラント)を供給してガラス基板の発熱を抑制する。さらに、端面研削加工において、研削された部分からのカレットが細かい粒子となって飛散するため、研削後の洗浄工程によりガラス基板に付着したカレット除去を行なっている。 Further, since the end face of the glass substrate is prone to crack if there are edges or minute irregularities, for example, the end face is ground into a chamfered shape or a semicircular shape to smooth the end face surface (for example, patents) Reference 1). Moreover, in the end surface grinding process of a glass substrate, a cooling fluid (coolant) is supplied to the contact part of a grindstone and the end surface of a glass substrate, and the heat_generation | fever of a glass substrate is suppressed. Furthermore, since the cullet from the ground part is scattered as fine particles in the end surface grinding process, the cullet attached to the glass substrate is removed by a cleaning process after grinding.
日本国特開2009-203141号公報Japanese Unexamined Patent Publication No. 2009-203141
 従来のガラス基板では、カレットの発生量(飛散量)等を考慮せずに端面の研削形状(研削後の断面形状)を面取り形状または半円形状に研削しているが、砥石が接触する端面の接触面積及び形状に応じてカレットの発生量(飛散量)が増大したり、研削時に冷却液供給による冷却が充分でないときは発熱によってガラス基板にヤケが発生し変色するおそれがある。 In the conventional glass substrate, the grinding shape of the end face (cross-sectional shape after grinding) is ground into a chamfered shape or semicircular shape without considering the amount of cullet generation (scattering amount), etc. Depending on the contact area and shape, the amount of cullet generated (scattered amount) may increase, or if the cooling due to the supply of coolant is insufficient during grinding, the glass substrate may be burned and discolored due to heat generation.
 特にガラス基板の主平面にカレットが付着すると、洗浄工程によってカレットを充分に除去できない場合がある。そのため、ガラス基板の端面研削工程においては、カレットの飛散量を抑制することが重要な課題である。 Especially when the cullet adheres to the main plane of the glass substrate, the cullet may not be sufficiently removed by the cleaning process. Therefore, in the end surface grinding process of a glass substrate, it is an important subject to suppress the amount of cullet scattering.
 そこで、本発明は上記事情に鑑み、上記課題を解決したガラス基板及びガラス基板の製造方法を提供することを目的とする。 Therefore, in view of the above circumstances, an object of the present invention is to provide a glass substrate and a method for manufacturing the glass substrate that have solved the above problems.
 上記課題を解決するため、本発明は以下のような手段を有する。
(1)本発明は、端面を砥石により研削されるガラス基板において、
 前記砥石に研削された端面は、
 前記端面の上部に形成される上部曲面と、
 前記端面の下部に形成される下部曲面と、
 前記上部曲面と前記下部曲面との中間に形成される中間部曲面とを有し、
 前記上部曲面、前記下部曲面、前記中間部曲面の夫々が任意の曲率半径を有し、
少なくとも前記上部曲面および前記中間部曲面の曲率半径が異なることを特徴とする。
(2)本発明の前記上部曲面、前記下部曲面、前記中間部曲面は、隣り合う曲面の曲率半径を変化させることで連続した曲面を形成することを特徴とする。
(3)本発明の前記上部曲面、前記下部曲面、前記中間部曲面は、ほぼ楕円形状の輪郭形状に近似する連続した曲面を形成することを特徴とする。
(4)本発明の前記上部曲面、前記下部曲面、前記中間部曲面は、夫々当該ガラス基板の厚さよりも小さい曲率半径を有することを特徴とする。
(5)本発明は、前記上部曲面と前記中間部曲面との境界に第1の凹部が形成され、前記下部曲面と前記中間部曲面との境界に第2の凹部が形成されることを特徴とする。
(6)本発明の前記第1、第2の凹部は、夫々板厚方向に所定の間隔を有するようにガラス基板の主平面と平行となる方向に延在形成されることを特徴とする。
(7)本発明の前記ガラス基板は、一辺が2.2m以上の四角形であることを特徴とする。
(8)本発明の前記ガラス基板の端面は、平均粗さRaが0.3μm以下であることを特徴とする。
(9)本発明の前記ガラス基板の厚さは、0.05~2.8mmであることを特徴とする。
(10)本発明は、端面を砥石により研削されるガラス基板の製造方法において、
 前記砥石の外周に、前記端面の上部に形成される上部曲面と、前記端面の下部に形成される下部曲面と、前記上部曲面と前記下部曲面との中間に形成される中間部曲面とに対応する曲面を形成し、
 前記砥石を回転させながら前記ガラス基板の端面に沿うように相対移動させて前記ガラス基板の端面に前記上部曲面、前記下部曲面、前記中間部曲面の夫々が任意の曲率半径を有するように加工することを特徴とする。
(11)本発明は、前記上部曲面、前記下部曲面、前記中間部曲面が、各曲率半径を変化させることで連続した曲面を形成するように加工することを特徴とする。
In order to solve the above problems, the present invention has the following means.
(1) The present invention provides a glass substrate whose end face is ground by a grindstone.
The end face ground on the grindstone is
An upper curved surface formed on an upper portion of the end surface;
A lower curved surface formed at a lower portion of the end surface;
An intermediate curved surface formed between the upper curved surface and the lower curved surface;
Each of the upper curved surface, the lower curved surface, and the intermediate curved surface has an arbitrary radius of curvature,
At least the upper curved surface and the intermediate curved surface have different radii of curvature.
(2) The upper curved surface, the lower curved surface, and the intermediate curved surface of the present invention are characterized by forming a continuous curved surface by changing the curvature radius of adjacent curved surfaces.
(3) The upper curved surface, the lower curved surface, and the intermediate curved surface of the present invention are characterized by forming a continuous curved surface that approximates an approximately elliptical contour shape.
(4) The upper curved surface, the lower curved surface, and the intermediate curved surface of the present invention each have a radius of curvature smaller than the thickness of the glass substrate.
(5) The present invention is characterized in that a first recess is formed at the boundary between the upper curved surface and the intermediate curved surface, and a second recess is formed at the boundary between the lower curved surface and the intermediate curved surface. And
(6) The first and second recesses of the present invention are characterized by extending in a direction parallel to the main plane of the glass substrate so as to have a predetermined interval in the plate thickness direction.
(7) The glass substrate of the present invention is characterized in that one side is a quadrangle having a length of 2.2 m or more.
(8) The end surface of the glass substrate of the present invention has an average roughness Ra of 0.3 μm or less.
(9) The thickness of the glass substrate of the present invention is 0.05 to 2.8 mm.
(10) The present invention provides a glass substrate manufacturing method in which an end face is ground with a grindstone.
Corresponding to the upper curved surface formed at the upper part of the end surface, the lower curved surface formed at the lower part of the end surface, and the intermediate curved surface formed between the upper curved surface and the lower curved surface on the outer periphery of the grindstone Form a curved surface,
The grindstone is rotated and relatively moved along the end surface of the glass substrate so that the upper curved surface, the lower curved surface, and the intermediate curved surface each have an arbitrary radius of curvature on the end surface of the glass substrate. It is characterized by that.
(11) The present invention is characterized in that the upper curved surface, the lower curved surface, and the intermediate curved surface are processed so as to form a continuous curved surface by changing each radius of curvature.
 本発明によれば、砥石に研削された端面形状の上部曲面、下部曲面、中間部曲面の曲率半径を任意の大きさに選択することにより、ガラス基板の端面が砥石に接触する接触面積を削減して研削時のカレット発生量及び発熱量を抑制することが可能になる。 According to the present invention, the contact area where the end surface of the glass substrate contacts the grindstone is reduced by selecting the curvature radii of the upper curved surface, the lower curved surface, and the intermediate curved surface of the end surface ground by the grindstone to an arbitrary size. As a result, the amount of cullet and heat generated during grinding can be suppressed.
本発明によるガラス基板の一実施例を示す縦断面図である。It is a longitudinal cross-sectional view which shows one Example of the glass substrate by this invention. 端面研削工程における砥石とガラス基板の端面との相対位置関係を示す縦断面図である。It is a longitudinal cross-sectional view which shows the relative positional relationship of the grindstone and the end surface of a glass substrate in an end surface grinding process. 端面研削工程で用いられる研削装置を模式的に示す平面図である。It is a top view which shows typically the grinding device used at an end surface grinding process. 従来のガラス基板の研削方法1を説明するための縦断面図である。It is a longitudinal cross-sectional view for demonstrating the grinding method 1 of the conventional glass substrate. 従来のガラス基板の研削方法2を説明するための縦断面図である。It is a longitudinal cross-sectional view for demonstrating the grinding method 2 of the conventional glass substrate. 本発明によるガラス基板の変形例1を説明するための縦断面図である。It is a longitudinal cross-sectional view for demonstrating the modification 1 of the glass substrate by this invention. 本発明によるガラス基板の変形例2を説明するための縦断面図である。It is a longitudinal cross-sectional view for demonstrating the modification 2 of the glass substrate by this invention. 本発明によるガラス基板の変形例3を説明するための縦断面図である。It is a longitudinal cross-sectional view for demonstrating the modification 3 of the glass substrate by this invention. 変形例3の砥石とガラス基板の端面との相対位置関係を示す縦断面図である。It is a longitudinal cross-sectional view which shows the relative positional relationship of the grindstone of the modification 3, and the end surface of a glass substrate.
 以下、図面を参照して本発明を実施するための形態について説明する。 Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings.
 図1Aは本発明によるガラス基板の一実施例を示す縦断面図である。図1Aに示されるように、ガラス基板10は、例えば、液晶ディスプレイやプラズマディスプレイ、有機エレクトロルミネッセンスなどの薄型ディスプレイ装置に用いられる四角形状の大型ガラスパネルである。ガラス基板10の厚さt(図1Aでいうガラス基板10の上下方向寸法)は、0.05mm~2.8mmであることが望ましい。また、ガラス基板10の主平面は、一辺が2.2m以上の四角形であることが望ましい。 FIG. 1A is a longitudinal sectional view showing an embodiment of a glass substrate according to the present invention. As shown in FIG. 1A, the glass substrate 10 is a rectangular large glass panel used for a thin display device such as a liquid crystal display, a plasma display, and organic electroluminescence. The thickness t of the glass substrate 10 (the vertical dimension of the glass substrate 10 in FIG. 1A) is preferably 0.05 mm to 2.8 mm. Further, the main plane of the glass substrate 10 is desirably a quadrangle having a side of 2.2 m or more.
 ガラス基板10の端面12は、ほぼ楕円形状に近似された曲面に研削される。端面12は、端面12の上部に形成される上部曲面12aと、端面12の下部に形成される下部曲面12bと、上部曲面12aと下部曲面12bとの中間に形成される中間部曲面12cとを有する。 The end surface 12 of the glass substrate 10 is ground into a curved surface approximated to an elliptical shape. The end surface 12 includes an upper curved surface 12a formed at the upper portion of the end surface 12, a lower curved surface 12b formed at the lower portion of the end surface 12, and an intermediate curved surface 12c formed between the upper curved surface 12a and the lower curved surface 12b. Have.
 本実施例における各曲面12a~12cは、上部曲面12aの曲率半径R1と、下部曲面12bの曲率半径R2と、中間部曲面12cの曲率半径R3とによって連続するほぼ楕円形状に近似する曲面に形成されている。尚、楕円は、長辺軸上の2点からの距離の合計が一定となるように各曲率半径が変化しているが、ここでは、説明の便宜上、上記曲率半径R1~R3を変化させることで連続した曲線として描くことが可能になる。 Each of the curved surfaces 12a to 12c in the present embodiment is formed into a curved surface that approximates an approximate elliptical shape by the curvature radius R1 of the upper curved surface 12a, the curvature radius R2 of the lower curved surface 12b, and the curvature radius R3 of the intermediate curved surface 12c. Has been. Note that the radius of curvature of the ellipse changes so that the total distance from two points on the long side axis is constant. Here, for convenience of explanation, the radius of curvature R1 to R3 is changed. It becomes possible to draw as a continuous curve.
 また、本実施例では、仮想楕円形状の長辺a=0.7mm、短辺b=0.6mmとする。長辺aは、ガラス基板10の厚さtと同じである。各曲率半径R1~R3は、当該ガラス基板10の厚さtよりも小さく、R1≦R2、R2≦R3、または上記R1=R2、R3>R2、R3>R1の関係を有する。 In the present embodiment, the long side a = 0.7 mm and the short side b = 0.6 mm of the virtual ellipse shape are set. The long side a is the same as the thickness t of the glass substrate 10. Each of the radii of curvature R1 to R3 is smaller than the thickness t of the glass substrate 10, and has a relationship of R1 ≦ R2, R2 ≦ R3, or R1 = R2, R3> R2, and R3> R1.
 図1Aの斜線で示す部分が研削によって削除される研削領域20である。すなわち、上記各曲面12a~12cの左側が研削される研削領域20であり、上記各曲面12a~12cの右側が研削後のガラス基板10である。 1A is a grinding region 20 to be removed by grinding. That is, the left side of the curved surfaces 12a to 12c is a grinding region 20 to be ground, and the right side of the curved surfaces 12a to 12c is the ground glass substrate 10.
 また、ガラス基板10の端面12を研削する際の条件としては、研削量x=0.15mm、厚さt=0.7mm、端面12から研削縁部までのX方向の距離c=0.23mmとする。また、ガラス基板10の端面12の端面研削工程では、平均粗さRaが0.3μm以下であることが望ましい。 Moreover, as conditions for grinding the end surface 12 of the glass substrate 10, the grinding amount x = 0.15 mm, the thickness t = 0.7 mm, and the distance c in the X direction from the end surface 12 to the grinding edge c = 0.23 mm. And Moreover, in the end surface grinding process of the end surface 12 of the glass substrate 10, it is desirable that average roughness Ra is 0.3 micrometer or less.
 また、ガラス基板10の端面12の上部曲面12aに対する接線S1と下部曲面12bに対する接線S2との角度αは、60°に設定されている。尚、角度αは、砥石30の開き角であり、任意の角度に設定することが可能である。 The angle α between the tangent line S1 of the end surface 12 of the glass substrate 10 with respect to the upper curved surface 12a and the tangent line S2 with respect to the lower curved surface 12b is set to 60 °. The angle α is an opening angle of the grindstone 30 and can be set to an arbitrary angle.
 また、ガラス基板10の端面12において、上記厚さtは、短辺bより大きいため、X方向の中心線上の端面12の中心Oから上記接線S1,S2が基板10の主平面14から離れる境界Pまでの距離cは、0.23mmとなり、従来のように端面12を面取り形状あるいは半円形とした場合よりも小さくなる。これにより、端面研削工程時に発生するカレットの飛散方向が端面12側に移動し、ガラス基板10の主平面14におけるカレット付着量を削減することができる。 Further, in the end surface 12 of the glass substrate 10, since the thickness t is larger than the short side b, the boundary where the tangents S 1 and S 2 are separated from the main plane 14 of the substrate 10 from the center O of the end surface 12 on the center line in the X direction. The distance c to P is 0.23 mm, which is smaller than the conventional case where the end face 12 is chamfered or semicircular. Thereby, the scattering direction of the cullet generated during the end surface grinding process moves to the end surface 12 side, and the amount of cullet adhesion on the main plane 14 of the glass substrate 10 can be reduced.
 また、端面12を楕円形状に研削する場合、従来の面取り形状や半円形状に研削するものに比べて砥石との接触面積が減少するため、研削時の発熱が抑制される。さらに、端面12を楕円形状に研削する場合、上記距離cが小さくなる分、カレット飛散方向が主平面14より端面側(主平面14より離間する方向)に移動して主平面14へのカレット付着量が減少する。 Further, when the end surface 12 is ground into an elliptical shape, the contact area with the grindstone is reduced as compared with a conventional chamfered shape or a semicircular shape, so that heat generation during grinding is suppressed. Further, when the end face 12 is ground into an elliptical shape, the cullet scattering direction moves from the main plane 14 to the end face side (in the direction away from the main plane 14) and the cullet adheres to the main plane 14 as the distance c decreases. The amount decreases.
 そのため、本実施例では、端面研削工程時における主平面14側へのカレット飛散量を抑制できると共に、端面12の発熱も抑制することができる。 Therefore, in this embodiment, it is possible to suppress the amount of cullet scattering to the main plane 14 side during the end surface grinding process, and also to suppress the heat generation of the end surface 12.
 図1Bは端面研削工程における砥石とガラス基板の端面との相対位置関係を示す縦断面図である。図1Bに示されるように、ガラス基板10の端面12は、砥石30を回転させて研削される。砥石30はダイヤモンド砥粒を有しており、回転軸40により回転可能に支持されている。また、砥石30は、滑車のようにガラス基板10の端面12に接する凹曲面からなる加工溝を有しており、ガラス基板10の端面12の曲面形状に対応した凹曲面32と、凹曲面32の上方に配された上鍔部34と、凹曲面32の下方に配された下鍔部36とを有する。 FIG. 1B is a longitudinal sectional view showing a relative positional relationship between the grindstone and the end surface of the glass substrate in the end surface grinding step. As shown in FIG. 1B, the end surface 12 of the glass substrate 10 is ground by rotating a grindstone 30. The grindstone 30 has diamond abrasive grains and is rotatably supported by the rotating shaft 40. Further, the grindstone 30 has a processing groove having a concave curved surface that contacts the end surface 12 of the glass substrate 10 like a pulley, and a concave curved surface 32 corresponding to the curved surface shape of the end surface 12 of the glass substrate 10 and a concave curved surface 32. An upper collar portion 34 disposed above and a lower collar portion 36 disposed below the concave curved surface 32.
 凹曲面32は、ガラス基板10の端面12の研削形状に対応する楕円形状の凹曲面に形成されている。すなわち、凹曲面32は、上部曲面12aに対応する曲率半径R1と、下部曲面12bに対応する曲率半径R2と、中間部曲面12cに対応する曲率半径R3とによって連続する楕円形状に形成されている。 The concave curved surface 32 is formed into an elliptical concave curved surface corresponding to the ground shape of the end surface 12 of the glass substrate 10. That is, the concave curved surface 32 is formed in an elliptical shape that is continuous by a curvature radius R1 corresponding to the upper curved surface 12a, a curvature radius R2 corresponding to the lower curved surface 12b, and a curvature radius R3 corresponding to the intermediate curved surface 12c. .
 尚、上記ダイヤモンド砥粒の砥石30は、放電加工により凹曲面32の形状を任意の形状に加工される。従って、砥石30を回転させながらガラス基板10の端面12に凹曲面32を接触させることによりガラス基板10の端面12の形状を任意の形状に研削することができる。 In addition, the grinding stone 30 of the diamond abrasive grains is processed into an arbitrary shape by forming the concave curved surface 32 by electric discharge machining. Therefore, the shape of the end surface 12 of the glass substrate 10 can be ground to an arbitrary shape by bringing the concave curved surface 32 into contact with the end surface 12 of the glass substrate 10 while rotating the grindstone 30.
 図2は端面研削工程で用いられる研削装置を模式的に示す平面図である。図2に示されるように、端面研削工程において、ガラス基板10は、研削装置の吸着テーブル50の上面に載置された状態で吸着されて保持されている。ガラス基板10と砥石30とは、ガラス基板10の左右両側の端面12に一対の砥石30が接触するように位置合わせされる。 FIG. 2 is a plan view schematically showing a grinding apparatus used in the end face grinding process. As shown in FIG. 2, in the end surface grinding step, the glass substrate 10 is sucked and held in a state of being placed on the upper surface of the suction table 50 of the grinding device. The glass substrate 10 and the grindstone 30 are aligned so that the pair of grindstones 30 are in contact with the left and right end faces 12 of the glass substrate 10.
 また、各砥石30の高さ位置(Y方向位置)が、ガラス基板10の端面12の高さ位置(Y方向位置)に合わせて調整される。すなわち、図1Aに示されるように、砥石30の凹曲面32の中心の高さ位置とガラス基板10の端面12の中心Oの高さ位置とが一致するように設定される。 Moreover, the height position (Y direction position) of each grindstone 30 is adjusted according to the height position (Y direction position) of the end surface 12 of the glass substrate 10. That is, as shown in FIG. 1A, the height position of the center of the concave curved surface 32 of the grindstone 30 and the height position of the center O of the end surface 12 of the glass substrate 10 are set to coincide with each other.
 一対の砥石30は、夫々が回転駆動されながら、X1方向、X2方向に送られてガラス基板10の左右両側の端面12を研削する。また、端面研削時は、砥石30の凹曲面32とガラス基板10の端面12との接触部分に冷却液(クーラント)を供給して研削による発熱を緩和する。そして、当該研削工程が終了すると、ガラス基板10を90度回動させて他の二辺の端面12の研削を行なう。 The pair of grindstones 30 are fed in the X1 direction and the X2 direction while being rotationally driven to grind the left and right end faces 12 of the glass substrate 10. Moreover, at the time of end face grinding, a cooling liquid (coolant) is supplied to the contact part of the concave curved surface 32 of the grindstone 30 and the end face 12 of the glass substrate 10, and the heat_generation | fever by grinding is relieve | moderated. And when the said grinding process is complete | finished, the glass substrate 10 is rotated 90 degree | times and the end surface 12 of two other sides is ground.
 尚、ガラス基板10を回動させる際は、当該ガラス基板10を空気吸引により吸着したまま吸着テーブル50と共に回動させても良いし、あるいは空気噴出によりガラス基板10を浮上させてガラス基板10のみを90度回動させ、位置合わせを行なって吸着するようにしても良い。 When the glass substrate 10 is rotated, the glass substrate 10 may be rotated together with the suction table 50 while being adsorbed by air suction, or only the glass substrate 10 is floated by air blowing. May be rotated 90 degrees, aligned and sucked.
 このように、端面研削工程では、ガラス基板10の四方向の各端面12を砥石30により任意の形状に研削している。また、端面研削工程で発生するカレットは、砥石30の回転方向に飛散するため、各端面12から離間する方向に飛散され、主平面14の付着量が削減されている。
〔従来の研削方法〕
 ここで、従来の研削方法について説明する。
Thus, in the end surface grinding step, each end surface 12 in the four directions of the glass substrate 10 is ground into an arbitrary shape by the grindstone 30. Moreover, since the cullet generated in the end surface grinding process is scattered in the rotation direction of the grindstone 30, it is scattered in the direction away from each end surface 12, and the adhesion amount of the main plane 14 is reduced.
[Conventional grinding method]
Here, a conventional grinding method will be described.
 図3は従来のガラス基板の研削方法1を説明するための縦断面図である。図3に示されるように、従来のガラス基板の研削方法1では、ガラス基板10の端面12を面取り形状に研削する。この研削方法1の研削条件は、上記実施例の場合と同様であり、研削量x=0.15mm、厚さt=0.7mm、面取り角度α=52°としている。また、端面12の外側面と面取りとの角が曲率半径R4,R5の曲面に形成されている。 FIG. 3 is a longitudinal sectional view for explaining a conventional glass substrate grinding method 1. As shown in FIG. 3, in the conventional glass substrate grinding method 1, the end surface 12 of the glass substrate 10 is ground into a chamfered shape. The grinding conditions of this grinding method 1 are the same as in the case of the above embodiment, and the grinding amount x = 0.15 mm, the thickness t = 0.7 mm, and the chamfer angle α = 52 °. In addition, the angle between the outer surface of the end surface 12 and the chamfer is formed as a curved surface having the curvature radii R4 and R5.
 しかしながら、端面12を面取り形状とするため、端面12から研削縁部までのX方向の距離がc=0.29mmとなり、上記実施例の場合よりも大きい。これにより、砥石30による端面研削工程では、主平面14側へのカレット飛散量が増大し、冷却液による冷却が充分でないときには、端面12が発熱によりヤケが発生するおそれがある。 However, since the end surface 12 has a chamfered shape, the distance in the X direction from the end surface 12 to the grinding edge is c = 0.29 mm, which is larger than that in the above embodiment. Thereby, in the end surface grinding process by the grindstone 30, when the amount of cullet scattering to the main plane 14 side increases, there is a possibility that the end surface 12 may be burned due to heat generation when cooling by the coolant is not sufficient.
 図4は従来のガラス基板の研削方法2を説明するための縦断面図である。図4に示されるように、従来のガラス基板の研削方法2では、ガラス基板10の端面12を半円形状に研削する。この研削方法2の研削条件は、上記実施例の場合と同様であり、研削量x=0.15mm、厚さt=0.7mm、角度α=60°としている。また、端面12の曲率半径R6は、ガラス基板10の厚さ(t=0.7mm)の半分である。 FIG. 4 is a longitudinal sectional view for explaining a conventional glass substrate grinding method 2. As shown in FIG. 4, in the conventional glass substrate grinding method 2, the end surface 12 of the glass substrate 10 is ground into a semicircular shape. The grinding conditions of this grinding method 2 are the same as in the case of the above embodiment, and the grinding amount x = 0.15 mm, the thickness t = 0.7 mm, and the angle α = 60 °. Further, the radius of curvature R6 of the end face 12 is half of the thickness (t = 0.7 mm) of the glass substrate 10.
 しかしながら、端面12を半円形状とするため、端面12から研削縁部までのX方向の距離がc=0.25mmとなり、上記実施例の場合よりも大きい。これにより、砥石30による端面研削工程では、主平面14側へのカレット飛散量が増大し、冷却液による冷却が充分でないときには、端面12が発熱によりヤケが発生するおそれがある。 However, since the end face 12 has a semicircular shape, the distance in the X direction from the end face 12 to the grinding edge is c = 0.25 mm, which is larger than in the above embodiment. Thereby, in the end surface grinding process by the grindstone 30, when the amount of cullet scattering to the main plane 14 side increases, there is a possibility that the end surface 12 may be burned due to heat generation when cooling by the coolant is not sufficient.
 ここで、変形例について説明する。
〔変形例1〕
 図5は本発明によるガラス基板の変形例1を説明するための縦断面図である。図5に示されるように、変形例1では、楕円形状に形成された端面12に対する砥石30の接線S1,S2の角度αがα=52°に設定されている。尚、変形例2における他の条件は、前述した条件と同じである。
Here, a modified example will be described.
[Modification 1]
FIG. 5 is a longitudinal sectional view for explaining a first modification of the glass substrate according to the present invention. As shown in FIG. 5, in the first modification, the angle α of the tangents S1, S2 of the grindstone 30 with respect to the end surface 12 formed in an elliptical shape is set to α = 52 °. The other conditions in the modified example 2 are the same as those described above.
 変形例1の場合も上記実施例の場合と同様に、端面12を楕円形状に研削する場合、従来の面取り形状や半円形状のものに比べて砥石との接触面積が減少するため、研削時の発熱が抑制される。さらに、端面12を楕円形状に研削する場合、上記距離cが小さくなる分、カレット飛散方向が主平面14より端面側に移動して主平面14へのカレット付着量が減少する。 In the case of the modified example 1 as well, in the case of grinding the end surface 12 into an elliptical shape, the contact area with the grindstone is reduced as compared with the conventional chamfered shape or semicircular shape. Heat generation is suppressed. Further, when the end face 12 is ground into an elliptical shape, the cullet scattering direction moves from the main plane 14 to the end face side as the distance c decreases, and the amount of cullet attached to the main plane 14 decreases.
 そのため、本変形例1では、端面研削工程時における主平面14側へのカレット飛散量を抑制すると共に、端面12の発熱も抑制することができる。 Therefore, in the first modification, it is possible to suppress the amount of cullet scattering to the main plane 14 side during the end surface grinding process and to suppress the heat generation of the end surface 12.
〔変形例2〕
 図6は本発明によるガラス基板の変形例2を説明するための縦断面図である。図6に示されるように、変形例2では、楕円形状に形成された端面12に対する砥石30の接線S1,S2の角度αがα=72°に設定されている。また、変形例2では、研削量x=0.15mm、厚さt=0.7mmは、前述した条件と同じである。一方、距離c及び長辺aと短辺bとの比は、上記実施例の場合と異なるが、0.5≦b/a≦2.0であることが好ましい。
[Modification 2]
FIG. 6 is a longitudinal sectional view for explaining a second modification of the glass substrate according to the present invention. As shown in FIG. 6, in the second modification, the angle α of the tangents S1 and S2 of the grindstone 30 with respect to the end surface 12 formed in an elliptical shape is set to α = 72 °. In Modification 2, the grinding amount x = 0.15 mm and the thickness t = 0.7 mm are the same as those described above. On the other hand, the distance c and the ratio of the long side a to the short side b are different from those in the above embodiment, but it is preferable that 0.5 ≦ b / a ≦ 2.0.
 変形例2においては、短辺bが上記実施例及び変形例1のものよりも小さく設定されている。そのため、端面12を楕円形状に研削する場合、従来の面取り形状や半円形状のものに比べて砥石との接触面積が減少するため、研削時の発熱が抑制される。さらに、上記距離cが上記実施例及び変形例1のものよりも小さくなっており、その分、カレット飛散方向が主平面14より端面側に移動して主平面14へのカレット付着量が減少する。 In the second modification, the short side b is set to be smaller than that in the first embodiment and the first modification. Therefore, when the end surface 12 is ground into an elliptical shape, the contact area with the grindstone is reduced as compared with a conventional chamfered shape or a semicircular shape, so that heat generation during grinding is suppressed. Further, the distance c is smaller than that of the above-described embodiment and the first modification, and accordingly, the cullet scattering direction moves from the main plane 14 to the end face side, and the amount of cullet attached to the main plane 14 decreases. .
〔変形例3〕
 図7は本発明によるガラス基板の変形例3を説明するための縦断面図である。図8は変形例3の砥石とガラス基板の端面との相対位置関係を示す縦断面図である。
[Modification 3]
FIG. 7 is a longitudinal sectional view for explaining a third modification of the glass substrate according to the present invention. FIG. 8 is a longitudinal sectional view showing the relative positional relationship between the grindstone of Modification 3 and the end face of the glass substrate.
 図7に示されるように、変形例3のガラス基板10は、端面12に3つの異なる曲率半径を有する曲面12a~12cを有しており、各曲面12a~12cの境界には、第1の凹部12d、第2の凹部12eが形成されている。各曲面12a~12cの曲率半径R1~R3は、夫々ガラス基板10の厚さtよりも小さい値に設定されており、且つR1≦R2、R2≦R3、またはR1<R2<R3の関係にある。 As shown in FIG. 7, the glass substrate 10 of Modification 3 has curved surfaces 12a to 12c having three different radii of curvature on the end surface 12, and the first curved surface 12a to 12c has a first A recess 12d and a second recess 12e are formed. The curvature radii R1 to R3 of the curved surfaces 12a to 12c are set to values smaller than the thickness t of the glass substrate 10 and have a relationship of R1 ≦ R2, R2 ≦ R3, or R1 <R2 <R3. .
 第1凹部12dは、上部曲面12aと中間部曲面12cとの境界に設けられ、第2凹部12eは中間部曲面12cと下部曲面12bとの境界に設けられている。 The first recess 12d is provided at the boundary between the upper curved surface 12a and the intermediate curved surface 12c, and the second recess 12e is provided at the boundary between the intermediate curved surface 12c and the lower curved surface 12b.
 図8に示されるように、変形例3の端面12に対する砥石30の接線S1,S2の角度αがα=90°に設定されている。また、端面12から研削縁部までのX方向の距離がc=0.137mmとなり、上記実施例の場合よりも小さい。尚、研削量x=0.15mm、厚さt=0.7mmは、前述した条件と同じである。 As shown in FIG. 8, the angle α of the tangents S1, S2 of the grindstone 30 with respect to the end surface 12 of the modified example 3 is set to α = 90 °. Further, the distance in the X direction from the end face 12 to the grinding edge is c = 0.137 mm, which is smaller than that in the above embodiment. The grinding amount x = 0.15 mm and the thickness t = 0.7 mm are the same as those described above.
 そのため、上記距離cが小さくなる分、カレット飛散方向が主平面14より端面側に移動して主平面14へのカレット付着量が減少する。 Therefore, as the distance c becomes smaller, the direction of cullet scattering moves from the main plane 14 to the end face side, and the amount of cullet attached to the main plane 14 decreases.
 よって、本変形例3では、実施例及び変形例1,2よりも端面研削工程時における主平面14側へのカレット飛散量を抑制すると共に、端面12の発熱も抑制することができる。 Therefore, in the third modification, it is possible to suppress the amount of cullet scattering toward the main plane 14 during the end face grinding process and to suppress the heat generation of the end face 12 as compared with the embodiment and the first and second modifications.
 また、変形例3の端面12は、内側に凹んだ第1の凹部12dと第の2凹部12eと有するため、回転する砥石30によって研削される際に発生するカレットが凹部12d、12eに溜り、凹部12d、12eより外側に突出する上部曲面12a及び下部曲面12bによって主平面14にカレットが飛散されることが抑制される。尚、凹部12d、12eに溜ったカレットは、後段の洗浄工程で除去される。 Moreover, since the end surface 12 of the modification 3 has the 1st recessed part 12d and the 2nd recessed part 12e which were recessed inside, the cullet which generate | occur | produces when grinding with the rotating grindstone 30 accumulates in the recessed parts 12d and 12e, The cullet is prevented from being scattered on the main plane 14 by the upper curved surface 12a and the lower curved surface 12b protruding outward from the recesses 12d and 12e. The cullet collected in the recesses 12d and 12e is removed in a subsequent cleaning step.
 上部曲面12a及び下部曲面12bの曲率半径R1、R2は、上記のように異なる半径としても良いし、あるいは同じ半径としても良い。曲率半径R1、R2が同じ半径(R1=R2)の場合には、上部曲面12aと下部曲面12bとが上下方向で対称に形成される。また、凹部12d、12eは、夫々板厚方向に所定の間隔を有するようにガラス基板10の主平面14と平行となるX方向に延在形成される。そのため、端面研削工程時の砥石30とガラス基板10との高さ調整のずれを凹部12d、12eの位置から研削終了後に測定(検査)することが可能になる。 The curvature radii R1 and R2 of the upper curved surface 12a and the lower curved surface 12b may be different radii as described above, or may be the same radius. When the curvature radii R1 and R2 are the same radius (R1 = R2), the upper curved surface 12a and the lower curved surface 12b are formed symmetrically in the vertical direction. The recesses 12d and 12e are formed to extend in the X direction parallel to the main plane 14 of the glass substrate 10 so as to have a predetermined interval in the plate thickness direction. Therefore, it is possible to measure (inspect) the height adjustment deviation between the grindstone 30 and the glass substrate 10 during the end face grinding process from the positions of the recesses 12d and 12e after the grinding.
 また、変形例3においては、端面12に対する砥石30の接線S1,S2の角度αがα=90°と大きな値に設定されているので、カレットの飛散方向が主平面14よりも端面側になるため、このことからも主平面14へのカレット飛散量が抑制される。 In the third modification, the angle α of the tangents S1 and S2 of the grindstone 30 with respect to the end surface 12 is set to a large value of α = 90 °, so that the cullet scattering direction is on the end surface side with respect to the main plane 14. For this reason, the amount of cullet scattering on the main plane 14 is also suppressed.
 このように、ガラス基板10の端面12は、夫々曲率半径の異なる3つの曲面12a~12cの組み合わせからなり、且つ各曲面12a~12cの境界には、凹部12d、12eが形成されているため、端面研削工程における主平面14のカレット付着量を削減することが可能になる。 Thus, the end surface 12 of the glass substrate 10 is composed of a combination of three curved surfaces 12a to 12c having different curvature radii, and the concave portions 12d and 12e are formed at the boundaries of the curved surfaces 12a to 12c. It becomes possible to reduce the amount of cullet adhesion on the main plane 14 in the end surface grinding process.
 上記実施例では、薄型ディスプレイ装置に用いられるガラス基板の端面を研削する場合を例に挙げて説明したが、これに限らず、比較的厚さtの薄い(例えば、厚さt=0.05mm~2.8mm)ガラス基板であれば、本発明を適用することができるのは勿論である。 In the above embodiment, the case where the end surface of the glass substrate used in the thin display device is ground has been described as an example. However, the present invention is not limited thereto, and the thickness t is relatively thin (for example, the thickness t = 0.05 mm). It is a matter of course that the present invention can be applied to any glass substrate up to 2.8 mm.
 本出願を詳細にまた特定の実施態様を参照して説明したが、本発明の精神と範囲を逸脱することなく様々な変更や修正を加えることができることは当業者にとって明らかである。
 本出願は、2010年6月21日出願の日本特許出願(特願2010-140254)に基づくものであり、その内容はここに参照として取り込まれる。
Although this application has been described in detail and with reference to specific embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the invention.
This application is based on a Japanese patent application filed on June 21, 2010 (Japanese Patent Application No. 2010-140254), the contents of which are incorporated herein by reference.
10 ガラス基板
12 端面
12a 上部曲面
12b 下部曲面
12c 中間部曲面
12d 第1の凹部
12e 第2の凹部
14 主平面
20 研削領域
30 砥石
32 凹曲面
34 上鍔部
36 下鍔部
40 回転軸
50 吸着テーブル
DESCRIPTION OF SYMBOLS 10 Glass substrate 12 End surface 12a Upper curved surface 12b Lower curved surface 12c Middle curved surface 12d 1st recessed part 12e 2nd recessed part 14 Main plane 20 Grinding area 30 Grinding stone 32 Recessed curved surface 34 Upper collar part 36 Lower collar part 40 Rotating shaft 50 Suction table

Claims (11)

  1.  端面を砥石により研削されるガラス基板において、
     前記砥石に研削された端面は、
     前記端面の上部に形成される上部曲面と、
     前記端面の下部に形成される下部曲面と、
     前記上部曲面と前記下部曲面との中間に形成される中間部曲面とを有し、
     前記上部曲面、前記下部曲面、前記中間部曲面の夫々が任意の曲率半径を有し、
     少なくとも前記上部曲面および前記中間部曲面の曲率半径が異なることを特徴とするガラス基板。
    In a glass substrate whose end face is ground by a grindstone,
    The end face ground on the grindstone is
    An upper curved surface formed on an upper portion of the end surface;
    A lower curved surface formed at a lower portion of the end surface;
    An intermediate curved surface formed between the upper curved surface and the lower curved surface;
    Each of the upper curved surface, the lower curved surface, and the intermediate curved surface has an arbitrary radius of curvature,
    A glass substrate, wherein at least the upper curved surface and the intermediate curved surface have different radii of curvature.
  2.  前記上部曲面、前記下部曲面、前記中間部曲面は、隣り合う曲面の曲率半径を変化させることで連続した曲面を形成することを特徴とする請求項1に記載のガラス基板。 The glass substrate according to claim 1, wherein the upper curved surface, the lower curved surface, and the intermediate curved surface form a continuous curved surface by changing a curvature radius of an adjacent curved surface.
  3.  前記上部曲面、前記下部曲面、前記中間部曲面は、ほぼ楕円形状の輪郭形状に近似する連続した曲面を形成することを特徴とする請求項2に記載のガラス基板。 The glass substrate according to claim 2, wherein the upper curved surface, the lower curved surface, and the intermediate curved surface form a continuous curved surface that approximates a substantially elliptical contour shape.
  4.  前記上部曲面、前記下部曲面、前記中間部曲面は、夫々当該ガラス基板の厚さよりも小さい曲率半径を有することを特徴とする請求項1に記載のガラス基板。 The glass substrate according to claim 1, wherein each of the upper curved surface, the lower curved surface, and the intermediate curved surface has a radius of curvature smaller than a thickness of the glass substrate.
  5.  前記上部曲面と前記中間部曲面との境界に第1の凹部が形成され、前記下部曲面と前記中間部曲面との境界に第2の凹部が形成されることを特徴とする請求項4に記載のガラス基板。 The first concave portion is formed at a boundary between the upper curved surface and the intermediate curved surface, and the second concave portion is formed at a boundary between the lower curved surface and the intermediate curved surface. Glass substrate.
  6.  前記第1、第2の凹部は、夫々板厚方向に所定の間隔を有するようにガラス基板の主平面と平行となる方向に延在形成されることを特徴とする請求項5に記載のガラス基板。 6. The glass according to claim 5, wherein the first and second recesses are formed to extend in a direction parallel to the main plane of the glass substrate so as to have a predetermined interval in the plate thickness direction. substrate.
  7.  前記ガラス基板は、一辺が2.2m以上の四角形であることを特徴とする請求項1乃至6の何れか一項に記載のガラス基板。 The glass substrate according to any one of claims 1 to 6, wherein the glass substrate is a quadrangle having a side of 2.2 m or more.
  8.  前記ガラス基板の端面は、平均粗さRaが0.3μm以下であることを特徴とする請求項1乃至7の何れか一項に記載のガラス基板。 The glass substrate according to any one of claims 1 to 7, wherein the end surface of the glass substrate has an average roughness Ra of 0.3 µm or less.
  9.  前記ガラス基板の厚さは、0.05mm~2.8mmであることを特徴とする請求項1乃至8の何れか一項に記載のガラス基板。 The glass substrate according to any one of claims 1 to 8, wherein the glass substrate has a thickness of 0.05 mm to 2.8 mm.
  10.  端面を砥石により研削されるガラス基板の製造方法において、
     前記砥石の外周に、前記端面の上部に形成される上部曲面と、前記端面の下部に形成される下部曲面と、前記上部曲面と前記下部曲面との中間に形成される中間部曲面とに対応する曲面を形成し、
     前記砥石を回転させながら前記ガラス基板の端面に沿うように相対移動させて前記ガラス基板の端面に前記上部曲面、前記下部曲面、前記中間部曲面の夫々が任意の曲率半径を有するように加工することを特徴とするガラス基板の製造方法。
    In the method of manufacturing a glass substrate whose end face is ground with a grindstone,
    Corresponding to the upper curved surface formed at the upper part of the end surface, the lower curved surface formed at the lower part of the end surface, and the intermediate curved surface formed between the upper curved surface and the lower curved surface on the outer periphery of the grindstone Form a curved surface,
    The grindstone is rotated and relatively moved along the end surface of the glass substrate so that the upper curved surface, the lower curved surface, and the intermediate curved surface each have an arbitrary radius of curvature on the end surface of the glass substrate. A method for producing a glass substrate, comprising:
  11.  前記上部曲面、前記下部曲面、前記中間部曲面が、隣り合う曲面の曲率半径を変化させることで連続した曲面を形成するように加工することを特徴とする請求項10に記載のガラス基板の製造方法。 11. The glass substrate according to claim 10, wherein the upper curved surface, the lower curved surface, and the intermediate curved surface are processed so as to form a continuous curved surface by changing a curvature radius of adjacent curved surfaces. Method.
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